TW557555B - Flip chip package having underfill materials with different Young's module - Google Patents
Flip chip package having underfill materials with different Young's module Download PDFInfo
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- TW557555B TW557555B TW091118257A TW91118257A TW557555B TW 557555 B TW557555 B TW 557555B TW 091118257 A TW091118257 A TW 091118257A TW 91118257 A TW91118257 A TW 91118257A TW 557555 B TW557555 B TW 557555B
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- semiconductor package
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/741—Apparatus for manufacturing means for bonding, e.g. connectors
- H01L2224/743—Apparatus for manufacturing layer connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/921—Connecting a surface with connectors of different types
- H01L2224/9212—Sequential connecting processes
- H01L2224/92122—Sequential connecting processes the first connecting process involving a bump connector
- H01L2224/92125—Sequential connecting processes the first connecting process involving a bump connector the second connecting process involving a layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- Wire Bonding (AREA)
Abstract
Description
557555557555
【發明領域】: 奉發明係關於一種牛導體封裝件,尤指一種以不 氏模數(Young,s Module)之填狀你哲、任J ^ r n , D 、 ; &填膠物質進行底部填膠作章 (Underhli Process)之覆晶式半導體封裝件(η下菜 ChipPackage)。 p 【發明背景】: 覆晶式球栅陣列技術(Flip Chip BaU &id a FCBGA)為一種改良之球柵陣列封裝技術,其較傳統y’ 體封裝技術進步者,在於封裝之半導體晶片係利用倒置 (Flipped),即以多數錫銲凸塊(s〇lder Bumps)將晶 片作用表面(Active Surface)朝下電性連接至基板,再 藉基板背面植設的多數銲球與外部裝置電性連結,以減 封裝成品的整體尺寸。 然而’運用覆晶方式將晶片置於基板特定位置後,晶 5與基板間會因錫銲凸塊之分隔,使得相鄰錫銲凸塊以及 晶片與基板之間存有空隙。如不將此覆晶底部間隙填滿, 則會因晶片與基板各具有不同的熱膨脹係數 (Coefficient 〇f Thermal Expansion, CTE),而在後 續製程之溫度循環(Temperature Cycle)產生熱應力 (Stress)差’導致銲結接合部(s〇ider Joint)出現裂 損(Crack)或電性失能(Electronic F a i 1 ur e )等缺 失。因此’ FCBGA型晶片封裝製程有一項必要的步驟,即 使用一如環氧樹脂(E p 〇 X y R e s i η )等絕緣性膠材填佈於 覆晶底部間隙内,而達到強化結構支撐(Mechanical[Field of the invention]: Feng invention is a kind of cattle conductor package, especially a filler with Young's Modulus (Young, s Module), and J ^ rn, D, & filling material for the bottom A flip-chip semiconductor package (η under the ChipPackage). p [Background of the Invention]: Flip Chip BaU & id a FCBGA is an improved ball grid array packaging technology, which is an improvement over the traditional y 'body packaging technology, which lies in the packaged semiconductor wafer system. By flipping, the majority of solder bumps are used to electrically connect the active surface of the wafer downward to the substrate, and then most of the solder balls planted on the back of the substrate are electrically connected to the external device. Connection to reduce the overall size of the packaged product. However, after using the flip-chip method to place the wafer at a specific position on the substrate, the solder bumps are separated between the crystal 5 and the substrate, so that there is a gap between the adjacent solder bumps and between the wafer and the substrate. If the bottom gap of this flip chip is not filled, thermal stress (Stress) will be generated in the temperature cycle of the subsequent process because the wafer and the substrate each have different thermal expansion coefficients (CTE). Poor 'causes a crack (Crack) or electrical disability (Electronic F ai 1 ure) to appear in the joint joint. Therefore, the FCBGA type chip packaging process has a necessary step, which is to use an epoxy resin (E p 0X y R esi η) and other insulating glue to fill the gap at the bottom of the flip-chip to achieve strengthened structural support ( Mechanical
16902.ptd 第5頁 557555 五、發明說明(2)16902.ptd Page 5 557555 V. Description of the invention (2)
Support )並減少短路產生之目的。 惟上述覆晶結構’如美國專利第5, 821,456號案所揭 不’晶片與基板之電性連結是由錫銲凸塊提供,該錫銲凸 塊本身為一錫鉛合金材質,因此將金屬材質凸塊回銲 (Reflow)到非金屬材質(如晶片)表面時,為提高銲塊 (Bumps )附著力’晶片的銲墊表面需要敷設一如鈦或鶴 化合物之金屬純化層(Metal Carrier or Passivation ),以防銲結接合部於高溫製程中受到破壞;再一方面, 晶片在線路形成階段使用金屬材質之錫銲凸塊,亦可能因 為半導體晶片、金屬鈍化層、錫銲凸塊以及基板間之CTE 差異較大,造成封裝體在溫度循環下產生不同熱應力而導 致基板平面度降低、在干結接合部破裂,甚至出現晶片裂損 (Die Crack)等問題,此現象對大晶片或大尺寸封裝件 的影響更為顯著;另外,錫鉛材質之銲塊在熔融過程 (Melting)中在在生成如導電性助鲜劑(Electrically Conductive Flux)等非預期副產物而損及銲結接合部的 結構強度,基於此等原因,業者遂有以導電性聚合物 (Conductive Polymer)取代錫鉛合金的構想產生。 美國專利第 5,237, 130號"Flip Chip Technology Using Electrically Conductive Polymers AndSupport) and reduce the purpose of short circuit. However, the above-mentioned flip-chip structure is not disclosed in US Patent No. 5, 821,456. The electrical connection between the chip and the substrate is provided by a solder bump, which is a tin-lead alloy material, so When reflowing metallic bumps to the surface of non-metallic materials (such as wafers), in order to improve the adhesion of the bumps, the pad surface of the wafer needs to be provided with a metal purification layer (such as titanium or crane compounds). Carrier or Passivation) to prevent solder joints from being damaged during high-temperature processes; on the other hand, the wafer uses metal solder bumps during the circuit formation stage. It may also be caused by semiconductor wafers, metal passivation layers, and solder bumps. And the CTE difference between the substrates is large, which causes the package to generate different thermal stresses under temperature cycling, which causes the substrate flatness to decrease, cracks at the dry junctions, and even die cracks. This phenomenon is large. The impact of wafers or large-size packages is more significant; in addition, soldering tin-lead materials are generating, for example, Electrically Conductive Flux during the melting process (Melting). ) And other unintended by-products that impair the structural strength of the solder joints. For these reasons, the industry has the idea of replacing conductive tin (Pb) alloys with conductive polymers. U.S. Patent No. 5,237,130 " Flip Chip Technology Using Electrically Conductive Polymers And
Dielectrics 及第 6, 138,348號"Method Of FormingDielectrics & No. 6, 138, 348 " Method Of Forming
Electrically Conductive Polymer Interconnects On Electrical Substrates”揭露一種以導電性聚合物作為鲜 塊材質之半導體封裝件,冀藉由聚合物材質降低晶片與基"Electrically Conductive Polymer Interconnects On Electrical Substrates" unveiled a semiconductor package using conductive polymer as a fresh block material.
16902.ptd 第 6 頁 557555 五、發明說明(3) 板間之熱應力差來減少上述問題 :半導體封裝件2是在一基板2〇(:晶片22)第之面 上形成多數銲墊m( 222 ),藉由網版印刷…咖表面 Pnntmg)、模版印刷(stenciu 導電性填料(Conductive FiUe g 2:f:將混有 銲墊204 ( 222 )表面上形成導雷=有機聚合物佈設到 B卿s),供基板20與晶片22電性連〇结物。凸塊21 (P〇l — 物介K Μ導at電r性fit:為錫銲凸塊材料可以預先將聚合 度,減二片i 脹係數調整到與基板相近的程 人減少日日片、鈐塊與基板間之熱應力差,以 σ部之結構完整性。伯具 ^ _ 崎彳示鮮π接 費較高二二::電性填料製作銲塊成本花 及金屬材質,因此以導電性聚合物作為匕力遂不 品’在電性口皙柄雜、去2;丨lb 鬼材料之封裝產 封裝件等同I水準。、、使用錫錯合㈣塊之半導體 【發明概述】: 本發明之主要目的即在提供一種於封裝製 、凸塊崩缺,並減少晶片之錫銲凸塊盥曰 結接合邱f ^ τ ·、 外口尼興日曰片承載件之銲 】:j (Solder Jolnt)因形變而產生裂 之覆晶式半導體封裝件。 貝[track) 完整ί發Si:曰目:在:提供一種維持銲結接合部結構 賴性之覆晶式半導體封裝件。 民羊及。口質k 本發明之再-目的在於提供一種維持晶片承載件平面 第7頁 l69〇2.ptd 557555 五、發明說明(4) 度(planarity),俾使後續製程(如植球或測試等)且 有較佳之作業信賴性之覆晶式半導體封裝件。 本發明之又一目的在於提供一種可運用現有製程技 術,無須增加設備成本之覆晶式半導體封裝件。 為達上揭及其他目&,本發明提供之防止錫鲜凸塊崩 缺之覆晶式半導體封裝件係包括:一晶片承載件,盆且有 乂表面及-下表面’該上表面上預佈有複數個導電線路 區(Conductive Patterned Locations),且至少一部 之導電線路區上形成有多數基板銲墊;至少一半導體晶々 片,其上形成有多數按導電線路鋪排之晶片銲墊,以2 等晶片鲜墊上形成複數個錫銲凸塊,供晶片與晶片承载2 電性連接,一第一底部填膠,係沾染於各錫銲凸塊上, 晶片與晶片承載件銲接後’各錫銲凸塊表面被該第一底 填膠完全包覆;一第二底部填膠,用以填滿晶片與晶 載件間之間隔空隙,使二者完全密合;以及植接於晶片 載件下表面,供該晶片電性連接至外界之多數銲球。 本發明之覆晶式半導體封裝件在不增加成本的條件 下,運用兩種底部填膠實施覆晶底部填膠製程 (Underfill)。其用意係希望藉由第一底部填膠及第二 底部填膠不同的物理特性,解決晶片、錫銲凸塊與美一 因CTE差異而導致的種種問題。更詳而言之,該第、一^底苦曰 填膠為一種非流動性填膠(No —f 1〇w Underf i/丨),其1 有較高的揚氏模數(Young,s Module ),即剛性、具 (Regidity)較強;而第二底部填膠的楊氏模數較低,其 16902.ptd 第8頁 557555 五 —發明說明(5) ---- 材質柔軟,對於改善形變效果較佳;因此,在 覆該第一底部填膠,可以強化銲結接合部的龄構塊周圍包 免錫銲凸塊崩缺(Decomposition)產生;而B強度’避 承載件間隔空隙用第二底部填膠補滿,亦能減曰曰小片與晶片 中銲結接合部的形變程度,使晶片承载件維持^ ^裴過程 度’而提高後續製程之作業信賴性。如此,本發5之平面 用現有佈膠技術,便能同時達成強化銲結接人ς =要運 變,對於提昇封裝成品,特別是大尺寸/大Q° $成少形 裝件的良率及品質極有幫助。 曰曰片+導體封 【發明詳細說明】: 以下即配合第1至4圖詳細說明本發明第一實施 晶式半導體封裝件及其施予覆晶底部填膠作業 復 (Underf i 1 1 )之情形,惟實施例中附具之圖式僅簡單示 意出與本實施例有關之元件種類及結構,其實際成品之不一 件數量、種類以及佈局形態均較圖式複雜。' τ 70 第1圖顯示本發明防止錫銲凸塊崩缺之半導體封裝件 之立體斷面圖。如圖所示,此半導體封裝件丨係由一基板 1〇,一藉多數錫銲凸塊11與該基板1〇電性連接之晶片12, 一包覆於各錫銲凸塊11周圍之第一底部填膠13,一填滿該 晶片1 2與基板1 〇間隔空隙之第二底部填膠丨4,以及多數$ 接於基板10上提供晶片12電性導接至外界之銲球15所構 成。其中,該基板1 〇與晶片1 2係以一覆晶方式(F丨i ρ C h i ρ )電性接合,惟此技術屬於習知,故在此不予贅述。 該基板 10為一由 FR-4樹脂、BT ( Bismaleimide16902.ptd Page 6 557555 V. Description of the invention (3) The thermal stress difference between the boards reduces the above problems: The semiconductor package 2 is formed with a plurality of pads m () on the first surface of the substrate 20 (: wafer 22). 222), screen printing (Cn surface Pnntmg), stencil printing (stenciu conductive filler (Conductive FiUe g 2: f): mixed with pad 204 (222) to form a lightning guide = organic polymer layout to B S), for the substrate 20 and the wafer 22 to be electrically connected to each other. The bump 21 (P0l — the physical medium MEMS guide at electrical rfitting: For the solder bump material, the degree of polymerization can be reduced by two The expansion coefficient of the film i is adjusted to be close to the substrate. The thermal stress difference between the Japanese-Japanese film, the block and the substrate is reduced, and the structural integrity of the σ part is shown. ^ _ Ruggedness indicates that the π connection fee is higher. :: Electric filler is costly to produce soldering pads and metal materials, so using conductive polymers as the dagger force is not good. 'Electricity is mixed, and 2; lb. The packaging of ghost materials is equivalent to I-level packaging. .., Semiconductors using tin ingots [Summary of the Invention]: The main purpose of the present invention is to provide a package system The bumps are chipped and the solder joints of the wafers are reduced, and the joints of the wafers are Qiu f ^ τ · Welding of the Nissan chip carrier on the outer side]: j (Solder Jolnt) is cracked due to deformation Complete semiconductor package. [Track] Complete Si: Said: In: To provide a flip-chip semiconductor package that maintains the structural reliance of the solder joint. The sheep and the mouth. The re-objective of the present invention It is to provide a method to maintain the plane of the wafer carrier. Page 7 l69〇2.ptd 557555 V. Description of the invention (4) Degree (planarity), so as to enable subsequent processes (such as ball planting or testing) and have a better operation reliability Crystalline semiconductor package. Another object of the present invention is to provide a flip-chip semiconductor package that can use existing process technology without increasing equipment cost. In order to achieve the above objective and other objectives & The chip-on-chip semiconductor package with bump collapse includes: a wafer carrier, a pot with a ridged surface and a lower surface. The upper surface is pre-laid with a plurality of conductive patterned locations (Conductive Patterned Locations), and at least one Conductive wire Most substrate pads are formed on the area; at least one semiconductor wafer is formed with a plurality of wafer pads arranged according to conductive lines, and a plurality of solder bumps are formed on a second-grade wafer pad for wafer and wafer carrying 2 For electrical connection, a first underfill is contaminated on each solder bump. After the wafer and the wafer carrier are welded, the surface of each solder bump is completely covered by the first underfill; a second bottom Filling glue is used to fill the gap between the wafer and the wafer carrier so that the two are completely in close contact; and implanted on the lower surface of the wafer carrier for the wafer to be electrically connected to the majority of the solder balls on the outside. The flip-chip semiconductor package of the present invention uses two kinds of underfill to implement an underfill process without increasing cost. The intention is to solve the various problems caused by the difference in CTE between wafers, solder bumps and Meiyi by different physical characteristics of the first underfill and the second underfill. In more detail, the first and the last bitter filling is a non-flowing filling (No —f 1〇w Underf i / 丨), where 1 has a higher Young's modulus (Young, s Module), that is, rigid and strong (Regidity); and the Young's modulus of the second underfill is lower, which is 16902.ptd Page 8 557555 V-Description of the invention (5) ---- The material is soft. The improvement of deformation is better; therefore, filling the first bottom with glue can strengthen the solder joint bumps around the old structure to prevent the formation of solder bumps; and the B strength 'avoids the gap between the carriers Filling with the second bottom glue can also reduce the degree of deformation of the bonding joint between the small piece and the wafer, so that the wafer carrier maintains the ^^ process degree and improves the reliability of the subsequent process operations. In this way, the plane of the present hairpin 5 can use the existing glue technology to achieve enhanced bonding at the same time. It is necessary to improve the package yield, especially the large size / large Q ° $. And quality is extremely helpful. Chip + conductor seal [Detailed description of the invention]: The following is a detailed description of the first embodiment of the crystalline semiconductor package of the present invention and the application of the under-filling process (Underf i 1 1) with the help of Figures 1 to 4. In some cases, the drawings attached in the embodiments simply indicate the types and structures of the components related to this embodiment. The actual number, type, and layout of the finished products are more complicated than the drawings. 'τ 70 FIG. 1 is a perspective cross-sectional view of a semiconductor package for preventing chipping of solder bumps according to the present invention. As shown in the figure, the semiconductor package is composed of a substrate 10, a wafer 12 which is electrically connected to the substrate 10 by a plurality of solder bumps 11, and a first chip which is wrapped around each solder bump 11 A bottom filler 13, a second bottom filler that fills the gap between the wafer 12 and the substrate 10, and a majority of 15 solder balls connected to the substrate 10 to provide the wafer 12 with electrical conductivity to the outside Make up. Wherein, the substrate 10 and the wafer 12 are electrically bonded in a flip-chip manner (F 丨 i ρ C h i ρ). However, this technology is known, so it will not be repeated here. The substrate 10 is made of FR-4 resin, BT (Bismaleimide
557555 五、發明說明(6)557555 V. Description of Invention (6)
Triazine)樹脂、聚亞醯胺(p〇iyimide)樹脂等材質製 成之單層、雙層或多層電路板,其具有一上表面1〇〇及一 相對之下表面101,此電路板是在一樹脂芯層(c〇re ) (未圖示)上預經圖案化(Patterning)形成複數個由多 條導電跡線(Conductive Traces)(如第2圖1〇2所示) 匯集之導電線路區(Conductive Patterned Locations) (未圖示),該導電線路區外敷設有一隔絕電性之拒銲劑 層(Solder Mask)(如第2圖103所示);其中,基板1〇 上表面100之至少一部份導電線路區(未圖示)上^設有 多個拒銲劑層外露開口,供鎳、鉛等合金預鍍形成複數個 基板銲墊104;而基板1〇下表面1〇1上則植設有多個銲球 1 5,使^片可藉之電性連接至外界(如印刷電路板)。 該晶片1 2係由矽、砷化鎵等半導體材料製成,其具有 用表面120(即佈设有多數電子電路與電子元件之晶 二二亦稱電路面)與一相對之非作用表面i2i,該作 122以m!複數個按照導電線路鋪排之晶片銲墊 均與成一相互對應之空間關係。 膠13與第-庇都诂脚、 erfl11)是採用第一底部填 膠W與第一底部填膠14共同為之。 ^ ^ 4圖分別對第一底部填膠13 下即以第2、第3及第 加以說明。 、 、第一底部填膠1 4的實施情形A single-layer, double-layer, or multi-layer circuit board made of Triazine resin, polyimide resin, or other materials. The circuit board has an upper surface 100 and a relatively lower surface 101. A resin core layer (core) (not shown) is pre-patterned to form a plurality of conductive traces assembled by a plurality of conductive traces (as shown in FIG. 102). (Conductive Patterned Locations) (not shown), a conductive solder mask (Solder Mask) (as shown in FIG. 2) of the conductive circuit area is coated on the outside; A part of the conductive circuit area (not shown) is provided with a plurality of exposed openings of the solder resist layer, which are used for pre-plating of nickel, lead and other alloys to form a plurality of substrate pads 104; A plurality of solder balls 15 are planted, so that the chip can be electrically connected to the outside (such as a printed circuit board). The chip 12 is made of semiconductor materials such as silicon and gallium arsenide, and has a surface 120 (that is, a crystal surface where most electronic circuits and electronic components are arranged), and an opposite non-active surface i2i. The operation 122 uses m! To arrange a plurality of wafer pads arranged in accordance with conductive lines and a spatial relationship corresponding to each other. The glue 13 and the first-pillar lame, erfl11) use the first underfill W and the first underfill 14 together. ^ ^ 4 illustrates the first underfill 13 respectively, namely the second, the third and the third. The implementation of the first underfill 14
557555 五、發明說明(7) 該第一底部填膠13為一含高量環氧樹脂(Ερ〇χγ Resin)之絕緣膠材,其楊氏模數較高,剛性(Regidity )較強而具有較大的機械強度(Mechanical strength )。如第2圖所示,第一底部填膠13係藉由沾浸(Dipping )方式預先沾塗於錫銲凸塊丨丨上;當晶片丨2接置到基板i 〇 時,經過回銲(Refl〇w)的第一底部填膠13會完全包覆在 錫銲凸塊11周圍而形成一保護層,以助錫銲凸塊丨丨增強銲 結接合部的應力耐受性,避免錫銲凸塊丨丨產生崩缺 (Decomposition)而影響晶片12的電性品質。 該弟一底部填膠14則為一石夕粒子(siiic〇n Particles)比例較多之絕緣膠材,其揚氏模數偏低,對 於調整熱膨脹係數差異與控制形變效果卓著;此種膠材流 動性(即膠材柔軟度)甚高,故較佳之佈膠方法通常使用 點膠(Top Globing)。惟除前述舉例之膠材外,該第一 底。P填膠1 3與第二底部填膠1 4亦可使用任何成份相同不同 比例之膠材’或成份及比例皆異之膠材,只要用於包覆錫 銲凸塊之膠材可提供較強機械支撐,而其餘部分能改善熱 應力差造成之材料形變者,均涵蓋於本發明之適用膠材範 圍。 、如第3圖及第4圖所示,第二底部填膠丨4從點膠針丨6流 出並施加在晶片1 2周圍,以填滿晶片J 2與基板i 〇之間隔空 隙。由於該第二底部填膠丨4對形變控制功效較佳,是以, 將第二底部填膠1 4塗佈到晶片丨2底部外緣可以補強覆晶間 隙周圍’避免最外侧的銲結接合部遭應力破壞,此種功效557555 V. Description of the invention (7) The first underfill 13 is an insulating rubber material containing a high amount of epoxy resin (Eρ〇χγ Resin), which has a high Young's modulus and a high rigidity (Regidity). Large mechanical strength (Mechanical strength). As shown in FIG. 2, the first underfill 13 is pre-applied to the solder bumps 丨 丨 by means of dipping; when the wafer 丨 2 is connected to the substrate i 〇, it is re-welded ( Refl0w) The first underfill 13 will completely cover the solder bumps 11 to form a protective layer to help the solder bumps 丨 丨 enhance the stress resistance of the solder joints and avoid soldering Decomposition of the bumps 丨 丨 affects the electrical quality of the chip 12. The bottom filler 14 of this brother is an insulating rubber material with a large proportion of siiicon Particles. Its Young's modulus is low, which is outstanding for adjusting the difference in thermal expansion coefficient and controlling deformation. This rubber material flows The flexibility (ie, the softness of the glue) is very high, so the preferred method of glue application usually uses top Globing. However, in addition to the rubber materials exemplified above, the first base. The P filler 1 3 and the second bottom filler 1 4 can also use any glue with the same composition and different proportions, or glues with different compositions and ratios, as long as the glue used to cover the solder bumps can provide more Those with strong mechanical support and other parts that can improve the deformation of the material caused by the difference in thermal stress are covered by the scope of the applicable rubber material of the present invention. As shown in FIGS. 3 and 4, the second underfill 丨 4 flows out from the dispensing needle 丨 6 and is applied around the wafer 12 to fill the gap between the wafer J 2 and the substrate i 0. Since the second underfill 丨 4 has better effect on deformation control, the second underfill 1-4 is applied to the wafer 丨 2 the outer edge of the bottom can strengthen the periphery of the chip gap to avoid the outermost joint bonding The part is damaged by stress, this effect
16902.ptd16902.ptd
第11頁 557555Page 11 557555
五、發明說明(8) 在大晶片及大尺寸的覆晶產品尤為顯著 再者,第一底部填膠13及第二底部填膠14之佈膠只要 運用現有製程設備便可實施,不需導致成本增加;且第一 底部填膠1 3與第二底部填膠1 4可以依照膠材不同的物理特 性各展所長,因此更能充分發揮底部填膠技術預期之功 效’使覆晶產品的良率明顯提昇。 ^ 以上所述僅為本發明之較佳實施例而已,並非用以限 明之實質技術内容範圍,本發明之實質技術内容係 義於下述之申請專利中,^可他人所完成之 —1i ·或方法,若是與下述之申請專利範圍所定義者係 =:二ΐ:或疋同一等效之變更,均將被視為涵蓋於此申V. Description of the invention (8) It is particularly significant in large wafers and large-size flip-chip products. The glue of the first underfill 13 and the second underfill 14 can be implemented by using existing process equipment without causing any problems. The cost increases; and the first underfill 13 and the second underfill 14 can be developed according to the different physical characteristics of the rubber material, so the expected effect of the underfill technology can be brought into full play. The rate has increased significantly. ^ The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of the substantive technical content. The substantive technical content of the present invention is defined in the following patent applications. ^ Can be completed by others—1i · Or method, if it is the same as defined in the scope of patent application below: =: 二 ΐ: or 疋, equivalent changes will be considered to be covered in this application
557555 圖式簡單說明 【圖式簡單說明】: 以下茲以較佳具體例配合所附圖示進一步詳細說明本 發明之特點及功效: 第1圖為本發明之覆晶式半導體封裝件之立體斷面示 意圖; 第2圖為本發明之覆晶式半導體封裝件上片之動作示 意圖; 第3圖為本發明之半導體封裝件進行第二底部填膠佈 膠作業之上視示意圖; 第4圖為第3圖A-A剖面線之剖面示意圖;以及 第5圖為習知之美國專利第5,2 3 7, 1 3 0號半導體封裝件 之剖面示意圖。 【元件符號說明】: 1,2 半導體封裝件 10, 20 基板 100 基板上表面 101 基板下表面 102 導電跡線 1 04, 2 04基板銲墊 12, 22 晶片 121 晶片非作用表面 13 第一底部填膠 15 銲球 21 導電膠層 103 拒銲劑層 11 錫銲凸塊(銲塊) 120 晶片作用表面 122,222晶片銲墊 14 第二底部填膠 16 點膠針557555 Brief description of the drawings [Simplified description of the drawings]: The following is a more detailed description of the features and effects of the present invention with preferred specific examples and accompanying drawings: Figure 1 is a three-dimensional fracture of a flip-chip semiconductor package of the present invention Figure 2 is a schematic diagram of the operation of the flip-chip semiconductor package of the present invention. Figure 3 is a schematic top view of the semiconductor package of the present invention performing a second underfill operation. Figure 4 is FIG. 3 is a schematic cross-sectional view of the AA section line; and FIG. 5 is a schematic cross-sectional view of a conventional US Pat. No. 5, 2 37, 130 semiconductor package. [Description of component symbols]: 1,2 semiconductor packages 10, 20 substrate 100 upper surface of substrate 101 lower surface of substrate 102 conductive traces 1 04, 2 04 substrate pads 12, 22 wafer 121 non-active surface of wafer 13 first underfill Adhesive 15 Solder ball 21 Conductive adhesive layer 103 Solder resist layer 11 Solder bump (solder bump) 120 Wafer surface 122, 222 Wafer pad 14 Second underfill 16 Dispensing needle
16902.ptd 第13頁16902.ptd Page 13
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