TW565536B - Manufacturing method of quartz glass component - Google Patents
Manufacturing method of quartz glass component Download PDFInfo
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- TW565536B TW565536B TW91123052A TW91123052A TW565536B TW 565536 B TW565536 B TW 565536B TW 91123052 A TW91123052 A TW 91123052A TW 91123052 A TW91123052 A TW 91123052A TW 565536 B TW565536 B TW 565536B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/34—Wet processes, e.g. sol-gel process adding silica powder
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Abstract
Description
565536 —---襄號91123052 车月日 修正_ 五、發明說明(1) 本發明係與製作矽晶圓之周邊用品有關,更詳而言之 是指一種石英玻璃元件之製法者。 按’半導體產業用來生產矽晶圓之設備中,石英坩堝 (Quartz glass crucible) —直是必要元件之一,半導 體產業對於石英掛堝之石英_純.度要求一般皆在9 9 · 9 9 %以 上’單晶製造廠亦堅持石英坩堝應呈現透明、無氣泡之型 態及不含白矽石(Cristabol i te)微晶粒之品質要求。此 外’高純度之石英玻璃膜在現代化微機電(M i c r〇-electronics)產業中亦是生屢微晶片的基本元件,甚 至’新一代之晶片製程中對,於石英玻璃純度的要求更達到 9 9 · 9 9 5% 。對於傳統非晶質石英製品而言,即使在生產技 術尚未達到9 9 · 9 9 5%的高純度之前,石英製品也因其優異 之耐熱震性(T h e r m a 1 s h 〇 c k r e s i s t a n c e )與物理化學性 質而普遍使用於電子工業與化學工業中,石英製品可以被 認定是一種具高經濟價值之工業用必需品。 就石英元件之製造方法而言,相關之專利前案如中華 民國公告第4 0 6 1 7 6號、第2 5 4 9 2 1號、第3 2 0 6 2 6號、第 440548號等專利案,及美國第6381986B1號、第635587B1 號、第 6012304號、第 5389582號、第 5053359號、第 4 7 8 9 3 8 9號、第 4 747 8 6 3號、第 4 5 7 2 7 2 9 號、第 4 0 7 248 9號、 第 3 8 3 7 8 2 5 號、第 3 7 7 5 0 7 7號、第 3 7 6 3 2 9 4號與第 3 5 3 5 8 9 0 號 等…··等專利案所示。傳統製作石英元件之方法多使用鑄 漿法(S 1 i p c a s t i n g )或熱旋炼結法(R 〇 t a t i n g a r c -f u s i ο n m e t h o d )。就鑄漿法而言,其所使用之原料多半 是石英玻璃粉體,調漿後鑄入石膏模中成型,脫模後經2565536 ----- Xiang No. 91123052 Car Moon Day Amendment _ V. Description of the Invention (1) The present invention relates to the manufacture of peripherals for silicon wafers, and more specifically refers to a method for manufacturing a quartz glass element. According to the semiconductor industry's equipment used to produce silicon wafers, Quartz glass crucible — straight one of the necessary components, the semiconductor industry for quartz hanging pot quartz _ pure. Degree requirements are generally 9 9 · 9 9 % 'Single crystal manufacturers also insist that the quartz crucible should be transparent, non-bubble, and free of microcrystalline grains (Cristabol i te). In addition, 'high-purity quartz glass film is also a basic component of microchips in the modern micro-electromechanical (Micro-electronics) industry, and even' new-generation wafer processes require that the purity of quartz glass reach 9 9 · 9 9 5%. For traditional amorphous quartz products, even before the production technology has reached a high purity of 9 · 99 · 95%, quartz products have excellent thermal shock resistance (Therma 1 sh 〇ckresistance) and physical and chemical properties. And it is widely used in the electronics industry and the chemical industry. Quartz products can be regarded as a kind of industrial necessities with high economic value. With regard to the manufacturing method of quartz elements, related pre-patent cases are patents such as the Republic of China Announcement No. 4 0 6 1 7 6, No. 2 5 4 9 2 1, No. 3 2 0 6 2 6, No. 440548, etc. Case No. 6381986B1, No. 635587B1, No. 6012304, No. 5385882, No. 5053359, No. 4 7 8 9 3 8 9 No. 4 747 8 6 No. 3, No. 4 5 7 2 7 2 9 No. 4 0 7 248 9 No. 3 8 3 7 8 2 5 No. 3 7 7 5 0 7 7 No. 3 7 6 3 2 9 4 No. 3 5 3 5 8 9 0 etc. … And so on. The traditional methods for making quartz elements mostly use the slurry method (S 1 i p c a s t i n g) or the thermospinning method (R 0 t a t i n g a r c -f u s i ο n m e t h o d). As far as the casting method is concerned, most of the raw materials used are quartz glass powder. After mixing, it is cast into a gypsum mold for molding.
第5頁 565536 案號 91123052 年 月 曰 修正 五、發明說明(2) 至3天乾燥形成多孔質石英生坏,石英生坏經素燒後再置 於通有氦氣之感應電爐中燒結致密,燒結溫度通常高於 1 7 2 0 °C ,時間約為6至1 5分鐘之間。上述乃現行半導體工 業所使用之矽單晶爐中石英坩堝與半導體製程中酸洗用之 大型石英槽之典型製作方式。、而就熱旋熔結法而言,係將 石英漿料置於模具中,再將盛有石英漿料之模具旋轉加 熱,使石英熔結成型,此種方式僅限於生產圓管或環狀之 石英元件,並不適用於製造板狀、托盤狀或有底之容器及 非對偁環狀之器件。目前幾乎所有的半導體矽晶成長用石 英坩堝都是用傳統鑄漿法或熱、旋熔結法所製造的,由於製 程之限制,此二種方法所製造石英坩堝其石英純度一般介 於9 9. 9 5%與9 9. 9 9%之間,純度無法再提升。 其次,傳統鑄漿法係使用多孔質吸水樹脂模具或石膏 模作為脫水與成型工具,由於多孔質吸水樹脂模具之價格 較為昂貴,影響生產成本,因此使用者不多,而石膏模由 於加工方便、成本低、吸水性佳,在過去半個世紀中幾乎 無其他材料可取代其作為陶·究漿料脫水成型之模具,惟, 當半導體產業對於矽晶圓之微細加工逐漸朝向更細小化發 展時,對於石英元件之純度與精度要求亦愈高,此時以石 膏模作為成型介質將產生以下缺點:首先,漿料之酸鹼度 (PII值)必須控制於7以上,此乃因石膏模不適於酸性之 環境,對石膏材料而言,最,佳之酸鹼值約在7. 5附近,此 一限制將造成調製超微細石英粉體時顆粒度與結膠性質之 限制。其次,生產高純度(99· 9 9 5% )石英元件時,石膏 模會成為石英元件之污染源,除非先以石膏模翻製石英玻Page 5 565536 Case No. 91123052 Amendment V. Description of the invention (2) The porous quartz is dried and formed within 3 days, and the quartz is damaged and then placed in an induction electric furnace with helium gas for sintering and compaction. The sintering temperature is usually higher than 1720 ° C, and the time is about 6 to 15 minutes. The above are typical manufacturing methods of quartz crucibles in silicon single crystal furnaces used in the current semiconductor industry and large quartz tanks for pickling in semiconductor processes. As far as the thermal spin fusion method is concerned, the quartz slurry is placed in a mold, and the mold containing the quartz slurry is rotated and heated to form the quartz fusion. This method is limited to the production of round tubes or rings. The quartz element is not suitable for manufacturing plate-shaped, tray-shaped or bottomed containers and non-opposed ring-shaped devices. At present, almost all of the quartz crucibles for semiconductor silicon growth are manufactured by the traditional casting method or thermal and spin fusion. Due to process limitations, the quartz crucibles produced by these two methods generally have a quartz purity of 9 9 . Between 9 5% and 9 9. 9 9%, the purity can no longer be improved. Secondly, the traditional casting method uses a porous water-absorbent resin mold or gypsum mold as a dehydration and molding tool. Since the price of the porous water-absorbent resin mold is relatively expensive and affects production costs, there are not many users. Low cost and good water absorption. In the past half century, almost no other materials can replace it as a mold for ceramic and slurry dehydration molding. However, when the semiconductor industry's micro-processing of silicon wafers is gradually moving towards smaller dimensions, The requirements for the purity and accuracy of quartz components are also higher. At this time, using a gypsum mold as a molding medium will produce the following disadvantages: First, the pH value of the slurry (PII value) must be controlled above 7 because the gypsum mold is not suitable for acidity. The environment, for gypsum materials, the best pH value is around 7.5, this limitation will cause restrictions on the particle size and cementation properties of the ultrafine quartz powder. Secondly, when producing high-purity (99.995%) quartz elements, the plaster mold will become a source of contamination for the quartz element, unless the quartz glass is first converted by the plaster mold.
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皇号l 91123052 五、發明說明(3) 英玻!模製造石英元件,如此才能避免石英 者:二::i…惟,如此做法甚不符經濟效益。再 (45。二下有度不夠、.使用壽命短、不耐高溫 (4 5 0 C以下)、乾燥速度慢諸缺點。 ^ ί發:之:要目的即在提.供一種可解決前揭缺失之石 央玻璃兀件之‘法,其係利用凝膠鑄漿法(〇 e丄 casting)配合使用非吸水性塑膠模具成型出高純度之石 奂玻璃元件者。 、 本發明之:一目的在於提供一種石英坡璃元件之製 法’其模具之製作成本低廉者。 本發明之又—目的在於提供_種石英玻璃元件之製 =其無水份乾燥過程’淨成型(Net_shape f〇rming) 旎力佳者。 本發明之再一目的在於提供 _ ., 法,其製程時間較習知技術種石英玻璃元件之製 緣是,為達成前述之目的, 璃元件之製法,其步驟包含有a本發明係提供一種石英玻 英破璃砂與純水;b ·將石英坡墦備置預定比例之高純度石 定時間;c ·於石英玻璃砂與純水砂與純水予以混合研磨預 溶凝膠;d·備置以非吸水性材^ =混合物中添加有機金屬 作,俾藉由水解反應將所形成=製成之模具進行鑄漿之動 體膠合而形成生坏;e·取出生坏矽氧鍵結將石英玻璃砂粉 動作並持續顇定之時間;f ·乾進行第一段低溫加熱之 溫加熱之動作而成為熟坏;g.將後之生坏再進行第二段中King l 91123052 V. Description of the invention (3) Yingbo! Quartz elements can be manufactured by molds, so that quartz can be avoided. Two :: i ... However, this approach is not very economical. (45. Second, there are insufficient degrees, short service life, high temperature resistance (below 4 50 C), slow drying speed, and other shortcomings. ^ Fat: The main purpose is to provide. Provide a solution to solve the problem The method of the missing Shiyang glass components is to use the casting method (〇e 丄 casting) in combination with non-water-absorbing plastic molds to form high-purity stone 奂 glass elements. 本 This invention: one purpose The purpose is to provide a method for manufacturing a quartz sloped glass element whose manufacturing cost is low. Another aspect of the present invention is to provide _ a kind of quartz glass element manufacturing = its moisture-free drying process 'Net_shape fomming' 旎Li Jia. Another object of the present invention is to provide _., Method, the process time of which is longer than that of the conventional technology quartz glass element. In order to achieve the aforementioned purpose, the glass element manufacturing method includes a method. The invention is to provide a quartz glass blasting sand and pure water; b. Set the quartz slope to a predetermined proportion of high purity stone for a fixed time; c. Mix and grind the pre-dissolved gel with quartz glass sand, pure water sand and pure water ; D · Provision for non-absorbent The material ^ = organic metal is added to the mixture, and the formed mold is subjected to agglutination of the casting mold by hydrolysis reaction to form raw and bad materials; e. Take out the raw and bad silicon-oxygen bond and place quartz glass powder Action and continue for a fixed period of time; f · dry and perform the first stage of low temperature heating and heating operation and become cooked; g. The next stage of the bad and then go to the second stage
預定之時間即可得燒結致密之 热坏予以高溫燒結並持續 — —— ,石英元件者。 565536 MM 91123052 年 月 曰The sintered compact heat damage can be obtained at a predetermined time to be sintered at high temperature and continued — ——, quartz components. 565536 MM 91123052
五、發明說明(4) 此外,h本發明更提供另一,種石英玻璃元件之製法, 先備置預定比例之有機金屬溶凝膠、高純度石英坡璃別糸广 純水,先將有機金屬溶凝膠與純水予以混合後,再添/與 英玻璃◊ γ復備置以非吸水性材質製成之模具進行鑄漿 :U藉由水解反應將所形成之矽氧鍵結將石英玻,砂 之乾燥動作並持嘖出生進行第一段低溫加熱 二段中溫加熱時間’缝燥後之生坏進行第 溫燒結並持續預定:::而成為熟坏’最後將熟坏予以高 者。 寺間即可得燒結致密之石英元件製品 以下,茲舉太發日Η + 步之詳細說明如后:一較佳實施例,並配合圖式作進一 圖式簡單說明: 圖一係本發明一鲂 — 圖二係顯示改變催佳Λ施例Λ流程圖。 影響之變化圖,苴中,^ |重里對於製程中生坏機械強度 圖三係顯—二傲,石英玻璃粉重量為20g。 強度影響之變二g Tf玻璃粉重量對於製程中生坏機械 圖四係顯示:變;!,催化劑重量為,。 密度影響之變化^ 玻璃粉重量對於製程中生坏相對 圖五係顯二:!:·催痛量為 影響之變化圖,盆中 圳重、里對於製程中生坏相對密度 圖六係顯示改ί石:量為 密度影響之變化gj , t ^璃叙重里對於製程中素坏相對 圖七係顯示改變催彳,催化州重里為〇.]25g。 ——重量對於製裎中素坏相對密度V. Description of the invention (4) In addition, the present invention also provides another method for manufacturing a quartz glass element, firstly preparing a predetermined proportion of an organometallic sol gel, high-purity quartz slope glass, and purifying pure water. After the sol gel is mixed with pure water, add / remove the glass with a mold made of non-water-absorbent material to make a slurry: U The quartz glass is formed by the silicon-oxygen bond formed by the hydrolysis reaction, The drying action of the sand is carried out, and the first stage of low temperature heating and the second stage of medium temperature heating time are performed. 'The badness after the seam is dried is sintered at the first temperature and continues to be scheduled ::: and becomes cooked.' Finally, the cooked is given higher. You can get sintered and compact quartz element products below. Here is a detailed description of the steps of Taifa Sundial + Steps: A preferred embodiment, combined with the drawings to make a simple explanation: Figure 1 is a part of the present invention.鲂 — Figure 2 shows the flow chart of the change-promoting Λ embodiment Λ. The effect of the change diagram, 苴 中, ^ | Zhongli on the mechanical strength of the production process is shown in Figure 3-Erao, quartz glass powder weight is 20g. The effect of change in strength on the weight of two grams of Tf glass powder for the mechanical failure during the manufacturing process The catalyst weight is. Changes in the effect of density ^ The weight of glass powder is relative to the quality of the process. : · The amount of pain relief is the effect of the change, the relative density of the production and the bad during the process is shown in the sixth series. The stone is the change of the effect of the density gj, t ^ Li Xuzhong is bad for the process. Relative to the seventh series, the change reminder was catalyzed, and the catalytic state weight was 25 g. ——Weight relative density
第8頁 565536 ____ 案號 _年月 曰 修走_ 五、發明說明(5) 丨 景’響之變化圖,其中,石英玻璃粉重量為2 0 g。 圖八係本發明所使用模具表面預刻之紋路(凸紋)。 圖九係本發明製程中石英生坏表面所翻製之紋路(凹 紋)。 圖十係對於本發明之TGA熱重分析圖。 圖十一係對於本發明之DTA熱差分析圖。 圖十二(A)係本發明生坏(Green body)之顯微結 構圖。 圖十二(B)係本發明素坏(Sintering body 8 5 0 )之顯微結構圖。 圖十一(C )係本發明成品(F u s i ο n b 〇 d y )之顯微結 構圖。 首先’請參閱圖一所示,本發明一較佳實施例石英玻 5离元件之製法係包含有以下之步驟: ^先,第一步驟係取9 9 · 9 9%之石英玻璃砂及去離子 之純水作為原料,石英玻璃砂與純水之重量百分率大於 8 0 w t % ; 第二步驟係將石英玻璃砂與純水置於球磨罐中予以球 磨不超過3 6小時,俾將原料混合研磨成石英玻璃砂泥漿; 弟一步驟係將以四乙基氧石夕燒(T e t r a e t h y 1 orthosilicate,TE〇s)所基.礎所形成之溶凝膠(或二氧 化夕有枝孟屬醇氧烧所形成之〉谷凝膠)添加於石英玻璃砂 泥聚中’其中,【四乙基氧矽烷(TE〇s)有機金屬添加 劑】/水之莫耳比例係小於20;Page 8 565536 ____ Case No. _ Year Month Revision_ V. Description of the Invention (5) 丨 Jing's change chart, in which the quartz glass powder weighs 20 g. FIG. 8 is a pre-engraved texture (convex) on the surface of the mold used in the present invention. Figure 9 is the texture (concave) of the quartz surface during the process of the invention. FIG. 10 is a thermogravimetric analysis chart for the present invention. FIG. 11 is an analysis chart of the DTA thermal difference of the present invention. Fig. 12 (A) is a microstructure diagram of the green body of the present invention. FIG. 12 (B) is a microstructure diagram of the present invention (Sintering body 850). FIG. 11 (C) is a microstructure view of a finished product (F u s i ο n b 0 d y) of the present invention. First, please refer to FIG. 1. A preferred embodiment of the present invention is a method for manufacturing a 5 glass quartz crystal element including the following steps: ^ First, the first step is to take 9 9 · 9 9% of quartz glass sand and remove Ion pure water is used as raw material. The weight percentage of quartz glass sand and pure water is greater than 80 wt%. The second step is to place the quartz glass sand and pure water in a ball mill tank for ball milling for no more than 36 hours. Mix the raw materials. Grinded into quartz glass sand slurry; the first step is based on the sol-gel (or bismuth alcohol) formed by tetraethy 1 orthosilicate (TE0s). Oxygen fired formation> Valley gel) added to the quartz glass sand and mud polymer 'wherein, [tetraethyloxysilane (TE0s) organometallic additives] / water mole ratio is less than 20;
第9頁 565536 _累號 91123052 ·ΜΙ. .1 五、發明說明(6) 第四步驟係於原料中添加與四乙基氧矽燒(TE0S)量 略同之醇類共溶劑(MUTUAL S0LVENT),以及適量 = 催化劑。 , 1王 ^第五步驟係備置以非多孔性(非吸水性)材質製成之 杈具,如塑膠模具,進行鑄漿之動作,俾四乙基氧矽烷 (TE0S)有機金屬溶凝膠可·與石英玻璃砂泥漿於模具中 =行水解反應,進而發生聚合反應而形成無機高分'子聚人 j丄俾應用所形成之石夕氧鍵結將石英玻璃砂粉體膠合而: 广上前揭生坏之粉體間係以化學鍵鍵結並輔以物理引 7 ’如虱鍵與凡得瓦力,而塑膠材料可為聚乙#、 或聚碳酸樹脂類等常用塑膠;' 希 第六步驟係將生坏取出置於烘箱中, 至1 20t以下並保持溫度4小.時以 ./里、漸升溫 第七步驟係將乾燥後之生坏置方':將ί坏予以乾燥; 不置方;熱阻式雷室φ綠墙 溫至85(TC並保持溫度2-3小時,俾將古她^ …中、.友&升 而素燒成為熟坏; "牟將有機物確實氧化排除 最後,將素燒之熟坏置於高、、 少量水蒸氣於20分鐘内升溫至^爐I並通入氨氣與 鐘,俾進行高溫燒結之動作,藉 上並,溫10_25分 石笨姑减分4制口 4* — : 「可獲得燒結致密之 石央玻璃兀件製品,本實施例為石英坩 對於本發明中生坏、素坏及製〇 ^ 析如下·· 汉表°口之物理化學性質茲分 一、生坏機械強度測量:' 如圖二及圖三所示,以万約 — I 一田〶A,土 ρ、 n 疋夠之浴膠【丁EOS/MTMS (甲 基二甲乳基石圭烷)=0·2〜〇.3之 __ 吳斗百分率之比例混合,混 11111 1 1 Μι""' 1 __ m 第ίο頁 565536 __ 案號 91123052_^年月曰__ 五、發明說明(7) 合液再與去離子純水以約1 : 1 · 6之莫耳百分率比混合】加 入2 0 g石英玻璃粉體至完全濕潤,接著固定溶膠與粉體之 數量,改變鹼性催化劑(DMA, DI-METHY AMIUE,二甲基 銨)之數量,以等比例遞增,(0.06g、0.125g、0.25g、Page 9 565536 _ tired number 91123052 · MI. .1 V. Description of the invention (6) The fourth step is to add an alcoholic co-solvent (MUTUAL SOLVENT) with the same amount of TEOS as the raw material. , And the right amount = catalyst. 1 King ^ The fifth step is to prepare a branch made of non-porous (non-absorbent) material, such as a plastic mold, to perform the casting action. Tetraethyl ethoxysilane (TE0S) organometallic sol gel can be used. · Quartz glass sand mud in the mold = hydrolysis reaction, and then polymerization reaction occurs to form inorganic high-scoring 'zijuren j 丄 俾 application of the stone Xi oxygen bond to glue the quartz glass sand powder: 广 上The previously exposed bad powders are chemically bonded and supplemented by physical bonds such as lice keys and van der Waals, and the plastic material can be polyethylene #, or polycarbonate plastics; and so on; The six steps are to take out the raw materials and put them in an oven, and keep the temperature below 1 20t and keep the temperature for 4 hours. The temperature is gradually increased. The seventh step is to dry the raw materials after the drying process. No square; thermal resistance mine room φ green wall temperature to 85 (TC and maintain the temperature for 2-3 hours, 俾 will be ancient ^……… Friends & rise and become burned; " Mou organic matter does At the end of the oxidation elimination, the cooked simmered meat is placed in a high, small amount of water vapor to rise to the furnace I in 20 minutes, and the Gas, bell, and cymbal perform high-temperature sintering. With the help of the temperature, the temperature of 10-25 minutes is reduced by 4 minutes. 4: — "Sintered dense Shiyang glass components can be obtained. This example is a quartz crucible. The physical, chemical, and chemical properties of the present invention are as follows: The physical and chemical properties of Hanbiao ° are divided into one, and the mechanical strength is measured as shown in the following figure: Tian 〶A, soil ρ, n 疋 enough bath gel [butyl EOS / MTMS (methyl dimethyl lactyl guanyl guanidine) = 0. 2 ~ 0.3 of __ Wu Dou percentage ratio mixing, mixing 11111 1 1 Μι " " '1 __ m p.565565 __ Case No. 91123052_ ^ 年月 月 __ V. Description of the invention (7) The liquid mixture is mixed with deionized pure water at a molar ratio of about 1: 1 to 1.6 ] Add 20 g of quartz glass powder to complete wetting, then fix the amount of sol and powder, change the amount of alkaline catalyst (DMA, DI-METHY AMIUE, dimethyl ammonium), increase in equal proportions, (0.06g , 0.125g, 0.25g,
0 . 5 g、1 g ),測試鹼性催化劑對於生坏強度之影響。實驗 結果得知,催化劑【二甲基銨(DMA )】增加1 g時,生坏 機械強度最高,但生坏嚴重變形(彎曲)、表面呈現龜 裂,不符合品質,而添加催化劑(DMA) 0· 125g時,生坏 機械強度位居第二,生坏表.面呈現光滑、無龜裂,且生坏 無彎曲。 二、 生坏相對密度測量: 測試方法係以水銀為媒介的阿基米德法,將生坏切成 約1 cm X 1 cm的試片,放入水銀中再用升降儀將試片壓入水 銀中測得生坏密度,生坏相對密度=生坏密度+矽砂理論 密度(2· 65g/cm 3 ) X 1 00% ,、固定凝膠和粉體重量,改變 催化劑之比例可得如圖四所示之結果,若固定凝膠和催化 劑(DMA0. 1 25g)之重量而改變粉體重量則可得如圖五所 示之結果。0.5 g, 1 g), to test the effect of alkaline catalysts on the strength of failure. The experimental results show that when the catalyst [dimethylammonium (DMA)] is increased by 1 g, the mechanical strength of the raw materials is the highest, but the raw materials are severely deformed (bent), and the surface is cracked, which does not meet the quality, and the catalyst (DMA) is added. At 0 · 125g, the mechanical strength of the raw material is the second, and the surface of the raw material is smooth, without cracks, and without bending. Measurement of relative density of birth and death: The test method is the Archimedes method with mercury as the medium. The birth and death are cut into test pieces of about 1 cm X 1 cm, put into mercury, and then the test pieces are pressed in with a lifter. Density of raw and bad measured in mercury, relative density of raw and bad = raw and bad density + theoretical density of silica sand (2 · 65g / cm 3) X 100%, fixed gel and powder weight, changing the ratio of catalyst can be obtained as The results shown in Figure 4, if the weight of the gel and catalyst (DMA0. 1 25g) is fixed and the powder weight is changed, the results shown in Figure 5 can be obtained.
三、 素坏相對密度測量:. 將素坏置於底部加墊金屬網之燒杯中,俾隔離素坏與 燒杯,加入蒸餾水,水面至少超過素坏3cm,加熱至沸騰 保持2小時,再冷卻至室溫。視密度(不含開孔孔隙之密 度值)測試方法是以水為媒介之阿基米德法,測試結果如3. Relative density measurement of plains: Put plains in a beaker with a metal net at the bottom, and isolate the plains and beakers, add distilled water, the water surface should be at least 3cm above the plains, heat to boiling for 2 hours, and then cool to Room temperature. The apparent density (density value without open pores) test method is Archimedes method with water as the medium. The test results are as follows
第11頁 565536 _案號 91123052_年月曰_ί±^_ 五、發明說明(8) 圖六與圖七所示。 四、 細微結構複製: 為探究凝膠鑄漿法所翻‘製之坏體是否具有表面刻紋之 複製能力,遂取一表面印有浮凸文字之模具進行翻製,並 以光學顯微鏡觀察,如圖八及圖九所示,係分別顯示原模 字樣與石英生坏上所翻製之字樣。實驗結果顯示,凝膠鑄 漿法可翻製出細微之刻紋。 五、 熱分析之檢測: 如圖十所示,製程中,當溫度在8 0 0 °C以後重量損失 (w t % )開始呈現平滑直線現象(即重量保持不變),實 驗結果顯示重量損失0. 5% ,如圖十一所示,當溫度在 8 0 0 °C左右亦同樣出現吸熱反應。實驗結果證明生坏要素 燒至8 5 0 °C才能完全去除催化劑(DM A ),主要目的係要提 升石英玻璃元件之良率,俾便 '於快速燒結縮短製程。 六、 掃描式電子顯微鏡(SEM)分析: 利用掃描式電子顯微鏡(SEM )觀察本發明各階段之 生坏、素坏及成品之表面結構,由圖十二(A )可明顯地 看出粉末顆粒只有相互接觸,.經由密度測量實驗得知,此 階段相對密度可達到5 5〜6 5% ’。而由圖十二(B )可發現孔 隙慢慢減少且晶粒已慢慢成長,此階段燒結後,可達到9 5 〜97 %相對密度。再由圖十二’(C)可清楚地看出石英坩堝 表面已完全緻密。Page 11 565536 _ Case No. 91123052_ Year month _ί ± ^ _ V. Description of the invention (8) Figures 6 and 7 are shown. 4. Microstructure replication: In order to investigate whether the bad body made by the gel casting method has the ability to reproduce surface engraving, a mold with embossed characters printed on the surface was used for reproduction and observed with an optical microscope. As shown in Fig. 8 and Fig. 9, it shows the original text and the reprinted text on the quartz. The experimental results show that the gel casting method can make fine engravings. 5. Detection of thermal analysis: As shown in Figure 10, during the manufacturing process, the weight loss (wt%) starts to show a smooth straight line phenomenon (that is, the weight remains the same) after the temperature is 800 ° C. The experimental results show that the weight loss is 0 5%, as shown in Figure 11, when the temperature is about 800 ° C, the endothermic reaction also occurs. The experimental results show that the catalyst (DM A) can be completely removed by burning the raw and bad elements to 850 ° C. The main purpose is to improve the yield of the quartz glass element, so as to shorten the manufacturing process by rapid sintering. 6. Scanning Electron Microscopy (SEM) Analysis: The scanning electron microscope (SEM) is used to observe the damage, failure, and surface structure of the finished product at each stage of the invention. From Figure 12 (A), the powder particles can be clearly seen. Only when they are in contact with each other, it is known through density measurement experiments that the relative density at this stage can reach 5 5 ~ 6 5% '. From Fig. 12 (B), it can be found that the pore space is gradually reduced and the grains have gradually grown. After sintering at this stage, a relative density of 95 to 97% can be reached. It can be clearly seen from Fig. 12 (C) that the surface of the quartz crucible has been completely dense.
第12頁 565536Page 12 565536
第13頁 565536 案號 91123052 年 月 曰 修正 五、發明說明(10) , 然不會產生傳統鑄漿法採用石膏模而導致污染石英玻璃元 件之問題。其次,非多孔性(非吸水性)塑膠模具之設計 與生產可應用目前國内現有塑膠模具業之能力,因此,相 較於習知技術,本發明可大幅降低製造石英玻璃製品之注 漿模具的難度與成本。 4. 石英砂之平均粒徑在1 0微米左右時,本發明之生坏 密度可達6 0 % ,此密度與使用之石英粉體粒徑有關,本發 明若使用次微米之石英粉體,生坏密度將可更提昇。其 次,本發明製程中生坏與素坏之表面光滑,可用於翻製微 細刻紋,若本發明使用次微米之石英粉體,更可用於翻製 光學級玻璃元件。 5. 本發明製法中,添加於石英玻璃砂漿料中之純水係 作為反應劑用,不作為溶劑。水分子會在水解反應與聚合 反應中消耗,因此,本發明之坏體成型後不含有水份,此 特色與習知製作方法不同。 6. 本發明製程中聚合反應、完成後形成生坏,生坏不會 沾附模具,可輕易脫模,並可完整複製模具内之圖案紋 路丄 7. 本發明之製法無水份乾燥之過程,在醇類蒸發過程 中僅會造成小於2%之收縮率。其相較於傳統鑄漿法由於 水分乾燥會導致1 0 -1 5%之收縮率,顯然本發明具有優秀 之淨成型(Net-shape forming)能力。 8. 本發明由石英粉體製漿至反應完成而得到可順利脫 模之生坏可於8小時内完成;而由石英粉體經製漿、反 應、成型、脫模、乾燥、素燒至燒結緻密等全部製程可於Page 13 565536 Case No. 91123052 Date of Amendment V. Description of the Invention (10), of course, the problem of contamination of quartz glass components caused by the use of gypsum molds in the traditional casting slurry method will not occur. Secondly, the design and production of non-porous (non-absorbent) plastic molds can be applied to the capabilities of the existing domestic plastic mold industry. Therefore, compared with the conventional technology, the present invention can greatly reduce the injection mold for manufacturing quartz glass products. Difficulty and cost. 4. When the average particle size of the quartz sand is about 10 microns, the density of birth and failure of the present invention can reach 60%. This density is related to the particle size of the quartz powder used. If submicron quartz powder is used in the present invention, The density of births and deaths will increase even more. Secondly, the surface of the bad and the bad in the process of the present invention is smooth and can be used for the micro-grain engraving. If the present invention uses the sub-micron quartz powder, it can be used for the optical-grade glass element. 5. In the production method of the present invention, the pure water system added to the quartz glass sand slurry is used as a reactant and not as a solvent. Water molecules are consumed in the hydrolysis reaction and the polymerization reaction. Therefore, the bad body of the present invention does not contain water after molding. This feature is different from the conventional manufacturing method. 6. In the process of the present invention, the polymerization reaction will form a bad product after the completion. The bad product will not adhere to the mold, can be easily demoulded, and can completely reproduce the pattern lines in the mold. 7. The process of the present invention without water drying In the process of alcohol evaporation, it will only cause a shrinkage of less than 2%. Compared with the traditional casting method, moisture shrinkage will cause a shrinkage of 10 -1 5%. Obviously, the invention has excellent Net-shape forming ability. 8. According to the present invention, the quartz powder system can be successfully demoulded within 8 hours from the completion of the reaction and the mold can be successfully demoulded; and the quartz powder can be pulped, reacted, shaped, demoulded, dried, and burned to All processes such as sintering and compacting can be performed in
第14頁 565536 _案號 91123052_年月日__ 五、發明說明(11) 2 4小時内完成,製作石英玻璃、元件之速度較傳統鑄漿法為 快。 . 綜上所陳,本發明所提供之石英玻璃元件之製法,其 以有機金屬溶凝膠為石英粉體之結合劑,以凝膠鑄漿法 (G e 1 c a s t i η g )及非吸水性模具可快速將石英粉體固結 成型,並可製作出高純度之石、英玻璃元件,具有模具成本 低與淨成型(Net-shape forming)能力佳之效果;緣 是,本發明確實符合發明專利要件,爰依法提出申請。Page 14 565536 _case number 91123052_ year month day__ V. Description of the invention (11) It can be completed within 4 hours. The speed of making quartz glass and components is faster than the traditional casting method. In summary, the manufacturing method of the quartz glass element provided by the present invention uses an organic metal sol gel as a binding agent for the quartz powder, a gel casting method (G e 1 casti η g), and non-absorbency. The mold can quickly consolidate the quartz powder, and can produce high-purity stone and glass components, which have the effects of low mold cost and good net-shape forming ability; the reason is that the present invention does meet the invention patent Requirements, apply in accordance with the law.
第15頁 565536 ^_案號 91123052 •年 月 日_ifi_ 圖式:簡單說明 圖一係本發明一較佳實施,例之流程圖。 圖二係顯示改變催化劑重量對於製程中生坏機械強度 影響之變化圖,其中,石英玻璃粉重量為2 0 g。 圖三係顯示改變石英玻.璃粉重量對於製程中生坏機械 強度影響之變化圖,其中,催化劑重量為2 0 g。 圖四係顯示改變石英玻璃粉重量對於製程中生坏相對 密度影響之變化圖,其中,催化劑重量為0. 1 2 5g。 圖五係顯示改變催化劑重量對於製程中生坏相對密度 影響之變化圖,其中,石英玻璃粉重量為2 0 g。 圖六係顯示改變石英玻璃粉重量對於製程中素坏相對 密度影響之變化圖,其中,催化劑重量為〇. 1 2 5 g。 圖七係顯示改變催化劑重量對於製程中素坏相對密度 影響之變化圖,其中,石英玻璃粉重量為2 0 g。 圖八係本發明所使用模具表面預刻之紋路(凸紋)。 圖九係本發明製程中石英生坏表面所翻製之紋路(凹 紋)。 圖十係對於本發明之TGA熱重分析圖。 圖十一係對於本發明之DTA熱差分析圖。 圖十二(A )係本發明生坏(G r e e n b 〇 d y )之顯微結 構圖。 圖十二(B)係本發明素坏(Sintering body 8 5 0 °C )之顯微結構圖。 圖十二(C )係本發明成’品(F u s i ο n b 〇 (i y )之顯微結 構圖。Page 15 565536 ^ _ Case No. 91123052 • Year Month Day _ifi_ Schematic: Brief description Figure 1 is a flow chart of a preferred embodiment of the present invention. Figure 2 is a graph showing the effect of changing the catalyst weight on the mechanical strength during the process. The weight of the quartz glass powder is 20 g. Figure 3 is a graph showing the effect of changing the weight of quartz glass and glass powder on the mechanical strength of the process. The catalyst weight is 20 g. Figure 4 is a graph showing the effect of changing the weight of the quartz glass powder on the relative density of the raw materials in the manufacturing process, in which the catalyst weight is 0.1 2 5g. Figure 5 is a graph showing the effect of changing the catalyst weight on the relative density of production and failure in the manufacturing process, in which the weight of the quartz glass powder is 20 g. Fig. 6 is a graph showing the effect of changing the weight of the quartz glass powder on the relative density of the sulfonate in the manufacturing process, wherein the catalyst weight is 0.1 2 5 g. Figure 7 is a graph showing the effect of changing the catalyst weight on the relative density of sulfonate in the manufacturing process, in which the weight of quartz glass powder is 20 g. FIG. 8 is a pre-engraved texture (convex) on the surface of the mold used in the present invention. Figure 9 is the texture (concave) of the quartz surface during the process of the invention. FIG. 10 is a thermogravimetric analysis chart for the present invention. FIG. 11 is an analysis chart of the DTA thermal difference of the present invention. FIG. 12 (A) is a microstructure diagram of the present invention (G r e n b o d y). Fig. 12 (B) is a microstructure diagram of a plain body (Sintering body 850 ° C) of the present invention. Fig. 12 (C) is a microstructure diagram of a product of the present invention (F u s i ο n b 0 (i y)).
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CN113277715B (en) * | 2021-04-23 | 2023-10-20 | 华南师范大学 | Method for manufacturing quartz glass device with complex structure |
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