TWI230818B - Image display device - Google Patents

Image display device Download PDF

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Publication number
TWI230818B
TWI230818B TW92134100A TW92134100A TWI230818B TW I230818 B TWI230818 B TW I230818B TW 92134100 A TW92134100 A TW 92134100A TW 92134100 A TW92134100 A TW 92134100A TW I230818 B TWI230818 B TW I230818B
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Taiwan
Prior art keywords
substrate
pattern
image display
columnar spacers
display device
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TW92134100A
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Chinese (zh)
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TW200415392A (en
Inventor
Shinji Takasugi
Yasunobu Hiromasu
Yoshiharu Fujii
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Chi Mei Optoelectronics Corp
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Publication of TWI230818B publication Critical patent/TWI230818B/en

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Abstract

The present invention provides an image display device capable of preventing pillar-shaped spacers in the image display device from being fitted into cavity structures during a temporary securing step and a position alignment step. Among the pillar-shaped spacers 3a to 31 formed on an opposed substrate 2, pillar-shaped spacers 3a to 3f are arranged in a pattern B shown by single-dashed lines and pillar-shaped spacers 3g to 31 are arranged in a pattern C shown by double-dashed lines. Pattern A shown by broken lines in Fig. 4 is the projection onto the opposed substrate 2 from the arrangement pattern of the cavity structure formed on an array substrate 1 that is adhered to the opposed substrate 2. Patterns B and C are the patterns formed by parallel displacements of the pattern A only with different distances from each other and/or in different directions. By arranging each of the pillar-shaped spacers on the patterns B and C with an amount more than 1 and less than 2/3 of the total amount, it is possible to reduce the percentage of the pillar-shaped spacers fitted into the cavity structures.

Description

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五、發明說明(1) 一、【發明所屬之技術領域】 本發明係關於藉柱狀間隔物規定基板間隔之影像顯示 裝置’特別是關於預固定過程及對位過程中,可抑制柱狀 間隔物嵌入到孔構造内之影像顯示裝置。 二、【先前技術】 先别技術中,已知有在相向配置的基板之間配置液晶 層,控制該液晶層所含之液晶分子的配向性,以作影像顯 示之影像顯示裝置。因液晶材料之透光率係取決於液晶分 子的配向狀態,控制液晶分子的配向性即可控制液晶之透 光率’利用該特性即可作影像顯示。 阳 第9圖係習知技術的液晶顯示裝置之剖面構造示意 圖。如第9圖,習知構造之液晶顯示裝置具備陣列基^ 101,與陣列基板101相向配置的相向基板1〇2,及封入液 晶材料於陣列基板101與相向基板1〇2間而構成之液晶層 103,而陣列基板1〇1與相向基板1〇2間之距離係藉柱狀曰間 隔物104規定(參照例如專利文獻1。) 陣列基板101具備對應於顯示像素之像素電極1〇5等之 配線構造,具有可對液晶層103供給電位之構造。柱狀 隔物1 0 4即用以保持陣列基板J Μ盥相Α甘, 7干土极興相向基板1〇2 一定,使液晶層103之厚度均勻。如上, 係利用液晶層1G3之光學特性作$像題_ 裝置因 『作衫像顯不,液晶層1 03之厚 度必須均勻。柱狀間隔物1 Q 4将以咸忠^ y υ4係以感先性樹脂等材料形 成,具體而言,係例如以光微影法形成於相向基板102之 1230818 五、發明說明(2) 表面上。 而液晶顯示裝置之組裝過程係,保持陣列基板i 〇 1與 相向基板1 02於特定間隔並貼合後,於陣列基板丨〇 1與相向 基板1 0 2間封入構成液晶層1 〇 3之液晶材料。在此,陣列基 板1 0 1及相向基板1 〇 2因各有對應於顯示像素之配線構造 等,開閉之際須作精密對位。因此,實際的組裝過程中, 首先在陣列基板1 〇 1與相向基板1 0 2相向之狀態下壓合作預 固定後’於水平方向移動陣列基板丨〇 1或相向基板丨〇2對位 後作正式固定。 專利文獻1 曰本專利特開平2-223922號公報(第4頁,第3圖) 三、【發明内容】 然而陣列基板101及相向基板1 〇2預固定後於對位過程 中’柱狀間隔物1 0 4之存在有時會造成問題。具體而言, 預固定後於水平方向移動陣列基板101或相向基板丨〇2之 際’柱狀間隔物1 〇 4妨礙陣列基板1 0 1或相向基板1 0 2之移 動’有對位精度下降之問題。以下說明該問題。 第1 〇圖係,柱狀間隔物1 〇 4嵌入孔構造1 0 9之狀態的示 意、® °如第1 0圖,陣列基板1 〇 1有具開關元件功能之薄膜 電晶體1 0 7,及像素電極1 〇 5。薄膜電晶體1 0 7與像素電極 1 0 5之間配置有平坦化層丨〇 8,像素電極丨〇 5與薄膜電晶體 1 0 7透過鑽設於平坦化層1 0 8之一部份的孔構造1 〇 9作電連 接°於是,為降低產生於像素電極1 〇 5與位在像素電極1 0 5V. Description of the invention (1) 1. [Technical field to which the invention belongs] The present invention relates to an image display device that uses a columnar spacer to specify a substrate interval, and particularly to a pre-fixing process and an alignment process, which can suppress the columnar space. Image display device with objects embedded in the hole structure. 2. [Prior art] In the prior art, it is known to arrange a liquid crystal layer between substrates disposed opposite to each other, and to control the alignment of liquid crystal molecules contained in the liquid crystal layer, to be used as an image display device for image display. Since the light transmittance of a liquid crystal material depends on the alignment state of the liquid crystal molecules, controlling the alignment of the liquid crystal molecules can control the transmittance of the liquid crystal ', which can be used for image display. Fig. 9 is a schematic cross-sectional view of a conventional liquid crystal display device. As shown in FIG. 9, a liquid crystal display device with a conventional structure includes an array substrate 101, an opposite substrate 102 arranged opposite to the array substrate 101, and a liquid crystal configured by sealing a liquid crystal material between the array substrate 101 and the opposite substrate 102. Layer 103, and the distance between the array substrate 101 and the opposing substrate 102 is defined by a columnar spacer 104 (see, for example, Patent Document 1). The array substrate 101 includes pixel electrodes 105 and the like corresponding to display pixels. The wiring structure has a structure capable of supplying a potential to the liquid crystal layer 103. The columnar spacers 104 are used to maintain the array substrate J M and the phase Agan. 7 The dry soil is extremely opposite to the substrate 10 2 to make the thickness of the liquid crystal layer 103 uniform. As mentioned above, the optical characteristics of the liquid crystal layer 1G3 are used to make the image problem. ___________ Device reasons "For shirt images, the thickness of the liquid crystal layer 103 must be uniform. The columnar spacers 1 Q 4 will be formed of Xianzhong ^ y υ4 based on materials such as antecedent resin. Specifically, they will be formed on the opposite substrate 102 by photolithography, for example. 1230818 V. Description of the invention (2) Surface on. The assembling process of the liquid crystal display device is to keep the array substrate i 〇1 and the opposing substrate 102 at a certain interval and attach them, and then seal the liquid crystal constituting the liquid crystal layer 103 between the array substrate 010 and the opposing substrate 102. material. Here, since the array substrate 101 and the opposite substrate 102 each have a wiring structure corresponding to a display pixel, etc., precise alignment is required during opening and closing. Therefore, in the actual assembly process, first, the array substrate 10 and the opposing substrate 102 face each other under pressure and pre-fixed, and then move the array substrate in the horizontal direction or the opposing substrate. Formally fixed. Patent Document 1 Japanese Patent Laid-Open Publication No. 2-223922 (Page 4, Figure 3) 3. [Summary of the Invention] However, the array substrate 101 and the opposite substrate 1 are pre-fixed in the alignment process during the alignment process. The presence of objects 104 can sometimes cause problems. Specifically, when the array substrate 101 or the opposing substrate is moved in the horizontal direction after the pre-fixation, the 'columnar spacer 1 104' prevents the movement of the array substrate 101 or the opposing substrate 102, and alignment accuracy is reduced. Problem. This problem is explained below. Fig. 10 is a schematic diagram of a state in which the columnar spacers 104 are embedded in the hole structure 109. As shown in Fig. 10, the array substrate 1 〇1 has a thin film transistor with a switching element function 107. And pixel electrode 105. A planarization layer is arranged between the thin film transistor 107 and the pixel electrode 105, and the pixel electrode 105 and the thin film transistor 107 are drilled on a part of the planarization layer 108. The hole structure 1 〇9 is electrically connected. Therefore, in order to reduce the generation of the pixel electrode 1 0 5 and the pixel electrode 1 0 5

第10頁 1230818Page 10 1230818

五、發明說明(3) 下層之溥膜電晶體1 〇 7等的配線構造間之寄生電容,平坦 化層1 0 8膜厚須在2至4微米左右,結果孔構造丨〇 9之深度亦 在2至4微米左右。 因陣列基板1 0 1有孔構造1 0 9,預固定過程及對位過程 中有時柱狀間隔物1 〇 4會嵌入孔構造1 〇 9。喪入孔構造1 〇 9 之柱狀間隔物1 〇 4,於水平方向移動陣列基板丨〇 j或相向基 板1 0 2之際,因朝妨礙基板移動之方向施力,以致於對位 過程造成故障。 一般,為保持液晶層1 0 3之厚度均勻,柱狀間隔物! 〇 4 在設計上係避開相向配置之基板表面的孔構造丨〇 9而配 置。但是,預固定過程中,陣列基板1 〇 1與相向基板丨〇 2之 位置關係難以依設計貼合,會有一定的位置滑移,造成柱 狀間隔物1 0 4嵌入孔構造1 0 9。又,預固定過程中即使無柱 狀間隔物1 0 4之嵌入孔構造1 0 9,對位過程中於水平方向移 動陣列基板1 0 1或相向基板1 0 2之際,也會有柱狀間隔物 1 0 4之喪入孔構造1 〇 9,而嵌入後即難以對位。 習知技術的液晶顯示裝置因像素電極1 〇 5、薄膜電晶 體1 〇 7等之配線構造在各顯示像素内構造幾乎相同,孔構 造1 0 9在顯示像素内之位置也大致一定。同樣,柱狀間隔 物1 0 4亦在相向基板1 0 2之内表面上,對應於顯示像素規則 配置。因此,預固定過程或對位過程中一旦柱狀間隔物 1 〇 4成為可嵌入孔構造1 〇 9之位置關係時,幾乎所有多數設 置的柱狀間隔物都嵌入,使對位過程之進行大有困雖。 本發明係鑑於上述習知技術諸問題而完成,其目的在V. Description of the invention (3) The parasitic capacitance between the wiring structures such as the lower-layer silicon film transistor 107, and the planarization layer 108 thickness must be about 2 to 4 microns, so the depth of the hole structure Around 2 to 4 microns. Because the array substrate 101 has a hole structure 10, sometimes the columnar spacer 104 may be embedded in the hole structure 10 during the pre-fixing process and the alignment process. When the columnar spacer 10 of the hole structure 10 is moved in the horizontal direction when the array substrate 丨 0j or the opposite substrate 102 is moved, a force is applied in a direction that obstructs the substrate movement, which causes the alignment process. malfunction. Generally, to keep the thickness of the liquid crystal layer 103 uniform, columnar spacers! 〇 4 It is designed to avoid the hole structure on the surface of the substrates facing each other. However, during the pre-fixing process, the positional relationship between the array substrate 101 and the opposing substrate 1 2 is difficult to fit according to the design, and there will be a certain position slip, causing the columnar spacer 104 to be embedded in the hole structure 10 9. In addition, even if there is no embedded hole structure 1 0 9 of the columnar spacer 104 in the pre-fixing process, there will be a columnar shape when the array substrate 1 0 1 or the opposite substrate 1 102 is moved in the horizontal direction during the alignment process. The spacer structure of the spacer 104 is 109, and it is difficult to align it after embedding. In the conventional liquid crystal display device, the wiring structure of the pixel electrode 105 and the thin film transistor 107 is almost the same in each display pixel, and the position of the hole structure 109 in the display pixel is also approximately constant. Similarly, the columnar spacers 104 are also arranged on the inner surface of the opposing substrate 102, corresponding to the regular arrangement of display pixels. Therefore, once the columnar spacers 104 are in the positional relationship of the embeddable hole structure 10 in the pre-fixing process or the alignment process, almost all of the columnar spacers provided are embedded, which makes the alignment process much larger. There are sleepy though. The present invention has been made in view of the problems of the above-mentioned conventional technologies, and its object is to

1230818 五、發明說明(4) 提供’以枉狀間隔物規定基板間隔之影像顯示装置,在預 固定過程及對位過程中柱狀間隔物的嵌入孔構迭受抑制之 影像顯示裝置。 為達上述目的,申請專利範圍第1項有關之影像顯示 裝置,其特徵係具備: 第一基板,其内表面上具備多數的孔構造,該多數的 孔構造依特定配置圖型配置, 第二基板,與該第一基板相向配置, 液晶層,配置於上述第一基板與第二基板之間,以及 2以上之柱狀間隔物群,係於該第二基板内表面上, 1述多數孔構造配置圖型之投影圖型經不同平行移動之 2型上’各配置1以上、總數的2/3以下之柱狀間隔物而 _ 而「不同平行移動」係指距離及/或方向不同之平行 ^该申請專利範圍第丨項之發明,在第二基板上於上 =孔構造配置圖型之投影圖型經不同平行移動後之各 ’配置1以上、總數的2/3以下之柱狀間隔物,在作 造的i:3 ί 一基板的預固定及對位之際,同時嵌入孔構 礙受到抑:隔物之比率降低,對位過程中對移動基板之妨 中 =專利範圍第2項有關之影像顯示 上j孔構造深1微米以上。 中 数在上述孔構造數的3 / 2倍以1230818 V. Description of the invention (4) Provide an image display device that uses a 枉 -shaped spacer to define the substrate interval, and an image display device in which the embedded hole formation of the columnar spacer is suppressed during the pre-fixing process and the alignment process. In order to achieve the above purpose, the image display device related to item 1 of the scope of patent application is characterized in that: the first substrate has a plurality of hole structures on its inner surface, and the plurality of hole structures are arranged according to a specific layout pattern; A substrate is disposed opposite to the first substrate, and a liquid crystal layer is disposed between the first substrate and the second substrate, and a group of two or more columnar spacers are attached to the inner surface of the second substrate. The projected pattern of the structural configuration pattern is passed on the type 2 of different parallel movements, and the columnar spacers of 1 or more and less than 2/3 of the total number are arranged, and `` different parallel movements '' refers to different distances and / or directions. Parallel ^ The invention in item 丨 of the scope of the patent application, on the second substrate is a columnar shape with a projection pattern of an upper hole configuration pattern after different parallel movements, each having a configuration of 1 or more and 2/3 or less of the total Spacer, during the fabrication of i: 3 til a substrate is fixed and aligned at the same time, the structure of the embedded hole is suppressed at the same time: the ratio of the spacer is reduced, and the obstacle to the moving substrate during the alignment process = the second in the patent scope Related image display The upper j-hole structure is more than 1 micron deep. The median is more than 3/2 times the number of pore structures

第12頁 1230818Page 12 1230818

依該申請專利範圍第3項之發明,配置於第二 的柱狀間隔物個數係上述孔構造數的3/2倍以上,板上 配置圖型配置柱狀間隔物,預固定及對位之際吃Μ住意 之比率可壓低到總數的2 / 3以下。 Τ、瓜孔構造 申請專利範圍第4項有關之影像顯示裝置 中,上述第一基板或第二基板於部份區域±更具攻發明 之穿透的遮光裝置,上述2以上的柱狀間隔物群、,卩制光 在對應於上述遮光區域之區域上。 糸形成 申凊專利範圍第5項有關之影像顯示裝置係上、十、 t,上述陣列基板之每一顯示像素具備:開關元攻發明 在該:關元件上之平坦化層;以及像素電 上形成 素電極與上述開關元件,形成 挺用連接該像 域。 4十一化層之部份區 申睛專利範圍第6項有關之影像顯示裝 :置t述多數之孔構造各設在所屬顯示像素内的Λ發:同 申凊專利範圍第7項有關之影像 中’上述陣列基板具備m其m上述發明According to the invention in the third item of the patent scope of the application, the number of the columnar spacers arranged in the second is more than 3/2 times of the number of the above-mentioned hole structures. The plate is arranged with a pattern to arrange the columnar spacers, pre-fixed and aligned. At this time, the ratio of eating and drinking can be reduced to less than 2/3 of the total. In the image display device related to item 4 of the patent application scope of T and melon structure, the first substrate or the second substrate is located in a part of the area ± a light-shielding device that penetrates the invention, and the above-mentioned columnar spacers are more than 2 The light is grouped on the area corresponding to the light-shielding area. The image display device related to the fifth item of the application patent scope is 、, 、, and t. Each display pixel of the above array substrate is provided with: a switch element to invent the flattening layer on the element; and the pixel is electrically connected. A plain electrode is formed with the above-mentioned switching element, and the image field is connected with a positive electrode. 4 Part of the eleventh layer of the image display device related to the sixth item in the patent scope of Shenyan: the majority of the hole structure is set in the corresponding display pixel. Λ: related to the seventh item in the patent scope In the video, the above-mentioned array substrate includes the above-mentioned invention.

電極供給電位。 其透過上述開關元件對上述像J 申睛專利範圍第8項有關夕旦/ 中’上述陣列基板在上述像Wl像顯示裝置係上述發明 切素電極附近更具備共通電極, 1230818 五、發明說明(6) ί ί ί f 2素電極與上述共通電極間之電位差,對上过、r sa層細加平行於上述陣列基板内表面之電場。 述液 四、【實施方式】 以下參照圖式說明本發明的實施形態之 置。須指出,圖式僅係示意而異於實物。當然像圖= 月匕包含尺寸關係、比率不同之部份。 〇 (實施形態1 ) ^ &首先說明本實施形態1有關之影像顯示裝置。本 形態1有關之影像顯示裝置其構造係,藉形成於相向基= 内表面上的多數柱狀間隔物,規定陣列基板與相向基"板反之 間隔。多數的孔構造係依陣列基板内表面上之特定二置圖 型而存在’形成在相向基板上之多數柱狀間隔物,係配置 於對相向基板表面上孔構造之投影圖型經施以不同平行移 動之2以上圖型上。而配置於各圖型上之柱狀間隔物個數 係調整為1以上、總數的2 / 3以下。將柱狀間隔物配置於該 2以上之圖型上,本實施形態1有關的影像顯示裝置在作陣 列基板與相向基板之預固定及對位時,即可抑制同時敌入 孔構造之柱狀間隔物比率於總數的2/3以下。以下詳細~說 明實施形態1有關之影像顯示裝置。 ° 如第1圖,實施形態1有關之影像顯示裝置具有: 陣列基板1 ’其具備特定配線構造’以及相向基板2,係與 陣列基板1相向配置。其構造係,陣列基板1與相向基板2 之間隔由柱狀間隔物3規定。形成於陣列基板1與相向基板The electrodes supply potential. The above-mentioned array substrate is provided with a common electrode near the above-mentioned slice electrode of the invention through the above-mentioned switching element for the above-mentioned image J. The scope of the patent application No. 8 is related to the above-mentioned image. 1230818 V. Description of the invention ( 6) For the potential difference between the f 2 element electrode and the common electrode, an electric field parallel to the inner surface of the array substrate is applied to the upper and r sa layers.解 液 4. [Embodiment] The following describes the embodiment of the present invention with reference to the drawings. It must be pointed out that the drawings are only schematic and different from the real thing. Of course, like figure = moon dagger contains different dimensions and ratios. (Embodiment 1) First, an image display device according to Embodiment 1 will be described. The structure of the image display device according to this aspect 1 is to define the interval between the array substrate and the opposite substrate by using a large number of columnar spacers formed on the inner surface of the opposite substrate. Most hole structures exist according to a specific two-pattern pattern on the inner surface of the array substrate. Most columnar spacers formed on the opposing substrate are arranged to project different patterns of the hole structure on the surface of the opposing substrate. Move 2 above in parallel. The number of columnar spacers arranged on each pattern is adjusted to 1 or more and 2/3 or less of the total. The columnar spacers are arranged on the pattern of 2 or more. When the image display device according to the first embodiment is used for pre-fixing and alignment of the array substrate and the opposite substrate, the columnar structure of the simultaneous entry hole structure can be suppressed. The spacer ratio is below 2/3 of the total. The video display device according to the first embodiment will be described in detail below. ° As shown in FIG. 1, the image display device according to the first embodiment includes: an array substrate 1 ′, which has a specific wiring structure, and an opposite substrate 2, which are arranged facing the array substrate 1. The structure is such that the distance between the array substrate 1 and the opposing substrate 2 is defined by a columnar spacer 3. Formed on the array substrate 1 and the opposite substrate

第14頁 1230818Page 14 1230818

2間之間隙配置有液晶層4,陣列基板1外表面及相向基板2 之外表面上各配置偏光板5及偏光板6。並且陣列基板1與 液晶層4之界面及相向基板2與液晶層4之界面,各配置^ 定向膜7、定向膜8。 陣列基板1於基板上具備特定配線構造。第2圖係陣列 基板1之構造的俯視圖。陣列基板1如第2圖,具備· 像素電極9 ;共通電極10,其係形成為覆蓋於像素電 件之之二^,薄膜電曰曰體11 ’ *有作為像素電極9的開關元 功此,掃描線1 2,其控制薄膜電晶體丨丨之驅· :二信號線13 ’其透過薄膜電晶體u供給位於;辛 電極9。為供給信號線丨3之電位 ^ f 與薄膜電晶體η電連接,具體而+像素ϋ ’像素電極9 電極9,間透過具接觸孔功能之孔構造“連接。-像素 第3圖係第2圖沿A-A線之剖視圖。如第 體11、掃描線12及信號線13與像+ 圖,溥膜電日日 層18。平坦化層18係用以抑制之,介有平坦化 構造之電位變動對像素電極9的電位 / t㈣等配線 4微米左右。因此,電連接像素衫曰,膜厚須在1至 構造14深1至4微米左右。如第2 : ^》膜電晶體11之孔 每-顯示像素各設電路構造陣列基板1上 狀。因此,形成於陣列基板丨上之 ^ 配置成矩陣 依矩陣狀圖型以規則間隔排列。 k ’、有多數個,並 玆簡單說明第2圖、第3圖之電路 掃描線12供給特定電位於薄 =。首先自 曰M i 1之閘極電極,薄膜A liquid crystal layer 4 is arranged in the gap between the two, and a polarizing plate 5 and a polarizing plate 6 are arranged on the outer surface of the array substrate 1 and the outer surface of the opposing substrate 2 respectively. In addition, the interface between the array substrate 1 and the liquid crystal layer 4 and the interface between the opposing substrate 2 and the liquid crystal layer 4 are each provided with an alignment film 7 and an alignment film 8. The array substrate 1 includes a specific wiring structure on a substrate. FIG. 2 is a plan view of the structure of the array substrate 1. As shown in FIG. As shown in FIG. 2, the array substrate 1 includes a pixel electrode 9 and a common electrode 10 which is formed to cover the second part of the pixel electrical element. The thin-film electrical body 11 ′ has a switching element function as the pixel electrode 9. Scanning line 12 controls the driving of the thin film transistor 丨: two signal lines 13 ′ are provided through the thin film transistor u; In order to supply the potential of the signal line 丨 3 to the thin film transistor η, it is specifically connected to the + pixel ϋ 'pixel electrode 9 and the electrode 9 are connected through a hole structure with a contact hole function.- The third picture of the pixel is the second Figure is a cross-sectional view along the AA line. For example, the first body 11, the scanning line 12, and the signal line 13 and the image +, the diaphragm film is a solar-level layer 18. The planarization layer 18 is used to suppress the potential variation of the planarized structure. The potential / t㈣ of the pixel electrode 9 is about 4 microns. Therefore, to electrically connect the pixel shirt, the film thickness must be 1 to the structure 14 and the depth is about 1 to 4 microns. -Each display pixel is provided with a circuit structure on the array substrate 1. Therefore, ^ formed on the array substrate 丨 are arranged in a matrix arranged at regular intervals in a matrix pattern. K ', there are a plurality, and a brief description of FIG. 2 3, the circuit scanning line 12 supplies a specific electric power at a thin thickness. First, the gate electrode of M i 1 is a thin film.

1230818 五、發明說明(8) 電晶體11成為〇N之狀態。然後對⑽狀態之 信號線13供給特定電位’透了:電-體11由 素電極9寫入特定電位。另一方面電為日曰:二之/道層於像 位,即在像素電極9與共通電極丨〇之間產生電、寫入電 素電極9及共通電極1G係形成於陣列 。因像 :广在陣列基板丨表面的平行方向產生電/,於隨產生, 強度,配置於陣列基板丨上之液晶層所含 = =動作’光自外部穿透透光率起變化之液晶 物3/开柱狀間隔物3之構造及配置圖型。柱狀間隔 其j 板2之内表面丨,具體而言,係於相向 J J2之内表面上塗布感光性樹脂後,&光微影法等圖型 化形成 因此’柱狀間隔物3異於習知球狀間隔物,圖型 化之際調整所用的光罩圖型,即可實現幾乎任何配置圖 型。而本實施形態1之柱狀間隔物,構造不限於上述,具 ,而言,能於基板上形成配置圖型者,均可用作本實施形 也1之柱狀間隔物。 第4圖係相向基板2及相向基板2内表面上之柱狀間隔 物的配置圖型之示意圖。如第4圖’相向基板2之每一顯 示像$具備開口部19a至開口部19r,其餘區域為遮光部2〇 所覆蓋。而相向基板2内表面上之柱狀間隔物3a至柱狀間 隔物3 1,係形成如第4圖。第4圖中所示係,多數虛線區域1230818 V. Description of the invention (8) The state of the transistor 11 becomes 0N. Then, a specific potential is supplied to the signal line 13 in the ⑽ state: the electro-body 11 is written into the specific potential by the element electrode 9. On the other hand, the electricity is Japanese: the second layer / track layer is at the image position, that is, electricity is generated between the pixel electrode 9 and the common electrode, and the writing electrode 9 and the common electrode 1G are formed in the array. Because of the image: a large amount of electricity is generated in the parallel direction of the surface of the array substrate, and the liquid crystal layer arranged on the array substrate is generated with the intensity and intensity of the liquid crystal. 3 / Open columnar spacer 3 structure and configuration pattern. The columnar spacer is the inner surface of the j plate 2. Specifically, after the photosensitive resin is coated on the inner surface of the opposite J J2, patterns such as & photolithography are formed. Therefore, the columnar spacer 3 is different. Knowing the spherical spacer and adjusting the mask pattern used when the pattern is changed, almost any configuration pattern can be realized. The structure of the columnar spacer of the first embodiment is not limited to that described above. For example, anyone who can form a layout pattern on a substrate can be used as the columnar spacer of the first embodiment. Fig. 4 is a schematic view showing the arrangement pattern of the columnar spacers on the inner surface of the opposing substrate 2 and the opposing substrate 2. As shown in FIG. 4 ', each display image of the opposing substrate 2 includes an opening portion 19a to an opening portion 19r, and the remaining area is covered by the light shielding portion 20. The columnar spacers 3a to 31 on the inner surface of the opposing substrate 2 are formed as shown in FIG. The system shown in Figure 4, most dotted areas

12308181230818

所不之圖型A,乃陣列基板丨内表面上所存在的孔構造“之 配置圖型於相向基板2之投影。又,多數單點鏈線區域所 不之圖型B,係經平行移動的孔構造14之投影圖型。而, 多數雙點鏈線區域所示之圖型c,係圖型A僅以與圖型B者 不同之方向及/或不同距離平行移動而得者。、 首先’柱狀間隔物3a至柱狀間隔物3丨,係各避開開口 部19a至開口部i9r,形成於遮光部2〇上。因係配置於開口 部19a至開口部19r上,對位過程中可防柱狀間隔物仏至柱 狀間隔物3 1打亂配置於陣列基板i上的定向膜7之定向性, 致使顯示影像品級下降。 本實施形態1中,柱狀間隔物3a至柱狀間隔物31,係 配置於各孔構造14配置圖型之投影經平行移動之圖型上。 具體而言,柱狀間隔物3a至柱狀間隔物3f,係依圖型B配 置,而柱狀間隔物3g至柱狀間隔物3丨,則係依圖型^配 本實施形態1有關之影像顯示裝£,係依如第4圖之圖 j二相向基板2之内表面上形成有柱狀間隔物3日至柱狀 間隔物31。因依該圖型’預固定過程及對位過程中同時嵌 入孔構造14的柱狀間隔物3之比率壓低到1/2以下,柱狀間 隔物3/斤致阻力之影響受抑制,精密對位成為可能。 第5圖、第6圖係用以說明預固定過程及對位過程中, 列純1上之孔構造14,與形成在相向基板2上的 ,、隔物3之位置關係的示意圖。更具體而言,第5圖表 示孔構U14之配置圖型與第4圖的圖型b之重合狀態,第6The pattern A, which is the configuration pattern of the hole structure existing on the inner surface of the array substrate, is projected on the opposite substrate 2. In addition, the pattern B, which is not included in most single-point chain line regions, is moved in parallel. The projection pattern of the hole structure 14. The pattern c shown in most double-dot chain line areas is obtained by moving the pattern A in parallel only in a direction and / or different distance from the pattern B., First, the columnar spacer 3a to the columnar spacer 3 are formed on the light-shielding portion 20 so as to avoid the opening portion 19a to the opening portion i9r. Because they are arranged on the opening portion 19a to the opening portion 19r, they are aligned. During the process, the columnar spacers 3 to 3 can be prevented from disturbing the orientation of the alignment film 7 arranged on the array substrate i, and the display image quality is reduced. In the first embodiment, the columnar spacers 3a The columnar spacers 31 are arranged on the pattern in which the projection pattern of the arrangement pattern of each hole structure 14 is moved in parallel. Specifically, the columnar spacers 3a to 3f are arranged according to the pattern B. The columnar spacer 3g to the columnar spacer 3 丨 are based on the figure ^ with the image related to this embodiment 1 The display device is a columnar spacer 3 to a columnar spacer 31 formed on the inner surface of the two opposing substrates 2 as shown in FIG. 4. Because of the pattern, the pre-fixing process and the alignment process are performed. At the same time, the ratio of the columnar spacers 3 embedded in the hole structure 14 is reduced to less than 1/2, and the influence of the resistance caused by the columnar spacers 3 / kg is suppressed, and precise alignment is possible. Figures 5 and 6 are for Schematic diagram illustrating the positional relationship between the hole structure 14 on the column 1 and the spacer 3 formed on the opposite substrate 2 during the pre-fixing process and the alignment process. More specifically, FIG. 5 shows the hole structure U14 The overlapping pattern of the configuration pattern and the pattern b in FIG. 4

第17頁 1230818Page 17 1230818

圖表示孔構造14之配置圖型與第4圖的圖型c之重合狀能。 首先,就預固定過程及對位過程中,陣列基板丨與 向基板2的位置關係成第5圖之狀態者作說明。第5圖^ 態下,因第4圖之圖型B與孔構造14的配置圖型重合,狀 間隔物3a至柱狀間隔物3f同時嵌入孔構造丨4a至孔構造 之任一。柱狀間隔物3a至柱狀間隔物3f,係在相向基^板/ 内表面上,各形成於孔構造14之配置圖型經平行移&的 型B上。因此,在如預固定過程及對位過程中,陣列基板工 與相向基板2之對位尚未完成之階段,圖型β與孔構造之 配置圖,型會係一致,此時形成在圖型B上之所有柱狀間隔 物3a至柱狀間隔物3f均嵌入於孔構造。 另一方面,柱狀間隔物3g至柱狀間隔物3丨,如第5 圖,不嵌入孔構造14a至孔構造14r之任一。如上,柱狀間 隔物3g至柱狀間隔物31,係形成在施以與圖型B不同之平曰 行移動的圖型c上。因此,圖型B與孔構造14之配置圖型在 重合狀態下,柱狀間隔物3g至柱狀間隔物3丨係位於孔構造 1 4之配置圖型以外。因此,陣列基板i與相向基板2成第5 圖的位置關係時,嵌入孔構造14a至孔構造Hr之任一的柱 狀間隔物3個數,乃總數之半。 其次,明陣列基板1與相向基板2成第6圖的位置關係 之情況。第6圖之狀態係柱狀間隔物仏至柱狀間隔物3丨嵌 入孔構造14a至孔構造i4r之任一,而柱狀間隔物仏至柱狀 間隔物W則不嵌入孔構造14a至孔構造14r之任一。第6圖 之It況係’陣列基板1及相向基板2之位置能使孔構造丨4aThe figure shows the overlapping shape of the arrangement pattern of the hole structure 14 and the pattern c of FIG. 4. First, the positional relationship between the array substrate 丨 and the orientation substrate 2 in the pre-fixing process and the alignment process will be described with reference to FIG. 5. In the state of FIG. 5, since the layout pattern of the pattern B in FIG. 4 coincides with the configuration pattern of the hole structure 14, the spacers 3 a to 3 f are simultaneously embedded in any one of the hole structure 4 a to the hole structure. The columnar spacers 3a to 3f are formed on the opposing substrate / inner surface, and each is formed on the pattern B in which the arrangement pattern of the hole structure 14 is shifted in parallel & Therefore, in the pre-fixing process and the alignment process, the alignment of the array substrate and the opposing substrate 2 has not yet been completed. The pattern β and the hole structure are arranged in the same pattern. At this time, it is formed in pattern B. All of the columnar spacers 3a to 3f above are embedded in the pore structure. On the other hand, as shown in FIG. 5, the columnar spacer 3 g to the columnar spacer 3 丨 do not fit any of the hole structure 14 a to the hole structure 14 r. As described above, the columnar spacer 3g to the columnar spacer 31 are formed on the pattern c to which the horizontal movement different from the pattern B is applied. Therefore, in the overlapping pattern of the pattern B and the hole structure 14, the columnar spacer 3g to the columnar spacer 3 are located outside the configuration pattern of the hole structure 14. Therefore, when the array substrate i and the opposing substrate 2 are in the positional relationship shown in Fig. 5, the number of three columnar spacers embedded in any one of the hole structure 14a to the hole structure Hr is half of the total number. Next, the case where the array substrate 1 and the opposing substrate 2 are in the positional relationship shown in Fig. 6 will be described. The state of FIG. 6 is that the columnar spacer 仏 to the columnar spacer 3 丨 embed any one of the pore structure 14a to the pore structure i4r, and the columnar spacer 仏 to the columnar spacer W are not embedded in the pore structure 14a to the hole Structure any of 14r. It is shown in FIG. 6 that the positions of the array substrate 1 and the opposing substrate 2 enable the hole structure. 4a

1230818 五、發明說明(11) 至孔構造14r之配置圖型,與圖型C重合。因此,形成於圖 型C上之柱狀間隔物3g至柱狀間隔物3 1嵌入孔構造1 4,而 形成於與圖型C不同的圖型B上之柱狀間隔物3a至柱狀間隔 物3 f,則位在孔構造1 4a至孔構造1 4r之配置區域以外。 預固定過程及對位過程中,因陣列基板1與相向基板2 幾乎係成任意位置關係,亦可成為第5圖、第6圖之狀態以 外的位置關係。如此之位置關係下,所有柱狀間隔物3 a至 柱狀間隔物3 1均位在孔構造1 4外部,任一柱狀間隔物均不 嵌入孔構造1 4。 如已說明,陣列基板1上孔構造1 4之配置,及相向基 板2上柱狀間隔物3之配置,已設計成不會如以往之於正式 固疋時互相重合,正式固定後影像顯示裝置之柱狀間隔物 3的頂部不嵌入孔構造1 4。然而,陣列基板1及相向基板2 在經預固定之階段及對位當中,因尚未正確定位,可能會 有部份柱狀間隔物3嵌入孔構造1 4。因此,本實施形態j有 關之影像顯示裝置,係以在預固定過程及對位過程中,柱 狀間隔物3之一部份嵌入孔構造14為前提,並將同時喪入 之柱狀間隔物3的比率壓低至一定值以下,即可於對位過 程中’壓低柱狀間隔物3欲入孔構造1 4所生阻力之值至實 用上不造成問題之程度。 具體而言,乃規定柱狀間隔物3形成位置之分布,以 於預固定過程及對位過程中,使嵌入孔構造丨4之柱狀間隔 物3的個數占柱狀間隔物3總數的2 / 3以下,更佳者為1 / 2 Z 下。散入之柱狀間隔物3的量並非針對絕對值,而係以占1230818 V. Description of the invention (11) The layout pattern of the hole structure 14r coincides with the pattern C. Therefore, the columnar spacer 3g to the columnar spacer 31 formed on the pattern C is embedded in the hole structure 14, and the columnar spacer 3a to the columnar spacer is formed on the pattern B different from the pattern C. The object 3 f is located outside the arrangement area of the hole structure 14 a to the hole structure 14 r. In the pre-fixing process and the alignment process, since the array substrate 1 and the opposing substrate 2 are almost in any positional relationship, they can also be in a positional relationship other than those shown in Figs. 5 and 6. In this positional relationship, all of the columnar spacers 3 a to 31 are located outside the pore structure 14, and any of the columnar spacers are not embedded in the pore structure 14. As already explained, the arrangement of the hole structure 14 on the array substrate 1 and the arrangement of the columnar spacers 3 on the opposite substrate 2 have been designed so that they will not overlap with each other when they are officially fixed, and the image display device after the official fixation The top of the columnar spacer 3 is not embedded in the hole structure 1 4. However, during the pre-fixed stage and alignment of the array substrate 1 and the opposite substrate 2, some columnar spacers 3 may be embedded in the hole structure 14 because they have not been positioned correctly. Therefore, the image display device according to this embodiment j is based on the premise that a part of the columnar spacer 3 is embedded in the hole structure 14 during the pre-fixing process and the alignment process, and the columnar spacer will be lost at the same time. When the ratio of 3 is reduced to a certain value or less, the value of the resistance caused by the columnar spacer 3 to enter the hole structure 14 during the alignment process can be reduced to a level that does not cause problems in practice. Specifically, the distribution of the formation positions of the columnar spacers 3 is specified so that the number of the columnar spacers 3 embedded in the hole structure 4 accounts for the total number of the columnar spacers 3 in the pre-fixing process and the alignment process. Below 2/3, more preferably 1/2 Z. The amount of scattered columnar spacers 3 is not for absolute values, but for

第19頁 1230818 五、發明說明(12) 總數的比率作規定,其理由如下。 預固定過程及對位過程中,於陣列基板丨與相向基板2 的接近方向施加有壓力,具體而言即,造成柱狀間隔物3 之末端與陣列基板1之表面互相抵接之狀態。於是,嵌入 孔構造1 4之柱狀間隔物3亦在施加有壓力之狀態下,對位 過程中產生之阻力已知隨該壓力變大。另一方面,預固定 過程及對位過程中,壓力係大致均勻施加於陣列基板丨及 相向基板2的整個表面,施加於每一柱狀間隔物3之壓力, 即總壓力除以柱狀間隔物3之個數的值。因此,對位過程 中,起因於嵌入孔構造14之柱狀間隔物3的阻力,並非隨 :入之個數的絕對值,而係隨嵌入個數對柱狀間隔物3總 數之比的增加而變大。基於該見解,本發明人等發現,同 時嵌入之柱狀間隔物3的個數對柱狀間隔物3總數的比在 2/3以下時,m力可壓低到對位過程中實際上不成問題之 程度,並完成可得該比之構造。 而以本實施形態丨之配置形成柱狀間隔物3時,製造上 住!雜。如上,柱狀間隔物3係於相向基板2内表 感光:樹脂等形成膜構造後,經光微影法形 γϊ 形態'1之配置’仔細選用光微影的光 =圖型即可,所用材料、製程等可係_如以往。因此,本 實施形態1有關之影像顯示裝置有,製造上 可作精密對位之優點。 小θ力負擔 (變化例) 其次說明本實施形態i有關之影像顯示裝置的變化 第20頁 1230818 五、發明說明(13) 例。第7圖示變化例有關之影像顯示裝置,其形成於相向 基板2内表面上之柱狀間隔的配置圖型。變化例有關之影 像顯示裝置係如第7圖,柱狀間隔物21a至柱狀間隔物211 滿足實施形態1之條件,兩兩成對形成於相向基板2上。在 此各對之配置位置可係隨意,而本變化例中係形成如同習 知技術的一般柱狀間隔物配置之柱狀間隔物對。 如由第7圖可知,本變化例中,對於虛線區域之孔構 造1 4的配置圖型之投影圖型,柱狀間隔物2丨a、2 1 c、Page 19 1230818 V. Description of the invention (12) The ratio of the total is prescribed for the following reasons. During the pre-fixing process and the alignment process, pressure is applied in the approach direction of the array substrate 丨 and the opposite substrate 2, specifically, the end of the columnar spacer 3 and the surface of the array substrate 1 are brought into contact with each other. Therefore, the columnar spacer 3 embedded in the hole structure 14 is also under pressure, and the resistance generated during the alignment process is known to increase with the pressure. On the other hand, during the pre-fixing process and the alignment process, the pressure is applied approximately uniformly to the entire surface of the array substrate and the opposing substrate 2, and the pressure applied to each columnar spacer 3, that is, the total pressure divided by the columnar interval The value of the number of objects 3. Therefore, in the alignment process, the resistance caused by the columnar spacers 3 embedded in the hole structure 14 does not depend on the absolute value of the number of inserts, but increases with the ratio of the number of embedded spacers to the total number of columnar spacers 3. And get bigger. Based on this knowledge, the inventors have found that when the ratio of the number of the columnar spacers 3 embedded to the total number of the columnar spacers 3 is less than 2/3 at the same time, the m force can be reduced to practically no problem during the alignment process. Degree, and complete the structure that can get the ratio. When the columnar spacers 3 are formed in the arrangement of this embodiment 丨, the manufacturing process will be carried out! miscellaneous. As described above, the columnar spacer 3 is formed on the inner surface of the opposite substrate 2. After the film structure of the resin and the like is formed, the light lithography method is used to shape the γϊ configuration '1'. The light lithography light = pattern can be used carefully. Materials, processes, etc. can be as before. Therefore, the image display device according to the first embodiment has the advantage that it can be precisely aligned in manufacture. Small θ force load (change example) Next, the change of the image display device related to the embodiment i will be described. Page 20 1230818 V. Description of the invention (13) Example. Fig. 7 shows an image display device according to a modified example, which is an arrangement pattern of columnar spaces formed on the inner surface of the opposing substrate 2. The image display device according to the modification is as shown in FIG. 7. The columnar spacers 21a to 211 satisfy the conditions of the first embodiment, and are formed in pairs on the opposing substrate 2. The arrangement position of each pair may be arbitrary, and in this modification, a pair of columnar spacers is formed as a general columnar spacer arrangement as in the conventional technique. As can be seen from FIG. 7, in this modification, for the projection pattern of the layout pattern of the hole structure 14 in the dotted area, the columnar spacers 2 丨 a, 2 1 c,

2 1 e、2 1 g、2 11、2 1 k係屬於經特定平行移動之圖型,柱狀 間隔物21b、21d、21f、21h、21j、211則屬於經不同平行 移動之圖型。而本變化例中柱狀間隔物之截面積係約為以 往一般所用柱狀間隔物的截面積之半。 亦即’本變化例之構造係形成柱狀間隔物21於,孔構 造14的配置圖型經施以不同於投影圖型之平行移動的多數 圖型上。因此,如同實施形態丨,預固定過程及對位過程 中’嵌入孔構造1 4的柱狀間隔物之比率受抑制,可免於在 對位過程中產生問題。2 1 e, 2 1 g, 2 11, 2 1 k belong to the pattern with specific parallel movement, and columnar spacers 21b, 21d, 21f, 21h, 21j, and 211 belong to the pattern with different parallel movement. The cross-sectional area of the columnar spacer in this modification is about half of the cross-sectional area of the conventional columnar spacer. That is, the structure of this modification example forms columnar spacers 21, and the arrangement pattern of the hole structure 14 is applied to a plurality of patterns that move in parallel to the projection pattern. Therefore, as in the embodiment 丨, the ratio of the columnar spacers of the 'embedded hole structure 14' in the pre-fixing process and the alignment process is suppressed, thereby avoiding problems in the alignment process.

又’本變化例係於習知構造中柱狀間隔物之配置位 置’配置2個截面積一半的柱狀間隔物,巨觀下柱狀間隔 物之分布可視為大致如同習知影像顯示裝置。因此,於完 成後之影像顯示裝置採用經以基板間的加權分布等作最適 化的習知柱狀間隔物配置,完成後之影像顯示裝置,即可 得與以往同等之特性。 本來柱狀間隔物之配置圖型,乃須考慮完成後影像顯Also, "this variation is based on the arrangement position of the columnar spacers in the conventional structure", and two columnar spacers having a half cross-sectional area are arranged. The distribution of the columnar spacers under the macro view can be regarded as approximately the same as the conventional image display device. Therefore, the completed image display device adopts a conventional columnar spacer arrangement optimized by using a weighted distribution between the substrates, and the completed image display device can have the same characteristics as before. The layout pattern of the columnar spacers must be taken into account after the image is completed.

第21頁 1230818 五 不,置之特性而定。因此,配置柱狀間隔物使之滿足實施 =態\的條件時,於依該條件完成後之影像顯示裝置而 口 ,係成最適柱狀間隔物配置圖型之設計,有時設計繁 雜。本變化例中,對截面積為習知一半的柱狀間隔物y因 係依白知圖型配置,設計上不增加負擔,有能依滿足實施 形態1的條件之配置圖型實現影像顯示裝置之優點。 (實施形態2) 其次說明實施形態2有關之影像顯示裝置。實施形態2 有關之影像顯示裝置係形成為,規定陣列基板與相向基板 之間隔的柱狀間隔物個數在,陣列基板上之孔構造數的 3/2倍以上。以該構造,預固定過程及對位過程中,同時 後入孔構造之柱狀間隔物占總數的比率即抑制於2/3以 下而本實施形態2有關之影像顯示裝置的基本構造與實 施形態1者同,僅只柱狀間隔物之配置樣態與實施形態1有 關之影像顯示裝置不同。因此,以下說明柱狀間隔物之配 置圖型及形成該配置圖型之優點。 第8圖係本實施形態2有關之影像顯示裝置中,柱狀間 隔物的配置圖型之示意圖。而第8圖中,虛線區域之圖型 如同第4圖’係存在於陣列基板上的孔構造之配置圖型的 投影圖型。實施形態2有關之影像顯示裝置,如第8圖,形 成有顯示像素數的3/2倍之柱狀間隔物3。形成柱狀間隔物 2 2之材料及形成方法與實施形態1同。 本實施形態2中,如第8圖’柱狀間隔物2 2之配置圖型 無特殊控制,多數的柱狀間隔物係所謂隨機配置。以下說Page 21 1230818 Five No, it depends on the characteristics. Therefore, when the columnar spacers are arranged so as to satisfy the conditions of the implementation = state \, the image display device after the completion of the conditions is a design of the optimal columnar spacer layout pattern, and sometimes the design is complicated. In this modification, the columnar spacer y having a cross-sectional area of half of the conventional arrangement is arranged in accordance with a known pattern, and does not increase the burden on the design. There is an image display device that can be implemented according to a configuration pattern that satisfies the conditions of Embodiment 1. Advantages. (Embodiment 2) Next, an image display device according to Embodiment 2 will be described. The image display device according to the second embodiment is formed such that the number of columnar spacers defining the interval between the array substrate and the opposing substrate is 3/2 times or more the number of hole structures on the array substrate. With this structure, in the pre-fixing process and the alignment process, the ratio of the total number of columnar spacers in the simultaneous post-hole structure to the total number is suppressed to less than 2/3. The basic structure and implementation form of the image display device related to this embodiment 2 1 is the same, only the arrangement of the columnar spacers is different from the image display device related to the first embodiment. Therefore, the arrangement pattern of the columnar spacers and the advantages of forming the arrangement pattern will be described below. Fig. 8 is a schematic diagram showing the arrangement pattern of columnar spacers in the image display device according to the second embodiment. In Fig. 8, the pattern of the dotted area is the same as that of Fig. 4 ', which is a projection pattern of the arrangement pattern of the hole structure on the array substrate. The image display device according to the second embodiment, as shown in Fig. 8, is formed with a columnar spacer 3 which is 3/2 times the number of display pixels. The material and method for forming the columnar spacers 22 are the same as those in the first embodiment. In the second embodiment, the arrangement pattern of the columnar spacers 22 as shown in FIG. 8 is not particularly controlled, and most of the columnar spacers are so-called randomly arranged. The following says

第22頁 1230818 五、發明說明(15) ' ' 明,本實施形態2有關之影像顯示裝置中,嵌入於孔構造 的柱狀間隔物不造成對位過程之妨礙的因素。 如上’本實施形態2有關之影像顯示裝置中,於相向 基板2之内表面上形成有個數為孔構造丨4的3/2倍以上之柱 狀間隔物22。而預固定過程及對位過程中,同時嵌入孔構 造1 4之柱狀間隔物2 2的最大個數取決於孔構造丨4之個數, 不會有孔構造14個數以上之柱狀間隔物22嵌入孔構造14。 因此,如本實施形態2之形成多於孔構造14之柱狀間隔物 22時,不可能所有的柱狀間隔物22都嵌入孔構造14,即使 所有的孔構造14都有柱狀間隔物22嵌入時,仍有一定個數 之柱狀間隔物2 2未嵌入孔構造1 4。尤以本實施形態2中, 因柱狀間隔物22係形成為孔構造14之個數的3/2倍以上, 即使例如所有孔構造14都被柱狀間隔物22嵌入時,嵌入之 柱狀間隔物22占總個數之比率亦在2/3以下。因此,\入 之柱狀間隔物22事實上無妨於對位過程,而可作精密對 位0 從f它觀點作考量,本實施形態2有關之影像顯示裝 置中,藉柱狀間隔物2 2個數的調整,即可說明柱狀間隔物 2 2之自動滿足實施形態1中之條件。亦即可以解釋,本實 施形態2中,任意配置柱狀間隔物22,亦能成為配置在孔 構造14之配置圖型的投影圖型經平行移動之多數圖型上。 以下說明,本實施形態2中柱狀間隔物2 2的配置滿足實施 極端例係假設,柱狀間隔物22中,僅以等於孔構造j 4Page 22 1230818 V. Description of the invention (15) '' It is clear that in the image display device according to the second embodiment, the columnar spacers embedded in the hole structure do not hinder the alignment process. As described above, in the image display device according to the second embodiment, the columnar spacers 22 having a number of 3/2 times or more the hole structure 4 are formed on the inner surface of the opposing substrate 2. In the pre-fixing process and the alignment process, the maximum number of columnar spacers 22 embedded in the hole structure 14 at the same time depends on the number of the hole structure and the number of columnar spacers with no more than 14 holes.物 22 Embedded in the hole structure 14. Therefore, if more columnar spacers 22 are formed than the hole structure 14 in the second embodiment, it is impossible for all the columnar spacers 22 to be embedded in the hole structure 14, even if all the hole structures 14 have columnar spacers 22. At the time of embedding, a certain number of columnar spacers 2 2 were not embedded in the hole structure 1 4. Especially in the second embodiment, since the columnar spacer 22 is formed to be 3/2 times or more of the number of the hole structures 14, even when, for example, all the hole structures 14 are embedded by the columnar spacers 22, the columnar spacers are embedded. The ratio of the spacer 22 to the total number is also less than 2/3. Therefore, in fact, the columnar spacer 22 can be used for the alignment process, but it can be precisely aligned. From the viewpoint of f, it is considered. In the image display device related to this embodiment 2, the columnar spacer 22 is used. By adjusting the number, it can be explained that the columnar spacers 22 and 2 automatically satisfy the conditions in the first embodiment. That is, it can be explained that in the second embodiment, the arbitrary arrangement of the columnar spacers 22 can also become the majority of the patterns of the projection pattern arranged on the arrangement pattern of the hole structure 14 by parallel movement. It will be described below that the arrangement of the columnar spacers 22 in the second embodiment satisfies the implementation. The extreme example assumes that in the columnar spacers 22, only the hole structure j 4

1230818 五、發明說明(16) " ' ' ^ 數之個數配置於,孔構造丨4之投影圖型僅經特定距離平、 移動的第一圖型上,其餘柱狀間隔物22配置於經不同距2 及/或方向平行移動的第二圖型上。本實施形態2中,杈 間隔物22之個數因在孔構造14數的3/2倍以上,配置於第 一圖型上之柱狀間隔物2 2個數孔構造1 4數)即在總數的 2 / 3以下。因此’該配置於第一圖型上之柱狀間隔物2 2, 滿足實施形態1的條件。於是,配置於第二圖型上之柱狀 間隔物22,因係配置於第一圖型上者以外,配置個數即占 總數的1 / 3以下。因此,配置於第二圖型上之柱狀間隔物 2 2 ’亦滿足實施形態1的條件。 柱狀間隔物2 2之配置實際上並非依如上次序,而係散 乱配置各柱狀間隔物2 2。因此,實際上柱狀間隔物2 2係配 置於多數圖型上,同時嵌入孔構造1 4之柱狀間隔物比率更 低於上述例,對位過程中產生之阻力值亦更小。 以上’已藉實施形態1及實施形態2說明本發明之内 容’但本發明不限於上述内容,相關業者應可想出種種實 施例、變化例等。例如,實施形態1及實施形態2中,乃將 柱狀間隔物形成於相向基板2之内表面上,但亦可係形成 於陣列基板1上。相向基板2内表面上因亦可有孔構造存 在’抑制嵌入該孔構造之柱狀間隔物比率,即可防嵌入之 柱狀間隔物於對位過程中造成妨礙,可作精密對位。 又’實施形態1及實施形態2中,孔構造係以具有用以 電連接像素電極9與薄膜電晶體11之通孔的功能者為例, 然此至多僅係例示,亦可考慮利用其它孔構造之配置圖1230818 V. Description of the invention (16) " '^ The number is arranged in the hole structure. The projection pattern of 4 is only on the first pattern that is flat and moved by a certain distance, and the remaining columnar spacers 22 are arranged in On a second pattern that moves in parallel at different distances 2 and / or directions. In the second embodiment, since the number of the branch spacers 22 is 3/2 times or more of the number 14 of the hole structure, the columnar spacers 2 arranged on the first pattern 2 (the number of the hole structure 1 4) are in Less than 2/3 of the total. Therefore, the columnar spacers 22 arranged on the first pattern satisfy the conditions of the first embodiment. Therefore, the number of the columnar spacers 22 arranged on the second pattern is less than 1/3 of the total number because they are arranged on the other than the first pattern. Therefore, the columnar spacer 2 2 'disposed on the second pattern also satisfies the conditions of the first embodiment. The arrangement of the columnar spacers 22 is actually not in the same order as above, but the columnar spacers 22 are arranged randomly. Therefore, in fact, the columnar spacers 2 and 2 are arranged on most patterns, and the ratio of the columnar spacers embedded in the hole structure 14 is lower than the above example, and the resistance value generated during the alignment process is also smaller. The contents of the present invention have been described above with reference to the first embodiment and the second embodiment. However, the present invention is not limited to the above-mentioned contents, and various related industries should be able to come up with various embodiments and modifications. For example, in the first and second embodiments, the columnar spacers are formed on the inner surface of the opposing substrate 2, but they may be formed on the array substrate 1. Since there can also be a hole structure on the inner surface of the opposing substrate 2, the ratio of the columnar spacers embedded in the hole structure can be suppressed, so that the embedded columnar spacers can be prevented from causing obstacles in the alignment process and can be precisely aligned. Also, in Embodiment 1 and Embodiment 2, the hole structure is exemplified by a function having a through hole for electrically connecting the pixel electrode 9 and the thin-film transistor 11. However, this is at most an example, and other holes may be considered for use. Configuration diagram

第24頁 1230818 五、發明說明(17) 型。例如,形成MVA型液晶顯示裝置時,為控制液晶分子 之傾斜角,有時於陣列基板内表面或相向基板内表面設凹 凸構造。為抑制該柱狀間隔物之嵌入該凹凸,可以採用本 發明。又’實施形態丨及實施形態2係以於每一顯示像素規 則没有孔構造者作說明,但本發明之適用範圍不限於此, 亦可具隨機配置之孔構造。孔構造以任一圖型設置時,均 了把握孔構造之配置圖型,並對投影圖型施以不同平行移 動成多數圖型,於其上配置特定比率的柱狀間隔物,即可 獲致本發明之優點。 而孔構造1 4配置圖型之投影圖型經平行移動之圖型個 數’實施形悲1中係為2,但若係2以上,可配置柱狀間隔 物3於任意數之圖型上。形成於各圖型上之柱狀間隔物3個 數係1以上’並可係柱狀間隔物3總數的2 / 3以下之任意 數。例如’亦可準備等於柱狀間隔物3的個數之圖型,於 各圖型上各配置一柱狀間隔物3。該構造下,預固定過程 及對位過程中,因同時僅單一柱狀間隔物嵌入孔構造丨4, 對位過程中所生之阻力幾可忽略。 形成於相向基板2内表面上之柱狀間隔物3的總數,於 本發明中無限定之必要。柱狀間隔物3之個數取決於形成 柱狀間隔物3之材料、柱狀間隔物3截面積及高度、以及正 式固定時所施加之壓力等。使用目前所用材料時,柱狀間 隔物3總數一般係在顯示像素個數的1 / 3至1 / 7左右,採用 本發明時亦可係另外的總個數。 本發明亦適用於例如,配置像素電極、共通電極於不Page 24 1230818 V. Description of the invention (17). For example, when forming an MVA liquid crystal display device, in order to control the tilt angle of liquid crystal molecules, a concave-convex structure may be provided on the inner surface of the array substrate or the inner surface of the opposite substrate. In order to prevent the columnar spacer from being embedded in the unevenness, the present invention can be adopted. Also, Embodiment Mode 2 and Embodiment Mode 2 are described in the case where there is no hole structure for each display pixel rule, but the scope of application of the present invention is not limited to this, and may also have randomly arranged hole structures. When the hole structure is set in any pattern, the layout pattern of the hole structure is grasped, and the projected pattern is moved in parallel to form a majority pattern, and a columnar spacer of a specific ratio is arranged on the pattern to obtain the result. Advantages of the invention. The number of the projected patterns of the hole structure 14 layout pattern after parallel movement is 2 in the implementation form 1, but if it is 2 or more, the columnar spacer 3 can be arranged on the arbitrary number of patterns. . The number of the three columnar spacers formed on each pattern is 1 or more 'and may be any number that is less than 2/3 of the total number of the columnar spacers 3. For example, a pattern equal to the number of columnar spacers 3 may be prepared, and one columnar spacer 3 may be arranged on each pattern. In this structure, during the pre-fixing process and the alignment process, because only a single columnar spacer is embedded in the hole structure at the same time, the resistance generated during the alignment process is negligible. The total number of the columnar spacers 3 formed on the inner surface of the opposing substrate 2 is not necessarily limited in the present invention. The number of the columnar spacers 3 depends on the material forming the columnar spacers 3, the cross-sectional area and height of the columnar spacers 3, and the pressure applied during the formal fixing. When using currently used materials, the total number of columnar spacers 3 generally ranges from about 1/3 to 1/7 of the number of display pixels, and other total numbers can also be used when the present invention is used. The present invention is also applicable to, for example, arranging a pixel electrode and a common electrode

第25頁 1230818Page 25 1230818

發明說明(18) 同基板上’對液晶層施加基板垂直方向之電場。除所謂平 面内切換(In〜Piane —Switching)型影像顯示裝置以外,本 發明亦適用於形成柱狀間隔物於其一基板,於另一基板上 有特定配置圖型之所有影像顯示裝置。 如以上說明,根據本發明,於第二基板上,孔構造配 置圖型之投影圖型經施以不同平行移動之圖型上各配置玉 以上,總數的2/3以下的柱狀間隔物,在第一基板與第二 基板之預固定過程及對位過程中,可達降低同時嵌入孔構 造之柱狀間隔物的比率,能抑制對位過程中移動基板時的 阻礙之效果。 ' 又,根據本發明,配置於第二基板上之柱狀間隔物個 數係在孔構造數的3 / 2倍以上,以任意配置圖型配置柱狀 間隔物,在預固定過程及對位過程中,可達抑制嵌 造之比率於總數的2/3以下之效果。 入Description of the invention (18) The same as the substrate ', an electric field in a direction perpendicular to the substrate is applied to the liquid crystal layer. In addition to the so-called In-Piane-Switching image display device, the present invention is also applicable to all image display devices in which a columnar spacer is formed on one substrate and another substrate has a specific layout pattern. As explained above, according to the present invention, on the second substrate, the projection patterns of the hole structure arrangement pattern are arranged on the pattern with different parallel movements, each of which is more than two thirds of the columnar spacer, and During the pre-fixing process and the alignment process of the first substrate and the second substrate, the ratio of the columnar spacers simultaneously embedded in the hole structure can be reduced, and the effect of hindering the movement of the substrate during the alignment process can be suppressed. 'Furthermore, according to the present invention, the number of the columnar spacers arranged on the second substrate is more than 3/2 times the number of the hole structure. The columnar spacers are arranged in an arbitrary layout pattern, and the pre-fixing process and the alignment are performed. In the process, the effect of suppressing the embedding ratio to less than 2/3 of the total can be achieved. Into

第26頁 1230818 圖式簡單說明 五 圖 【圖式簡單說明】 第1圖實施形態1有關之影像顯示裝置的全體構造示意 第2圖說明陣列基板上的配線構造之俯視圖。 第3圖第2圖沿A ~ A線之剖視圖。 第4圖說明形成於相向基板内表面上之柱狀間隔物的 配置圖型之俯視圖。 第5圖預固定過程及對位過程中陣列基板與相向基板 的位置關係之一例的示意圖。 第6圖預固定過程及對位過程中陣列基板與相向基板 的位置關係之另一例的示意圖。 第7圖說明實施形態1之變化例有關的影像顯示裝置 中,相向基板上柱狀間隔物配置圖型之俯視圖。 第8圖說明實施形態2有關的影像顯示裝置中,相向基 板上柱狀間隔物配置圖型之俯視圖。 第9圖習知技術有關之影像顯示裝置的構造剖視圖。 第1 0圖習知技術有關之影像顯示裝置在預固定過程或 對位過程中,柱狀間隔物嵌入孔構造之狀態的示意圖。 元件符號說明: 1、 1 01陣列基板 2、 1 0 2相向基板 3a至31、21a至211、22、104柱狀間隔物Page 26 1230818 Brief description of the drawings Five drawings [Simplified description of the drawings] Fig. 1 shows the overall structure of the image display device related to the first embodiment. Fig. 2 is a plan view illustrating the wiring structure on the array substrate. Figure 3 is a cross-sectional view taken along line A ~ A of Figure 2. Fig. 4 is a plan view showing the arrangement pattern of the columnar spacers formed on the inner surface of the opposing substrate. Fig. 5 is a schematic diagram showing an example of the positional relationship between the array substrate and the opposing substrate during the pre-fixing process and the alignment process. Fig. 6 is a schematic diagram of another example of the positional relationship between the array substrate and the opposing substrate during the pre-fixing process and the alignment process. Fig. 7 is a plan view illustrating an arrangement pattern of columnar spacers on an opposing substrate in an image display device according to a modification of the first embodiment. Fig. 8 is a plan view showing an arrangement pattern of columnar spacers facing the substrate in the image display device according to the second embodiment. Fig. 9 is a sectional view showing a structure of an image display device related to a conventional technology. FIG. 10 is a schematic diagram of a state in which a columnar spacer is embedded in a hole structure in a pre-fixing process or an alignment process of an image display device related to the conventional technology. Description of component symbols: 1. 1 01 Array substrate 2, 1 0 2 opposite substrates 3a to 31, 21a to 211, 22, 104 columnar spacers

第27頁 1230818 圖式簡單說明 4、 1 0 3液晶層 5、 6偏光板 7、8定向膜 9、1 0 5像素電極 1 0共通電極 11、1 0 7薄膜電晶體 1 2掃描線 1 3信號線 14、14a 至 14r、109 孔構造 15導電層 16基板 1 7絕緣層 1 8、1 0 8平坦化層 19a至19r開口部 2 0遮光部 第28頁Page 27 1230818 Brief description of the drawings 4, 1 0 3 Liquid crystal layer 5, 6 Polarizer 7, 8 Orientation film 9, 10 Pixel electrode 1 0 Common electrode 11, 1 7 Thin film transistor 1 2 Scan line 1 3 Signal lines 14, 14a to 14r, 109 Hole structure 15 Conductive layer 16 Substrate 1 7 Insulating layer 1 8, 1 0 8 Flattening layer 19a to 19r Opening portion 2 0 Light shielding portion page 28

Claims (1)

i-·: JIM 921341 nn 六、申請專利範圍 1 · 一種影像顯示裝置,具備: 第了基板,其内表面上具備多數之孔構造,該多數之 孔構造係依特定配置圖型配置; 第二基板,與第一基板相向配置; 液晶層,配置於上述第一基板與第二基板之間;以及 2以上之柱狀間隔物群,其係於該第二基板内表面 上-在上述夕數孔構造之配置圖型的投影圖型經施以不同 ::動之圖型上’苳配置1以上、總數的2 /3以下之柱狀 間隔物而成。 2造二:範圍第1項之影像顯示裝置’其中上述孔構 W申Λ專利範圍第1或2項之影像顯示裝置,其中上述 4 關造數的3/2倍以上。 第- 第利或2項之影像顯^ ^ 遮光裝置, 品域上更具備抑制光之穿透的 上述2以上之柱狀間隔物 光區域之區域上。 群,係形成在對應於上述遮 5.如申請專利範圍第1或2項之旦彡德相一 第一基板每—顯示像素具備、:〜像”、、員不裝置,其中上述 開關元件, 以及 平坦化層,形成於該開關元件上 像素電極’配置於該平坦化層上 上述孔構造係基於電連接該^ _扛 冢素電極與上述開關元件 第29頁 1230818 曰 修正 、申請專利範圍 之目的,而逐一顯示像 域。 ’、/成在上述平坦化層之部份區 6·如申請專利範圍第1或2 Jg夕旦/ Μ 多數的孔構造係設在各:貝:_像顯示裝置’其,上述 置。 斤屬”肩不像素内之大致同一位 Ί·如申請專利範圍第1或2頊夕旦彡 第一基板更具備:項之衫像顯示裝置,其中上述 知描線’以控制上述開關 信號線,其透過上述開::=動狀態,以及 位。 關兀件對上述像素電極供給電 8.如申請專利範圍第丨或2項之影像顯 第一基板於上述像素電極附近更具備此、、衣置,其中上述 像素電極與上述共通電極間之電位差了通電極,依據上述 基板内表面平行之方向對上述液晶而沿著與上述陣列 曰施加電場。i- ·: JIM 921341 nn VI. Patent application scope 1 · An image display device comprising: a first substrate with a plurality of hole structures on its inner surface, the majority of hole structures being configured according to a specific configuration pattern; the second A substrate disposed opposite to the first substrate; a liquid crystal layer disposed between the first substrate and the second substrate; and a group of 2 or more columnar spacers attached to an inner surface of the second substrate-at the above-mentioned number The projection pattern of the layout pattern of the hole structure is made by different: :: moving patterns are formed by columnar spacers with more than 1 and less than 2/3 of the total. 2 make two: the image display device of the first item in the scope ′ wherein the above-mentioned pore structure W applies to the image display device of the first or the second item of the patent scope, in which the number of the above 4 related products is 3/2 times or more. The image display of item-item 2 or item ^ ^ is a light-shielding device, and the product area is further provided with the above 2 or more columnar spacers in the light area to suppress the penetration of light. The group is formed on the first substrate corresponding to the above-mentioned cover 5. As described in item 1 or 2 of the scope of the patent application, each display pixel is provided with: ~ image ", and the device is not included, wherein the above-mentioned switching element, And a flattening layer, the pixel electrode formed on the switching element is arranged on the flattening layer, and the hole structure is based on electrically connecting the ^ 冢 冢 素素 electrode and the above-mentioned switching element, page 29, 1230818, amendment, patent application The purpose is to display the image fields one by one. '、 / 成 In the partial area of the above-mentioned flattening layer 6. If the scope of the patent application is 1 or 2 Jg Xidan / Μ Most of the pore structure is set in each: shell: _ image display The device "its, the above is set. The genus is" the shoulders are not substantially the same in the pixel. "If the patent application scope is 1 or 2, the first substrate is more equipped with: a shirt-like display device, in which the above-mentioned lines are known. In order to control the above-mentioned switch signal line, it passes through the above open :: = dynamic state, and bit. Related parts supply power to the above pixel electrode. 8. If the image display item No. 1 or 2 of the patent application scope shows that the first substrate is further provided with this and the vicinity of the above pixel electrode, the potential difference between the above pixel electrode and the above common electrode. With the through electrode, an electric field is applied to the liquid crystal in a direction parallel to the inner surface of the substrate along the array.
TW92134100A 2003-02-03 2003-12-03 Image display device TWI230818B (en)

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TWI831368B (en) * 2022-06-30 2024-02-01 群創光電股份有限公司 Display device and manufacturing method thereof

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JP2006350211A (en) 2005-06-20 2006-12-28 Toshiba Matsushita Display Technology Co Ltd Liquid crystal display device
JP2007052264A (en) * 2005-08-18 2007-03-01 Toshiba Matsushita Display Technology Co Ltd Liquid crystal display panel
US7894024B2 (en) 2007-07-26 2011-02-22 Beijing Boe Optoelectronics Technology Co., Ltd. Liquid crystal panel
JP6808335B2 (en) 2016-03-11 2021-01-06 株式会社ジャパンディスプレイ Liquid crystal display device
JP6640252B2 (en) 2018-01-19 2020-02-05 シャープ株式会社 LCD panel

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TWI831368B (en) * 2022-06-30 2024-02-01 群創光電股份有限公司 Display device and manufacturing method thereof

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