TWI229282B - Touch panel using low arc angle equal electrical potential field - Google Patents

Touch panel using low arc angle equal electrical potential field Download PDF

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Publication number
TWI229282B
TWI229282B TW91122690A TW91122690A TWI229282B TW I229282 B TWI229282 B TW I229282B TW 91122690 A TW91122690 A TW 91122690A TW 91122690 A TW91122690 A TW 91122690A TW I229282 B TWI229282 B TW I229282B
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Taiwan
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substrate
conductive
conductive film
scope
conductive substrate
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TW91122690A
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Chinese (zh)
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Pei-Rung Huang
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Pan Jit Internat Inc
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Abstract

The present invention provides a touch panel input device using low arc angle equal electrical potential field. This device comprises: the first and the second electric conductive substrates, a rectangular electrode frame, a non-conductive thin film layer, and a control unit. This rectangular electrode frame is attached to the first electric conductive substrate whose four corners are individual electrodes connected by a wire to the control unit. The rectangular electrode frame is formed by a plurality of S-shaped silver wires crossed but not conducted to one another lined up in a row. Moreover, a plurality of non-continuous etching lines is provided on the electrical conductive thin film on the first electric conductive substrate in order to provide a uniform resistance distribution. A wire connects the second electric conductive substrate to the control unit to make the second substrate receive the pressing input signal that is applied.

Description

1229282 五、發明說明(1) 【發明領域】 本發明係有關一種觸控式輸入裝置, 極之中含補償之蝕刻線, 尤指一種於兩電 之銀線線段彼此不連接但交互排列 之進Vk Λ4· ΛΗ 2m* ti J.A X Μ提同輸入結果 < + ;性之觸控式輸入裝置。 不 【發明背景】 按,電阻式觸控輸入裝置包括有上下兩層 原理係藉由導電基材連接特定方向電; Κι,另^導;基材則扮演感測層的角色,以驅動ί $剧入裝置/、中上層基材一般為撓性材料,過大外 :可能造成破損。習知之電阻式輸入裝置可概分為兩類, 第一類為上層導電基材連接之電極與下層導電基材連接之 電極須作電壓切換,也就是習稱之四線式觸控面板;第二 類為上層導電基材連接之電極與下層導電基材連接之電極 不須作電壓切換,也就是習稱之五線式觸控面板,其座標 感應方式分別敘述如下: μ ^ 請參閱第一圖,係第一類電阻式輸入裝置,其包括: 玻璃層1 0、ITO( Indium Tin Oxide )導電層11、絕緣層 1 2、一組絕緣點1 3、χ方向之一對銀線導電極(χ +與χ 一) 14、另一絕緣層15、y方向之一對銀線導電極(γ+與γ一) 1 6、另一 IT0導電層1 7、塑膠薄膜1 8以及排線(Tai 1 ) 1 9, 其中排線1 9係連接至控制器,使用時,於兩對電極丨4,丄6 交互施加一定之電壓,被施加電壓之導電層11, 17之電壓 呈線性分佈,當於兩層導電層外表上任一點觸壓時,可經1229282 V. Description of the invention (1) [Field of the invention] The present invention relates to a touch input device, which includes an etching line with compensation in the electrode, especially a silver wire segment between two electric lines which are not connected to each other but are arranged alternately. Vk Λ4 · ΛΗ 2m * ti JA X Μ Touch input device with the same input result <+; [Background of the invention] Pressing, the resistive touch input device includes two layers of upper and lower principles, which are connected to a specific direction of electricity through a conductive substrate; Kι, another guide; the substrate plays the role of a sensing layer to drive ί $ The sharp-entry device /, the upper and middle substrates are generally flexible materials, and they are too large: they may cause damage. The conventional resistive input devices can be roughly divided into two types. The first type is that the electrode connected to the upper conductive substrate and the electrode connected to the lower conductive substrate must be switched by voltage, which is commonly known as a four-wire touch panel; The second type is that the electrode connected to the upper conductive substrate and the electrode connected to the lower conductive substrate do not need to switch voltages, which is commonly known as a five-wire touch panel. The coordinate sensing methods are described as follows: μ ^ Please refer to the first The figure shows the first type of resistive input device, which includes: a glass layer 10, an ITO (Indium Tin Oxide) conductive layer 11, an insulating layer 1, 2, a set of insulating points 1, and a pair of silver wire conducting electrodes in the χ direction (Χ + and χ a) 14. Another insulating layer 15. One of the y-direction silver wire conducting electrodes (γ + and γ a) 1 6. Another IT0 conductive layer 1 7, plastic film 18, and wiring ( Tai 1) 19, where the cable 19 is connected to the controller. When using, a certain voltage is alternately applied to the two pairs of electrodes 丨 4, 丄 6, and the voltages of the conductive layers 11, 17 are linearly distributed. When touched at any point on the surface of the two conductive layers,

第4頁 五、發明說明(2) 由非施加電壓之一對電極測量兩片導電層經 值’經由控制器計算即可得知觸壓點位於 方向座標。此類電阻式輸入裝置的缺點 ‘ 】路==;要2交互通電產生雜訊及“定電 -上都較困難,同時當任-層導di:失加 請參閱第二圖,係第二類電阻式輸入裝置, b 層2。、m導電薄膜21、—組絕緣點22、電極γ . ^ 方向與Υ軸方向電極)23、絕緣層24、銀導線層Π軸 絕緣層26、檢測用銀導線層27、另—⑽導電^膜^另 膠薄膜29以及排線21 〇,其中排線2丨〇係連接至控制 :阻式輸入裝置之工作原理係於一導電薄膜21 :周連: ==上ΪΙΪΓ包括x軸方向與γ軸方向電極,以銀 ;-端透過排線21。與控制器電路基板相連接,、一導導線的 ^膜28之導電側亦以銀導線層27上導 ^ 器電路,以作為按壓檢測用。當义薄連膜接 21,,,表上任:點㈣時,藉由控制器電路 又互%加一疋之電壓於電極框23上之χ軸方向與Y 二電極,再由檢測層27量取觸壓時之電壓' 電路計算得知觸壓點之X、γ座標。 丄由控制器 第三圖說明第二類電阻式輸入裝置中控制器電Page 4 V. Description of the invention (2) The value of two conductive layers measured by one of the non-applied voltage pair electrodes is calculated by the controller, and it can be known that the touch pressure point is located in the direction coordinate. Disadvantages of this type of resistive input device '] Road ==; It is difficult to generate noise by 2 alternating currents and "fixing electricity-it is more difficult, and at the same time, the role-layer conduction di: please refer to the second figure, is the second Class resistive input device, b layer 2. m conductive film 21,-group of insulation points 22, electrode γ (^ direction and z axis direction electrode) 23, insulation layer 24, silver wire layer Π axis insulation layer 26, detection Silver wire layer 27, another conductive film, another adhesive film 29, and a cable 21, where the cable 2 is connected to the control: the working principle of the resistive input device is a conductive film 21: Zhou Lian: == 上 ΪΙΪΓ includes electrodes in the x-axis direction and the γ-axis direction with silver; the-end passes through the cable 21. Connected to the controller circuit substrate, the conductive side of the ^ film 28 of a conductive wire is also on the silver wire layer 27 The guide circuit is used for pressing detection. When the thin film is connected to 21 ,,, and on the table: when the point is clicked, the controller circuit adds a voltage of 1% to the x-axis direction of the electrode frame 23 and The Y two electrodes, and then the voltage at the time of the touch pressure is measured by the detection layer 27, and the X and γ coordinates of the touch pressure point are calculated by the circuit. The third figure illustrates the controller power in the second type of resistive input device.

之;=測層27設有一 Ι/0,Β係為檢測輪入= 狀L之控制裝置,電極框23四個角落之中有一個角落LB 1229282 五、發明說明(3) ^i:VCC,其對角角落RT則固定接於接地端,其餘兩 冬:*LT則父互連接於Vcc與接地端,當LT連接於Vcc 杰一 ±,連接於接地端,如此理想上可在導電基材21上形 而二隊左至右呈線性分佈的電壓場(VoltaSe Field),然 ^ 上並非如此,原因是此類電阻式輸入裝置的X軸方 :與=方向電極均連結於單一導電基材21,為避免短 阳p夕。方向與γ軸方向電極必是由不連續的銀線或由較高 S 2反線所構成,因此介於LB和[7的中間點電壓值便不 =目二Γ期的Vcc ’而介於RB和1^的中間點電壓值也不是 了 ^的接地端’造成x、γ座標值輸入之誤差較大,尤 ^ =罪,電極框内緣的輸入範圍’若無依賴控制器之校正 :::虽使用者晝一條直線時,i常出現的會是一條内凹 其1 Ϊ此如何降低此内凹的現象,亦即如何使得導電 = 之電位場為低弧度,甚至零弧度,將是觸控準確 ^之關鍵因此,本發明人有鑑於此,經過不斷測試研 九’始有本發明之產生。 【發明概要】 本,明之主要目的在於利用兩電極間之蝕刻線之補 侈,以提供均勻之電阻分佈,提高輸入結果之準確性。 本發明之次要目的在於電極框係由複數個類「s 之銀線線段彼此不連接但交互排列而成,以提供均電 阻分佈,提高輸入結果之準確性。 八一 "ίίΐΐ目:,本發明提出一種低弧度等電位場之觸 控式輸入裝置’其包括:第一導電基材、第二導電基材、 1229282 五、發明說明(4) 電極框、絕 材上,其四 控制器,該 不連接但交 薄膜上設有 分佈,該第 測按壓訊號 上述蝕 第一導電基 返離該第一 短,第二種 該第一導電 離該第二導 【圖式之簡 第'一圖係習 第二圖係習 第三圖係習 圖; 緣層及控制 角落係分別 電極框係由 互排列而成 複數個不連 一導電基材 用。 刻線有兩種 材之四個角 導電基材之 情況是該蝕 基材之四個 電基材之四 單說明】 用第一類電 用第二類電 用第二類電 器,該電極框係附著於第一導電基 為一電極且係利用一導線連接至該 複數個類「s」形之銀線線段彼此 ’另外’該第一導電基材上之導電 續之蝕刻線,以提供一均勻之電阻 係由一導線連接至該控制器作為感 分布情況,第一種情況是愈靠近該 落’該#刻線之線段長度愈長,愈 四個角落’該餘刻線之線段長度愈 刻線之線段長度皆相同,但愈靠近 角落’該姓刻線之密度愈大,愈遠 個角落,該蝕刻線之密度愈小。 阻式輸入裝置之示意圖; 阻式輸入裝置之示意圖; 阻式輸入裝置中控制器電路之示意 第四圖係本發明之結構示意圖; 電極框之示意圖 電極框之示意圖 第五圖係本發明第一實施例之餘刻線與 第六圖係本發明第二實施例之蝕刻線與 【主要元件編號】 10 玻璃層 11 ITO( Indium Tin Oxide)導電層=; The detection layer 27 is provided with a 1/0, B is a control device for detecting the wheel-in = shape L, and one of the four corners of the electrode frame 23 has a corner LB 1229282. 5. Description of the invention (3) ^ i: VCC, The diagonal corner RT is fixedly connected to the ground terminal, and the remaining two winters: * LT is connected to Vcc and the ground terminal. When LT is connected to Vcc, it is connected to the ground terminal, so ideally it can be on a conductive substrate. The voltage field (VoltaSe Field) with a linear distribution from left to right on the top of the 21st team, but not on ^, is because the X-axis side of this type of resistive input device: and = direction electrodes are connected to a single conductive substrate 21, in order to avoid short sun. The direction and γ-axis direction electrodes must be composed of discontinuous silver wires or higher S 2 anti-lines, so the voltage value between the middle point of LB and [7 is not equal to Vcc 'of the period Γ and is between The voltage at the intermediate point between RB and 1 ^ is not the ground terminal of ^, which causes a large error in the input of the x and γ coordinate values, especially ^ = sin, the input range of the inner edge of the electrode frame 'if it does not rely on the controller's correction: :: Although when a user draws a straight line, i often appears to be a recessed one. How to reduce this recessed phenomenon, that is, how to make the electric potential = low arc, or even zero arc, will be The key to accurate touch control Therefore, the present inventors have taken this into consideration, and the invention has been produced after continuous testing and research. [Summary of the Invention] The main purpose of the present invention is to use the complement of the etching line between the two electrodes to provide a uniform resistance distribution and improve the accuracy of the input result. The secondary objective of the present invention is that the electrode frame is composed of a plurality of silver wire segments of the type "s" which are not connected to each other but are arranged alternately to provide a uniform resistance distribution and improve the accuracy of input results. Bayi " ίίΐΐ 目:, The present invention proposes a touch input device with a low arc equipotential field. The touch input device includes: a first conductive substrate, a second conductive substrate, and 1229282. 5. Description of the invention (4) Electrode frame and insulation material. The non-connected but cross-connected film is provided with a distribution, the first measured pressing signal etches the first conductive base away from the first short, and the second kind of the first conductive ion is away from the second conductive base. The drawing is the second drawing, the third drawing is the drawing; the edge layer and the control corner are respectively electrode frames are arranged from each other to form a plurality of non-conductive substrates. The score line has four corners of two materials. In the case of a conductive substrate, four of the four electrical substrates of the etched substrate are described.] With the first type of electricity, the second type of electricity, and the second type of electrical appliances, the electrode frame is attached to the first conductive substrate as an electrode. And is connected to the plurality by a wire The “s” -shaped silver wire segments are “additional” to each other and the conductive etched lines on the first conductive substrate are provided to provide a uniform resistance connected by a wire to the controller as a sense distribution. The first type The situation is that the closer the line is, the longer the line length of the #engraved line is, the more four corners are. The longer the line length of the remaining line is, the more the length of the line is the same, but the closer to the corner, the denser the line of the last name is. The larger, the farther away the corner, the smaller the density of the etch line. Schematic diagram of a resistive input device; Schematic diagram of a resistive input device; Schematic diagram of a controller circuit in a resistive input device. The fourth diagram is a schematic diagram of the structure of the present invention; The remaining engraved lines and the sixth diagram of the embodiment are the etching lines and the [major component number] of the second embodiment of the present invention. 10 Glass layer. 11 ITO (Indium Tin Oxide) conductive layer.

1229282 五、發明說明(5) 12 絕緣層 13 絕緣點 14 X方向之一對銀線導電極(X+與X-) 15 絕緣層 16 y方向之一對銀線導電極(Y +與Y-) 17 ITO導電層 18 塑膠薄膜 19 排線 2 0 玻璃層 21 ITO導電薄膜 22 絕緣點 23 電極框(包括X軸方向與Y軸方向電極) 24 絕緣層 25 銀導線層 26 絕緣層 2 7 檢測用銀導線層 28 ITO導電薄膜 29 塑膠薄膜 2 1 0排線 30 基板 31 導電薄膜 32 網點層 3 3 電極框 34 絕緣層1229282 V. Description of the invention (5) 12 Insulating layer 13 Insulating point 14 One pair of silver wire conducting electrodes in X direction (X + and X-) 15 Insulating layer 16 pair of silver wire conducting electrodes in Y direction (Y + and Y-) 17 ITO conductive layer 18 Plastic film 19 Cable 2 0 Glass layer 21 ITO conductive film 22 Insulation point 23 Electrode frame (including X-axis and Y-axis electrodes) 24 Insulation layer 25 Silver wire layer 26 Insulation layer 2 7 Detection silver Conductor layer 28 ITO conductive film 29 Plastic film 2 10 cable 30 substrate 31 conductive film 32 dot layer 3 3 electrode frame 34 insulation layer

1229282 五、發明說明(6) ' 3 5 另一基板 36 另一導電薄膜 37 電極接點 38 電極接點 39 電極接點 40 電極接點 41 钮刻線 【發明詳細說明】 為使 鈞局對本發明能進一步瞭解,以下茲以較佳實 施例,配合圖式、圖號,將本發明之構成内容及其所達成 的功效詳盡說明如后。請參閱第四圖,係本發明之電阻式 輸入裝置之示意圖,其包括··基板30、導電薄膜31、網^ 層32、電極框33、絕緣層34、另一基板35、另一導電薄膜 3 6、以及姓刻線4 1。其中電極3 7,3 8,3 9,4 0係連接至控 制器,該基板30可為玻璃(Glass),塑膠基板(piastic Carbonate)或塑膠薄膜(Film),該導電薄膜31係為氧化銦 錫ITO(Indium Tin Oxide)或銅箔等導電材料,係以濺鑛 (Sputtering)或塗佈(Coating)等方式使之附著於基板3〇 上’該網點層3 2係以印刷方式印刷或將光阻塗佈、曝光、 顯衫於導電薄膜3 1上’該電極框3 3係以印刷方式印刷於導 電薄膜3 1之周緣上’該絕緣層3 4係以印刷方式印刷或貼覆 於導電薄膜31上,該另一基板35可為玻璃(Glass)、塑膠 基板(Plastic Carbonate)或塑膠薄膜(Film),該另一導1229282 V. Description of the invention (6) '3 5 Another substrate 36 Another conductive film 37 electrode contact 38 electrode contact 39 electrode contact 40 electrode contact 41 button engraving [Detailed description of the invention] It can be further understood that, in the following, preferred embodiments are described in detail with reference to the drawings and figures to describe the composition of the present invention and the effects achieved by it in detail. Please refer to the fourth figure, which is a schematic diagram of the resistive input device of the present invention, which includes a substrate 30, a conductive film 31, a mesh layer 32, an electrode frame 33, an insulating layer 34, another substrate 35, and another conductive film. 3 6, and last name engraved line 4 1. The electrodes 37, 38, 39, 40 are connected to the controller. The substrate 30 can be glass, plastic carbonate or film, and the conductive film 31 is indium oxide. Conductive materials such as tin ITO (Indium Tin Oxide) or copper foil are attached to the substrate 30 by means of sputtering or coating, etc. The dot layer 3 2 is printed or printed. Photoresist coating, exposure, display on conductive film 3 1 'The electrode frame 3 3 is printed on the periphery of conductive film 3 1' The insulating layer 3 4 is printed or printed on conductive film On the film 31, the other substrate 35 may be glass (Glass), plastic substrate (Plastic Carbonate) or plastic film (Film).

1229282 --------- 五、發明說明(7) "" ' ----- 膜36係為氧化銦錫IT〇(Indium Tin 〇xide)或銅箔 ,電材料,係以濺鍍(Sputtering)或塗佈(c〇ating). ^使之附著於基板35上,此另一導電薄膜36係連接至控方 益 該敍刻線4 1係以濕触刻或乾姓刻將導電薄膜3 1之 膜蚀刻掉,或已其他方式將導電膜移除。 電 請參閱第五圖所示,係本發明第一實施例中蝕刻線 與電極框33之示意圖,該電極框33係由複數個類「s」形 之銀線線段彼此不連接但交互排列而成,此設計之」; 於提供一均勻之電阻分佈,且可以下式概略估算每一類 「S」形區段之阻抗值: ΤΟ d3ΪΤ + RSAg 7 2/- 2w — 2d 12 w 4w^3d 其中u為導電薄劇之片電阻值、、為銀線線段之 片電阻值、1為區段長、w為線寬、d為線距。經由調整區 段長、線寬、線距之值,可設計出滿足控制器阻抗設計需 求之最佳值,較佳之實施例為w = (K5mm,d = ().3mi 1 = 1 6mm 〇 然而,此時電極框33所造成導電薄膜31上之等電位場 仍有些許孤度’如何將此等電位場之弧度再降至更低,則 利用本發明之姓刻線41 ’單位長度内,愈近電極處,蝕刻 線段之長度愈長’愈退離電極處,即愈中心處,姓刻線段 之長度愈短。以此實施例藉由調整蝕刻線之長度,越中間 越短之原則,導電薄膜31上之等電位場將可降至最低,甚1229282 --------- V. Description of the invention (7) " " '----- Film 36 is made of indium tin oxide IT〇 (Indium Tin 〇xide) or copper foil, electrical material, system Sputtering or coating. ^ Make it adhere to the substrate 35, this other conductive film 36 is connected to the prosecutor, the scribe line 4 1 is engraved with wet touch or dry name The conductive film 31 has been etched away, or the conductive film has been removed in other ways. Please refer to the fifth figure, which is a schematic diagram of the etching line and the electrode frame 33 in the first embodiment of the present invention. The electrode frame 33 is composed of a plurality of "s" shaped silver wire segments which are not connected to each other but are arranged alternately. This design is designed to provide a uniform resistance distribution, and can roughly estimate the impedance value of each type of "S" shaped section as follows: ΤΟ d3ΪΤ + RSAg 7 2 /-2w — 2d 12 w 4w ^ 3d where u is the sheet resistance value of the conductive thin film, is the sheet resistance value of the silver line segment, 1 is the section length, w is the line width, and d is the line spacing. By adjusting the values of section length, line width, and line spacing, the optimal value that meets the controller's impedance design requirements can be designed. The preferred embodiment is w = (K5mm, d = (). 3mi 1 = 16mm. 〇 However At this time, the equipotential field on the conductive film 31 caused by the electrode frame 33 is still slightly lonely. 'How to reduce the arc of the equipotential field to a lower level? The closer the electrode is, the longer the length of the etched line segment is. The farther it is away from the electrode, that is, at the center, the shorter the length of the last engraved line segment. In this embodiment, by adjusting the length of the etched line, the shorter the middle, the shorter the length. The equipotential field on the conductive film 31 will be minimized, and even

1229282 五、發明說明(8) 至零弧度。原因在於原本愈近電極處,電阻值愈低;愈遠 離電極處,電阻值愈高之現像,經由蝕刻線長度之調整, 在愈近電極處增加較多之阻值,愈遠離電極處,增加較少 之阻值’如此不管距離遠近,電阻值將可達一致,相對等 電位場將可達零弧度。 八另一姓刻線實施例請參閱第六圖,其中,該蝕刻線之 線段長,皆相同,但愈靠近電極處,蝕刻線之密度愈大 (也就是單位長度内蝕刻線段數目愈多),愈遠離&極 處,即愈中心處,該蝕刻線之密度愈小(也就是單位長度 内蝕刻線段數目愈少),如此亦可達電阻值一致之效果, 以提高輸入結果之準確性。 綜上所述,本發明所提供之低弧度等電位場之觸控式 輸入裝置,不僅可達預期之實用功效外並且為前所未^之 新設計,已符合專利法發明之要件,爰依法具文申於之。 為此,謹請貴審查委員詳予審查,並祈早日賜準專^ 至感德便。 以上已將本發明作一詳細說明,惟以上所述 本發明之較佳實施例而已,當不能限定本發明實施之”’、 圍,即凡依本發明申請專利範圍所作之均等變化與修^ 等,皆應仍屬本發明之專利涵蓋範圍意圖保護之ϋ。1229282 V. Description of the invention (8) to zero radians. The reason is that the closer the electrode is, the lower the resistance value; the farther away from the electrode, the higher the resistance value, the more the resistance value is increased near the electrode through the adjustment of the length of the etching line, and the farther away from the electrode, the more Less resistance value, so regardless of the distance, the resistance value will be consistent, and the relative equipotential field will reach zero radians. For an example of another engraved line, please refer to the sixth figure, in which the line length of the etching line is the same, but the closer to the electrode, the greater the density of the etching line (that is, the greater the number of etching line units per unit length) The farther away from the & pole, that is, the more the center, the smaller the density of the etching line (that is, the fewer the number of etching lines per unit length), so that the effect of consistent resistance value can also be achieved to improve the accuracy of the input result . In summary, the touch input device with low arc equipotential field provided by the present invention not only achieves the expected practical effect but also a new design that has never been achieved. It has already met the requirements of the invention of the Patent Law, and is based on the law. Gwen applied for it. For this reason, I ask your reviewing committee to give a detailed review, and pray for your special attention as soon as possible. The present invention has been described in detail above, but only the preferred embodiments of the present invention described above, when it is not possible to limit the implementation of the present invention, "", that is, all equal changes and modifications made in accordance with the scope of the patent application of the present invention ^ Etc., should all still fall under the protection scope of the patent scope of the present invention.

_ II_ II

第11頁 1229282 圖式簡單說明 第12頁Page 11 1229282 Brief description of the drawings Page 12

Claims (1)

1229282 六、申請專利範圍 1* 一種低弧度等電位場之觸控式輸入裝置,其包括: 哭電基材、第二導電基材、—電極框、一絕緣層 15,該電極框係附著於第一導電基材上,其特徵在於 f電極框係由複數個類rS」形之銀線線段彼此不連接但 父互排列而成,以提供一均勻之電阻分佈。 - 2, 如申請專利範圍第1項所述之裴置,其中,該第一導雷 J材包括::基板、一導電薄膜及_網點層,3外,該電 岳丨】之四角落係分別為一電極且係利用-導線連接至該控 3. 如申請專利範圍第丨項所述之裝置,其中,該第二導電 J材包括:-基板、—導€薄膜,該導電薄 控制器。 饮王必 4· 一種低弧度等電位場之觸控式輸入裝置,其包括:第一 ,電基材、第二導電基材、-電極框、_絕緣層及一控制 益,該電極框係附著於第一導電基材上,其特徵在於: 該第一導電基材上設有複數個不連續之蝕刻以 均勻之電阻分佈。 # 5·如申請專利範圍第4項所述之裝置,其中,該第一導電 基材包括:一基板、一導電薄膜及一網點層,另外,該電 極框之四角落係分別為一電極且係利用一導線連接至該控 制器,該钱刻線係位於該導電薄膜上。 二 6.如申請專利範圍第4項所述之裝置,其中,該第二導電 基材包括:一基板、一導電薄膜,該導電薄膜係連接至該 控制器。1229282 VI. Application patent scope 1 * A touch input device with a low arc equipotential field, comprising: a cryoelectric substrate, a second conductive substrate, an electrode frame, and an insulating layer 15, which is attached to The first conductive substrate is characterized in that the f-electrode frame is formed by a plurality of rS "-like silver wire segments which are not connected to each other but are arranged in parallel with each other to provide a uniform resistance distribution. -2, as described in item 1 of the scope of the patent application, wherein the first lightning guide J material includes: a substrate, a conductive film, and a dot layer, 3, and the four corner systems Each electrode is an electrode and is connected to the controller by a wire. 3. The device as described in the first item of the patent application scope, wherein the second conductive J material includes:-a substrate,-a conductive film, the conductive thin controller . Yin Wang Bi 4 · A touch input device with a low arc isoelectric field, comprising: a first, an electric substrate, a second conductive substrate, an electrode frame, an insulating layer and a control benefit, the electrode frame is The first conductive substrate is attached to the first conductive substrate and is characterized in that: the first conductive substrate is provided with a plurality of discontinuous etchings for uniform resistance distribution. # 5. The device according to item 4 of the scope of patent application, wherein the first conductive substrate includes: a substrate, a conductive film, and a dot layer; in addition, four corners of the electrode frame are electrodes and A wire is connected to the controller, and the money engraving line is located on the conductive film. 2. The device according to item 4 of the scope of patent application, wherein the second conductive substrate comprises a substrate and a conductive film, and the conductive film is connected to the controller. 第13頁 1229282 專利範ϊ '~—' ----^ ^如申請專利範圍第6項所述之裝置,其中,該蝕刻線之 生方式係利用濕蝕刻將該導電薄膜上之導電膜蝕刻掉。 •如申請專利範圍第6項所述之裝置,其中,該蝕刻線之 產生方式係利用乾蝕刻將該導電薄膜上之導電膜蝕刻掉。 9·如申請專利範圍第4項所述之裝置,其中,愈靠近該第 一導電基材之四個角落,該蝕刻線之線段長度愈長,愈遠 離該第一導電基材之四個角落,該蝕刻線之線段長度愈 短。Page 131229282 Patent range ~~~ '---- ^ ^ The device described in item 6 of the scope of patent application, wherein the way of generating the etching line is to etch the conductive film on the conductive film by wet etching Off. • The device according to item 6 of the scope of patent application, wherein the etching line is generated by dry etching the conductive film on the conductive film. 9. The device according to item 4 of the scope of patent application, wherein the closer to the four corners of the first conductive substrate, the longer the length of the line segment of the etching line, the farther away from the four corners of the first conductive substrate The shorter the line length of the etch line. I 0 ·如申請專利範圍第4項所述之裝置,其中,該蝕刻線之 線段長度皆相同,但愈靠近該第一導電基材之四個角落, 該蝕刻線之密度愈大,愈遠離該第一導電基材之四個角 落,該蝕刻線之密度愈小。 II ·如申請專利範圍第4項所述之裝置,其中,該電極框係 由複數個類「S」形之銀線線段彼此不連接但父互排列而 成0I 0 · The device as described in item 4 of the scope of patent application, wherein the lengths of the etched lines are the same, but the closer to the four corners of the first conductive substrate, the greater the density of the etched lines, the farther away they are. The four corners of the first conductive substrate have a smaller density of the etching line. II. The device as described in item 4 of the scope of patent application, wherein the electrode frame is composed of a plurality of "S" shaped silver wire segments which are not connected to each other but are arranged in parallel with each other to form 0. 第14頁Page 14
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI402740B (en) * 2009-12-10 2013-07-21 Ind Tech Res Inst Touch apparatus, transparent scan electrode structure, and manufacturing method thereof
US8558722B2 (en) 2009-12-10 2013-10-15 Industrial Technology Research Institute Touch apparatus, transparent scan electrode structure, and manufacturing method thereof
TWI594171B (en) * 2013-04-24 2017-08-01 Apex Mat Tech Corp Touch panel and method of manufacturing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI402740B (en) * 2009-12-10 2013-07-21 Ind Tech Res Inst Touch apparatus, transparent scan electrode structure, and manufacturing method thereof
US8558722B2 (en) 2009-12-10 2013-10-15 Industrial Technology Research Institute Touch apparatus, transparent scan electrode structure, and manufacturing method thereof
TWI594171B (en) * 2013-04-24 2017-08-01 Apex Mat Tech Corp Touch panel and method of manufacturing the same

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