TWI234205B - Thin film forming apparatus, film supplier, film cassette, transport mechanism, process device and transport method - Google Patents

Abstract

The present invention provides a compact thin film forming apparatus that is capable of efficiently forming a thin film onto a substrate adopting a sheet film, wherein within a process portion PP, a center robot 2 transports a sheet film F and/or a substrate W among a coating unit 3, a drying unit 4, a transfer printing unit 5 and a film-supplying unit 7, and a thin film is formed onto the substrate W adopting the sheet film F. As a result, forming a thin film by adopting the sheet film F is feasible without using an operator. In addition, the sheet film F is supplied to the process portion PP directly by disposing the film-supplying unit 7 onto the process portion PP, and whereby transportation efficiency of the sheet film F and throughput of the device are both capable of being enhanced.

Description

1234205 ”__Ά 92103759 w month / day ^ V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a thin film forming device that uses a sheet film to form a thin film on a substrate, and a film supply mechanism that can be used in the device. , Film storage g, conveying mechanism, processing device with a plurality of processing units, and conveying method. [Previous technology] In recent years, with the increase in the diameter of wafers used for manufacturing large-scale integrated circuits or the large area of liquid crystal panels, etc. In order to realize multilayer wiring, it is necessary to flatten the surface of the insulating film with high precision in the field of multilayer wiring technology in large-scale integrated circuit manufacturing technology. Therefore, in addition to the need for large area, 'the demand for the planarization technology of the surface when the film is formed is also increasing. In order to meet these needs, a film formation technology for forming a film on a substrate by a pressure transfer method has been proposed This thin film forming apparatus is, for example, the apparatus disclosed in Japanese Patent Laid-Open No. 2000-1 3 5 6 34 In this device, a thin film is formed on a substrate in the thin film formation sequence shown in Fig. 18. First, as shown in Fig. 18 (a), a substrate formed on a semiconductor wafer or a glass substrate for a liquid crystal panel is used. The electrode wiring 1 1 1 on the W surface is placed on the sample table so as to face upward. Here, the surface 1 1 2 on which the electrode wiring 1 1 1 is formed is a film forming surface on which a thin film is formed by the procedure described below. Next, as As shown in FIG. 18 (b), a film F having a silver edge film 1 2 1 formed on the surface is mounted on a transfer plate disposed opposite to the sample table. Here, the insulating film 1 2 1 is used The film is transferred to the substrate, and the insulating film 1 2 1 is opposite to the film formation surface 11 2 of the substrate W placed on the sample table.

314408 (revised version) .ptc

Page 6 Ο

Mlt 92103759 1234205 V. Description of the invention (2)-After moving to the transfer plate, the substrate W and the film F are brought into contact with each other, as shown by the arrows in i). Order power ..., to the board position to reach the predetermined temperature. In this way, 挟 i2i brings the sheet film F into close contact with the substrate w to form an adherend. ",", ",", "", And taking the thus-formed adherend from the film forming chamber and removing the sheet film F as shown in Fig. (C), the substrate W having the insulating film 1 2 1 formed thereon is obtained. [Summary of the Invention] (Problems to be Solved by the Invention) However, in order to use the above-mentioned device to form a thin plate An 1 vri-— _. Name it, and then use the substrate from the substrate as shown in Fig. 1 (8) !! !! To win, the film F before the transfer process should be used from the film ... to apply to two test stations, and the unused station should be used. In addition, after the transfer process, the transfer insulation film 121 of the device converts the substrate w and the sheet film F into a tightly sealed object (by taking it out, and the sheet film F is tightly bound by the peeling device) Although the film forming device is transported between the various devices to be peeled off. Such a situation in which the operator manually transports the film F or the substrate board becomes the main cause of reduced production efficiency, and the film supply or operation (maintaining · Handling ::: And expecting-the heat of an efficient film is created by heat dissipation: Ϊ ^: Some problems such as the adhesion of particles to the film or the reduction of the quality of the film occur, and it also causes the equipment to require a large floor area. Installation related problems exist. To solve these problems,

1234205 卞 Amendment No. 92103759 V. Explanation of the invention (3) Automation of membrane handling is indispensable ', but there is no operation technology suitable for this automation in the past. The present invention has been developed in view of the above-mentioned subject, and its first object is to provide a thin film forming apparatus that can efficiently form a thin film on a substrate using a sheet film. Furthermore, a second object of the present invention is to provide a film supply mechanism and a film storage unit capable of efficiently supplying a sheet film without using a person's work in a film forming apparatus for forming a film on a substrate using a sheet film. Furthermore, a third object of the present invention is to provide a transport mechanism and a transport method for a sheet or a sheet that can be used in a thin film forming apparatus to be formed on a substrate. M 4 (means to solve the problem) The thin film forming device of M is provided with: a substrate and a process section in the use of a sheet film; a indexing section for the substrate to the process section; The process section includes a film supply device for supplying a sheet film, and a coating device recognized by the film supply device. The film film and the index are formed in close contact with each other to form a seal to form a film. Transfer on the base; peeling device that peels off the film from the adherend to carry the film; transfer device between the coating device, the coating device, the transfer device, and the peeling device, and / or the substrate (patent application scope Item 1). The invention of the constitution is that the indexing unit supplies the substrates to the process unit in the same manner as the substrates, and the wafers are supplied from the film supply device provided in the process unit. In the process unit, the film and / or substrate is transported by Device

Page 8 IVI1 314408 (revised edition) · ptc 1234205 V. Description of the invention (4) Transfer between the coating device, transfer device, and peeling device to form a thin film on the substrate using a sheet film. That is, the film is transported to the coating device, and after the film is formed on the surface of the film, it is transported to the transfer device. In this transfer device, in addition to the sheet film, the substrate is also conveyed 'and the film is transferred to the substrate. Finally, the sheet film is peeled by a peeling device, and the film is formed on the substrate. As described above, in the present invention, a thin film can be formed without using a manual operation. Moreover, in the present invention, the film supply device is provided in the process section, and the film supply device is directly supplied to the process section, so the transportation efficiency is high and production can be improved.

Here, the arrangement layout of the film supply device, the coating device, the transfer device, and the peeling device in the process section may be arbitrary. For example, the above-mentioned processing devices (film supply device, coating device, transfer device, and The peeling device) is arranged around the conveying device (item 2 of the scope of the patent application), and the processing device can be arranged along the conveying path of the conveying device on both sides or one side of the conveying path (the scope of the patent application is 3, 4) item). In this arrangement layout, when the above-mentioned processing device is arranged around the conveying device, it is not necessary to provide a conveying path 'and the size of the clothes can be further reduced. A substrate holding portion is provided in the conveying device for transferring the substrate. The holding portion includes an arm body, a row #, an upper side holding mechanism, and a main-upper side holding base.

The lower side support mechanism is used to hold the substrate and hold the substrate in the lower side of the body. At the same time, in the case, the conveying device can switch between the two states to hold the substrate, = the substrate is transported, and the substrate can be transported in the root. (Application Q This can be adapted to the state of the substrate. Item 5 of the patent scope has

1234205

Case No. 921037M B /: Year

V. Description of the invention (5) When the drying device is used to dry the coating liquid for the film applied on the surface of the film, it is best to place the drying device with one of the coating device, the transfer device, the setting device and the peeling device. Direction overlap configuration. ^ If you install the drying device in the way of attack, purchase, and use, you can reduce the area required to set up the device. This also reduces the occupied space (items 6 and 7 of the scope of patent applications). When the transfer device is constructed in the following manner, the size of the transfer device can be miniaturized. Therefore, in order to reduce the size of the device, the upper and lower positions of f and the transfer device are overlapped with each other (application for a patent) Fan dry equipment 9 items). That is, a transfer device that can meet such a requirement can be arranged in a mutually opposite direction, and a substrate can be installed on the opposite side of the upper and lower directions, and has: The plate of the film, Gui Gui, "the first and second plates on the opposite side of the plate installed on the other side; move at least one of the first and second pieces in the direction of movement to the other side, and The weighting machine for pressing the Ang 2 sheet film for a predetermined time to transfer the film to the substrate ^ ^ & and the sheet has the following first and second support bodies, and can support the first and second sections relative to the direction of movement 1 plate to automatically correct the inclination correction mechanism of the relative inclination with respect to the second plate wall > 1 _ obliqueness; and the drying device and the transfer device are arranged to overlap with each other. The first support system is arranged obliquely with a milk-like hole π 々 土-soil and ~ not 丄 々 心 1, which is arranged obliquely around the outer periphery of the first plate = downward direction and extends in the first direction substantially perpendicular to the moving direction. The first is the center, and the first plate is rotatably supported, and the second support system of the rotary shaft is arranged on the outer periphery of the first support so as to be the second which is substantially perpendicular to the first direction of the movement # 面 ' The second rotation axis extending in the direction is supported in the middle, the direction, and the first support body can be rotated freely. The present invention is a thin film used to form a thin film on a substrate using a sheet film.

314408 (revised) .ptc Page 10

1234205 η H _ Case No. 92103759 / ~ (Month and Day Amendment _ V. Description of the invention (6) The film supply device and the film supply mechanism for supplying the film, in order to achieve the above-mentioned second purpose, there are: There is a film storage box for storing the film in the state of the release film, and the release film located at the uppermost part of the film storage box is removed from the film storage box so that the release film located at the uppermost part of the film storage E is removed. Device (item 10 of the scope of patent application). In the invention thus constructed, a plurality of sheet films are housed in a film storage cassette in a state in which a release sheet is interposed between the film and the film. It is located at the uppermost part, so it can effectively prevent the film from being contaminated. Moreover, when the uppermost release sheet is removed from the film storage box by the release sheet removal device, the film film is located at the uppermost part of the film storage box, so the film can be removed. The film is taken out from the film storage box. In this way, the film can be supplied as needed without the operator, and the film can be efficiently supplied. Here, in order to protect the stored film, the film storage box can be opened and closed. Free protective cover A cover opening and closing device for opening and closing the protective cover can also be provided. This can more reliably prevent the film from being contaminated (the scope of patent application is item 11). Furthermore, it can be removed from the film storage box by being provided for recycling. The release sheet recovery device of the release sheet can reliably recover the release sheet, and can prevent the release sheet from being scattered around the film storage box (the scope of application for patent No. 12). The present invention is a film used for forming a film on a substrate A film storage cassette for forming a device and used to store a sheet film, in order to achieve the above-mentioned second object, includes: a cassette body capable of storing a plurality of sheet films in a state in which detached sheets are interposed between the sheet films; and The positioning structure of the body film and the peripheral edge of the release sheet is engaged so that the film and the release sheet are positioned relative to the box body.

314408 (revised version) .ptc page 11 1234205… v _ case number 92103759 year / month day amendment _ five, description of the invention (7) (the scope of application for patent 13). In the film storage S thus constituted, a plurality of film films are stored in the cassette body in a state in which a release sheet is interposed between the film films. The film and the release sheet are positioned relative to the cassette body by the positioning member, so that the film can be reliably taken out and supplied from the cassette body. Furthermore, a protective cover that can be opened and closed can also be provided for the box body, so that the protective cover can be closed to cover and protect the film and the release film contained in the box body from above, and can reliably prevent the film from being affected by the film. Pollution (item 14 of the scope of patent application). Furthermore, when the film storage E is configured in a detachable manner with respect to the thin film forming device, a film storage box containing a film can be prepared in advance, and the film storage box can be replenished by installing the film storage box on the device as needed. Can make the film and film supply more efficient (application patent scope 15). Furthermore, the present invention relates to a film-forming device that uses a sheet film to form a film, and a transport mechanism for transporting the sheet film. In order to achieve the third object, the present invention includes: A film arm provided with an adsorption hole; the internal space formed inside the film arm communicates with the adsorption hole, and the interior of the internal space is blown and exhausted, so that the film is adsorbed and held on the film arm by a blower And a driving unit for moving the film arm to carry the film under a state in which the film is adsorbed and held on the film arm by a blower (item 16 of the scope of patent application). In the invention thus constituted, since the blast is exhausted in the internal space, the film is adsorbed and held in the suction hole of the arm for the film. The sheet is transported in such a state that it is held by suction. In this way, it is sucked by blast air

314408 (revised version) .ptc Page 12 1234205 _ Case No. 92103759 > >: Year (month day ___ ^ ___ V. Description of the invention (8) Attached maintenance ', that is, to increase the exhaust gas flow and impose negative pressure on the adsorption hole Therefore, even if a certain part of the exhaust path from the suction hole to the blower occurs, the electric dew's negative pressure will only reduce the amount corresponding to the leakage amount, but it can still generate enough negative pressure to adsorb and maintain the film. As a device for adsorption and holding, there have been conventional methods of applying a negative pressure to the adsorption hole and performing vacuum adsorption by using a vacuum adsorption device such as a vacuum pump or an aspirator. However, when a leakage occurs in a part of the exhaust path in these methods, the adsorption is carried out. The hole will not apply negative pressure, and even the film cannot be vacuum-adsorbed. The adsorption and holding of the blast air of this structure is the most suitable for the adsorption and holding of a film that is lighter than the substrate. Therefore, this structure is adopted. The conveying mechanism can convey the film mold with high stability, so that the film can be conveyed with good efficiency. Furthermore, when it is used in a film forming device, a film is formed at the central portion of the surface of the film, and at the peripheral portion of the surface. No film is formed, even if the surface is exposed a lot. In this case, it is best to use a transport mechanism to bring the contact area of the film arm against the peripheral edge portion of the surface of the non-formed area of the film for adsorption support. It can prevent impurities from adhering to the film, can effectively prevent problems caused by uneven film thickness, and can prevent the film arm from being contaminated (application patent scope item 17). '、 Again, the present invention is a processing device configured with For the plurality of processing units, in order to achieve the third object described above, the device includes: a indexing unit configured to receive a substrate from a substrate storage cassette configured to receive a substrate; and a process unit configured to be provided with a plurality of processing units. A substrate from the indexing part is transported to a plurality of processing and transportation mechanisms on one side. Among them, the transportation mechanism is prepared: the arm body and the early movement mechanism, which holds the substrate on the upper side of the arm body = side == Support 314408 (revised version) .ptc

imnwE Page 13 1234205 ϋ 正

SS_J2103751 V. Description of the invention (9) Hold the substrate on the lower side of the arm body; and the driving part moves and transports the substrate. In a moment, the conveying mechanism is in the process part m: the form of holding the substrate and the form of holding the substrate on the lower side Cut two sides of the substrate, and carry them at the same time (Shen Yunzhuan No. 18). Zhang and Jiaming pursue profit-making ~ In the invention thus constituted, the conveying device can hold the substrate in two ways = to be held, and at the same time, it can be handled purely, and it can be replaced according to the state of the substrate-so it can be adapted to the state of the substrate. Efficiently transport substrates. Here, 'the lower side support mechanism can be configured to use a suction hole formed under the arm body to suck and hold the substrate structure (application patent scope U,' or the upper side support mechanism can be configured to be provided on the arm body It is also possible to use a substrate supporting member on the side to support the substrate for mechanical support (item 20 of the scope of patent application). Too much, and furthermore, in order to achieve the third object described above, the present invention includes: The first conveying mode for holding the substrate on the upper side to carry the substrate; the second conveying mold for holding the substrate on the lower side of the body to carry the substrate; the second conveying mode according to the state of the substrate, and conveying in one of the first and second conveying modes. ^ L: substrate transportation (No. 21 in the scope of patent application). Therefore, the same as the above-mentioned transportation =: can be replaced and maintained according to the state of the substrate, not only can adapt to the shape of the soil plate, and can efficiently transfer the substrate ^ In the thin film forming apparatus for forming a thin film on a substrate using a sheet film, the film formed on the surface of the sheet film is transferred to the substrate by a transfer coat, and the film is formed by integrating the sheet film with the substrate through thin film formation. After the sealed object, the method of peeling the sheet film from the sealed object by the Lee equipment is generally known, but in order to transport the substrate in the film-forming device, the above-mentioned conveying method can also be used.

314408 (Revised Edition) .pt Page 14 1234205 Case No. 92103759 5th, the invention description (10) method. In this device, in order to prevent or reduce substrates or thin parts, it is best to transport the sealed object from the transfer device to the substrate in the second transport mode, and peel the substrate on which the film has been formed from the first transport mode. : Nest out (No. 22 in the scope of patent application). Ling Zhi 实施 [Embodiment] A · Device configuration: Fig. 1 is a view showing an implementation of a thin film forming apparatus of the present invention. In this thin film forming apparatus, as shown in Fig. 1, the indexing section I D is arranged on the left side of the figure of 2 cases (1), and in the indexing section! Below the square, Hung (the right-hand side) is equipped with a process part that uses a film to form a thin film on the substrate (Figure 1 in this indexing part ID, the substrate for housing the substrate is received P. 4 X It is arranged in a row in the direction, and the magic box 1 is moved along the array direction by the substrate transfer robot 丨 2 adopted, and the substrate stored in a film that is based on the normal 11 is formed and taken to the process department pp. Cassette = sequence part PP will form a thin-film substrate, and receive the substrate = receive by container 11. Below, for convenience of explanation, in each figure, the arrangement of the j substrate Z and the substrate storage box 丨 丨The direction X is perpendicular, and the direction XYZ is a right-angled coordinate axis. It is Γ ¥ square and is arranged on the (+ Υ) side of the indexing part ID. The process part P P is arranged around the middle of 2: coating unit 3, Drying unit 4, transfer sheet,-robot i6, film supply unit 7, and reversing unit 8. In the present system, two transfer units are provided in order to perform the transfer process of the transfer premature unit 5 together. , 5. As described later, the substrate received by the indexing unit ID is reversed in the reversing unit. "^" Is conveyed to one of the transfer units 5, and Zheng in the process section PP is connected to the area of the indexing section ID, and the two transfer units 5 are used to reverse the

314408 (revised version) ptc page 15 1234205? ... v _ case number 92103759 7 ... January z z amendment _ V. Description of the invention (11) The way in which the unit 8 is held is arranged in the X direction. In addition, the drying unit 4 and the transfer units 5 are arranged in an overlapping manner to reduce the area occupied by the device. A coating unit 3 and a peeling unit 6 are arranged on the opposite side of the index portion ID in the process portion PP. A film supply unit 7 for supplying a film is interposed between the coating unit 3 and the transfer unit 5. In this way, in the process section PP, the processing units 3 to 8 are arranged radially with the central robot 2 as the center, and the central robot 2 is fixed to the approximate central position of the process section PP. The substrate is transported between the transfer unit 5, the peeling unit 6, and the reversing unit 8, while the film arm is retracted, and the sheet can be transported between the coating unit 3, the drying unit 4, the transfer unit 5, and the film supply unit. membrane. B · Central robot (conveying mechanism) 2: Figure 2 shows the central robot, while Figure 2 (a) is a plan view from above, and Figure 2 (b) is a side view. This central robot 2 is a multi-joint robot equivalent to the carrying mechanism of the present invention, which has a robot body 2 1 and two multi-joint arms 2 2, 2 3 mounted on top of the robot body 21. The robot body 21 is fixedly arranged in the central part of the process part PP, and can rotate around the rotation axis AX 1 and can be extended and retracted in the Z direction. The multi-joint arm 2 2 is used to support the substrate arm 2 4 having the function of a substrate holding portion of the substrate W, and according to an operation command of a control unit (symbol 9 in FIG. 12 described later) for controlling the entire device. The telescopic drive and the rotation around the rotation axis AX 1 of the robot body 21 and the Z-direction drive move the substrate W from each unit 5, 6, 8 or vice versa, and move the substrate W held by the substrate arm 2 4 to Each unit 5, 6, 8. As such, in this embodiment, the robot

314408 (revised) .ptc Page 16

1234205 _ Case No. 92103759 V. Description of the invention (12) The body 21 and the multi-joint arm 2 2 move the substrate arm 2 4 which is equivalent to the “substrate holding portion” of the present invention, so as to exert the driving portion for transporting the substrate W. Its function. Fig. 3 is a diagram showing the structure of the arm for the substrate, and Fig. 3 (a) is a plan view of the arm for the substrate viewed from above, and Fig. 3 (b) is a cross-sectional view taken along line A-A in Fig. 3 (a). . As shown in Fig. 3, this substrate arm 24 is provided with an arm body 243 formed by the upper and lower plates 241 and 242. Here, wing portions 244 extending in a direction substantially perpendicular to the longitudinal direction of the arm body 2 4 3 are formed at the front end portion and the central portion of the arm body 2 4 3. And the substrate support block 2 4 5 is fixed on the upper surface of each wing 24 4, so as shown by the two dotted lines in FIG. 3, the outer side of the substrate W can be locked to the arm body 2 4 The upper surface of 3 holds the substrate W mechanically. Thus, in this embodiment, the substrate supporting block 2 4 5 will function as the "upper-side holding mechanism" of the present invention. Three suction holes 2 4 6 to 2 4 8 are provided in the central portion of the lower plate 2 4 2, and a groove portion 2 4 9 is formed on the lower side of the upper plate 2 4 1. The upper and lower plates 2 4 2 2 4 2 The body is integrated, and the three suction holes 2 4 6 to 2 4 8 are connected by the groove portion 2 4 9. This groove portion 2 4 9 is connected to a vacuum suction mechanism such as a vacuum pump (not shown), and the vacuum suction mechanism is operated to apply negative pressure to the groove portion, as shown by a dotted line in FIG. 3 (b). The substrate W is sucked on the lower side of the arm body 243. Thus, in this embodiment, the suction holes 2 46 to 2 48 and the groove portion 2 4 9 provided in the arm body 2 4 3 and the vacuum suction mechanism can function as the "lower-side holding mechanism" of the present invention. As such, in this embodiment, the center robot 2 can be held in two states, that is, mechanically held on the upper side, and adsorbed on the lower side.

314408 (revised version) .ptc Page 17 1234205 Γ >, --- Case No. 92103759-Month Z Day 1-^-~~-V. Description of the invention (13) Keep the substrate while keeping the substrate W at the same time Since the substrate is transported, the support state can be replaced depending on the state of the substrate W, and the substrate W can be efficiently transported in accordance with the state of the substrate W. In addition, the two substrates W may be transported at the same time. At the front end of the other multi-joint arm 2 3, a film arm 25 for attaching and holding the surface peripheral portion of the sheet F is attached to control the telescopic drive and robot of the multi-joint arm 23 according to the operation instruction from the control unit. Ontology

2 1's rotation axis AX 1 is rotated around and driven in the z direction, thereby moving the film F from each unit 3 to 5 and 7, or vice versa, moving the film F held by the film arm 2 5 into each unit 3 to 5. As such, in this embodiment, the robot body 21 and the multi-joint arm 2 3 move the film arm 25 corresponding to the “film holding portion” of the present invention to perform the function of a driving unit that transports the film F . Fig. 4 is a diagram showing the structure of the arm for the membrane, and Fig. 4 (a) is a bottom view of the arm for the membrane viewed from below, and Fig. 4 (b) is a sectional view taken along line B-B in Fig. 4 (a). This film arm 2 5 is attached to the front end of the arm body 2 5 1 at the front end of the film. The woman has a ring member 2 5 2 having the same outer diameter as the film film F, and the ring member 2 5 is attached to the lower side of the ring member 2 52. The plate member 2 5 3 ′ of the membrane F having substantially the same shape forms an internal space 2 5 4 with the arm body 2 5 1 and the ring member 2 5 2. In addition, six pillar members 2 5 5 are installed in the inner space 2 5 4 to reinforce the central portions of the arm body 251 and the plate member 2 53. In the peripheral portion of the plate M3, 18 through-holes 253a are formed, and a ring plate 2 5 7 having a phase and an outer diameter is attached to the plate member 2 5 3 by a gasket 2 5 6 formed of a resin. The pad 256 is formed corresponding to the plate structure 对应 9 dent holes 2 53 and formed with a through hole 256a, which is arranged corresponding to the bayonet hole 253 and 1 to 1 and is formed in the ring plate 257.

1234205 _ Case number 92103759 V. Description of the invention (14) #-year 'month Amendment 6 suction corrections across 3 through holes 2 5 3 a R 〇 and attached holes "57a, and the female 3 through holes 25 3a are configured with 1 adsorption hole 2 5 7 such as h, z I * Z b, a is so bad that the adsorption hole 2 5 7a, bayonet hole 2 5 6a and 2 5 3a to make the ring cup? Evening; 乂 \ 衣 槪 块 ^ 〖The lower side and the internal space 2 5 4 On the other hand, 'on the arm body 251' is provided with a communication hole 251a 'as shown in Figure 4 (b). The pipe 258 is connected to an exhaust blower (not shown). Therefore, by operating the exhaust blower to apply a negative pressure to the internal space 2 54, as shown in FIG. 4 (b), the entire lower surface of the ring plate 2 5 7 will form the “contact area” of the present invention and abut. The surface peripheral portion of the sheet film F can be adsorbed and held. C. Film supply unit (film supply mechanism) 7 and film storage cassette 7 1: FIG. 5 is a diagram showing a configuration of a film supply unit provided in a film supply device. This film supply unit 7 accommodates the film containing the film F! ^ 7 丨 Can be freely attached and detached from the cassette mounting table 72. Further, the cassette mounting table 72 can be moved up and down in the vertical direction Z by a lifting mechanism (not shown), so that the film storage cassette 71 loaded on the cassette mounting table 72 can be positioned in the vertical direction Z. In this embodiment, as shown in FIG. 5, three cassette mounting tables 72 ′ are provided, and a maximum of three film storage cassettes 7 1 can be mounted at the same time, but the number of the cassette mounting tables 7 2 is not limited to r. 3 "can be arbitrarily set. Fig. 6 is an exploded perspective view of a film storage box provided in the film forming apparatus of Fig. 1; Each film storage 1E 71 can store a plurality of film films F between the film films F in the cassette body 7 1 1. Three positioning pins 7 1 2 are neutrally provided in the box body 7 1 1 and are engaged with the peripheral edges of the sheet film F and the release sheet SH housed in the box body 7 1 1 to connect the sheet film F and the release sheet. SH is positioned relative to the cassette body 7 11. Thereby, in the cassette body 711, the film F and

314408 (revised) .ptc page 19 case number 92103759 1234205,

V. Description of the invention (15) The release sheet SH is accommodated in a state of regular arrangement, and the removal process of the film F or the release sheet can be efficiently performed. deal with. 7 1 3. To further elaborate, the protective cover which is freely closed at the lower end of the protective cover 7 丨 3 is provided with protruding portions 7 1 4, and all the insertion holes 715 corresponding to the four portions of each of the protruding portions 邛 and 邛. Insert the protruding parts 71 4 into the j box body 711 and 715 respectively, and install the protective cover 71 3 on the box body 7 with the corresponding insertion hole closed, and cover and receive the protective cover 71 3 from above to form a separate piece. SH and protected. With this, the protective film 71 3 of the body film F is removed and the protective cover 71 3 is moved upward from the cassette body 711 to prevent the film from being contaminated. When it is in the open state, it can be stored in the main body 7 and the protective cover will be opened.

Move out from above. The film F and the release sheet SH of the jujube body 711 move the protective cover 7 1 3 to open and close. As shown in the figure of the film mounting unit 72 in the first film supply unit 7, in this embodiment, turn 7Γ: The cover opening and closing drive mechanism 7 heart AX 2 said that it can rotate freely around the rotating arm 7 3 1 ^ 捭 π # Μ I i @ and the handle t 安装 attached to the front end of the cover. The rotating arm 731 is moved to a dotted line by a driving unit (not shown). = Head P1 rotates in the direction. Then, the lid opening-closing driving mechanism 73 is a handle portion 7 1 6 of the thin-skinned lid 7 1 3 of the film storage box 7 i which is set at the pre-closing lid opening-closing position (FIG. 8 (a)) to hold the lid. After the portion 7 3 2 is grasped, a structure is formed in which the rotating arm 7 3 1 is rotated to the (-P 1) direction to move it to the retreat position in FIG. 5. To close the protective cover 7 1 3, perform the opposite operation.

A release sheet removing mechanism 74 for removing the release sheet SH is disposed below the lid opening and closing drive mechanism 73. This release sheet removal mechanism 74, such as

314408 (revised version) .ptc P.20 1234205 Case No. 92103759 Amendment V. Description of the Invention (16) Figures 5 and 7 are arranged at intervals wider than the outer diameter of the film F and the release film SH. There are 2 rotating arms 7 4 1 and 7 4 2. Further, a link beam 7 4 3 extending in the horizontal direction is hung on the tops' of the rotating arms 7 4 1 and 7 4 2. An adsorption plate 7 4 4 for adsorbing the release sheet s Η is attached to the central portion of the connecting beam 7 4 3, and as shown in FIGS. 5 and 7, in the adsorption position, adsorption is formed on the lower surface of the adsorption plate 744. Face 744a. As shown in FIG. 8 (b), when the g-mounting table 72 is raised with the absorbing surface 744a facing the (-Z) direction, the g-mounting table 72 is placed on the uppermost part of the film-receiving box 71 on the cassette mounting table 72. The release sheet S Η will abut against the suction surface 7 4 4 a, and is held by the suction plate 744 as shown in FIG. 8 (c). The interval between the film storage cassettes 71 placed on the cassette mounting table 72 in the up and down direction is connected to the cover opening and closing drive mechanism 7 3 when the protective cover 7 1 3 is detached, which is sufficient to allow the above-mentioned protective cover 7 丨 3 to pass. . As shown in FIG. 7, the rotating arms 741 and 742 are respectively equipped with shaft members 745 and 746 extending in the (+ γ) direction and (-Y) direction, and can rotate freely with AX3 as the rotation center. The rotating arms 741, 742 are driven by the driving unit shown in the figure, and can be rotated in the direction of the dotted arrow at point i. Therefore, as described above, the release sheet SH is sucked by the suction plate 744, and the arms 741, 742 are moved to the first position. (+ P2) arrow shown in Figure 9 (a): make :: ”t Attachment plate J44 will be positioned at the removal position. Then the adsorption plate 7 疋 4 is turned to adsorb phenol, and the release sheet SH will fall from the adsorption plate 744. In the present embodiment of 44, a release sheet recovery box 76 is provided on the bottom surface of the film supply unit 7 = η, and is provided with a tear-off sheet sheet opening that will drop the two as described above and v to the release sheet recovery box 76. N is collected so that the release sheet SH can be reliably recovered and released

314408 (revised edition) · Oral soil Page 21 Case number 92103759 1234205

5. Description of the invention (17) 7 6. Therefore, it can effectively prevent the confession of the film from being confusing; … Week 7: Second week ”Since the release sheet S Η has been removed from the film storage box 71, the film film F can be exposed at the top and carried out from the box 7 丨. Therefore, the film ′ is moved at a proper timing in the film supply unit 7 and the uppermost portion is held by adsorption (FIG. 9 (b)). It is then transported to the next processing unit 3-the film clever application unit 3. Wherein, that is, in this embodiment, as shown in FIG. 5, an ionized state 7 9 ′ is provided near the detachment of the sheet ☆ to effectively prevent the film and f 7 from forming the container 7 1 When unloading, or when the release sheet SH is removed, a peeling tape film is received. Fig. 10 is a block diagram showing a structure of a thin film forming apparatus provided in Fig. 1. This coating unit 3 is provided with a disc-shaped carrier 2 = a rotating shaft 3 2 of a motor (not shown) that rotates the stage 3 1 early; a thin film coating liquid such as S0G (Spin- On—Glass) is used for sock cloth 3 3; for washing the peripheral edge, the cleaning liquid is sprayed on the peripheral part of the film ρ, and the cleaning liquid nozzle 34 is used to prevent the coating liquid or cleaning liquid Wait for the scattering to 77 Tu ^; Scattering prevention cup 3 5 around the first element 3. A plurality of suction holes (not shown) are provided on the entire surface of the stage 31 and are connected to a vacuum pump (not shown). As described above, the arm 25 transports the sheet film F from the film supply unit 7 to the coating unit 3 and places it on the hand stage 31 to 'actuate the vacuum pump, so that the sheet film F will be directly fixed to the carrier. Table 3 is composed of a scatter prevention cup and a structure around the work table 31. Carrier consisting of Gwu Shangyuan In the coating unit 3 thus constituted, the gland 17; I _ Τ 田 片 膜 F is placed on the stage

314408 (revised version) .ptc Page 22, Rev. 1234205 · Case No. 921037 D. V. Invention Description (18) 3 1 When the preparation of the coating process is completed, a motor (not shown) provided in the coating unit 3 will operate As shown in FIG. 10, the rotation shaft 32 starts to rotate, and accordingly, the film F and the loading port 31 are rotated around the rotation axis αχ4. At the same time as this rotation, or slightly delayed, the SOG liquid is supplied from the SOG liquid nozzle 33 to the center point of the sheet film F. Then, by the centrifugal force generated by the rotation of the sheet f, the 80 ° liquid is applied in a thin film form from the center of the sheet F. At this time, the SOG liquid scattered on the outside of the sheet F will be prevented from being scattered The cup 35 and a discharge pipe (not shown) are discharged to the outside of the coating unit 3. After the entire surface of the film F is supplied with the SOG solution, peripheral rinsing is performed. That is, the film is sprayed from the nozzle 34 for the cleaning solution to the film. Spray cleaning solution on the peripheral part of F. 2 F Gang sheet seam film: rotation, so by this rotation, the coating liquid attached to the peripheral edge of the sheet F ^ S can be removed. For the film film coating Hikoda —Λ, taxi unit 3, the film F: J = 4; use the arm 25 to stop the vacuum suction into the coating stage 31 = the air system is stopped to release the film F for the SOG film (film) by: Bad = arm 25 will have formed the test god _ —., Removed from the coating early Wu 3, and transported to the next processing early Wu, that is, the drying unit 4. 1 as solid as possible: the use of s ° g solution as the coating However, as for the substrate w, a photoresist solution such as the technique λ is exemplified, as long as it is limited. Furthermore, the coating solution for the film of 纟 本 成 参 / 的 溥 ' The following drying unit 4 is not specified so that it is only after the coating process. The film is transferred to the transfer unit 5 and is also processed, but the drying process is not performed, and the drying unit 4: No. 11 The figure shows the drying unit of the film forming apparatus shown in Fig. 1

314408 (revised version) .ptc page 23 1234205 factory ^ _ case number 92103759 '' year / month day amendment _ five, the description of the invention (19). This drying unit 4 is provided with: a processing container 4 1 with a processing chamber 4 1 1 inside; and a hot plate (stage) 4 2 disposed at the bottom of the processing chamber 4 1 1. The symbol 1 2 1 in FIG. 11 indicates an S 0 G film (thin film) formed on the surface of the sheet film F by the coating unit 3. Two nitrogen inlets 4 1 2, 4 1 3 are provided at the bottom of the processing container 41, and a nitrogen supply source (not shown) supplies nitrogen (N helium) to the inlets 4 1 2, 4 1 3 to the above. Inside the processing chamber 4 1 1. An exhaust port 4 1 4 is provided on the top of the processing container 41 to allow gas components in the processing chamber 4 1 1 to be discharged from the processing chamber 4 1 1. Therefore, the processing chamber 4 1 1 is filled with nitrogen, and the drying process is performed under the ambient gas. The heater 4 2 1 has a heater 4 2 1 built therein, and heats the heater 4 2 1 by an electric signal supplied from the control unit. The hot plate 42 is the same as the stage of the coating unit 3. A plurality of suction holes (not shown) are provided on the whole of the hot plate 42 and are connected to a vacuum pump (not shown). After the film F is moved to the drying unit 4 by the film arm 25 and placed on the hot plate 42, the vacuum pump is operated, and the film F is firmly vacuum-adsorbed on the hot plate 42. Then, the drying process is started in a state of being vacuum-adsorbed by the hot plate 42. When the sheet film F is heated for a predetermined time and the drying process is completed, the film arm 2 5 enters the drying unit 4 and the sheet film F is adsorbed and held, and the vacuum pump is stopped to release the vacuum adsorption of the hot plate 42. Then, the film F subjected to the drying treatment is carried out by the drying unit 4 by the film arm 2 5 and is carried to the next processing unit, that is, the transfer unit 5. F. Transfer unit 5: Fig. 12 is a schematic cross-sectional view showing a transfer unit provided in the film forming apparatus of Fig. 1. In Fig. 12, the inside of the transfer unit 5 may be

314408 (revised version) .ptc page 24 1234205… _ case number 92103759 ^ year (/ day amendment __ — — — ~ 1 ~ ~ ^^ V. Description of the invention (20) Vacuum exhaust, and it has formed A processing container 5 1 in a chamber 5 1 1 for performing a SOG film (film) transfer process. An exhaust port 5 1 2 is provided on a side portion of the processing container 5 1 and is connected to the exhaust port 5 1 2 There is a vacuum pump 5 2. This vacuum pump 5 2 is electrically connected to a control unit 9 for controlling the entire device, and operates in accordance with an operation command issued by the control unit 9. The first and second plates 54 and 55 are arranged in the chamber 51 1, and the inclination of the first plate 5 4 with respect to the second plate 55 is automatically corrected so as to be formed as a film formation target. The tilt correction mechanism 5 8 of the SOG film of the substrate W and the sheet film F can be fully pressed by the uniform pressure. The first plate 5 4 is suspended by the tilt correction mechanism 5 8 in order to be consistent with the axis of the second plate 55. A substrate W is mounted above the second plate 55, and on a surface (lower surface) opposite to the second plate 55, thus constituting a substrate plate. A polished quartz plate (not shown) is installed under the plate 5 to ensure flatness, and the substrate W is fixed here. The reason for using the quartz plate is that quartz does not contain substances that contaminate the substrate W. And the workability is good, and it is easy to obtain the required flatness, so it is suitable as a material for the mounting substrate W. The first plate 5 4 is provided with a heater 5 4 1 as a heating device in the interior. This heater 5 4 1 is connected to a heater. The controller 5 4 2 is electrically connected, and is controlled by a heater controller 5 4 2 which is operated according to a substrate temperature signal from the control unit 9 to heat between 25 ° C and 300 ° C. The other side's plate That is, the second plate 5 5 is arranged below the first plate 5 4, and a film plate is formed by mounting a film F on the plate. The second plate 5 5 is formed by placing a film F It is composed of a quartz stage and a heating stage for heating the film F, and has heating inside the heating stage.

314408 (revised version) .ptc page 25 1234205 ^？,? _ One case number 92103759 /. Year β month ’__ V. Description of the invention (21) Device heater 551. The heater 551 is electrically connected to the heater controller 5 52, and is controlled by a heater controller 5 5 2 which is operated according to a substrate temperature signal from the control unit 9 between 25 ° C and 300 ° C. heating. A shaft 553 is vertically integrated at the center below the f & a heating port. This shaft 55 3 is supported freely up and down by a bearing $ g 1, and is moved up and down in a moving direction Z by a weighting motor 5 9 2 as a weighting mechanism. Next, the structure of the tilt correction mechanism 58 will be described in detail with reference to FIGS. 2 to 4. Fig. 13 is a sectional view taken along line C-C in Fig. 12. Figure 4 is an oblique view showing a partial cut of the tilt correction mechanism. In this embodiment, the inclination correction mechanism 58 is arranged so as to surround the first plate 54 outside, and the first axis member 5 8 extends in the first direction X substantially perpendicular to the moving direction Z. 1 is connected to the first plate 5 4 and includes a ring-shaped first support body 5 8 2 that rotatably supports the first plate 5 4 around the first rotation axis a X 5; The outer periphery of the first support body 5 8 2 is connected to the first support body 5 82 by a second shaft member 583 extending in a second direction Y that is substantially perpendicular to the moving direction 2 and the first direction X, and the second rotation axis AX6 is a second supporting body 584 which can rotatably support the first branch body 582 as a center. In this embodiment, as shown in FIG. 14, a surface including a first and a second rotation axis a is provided on the surface of the substrate W mounted on the first plate 54, that is, the surface of the film formation surface 1 12. Each axis of X 5, AX 6 constitutes 5 8 1 and 5 8 3. In the tilt correction mechanism 58 constructed in this way, the first plate is supported by the first support 81 so as to be rotatable around the first rotation axis AX5, and is supported by the second support 5 8 3 The second rotation axis αχ6 is supported in a freely rotating manner, and the so-called axis rotation can tilt the first plate 54 with respect to the moving direction Z.

314408 (revised version). Pti Page 26 1234205 π… __ Case No. 92103759 / year ^ month / day _____ V. Description of the invention (22) Tilt correction mechanism 5 8 The second support 5 8 4 is as the first As shown in FIG. 4, two pillar portions 5 84a and 5 84b extending in the direction Z by holding the first support body 5 8 2 in the Y direction, and the upper portions of the two pillar portions 584a and 584b are connected. Beam portion 5 8 4 c. A pillar portion 5 8 4 d is extended upward from the central portion of the beam portion 5 8 4 c and is hung in the chamber 5 1 1. To explain in more detail, the pillar portion 5 8 4 d is supported by a bearing 5 9 3 so as to be able to move up and down freely. The upper end of the pillar portion 5 9 4 is integrally provided with a flange 5 9 4 to prevent falling down. The symbol 5 9 5 in FIG. 12 is a weighting sensor provided corresponding to the flange 5 9 4 and is used to detect the weighting value applied between the substrate W and the film F, and send the weighting value. Next, the control unit 9 will be described with reference to the transfer processing step using the transfer unit 5 described above. In this embodiment, the substrate support block 2 4 5 is used to mechanically support the substrate in a state where the film formation surface 丨 2 (the surface where the electrode wiring and the like should be formed) is facing downward. w, and the substrate w is transferred from the reversing unit 8 to the transfer unit 5 described later, and the substrate W is mounted below the first plate 54 so that the film formation surface 1 丨 2 faces downward. On the second plate 5 5, a sheet film F formed by coating the surface with a coating film 3 s 0 G film 1 2 1 (refer to FIG. 11) is installed so that the SOG film faces upward. Then, the control unit 9 controls each part 'of the device as described below to transfer the thin film on the sheet film F to the substrate w. First, the heater controller 5 4 2 is energized to the heater 5 4 1 to heat the first plate 5 4 to heat the substrate w to a desired temperature, and the heater controller 5 5 2 is energized to the heater. 5 5 1 to heat the second plate 5 5 to heat the film to the desired temperature. Vacuum is evacuated by the vacuum pump 5 2 so that the desired degree of vacuum is achieved in the chamber 5 1 1. After the desired degree of vacuum is reached in the chamber 5 1 1

314408 (revised version) .ptc page 27 1234205, _case number 92103759, year _ ^ 1_ 日 倐 iL _ V. Description of the invention (23) Yuan 9 sends the drive signal to the weighting motor 5 9 2 'to start the weighting operation . Thereby, the second plate 55 rises in the moving direction Z and pushes the sheet film F to the substrate W. At this time, the first plate 54 and the tilt correction mechanism 58 are pushed up integrally by the second plate 5 5. When this push-up is performed, if the first plate 5 4 is inclined with respect to the second plate 5 5, when the second plate 5 5 is in contact with the first plate 5 4, the first plate 5 4 is adjusted by the tilt correction mechanism 5 8. The inclination of plate 54 is automatically corrected. That is, since the first inverse block 54 is held by the tilt correction mechanism 58 so as to be tiltable with respect to the moving direction z, for example, when tilting to the left at a small angle in FIG. 12, the first The left end of plate 2 5 will touch the first plate 5 4 and push the first plate 5 4 upward. Therefore, the first plate 54 is rotated clockwise with the first rotation axis AX5 existing in the surface of the substrate w as the rotation center, so that the contact area between the substrate W and the sheet film F is gradually enlarged to the right. Then, when the inclination of the first plate 5 4 is completely corrected so as to be parallel to the second plate 55, the substrate W and the sheet film F are pushed by the uniform pressure. Then, the weighting is continued by the weighting motor 5 92. When the weighting desired by the weighting sensor 595 is detected, the control unit 9 controls the weighting motor * ° 5 9 2 ′ to make the weighting last for a certain time. During this period, the substrate w and the sheet film F are still heated and maintained at a predetermined temperature. After the above-mentioned successive weighting operations are completed, the control unit 9 transmits a signal to the weighting motor 5 9 2 so that the weighting state becomes zero. Control stops vacuum exhaust. ~ As described above, in the transfer unit 5, the 80 () film i 2 丨 is transferred to the substrate w, the substrate W and the sheet film F, and the SOG film (thin film) is integrated into the middle, and it enters the transfer unit 5 by The substrate with the 2 2 suction holes 2 4 6 to 2 4 8 will

1234205. , F ^ __ sickle 92103759 /, year, month / day you are not 5. Description of the invention (24) '-The substrate W in an integrated state is adsorbed and held. That is, the substrate is held by the substrate's lower side holding mechanism by means of the substrate 2 (shown by the symbol M in FIG. 15, that is, the substrate W and the sheet film f that are closely adhered to each other by the SOG film 1 2 1). Adsorption remains. Then, the substrate arm 24 transfers the adherend from the chamber 5 1 to the peeling unit 6 in the suction-holding state. Shan G · Peeling unit 6: Figure 15 shows a diagram of the peeling unit of the thin film forming apparatus shown in Figure 1. This peeling unit 6 is provided with: a processing chamber 6 1 whose inside is a processing chamber 6 11; and a peeling unit 6 which is arranged below the processing chamber 6 11 and is used to vacuum-suck the seal M formed by the transfer unit 5 described above. The adsorption plate 6 2 of the sheet film F; and the substrate W provided above the adsorption plate 62 in the processing chamber 6 1 1 and capable of adsorbing the dense object M placed on the adsorption plate 62, The substrate adsorption portion 63 is rotated around the axis A × 7 in the up-down direction (two directions) and the X-direction. Symbols 1 1 1 in FIG. 5 indicate electrode wirings formed on the substrate film formation surface n 2. The substrate adsorption unit 63 is connected to a rotary mechanism 64 such as a rotary cylinder in order to rotate the substrate adsorption unit 63 around the axis A X 7. Furthermore, a lifting mechanism 65 is provided in the substrate suction section 63. The elevating mechanism 65 has a pin 67 capable of advancing and retreating with respect to the contact surface of the substrate W in the substrate adsorption portion 63 by a driving member 66 of a cylinder or the like. When the substrate adsorption portion 63 is rotated to make the substrate W face upward, the substrate W can be raised above the substrate adsorption portion 63 by raising the pin 6. A processing chamber 6 11 of the processing container 61 is provided with a non-illustrated static eliminator, and an ozone (0 3) ambient gas can be formed in the processing chamber 6 11. Next, the operation of the peeling unit 6 configured as described above will be described. By transfer slip

314408 (Revised) .ptc Page 29

Amend 1234205, f month __Case No. 92103759 发明 V. Description of the invention (25) Yuan 5 and the substrate W attached to the sheet F through the S0G film 1 2 1, that is, the tightly sealed object M, is made by the central robot 2 The substrate is sucked and held by the arm 2 4 while being carried into the processing chamber 6 1 1 of the peeling unit 6. At this time, the 'substrate adsorption portion 63 is retracted upward. The substrate arm 24 contacts the sheet film F to the adsorption plate 62, and after placing the adherend M on the adsorption plate 62, it retracts out of the processing container 61. At the same time as the adsorption plate 62 absorbs the sheet film F, the substrate adsorption portion 63, which has evacuated above, lowers and adsorbs the back surface (non-film-forming surface) of the substrate W. In addition, the processing container 61 is closed, and the static eliminator is operated so that an ozone ambient gas is formed in the processing chamber 61. The sheet film F is thus adsorbed, and the solvent in the SOG film 121 is discharged by the sheet film F, so that the SOG film 121 is dried. By this drying treatment, the interface of the sheet film F and the SOG film 1 2 1 and the interface of the substrate W and the SOG film 1 2 1 can promote the drying and peeling of the SOG film 1 2 1 more easily than the interface of the substrate W and the SOG film 1 2 1. After the lapse of a predetermined time, when the substrate adsorption portion 63 is raised, the interface between the sheet film F and the SOG film 121 is peeled off, so the soG film is transferred from the sheet film F to the substrate W. Next, the raised substrate suction portion 63 is rotated around the axis AX7 by the rotation mechanism 64. In the state where the film formation surface i2 of the substrate faces upward and is in a horizontal posture, that is, it stops with the surface facing upward. Then, while the substrate suction section 63 releases the suction of the substrate f, the lifting mechanism 65 raises the substrate W. That is, the pin 67 is raised by the driving member 66, and the substrate W is raised from the contact surface with the substrate adsorption portion 63. The bell-and-tick; & of the base plate / system straw is carried by the substrate with the hand f 24 to the following reverse ί :: two? The substrate transfer robot 12 with the ID is stored in the substrate storage box 11. Electricity H. Reversing unit 8:

1234205 Case number 92103759

Amendment V. Description of the invention (26) Figure 16 shows the structure of the reversing unit of the thin film forming device provided in Figure 1. 'Picture (a) is a top view of the reversing unit viewed from above, Figure 16 ( b) is a sectional view taken along the line DD in FIG. 16 (a). This reversing unit 8 has a pair of substrate clamping jaws 8 1, 8 1 for receiving and delivering one of the substrates W to and from the substrate arm 2 4 of the center robot 2. The pair of substrate clamping claws 81 and 81 are arranged at intervals so as to face each other. Moreover, each of the substrate clamping jaws 8 1 is installed at the front end of the rod 8 3 of the rotary cylinder 8 2 and moves in the X direction as the rod 8 3 moves in the X direction, and in the rod 8 as the rod 8 3 rotates. 3 around 1 8 0. Rotate. Therefore, when the unprocessed substrate W is transferred between the substrate clamping claws 8 1 and 81 by the substrate transfer robot ID 2 of the indexing part ID, the two rods 8 3 will be extended, as shown in FIG. 16 As shown, after a pair of substrate holding claws 8 1 and 81 hold the substrate W, the substrate carrying robot 12 will retreat. Then, the two rods 8 3 rotate 180 °. Then, the substrate w carried in the state of facing up, that is, the state where the electrode wiring 1 1 1 formed on the film forming surface 1 1 2 faces upward, is reversed to form the state of facing down. On the other hand, as described above, when the substrate robot w is mechanically held by the substrate arm 2 4 in a face-up state, the substrate w formed with the film is moved from the peeling unit 6 to the reversing unit 8. The rod 83 will be extended. As shown in FIG. 16, a pair of substrate clamping claws 81 and 81 will only hold the substrate W, and will not perform the inversion process, but directly receive and deliver the substrate transfer robot 12. I. Action: Figure 17 is a diagram showing the overall operation of the thin film formation structure described above. The solid line arrows in Figure 17 indicate the transportation order of the substrate w, and the front of the one-dotted dotted line indicates the transportation order of the film F. , The hollow arrow indicates the movement of the seal

314408 (revised version) .ptc page 31 1234205 __ 一 ^ 1103759__f 7 years J month / g_ amendment V. Description of the invention (27) Box 71. The film F located at the uppermost part of the film storage box 71 is transported with the film arm 2 5. In this thin film forming apparatus, a substrate W having electrode wirings 1 丄 1 formed on its surface is stored in a substrate storage box n, and a film ρ is stored in a film storage step and is most preferably transported to the coating unit 3, where the film is The surface of ρ is coated with a SOG film 1 2 1 (step S1: coating process). At this time, if the release sheet δΗ is located on the upper part of the film storage box 7 1 ', the uppermost part is separated from the operation sequence described in the item "c • film supply unit (film supply mechanism) 7 and film receiving E 7 1". After the sheet SH is removed and the sheet film F is positioned at the uppermost part, the sheet film F is transported to the coating unit 3 described above, and the coating process of the coating unit 3 is performed. In parallel with the unloading and coating process of this film F, in the indexing section 丨 D, the substrate w stored in the substrate storage box 丨 丨 by the substrate transfer robot 丨 2 is taken out in a face-up state and transferred. Go to the reverse unit 8. The substrate w is inverted by the reversing unit 8 to form a face-down state (step s2: reverse, processing). Then, the substrate support block 245 of the substrate arm 24 receives the substrate W from the reversing unit 8 and transfers it to the transfer unit 5, and then installs it under the first plate 54 of the transfer unit 5. As described above, in this embodiment, the substrate w is held by the substrate holding mechanism 24 above the arm 24, and is transferred from the reversing unit 8 to the transfer unit 5. At the end of the field coating process, the sheet film is moved from the coating unit 3 to the drying unit 4 by the film arm 25, and in this drying unit 4, the SOG film 121 on the sheet film ρ is dried (step S3: drying process) ). At this time, if there is no need for a dry place, the sheet film F is directly transferred from the coating unit 3 to the transfer unit 5 by the film arm 25, and the sheet film F is mounted on the second plate 55. In this way, when the substrate W and the sheet film F are mounted on the first and second plates 54 and 55 respectively, the details are as described in the above item "F · Transfer Unit 5".

314408 (revised version) .ptc page 32 1234205 V. Description of the invention Case number (28) 92103759

Correct the operation sequence, and perform the process of transferring the S0G film 1 2 1 to the substrate W (step S4: transfer process). Next, the substrate arm 2 4 is brought into the transfer unit 5, and the substrate W is sucked and held by the lower surface of the arm body 2 4 3, and then the adhered matter is transferred to the peeling unit 6 in the sucked state. In this manner, the transfer unit 5 transfers the adhered matter to the peeling unit 6 by using the lower side holding mechanism of the substrate arm 24. Next, only the sheet film F is selectively peeled from the adherend μ carried to the peeling unit 6 (step S5. Peeling process). In this way, a substrate w in which only the SOG film 1 2 1 is formed on the thin film formation surface 1 1 2 can be obtained. Then, the substrate W is held in a face-up state by the substrate support block 245 of the substrate arm 24, and the substrate W is transferred to the reversing unit 8. That is, the substrate is carried by the substrate holding mechanism 24 above the substrate holding mechanism. The peeled film F was discarded. In the standard 11 〇 In this way, the substrate W formed by the thin film is returned to the reversing unit 8. The substrate ID is used in the lead ID to accommodate the substrate in the substrate J. The effect is as described above.

The following effects can be obtained in this embodiment: The film forming device of the present invention has a substrate [in the process part ppt, and has a substrate [the central robot 2 in the coating sheet / function 2 will place the film w / or set) 4. Printing unit (coating device) 3. Drying unit (drying room to carry in-printing device) 5. Peeling unit (peeling device) 6. It is not necessary to form a thin film on the substrate W by a human film F In addition, since: ΐ Γ can be used to form a thin film using the sheet film F. 7, to directly direct the film F: set the film supply unit (film supply device) __ connected to i, to the process section ρρ, so the film F can be raised

314 Rights (Revised Edition) PTC Page 33

1234205

Case No. 921037M Μ Amendment Year V. Invention Description (29) The handling efficiency will increase the throughput of the device. Section (2) The central robot 2 is fixedly disposed at approximately the center of the process section pp, and a coating unit (coating unit) 3, a drying unit (drying device) 4, and a transfer unit (transfer device) are arranged around the central robot 2. & Peel, unit (peeling device) 6, film supply unit (membrane supply device) 7, and reversing unit 8 'and allow the substrate arm 2 4 or the arm 2 5 to directly enter each unit 3 to 8, so there is no need to set the transport path of the central robot 2 'for miniaturization of the device. 5 ^) Medium ~ Robot Thief 2 has an upper holding mechanism and a lower holding mechanism, which can be used to carry the substrate in two ways? However, the state of the board W in the above embodiment is replaced and maintained. So, can it be adapted to a substrate? This makes it possible to efficiently carry the substrate. "(4) A transfer device for transferring the SOG film 121 on the sheet film F to the film formation surface 112 of the substrate w, in addition to the transfer unit 5 used in the above embodiment, a previously disclosed one may also be used. Various devices are described in, for example, Japanese Patent Laid-Open No. 200 1 35 6 34. However, in this embodiment, the tilt correction mechanism 58 is described in detail in the above-mentioned item "F · transfer unit 5". The transfer unit 5 can be used by rotating the two axes AX5 and AX6 as the center of rotation, so that the first plate 54 can be tilted relative to the vertical direction z, so as shown in Fig. 1, The drying unit 4 and the transfer unit 5 are arranged to overlap with each other in the up-down direction Z, so that the floor space required for installing the film forming apparatus can be reduced for the following reasons. In order to push the entire surface of the substrate W to the film F with a uniformly increasing pressure, for example, a tilt correction mechanism described in the above publication is proposed, that is, by rotating the first plate along the spherical surface of the convex plate and the concave plate, A method for assembling a transfer unit by a mechanism for performing tilt correction, but this public

1234205 / & _Case No. 92103759 υ, year / month / day correction_ V. Description of the invention (30) In the example, there will be a problem of large size in the vertical direction Z. The actual arrangement of the stacking unit of the transfer unit and the drying unit Somewhat difficult. In contrast, with the transfer unit of the above embodiment, compared with the conventional transfer unit, the height of the transfer unit 5 can be greatly reduced, and the drying unit 4 and the transfer unit 5 can be overlapped and arranged in the vertical direction. , Which can reduce the footprint of the device. (5) Since the sheet film F is stored in the film storage box 71 with the release sheet SH interposed between the sheet films F, it is possible to prevent the sheet films from being tightly connected to each other and to reliably separate and use each sheet film F. . Further, since the release sheet SH is located at the uppermost part of the film container 71, the film F can be effectively prevented from being contaminated. Furthermore, in this embodiment, a release sheet removing mechanism 74 is provided, which is a structure that can remove the release sheet SH located at the uppermost part, so that the film film F can be located at the uppermost part of the film storage box 71. Moreover, the sheet film F can be easily taken out from the film storage box 71. As a result, the sheet film F can be supplied as needed without manual operation, and the sheet film F can be efficiently supplied. The film F is a thin film or film made of resin. The release sheet SH is a thin plate-like or thin-film-like object for protecting the sheet film F or suppressing charging and sandwiching the sheet film F. From the standpoint of charging suppression or dust suppression, it is preferable to use dust-free paper, and other materials such as paper and resin are also acceptable. (6) Since the film storage box 71 can be freely attached to and detached from the film storage device, a film storage box 71 containing a film F can be prepared in advance, and the film storage box 71 can be installed in the device to replenish the film F as required. And, the film F can be efficiently supplied. (7) The internal space 2 5 4 formed inside the film arm 25 is brought into a negative pressure state by a blower, so that the sheet film F is adsorbed and held on the film arm 25, that is, the exhaust flow rate is increased to prevent the adsorption. The hole applies negative pressure, so even from suction

314408 (revised version) .ptc page 35 1234205. r _ case number 92103759 amended on July 7 _ V. Description of the invention (31) Attachment holes 2 4 6 to 2 4 8 to a part of the exhaust path of the blower leaks At this time, although the negative pressure only reduces the amount corresponding to the amount of leakage, it can still generate a negative pressure sufficient to adsorb and hold the sheet film F, can carry the sheet film F with good stability, and can efficiently carry the sheet film. K. Others: The present invention is not limited to the above-mentioned embodiments, and various changes other than the above can be made as long as they do not depart from the spirit of the present invention. For example, in the above embodiment, as shown in FIG. 1, although the processing units 3 to 8 are arranged radially with the center robot 2 as the center, the arrangement layout of the center machine 2 and each processing unit 3 to 8 is not It is limited to this, even if the center robot 2 is movably arranged along the conveyance path, and the processing units 3 to 8 may be arranged on both sides or one side of the conveyance path along the conveyance path. Furthermore, in the above-mentioned embodiment, it is provided for the treatment of the sheet film F: the coating unit 3 that performs the coating process, the drying unit 4 that performs the drying process, the transfer unit 5 that performs the transfer process, and the peeling process The peeling unit 6 is a unit for performing other treatments besides these units, for example, a unit for hydrophilic treatment for performing a hydrophilic surface treatment on the sheet film F is assembled, or conversely, a part of the units may be deleted, that is, the unit The invention is applicable to all thin film forming apparatuses provided with a unit for processing the sheet film F. Furthermore, in the above-mentioned embodiment, although the transfer unit 5 corresponding to the transfer device and the peel unit 6 corresponding to the peeling device are configured by different units, respectively, both the transfer device and the peeling device are provided. The present invention can also be applied to a thin film forming apparatus in which units are replaced with units 5 and 6. Furthermore, in the above-mentioned embodiment, although the drying unit 4 is laminated and disposed toward Z above and below the transfer unit 5, the drying unit 4 may be opposed to it.

314408 (revised version) .ptc page 36 1234205

V. Description of the invention (32) The two processing units are stacked, or the drying unit 4 is independently equipped with i, and the drying is performed: When the drying unit 4 is independently configured, a plurality of drying units 4 can be stacked and arranged together. As for the non-stop operation, it is of course also possible to configure the unit 4. Furthermore, the central robot 2 has two types of holding patterns, and has the characteristics that the substrates can be replaced and held according to the state of the substrate, and the substrate can be transported at the same time, which is equivalent to the carrying mechanism of the present invention. In the above-mentioned embodiment, 'the center machine Λ 2 is applied to a thin film forming apparatus using this feature, but the conveyance mechanism of the present invention can be applied to all apparatuses having substrate conveyance, and the above-mentioned effect (3) can be obtained, that is , Adapt to the state of the substrate, and can obtain the effect of efficiently transporting the substrate. Furthermore, the present invention is a process in which a film is crimped without forming a void in a recessed portion of a substrate having a concave-convex pattern, and the surface of the film is flattened. For example, when a substrate having a wiring pattern such as a metal is formed as a SOD film or a SOG film as an interlayer insulating film, or when a conductive film is buried in a hole such as a contact hole or a substrate having a groove shape, the conductive film is processed. In addition, the present invention is applicable not only to semiconductor wafers or glass substrates for liquid crystal panels, but also to substrates such as photomask glass substrates, plasma display glass substrates, and optical disk substrates. In the manufacture of 1C cards or solar cell devices. [Effect of the Invention] As described above, according to the thin film forming apparatus of the present invention, the sheet film and / or the substrate are transported between the coating, placing, and peeling device by the conveying device in the process section. It ’s easy to use a film to form a thin film on the substrate. So, it can be achieved without manual operation.

314408 (revised version) · ptc page 37 1234205 case number 92〗 03759 V. Description of the invention (33) It is formed by using a thin film. In addition, by directly supplying the sheet film to the process section, the throughput can be improved. Furthermore, the film according to the present invention provides the uppermost release sheet from the uppermost part of the film receiving film so that the film can be collected from the film.

The film can be efficiently supplied by operation. Furthermore, according to the invention, the exhaust gas adsorption and maintenance of the film # _ film, and can efficiently apply the film manually according to the present invention. Replace the board with a different one to maintain the state of the f-board. The film processing device is provided in the process section to improve the film transport efficiency to the mechanism and the film storage box. Because the film is located in the film storage box and removed, it is not necessary to use a person's transport mechanism. The film is blown by the blower, so the film can be transported with good stability. The transport mechanism and transport method are carried by the board and can be adapted to the state of the board according to the board.

Page 38 1234205 _μ Ί _ Case No. 92103759 / year. Month / Day Modification _ Brief Description of Drawings [Simplified Illustration of Drawings] Fig. 1 shows a configuration diagram of an embodiment of the thin film forming apparatus of the present invention. Figures 2 (a) and (b) show the central robot. Figures 3 (a) and (b) show the structure of the arm for the substrate of the center robot shown in Figure 2. Figures 4 (a) and (b) show the structure of the hand arm of the membrane constituting the center robot of Figure 2. Fig. 5 is a configuration diagram of a film supply unit provided in the film forming apparatus of Fig. 1. Fig. 6 is an exploded perspective view of a film storage box provided in the film forming apparatus of Fig. 1; Fig. 7 is a perspective view showing a release sheet removing mechanism provided in the film supply unit of Fig. 5; Figures 8 (a) to (c) are diagrams showing the operation of the film supply unit of Figure 5. Figures 9 (a) and (b) are diagrams showing the operation of the film supply unit of Figure 5. Fig. 10 shows a configuration diagram of a coating unit provided in the thin film forming apparatus shown in Fig. 1. Fig. 11 is a view showing a drying unit provided in the film forming apparatus of Fig. 1. Fig. 12 shows a schematic sectional view of a transfer unit provided in the film forming apparatus of Fig. 1. Figure 13 is a sectional view taken along the line C-C in Figure 12. Figure 14 shows the tilt correction mechanism of the transfer unit shown in Figure 12

314408 (revised) .ptc p.39 1234205. > _Case No. 92103759 / Year β Month Day Amendment _ Brief description of the drawing Partial cut oblique view. Fig. 15 is a view showing a peeling apparatus provided in the film forming apparatus shown in Fig. 1. Figures 16 (a) and (b) are diagrams showing the configuration of a reversing unit of the thin film forming apparatus shown in Figure 1. Fig. 17 is a diagram showing the overall operation of the thin film forming apparatus of Fig. 1; Figs. 18 (a) to (d) are diagrams showing a sequence of film formation in a conventional film forming apparatus. [Description of main component symbols] 2 Central robot (conveying mechanism) 3 Coating unit (coating device 4 Drying unit (drying device) 5 Transfer unit (transfer device 6 Peeling unit (peeling device) 7 Film supply unit (film supply device, Film supply mechanism) 8 reversing unit 9 control unit 11 substrate storage box 21 robot body 11, 23 multi-joint arm (driving part) 24 substrate arm (substrate holding part) 25 film arm (substrate holding part) 31 Stage 32 Rotary shaft 33 Nozzle for SOG liquid 34 Nozzle for cleaning liquid 35 Anti-scattering ring 54 Plate 1 (substrate plate) 55 Second plate (membrane plate) 58 Tilt correction mechanism 62 Suction plate 63 Suction section 64 Rotation Mechanism 65 Lifting mechanism 66 Drive member 67 Pin 71 Film storage cassette

314408 (revised version) .ptc page 40 1234205 case number 92103759 simple illustration

72 74 76 ΊΊ, 79 82 111 121 243 ~ 245 246, 249 252 2 5 3a 255 257 412, 42b 542, 58b 584 592 595 712 714 Cassette stage release sheet removal mechanism Ionizer rotating cylinder electrode wiring SOG film ( Film) 251 Arm body groove (lower side retaining mechanism) Ring member • 2 5 6 a Through-hole pillar member Ring plate 4 1 3 Nitrogen gas introduction 541, 551 heater M2 heater control ° 5 8 3 Second support of shaft member Body weighting motor (weighting mechanism) Weighting sensor support pin projections are corrected 73 cover opening and closing drive c device) device) 81 substrate clamp 83 lever 112 film forming surface 24 2 2 2 2 plate 244 wing: structure) ( Lower side holding mechanism 251a, communication hole 253, plate member 254, internal space 256, general pad 411, processing chamber 414 to 5 1 2 exhaust port 511, chamber 553 shaft 582 first support 591 bearing 594 convex wire 711 box body 713 protective cover 715 insertion hole

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Claims (1)

1234205, r 7 _ Case No. 92103759 / 'Year / Month / Day Amendment_' VI. Patent application scope 1. A thin film forming apparatus comprising: a process section for forming a thin film on a substrate using a sheet film; and supplying the substrate to The indexing section of the above-mentioned process section; wherein the above-mentioned process section includes: a film supply device for supplying a sheet film; a coating device for applying a coating solution for a film on the surface of the sheet film supplied by the film supply device to form a film; A film forming film is in close contact with a substrate supplied by the indexing portion to form a sealing material, a transfer device for transferring the film to the substrate; a peeling device for peeling the film film from the sealing material; and The film supply device, the coating device, the transfer device, and the transfer device that transfers a sheet film and / or a substrate between the peeling device. 2. The thin film forming apparatus according to item 1 of the patent application scope, wherein the film supply device, the coating device, the transfer device, and the peeling device are arranged around the conveying device. 3. The thin film forming apparatus according to item 1 of the patent application range, wherein in the process section, the conveying device can move freely along a conveying path, and further, the film supplying device and the coating device are provided along the conveying path. The transfer device and the peeling device are disposed on both sides of the transport path. 4. For example, the thin film forming apparatus of the scope of application for a patent, wherein in the process section, the conveying device can move freely along the conveying path, 314408 (Revised version) .ptc Page 43 1234205 6. Application scope of patents __ Coating equipment ^ Consider the conveying path described above, and arrange the film supply device, the printing device of the conveying path, and the peeling device. :: Please use any one of the patent scope 2 丨 to 4 of them, ^ 1 The film of the shell is formed, and the above-mentioned picking and transporting device is borrowed from the right holding unit; the last name is used; The film film and the film holding section and the substrate holding section are moved: and the film film and the substrate driving section are moved; f M is multi-moved to carry the substrate holding section with the arm body. The upper side of the base plate and the upper side material Z cover the lower side of the arm body and the lower side of the arm body to hold the lower side of the substrate and the upper 6. If the scope of patent application is the first! Any of up to 4 $ holding institutions. It further includes: the above-mentioned coating device and the film-forming device, one of the above-mentioned peeling devices, the above-mentioned transfer printing device, and the above-mentioned sheet and film coating device, and a drying device. Drying with coating liquid 7. If the thickness of item 5 in the scope of the patent application is as follows: with the above coating device and above: print / placement, which has more than 8 films on the surface of the above-mentioned film. In order to make the coating ^ such as the film shape of the patent application No. 6 ^ c dry drying device: the above-mentioned transfer device can be placed along / upper surface, where it can be freely arranged in the opposite direction, and in the lower direction Come to each other · Dream & 'One of the Y; Opposite side of the T Xi moving plate 1234205 ο, ... _ Case No. 92103759 丨 ... 7 years' January / Jan. Amendment_ Sixth, the scope of the patent application is to install the substrate, and it is equipped with: a film with a thin film installed on the opposite side of the other plate First and second plates; moving at least one of the first and second plates along the moving direction to the other side to push the substrate and the sheet film for a predetermined time so that the film is transferred to The weighting mechanism of the substrate; and the first and second support bodies described below, which hold the first plate in a manner capable of tilting freely with respect to the moving direction to automatically correct the relative inclination of the second plate with respect to the second plate. Tilt correction mechanism; The drying device is arranged to overlap the transfer device in the up-down direction, and the first support system is arranged to surround the outer periphery of the first plate, and extends in a first direction substantially perpendicular to the moving direction. The first rotation axis is the center, and the first plate is rotatably supported. The second support system is arranged on the outer periphery of the first support to move toward the above. To the first direction and the second direction substantially perpendicular to the second rotational shaft extending to the center, to the first support member is supported to be freely rotatable. 9. The thin film forming device according to item 7 of the scope of the patent application, wherein the above-mentioned transfer device is arranged opposite to each other in a freely movable manner along the up-down direction, and is installed on the opposite side of one of the plates A substrate, further comprising: a first and a second plate in which a sheet having a thin film is installed on the opposite side of the other plate; and at least one of the first and the second plate is moved in the moving direction to On the other side, with 314408 (revised version) .ptc Page 45 1234205 p 7 _ Case No. 92103759 Rev. c / day V_ Application for patent scope Push the substrate and the sheet film for a predetermined time to transfer the film to the above Substrate weighting mechanism; and having the following first and second support bodies, the first plate is held in such a manner as to be able to tilt freely with respect to the moving direction to automatically correct the tilt of the relative tilt with respect to the second plate Correction mechanism; the drying device is overlapped with the transfer device in an up-down direction, and the first support system is arranged to surround the outer periphery of the first plate so as to be in a first direction substantially perpendicular to the moving direction The extended first rotation axis is the center, and the first plate is rotatably supported. The second support system is arranged on the outer periphery of the first support body so as to be substantially perpendicular to the moving direction and the first direction. The second rotation axis extending in the second direction is centered, and the first support body is rotatably supported. 1 0. —The seed film supply mechanism is a film supply mechanism for supplying a thin film using a thin film forming device that forms a thin film on a substrate using a thin film, and includes: a release sheet interposed between the thin films; A film storage box that stores the above-mentioned film film in a state; and removing the release sheet located at the uppermost part of the film storage E from the film storage box so that the release film that is located at the uppermost part of the film storage box is removed Device. 11. The film supply mechanism according to item 10 of the patent application scope, wherein 314408 (revised version) .ptc page 46 1234205 a ,,) _ case number 92103759 / year < month > day amendment _ 6, patent application scope The film storage box can be opened and closed freely to protect the film For the protective cover, a cover opening and closing device for opening and closing the protective cover is further provided. 12. The film supply mechanism according to item 10 or 11 of the scope of patent application, which further includes: a release sheet recovery device for recovering the release sheet removed by the film storage box. 1 3. — Seed film storage box is a film storage box used for a thin film forming device for forming a thin film on a substrate and used to store a sheet film, which includes: It can be stored in a state where a release sheet is interposed between the sheet film and the film. A cassette body of a plurality of sheet films; and a positioning member that is engaged with the peripheral edge portion of the sheet film and the release sheet contained in the cassette body to position the sheet film and the release sheet relative to the E body. 1 4. The film storage box according to item 13 of the scope of patent application, which further includes: It can be installed and opened freely with respect to the box body, and covers the film and the release film contained in the box body from above in the closed state. It is protected, and in the open state, the film film and the release film contained in the box body can be carried out from above by a protective cover. 15. The film storage cassette according to item 13 or 14 of the scope of patent application, wherein the film storage device can be detachably attached to the film forming device. 1 6. A conveying mechanism is a film-forming device that uses a film to form a film, and is used to convey the film, and includes a suction hole provided in an abutting area that abuts the film. Film by hand 314408 (Revised version) .ptc Page 47 1234205 ^. _ Case No. 92103759 Amended / Date _ VI. Patent application scope arm; by connecting the internal space formed inside the above-mentioned membrane arm with the above-mentioned adsorption hole, A blower for exhausting the inside of the internal space so that the sheet film is adsorbed and held on the arm for the film; and the film is adsorbed and held on the arm for the film by the blower; The arm is moved to carry the driving part of the film. 17. The conveying mechanism according to item 16 of the scope of patent application, wherein a thin film is formed on a central portion of the surface of the sheet film, and when the peripheral edge portion of the surface is exposed, the conveying mechanism causes the film to come into contact with the arm of the film. The contact area abuts on the peripheral edge portion of the surface to adsorb and hold the holder. 1 8. A processing device, which is provided with a plurality of processing units, the device includes: a indexing section, a substrate storage S configured to store a substrate, and a substrate to be taken out or stored from the substrate storage box; and a process section configured to have a plurality of The processing unit has a transfer mechanism that holds the substrate from the indexing part and transfers it to a plurality of processing units, wherein the transfer mechanism includes: an arm body; an upper side holding mechanism on the upper side of the arm body maintain 314408 (revised version) .ptc Page 48 1234205 ^^ — 921 ^ 3759 VI. Patent application scope substrate; the lower side holder substrate; and the drive unit, so that the shape of the above-mentioned carrying substrate and the 'and' side are changed at the same time Warranty 19 · Such as the adsorption of the lower side of the above-mentioned lower body of the patent application scope of the mechanism 2 · As of the base holder of the upper side of the above main body of the patent application scope of the transport mechanism. 2 1 · A method of transporting a substrate, and transporting the substrate on the front side of the substrate. The substrate is transported in the state described above. 2 2. If the patent application is covered by the patent, the transfer device will be formed on the formation surface, and the film will be peeled off by the adhesive after the body is sealed. The carrying arm described above is configured to hold the arm body on the lower side of the arm body and move the substrate carrying mechanism in the process section. The two substrates are cut while holding the substrate on the lower side while holding the upper side. The processing device for carrying 18 items, wherein the upper holding mechanism is a holder that sucks and holds the substrate by forming the holes. The processing device according to item 18 or item 19, wherein the work-site-side holding mechanism is configured to mechanically support the substrate by the arm plate supporting member, and includes: holding the base 1 on the upper side of the arm body; The second conveying mode of carrying the substrate under the arm body; and the conveying method according to one of the conveying mode 21 of the base 1 and the second conveying mode, in which the film is transferred to the substrate through a film on the surface of the film. The thin film forms the sheet film and the substrate. The sheet film is transported from the compacting device by a peeling device. 314408 (revised version). Ptc page 49 1234205 case number 92103759 ^ year, month / day amendment 6. Application scope of the patent In the above second conveying mode, the sealed object is transferred from the transfer device to the peeling device, and the above In the first transport mode, the substrate on which the thin film has been formed is carried out by the peeling device. 314408 (revised) .ptc Page 50