TW580604B - Optical exposure systems and processes for alignment of liquid crystals - Google Patents

Abstract

This invention relates to an optical exposure system that is useful for exposing optical alignment layers with light in order to align liquid crystal. The exposure system comprises at least one source of optical radiation, means for partially collimating the optical radiation, means for partially polarizing the optical radiation, means for adjusting the degree of polarization, and means for transporting a substrate and radiation relative to one another. Other embodiments include means for partially filtering the optical radiation and means for some portion of said optical radiation to be incident at an oblique angle relative to the substrate. Another embodiment is a novel optical module and processes for aligning liquid crystals using the optical exposure systems.

Description

2. Description of the invention: [Technical field to which the invention belongs] The present invention relates to an optical exposure system and a method for arranging a light alignment layer and a liquid crystal with light. The present invention was funded by the government under the auspices of ARPA under the agreement No. MDA972-93-2- 0014. The government has certain rights in the invention. [Prior art] Liquid crystal compounds are used in human and machine-readable displays, and can be used in instrument control parts, such as in motor vehicles, avionics, medical devices' watches, portable computers and desktop computer displays. The common feature of each of the above products is that a liquid crystal layer is interposed between a pair of substrates, and the substrate is coated with a polymer alignment layer. The polymer alignment layer controls the alignment direction of the liquid crystal medium when / with an electric field. The alignment direction of the liquid crystal medium is usually established in a mechanical rubbing process, in which the polymer layer is rubbed with a cloth or other fibrous material. The liquid crystal medium contacting the rubbed surface is usually aligned parallel to the direction of the mechanical rubbing. Another method is that an alignment layer including anisotropic absorption molecules can be exposed to polarized light to align liquid crystal media, such as Gibbons and their companions in U.S. Pat. of Aligning and Realigning Liquid Crystal Media ". Most liquid crystal devices, including displays, have a limited pre-tilt angle, for example, controlled by the mechanical friction of the selected polymer alignment layer. Contact this layer < The liquid crystal molecules are aligned parallel to the rubbing direction, but they are not absolutely parallel to the substrate. The liquid crystal molecules are slightly inclined to the substrate, for example, about 2 O: \ 55 \ 557II-920905 DOC -5- to 15 degrees. In most displays In the application, in order to achieve the best performance, the liquid crystal needs to have a limited and consistent pre-tilt angle. Recently, a method of using polarized light to arrange the light with pre-tilt was disclosed in Gibbons and their companions In U.S. Patent Application No. 08 / 624,942, filed on March 29. In this method, a material absorbs a polarized radiation source. Examples of several different light alignment layers Disclosed in the application. These layers are then arranged at a specific angle with respect to the direction of polarization and intermediary convey a liquid crystal array in contact with the alignment layer. The pre-tilt of the liquid crystal can be achieved by controlling the incident angle of ultraviolet radiation. The multiple exposure step is most often achieved. Another method that uses polarized light to expose an alignment material to pre-tilt the liquid crystal is disclosed in Kobayashi and his companion in European patent application EP 0742471. Kobayashi and his companion consider The step exposes a substrate to linearly polarized light, and the polarized light in the second step contains components that are perpendicular to the first exposure step. This method also proposes to use unpolarized light as part of this method. Finally, Kobayashi and his companion theory And the possibility of using elliptically polarized light as a more versatile type of linearly polarized light. In all the descriptions of this method, the incident angle of light does not take into account the divergence of light, and then only deals with the case of collimated light. By itself, any optical system used to expose in this way must produce high collimation and high There is a need for optical exposure systems that can transmit polarized light over a large area. For optical systems and methods there is also a need to induce a pre-tilt of a liquid crystal medium in a single exposure step.目 # ， 发明 O: \ 55 \ 55711 -920905. DOC -6-It is found that the degree of polarization and collimation is-an adjustable parameter in the optical exposure system, and it plays a very important role in the exposure method. So far it is used for ranking The material's optical exposure system has been designed to achieve high polarization and high collimated light. It is now possible to control these needs to an appropriate level and achieve improvements: energy and new exposure geometry. An optical exposure system using part of the polarization and partial collimation of the module is disclosed in this book, which has obvious advantages over the full polarization and full collimation systems. This optical system helps to become a production-grade optical exposure system. [Summary of the Invention] One object of the present invention is to provide an efficient optical exposure system capable of irradiating a large-area substrate with partial polarization and partial collimated ultraviolet rays. Another object of the present invention is a method for optically arranging a light alignment layer using a part of collimation and a part of polarized light and then placing a liquid crystal in contact with the light alignment layer. Another aspect of the present invention is a method for inducing a liquid crystal pre-tilt arrangement with only a single exposure step. Another object of the present invention is to verify that a large substrate area can be exposed by multiple smaller components. The composition of the components achieves the same function as the smaller components over a larger area. An embodiment of the present invention is an optical exposure system including at least one optical radiation source aligning a substrate with partially polarized and partially collimated light, a device that partially collimates the light wheel, and a device that partially polarizes the light radiation A device for adjusting the polarization angle and a device for moving the substrate and the radiation to each other. Other embodiments further include a device that partially filters the optical radiation and a device that makes certain portions of the optical radiation incident on the substrate at an oblique angle. Other embodiments include a novel optical component that collimates and polarizes light, and uses the optical exposure

O: \ 55 \ 55711 -920905. A new method for aligning liquid crystals in DOC light systems. [Embodiment] The term "light aligning layer" as used herein means any layer that can anisotropically change the dielectric properties when exposed to light radiation. Some examples of light aligning layers are disclosed in the aforementioned Gibbons and their patents US Patent No. 5,567,349 by Schadt and his companions, and US Patent No. 5,389,698 by Chigrinov and his companions. The term "substrate" as used herein means a light alignment layer or a light alignment layer adhered to it. Any material on it. As used herein, the term "non-polarized light" means light radiation with any transformation instantaneous polarization state with an even and uniform distribution of the light propagation axis. The term used in this article, partly polarized light means It refers to the distribution of light radiation with arbitrary transformation of instantaneous polarization state along two orthogonal major axes, so that one axis contains the average intensity of the car body than its orthogonal axis. The relative intensity of two orthogonal axes of Shaofen polarized light ranges from 1: 100 to 100: 1, but does not include the condition of about 1: 1, which is the aforementioned non-polarized light. The relative intensity range of the preferred partial polarized light is from about 2: 1 to 30: 1 and about 1: 2 to 1: 3〇. As used herein, the term, polarization, 〃 is a measure of the relative strength between the two orthogonal principal axes of the partially polarized light. The degree of polarization can be related to a local state in the beam and / or an average state obtained by integrating a full beam. The terms, polarization ratio, and polarization degree used have the same meaning. Part of the polarized light used in the present invention is different from that discussed by Kobayashi and his companions, and the polarization state of the light in the present invention is not linear. Or elliptical polarization is defined. Using non-homogeneous light is more likely to generate partial O: \ 55 \ 5571I-920905.DOC -8-part polarized light than linear or elliptical polarization. This relationship # 非同 ΐ 周光光 的 Random Nature. # 同 调The source of light includes lamps, such as electric solitary lamps or other inflatable lamps commonly used in most exposure systems. Such non-homogeneous light sources are difficult to produce linear or elliptical polarization, and are more complicated when the exposure area is increased. The present invention utilizes parts Polarized light. Considering the ray angle and the scale covered by this light source, part of the polarized light is easier to produce with non-homogeneous light sources. Using a part of polarized light to arrange a substrate will increase the yield and more Effective use of optical radiation. Any device that produces unpolarized light in the wavelength range of 150 to 2000 nanometers is a source of optical radiation. Examples of suitable light sources include, but are not limited to, arc lamps, incandescent lamps, lasers, and inflatable lamps A preferred light source is a high-brightness linear inflatable lamp. Other preferred light sources include lamps based on inflatable lamps but excited by microwaves (eg, provided by Fusion UV Systems, Inc, Gaithersburg, MD). Microwave excitation provides Additional control of the spectral characteristics of lamps. Examples of some lamps (arc and microwave excitation) are mercury and excimer light bulbs (such as xenon chloride and cobalt). As used herein, the term, part of the collimation means light along At least one dimension has a divergence greater than about 5 degrees. The collimation of light may vary in different directions. A portion of the collimated light produced by a preferred optical system has a divergence greater than about 5 degrees and less than about 30 degrees in one dimension and an infinite system divergence along its orthogonal dimension. Partial collimation can be achieved by the configuration of a mirror, refractive optics (such as a lens) and holes, but it is not limited to the above method. The preferred part The device for collimating light radiation may be selected from the group of curved reflectors, holes, blades and refracting optics. A preferred collimator of the present invention is composed of at least one curved reflector and at least one hole. Another preferred collimator is a cylindrical elliptical mirror O: \ 55 \ 5571I-920905.DOC -9-580604 and at least one hole corresponding to the size of the linear light fixture. In this embodiment, a part of the elliptical mirror generates some rays with limited divergence, the divergence is less than 45 degrees, and it is further limited by at least one hole in a plane orthogonal to the cylindrical axis. Rays are unaffected in a plane parallel to the cylindrical axis. Another preferred alignment is a blade structure. 1. Blade structure means a device that partially collimates light. It acts like a hole, allowing light rays to propagate to the optical axis of the structure at an angle. An example of a three-dimensional one-dimensional leaf structure that may be collimated internally in one or two dimensions is an array of at least two flat absorption surfaces that are arranged so that the surfaces of the surfaces are parallel to each other and perpendicular to the desired optics axis. Rays at an angle to the optical axis may be partially absorbed by the blade. The maximum angle is determined by the spacing and length of the surface that constitutes the blade. An example of a one-dimensional blade structure is a honeycomb structure with a part of the absorbing surface. Rays propagating parallel to the length of the hive structure are transmitted and define the optical axis. Rays at an angle to the optical axis are absorbed. The maximum angle is determined by the size of the hive and the length of the hive that constitutes the blade. A one-dimensional blade is depicted in Figure 5 and further explained in Example 8. Collimation may vary from direction to direction. If the collimation of a light source is only controlled in one degree and accuracy, it may increase infinitely in other dimensions. For example, a linear luminaire may be better collimated in one dimension by a cylindrical optic. Orthogonal dimensions are not affected. Its length may then be increased to any desired width. When combined with linear scanning of the substrate, a very large area can be exposed uniformly. In multiple exposure systems, collimation may vary for some or all exposures. Part of the collimated light used in the present invention has not been considered in the past. Light source height

O: \ 55 \ 557ll-920905 DOC • 10- 580604 Collimation has been identified as the need to achieve good alignment in the light alignment layer. The present invention shows an example of a good homogeneous arrangement using a partially collimated light source. The combination of Shao Fen collimation and partial polarization results in a + light method that can illuminate a very large area. This is especially true when the delta exposure substrate is scanned under this exposure area. Scanning has the benefit of advancing steps that average the exposure in the direction of travel and produce a very homogeneous exposure. The other aspect of using some collimated light is related to the uniformity of exposure. Low collimation within the dimension perpendicular to the scanning direction produces more diffuse illumination along that dimension, minimizing irregularities in the uniformity of exposure due to defects in the optical components. This is particularly relevant for assemblies made up of multiple element arrays. For example, if used in collimated light, a thin film polarizer made up of a linear array of smaller polarizers that touch along the edge will have uneven exposure due to edge seams. Partially collimated light diffuses the image of the seam and causes more uniform illumination. -Shao Fen polarizer converts unpolarized light to partially polarized light, or converts polarized light to Shao Fang polarization ^. Examples of some polarizers include, but are not limited to, thin film polarizers, polarizing beam splitters, one or more light plates at a Brewster'S angle, an anisotropic absorption medium, a reflective surface, and a scattering medium. A -preferred part of the polarizer of the present invention is a thin-film polarizer that operates near its design angle. The polarization of rays reflected from a thin film polarizer is not as strong as that of transmitted rays. The degree of polarization of a beam incident at a non-design angle is less than the degree of polarization of a beam incident at a design angle. The sum of rays from an extended partially collimated light source is only partially polarized in reflection or transmission. For a given film polarizer design, the degree of polarization can be adjusted within a limited range by transforming the average incidence angle or the divergence of the incident ray. O: \ 55 \ 557ll-920905 DOC -11-580604 integer. Optical components that generate part of the polarized light radiation may be used alone or in combination to achieve the desired degree of polarization. In multiple exposure systems, some or all of the exposures may have different degrees of polarization. The inventors have found that the degree of polarization used in the method of the present invention can substantially affect the performance of the light alignment material. Therefore, one preferred optical system of the present invention includes a device for controlling the degree of polarization. As mentioned above, a device for controlling the degree of polarization is to adjust the angle of a thin film polarizer. Exposure geometry also affects the degree of polarization. For an exposure geometry at an oblique angle, the orientation of the polarizer determines the average degree of polarization. This can be summarized as follows. Consider a beam whose dimensions are reduced by a major axis and a minor axis, where the minor axis is in the plane of incidence of the oblique exposure angle. Different parts of the beam along the short axis will have different incidence angles with the polarizer, resulting in different degrees of polarization. The divergence of the light beam on the long axis causes the intensity of the oblique exposure angle to change along the short axis. As shown in Figures 6 and 7, the leading edge is more intense than the B part. The differences between two different angles for a given system, printed in Figures 6 and 7, will be explained in more detail in the examples. Subsequently, for a given angular size, one of the polarizer angles, the orientation of the polarizers produces two different average degrees of polarization for oblique exposure angles. Changes in the degree of polarization along the short axis of the beam will have important consequences for this exposure method. In the material of the light beam, the reaction of <Light Beginning (ρ1ι〇ί〇ίη ^^) may prefer that the light alignment material first enters the exposure beam, and is The highly polarized light beam is projected and then irradiated by the light beam with decreasing polarization. Therefore, polarization control will be an important issue for both partial and average exposure procedures. Another aspect of the present invention is to control the degree of polarization by the lateral position of the optical component in the plane of incidence of the polarizer. With this direction-shifting optics,

O: \ 55 \ 557II-920905DOC -12- 580604 The average cone of rays that can pass through an optical system. Distributing within this cone, the energy will change the effective angle of incidence on the polarizer, and then affect the partial and plane polarization ratios. Therefore, the control of the lateral position allows further control over the polarization of a given optical arrangement, and Can be used to optimize energy yield and polarization. Optical radiation incident on a substrate can have spectral content limited by a spectral filter. Examples of filters include, but are not limited to, two-layer thin-film dielectric reflectors, absorbing glass, absorption Dyes, prisms, gratings and Bragg reflectors. The filtering effect may be original or included on the light source as part of it. A preferred filter is a two-piece thin-film reflector on a transparent substrate. Another preferred filter is an absorptive glass. In addition, some of the optical radiation can be performed by other optical components in the system. For example, polarizing and reflective or transmissive optics usually reflect, transmit, And / or the absorption of light radiation 'depends on its spectral content. Therefore, if the other components mentioned above would originally filter out unwanted wavelengths, there may be no An additional filtering device is added to an optical exposure system. The optical system of the present invention transmits optical radiation at a specific angle perpendicular to the surface of the substrate. An example is exposing a substrate with radiation reflected from a thin film polarizer, where the The polarizer surface is at an oblique angle to the substrate surface. Another example is exposing a substrate with radiation reflected from a mirror, where the mirror surface is at an oblique angle to the substrate surface. A preferred angle of incidence is 45 degrees 10 A device that moves a substrate relative to light radiation can make the exposure area smaller than the size of the substrate. A full scan makes the substrate uniformly exposed. An example is a linear translation stage that supports the substrate and is relative to the optics formed by a linear lamp O: \ 55 \ 557II-920905 DOC -13- 580604 system, traveling at the speed of land hair first. The viewpoint of scanning the substrate is related to the uniform exposure. The uneven light illuminating along the scanning direction achieves uniform exposure. Accuracy averaging. As one aspect of the present invention allows partial collimation and partially polarized light, the above characteristics are not expected on the entire illuminated surface of the substrate Keep the same on the top. Scanning makes the above non-uniformity characteristics average along the scanning direction and achieves uniform exposure. Another advantage of this title is that it is compatible with continuous motion assembly lines. In order to produce large area exposure, a large area light source, polarizer , Collimating optics (such as lenses, curved mirrors) and optics that redirect light (such as planar mirrors). One aspect of the present invention is that smaller components can be combined into an array to form a large area component. For example For example, four smaller 3 inch X4 inch thin film polarizers are used to make a 1] inch x 4 inch large polarizing device. This can use a smaller component polarizer to expose a 2-inch substrate. The same can be applied to light sources, collimating optics, and optics to redirect light. For example, an optical exposure system that includes two or more linear lamps side-by-side along the long axis can be much wider than a single lamp The wide substrates are arranged optically. The divergence of light along the long axis provides a more even exposure, even if there is a gap between the lamps. Linear arrays of reflectors, polarizers, and filters with appropriate openings> can be arranged in proportion to match the length of the entire luminaire assembly. Some embodiments of the invention require two or more exposures to be performed to produce alignment and pretilt. This is necessary, for example, in a case where the polarization ratio of a single exposure system is insufficient. In this case, the optical system is constructed with a multiple optical exposure system to produce alignment and pretilt. For example, the substrate coated with the light alignment material is first incident with a partially polarized and partially collimated light at approximately a right angle O: \ 55 \ 5571l-920905.DOC -14- 580604 to generate the alignment direction. A subsequent exposure is partially collimated and partially polarized light is incident at an oblique angle to produce a pretilt. For example, two or more optical exposure systems can be arranged along the path of a linear translation mechanism. Each exposure system can be individually adjusted to provide the type of exposure required for a complete exposure process. Similarly, multiple optical exposure systems can be arranged to increase throughput, such as on an assembly line. The combination of the optical exposure system along the long lamp axis and along the scanning direction can provide a higher ratio of light alignment required for large substrates in production. It is necessary to make the polarization state of the exposure system and / or the optical energy of the exposure system different, and / or the substrate to rotate the incident light radiation for each subsequent exposure. In this case, the exposures are performed in parallel by overlapping the outputs of different optical exposure systems, or in batches performed sequentially in time and / or space. A preferred embodiment utilizes a common transport mechanism 'for all optical exposure systems to translate the substrate under the multiple outputs of the optical exposure system. The ability to rotate the substrate in any direction is used to change the polarization orientation and / or light radiation propagation direction relative to the substrate. A preferred direction of rotation is around an axis (polar direction) in the plane of the substrate. Another preferred direction of rotation is around the vertical direction (azimuth direction) of the substrate. Another preferred direction of rotation is a combination of a polar direction and a ten-degree angle direction. This method is beneficial for alignment and pre-tilt when multiple exposures are required. A preferred optical exposure for arranging a substrate with partially polarized and partially collimated light is at least one light source with a long axis; a device for partially collimating and polarizing the light radiation Including: a cylindrical elliptical mirror with a long axis is provided, which is parallel to the long axis of the light source and has a distance of O: \ 55 \ 557ll.920905 -15- 580604 to focus light radiation to a focal point; a first hole , Which has a long axis and a surface facing and away from the light source, is located at the focal point and is arranged along the long axis of the light source; a thin film polarizer, which has a surface facing and away from the light source and a specific design angle, faces away from the light source along the first hole The surface is arranged at an angle corresponding to the specific design angle, in which the thin film polarizer generates a reflected ray and a transmitted ray; a second hole having a long axis and a surface facing and away from the light source, and away from the light source along the film polarization direction It is arranged along the long axis of the first hole and is parallel to the first hole. A filter device that partially filters the light radiation has a side facing and away from the light source, and a side facing away from the light source along the second hole. And The parallel; one kind of the substrate with respect to the transfer of part of the translation stage and partly polarized light collimation means, which has a surface facing the light source, for supporting the substrate, the surface light source from its back and in parallel along the configuration of the filter. This system is depicted in Figure 1 and detailed in the example. Another preferred optical exposure system includes a reflector with a reflective surface facing the light source, located between the second hole and the filter, and its position can reflect the transmitted rays of the thin film polarizer onto the filter, so that the transmitted rays Form an incident angle with the substrate. This system is depicted in Figure 3 and detailed in the example. Another preferred optical exposure system includes an arrangement of optical components such that transmitted rays impinge on the substrate at an angle. This angle can be adjusted to about 0 to 89 degrees. Another preferred optical exposure system includes an optical arrangement such that the angle of the polarizer controls the degree of polarization. Another preferred embodiment of the present invention includes selecting a polarizer orientation to control the degree of polarization. Another preferred optical exposure system includes a configuration such that the lateral position of the optical element in the plane of the polarizer incident O: \ 55 \ 557II-920905.DOC -16- 580604 controls the degree of polarization. Another preferred 1 exposure system includes at least one thin film polarizer for transmission operation, but: vibration = vertical rotation of the beam axis' as shown in the figure. This system of a device array is shown in Figure 8A # B, and It can be used for exposing the substrate during the vibration step, similar to the system shown in Figure 丨 4 light another-The preferred optical exposure system is one in which the device used to generate partially collimated and partially polarized light includes-polarizer array, including Rectangular support frame: An array with two or more absorption plates spaced evenly and mounted perpendicularly to the support frame 2 and parallel to the width of the support frame 'One or two thin film polarizers are interposed between the absorption plates and absorbed at an angle An array of spaces between the top and bottom of the plate, and the spacing between the absorbing plates in the diaphragm makes the installed film polarizer at about the design angle. A polarizer array is depicted in Figure 8b. A best optical exposure system includes The optical module shown in Figures B and B is provided with a light source with a long axis and a cylindrical reflector parallel to the long axis of the light source. The optical module provides part of the collimation and part of the polarized light radiation Outfit Part of the device for filtering the optical radiation and the device for adjusting the degree of polarization. The optical module can be a rectangular shell, including a movable plate 3 at the top. An elongated shape is provided at the center of the plate and parallel to the length of the shell. Holes, a bottom movable plate 5 is provided with an elongated hole about the center of the plate and parallel to the length of the shell, a front plate 17 is provided with one or more transverse holes 19, a pivot on the periphery of the plate Axial hole 20 deviates from the central position in the upper quadrant of the plate and an arc-shaped hole 2 1 deviates from the central position in the opposite lower quadrant of the plate defined by a line pivoting to the pivot hole, a rear plate 1 8 There is a pivot hole and an arc hole corresponding to the front plate. The side plate (not shown) can connect the front plate O: \ 55 \ 557II-920905.DOC -17- 580604 and the rear plate. It is located in the The rectangular outer center is the installed optical element cut out by the figure, including the-pivot pin 24 is supported by the pivot holes in the front plate and the rear plate, and a rectangular open frame 22 is attached to the pivot pin. —The pivot pin ^ is connected to the rectangular open frame at the opposite end of the pivot pin and fixed in the pie-shaped hole, and one or more thin film polarizers 4 are installed In this rectangular open frame, one or more filter plates 16 are installed substantially parallel to the bottom orifice plate and cover the holes; wherein the position of the sacral hole is such that the film polarizer is located in the middle and travel hole of the top orifice plate Located approximately in the center of the film polarizer at a specific design angle, where the solitary hole can be used to adjust the angle of the film polarizer and the lateral hole can be used to adjust the position of the long shell relative to the source of optical radiation. The orientation can be changed by reversing the orientation of the front plate and the rear plate. The optical module provides the device of the degree of polarization as described earlier: the pivot and arc hole and pin for adjusting the angle of the polarizer; the pivot and arc The positions of the holes on the front plate and the rear plate are used to adjust the polarizers. # • 正 尔 Position Aiwan, and the lateral holes adjust the optical components relative to the beam by using the holes to attach an optical module to the light source. Horizontal and vertical position. Another embodiment is a method for arranging a light aligning layer, which comprises exposing a light-emitting aligning layer to a portion of polarized light, wherein a portion of the polarized light is absorbed by the aligning layer and the aligning layer has anisotropic dielectric characteristics after exposure. A better method is to partially collimate the polarized light. Also preferred is a method in which the degree of polarization can be adjusted. -Another embodiment is a method for generating an alignment of a liquid crystal medium adjacent to the surface of a light alignment layer, which includes exposing a light-emitting layer to a portion of polarized light. 'The polarized light is absorbed by the alignment layer and the liquid crystal medium is applied. Yu Guangpai

O: \ 55 \ 557ll-920905 DOC -18- 580604 column layer, where the alignment layer after exposure exposes the liquid crystal alignment. -Partially polarized light in the preferred method is also partially collimated. Another-the preferred method, part of the polarization and part of the collimated light has an adjusted degree of polarization. Other preferred embodiments include a step in which the liquid is heated to exceed the isotropic point of the liquid crystal medium upon contact with the light alignment layer and cooled below its isotropic point. Another preferred method includes a step 'wherein the post-exposure alignment layer is heated and quenched before contacting the liquid crystal medium. Other preferred methods include: the exposure of the light alignment layer to a portion of the polarized light is oblique incidence and the exposed alignment layer induces a pretilt angle of the liquid crystal medium relative to the surface of the light alignment layer. Other preferred methods include exposing a light array layer, including two exposures to the polarized light of Shao Fen, in which a pair of light alignment layers have a relative relative rotation angle of greater than 0 degrees but less than 360 degrees between the two exposures. The above method is illustrated in the following examples. A photosensitive polyimide, PptAlignTM M-2000 (Elsicon Incorporated, Wilmington, DE 19810) was used in the examples. Example 1 This example illustrates an optical exposure system of the present invention, which uses a portion of polarized light to arrange a liquid crystal with a pretilt in a single exposure light. The optical exposure system is shown in FIG. 1. The source of the light radiation is an ultraviolet light, a 10-inch linear inflatable lamp excited by a microwave source (product of Fusion UV Systems, Inc., Gaithersburg, MD). The light radiation is collected by a cylindrical elliptical mirror 2. A 1.5 inch X10 inch first hole 3 position is close to the focus of the lamp. A 4-inch X12-inch film polarizer 4 is located behind the hole at its design angle (68 degrees). The polarizer consists of four 4-inch X 3-inch film polarizers (CVI, Albuquerque, New Mexico). First line O: \ 55 \ 557ll-92O905.DOC -19- Chen array. The rays reflected from the polarizer pass through a 1.5-inch X8-inch second hole 5 behind the polarizer. The cylindrical collimator and the two holes produce the collimated light in a dimension along the scanning direction, with a divergence of about ig to 15 degrees. 45 degrees) slightly affected. An absorbent glass plate 6 blocks transmission of radiation having a wavelength of less than 270 nm. The substrate (on which the light alignment layer is coated) 7 is a linear translation stage 13 (eight howls) along the axis perpendicular to the long axis of the lamp

Pittsburgh, PA) constant speed scanning. The light passing through the second hole nominally enters the base &amp; at a material angle. The polarization ratio measured for the polarized light parallel to the scanning direction and the polarized light perpendicular to the scanning direction after integrating all the holes parallel to the scanning direction is nominally 1: 2. By using the above optical exposure system, a substrate having a photosensitive polyimide is exposed to a total energy density of about 100 Joules / cm 2. The scanning rate and lamp power are selected to give the required energy density, to fully expose the light alignment material on the substrate and to promote the alignment of liquid crystals in contact with the alignment material. After the exposure, the substrate is assembled into a unit in an orthogonal orientation of the optically generated alignment direction. The cell thickness is approximately 4 microns. The cell then fills the nematic liquid crystal by capillary action. As expected, it was observed that the liquid crystals were aligned in a twisted nematic orientation with pretilt. After the liquid crystal cell is heated beyond the isotropic point of the liquid crystal (heated at 95 ° C for 30 minutes), it can be observed that the alignment uniformity is improved. The pretilt can be confirmed by the liquid crystal rotation method advocated by Bauer et al. Example 2 O: \ 55 \ 557l 1-920905 DOC -20- This example illustrates an optical exposure system using partially polarized light to generate a light array without pre-tilt. The optical exposure system of this example is shown in FIG. 2. The lamp system includes a linear inflatable lamp 1 and a cylindrical elliptical mirror 2 of Example 1. The lamp system is combined with a 5-inch x 10-inch first hole 3 near the focal point of the lamp. The thin film polarizer 4 of Example 1 is behind its design angle (68 degrees). The ray transmitted through the polarizer passes through a 15-inch X 8-inch second hole 5 located behind the polarizer. Part of the collimated light generated by the cylindrical reflector and the two holes has a divergence of about 10 to 15 degrees in the dimension along the scanning direction, and has a slight effect on the divergence of the lamp in the vertical direction of the scanning direction ( (About 30 to 45 degrees). An absorptive glass plate 6 blocks transmission of wavelengths less than 270 nm &lt; radiation. The substrate 7 provided with a photosensitive polyimide alignment layer is swept by a linear translation stage 13 at a certain speed along an axis perpendicular to the long axis of the lamp. The light passing through the second hole is incident nominally perpendicular to the substrate. The polarization ratio of the light polarized parallel to the scanning direction to the light polarized perpendicular to the scanning direction was measured after passing the whole Shao hole parallel to the scanning direction as a whole. Using the above-mentioned optical exposure system, a substrate having a photosensitive polyfluorene imine is exposed to a total energy density of Xiao Xiao Joules / cm 2. The scanning rate and the power of the lamp are selected to reach the required energy density to fully expose the light alignment material on the substrate, and to promote the alignment of the liquid crystals in contact with the alignment material. The thickness of the unit element is about 44 microns. The I element then fills the nematic liquid crystal by capillary action. _ As expected, the LCD is observed with a twisted pretilt

O: \ 55 \ 557II-920905 DOC -21-column orientation. After heating the liquid crystal cell beyond the isotropic point of the liquid crystal (heating at 95 ° C for 30 minutes), an improvement in the uniformity of the alignment was observed. As expected, the liquid crystals are aligned in a nematic orientation with no pretilt. Example 3 This example illustrates the combination of an optical exposure system of Example 2 with a photon exposure system of FIG. 3 to expose under an oblique incidence. This double exposure method is used to align liquid crystals with pre-tilt, and illustrates the polarization effect of a mirror to increase the polarization ratio. The substrate 7 provided with a photosensitive polyfluorene imine alignment layer is first exposed by a system described in detail in Example 2. Then, the substrate is rotated 90 degrees in the vertical direction with respect to the plane of the substrate provided with a mechanical platform 15. The substrate is then exposed a second time by the optical exposure system shown in FIG. The luminaire system (1 and 2) of Example 1 is combined with a 1.5 inch X 10 inch first hole 3 located close to the focus of the luminaire. Part of the collimated light generated by the cylindrical reflector and the two holes has a divergence of about 10 to 15 degrees in the dimension along the scanning direction, and has a slight effect on the divergence of the lamp in the vertical direction of the scanning direction (about 30 to 45 degrees). The polarization benefit 4 of Example 1 is located behind the hole with its design angle (68 degrees). The rays transmitted through the polarizer pass through one of the polarizers 1 · 5 inches X § Yingye second hole 5. A reflector 8 (Fusion Systems, Gaithersburg, MD) including an aluminum substrate coated with an aluminum layer is placed behind the second hole at an angle of 68 degrees. The reflection ^ also acts to increase the polarization ratio of light light emission to about 11: 1 at this angle. The base plate 7 is swept at a certain speed along an axis perpendicular to the long axis of the lamp by a linear translation stage 1 3. The light reflected from the mirror 8 is nominally incident on the coated substrate at 44 degrees. O: \ 55 \ 55711-920905 D0C -22- 580604 Using the above-mentioned optical exposure system, a substrate having a photosensitive polyimide is exposed to a total energy density of about 100 Joules per square centimeter. The relative exposure energy ratio between the first and second exposures is 4: 1. The scanning rate and the power of the lamp are selected to achieve the desired energy density, to fully expose the light alignment material on the substrate, and to promote the alignment of liquid crystals in contact with the alignment material. After exposure, the substrates are assembled into units in mutually perpendicular orientations in the optically generated alignment directions. The cell thickness is approximately 4 microns. The cell then fills the nematic liquid crystal by capillary action. The liquid crystals were observed to be aligned in a twisted pre-tilted nematic orientation as expected. After heating the liquid crystal cell beyond the isotropic point of the liquid crystal (heating at 95 ° C for 30 minutes), an improvement in the uniformity of the alignment was observed. This pretilt was confirmed by the crystal rotation method. Example 4 This example shows how to combine the optical exposure system of Example 2 and the optical exposure system of Example 3 to arrange the liquid crystals with pretilt by light. Example 2 was repeated, but the first exposure was performed using the optical exposure system of FIG. 3 and the first exposure was performed using the optical exposure system of FIG. 2. The relative ratio of the exposure energy between the first and second exposures is 4: 4. After the exposure, the substrates are assembled into units in a mutually perpendicular orientation in the optically generated alignment direction. The cell thickness is approximately 4 microns. The cell then fills the nematic liquid crystal by capillary action. The liquid crystals were observed to be aligned in a twisted pre-tilted nematic as expected. After heating the liquid crystal cell beyond the isotropic point of the liquid crystal (95.0 heating for 30 minutes), an improvement in the uniformity of the alignment was observed. This pretilt was confirmed by the crystal rotation method. Example 5 O: \ 55 \ 5571I-920905.DOC -23- 580604 This example illustrates an optical system 'that uses two oblique incident exposures to produce a pre-tilted light arrangement. The substrate 7 provided with a photosensitive polyimide alignment layer is first exposed by a system described in Fig. 3 &lt; The substrate is then rotated by 90 degrees with respect to the substrate plane provided with the mechanical platform 15 in the vertical direction. The substrate is then subjected to a second exposure in the same system. The total exposure energy density is about 100 Joules / cm 2. The relative exposure energy ratio between the first and second exposures is 4: 丨. After the exposure, the substrates are assembled into units in mutually perpendicular orientations in the optically generated alignment directions. The cell thickness is approximately 4 microns. The cell then fills the nematic liquid crystal by capillary action. The liquid crystals were observed to be aligned in a twisted pre-tilted nematic orientation as expected. After the liquid crystal cell is heated beyond the isotropic point of the liquid crystal (heated at 95 ° C for 30 minutes), the uniformity of the observation is improved. This pretilt was confirmed by the crystal rotation method. Example 6 This example illustrates an optical system that uses two oblique incidence exposures to produce a pre-tilted light array. The substrate 7 provided with a photosensitive polyimide alignment layer is first exposed by the system described in Fig. 3. Then, the substrate is rotated 90 degrees in a vertical direction with respect to a substrate plane provided with a mechanical platform 15. The substrate is then subjected to a second exposure in the same system. Brother Yi ’The relative ratio of exposure energies between Ruyi and Brother · One exposure is 1: 4. The total double exposure energy density is approximately 100 Joules per square centimeter. After the exposure, the substrate is assembled into a unit in a vertical orientation in which the alignment direction is optically generated. The cell thickness is approximately 4 microns. The cell then fills the nematic liquid crystal by capillary action. The liquid crystals were observed to be aligned in a twisted pre-tilted nematic orientation as expected. After heating the O: \ 55 \ 557ll-920905 DOC -24- 580604 liquid crystal cell beyond the isotropic point of the liquid crystal (heating at 95 ° C for 30 minutes), the uniformity of the observation is improved. This pretilt was confirmed by the crystal rotation method. Example 7 This example illustrates that the optical exposure device of the present invention can be used to change the dielectric characteristics of the light alignment layer after exposure. The optical exposure system of this example is shown in FIG. 4. The lamp system (1 and 2) of Example 1 is combined with a 2 inch x 2 inch first hole 9 near the focal point of the lamp. Immediately following the hole 9, there are two 2 inch X 2 inch plano-convex fused silica cylindrical lenses 10 (Newport Optics, Irvenc, CA) in contact with each other to produce a linear focal length of 80 μm. The linear focal length of the lens is parallel to the linear axis of the inflatable lamp. It is followed by a single 4-inch X3-inch film polarizer u (c VI, AlbiiquerqUe, NM) at its design angle of 68 degrees. A inch inch x 3 inch hole 12 is placed behind the polarizer. The hole 9, the cylindrical lens 10, and the hole 12 are used to collect the light radiation and align the light radiation part until the divergence in the direction parallel to the scanning direction is about 10 degrees. The substrate 7 provided with a photosensitive polyimide alignment layer is exposed by this system. A total exposure energy density of about 100 Joules / cm 2 was used. The scanning rate and the power of the lamp are selected to achieve the desired energy density, to fully expose the light alignment material on the substrate, and to promote the alignment of liquid crystals in contact with the alignment material. The optical measurement method for anisotropic dielectric properties uses a standard birefringence measurement system based on a photoelastic modulator (PEM-90, Huids Instruments, HiUsboro, 0R), according to the method outlined by Kemp (p〇larized O: \ 55 \ 557II-920905 D〇c -25-580604

Light and its interaction with Modulating Devices, Hinds International, Inc., 1987). The measured optical birefringence is about 1 X 10.2. Example 8 This example illustrates a blade structure for controlling the internal collimation of an optical system to expose a substrate to light. An optical exposure system of the present example is shown in FIG. 5 from a front view, where the substrate is translated toward the outside of the page. This system includes the optical exposure system of FIG. 2 and a blade interposed between the cylindrical reflector 2 and the first hole 3. A blade composed of a vertical baffle 14 is placed to block light with an angle perpendicular to the scanning direction and greater than 10 degrees in the vertical direction. This limits the divergence of light perpendicular to the scanning direction to 20 degrees. This example illustrates an optical exposure system 'having an oblique orientation to the sample plane, which produces a smaller average polarization ratio.

An exposure system is constructed as shown in Fig. 6 to form an oblique orientation (44 degrees) with respect to the substrate surface to be scanned. Includes—a linear gas-filled lamp example of a cylindrical elliptical reflector, a lamp system combined with a first 3, -thin film polarizer 4 and a second hole 5 of the second example ... a transparent quartz plate and a two-color diaphragm reflector 16 Between the polarizer 4 and the second hole 5, the reflected wave is less than 275 nanometers and transmits a wavelength greater than 275 nanometers. The optical axis is approximately 44 degrees from the substrate surface. The polarization ratio is not uniform.

O: \ 55 \ 557II-920905.DOC -26- 580604 The polarization ratio is determined by the energy accumulated within one minute of the measurement. The measurement method uses a UV-enhanced plastic sheet polarizer equipped with a rejection ratio better than 1000: 1. (Polaroid HNP'B, Boston, MA)

Supply Inc., Chicago, IL). For vertical polarization between two exposures, the plastic sheet polarizer is rotated 90 degrees to determine the polarization ratio of the beam. The polarization ratio of the edge of the beam at the a position is 7.8: 1. The energy of the beam at position A is 600 Ajoules. The polarization ratio of the beam at the edge of the B position is 4.2: 1. The energy of the beam at position b is 892 millijoules. For the orientation of the optical axis and the polarizer in this example, 'low polarization degree and higher polarization degree have a higher energy. When the energy meter scans across the full beam width, the average polarization is & 2: 1. Example 10 This example illustrates an optical exposure system with an oblique orientation to the sample plane, which produces a higher average polarization ratio. An exposure system similar to that of Example 9 is constructed to tilt the plane of the substrate scanned as shown in Fig. 7 at an oblique orientation (44 degrees). In this example, the polarizer is in a position opposite to that of Example 9. The lateral positions of the first hole 3, the polarizer 4, the second hole 5, and the dichroic filter 6 are shifted to the left and down by about 1/4 inch to increase the average polarization degree. This view is further illustrated in Example XI. The polarization ratio of the light beam is inconsistent in a direction spanning a scanning direction, and is measured as in Example 9. The polarization ratio of the beam at the edge of the A position is 16: 1. The energy of the beam at the A position is 79 millijoules. The polarization ratio of the beam at the edge of position b is 12: 1. The energy of the light beam at the B position is 405 millijoules. For the orientation of the optical axis and the polarizer in this example, high polarization and low polarization have a higher energy. When the energy meter scans O: \ 55 \ 55711-920905.DOC -27 · 580604 across the full beam width, the average polarization is 14: 1. An optical transmission analysis shows that this example provides similar exposure conditions as in Example 3. Consideration of exposure geometry and polarizer orientation as previously described provides an explanation of the increase in polarization ratios observed between Examples 2 and 3. Example 11 This example illustrates an optical exposure system of Example 9, showing how to control the polarization ratio using a horizontal arrangement. An exposure system similar to that of Example 9 is constructed to tilt the plane of the substrate scanned as shown in Fig. 6 at an oblique orientation (44 degrees). The first hole 3, the thin film polarizer 4, the second hole 5, and the thin film dichroic reflector 16 are offset along one axis perpendicular to the long axis of the lamp. When the T-meter can scan across the full width of the beam, a pair of upper right offsets of about 0.25 inches offsets a polarization ratio of 5.4: 1. When the energy meter scans across the full width of the beam, a pair of offsets of about 0.5 inches at the bottom left cause a polarization ratio of 7.4: 1. Example 12 This example illustrates an optical exposure system similar to Example 1 that can produce a pre-tilted light array but operates in transmission. An exposure system is constructed to tilt the plane of the scanned substrate as shown in Fig. 8A at an oblique orientation (44 degrees). A lamp system including a linear inflatable lamp of Example 1 and a cylindrical elliptical mirror is combined with a first hole 3, a thin film polarizer array 28, and a second hole 5 of Example 2. A transparent quartz plate and a two-layer thin film reflector 16 are interposed between the polarizer array 28 and the second hole 5, and reflect rays with a wavelength less than about 275 nm and transmit wavelengths greater than about 275 O: \ 55 \ 55711-920905.DOC -28-Hair micron &lt; ray. The complete assembly of the optical component is constructed such that its optical axis makes an angle of about 44 degrees with respect to the plane of the substrate. The thin film polarizer array 28 is constituted by a -p train of the individual thin film polarizers 4 which have an angle of 68 degrees to the light beam as shown in Fig. 8B. Each polarizer 4 is rotated by 90 degrees with respect to the beam axis in comparison with FIG. Each polarizer 4 is separated by a vertical baffle 14 for blocking the reflected light for each polarization benefit. When the energy meter is scanned across the full beam width, the average polarization is 1: 2.5. Example 13 This example illustrates an optical exposure system with a lower degree of polarization, which uses two oblique incidence exposures to produce a pre-tilted light array. The substrate 7 provided with a photosensitive polyfluorene imine alignment layer is first exposed by a system similar to that shown in FIG. Then, the substrate is rotated 90 degrees in a vertical direction with respect to a substrate plane provided with a mechanical platform 15. The substrate is then exposed for the second time using the same optical exposure system. The luminaire system (1 and 2) of Example 1 is combined with a 1.5-inch X 100-inch first hole 3 located near the focal point of the luminaire. Part of the collimated light generated by the cylindrical reflector and the two holes has a divergence of about 10 $ to 15 degrees in the dimension along the scanning direction, and the divergence of the lamp in the direction perpendicular to the scanning direction (about 30 Up to 45 degrees). The film polarizer 4 is located behind the hole with its design angle (68 degrees). The rays transmitted through the polarizer pass through the second hole 5 which is one behind the polarizer, 1.5 inches X 8 inches. The measured polarization ratio was approximately 6: 1. The base plate 7 is swept at a certain speed along one axis of the long axis of the vertical acoustic horn by a linear translation stage 13. Light was incident on the coated substrate at nominally 44 degrees. Using the above-mentioned optical exposure system, a substrate having a photosensitive polyimide O: \ 55 \ 55711-920905 DOC -29- 580604 is exposed at a total energy density of -about 100 Joules per square centimeter. The relative ratio of exposure energy between the first and first exposures is 4: 1. The scanning rate and lamp power are selected to give the required energy density, to fully expose the light alignment material on the substrate and to promote the alignment of liquid crystals in contact with the alignment material. After exposure, the substrates are assembled into units in mutually perpendicular orientations in the optically generated alignment directions. The cell thickness is approximately 44 microns. The cell then fills the nematic liquid crystal by capillary action. The liquid crystals were observed to be aligned in a twisted pre-tilted nematic orientation as expected. After the liquid crystal cell was heated beyond the isotropic point of the liquid crystal (% ° c for 30 minutes), an improvement in the uniformity of the alignment was observed. Confirm the pre-tilt using the _ crystal rotation method. Example Fourteen This example illustrates an optical exposure system with a higher degree of polarization that uses two oblique incident exposures to enhance uniformity to produce a pre-tilted light array. A substrate provided with a photosensitive polyimide alignment layer is first exposed by a system similar to that shown in FIG. The substrate is then rotated 90 degrees in the vertical direction with respect to the substrate plane provided with a mechanical platform 15. The substrate is then subjected to the second * exposure using the same optical exposure system. The lamp system (1 and 2) of Example 1 is combined with a 1.5 inch X 10 inch first hole 3 located near the focal point of the lamp. The collimated light produced by the cylindrical reflector and the two holes has a divergence of about 10 to 15 degrees in the dimension along the scanning direction, and the divergence of the lamp in the direction perpendicular to the scanning direction (about 30 to 45 degrees) slightly affected. The thin film polarizer 4 of Example 1 is located behind the hole with its design angle (68 degrees). The ray transmitted through the polarizer passes through a second hole of 1.5 inches x 8 inches located behind the polarizer. O: \ 55 \ 557l 1-920905 DOC -30- 580604 The polarization ratio is approximately 9.5: 1. The substrate 7 is swept by a linear translation stage 13 at a certain speed along an axis perpendicular to the long axis of the lamp. Light was incident on the coated substrate at nominally 44 degrees. Using the above-mentioned optical exposure system, a substrate having a photosensitive polyimide is exposed to a total energy density of about 100 Joules / cm 2. The relative exposure energy ratio between the first and second exposures is 4: 丨. The scanning rate and lamp power are selected to give the required energy density, to fully expose the light alignment material on the substrate and to promote the alignment of liquid crystals in contact with the alignment material. After exposure, the substrates were assembled into a single 7C in a mutually perpendicular orientation with the optically generated alignment directions. Single 7C thickness is about 4 microns. The cell then fills the nematic liquid crystal by capillary action. The liquid crystals were observed to be aligned in a twisted pre-tilted nematic orientation as expected. After the liquid crystal cell was heated beyond the isotropic point of the liquid crystal (% ° C for 30 minutes), an improvement in the uniformity of the alignment was observed. The quality of the arrangement is improved compared to Example 13. This pretilt was confirmed by the crystal rotation method. Example 15 This example illustrates a method of heating a substrate made of a light aligning material after exposure but before forming a liquid crystal test cell. A substrate provided with a photosensitive polyimide alignment layer is first exposed by the system shown in FIG. 10. Then, the substrate is rotated 90 degrees in the vertical direction with respect to the substrate plane on which the mechanical platform 15 is provided. The substrate is then subjected to a second exposure using the same optical exposure system. # 例 一 的 灯 系 ， 系 (i * 2) is combined with a position 1.5 which is close to the focal point of the lamp, and the first hole 3 is 10 inches. Part of the collimated light produced by the cylindrical reflector and the two holes has a divergence of about 10 to O: \ 55 \ 557 Π-920905.DOC -31-580604 15 degrees in the dimension along the scanning direction, and it is The degree of divergence in the direction perpendicular to the scanning direction (about 30 to 45 degrees) is slightly affected. The thin film polarizer 4 of Example 1 is located behind the hole with its design angle (68 degrees). The ray transmitted through the polarizer passes through a second hole 5 of 1.5 inches X 8 inches located behind the polarizer. The substrate 7 is swept at a certain speed along an axis perpendicular to the long axis of the lamp by a linear translation stage 1 3. Light is incident on the coated substrate at nominally 44 degrees. Using the optical exposure system described above, a substrate having a photosensitive polyimide is exposed to a total energy density of about 1000 Joules / cm 2. The relative exposure energy ratio between the first and first 'person exposure is 4: 1. The scanning rate and lamp power are selected to give the required energy density, to fully expose the light alignment material on the substrate and to promote the alignment of liquid crystals in contact with the alignment material. After exposure, the substrate is heated to 18 ° C for two hours and then allowed to cool. After heating and cooling, the substrate is assembled into a unit in an optically perpendicular direction to the arrangement direction. The unit thickness is about 4 microns. The unit is then made of capillary

It was found that the row-like µ property and the rotation maintenance ratio were improved when compared with the unit prepared in Example 14. Example sixteen

In 9A and B, a supporting structure 29, an optical exposure system with adjustable exposure angle. Group 26, an optical cover 27 is shown in Fig. 29 'A wheel shaft 30, _positioner pin 31, O: \ 55 \ 5571l-920905 DOC -32-580604 The light module module 26 accommodates an example and a positioner rear plate 3 2 As shown in Fig. 10, a cylindrical lamp 1 and a reflector 2 are provided. ~ Optical housing accommodating-the optical module in Figure 9 The optical housing is firmly attached to the luminaire module. The optical module is attached to the optical housing by bolts passing through the transverse holes 19 in the optical module. This allows the lateral positioning of the optical module to control the degree of polarization. The optical module is positioned at about ι / 4 inches in the lower right as shown in Figure 10 to increase the degree of polarization. The orientation of the polarizer shown in FIG. 9 is used to generate a higher degree of polarization under oblique incidence in the exposure system shown in FIG. 10. The support structure 29, the wheel axle 30, the locator pin 31, and the locator back plate 32 provide means for controlling the exposure angle. The lamp module is mounted on the supporting structure by a screw mechanism that provides height adjustment. The support structure 29 rotates the axle, and the function of the positioner pin 31 and the positioner rear plate 32 is to lock the support structure at different exposure angles. When the support structure is positioned for vertical human shooting, the polarization ratio of the average exposure beam across the full beam is about 6: When the support structure is positioned for 44-degree oblique incidence, the average exposure beam crosses the entire beam. The polarization ratio is approximately 9.5: 1. When the support structure is positioned for a 55-degree oblique incidence, the average polarization ratio of the optical exposure system across the full beam is approximately 12.5: 1. This example shows that part of the degree of polarization in the beam affects the average degree of polarization and depends on the exposure angle; and further supports the orientation of the polarizer that has an average polarization degree of the oblique exposure angle. The above examples and the foregoing descriptions are illustrative of the present invention. It should be understood that other options may be conceived for those skilled in the art. The invention encompasses all such other options within the scope of the invention.

O: \ 55 \ 557I1-920905 DOC -33- 580604 [Brief description of the diagram] Figure 1. There will be an optical exposure system, which is equipped with Shaofen collimation and partial deflection. Figure 2 depicts a side view of an optical system for exposing a substrate with approximately forward incidence. Figure 3 depicts a side view of an optical system for exposing a substrate with oblique incidence. Figure 4 depicts a side view of an optical system that uses refractive optics to expose a substrate at approximately forward incidence. _ Figure 5 depicts a front view of an optical system using a blade structure to control partial collimation. Fig. 6 depicts a side view of an optical system having optical components at an angle that is used for oblique incidence exposure with a lower degree of polarization. Fig. 7 depicts a side view of an optical system having optical components at an angle that is used to expose at an oblique incidence with a higher degree of polarization. Figure 8 (A) depicts a side view of an optical system with optical components at an angle that is used for oblique incidence with a single exposure, (B) depicts a front view of the polarizer for clarity Show its structure. Fig. 9 (A) depicts an external case of an elongated housing used in an optical module of the present invention, and (B) depicts an optical element mounted in the optical module. Fig. 10 shows an optical exposure system equipped with a device for changing the exposure angle of incidence. [Schematic representation of symbols]

O: \ 55 \ 557 Π-920905 DOC -34- 580604 1 10-inch linear gas lamp 2 Round elliptical reflector 3 First 孑 L 4, 11 Thin film polarizer 5 Second hole 6 Absorptive glass disc 7 Substrate 8 Mirrors 9, 12 holes 10 Cylindrical lens 13 Linear translation stage 14 Vertical baffle plate 15 Mechanical platform 16 Divided thin film reflector 17 Front plate 18 Rear plate 19 Transverse hole 20 Pivot hole 21 Arc hole 22 Rectangular open frame 24 Pivot Pin 25 Arc pin 26 Luminaire module 27 Optical cover O: \ 55 \ 55711-920905.DOC -35- 580604 28 Thin film polarizer array 29 Support structure 30 Axle 31 Positioner pin 32 Positioner rear plate O: \ 55 \ 55711-920905 DOC -36-

Claims (1)

Brother No. 087118266 patent application Chinese patent application scope replacement version (September 1992) Including: P y: 'An optical exposure system that radiates a substrate, including at least one optical radiation source; a device for partially polarizing the optical radiation; a device for partially collimating the optical radiation; A device for transmitting the substrate with partially polarized and partially collimated light radiation, wherein the M light radiation source has a long axis or spherical geometry, and the device for partially polarizing the light radiation includes: a polarizer having A specific design angle faces and faces away from the light radiation source, wherein the polarizer generates a reflected ray and a transmitted ray; the device for partially collimating the light radiation includes: a curved reflector located away from the light radiation source At a specified distance; a first hole having a face facing and away from the light radiation source; a second hole having a face facing and away from the light radiation source, which is arranged along the surface of the polarizer facing away from the light radiation source; The device for transmitting the substrate with respect to the partially polarized and partially collimated optical radiation has a surface facing the optical radiation source for supporting the substrate, and is arranged along the second hole away from the surface of the optical radiation source. 2. The optical exposure system according to item 1 of the scope of patent application, which further includes a device for partially filtering the light. 3. The optical exposure system according to item 1 of the patent application scope, further comprising a device for adjusting a part of the polarization O: \ 55 \ 55711-920925.DOC b5l, ut * ri ^ degree &lt;. For example, Shen Qiao's patent scope No. 2 "optical exposure system, which further includes a device for adjusting the degree of polarization. 5. The optical exposure system according to item 2 of the patent, in which: The polarizer is-the thin m-reduction m-hole is disposed away from the light radiation source surface and forms an angle corresponding to a specific design angle; The curved reflector is a cylindrical cylindrical reflector, which has a long axis that is arranged parallel to the long axis of the light light source and has a rotation with the light silver m to focus the light radiation at a focal point; the β-th hole has- The filament is located approximately at the focal point and is arranged along the long axis of the optical reading source; the second hole has a long axis and is arranged along the film polarizer away from the light light source surface, and is arranged along the long axis of the first hole and parallel to the first hole ; Qing Fen filtering, the device for optical radiation is a filter with a side facing and away from the silk source, which is parallel to and arranged along the side of the second hole decoration silk source. 6. An optical module for generating a partial polarization and a partial collimation of light with a degree of polarization, including an elongated housing, the module comprising: a movable top orifice plate with an elongated hole About the center of the plate and parallel to the length of the shell, a movable bottom hole plate with an elongated hole about the center of the plate and parallel to the length of the shell, a front plate with one or more transverse holes at the periphery of the plate A pivot hole deviates from the center in one of the upper quadrants of the plate, and an arc hole deviates from the center in one of the lower quadrants of the plate, defined by a line of rotation to the pivot hole, a rear plate, which There is a pivot hole and a curved hole in accordance with the front plate, O: \ 55 \ 55711-920925.DOC -2-a pivot pin, which is supported by the pivot holes in the front plate and the rear plate, a rectangle An open frame attached to a pivot pin, an arc pin attached to a rectangular open frame at the opposite end of the pivot pin and fixed in an arc hole, one or more thin film polarizers attached to a rectangular opening Inside the rack, one or more filter plates are mounted approximately parallel to the bottom orifice plate. And cover the hole; the position of the pivot hole is such that the film polarizer is located exactly below the top hole plate hole, and the 篆 -shaped hole is located approximately at the center of a specific design angle for the film polarizer, and the travel hole can be used to adjust The angle of the thin film polarizer and the transverse hole can be used to adjust the position of the elongated shell relative to a light radiation source. An optical exposure system for arranging a substrate with partially polarized and partially collimated optical radiation, including: at least one optical radiation source; a device for partially polarizing the optical radiation; A device for partially collimating the optical radiation; a device for partially filtering the optical radiation; a device for adjusting a degree of polarization; and a device for transmitting the polarization relative to the part of the polarization and the collimated light radiation Substrate device, wherein the device for partially polarizing the optical radiation includes an array of two or more thin film polarizers which are self-connected at an angle between two or more absorption plates The top to the bottom of the absorption plate traverses the space between the plates. The device for collimating the light radiation includes an array of two or more absorption plates. O: \ 55 \ 55711-920925.DOC -3-580604 rows The absorption plates are evenly spaced, and are orthogonal and parallel to the width of a supporting frame supporting the absorption plate, wherein the interval between the absorption plates makes the installed film polarizer approximately at the design angle. 8. A method for arranging a light aligning layer, comprising: exposing a light aligning layer to a portion of polarization and a portion of collimated light radiation, wherein the portion of the collimated light radiation is greater than 5 degrees in one dimension and The divergence is less than 30 degrees, and there is “unlimited divergence” along its orthogonal dimension, and the part of the polarized and part of the collimated light is absorbed by the alignment layer and the exposed alignment layer has anisotropic dielectric characteristics. 9 · A method for adjoining the liquid crystal medium generating side of the light-smoothing surface with money, including: exposing the light-emitting layer to a part of the collimated collimated filament, the polarization of the god, and a part of the collimated filament _ Layer absorption, where the hybrid collimated wire hides-with a divergence greater than 5 degrees and less than 30 degrees, and has an unlimited divergence along its orthogonal dimension, and applies a liquid crystal medium to the light alignment layer, which is aligned after exposure The layers emit liquid crystal alignment. O: \ 55 \ 55711-920925.DOC -4-