TWD182751S - Reaction tubes for semiconductor manufacturing equipment - Google Patents

Abstract

[Use of article]; The article of this design is a tube that is installed in the film-forming device as shown in the reference cross-sectional view showing the use state during the film-forming process of semiconductor manufacturing to allow the product wafer to react with the gas. . Specifically, in this article, when the product wafer is in a stacked state, the gas flows in to form a film on the surface of the product wafer. At this time, the gas concentration in the upper and lower parts of the article must be made uniform. The part for which a partial design patent is to be obtained is a gas outlet for exhausting the incoming gas. Its shape is set in a roughly inverted triangle, thereby making the gas concentration uniform throughout the interior of the product. In addition, the part for which a design patent is to be obtained is composed of six sections marked with symbols A to F in the up and down direction, as shown in the partially enlarged reference drawing of the solid line part. The inner wall of each section is made of the product. The entire interior is linear in order to achieve the most uniform gas concentration, and the overall shape of the gas outlet is approximately an inverted triangle. ;[Design description];The parts of this design represented by solid lines are intended to be part of the design and are subject to a design patent. The X-X line enlarged cross-sectional view is specifically intended to be a part of the design to obtain a design patent. In addition, the parts indicated by dotted lines in the drawings are not recommended by this design.