TWI221689B - Corona processing equipment - Google Patents

Corona processing equipment Download PDF

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Publication number
TWI221689B
TWI221689B TW92107368A TW92107368A TWI221689B TW I221689 B TWI221689 B TW I221689B TW 92107368 A TW92107368 A TW 92107368A TW 92107368 A TW92107368 A TW 92107368A TW I221689 B TWI221689 B TW I221689B
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Taiwan
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electrode plate
circuit system
voltage circuit
positive electrode
negative electrode
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TW92107368A
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Chinese (zh)
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TW200421684A (en
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Feng-Yi Tsai
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Linco Technology Co Ltd
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Publication of TW200421684A publication Critical patent/TW200421684A/en

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Abstract

The present invention provides a corona processing equipment, which improves the problem of high cost and limited surface processing effect for the plasma processing equipment in the prior art. The solution of the present invention is to install a high-voltage circuit system between a power source and a positive electrode plate. The high-voltage circuit system is grounded in the middle, and a negative electrode plate is installed. The dense silk-like arc (hopping electrons) between the positive electrode plate and the negative electrode plate is utilized to generate the corona discharge in a wider range. Thus, the corona discharge provides a better surface cleaning effect on the object to be cleaned, and enhances the surface uniformity. Also, since the gas temperature to operate the corona discharge is close to room temperature (which belongs to cold plasma type), energy is not required to raise the gas temperature, and electromagnetic interference of RF emission equipment is not generated.

Description

1221689 五、發明說明(1) 【發明所屬技術領域】 本發明係提供一種電暈處理設備,其主要是在二個電 極板之間產生穩定的擴散電暈放電,利用電暈放電可以增 進表面處理效果與表面一致性;具體而言,本發明設備是 指一種具有高壓電路系統、中點接地、絕緣室、正電極板 與負電極板的電暈處理設備,藉由正電極板與負電極板讓 待清理物表面承受擴散的電暈放電(大量絲狀電弧與發光 現象),電子撞擊會產生一般性的表面清理,而大量絲狀 電暈則會增益表面清理的效果者。 【先前技術】 按,一般低壓電漿表面處理都是採用高頻電漿電力發 射系統(例如:就像無線電頻RF ),請參閱第一圖所示, 包含了 一組電極電源(1 0 )、一待清理件(1 4 ),以 及另一組用於發射無線電頻(RF )之電源(1 1 )、發射 盒(1 2 )及交流電發電機(1 3 );由電極電源(1 0 )產生的電漿電子,會利用氣體分子將待清理件(1 4 ) 上的金屬原子藏射出來,當這些金屬原子行經藏鍵室中的 氣體時,則這些金屬原子便再與氣體產生大量碰撞,產生 表面原子撞擊、清理的效果;若在此同時,另外施與交流 電發電機(1 3 )之無線電頻(RF )的震盪,則無線電頻1221689 V. Description of the invention (1) [Technical field of the invention] The present invention provides a corona treatment device, which mainly generates a stable diffusion corona discharge between two electrode plates, and the surface treatment can be improved by using the corona discharge. The effect is consistent with the surface; specifically, the device of the present invention refers to a corona treatment device having a high-voltage circuit system, a neutral point ground, an insulation chamber, a positive electrode plate and a negative electrode plate. The surface of the object to be cleaned is subjected to a diffuse corona discharge (a large number of filamentary arcs and luminous phenomena). Electron impact will generate general surface cleaning, and a large number of filamentary coronas will increase the effect of surface cleaning. [Previous technology] According to the general, the surface treatment of low-voltage plasma is generally a high-frequency plasma power transmission system (for example: just like radio frequency RF), please refer to the first figure, including a set of electrode power supply (1 0 ), A piece to be cleaned (1 4), and another set of power sources (1 1), transmitting boxes (1 2) and AC generators (1 3) for transmitting radio frequency (RF); powered by electrodes (1 The plasma electrons generated by 0) will use the gas molecules to hide the metal atoms on the part to be cleaned (1 4). When these metal atoms pass through the gas in the bond bond chamber, these metal atoms will be generated with the gas. A large number of collisions produce the effect of surface atomic collisions and cleaning; if at the same time, the radio frequency (RF) vibration of the alternator (1 3) is additionally applied, the radio frequency

第5頁 1221689 五、發明說明(2) (RF )散發出獨特的規律電子衝撞及震盪光熱會加速這些 金屬與氣體及電子間的碰撞,致使電子很容易與氣體分子 碰撞而將能量轉移;上述符習用低壓電漿表面處理會降低 電漿處理的電源的需求量(操作時間縮短、溫度降低), 並且防止過度加熱,此種高頻電漿電力發射系統是現今常 見低壓電漿表面處理方法之一,但是,其處理作業仍會產 生下列問題: 其一,習用無線電頻(RF )會有高成本的問題,由於 無線電頻(RF )的高頻震動會使作業環境的溫度過高,故 習用設備中必須安裝高成本的降溫設備; 其二’同樣因為無線電頻(R F )易產生局溫的問題5 作業環境高溫會使待清理件(1 4 )表面原子結成失敗, 而且,由於電漿電子分散並不均勻,該待清理件(1 4 ) 表面處理的效果增益也十分有限; 其三,習用無線電頻(RF )在發射時又會產生電磁波 ,而電磁波則會干擾週側的電子設備,使器材不準破、控 制不易精確者。 會製也 不與題 、者問 果發的 效研現 理成呈 處變所 面已中 表早容 佳,内 更備述 有設上。 具理而機 種處,動 一 暈題的 出電問案 發面個本 開表幾發 何的的研 如陷服人 ,缺克明 此多想發 因過最案 生商本 產造是 針對以上缺陷,在求理想、實用與進步之今日,誠為Page 5 1221689 V. Description of the invention (2) (RF) emits a unique regular electron impact and oscillating light and heat will accelerate the collision between these metals and gases and electrons, causing electrons to easily collide with gas molecules and transfer energy; the above Fuxi ’s low-voltage plasma surface treatment will reduce the amount of power required for plasma treatment (shorter operating time and lower temperature) and prevent excessive heating. This high-frequency plasma power transmission system is a common low-voltage plasma surface treatment today. One of the methods, however, its processing operations still produce the following problems: First, the conventional radio frequency (RF) will have a high cost problem. Due to the high frequency vibration of the radio frequency (RF), the temperature of the working environment will be too high. Therefore, conventional equipment must be equipped with high-temperature cooling equipment; the second is also because radio frequency (RF) is prone to local temperature problems. 5 The high operating environment will cause the formation of atoms on the surface of the part to be cleaned (1 4). The electron dispersion of the pulp is not uniform, and the effect gain of the surface treatment of the part to be cleaned (1 4) is also very limited. Third, the conventional radio frequency (RF) Will produce electromagnetic waves emitted, the electronic device will interfere with the electromagnetic circumferential side of the equipment are not allowed to break, difficult to precisely control by. The meeting system is not related to the questions and questions. The effectiveness of the research is now quite reasonable, and it is described in detail. Reasonable and machine-type department, a dizzy question appears on the phone, the case is published, how many studies have been published, such as the trapped person, and the lack of clarification, I want to send more because of the most successful businessmen Defects, in the pursuit of ideals, practicality and progress, sincerely

第6頁 1221689 五、發明說明(3) 一極待努力追求改善之目標;有鑑於斯,本案發明人乃經 詳思細索,並積多年從事各種電漿機構與相關電漿處理技 術之販售、研究與開發之經驗,終而得以開發出一種電暈 處理設備,其不但有益於表面處理作業,也能取代結成容 易失敗、會產生南溫及電磁波的無線電頻電聚設備。 【發明内容】 本發明的第一目的,係提供一種電暈處理設備,其利 用二個電極板之間產生穩定的擴散電暈放電進行表面清潔 ,不但稠密的絲狀電弧會有效撞擊清理表面,且電暈發射 的光線也能提昇表面處理時的結成力量(穩定處理表面的 分子及衝擊之中的電子),加上本發明不會產生高頻震盪 及電磁波,故本發明會改善以往電漿表面處理設備成本過 高、表面處理效果有限的問題。 本發明的第二目的,係提供一種有效產生電暈放電的 電軍處理設備,本發明係將一個南壓電路糸統設置在電源 與正電極板之間,而該高壓電路系統運用中點接地另設置 一負電極板,運用正電極板與負電極板之間的稠密絲狀電 弧(跳動電子)產生較大範圍的電暈放電,藉此,本發明 能在塑膠表面能產生有利表面的一致、低溫電漿,無需進 行額外加熱。Page 6 1221689 V. Description of the invention (3) Extreme efforts are needed to pursue the goal of improvement; in view of this, the inventor of this case has carefully considered and has been engaged in the sale of various plasma institutions and related plasma processing technologies for many years. The experience of sales, research, and development eventually led to the development of a corona treatment device, which is not only beneficial for surface treatment operations, but also can replace radio frequency electrocondensation equipment that is prone to failure and generates south temperature and electromagnetic waves. [Summary of the Invention] The first object of the present invention is to provide a corona treatment device which utilizes a stable diffusion corona discharge generated between two electrode plates for surface cleaning, not only a dense filamentary arc will effectively impact the cleaning surface, In addition, the light emitted by the corona can also improve the formation strength during surface treatment (the molecules on the surface and the electrons in the impact are stabilized), and the invention does not generate high-frequency oscillations and electromagnetic waves, so the invention will improve the past plasma The surface treatment equipment cost is too high, and the surface treatment effect is limited. A second object of the present invention is to provide an electric army processing equipment for effectively generating a corona discharge. The present invention is to set a south voltage circuit system between a power source and a positive electrode plate, and the high voltage circuit system uses a midpoint An additional negative electrode plate is provided for grounding, and a dense wire-like arc (beating electrons) between the positive electrode plate and the negative electrode plate is used to generate a wide range of corona discharges. Thus, the invention can generate a favorable surface on the plastic surface. Consistent, low temperature plasma without additional heating.

第7頁 1221689 五、發明說明(4) 本發明的第三目的,係提供一種電暈處理設備,其係 利用正電極板與負電極板之間的稠密絲狀電弧產生電暈, 由於電暈操作放電的氣體溫度接近於室溫(屬於冷電漿形 式),故本發明十分節省能源與設備成本,無需將能量用 提升氣體溫度之上。 發頻低 本高降 ,生幅 備產大 設會夠 理不能 處3本 暈孤成 電電儀 種狀設 一絲的 供密明 提稠發。 係的本者 ,線故擾 的光,干 目有波波 四具磁磁 第丨電電 的電及到 明放溫受 發暈高會 本電、不 的動且 明震, 有關本案發明為達成上述目的、所採用之技術,手段 及其他功效,茲列舉一較佳可實施例並配合圖式詳細說明 如後,相信本案發明之目的、特徵及其他優點,當可由之 得一深入而具體之瞭解;首先請參閱第二圖所示,為本發 明簡圖,本發明包括有一個電源(2 0 )、一高壓電路系 統(2 1).、一正電極板(2 20 、一負電極板(2 3) 及一處理室(24),其中: 該電源(2 0 ),係提供充足的電力者; 該南壓電路糸統(2 1 ) ^係與該電源(2 0 )相連 接,且會將電力提高至預設正電壓,另在高壓電路系統( 2 1 )内裝設有中點接地(2 1 1 ),利用該中點接地( 211)產生預設的負電壓者; 該正電極板(2 2 ),係與該高壓電路系統(2 1 )Page 7 1221689 V. Description of the invention (4) The third object of the present invention is to provide a corona treatment device which uses a dense filamentary arc between a positive electrode plate and a negative electrode plate to generate a corona. The temperature of the gas for operation and discharge is close to room temperature (which is in the form of cold plasma), so the present invention saves energy and equipment costs very much, and does not need to raise the energy temperature above the gas temperature. The hair frequency is low, the cost is high, and the production capacity is large enough. The equipment will not be able to handle 3 books. The author of the system, the light that is disturbed by the wire, has the electricity of the four magnetic waves, and the electric power, which is affected by the halo at the temperature of the open-air, will cause the electric power, motion, and vibration. The invention of this case is to achieve The above purpose, technology, means and other effects used are listed in detail with a preferred embodiment and illustrated in detail. It is believed that the purpose, characteristics and other advantages of the present invention can be obtained in-depth and specific. Understand; first please refer to the second figure, which is a schematic diagram of the present invention. The present invention includes a power source (20), a high-voltage circuit system (21), a positive electrode plate (2 20, a negative electrode plate). (2 3) and a processing room (24), wherein: the power source (20) is a person providing sufficient power; the south voltage circuit system (2 1) is connected to the power source (2 0) And will increase the power to a preset positive voltage, and a midpoint ground (2 1 1) is installed in the high voltage circuit system (21), and the midpoint ground (211) is used to generate a preset negative voltage; The positive electrode plate (2 2) is connected to the high voltage circuit system (2 1)

第8頁 1221689 五、發明說明(5) 相連接,且會 電壓; 該負電極 相連接,且會 電壓; 該處理室 壓密閉空間( 注入氧氣,且 負電極板(2 一待清理 負電極板(2 係位置之巧妙 散的電暈放電 理效果,也由 漿形式),讓 板(2 3 ) 將導引該南 (24), 2 4 1), 處理室(2 3 )密封於 物(2 5 ) 3 )之間; 安排,本發 處理,藉由 於本發明的 本發明設備 將導引該南壓電路糸統(2 1 )上的預設正 ,係與該高壓電路系統(2 1 ) 壓電路系統(2 1 )上的預設負 係採絕緣材質製成,且提供一低 在該低壓密閉空間(2 4 1 )内 4)會將該正電極板(22)與 内者; ,置放在該正電極板(2 2 )與 藉由上述之結構特徵與其相互關 明會讓待清理物(2 5 )受到擴 稠密絲狀電弧、電暈增進表面清 氣體溫度接近於室溫(屬於冷電 成本降低。 【發明實施方式】 其次,再將本案發明之動作原理配合圖式詳細說明如 後,期使 貴審查委員對本發明之構造、特徵及其他優點 能有更進一步之體會與認識,為便於說明與彰顯本發明確 較傳統結構為進步與實用之優點;請參閱第三圖所示,本 發明的電源(2 0 )會將電力送入該高壓電路系統(2 1 )内,而該高壓電路系統(21)會將電壓提昇至正75Page 8 1221689 V. Description of the invention (5) Connected and voltage; The negative electrode is connected and voltage; The processing chamber pressure sealed space (injected oxygen, and the negative electrode plate (2-negative electrode plate to be cleaned) (The ingenious effect of corona discharge in the 2 series position is also in the form of slurry), so that the plate (2 3) will guide the south (24), 2 4 1), and the processing chamber (2 3) is sealed to the object ( 2 5) 3); arrange, the present process, because the device of the invention of the present invention will guide the preset positive on the south voltage circuit system (2 1), and the high voltage circuit system (2 1) The preset negative system on the voltage circuit system (2 1) is made of insulating material and provides a low inside the low voltage enclosed space (2 4 1) 4) The positive electrode plate (22) and the inner Or, placing the positive electrode plate (2 2) and the above-mentioned structural features and their mutual relationship will make the object to be cleaned (2 5) subject to a dense filamentary arc, and corona enhances the temperature of the surface cleaning gas close to Room temperature (belonging to the reduction of the cost of cold electricity. Embodiments of the invention) Secondly, the operation principle of the invention of the present case is matched The detailed description of the formula is as follows, in order to allow your reviewers to have a further understanding and understanding of the structure, characteristics and other advantages of the present invention, in order to facilitate the description and highlight the advantages of the invention is indeed more advanced and practical than the traditional structure; As shown in the three figures, the power supply (20) of the present invention sends power into the high-voltage circuit system (2 1), and the high-voltage circuit system (21) increases the voltage to +75

第9頁 1221689 五、發明說明(6) 0 0伏特(預設之可行數據),並將正7 5 0 0伏特電力 傳送給該正電極板(2 2 ),此時,該中點接地(2 1 1 )會配合高壓電路系統(2 1 )產生負7 5 0 0伏特(預 設之可行數據)電壓,並將負7 5 0 0伏特電力傳送給負 電極板(2 3 ),使正電極板(2 2 )與負電極板(2 3 )之間產生稠密絲狀電弧(跳動電子);另一方面,由於 該處理室(2 4 )採絕緣材質,且在該低壓密閉空間(2 4 1 )内充滿氧氣,故稠密絲狀電弧會内的電子會撞擊氧 分子,使氧分子因電子撞擊而形成不穩定的高能階狀態, 但氧分子隨即會馬上回到低能階的位置(氧分子也呈跳動 ),而在氧分子從高能階狀態返回低能階的同時,會釋放 出相當能量的光子(Photon ),也產生出電暈光,此時, 該稠密絲狀電弧會與電暈光結合成擴散狀的電暈放電(2 6 )(光波、電弧混合體),且會保持在該正電極板(2 2 )與負電極板(2 3 )之間,並不斷撞擊、照射待清理 物(2 5 )表面,故電暈放電(2 6 )可以造成待清理件 .(2 3 ).表面受到清理,達成本發明的清理效果者。 會需作於 但壓操屬 不電於C 光的由溫 暈孤,室 電電外於。 的狀另近低 内絲;接降 }低性度顯 6降致溫明 2 C 一 }本 彳}的氣成 電5子氧備 放2分C設 暈C氧體明 電物進氣發 ,理增的本 是清會}故 的待光6 , 提理暈2 } 一清電C式 得助且電形 值輔,放漿 效}暈電 有求電冷Page 1212689 V. Description of the invention (6) 0 0 volts (predeterminable feasible data), and positive 7 500 volts power is transmitted to the positive electrode plate (2 2). At this time, the midpoint is grounded ( 2 1 1) will cooperate with the high voltage circuit system (2 1) to generate a negative voltage of 7500 volts (the preset feasible data), and transmit negative 750 volts of power to the negative electrode plate (2 3), so that the positive A dense wire-like arc (beating electrons) is generated between the electrode plate (2 2) and the negative electrode plate (2 3); on the other hand, since the processing chamber (2 4) is made of insulating material, and in the low-voltage enclosed space (2 4 1) It is filled with oxygen, so the electrons in the dense filamentary arc will collide with the oxygen molecules, which will cause the oxygen molecules to form an unstable high-energy state due to the impact of the electrons, but the oxygen molecules will immediately return to the low-energy position (oxygen The molecule is also beating), and when the oxygen molecule returns from a high energy state to a low energy level, it will release a photon of considerable energy (Photon) and generate corona light. At this time, the dense filamentary arc will corona with the corona. Corona discharge (2 6) (light wave, electric arc mixture) which is combined with light by diffusion, It will be kept between the positive electrode plate (2 2) and the negative electrode plate (2 3), and will continuously impact and illuminate the surface of the object to be cleaned (2 5), so the corona discharge (2 6) can cause the part to be cleaned. (2 3). The surface is cleaned to achieve the cleaning effect of the invention. Will need to be done, but the pressure operation is not electric to the C light by the temperature halo, the room electricity is external. The condition is close to the low internal wire; the connection is low, the degree of sexuality is 6 and the temperature is low, and the temperature is 2 ° C. 1% of the gas is generated. The oxygen is released. 2 minutes are set. C is set. , Li Zeng's book is Qinghui} So Waiting for Light 6, Lei Halo 2} A clear electricity C-type is assisted and the electricity shape value is auxiliary, and the slurry effect is effective.

第10頁 1221689 五、發明說明(7) 值得一提的是,本發明能夠在低壓密閉空間(2 4 1 )内增強清理效果,其運作在低頻率、較無電磁波的環境 下,故本發明不會導致電子阻礙,能在在待清理物(2 5 )表面產生充份的電暈放電(26),無需過量的電子阻 抗配合及過度的加熱。 綜上所述,本發明係將一個高壓電路系統設置在電源 與正電極板之間,而該高壓電路系統運用中點接地另設置 一負電極板,運用正電極板與負電極板之間的稠密絲狀電 弧(跳動電子)產生較大範圍的電暈放電,藉此,電暈放 電會讓待清理物的表面清理效果更佳、增進表面一致性, 也由於操作電暈放電的氣體溫度接近於室溫(屬於冷電漿 形式),故本發明設備成本較低,無需將能量用在氣體溫 度的提昇,更不會產生無線電頻放射設備的電磁干涉問題 ;所以本發明之『具有產業之可利用性』應已毋庸置疑, 此外,本案發明實施例所揭露之構造,在申請之前並未曾 見於諸刊物,亦未曾被公開使用,不但具有如上功效增進 之事實,更具有多種不可輕忽的附加功效,是故,本發明 之『新穎性』以及『進步性』都均已符合專利法規,爰依 法提出發明專利之申請,祈請惠予審查並早曰賜准專利, 實感德便。Page 10 1221689 V. Description of the invention (7) It is worth mentioning that the present invention can enhance the cleaning effect in a low-pressure enclosed space (2 4 1). It operates in a low-frequency and relatively electromagnetic wave-free environment, so the present invention Will not cause electronic obstruction, can generate sufficient corona discharge (26) on the surface of the object to be cleaned (26), without excessive electronic impedance cooperation and excessive heating. In summary, the present invention is a high-voltage circuit system provided between a power source and a positive electrode plate, and the high-voltage circuit system uses a midpoint ground to provide another negative electrode plate. The dense wire-like arc (beating electrons) generates a wide range of corona discharges. As a result, the corona discharge will make the surface of the object to be cleaned better, improve the surface consistency, and because the gas temperature of the corona discharge is close to At room temperature (belonging to the form of cold plasma), the cost of the equipment of the present invention is relatively low. It is not necessary to use energy to increase the gas temperature, and it does not cause electromagnetic interference problems of radio frequency radiation equipment. "Availability" should be beyond doubt. In addition, the structure disclosed in the embodiment of the present invention has not been seen in publications before application, nor has it been used publicly. It not only has the fact that the effect is enhanced as above, but also has a variety of non-negligible additions. Efficacy, therefore, the "newness" and "progressiveness" of the present invention have all complied with patent regulations. The application, saying prayers vouchsafed to review and give early patent-pending, will be a real sense of ethics.

第11頁 1221689 圖式簡單說明 圖式部份 第一圖 係習用之示意簡圖。 第二圖 係本發明之示意簡圖。 第三圖 係本發明之電暈放電示意圖。 圖號部份Page 11 1221689 Brief description of the drawings Schematic part The first drawing is a schematic diagram used in practice. The second figure is a schematic diagram of the present invention. The third figure is a schematic diagram of the corona discharge of the present invention. Drawing number part

I 電極電源(1 0 ) 電源(1 1 ) 發射盒(12) 交流電發電機(13) 待清理件(1 4 ) 無線電頻(RF ) 0 13 16 2 12 4 2 (2(2( 源C板C電 電地極間放 接電空暈 點負 電 中 高壓電路系統(2 1 ) 正電極板(2 2 ) 處理室(2 4 ) 待清理物(2 5 )I Electrode power supply (1 0) Power supply (1 1) Transmitter box (12) Alternator generator (13) To be cleaned (1 4) Radio frequency (RF) 0 13 16 2 12 4 2 (2 (2 (source C board C electric and electrical ground electrodes are connected with an electric halo point and a negative current medium and high voltage circuit system (2 1) a positive electrode plate (2 2) a processing chamber (2 4) an object to be cleaned (2 5)

第12頁Page 12

Claims (1)

1221689 六、申請專利範圍 1. 一種電暈處理設備,包括有: 一電源,係提供充足的電力者; 一高壓電路系統,係與該電源相連接,且會將電力提 高至預設正電壓,另在高壓電路系統内裝設有中點接地, 利用該中點接地產生預設的負電壓者; 一正電極板,係與該高壓電路系統相連接,且會將導 引該高壓電路系統上的預設正電壓; ‘ 一負電極板,係與該高壓電路系統相連接,且會將導 、 引該高壓電路系統上的預設負電壓; 一處理室,係採絕緣材質製成,且提供一低壓密閉空〇 間,在該低壓密閉空間内注入預設氣體,且處理室會將該 正電極板與負電極板密封於内者; 一待清理物,置放在該正電極板與負電極板間;藉此 ,該正電極板與負電極板間會產生電暈放電,並對待清理 物表面進行清理者。 備設 tn*-l ίι 處。 窃軍者 電氣 之氧 述入 所注 項内 1間 第空 圍閉 範密 ♦壓 專低 請於 申室如理 •處 2該 中 其1221689 6. Scope of patent application 1. A corona treatment equipment, including: a power source, which provides sufficient power; a high-voltage circuit system, which is connected to the power source, and will increase the power to a preset positive voltage, In addition, a mid-point ground is installed in the high-voltage circuit system, and a preset negative voltage is generated by using the mid-point ground. A positive electrode plate is connected to the high-voltage circuit system, and will guide the high-voltage circuit system. A preset positive voltage; 'a negative electrode plate is connected to the high voltage circuit system, and will conduct and lead to the preset negative voltage on the high voltage circuit system; a processing chamber made of insulating material, and Provide a low-pressure airtight space, inject a preset gas into the low-pressure airtight space, and the processing chamber will seal the positive electrode plate and the negative electrode plate inside; a to-be-cleaned material is placed between the positive electrode plate and the positive electrode plate. Between negative electrode plates; by this, a corona discharge will be generated between the positive electrode plate and the negative electrode plate, and the surface of the object to be cleaned will be cleaned. Provide tn * -l ίι places. The thief's electrical oxygen is described in the noted item. One is the air confinement. Fan Mi. ♦ Press down. Please apply in the application room. 第13頁Page 13
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI469463B (en) * 2008-12-15 2015-01-11 Koninkl Philips Electronics Nv Cooling arrangement, luminaire and method for cooling a luminaire

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI469463B (en) * 2008-12-15 2015-01-11 Koninkl Philips Electronics Nv Cooling arrangement, luminaire and method for cooling a luminaire

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