TWD184100S - Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate - Google Patents

Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate

Info

Publication number
TWD184100S
TWD184100S TW105305390F TW105305390F TWD184100S TW D184100 S TWD184100 S TW D184100S TW 105305390 F TW105305390 F TW 105305390F TW 105305390 F TW105305390 F TW 105305390F TW D184100 S TWD184100 S TW D184100S
Authority
TW
Taiwan
Prior art keywords
electrolytic
substrate
chemical
metal deposition
galvanic
Prior art date
Application number
TW105305390F
Other languages
Chinese (zh)
Inventor
Ralf Haenschen
Original Assignee
德國艾托特克公司
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 德國艾托特克公司, Atotech Deutschland Gmbh filed Critical 德國艾托特克公司
Publication of TWD184100S publication Critical patent/TWD184100S/en

Links

Abstract

【物品用途】;本設計係關於一種用於基板上之化學沉積及/或電解(電流)金屬沉積之裝置。;【設計說明】;仰視圖係普通消費者在購買或使用本設計時不會注意之視圖且不具有特徵,因此省略仰視圖。[Use of article]; This design is about a device used for chemical deposition and/or electrolytic (current) metal deposition on a substrate. ;[Design Description];The bottom view is a view that ordinary consumers will not pay attention to when purchasing or using this design and is not characteristic, so the bottom view is omitted.

TW105305390F 2016-03-24 2016-09-12 Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate TWD184100S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EM30409970001 2016-03-24

Publications (1)

Publication Number Publication Date
TWD184100S true TWD184100S (en) 2017-07-01

Family

ID=89123674

Family Applications (2)

Application Number Title Priority Date Filing Date
TW105305391F TWD186023S (en) 2016-03-24 2016-09-12 Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate
TW105305390F TWD184100S (en) 2016-03-24 2016-09-12 Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW105305391F TWD186023S (en) 2016-03-24 2016-09-12 Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate

Country Status (1)

Country Link
TW (2) TWD186023S (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1622358S (en) 2018-05-30 2019-01-21

Also Published As

Publication number Publication date
TWD186023S (en) 2017-10-11

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