TW550562B - Alloy material for reflection film of reflection type flat panel display and sputtering target material - Google Patents

Alloy material for reflection film of reflection type flat panel display and sputtering target material Download PDF

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Publication number
TW550562B
TW550562B TW91116836A TW91116836A TW550562B TW 550562 B TW550562 B TW 550562B TW 91116836 A TW91116836 A TW 91116836A TW 91116836 A TW91116836 A TW 91116836A TW 550562 B TW550562 B TW 550562B
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Taiwan
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alloy material
reflective
sputtering target
reflective film
alloy
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TW91116836A
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Chinese (zh)
Inventor
Wei-Cheng Li
Chin-Shiau Jau
Jin-Duo Chen
Shin-Shian Wu
Deng-Ke Chen
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Solar Applied Materials Techno
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Abstract

The invention is related to a kind of reflection film alloy material for reflection type flat panel display, and is particularly related to the reflection film alloy material used for reflecting the externally incident light in a reflection type flat panel display. The main composition element of the alloy material includes the metal elements such as silver (Ag), copper (Cu), and platinum (Pt); and the alloy material is designed through an appropriate content ratio between the elements. Or, through the addition of the other specific element to further fine the alloy grain, the invention is used to provide an alloy material specified for the reflection film with high reflectivity and excellent durability used in a reflection type flat display and sputtering target.

Description

550562 A7 B7 _ 五、發明說明(/ ) 、本發明係關於一種用於反射型平面顯示器之反射膜及 鍍靶材(sputtering target)之合金材料,尤指一種具備高 (請先閱讀背面之注意事項再填寫本頁) 反射率、提昇反射型平面顯示器晝面顯示清晰度之反射膜 合金材料及濺鍍反射膜用之靶材材料。 平面顯示态(Flat Panel Display ; FPD)因具有輕薄短 * 小之優點,目前已逐漸取代傳統的陰極射線管(Cathode550562 A7 B7 _ 5. Description of the Invention (/) The present invention relates to an alloy material for a reflective film and a sputtering target for a reflective flat display, especially an alloy material having a high (please read the note on the back first) Please fill in this page for more details.) Reflective film alloy material for improving reflectivity and improving the sharpness of daytime display of reflective flat panel display, and target material for sputtering reflective film. Flat panel display (FPD) has gradually replaced traditional cathode-ray tubes (Cathode) due to its advantages of lightness, thinness, shortness, and smallness.

Ray Tube ; CRT)式顯示器、,目前有關平面顯示器的種類概 有液晶顯示器(Liquid Crystal Display ; LCD)、場發射顯示 器(Field Emission Display; FED)及有機電激發光顯示器 (Organic Electroluminesence Display ; OLED)、…等等, 其中液晶顯示器更為目前已進入實用階段之產品。 在前揭眾多型式的顯示器中,反射型平面顯示器(尤 其是反射型液晶顯示器)因不使用高耗電的背光模組或其 他發光構件,而係藉助反射外部光源之方式配合成像控 制,達到影像顯示且兼具低耗電之目的,而被廣泛應用於 各種攜帶式的產品上。 如刖述所言,反射型平面顯示器本身不具發光模組, 王係藉由反射外部光線的方式配合成像控制而達到影像 顯示之功用,故此,一反射型顯示器必需具備良好反射 率,方能達到清晰顯像的效果,如何提昇其反射率,即為 現階段反射型平面顯示器研發中一項重要的課題。 目前有關反射型平面顯示器之基本構造,以反射型液 晶顯示器為例,其組成主要具有一組呈上下對應配置的透 明基板,該二基板間設有以封密材封入其内的液晶層,上 3 本紙張尺度遗用中國國家標準(CNS)A4規格(210 x 297公釐)~ ' ------ 550562 A7 B7 五、發明說明(^ ) 基板底面與下基板頂面各設有透明電極(如丨丁〇等)、被覆 層及配向膜,另於上基板頂面依序設有偏光板、相位差 板,於下基板底面則設一反射板,該反射板係由一表面形 成細微凹凸狀之透明基材,以及被覆其上之反射膜及黏著 層等所構成。藉此,讓由上基板上方之入射光通過液晶層 後,經反射板上之反射膜反射入射光,再通過液晶層回至 上基板日守,在液晶層偏光方向之切換控制下產生明或暗之 顯像狀態,其中因反射板上之反射膜關係著反射入射光之 強度,故選用具有高反射率材料作為反射膜,即可有效提 昇該反射型乎面顯示器之影像顯示效果。 月ίΐ述鍍没於反射板上用以反射入射光協助顯像之反射 膜材料,已知的材料概有鋁、鋁合金、銀及銀合金等多 種,其中鋁或鋁合金之成本雖然較低,但僅在特定的可見 光波長區段具有80%以上的反射率,如第二圖所示,其他 可見光區段則反射率低於80%。至於銀則具有較高反射 率,如第三圖所示,其在可見光波長區段(波長 380_~80〇nm)均可達到80%以上之高反射率,惟銀^ 候性不佳,於一般環境中易形成硫化物或氧化物,其反應 生成物會吸收藍光,致使反射層在藍光波段反射率下降。 於銀中添加合金元素有助於提升耐候性,但亦可能造成反 射率下降,如第四圖所示,而降低該反射型平面顯示器晝 面顯示清晰度。 為此,本發明之主要目的在於:提供一種有別於既有 應用於反射型平面顯示器中之鋁或銀質反射膜材料,且兼 4 本紙張尺度適用中國國家標準(_CNS)A4規格(210 X 297公爱) ' ---- I I I —II--· I I (請先閱讀背面之注意事項再填寫本頁) · 線- 550562 A7 B7 五、發明說明()) 具高反射率(90〇/0以上)及耐候性佳等功用之反射膜及濺鍍 革巴材之合金材料,供業者於反射板上鍍設反射膜時另一種 可以選用之付料及濺鍍靶材。 為達成前揭目的,本發明提出之用於反射型平面顯示 器之反射膜合金材料組成,係以銀(Ag)、銅(Cu)、鉑(pt)等 金屬7L素為其主要構成元素,並透過各元素間適當的含量 例設計,或再添加其他合適的特定元素進一步使該合金 之晶粒細化,而構成一專用於反射型平面顯示器中具有高 反射率、耐候性佳之反射膜合金材料及濺鍍靶材。 為使貴審查委員能進一步瞭解本發明具體之設計及 其他目的,以下再配合圖式詳細說明如后: 圖示部份: 第一圖:係本發明反射膜合金材料R(反射率)、T(穿透 率)、Α(吸收率)與波長關係圖。 f U習用不同厚度齡金之反射率與波長關係圖。 弟二圖··係習用純銀反射膜材料不同厚度鍍膜之反射率與 波長關係圖。 第四圖:係習用銀合金反射膜材料反射率與波長關係圖。 本發明用於反射型平面顯示器之反射膜合金材料之且 體實施設計,其係以銀(Ag)結合選自下列元素的族群金 (Au)、銅(Cu)、免(Pd)、始㈣、鈦(丁丨)等元素之— 2其主要構成元素之組合,藉此’透過各元素間適杂的含 1比㈣計’構成-兼具高反射率及对候性佳等功二之反 5 . — — — — — —------- (請先閲讀背面之注意事項再填寫本頁) . 線- 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 297公釐) 550562 A7 ----- ----Β7__ 五、發明說明(么) 射膜合金材料及濺鍍靶材。 依據前述元素之組成設計,本發明可設計成以下數種 &孟材料之只靶例,其第一種實施例係採取銀(八9 )、金 (Au)、銅(Cu)、鈀(pd)、鉑(R)、鈦(丁丨)等六種元素之組 合,其含量關係以AgxAuYCuzPdwPtvTiu定義之,其中 〇-1<y<1.0原子百分比(at%),〇 1<z<4 〇原子百分比 (at%)’ 〇.1<w<4_〇 原子百分比(at%),〇 1<V<4 〇 原子百分 比(at%)’ O.Kuu.o原子百分比(at%),其餘為X之原子百 分比。 如第一圖所示,其係以第一種實施例合金材料測得之 波長(Wavelength)與反射率(R)、穿透率(τ)、吸收率(A) 關係圖,由該關係圖中可以清楚看出,本發明選取銀(Ag)_ (0.5-1.5)始(Pt)-(0.5 〜1.5)銅(CuHO.no)鈦(Ti)等四種元 素構成的合金材料,該合金材料(R2曲線)在可見光波長 區段(波長380nm〜800nm)皆可達到90%以上之高反射 率;另在第一圖中,本發明另選取由銀(Ag)_(1 5〜2·5)鉑 (Pt)-(0.5〜1 ·5)鈀(Pd)-(2.2〜3.2)銅(Cu)等四元素構成的合金 (即R1曲線),以及由銀(Ag)-(〇.5〜1_5)翻(Pt)-(1.5〜2.5)鈀 (Ρ〇Ι)-(1.〇〜2.0)銅(Cu)等四元素構成的合金(即R3曲線)所 作的波長與RTA之關係曲線,該二合金材料(R1、R3曲線) 之反射率(R)雖不及前述第一種實施合金材料(R2曲線)之反 射率(R),但其反射率(R)仍幾乎達到80%以上,且該二合 金材料可透過改變合金厚度、改變元素比例或添加其他附 力Π元素等方式,進一步提昇其反射率(R)。 6 本紙張尺度適用中國國家標準(CNS)A4規格(210x297公爱) -------— II------I (請先閱讀背面之注意事項再填寫本頁} - 550562Ray Tube; CRT) type displays. Currently, the types of flat-panel displays include Liquid Crystal Display (LCD), Field Emission Display (FED), and Organic Electroluminesence Display (OLED). , Etc., among them, the liquid crystal display is the product that has already entered the practical stage. Among the many types of displays previously disclosed, reflective flat-panel displays (especially reflective liquid-crystal displays) do not use high-power consumption backlight modules or other light-emitting components. Instead, they reflect the external light source and cooperate with imaging control to achieve images. Display and the purpose of low power consumption are widely used in various portable products. As mentioned in the introduction, the reflective flat panel display itself does not have a light emitting module. Wang Xi achieves the function of image display by reflecting the external light in conjunction with the imaging control. Therefore, a reflective display must have a good reflectance to achieve The effect of clear development and how to improve its reflectivity is an important issue in the development of reflective flat panel displays at this stage. At present, the basic structure of a reflective flat display is a reflective liquid crystal display as an example. Its composition mainly includes a set of transparent substrates that are arranged up and down, and a liquid crystal layer enclosed by a sealing material is arranged between the two substrates. 3 Chinese paper standard (CNS) A4 specification (210 x 297 mm) is used for this paper size ~ '------ 550562 A7 B7 V. Description of the invention (^) The bottom surface of the substrate and the top surface of the lower substrate are each provided with transparency Electrodes (such as Ding Xiao, etc.), coatings and alignment films, and a polarizing plate and a retardation plate are sequentially arranged on the top surface of the upper substrate, and a reflecting plate is formed on the bottom surface of the lower substrate. The reflecting plate is formed by a surface It is composed of a fine concave-convex transparent substrate, a reflective film and an adhesive layer covering it. In this way, after the incident light from the upper substrate passes through the liquid crystal layer, the incident light is reflected by the reflective film on the reflective plate, and then returns to the upper substrate through the liquid crystal layer, and the light or dark is generated under the switching control of the polarization direction of the liquid crystal layer. In the developing state, the reflective film on the reflective plate is related to the intensity of the reflected incident light, so the use of a material with a high reflectivity as the reflective film can effectively improve the image display effect of the reflective face-up display. This article describes the reflective film material that is plated on the reflective plate to reflect incident light to assist development. Known materials include aluminum, aluminum alloy, silver, and silver alloy. Among them, the cost of aluminum or aluminum alloy is low. , But has a reflectance of more than 80% only in a specific visible light wavelength section, as shown in the second figure, the reflectance of other visible light sections is less than 80%. As for silver, it has a high reflectance. As shown in the third figure, it can reach a high reflectance of more than 80% in the visible light wavelength range (wavelength 380 ~~ 80nm). However, silver has poor weatherability. Sulfides or oxides are easily formed in the general environment, and the reaction products will absorb blue light, causing the reflectivity of the reflective layer to decrease in the blue light band. Adding alloying elements to silver helps to improve weather resistance, but it may also cause a decrease in reflectance, as shown in the fourth figure, which reduces the daytime display clarity of this reflective flat panel display. For this reason, the main object of the present invention is to provide an aluminum or silver reflective film material that is different from existing aluminum or silver reflective film materials used in reflective flat-panel displays. The paper size is applicable to the Chinese National Standard (_CNS) A4 specification (210 X 297 public love) '---- III —II-- · II (Please read the notes on the back before filling this page) · Line-550562 A7 B7 V. Description of the invention ()) High reflectivity (90〇 / 0) and other materials such as reflective film and sputtered leather and alloy materials with good weather resistance. For the supplier, another optional material and sputtering target can be used when the reflective film is plated on the reflective plate. In order to achieve the purpose of the previous disclosure, the composition of the reflective film alloy material for the reflective flat display proposed by the present invention is composed of 7L element such as silver (Ag), copper (Cu), platinum (pt) and the like, and Through the appropriate content example design of each element, or adding other appropriate specific elements to further refine the crystal grains of the alloy, a reflective film alloy material with high reflectivity and good weather resistance is used in reflective flat panel displays. And sputtering targets. In order to make your review committee better understand the specific design and other purposes of the present invention, the following is explained in detail in conjunction with the drawings as follows: The part shown in the figure: The first figure: the reflective film alloy material R (reflectance), T of the present invention (Transmittance), A (absorptance) and wavelength. f U used the graph of the reflectance and wavelength of different thickness of age. The second figure is a graph of the relationship between reflectance and wavelength of different thickness coatings of conventional pure silver reflective film materials. The fourth figure: the relationship between reflectivity and wavelength of the conventional silver alloy reflective film material. The invented design of a reflective film alloy material for a reflective flat display of the present invention is a combination of silver (Ag) and a group selected from the following elements: gold (Au), copper (Cu), free (Pd), , Titanium (Ding 丨) and other elements-2 The combination of its main constituent elements, by which 'through a mixture of various elements containing a ratio of 1',-a combination of high reflectivity and good weatherability Anti 5. — — — — — — —------ (Please read the notes on the back before filling out this page). Line-This paper size is applicable to China National Standard (CNS) A4 (21〇297 mm) ) 550562 A7 ----- ---- B7__ 5. Description of the invention (?) Film alloy material and sputtering target. According to the composition design of the foregoing elements, the present invention can be designed into the following target examples of several & Meng materials, the first embodiment of which is made of silver (Au 9), gold (Au), copper (Cu), palladium ( The combination of six elements, such as pd), platinum (R), and titanium (butylene), is defined by AgxAuYCuzPdwPtvTiu, where 〇-1 < y < 1.0 atomic percentage (at%), 〇1 < z < 4 〇 Atomic percentage (at%) '〇.1 < w < 4_〇atomic percentage (at%), 〇1 < V < 4 atomic percentage (at%)' O.Kuu.o atomic percentage (at%), the rest Is the atomic percentage of X. As shown in the first figure, it is the relationship between the wavelength (Wavelength) and the reflectance (R), the transmittance (τ), and the absorptance (A) measured by the alloy material of the first embodiment. It can be clearly seen that the present invention selects an alloy material composed of four elements such as silver (Ag) _ (0.5-1.5) starting (Pt)-(0.5 ~ 1.5) copper (CuHO.no) titanium (Ti), and the alloy The material (R2 curve) can achieve a high reflectance of more than 90% in the visible light wavelength range (wavelength 380nm ~ 800nm). In addition, in the first figure, the present invention also selects silver (Ag) _ (1 5 ~ 2 · 5) An alloy composed of four elements such as platinum (Pt)-(0.5 ~ 1.5), palladium (Pd)-(2.2 ~ 3.2), copper (Cu) (ie, R1 curve), and silver (Ag)-(〇. 5 ~ 1_5) The relationship between the wavelength and RTA made by a four-element alloy (ie, R3 curve) composed of (Pt)-(1.5 ~ 2.5) palladium (POI)-(1.0-2.0) copper (Cu) Curve, although the reflectivity (R) of the two alloy materials (R1, R3 curve) is not as good as the reflectance (R) of the first alloy material (R2 curve), the reflectance (R) is still almost 80% The above, and the two alloy materials can be changed by changing the alloy thickness, The proportion of added pigment, or other attachment elements Π force, etc., to further enhance its reflectivity (R). 6 This paper size applies to China National Standard (CNS) A4 (210x297 public love) --------- II ------ I (Please read the precautions on the back before filling this page}-550562

五、發明說明(γ 第二種實施例係採取銀 素之組合,复人曰日日乂 日(Μ)二禋70 其3 I關係以AgxCuzPtv定義之,i • <Ζ<4·〇原子百分比⑼%),0·1<ν<4.0原子百又 其餘為χ之原子百分比。 砰子百为比 f之H種實甘施例係採取銀(Ag)、銅(CU)、1巴(Pd)三種元 f &,其含量關係以AgxCUzPdw定義之 二<4二1子百分比_) ’ 〇1<W<4·。原子百分比 (at/。)’其餘為X之原子百分比。 第四種實施例係採取銀(Ag)、金(Au)、銅(cu)三種元 '、之組合,其含量關係以A9xAUyCUz定義之,其中 二::<1.0原子百分比(at%),〇 1<Z<4 〇原子百分比 (at /。)’其餘為X之原子百分比。 第五種實施例係採取銀(Ag)、欽(Ti)二種元素之組 合,其含量Μ係以AgxTiu定義之,其中〇 1<u<5〇原子百 分比(at%),其餘為χ之原子百分比。 -本發明合金材料所選用的銀、金、銅、把、始、欽等 几素於组成合金後’其表面細緻、鏡面效果佳,而能構成 —種具高反㈣之反射膜合金材料或作為雜反射膜用之 錢鐘減,另藉由前揭添加於銀中之金屬元素,在維持應 有的高反射率前提下,進—步增進銀的耐候性,提昇該合 金材料的化學穩定性。 該合金材料鏟於基板表面形成反射膜後,當其鑛膜厚 度約為1000〜1500Α ’經實際測試,在可見光波段 C 380nm~80Onm),其反射率可達9〇%以上尤其是藍 本適用中國國家標準(CNS)A4規格 --- (請先閱讀背面之注意事項再填寫本頁) · · -·線 550562 A7V. Description of the Invention (γ The second embodiment adopts a combination of silver, and the complex day (M) is 禋 70, and its 3 I relationship is defined by AgxCuzPtv, i • < Z < 4.0 atom The percentage ⑼%), 0.1 < ν < 4.0 atomic percent, and the rest are χ atomic percent. The example of the H kinds of tangs with a percentage of bangzi f is silver (Ag), copper (CU), and 1 bar (Pd). The content relationship is defined by AgxCUzPdw. Percentage_) '〇1 < W < 4 ·. Atomic percentage (at /.) 'The rest is the atomic percentage of X. The fourth embodiment adopts a combination of three elements of silver (Ag), gold (Au), and copper (cu). The content relationship is defined by A9xAUyCUz, where two: < 1.0 atomic percent (at%), 〇1 < Z < 4 0 atomic percent (at /.) 'The rest is the atomic percent of X. The fifth embodiment adopts a combination of two elements of silver (Ag) and chin (Ti), and the content M is defined by AgxTiu, where 〇1 < u < 50 atomic percent (at%), and the rest is χ Atomic percentage. -The silver, gold, copper, handle, starting, and other elements selected for the alloy material of the present invention are composed of the alloy, which has a fine surface and a good mirror effect, and can be constituted as a reflective film alloy material with high reflectance or As a reflective film, it can reduce the amount of money. In addition, the metal elements added to the silver can be used to further improve the weatherability of the silver and improve the chemical stability of the alloy material while maintaining the high reflectivity that it should have. Sex. After the alloy material is formed on the surface of the substrate to form a reflective film, when the thickness of the mineral film is about 1000 ~ 1500A ', after actual testing, in the visible light band C 380nm ~ 80Onm), its reflectance can reach more than 90%, especially for blueprints applicable to China National Standard (CNS) A4 Specification --- (Please read the precautions on the back before filling this page) · ·-· Line 550562 A7

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550562 A7 B7 五、發明說明( 顯示器上之反射膜及濺鍍靶材之材料設計領域中,確為一 新且富產業利用性之實用設計’因此’本發明符合發明 專利之要件,爰依法具文提出申請。 (請先閱讀背面之注意事項再填寫本頁) 裝 -i-r°J· 線· 本紙張尺度適用中國國家標準(CNS)A4規格(21〇x297公釐)550562 A7 B7 V. Description of the invention (In the field of material design of the reflective film and sputtering target on the display, it is indeed a new and industrially applicable design. Therefore, the present invention complies with the requirements of the invention patent. (Please read the precautions on the back before filling out this page.) -Ir ° J · Thread · This paper size is applicable to China National Standard (CNS) A4 (21〇x297 mm)

Claims (1)

於05鼠云 A8 ϋ U >4九丨 B8 i 猱 丨 ’ 」·~· ---— __________ 六、申請專利範圍 (請先閲讀背面之注意事項再填寫本頁) 1、 一種用於反射型平面顯示器之反射膜及濺鍍靶材 之合金材料,該合金材料係選取銀(Ag)、銅(Cu)及鉑(pt)三 元素之組合為主要構成元素,其含量關係以AgxCuzPtv定 義之’其中0·1<ζ<4.〇原子百分比(at〇/o),〇 1<v<4 〇原子 百分比(at%),其餘為χ之原子百分比,構成一種具有高反 身ί率之合金材料及濺錢靶材。 2、 如申請專利範圍第1項所述之用於反射型平面顯 不為之反射膜及濺鍍靶材之合金材料,其中該合金材料之 主要構成元素除銀(Ag)、銅(Cu)及鉑(Pt),尚包括有鈀 (Pci),為四元素之組合,其含量關係以AgxCUzPdwP、定義 之’其中0_ 1 <z<4_0原子百分比(at〇/0),〇/|<w<4.〇原子百 分比(at%),〇.1<V<4.〇原子百分比(at%),其餘為χ之原子 百分比。 3、 如申請專利範圍第1項所述之用於反射型平面顯 不器之反射膜及濺鍍靶材之合金材料,其中該合金材料之 主要構成元素除銀(Ag)、銅(Cu)及鉑(Pt),尚包括有鈇 (Ti),為四元素之組合,其含量關係以AgxCUzRvTiu定義 之’其中0.1 <z<4.0原子百分比⑼%),〇· 1 <v<4.0原子百 分比(at%),0·1<υ<5·〇原子百分比(at%),其餘為χ之原子 百分比。 4、 如申請專利範圍第1項所述之用於反射型平面顯 示器之反射膜及濺鍍靶材之合金材料,其中該合金材料之 主要構成元素除銀(Ag)、銅(Cu)及鉑(Pt),尚包括金(Au)、 查巴(Pd)及鈦(Ti),為六元素之組合,其含量關係以 ___10 本紙張尺度適用中國S家標準(CNS)A4規格(210 χ 297公爱) 一 ""~ -- 550562 六、申請專利範圍 AgxAuYCUzPdwPtvTiu定義之,其".1<y<1 〇原子百分比 (at%) ’ 〇·1 <z<4.〇 原子百分比(at%) ’ 0_ 1 <w<4.〇 原子百分 比(at%)’ 〇·ι<ν<4_0 原子百分比(at%),〇 1<U<5 〇 原子: 分比(at%),其餘為χ之原子百分比。 ,5、如巾請專利範圍第!、2或3項所述之用於反射 型平面顯示為之反射膜及濺鐘靶材之合金材料,其中該合 金材料中可自族群:鎳(Nj)、硼(B)、矽(Sj)三元素中擇一 或多種添加其中,作為該合金材料的附加元素。 6、 如申請專利範圍第5項所述之用於反射型平面顯 不器之反射膜及濺鍍靶材之合金材料,其中鎳之添加 量少於0· 2原子百分比(at%)。 7、 如申請專利範圍第5項所述之用於反射型平面顯 示器之反射膜及濺鍍靶材之合金材料,其中硼(幻之添加量 少於0· 5原子百分比(at%)。 8、 如申請專利範圍第5項所述之用於反射型平面顯 示恭之反射膜及濺鍍革巴材之合金材料,其中石夕(以)之添加 量少於2. 0原子百分比(at%)。 11 本紙張尺度適用中國國家標準(CNS)A4規格(210 χ 297公釐)In 05 Rat Cloud A8 ϋ U > 4 nine 丨 B8 i 猱 丨 '' '· ~ · ----- __________ 6. Scope of patent application (please read the precautions on the back before filling this page) 1. A type of reflection Type of flat-panel display reflective film and alloy material for sputtering target. The alloy material is selected from the combination of silver (Ag), copper (Cu) and platinum (pt) as the main constituent elements, and its content relationship is defined by AgxCuzPtv 'Where 0 · 1 < ζ < 4.0 atomic percent (at〇 / o), 〇1 < v < 4.0 atomic percent (at%), and the rest are the atomic percent of χ, constituting an alloy with a high reflex rate Materials and money splash targets. 2. As described in item 1 of the scope of the patent application, the alloy material used for the reflective film and sputtering target of the reflective plane display, wherein the main constituent elements of the alloy material are silver (Ag) and copper (Cu). And platinum (Pt), which also includes palladium (Pci), is a combination of four elements, and its content relationship is defined by AgxCUzPdwP, where '0_ 1 < z < 4_0 atomic percentage (at〇 / 0), 〇 / | < w < 4.0 atomic percent (at%), 0.1 < V < 4.0 atomic percent (at%), and the rest are χ atomic percent. 3. As described in item 1 of the scope of the patent application, the alloy material used for the reflective film and sputtering target of the reflective flat display, wherein the main constituent elements of the alloy material are silver (Ag) and copper (Cu). And platinum (Pt), which also includes osmium (Ti), is a combination of four elements, and its content relationship is defined by 'AgxCUzRvTiu', where 0.1 < z < 4.0 atomic percentage ⑼%), 0.1 < v < 4.0 atoms Percentage (at%), 0.1 < υ < 5.0 atomic percent (at%), and the rest are χ atomic percent. 4. The alloy material for the reflective film and sputtering target material of the reflective flat display as described in item 1 of the scope of the patent application, wherein the main constituent elements of the alloy material are silver (Ag), copper (Cu) and platinum (Pt), which still includes gold (Au), chaba (Pd), and titanium (Ti), is a combination of six elements, and its content relationship is ___10 This paper size applies to China S Standard (CNS) A4 specifications (210 χ 297 public love) a " " ~-550562 VI, as defined by the scope of patent application AgxAuYCUzPdwPtvTiu, its " .1 < y < 1 〇 atomic percentage (at%) '〇 · 1 < z < 4.0 atom Percent (at%) '0_ 1 < w < 4.0 atomic percentage (at%)' 〇 · ι < ν < 4_0 atomic percentage (at%), 〇1 < U < 5 〇 atom: fraction ratio (at% ), The rest is the atomic percentage of χ. 5, such as towel please patent the first! The alloy material for the reflective film and the sputtering target for reflective flat display as described in item 2, 2 or 3, wherein the alloy material can be from the group: nickel (Nj), boron (B), silicon (Sj) One or more of the three elements are added as an additional element of the alloy material. 6. As described in item 5 of the scope of the patent application, the alloy film used for the reflective film and sputtering target material of the reflective flat display, the addition amount of nickel is less than 0.2 atomic percent (at%). 7. As described in item 5 of the scope of the patent application, an alloy material for a reflective film and a sputtering target for a reflective flat panel display, wherein boron (the added amount is less than 0.5 atomic percent (at%). 8 0, as described in the scope of the application for the patent for the reflective flat display of the reflective film and alloy materials of sputter leather, in which the addition of Shi Xi (to) is less than 2.0 atomic percentage (at%) . 11 This paper size applies to China National Standard (CNS) A4 (210 χ 297 mm)
TW91116836A 2002-07-29 2002-07-29 Alloy material for reflection film of reflection type flat panel display and sputtering target material TW550562B (en)

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