TW200415392A - Image display device - Google Patents

Image display device Download PDF

Info

Publication number
TW200415392A
TW200415392A TW92134100A TW92134100A TW200415392A TW 200415392 A TW200415392 A TW 200415392A TW 92134100 A TW92134100 A TW 92134100A TW 92134100 A TW92134100 A TW 92134100A TW 200415392 A TW200415392 A TW 200415392A
Authority
TW
Taiwan
Prior art keywords
substrate
display device
image display
pattern
hole structure
Prior art date
Application number
TW92134100A
Other languages
Chinese (zh)
Other versions
TWI230818B (en
Inventor
Shinji Takasugi
Yasunobu Hiromasu
Yoshiharu Fujii
Original Assignee
Chi Mei Optoelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chi Mei Optoelectronics Corp filed Critical Chi Mei Optoelectronics Corp
Publication of TW200415392A publication Critical patent/TW200415392A/en
Application granted granted Critical
Publication of TWI230818B publication Critical patent/TWI230818B/en

Links

Landscapes

  • Liquid Crystal (AREA)

Abstract

The present invention provides an image display device capable of preventing pillar-shaped spacers in the image display device from being fitted into cavity structures during a temporary securing step and a position alignment step. Among the pillar-shaped spacers 3a-31 formed on an opposed substrate 2, pillar-shaped spacers 3a-3f are arranged in a pattern B shown by single-dashed lines and pillar-shaped spacers 3g-31 are arranged in a pattern C shown by double-dashed lines. Pattern A shown by broken lines in Fig. 4 is the projection onto the opposed substrate 2 from the arrangement pattern of the cavity structure formed on an array substrate 1 that is adhered to the opposed substrate 2. Patterns B and C are the patterns formed by parallel displacements of the pattern A only with different distances from each other and/or in different directions. By arranging each of the pillar-shaped spacers on the patterns B and C with an amount more than 1 and less than 2/3 of the total amount, it is possible to reduce the percentage of the pillar-shaped spacers fitted into the cavity structures.

Description

200415392200415392

五、發明說明(1) —-L 一、【發明所屬之技術領域】 本發明係關於藉柱狀間隔物規定基板間隔之影像顯示 裝置’特別是關於預固定過程及對位過程中,可抑制柱狀 間隔物嵌入到孔構造内之影像顯示裝置。 二、【先前技術】 先前技術中,已知有在相向配置的基板之間配置液晶 層,控制該液晶層所含之液晶分子的配向性,以作影像顯 示之影像顯示裝置。因液晶材料之透光率係取決於液晶分 子的配向狀態,控制液晶分子的配向性即可控制液晶1 光率’利用該特性即可作影像顯示。 第9圖係習知技術的液晶顯示裝置之剖面 圖。如第9圖,習知構造之液晶顯示裝置具備陣列基: 101 ’與陣列基板101相向配置的相向基板1〇2 ^ 1 03 ^ ^ & ^ 〇2 ^ 隔物1 0 4規疋(參照例如專利文獻1。) 、 水冓 '有對液阳層103供給電位之構造。枝狀問 隔物1 0 4即用以保持哮列基板1 〇 1盘 曰 一定,使液晶層1〇3之厚“句〇1。^板曰U2間之間隔 係利用液晶層1 03之光學特性作影像顯示;d置因 度必須均勻。柱狀間隔物1〇4係以感光夜s曰層1 03之厗 成,具體而言,係例如以光微影^ '十脂等材料形 去开y成於相向基板102之 200415392 五、發明說明(2) 表面上。 而液晶顯示裝置之組裝過程係,·保持陣列基板丨〇 1與 相向基板1 0 2於特定間隔並貼合後,於陣列基板丨與相向 基板1 0 2間封入構成液晶層1 0 3之液晶材料。在此,陣列基 =反1 01及相向基板丨〇2因各有對應於顯示像素之配線構造 等’開閉之際須作精密對位。因此,實際的組裝過程中, 首先在陣列基板101與相向基板102相向之狀態下壓合作預 固定後,於水平方向移動陣列基板1〇1或相向基板1〇2對位 後作正式固定。 專利文獻1 曰本專利特開平2-223922號公報(第4頁,第3圖) 三、【發明内容】 然而陣列基板1 0 1及相向基板1 〇 2預固定後於對位過程 中’柱狀間隔物丨〇 4之存在有時會造成問題。具體而言, 預固定後於水平方向移動陣列基板1〇1或相向基板1〇2之 際’柱狀間隔物1 〇 4妨礙陣列基板1 〇 1或相向基板丨〇 2之移 動,有對位精度下降之問題。以下說明該問題。 第1 〇圖係,柱狀間隔物1 〇 4嵌入孔構造1 〇 9之狀態的示 意圖。如第1 0圖,陣列基板1 〇 1有具開關元件功能之薄膜 電晶體1 0 7,及像素電極1 〇 5。薄膜電晶體1 〇 7與像素電極 1 〇 5之間配置有平坦化層i 〇 8,像素電極i 〇 5與薄膜電晶體 1 0 7透過鑽設於平坦化層丨〇 8之一部份的孔構造丨〇 9作電連 接。於是,為降低產生於像素電極1 0 5與位在像素電極1 〇 5V. Description of the invention (1) --- L I. [Technical field to which the invention belongs] The present invention relates to an image display device that uses a columnar spacer to define a substrate interval, especially to a pre-fixing process and an alignment process, which can be suppressed. Image display device with columnar spacers embedded in the hole structure. 2. [Prior art] In the prior art, there is known an image display device in which a liquid crystal layer is arranged between substrates disposed oppositely, and the alignment of liquid crystal molecules contained in the liquid crystal layer is controlled. Since the light transmittance of a liquid crystal material depends on the alignment state of the liquid crystal molecules, controlling the alignment of the liquid crystal molecules can control the photometric ratio of the liquid crystal ', which can be used for image display. Fig. 9 is a sectional view of a conventional liquid crystal display device. As shown in FIG. 9, a liquid crystal display device with a conventional structure includes an array substrate: 101 ′ Opposing substrate 10 opposite to the array substrate 101 102 ^ 1 03 ^ ^ & ^ 〇2 ^ spacer 1 0 4 gauge (see For example, Patent Document 1.) The water puppet has a structure that supplies a potential to the liquid anode layer 103. The dendritic spacers 104 are used to hold the substrate 100, so that the thickness of the liquid crystal layer 103 is "sentence 01." The space between U2 is the use of the optical properties of the liquid crystal layer 103. The characteristics are used for image display; the d factor must be uniform. The columnar spacer 104 is formed of a photosensitive layer 1003, specifically, for example, in the form of light lithography ^ 'Shizhi and other materials The opening is formed on the surface of 200415392 of the opposite substrate 102. 5. Description of the invention (2). The assembly process of the liquid crystal display device is to keep the array substrate 丨 〇1 and the opposite substrate 102 at a specified interval and attach them. The liquid crystal material constituting the liquid crystal layer 103 is sealed between the array substrate 丨 and the opposing substrate 102. Here, the array substrate = inverse 01 and the opposing substrate 丨 02 each have a wiring structure corresponding to a display pixel, etc. Therefore, in the actual assembly process, the array substrate 101 and the opposing substrate 102 are first pressed and fixed in advance, and then the array substrate 101 or the opposing substrate 102 are moved horizontally. It is formally fixed after the position. Patent Document 1 Japanese Patent Laid-Open No. 2-223922 Bulletin (Page 4, Figure 3) III. [Summary of the Invention] However, the existence of the 'columnar spacers 丨 〇4' may sometimes occur during the alignment process after the array substrate 101 and the opposite substrate 102 are pre-fixed. Causes a problem. Specifically, when the array substrate 100 or the opposing substrate 10 is moved in the horizontal direction after pre-fixing, the 'columnar spacer 1 104' hinders the movement of the array substrate 101 or the opposing substrate 1 02. There is a problem that the alignment accuracy is lowered. This problem is described below. Fig. 10 is a schematic diagram showing a state where the columnar spacers 104 are embedded in the hole structure 10a. As shown in Fig. 10, the array substrate 10a has a structure. A thin film transistor 107 for the switching element function and a pixel electrode 1 〇5. A flattening layer i 〇8, a pixel electrode 〇5 and a thin film transistor are arranged between the thin film transistor 107 and the pixel electrode 107. 1 0 7 is electrically connected through a hole structure drilled in a part of the planarization layer 〇 08. Therefore, in order to reduce the generation of the pixel electrode 105 and the pixel electrode 105

第10頁 200415392 五、發明說明(3) 下層之薄膜電晶體1 〇 7等的配線構造間之寄生電容,平坦 化層108膜厚須在2至4微米左右,結果孔構造1〇9之深度亦 在2至4微米左右。 因陣列基板1 0 1有孔構造1 0 9,預固定過程及對位過程 中有時柱狀間隔物104會嵌入孔構造丨09。嵌入孔構造1〇9 之柱狀間隔物104,於水平方向移動陣列基板1〇ι或相向基 板102之際’因朝妨礙基板移動之方向施力,以致於對位 過程造成故障。 一般’為保持液晶層1 〇 3之厚度均勻,柱狀間隔物〗〇 4 在设計上係避開相向配置之基板表面的孔構造丨〇 9而配 置。但是,預固定過程中,陣列基板1〇1與相向基板1〇2之 位置關係難以依設計貼合,會有一定的位置滑移,造成柱 狀間^物1 0 4肷入孔構造丨〇 9。又,預固定過程中即使無柱 狀間隔物104之散入孔構造1〇9,對位過程中於水平方向移 $陣列~基板101或相向基板1〇2之際,也會有柱狀間隔物 104之/欠入孔構造1〇9,而嵌入後即難以對位。 骑1 ηΛ/口技#的液晶顯示裝置因像素電極105、薄膜電晶 A 09 , ΐ配Ϊ構造在各顯示像素内構造幾乎相同,孔構 : 素内之位置也大致一定。同樣,柱狀間隔 配置/因此目°基板1〇2之内表面上,對應於顯示像素規則 1成為^ 置的柱狀孔構造1 09之位置關係時,幾乎所有多數設 置的=:匆都嵌入,使對位過程之進行大有困雖。 餐丁、鑣於上述習知技術諸問題而完成,其目的在Page 10 200415392 V. Description of the invention (3) The parasitic capacitance between the wiring structures such as the thin film transistor 10 and the lower layer, the thickness of the flattening layer 108 must be about 2 to 4 microns, and the depth of the hole structure 109 Also around 2 to 4 microns. Because the array substrate 101 has a hole structure 10, the columnar spacer 104 may be embedded in the hole structure 09 during the pre-fixing process and the alignment process. The columnar spacer 104 embedded in the hole structure 109 moves the array substrate 10m in the horizontal direction or opposes the substrate 102 'because force is applied in a direction that prevents the substrate from moving, which causes a malfunction in the alignment process. Generally, in order to keep the thickness of the liquid crystal layer 103 uniform, the columnar spacers are arranged in a design that avoids the hole structure on the surface of the substrate facing each other. However, during the pre-fixing process, the positional relationship between the array substrate 101 and the opposing substrate 102 is difficult to fit according to the design, and there will be a certain position slip, which will cause the columnar space 1 104 to enter the hole structure. 9. In addition, even if there is no interstitial hole structure 10 of the columnar spacer 104 during the pre-fixing process, there will be columnar spaces when the array is moved horizontally from $ array to the substrate 101 or opposite to the substrate 102 during alignment. The structure of the object 104 / undercut hole is 109, and it is difficult to align after embedding. The 1 ηΛ / 口技 # liquid crystal display device has almost the same structure in each display pixel due to the pixel electrode 105 and the thin-film transistor A 09, and the structure of the pore structure: the element location is also approximately constant. Similarly, on the inner surface of the columnar spaced arrangement / substrate 102, the positional relationship of the columnar hole structure 1 09 corresponding to the display pixel rule 1 becomes ^, almost all of the settings =: , Making the alignment process difficult. The meals are completed based on the problems of the above-mentioned conventional technologies. The purpose is to

第11頁 200415392 五、發明說明(4) 提,、’以柱狀間隔物規定基板間隔之影像顯示装置,在預 固疋過程及對位過程中柱狀間隔物的_嵌入孔構造受抑制之 影像顯示裝置。 為達上述目的,申請專利範圍第1項有關之影像顯示 裝置’其特徵係具備: 第基板’其内表面上具備多數的孔構造,該多數的 孔構造依特定配置圖型配置, 第二基板,與該第一基板相向配置, =、晶層,配置於上述第一基板與第二基板之間,以及 以上之柱狀間隔物群,係於該第二基板内表面上, 圖型ί多置圖型之㈣^ 点。^「 置1上、總數的2/3以下之柱狀間隔物而 移動。不同平行移動」係指距離及/或方向不同之平行 述多專利範圍第1項之發明,在第二基板上於上 =孔=配置圖型之投影圖型經不㈣ 造的柱狀間定; 礙受到抑制。 -、α &中對移動基板之妨 申凊專利範圍第2項有關旦-中’上述孔構造深!微米以J,像顯示裂置係上述發明 申請專利範圍第3項有關 中,上述柱狀間隔物之個數在上'"孔構不裂置係上述發明 L構造數的3/2倍以 200415392Page 11 200415392 V. Description of the invention (4) It is mentioned that the image display device of the substrate interval specified by the columnar spacer, the structure of the embedded hole of the columnar spacer in the pre-fixing process and the alignment process is suppressed. Image display device. In order to achieve the above purpose, the feature of the image display device related to item 1 of the scope of patent application is that the first substrate has a plurality of hole structures on its inner surface, and the plurality of hole structures are arranged according to a specific layout pattern. The second substrate Is arranged opposite to the first substrate, the crystal layer is arranged between the first substrate and the second substrate, and the above-mentioned columnar spacer group is tied to the inner surface of the second substrate, and the pattern is much larger Set the 点 ^ point of the picture type. ^ "Move by columnar spacers placed above 1, less than 2/3 of the total. Different parallel movements" refers to the invention of item 1 of the above-mentioned multi-patent range with different distances and / or directions. The projection pattern of the upper = hole = configuration pattern is fixed by unmade columns; the obstruction is suppressed. -, Α & China may apply for moving substrates in the scope of patent application No. 2 is related to the above-mentioned pore structure is deep! Micron to J, the image shows that the cracking is related to the above invention application patent scope No. 3 related to the above column The number of the spacers is "" The pore structure is not split, which is 3/2 times the number of the L structure of the above invention. 200415392

列乾圍第3項之發明_且” 依 的柱狀 配置圖 之比率 中 中,上 之穿透 在對應 中 中,上 在該開 坦化層 素電極 域。 中 中,上 位置。 中 中,上 驅動狀 電極供 中 中,上 該申請專 間隔物個 型配置柱 可壓低到 請專利範 述第一基 的遮光裝 於上述遮 清專利範 述陣列基 關元件上 之上;上 與上述開 請專利範 述多數之 晴專利範 述陣列基 態;以及 給電位。 睛專利範 述陣列基 數係上述孔構造數的3/2d板士 狀間隔物,預固定及對位壬思 總數的2/3以下。 際肷入孔構造 項-有關之影像顯示裝置係上述發明 置:ΐ :2基㈣部份區域上更具備抑制光 光巴姆Ϊ 的柱狀間隔物群,係形成 尤域之區域上。 Ξ:5每項有:之影像顯示裝置係上述發明 4C素具備:開關元件;形成 述孔構心二以及像素電極’配置於該平 關元件顯::素用以電連接該像 y成於上述平坦化層之部份區 孔構造久有η·關,影像顯不裝置係上述發明 、各政在所屬顯示像素内的大致相同 Ϊ二項有播關广影像顯示裝置係上述發明 ς知描線,其控制上述開關,元件之 ’其透過上述開關元件對上述像素 :Γ上項/德關去之影像顯示裝置係上述發明 迷像素電極附近更具備共通電極,The invention of the third column of the column_and ”According to the ratio of the columnar layout according to the above, the upper penetration is in the corresponding middle, and the upper is in the Kaidan layer electrode domain. Middle, upper position. Middle and middle In the middle of the upper driving electrode, the spacer-type configuration column of the application can be lowered to the first base of the patent model, and the light shielding device is mounted on the array element of the above patent model patent; Please open the patent list, the majority of the patent list, the ground state of the array, and the potential. The patent base list is the 3 / 2d slab-like spacer of the number of the above-mentioned hole structure, pre-fixed and 2 / of the total number of counterpoints. 3 or less: The structure of the interstitial entrance hole-the related image display device is the above-mentioned invention: ΐ: 2 base ㈣ part of the area is further equipped with a columnar spacer group that suppresses light and light, which is an area that forms a special domain Ξ: 5 Each item has: The image display device of the above invention 4C element is provided with: a switching element; a hole forming center 2 and a pixel electrode are disposed on the level-off element display :: element for electrically connecting the image y Formed on the above-mentioned planarizing layer The area hole structure has been η · guan for a long time. The image display device is the above-mentioned invention, and each government is approximately the same in the display pixel. The two items of the broadcast image display device are the above-mentioned invention. The image display device for the above pixels through the above-mentioned switching element: Γ The above item / Deguan ’s image display device is provided with a common electrode near the pixel electrode of the above invention,

200415392 五、發明說明(6) --- 基於上述像素電極與上述共通電極間之電位差,對上述液 晶層施加平行於上述陣列基板内表面之電場。 彳 四、【實施方式】 菩^ ί照圖式說明本發明的實施形態之影像顯示裝 置。,m圖式僅係示意而異於實物。當然,圖式間可 能包含尺寸關係、比率不同之部份。 (實施形態1 ) / Μ首先說明本實施形態丨有關之影像顯示裝置。 施 形,1有關之影像顯示裝置其構造係,藉形成於相向^ 3面$:多數柱狀間隔物,規定陣列基板與相向基板之 構造係依陣列基板内表面上之特定配置圖 其Γί在相向基板上之多數柱狀間隔物,係配置 於對相向基板表面上孔構造之投影圖型經施以不 ==圖…而配置於各圖型上之柱狀間隔物個數 係6周正為1以上、總數的2/3以下。將柱狀間隔物配置於該 上之圖型上,本實施形態1有關的影像顯示裝置在伟二 列基板與相向基板之預固定及對位時,即可抑制同時嵌入 孔構造之柱狀間隔物比率於總數的2/3以下。以下 明實施形態1有關之影像顯示裝置。 β 、、、田5兄 如第1圖,實施形態1有關之影像顯示裝置具有: 陣列基板1,其具備特定配線構造,以及相向基板2,係與 陣列基板1相向配置。其構造係,陣列基板丨與相向基板2、 之間隔由柱狀間隔物3規定。形成於陣列基板丨與相向基板200415392 V. Description of the invention (6) --- Based on the potential difference between the pixel electrode and the common electrode, an electric field parallel to the inner surface of the array substrate is applied to the liquid crystal layer.彳 IV. [Embodiment] An image display device according to an embodiment of the present invention is illustrated. The m scheme is only schematic and different from the real thing. Of course, the drawings may include parts with different dimensional relationships and ratios. (Embodiment 1) First, a video display device according to this embodiment will be described. The structure of the image display device related to the configuration 1 is formed on the opposite ^ 3 surfaces. Most of the columnar spacers define the structure of the array substrate and the opposite substrate according to a specific layout diagram on the inner surface of the array substrate. Most of the columnar spacers on the opposite substrate are arranged in the projection pattern of the hole structure on the surface of the opposite substrate, and the number of the columnar spacers arranged on each pattern is 6 weeks. More than 1 and less than 2/3 of the total. The columnar spacers are arranged on the above pattern. When the image display device according to the first embodiment is pre-fixed and aligned with the Wei Er column substrate and the opposite substrate, the columnar spacers that are simultaneously embedded in the hole structure can be suppressed. The ratio is less than 2/3 of the total. The image display device according to the first embodiment will be described below. As shown in FIG. 1, the image display device according to the first embodiment includes: an array substrate 1, which has a specific wiring structure, and an opposing substrate 2, which is arranged opposite to the array substrate 1. The structure is such that the distance between the array substrate 丨 and the opposing substrate 2 is defined by the columnar spacer 3. Formed on the array substrate 丨 and the opposite substrate

200415392200415392

2間之間隙配置有液晶層4,陣列基板丨外表面及相向基板2 之曰表面上各配置偏光板5及偏光板6。並且陣列基板i與 液晶層4之界面及相向基板2與液晶層4之界面,各配置 定向膜7、定向膜8。 陣列基板1於基板上具備特定配線構造。第2圖係陣列 基板1之構造的俯視圖。陣列基板丨如第2圖,呈備:A liquid crystal layer 4 is arranged in a gap between the two, and a polarizing plate 5 and a polarizing plate 6 are arranged on the outer surface of the array substrate 丨 and the surface of the opposite substrate 2 respectively. The interface between the array substrate i and the liquid crystal layer 4 and the interface between the opposing substrate 2 and the liquid crystal layer 4 are each provided with an alignment film 7 and an alignment film 8. The array substrate 1 includes a specific wiring structure on a substrate. FIG. 2 is a plan view of the structure of the array substrate 1. As shown in FIG. The array substrate 丨 as shown in Figure 2, is presented:

像素電極9 ;共通電極10,其係形成為覆蓋於像素電 才f之周圍;薄膜電晶體11,具有作為像素電極9的開關元 ^、之^b ,掃描線1 2,其控制薄膜電晶體11之驅動狀態; 以及信號線13,其透過薄膜電晶體u供給特定電位於像素 電極9。為供給信號線13之電位於像素電極9,像素電極9 與薄膜電晶體Η電連接,具體而言,薄膜電晶體u與像素 電極9之間透過具接觸孔功能之孔構造14連接。Pixel electrode 9; common electrode 10, which is formed to cover the periphery of the pixel electrode f; a thin film transistor 11, which has switching elements ^, ^ b, and scan lines 12 as the pixel electrode 9, which controls the thin film transistor A driving state of 11; and a signal line 13 that supplies specific electricity through the thin film transistor u to the pixel electrode 9. In order to supply the signal line 13 with electricity, the pixel electrode 9 is electrically connected to the thin film transistor Η. Specifically, the thin film transistor u and the pixel electrode 9 are connected through a hole structure 14 having a contact hole function.

第3圖係第2圖沿A-A線之剖視圖。如第3圖,薄膜電晶 體11、掃描線12及信號線13與像素電極9之間介有平坦化 層1 8。平坦化層1 8係用以抑制掃描線丨2、信號線丨3等配線 構造之電位變動對像素電極9的電位之影響,膜厚須在1至 4微米左右。因此,電連接像素電極9與薄膜電晶體n之孔 構造“深丄至士微米左右。如第2圖、第3圖,陣列基板1上 每一顯示像素各設電路構造,該電路構造係配置成矩陣 狀。因此,形成於陣列基板1上之孔構造亦有多數個,並 依矩陣狀圖型以規則間隔排列。 玆簡單說明第2圖、第3圖 掃描線1 2供給特定電位於薄膜Figure 3 is a sectional view taken along line A-A in Figure 2. As shown in FIG. 3, a planarization layer 18 is interposed between the thin-film electrical crystal 11, the scanning line 12, and the signal line 13 and the pixel electrode 9. The planarizing layer 18 is used to suppress the influence of the potential variation of the wiring structure such as the scanning lines 2 and the signal lines 3 on the potential of the pixel electrode 9, and the film thickness must be about 1 to 4 microns. Therefore, the hole structure electrically connecting the pixel electrode 9 and the thin-film transistor n is “deep to about a micron. As shown in FIG. 2 and FIG. 3, each display pixel on the array substrate 1 has a circuit structure, and this circuit structure is configured. It has a matrix shape. Therefore, there are also a large number of hole structures formed on the array substrate 1, and they are arranged at regular intervals according to a matrix pattern. The scan lines 12 and 2 in FIG.

第15頁 之電路構造的動作。首先自 電晶體11之·閘極電極,薄膜The operation of the circuit structure on page 15. First self-transistor 11 · Gate electrode, thin film

200415392 五、發明說明(8) ^---- 電晶體11成為0N之狀態。然後對0N狀態之薄膜電晶 信號線1 3供給特定電位,透過薄膜電.晶體丨丨之通 ^ 素電極9寫入特定電位。另一方面,為維持位在像素曰 周圍之共通電極1 0於大致一定之電位,於像素電極、寫入 位’即在像素電極9與共通電極10之間產生電位差/因 素電極9及共通電極1〇係形成於陣列基板1上,基於產生之 電位差’在陣列基板1表面的平行方向產生電場,隨電π 強度二配置於陣列基板1上之液晶層所含的液晶分子之= f狀態起變化,而透光率起變化。一個個顯示像素各別々進 =丁该動作,光自外部穿透透光率起變化之液晶層進行影 顯不。 、冬 其次說明柱狀間隔物3之構造及配置圖型。桎妝 物3伤彬# μ, 位;I大間隔 基柘? /成相向基板2之内表面上’具體而言’係於相向 二 < 之内表面上塗布感光性樹脂後,以光微影法等圖型 化形成。因此,柱狀間隔物3異於習知球狀間隔物,圖型 型之際調,所用的光罩圖型,即可實現幾乎任何配置圖 體:本實施形態1之柱狀間隔物,構造不限於上述,具200415392 V. Description of the invention (8) ^ ---- The transistor 11 becomes 0N. Then, a specific potential is supplied to the thin film transistor signal line 13 in the 0N state, and the specific potential is written to the transistor electrode 9 through the thin film transistor. On the other hand, in order to maintain the common electrode 10 located around the pixel at a substantially constant potential, a potential difference / factor electrode 9 and the common electrode are generated between the pixel electrode and the write bit, that is, between the pixel electrode 9 and the common electrode 10. The system 10 is formed on the array substrate 1 and generates an electric field in a parallel direction on the surface of the array substrate 1 based on the generated potential difference. And the light transmittance changes. Each display pixel advances individually. In this action, the liquid crystal layer that changes in light transmittance from the outside is displayed. , Winter Next, the structure and arrangement pattern of the columnar spacer 3 will be described.桎 妆 物 3 伤 彬 # μ, bit; I large interval base? "Specifically" is formed on the inner surface of the opposite substrate 2 after the photosensitive resin is coated on the inner surface of the opposite substrate 2 and patterned by photolithography. Therefore, the columnar spacer 3 is different from the conventional spherical spacer. When the pattern is used, the pattern of the photomask can be used to achieve almost any layout. The columnar spacer of this embodiment 1 is not limited in structure. Above, with

At β ’能於基板上形成配置圖型者,均可用作本實施形 屬柱狀間隔物。 、 第4圖係相向基板2及相向基板2内表面上之柱狀間隔 示像 置圖型之示意圖。如第4圖,相向基板2之每一顯 所覆Ϊ具備開口部1 9a至開口部1 9r,其餘區域為遮光部2 0 阳^蓋。而相向基板2内表面上之柱狀間隔物3 a至柱狀間 阳物3 1,总7^ 係开》成如第4圖。第4圖中所示係,多數虛線區域At β ′ can be used to form a layout pattern on a substrate, and can be used as the columnar spacer of the present embodiment. And FIG. 4 are diagrams showing the arrangement pattern of the columnar space on the inner surface of the opposing substrate 2 and the opposing substrate 2. As shown in FIG. 4, each display of the opposite substrate 2 is provided with an opening portion 19a to an opening portion 19r, and the remaining area is a light shielding portion 20 and a cover. The columnar spacers 3a to the columnar anodes 31 on the inner surface of the opposing substrate 2 are shown in Fig. 4 as a total of 7 ^. The system shown in Figure 4, most dotted areas

第16頁 200415392Page 16 200415392

所示之圖型A,乃陣列基板1内表面上所存在的孔構造14之 配置圖型於相向基板2之投影。又,多數單點鏈線區域所 示之圖型B,係經平行移動的孔構造14之投影圖型。而, 多數雙點鏈線區域所示之圖型C,係圖型a僅以與圖型b者 不同之方向及/或不同距離平行移動而得者。 首先,柱狀間隔物3a至柱狀間隔物3 1,係各避開開口 部1 9 a至開口部1 9 r,形成於遮光部2 〇上。因係配置於開口 部19a至開口部19r上,對位過程中可防柱狀間隔物仏至柱 狀間隔物3 1打亂配置於陣列基板1上的定向膜7之定向性, 致使顯示影像品級下降。 本實施形態1中,柱狀間隔物3 a至柱狀間隔物3丨,係 配置於各孔構造1 4配置圖型之投影經平行移動之圖型上。 具體而言,柱狀間隔物3a至柱狀間隔物3f,係依圖型B配 置,而柱狀間隔物3 g至柱狀間隔物3 1,則係依圖型匸配 置。 本實施形態1有關之影像顯示裝置,係依如第4圖之圖 型,於相向基板2之内表面上形成有柱狀間隔物仏至柱狀 間隔物3 1。因依該圖型,預固定過程及對位過程中同時嵌 入孔構造1 4的柱狀間隔物3之比率壓低到丨/ 2以下,柱狀間 隔物3所致阻力之影響受抑制,精密對位成為可能。 曰 第5圖、第6圖係用以說明預固定過程及對位過程中, 存在於陣列基板1上之孔構造14,與形成在相向基板2上的 柱狀間隔物3之位置關係的示意圖。更具體而言,第5圖表 示孔構造14之配置圖型與第4圖的圖型β之重合狀態,The illustrated pattern A is a projection of the arrangement pattern of the hole structure 14 existing on the inner surface of the array substrate 1 onto the opposing substrate 2. In addition, the pattern B shown in most single-dot chain line regions is a projection pattern of the hole structure 14 moved in parallel. However, the pattern C shown in most double-dot chain line regions is obtained by moving the pattern a in parallel only in a direction and / or a different distance from the pattern b. First, the columnar spacers 3a to 31 are formed on the light-shielding portion 20, avoiding the opening portions 19a to 19r, respectively. Because it is arranged on the opening portion 19a to the opening portion 19r, it is possible to prevent the columnar spacers from arranging to the columnar spacers 3 during the alignment process. 1 The orientation of the alignment film 7 disposed on the array substrate 1 is disturbed, resulting in a displayed image. Grade decline. In the first embodiment, the columnar spacers 3 a to 3 丨 are arranged on the pattern in which each of the hole structure 14 layout patterns is moved in parallel. Specifically, the columnar spacers 3a to 3f are arranged according to the pattern B, and the columnar spacers 3g to 3b are arranged according to the pattern 匸. In the image display device according to the first embodiment, a columnar spacer 仏 to a columnar spacer 31 are formed on the inner surface of the opposing substrate 2 in accordance with the pattern shown in FIG. 4. According to the figure, the ratio of the columnar spacers 3 embedded in the hole structure 14 during the pre-fixing process and the alignment process is reduced to less than 丨 / 2, and the influence of the resistance caused by the columnar spacers 3 is suppressed. Bit becomes possible. 5 and 6 are schematic diagrams for explaining the positional relationship between the hole structure 14 existing on the array substrate 1 and the columnar spacers 3 formed on the opposing substrate 2 during the pre-fixing process and the alignment process. . More specifically, Fig. 5 shows the overlapping state of the layout pattern of the hole structure 14 and the pattern β of Fig. 4,

第17頁 200415392 五、發明說明(ίο) 圖表示孔構造14之配置圖型與第4圖的圖型c之重合狀態。 首先’就預固定過程及對位過程中,陣列基板1與相 向基板2的位置關係成第5圖之狀態者作說明。第5圖之狀 恶下,因第4圖之圖型B與孔構造14的配置圖型重合,柱狀 間隔物3a至柱狀間隔物3f同時嵌入孔構造14a至孔構造14r 之任一。柱狀間隔物3a至柱狀間隔物3f,係在相向基板2 内表面上,各形成於孔構造14之配置圖型經平行移動的圖 型B上。因此,在如預固定過程及對位過程中,陣列基板工 與相向基板2之對位尚未完成之階段,圖型B與孔構造14之 配置圖.型會係一致,此時形成在圖型B上之所有柱狀間隔 物3 a至柱狀間隔物3 f均嵌入於孔構造。 另一方面’柱狀間隔物3 g至柱狀間隔物3 1,如第5 圖,不嵌入孔構造14a至孔構造I4r之任一。如上,柱狀間 隔物3 g至柱狀間隔物3 1,係形成在施以與圖型b不同之平 行移動的圖型C上。因此,圖型b與孔構造14之配置圖型在 重合狀態下,柱狀間隔物3g至柱狀間隔物3丨係位於孔構造 1 4之配置圖型以外。因此,陣列基板1與相向基板2成第5 图的位置關係時’欲入孔構造1 4 a至孔構造1 4 r之任一的柱 狀間隔物3個數,乃總數之半。 其次說明陣列基板i與相向基板2成第6圖的位置關係 之情況。第6圖之狀態係柱狀間隔物3g至柱狀間隔物3丨嵌 入孔構造14a至孔構造i4r之任一,而柱狀間隔物3&至柱狀 間隔物3f則不嵌入孔構造14a至孔構造i4r之任一。第6圖 之情況係’陣列基板1及相向基板2之位置能使孔構造1 4aPage 17 200415392 V. Description of the invention (ίο) The figure shows the overlapping state of the layout pattern of the hole structure 14 and the pattern c of FIG. 4. First, the positional relationship between the array substrate 1 and the opposing substrate 2 in the pre-fixing process and the alignment process will be described with reference to FIG. 5. In the case of the fifth figure, because the pattern B of the fourth figure coincides with the layout of the hole structure 14, the columnar spacers 3a to 3f are simultaneously embedded in any one of the hole structure 14a to the hole structure 14r. The columnar spacers 3a to 3f are each formed on the inner surface of the opposing substrate 2 on the pattern B in which the arrangement pattern of the hole structure 14 is moved in parallel. Therefore, in the pre-fixing process and the alignment process, the alignment of the array substrate and the opposing substrate 2 has not yet been completed. The pattern of the pattern B and the hole structure 14 are the same. The pattern is formed at this time. All the columnar spacers 3 a to 3 f on B are embedded in the pore structure. On the other hand, the columnar spacer 3 g to the columnar spacer 31 are not embedded in any one of the hole structure 14a to the hole structure I4r as shown in FIG. 5. As described above, the columnar spacer 3 g to the columnar spacer 31 are formed on the pattern C to which a parallel movement different from the pattern b is applied. Therefore, in the overlapping pattern of the pattern b and the hole structure 14, the columnar spacer 3g to the columnar spacer 3 are located outside the arrangement pattern of the hole structure 14. Therefore, when the array substrate 1 and the opposing substrate 2 are in the positional relationship shown in FIG. 5, the number of the columnar spacers of any one of the hole structure 1 4 a to the hole structure 1 4 r is half of the total number. Next, the case where the array substrate i and the opposing substrate 2 are in the positional relationship shown in FIG. 6 will be described. The state of FIG. 6 is that the columnar spacer 3g to the columnar spacer 3 丨 embeds any one of the hole structure 14a to the hole structure i4r, and the columnar spacer 3 & to the columnar spacer 3f does not embed the hole structure 14a to Any of the hole structures i4r. The case of FIG. 6 is that the positions of the array substrate 1 and the opposing substrate 2 enable the hole structure 1 4a.

第18頁 200415392 五、發明說明(11) 至孔構造14r之配置圖型,與圖型C重合。因此,形成於圖 型C上之柱狀間隔物3g至柱狀間隔物31嵌入孔構造14,而 形成於與圖型C不同的圖型B上之柱狀間隔物3 a至柱狀間隔 物3 f,則位在孔構造1 4 a至孔構造1 4 r之配置區域以外。 預固定過程及對位過程中,因陣列基板1與相向基板2 幾乎係成任意位置關係,亦可成為第5圖、第6圖之狀態以 外的位置關係。如此之位置關係下,所有柱狀間隔物3 a至 柱狀間隔物31均位在孔構造14外部,任一柱狀間隔物均不 嵌入孔構造1 4。 陣列基板1上孔構造1 4之配置 如已說明, 板2上柱狀間隔物3之配置,已設計成不會如以往之於正式 9口ΛΑ定日守互相重合,正式固定後影像顯示裝置之柱狀間隔物 的頂部不嵌入孔構造14。然而,陣列基板i及相向基板2 預固定之階段及對位當中,目尚未正確定位,可能合 :::柱狀間隔物3後入孔構造14。因此,本‘ :=象顯示裝置,係以在預固定過程及 : ==3之一部份喪入孔構造14為前提,並將同:嵌入柱 程:狀:隔物3的比率壓低至一定值以下,即可於對位過 用上不ίΪί,間隔物3喪人孔構造14所生阻力之值至實 用上不造成問題之程度。 扭土貝 於子音=而言’乃規定柱狀間隔物3形成位置之分布,以 :預固定過程及對位過程中,使後入孔構造布以 物3的個數占柱狀間隔物3 狀間 下。喪入之柱狀間隔物3的量數並的非2/= 里亚非針對絕對值,而係以占 200415392 五、發明說明(12) 總數的比率作規定,其理由如下。 預固定過程及對位過程中,於陣.列基板〗與相向基板2 的接近方向施加有壓力,具體而言即,造成柱狀間隔物3 之末端與陣列基板1之表面互相抵接之狀態。於是,嵌入 孔構ie 1 4之柱狀間隔物3亦在施加有廢力之狀態下,對位 過f中產生之阻力已知隨該壓力變大。另一方面,預固定 過程及對位過程中,壓力係大致均勻施加於陣列基板1及 相向基板2的整個表面,施加於每一柱狀間隔物3之壓力, 即總壓力除以柱狀間隔物3之個數的值。因此,對位過程 =,起因於嵌入孔構造14之柱狀間隔物3的阻力,並非隨 2入之個數的絕對值,而係隨嵌入個數對柱狀間隔物3總 士 =比的增加而變大。基於該見解,本發明人等發現,同 日了欲入之柱狀間隔物3的個數對柱狀間隔物3總數的比在 下:寺,阻力可壓低到對位過程中實際上不成問題之 私度,並完成可得該比之構造。 :以本實施形態!之配置形成柱狀間隔物3時,製造上 面上门。如上,柱狀間隔物3係於相向基板2内表 :十:ί = ί樹脂等形成膜構造後,經光微影法形 成為只現如本貫施形態1之配置,仔細潠用本蝌旦/从上 罩圖型即可,所用姑祖、制1直1于、、、田砥用光裰影的光 實施形能1古Μ /4衣転等可係一如以往。因此,本 貝把形恶1有關之影像顯示裝置 可作精密對位之優點。置有製仏上不增加負擔、 (變化例) 其次說明本實施形態1有關之影像顯示裳置的變化 ml 第20頁 200415392 五 發明說明(13) ___ 例。第7圖示變化例有關之影像顯示裝置,兑/ 、 基板2内表面上之柱狀間隔的配置圖型。變二=f =相向 像顯示裝置係如第7圖,柱狀間隔物21a至1 ^關之影 滿足實施形態1之條件,兩兩成對形成曰/匆211 此各對之配置位置可係隨意,而本變成化於:二基板2上。在 ,^ 令复化例中係形成如同羽 知技術的一般柱狀間隔物配置之柱狀間隔物對。 「】白 如由第7圖可知,本變化例中,對於虛線區域之 造14的配置圖型之投影圖型,柱狀間隔物21&、Η。、 21e、21g、21i、21k係屬於經特定平行移動之圖型] 間隔物21b、21d、2lf、21h、21j、211則屬於經不同狀 移動之圖型。而本變化例中柱狀間隔物之截面積係約為/ 在^般所用柱狀間隔物的截面積之半。 、μ ' 亦即’本變化例之構造係形成柱狀間隔物21於,孔構 造1 4的配置圖型經施以不同於投影圖型之平行移動的多數 圖型上。因此,如同實施形態1,預固定過程及對位過^ 中’散入孔構造1 4的柱狀間隔物之比率受抑制,可免於在 對位過程中產生問題。 ' 又,本變化例係於習知構造中柱狀間隔物之配置位 置,配置2個截面積一半的柱狀間隔物,巨觀下柱狀間隔 物之分布可視為大致如同習知影像顯示裝置。因此,於完 成後之影像顯示裝置採用經以基板間的加權分布等作最適 化的習知柱狀間隔物配置,完成後之影像顯示裝置,即可 得與以往同等之特性。 本來柱狀間隔物之配置圖型,乃須考慮完成後影像顯Page 18 200415392 V. Description of the invention (11) The layout pattern of the hole structure 14r coincides with the pattern C. Therefore, the columnar spacers 3g formed on the pattern C to the columnar spacers 31 are embedded in the hole structure 14, and the columnar spacers 3a to the columnar spacers formed on the pattern B different from the pattern C are formed. 3 f is located outside the area from the hole structure 1 4 a to the hole structure 1 4 r. In the pre-fixing process and the alignment process, since the array substrate 1 and the opposing substrate 2 are almost in any positional relationship, they can also be in a positional relationship other than those shown in Figs. 5 and 6. In this positional relationship, all of the columnar spacers 3a to 31 are located outside the pore structure 14, and any of the columnar spacers are not embedded in the pore structure 14. The arrangement of the hole structure 14 on the array substrate 1 has already been explained. The arrangement of the columnar spacers 3 on the plate 2 has been designed so that they will not overlap with each other in the official 9-port ΛΑ fixed date guard, and the image display device is officially fixed. The top of the columnar spacer is not embedded in the hole structure 14. However, in the stage of pre-fixing and alignment of the array substrate i and the opposite substrate 2, the target has not been correctly positioned, and it may be combined with ::: column spacer 3 and then entered into the hole structure 14. Therefore, this' == elephant display device is based on the premise of the pre-fixation process and: == 3 part of the hole structure 14, and will be the same as: embedding column path: shape: spacer 3 ratio is reduced to Below a certain value, the value of the resistance caused by the manhole structure 14 of the spacer 3 can be used in the alignment process to the extent that it does not cause problems in practice. Twisting the soil to the consonant = speaking 'is to specify the distribution of the formation of the columnar spacers 3, so that: in the pre-fixing process and the alignment process, the number of the post-hole structure cloth 3 to occupy the columnar spacers 3 Under the state. The number of columnar spacers 3 lost is not equal to 2 / = Riyafia is based on the absolute value, and it is specified by the ratio of 200415392 V. Invention Description (12) The reason is as follows. During the pre-fixing process and the alignment process, pressure is applied in the approach direction between the array substrate and the opposing substrate 2, specifically, the state where the end of the columnar spacer 3 and the surface of the array substrate 1 are in contact with each other. . Therefore, the columnar spacer 3 embedded in the hole structure ie 1 4 is also in a state where a waste force is applied, and the resistance generated in the alignment process f is known to increase with the pressure. On the other hand, during the pre-fixing process and the alignment process, the pressure is applied to the entire surface of the array substrate 1 and the opposing substrate 2 substantially uniformly, and the pressure applied to each columnar spacer 3, that is, the total pressure divided by the columnar interval The value of the number of objects 3. Therefore, the alignment process =, the resistance due to the columnar spacers 3 embedded in the hole structure 14 is not the absolute value of the number with the number of two, but the columnar spacers 3 with the number of the embedment. Increase and become larger. Based on this insight, the present inventors have found that the ratio of the number of columnar spacers 3 to the total number of columnar spacers 3 on the same day is as follows: temple, resistance can be reduced to the point that the alignment process is not actually a problem. Degrees, and complete the structure to get the ratio. : In this embodiment! When the arrangement is to form the columnar spacers 3, the upper door is manufactured. As described above, the columnar spacer 3 is on the opposite substrate 2. Inner surface: Ten: ί = ί Resin and other film-forming structures are formed by the light lithography method to have only the configuration as in the first embodiment. Carefully use this Once you can use the pattern from the top cover, you can use the ancestors, make 1 straight, 1 in ,,, and so on, and use the light of the shadow to implement shape energy 1 ancient M / 4 clothes, etc. can be as usual. Therefore, the image display device related to the shape 1 can be used for precise alignment. The system does not increase the burden on the installation system. (Modifications) Next, the changes in the display of the image display related to the first embodiment will be described. Ml page 20 200415392 5 Description of the invention (13) ___ Examples. The seventh diagram shows an image display device according to a modified example, which is a layout pattern of columnar spaces on the inner surface of the substrate 2. Variation two = f = the opposite image display device is as shown in FIG. 7, the columnar spacers 21 a to 1 ^ The shadow of the Guan satisfies the condition of Embodiment 1, two pairs are formed in pairs / 211. The arrangement position of each pair may be Random, and this becomes: on the two substrates 2. In the example of the compound, a pair of columnar spacers of the same columnar spacer arrangement as in the known technology is formed. "] As can be seen from Figure 7, in this variation, for the projection pattern of the layout pattern of the 14 in the dotted area, the columnar spacers 21 &, Η., 21e, 21g, 21i, 21k belong to the warp The pattern of a specific parallel movement] The spacers 21b, 21d, 2lf, 21h, 21j, and 211 belong to a pattern that is moved in different shapes. In this variation, the cross-sectional area of the columnar spacer is about / used in general Half of the cross-sectional area of the columnar spacer. Μ, that is, the structure of this variation is formed by the columnar spacer 21, and the arrangement pattern of the hole structure 14 is subjected to a parallel movement different from the projection pattern. Most of the patterns. Therefore, as in the first embodiment, the ratio of the columnar spacers of the "diffusion hole structure 14" in the pre-fixing process and the alignment process is suppressed, which can avoid problems in the alignment process. In addition, this variation is based on the arrangement position of the columnar spacers in the conventional structure. Two columnar spacers with a half cross-sectional area are arranged. The distribution of the columnar spacers under the macroscopic view can be regarded as approximately the same as the conventional image display device. Therefore, after the completion of the image display device, For optimal distribution of the conventional column spacer configuration, means to have the same characteristics of a conventional image after completion of the display should be arranged pattern of columnar spacers, is to be considered after the completion of the image significantly

第21頁 200415392 五、發明說明(14) 置Λ特性而定。因此,配置柱狀間隔物使之滿足實施 」〜+、ΓΤ件時,於依该條件完成後之影像顯示裝置而 二:ίί隶適柱狀間隔物配置圖型之設計,有時設計繁 棉忙羽^化例中,對截面積為習知一半的柱狀間隔物,因 开;二白二圖型配置’設計上不増"擔,有能依滿足實施 ί件之配置圖型實現影像顯示裝置之優點。 (貫施形態2) 右關ί i欠說明實施形態2有關之影像顯示裝置。實施形態2 像顯示裝置係形成為1定陣列基板與相向基板 〇間^的柱狀間隔物個數在,陣列基板上之孔構造數的 嗖口以上。以該構造,預固定過程及對位過程中,同時 孔構4之柱狀間隔物占總數的比率即抑制於2 / 3以 I带=本實施形態2有關之影像顯示裝置的基本構造與實 =y心1者同,僅只柱狀間隔物之配置樣態與實施形態^有 Ξ i影像顯示裝置不同。因此,以下說明柱狀間隔物之配 置圖51及形成該配置圖型之優點。 5第8圖係本實施形態2有關之影像顯示裝置中,柱狀間 隔,j配置圖型之示意圖。而第8圖中,虚線區域之圖型 ^ =第4圖’係存在於陣列基板上的孔構造之配置圖型的 杈〜圖型。實施形態2有關之影像顯示裝置,如第8圖,形 成有顯示像素數的3/2倍之柱狀間隔物3。形成柱狀間隔物 22之材料及形成方法與實施形態1同。 盔本貝施形態2中,如第8圖,柱狀間隔物2 2之配置圖型 …特殊控制’多數的柱狀間隔物係所謂隨機配置。以下說Page 21 200415392 V. Description of the invention (14) Depending on the Λ characteristics. Therefore, when columnar spacers are configured to meet the requirements of "~ + and ΓΤ pieces, the image display device after completion of the conditions is as follows: ίί the design of the columnar spacer configuration pattern, sometimes designing cotton In the busy feather example, the columnar spacers with a cross-sectional area of half of the known size can be realized according to the configuration pattern that satisfies the implementation requirements. Advantages of image display devices. (Performance Form 2) The right gate ίi will explain an image display device related to Embodiment 2. Embodiment 2 The image display device is formed such that the number of columnar spacers between the fixed array substrate and the opposite substrate is greater than or equal to the number of holes in the array substrate. With this structure, during the pre-fixing process and the alignment process, the ratio of the columnar spacers of the pore structure 4 to the total number is suppressed to 2/3. I band = the basic structure and practicality of the image display device related to this embodiment 2. = y heart 1 is the same, only the arrangement of the columnar spacers is different from the embodiment ^ i. The image display device is different. Therefore, the configuration diagram of the columnar spacers 51 and the advantages of forming the layout pattern will be described below. Fig. 8 is a schematic diagram of the arrangement pattern of the columnar interval j in the image display device according to the second embodiment. In FIG. 8, the pattern of the dotted area ^ = FIG. 4 ′ is a pattern of a layout pattern of the hole structure existing on the array substrate. The image display device according to the second embodiment, as shown in Fig. 8, is formed with a columnar spacer 3 which is 3/2 times the number of display pixels. The material and method for forming the columnar spacer 22 are the same as those in the first embodiment. In the form 2 of the helmet Benbesch, as shown in FIG. 8, the arrangement pattern of the columnar spacers 22 is ... special control. Most of the columnar spacers are so-called randomly arranged. The following says

第22頁 200415392Page 22 200415392

明,本實施形態2有關之影像顯示裝置中,嵌入於孔構造 的柱狀間隔物不造成對位過程之妨礙的因素。It is clear that in the image display device according to the second embodiment, the columnar spacers embedded in the hole structure do not cause an obstacle to the alignment process.

如上,本貫施形悲2有關之影像顯示裝置中,於相向 基板2之内表面上形成有個數為孔構造丨4的3/2倍以上之柱 狀間隔物22。而預固定過程及對位過程中,同時嵌入孔構 造14之柱狀間隔物22的最大個數取決於孔構造14之個數, 不會有孔構造14個數以上之柱狀間隔物22嵌入孔構造14。 因此,如本實施形態2之形成多於孔構造丨4之柱狀間隔物 22時,不可能所有的柱狀間隔物22都嵌入孔構造14,即使 所有的孔構造14都有柱狀間隔物22嵌入時,仍有一定個數 之柱狀間隔物2 2未嵌入孔構造1 4。尤以本實施形態2中, 因柱狀間隔物2 2係形成為孔構造1 4之個數的3 / 2 立以上, 即使例如所有孔構造1 4都被柱狀間隔物22嵌入時,後入之 柱狀間隔物22占總個數之比率亦在2/3以下。因此,~嵌入 之柱狀間隔物22事實上無妨於對位過程,而可作精密'對 位0 從其它觀點作考量,本實施形態2有關之影像顯示裝 置中,藉枉狀間隔物22個數的調整,即可說明柱狀間隔物 2 2之自動滿足實施形態1中之條件。亦即可以解釋,本實 施形態2中,任意配置柱狀間隔物22,亦能成為配置在^ 構造1 4之配置圖型的投影圖型經平行移動之多數圖型上。 以下說明,本實施形態2中柱狀間隔物2 2的配置滿足實施 形態1之條件。 κ 極端例係假設,柱狀間隔物2 2中,僅以等於孔構造i 4As described above, in the image display device related to the original shape 2, columnar spacers 22 having a number of 3/2 times or more of the hole structure 4 are formed on the inner surface of the opposing substrate 2. In the pre-fixing process and the alignment process, the maximum number of columnar spacers 22 embedded in the hole structure 14 depends on the number of the hole structures 14. There will be no embedding of the columnar spacers 22 with more than 14 hole structures.孔 结构 14。 Hole structure 14. Therefore, when the columnar spacers 22 having more than the hole structure 4 are formed in the second embodiment, it is impossible for all the columnar spacers 22 to be embedded in the hole structure 14 even if all the hole structures 14 have columnar spacers. When 22 is inserted, there are still a certain number of columnar spacers 2 2 without embedded hole structures 1 4. In particular, in the second embodiment, since the columnar spacers 22 are formed as 3/2 or more of the number of the hole structures 14, even when, for example, all the hole structures 14 are embedded by the columnar spacers 22, The ratio of the entered columnar spacers 22 to the total number is also less than 2/3. Therefore, the ~ embedded columnar spacers 22 can actually be used for the alignment process, but can be used for precise 'alignment 0'. From other viewpoints, the image display device related to this embodiment 2 uses 22 spacers. By adjusting the number, it can be explained that the columnar spacers 22 and 2 automatically satisfy the conditions in the first embodiment. That is, it can be explained that, in the second embodiment, the columnar spacers 22 can be arbitrarily arranged, and they can also be arranged on most of the patterns in which the projection patterns of the arrangement pattern of the structure 14 are moved in parallel. It will be described below that the arrangement of the columnar spacers 22 in the second embodiment satisfies the conditions of the first embodiment. The κ extreme case assumes that, in the columnar spacer 2 2, only the pore structure i 4

200415392 五、發明說明(16) *--- 數之個數配置於,孔構造1 4之投影圖型僅經特定距離平行 移動的第一圖型上,其餘柱狀間隔物·22配置於經不同距離 及/_或方向平行移動的第二圖型上。本實施形態2中,柱狀 間隔,22之個數因在孔構造14數的3/2倍以上,配置於第 一圖型上之柱狀間隔物22個數孔構造14數)即在總數的 2/3以下。因,該配置於第一圖型上之柱狀間隔物22, 滿足實施形態1的條件。於是,配置於第二圖型上之柱狀 門隔物2 2因係配置於第一圖型上者以外,配置個數即占 總數的1/3以下。因此,配置於第二圖型上之柱狀間隔物 22,亦滿足實施形態1的條件。 〆柱狀間隔物22之配置實際上並非依如上次序,而係散 亂配,各柱狀間隔物22。因此,實際上柱狀間隔物22係配 置於多數圖型上,同時嵌入孔構造1 4之柱狀間隔物比率更 低於上述例’對位過程中產生之阻力值亦更小。 — 以上’已藉實施形態1及實施形態2說明本發明之内 谷’但本發明不限於上述内容,相關業者應可想出種種實 ^例、麦化例等。例如,實施形態1及實施形態2中,乃將 柱狀間隔物形成於相向基板2之内表面上,但亦可係形成 於陣列基板1上。相向基板2内表面上因亦可有孔構造存 在’抑制肷入該孔構造之柱狀間隔物比率,即可防嵌入之 柱狀間隔物於對位過程中造成妨礙,可作精密對位。 又’實施形態丨及實施形態2中,孔構造係以具有用以 電連接像素電極9與薄膜電晶體丨1之通孔的功能者為例, 然此至多僅係例示,亦可考慮利用其它孔構造之配置圖200415392 V. Description of the invention (16) * --- The number is arranged on the first pattern in which the projection pattern of the hole structure 14 is moved in parallel only by a certain distance, and the rest of the columnar spacers · 22 are disposed in the warp The second pattern moves in parallel at different distances and / or directions. In the second embodiment, since the number of columnar spacers is 22 times the number of holes in the structure 14 or more, the number of columnar spacers arranged on the first pattern is 22 and the number of holes in the structure 14). Less than 2/3. Therefore, the columnar spacers 22 arranged on the first pattern satisfy the conditions of the first embodiment. Therefore, since the columnar door spacers 22 arranged on the second pattern are arranged in addition to the ones on the first pattern, the number of arrangement is less than 1/3 of the total number. Therefore, the columnar spacer 22 disposed on the second pattern also satisfies the conditions of the first embodiment. The arrangement of the columnar spacers 22 is actually not in the same order as above, but is randomly arranged, and the columnar spacers 22 are arranged randomly. Therefore, in fact, the columnar spacers 22 are arranged on most patterns, and at the same time, the ratio of the columnar spacers embedded in the hole structure 14 is lower than the resistance value generated in the alignment process of the above-mentioned example. — In the above, the “inner valley of the present invention has been described by the first embodiment and the second embodiment”, but the present invention is not limited to the above, and relevant industry players should be able to come up with various examples, wheat examples, and the like. For example, in the first and second embodiments, the columnar spacers are formed on the inner surface of the opposing substrate 2, but they may be formed on the array substrate 1. Since there may also be a hole structure on the inner surface of the opposing substrate 2, the ratio of the columnar spacers that penetrate into the hole structure is suppressed, so that the embedded columnar spacers can be prevented from causing obstacles in the alignment process and can be precisely aligned. In the second embodiment and the second embodiment, the hole structure is exemplified by a function having a through hole for electrically connecting the pixel electrode 9 and the thin-film transistor. However, this is only an example at most, and other methods may be considered. Layout of hole structure

第24頁 200415392 五、發明說明(17) 型。例如,形成MVA型液晶顯示裝置時,為控制液晶分子 之傾斜角,有時於陣列基板内表面或相向基板内表面設凹 凸構造。為抑制該柱狀間隔物之嵌入該凹凸,可以採用本 發明。又,實施形態1及實施形態2係以於每一顯示像素規 則設有孔構造者作說明,但本發明之適用範圍不限於此, 亦可具隨機配置之孔構造。孔構造以任一圖型設置時,均 可把握孔構造之配置圖型,並對投影圖型施以不同平行移 動成多數圖塑,於其上配置特定比率的柱狀間隔物,即可 獲致本發明之優點。 而孔構造1 4配置圖型之投影圖型經平行移動之圖型個 數’實施形態1中係為2,但若係2以上,可配置柱狀間隔 物3於任意數之圖型上。形成於各圖型上之柱狀間隔物3個 數係1以上,並可係柱狀間隔物3總數的2 / 3以下之任意 數。例如,亦可準備等於柱狀間隔物3的個數之圖型,於 各圖型上各配置一柱狀間隔物3。該構造下,預固定過程 及對位過程中,因同時僅單一柱狀間隔物嵌入孔構造14, 對位過程中所生之阻力幾可忽略。 形成於相向基板2内表面上之柱狀間隔物3的總數,於 本發明中無限定之必要。柱狀間隔物3之個數取決於形成 柱狀間隔物3之材料、柱狀間隔物3截面積及高度、以及正 式固定時所施加之壓力等。使用目前所用材料時,柱狀間 隔物3總數一般係在顯示像素個數的1 / 3至 丄A f 石’採用 本發明時亦可係另外的總個數。 本發明亦適用於例如,配置像夸雪托 4 1 I豕I冤極、共通電極於不Page 24 200415392 V. Description of invention (17). For example, when forming an MVA liquid crystal display device, in order to control the tilt angle of liquid crystal molecules, a concave-convex structure may be provided on the inner surface of the array substrate or the inner surface of the opposite substrate. In order to prevent the columnar spacer from being embedded in the unevenness, the present invention can be adopted. In addition, Embodiment 1 and Embodiment 2 are described with a hole structure provided for each display pixel rule. However, the scope of application of the present invention is not limited to this, and may have a randomly arranged hole structure. When the hole structure is set in any pattern, the configuration pattern of the hole structure can be grasped, and the projected pattern can be moved in parallel to form a majority figure, and a columnar spacer with a specific ratio can be obtained on the pattern. Advantages of the invention. The number of the projected patterns in which the hole structure 14 is arranged and the pattern is moved in parallel is "2" in Embodiment 1. However, if it is 2 or more, columnar spacers 3 can be arranged on any number of patterns. The number of the three columnar spacers formed on each pattern is 1 or more, and may be any number less than 2/3 of the total number of the columnar spacers 3. For example, a pattern equal to the number of columnar spacers 3 may be prepared, and one columnar spacer 3 may be arranged on each pattern. With this structure, during the pre-fixing process and the alignment process, because only a single columnar spacer is embedded in the hole structure 14 at the same time, the resistance generated during the alignment process is negligible. The total number of the columnar spacers 3 formed on the inner surface of the opposing substrate 2 is not necessarily limited in the present invention. The number of the columnar spacers 3 depends on the material forming the columnar spacers 3, the cross-sectional area and height of the columnar spacers 3, and the pressure applied during the formal fixing. When using currently used materials, the total number of columnar spacers 3 generally ranges from 1/3 of the number of display pixels to 丄 A f stone ′. When the present invention is used, it may also be another total number. The present invention is also applicable to, for example, disposing a common electrode, such as

200415392 五、發明說明(18) —-- 同基板上,對液晶層施加基板垂直方向之電場。除所謂平 面内切換(In-Piane_Switching)型影像顯示裝置以外,本 發明亦適用於形成柱狀間隔物於其一基板,於另一基板上 有特定配置圖型之所有影像顯示裝置。 如以上說明,根據本發明,於第二基板上,孔構造配 置圖型之投影圖型經施以不同平行移動之圖型上各配置1 以上,總數的2/3以下的柱狀間隔物,在第一基板與第二 ^板之預固定過程及對位過程中,可達降低同時嵌入孔構 造之柱狀間隔物的比率,能抑制對位過程中移動基板時的 阻礙之效果。 /又,根據本發明,配置於第二基板上之柱狀間隔物個 數係在孔構造數的3 / 2倍以上,以任意配置圖型配置柱狀 間隔物,在預固定過程及對位過程中,可達抑制嵌入孔構 造之比率於總數的2 / 3以下之效果。200415392 V. Description of the invention (18) --- On the same substrate, an electric field in the vertical direction of the substrate is applied to the liquid crystal layer. In addition to the so-called In-Piane_Switching image display device, the present invention is also applicable to all image display devices in which a columnar spacer is formed on one substrate and another substrate has a specific layout pattern. As explained above, according to the present invention, on the second substrate, the projection patterns of the hole structure arrangement pattern are arranged on the pattern with different parallel movements by more than 1 each, and less than 2/3 of the total columnar spacers, During the pre-fixing process and the alignment process of the first substrate and the second substrate, the ratio of the columnar spacers simultaneously embedded in the hole structure can be reduced, and the effect of hindering the movement of the substrate during the alignment process can be suppressed. / Furthermore, according to the present invention, the number of the columnar spacers arranged on the second substrate is more than 3/2 times the number of the hole structure. The columnar spacers are arranged in an arbitrary layout pattern, and during the pre-fixing process and alignment In the process, the effect of suppressing the ratio of the embedded hole structure to less than 2/3 of the total can be achieved.

第26頁 200415392Page 26 200415392

五、【圖式簡單說明】 第1圖實施形態丨有關之影像顯示裝置的全體構造示意 第2圖s兄明陣列基板上的配線構造之俯視圖。 第3圖第2圖沿A-A線之剖視圖。 第4圖說明形成於相向基板内表面上之柱狀間隔物的 配置圖型之俯視圖。 第5圖預固定過程及對位過程中 向基板V. [Brief Description of the Drawings] Figure 1 shows the overall structure of the related image display device. Figure 2 is a top view of the wiring structure on the array substrate. Figure 3 and Figure 2 are cross-sectional views taken along line A-A. Fig. 4 is a plan view showing the arrangement pattern of the columnar spacers formed on the inner surface of the opposing substrate. Figure 5 Pre-fixing process and alignment process

的位置關係之一例的示意圖。 j i 第6圖預固定過程及對位過程中陣基板 的位置關係之另一例的示意圖。 彳基板… 中 板 對 弟,圖說明實施形 —— w巧關的影像顯57 ,相向基板上柱狀間隔物配置圖刑 ^ $之俯視圖。 第8圖說明實施形態2有關的影儳 1冢顯示裝置中 上柱狀間隔物配置圖型之俯視圖。 第9圖習知技術有關之影像顯示类別視_ 遠1 Π圓羽J:n社你ή右關夕激/会51¾ 相 向 咏Λ •,辰置的構透$ 第10圖習知技術有關之影像顯示裝置在預濟 位過程中,柱狀間隔物嵌入孔構造: 、 \ <狀態的介 意 過An example of the positional relationship. j i Figure 6 is a schematic diagram of another example of the positional relationship of the array substrate during the pre-fixing process and the alignment process.彳 Substrate ... The middle plate, the figure illustrates the implementation form-the image of W Qiaoguan is 57, and the top view of the columnar spacers on the opposite substrate is shown. Fig. 8 is a plan view showing an arrangement pattern of upper columnar spacers in the shadow mound 1 mound display device according to the second embodiment. The image display category view related to the conventional technology in Figure 9_ 远 1 Π 圆 羽 J: n 社 你 price Youguanxiji / hui 51¾ Opposite chanting Λ •, Chen Zhi's structure through $ 10 Image related to the conventional technology In the image display device during the pre-relief process, the columnar spacers are embedded in the hole structure:

元件符號: 1、 101陣列基板 2、 102相向基板 3 a至3 1、2 1 a至2 1 1、2 2、1 0 4柱狀間隔物Element symbols: 1, 101 array substrate 2, 102 opposite substrate 3 a to 3 1, 2 1 a to 2 1 1, 2 2, 1 0 4 columnar spacers

第27頁 200415392 圖式簡單說明 4、 1 0 3液晶層 5、 6偏光板 7、8定向膜 9、1 0 5像素電極 1 0共通電極 11、1 0 7薄膜電晶體 1 2掃描線 1 3信號線 14、14a 至 14r、109 孔構造 15導電層 16基板 1 7絕緣層 1 8、1 0 8平坦化層 19a至19r開口部 2 0遮光部Page 27 200415392 Brief description of the drawings 4, 1 0 3 Liquid crystal layer 5, 6 Polarizing plate 7, 8 Orientation film 9, 10 Pixel electrode 1 0 Common electrode 11, 1 0 7 Thin film transistor 1 2 Scan line 1 3 Signal lines 14, 14a to 14r, 109 Hole structure 15 Conductive layer 16 Substrate 1 7 Insulating layer 1 8, 1 0 8 Flattening layer 19a to 19r Opening portion 20 Light shielding portion

第28頁Page 28

Claims (1)

ZUU4I^jy2 六、申請專利範圍 1 · 一種影像顯示裝置,I供· 第一基板,直内表而、 · 孔構造係依特定配置圖ϋ備多數之孔構造,該多數之 筮-话1 土回匕置, 禾一暴板,與第—I 液曰爲, 基板相向配置; ο α . Α 、 處弟一基板與第二基板之間;以及 上,在卜、+、夕4 Ί ^物群,其係於該第二基板内表面 丄’隹上述多數孔槿袢 平行移動之圖型上,配置圖型的投影圖髮經施以不同 間隔物而成。 配置1以上、總數的2/3以下之柱狀 2.如申請專利範圍第1頊 造深1微米以上。 項之影像顯示裝置,其中上述孔構 3 ·如申請專利範圍第1岑 桎妝Μ碎仏 / ▲ 項之影像顯示裝置,其中上述 狂狀間隔物之個數係在上 ^ 4 如由卜 上逃孔構造數的3/2倍以上。 4.如申請專利範圍第1或2垣夕旦/你w 第一美姑七错—I 4 以項之衫像顯示裝置,其中上述 土板或第^一基板於部份u $ 遮光裝置, lf77&域上更具備抑制光之穿透的 上述2以上之柱狀間隔物 光區域之區域上。 群,係形成在對應於上述遮 5*如申請專利範圍第1或2項之影像顯千駐罢甘士 陣列基板每一顯示像素具備:〜像,、肩不裝置,其中上述 開關元件, 平坦化層,形成於該開關元件上,以 像素電極,配置於該平坦化層上; 上述孔構造係係基於電連接二丄 建接5亥像素電極與上述開關元ZUU4I ^ jy2 6. Scope of patent application1. An image display device, I for the first substrate, straight inside the surface, and the hole structure is prepared according to a specific layout of the majority of the hole structure, the majority of the majority-words 1 soil The dagger is placed, and the violent plate is arranged opposite to the first-I liquid, and the substrate is disposed opposite to each other; ο α. Α, between the first substrate and the second substrate; The group is formed on the inner surface of the second substrate 丄 ′, the above-mentioned plurality of holes are moved in parallel, and the projections of the arranged patterns are formed by applying different spacers. Columns with more than 1 and less than 2/3 of the total number 2. If the scope of patent application is the first one, the depth of manufacture is more than 1 micron. The image display device according to item 3, wherein the above-mentioned pore structure 3 · The image display device according to item 1 of the scope of application for patent, item ▲ / ▲, wherein the number of the above-mentioned crazy spacers is on the top ^ 4 More than 3/2 times the number of escape holes. 4. If the scope of the application for the patent is the first or the second, you will be the first beauty girl and seven mistakes-I 4 item shirt display device, in which the above soil plate or the first substrate is part of the u $ shading device, The lf77 & domain is further provided with the above-mentioned two or more columnar spacer light regions that suppress the penetration of light. The cluster is formed on the image display substrate corresponding to the above-mentioned cover 5 * such as item 1 or 2 of the patent application scope. Each display pixel is provided with: ~ image, shoulder-free device, wherein the above-mentioned switching element is flat. A layer is formed on the switching element, and a pixel electrode is disposed on the planarization layer. The hole structure is based on an electrical connection between the pixel electrode and the switching element. 第29頁 200415392 六、申請專利範圍 件之目的,而逐一顯示像素形成在上述平坦化層之部份區 域。 6 ·如申請專利範圍第1或2項之影像顯示裝置,其中上述 多數的孔構造係設在各自所屬顯示像素内之大致同—位 置。 7 ·如申請專利範圍第1或2項之影像顯示裝置,其中上述 陣列基板更具備: ; 掃描線,以控制上述開關元件之驅動狀態,以及 信號線,其透過上述開關元件對上述像素電極供給電 位。 口 8·如申请專利範圍第1或2項之影像顯示裝置,其中上述 陣列基板於上述像素電極附近更具備共通電極,依據上;述 像素電極與上述共通電極間之電位差,而沿著與上述陣= 基板内表面平行之方向對上述液晶層施加電場。Page 29 200415392 6. For the purpose of patent application, one by one display pixels are formed in a part of the flattening layer. 6 · If the image display device of the scope of patent application No. 1 or 2, most of the above-mentioned hole structures are set at approximately the same position within the respective display pixels. 7 · The image display device according to item 1 or 2 of the patent application scope, wherein the array substrate further includes: a scanning line to control the driving state of the switching element, and a signal line that supplies the pixel electrode through the switching element. Potential. Port 8: If the image display device according to item 1 or 2 of the patent application scope, wherein the array substrate is further provided with a common electrode near the pixel electrode, according to the above; the potential difference between the pixel electrode and the common electrode is along with the above Array = an electric field is applied to the liquid crystal layer in a direction parallel to the inner surface of the substrate.
TW92134100A 2003-02-03 2003-12-03 Image display device TWI230818B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003026441A JP2004239982A (en) 2003-02-03 2003-02-03 Image displaying apparatus

Publications (2)

Publication Number Publication Date
TW200415392A true TW200415392A (en) 2004-08-16
TWI230818B TWI230818B (en) 2005-04-11

Family

ID=32954450

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92134100A TWI230818B (en) 2003-02-03 2003-12-03 Image display device

Country Status (2)

Country Link
JP (1) JP2004239982A (en)
TW (1) TWI230818B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006350211A (en) 2005-06-20 2006-12-28 Toshiba Matsushita Display Technology Co Ltd Liquid crystal display device
JP2007052264A (en) * 2005-08-18 2007-03-01 Toshiba Matsushita Display Technology Co Ltd Liquid crystal display panel
US7894024B2 (en) 2007-07-26 2011-02-22 Beijing Boe Optoelectronics Technology Co., Ltd. Liquid crystal panel
JP6808335B2 (en) 2016-03-11 2021-01-06 株式会社ジャパンディスプレイ Liquid crystal display device
JP6640252B2 (en) 2018-01-19 2020-02-05 シャープ株式会社 LCD panel
CN117374205A (en) * 2022-06-30 2024-01-09 群创光电股份有限公司 Electronic device and preparation method thereof

Also Published As

Publication number Publication date
TWI230818B (en) 2005-04-11
JP2004239982A (en) 2004-08-26

Similar Documents

Publication Publication Date Title
US9811191B2 (en) Array substrate and manufacture method thereof, and touch display panel
TWI533065B (en) Display panel
CN105514125B (en) A kind of array substrate, preparation method and display panel
TWI454807B (en) Display panel and method for manufacturing the same
CN102346339B (en) Liquid crystal display
CN103389599B (en) Display device and its manufacture method
EP2562594A2 (en) Display apparatus and method for manufacturing the same
KR102060992B1 (en) Display substrate and method of manufacturing the same
CN107085323B (en) Display panel, manufacturing method thereof and display device
TWI427385B (en) Liquid crystal display panel
TW200921221A (en) Display and method of manufacturing the same
CN104749842B (en) Liquid crystal display and its manufacture method
WO2016165264A1 (en) Pixel unit and preparation method therefor, array substrate and display device
CN102566148B (en) Liquid crystal display panel and method for fabricating the same
CN203299492U (en) Colored-film substrate, display panel and display device
WO2016201874A1 (en) Array substrate and method for manufacturing same, and display device
CN102998851A (en) Liquid crystal display panel and display device
CN104375344B (en) Liquid crystal display panel and its color membrane array substrate
CN106098703B (en) Display panel, manufacturing method thereof and display
CN103824865B (en) Array substrate, preparation method thereof and display device
CN102104050B (en) Thin film transistor substrate and method for fabricating the same
TW201426146A (en) Array substrate and liquid crystal display device including the same
CN103645589A (en) Display device, array substrate and manufacturing method of array substrate
CN104423098A (en) Liquid crystal display and method for manufacturing the same
CN106773365A (en) Liquid crystal display panel, display device and preparation method

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees