TWD148170S - Roller for substrate cleaning - Google Patents

Roller for substrate cleaning

Info

Publication number
TWD148170S
TWD148170S TW100306700F TW100306700F TWD148170S TW D148170 S TWD148170 S TW D148170S TW 100306700 F TW100306700 F TW 100306700F TW 100306700 F TW100306700 F TW 100306700F TW D148170 S TWD148170 S TW D148170S
Authority
TW
Taiwan
Prior art keywords
creation
roller
substrate cleaning
new style
substrate
Prior art date
Application number
TW100306700F
Other languages
Chinese (zh)
Inventor
Tomoatsu Ishibashi
Fumitoshi Oikawa
Hideaki Tanaka
Teruaki Hombo
Original Assignee
荏原製作所股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荏原製作所股份有限公司 filed Critical 荏原製作所股份有限公司
Publication of TWD148170S publication Critical patent/TWD148170S/en

Links

Abstract

【物品用途】;本創作係有關於一種用來洗淨施加研磨處理基板使用的「基板洗淨用輥軸」之新式樣設計。;【創作特點】;如立體圖所示，本創作「基板洗淨用輥軸」概呈圓柱狀，如前後視圖所示，該輥軸呈現出多數個略同心圓，配合右側視圖觀之，其中央有一凹部，該輥軸軸身上有多數略呈圓形孔。;整體而言，本創作線條流暢簡潔俐落、且式樣新穎具獨創性，實為一特殊且實用之新式樣設計。;上述說明僅供輔助瞭解本創作而非用以限制其內容；理應明瞭，新式樣係就其整體形狀指定之。[Use of the article]; This creation is about a new style design of a "substrate cleaning roller" used to clean a substrate that has been subjected to a grinding treatment. ; [Features of the creation]; As shown in the three-dimensional diagram, the "substrate cleaning roller" of this creation is generally cylindrical. As shown in the front and rear views, the roller presents a plurality of slightly concentric circles. When viewed from the right side, there is a concave portion in the center, and the roller has a plurality of slightly circular holes on the shaft. ; Overall, this creation has smooth, simple and neat lines, and the style is novel and original. It is indeed a special and practical new style design. ; The above description is only to assist in understanding this creation and is not used to limit its content; it should be understood that the new style is specified based on its overall shape.

TW100306700F 2011-06-09 2011-12-08 Roller for substrate cleaning TWD148170S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011013045 2011-06-09

Publications (1)

Publication Number Publication Date
TWD148170S true TWD148170S (en) 2012-07-11

Family

ID=51212585

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100306700F TWD148170S (en) 2011-06-09 2011-12-08 Roller for substrate cleaning

Country Status (2)

Country Link
US (1) USD710062S1 (en)
TW (1) TWD148170S (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD735427S1 (en) * 2013-02-01 2015-07-28 Ebara Corporation Roller shaft for substrate cleaning
USD728177S1 (en) * 2013-02-01 2015-04-28 Ebara Corporation Roller shaft for substrate cleaning
USD769108S1 (en) * 2014-08-06 2016-10-18 Eberl Iron Works, Inc. Rooftop support base
JP1670140S (en) * 2020-05-15 2020-10-12
JP1695757S (en) * 2020-06-26 2021-09-27
USD994604S1 (en) * 2020-09-25 2023-08-08 Easytork Automation Corporation Actuator vane shaft
USD959374S1 (en) * 2020-11-13 2022-08-02 Electrical Grid Monitoring Ltd. BNC cap assembly
USD1080366S1 (en) * 2023-05-09 2025-06-24 Duet Doctor Limited Tool bracket
USD1078818S1 (en) * 2024-10-28 2025-06-10 Xiaoqiang Lin Jack block

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Publication number Priority date Publication date Assignee Title
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6076217A (en) * 1998-04-06 2000-06-20 Micron Technology, Inc. Brush alignment platform
JP3200036B2 (en) * 1998-05-22 2001-08-20 アイオン株式会社 Rotating brush for cleaning
US6247197B1 (en) * 1998-07-09 2001-06-19 Lam Research Corporation Brush interflow distributor
US6467120B1 (en) * 1999-09-08 2002-10-22 International Business Machines Corporation Wafer cleaning brush profile modification
US6240588B1 (en) * 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US6523210B1 (en) * 2000-04-05 2003-02-25 Nicholas Andros Surface charge controlling apparatus for wafer cleaning
JP3844635B2 (en) * 2000-04-12 2006-11-15 株式会社荏原製作所 Roll sponge, roll sponge manufacturing method, roll sponge manufacturing tool and roll sponge mounting method
JP4046931B2 (en) * 2000-07-14 2008-02-13 株式会社荏原製作所 Substrate cleaning device and cleaning tool
US7955693B2 (en) * 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
WO2005016599A1 (en) * 2003-08-08 2005-02-24 Mykrolys Corporation Methods and materials for making a monolithic porous pad cast onto a rotatable base
US20050109371A1 (en) * 2003-10-27 2005-05-26 Applied Materials, Inc. Post CMP scrubbing of substrates
KR101324870B1 (en) * 2005-12-06 2013-11-01 엔테그리스, 아이엔씨. A molded rotatable base for a porous pad
JP4813185B2 (en) * 2006-01-17 2011-11-09 富士通セミコンダクター株式会社 Wafer cleaning apparatus and cleaning method
US7735177B1 (en) * 2006-02-10 2010-06-15 Lam Research Corporation Brush core assembly
US8778087B2 (en) * 2012-04-03 2014-07-15 Illinois Tool Works Inc. Conical sponge brush for cleaning semiconductor wafers
US20130255721A1 (en) * 2012-04-03 2013-10-03 Illinois Tool Works Inc. Concave nodule sponge brush

Also Published As

Publication number Publication date
USD710062S1 (en) 2014-07-29

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