TWI238081B - Plasma generator and plasma coupling pipe therefor - Google Patents

Plasma generator and plasma coupling pipe therefor Download PDF

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Publication number
TWI238081B
TWI238081B TW093136076A TW93136076A TWI238081B TW I238081 B TWI238081 B TW I238081B TW 093136076 A TW093136076 A TW 093136076A TW 93136076 A TW93136076 A TW 93136076A TW I238081 B TWI238081 B TW I238081B
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Taiwan
Prior art keywords
electrode
dielectric
plasma
item
plasma generating
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TW093136076A
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Chinese (zh)
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TW200526314A (en
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Myung-Suk Kim
Kyoung-Ae You
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Leewoo Smartech Co Ltd
Myung-Suk Kim
Kyoung-Ae You
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Priority claimed from KR1020040051608A external-priority patent/KR100704160B1/en
Application filed by Leewoo Smartech Co Ltd, Myung-Suk Kim, Kyoung-Ae You filed Critical Leewoo Smartech Co Ltd
Publication of TW200526314A publication Critical patent/TW200526314A/en
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Publication of TWI238081B publication Critical patent/TWI238081B/en

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437Multilayer systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Disclosed are a plasma generator and a plasma coupling pipe for coupling the plasma generator to another pipe, and more particularly a plasma generator for applying a high power supply voltage while a fluid flows therein, thus activating predetermined matter present in the fluid, and a plasma coupling pipe for coupling the plasma generator to a general pipe. In the plasma generator, a first dielectric is formed in a plate shape. First and second electrodes are formed on front and rear surfaces of the first dielectric, respectively. A plurality of fluid vent-holes pass through the first dielectric and the first and second electrodes. The first electrode is coupled to a power supply voltage and the second electrode is coupled to a ground so that the first and second electrodes operate.

Description

1238081 九、發明說明: 【發明所屬之技術領域】 本發明提供一種等離子體產生裝置及其利用該等離子體産生 裝置連接管體的等離子體產生連接管,具體在流體流動過程中, 利用連接高壓電源啟動流體内一些物質的等離子體產生裝置及其 利用該等離子體産生裝置連接一般管體的等離子體產生連^接管f 【先前技術】 爲了提尚産品精確度以及防止產品表面被污染,在半導體、 液晶顯示器(LCD)、等離子體顯示板(pDP)、有機電子發先 品等生產設備上使用去離子水(DIW:Dei〇nizedWa㈣。(Μ 但去離子水中仍存在微生物(細菌)及細小的微粒(partid 貝(有機或無機雜質)等,在去離子水進人生產制⑽管體入口設置 ,遽裝置(Filter·) ’對去料水進行猶。即便用過餘置進行過 i粒ΐί猶—些大的微粒雜質,無法顧各種微生物及細小的 卻目献置的微生物_在管壁上A量繁殖,用於冷 产,ϊΐΐίί備上的去離子水線(DI Water Line)妨礙冷卻水暢 ΐΐϊ到有效的冷卻作用,對生産設備產生負面影響。 備ΐ離子水線畴賴生物及_。上述清洗工作 污染等嚴重問題。工㈣有告工作人M健康,甚至可能引起環境 間、^^=、\及^僅在上赴纽備躺,而且在洗手 業畜牧業等所有用水領域引起了嚴重問題。1238081 IX. Description of the invention: [Technical field to which the invention belongs] The present invention provides a plasma generating device and a plasma generating connecting pipe using the plasma generating device to connect a pipe body. Specifically, in a fluid flow process, a high-voltage power source is connected. A plasma generating device for starting some substances in a fluid and a plasma generating connection using the plasma generating device to connect a general pipe body [Previous technology] In order to improve the accuracy of the product and prevent the surface of the product from being contaminated, Deionized water (DIW: DeionizedWa㈣) is used in production equipment such as liquid crystal displays (LCD), plasma display panels (pDP), and organic electronics. (M) However, microorganisms (bacteria) and fine particles are still present in the deionized water. (Partid shellfish (organic or inorganic impurities), etc., are installed at the inlet of the deionized water into the production pipe body, and the filter device (Filter ·) is used to remove the raw material water. — Some large particulate impurities, can not take care of various microorganisms and small but dedicated microorganisms_ multiply A quantity on the tube wall, use Cold production, the DI Water Line on the equipment prevents the cooling water from flowing smoothly to effective cooling, and has a negative impact on the production equipment. The preparation of the ionic waterline depends on biological and environmental pollution. The above-mentioned cleaning pollution Serious problems. Workers have reported that workers are healthy, and may even cause environmental problems, ^^ =, \, and ^ only go to New Zealand to lie down, and cause serious problems in all areas of water use such as hand washing and animal husbandry.

L 1238081 【發明内容】 的、在於提供—種等離子體産生裝置,使流向-定 的μ體通過,啟動該流體内的特定物質。 體=Ϊ供:Τ等離子體産生連接管’其内部 〇、子體産生凌置,亚與一般流體流過的管體相連。 的第供的等離子體産生裝置包括板狀 極二.μ 又置在上述弟一電介質正面及背面的電極一及電 體:::電介質及電極一、電極二形成多個的流 述电極連接電源,上述電極二接地驅動。 二電介ΐ明子體產生裝置,其特徵是包括板狀的第 備-個以上:電ί:工礙入到某-面的至少具 電介nH二在械上與上述苐二電介質相對應的第三 -個以上^:^四、二電介質内部並欽到某—面的至少具備 -流特成體通過孔,但不與上述第 括第=接ί發ϊίΐϊ,等離子體產生連接管,其特徵是包 連連 = ,體,主要包括與上述管體—相 二’ f : 册生裝置的第 極-及電極置在上述第—電介質正面及背面的電 體孔述1介質及電極—、電極二的多個流 體產生裝置。屯°賴包源,上述電極二接地驅動的等離子 J 口丨通過*體的官體二相連的管體三連接件 1 1238081 以及可以放置等離子體產生裝置 ’ · 體,主要包括與上述管體三相 ^ ^,一第四連接 及可放置等離子體產生裝置的管體四連接件以 具備-個以上的内部錢人到某-面的至少 ㊁電介質;設置在上:第三電質=的第 質特定部位至少有-個上述第二電介 與上述第部位形成的第二流體通過孔,但不 上述電極=和電極四鱗_定輯的同時, 生^述電極三連接電源’而上述電極四接地驅動的等離子體產 本發明還提供-種產生等離子體 ^板狀的金屬板和纏燒上述電極僅露出上二ί;:::: ,其工藝包括: 質成型階段; 底部電介質模子裏的電介 電介f上形成薄的金屬板的階段; 模子ΐΞίϊϊίβΐ;;”模子相對_部電介質 4) g逑頂部電介質與上述底部電介質頂面接觸以及衝壓的階 5) 燃燒粘合的頂部及底部電介質的鍛燒階段; 本,明^供的-種産生等離子體電極製作方法工藝還包括· 1) 按一疋形狀成型並鍛燒底部電介質的階段; 2) =述底部電介質減躺形狀成錢i燒前電介質的 1238081 t ί ί个3,介質上面形成金屬板的階段; A田質放在上述粘結物質上面的階段. ϋ 1=㈣姆喊度對上述卿、底部電介質以及全 屬板、枯結物質進行加熱枯結的階段;㈣貝以及至 口另本提供—種等離子體清洗裝置,包括-端帶有外入 離子體産生穿置.你於μ +、亚荨離子化通過上述機殼的流體的等 向=述機殼的流體提^=^置與流體入口之間’ 八中,上述等離子體產生裝置包括: 稍定拓i少H個產生#離子體雜層疊而成,並鱗各電極之門 規疋距f ’讓流體糊通過各電極之間的電極件轉各⑨極之間 源件/、述極件連接,並向上述電極件提供高電壓電流的電 形或多角形體清洗裝置,包括截面呈圓 二。;向上述電極件提供源 角形 極交^ 詳細:本發明將結合附圖對本發明的“ 生氫和氧氣以及0H自由基雜子體加逮的電子發生衝突,産 4 i 1238081 氧化ϋί氧ί自”能清除水中的無機物、有機物,還能 菌作鐵、叙、石申、水銀等重金屬,臭氧對各種細菌起殺 生產&備等去離子水線(DI Water Line)上設置 離子11處理灯,不魏清除絲子水巾^= 短箄番清除產^表社的無機物、錢物,並氧化除去 物微清洗效果;用臭氧殺滅各種細菌,可= 中的子體處_置產生的臭氧濃度不到咖瓜,水 中的大倾原成水巾自綠的氧氣,不影響工作人員健康。 ^政府、機鮮位的公用洗手間使用本發 染的咖職、 逖月匕即=洗手間消母及清洗工作所需的費用。 、 加ii用if上使用本發日种料離子體處_置也可以得到 ,效^ ’尤其在淨身器(Bidet)上使用該設備,不僅能有效清除 !9.9%f上的_,還能徹底清除有機、無機雜質°。 大型建築的空調冷卻塔内部水線Une)設置本發明中 季使用認isu以殺滅各種細菌、清除雜質,可預防夏 士發明的等離子體産生裝置産生的臭氧濃度很低,可用於餐 龐或豕庭洗手間以及-般家用水(如清洗蔬菜、海鮮等農水産物: 可以fe鬆殺滅各種細菌。 若在畜牧業(如農場用水或清潔水線)使用本發明的等離子體 産生震置,可以抑制引發家畜疾病的各種細菌繁歹直,有效防止 病擴散。 本發明中的等離子體産生装置的優點是可以製作成不同大 小’使1大小(直徑)不同的各種管子;通過本發明中的等離子體産 生^接管可輕鬆連接現有供水管和等離子體産生裝置,設置費用 不高,可使用一般的交流電壓,裝置結構簡單。 、 1238081 卽清洗效果 Ϊί;!lb : 【實施方式】 、實施例一> 明 百先對本發明中的等離子體產生裝置結構及其作用進行說 以及明實施例一中的等離子體産生裝置⑴結構斜視圖 第-ΐ==Γ、’、、ί?,明實施例一中的等離子體產生裝置⑴包括 、()/爪體孔(20)、電極一及電極二(3〇、4〇)。 第一電介質⑽如圖1所示呈板狀爲佳。第—電介質⑽獅 可以進行精密加工。換 == 陶是t工成度,使正面呈圓形或矩形等多種 弟-電介質(10)厚度等於電極之間的間距,與等離 ,的特點有著密切關聯。在本發明中,應該把第_電介^ ^ 成0·1〜3mm厚度,使電極之間保持一定間距。 、σ 上述第一電介質(1〇)以及電極一、電極二(3〇、4 ίϊίΐ—litf ^'L(20), 上儘量形成多個流體孔⑽更爲有效。此夕卜,一 m二電貝=) 體孔⑽的部位應避免形成電極。在第V電流 後,===電介f 1°電極上穿孔從而形成‘孔(# ^上述第一電介質(10)兩側各帶有電極—(3〇)及带 個正面及背峨 極二(3。、,彡成綠是騎(CGatmg)法。料,忒:二】 1238081 ^屬加工成薄膜後再進行餘的方法 ⑽上打穿流體孔(權再形成電^,避 内壁f,金屬,從猶止電極-⑽和電極二(4。)二舰(2〇) 此外’電極厂(30)及電極二(4〇)應具備良好的導電性, 以及採 用T以加工成薄板的金屬,尤其適合選 朽-全: (Ag)、鈦(Ti)、鶴(w)、不錄鋼(sus)、銦㈣中^音:(^銀 件^好ί不二電介質(1〇)接觸的電極(4〇)外露表面ί置it蔓 獅的方^成 以且夜路在々,L體中被乳化0電極保讜株m上 乙烯(TeflGn)、氨基甲酸乙 雜枓纟其疋玻璃屬於電介質,最適合做電極保護件。 盥雷戶ί述’具有上述結構的等離子體産生裝置⑴的電極一⑽ - 接在電極二(40)連接電源後啓動。在電極 期間Ϊ 壓^特定流體經過流體孔⑽ 箄籬神。 ^放電〇Β〇把BaiTier此吐零)産生 個 體矣工過:體的中央部位或排放流體的管體底部層疊 ΪΪΪ以上的上述實施例—中的等離子體產生裝置⑴,在流體通 過k體孔(20)的過程中産生等離子體。 k <實施例二: 圖2是本發明實施例二中的等離子體產生裝置(1师吉構 ‘圖。 Ϊ發明貫施例二中的等離子體產生裝置(100)如圖2所示,由 斜視圖 本 電介質(11G)、第三電介質⑽)、電極三(13G)、電極四(14=) …如’上述第二電介質(110)爲薄板狀,正面呈圓形或 巨形。建礅第二電介質(12〇)與第二電介質(11〇)正面形狀一樣,爲 1238081 三電介質(120)爲細陶瓷,建 薄板狀。此時的第二電介質(110)或第三 議按一定厚度加工所有部位。 如圖2所示第二電介質(11〇)表面中,與寿 的表面規定部位設置一個電極三(13〇)。此時, ’與第三電介質(120)相對 :匕時,電極三(130)嵌入到 第-電介質⑽)絲,可内載至第—電介質(n_^外露: %極肷入電介質表面是指電極附著在電介質表面的同時,其 一部分或全部嵌入到電介質的狀態,僅露某一面。 …、建4在電極三(130)外露面設置一個電極保護件(未圖示)。換句 =兄’在雜二(130)表面塗覆特定物質,防止電極與流體直接接 ?,P方止電極:皮。電極賴件可以採財璃、環氧樹脂 (p^xy)、聚四氟乙稀(Tefl〇n)、氨基甲酸乙醋伽出継)等材料, 尤其疋,璃屬於電介質,最適合做電極保護件。 建議把電極四(140)内載或鑲嵌至第三電介質(12〇)上, it銀?g)、鈦(Τ0、鎢(W)、不銹鋼阔、鉬_㈣ 與電極^(130)相同,並在外露面上設置一個電極保護件。’ 此日寸,電極三(130)以及電極四(140)可以選用白金(pt)、金 種材料’從而保暗& 植. I —.L 1238081 [Summary of the invention] It is to provide a plasma generating device that allows a flow-determined μ-body to pass and start a specific substance in the fluid. Body = Ϊ supply: T plasma generating connection tube ′, the inside of the body, the daughter body is placed, and the sub body is connected to the pipe body through which the general fluid flows. The first plasma generating device provided includes a plate-like electrode. Μ and an electrode and an electric body which are placed on the front and back of the above-mentioned dielectric. The dielectric and electrode one and electrode two form a plurality of rheological electrode connections. Power source, the above two electrodes are driven by ground. A two-dielectric scorpion generation device, which is characterized by including a plate-shaped first-more than one: electricity: at least a dielectric nH2 that interferes with a certain surface is mechanically corresponding to the above-mentioned second dielectric The third or more ^: ^ Four or two dielectrics and at least have a -flow special body through hole in a certain surface, but not connected with the above-mentioned first and second = connection, the plasma generating connection tube, which The feature is that the connection is connected to the body, which mainly includes the body and phase of the above-mentioned tube body. F: The first pole of the register device and the electrode are placed on the front and back of the dielectric body. Two multiple fluid generating devices. According to the source, the above-mentioned electrode two is ground-driven plasma J port 丨 the tube body three connector 1 1238081 connected with the body body two of the body and the plasma generating device can be placed. The body mainly includes the tube body three Phase ^ ^, a fourth connection and four connectors of the tube body where the plasma generating device can be placed to have at least 钱 dielectrics of more than one internal money person to a certain surface; set on: the third electric mass = the first At least one second fluid passing hole formed by the above-mentioned second dielectric and the above-mentioned first part in a specific part of the mass, but not the above-mentioned electrode = and the electrode four scales_determining the electrode, the three electrodes are connected to a power source, and the electrode is Four-ground-driven plasma production The present invention also provides a kind of plasma-generating plate-shaped metal plate and sintering the above-mentioned electrodes to expose only the upper two; ::::, the process of which includes: a quality forming stage; a bottom dielectric mold The stage of forming a thin metal plate on the dielectric dielectric f; the mold ΐΞίΐ β ;;; "the mold is opposite to the part of the dielectric 4) g 逑 the top dielectric is in contact with the top surface of the bottom dielectric and the stamped stage 5) combustion bonding The calcination stage of the top and bottom dielectrics; the present invention provides a method for producing a plasma electrode. The process further includes: 1) forming and calcining the bottom dielectric according to a shape; 2) = the bottom dielectric reduction The shape of the dielectric is 1238081 t before the dielectric is burnt. 3, the stage where the metal plate is formed on the medium; the stage where the field is placed on the above-mentioned bonding substance. It belongs to the stage of heating and drying of the dead material; the shellfish and the mouth provide another kind of plasma cleaning device, which includes a-end with an external ion to generate penetration. You are in the μ +, subnet ion The isotropy of the fluid passing through the above-mentioned casing = between the fluid lifting of the casing and the fluid inlet. The above-mentioned plasma generating device includes: The gate gauge distance f 'of each electrode allows the fluid paste to pass through the electrode pieces between the electrodes to the source / pole connection between the electrodes, and provides high voltage current to the electrode pieces. Electric or polygonal body cleaning device, bag The cross-section is round. The source electrode is provided with the above-mentioned electrode element. Details: The present invention will conflict with the "electron trapped by hydrogen and oxygen and 0H free radical protons of the present invention in combination with the drawings, producing 4 i 1238081 Oxidation can remove inorganic and organic substances in water, and it can also be used as heavy metals such as iron, Syria, Shishen, and mercury. Ozone can kill and kill various bacteria on the DI Water Line. Set the ion 11 treatment lamp, remove the silk towels ^ = short time to remove the inorganic and money products of the production company, and oxidize the removal of the micro-cleaning effect; use ozone to kill various bacteria, can = the daughter body The concentration of ozone produced by the treatment is less than that of the gourd, and the large pour of water into the green towel is from the green oxygen, which does not affect the health of the staff. ^ The public toilets of the government and the machine station use the cost of the cafeteria and the diarrhea, which is the cost of the toilet and the cleaning work. The addition of ii using the hair ion seed material on the if can also be obtained, and the effect ^ 'especially when using the device on the bidet (Bidet), not only can effectively remove the _ on 9.9% f, but also Can completely remove organic and inorganic impurities. The water line inside the air-conditioning cooling tower of a large building is set in the present invention. It is used in the middle season to kill various bacteria and remove impurities, which can prevent the concentration of ozone generated by the plasma generation device invented by Xiashi is very low. Wu Ting toilet and general household water (such as cleaning vegetables, seafood and other agricultural and aquatic products: it can be used to kill various bacteria. If the plasma of the present invention is used in the animal husbandry (such as farm water or clean water line) to generate shock, you can It suppresses the proliferation of various bacteria that cause diseases in livestock, and effectively prevents the spread of the disease. The plasma generating device in the present invention has the advantage that it can be made into various tubes with different sizes so that 1 size (diameter) is different; through the plasma in the present invention The body generator can be easily connected to the existing water supply pipe and the plasma generating device, the installation cost is not high, the general AC voltage can be used, and the device structure is simple., 1238081 卽 cleaning effectΪ;! Lb: [Embodiment], Embodiment 1 > Ming Baixian explained the structure and function of the plasma generating device in the present invention and the first embodiment The structure of the plasma generating device 斜-斜 == Γ, ',, ί ?, the plasma generating device in the first embodiment includes, () / claw body hole (20), electrode one and electrode two ( 3〇, 4〇). The first dielectric 第一 is preferably plate-shaped as shown in Figure 1. The first—dielectric ⑽ Lion can be precision-machined. Change == pottery is t workability, so that the front surface is round or rectangular, etc. The thickness of the various dielectrics (10) is equal to the distance between the electrodes, which is closely related to the characteristics of the plasma. In the present invention, the _dielectric ^^ should be formed to a thickness of 0.1 to 3 mm, so that between the electrodes Keep a certain distance. Σ It is more effective to form as many fluid holes as possible on the first dielectric (10) and the first and second electrodes (30, 4 ίϊίΐ—litf ^ 'L (20)). The electrode of the body hole ⑽ should be prevented from forming electrodes. After the Vth current, === dielectric f 1 ° electrode is perforated to form a 'hole (# ^ The above first dielectric (10) two Each side is provided with an electrode— (30), and a front and back E pole II (3. ,, 彡 成 绿 is riding (CGatmg) method. Material, 忒: 二] 1238081 ^ is processed into thin Then proceed to Yu's method, pierce the fluid hole (right to form electricity again, avoid the inner wall f, metal, and stop the electrode-⑽ and electrode II (4.) Second ship (20)) In addition, the 'electrode factory (30 ) And electrode two (40) should have good electrical conductivity, and use T to process metal into thin plates, especially suitable for selection-all: (Ag), titanium (Ti), crane (w), non-recording steel ( sus), Indium ^ sound: (^ Silver pieces ^ Good 不 The electrode (4〇) in contact with the dielectric (1〇) is exposed on the exposed surface, and the night road is 々, L body Ethylene (TeflGn) and ethyl carbamate on the emulsified 0-electrode protection strain m are made of dielectric and are most suitable for electrode protection. The electrode holder of the minehouse ′ has the above-mentioned structure of the electrode 1 of the plasma generating device ⑽-connected to the electrode two (40) and connected to start. During the electrode, a specific fluid is pressed through the fluid hole. ^ Discharge 〇〇〇 BaiTier spit it out) Generated individual work: the central part of the body or the bottom of the tube body that discharges the fluid is stacked (the plasma generating device in the above embodiment-above), when the fluid passes through the body hole (20) The plasma is generated during the process. k < Second embodiment: Fig. 2 is a plasma generation device (a division of a gyrostructure) in the second embodiment of the present invention. (2) The plasma generation device (100) in the second embodiment of the present invention is shown in Fig. 2, From a perspective view, the dielectric (11G), the third dielectric (i), the electrode three (13G), the electrode four (14 =), such as the above-mentioned second dielectric (110) is a thin plate, and the front surface is round or giant. Jianye's second dielectric (120) has the same shape as the front surface of the second dielectric (120), and the dielectric (120) is a thin ceramic, and the thin dielectric is a thin plate. At this time, the second dielectric (110) or the third dielectric is used to process all parts with a certain thickness. As shown in FIG. 2, one electrode three (13) is provided on a predetermined portion of the surface of the second dielectric (11). At this time, 'as opposed to the third dielectric (120): when the electrode three (130) is embedded in the -dielectric ⑽) wire, it can be loaded into the -dielectric (n_ ^ exposed:% pole into the dielectric surface means While the electrode is attached to the surface of the dielectric, a part or all of it is embedded in the dielectric, and only one surface is exposed. ..., Jian 4 Set an electrode protector (not shown) on the exposed surface of electrode three (130). In other words = brother 'Coated with a specific substance on the surface of Miscellaneous (130) to prevent the electrode from directly contacting the fluid. P-side electrode: skin. The electrode can be made of glass, epoxy resin (p ^ xy), polytetrafluoroethylene. (TeflOn), urethane, and other materials, in particular, glass is a dielectric, and is most suitable for electrode protection. It is suggested that the electrode four (140) be loaded or embedded in the third dielectric (12), it silver? g), titanium (TO, tungsten (W), stainless steel, and molybdenum) are the same as the electrode ^ (130), and an electrode protector is provided on the exposed surface. 'At this time, electrode three (130) and electrode four ( 140) Platinum (pt) and gold materials can be selected to protect the dark & plant. I —.

13 1238081 相同的材料,從而提高距離保持件和第二電介質 命人 質(130)的钻結力。 一屯;丨 、、如圖2所示,在第二電介質⑽)的規定部位上設計第一流體 ,過孔(160),而第一流體通過孔(16〇)可在沒有電極三(13〇)的部位 設置2個以上。此外,在第三電介質(12〇)的規定部位設計第二流 體通過孔(170),具體設計在沒有電極四(14〇)的部位並與第一流體 通過孔(160)不重疊。其理由是爲了讓經過第一流體通過孔(16&進 ^的流體通過不同位置上的第二流體通過孔(17〇)流出,保障經過 等離子體產生裝置(100)的流體通過電極三(13〇)以及電極四(14〇) 之間的空隙。流體在經過電極三(130)及電極四(1明)期間,外露在 介質阻擋放電産生的等離子體之中。 / 一在等離子體産生裝置(100)上設置距離保持件(150)時,如圖2 所不’建議在距離保持件(150)上設計第三流體通過孔(18〇),對第 了流體通過孔(160)和第二流體通過孔(17〇)起連接作用。通過第一 流體通過孔(160)的流體經過第三流體通過孔(18〇)流向第二流體通 $孔(170)並外流’自然也會通過電極王⑴⑺及電極四(⑽)之間的 工^ P永0 <實施例三> 圖3是本發明實施例一中的等離子體産生裝置(1)連接流體管 (210、220)結構的分解斜視圖。 如圖3所示,實施例一中的等離子體産生裝置(1)通過等離子 體產士連接管與管體一、二(21〇、22〇)相連。此時,等離子體産生 連接管(200)的實施例一如圖3所示,由第一連接體(23〇)及第二連 接體(240)構成。 、在結構上,第一連接體(230)與内部通過流體的管體一(210)相 連,包括與管體一(210)相連的管體一連接件(232)以及可以裝置等 離^體產生裝置(1)的第一裝置位置件(234)。第一裝置位置件(234) 與第二裝置位置件末端相結合,保障第一連接體(23⑺和第二連接 1今 1238081 體:f壯’等離子體産生裝置多個層疊。多個層 可以得到更有效的清洗效果。 相連,、^括盘二i—連接體(24〇)與管體一(21〇)相對的管體二(22〇) =産ίϊί;^,2:·)相連的管體二連接件以及可以裝置等離 生衣置⑴的弟二裝置位置 件在結構上可與第―妓位置件(234)相結合 弟一衣置位置 此外’建議上述第一連接體(23〇)、第連 徒過官體一(210)的流體'經過大的截面積部位, ί經過管體—、二麟速,從而延長通過電極-⑽ 時間,換句話說是爲了延長流體露在等離子體 <實施例四> 的姓發3實?例二中的轉子體産生裝置_連接管體 圖了斜見圖’圖5是等離子體産生裝置與管體的連接結賊面13 1238081 The same material, which increases the knotting force of the distance holder and the second dielectric hostage (130). One, as shown in FIG. 2, a first fluid is designed on a prescribed portion of the second dielectric ⑽), a via (160), and the first fluid passes through the hole (16) without the electrode three (13). 〇) Two or more sites are provided. In addition, a second fluid passage hole (170) is designed in a prescribed portion of the third dielectric (120), and specifically, it is designed in a place where there is no electrode four (14) and does not overlap the first fluid passage hole (160). The reason is to allow the fluid passing through the first fluid passage hole (16 &) to flow out through the second fluid passage hole (17) at a different position to ensure that the fluid passing through the plasma generating device (100) passes through the electrode three (13). 〇) and electrode four (14). The fluid is exposed to the plasma generated by the dielectric barrier discharge during the passage of electrode three (130) and electrode four (1ming). When the distance maintaining member (150) is provided on the (100), as shown in FIG. 2, it is recommended to design a third fluid passing hole (18) on the distance retaining member (150), and the first fluid passing hole (160) and the first The two fluids pass through the hole (17) to play a connecting role. The fluid passing through the first fluid through the hole (160) flows through the third fluid through the hole (18) to the second fluid through the hole (170) and flows out naturally. Work between the electrode king ⑴⑺ and the electrode four (⑽) ^ P Yong 0 < Embodiment 3 > Fig. 3 is a structure of a plasma generating device (1) connected to a fluid tube (210, 220) in Embodiment 1 of the present invention An exploded perspective view of the plasma generator. As shown in FIG. 3, the plasma generating apparatus (1) The midwife connecting pipe is connected to the first and second pipes (21 and 22). At this time, the first embodiment of the plasma generating connecting pipe (200) is shown in FIG. 3, and the first connecting body (23) And the second connecting body (240). In structure, the first connecting body (230) is connected with the pipe body (210) through the fluid inside, including a pipe body (210) connected to the pipe body (210) (232) and the first device position member (234) that can install the plasma generating device (1). The first device position member (234) is combined with the end of the second device position member to ensure the first connecting body (23⑺) And the second connection 1 to 1238081 body: multiple layers of the plasma generating device are stacked. A plurality of layers can obtain a more effective cleaning effect. Connected, including the plate two i-connecting body (24〇) and the tube body one (21〇) The opposite pipe body (22〇) = production ίϊί; ^, 2: :) The pipe body two connecting piece and the second device position piece which can be set apart from the raw clothes can be structurally connected with The first-prostitute position piece (234) is combined with the younger one's clothes position. In addition, it is recommended that the fluid of the first connection body (23) and the second disciple pass official body one (210) through a large The cross-sectional area part passes through the tube body and the speed of the two electrodes, thereby prolonging the time of passing the electrode-⑽, in other words, to prolong the exposure of the fluid to the plasma < Example 4 > Rotor body generating device _ connected to the tube body is shown at an angle. Figure 5 is the connection between the plasma generating device and the tube body.

^圖4所不’實施例二中的等離子體產生裝置_)通過等離 接管與管體相連,實施例二中的等離子體產生裝置_ 生賴管的實齡^巾的轉子體産生連接管 如圖4所示,實施例二中的等離子體産生連接管(3〇〇)由第三 連接體(MO)以及第四連接體(32〇)組成。 在結構上,第三連接體(310)與内部通過流體的管體三(未圖示) 相連,包括與管體三相連的管體三連接件(312)以及可以裝 子體産生裝置(1GG)的第三裝置位置件(314)。實施例二巾的等 體産生管(300)上層疊著一個或兩個以上的等離子體産生裝置 (100) ° 19 1238081 在、、、。構上,弟四連接體(320)與管體三相對的管體四(未圖示 相連,包括與管體四相連的管體四連接件(322)以及可以 ^ 子體産生裝置(100)的第四裝置位置件(324)。 、、 在結構山’第三連接體⑽)和第四連接體(no)應相結合,如 圖4所示’本實施财的第三裝置位置件⑽)邊緣上按—定距離 設計了多個突出的結合凸件⑽),而在第四裝置位置件( 设计了與第三裝置位置件(314)邊緣相吻合的多個結合凹件(32 , 使結合凸件(316)和結合凹件(326)相嗜合。 另外,實施例二中的等離子體產生連接管(3〇〇)相結合的橫截 面,應大於管體三以及管體四的截面積,讓通過等離子體産生連 接管的流體放慢流速,保障經過等離子體產生空間的時間充足。 如圖4及圖6所示,實施例二中的等離子體產生連接管截面 呈圓形或矩形。如果截面呈圓形,與管體形狀相同,其優點是容 易結合或製作;若截面呈矩形,把等離子體産生連接管(3〇〇)固定 在牆壁上,擴大它與牆面的接觸面積,使之更穩定地固定在牆壁 上。 土 實施例二的等離子體産生連接管(3〇〇)上的等離子體産生裝置 (100)與連接電源的電線以及接地電線相連,此時與電源連接^電 線和接地電線如圖4所示,建議按不同方向引出,原則上避免^ 觸。即連接電源的電線(與電極三相結合)向右引出,接地電線 (與電極四相結合)向左引出,取消了接觸的可能性。 <實施例五> 圖6或圖7是實施例二的等離子體産生連接管(3〇〇a)呈圓形 的分解斜視圖及截面圖。 如圖6及圖7所示,等離子體産生連接管(3〇〇a)呈圓形時,其 結構及各構成要素的功能與呈矩形時一樣。 <實施例六> 1238081 下面對本發明的等離子體產生裝置及等離 的産生等離子體電極實施例進行說明。 體π冼衣置使用 本實施例的產生等離子體電極(41〇)如圖8、 = (414)内部設置導電性金屬板(412) ^ =體= 端採取導電性金屬板端件(他)外露:生^3 = 件(412a)連接電源’在產生轉子體電極連接高壓 ^ ^質(414)側面規定部位設計—定深度的 ^板端〜电 露在外。在電介質(414)側面設計凹件使干^f,1仙) 如圖8所示端件⑷邱受端件⑽ a 外 力影響受損麟路。 ”丨貝财,防止文外 置或結構如上所述,當等離子體產生裝 裝 產生等離子體電極_)時,如圖1〇所 =層豐兩個以上的電極’讓電極之間保持—定距^ ϊ極m。産生等離子體電極層疊時,相鄰的電極如圖w 所不,建*金屬板端件外露側面按反方向層疊。口 的,才能使 幾種Λ疊式電極(多個電極層疊結構)的製造方法。 種η牛:n二Λ形成陶兗和金胁後,同時成型的方法。這 巧巧ΐ77、低溫成型法(LTCC)和高溫成型法(htcc)兩種。 斑型的電極和距離保持件之間設置枯結物體即玻 附著的方法。建議,此時使用蚊的夾具陶) 固疋夕個電極和距離保持件,對其進行加熱附著。 用按一定間距平行設置多個電極的形狀一定的模 ;Γ 即準備一個按一定間距插入並固定電極邊緣的模 子,把電極插入到模子上層疊。 μ ίίίίίί電極和距離保持件邊緣形成多個貫穿孔,並向貫 牙孔插入驗4結合件擰緊,從神積電極的方法。^ The plasma generating device in the second embodiment shown in FIG. 4) is connected to the tube body through a plasmon connection tube, and the plasma generating device in the second embodiment _ the actual age of the raw tube ^ the rotor body of the towel generates a connecting tube As shown in FIG. 4, the plasma generating connecting pipe (300) in the second embodiment is composed of a third connecting body (MO) and a fourth connecting body (32). Structurally, the third connecting body (310) is connected with the pipe body three (not shown) through the fluid, including the pipe body three connecting piece (312) connected to the pipe body three and the sub-body generating device (1GG) ) Third device position member (314). One or two or more plasma generating devices (100) are stacked on the plasma generating tube (300) of the second embodiment. Structurally, the fourth body connector (320) and the third body tube (not shown in the figure are connected, including the fourth body tube connector (322) connected to the fourth body tube and the child body generating device (100) The fourth device position piece (324). The third connection body (no) in the structure mountain should be combined with the fourth connection body (no), as shown in FIG. ) On the edge, a plurality of protruding coupling projections (设计) are designed at a fixed distance, and on the fourth device positioning member (a plurality of coupling recesses (32, The coupling convex piece (316) and the coupling concave piece (326) are affixed. In addition, the cross section of the combination of the plasma generating connection pipe (300) in the second embodiment should be larger than the pipe body three and the pipe body four. The cross-sectional area allows the fluid passing through the plasma generating connection pipe to slow down and ensure sufficient time to pass through the plasma generating space. As shown in FIGS. 4 and 6, the cross section of the plasma generating connection pipe in the second embodiment is circular. Or rectangular. If the cross section is round and the same shape as the pipe body, its advantage is easy to combine or make; If the cross section is rectangular, the plasma generating connecting pipe (300) is fixed on the wall, and the contact area between the plasma generating connecting pipe and the wall surface is enlarged, so that the plasma generating connecting pipe is more stably fixed on the wall. The plasma generating device (100) on (300) is connected to the power supply wire and the ground wire. At this time, it is connected to the power source. ^ The wire and the ground wire are shown in Figure 4. It is recommended to lead in different directions, and avoid it in principle. Contact. That is, the wire connected to the power source (combined with the three-phase electrode) is drawn to the right, and the ground wire (combined with the electrode four) is led to the left, eliminating the possibility of contact. ≪ Embodiment 5 > Figure 6 or Figure 7 It is an exploded perspective view and a sectional view of the plasma generating connection pipe (300a) of the second embodiment in a circle. As shown in Figs. 6 and 7, the plasma generating connection pipe (300a) is a circle In this case, the structure and the functions of the constituent elements are the same as in the case of a rectangular shape. ≪ Embodiment 6 > 1238081 The embodiment of the plasma generating device and the plasma generating plasma electrode of the present invention will be described below. Use this implementation The plasma-generating electrode (41〇) is shown in Figure 8. = (414) A conductive metal plate (412) is set inside. ^ = Body = the end is made of conductive metal plate. The end piece (he) is exposed: ^ 3 = piece (412a). ) Connect the power source 'at the specified position on the side where the rotor body electrode is connected to the high voltage ^ ^ (414) side-a certain depth ^ plate end ~ electrical exposure. Design a recess on the side of the dielectric (414) to dry ^ f, 1 cent) As shown in Figure 8, the end piece ⑷ Qiu is affected by the end piece 外 a external force to damage the damaged road. "丨 Beijing, to prevent the external or structure of the text as described above, when the plasma generating device generates a plasma electrode _), As shown in Fig. 10, the two or more electrodes of the layer 'allow the electrodes to maintain a fixed distance ^ ϊ m. When the plasma electrodes are stacked, the adjacent electrodes are stacked in the opposite direction as shown in Figure w. In order to make several kinds of Λ stacked electrodes (multiple electrode laminated structure) manufacturing methods. A method for forming 牛牛: n 成型 Λ at the same time after forming Tao Yan and Jin Xi. This coincides with 77, low temperature molding (LTCC) and high temperature molding (htcc). A method of attaching a dead object, i.e., glass, between a spot-shaped electrode and a distance holder. It is recommended to use mosquito fixtures at this time to fix the electrodes and distance holders and heat them. A mold having a certain shape is arranged in parallel with a plurality of electrodes at a certain interval; Γ is to prepare a mold that inserts and fixes the edges of the electrodes at a certain interval, and inserts the electrodes on the mold to be stacked. μ ίίίί The electrode and the distance from the edge of the holder to form a plurality of through-holes, and inserted into the through-hole 4 test pieces to tighten, from the God product electrode method.

II

Il238〇81 〈實施例七&gt; =將詳細·上述産生_子體電極的製造方法。 t施例講$的産生等離子體電極的製造方法分爲兩種。 带入方電介質硬化之前,把金屬板插入到頂部、底部 、ΐ二h ί mT頁部、底部電介質的方法。圖12是有關上述方 法的產生等離子體電極製造方法工序圖。 把到—定形狀的底部電介質模子裏成型底 = 電介質呈蚊形狀後,在上面放金屬板。金屬 的其中的兩種。一是先把薄 邻雨入所卜丨質上面’對金屬板施壓把電極板散入到底 個是把導電性物質按規定形狀塗覆在 上面ϋ曰仏上&quot;成至屬板’並施加壓力使之嵌入到底部電介質Il238〇81 <Embodiment 7> = Details · The above-mentioned method for producing the daughter electrode. In the embodiment, the manufacturing method of the plasma generating electrode is divided into two types. The method of inserting the metal plate into the top, bottom, and second page of the dielectric material before the hardening of the lead-in dielectric is hardened. Fig. 12 is a flow chart of a method for manufacturing a plasma generating electrode in the above method. Put the bottom-shaped dielectric mold into a fixed shape. Bottom = After the dielectric is in the shape of a mosquito, place a metal plate on it. Two of the metals. The first is to put thin rain on the surface of the substrate and apply pressure to the metal plate to spread the electrode plate to the bottom. The conductive material is coated on it in a prescribed shape. Pressure makes it embedded in the bottom dielectric

Screen)® t(Patte^: 闰t f貝V電性物質可以採用銀漿料等。 疋有關說明金屬板(43。)某—實施例的斜視圖。 斗户f ΞΓ所不,金屬板中央有多個貫穿孔(432)。在金屬板上-的過程中,使部分底部絕 緣面積,使金屬板和底部絕緣體結合得更加 方法成型财電介質,再相同的 部電介質擠壓成型後,再用高 。這種方法的優點是形成電極後,頂部、底 貝元:結合成-個部件,其齡面魄結力強。 第二個方法是在硬化的電介質之間插 是有關本方法的產生等離子體電極製造方法③的方法。圖π 頂部同時成型 再製造頂部電介質,但頂部電介質在形狀上 (Ξ 1238081 $ 對應成型,這樣才能使頂部電介質和底部時而 -致、外觀整齊,不破壞枯合部位。 貝十占、、、。_拈合面 其次在底部電介質上面形成金屬板。金 種,本實施例主要講述其中兩種。—是先 在上述金屬板以及底部電介f上面形成槪物質,使用 更化的頂部、底部電介魏合牢固'。此時, ~、、、D物貝祕祕要低於頂部、底部電介質魏醜 頂=、底部電介質’在鍛燒過程中用高於枯結物質溶融點^ ^仃加熱’使減物質完全滲透至電介f接觸面上锻於= 1丄,融點要低於卿、底㈣介質的舰點,才能在ΐ-Ξ Γ 3狀ίϊί:5鍛燒。在本實施例中把玻璃卿結: 、匕卜逖可以使用環氧樹脂(epoxy)等粘結物質。 “ 貝口丨展冲丨貝枯合。此時,粘結物質被熔融#、、灸 =頂部、底㈣介妹_各_裏,使獅、=== 由於頂部、底部電介f自身的炫融點過高,不受影塑, ΐϊίΓ逮sr在本階段中頂部、底部電介質或金屬“ 枯合Γ化’建4用夾具固定頂部、底部電介質以及金屬板後進行 雜工I面將對本發明使㈣電源件結構進行說明。該電源件向算 =產生連接管_、)以及等離子體產 4 =置_、700)電極供電。此時,電源件陶,忽:: 二」=1〇)、電源整流件(520)、變換件(530)、調壓件(54〇)構成。 量布j制項(510)通過微控制器’利用感測器測量流量中心的流 或机速,再利用測量值控制供氧裝置閥門;或者中斷電源Screen) ® t (Patte ^: 闰 tf) V electrical materials can use silver paste, etc. 疋 Description of the metal plate (43.)-an oblique view of an embodiment. What Doudou f ΞΓ does, the center of the metal plate has A plurality of through holes (432). During the process of the metal plate, part of the bottom insulation area is made, so that the metal plate and the bottom insulator are combined to form the dielectric, and then the same dielectric is extruded and then used to The advantage of this method is that after the electrode is formed, the top and bottom shells are combined into a single component, which has a strong age. The second method is to interpose between hardened dielectrics. This method is related to the generation of plasma. The method of manufacturing the body electrode ③. Figure π The top is simultaneously molded and then the top dielectric is manufactured, but the top dielectric is shaped (Ξ 1238081 $ corresponding to the molding, so that the top dielectric and the bottom are sometimes consistent, the appearance is neat, and it does not damage the coupling) The joint surface is followed by the formation of a metal plate on the bottom dielectric. The gold type, this embodiment mainly describes two of them.-First on the above metal plate and the bottom dielectric f The surface is formed of tritium material, and the top and bottom dielectrics are more firmly bonded. At this time, the secrets of ~ ,,, and D materials are lower than the top and bottom dielectrics. The medium use is higher than the melting point of the dead material ^ ^ 仃 heating 'to make the reduced material completely penetrate into the dielectric f contact surface forging at = 1 丄, the melting point must be lower than the ship's point of the Qing and bottom ㈣ medium, in order to ΐ- Γ Γ 3 状 ίϊί: 5 calcination. In this embodiment, the glass is cleared: The epoxy resin (epoxy) can be used as a bonding material. The bonding substance is melted # ,, moxibustion = top, bottom ㈣ 介 妹 _ 里 _ 里, so that lion, === because the top and bottom dielectric f itself is too high, not affected by shadow, sr In this stage, the top and bottom dielectrics or metals are used to fix the top and bottom dielectrics and metal plates with fixtures and then perform manual work. The structure of the power supply device of the present invention will be described. = Generating connection tube _,) and plasma generation 4 = set _, 700) electrode power supply. At this time, the power supply unit is composed of two power supply units: (10), a power rectifier (520), a conversion unit (530), and a voltage regulator (54). Measuring item j (510) uses a microcontroller to measure the flow or speed of the flow center with a sensor, and then uses the measured value to control the valve of the oxygen supply device; or interrupts the power supply

I 1238081 所有電源或者細可以進行賴 抓 壓’利用二:體和調節器 源轉換成控制用直流電源以及低壓等路’把父流電 岸電曰dtt二體、絕緣柵雙極電晶體、場效 ΪΓ哭電源轉換成交流電源,再利用線圈、 祕#件把頻率調整爲符合等離子體產 源。調壓件⑽)利用變壓器把低壓交流電源轉換成高壓交流電 心fii;本發明的電源件(5〇〇)上,把頻率爲6〇〜4_〇Ηζ、電 £ 380〜15,000V的電源連接到等離子體產生裝置(1、1〇〇)。 &lt;實施例八&gt; 下面將對本發明的等離子體清洗裝置某一實施例進行詳細說 明。圖15是本實施例中的等離子體清洗裝置結構截面圖。 本實施例中的等離子體清洗裝置(6〇〇)由機殼(61〇)、等離子體 産生裝置(620)、供氧裝置(630)構成。 士在結構上,可以把機殼(610)插入到流體流管的某一領域。機 殼(610)—端帶有流體入口(612),另一端有流體出口(614),、流體入 口和流體出口之間形成可以通過流體内部空間。在該内部办間裒 設置等離子體産生裝置(620)和供氧裝置(630)。内&amp;㈣ 首先把荨離子體産生裝置(620)設置在上述機殼(61〇)内部,對 經過機殼(61〇)的流體進行等離子體。建議等離子體産生裝置(62〇) 由電極件(622)和電源件(624)構成。電極件(622)至少由兩個産生等 肖隹子體電極層疊而成,各電極(622a、b、c、d、e)相隔一定距離層 疊’使流體通過電極之間的缝隙。然後把層疊的電極按正、負才^ 連接到電源上。此外,爲了使流體經過電極之間的縫隙,建議把 20 1238081 ^極件(622)安裝在機殼_)内部,使 壁行杜 ,㈣電連接,向電極件㈣提^广源件 (62〇ί=置㈣)設置在機殼(61_部的上述等離子體産生裝置 氧之間’向經過機殼(61〇)的流體提供氧氣。供 % Γί ϊΐ職殼畴,其作収式向流體提供 乳冗对乳泡產生件上設有多個細小 把氧氣排放到流體中。 孔忍孔 、、包产細小氣泡産生件(632)相連,其作用是向細小氣 二乳乳。供氧件(634)帶有一管體,通過該管體從外界 及入虱軋,官體中間設有一個調節氧氣流量的閥門(636)。 建議在本實施例的等離子體清洗裝置上設置一個氧氣回 。氧氣回收裝置_應設置在等離子體産生裝置(620)和J -出口(614)之間’其作肢回收通過機殼的流體中的剩餘氧氣, 並將回收的氧氣提供到供氧裝置(63〇)上。 建議在本實施例的等離子體清洗裝置(6〇〇)上設置一個測流件 (650) ’即在流體入口(612)周圍設置一個測流件,測量經過機殼的 流體速度。如果經過等離子體產生裝置(62〇)的流體流速過快,很 難對流體進行等離子化。因此,測流件的設置理由是測量流速, 保持適當的流體流量。 &lt;實施例九&gt; 圖15是本發明中的等離子體清洗裝置(7〇〇)的其他實施例結 構圖。在本實施例中,分開設置了等離子體産生裝置(72〇)和供氧 裝置(730)。因此,有時使用無供氧裝置僅設置了等離子體産生裝 置的等離子體清洗裝置,根據需要可增設供氧裝置,取得更有效 的清洗效果。 該方法的優點是可以根據需要選擇使用。 &lt;實施例十&gt; 2:1 1238081 下面將對等離子體清洗裝置的其他實干 體經過該空間。建議電介質採用陶瓷材料。、疋工的欠寺机 電極件(820、830)設置在該介電管(81〇)内部。該電極 、 83:)如,Π及圖18所示,正極(82〇)和 二:( 如圖17所不、有向介電管外凸出並與電源件連接的凸 、 832二上述正極的凸件㈣和負極凸件(83〇)最好 二 防止短路。 W 4 電極件(820、830)帶有-個可以提供電源的電源件。本實施 電二ίΐ件Ϊ供交流電。建議本實施例中的電源件如上 所述’由主控制項、電源整流件、變換件、調壓件構成。 ;^施例中的等離子體清洗裝置(_帶有—個保護件( 该巧遠如圖Π所示’圍繞上述介電管_)起保護作用,採 titil料=卜’建議保護件(840)兩侧設置與流體管連接的 1 财崎離子體清洗裝置(細)可輕鬆插入到 一般水官等供水管内。 4 &lt;實施例Η&gt; 本貫施例巾料軒齡洗裝置(_)如时關十的等離子 體清洗裝置(_) ’由介電管(_)、電極件(92〇、93〇卜電源 圖不)構成。 介電管(910)和電源件的結構與功能同實施例十的等離子體 洗裝置(_)介電管(⑽)及電源件大體相同,@此省略說明, 同的是本實施例中的電源件向電極件提供直流電源。 本實施例中的電極件(920、930)與實施例十不同。本實施例中 的電極件(92〇、93〇)不在介電管_)内部,而是附著在介電管⑽) 1238081 内壁上,即如圖19及圖20所示,介電管内壁帶有交替平行的正 極(920)和負極(930),電極之間保持一定距離。 正極(920)和負極(930)上各有一個向上述介電管(91凸 亚與電源件連接的凸件(922、932),上述正極的凸件(922)和負極凸 件(930)最好反方向凸出,可防止短路。 、 本實施例如同實施例十,介電管(91〇)外側帶有圍繞介 (910,保護作用的保護件(940),如圖19所示。建議在保護件( 兩侧.又置與流體官連接的結合件(942)。本實施例中的等離子體生 洗裝置(900)可輕鬆插入到一般水管等供水管内。 π 【圖式簡單說明】 部分=ί本發明實胁卜巾的等離子體產生裝置、輯斜視圖及 圖 圖2是本發明實施例二中的等離子體産生裝置結構分解斜視 丨圖3是本發明實施例—巾_離子體産生連接管結構分解斜 圖 視圖 4是本發明實細二巾的等離子财生連接管結構分解斜 截面ί。5是連接本發明實施例二中的雜子魅生連接管的結構 連接雜觀本㈣實蝴二巾的雜子體產生 接管面用圖其他形狀體現本發明實施例二中等離子體産生連 圖8^本發明實施例中產生等離子體電極結構圖。 圖9是本發明實施例中産生等離子體電極截面圖。 ===發明實補巾產生物?體電極層疊截面圖。 ,11疋有關本發明實施例中使用産生 某一實施例的斜視圖。 雜的至屬板 1238081 圖12是本發料―實施射産生轉子體電極的鱗方法工 圖13是本發明其他實施例中的産生等離子體電 工序圖。 、…,丨…工山驵电極的製造方法 =14是體現本發明使用的電源件構 円 圖。圖丨5是本發料-實補巾的轉子體綠^^構戴面 圖。圖π是本發明其他實施辦的轉子體清洗裝置結構截面 視圖圖17是本發明另—實施射的等離子體清洗妓結構分解斜 =18是圖17的等離子體清洗裝置截面圖。 視圖圖丨9是本發㈣—實施财轉軒贿洗裝置結構分解斜 圖2〇是圖I9的等離子體清洗裝置戴面圖。 【主要元件符號說明】 1 ··實施例一中的等離子體產生裝置 10 :第一電介質 20 :流體孔 30 ··電極一 40 ··電極二 100 ··實施例二中的等離子體産生裝置 110:第二電介質 1 120 ··第三電介質 130 ··電極三 140 ·電極四 150 ·_距離保持件 160 ··第一流體通過孔 170 ··第二流體通過孔 1238081 180 :第三流體通過孔 190 :陶瓷板 200 :實施例一中的等離子體產生連接管 210 :管體一 220 :管體二 230 :第一連接體 232 :管體一連接件 234 :第一裝置位置件 240 :第二連接體 300 :實施例二中的等離子體産生連接管 300a:等離子體産生連接管 310 ··第三連接體 312 :管體三連接件 314 ··第三裝置位置件 316 :結合凸件 320 :第四連接體 322 :管體四連接件 324 :第四裝置位置件 326 ··結合凹件 400 :產生等離子體電極 410 :等離子體電極 410a :電極 410b :電極 412 :導電性金屬板 412a :金屬板端件 414 :在電介質 420 :距離保持件 430 :金屬板 2^ 1238081 432 :貫穿孔 500 :電源件 510 :主控制項 520 :電源整流件 530 :變換件 540 :調壓件 600 :等離子體清洗裝置 610 :機殼 612 :流體入口 614 :流體出口 620 :等離子體産生裝置 622 ··電極件 622a,622b,622c,622d,622e :電極 624 ··電源件 630 :供氧裝置 632 :細小氣泡産生件 634 :供氧件 636 :調節氧氣流量的閥門 640 :氧氣回收裝置 650 :測流件 700 :等離子體清洗裝置 710 :機殼 720 :等離子體産生裝置 730 :供氧裝置 740 :氧氣回收裝置 750 :測流件 800 :等離子體清洗裝置 810 ··介電管 820 :電極 1238081 822 ··凸件 830 :電極 832 :凸件 840 :保護件 842 :結合件 900 :等離子體清洗裝置 910 :介電管 920 :電極 922 :凸件 930 ··電極 932 :凸件 940 :保護件 942 :結合件I 1238081 All power supply or fine can be pressed and pressed. 'Using two: body and regulator source is converted into control DC power supply and low-voltage equalizer.' Father power shore power is called dtt two body, insulated gate bipolar transistor, field The power source is converted into AC power, and then the frequency is adjusted to match the plasma source by the coil and the secret piece. Voltage regulator ⑽) The transformer converts low-voltage AC power into high-voltage AC core fii; the power supply (500) of the present invention is connected to a power source with a frequency of 60 ~ 4_〇Ηζ and an electric power of £ 380 ~ 15,000V. To the plasma generating device (1, 100). &lt; Embodiment 8 &gt; An embodiment of the plasma cleaning apparatus of the present invention will be described in detail below. FIG. 15 is a cross-sectional view showing the structure of a plasma cleaning apparatus in this embodiment. The plasma cleaning device (600) in this embodiment is composed of a casing (61), a plasma generating device (620), and an oxygen supply device (630). Structurally, the casing (610) can be inserted into a certain area of the fluid flow tube. Enclosure (610)-with fluid inlet (612) at one end and fluid outlet (614) at the other end, an internal space is formed between the fluid inlet and the fluid outlet through which fluid can pass. A plasma generating device (620) and an oxygen supply device (630) are installed in the internal office. Inside & ㈣ First, the net plasma generating device (620) is set inside the casing (61), and the fluid passing through the casing (61) is subjected to plasma. It is recommended that the plasma generating device (62) be composed of an electrode member (622) and a power source member (624). The electrode member (622) is formed by stacking at least two isochronous body electrodes, and each electrode (622a, b, c, d, e) is layered at a certain distance 'to allow fluid to pass through the gap between the electrodes. Then connect the stacked electrodes to the power supply with positive and negative ^. In addition, in order to allow the fluid to pass through the gap between the electrodes, it is recommended to install the 20 1238081 ^ pole piece (622) inside the housing _), so that the wall line is electrically connected, and the electrode piece is lifted ^ Guangyuan piece (62 〇ί = 置 ㈣) is provided between the casing (61_ of the above-mentioned plasma generating device oxygen 'to provide oxygen to the fluid passing through the casing (61〇). For% Γ ί the shell domain, its closing type The fluid supply milk is provided with a plurality of tiny bubbles for generating oxygen to the fluid on the milk bubble generating part. The holes, holes, and small bubble generating parts (632) are connected to each other, and their function is to suck milk to the small gas. Oxygen supplying part (634) A pipe body is provided through which the valve is used to regulate the oxygen flow rate from the outside and into the lice. It is recommended that an oxygen return be provided on the plasma cleaning device of this embodiment. Oxygen recovery device_ shall be placed between the plasma generating device (620) and the J-outlet (614) 'its limbs recover the remaining oxygen in the fluid passing through the casing, and provide the recovered oxygen to the oxygen supply device (63 〇)。 It is recommended that the plasma cleaning device (600) of this embodiment Place a flow measuring element (650) 'that is, set a flow measuring element around the fluid inlet (612) to measure the velocity of the fluid passing through the casing. If the velocity of the fluid passing through the plasma generating device (62) is too fast, it is difficult to adjust the velocity of the fluid. The fluid is plasmatized. Therefore, the reason for installing the flow meter is to measure the flow velocity and maintain an appropriate fluid flow rate. &Lt; Embodiment 9 &gt; Fig. 15 is another embodiment of the plasma cleaning apparatus (700) according to the present invention. Structure diagram. In this embodiment, a plasma generating device (72o) and an oxygen supply device (730) are separately provided. Therefore, a plasma cleaning device provided with only a plasma generating device may be used without an oxygen supply device. An oxygen supply device can be added as needed to achieve a more effective cleaning effect. The advantage of this method is that it can be selected and used as required. <Example 10> 2: 1 1238081 The other dry bodies of the plasma cleaning device will be passed through This space. The dielectric is recommended to be made of ceramic materials. The masonry's Oji machine electrode parts (820, 830) are arranged inside the dielectric tube (81〇). The electrodes, 83 :) are as shown in Figure Π and Figure 18, Positive electrode (82〇) and two: (as shown in FIG. 17, the protrusion protruding to the outside of the dielectric tube and connected to the power supply, 832, the above-mentioned positive projection ㈣ and negative projection (83) is the best two Prevent short circuit. The W 4 electrode pieces (820, 830) are provided with a power supply component that can provide power. This implementation uses two components to supply AC power. It is recommended that the power supply components in this embodiment be controlled by the main control items as described above. The power rectifier, converter, and voltage regulator are included. ^ The plasma cleaning device in the embodiment (_with a protective member (the Qiaoyuan is shown in Figure Π 'around the above-mentioned dielectric tube_) plays a protective role Titil material = bu 'suggested that the protective piece (840) should be equipped with a fluid pipe 1 on both sides of the Qisaki ion cleaning device (thin) can be easily inserted into water pipes such as general water officials. 4 &lt; Examples &gt; In the present embodiment, the towel material Xuanling washing device (_) is a plasma cleaning device (_) such as Shiguanshi, which is composed of a dielectric tube (_) and an electrode member (92, 93). Power diagram is not) constituted. The structure and function of the dielectric tube (910) and the power supply member are substantially the same as those of the plasma washing device (_), the dielectric tube (⑽), and the power supply member of the tenth embodiment, and the description is omitted here. The same is the same as in this embodiment. The power supply device provides DC power to the electrode device. The electrode pieces (920, 930) in this embodiment are different from the tenth embodiment. In this embodiment, the electrode pieces (92, 93) are not inside the dielectric tube _), but are attached to the dielectric tube ⑽) 1238081 on the inner wall, that is, as shown in FIG. 19 and FIG. 20, the inner wall of the dielectric tube There are alternately parallel positive electrodes (920) and negative electrodes (930), and a certain distance is maintained between the electrodes. Each of the positive electrode (920) and the negative electrode (930) has a convex piece (922, 932) connected to the above-mentioned dielectric tube (91 convex sub) and the power source, and the convex piece (922) of the positive electrode and the negative convex piece (930) It is better to project in the opposite direction to prevent short circuit. This embodiment is the same as the tenth embodiment, and the dielectric tube (91) is provided with a protective member (940) surrounding the dielectric (910) for protection, as shown in FIG. It is recommended that the protective member (on both sides. The coupling member (942) connected to the fluid officer is also provided. The plasma biological washing device (900) in this embodiment can be easily inserted into a water pipe such as a general water pipe. Π [Schematic description ] = = Plasma generating device, oblique view and figure of the actual towel of the present invention FIG. 2 is an exploded perspective view of the structure of the plasma generating apparatus in the second embodiment of the present invention 丨 FIG. 3 is an embodiment of the present invention—towel_ion Exploded oblique view of the structure of the connection tube produced by the body 4 is an exploded oblique section of the structure of the plasma wealth connection tube of the solid thin towel of the present invention. 5 is a structural connection view of the connection of the heterozygous charm connection tube in the second embodiment of the present invention. Miscellaneous bodies of the two towels of this butterfly are used to generate the takeover surface. Fig. 8 shows the structure of the plasma electrode in the embodiment of the present invention in the second embodiment of the invention. Fig. 9 is a sectional view of the plasma electrode in the embodiment of the present invention. Cross-sectional view of electrode stack., 11 疋 A perspective view of a certain embodiment of the present invention. Miscellaneous board 1238081 Figure 12 is the material-the scale method for generating a rotor body electrode is shown in Figure 13 is Diagram of the process of generating plasma electricity in other embodiments of the present invention....... Gongshan 驵 electrode manufacturing method = 14 is a structural diagram of a power supply device embodying the present invention. Green ^^ structure wearing surface view of the rotor body. Figure π is a cross-sectional view of the structure of the rotor body cleaning device of the other embodiment of the present invention. Figure 17 is another embodiment of the present invention. 17 is a sectional view of the plasma cleaning device. View 9-1 is an oblique view of the structure of the implementation of the Caizhuanxuan bridal cleaning device. Figure 20 is the wearing view of the plasma cleaning device in Figure I9. [Description of main component symbols] 1 ·· Implement The plasma generating device 10 in the first: the first dielectric 20: the fluid hole 30. The electrode one 40 The electrode two 100. The plasma generating device 110 in the second embodiment 110: the second dielectric 1 120. The third dielectric 130 · electrode three 140 · electrode four 150 · distance holder 160 · first fluid passage hole 170 · second fluid passage hole 1238081 180: third fluid passage hole 190: ceramic plate 200: in the first embodiment Plasma generating connecting pipe 210: pipe body 220: pipe body 230: first connecting body 232: pipe body one connecting member 234: first device position member 240: second connecting body 300: plasma in the second embodiment Generation connection pipe 300a: Plasma generation connection pipe 310. Third connection body 312: Tube body three connection member 314. Third device position member 316: Bonding convex member 320: Fourth connection body 322: Tube body four connection member. 324: the fourth device position member 326, the combined recess 400: the plasma electrode 410: the plasma electrode 410a: the electrode 410b: the electrode 412: the conductive metal plate 412a: the metal plate end piece 414: the dielectric 420: distance maintenance Piece 430: metal plate 2 ^ 123 8081 432: through-hole 500: power supply unit 510: main control item 520: power supply rectifier 530: conversion unit 540: pressure regulator 600: plasma cleaning device 610: housing 612: fluid inlet 614: fluid outlet 620: plasma Generating device 622 ·· Electrode parts 622a, 622b, 622c, 622d, 622e: Electrode 624 ·· Power supply member 630: Oxygen supply device 632: Fine bubble generating member 634: Oxygen supply member 636: Valve for regulating oxygen flow 640: Oxygen recovery Device 650: Current measuring device 700: Plasma cleaning device 710: Case 720: Plasma generating device 730: Oxygen supply device 740: Oxygen recovery device 750: Current measuring device 800: Plasma cleaning device 810 Dielectric tube 820 : Electrode 1238081 822 · convex member 830: electrode 832: convex member 840: protective member 842: coupling member 900: plasma cleaning device 910: dielectric tube 920: electrode 922: convex member 930 · · electrode 932: convex member 940 : Protective piece 942: Binding piece

Claims (1)

1238081 、申請專利範圍: •一種等離子體產生裝置,其特徵在於: 一個板狀的第一電介質; 、 ίϊίΐί極二Ξΐ上電介質的正面和背面; 二,體孔,貝牙上述弟—電介質以及電極―、一. 、电極一連接電源,上述電極二接地驅動。电- 2· $申,專利範圍第!項所述的等離子體 弟一電介質採用的陶兗(Ceramic)材料。生衣置其中上述 3.=申請專利範’ i項所述的轉子體產生裝置, 4· 5· 項至第4項的任意—撕述的等離子體 極保護件,一般設置:述j二::保護上述電極的電 範目ΐ5項所軸雜子體產生錢,其中上述 (Teflon) . -個其特徵在於: 到某=’·細上的電極三,設置在上述第二電介質内部並欲入 第a ^貝,在形狀上與上述第二電介質相對應,· 1238081 到某ft個以上的電極四’設置在上述第三電介質内部並歲入 以上==三=二電介質特定部位至少有—個 質特定部位形成第^體又f上f電極四的上述第三電介 叠; ¥—體通過孔,但不與上述第-麵通過孔重 上述電極三和電極四保持一定距離; 上述電極三連接電源,而上述電極四接地驅動。 上述^^申利範f第7項所述的等離子_生裝f,其中當 :本二或電極四嵌入到上述第二電介質或第三雷介所^一二 守,在電極外露表面覆蓋一個電極保護件。 貝〃 、、9·如申請專利範圍第7項所述的等離子體產生裝置,其中上 料極保射Μ用賴、魏樹脂(EpQxy)、細氟乙雜腿)、 氨基甲酸乙酯(Urethane)中的任意一種素材。 述兩ί. - ΐ 專利範圍第7項所述的等離子體產生裝置,其中上 “極二和電極四之間設有厚度的距離保持件。 11.如中請專利範圍第7項所述 述第二電介質及第三電介質採用的是陶究材、中上 ?專利乾圍第7項所述的等離子體産生裝置,其中上 述电極二及電極四可以選用白金(Pt)、金、^ (W)、不錄鋼(SUS)、鉬(Mo)中的任意一種材料: 1 &quot; 第-13·楚如範圍第1〇項所述的等離子體產生裝置,上述 弟一、弟二電;丨貝和距離保持件採用的是相同材料。 1238081 1 * &lt; t 14·如申請專利範圍第項所述的等離子體產生裝置,其中上 述距離保持件上設計一個第三流體通過孔,連接上述第一&amp;體通 過孔和第二流體通過孔。 、、=·如申請專利範圍第10項所述的等離子體産生裝置,其中上 述電極三和電極四之間的距離以及上述距離保持件的厚度爲 〇·1〜3mm 〇 16·二種等離子體産生連接管,其特徵在於·· 、第一連接體,主要包括與内部通過流體的管體一相連的管體 一連接$以及可以放置等離子體産生裝置的第一裝置位置件; 第二連接體,主要包括與上述管體一相對的管體二相連的管 體二連接件以及可以放置等離子體産生裝置的第二 以及等離子體産生裝置。 衣直诅置忏 上述等離子體産生裝置包括·· (板狀的第一電介質; (^別設置在上述第-電介質正面及背_電極—及電極二; (貝穿上述第一電介質及電極一、電極二的多 上述電極-與電源相連,上述電極二接地驅動。职 17.*如申請專利範圍第16項所述的等離子體産生連接管,豆中 於等離子體產生裝置的截面積要大 上離恤嫩管,其中 19· 種等離子體產生連接管,其特徵在於·· 連接體,主要包括與⑽通過流體的管體三相連的1 •二連接件以及可以放置轉讀纽裝置的第三裝置位置件; 3d i 1238081 一第四連接體,主要包括與上述管體三 管體四連接件以及可以放置等離子體產j 相連的 件; 版厓玍衣置的弟四裝置位置 以及等離子體産生裝置。 上述等離子體産生裝置包括·· 一個板狀的第二電介質; 到某一面 至少一個以上的電極三,設置在上 一而· 又1杜上迩弟—電介質内部並嵌入 第二電介質,在形狀上與上述第二電介 ,(至少一個以上的電極四,設置在上述第三電介質 到某 '一面, 、 質相對應; 内部並嵌入 以上ΐίίϊΐϊί極三的上述第二電介質特定部位至少有一個 ^特疋雜形成第二流體通過孔,但不與上述第—流體通g重 上述電極二和電極四保持一定距離; 上述電極二連接電源,而上述電極四接地驅動。 20二如巾請專纖圍第19項所述的轉子體産生連接管,盆中 ==四=體以及等離子體產生裝置截面積要大 21·+如^請專利範圍第19項所述的等離子體產生連接管, a按距離在第三*置位置件邊緣設計多個突出的結合凸 ί二而在細裝置位置件邊緣設計與*三裝置位置件邊緣相結合 的夕個結合凹件,使結合凸件和結合凹件相嚙合。 22·如申請專利範圍第19項所述的等離子體産生連接管,直中 上述等離子體産生連接管的各構成要素結合的橫戴面呈圓形Γ 1238081 上述等離子财錢鮮的其中 生運接s 電源件,向上述電極三提供電源。 上帛25項所述鱗離子體姓連接管,其中 彳’、 控制項、電源整流件、變換件、調壓(電壓)件構成。 25 ^ *t 電源。Λ、 σ電極二提供頻率60〜40,000Ηζ、電壓380〜15,000V的 上册蝴管,其中 産生㈣子體雜,其中上 ϋΐ1'如申請專利範圍第29項所述的産生等離子體電極,其中帝 保持2 個,在上述電極之間設置距離保持件,使上i電i 疊專的等離子體電極,層 1238081 i H赵轉子體電極製作方法 )人ΐ把陶土泥漿澆注到-定形峨部Tjlr ; 介質成型階段; 一包”貝Μ子内的電 ;)在亡述底部電介質上形成薄的金屬板的階段. )把陶土泥漿注人顺上述底 介質模子裏的頂部電介質成型階貝接子相對的頂部電 4) 讓上述頂部電介質與上魏;^介 的階段; ,电&quot;貝1貝面接觸以及衝壓 5) 燃燒附著的頂部以及底部電介質的锻燒階段。 法34其=:!L33有!=生等離蝴峨方 法述的產生等離子體電極製作方 a) 先把薄的金屬板放在上述底部電介質上面; b) 對上述金屬板施壓,使金屬板嵌入到電介質表面。 36. 如申請專利範圍第33項所述 法,其特徵是上述第二階段包括: 寺軒體包極製作方 a)t定形狀在上述底部電介質上面塗覆導電性物質形成金 ^對上述金屬板施壓,使金屬板嵌入到電介質表面。 37. =請專利顧第36項㈣的産生等離子體電極料方 ί質 是上述b)階段糊絲絹網圖案按—定形狀塗覆i電性 38. —種産生等離子體電極製作方法,其工藝包括·· 〇 按一定形狀成型並鍛燒底部電介質的階段; 1238081 電介 2)質的ϊί述底㈣介質相對應的形狀成型並鍛燒頂部 屬板的階段 2 25,介質上面形成金, 5) =上=$!:3電介質上面形成減物質的階段; 6) 用上舰糾 =貝放在上述招結物質上面的階段; ^入ifd物4的驗溫度對上述頂部、底部電介曾η 及金屬板、枯結物質進行加熱枯結的階段I底#心貝以 、去,9立圍$ 38 ’所述的產生等離子體電極梦作方 段。述3)階段把薄的金屬板放在上述底部電介質上面的階 40.如申請專利範圍帛3 上述3)·是按—定雜在上 電性物質形成金屬板的階段。 〜丨貝上面塗復導 I如申明專利範圍第4〇項所述的產生等離子體 法,其中上述物糊絲__按—定形狀塗覆導^生= 方 法,‘項所述的産生等離子體電極製作方 /、甲上述枯、纟口物貝的熔融點要大於上述電介質熔融點。 請專利範圍第42項所述的産生等離子體電極 法,〃、中上述粘結物質選用玻璃或環氧樹脂(eP〇Xy)。 、 請專纖圍第38項所述的産生等離子體電極製作方 ' 上述6)階段是在用夾具固定上述頂部、底部電介質八 屬板、粘結物質後進行操作的階段。 貝、至 45· —種等離子體清洗裝置, 1238081 通過體入口、另-端帶有流體出口,其内部形成 恐卜、财生裝置,設置在上述機殼内部規定部位,對通 過上述機殼的流體進行等離子化; 、 之 BB 裝置,設置在上述等離子體産生裝置與流體入 間,向通過上述機殼的流體提供氧氣。 上述等離子體產生裝置包括: 夂至4有^個產生等離子體電極層疊而成,並保持 口 + θ疋距離,讓流體順利地通過各電極之間的空隙; 壓電ί電源件’與上述電極件電連接,並向上述賴件提供高電 述Μ 料軒财洗裝置,其中上 形式====件,設踩上職_部,其作岐以氣泡 産餅=氣與上述細小氣泡産生件相連’並向上述細小氣泡 J·如,專利範圍第45項所述的等離子體清洗襄置 W有-個魏回收裝置’主要設置在上述子體産生带、= ί體ΪΙ之間,其作用是回收經過上述機殼的流體中的^餘^ 氣,並將回收的氧氣供給上述供氧裝置。 Τ的刃餘虱 48.如申請專利範圍g 45項所述的等離子體清洗t 是帶有-個測流件,主要設置在上述流體人口周 ς = 述機殼的流體速度。 列里、,、工過上 35 1238081 49.種寺離子體清洗裝置,主要包括: ,截面呈圓形或多角形; 包極件’ δ又置在上述;丨電管内部,正. —電源件,向上述電極件提供電源。貞U衡排列, 5〇.如申請專利範圍第49項所述的等離子俨、、主狀 述電介質採關紐料。 ㈣子體清洗裝置,其中上 的凸件,上述正極的凸件和負極凸件反方向凸^一源件連接 曰52.如申請專利範圍第卻項所述的等離子 疋上述電源件向電極件提供交流電源。 先裝X,、特被 53.如申請專利範圍第49項所述的等 疋上述介電料财上料鮮起偏其特被 是5S3獅賴雜子财錄i,其特徵 疋上这保濩件兩側帶有可與流體管連接的結合件。 55· —種等離子體清洗裝置,包括: 介電官,具有一定厚度,截面呈圓形或多角形; 一mt述介電管内部,正、負極交替平衡排列; 私源件,向上述電極件提供電源。 56·如,專利範圍f ”項所述的等離子體清洗裝置,其中其 連接ijn?上各帶有—個向上述介電管外凸*並與電源件 連接的凸件,上述正極的凸件和負極凸件反方向凸出。 子體清洗裝置,其中上 述::範:第:員所述的等離子體清洗裝置,其中上 側卞有―個圍繞上述介電管起保護作用的保護件。 59:=申請專利範圍第58項所述的等離子體清洗裝置,其特徵 地保護件兩側帶有可與流體管連接的結合件。1238081, patent application scope: • A plasma generating device, characterized by: a plate-shaped first dielectric; front and back of the dielectric on the pole; two, the body hole, the above-mentioned brother of the teeth-the dielectric and the electrode ― 、 1. The electrode 1 is connected to the power supply, and the above electrode 2 is driven by ground. Electricity-2 · $ applications, patent scope! The plasma material described in item 1 is a ceramic material. The clothing is provided with the rotor body generating device described in item 3. i of the above-mentioned patent application, any of items 4 · 5 · to item 4-a torn plasma protection element, and the general setting is as follows: : Electricity of the above-mentioned electrode to protect the above-mentioned five items of the progeny, among which (Teflon). One of them is characterized in that: the electrode 3 on a certain thin electrode is provided inside the second dielectric and is The first dielectric material corresponds to the second dielectric material in the shape, and 1238081 to a certain number of ft or more electrodes are provided inside the third dielectric material and are more than one year old == three = at least one specific part of the second dielectric material. The third dielectric stack of the third body and the f electrode four is formed at a specific part of the mass; the body through hole, but does not maintain a certain distance from the third electrode and the fourth electrode through the first surface through hole; the above electrode three A power source is connected, and the above electrodes are driven by four grounds. The above-mentioned plasma plasma _ equipment f described in item 7 of the above ^ Shenlifan f, wherein: when the second or electrode four is embedded in the second dielectric or the third lightning medium ^ one and two guards, and an exposed electrode is covered with an electrode Protective parts. Bei Jing, 9 · The plasma generating device as described in item 7 of the scope of the patent application, wherein the feeding electrode is made of Lai, Wei resin (EpQxy, fine fluoroethyl legs), urethane (Urethane ). Said two ί.-的 The plasma generating device described in item 7 of the patent scope, wherein a thickness-retaining member is provided between the upper pole 2 and the electrode 4. 11. As described in item 7 of the patent scope The second dielectric material and the third dielectric material are ceramic plasma generating devices described in item 7 of Zhongshang Patent, Zhongshang ?, where the electrode two and the electrode four can be selected from platinum (Pt), gold, ^ ( W), non-recording steel (SUS), molybdenum (Mo) any one of the materials: 1 &quot; No. -13 · Chu plasma generation device as described in the range of item 10, the above brother one, brother two electricity;丨 The same material is used for the bezel and the distance maintaining member. 1238081 1 * &lt; t 14 · The plasma generating device according to item 1 of the scope of patent application, wherein a third fluid passing hole is designed on the distance maintaining member to connect the above. The first &amp; body passage hole and the second fluid passage hole. The plasma generating device according to item 10 of the patent application scope, wherein the distance between the electrode three and the electrode four and the distance of the distance holder Thickness: 〇 · 1 ~ 3mm 〇16 · Two kinds The plasma generating connecting pipe is characterized by a first connecting body, which mainly includes a pipe body connected to a pipe body through which fluid passes inside, and a first device position member where a plasma generating device can be placed; second The connecting body mainly includes a pipe body two connecting piece connected to the pipe body two opposite to the pipe body one, and a second and a plasma generating device where a plasma generating device can be placed. The above-mentioned plasma generating device includes: · (Plate-like first dielectric; (^ Don't set on the front of the first dielectric and the back of the electrode-and electrode two; The above two electrodes are driven by ground. Job 17. * As described in the patent application scope No. 16 of the plasma generating connection tube, the cross-sectional area of the plasma generating device should be larger than the tender tube, of which 19 · plasma A connecting tube is produced, which is characterized by a connecting body, which mainly includes a one-two connecting piece connected to a pipe body three through which fluid passes through, and a transposition button 3d i 1238081 a fourth connecting body, mainly including the above-mentioned pipe body three pipe body four connecting piece and the piece which can be connected to the plasma production j; And a plasma generating device. The above plasma generating device includes: a plate-like second dielectric; at least one or more electrodes on a certain surface; The two dielectrics are in shape corresponding to the above-mentioned second dielectric, (at least one or more electrodes four are arranged on the side of the third dielectric to a certain side, and the quality is corresponding; the above-mentioned second dielectric specific for the above-mentioned three poles is embedded inside. There is at least one part mixed at the part to form a second fluid passage hole, but it does not keep a certain distance from the electrode two and the electrode four, the electrode two is connected to a power source, and the electrode four is driven to ground. 20 Second, the rotor body generates the connection pipe as described in item 19 of the special fiber enclosure, and the cross-sectional area of the body in the basin and the plasma generating device is larger than 21 · + as described in item 19 of the patent scope Plasma generating connecting tube, a designing a plurality of protruding joints on the edge of the third device position according to the distance, and a combination of recesses on the edge of the thin device position and the edge of the three device position, Engage the engaging convex member and the engaging concave member. 22. The plasma generating connection pipe according to item 19 of the scope of the patent application, the cross section of the combination of the constituent elements of the plasma generating connection pipe is circular Γ 1238081 The above-mentioned plasma money is fresh and healthy. s Power supply to supply power to the above electrode three. The connection tube of the squamous ion surname described in item 25 above, which is composed of 彳 ', a control item, a power rectifier, a conversion member, and a voltage regulating (voltage) member. 25 ^ * t power supply. The Λ and σ electrodes 2 provide the first volume butterfly tube with a frequency of 60 to 40,000Ηζ and a voltage of 380 to 15,000V, in which tritium is generated. Among them, the upper 1 ′ is a plasma electrode as described in item 29 of the patent application scope. Keep two, and set a distance holder between the above electrodes to make a plasma electrode on top of the electrical layer, the method of manufacturing the layer 1238081 i H Zhao rotor body electrode) people cast the clay mud to-shape Ebe Tjlr; Dielectric forming stage; a pack of "electricity in the shell";) the stage of forming a thin metal plate on the bottom dielectric.) Pouring clay mud into the top dielectric molding stage in the bottom dielectric mold above 4) The phase of the top dielectric and the upper dielectric; contact the surface and press 5) Burning the top and bottom dielectrics. Attachment of the method. Method 34 Its =:! L33 Yes! = Plasma electrode production method described in the method of living plasma a) First put a thin metal plate on the bottom dielectric; b) apply pressure to the metal plate to embed the metal plate on the dielectric surface 36. The method as described in item 33 of the scope of patent application, characterized in that the second stage includes: a) temple maker package a) t shape coating a conductive substance on the bottom dielectric to form gold ^ The metal plate is pressed to embed the metal plate on the surface of the dielectric. 37. = Please refer to item 36 of the patent for the generation of the plasma electrode material. The quality is the b) stage of the pasted silk screen pattern in a fixed shape. 38. A method for producing a plasma electrode, the process of which includes the stage of forming and calcining the bottom dielectric in a certain shape; 1238081 dielectric 2) forming and calcining the corresponding shape of the bottom dielectric The top plate belongs to stages 2 to 25, gold is formed on the medium, 5) = upper = $ !: 3 the stage of reducing the mass on the dielectric; 6) the stage of using the ship to put the shell above the knotted substance; The test temperature of ifd object 4 is to heat the top and bottom dielectrics, metal plates, and dead materials at the end of the dead phase. At the end of the heart, the plasma electrode is generated as described in $ 38. The dream section. Narrative 3) Stage put The step 40 where the thin metal plate is placed on the above bottom dielectric. For example, the scope of the patent application (3) The above 3) is the stage of forming a metal plate by adding a dopant to the electrified material. The plasma generating method according to item 40 of the patent scope, wherein the above-mentioned material paste wire is coated in a fixed shape and is used to produce the plasma electrode. The melting point of the shellfish is larger than the dielectric melting point. Please use the plasma electrode method described in item 42 of the patent. Please prepare the plasma electrode producer according to Item 38 of the special fiber enclosure. The above 6) stage is the stage where the top and bottom dielectric eight metal plates and the bonding material are fixed with a jig. A type of plasma cleaning device, 1238081 through the body inlet, the other end with a fluid outlet, the inside of which forms a horror, wealth generating device, which is provided at a specified position inside the casing, and The fluid is subjected to plasma; the BB device is provided between the plasma generating device and the fluid inlet, and supplies oxygen to the fluid passing through the casing. The above plasma generating device includes: 夂 to 4 ^ plasma generating electrodes are stacked, and the distance of the mouth + θ 疋 is maintained so that the fluid can smoothly pass through the gap between the electrodes; the piezoelectric power source component and the electrode The parts are electrically connected, and the above-mentioned parts are provided with a high-density material washing equipment. The upper form ==== pieces, set up step-by-step ministry, which is used to produce cakes with bubbles = gas and the above-mentioned small bubbles. The components are connected to the fine bubbles J. For example, the plasma cleaning device described in item 45 of the patent scope has a Wei recovery device, which is mainly provided between the above-mentioned daughter generation zone, = Ϊ 体 ΪΙ, which The function is to recover the remaining gas in the fluid passing through the casing, and supply the recovered oxygen to the oxygen supply device. T. Residual lice 48. The plasma cleaning method t described in item 45 of the scope of the application for patent is a flow measuring device, which is mainly set at the above fluid population cycle. Liri, Li, and Gong 35 35 1238081 49. The temple ion body cleaning device mainly includes:, the cross section is circular or polygonal; the pole piece 'δ is placed in the above; 丨 the interior of the tube, positive. — Power supply Power supply to the electrode member. Zhen U-Heng arrangement, 50. As described in the scope of the patent application No. 49 plasma, the main materials of the dielectric material used as the key material. The ladle body cleaning device, wherein the upper convex part, the positive convex part and the negative convex part are convex in the opposite direction. One source part is connected. 52. The plasma as described in the item of the scope of the patent application, the power source part is directed to the electrode part. Provide AC power. First install X, special cover 53. As described in item 49 of the scope of the patent application, the above dielectric material is not as good as the original material. The special cover is 5S3 Lion Lazy Miscellaneous Record i, which is characterized by this guarantee. The sides of the cymbal are provided with coupling parts which can be connected with the fluid pipe. 55 · —A plasma cleaning device, comprising: a dielectric officer having a certain thickness and a circular or polygonal cross-section; a mt-dielectric tube, the positive and negative electrodes are alternately balanced; Provide power. 56. The plasma cleaning device according to the item "patent range f", wherein each of the connections ijn? Is provided with a convex piece protruding outward from the above-mentioned dielectric tube * and connected to the power source piece, and the convex piece of the positive electrode And the negative electrode convex part protrude in the opposite direction. The sub-body cleaning device, in which the plasma cleaning device described in the above :: Fan: the first member, wherein the upper side is provided with a protective member surrounding the above-mentioned dielectric tube for protection. 59 : = The plasma cleaning device according to item 58 of the scope of application for patent, characterized in that both sides of the protective member are provided with coupling members that can be connected to the fluid pipe.
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US20240066161A1 (en) * 2021-08-09 2024-02-29 TellaPure, LLC Methods and apparatus for generating atmospheric pressure, low temperature plasma
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