TW574619B - Photosensitive resin, photoresist for color filters, and process for producing color filter - Google Patents

Description

574619 V. Description of the Invention (1) Technical Field The present invention relates to a photosensitive resin composition, a photosensitive resist for a color filter, and a method for manufacturing a color filter. Specifically, paints, printing inks, and colored display panels using such materials, or objects that form colored images on substrates such as color protection, especially filters for color liquid crystal displays, color scanners, and solid-state imaging elements After the color sheet is subjected to a pattern forming step such as development, a photosensitive resin composition suitable for the required durable use, a photosensitive resist for a color filter with excellent durability, and a method for producing a color filter. BACKGROUND ART Conventionally, when using a photosensitive resin composition to improve the durability of a cured coating film, in addition to a crosslinked structure of an ethylenically unsaturated double bond, a crosslinked structure of another functional group may be introduced. For this purpose, the use of epoxy groups as other functional groups is envisaged. The epoxy group can be polymerized by itself, or a cross-linking reaction with a compound having an amine group, a hydroxyl group, a carboxyl group, or the like, can effectively introduce a cross-linking structure. However, since the epoxy group has high reactivity, the photosensitive resin composition containing an epoxy group has poor storage stability and is difficult to be single-liquid. In view of this problem, Japanese Patent Laid-Open No. 4- 1 753 59 advocates a thermosetting resin composition containing a compound having 2-oxo-1,3-diphosphorane-4-yl group, which can obtain acid resistance, Coating with excellent weather resistance and smoothness. However, this composition does not have an ethylenically unsaturated double bond, hardly undergoes a photohardening reaction, cannot be hardened by a non-heating system, and has a problem in durability of the coating film. Especially in recent years, the photosensitive resin has been used widely, and its position as a pattern forming material has also increased. Among them, the alkali-developing pattern-forming material must be soluble. 574619 A7 B7 i. Description of the invention (2) In an alkaline aqueous solution, a compound contained in a resin composition is generally used, which contains a carboxyl group. However, in the end use, having functional groups such as a carboxyl group can cause problems such as water resistance and chemical resistance. Here, for example, JP-A-Sho 60-21 7230 or JP-A No. 6-192389 proposes a compound having a carboxyl group, a compound having an epoxy group capable of reacting with a carboxyl group can be used, and a reaction between the carboxyl group and the epoxy group can be used. Carboxylic acid is introduced into the crosslinked structure produced by the reaction to improve heat resistance or mechanical properties. In particular, when a compound having both an epoxy group and a carboxyl group in the same molecule is used, a crosslinked structure can be finally formed from the epoxy group / carboxyl group, which has the effect of improving durability. However, when this compound is used, the sensitivity of the photosensitive resin composition containing the compound due to the high reactivity of the epoxy group and the carboxyl group is not good in terms of production and storage, and it is difficult to be singly liquefied, resulting in alkali developability. Reduced problems. The photosensitive resin composition has been known to be one of the photosensitive resin compositions using colorants such as pigments and dyes. It is a resin composition in which pigments are dispersed using synthetic resins and dispersants, etc. Polymerization initiator. A known method for producing a colored pixel is to coat the composition on a substrate and dry it, use a photomask with a pixel pattern, perform exposure and development, and form the pixel pattern, and then heat the pixel pattern to fix it. In particular, one of the fields of use of photosensitive resists is the use of color filters such as color liquid crystal displays, color scanners, and solid-state imaging devices. The material used for the color filter must meet the characteristics caused by the manufacturing steps of the color liquid crystal display. Therefore, the colorant is mainly pigment. -4- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling out this page) | * --- IIIII Order 1111111 · Intellectual Property Office Staff, Ministry of Economic Affairs Printed by a consumer cooperative 574619 V. Description of the invention (3) In recent years, various methods have been reported in order to balance the physical properties of coating films such as good solvent resistance and heat resistance with alkali developability, and to improve the performance of photosensitive resin compositions. . For example, Japanese Unexamined Patent Publication No. 1 0-3 1 672 1 proposes to introduce an ester cyclic epoxy group into a binder resin, react with a carboxyl group, and finally consume unnecessary carboxylic acid, and then introduce a cross-linked structure generated by the reaction to improve Solvent or heat resistance. However, these photosensitive resists have good physical properties of the cured pixel film. However, because of the high reactivity of epoxy groups and carboxyl groups, when used as a resist, the stability in manufacturing and storage is insufficient. As a result, This causes the problem of reduced alkali developability. In addition, Japanese Patent Application Laid-Open No. 5-39336 proposes an active energy ray-curable resin composition containing a compound of 2-oxo-1,3-difluorenyl-4-yl group, which can obtain water resistance, solvent resistance, Coating with excellent chemical resistance, heat resistance and hardening properties. However, in these compositions, the resin skeleton is mainly composed of epoxy resin, and when pigments are contained in the composition, the pigment dispersibility is insufficient, resulting in a problem of lowering transparency. The object of the present invention is to provide a photosensitive resin composition that is excellent in heat resistance, water resistance, solvent resistance, and chemical resistance, and has excellent dispersibility of pigments in the step, and does not reduce transparency. Material, a color resist for a photoresist, and a method for producing a color filter. In view of the shortcomings of the conventional techniques, the present inventors have repeatedly described a photosensitive resin composition that is excellent in heat resistance, water resistance, solvent resistance, and chemical resistance, and has good dispersion stability of pigments. Intensive research results, 574619 V. Description of the invention (4): The photosensitive resin composition that does not reduce light transmittance has been intensively researched and found that it has at least one 2-oxo-1,3-in the molecule. Vinyl polymers of bisphosphorane-4-yl and at least one carboxyl group, and photosensitive resin compositions of compounds having at least two ethylenically unsaturated double bonds in the molecule can solve the shortcomings of the conventional technology, and The present invention has been completed. That is, the photosensitive resin composition provided by the present invention includes a vinyl polymer (A) having at least one 2-oxo-1,3-difluorenyl-4-yl group and at least one carboxyl group in the molecule [ Hereinafter, the vinyl polymer (A)] and the compound (B) having at least two ethylenically unsaturated double bonds in the molecule are main components. In addition, a photoresist for a color filter is provided, which includes a vinyl polymer having at least one 2-oxo-1,3-diphosphone-4-yl group (hereinafter referred to as a cyclic carbonate) and at least one carboxyl group in a molecule. (A), and the compound (B) having at least two ethylenically unsaturated double bonds in the molecule, and the coloring! J (C) are the main components. The present invention also provides a method for producing a color filter using the photosensitive resist for a color filter. DETAILED DESCRIPTION OF THE PREFERRED SPECIFIC EXAMPLES The photosensitive resin composition of the present invention will be described in detail. First, the vinyl polymer (A) can be explained as follows. The cyclic carbonate group in the vinyl polymer (A) is represented by the following general formula: 574619 A7 R7, description of the invention (5) R1 R2 R3 • C—c-

In the formula, R ', R2, and R3 may be the same or different, and each represents a hydrogen atom or a Cl_C4 alkyl group. The vinyl polymer (A) is a monomer having at least one cyclic carbonate group and an ethylenically unsaturated double bond in the molecule (hereinafter referred to as a monomer having a cyclic carbonate and an ethylenically unsaturated double bond, and a monomer having at least one A monomer having a carboxyl group and an ethylenically unsaturated double bond (hereinafter referred to as a monomer having a carboxyl group and an ethylenically unsaturated double bond) is obtained by copolymerizing as an essential component. It has a cyclic carbonate group and an ethylenically unsaturated double bond. Monomers, compounds of the following formula

R h2c = c R1 R2 R3 r --- 111 I -------- ^ --------- (Please read the precautions on the back before filling this page) Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by Consumer Cooperatives

C—〇 · -C—c- CH

In the formula, R represents a hydrogen atom or a methyl group, R1, R2 'and R3 may be the same or different, and each represents a hydrogen atom or an alkyl group, and η is an integer of 1 to 6. Specific examples are 2,3-carbonate propyl (meth) acrylate, 2-methyl-2,3_ carbonate propyl (meth) acrylate, 3,4-carbonate butyl (meth) acrylate _Acid paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 574619 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 ___ 5. Description of the invention (6) Ester, 3-methyl-3 , 4-carbonate butyl (meth) acrylate, 4-methyl-3,4-carbonate butyl (meth) acrylate, 6,7-carbonate hexyl (meth) acrylate, 5- (Meth) acrylates such as ethyl-5,6-carbonate hexyl (meth) acrylate, 7,8-carbonate octyl (meth) acrylate; 2,3-carbonate propyl vinyl ether , Methyl-2,3-carbonate propyl maleate, or methyl-2,3-carbonate propyl butyrate, and the like. The monomer having such a cyclic carbonate group and an ethylenically unsaturated double bond may be used singly or in combination of two or more kinds. In addition, monomers having a carboxyl group and an ethylenically unsaturated double bond include, for example, ethylenic unsaturated monomers such as acrylic acid, methacrylic acid, benzofuranic acid, itaconic acid, maleic acid, and fumaric acid. Dicarboxylic acids; maleic acid monoalkyl esters, fumaric acid monoalkyl esters, or itaconic acid monoalkyl esters; phthalic anhydride, succinic anhydride, or meta Anhydride products such as trimellitic anhydride. The vinyl polymer (A) may be composed of the monomers having a cyclic carbonate and an ethylenically unsaturated double bond, and the monomers having a carboxyl group and an ethylenically unsaturated double bond. Other monomers having ethylenically unsaturated double bonds (hereinafter referred to as monomers having copolymerizable ethylenically unsaturated double bonds) are obtained by copolymerization. Monomers having copolymerizable ethylenically unsaturated double bonds include, for example, (1) methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, hexyl acrylate, heptyl acrylate, octyl acrylate, and nonyl acrylate , Decyl acrylate, dodecyl acrylate, tetradecyl acrylate, cetyl acrylate, stearyl acrylate, stearyl acrylate, behenyl acrylate, etc. have (:!-(: 22 alkane) Base acrylic esters, and those with the same paper size as the Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the note on the back? Matters before filling out this page) -I ----- --- Order ---------- 574619 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (7) Methacrylic acid esters like alkyl; (2) Cycloacrylate Acrylates having alicyclic alkyl groups such as esters, isobornyl acrylate, dicyclopentyl acrylate, dicyclopentyloxyethyl acrylate, etc., and methacrylates having the same alicyclic alkyl groups as above, or the like Acrylic esters of hydrogen furfuryl alcohol and epsilon-caprolactone Acrylate, etc., (3) Benzoyloxyethyl acrylate, benzyl acrylate, phenethyl acrylate, phenoxyethyl acrylate, phenoxy diethylene glycol acrylate, 2-hydroxy-3-acrylate Acrylates having aromatic rings such as phenoxypropyl esters, and methacrylates having the same aromatic rings as described above. (4) Hydroxyalkyl acrylates such as hydroxyethyl acrylate, hydroxypropyl acrylate, and glyceryl acrylate. Acrylic acid ester, or methacrylic acid ester or lactone modified hydroxyethyl acrylate or hydroxyethyl methacrylate with the same hydroxyalkane, or acrylic acid polyethylene glycol, acrylic acid polypropylene glycol, etc. Acrylic esters, and methacrylic esters having the same polyalkylene glycol group as described above, (5) glycidyl acrylate, glycidyl methacrylate, α-ethyl acrylate, α-n-propyl acrylate Glyceryl ester, α-n-butyl glycidyl acrylate, -3,4-epoxybutyl acrylate, -3,4-epoxybutyl methacrylate, _4,5-epoxy methacrylate Pentyl ester, acrylic acid-6,7 _6,7_ epoxypentyl acrylate, α_ethyl acrylate-6,7-epoxypentyl acrylate, etc .; -3,4-epoxyhexyl acrylate, -3,4-cyclomethacrylate Oxycyclohexyl ester, lactone modified acrylic acid _3,4_ epoxy cyclohexyl ester, lactone modified methacrylic acid 3,4-epoxy cyclohexyl ester, vinyl epoxy hexane and other lipids Cyclic epoxy compounds, and compounds with at least two alicyclic epoxy groups in the molecule, and at least one B-9 in the molecule- This paper is in accordance with China National Standard (CNS) A4 (210 X 297) Li):? ---- r I ^ -------- ^ --------- (Please read the note on the back ^ before filling out this page) 574619 Α7 Β7 Intellectual Property of the Ministry of Economic Affairs Printed by the Bureau's Consumer Cooperatives 5. Description of the invention (Ethylene unsaturated double bond and an alicyclic epoxy group are reactive groups, and the compound obtained by the reaction has a glycidyl group and an ethylenically unsaturated double bond in the molecule ; A compound having a glycidyl group and an ethylenically unsaturated double bond represented by the following general formula. R4 h2c = c C——〇 · // 〇 ch2- R5

• C-CH2 V (where R4 is a hydrogen atom or a methyl group, 115 is a CrCs alkyl group, and η is an integer from 1 to 6), for example, R4 is hydrogen or methyl group, and R5 lower alkyl group is methyl group, propyl group, Isopropyl, isobutyl, pentyl, etc. acrylates or methacrylates, etc. (6) Ethylene fluoride, difluoroethylene, trifluoroethylene, chlorotrifluoroethylene, bromotrifluoroethylene, pentafluoropropylene, Ci-Cu (Fluoro-α-olefins such as hexafluoropropylene; Ci-Cu (per) fluoroalkyl groups such as trifluoromethyl trifluoroethylene ether, pentafluoroethyl trifluoroethylene ether, or heptafluoropropyl trifluoroethylene ether Perfluorofluoroalkyl perfluoroethylene ethers; 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate, 1H, 1H , 5H-octafluoropentyl (meth) acrylate, 1Η, 1Η, 2Η, 1Η-heptadecafluorodecyl (meth) acrylate, or perfluoroethoxyethyl (meth) acrylate, etc. ( Perfluorofluoroalkyl C! ^ 8 (per) fluoroalkyl (meth) acrylates and other compounds having a fluorine atom and an ethylenically unsaturated double bond, etc., (7) 7-Methacryloxypropane Trimethoxysilane and other silyl-containing (methyl Acrylate, (8) Ν, Ν-dimethylaminoethyl (meth) acrylate, Ν, Ν-diethylaminoethyl (meth) acrylate, or Ν, Ν-diethylaminepropyl (Meth) acrylate-10- (Please read the note on the back? Matters before filling out this page) -Installation -------- Order -------- · This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 574619 A7 ________B7__ 5. Description of the invention (9) and other N, N-dialkylamine alkyl (meth) acrylates, (9) Acrylic acid, methyl Acrylonitrile, etc. (Please read the precautions on the back before filling out this page) (10) Acrylamidine or its acid-alcohol resin replaces amidine, etc., (11) Dimethyl fumarate, fumaric acid Diethyl ester, dibutyl fumarate, dimethyl iconate, dibutyl iconate, ethyl fumarate, methyl fumarate, methyl econate Unsaturated dicarboxylic acid esters such as esters, (12) styrene derivatives such as styrene, α-methylstyrene, chlorostyrene, etc., (13) butadiene, isoprene, pentadiene, Diene compounds such as dimethyl butadiene, (14) Group vinyl ketone, butyl vinyl ketone, unsaturated ketone, (15) methyl vinyl ether, butyl vinyl ether, vinyl ether and the like. Among the above monomers having a copolymerizable ethylenically unsaturated double bond, from the viewpoint of dispersibility of the pigment, a (meth) acrylate having an aromatic ring is preferred, and a benzyl (meth) acrylate is particularly preferred. The monomer having a copolymerizable ethylenically unsaturated double bond may be used singly or in combination of two or more kinds. Vinyl polymer (A) printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is a monomer having a cyclic carbonate group and an ethylenically unsaturated double bond, a monomer having a carboxyl group and an ethylenically unsaturated double bond, and Acrylic resin obtained by copolymerizing a monomer having a (meth) acrylfluorenyl group as a main component among monomers having a copolymerizable ethylenically unsaturated double bond, and if necessary, copolymerizing with other monomers having an ethylenically unsaturated double bond, It is preferable in terms of heat resistance, light resistance, transparency, and the like. -11-^ Paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ~ 'Α7

574619 V. Description of the invention (10) As mentioned above, the vinyl polymer (A) is composed of a monomer having a cyclic carbonate group and an ethylenically unsaturated double bond, and a monomer having a carboxyl group and an ethylenically unsaturated double bond. And a monomer having a copolymerizable ethylenically unsaturated double bond is obtained by copolymerization. Although these copolymerization forms are not particularly limited, they can be produced by a radical polymerization method in the presence of, for example, a catalyst (polymerization initiation! I). As the copolymerization method, known methods such as a block polymerization method, a solution polymerization method, a suspension polymerization method, and an emulsion polymerization method can be used. The obtained vinyl polymer (A) may be any random copolymer, block copolymer, graft copolymer, or the like. '' Here, the solvents used in the solution polymerization method include, for example: (1) acetone, methyl ethyl ketone, methyl n-acetone, methyl isopropyl, methyl n-butyl ketone, methyl isobutyl ketone, methyl n-pentanone, Ketone solvents such as methyl-n-hexanone, diethylketone, ethyl-n-butanone, di-n-acetone, diisobutanone, cyclohexanone, phorone; (2) ether, isopropyl ether, n-butyl ether, diiso Ether solvents such as pentyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol, dioxane, tetrahydrofuran; (3) ethyl formate, propyl formate, N-butyl formate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, n-amyl acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethyl acetate Ester-based solvents such as glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, and ethyl 3-ethoxypropionate. As the catalyst, a known radical polymerization initiator can be used. Free radical polymerization initiators include, for example, 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvaleronitrile), 2,2'-azobis (4_ Methoxy-2,4 · dimethylvaleronitrile) and other azo compounds, over -12- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the note on the back first) Please fill in this page for matters) · I -----— Order --------- · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 574619 V. Description of the invention (11) Benzozone oxide, over Laurel oxide, tertiary butyl peroxy trimethyl acetate, 1, Γ-bis (tertiary butyl peroxy) cyclohexane, tertiary pentyl peroxy-2-ethylhexanoate, tri Organic peroxides such as hexylper-2-ethylhexanoate, and hydrogen peroxide. When a peroxide is used as a radical polymerization initiator, a reducing agent can be used as a redox initiator in organic peroxides. When the amount of the cyclic carbonate group of the vinyl polymer (A) is converted into the above-mentioned amount of the monomer having a cyclic carbonate group and an ethylenically unsaturated double bond, the number 値 is preferably 1 to 50% by weight, and 2 to 40 % By weight is best. When the cyclic carbonate group is 1% by weight or less, the monomer has an amount of monomers of a cyclic carbonate group and an ethylenically unsaturated double bond, and the effect of a crosslinking reaction cannot be expected. On the other hand, when the amount exceeds 50% by weight, the molecular interaction between the cyclic carbonate groups becomes stronger, and the solubility in the solvent is lowered, so that the pigment dispersibility is lowered, which is not good. When the amount of the carboxyl group of the vinyl polymer (A) is converted into the amount of the monomer having a carboxyl group and an ethylenically unsaturated double bond, the number 値 is preferably 3 to 40% by weight, and most preferably 5 to 30% by weight. . At 3% by weight, the monomer having a carboxyl group and an ethylenically unsaturated double bond has insufficient solubility in an alkaline aqueous solution. On the other hand, when the amount exceeds 40% by weight, the solubility in an alkaline aqueous solution is too high, and pattern formation of a coating film is difficult, so it is not good in these respects. The acid base of the vinyl polymer (A) (the acid content present in 1 g of the sample is neutralized by the prescribed method in milligrams of calcium hydroxide) can be selected according to the purpose of forming a coating film. Under the condition that development can be performed using an alkaline aqueous solution, the acid is not particularly limited ', but it is preferably in the range of 20 to 250 ngKOH / g. In addition, the vinyl polymer (A) preferably has ethylenic unsaturation in the molecule -13- 574619 V. Description of the invention (12) Double bond is preferred. The introduction of an ethylenically unsaturated double bond in the vinyl polymer (A) can make the vinyl polymer (A) itself have active energy ray-hardenability. The sensitization between the introduced ethylenically unsaturated double bond and the polymerizable compound (B) can be improved due to the paternity reaction '. The vinyl polymer (A) preferably has a hydroxyl group. The vinyl polymer (A) having a hydroxyl group can be composed of a monomer having a cyclic carbonate group and an ethylenically unsaturated double bond, a monomer having a carboxyl group and an ethylenically unsaturated double bond, and a monomer having a residue and ethylenicity. An unsaturated double bond monomer and a monomer having at least one hydroxyl group and an ethylenically unsaturated double bond in the molecule are obtained by copolymerization. By using a vinyl polymer (A) having a hydroxyl group, the solubility in an alkaline aqueous solution can be improved without developing residues, and a coating film forming a sharp pixel pattern can be obtained. Although the molecular weight of the vinyl polymer (A) is not particularly limited, in order to maintain the coating film properties and the like, the number average molecular weight (hereinafter referred to as Mη) in terms of styrene is preferably 2,000 or more. Among them, 3,500 ~ 50,000 is the best. When the number average molecular weight is less than 2,000, it is difficult to form a uniform coating film and impart various coating film properties. When the number average molecular weight exceeds 50,000, the resin has a high viscosity and the coating workability by the coating method is poor. The ratio of the weight average molecular weight (hereinafter referred to as Mw) to Mη (Mw / Mη: molecular weight distribution) is not particularly limited ', but is preferably 6.0 or less, and most preferably 5.0 or less. When Mw / Mn exceeds 6.0, it is difficult to form a uniform coating film as well as the above molecular weight, and because the resin viscosity is high, the coating workability by the coating method tends to deteriorate, and the solubility in alkaline aqueous solutions during development There is a tendency to worsen. This molecular weight can be appropriately selected according to the thickness of the coating film to be formed, the coating method, etc. -14- 574619 A7 ____ B7 V. The description or condition of the invention (13), can be appropriately selected. Next, a compound [hereinafter referred to as a polymerizable compound (B)] having at least two ethylenically unsaturated double bonds in the molecule will be described. Examples of the polymerizable compound (B) include trimethylolethane triacrylate, trimethylolpropane triacrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, and isopentyl. Tetraol tetra (meth) acrylate, isopentaerythritol tri (meth) acrylate, diisopentaerythritol hexa (meth) acrylate, diisopentaerythritol penta (meth) acrylate, hexamethylene Alcohol di (meth) acrylate, trimethylolpropane tri (acryloxypropyl) ether, tris (propyleneamyloxyethyl) isotricyanate, glycerol tri (meth) acrylic acid Esters, epoxy (meth) acrylates [e.g. the reaction of epoxy resins such as phenol-phenolic epoxy resin, cresol-phenolic epoxy resin, bisphenol A epoxy resin and (meth) acrylate Materials], urethane (meth) acrylate {such as ethylene glycol, polyethylene glycol, polypropylene glycol, polybutylene glycol, polyethoxy glycol of bisphenol A, polyester polyol, poly Polyols such as butadiene polyols, polycarbonate polyols, and organic polyisocyanates (such as toluene diisocyanate, Toluene diisocyanate, isophorone diisocyanate, hexamethylene diisocyanate, etc.), and hydroxyl-containing (meth) acrylates [eg, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl ( (Meth) acrylates, 1,4 · butanediol mono (meth) acrylates, etc.], etc.}, polyester (meth) acrylates [such as polybasic acid compounds and their anhydrides (such as maleic acid Acids, succinic acid, adipic acid, isophthalic acid, phthalic acid, terephthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and their anhydrides, etc., and polyols (such as ethylene glycol Alcohol, propylene glycol, 3-methyl-1,5-pentanediol, neopentyl-15- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) " ~ (Please read the back Please fill in this page for attention) -------- Order ---------. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 574619 V. Description of Invention (14) Polyester Polyols Reactants with (meth) acrylic acid, etc.] etc. Among these polymerizable compounds (B), trimethylolpropane tri (meth) acrylate, isopentaerythritol tetra ( Base) acrylate, diisopentaerythritol hexa (meth) acrylate, and diisopentaerythritol penta (meth) acrylate are the best in terms of light curing sensitivity. The proportion of polymerizable compound (B) used is The range of 5 to 90% by weight of the resin component of the photosensitive resin composition of the present invention. The polymerizable compound (B) may be used in combination of one or two or more of the specific compounds described above. In particular, the photosensitive resin composition of the present invention is used as a color filter. When a photosensitive resist for a sheet is used, when it is necessary to have a pattern forming property, it is preferably used in an amount of 10 to 70% by weight. In this case, when the polymerizable compound (B) exceeds 70% by weight, the alkali solubility of the object of the present invention is also reduced. On the other hand, when it is 10% by weight or less, it is difficult to obtain a hardened coating film having desired coating film physical properties, and it is difficult to form a pattern, which is not preferable. The photosensitive resin composition of the present invention can be used as a photosensitive coating, an adhesive, and a pattern forming material as it is. Here, the photosensitive resin is blocked to include a coloring agent suitable for pigments, dyes, and the like, and a photosensitive resin composition containing a colorant is suitable for coatings, printing inks, and resists, and particularly to photosensitive resistance for color filters. Etchant. In addition, the cyclic carbonate group in the vinyl polymer (A) is a polar functional group and has the effect of further improving the dispersibility of the pigment. In order to ring-open the cyclic carbonate group to promote the cross-linking reaction, the ring-opening catalyst can be used as a ring-opening catalyst having a cyclic carbonate group or an epoxy-based ring-opening catalyst. Specific examples include tetramethylammonium bromide, trimethylbenzyl ammonium hydroxide, 2-hydroxypyridine, trimethylbenzyl ammonium methoate, phenyltrimethylammonium chloride, and phenyltri-16-574619 A7. B7 V. Description of the invention (15) Methyl ammonium bromide, phenyltrimethylammonium hydroxide, phenyltrimethylammonium iodide, choline phosphate sodium chloride, stearyl ammonium bromide, tetra-n-pentyl Ammonium iodide, tetra-n-butylammonium bromide, tetra-n-methylammonium hydroxide, tetra-n-butylammonium phosphate, tetra-n-decylammonium trichloride, tetraethylammonium hydroxide, tetraethyltetrafluoroborate Ammonium. Ethylcholine bromide, alkyldimethylbenzyl ammonium chloride, benzylcholine bromide, benzyl-n-butylammonium bromide, carmenine, butyl chloride, bis (tetra-n-butylammonium) ) Dichloride, or quaternary ammonium salts such as trimethyl vinyl ammonium bromide, allyl triphenyl chloride scale, n-pentyl triphenyl scale scale, benzyl triphenyl scale scale, Bromomethyl triphenyl bromide scale, 2-dimethylamine ethyl triphenyl bromide scale, ethoxycarbonyl bromide scale, n-heptyl triphenyl bromide scale, methyl triphenyl bromide Scale salts such as scales, methyl (hydroxymethyl) sulfate, or tetraphenyl bromide; acid catalysts such as phosphoric acid, p-toluenesulfonic acid, or dimethylsulfuric acid; and carbonates such as tin carbonate. When the photosensitive resin composition of the present invention is cured using active energy rays such as light, a photopolymerization initiator may be used to start the polymerization reaction using light. As the photopolymerization initiator, a known photopolymerization initiator can be used. Known photopolymerization initiators include, for example: (1) benzophenone, 3,3 · dimethyl-4 · methoxybenzophenone, 4,4 '· bisdimethylaminobenzophenone, 4 , 4'-bisdimethylaminobenzophenone, 4,4-dichlorobenzophenone, Michelin, 3,3 ', 4,4'-tetrakis (tertiary butyl peroxycarbonyl) Benzophenones such as benzophenone, (2) ketone, thioketone, 2-methylthioxanthone, 2-isopropylthioxanthone, 2-sulfanyl chloride, 2 Pilj ketones, thio_ketones, such as 1,4-diethylthioxanthone, 2,4-dimethylthioketone, thioketone_4_sulfonic acid, -17- This paper size applies to Chinese national standards (CNS) A4 specifications (210 X 297 mm) _ ~ " (Please read the precautions on the back before filling out this page)-丨 Installation ---- Order ---------. Ministry of Economy Wisdom Printed by the Consumer Cooperative of the Property Bureau 574619 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (16) (3) Benzoin, Benzoin Methyl Ether, Benzoin Ether, Benzoin Isopropyl Ethers, benzoin n-butyl ether, benzoin isobutyl ether, benzoin butyl ether and other benzoin groups' (4) α-diketones such as benzyl and diethylfluorenyl, (5) Sulfides such as methylthiuram monosulfide, tetramethylthiuram disulfide, p-toluene disulfide, (6) 4-methylaminobenzoic acid, 4-dimethylaminobenzoic acid methyl ester Ester, 4-dimethylaminobenzoic acid ethyl ester, 4-dimethylaminobenzoic acid butyl ester, 4-dimethylaminobenzoic acid 2-ethylhexyl ester, 4-dimethylaminobenzoic acid-2 -Isoamyl esters and other benzoic acids, in addition to 3,3'-carbonylbis (7-diethylamino) -humulin, 1-hydroxycyclohexyl phenone, 2,2-dimethoxy-1,2 -Diphenylethane-1-one, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamine -IO-morpholinophenyl) -butane-1-one, 2-hydroxymethyl-1 · phenylpropane-1-one |, 2,4,6-dimethylpentyl monophenylphosphine oxidation Compound, 1- [4- (2-hydroxyethoxy) phenyl] -2 · hydroxy-2-methyl-1 · propane-1-one, 1- (4-isopropylphenyl) -2- Hydroxy-2-methylpropane-1-one, 1- (4-dodecylphenyl) -2-hydroxy-2-methylpropane-1-one, 4-benzylidene-4'-form Dimethyl sulfide, ethoxyacetal, 1-phenyl-1,2-propanedione-3- (o-ethoxycarbonyl) Oxime, 2-phenyl-1,2-butanedione-2- (o-methoxycarbonyl) oxime, ι, 3-diphenylpropanedione-2- (o-ethoxymine), 1-phenyl-3-ethoxyglycerone- 2- (o-benzylfluorenyl) benzene, o-benzoic acid methyl benzoate, bis (4-dimethylaminophenyl) ketone, p-dimethylene Aminoacetophenone, α, α-Dichlorophenoxyacetophenone, Amyl 4-dimethylaminobenzoate, 2,2'-bis (2-chlorophenyl) -4,4 ', 5 , 5'- 肆 (4-ethoxymine-based phenyl) _ -18- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) — ILIII-llll · I ---- 丨丨 Order II -------- (Please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economy, Employee Consumer Cooperative 574619 A7 —One B7 V. Description of Invention (17) 1, 2 '-Diimidazole, 2,2, bis (2-bromophenyl), 4,4', 5,5 '-(4-ethoxycarbonylphenyl) -1,2'-diimidazole, 2 ,, 2, -bis (2,4-dichlorophenyl-4,4, '5,5, tetraphenyl-1,2'-diimidazole, 2,2, -bis (2,4-dibromophenyl) ) -4,4 ,,, 5,5'-tetraphenyl · 1,2, -diimidazole, 2,2, -bis (2 , 4,6-tribromophenyl) -4,4 ', 5,5'-tetraphenyl · 1,2, -diimidazole and other diimidazoles; p-dimethylaminoacetophenone, α, α- Dichloro-4-phenoxyacetophenone, 4-dimethylamine benzoic acid amyl ester, 2,4-bistrichloromethyl-6- [di- (ethoxycarbonylmethyl) amino] phenyl -S-Sanken, 2,4-bistrichloromethyl-6- (4-ethoxy) phenyl-S-trioxine, 2,4-bistrichloromethyl-6- (3-bromo- 4-ethoxy) phenyltrianthraquinone, 2-tert-butylanthraquinone, 2-pentylanthraquinone, chloroanthraquinone, benzoxanthone, dibenzocycloheptane, methylene anthrone, 4-azidocarbylacetophenone, 2,6-bis (p-azidobenzylidene) cyclohexane, 2,6-bis (p-azidobenzylidene) -4-methylcyclohexyl Ketones, naphthalenesulfonyl chloride, quinolinesulfonyl chloride, n-phenylthioazetone, 4,4-azobisisobutyronitrile, diphenyldisulfide, benzothiazole disulfide, triphenylphosphine, tetrabromide A combination of carbon, tribromophenanthrene, benzoin peroxide, eosin, methylene blue and other photoreductive pigments, ascorbic acid, triethanolamine and other reducing agents. In addition, photopolymerization initiators include Irgaure series 184, 149, 261, 369, 500, 651, 784, 819, 907, 1116, 1664, 1700, 1 800, 1 850, 2959, 4043, Darocurll 73 (Ciba Specialty Chemicals) Products), Lucirin TPO (manufactured by BASF), KAYACURE series 歹 ij DETX, MBP, DMBI, EPA, OA (manufactured by Nippon Kayaku Co., Ltd.), VICURE series 歹 ij 10, 55 (manufactured by STAUFFER), TRIGONAL P1 (ΑΚΚΟ) (Product of the company), SANDORY1 000 (product of the company SANDOZ), DEOP (product of the company APJ〇HX), QUANTAX URE system [] PDO, -19- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ) --- r ----- l · Aw I -------- Order --------- (Please read the phonetic notes on the back before filling this page) 574619 A7 B7 V. Description of the invention (18) ITX, EPO (made by WARO BLEKINSOP) and so on. As the photopolymerization initiator, a photosensitizer can be used. As the photosensitizer, a known photosensitizer can be used. Known photosensitizers include, for example, amines, ureas, sulfur-containing compounds, phosphorus-containing compounds, chlorine-containing compounds, and nitriles, or other nitrogen-containing compounds. The photopolymerization initiator and the photosensitizer can be used singly or in combination. The amount used is not particularly limited, but it is preferably from 0.1 to 20% by weight relative to the polymerizable compound (B), and more preferably from 0.5 to 10% by weight. When the content is less than 0.1% by weight, the photosensitivity is reduced, and when it exceeds 20% by weight, crystal precipitation and deterioration of the coating film physical properties are not preferred. The photosensitive resin composition of the present invention may contain other ingredients, if necessary, without preserving storage stability, water resistance, chemical resistance, heat resistance, and the like, without departing from the purpose of the present invention. Other ingredients include stabilizers such as reactive diluents, hardening catalysts, organic solvents, coupling agents, antioxidants, and ultraviolet absorbers, and various homogenizers such as silicone, fluorine, and acrylic. In order to improve alkali developability and thermosetting property of the photosensitive resin composition of the present invention, a polybasic acid and an anhydride may be added as other components. In order to improve the thermosetting property, an epoxy compound or the like may be added. Reactive diluents include, for example, butoxyethyl (meth) acrylate, n-oxyethylene glycol (fluorenyl) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (methyl Base) acrylate, 2-ethylhexyl (meth) acrylate, N-vinyltetrahydropyrrolidone, 1-vinylimidazole, isobornyl (meth) acrylate, tetrahydrofurfuryl (methyl) Acrylate, carbitol (meth) acrylate, phenoxyethyl (meth) acrylate, cyclopentadiene (meth) acrylate, -20- This paper size applies to Chinese National Standard (CNS) A4 Specifications (210 X 297 mm) (Please read the notes on the back before filling out this page) I -------- Order --------- AWI Printing 574619 A7 B7 5. Description of the invention (19) N-vinylformamide, N-vinylacetamide, N-vinylmorpholine, etc. These can be used singly or in combination of two or more kinds. (Please read the precautions on the back before filling out this page) Coupling agents include, for example, silane coupling agents, titanium coupling agents, and aluminum coupling agents. Among these materials, a silane coupling agent is preferred in terms of excellent smoothness, adhesion, water resistance, and solvent resistance. Examples of the silane coupling agent include r- (2-aminoethyl) aminopropyltrimethoxysilane, r- (2-aminoethyl) aminopropylmethyldimethoxysilane, and r-methylpropaneoxypropyl Trimethoxysilane, 7-glycidylpropyltrimethoxysilane, / 3-(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 7-hydrothiopropyltrimethoxysilane , Vinyltriethoxysilane, vinyltrimethylsilane, trimethoxysilylbenzoic acid, r-isocyanatopropyltrimethoxysilane, etc., and oligomers made from these silane coupling agents Materials or polymers. Among the above-mentioned silane coupling agents, silane coupling agents having an epoxy group such as 7-glycidylpropyltrimethoxysilane and / 3- (3,4-epoxycyclohexyl) ethyltrimethoxysilane are preferred. . These coupling agents may be used singly or in combination. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. For each 100 parts by weight of vinyl polymer (A), the blending amount of the coupling agent is preferably in the range of 0.1 to 30 parts by weight, and more preferably 0.5 to 20 parts by weight. When the blending amount of the coupling agent is less than 0.1 part by weight, the smoothness of the coating film formed, and the adhesive, water resistance and solvent resistance with the substrate are insufficient, and when it exceeds 30 parts by weight, not only can the improvement of adhesion not be expected. It is not suitable to form a coating film with reduced hardenability. The photosensitive resin composition of the present invention can be obtained by uniformly mixing the above-mentioned components. -21- The paper size is applicable to the Chinese National Standard (CNS) A4 (21 ^ < 297 mm) 574619 A7 B7 i. Description of the invention (,. Mixing The method is a solvent mixing method in which these components are dissolved in an appropriate solvent and then mixed. These solvents are not particularly limited as long as they can dissolve the above components without reacting. This solvent can be used as it is for the above-mentioned vinyl polymerization. Various solvents listed at the time of production of the substance (A). The mixing order of the photosensitive resin composition of the present invention when prepared by the solvent mixing method is not particularly limited. For example, all the components can be dissolved in the solvent at the same time to prepare the photosensitive resin of the present invention The solution of the composition. The components can also be dissolved in the same or different solvents to form two or more kinds of solutions, and then these solutions are mixed to prepare the solution of the photosensitive resin composition of the present invention. The present invention prepared from the above The photosensitive resin composition can be used as it is as a paint, an adhesive, a pattern forming material, etc. The photosensitive resin composition is coated on a substrate That is, a hardened coating film having heat resistance, water resistance, solvent resistance, and chemical resistance can be formed. When the photosensitive resin composition of the present invention is used as a coating material, the vinyl polymer (A) and the polymerizable compound (B) can be regarded as The binder resin can be used as a UV-curable coating, a thermosetting coating, etc. by mixing colorants and additives. When the photosensitive resin composition of the present invention is used as a printing ink, it can be vinyl polymer (A), polymerizable The compound (B), the solvent, etc., can be used as a component of the medium, and can be used as a UV-curable ink by mixing a colorant and an auxiliary agent. Next, the photosensitive resist for a color filter of the present invention will be described. A photosensitive resist for a color filter is obtained by containing a vinyl polymer (A), a cyclic carbonate group (B), and a colorant (C) as essential components. This vinyl polymer (A) and a polymerizable compound ( B) The above is known. -22- This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the note on the back before filling this page) -1 ----- --- Order ---- I ---- · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 574619 A7 B7 i. Description of the invention (21) The colorant (C) includes pigments, dyes, and other colorants. Pigments include organic pigments and inorganic pigments. Organic pigments include, for example, CiI.9 red pigment and C.1.97 red Pigment, C. 1.1 No. 22 Red Pigment, CI123 No. Red Pigment, C.L149 No. Red Pigment, c.1.168 No. Red Pigment, CI177 No. Red Pigment, Ci180 No. Red Pigment, No. c.1.192 Red Pigment, CI Red pigment No. 215, red pigment No. CI216, red pigment No. C.1.217, red pigment No. C.L22, red pigment No. c.1.223, red pigment No. CI224, red pigment No. C.L226, no. C.1.227 Red pigment, CI228 red pigment, CI240 red pigment, C. 1.254 red pigment.丄 48: Red pigments such as No. 1 red pigment, CI, No. 7 green pigments, (: No. 36 green pigments such as green pigment, cl15 blue pigment, C.1.15: No. 6 blue pigment, CI22 blue Blue pigments, blue pigments such as CI60 blue pigment, αι · 64 blue pigment, etc .; CI19 purple pigment, c.lu purple pigment, ci29 purple pigment, CI30 purple pigment, c.1.37 No. purple pigment, C.1.40 purple pigment, CI50 purple pigment and other purple f; CI20 yellow pigment, CI24 yellow pigment, C.L83 yellow pigment, cl86 yellow pigment, C.1.93 yellow Pigment, cm 09 yellow pigment, c. 1.1 10 page pigment, C · I · 11 1 7 yellow pigment, c · 1.1 2 5 yellow pigment, CI137 yellow pigment, c.uw yellow pigment , C.L139 yellow pigment, CI147 yellow pigment, c.1.148 yellow pigment, CI150 yellow pigment, CI · 153 yellow pigment, cj · :! No. 54 yellow pigment, CI166 yellow pigment, C Yellow pigments such as I168 yellow pigment and CI185 yellow pigment; black pigments such as CI7 black pigment. Electronic display -23- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page)

-IIII 1T --------- Printed by the Employees 'Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 574619 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 However, it can be seen that each pigment primary particle that constitutes the aggregate. If the average particle diameter of the primary particles of the pigment of the present invention is in the range of 〇〗 ～ 〇 .;! 〇 // m, the early dispersibility is good. In addition, the average particle diameter of the primary particles of the pigment can be measured by using a transmission electron microscope or a scanning electron microscope by dispersing the pigment in a solvent by ultrasonic waves. In the present invention, the average particle diameter of the primary pigment particles is photographed with a scanning electron microscope JEM-2010 (manufactured by Japan Electronics Co., Ltd.), and each of the primary pigment particles constituting the aggregate on the secondary image is 50 particles. , Respectively, to obtain the diameter (long diameter) in the longitudinal direction, and obtain the average 値. The inorganic pigments include, for example, barium sulfate, lead sulfate, titanium oxide, Huang Dan, Hong Dan, chromium oxide, carbon black, and the like. Various dyes are available, such as < < Dye Guide > > (organic synthetic chemistry association, 1970), < < color material industry manual > > (color material association, asakura bookstore, 1 989), < < Industrial Pigment Technology and Markets > (CMC, 1 983), "Chemistry Fact Sheet Applied Chemistry" > (edited by the Chemical Society of Japan, Jiusen Bookstore, 1986) are available. Specific examples include azo dyes, metal chain salt azo dyes, pyrazolium azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbon dyes, quinone imine dyes, methine dyes, perylene blue Dyes, indigo dyes, quinoline dyes, nitro-based dyes, dibenzopiperan dyes, thienol dyes, tiller dyes, tiller dyes, Skorion dyes, and the like. These pigments, dyes, and the like may be used in combination of one kind or two or more kinds. In addition to the pigments and dyes, inorganic pigments can be used as colorants. The inorganic pigments include, for example, inorganic pigments such as carbon-based, titanium-based, macro-based, aluminum-based, calcium-based, iron-based, lead-based, and cobalt-based. -24- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) " ---_---- 1 --- Γ Aw I ^ -------- Order- -------- AWI (Please read the precautions on the back before filling in this page) 574619 A7 __ B7 V. Description of the invention (23) Pigments are preferred in terms of heat resistance and light resistance. The coloring agent content in the photosensitive resin composition of the present invention is 5 to 80% by weight (please read the precautions on the back before filling in this page). The dispersant can be used to disperse the pigment in the photosensitive resist for color filters. Agent. Here, the dispersant is not particularly limited, and examples thereof include resin-based dispersants such as pigment intermediates, dye intermediates, polyamine compounds or polyurethane compounds. Commercially available products of this resin-based dispersant include, for example, oil spa-pic series 1 30, 1 61, 1 63, 1 70 Jefka series 46, 47, Solusbis and the like. In addition, resin-based dispersants such as' acrylic acid-based and polyethylene fired-based systems can also be used. When dispersing the pigment, a dispersing machine can be used. The dispersing machine includes a roller mill, a ball mill, a bead mill, a pulverizer, and a dispersion mixer. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs This pigment uses a solvent when it is dispersed. The solvent is not particularly limited. For example, aromatic solvents such as toluene or xylene, methoxybenzene, ethyl acetate or butyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, and other acetic acid solvents, ethoxyethyl Propionate solvents such as propionate, alcohol solvents such as methanol and ethanol, ether solvents such as butyl cellulose, propylene glycol monomethyl ether, diethylene glycol ether, and diethylene glycol dimethyl ether, methyl ethyl ketone, methyl formaldehyde Ketone solvents such as isobutyl ketone and cyclohexanone; aliphatic hydrocarbon solvents such as hexane; N, N-dimethylformamide, 7-butyrolactone, N-methyl-2-tetrahydropyrrolidone , Nitrogen compound solvents such as aniline and pyridine, lactone solvents such as r-butyrolactone, carbamates such as 48:52 mixtures of aminomethyl methyl esters and urethanes, water and the like. Except for the above colorant and dispersant, the photosensitive resist for a color filter of the present invention can be added with a cyclic carbonate group of -25 as with the above-mentioned photosensitive resin composition.-This paper size applies to Chinese National Standard (CNS) A4 Specifications (210 X 297 mm) 574619 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 i. Invention Description (24) Ring-opening catalyst, photopolymerization initiator, photosensitizer, reactive diluent, hardened contact Solvents, organic solvents, coupling agents or stabilizers such as antioxidants, UV absorbers, homogenizers, etc. In the photoresist for a color filter of the present invention, the cyclic carbonate group and carboxyl group of the vinyl polymer (A) can inhibit the reaction between the difunctional groups at normal temperature and the temperature exposed by preheating to the time of development. Stability can be maintained up to the pixel portion formation step. In the heating step after the pixel portion is formed, a cyclic carbonate group is reacted with a carboxyl group, and a crosslinked structure is introduced into the pixel portion, which can improve the solvent resistance, heat resistance, and mechanical characteristics of the pixel portion. In the last heating step, the cyclic carbonate group reacts with the carboxyl group and consumes the carboxyl group, which can improve the decrease in water resistance and chemical resistance of the coating film caused by the carboxyl group. Next, the manufacturing method of the color filter of the present invention will be described in detail. The color filter of the present invention is produced by forming a resist layer on a transparent substrate using the photosensitive resist for the color filter of the present invention, and providing the resist with a photomask provided with a pixel pattern for the color filter. Layer exposure, photo-curing the resist layer, developing the resist layer, forming a pixel portion, and heating the pixel portion to thermally harden the pixel portion. In this manufacturing method, when a solvent is contained in the photosensitive resist, after the resist layer is formed, in order to remove the solvent in the resist layer, it may be preheated at 50 to 15 (TC for about 1 to 15 minutes.) The color chip mainly includes a transparent substrate, a light-shielding pixel portion called a black substrate provided on the transparent substrate, and a light-transmitting pixel portion composed of three primary colors of red, green, and blue arranged on the light-shielding film. In the film method, the pixels forming the three primary colors of red, green, and blue are -26- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page)- -------- Order --------- AWI · 574619 V. Description of the invention (25, 'must be repeated three times: forming a resist layer, exposing the resist layer, developing, The step of heating. The transparent substrate includes, for example, a glass plate or a transparent plastic plate. The method for forming the photosensitive resist layer of the present invention on the surface of the transparent substrate is not particularly limited. For example, coating, transfer, etc. may be applied. For example, printing method, spraying method, roll coating method, spin coating method, etc. For printing, a photoresist can be pre-coated on a thin film substrate, and then transferred to a glass substrate to form a photoresist layer on the glass substrate. Exposure is applied to a transparent substrate. The shape of the photosensitive resist layer is performed by using a mask having a pixel pattern for a color filter, using a high-pressure mercury lamp, etc. With this exposure, the photosensitive resist layer is light-cured. The development is to make the photosensitive resist The layer is in contact with the developing solution. With this developing method, the carboxyl group in the unexposed portion can be dissolved in an alkaline aqueous solution to remove the unexposed portion. The developing method includes a full liquid method, an immersion method, and a liquid spray method. After development, rinse with running water and air dry with compressed air or compressed nitrogen to completely remove unnecessary unexposed parts to form pixel parts. The developing solution can be alkaline aqueous solution. The basic aqueous solution includes, for example, sodium hydroxide, Potassium hydroxide, sodium carbonate, sodium silicate, ammonia, ethylamine, n-propylamine, diethylamine, di-n-propylamine, triethylamine, methyldiethylamine, dimethylethanolamine, diethanolamine, triethanolamine, tetramethyl Ammonium hydroxide, tetraethyl Ammonium hydroxide, tetrabutyl argon oxide, pyridine, pyridine, 1,8-diazobicyclo [5.4 · 0] -7-undecene, 1,5-diazobicyclo [4 · 3 · 0] -5-nonane and other aqueous solutions. Where the above compounds are insoluble in water, the solution of organic solvents such as methanol, ethanol, isopropanol, etc. can be diluted with water to form an aqueous solution. -27- This paper size applies to China National Standard (CNS) A4 Specification (210 X 297 mm) (Please read the precautions on the back before filling this page) ---------------- I · Bureau of Intellectual Property, Ministry of Economic Affairs Printed by the employee consumer cooperative 574619 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Consumer Cooperative A7 B7 V. Description of the invention (26) After the pixel unit is formed, this pixel unit can use heating devices such as hot plates and ovens at a predetermined temperature, such as 100 ~ 250 ° C, heating for a predetermined time to thermally harden the pixel portion. By this heat curing, a pixel portion having excellent durability such as heat resistance, transparency, and hardness can be formed. The color filter obtained by the method of the present invention has durability and can be used as, for example, a color liquid crystal display, a color scanner, a solid-state imaging element, and the like. Examples Next, the present invention will be explained in detail using examples, but the present invention is not limited by these examples. Unless otherwise specified, the following "parts" and "%" are based on weight. For the performance test of the finished coating film, the following method is used. Measurement method and evaluation basis of component performance test Storage stability The 25 g of the photosensitive resin composition of the examples described below was transferred to a sealed glass container and stored at 40t for 24 hours. The viscosity was measured. The change rate from the initial viscosity was 0 is below 10%, and X is above 10%. Regarding the photosensitive resist in the examples described later, the same operations as described above were performed. Viscosity measurement was performed using an E-type viscometer manufactured by (Tequico). Development characteristics The photosensitive resin composition of the examples described later was spin-coated on a glass plate with a spin coater at 1,000 rpm for 9 seconds, and then dried at 6 ° C. for 5 minutes to form a coating film. The film was exposed with a high-pressure mercury lamp 200mJ / cm2 using a photomask with a set pattern, and developed in a 1.0 wt% carbonic acid aqueous solution at 30 ° C, and then washed with pure water. After this operation, the line width was evaluated to 20 -28- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)-installed -------- order --------- ^ _ wi (Please read the Please fill in this page again for attention) 574619 Α7 Β7 1. Description of the invention (27) Possibility of Vm pattern (residual). The same operation is also performed for the photosensitive uranium anti-oxidant of the examples described later. The patternable is 0, It cannot be X. The transparent resin is coated with the photosensitive resin composition of the following examples on a glass plate using a spin coater at 1000 rpm for 9 seconds, and then dried at 60 ° C for 5 minutes to form a coating film. After the above coating film was exposed with a high-pressure mercury lamp 200 mJ / cm2, padding was performed at 23 ° C for 15 minutes to harden the coating film. A hardened coating was formed. The absorption spectrum of the glass plate was measured based on the glass plate used, and the light transmittance in the range of 400 nm to 800 nm was measured. The photosensitive resist in the examples described later was performed in the same manner as above. The light transmittance of 95% or more was 0. 95% or less is X. Heat-resistance-1 The chromaticity (hereinafter referred to as Y 所得) of the hardened coating film obtained in the above-mentioned transparency test is measured by OSP-SP200, a micro-spectrophotometer manufactured by Olympus Corporation (At this time, Y 値 is Y1), secondly, the hardened coating film was heated at 28 (after 30 minutes of TC heating, the Y 値 of the hardened coating film was measured using the above device (Y 此时 is Y2 at this time). The hardened coating film was evaluated from the difference ΔY between Y1 and Y2 Heat resistance. This △ γ is 0.5 when it is 0.5 or less, and X when it is 0.5 or more. Heat resistance-2 The maximum light transmittance of the cured coating film obtained in the above-mentioned transparency test is measured using the above device. Second, the above cured coating film At 28 ° C after heating for 30 minutes, use the above device to measure the maximum light transmittance of the cured coating film. From the maximum light transmittance of the cured coating film before heating 値 (A) and the maximum light transmittance of the cured coating film after heating 値 (B) Change rate {[(Α-Β) / Α] χ100}, comment Hardened coating film-29- This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the phonetic on the back? Matters before filling out this page) I --------- Order --------- · Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 574619 V. Description of the invention (28) Heat resistance. This change rate is 0 when it is less than 5% and X when it is more than 5% For the measurement of the above maximum light transmittance, use the OSP-SP200 as described above. Chemical resistance 忡 -1 The cured coating film obtained in the transparency test described above was immersed in 23 ° CN-methyl-2-tetrahydropyrrolidone for 30 minutes. The boundary surface of the cured coating film after immersion was observed, and the boundary line was X when visual confirmation, and 0 when not possible. Chemical resistance part-2 The hardened coating film obtained by the above-mentioned transparency test was rubbed with a acetone under a condition of 25 t under a load of 0.5 kg by using a friction tester (product of Taiping Ricoh Chemical Industry Co., Ltd.), and it was evaluated that it reached the lower glass substrate. Number of frictions. The number of frictions at this time is X for 100 times or less, Δ for 100 to 300 times, 0 for 300 to 500 times, and ◎ for 500 or more times. Production Example 1: Preparation of a certain polymer (A) of ethylene In a four-necked flask equipped with a thermometer, a reflux cooling tube, a stirrer, and a nitrogen inlet tube, 425.0 parts of propylene glycol monomethyl ether acetate (hereinafter referred to as PGMAc) was charged, while stirring The temperature was raised to 90 ° C, and 82.0 parts of 2,3-carbonate propyl methacrylate (hereinafter referred to as CPMA) and 38.0 parts of methylpropionate (hereinafter referred to as MMA) were added dropwise within 1 hour. A mixed solution of 210.0 parts of benzyl acrylate (hereinafter referred to as BZMA), 97.0 parts of PGMAC 'and 16.5 parts of tertiary butyl peroxy-2-ethylhexanoate (hereinafter referred to as P-0). After the dropwise addition, keep at 90 ° C for 2 hours, then add P-01.7 parts, and then react at the same temperature for 7 hours to obtain the acid value of the resin solids (phenol content in 1 g of the sample, according to the prescribed method And the required number of milligrams of sodium hydroxide) is 7 5 mg Κ Ο H / g of vinyl polymerization -30-printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 574619 A7 B7 29 V. Description of the invention () Object (A-1 ). The nonvolatile matter (residual resin weight% after drying at 107.5 ° C for 1 hour) of the obtained resin solution was 40.7%, the Gardner viscosity was T ~ U, the number average molecular weight in terms of styrene was 5300, and Mw / Mn was 2.29 . System Example 2: Ibid. In Production Example 1, 8.0 parts of MAA3 was changed to 76.0 parts, 210.0 parts of BZMA was changed to 122.0 parts of BZMA, 17.0 parts of 2-hydroxyethyl methacrylate (hereinafter referred to as HEMA) and styrene 33.0 parts. In addition, the polymerization initiator changed P-O to 2,2'-azobis (2,4-dimethylvaleronitrile (hereinafter referred to as ADVN)), P-016.5 parts to ADVN 19.8 parts, and P- 01.7 parts was changed to 1.7 parts of ADVN, and the reaction temperature was changed from 90 ° C to 80 ° C. The mixed solution was added dropwise for 1 hour to 2 hours. The rest was the same as in Production Example 1. The acid value of the resin solids was 150 mgKOH. / g of vinyl polymer (A-2). The obtained resin solution has a nonvolatile content of 41.0%, a Gandner viscosity of X to Y, a number average molecular weight of 3700, and a Mw / Mn of 3.55. Production Example 3: Ibid. In Manufacturing Example 1, 82.5 parts of CPMA was changed to 25.0 parts of 3,4-carbonate butyl acrylate, 8.0 parts of MAA3 was changed to 49.5 parts, and 209.5 parts of BZMA was changed to 255.5 parts of methyl methacrylate. The polymerization initiator P-0 was changed to tertiary pentylperoxy-2-ethylhexanoate (hereinafter referred to as TAE), and 16.5 parts of P-0 was changed to 3.5 parts of TAE. The rest was the same as in Production Example 1. Resin solids A vinyl polymer (A-3) with a valence of 98 mgKOH / g. The obtained resin solution had a nonvolatile content of 41.2%, a Gandner viscosity of Z22 to Z3, a number average molecular weight of 1 1 500, and a Mw / Mn of 2.65. Production Examples 3: Copolymer for modulation and comparison-31- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 丨 丨 —— 丨 -1 丨 丨 1-1- 丨 丨 丨 丨 丨 丨 丨 Order.丨 丨 丨 丨 丨! · (Please read the precautions on the back before filling this page) 574619 V. Description of the Invention (3G) In Manufacturing Example 1, CPMA is not used in the mixed solution added dropwise, but 210.0 parts of BZMA is modified. It was 292.0 parts, and the rest was the same as in Production Example 1. A comparative copolymer (H-1) having an acid value of 75 mgKOH / g as the solid content of the resin was obtained. The non-volatile content of the obtained resin solution was 40.7%, and the Gandnen viscosity was Η The average molecular weight is 4800 and the dispersion Mw / Mn is 2.40. Production Example 4: The same reactor as in Production Example 1 was filled with 400.0 parts of PGMAC, heated to 80 ° C while stirring, and methyl was added dropwise within 1 hour. 66.4 parts of acrylic acid, 196.9 parts of MMA, 113.9 parts of glycidyl methacrylate and P-022.6 parts of mixed dissolved matter. , Hold at 80 ° C for 1 hour, add 0.34 parts of P-0, and then react at the same temperature. However, the reaction will thicken in about 3 hours after the monomer is dripped, so that it will finally gel and no comparative copolymer will be obtained. (H-2). Production Example 5: Same as in Production Example 1, except that 2,3-carbonate propyl methacrylate in the mixed solution was added dropwise to epoxy cyclohexyl methacrylate [Daisil Chemical Industry Co., Ltd. Product (Secero) 100]. In order to prevent the gelation reaction during polymerization, the reaction temperature was changed from 90t to 80 ° C, and the rest were reacted in the same manner as in Production Example 1. After adding P-0, the Gandner viscosity after 2 hours were all Z1 to Z2. At this time, the number average molecular weight was 1 1 700, and the Mw / Mn was 6.86. Then, P-0 was added to gradually increase the viscosity of the reaction solution, and the reaction was stopped after 5 hours to obtain a comparative polymer (H-3) having a resin solid acid value of 75 mgKOH / g. The obtained resin solution had a nonvolatile content of 40.7%, a Gandner viscosity of Z4 to Z5, a number average molecular weight of 12,700, and a Mw / Mn of 25.59, which became a polymer with a wider molecular weight distribution. -32- 574619 A7 B7 V. Description of the invention (31) Manufacturing example 6_: same as above (please read the note on the back? Matters before filling out this page) Fill the flask equipped with a thermometer, reflux cooling tube and stirrer. 187 parts of epoxy equivalent 187 parts of bisphenol A type epoxy resin, 72 parts of acrylic acid, 12 parts of triphenylphosphine, and the temperature was raised to 110 ° C while stirring. (: Reaction at this temperature until the acid value is 3 or less. Next, 152 parts of tetrahydrophthalic anhydride is added, and the reaction is performed at 100 ° C until the acid value is 137 to obtain a compound having both a carboxyl group and an unsaturated double bond. (H-4). A flask equipped with a thermometer, a reflux cooling tube, and a stirrer was filled with 110 parts of glycerol-α · monochlorohydrin, 1,000 parts of dimethylformamide, and 120 parts of sodium bicarbonate. During the stirring, the temperature was raised to 100 ° C, and the reaction was carried out at this temperature for 2 hours, and then the insoluble matter and the solvent were removed to obtain a viscous liquid of methylol-ethyl carbonate. Next, a flask equipped with a thermometer, a stirrer and a condenser was charged.塡 This is 1 18 parts of hydroxymethyl ethylene carbonate, and the temperature is raised to 60t during stirring, and the hexamethylene diisocyanate isotricyanate-type polyisocyanate (NCO% = 23.8) is added in a careful heating for 1 hour. %) 165 parts, and reacted. After 1 hour of reaction, it was confirmed by infrared absorption spectrum that the isocyanate group absorption was eliminated, and the target cyclic carbonate-based compound (H-5) was obtained. Example 1 Printed and manufactured by the Consumer Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs The vinyl polymer (Al) 100.O obtained in Example 1 After diluting with 220.0 parts of PGMAc, measure 40.0 parts of diisopentaerythritol hexaacrylate (hereinafter referred to as DPHA) and 1.2 parts of Irgacunel 84 (product of Ciba Specialty Chemicals Co., Ltd.). The filter material of m was filtered to obtain the photosensitive resin composition of the present invention. The storage stability of the composition was evaluated. The results are shown in Table 1. -33- This paper size is applicable to China National Standard (CNS) A4 (210 X 297) (Centi) 574619 V. Description of the invention (32) The solution obtained was spin-coated on a glass plate using a spin coater at 1000 rpm for 9 seconds, and then pre-dried at 60 ° C for 5 minutes to form a pre-dried coating film. After the coating film was exposed to 200 mJ / cm2 with a high-pressure mercury lamp, the coating film was hardened at 23 ° C for 15 minutes to evaluate the transparency, heat resistance, and chemical resistance of the coating film. The evaluation results are shown in Table 1. The dry coating film was exposed to 200mJ / cm2 with a high-pressure mercury lamp through a mask with a predetermined pattern, and then developed in a 1.0% by weight sodium carbonate aqueous solution at 30 ° C, and then washed with pure water. 2 0 // mg [case (residual) possibility (imaging features The results are shown in Table 1 m. Next, the pattern coating film was heated with a hot plate at 23 ° C for 15 minutes and cured. Examples 2-5 and Comparative Examples 1-4 were changed to tables Except for the substance shown in Example 1, the same operation as in Example 1 was performed to obtain a horizontal lipid composition, and then various tests were performed. The coating film properties are shown in Table 1 &#. -34- 574619 Five Comparative Examples: Inch 1 '1' 1 § S Guide, 280 (N 1-Η 1 1 〇X 〇1 〇 Good 〇〇1 1 1 1 〇1 1 1-H wear · | 220 | CN rH 1 hire XX 〇1 〇 Good 〇 (N condensed Gelled O 1 1 1 〇1 1 1 1-H guide · 220 (N i-H 1 1 〇OO1 X Microwave muscle 〇〇 Example § 2 _, r-H guide · 220 (N rH 1 1 〇〇〇〇 〇 Good 〇〇 inch 1 〇1 1 1 1 1 〇220 (N 1 1 〇〇〇〇〇 Good 〇〇cn 〇1 1 1 1 1 1 r—1 •? 220 < N 1- H 1 〇 〇 〇 〇 〇 〇 good 〇 〇 (N 〇 1 1 1 1 1 1 H guide · 220 (N TH (N o ο (N 〇 〇 〇 〇 〇 good 〇 ◎ 1 1 1 1 1 1 T- (220 (N TH 1 1 0 0 1 0 good 0 0 < < < HJJ 锲 锲 锲 锲 锲 锲 锲 锲 ι! Λ UX ΜΛ Ttr \ < V 镞 镞 龄 龄 龄 饪 _ _ _ slightly_ loose pine N3 ^ K) 1¾ N3 DPHA PETA PGMAc rH = tt W) | Vh Tetrabutylammonium bromide r-Methacryloxypropyltrimethoxysilane Storage stability Development characteristics Transparent heat resistance-1 Heat resistance-2 Coating film appearance after heat resistance test Chemical resistance-1 Chemical resistance Property-2 -35- 574619 V. Description of the Invention (34) Example 6 Using a high-speed disperser TSG-6H manufactured by Igarashi Machinery Factory, 25.0 parts of the vinyl polymer (A-1) solution prepared in Manufacturing Example 1 was used. CI 8.0 parts of No. 254 red pigment (primary particle size below 80nm), 8.0 parts of Dispar one 161 (resin-based dispersant) 2.5 parts of PGMAC, 64.5 parts of PGMAC dispersion, dispersed with oxidized particles, and dispersed at 2000 rpm for 8 hours To obtain a red pigment dispersion. Next, with respect to 100 parts of the red pigment dispersion liquid obtained above, 7.0 parts of DPHA was added, 0.3 parts of Irgacune 369 (manufactured by Ciba Specialty Chemicals Co., Ltd.) was mixed and filtered through a filter material having a pore size of 1.0 mm, to obtain the present invention. Photoresist. Next, 25 g of the obtained photosensitive resist was transferred to a closed glass container, and stored at 40 ° C. for 24 hours to evaluate storage stability. The obtained photosensitive resist was spin-coated on a glass plate using a spin coater at 1000 rpm for 9 seconds, and then pre-dried at 6 ° C. for 5 minutes to form a pre-dried coating film. The high-pressure mercury lamp was used for the pre-dried coating film. After exposure to 2G0mJ / Cm2, heat treatment was performed at 23 ° C for 15 minutes to harden the coating film, and evaluate the transparency, heat resistance and chemical resistance of the coating film. The evaluation results are shown in Table 2. For the above pre-dried coating film, Using a mask with a pixel pattern for a predetermined color filter, exposed to 100 mJ / cm2 with a high-pressure mercury lamp, and developed in a 0.5% by weight sodium carbonate aqueous solution at 30 ° C, and then washed with pure water to obtain a line width. The possibility (developing characteristics) of a 20 μm pattern (residual) was evaluated. Next, the obtained pixel portion was heat-treated at 230 ° C for 15 minutes and hardened. -36- 574619 V. Description of the Invention (35) Comparative Example 5 -6 Except that the materials shown in Table 2 were used instead, the same operation as in Example 6 was carried out, and a red pigment dispersion liquid was prepared to obtain a photosensitive resist. The same various tests were performed, and their properties are summarized in Table 2. Table 2 Fang g Example Comparative Example 6 5 6 7 Vinyl polymer solution A-1 25---Vinyl polymer solution A-2----Vinyl polymer solution A-3----Vinyl polymer solution H_1-25--Sensitive vinyl polymer solution H-2--- -Photovinyl polymer solution H-3--25-Anti-compound solution H-4---10 Etching compound solution H-5---7 agents C.1.254 red pigment 8 8 8 8 2.5 2.5 2.5 2.5 DPHA 7 7 7-PGMAc 64.5 64.5 64.5 79.5 Irg # 369 0.3 0.3 0.3 0.3 Storage stability 〇XX Development characteristics 〇XX Transparency 〇〇〇X Coating heat resistance-1 〇X 〇〇 Film heat resistance-2 〇X 〇〇 After heat resistance test, the appearance of the coating film is good. Microwave muscle is good. Good chemical resistance -1 〇〇〇〇 Chemical resistance-2 〇〇〇-37- 574619 A7 ___B7_ V. Description of the invention (36) Industrial use Valence Since the photosensitive resin composition of the present invention contains a cyclic carbonate group and a carboxyl group-based vinyl polymer, it has good storage stability and excellent transparency. Finally, the cyclic carbonate group and the carboxyl group are reacted to introduce a crosslinked structure to obtain heat resistance and heat resistance. Coating with excellent chemical resistance. It is used in coatings, printing inks, resists, etc., especially for color filters. Photoresist for cross-linked structure color filters, because it contains vinyl polymers with cyclic carbonate groups and carboxyl groups. As well as compounds having ethylenically unsaturated double bonds, a crosslinked structure can be introduced in the pixel portion of the color filter by light curing and thermal curing, and can be used to form a durable color filter pixel portion. The method for producing a color filter of the present invention can be used to produce a durable color filter by using the above-mentioned photosensitive resist for a color filter. (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

Claims (1)

574619- VI. Patent Application No. 9 0 1 0 7 1 8 6 "Photoresist Composition Etching Agent and Color Filter Manufacturing Method" Patent Case (Amended on January 6, 1992) The scope of six patent applications: 1. A photosensitive resin composition comprising: z R H2C = C R1 R2 // C-〇- • CH, • C-C · R3 〇〇, C II 〇 (Formula Where R represents a hydrogen atom or a methyl group, R1, R2, and R3 may be the same or different, and each represents a hydrogen atom or a C! -C4 alkyl group, and η is an integer of 1 to 6) 2 -oxygen-1,3- The monomers of difluorene-4 -yl and ethylenically unsaturated double bonds, and monomers having carboxyl and ethylenically unsaturated double bonds are the main components. The molecule obtained by copolymerization has at least one 2 (Meth) acrylic resin (A) of -oxy-1,3-dioxocene-4-group and at least one carboxyl group, and selected from trimethylolethane triacrylate, trimethylolpropane triacrylate Ester, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, isopentaerythritol tetra (meth) acrylate, isopentaerythritol tri ( Base) acrylate, diisopentaerythritol hexa (meth) acrylate, diisopentaerythritol penta (meth) acrylate, hexanediol di 574619 6. Patent application scope (meth) acrylate, trihydroxy Methylpropane tris (propylene ethoxypropyl) ether, tris (propylene ethoxyethyl) isotricyanate, tris (propylene ethoxyethyl) tricyanate, glycerol tri ( Compounds having at least two ethylenically unsaturated double bonds in the molecule of meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, and polyester (meth) acrylate (B) is the main component, and the content of the compound (B) having at least two ethylenically unsaturated double bonds in the molecule is 5 to 90% by weight. 2. The photosensitive resin composition according to item 1 of the application, wherein (meth) acrylic acid which has at least one 2-oxo-1,3-difluorenocane-4-yl and at least one carboxyl group in the molecule Ester resin (A), which is obtained by copolymerizing a 2-oxo-1,3-diphosphorane-4-yl group and an ethylenically unsaturated double bond monomer and (meth) acrylic acid represented by the general formula: (Meth) acrylic resin; and compound (B) having at least two ethylenically unsaturated double bonds in the molecule, which is selected from the group consisting of trimethylolpropane tri (meth) acrylate, isoprene tetraol One or more compounds of (meth) acrylate, diisopentaerythritol hexa (meth) acrylate, and diisopentaerythritol penta (meth) acrylate. 3. The photosensitive resin composition according to item 丨 or 2 of the scope of application for a patent, wherein the molecule has at least one 2-oxo-1,3-diphosphone-4-yl group and at least one carboxyl (methyl ) Acrylic resin (A), which is a (meth) acrylic resin using a (meth) acrylate having a phenyl or phenoxy alcohol as a copolymerization component. 574619 6. Scope of patent application 4 • The photosensitive resin composition as described in item 3 of the scope of patent application, in which (meth) acrylate (meth) acrylate benzyl (meth) acrylate having a phenyl or phenoxy alcohol is used. 5. A kind of photosensitive resist for color filters, including: by the general formula: h2c = c c-〇 --- ch2 R1 R2 (Where R represents a hydrogen atom or a methyl group, R1, R2, and R3 may be the same or different, and each represents a hydrogen atom or an alkyl group, and η is an integer of 1 to 6).卩 W Maoyuan-4 -based and ethylenically unsaturated double bond monomers, and monomers with carboxyl and ethylenically unsaturated double bonds are the main components, and at least one of them is obtained by copolymerization. 2. (meth) acrylic resin (A) of oxo-1,3-dioxolan-4-yl group and at least one carboxyl group, and selected from trimethylolethane triacrylate, trimethylolpropane tri Acrylate, trimethylolpropane diacrylate, neopentyl glycol di (meth) acrylate, isopentaerythritol tetra (meth) acrylate, isopentaerythritol tri (meth) acrylate, diiso Pentaerythritol hexa (meth) acrylate, diisopentaerythritol penta (meth) acrylate, hexamethylene glycol di (meth) acrylate, trimethylolpropane tris (propenyloxypropyl) 574619 6. Scope of patent application: ether, tris (propylene ethoxyethyl) isocyanurate, tris (propylene ethoxyethyl) tricyanate, glycerin Tri (meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, and polyester (meth) acrylate have at least two ethylenically unsaturated double bonds in the molecule The compound (B) is the main component. The content of the compound (B) having at least two ethylenically unsaturated double bonds in the molecule is 10 to 70% by weight, and the content of the colorant (C) is 5 to 80% by weight. . 6 · The photosensitive resist for a color filter according to item 5 of the patent application, wherein the molecule has at least one 2-oxo-1,3-difluorenane-4-yl group and at least one carboxyl group ( A meth) acrylate resin (A), which is a monomer represented by the general formula: 2-oxy-1,3-difluorenane-4-yl group and ethylenically unsaturated double bond, and (meth) (Meth) acrylic resin obtained by copolymerizing acrylic acid; and compound (B) having at least two ethylenically unsaturated double bonds in one or more molecules, which is selected from trimethylolpropane tri (meth) acrylic acid One or more polymerizable compounds of esters, isopentaerythritol tetra (meth) acrylate, diisopentaerythritol hexa (meth) acrylate, and diisopentaerythritol penta (meth) acrylate. 7. The photoresist for a color filter according to item 5 of the scope of patent application, wherein the molecule has at least one 2-oxo-1,3-disenorane-4-yl group and at least one carboxyl group ( A meth) acrylate resin (A) is a (meth) acrylic resin using a (meth) acrylate having a phenyl or phenoxy alcohol as a copolymerization component. 8. If the photoresist is used for a color filter in item 6, 574619 6. Scope of patent application (Meth) acrylate resin (A) which has at least one 2-oxo-1,3 · dioxocane-4-yl group and at least one carboxyl group in the molecule. (Meth) acrylic acid esters of phenyl or phenoxy alcohols as (meth) acrylic resins with copolymerization components. 9 · The photosensitive resist for color filters according to item 7 of the patent application, in which a (meth) acrylic acid-based (meth) acrylic acid benzyl ester having a phenyl group and a phenoxy group is used. 10. The photosensitive resist for a color filter according to item 8 of the scope of patent application, in which a (meth) acrylate (meth) acrylate benzyl (meth) acrylate having an alcohol of a phenyl group and a phenoxy group is used. 11. The photosensitive resist for color filters according to any one of claims 5 to 10 in the scope of patent application, which forms a resist layer on a transparent substrate, and the resist layer has a color filter The sheet is exposed with a mask of a pixel pattern, the resist layer is light-cured, and the resist is developed to form a pixel portion, and then the pixel portion is heated to thermally harden the pixel portion.