TW593786B - Aluminum product with film with variable colors corresponding to variable view angles, and method for forming a film with variable colors corresponding to variable view angles on an aluminum substrate - Google Patents
Aluminum product with film with variable colors corresponding to variable view angles, and method for forming a film with variable colors corresponding to variable view angles on an aluminum substrate Download PDFInfo
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593786 A7 __________B7 五、發明説明(i )593786 A7 __________B7 V. Description of Invention (i)
發明背I 近年來,'由於電腦、通訊與消費性電器等3C產 業之蓬勃發展,使得㈣基底金屬基材為裝飾外殼 < 3C產品(例如:筆記型電腦、行動電話、隨身聽、 光碟播放器、MP3、照相機及個人數位助器(pDA) 寺)的市場需求量有日漸增加大趨勢,鋁基底金屬 基材不僅重量輕且具有金屬質感,故已逐漸取代拷 漆的外觀部件。 ^鋁基底金屬基材之著色,傳統上係藉由進行陽極· 子化處理及以無機金屬粒子加以電解著色達成,此 不僅可保護鋁基底金屬基材免於腐蝕及刮傷,且可 提供美觀之裝飾效果,因此提高了鋁基底金屬基材 濟價值。鋁基底金屬基材之陽極氧化處理及電 解著色係目前已成熟發展之技術,一般係於電解質 浴(例如硫酸浴或磷酸浴)中利用交替之直流電/交 流電或單獨使用直流電或交流電,以於鋁基底金屬 基材上形成一層.艇的陽極氧化膜,該氧化膜包含一 多孔層(即,外層)與一屏障層(即,内層),接著將 操機金屬粒子沉積於該多孔層之孔隙中,以賦予鋁 基底金屬基材有色彩之外觀。然而,習知技術獲得 <銘製品的外觀顏色仍以單一顏色為主,且顏色種 類並不多,主要為古銅色、黑色及紅色。 ,二種習知之銘基底金屬基材著色方法可參見例 如 1995 年 12 月 5 號頒予 Eliseo Benitez-Garriga - -6 - 本紙張尺度適用中國國家標準(CNS) A4規格(210 χ 297公釐) —-Invention Back I In recent years, 'the rapid development of 3C industries such as computers, communications, and consumer electronics has made the base metal substrate a decorative shell < 3C products (for example: notebook computers, mobile phones, walkmans, CD players) Devices, MP3s, cameras, and personal digital assistants (pDA) temples) have increasing market demand. Aluminum-based metal substrates are not only lightweight and have a metallic texture, so they have gradually replaced the appearance of painted parts. ^ The coloring of aluminum-based metal substrates has traditionally been achieved by performing anode and protonization treatments and electrolytic coloring with inorganic metal particles. This not only protects aluminum-based metal substrates from corrosion and scratches, but also provides aesthetics. Decorative effect, thus improving the economic value of aluminum-based metal substrates. The anodizing treatment and electrolytic coloring of aluminum-based metal substrates are currently mature technologies. They are generally used in electrolytic baths (such as sulfuric acid bath or phosphoric acid bath) using alternating DC / AC power or using DC or AC power alone. The base metal substrate forms a layer of anodic oxide film, which includes a porous layer (that is, an outer layer) and a barrier layer (that is, an inner layer), and then machine metal particles are deposited in the pores of the porous layer. In order to give the aluminum base metal substrate a colored appearance. However, the appearance color of the products obtained by conventional techniques is still mainly a single color, and there are not many types of colors, mainly bronze, black and red. For the two conventional coloring methods of base metal substrates, please refer to, for example, Eliseo Benitez-Garriga awarded to December 5th, 1995--6-This paper size applies Chinese National Standard (CNS) A4 (210 χ 297 mm) —-
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線 593786 A7 B7 五、發明説明(2 ) 之美國專利第5,472,78 8號的描述,此美國專利揭 示經著色之'陽極化鋁製品與使陽極化鋁製品電解 著色之方法,其係使/用傳統之硫酸浴/直流電法以 於鋁基底金屬基材表面形成一層銘的陽極氧化 膜,該氧化膜包含一多孔層(即,外層)與一屏障層 (即,内層),接著使用例如直流電交流電直流 電-> 交流電直流電之5次電流交替方式進行鋁基 底金屬基材的電解著色。根據此美國專利說明書中 所提供之實施例,所形成鋁.的陽極氧化膜的厚度均 超過 1 5 μ m,於此厚度下,該經著色之銘的陽極氧 化膜僅能表現因干涉效應所產生之單一顏色,並無 法表現可隨視角改變而產生顏色變化之效果。此 外,雖然此美國專利另將產品之表面進行經封孔處 理,然當手指接觸該表面時,容易沾染指紋且不易 去除。 目前為因應市場及消費者之需求,業界正積極研 發具有可依視角改變而產生顏色變化之膜的鋁製 品,及可於鋁基底金屬基材表面形成可依視角改變 而產生顏色變化之膜的方法。較佳地,該具有可依 視角改變而產生顏色變化之膜的鋁製品可同時免 除指紋沾染問題。 發明簡述 ,本發明提供具有可依視角改變而產生顯著顏色 變化之膜的鋁製品,以及於鋁基底金屬基材上形成 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593786 A7 B7 五、發明説明( 可隨視角改變而產生顯著顏色變化之膜的方法,於 本發明之較V佳實施態樣中,所製得的具有可依視角 改變而產生顏色變化之膜的鋁製品之指紋沾染問 題可同時獲得改善。 圖之簡單說明 圖1代表本發明方法所形-成的鋁粗化面、陽極氧 化膜及高折射率氧化物及低折射率氧化物之交替 成長多層薄膜間的干涉效應之一項具體實施態 樣,其中鋁的陽極氧化膜係.經由在硫酸浴中進行陽 極氧化處理所形成,其總厚度小於1 Ο μπι。 圖2代表本發明方法所形成鋁粗化面、陽極氧化 膜及高折射率氧化物及低折射率氧化物之交替成 長多層薄膜間的干涉效應之另一具體實施態樣,其 中鋁的陽極氧化膜係經由硫酸浴—磷酸浴—硫酸 浴之陽極氧化處理順序所形成。 圖3代表本發明方法所形成的鋁粗化面、陽極氧 化膜及高折射率氧化物及低折射率氧化物之交替 成長多層薄膜間的干涉效應之又一具體實施態 樣,其中銘的陽極氧化膜係經由硫酸浴—^粦酸浴之 陽極氧化處理順序所形成。 圖4代表本發明方法所形成的銘粗化面、陽極氧 化膜及高折射率氧化物及低折射率氧化物之交替 成,長多層薄膜間的干涉效應之再一具體實施態 樣,其中鋁的陽極氧化膜係於調整電壓之條件下於 -8- 本紙張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐)Line 593786 A7 B7 V. Description of the United States Patent No. 5,472,78 No. 8 of the Invention Description (2), this U.S. Patent discloses colored anodized aluminum products and a method for electrolytically coloring anodized aluminum products. A conventional sulphuric acid bath / DC method is used to form a layer of anodic oxide film on the surface of an aluminum-based metal substrate. The oxide film includes a porous layer (ie, an outer layer) and a barrier layer (ie, an inner layer). Direct current, alternating current, direct current-> The alternating current of alternating current and direct current is used to perform electrolytic coloring of aluminum-based metal substrates in an alternating current of 5 times. According to the examples provided in this U.S. patent specification, the thickness of the anodic oxide film formed of aluminum is more than 15 μm. At this thickness, the colored anodic oxide film can only show the effect of interference effects. The single color produced cannot express the effect of color change with the change of viewing angle. In addition, although this US patent additionally seals the surface of the product, when a finger touches the surface, it is easy to stain fingerprints and not easy to remove. At present, in response to the needs of the market and consumers, the industry is actively researching and developing aluminum products with a film that can change color depending on the viewing angle change, and can form a film that can change color depending on the viewing angle on the surface of the aluminum base metal substrate. method. Preferably, the aluminum product having a film capable of producing a color change according to a change in viewing angle can simultaneously avoid fingerprint contamination. Brief description of the invention: The present invention provides an aluminum product with a film that can produce significant color changes depending on the viewing angle change, and the paper is formed on an aluminum-based metal substrate. The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) ) 593786 A7 B7 V. Description of the invention (Method of film that can produce significant color changes with changes in viewing angle. In the preferred embodiment of the present invention, the film is produced with a film that can change color depending on the viewing angle. The problem of fingerprint contamination of aluminum products can be improved at the same time. Brief description of the figure Figure 1 represents the alternating growth of aluminum roughened surface, anodized film, and high-refractive index oxide and low-refractive index oxide formed by the method of the present invention. A specific embodiment of the interference effect between the multilayer films, wherein the anodic oxide film of aluminum is formed by anodizing in a sulfuric acid bath, and the total thickness is less than 10 μm. Figure 2 represents the method formed by the method of the present invention. Another embodiment of the interference effect between the roughened aluminum surface, the anodic oxide film, and the alternating growth multilayer films of high refractive index oxides and low refractive index oxides The aluminum anodic oxide film is formed through the anodic oxidation treatment sequence of sulfuric acid bath-phosphoric acid bath-sulfuric acid bath. Figure 3 represents the roughened surface of aluminum, anodized film, high-refractive index oxide, and low refractive index formed by the method of the present invention. Another specific embodiment of the interference effect of the alternate growth of multi-layered thin films, the anodic oxide film is formed by the anodic oxidation treatment sequence of the sulfuric acid bath-the acid bath. Figure 4 represents the method of the present invention. The formed rough surface, anodized film, and high-refractive-index oxide and low-refractive-index oxide are alternately formed, and another embodiment of the interference effect between long multilayer films is implemented. The anodized film of aluminum is adjusted. Under voltage conditions at -8- This paper size applies to China National Standard (CNS) Α4 size (210 X 297 mm)
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線 593786 A7 B7 五、發明説明(4 ) 硫 酸 浴中進行陽極氧化處理所形成。 圖 式 主要元4符號之描述 1 代表銘基底金屬基材; 2 代表金屬沉積物層; 3 代表鋁之陽極氧化膜之多孔層 的微孔 , 4 代表鋁之陽極氧化膜的屏障層 y 5 代表金屬沉積物之表面; 6 代表銘基底金屬基材之表面; 7 代表鋁之陽極氧化膜之多孔層 , 8 代表粗化表面; 9 代表高折射率氧化物及低折射 率氧化 物 之 交 替成長多層薄膜; 10 代表多孔層之微孔中之小孔隙 A, B,C,D代表入射光;及 d 代表鋁之陽極氧化膜的總厚度 〇 發 明 詳述 本 發明之目的在於提供具有可依 視角改 變 而 產 生 顏 色變化之膜的鋁製品,以及於銘 基底金 屬 基 材 上 形 成可隨視角改變而產生顏色: 變化之 膜 的 方 法 〇 此外,藉由控制銘基底金屬基材 表面上 之 鋁 的 陽 極 氧化膜(即,干涉層)之厚度於一 特定範 圍 > 本 發 明 可提供隨觀察者視角改變而具 不同外 觀 顏 色 之,招 基底金屬基材,此外,藉由在基 材進行 陽 極 處 理 前 進行一粗化處理,可使得製得產 品隨視 角 不 同 -9- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593786 A7 B7 五、發明説明(5 ) 變化顏色之效果更加明顯。本發明另提供一改善指 紋沾染問·題之方法,其係於鋁之陽極氧化膜經電解 著色後,於其上交替成長高折射率氧化物及低折射 率氧化物之多層薄膜,透過所搭配材料之反射顏 色,此處理附帶可使鋁製品之外觀顏色變化更加多 樣化。 特定言之,本發明提供一種具有可隨視角改變而 產生顏色.變化之膜的鋁製品,其包含: -一銘基底金屬基材, -一覆蓋於該金屬基材表面且厚度小於ΙΟμηι之 鋁的陽極氧化膜,該氧化膜包含一多孔層及一屏障 層,及 -於多孔層孔隙中之金屬沉積物, 其中該金屬沉積物係藉由直流電/交流電交替或二 者同時併用之方式進行電解著色而獲得, 該鋁製品另包含一位於該陽極氧化膜上方之粗化 層,及/或一位於該粗化層上方的高折射率氧化物 及低折率氧化物之交替成長多層薄膜。 本發明另提供一種於鋁基底金屬基材上形成可 隨視角改變而產生顏色變化之膜的方法,其包含: -對一鋁基底金屬基材進行陽極氧化處理,以於該 基材上方提供一包含多孔層及屏障層且厚度小 ,於1 0 μιη之鋁的陽極氧化膜,及 -藉由直流電/交流電交替或二者同時併用之方 -10- 本紙張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐) 593786 A7 B7 ___ 五、發明説明(6 ) 式,在該多孔層之孔隙中沉積金屬沉積物以進行 鋁的陽.極成化膜之電解著色, 其中,係於該鋁基底金屬基材於進行陽極氧化處理 之前,先進行粗化處理,以於基材表面形成一粗化 層,而隨後進行陽極氧化處理,則於基材表面及粗 化層之間形成一層陽極氧化膜,及/或 於該鋁基底金屬基材經電解著色後’於該陽極氧化 膜上交替成長高折射率氧化物及,低折率氧化物之 多層薄膜。 . 本發明中所稱之「可隨視角改變而產生顏色變化 的膜」’係指於入射光下’該膜所含金屬沉積物之 表面可與鋁基底金屬基材表面產生干涉效應,因此 當觀察者之視角改變時,其會表現不同之顏色。 於本發明一項較佳實施態樣中,係另外於基材上 交替成長高折射率氧化物及低折射率氧化物之多 層薄膜,此可改善鋁製品表面之指紋沾染問題,同 時可提供不同的干涉效應,使基材表面顯現另外的 不同顏色變化。 於本發明中’該粗化處理為陽極處理之前製程, 可為化學性質之蚀刻處理或物理性質之噴砂處 理,其具有除漆、蝕刻、消除應力、表面處理、消 光、梨地等功能,目的為潤飾鋁製品表面之外貌及 構,造。 可使用任何習知之蝕刻技術以進行化學蝕刻處 -11 - 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593786Line 593786 A7 B7 V. Description of the invention (4) It is formed by anodic oxidation treatment in sulfuric acid bath. Description of the main elements of the figure 4 Symbol 1 represents the base metal substrate; 2 represents the metal deposit layer; 3 represents the micropores of the porous layer of the anodized aluminum film; 4 represents the barrier layer of the anodized aluminum film; y represents The surface of the metal deposit; 6 represents the surface of the base metal substrate; 7 represents the porous layer of the anodized film of aluminum, 8 represents the roughened surface; 9 represents the alternating growth of high refractive index oxides and low refractive index oxides. Thin film; 10 represents small pores A, B, C, D in the micropores of the porous layer; and d represents the total thickness of the anodized film of aluminum. DETAILED DESCRIPTION OF THE INVENTION The object of the present invention is to provide Aluminum products that produce a color-changing film, and the formation of a color that changes with the viewing angle on a metal substrate with a change in viewing angle: a method of changing the film. In addition, by controlling the anodization of aluminum on the surface of the metal substrate The thickness of the film (ie, the interference layer) Scope > The present invention can provide a base metal substrate with different appearance colors as the observer's viewing angle changes. In addition, by subjecting the substrate to a roughening treatment before the substrate is anodized, the product can be made to have different viewing angles. -9- This paper size applies Chinese National Standard (CNS) A4 (210 X 297 mm) 593786 A7 B7 V. Description of the invention (5) The effect of changing color is more obvious. The present invention also provides a method for improving fingerprint contamination problems. The aluminum anodic oxide film is electrolytically colored, and a multilayer film of high-refractive index oxide and low-refractive index oxide is alternately grown thereon. The reflection color of the material, this treatment can make the appearance color of aluminum products more diversified. In particular, the present invention provides an aluminum product with a film that can produce color as the viewing angle changes. The film comprises:-a base metal substrate,-an aluminum covering the surface of the metal substrate and having a thickness of less than 10 μm An anodic oxide film, the oxide film includes a porous layer and a barrier layer, and-metal deposits in the pores of the porous layer, wherein the metal deposits are performed by alternating current or alternating current or both Obtained by electrolytic coloring, the aluminum product further includes a roughened layer above the anodized film, and / or an alternating-growth multilayer film of high refractive index oxide and low refractive index oxide located above the roughened layer. The present invention further provides a method for forming a film that can change color as the viewing angle changes on an aluminum-based metal substrate, including:-anodizing an aluminum-based metal substrate to provide a Contains a porous layer and a barrier layer with a small thickness, anodized film of aluminum at 10 μιη, and-by alternating current or alternating current or both simultaneously-This paper size applies to Chinese National Standard (CNS) Α4 Specifications (210 X 297 mm) 593786 A7 B7 ___ V. Description of the invention (6) Formula: deposit metal deposits in the pores of the porous layer to perform aluminum anode and polarized film electrolytic coloring, where Before the aluminum base metal substrate is anodized, a roughening treatment is performed to form a roughened layer on the surface of the substrate, and then an anodizing treatment is performed to form a layer between the substrate surface and the roughened layer. Anodized films and / or multilayer films of high-refractive-index oxides and low-refractive-index oxides are alternately grown on the anodized films after the aluminum-based metal substrate is electrolytically colored. In the present invention, the "film that can change color with the change of viewing angle" means that under incident light, the surface of the metal deposits contained in the film can interfere with the surface of the aluminum-based metal substrate. When the observer's perspective changes, they will show different colors. In a preferred embodiment of the present invention, a multilayer film of high-refractive index oxide and low-refractive index oxide is alternately grown on the substrate, which can improve the fingerprint contamination problem on the surface of aluminum products and can provide different The interference effect makes the surface of the substrate show another color change. In the present invention, the roughening treatment is a process before anodizing, and can be a chemical etching treatment or a physical sandblasting treatment. It has the functions of paint removal, etching, stress relief, surface treatment, matting, pear field, etc. The purpose is Refinish the appearance and texture of aluminum products. Any conventional etching technique can be used for chemical etching. -11-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 593786
理。一般而言,化學蝕刻處理以鹼性居多,但依製 品不同亦會視需要使用酸性蝕刻液,以產生不同 的潤飾效果。傳統鹼..性蝕刻以苛性鈉為主,濃度 H)wt%;酸性蝕刻則為硝酸、氣化按、氫氟酸等, ▲度為 1〜5%’以於叙其念人κ 、’ 土展至屬基材表面形成約1.2 之平均粗糙度。 可使用任何習知之技術以進行物理喷砂處理。適 合之噴砂材料可依不同需求而改變,常用之噴砂材 料包括,但不限於,玻璃珠.、氧化艇、$英砂、塑 膠粒、碳化矽、鋼珠及鋼礫等。於本發明中,噴砂 條件可為,但不限於,利用粒徑為12〇〜25叫瓜之破 璃珠砂,於2kg/cm2之氣體壓力下進行,喷嘴與工件 之距離約為150_,所造成之平均粗糙度約為ο。 對本發明而言,最重要的是位於該鋁基底金屬基 材表面 < 鋁的陽極氧化膜的厚度必須控制在小於 ,於此厚度下,多孔層及屏障層均呈半透明 或透明狀態,故可容易地進行光的吸收與散射, 生所欲之干涉色。 屋 該鋁基底金屬基材可為任何此技藝中習用者,浐 佳係鋁之合金,已知鋁之合金往往含有至少—種乂 外的金屬元素,例如矽、鎂、銅、鋅及鐵等,除 厚度以外,鋁合金之純度亦為可影響該鋁之陽極氧 化,膜是否可呈半透明或透明狀態之重要因素。乳 士、 舉例 ^ 倘若遠雜合金中含有大量的碎及鐵,則4 曰形Management. Generally speaking, chemical etching is mostly alkaline, but depending on the product, an acidic etching solution is also used as needed to produce different retouching effects. Traditional alkali .. Etching is mainly caustic soda, concentration H) wt%; acidic etching is nitric acid, gasification, hydrofluoric acid, etc., ▲ degree is 1 ~ 5% 'for Yu Qinian κ,' The soil spreads to an average roughness of about 1.2 on the surface of the substrate. Any conventional technique can be used for physical blasting. Suitable blasting materials can be changed according to different requirements. Commonly used blasting materials include, but are not limited to, glass beads, oxidation boats, sands, plastic pellets, silicon carbide, steel balls, and steel gravel. In the present invention, the blasting conditions may be, but are not limited to, the use of glass-breaking bead sand with a particle size of 12 to 25 is carried out under a gas pressure of 2 kg / cm2, and the distance between the nozzle and the workpiece is about 150 mm. The average roughness is about ο. For the present invention, the most important thing is that the thickness of the aluminum anodized film on the surface of the aluminum-based metal substrate < aluminum must be controlled to be less than, and at this thickness, the porous layer and the barrier layer are translucent or transparent, so It can easily absorb and scatter light to produce desired interference colors. The aluminum-based metal substrate can be any person skilled in this art. The aluminum alloy is an aluminum alloy. It is known that aluminum alloys often contain at least one metal element other than aluminum, such as silicon, magnesium, copper, zinc, and iron. In addition to the thickness, the purity of the aluminum alloy is also an important factor that can affect the anodization of the aluminum and whether the film can be translucent or transparent. Milk, example ^ If the far-away alloy contains a large amount of scrap and iron,
593786 A7 B7 五、發明説明(8 ) 成一中間金屬相,並與鋁的陽極氧化膜結合而產生 霧狀膜,·其無法產生所欲的干涉效應。因此,於本 發明中,所使用鋁之合金所含的鋁純度較佳係介藉 於90.0至99.9%,最佳介於95 〇至99 9%。 於本發明中,可使用任何此技藝中已知°之技術以 於鋁基泜金屬基材上進行陽#氧化處理以形成陽 極氧化膜,该氧化膜包含多孔層(外層)與屏障層(内 層)。例如’可使用美國專利第5,472,788號中所教 不之硫酸浴/直流電法,該硫酸浴可具有自5至40% 之濃度’較佳係具有自10至20 %之濃度。視須要 亦可使用或搭配使用其他酸浴(如:5至40%濃度 之轉酸)以形成具不同多孔層結構的氧化膜。該陽 極氧化處理之溫度可介於自5至1 〇 〇 t之間,較隹 係介於自1 5至2 5 C之間。藉由控制陽極氧化處理 之電壓大小與處理時間,可控制所形成鋁的陽極氧 化膜之厚度。舉例之,可於本發明使用介於自 0.5至5 0伏特間之電壓進行該陽極氧化處理歷〇 · 5 至3 0分鐘,較佳係使用介於自3至2〇伏特間之電 壓處理1至15分鐘。此外,陽極氧化處理時使用 之電壓對所形成銘之陽極氧化膜結構亦具有影 響。一般而τ,當電壓愈大,所形成多孔層之孔數 少且孔壁厚度大,故屏障層之厚度亦會隨之增加。 反,之,當電壓愈小,則所形成多孔層之孔數多且孔 壁厚度小。因此’於正常陽極氧化處理流程中,倘 -13- ^紙張尺度適用中樣準(CNS) A4規格(21〇X297公董)593786 A7 B7 V. Description of the invention (8) An intermediate metal phase is formed, which is combined with the aluminum anodic oxide film to produce a mist film, which cannot produce the desired interference effect. Therefore, in the present invention, the aluminum purity of the aluminum alloy used is preferably between 90.0 and 99.9%, and most preferably between 95.0 and 99 9%. In the present invention, any technique known in the art can be used to perform an anodic oxidation treatment on an aluminum-based metal substrate to form an anodic oxide film. The oxide film includes a porous layer (outer layer) and a barrier layer (inner layer). ). For example, 'a sulfuric acid bath / DC method not taught in U.S. Patent No. 5,472,788 may be used, and the sulfuric acid bath may have a concentration of from 5 to 40%', preferably having a concentration of from 10 to 20%. If necessary, other acid baths (eg, 5 to 40% concentration of transacid) can also be used or combined to form oxide films with different porous layer structures. The temperature of the anode oxidation treatment may be between 5 and 100 t, more preferably between 15 and 25 C. By controlling the voltage and processing time of the anodizing process, the thickness of the anodized film of aluminum can be controlled. For example, in the present invention, the anodizing treatment can be performed using a voltage between 0.5 and 50 volts for 0.5 to 30 minutes, preferably using a voltage treatment between 3 and 20 volts. To 15 minutes. In addition, the voltage used in the anodizing process also affects the structure of the anodized film formed. Generally, when τ is larger, the number of pores formed in the porous layer is smaller and the thickness of the pore wall is larger, so the thickness of the barrier layer will increase accordingly. Conversely, when the voltage is smaller, the number of pores of the porous layer formed is larger and the thickness of the pore wall is smaller. Therefore, in the normal anodizing process, if the -13- ^ paper size is applicable to the CNS A4 specification (21〇297297)
593786 A7593786 A7
壓遽然下降,則會使多孔層之孔隙我s 支,成為具有數個較小孔徑的孔陳者,此七 得銘之陽極氧化膜與-基材間之結合力變得較弱使 本發明中’經陽極氧化處理於銘基底金: 成之鋁的陽極氣化膜厘命V形 乳化1^厚度係小於ΙΟμιη,且相對 說,夕孔層之厚度大於屏障考。 任何此技藝中已知之電解著色技術均可用於 Γ月―中佳其先決條件為必須以交流電/直流電之交. 實例可參見例如美國專利第5,472,788 二舉例言之’可於本發明中使用具有下 組ΐ::趣浴:含濃度自1…。克/升之硫酸 H又自10至40克/升之硫酸镁、濃度自15至 5:二升…及濃度自5至3〇克/升之破酸铵, 、利用父流電/直流電交替或二者同時併用方式, 使用自2至50伏特之電恩(較佳自5至2〇伏特)於 多孔層之孔隙中沉積金屬沉積物。於本發明中,視 所採用電壓,電解著色所進行之時間可為自〇 5至 3〇分鐘之間(較佳i至10分鐘)。適當之金屬沉 積物乃屬已知,可選自例如彼等由鋼、鐵、姑、鎳、 錫、金、銀、舶、録、錯、Μ、鉬所級成之群。金 屬沉積物之厚度亦會影響所形成干涉色之種類,因 此,於本發明中,該金屬沉積物之厚度可為自〇 〇 i 至'、μιη,較佳係自0.1至2μιη。 於本發明中,申請人發現,當銘之陽極氧化膜之 __^ - 14- 本紙張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐)If the pressure drops suddenly, it will make the pores of the porous layer become pores with several smaller pores. The bonding force between the anodic oxide film and the substrate of the Qi Deming becomes weaker, which makes the invention Zhong 'anodized on Ming base gold: The thickness of the anode's vaporized film made of aluminum is V-emulsion 1 ^. The thickness is less than 10 μm, and relatively, the thickness of the pore layer is greater than the barrier. Any of the electrolytic coloring techniques known in the art can be used for the month of _Jiajia. The prerequisite is that it must be AC / DC. For examples, see, for example, US Patent No. 5,472,788. For example, it can be used in the present invention with the following Group ΐ :: Fun bath: Concentration from 1…. G / L of H2SO4 from 10 to 40 g / L of magnesium sulfate, a concentration of 15 to 5: 2 liters ... and a concentration of 5 to 30 g / L of ammonium sulphate, using parent galvanic / DC alternating current Or a combination of both, using 2 to 50 volts of electrons (preferably from 5 to 20 volts) to deposit metal deposits in the pores of the porous layer. In the present invention, depending on the applied voltage, the time for electrolytic coloring may be from 05 to 30 minutes (preferably i to 10 minutes). Appropriate metal deposits are known and can be selected from, for example, groups consisting of steel, iron, nickel, nickel, tin, gold, silver, shipping, copper, copper, M, and molybdenum. The thickness of the metal deposit also affects the type of interference color formed. Therefore, in the present invention, the thickness of the metal deposit may be from 0 to 1 and μm, preferably from 0.1 to 2 μm. In the present invention, the applicant has found that the anodic oxidation film of Dang Ming's __ ^-14- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm)
裝 訂Binding
593786 Α7 Β7 五、發明説明(1()) 厚度小於1 Ο μπι時(即,多孔層及屏障層均為半透明 或透明狀·態時),再配合直流電/交流電交替或二者 同時併用方式進行電/解著色,可造成至少二個方向 性的光學干涉效應。 於本發明之另一較佳實施態樣中,係於該基材經 電解著色的鋁之氧化層表面j,交聲成長高折射率 乳化物薄膜及低折射率氧化物薄膜。可使用任何已 知技術成長該高折射率氧化物薄膜及低折射率氧 化物薄膜。舉例言之,但不限於,可利用进鍍 (sputtering)之方式進行,舉例來說,於本發明中可採 用射頻(radio-frequency)方式,以高純度(例如99.9%) 之Τι〇2或Si〇2作為靶材,利用最大功率為6〇〇瓦 (w)之能量,分別將Ti〇2或Si〇2靶材以原子或離 子飛濺之方式,依次沉積於粗化層_氧化鋁及金屬 層-鋁基材之噴砂面上,其中各層之厚度係以石英 震盈膜厚計分別量測,並以自動關閉器(shutter)控制 各層厚度於500至ιοοοΑ之間。藉由調整此等高折 射率及低折射率氧化物薄膜之層數與厚度,可造成 不同的光學干涉效應。其中,較佳係交替成長3層 高折射率氧化物薄膜及3層低折射率氧化物薄 膜,更佳係父替成長5層高折射率氧化物薄膜及5 層低折射率氧化物薄膜,每層厚度較佳係控制於數 十,莖數百奈米之内。申請人發現到,於基材上交替 成長高折射率氧化物及低折射率氧化物之多層薄 -15- 593786 A7 B7593786 Α7 Β7 V. Description of the invention (1 ()) When the thickness is less than 10 μm (that is, when the porous layer and the barrier layer are translucent or transparent and in a state), it is used in combination with alternating current or alternating current or both. Electro / decolorization can cause at least two directional optical interference effects. In another preferred embodiment of the present invention, the substrate is an electrolytically colored aluminum oxide layer surface j of the substrate, and grows a high-refractive index emulsion film and a low-refractive index oxide film. The high refractive index oxide film and the low refractive index oxide film can be grown using any known technique. For example, but not limited to, it can be carried out by means of sputtering. For example, in the present invention, a radio-frequency method can be used, with a high purity (for example, 99.9%) of TiO 2 or Si〇2 as a target, using a maximum power of 600 watts (w) of energy, respectively, Ti02 or Si02 targets were deposited on the roughened layer _ alumina and Metal layer-the sandblasted surface of the aluminum substrate, where the thickness of each layer is measured separately with a quartz vibrating film thickness meter, and the thickness of each layer is controlled between 500 and ιοοοΑ by an automatic shutter. By adjusting the number and thickness of these high refractive index and low refractive index oxide films, different optical interference effects can be caused. Among them, it is preferable to alternately grow 3 layers of high refractive index oxide films and 3 layers of low refractive index oxide films, and more preferably to grow 5 layers of high refractive index oxide films and 5 layers of low refractive index oxide films in each case. The layer thickness is preferably controlled within a few tens and hundreds of nanometers in the stem. The applicant found that the multilayers of high refractive index oxides and low refractive index oxides were alternately grown on the substrate -15-593786 A7 B7
五、發明説明(u 膜,可進一步改善銘製品表面之指紋沾染問題,另 外,可提·供不同的干涉效應,使基材表面顯現另外 的不同顏色變化。 / 於本發明之使用中,較佳地,該高折射率氧化物 係具有自2至2.5間之折射率,而該低折射率氧化 物係具有自1.3至1 · 7間之奸一射率。可使用任何合 宜之高折射率氧化物與低折射率氧化物,其中,適 用之南折射率氧化物的例子可為,但不限於,Ti〇2. 或Zr〇2,而適用之低折射率氧化物的例子可為, 但不限於,Si02及Al2〇3。 光學干涉效應主要係因光線在下列表面間發生 反射而造成干涉與吸收之結果:(丨)沉積於多孔層 孔隙中的金屬沈積物表面、(2)位於屏障層下方的 銘基底金屬底材之表面,及(3)陽極氧化勝上方咼 折射率氧化物及低折射率氧化物之交替成長多層 薄膜表面。由於入射光路徑與金屬沈積物之不同, 產生之干涉色亦.有差異。 圖1至圖4分別代表本發明之不同較#實施態 樣,其中探討干涉層之結構與電解質種類、形成方 式及使用電壓間之關係。 參閱圖1,其中,鋁基底金屬基材1係首先進行 喷砂處理,使產生一具有質感之金屬霧化表面8 ’ 再,it行前處理,然後使用硫酸浴/直流電法進行陽 極氧化處理,以於鋁基底金屬基材1上生成一包含 -16- 本紙張尺度適用中國國家標準(CNS) A4规格(210 X 297公釐) 593786 A7 B7 五、發明説明(12 ) 多 孔 層 7及屏障層4的銘之陽極氧化膜, 該鋁 之 陽 . 極 氧 化 膜之厚度d (即,多孔層7及屏障 層4 之 總 厚 度)係小於1 0 μιη,於此厚度下,多孔層 及屏 障 層 均 呈 半 透明或透明狀態。並以直流電/交 流電 交 替 或 二 者 同時併用之方式將金屬2沈積於孔 ‘隙3 之 底 部 以 進行電解著色,之後.,_再於詨經電 解著 色 的 鋁 之 陽 極氧化膜表面上交替成長高折射 率氧 化 物 及 低 折 射率氧化物之多層薄膜。入射光A 係於 鋁 基. 底 金 屬 基材之表面6反射,.而入射光B係 於金 屬 沈 積 物 之 表面5反射,入射光C、D係於高 折射 率 氧 化 物 及 低折射率氧化物之多層薄膜 9 之表 面 反 射 此結構之反射表面及光學路徑可表現 至少 兩 種 顏 色 變 化之干涉效應,並且,可改善鋁製 品表 面 之 指 紋 沾 染問題。 圖 2 顯示本發明之另一較佳實施態樣。 於此 實 施 態 樣 中 ,鋁基底金屬基材1係首先進行喷 砂處 理 y 使 產 生 一具有質.感之金屬霧化表面8,再 進行 前 處 理 炊 广 後使用硫酸浴/直流電法進行第一 次陽 極 氧 化 處 理 ,以於銘基底金屬基材1上生成一 鋁的 陽 極 氧 化 膜 ,接著再以磷酸浴/直流電法進行 第二 次 陽 極 氧 化 處理,此可使多孔層中的孔隙底部 表面 積 增 加 y 因 此形成上窄下寬(類似瓶頸)之孔隙 結構 〇 之 後, \ 藉 由直流電/交流電電流交替或二者 同時 併 用 之 方 式 進行電解著色,將諸如鎳之金屬沈 積於 孔 隙 -17- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593786 A7 B7 五、發明説明(13 ) 底部,形成金屬沈積物。隨後進行第三次陽極氧化 V ^ 處理,前·述金屬沈積物係半透明狀,以利進行第三 次陽極氧化處理時電,解質之通過。接著,再於此鋁 之陽極氧化膜表面上交替成長高折射率氧化物及 低折射率氧化物之多層薄膜9。此方式使得金屬沈 積物之表面5的表面積增加,_可表現至少兩種不同 之干涉色,而第三次陽極氧化處理所形成之鋁的陽 極氧化膜之厚度亦會影響干涉效應之結果,此外,-可改善鋁製品表面之指紋沾.染問題。 圖3顯示本發明之再一較佳實施態樣。於此具體V. Description of the invention (U film can further improve the fingerprint contamination problem on the surface of the product. In addition, it can provide different interference effects to make the surface of the substrate appear different color changes. / In the use of the present invention, Preferably, the high-refractive index oxide has a refractive index ranging from 2 to 2.5, and the low-refractive index oxide has a refractive index between 1.3 and 1. 7. Any suitable high-refractive index can be used Oxides and low-refractive-index oxides, among which examples of suitable south-refractive-index oxides can be, but are not limited to, Ti〇2. Or Zr〇2, and examples of suitable low-refractive-index oxides can be, but Not limited to Si02 and Al203. The optical interference effect is mainly the result of interference and absorption caused by the reflection of light between the following surfaces: (丨) the surface of the metal deposits deposited in the pores of the porous layer, and (2) located at the barrier The surface of the base metal substrate under the layer, and (3) the surface of the multilayer film with alternating growth of the refractive index oxide and the low refractive index oxide above the anodized surface. Due to the difference between the incident light path and the metal deposit, There are also differences in the interference colors. Figures 1 to 4 represent different embodiments of the present invention, in which the relationship between the structure of the interference layer and the type of electrolyte, the formation method, and the use voltage are discussed. See Figure 1, Among them, the aluminum-based metal substrate 1 is firstly subjected to a sand blasting treatment to generate a textured metal atomized surface 8 ′. Then, it is subjected to a pretreatment, and then anodized using a sulfuric acid bath / DC method to apply the aluminum substrate. A metal substrate 1 is produced containing -16- this paper size applies to Chinese National Standard (CNS) A4 specifications (210 X 297 mm) 593786 A7 B7 V. Description of the invention (12) Inscription of porous layer 7 and barrier layer 4 The anodic oxide film, the anode of the aluminum. The thickness d of the anodic oxide film (that is, the total thickness of the porous layer 7 and the barrier layer 4) is less than 10 μm. At this thickness, the porous layer and the barrier layer are translucent or Transparent state. The metal 2 is deposited on the bottom of the hole 'gap 3 for alternating color by alternating current or alternating current or both at the same time. On the surface of aluminum anodized film, a multi-layer thin film of high refractive index oxide and low refractive index oxide is alternately grown. The incident light A is reflected on the aluminum base. The surface of the base metal substrate 6 reflects, and the incident light B is on the metal. The surface 5 of the deposit is reflected, and the incident light C and D are reflected on the surface of the multilayer film 9 of the high refractive index oxide and the low refractive index oxide. The reflecting surface and optical path of this structure can show the interference effect of at least two color changes. And, it can improve the fingerprint contamination on the surface of aluminum products. FIG. 2 shows another preferred embodiment of the present invention. In this embodiment, the aluminum-based metal substrate 1 is firstly subjected to a sandblasting treatment to produce a metal atomized surface 8 having a texture and feel, and then subjected to a pretreatment and a sulfuric acid bath / DC method for the first time. Sub-anodizing treatment to form an aluminum anodized film on the base metal substrate 1 and then performing a second anodizing treatment using a phosphoric acid bath / DC method, which can increase the surface area of the bottom of the pores in the porous layer. Therefore, the pore structure with narrow upper and lower width (similar to the bottleneck) is formed. \ Electrolytic coloring is performed by alternating DC / AC current or both. Both metals such as nickel are deposited in the pores. -17 Chinese National Standard (CNS) A4 specification (210 X 297 mm) 593786 A7 B7 5. Description of the invention (13) At the bottom, metal deposits are formed. Subsequently, the third anodizing V ^ treatment is performed, and the aforementioned metal deposits are semi-transparent, so that the electricity can be passed through the third anodizing treatment to decompose them. Next, on the surface of the anodized film of aluminum, a multilayer film 9 of high-refractive index oxide and low-refractive index oxide is alternately grown. In this way, the surface area of the surface 5 of the metal deposit is increased, and at least two different interference colors can be expressed, and the thickness of the anodized film of aluminum formed by the third anodizing treatment will also affect the result of the interference effect. ,-Can improve fingerprint contamination on the surface of aluminum products. FIG. 3 shows another preferred embodiment of the present invention. Specific here
V 實施態樣中,鋁基底金屬基材1係首先進行噴砂處 理,使產生一具有質感之金屬霧化表面8,再進行 前處理,然後使用硫酸浴/直流電法進行第一次陽 極氧化處理,以於鋁基底金屬基材1上生成一鋁的 陽極氧化膜,接著再以磷酸浴/直流電法進行第二 次陽極氧化處理,此可使多孔層中的孔隙底部表面 積增加,因此形成上窄下寬(類似瓶頸)之孔隙結 構。之後,藉由直流電/交流電電流交替或二者同 時併用之方式進行電解著色,將諸如鎳之金屬沈積 於孔隙底部,形成金屬沈積物。之後,再於該經電 解著色的銘之陽極氧化膜表面上交替成長高折射 率氧化物及低折射率氧化物之多層薄膜9。此結構 之,发射表面及光學路徑可表現至少兩種顏色變化 之干涉效應,並且,可改善鋁製品表面之指紋沾染 -18- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)V In the implementation aspect, the aluminum-based metal substrate 1 is firstly subjected to a sandblasting treatment to generate a textured metal atomized surface 8 and then subjected to a pretreatment, and then a sulfuric acid bath / DC method is used for the first anodizing treatment. An aluminum anodized film is formed on the aluminum-based metal substrate 1, and then a second anodizing treatment is performed by a phosphoric acid bath / DC method. Wide (similar to bottleneck) pore structure. After that, electrolytic coloring is performed by alternating DC current or alternating current or both, and a metal such as nickel is deposited on the bottom of the pore to form a metal deposit. After that, a multilayer film 9 of high refractive index oxide and low refractive index oxide is alternately grown on the surface of the anodized film of the electrolytically colored Ming. With this structure, the emission surface and optical path can show the interference effect of at least two color changes, and can improve the fingerprint contamination on the surface of aluminum products. -18- This paper size applies to China National Standard (CNS) A4 (210 X 297) (Centimeter)
裝 訂Binding
線 593786 A7 B7 五、發明説明(14 ) 問題。 如前所·述、於正常陽極氧化處理流程中,若將施 加之電壓遽然下降,則會使多孔層之孔隙底部形成 分支 1 〇,成為具有數個較小孔徑的孔隙者,此使 得鋁之陽極氧化膜與基材間之結合力變得較弱。圖 4即顯示此利用電壓變化使已,成的結構產生部份 分離以改變顏色之情形。於圖4中,鋁基底金屬基 材1係首先進行喷砂處理,使產生一具有質感之金 屬霧化表面8,再進行前處理,然後係使用硫酸浴 /直流電法進行陽極氧化處理,以生成鋁之陽極氧 化膜,於形成過程中,將電壓逐漸下降至0伏特, 多孔層之各孔隙底部因此形成許多分支之小孔隙 1 0,且屏障層4亦變薄,此導致屏障層4與鋁基底 金屬基材1間之結合力變弱,容易形成干涉層剝離 之現象。之後,藉由直流電/交流電電流交替或二 者同時併用之方式進行電解著色,將諸如鎳之金屬 沈積於孔隙底部,形成金屬沈積物。接著再於該經 電解著色的鋁之陽極氧化膜表面上交替成長高折 射率氧化物及低折射率氧化物之多層薄膜9。此結 構之反射表面及光學路徑可表現至少兩種顏色變 化之干涉效應,並且,可改善鋁製品表面之指紋沾 染問題。 ,藉由研讀以下實例可進一步了解本發明之目 的、特徵及優點。 -19- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593786 A7Line 593786 A7 B7 V. Description of Invention (14) Problem. As mentioned above, in the normal anodizing process, if the applied voltage is suddenly reduced, the bottom of the pores of the porous layer will form a branch 10, becoming a pore with several smaller pores, which makes aluminum The bonding force between the anodized film and the substrate becomes weak. Fig. 4 shows the situation where the voltage structure is used to partially separate the completed structure to change the color. In FIG. 4, the aluminum-based metal substrate 1 is firstly subjected to a sandblasting treatment to generate a textured metal atomized surface 8, and then subjected to a pretreatment, and then anodized using a sulfuric acid bath / DC method to generate During the formation of the anodic oxide film of aluminum, the voltage is gradually reduced to 0 volts. As a result, many small pores 10 are formed at the bottom of each pore of the porous layer, and the barrier layer 4 is also thin. This causes the barrier layer 4 and aluminum The bonding force between the base metal substrates 1 becomes weak, and the phenomenon of peeling of the interference layer is easily formed. Thereafter, electrolytic coloring is performed by alternating DC current or alternating current or both, and a metal such as nickel is deposited on the bottom of the pore to form a metal deposit. Then, on the surface of the electrolytically colored aluminum anodized film, a multilayer film 9 of high refractive index oxide and low refractive index oxide is alternately grown. The reflective surface and optical path of this structure can show the interference effect of at least two color changes, and can improve the problem of fingerprint contamination on the surface of aluminum products. By studying the following examples, you can further understand the purpose, features and advantages of the present invention. -19- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 593786 A7
例 1 將銘純度為99·5%之銘合金依下列步綠進 =首先將鋁材進行表面噴砂處理,再以鳩之隹 奔鉍鈉,於6〇r之溫度下進行脫脂處埂3分鐘了 經水洗之後、再藉超音波作見於上述溶液中:二_ 脫脂處理3分鐘,再經水洗後,以濃 3 〇 :Example 1 The Ming alloy with a purity of 99 · 5% is entered in the following steps. Green: First, sandblast the surface of the aluminum material, and then run the degreasing treatment at 60 ° C for 3 minutes. After washing with water, I used ultrasound to see it in the above solution: two_ degreasing treatment for 3 minutes, and then washed with water, concentrated to 3 〇:
裝 酸水溶液予以中和3〇秒。此可於鋁合金。 度為5 μιη的鋁之陽極氧化膜,其包 =予 -層。 已口多孔層與屏 將經上述前處理之鋁合金,於濃度 、、欠占 1 。 為12%之硫酸 冷中,於15 C之溫度下,使用7伏特 進行陽極氧化處理丨〇分鐘。之後,依 譽 ^ ^ ^ Ar . 卜列方式進 訂Charge with acid solution and neutralize for 30 seconds. This can be applied to aluminum alloys. The anodic oxide film of aluminum having a degree of 5 μηη includes a pre-layer. The porous layer and the screen have been subjected to the above-mentioned pre-treated aluminum alloy at a concentration of 1 and less than 1. It was sulphuric acid at 12% in the cold at 15 C and anodizing at 7 C for 0 minutes. Afterwards, order by reputation ^ ^ ^ Ar.
線 仃兒~耆色·於事先調製好之電鍍 ^ ^ T (電鍍浴組 1匕括25克/升硫酸鎳、2〇克/升硫酸鎂、25 升硼酸與15克/升硫酸銨),以4伏特 兄 处认、、、, 夏流電與9 伙特之交流電同時併用方式,進行電 ^ 外沈積5分 4里’以將金屬鎳沉積於多孔層之孔隙底 、、〃 、 仏沣。電解著 色元成後,接著利用錢鍍(SpUttering)之方式、、、 極氧化膜表面上交替成長Ti〇2 (高折射、險 薄膜及S i 0 2 (低折射率氧化物)薄膜各' / '— ) 厚度500〜1000A。結果參見圖】所示。1層,每層 、·、 由於係形成厚 度’小於ΙΟμηι纟干涉|,當觀察者位於不同視 下,該鋁合金表面因干涉效應而會 度王至少2種之 -20. 593786 A7 B7 五、發明説明(16 ) 顏色變化。此外,所製得鋁製品之指紋沾染問題業 已獲致改善。 實例2 將鋁純度為99.5 %之鋁合金依實例1之方式進行 前處理。 將經上述前處理之鋁合金匕於濃度為1 2%之硫酸 浴中,於15 °C之溫度下,使用7伏特之直流電壓 進行陽極氧化處理1 0分鐘。經水洗之後,於濃度-為12%之磷酸浴中,於15°C之溫度下,使用7伏 特之直流電壓進行第二次陽極氧化處理5分鐘。之 後依下列方式進行電解著色:於事先調製好之電鍍 浴中(電鍍浴組成同實例 1 ),以直流電4交流電— 直流電4交流電4直流電五次電流交替之方式,使 用12伏特之電壓進行電解沈積5分鐘,以將金屬 鎳沉積於多孔層之孔隙底部。然後經再次之水洗。 之後,於上述之相同條件下、於硫酸浴中進行第三 次陽極氧化處理,。接著利用錢鐘(sputtering)之方式於 鋁之陽極氧化膜表面上方交替成長Ti02 (高折射率 氧化物)薄膜及 Si02 (低折射率氧化物)薄膜各 5 層,每層厚度500〜1000 A。此可於鋁合金上形成厚 度為 5μιη之鋁的陽極氧化膜,其包含多孔層與屏 障層。結果參見圖2所示。 ,缶於係形成厚度小於1 0 μ m之干涉層,當觀察者 位於不同視角下,該紹合金表面因干涉效應而會產 -21 - 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593786 A7 B7 五、發明説明(17 ) 生 至 少2種之顏色變化。此外,所製得鋁製品 之 指 紋 沾 染問題~業已獲致改善。 例 3 / 將 鋁純度為9 9.5 %之鋁合金依實例1之方式 進 行 前 處 理。 將 經上述前處理之鋁合金匕於濃度為1 2%之 硫 酸 浴 中 ,於1 5 °C之溫度下,使用7伏特之直流 電 壓 進 行 陽極氧化處理1 0分鐘。經水洗之後,於 濃 度· 為 12 %之磷酸浴中,於15°C之溫度下,使用 12 伏 特 之 直流電壓進行第二次陽極氧化處理5分鐘。 之 後 依 下列方式進行電解著色:於事先調製好之 電 鍍 浴 中 (電鍍浴組成同實例 1 ),以直流電4交流 電 — 直 流 電4交流電直流電五次電流交替之方式 使 用 1 2伏特之電壓進行電解沈積5分鐘,以將 金 屬 鎳 沉 積於多孔層之孔隙底部。接著利用 錢 鍍 (sputtering)之方式於鋁之陽極氧化膜表面上方 交 替 成 長 Ti02 (高折射率氧化物)薄膜及Si02 (低 折 射 率 氧 化物)薄膜各5層,每層厚度500〜1000 A。 此 可 於 鋁 合金上形成厚度為 5μιη之銘的陽極氧化 膜 〇 結 果 參見圖3所示。 由 於中係形成厚度小於1 0 μπι之干涉層,當 觀 察 者 位 於不同視角下,該鋁合金表面因干涉效應 而 會 產 至少2種之顏色變化。此外,所製得鋁製 品 之 指 紋 沾染問題業已獲致改善。 -22 - 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593786 A7 B7 五、發明説明(18 ) 實例4 將鋁純·度為9 9.5 %之鋁合金依實例1之方式進行 前處理。 > 將經上述前處理之鋁合金,於濃度為1 2 %之硫酸 浴中,於1 5 °C之溫度下,使用7伏特之直流電壓 進行陽極氧化處理,處理過程_中,以_ 0. 1伏特/秒之 電壓下降速度,將電壓逐漸降至0.5伏特並停留5 秒,接著將電壓下降至0伏特,停留5秒後,再將. 電壓調升至2 0伏特,停留2 〇秒,而獲得分枝狀的 之孔隙結構。然後依下列方式進行電解著色:於事 先調製好之電鍍浴中(電鍍浴組成同實例 1 ),以直 流電4交流電-> 直流電4交流電直流電五次電流 交替之方式,使用12伏特之電壓進行電解沈積5 分鐘,以將金屬鎳沉積於多孔層之孔隙底部。接著 利用濺鍍(sputtering)之方式於鋁之陽極氧化膜表面 上方交替成長Ti02 (高折射率氧化物)薄膜及Si02 (低折射率氧化物)薄膜各5層,每層厚度500〜1000 A。此可於銘合金上形成厚度為5μιη之銘的陽極氧 化膜。結果參見圖4所示。 由於係形成厚度小於ΙΟμηι之干涉層,當觀察者位 於不同視角下,該鋁合金表面因干涉效應而會產生 至少2種之顏色變化。此外,所製得鋁製品之指紋 沾,挺問題業已獲致改善。 實例5 -23- 本紙張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐) 593786 A7 __________ B7 . _ 五、發明説明(19 ) 將銘純度為9 9 · 5 %之鋁合金依下列步騾進行前處 V籌 理1首先將铭材以2 〇 %之焦磷酸鈉,於6 0 °C之溫度 下進行脫脂處理3分鐘,經水洗之後、再藉超音波 作用於上述溶液中,進行脫脂處理3分鐘後,經水 洗’然後以濃度為3 0 %之硝酸水溶液予以中和3 0 秒,再經水洗後,置入5 %的苛性納水溶液中,進 行蝕刻1分鐘。此可於鋁合金上形成厚度為5 μηι的 銘之陽極氧化膜,其包含多孔層與屏障層。 將經上述前處理之鋁合金.,於濃度為1 2%之硫酸 ,中,於1 5 °C之溫度下,使用7伏特之直流電壓進 行極氧化處理1 〇分鐘。之後,依下列方式進行電 解著色:於事先調製好之電鍍浴中(電鍍浴組成包 括25克/升硫酸鎳、20克/升硫酸鎂、25克/升硼酸與 1 5克/升硫酸铵),以4伏特之直流電與9伏特之交流 電同時併用方式,進行電解沈積5分鐘,以將金屬 鎳沉積於多孔層之孔隙底部。電解著色完成後,接 著利用濺鍍(sputtering)之方式於鋁之陽極氧化膜表 面上交替成長Ti〇2 (鬲折射率氧化物)薄膜及3丨〇2 (低折射率氧化物)薄膜各5層,每層厚度5〇〇〜1〇〇〇a。 結果與實例1相當。由於係形成厚度小於10μπι之干 涉層,當觀察者位於不同視角下,該鋁合金表面因 干涉效應而會產生至少2種之顏色變化。此外,所 製,得銘製品之指紋沾染問題業已獲致改善。 •24- 本紙張尺度適用中國i?^CNS)Α4規格(21GX 297公~Line 仃 ~ 耆 色 · Pre-prepared electroplating ^ ^ T (plating bath set includes 25 g / L nickel sulfate, 20 g / L magnesium sulfate, 25 L boric acid and 15 g / L ammonium sulfate), Using 4 volts at the same time, Xia Liudian and 9 watts of alternating current are used simultaneously to perform electrical deposition for 5 minutes and 4 miles' to deposit metallic nickel on the pore bottom of the porous layer, 〃, 仏 沣. After the electrolytic coloring element is formed, the TiO2 (high-refractive, high-refractive film, and Si 0 2 (low-refractive-index oxide) film are each grown alternately on the surface of the polar oxide film by means of SpUttering. '—) Thickness 500 ~ 1000A. The results are shown in Figure]. 1 layer, each layer, as a result of the thickness' less than ΙΟμηι | interference |, when the observer is located in different views, the aluminum alloy surface will be at least 2 kinds due to interference effects -20. 593786 A7 B7 five, Description of the invention (16) Color change. In addition, the problem of fingerprint contamination of the produced aluminum products has been improved. Example 2 An aluminum alloy having a purity of 99.5% was pretreated in the same manner as in Example 1. The anodized aluminum alloy was subjected to anodization treatment at a temperature of 15 ° C and a DC voltage of 7 volts for 10 minutes in a sulfuric acid bath with a concentration of 12%. After washing with water, a second anodic oxidation treatment was performed in a phosphoric acid bath having a concentration of 12% at a temperature of 15 ° C for 5 minutes using a DC voltage of 7 volts. After that, the electrolytic coloring was performed in the following way: in a pre-prepared electroplating bath (the composition of the electroplating bath is the same as that in Example 1), the electrolytic deposition was performed by alternating current of 4 volts DC-4 volts AC 4 volts DC five times, using 12 volts 5 minutes to deposit metallic nickel on the bottom of the pores of the porous layer. Then washed again. Then, a third anodizing treatment was performed in a sulfuric acid bath under the same conditions as described above. Then, using a method of sputtering, five layers of Ti02 (high-refractive-index oxide) and Si02 (low-refractive-index oxide) films are grown alternately over the surface of the aluminum anodized film, each with a thickness of 500 ~ 1000 A. This can form an anodized film of aluminum with a thickness of 5 μm on the aluminum alloy, which includes a porous layer and a barrier layer. The results are shown in Figure 2. An interference layer with a thickness of less than 10 μm is formed. When the observer is located at different viewing angles, the surface of the alloy will produce -21 due to interference effects.-This paper size applies to Chinese National Standard (CNS) A4 specifications (210 X 297 mm) 593786 A7 B7 V. Description of the invention (17) At least 2 kinds of color changes are produced. In addition, the problem of fingerprint contamination of the produced aluminum products has been improved. Example 3 / An aluminum alloy having an aluminum purity of 99.5% was processed in the same manner as in Example 1. The pre-treated aluminum alloy was anodized in a sulfuric acid bath with a concentration of 12% at a temperature of 15 ° C and a direct voltage of 7 volts for 10 minutes. After washing with water, a second anodic oxidation treatment was performed in a phosphoric acid bath having a concentration of 12% at a temperature of 15 ° C for 12 minutes using a DC voltage of 12 volts. After that, electrolytic coloring was performed in the following way: in a pre-prepared electroplating bath (the composition of the electroplating bath is the same as that in Example 1), electrolytic deposition was performed using a voltage of 12 volts in a manner of alternating alternating current of 4 direct current-direct current 4 direct current and direct current 5 times. Minutes to deposit metallic nickel on the bottom of the pores of the porous layer. Then, 5 layers of long Ti02 (high refractive index oxide) film and Si02 (low refractive index oxide) film were replaced on the surface of aluminum's anodized film by sputtering, and the thickness of each layer was 500 ~ 1000 A. This can form an anodic oxide film with a thickness of 5 μm on the aluminum alloy. The results are shown in FIG. 3. Since the meso system forms an interference layer with a thickness of less than 10 μm, when the observer is at different viewing angles, the aluminum alloy surface will produce at least two color changes due to interference effects. In addition, the fingerprint contamination of the aluminum products has been improved. -22-This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 593786 A7 B7 V. Description of the invention (18) Example 4 An aluminum alloy with a purity of 99.5% aluminum according to Example 1 Pre-processing. > Anodize the pre-treated aluminum alloy in a sulfuric acid bath with a concentration of 12% at a temperature of 15 ° C using a DC voltage of 7 volts. During the process, _ 0 1 volt / second voltage drop rate, gradually reduce the voltage to 0.5 volts and stay for 5 seconds, then lower the voltage to 0 volts, stay for 5 seconds, and then increase the voltage to 20 volts and stay for 20 seconds To obtain a branched pore structure. Then perform the electrolytic coloring in the following way: in a pre-prepared electroplating bath (the composition of the electroplating bath is the same as in Example 1), the electrolysis is performed by alternating current of 5 times with direct current 4 alternating current-> direct current 4 alternating current direct current 5 times Deposit for 5 minutes to deposit metallic nickel on the bottom of the pores of the porous layer. Then, by sputtering, Ti02 (high-refractive-index oxide) film and Si02 (low-refractive-index oxide) film are grown on the surface of aluminum's anodized film alternately in five layers, each with a thickness of 500 ~ 1000 A. This can form an anodized film with a thickness of 5 μm on the alloy. The results are shown in Figure 4. Due to the formation of an interference layer with a thickness of less than 10 μm, when the observer is at different viewing angles, at least two kinds of color changes will occur on the aluminum alloy surface due to interference effects. In addition, the fingerprints of the aluminum products produced have been improved. Example 5 -23- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 593786 A7 __________ B7. _ 5. Description of the invention (19) Aluminum alloy with a purity of 9 9 · 5% The following steps are carried out in the previous step V. 1 First, the Ming material is degreased with 20% sodium pyrophosphate at 60 ° C for 3 minutes, washed with water, and then ultrasonicated in the above solution. After being degreased for 3 minutes, it was washed with water and then neutralized with a 30% nitric acid aqueous solution for 30 seconds. After being washed with water, it was placed in a 5% caustic soda aqueous solution and etched for 1 minute. This can form a 5 μm thick anodized film on the aluminum alloy, which includes a porous layer and a barrier layer. The pre-treated aluminum alloy was subjected to extreme oxidation treatment at a concentration of 12% sulfuric acid at 15 ° C and a DC voltage of 7 volts for 10 minutes. After that, electrolytic coloring was performed in the following manner: In a previously prepared electroplating bath (the composition of the electroplating bath includes 25 g / L of nickel sulfate, 20 g / L of magnesium sulfate, 25 g / L of boric acid, and 15 g / L of ammonium sulfate) The electrolytic deposition was performed for 5 minutes by using a direct current of 4 volts and an alternating current of 9 volts simultaneously to deposit metallic nickel on the bottom of the pores of the porous layer. After the electrolytic coloring is completed, successively, titanium oxide (Ti refractive index oxide) films and 3 丨 〇2 (low refractive index oxide) films are grown on the surface of aluminum anodized film by sputtering. Layers, each with a thickness of 500 ~ 1000a. The results are comparable to Example 1. Because the interference layer is formed with a thickness of less than 10 μm, when the observer is located at different viewing angles, the aluminum alloy surface will produce at least two kinds of color changes due to interference effects. In addition, the fingerprint contamination of Deming products has been improved. • 24- This paper size applies to China i? ^ CNS) Α4 size (21GX 297 male ~
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CN110612001A (en) * | 2018-06-14 | 2019-12-24 | 因特瓦克公司 | Multi-color dielectric coating and UV ink-jet printing |
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CN111670270A (en) * | 2018-03-28 | 2020-09-15 | 株式会社Uacj | Aluminum member and method for producing same |
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CN110612001A (en) * | 2018-06-14 | 2019-12-24 | 因特瓦克公司 | Multi-color dielectric coating and UV ink-jet printing |
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CN112376102A (en) * | 2020-11-07 | 2021-02-19 | 江苏美玛技术有限公司 | Preparation method of high-performance cutter coating material |
CN115341169A (en) * | 2021-05-14 | 2022-11-15 | 北京小米移动软件有限公司 | Surface treatment method |
CN115821261A (en) * | 2022-07-19 | 2023-03-21 | 得利钟表制品厂有限公司 | Surface modification and color change method and article |
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