TWI242386B

TWI242386B - Manufacturing method of shadow mask for quadr-pole field emission displays

Info

Publication number: TWI242386B
Application number: TW93106976A
Authority: TW
Inventors: Shie-Heng Li; Kuei-Wen Jeng
Original assignee: Teco Nanotech Co Ltd
Priority date: 2004-03-16
Filing date: 2004-03-16
Publication date: 2005-10-21
Also published as: TW200533223A

Abstract

Disclosed is a manufacturing method of shadow mask for quadr-pole field emission display. The shadow mask is an independent board member with three layers of a convergent electrode layer, an insulated layer and a gate electrode layer. The board member uses a metal conductive plate having a plurality of through holes as the substrate, and the substrate is then used as a convergent electrode layer on which one end of the conductive plate is fabricated by a method combining screen printing and lithographic process to first deploy the insulated layer and then form a gate electrode layer on the outer side of the insulated layer.

Description

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五、發明說明（1) 【發明所屬之技術領域】蔣ΐ Ϊ =係有關一種四極結構之場發射顯示器，尤指-種 i ί電極層、絕緣層及收斂電極層合成一獨立網罩之製 k万法。【先前技術】按場發射顯示為（Fi eld Emi ssi on Display，FED)是近年來新興的平面顯示器之一，其原因在其具有自體發光，效果’無需另外使用背光光源，較諸LCd，除有較佳的亮度表現外，再加上更寬廣的可視角度範圍、耗電量低、反應速度快（不留殘影）及操作溫度較廣等優點，且其所呈現之影像畫質非常近似於傳統的陰極射線管（CRτ )顯示器’而其體積卻遠較陰極射線管輕、薄，故場發射顯示器成為取代液晶顯示器及電漿顯示器的明日之星實為指日可待之事。更由於近年來奈米技術之迅速發展，將奈米材料應用於場發射顯示器中，勢將更形促進其發展為成熟商品 ° 第一圖所示者乃為一種基本的三極結構場發射顯示器之剖視圖，其結構主要係包含陽極板（1 0 )與陰極板（2 〇 )，陽極板（10)與陰極板（20)之間設置有支樓器（Spacer)(i4)，提供為陽極板（1 0 )與陰極板（2 0 )間真空區域之間隔，及作為陽極板（1 0 )與陰極板（2 0 )之間之支撐，該陽極板（1 〇 )係包含一陽極基板（11)、一陽極導電層（12)及一螢光粉體層 (phosphors layer)(13);而該陰極板（20)則包含一陰極V. Description of the invention (1) [Technical field to which the invention belongs] Chiang Kai-shek = a field emission display with a quadrupole structure, especially-a kind of independent net cover made of an electrode layer, an insulating layer and a convergent electrode layer k million methods. [Previous technology] Field Emi ssi on Display (FED) is one of the emerging flat-panel displays in recent years. The reason is that it has self-luminescence, and the effect is' no need to use a backlight source. Compared with LCd, In addition to better brightness performance, plus a wider viewing angle range, low power consumption, fast response speed (no residual image), and wide operating temperature, etc., and the image quality it presents is very It is similar to a traditional cathode ray tube (CRτ) display, but its volume is much lighter and thinner than a cathode ray tube. Therefore, the field emission display will become the star of tomorrow to replace the liquid crystal display and plasma display. In addition, due to the rapid development of nanotechnology in recent years, the application of nanomaterials in field emission displays will further promote its development into mature products. The first picture shows a basic three-pole field emission display. The cross-sectional view mainly includes the anode plate (10) and the cathode plate (20). A spacer (i4) is provided between the anode plate (10) and the cathode plate (20), and is provided as an anode. The space between the vacuum zone between the plate (10) and the cathode plate (20), and as a support between the anode plate (10) and the cathode plate (20), the anode plate (10) contains an anode substrate (11), an anode conductive layer (12), and a phosphors layer (13); and the cathode plate (20) includes a cathode

1242386 五、發明說明（2) 基板（2 1 )、一陰極導電層（2 2 )、一電子發射源層（2 3 )、一介電層（2 4 )及一閘極層（2 5 );其中該閘極層（2 5 )係被提供一電位差以沒引電子發射源層（2 3 )之電子射出，藉由陽極導電層（12)所提供之高電壓，以提供電子束之加速，俾使電子有足夠的動能撞擊（impinge)陽極板（1〇)上之螢光粉體層（1 3 )激發而使其發光。惟因電子束之射出會形成扇形發散，而此種三極結構之場發射顯不器，難以控制其電子束之發散幅度，使得電子束過度發政’甚至有可能撞擊到鄰近單元之螢光粉體層 (1 3 )’因而降低了顯像效果，於是便有如第二圖所示之四極結構問世，該種四極結構亦為本申請人所提出，其係於原有二極結構以外再增設第四電極（即收斂電極），主要係在該陰極板（40)與陽極板（3 0)間對應固設一網罩（5)，其係為具有收斂電極層（51 )、絕緣層（52)及閘極層（53)之三層結構’且其收斂電極層（5丨）係面對陽極板（3 〇 )，其間並 •設有多條狀支撐器（34)，該陽極板（3〇)係為由陽極基板 (一31)、陽極導電層（32)及螢光粉體層（33)所組成之陽極單兀；而閘極層（53)係面對陰極板（40)，其間並設有阻隔壁 (44)，該陰極板（4〇)係為由陰極基板（41 )、陰極導電層 (42)及電子發射源層（43)所組成之陰極單元；該閘極層 (53)及收斂電極層（51)均載有適當之電位。另該網罩（5) 上開設有對應於每一陰陽極單元之複數透孔（54)，以容由電$源發射層（43)射向螢光粉體層（33)之電子束穿越。在貝務運作上，因電子束係成扇形發散，故網罩（5 )之透1242386 V. Description of the invention (2) substrate (2 1), a cathode conductive layer (2 2), an electron emission source layer (2 3), a dielectric layer (2 4), and a gate layer (2 5) Among them, the gate layer (2 5) is provided with a potential difference so as not to attract electrons from the electron emission source layer (2 3), and the high voltage provided by the anode conductive layer (12) is used to provide acceleration of the electron beam. In order to make the electrons have enough kinetic energy to impinge, the fluorescent powder layer (1 3) on the anode plate (10) is excited to make it emit light. However, due to the emission of the electron beam, a fan-shaped divergence is formed, and the field emission display of this three-pole structure is difficult to control the divergence amplitude of the electron beam, so that the electron beam is excessively irritated. It may even hit the fluorescent light of adjacent units. The powder layer (1 3) 'thus reduces the imaging effect, so a quadrupole structure as shown in the second figure is introduced. This kind of quadrupole structure has also been proposed by the applicant, which is in addition to the original two-pole structure. The addition of a fourth electrode (ie, a convergent electrode) is mainly provided by a mesh cover (5) fixed between the cathode plate (40) and the anode plate (30), which has a convergent electrode layer (51) and an insulating layer. (52) and the gate layer (53) of the three-layer structure 'and its convergent electrode layer (5 丨) is facing the anode plate (30) with a plurality of strip-shaped supports (34) in between. The plate (30) is an anode unit composed of an anode substrate (31), an anode conductive layer (32), and a fluorescent powder layer (33); and the gate layer (53) faces the cathode plate ( 40), and a barrier wall (44) is provided in between. The cathode plate (40) is composed of a cathode substrate (41) and a cathode conductive layer (42). The electron emission source layer (43) composed of the cathode unit; the gate layer (53) and a convergence electrode layer (51) are contained the appropriate potential. In addition, the mesh cover (5) is provided with a plurality of through holes (54) corresponding to each of the cathode and anode units, so as to allow the electron beam emitted from the electric source emission layer (43) to the fluorescent powder layer (33) to pass through. . In the operation of shellfish, because the electron beam is fan-shaped, the net cover (5) is transparent.

第6頁 1242386 五、發明說明（3) 孔（54)需稍加變化，以求得更佳之收斂效果，如第三圖所示者’位於收斂電極層（5Γ)之第一透孔（511，）之孔徑大於絕緣層（52,）之第二透孔（521，）及閘極層（53,）之第三透孔（5 3 1 ’）之孔徑。此種網罩之製造方法係以一金屬導電板為基板，並即以其做為收斂電極層（5丨），於其下側面布設一絕緣層（52)，再於該絕緣層（5 2)之下側面再布設一導電層，即形成閘極層（5 3 )，其中該網罩（5 )之金屬導電板（即收斂電極層（5 1 ))上開設有複數個成矩陣排列之第一透孔 (5 1 1 )，該第一透孔（5 1 )之位置係對應於每一陰陽極單元 (即電子發射源及螢光粉體）排列，以做為陰極電子發射源層（43)產生電子束以射向陽極螢光粉體層（33)時穿越網罩 (5 )之通道。此種四極結構可使收斂電極層（5 1 )對電子束產生收斂作用’即限縮其扇形發散幅度，使電子束可精準的撞擊對應之螢光粉體層（33)，而不致撞擊至鄰近單元，有效提升了、場發射顯示器之顯像效果，惟該網罩（5 )之絕緣層（5 2 )及閘極層（5 3 )往昔皆係以網版印刷方式所布設，仍有如下之缺點：其一，如第三圖所示之孔形’以網印製作圖騰化之絕緣層（52’）與閘極層（53,），因收斂電極層（51，）之第一透孔 (5 1 Γ )之孔徑較大，致使印刷下墨之區域無支撐之處，印刷之第二透孔（521’）及第三透孔（531，）之四周容易造成游塌崩毀。其二，於印刷製程中，由於收斂電極層（5 1 ’）之第一透Page 6 1242386 V. Description of the invention (3) The hole (54) needs to be slightly changed to obtain a better convergence effect. As shown in the third figure, the first through hole (511) located in the convergent electrode layer (5Γ) The diameter of the hole is larger than the diameter of the second through hole (521,) of the insulating layer (52,) and the third through hole (5 3 1 ') of the gate layer (53,). The manufacturing method of this kind of net cover uses a metal conductive plate as a substrate and uses it as a convergent electrode layer (5 丨), and an insulating layer (52) is arranged on the lower side, and then the insulating layer (5 2 A conductive layer is arranged on the lower side of the substrate to form a gate layer (5 3). A metal conductive plate (ie, a convergent electrode layer (5 1)) of the mesh cover (5) is provided with a plurality of arrayed arrays. The first through-hole (5 1 1), the position of the first through-hole (5 1) is arranged corresponding to each cathode and anode unit (that is, the electron emission source and the fluorescent powder body) as the cathode electron emission source layer (43) An electron beam is generated to pass through the channel of the mesh cover (5) when it is directed to the anode fluorescent powder layer (33). This quadrupole structure allows the convergent electrode layer (5 1) to converge on the electron beam, that is, to limit its fan-shaped divergence amplitude, so that the electron beam can accurately hit the corresponding fluorescent powder layer (33) without hitting it. Adjacent units have effectively improved the imaging effect of the field emission display, but the insulation layer (5 2) and gate layer (5 3) of the mesh cover (5) were previously laid by screen printing. The disadvantages are as follows: First, as shown in the third figure, the toroidal insulation layer (52 ') and the gate layer (53,) are produced by screen printing. The larger hole size of the through hole (5 1 Γ) makes the unprinted area unsupported. The printed second through hole (521 ') and the third through hole (531,) are easy to cause collapse and collapse. . Second, in the printing process, due to the first penetration of the convergent electrode layer (5 1 ′),

1242386 五、發明說明（4) ' ' --- 孔(—5 1 1 )之存在，致使部分透孔於印製過程下墨料攤流於 ί第二透孔（5 1 1 ’）内，其中絕緣層（5 2，）之玻璃膠塗料會化成第一透孔（5 1 1 ’）之污染或阻塞，而閘極層（5 3，）之銀膠塗料會造成部分閘極層（53,）與收斂電極層（5丨，）之導通。因此而導致網罩製作之瑕疵不良，故習用網罩之製造方法仍有未臻理想之處。、【發明内容】一本發明之主要目的’即在於提供一種四極結構場發射顯不器之網罩製造方法，其以一種壓合裝置壓合塗料，並結合微影蝕刻製程取代既有之網版印刷，可避免收斂電極層之第一透孔所造成第二透孔及第三透孔之崩塌問題，與& 斂電極層及閘極層之導通問題，以提高網罩之製造良率。為達上述目的，本發明係以一金屬導電板形成收斂電極層’並採用一壓合製程製作絕緣層並填塞收斂電極層之第一透孔，再以一微影或印刷製程製作閘極層，接著以一颠刻製程俾使原填塞之透孔移除再生，並於絕緣層對應收斂電極層及閘極層之對應透孔位置蝕刻形成第二及第三透孑L 。【實施方式】首請參閱第四圖，第一步係先以一種非接觸S(free contact)塗料裝置（61)將玻璃膠或二氧化矽膠塗覆於一平1242386 V. Description of the invention (4) '--- The existence of the hole (-5 1 1) caused part of the through-holes to spread in the second through-hole (5 1 1') during the printing process. Wherein, the glass glue coating of the insulating layer (52, 2) will be polluted or blocked by the first through hole (5 1 1 '), and the silver glue coating of the gate layer (53, 5) will cause part of the gate layer (53 ,) Is in conduction with the convergent electrode layer (5 丨,). As a result, defects in the production of the net cover are not good, so the manufacturing method of the conventional net cover is still not perfect. [Contents of the invention] A main object of the present invention is to provide a method for manufacturing a net cover of a field emission display device with a quadrupole structure, which uses a laminating device to press the coating and combines the lithographic etching process to replace the existing net. Plate printing can avoid the collapse problem of the second through hole and the third through hole caused by the first through hole of the convergence electrode layer, and the conduction problem of the & convergence electrode layer and the gate layer to improve the manufacturing yield of the mesh cover . To achieve the above object, the present invention uses a metal conductive plate to form a convergent electrode layer, and uses a lamination process to make an insulating layer and fill the first through hole of the convergent electrode layer. Then, a lithography or printing process is used to make the gate electrode layer Then, a through process is performed to remove and regenerate the originally filled through holes, and the second and third through holes L are etched at the corresponding through hole positions of the insulating layer corresponding to the convergent electrode layer and the gate layer. [Embodiment] First, please refer to the fourth figure. The first step is to apply glass glue or silicon dioxide to a flat surface with a non-contact S (free contact) coating device (61).

第8頁 1242386 五、發明說明（5) 面膠膜（71)上’形成一均勻厚度之塗層（72)，該塗層（72) 可使用美國Dupond公司生產之DG〇〇1玻璃膠塗料。第二步係將一具複數第一透孔（731)之金屬導電板置於該塗層（72)上’該金屬導板即為收斂電極層（73 )，其係為一種膨脹係數與陰陽極基板近似的鐵鎳合金材料，可避免封I日寸因％脹差而異造成裂片。續以一壓合設備（62)壓合 (laminate) ’俾使前述塗層（72)之玻璃膠充分填塞於收斂電極層（73)之複數第一透孔（731 )内，即如第五圖所示。第二步係將第二步所完成之板體以低溫微烤後，移除膠膜（71)。乂第四步係於被移除膠膜（7 1 )之一側，再以非接觸式塗料裝置（6 1 )或以一滿版無圖騰之印刷方式，再塗覆或印製一層前述之塗層（72)，以形成絕緣層（74)，即如第六圖所示。第五步，實施第一燒結程序，使漿料固化成膜體。 •第六步係以網印或微影製程於前述膜體外側圖騰化製作閘極層（7 5 )’並使該閘極層（7 5 )之複數第三透孔（7 5 1 )正對應於收斂電極層（73)之第一透孔（731 )，該閘極層（75) 係為一種感光型銀膠，如美國Dupond公司之DC206，以黃光微影製作，並以低濃度之碳酸鈉水溶液做為顯像液。第七步係將上一步驟所完成之半成品再施以第二燒結，以使閘極層（7 5 )固著於絕緣層（7 4 )上，即如第七圖所示。第八步係於閘極層（7 5 )之外側與收斂電極層（7 3 )外側，分別以網印或微影製程圖騰化製作一保護層（7 6，7 7 )，該Page 8 1242386 V. Description of the invention (5) A uniform thickness coating (72) is formed on the adhesive film (71), and the coating (72) can use DG〇01 glass glue coating produced by Dupond Company in the United States. . The second step is to place a metal conductive plate with a plurality of first through holes (731) on the coating (72). The metal guide plate is a convergent electrode layer (73), which is an expansion coefficient and yin and yang. The electrode substrate is similar to the iron-nickel alloy material, which can avoid the occurrence of cracks due to the difference in% expansion of the seal. Continue to use a laminating device (62) to laminate (俾) to fully fill the glass glue of the aforementioned coating (72) in the plurality of first through holes (731) of the convergent electrode layer (73), that is, as in the fifth As shown. The second step is to bake the plate completed in the second step at low temperature, and then remove the adhesive film (71).乂 The fourth step is on one side of the removed adhesive film (7 1), and then a non-contact coating device (6 1) or a full version without totem printing is used to coat or print a layer of the aforementioned Coating (72) to form an insulating layer (74), as shown in the sixth figure. The fifth step is to implement the first sintering procedure to solidify the slurry into a film. • The sixth step is to use a screen printing or lithography process to totemize the gate layer (7 5) 'on the outside of the membrane body and make the third through hole (7 5 1) of the gate layer (7 5) positive. Corresponding to the first through hole (731) of the convergent electrode layer (73), the gate layer (75) is a photosensitive silver glue, such as DC206 from Dupond Company in the United States, made of yellow light lithography, and a low concentration of carbonic acid An aqueous sodium solution was used as a developing solution. The seventh step is to apply the second sintering to the semi-finished product completed in the previous step, so that the gate layer (7 5) is fixed on the insulating layer (7 4), as shown in the seventh figure. The eighth step is based on the outside of the gate layer (7 5) and the outside of the convergent electrode layer (7 3), and a protective layer (7 6, 7 7) is produced by totemization using screen printing or lithography process.

第9頁 1242386 五、發明說明（6) 二保護層（7 6，7 7 )之複數透孔（7 6 1，7 7 1 )係分別對應收斂電極層（73)之第一透孔（731)與閘極層（75)之第三透孔 (7 5 1 )，該保護層（7 6，7 7 )之設置係為配合蝕刻製程，以移除第一透孔（7 3 1 )内之填充物（玻璃膠），及形成絕緣層 (74)之第二透孔。該保護層係採用一般電鍍業習用之負型光阻乾膜（dry film with negative type photoresist) ’以低濃度之碳酸鈉水溶液進行顯影，即如第八圖所示者0 第九步係以蝕刻製程移除收斂電極層（7 3)之第一透孔 (731)内之填充物（玻璃膠），並將絕緣層對應於該第一透孔（731)處之玻璃膠蝕刻形成第二透孔（741)，以使收斂電極層（73)之第一透孔（731)、絕緣層（74)之第二透孔 (741)與閘極層（75)之第三透孔（751)對應形成一連續相通之透孔，，即如第九圖所示者。本步驟中係採用一種低度之硝酸以進行姓刻。第十步係剝離前述之保護層（76，77)，係採用一種低濃度之氫氧化鈉水溶液以剝除保護層（75)，剝離保護層一 (76，77)後即完成網罩之製作，如第十圖所示者。曰 ·本發明所製造之網罩’彳克服並滿足收斂電極層 :求；可完全解決間極銀膠攤流至收斂電極層所路’或玻璃膠阻塞透孔之問題。 ^ 明惟3 ΐ所述者’不過為本發明之較佳實施例之舉例說 ’非用以侷限本發明之專利範圍，其他利用本發明^Page 9 1242386 V. Description of the invention (6) The plurality of through-holes (7 6 1, 7 7 1) of the two protective layers (7 6, 7 7) correspond to the first through-holes (731) of the convergent electrode layer (73), respectively. ) And the third through hole (7 5 1) of the gate layer (75), the protective layer (76, 7 7) is set to cooperate with the etching process to remove the inside of the first through hole (7 3 1) A filler (glass glue), and a second through hole forming an insulating layer (74). The protective layer is developed by using a dry film with negative type photoresist commonly used in the general electroplating industry to develop with a low concentration sodium carbonate aqueous solution, that is, as shown in the eighth figure. The ninth step is etching. The process removes the filler (glass glue) in the first through hole (731) of the convergent electrode layer (73), and etches the glass glue at the insulating layer corresponding to the first through hole (731) to form a second through hole. Hole (741) so that the first through hole (731) of the convergent electrode layer (73), the second through hole (741) of the insulating layer (74), and the third through hole (751) of the gate layer (75) Correspondingly, a continuous communication hole is formed, as shown in the ninth figure. In this step, a low level of nitric acid is used for the last name engraving. The tenth step is to peel off the aforementioned protective layer (76, 77). A low-concentration sodium hydroxide aqueous solution is used to peel off the protective layer (75). After the protective layer (76, 77) is peeled off, the production of the net cover is completed. , As shown in the tenth figure. Said that the net cover manufactured by the present invention ′ 彳 overcomes and satisfies the convergence electrode layer: seeking; it can completely solve the problem that the galvanic silver glue spreads to the convergence electrode layer ’or the glass glue blocks the through holes. ^ Ming Wei 3 ΐ mentioned above is just an example of a preferred embodiment of the present invention ′ is not intended to limit the patent scope of the present invention, other uses of the present invention ^

1242386 五、發明說明（7) 作精神所為之任何等效變換，均應倶屬本發明之專利範圍。 ilia 第11頁 1242386 圖式簡單說明 [ 圖式簡單說明 ] 第 — 圖習知二極結構之場發射顯示器之局部剖視圖。第二圖習知四極結構之場發射顯示器之局部剖視圖。第三圖習知四極結構之場發射顯示器之另一種網罩局部剖視圖（第四圖本發明之第一步驟示意圖〇第五圖本發明之第二步驟示意圖〇第六圖本發明之第四步驟示意圖〇第七圖本發明之第七步驟示意圖〇第八圖本發明之第八步驟示意圖〇第九圖本發明之第九步驟示意圖〇第十圖本發明之第十步驟示意圖〇【元件代表符號】習知部份 10… 陽極板 11· · · 陽極基板 12. · · 陽極導電層 13· · · 螢光粉體層 14· · · 支撐器 20· · · 陰極板 21… 陰極基板 22… 陰極導電層 23… 電子發射源層 24. · · 介電層 25… 閘極層 30· · · 陽極板 31… 陽極基板 32· · · 陽極導電層 33… 螢光粉體層 34· · · 支撐器1242386 V. Description of the invention (7) Any equivalent transformation made by the spirit should fall within the patent scope of the present invention. ilia Page 11 1242386 Schematic description [Schematic description] Section-Figure A partial cross-sectional view of a field emission display of a conventional two-pole structure. The second figure is a partial cross-sectional view of a field emission display of a conventional quadrupole structure. The third figure is another partial cross-sectional view of a conventional field emission display with a quadrupole structure (the fourth figure is a schematic diagram of the first step of the present invention. The fifth figure is the second step of the present invention. The sixth figure is the fourth step of the present invention. Schematic diagram VII Schematic diagram of the seventh step of the present invention 〇 Schematic diagram of the eighth step of the invention 〇 Schematic diagram of the ninth step of the invention 〇 Tenth diagram of the tenth step of the invention 〇 [Element symbol ] Known part 10 ... Anode plate 11 ... Anode substrate 12. Anode conductive layer 13 A fluorescent powder layer 14 A support 20 A cathode plate 21 A cathode substrate 22 A cathode Conductive layer 23 ... Electron emission source layer 24. Dielectric layer 25 ... Gate layer 30 ... Anode plate 31 ... Anode substrate 32 ... Anode conductive layer 33 ... Fluorescent powder layer 34 ... Support

第12頁 1242386Page 12 1242386

第13頁圖式簡單說明 40. ..陰極板 41.·· 陰極基板 42. ..陰極導電層 43··. 電子發射源層 44· ..阻隔壁 5… 網罩 51· ..收斂電極層 52… 絕緣層 53. ..閘極層 54· · · 透孔 511， ...第一透孔 521，· · .第二透孔 531， ...第三透孔發明部份 61.. .塗料裝置 62· · · 壓合設備 71.. .膠膜 72· · · 塗層 73· · .收斂電極層 731· · · 第一透孔Schematic illustration on page 13 40. Cathode plate 41 .. Cathode substrate 42. Cathode conductive layer 43. Electron emission source layer 44 .. Barrier wall 5 ... Mesh cover 51 .. Convergent electrode Layer 52 ... Insulating layer 53 ... Gate layer 54 ... Through hole 511, ... First through hole 521, ... Second through hole 531, ... Third through hole invention 61. . Coating device 62 · · · Laminating equipment 71. · Adhesive film 72 · · · Coating 73 · ·. Convergent electrode layer 731 · · · First through hole

Claims

1242386

1 · A method for manufacturing a net cover of a quadrupole field emission display, the net cover is placed between a cathode substrate and an anode substrate, and has a three-layer structure such as a convergent electrode layer, an insulating layer, and a gate layer. The method includes ·· a. The soft insulating material is coated on a flat adhesive film to form a coating. b. A metal conductive plate with a plurality of first through holes is placed on the coating 7 and pressed (1 ami nate). Metal conductive plate, so that the insulating material of the aforementioned coating is packed in the first through hole of the metal conductive plate, that is, the metal conductive plate is used as the convergent electrode layer; '' c. The plate body completed in step b is baked After baking, remove the adhesive film; d. Lay a layer of the same coating as step a on one side of the removed adhesive film to form an insulating layer; e. Perform a sintering process to solidify the slurry into a film; f · A gate layer is provided on the outside of the foregoing membrane body, and the plurality of third through holes of the gate layer correspond to the first through holes of the metal conductive plate, and the gate layer is a photosensitive metal material; g · Apply the second sintering to the semi-finished product completed in step f to fix the gate layer On the insulating layer; eh · Make a layer on the outer side of the gate layer and the outer side of the convergent electrode layer, and the plurality of through holes of the two protective layers respectively correspond to the second through hole of the convergent electrode layer and the first of the gate layer. Three through-holes; i. Remove the filler in the first through-hole of the convergent electrode layer by an etching process, and etch the insulating glass glue corresponding to the first through-hole to form a second through-hole to make the convergent electrode layer The first through hole of the insulating layer, the second through hole of the insulating layer and the third through hole of the M electrode layer correspond to form a continuous communicating hole;

Page 14 1242386 6. Scope of patent application j. Stripping of the aforementioned protective layer 2. The soft insulating material in step a of the net as described in item 1 of the scope of patent application is glass glue 3. The described net glass adhesive is DG001 from DuPond Company in the United States. The insulation material in step a of the net as described in the first item of the patent application range is applied on the film in a non-contact manner (f position). 5. The insulating material covered by the mesh m on the adhesive film as described in item 丨 of the scope of patent application is a metal material similar to the metal conductive plate in step a of the mesh as described in item 1 of the patent scope. Li / Expansion 7 belongs to the category 6 of the patent scope, and the grid-type V electric plate is an iron-nickel alloy. 8 · As described in the patent application scope step b, the metal conductive plate, the category described in the category 9. The electric board should be used for pressing equipment in the first step c of the patent scope of the patent, and the netting for the low-temperature roasting. 1 〇 · If the scope of the patent application is applied, the coating # 4 Screen printing method described in item 1 Non-contact paint placement = layout for coating or printing. Door support in step f, item 1 The net punch T < gate layer is a method for manufacturing a mask by screen printing or lithography process, wherein the or silicon dioxide. A method for manufacturing a mask, wherein the glass glue coating. A method for manufacturing a mask, wherein the ree contact) A method for manufacturing a paint cover, wherein the steps have a uniform thickness. The manufacturing method of the cover is the same as that of the anode and the anode, wherein the substrate is near the manufacturing method of the cover, and the manufacturing method of the cover is pressed. Hood manufacturing method, Hood manufacturing method, or a full version without step, step, step, step, totem, step, step manufacturing method, totem production.

Page 15 1242386 VI. Scope of Patent Application 1 2. The method of manufacturing a net cover as described in item 1 of the scope of patent application, wherein the gate layer in step f is a photosensitive silver glue. 1 3. The method for manufacturing a net cover as described in item 12 of the scope of patent application, wherein the photosensitive silver glue is DC206 of Dupond Company in the United States. 14. The method for manufacturing a net cover according to item 13 of the scope of the patent application, wherein the photosensitive silver glue is made of yellow light lithography, and a low-concentration sodium carbonate aqueous solution is used as a developing solution. 1 5. The method for manufacturing a net cover according to item 1 of the scope of patent application, wherein the protective layer in step h is produced by screen printing or lithography totemization. 16. The method for manufacturing a net cover according to item 1 of the scope of patent application, wherein the protective layer in step h is a dry film with negative type photoresist, and is performed with a low concentration sodium carbonate aqueous solution. development. 1 7. The method for manufacturing a net cover according to item 1 of the scope of the patent application, wherein the etching in step h is performed using a low concentration of nitric acid. 1 8. The method for manufacturing a net cover according to item 1 of the scope of patent application, wherein step j is to use a low-concentration sodium hydroxide aqueous solution to remove the protective layer.

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