TW586178B - Wafer clamp ring having removable pad and its manufacturing method - Google Patents
Wafer clamp ring having removable pad and its manufacturing method Download PDFInfo
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- TW586178B TW586178B TW92101930A TW92101930A TW586178B TW 586178 B TW586178 B TW 586178B TW 92101930 A TW92101930 A TW 92101930A TW 92101930 A TW92101930 A TW 92101930A TW 586178 B TW586178 B TW 586178B
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Abstract
Description
586178 五、發明說明(1) [發明所屬之技術領域] 本發明係有關於半導體晶圓的製程裝置,特別是有關 於一種具有可拆式墊的晶圓夾環及其製作方法。 [先前技術] 在一般金屬沉積裝置中,例如在濺鍍(s p u 11 e r i n g )裝 置中,常利用晶圓夾環(wafer c lamp ring)來固定住晶 圓,以利進行沉積金屬膜於晶圓的表面上。 請參見第1圖,用以顯示習知晶圓夾環1 〇固定一晶圓 的佈置(arrangement)剖面圖。在第1圖中,一圓環狀的晶 圓爽環(circular wafer clamp ring)l〇 將一晶圓12 固定 於一基座(或稱:晶圓承載器)1 4上。亦即,該晶圓夾環i 〇 备、壓住该晶圓1 2的邊緣(e d g e ),使得該晶圓1 2固定於該基 座1 4上,其中符號1 3係表示晶圓夾環1 0接觸到晶圓1 2的接 觸面(contact area)。然後,經由濺鍍程序將金屬原子/ 離子M+沉積至晶圓12的表面。 ’ ^ 由於金屬沉積物也會沉積在晶圓夾環丨〇上,所以習知 晶圓夾環10在使用-段期間之後,必須進行回收程序d 界稱為:cUmP ring recycling),亦即經由噴砂(sand、 blasting)、酸洗(acid cleaning)與純水沖洗(dns 程序將沉積在晶圓夾環1 〇表面上的沉積物與污 ' , 以免改變晶圓夾環ίο的輪廓尺寸(profUe siz㈧而產生陰 影效應(shadow effect)而降低濺鍍製程的良二 然而,習知晶圓夾環]〇名推钚μ、+、 y ui人衣1 ϋ在進仃上述回收程序時,常發586178 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a process device for semiconductor wafers, and more particularly to a wafer clamp ring with a detachable pad and a manufacturing method thereof. [Previous Technology] In a general metal deposition device, for example, in a sputtering (erpu) device, a wafer c ring (wafer c lamp ring) is often used to fix the wafer to facilitate the deposition of a metal film on the wafer. on the surface. Please refer to FIG. 1 for a cross-sectional view showing an arrangement of a conventional wafer clamp ring 10 for holding a wafer. In Figure 1, a circular wafer clamp ring 10 is used to fix a wafer 12 on a base (or wafer carrier) 14. That is, the wafer clamping ring i 〇 prepares and presses the edge of the wafer 12, so that the wafer 12 is fixed on the pedestal 14, where the symbol 13 indicates the wafer clamping ring. 10 is in contact with the contact area of the wafer 12 (contact area). Then, metal atoms / ions M + are deposited on the surface of the wafer 12 via a sputtering process. ^ Since metal deposits will also be deposited on the wafer clamp ring, it is known that after the wafer clamp ring 10 is used, the recycling process must be performed. The circle is called cUmP ring recycling), that is, by sandblasting ( sand, blasting), acid cleaning, and pure water rinsing (dns program will deposit the sediment and dirt on the surface of the wafer clamp ring 10, so as not to change the outline size of the wafer clamp ring (profUe siz) and The shadow effect is a good way to reduce the sputtering process. However, the conventional wafer clamping ring] 0 people push μ, +, y ui clothes 1 仃 When entering the recovery process, it often occurs
0503-8970TW(Nl) : TSMC2002-0734;jacky.ptd 第4頁 586178 五、發明說明(2) 現晶圓夹環1 〇的接觸面1 3报容易爭指 ^ . Q ^ ^ n 令为又相,其原因推論是接觸 m曰曰圓12磨擦,目而在進行上述回收程序時便特別 谷易文知。當接觸面1 3受損時’就會釋放出粒子 而在滅鍍製程中污染晶圓12,因此,成本相合 貝(母個約25萬元)的晶圓夾環1〇就必須整個更換 田 。也就是說,習知晶圓夾環1〇的使用壽 t::)因為接觸面13容易損傷而減短,因而造 增加。 美國專利第54 2 1 40 1號有揭干一插、吞 八m λ Α β门询不種適用於具有平邊部 刀(flat P〇rtlon)的曰日圓的晶圓夾環, 進行回收程序時仍然會有如前述之門題 b曰U又衣在 美國專利第5 4 6 0 7 0 3號有揭示一種由 料所製造而成的晶圓夾環,然而兮曰n + 心脹係数材 >丄 _ 5亥日日圓夾環在進行回收裎 序時仍然會有如前述之問題。 美國專利第6 1 6 2 33 6號有揭矛一链拉丄 觸面積的晶圓夾環,用以減少曰 7縮小與晶圓接 述之問題。 進仃回收程序時㈣會有如前 美國專利第6 1 76 93 1號有揭示一種用於離子化物理氣 相沉積⑽)裝置的晶圓夹環’該晶圓爽環具子有一物令“ 以及-開口’用以避免該晶圓夾環在製程中被過度加熱。 然而該晶圓夾環在進行回收程序時仍然會有如前述之問 題。0503-8970TW (Nl): TSMC2002-0734; jacky.ptd Page 4 586178 V. Description of the invention (2) The contact surface of the existing wafer clamp ring 1 0 is easy to contend ^. Q ^ ^ n It is inferred that the reason is contact with the friction of circle 12, and it is especially known in the text when the recovery process is performed. When the contact surface 13 is damaged, particles will be released and the wafer 12 will be contaminated during the deplating process. Therefore, the wafer clamping ring 10 with the same cost (about 250,000 yuan) must be replaced entirely. . That is, the lifetime of the conventional wafer clamp ring 10 is shortened because the contact surface 13 is easily damaged, which increases the cost. U.S. Patent No. 54 2 1 40 1 has disclosed a dry insertion, swallowing eight m λ Α β gate inquiry is not suitable for a Japanese yen wafer clamp ring with a flat edge knife (flat Portion), to carry out the recovery process At the same time, there will still be a wafer clamp ring made of materials as described in the above-mentioned subject b. U and U.S. Patent No. 5 4 0 7 0 3, however, n + heart expansion material > 丄 _ 5 Haitian Yen clamps will still have the same problems as before. U.S. Patent No. 6 1 6 2 33 6 has a wafer clamping ring with a spear-chain pulling area to reduce the problem of shrinking the wafer with the wafer. During the recovery process, there will be a wafer clamping ring for the device as described in the former US Patent No. 6 1 76 93 1). The wafer ring has a material order "and -The opening is used to prevent the wafer clamping ring from being overheated during the manufacturing process. However, the wafer clamping ring still has the same problems as described above during the recycling process.
0503-8970TW(Nl) ; TSMC2002-0734;jacky.ptd 第5頁 5861780503-8970TW (Nl); TSMC2002-0734; jacky.ptd page 5 586178
發明内容: 有鑑於此 製作方法。 本發明的目的在於提供一種晶圓 夾環及其 種具有可拆式墊的晶圓 圓夾環使用壽命。 種具有可拆式墊的晶圓 本發明的另一目的在於提供_ 夾環及其製作方法,而能夠增加晶 根據上述目的,本發明提供一 夹環,包括: 該夾環本體 絲而固定於 一夾環(clamp ring)本體;以及 複數個可拆式墊(removable pads)連接於 的部分表面上,每個可拆式墊係藉由至少一螺 該夾環本體上; μ 其中,該等可拆式墊係用來固定一晶圓於一基座上。 根據上述目的,本發明亦提供一種具有可拆 ^ 圓夾環的製作方法,包括下列步驟: 工勢的晶 提供一夾環(cl amp ring)本體;以及 連接複數個可拆式墊(removable pads)於該夾環本體 的部分表面上,每個可拆式墊係藉由至少一螺絲而固: 該夾環本體上; < 其中,該等可拆式墊係用來固定一晶圓於一基座上。 以下配合圖式以及較佳實施例,以更詳細地說日^本發 實施方式: 以下利用第2圖與第3圖來說明本發明之具有可拆式塾Summary of the Invention: In view of this, the manufacturing method. An object of the present invention is to provide a wafer clamp ring and a wafer round clamp ring with a detachable pad. A wafer with a detachable pad. Another object of the present invention is to provide a clamp ring and a method for manufacturing the same, which can increase the crystal. According to the above object, the present invention provides a clamp ring including: the clamp ring body wire is fixed to A clamp ring body; and a plurality of removable pads connected to a part of the surface, each of which is attached to the clamp ring body by at least one screw; μ wherein The detachable pad is used to fix a wafer on a base. According to the above object, the present invention also provides a method for manufacturing a detachable circular clamp ring, which includes the following steps: the crystal of the working force provides a cl amp ring body; and connecting a plurality of removable pads ) On a part of the surface of the clamp ring body, each detachable pad is fixed by at least one screw: on the clamp ring body; < wherein the detachable pads are used to fix a wafer on On a pedestal. The following is a detailed description of the present embodiment in conjunction with the drawings and preferred embodiments: The following uses FIG. 2 and FIG. 3 to describe the detachable type of the present invention.
五、發明說明(4) 佈置(arrangement)及其製作方法。這裡 面,實際】的弟2圖係顯示本發明之晶圓夾環的一部分斷 第3圖所示。、本&明之晶圓夾環係呈環狀(annul ar),如 ^ 夾環本體/〇户士圖,提供一夾環(clamP dng)本體20,該 等等。 孟屬材料所製成,例如是鈦合金或不鏽鋼 4乃舌青閱^ Γ) @V. Description of the Invention (4) Arrangement and its manufacturing method. Here, the actual figure 2 shows a part of the wafer clamping ring of the present invention as shown in figure 3. The wafer clamp ring of this & Ming is annul ar, such as ^ clamp ring body / 0 household chart, a clamp ring (clamP dng) body 20 is provided, and so on. Made of Meng materials, such as titanium alloy or stainless steel 4 乃 舌 青青 ^ Γ) @
Pads)22於該类产:,連接複數個可拆式墊(removabie 晶圓邊緣之表面^ A體的部分内側表面上(即對應於靠近 器24(在此,以^处,母個可拆式墊22係藉由至少一固著 明)上於= ; = 說明,但並非限制本發 來固定一晶圓本體20上’其中該等可拆式墊22係用 圓12接觸之接觸面2:基f 14上,還有可拆式墊22具有與晶 料所製成,例如Γ:人it ’該等可拆式塾22係由金屬材 π、a 欽合金或不鏽鋼等等,而可拆彳埶9 9从 -:;:.L-2r~re;;r:;p:;v/;^ 別於每一 Z拆式塾22與該失環本體2〇中形成對應=二二 絲孔26與第二螺絲孔28,然後將螺絲24鎖入該;蟬 尔 26、2",如此就能將可拆式墊22固 以孔 上。其中,上述螺絲24的材質最好是鈦合金Ϊ;:Γ° 另外,為了能確貫地將每一可拆式塾22固定於該夹環 586178 五、發明說明(5) 20上’所以在每一可拆式墊22的兩個不同位 好疋,用兩個螺絲24鎖入該等螺絲孔26、Μ中。 取 节等二能均勻地固定住該晶圓12於該基座Η上, 違寻可拆式墊22配置於該夹環太俨 圖所示护岫,邴罢、-紅彳 本 的方式可以如第3 " 稷數個相隔固定距離之可拆式墊2 2 π β 夹環本體20上。這裡要說明 J拆式塾22於该 9 9 AA ^z. ^ „ J疋 弟d圖所不之可拆式墊 τ处I可以疋3個、4個、5個、6個或6個以上;狹而, 為了此將晶圓12均勻地固定於基座14上,最 相隔固定距離之可拆式墊22於該夾環本體2〇上。- 再者,上述本發明之具有可拆式墊的晶圓夾環3 0在經 過2夕次沉積製程之後,則必須進行進行回收程序(聿界 %為.clamp ring recycling),亦即經由嘖砂(“Μ ^asUng)、酸洗(acid cleaning)與純水沖洗(rinse)等 私序將沉積在晶圓夾環3 0表面上的沉積物與污染物去掉, 以免改變晶圓夾環30的輪廓尺寸(pr〇fUe以^)而產生陰 影效應(shadow effect)而降低沉積製程的良率(yield)。 、然而,由於可拆式墊22的接觸面29比較容易受損(因 為與晶圓碰觸摩擦),因此本發明將該夾環本體2〇與該等 可拆式墊22分開來進行回收(recycHng)程序,也就是 說,、對該夾環本體20進行一第一回收程序,以及對該等可 拆式墊2 2進行一第二回收程序。由於可拆式墊2 2受到沉積 製私的影響比夾裱本體2 〇少,所以第二回收程序所使用的 酸洗濃度可以低於第一回收程序,第二回收程序的喷砂強 度也可低於第一回收程序,甚至第二回收程序可被簡化成Pads) 22 in this type of product: connect a plurality of detachable pads (removabie surface of the edge of the wafer ^ part of the inside surface of the A body (that corresponds to the proximity device 24 (here, ^, the female The type pad 22 is fixed on at least one by means of an explanation; but it is not limited to the present invention for fixing a wafer body 20 ', wherein the detachable type pads 22 are contact surfaces 2 which are contacted by a circle 12 : On the base f 14, there is also a detachable pad 22 having a crystal material, for example, Γ: 人 it 'The detachable 塾 22 is made of a metal material π, an alloy or stainless steel, etc. Demolition 9 9 9 is from-:;:. L-2r ~ re ;; r :; p :; v /; ^ Different from each Z detachable 塾 22 to form a correspondence with the lost-loop body 20 = 22 Screw hole 26 and second screw hole 28, and then lock the screw 24 into it; so that the removable pad 22 can be fixed to the hole. Among them, the screw 24 is preferably made of titanium Alloy Ϊ;: Γ ° In addition, in order to securely fix each detachable 于 22 to the clamp ring 586178 V. Description of the invention (5) 20 'So two different in each detachable pad 22 Good position, lock with two screws 24 The screw holes 26 and M. Sections and the like can evenly fix the wafer 12 on the base Η, and the detachable pad 22 is arranged on the retaining ring shown in the figure, Stop,-the method of the red book can be as in the third " 稷 several detachable pads 2 2 π β clamp ring body 20 separated by a fixed distance. Here to explain the J detachable 塾 22 on the 9 9 AA ^ z ^ „At the detachable pad τ, which can not be seen in the figure of J 疋 d, three, four, five, six, or more can be used; for this purpose, the wafer 12 is evenly fixed to the substrate. On the seat 14, a detachable pad 22 that is most separated by a fixed distance is on the clamp ring body 20.-Furthermore, the wafer clamp ring 30 with a detachable pad of the present invention described above undergoes a second deposition process. After that, a recycling process must be carried out (the circle% is .clamp ring recycling), that is, the sediment is deposited in a private sequence such as arsenic (“M ^ asUng), acid cleaning, and pure water rinse. The deposits and contaminants on the surface of the wafer clamp ring 30 are removed, so as not to change the outline size (pr0fUe of the wafer clamp ring 30) of the wafer clamp ring 30 to produce a shadow effect and reduce Yield of the integrated manufacturing process. However, since the contact surface 29 of the detachable pad 22 is relatively easy to be damaged (because of friction with the wafer), the present invention uses the clamp ring body 20 and the The detachable pad 22 is separately subjected to a reccycng process, that is, a first recovery process is performed on the clamp ring body 20, and a second recovery process is performed on the detachable pads 22. Since the removable pad 22 is less affected by the deposition system than the clip-mounted body 20, the pickling concentration used in the second recovery process can be lower than the first recovery process, and the blasting strength of the second recovery process can also be reduced. Lower than the first recovery procedure, even the second recovery procedure can be simplified to
II
I » 〇503-8970TW(Nl) ; TSMC2002-0734;jacky.ptd 第8頁 586178 五、發明說明(6) 只需進行純水沖洗即可,所以可拆式墊22的接觸面“比較 不會在回收程序中受損,因而也減少粒子污染的問題,而 改善習知之製程良率。 還有,由於本發明使得該夹環本體2〇沒有與該晶圓12 接觸,因此也大幅地提升該夾環本體2 〇的使用壽命。、 發明者在此舉一例,在相同的製程條件下=二本發明 與習知技術的晶圓夾環的使用壽命與成本。 ' 比較結果如下表所示: 每年耗材成本I »〇503-8970TW (Nl); TSMC2002-0734; jacky.ptd Page 8 586178 V. Description of the invention (6) Only pure water flushing is required, so the contact surface of the removable pad 22 is“ less likely It is damaged in the recovery process, thus reducing the problem of particle contamination, and improving the conventional process yield. In addition, the present invention makes the clamp ring body 20 not in contact with the wafer 12, so it greatly improves the process. The service life of the clamp ring body 〇. The inventor will take an example here, under the same process conditions = the service life and cost of the wafer clamp ring of the present invention and the conventional technology. The comparison results are shown in the following table: Consumable cost per year
曰曰 從上述例子可知道,使帛本發明的具有 圓夾壤可以大大地降低成本。也就是說 有=的可拆式墊就可以了,而不必像f知晶圓夾環= 個換新,因此本發明對於降低耗材成本而言,是相 [本案特徵及效果] 本發明之特徵與效果在於: 本毛.月之^有可拆式墊的晶圓失環,包括:一夾環 (c a叩ring)本體;以及複數個可拆式墊(rem〇vaMe pads)連接於該夾環本靜的邱八 不也的口刀表面上,每個可拆式墊係 精由至少一螺絲而固定於該夾環本體上。 第9頁 0503-8970TW(Nl) ; TSMC2002-0734;jacky.Ptd 586178 五、發明說明(7) 因此,夾環本體與可拆式墊可以分開來進行不同條件 之回收(r e c y c 1 i n g )程序,所以使得可拆式墊與晶圓接觸 之接觸面比較不會在回收程序中受損,因而也減少粒子污 染的問題,而改善習知之製程良率。 退有’由於本發明使得夹壞本體沒有與晶圓接觸’故 能大幅地提升夾環本體的使用壽命,而減少耗材成本。 雖然本發明已以較佳實施例揭露如上,然其並非用以 限定本發明,任何熟習此項技藝者,在不脫離本發明之精 神和範圍内,當可作更動與潤飾,因此本發明之保護範圍 當視後附之申請專利範圍所界定者為準。It can be known from the above examples that the cost of the present invention can be greatly reduced by having a circular sandwich. That is to say, it is enough to have a detachable pad, and it is not necessary to know that the wafer clamp ring = a new one. Therefore, the present invention is related to reducing the cost of consumables. [Features and Effects of the Case] The effect is as follows: the wafer has a missing ring with a detachable pad, including: a caring ring body; and a plurality of detachable pads (removaMe pads) connected to the clip On the surface of Qiu Babu's mouth knife of Huanbenjing, each detachable pad is fixed to the clamp ring body by at least one screw. Page 9 0503-8970TW (Nl); TSMC2002-0734; jacky.Ptd 586178 V. Description of the invention (7) Therefore, the clamp ring body and the detachable pad can be separated to perform reccyc ing procedures for different conditions. Therefore, the contact surface between the removable pad and the wafer is less likely to be damaged during the recovery process, thereby reducing the problem of particle contamination, and improving the conventional process yield. "With the present invention, because the clamped body does not contact the wafer", the service life of the clamp ring body can be greatly improved, and the cost of consumables can be reduced. Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make changes and retouches without departing from the spirit and scope of the present invention. The scope of protection shall be determined by the scope of the attached patent application.
0503-8970rnV(Nl) ; TSMC2002-0734; j acky .ptcl 第10頁 586178 圖式簡單說明 第1圖係顯示習知晶圓夾環的佈置剖面圖; 第2圖係根據本發明具有可拆式墊的晶圓夾環的佈置 剖面圖;以及 第3圖係顯示本發明具有可拆式墊的晶圓夾環之一例 的下視圖,用以顯示可拆式墊的配置位置。 [符號說明] 習知部分(第1圖) 1 0〜習知晶圓夾環 1 3〜接觸面; M+〜金屬原子/離子 本案部分(第2、3圖) 1 2〜晶圓; 2 0〜夾環本體; 2 4〜螺絲; 2 8〜第二螺絲孔; 3 0〜本發明之具有 1 2〜晶圓; 1 4〜基座; 1 4〜基座; 2 2〜可拆.式墊; 2 6〜第一螺絲孔; 2 9〜接觸面; 拆式塾的晶圓爽壞。0503-8970rnV (Nl); TSMC2002-0734; jacky.ptcl Page 10 586178 Brief description of the drawings Figure 1 is a sectional view showing the arrangement of a conventional wafer clamp ring; Figure 2 is a diagram of a removable pad according to the present invention. A cross-sectional view of the arrangement of the wafer clamp ring; and FIG. 3 is a bottom view showing an example of a wafer clamp ring with a detachable pad according to the present invention, and is used to show the disposition position of the detachable pad. [Description of symbols] Conventional section (Fig. 1) 1 0 ~ Conventional wafer clamp ring 1 3 ~ Contact surface; M + ~ Metal atom / ion part of the case (Figs. 2 and 3) 1 2 ~ Wafer; 2 0 ~ Clip Ring body; 2 4 ~ screws; 2 8 ~ second screw holes; 30 ~ of the present invention has 1 2 ~ wafers; 1 4 ~ base; 1 4 ~ base; 2 2 ~ detachable pad; 2 6 ~ first screw hole; 2 9 ~ contact surface; detachable wafer is bad.
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Application Number | Priority Date | Filing Date | Title |
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TW92101930A TW586178B (en) | 2003-01-29 | 2003-01-29 | Wafer clamp ring having removable pad and its manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92101930A TW586178B (en) | 2003-01-29 | 2003-01-29 | Wafer clamp ring having removable pad and its manufacturing method |
Publications (2)
Publication Number | Publication Date |
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TW586178B true TW586178B (en) | 2004-05-01 |
TW200414398A TW200414398A (en) | 2004-08-01 |
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Family Applications (1)
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TW92101930A TW586178B (en) | 2003-01-29 | 2003-01-29 | Wafer clamp ring having removable pad and its manufacturing method |
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TW (1) | TW586178B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US11195756B2 (en) * | 2014-09-19 | 2021-12-07 | Applied Materials, Inc. | Proximity contact cover ring for plasma dicing |
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2003
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TW200414398A (en) | 2004-08-01 |
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