TWD170864S - Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate - Google Patents

Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate

Info

Publication number
TWD170864S
TWD170864S TW103300390F TW103300390F TWD170864S TW D170864 S TWD170864 S TW D170864S TW 103300390 F TW103300390 F TW 103300390F TW 103300390 F TW103300390 F TW 103300390F TW D170864 S TWD170864 S TW D170864S
Authority
TW
Taiwan
Prior art keywords
galvanic
electrolytic
chemical
substrate
metal deposition
Prior art date
Application number
TW103300390F
Other languages
Chinese (zh)
Inventor
Ralf Haenschen
Original Assignee
德國艾托特克公司
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 德國艾托特克公司, Atotech Deutschland Gmbh filed Critical 德國艾托特克公司
Publication of TWD170864S publication Critical patent/TWD170864S/en

Links

Abstract

【物品用途】;本設計係關於一種在一基板上之化學及/或電解(電偶)金屬沉積之裝置。;【設計說明】;圖式中所展示之色彩,為本案不主張設計之部分。;仰視圖為普通消費者於選購時或使用時不會注意之視面,故省略之。[Item Usage];This design is about a device for chemical and/or electrolytic (galvanic) metal deposition on a substrate. ;[Design Description];The colors shown in the diagram are not part of the design advocated by this case. ;The bottom view is omitted because ordinary consumers will not pay attention to it when purchasing or using it.

TW103300390F 2013-08-07 2014-01-22 Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate TWD170864S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EM22879870001 2013-08-07

Publications (1)

Publication Number Publication Date
TWD170864S true TWD170864S (en) 2015-10-01

Family

ID=90625019

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103300390F TWD170864S (en) 2013-08-07 2014-01-22 Device for chemical and/or electrolytic (galvanic) metal deposition on a substrate

Country Status (1)

Country Link
TW (1) TWD170864S (en)

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