548716 A7 ___ B7___ 五、發明說明（/ ) [技術領域] 本發明，係關於係保護標線片之圖案面不受汙染，具 備能裝拆於標線片之裝拆機構的標線片保護盒及使用該保 護盒之曝光裝置。 [習知技術] 光步進器中，爲保護標線片之圖案面不受污染物之污 染，係使用由透明樹脂等所構成之薄膜狀的保護膜 (pellicle)。以此保護膜覆蓋標線片之圖案面，即能防止污 染物等附著於標線片之圖案面。 然而，近年來隨著半導體積體電路之微細化，爲了提 昇受限於光之繞射限度之光學系統之解析力，開發了取代 習知之紫外線，而使用波長較紫外線短之X光的投影微影 技術。此技術所使用之EUV曝光機中，由於EUV光卜般_ 來說係波長5〜20nm，具體而言，係使用13nm或llnm之 波長）幾乎會被所有物質吸收，因此在將保護膜安裝於標線 片之狀態下進行曝光是極爲困難的。也就是說，在安裝保 護膜之狀態下進行曝光，由於EUV光會被保護膜吸收，因 此無法將標線片之圖案轉印至曝光對象物。因此，提出了 一種EUV曝光機中能裝拆之保護膜(標線片保護盒）。 圖3，係顯示習知標線片保護盒之槪略構成的立體圖 〇 此圖中，顯示了標線片保護盒21安裝於標線片2之狀 態。此標線片2，其俯視形狀大致呈正方形，其上面形成 (請先閱讀背面之注意事項再填寫本頁) 訂---------. 衣紙張尺度適用中國_家標準（CNS)A4規格（210 X 297公釐） A7 548716 ___B7 __ 五、發明說明Γ77 ) 有曝光圖案(未圖示）。此曝光圖案被標線片保護盒21完全 覆蓋，未形成曝光圖案之標線片的兩端部則自標線片保護 盒21露出。覆蓋曝光圖案之標線片保護盒21 ’係以透明 之玻璃或樹脂形成，可穿透可視光及紫外光。 此標線片保護盒21之使用’在fe線片之查步驟、將 標線片2搬送至曝光機內之步驟等時爲安裝狀態，而在曝 光則一'刻自標線片2取下。亦即，其使用係在將標線片2 搬送至EUV曝光機內，裝載於標線片載台之前一刻、或裝 載後在曝光開始前一刻將標線片保護盒21自標線片取下， 以避免妨礙EUV光對標線片圖案面之照射。 由於標線片保護盒21係使用對可視光及紫外光充分透 明之材料，因此能在安裝了標線片保護盒21之狀態下，檢 查標線片2圖案面之污染物等。是故，標線片保護盒具有 如下之優點，亦即，於標線片檢查機中即使在大氣環境下 檢查標線片2，亦能防止塵垢等污染物附著於標線片2之 圖案面。 進行曝光時，最易附著塵垢之狀況，係在將標線片搬 ，送至標線片載台之路徑上，此路徑係曝露於大氣狀態。然 而，於此搬送中亦能藉由標線片保護盒21來保護標線片2 防止塵垢附著之處，即係最大優點之一。 EUV曝光機內之標線片載台係在真空下。其理由，係 因即使是He氣亦會強烈吸收EUV光，因此在大氣壓力中 無法獲得充分的產能之故。 4 木纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) ---- 訂--------- 548716 A7 _ B7_______ 五、發明說明（j ) [發明欲解決之課題] 如前所述，標線片保護盒21，在從大氣中之檢查機移 動至真空中之EUV曝光機內之標線片載台期間’爲安裝於 標線片2之狀態。因此，標線片保護盒21必須在大氣中及 真空中皆能持續保護標線片2。故標線片保護盒21應具有 能承受1氣壓之壓力差的強度。爲了具備此強度’需使標 線片保護盒具有充分之壁厚。 然而，若增加其壁厚，會因可視光穿透率之下降而在 檢查機中安裝標線片保護盒之狀態下檢查標線片時產生問 題，或因整體重量增加而在搬送標線片時產生問題。 本發明有鑑於上述問題，其目的在提供一種即使使保護盒 之壁厚較薄亦能承受1氣壓之氣壓差的標線片保護盒及使 用該保護盒之曝光裝置。 [用以解決課題之手段] 爲解決上述課題，本發明之標線片保護盒，係保護標 線片之圖案面不受汙染，具備裝卸於標線片之裝卸機構， 安裝於標線片時內部具有中空部，其特徵在於，具備：覆 蓋標線片之圖案面的覆蓋部，用以保持此覆蓋部之保持部 ’形成於覆蓋部及保持部之至少一方的壁面、連接於上述 中空部之通氣孔，安裝於此通氣孔、用以遮斷既定大小以 上之塵垢通過的過濾器。 若根據上述標線片保護盒，藉設置連接於中空部之通 氣孔，即使使覆蓋部及保持部之壁厚較薄亦能承受1氣壓 之氣壓差的使用條件。換言之，由於係在大氣中進行標線 衣紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公愛1 "~ " ' (請先閱讀背面之注意事項再填寫本頁) ---------訂------- 548716 A7 ___B7 _____ — 五、發明說明（+) 片之檢查及保管，在真空中之曝光裝置內進行曝光，雖然 標線片往返於大氣中與真空中，但藉由在標線片保護盒設 置通氣孔，即使使標線片保護盒之壁厚較薄亦能承受1氣 壓之氣壓差的使用條件，防止因氣壓差使標線片保護盒受 到破壞。當安裝了標線片保護盒之標線片所處環境由大氣 中變更至真空中時，中空部內之空氣即從通氣孔排出，用 標線片保護盒內亦成真空。當標線片之環境由真空中變更 至大氣中時，空氣即從通氣孔流入中空部內’使標線片保 護盒內亦成爲大氣壓。此時，由於在通氣孔安裝了過濾器 ，因此可防止塵垢與流入之空氣一起進入標線片保護盒內 Ο 又，本發明之標線片保護盒中，上述過濾器，最好是 能遮斷對使用上述標線片之EUV曝光裝置之解析度限度乘 以縮小倍率値的10%以上大小之物質的通過。 又，本發明之標線片保護盒中’上述通氣孔’亦可配 置在上述覆蓋部及保持部之至少一方之側面中’安裝標線 片時與該標線片側部對向的面。又’上述通氣孔’亦可配 置在上述保持部之下面中，安裝標線片時與該標線片圖案 面之相反側面對向的面。又，上述通氣孔’亦可配置在上 述覆蓋部之上面中，安裝標線片時與該標線片圖案面對向 之面的遠離該圖案面之位置。 本發明之曝光裝置，具有將X光導向標線片之照明系 統，與將來自標線片之X光導向感光性基板之投影光學系 統，以將標線片圖案轉印至感光性基板’其特徵在於：具 6 木紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 訂-------- 548716 A7 ^______ B7 ___ 五、發明說明（f) 有在曝光前自標線片取下標線片保護盒、曝光後將標線片 保護盒安裝於標線片之安裝機構，上述標線片保護盒，係 保護標線片之圖案面不受汙染，具備裝卸於標線片之裝卸 機構，安裝於標線片時內部具有中空部者，其具備，覆蓋 標線片之圖案面的覆蓋部，用以保持此覆蓋部之保持部， 形成於覆蓋部及保持部之至少一方的壁面、連接於上述中 空部之通氣孔，安裝於此通氣孔、用以遮斷既定大小以上 之塵垢通過的過濾器。 根據上述曝光裝置，於該裝置內搬送安裝了標線片保 護盒之標線片，標線片保護盒之壓力環境即使從大氣壓狀 態變更爲真空狀態，亦能透過通氣孔使標線片保護盒內部 之中空部亦成真空狀態。因此，即使使標線片保護盒之壁 厚較薄亦能承受1氣壓之氣壓差。又，由於通氣孔中設置 了過濾器，因此在標線片保護盒之壓力環境從真空壓變更~ 成大氣壓時，能以過濾器防止塵垢等進入標線片保護盒內 之中空部。因此，能抑制塵垢等附著於標線片圖案面、而 將標線片保護盒之壁厚作的較薄。 [圖式之簡單說明] 圖1，係顯示本發明實施形態之能裝拆之保護膜(標線 片保護盒)之槪略構造的立體圖。 圖2 ’係顯不可利用圖1所不之標線片保護盒之EUV 曝光裝置的槪略圖。 圖3，係顯示習知標線片保護盒之槪略構成的立體圖 7 t、紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)548716 A7 ___ B7___ V. Description of the Invention (/) [Technical Field] The present invention relates to the protection of the pattern surface of the reticle from pollution, and a reticle protection box equipped with a removable mechanism for the reticle. And an exposure device using the protective box. [Conventional Technology] In the optical stepper, a thin film-shaped protective film (pellicle) made of a transparent resin or the like is used to protect the pattern surface of the reticle from contamination. By covering the pattern surface of the reticle with this protective film, it is possible to prevent contamination and the like from adhering to the pattern surface of the reticle. However, in recent years, with the miniaturization of semiconductor integrated circuits, in order to improve the resolution of optical systems that are limited by the diffraction limit of light, a projection micrometer that uses conventional X-rays that have a shorter wavelength than UV rays has been developed in place of conventional ultraviolet rays. Shadow technology. In the EUV exposure machine used in this technology, the wavelength of EUV light is 5 ~ 20nm, specifically, the wavelength of 13nm or 11nm is used.) It will be absorbed by almost all substances, so the protective film is installed on It is extremely difficult to perform exposure under a reticle. In other words, when the exposure is performed while the protective film is installed, the EUV light is absorbed by the protective film, so the pattern of the reticle cannot be transferred to the object to be exposed. Therefore, a protective film (reticle protection box) that can be attached and detached in an EUV exposure machine is proposed. FIG. 3 is a perspective view showing a schematic configuration of a conventional reticle protection box 〇 This figure shows a state where the reticle protection box 21 is mounted on the reticle 2. This graticule 2 is roughly square in plan view and is formed on it (please read the precautions on the back before filling in this page). Order ---------. The size of the paper is suitable for China_ 家 standard (CNS ) A4 specification (210 X 297 mm) A7 548716 ___B7 __ 5. Description of the invention Γ77) There are exposure patterns (not shown). This exposure pattern is completely covered by the reticle protective box 21, and both ends of the reticle where no exposure pattern is formed are exposed from the reticle protective box 21. The reticle protection box 21 ′ covering the exposure pattern is formed of transparent glass or resin, and can penetrate visible light and ultraviolet light. The use of this reticle protection box 21 is the installation state during the step of checking the reticle, the step of transporting the reticle 2 to the exposure machine, etc., and it is removed from the reticle 2 at the moment of exposure. . That is, its use is to remove the reticle protection box 21 from the reticle at the moment before the reticle 2 is transferred to the EUV exposure machine, before being loaded on the reticle stage, or immediately before the exposure starts after loading. To avoid obstructing the EUV light to illuminate the pattern surface of the reticle. Since the reticle protection box 21 is made of a material that is sufficiently transparent to visible light and ultraviolet light, it is possible to check the contamination on the pattern surface of the reticle 2 with the reticle protection box 21 installed. Therefore, the reticle protection box has the advantage that even if the reticle 2 is inspected in an atmospheric environment in a reticle inspection machine, it is possible to prevent contaminants such as dirt from adhering to the pattern surface of the reticle 2 . During exposure, the most prone to dust adheres to the path of moving the reticle to the reticle stage, which is exposed to the atmosphere. However, it is also one of the greatest advantages that the reticle 2 can be protected from the attachment of dirt by the reticle protection box 21 during transportation. The reticle stage in the EUV exposure machine is under vacuum. The reason is that even He gas absorbs EUV light strongly, so it cannot obtain sufficient production capacity under atmospheric pressure. 4 Wood paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) ---- Order --------- 548716 A7 _ B7_______ V. Description of the invention (j) [Questions to be solved by the invention] As mentioned above, the reticle protection box 21 is moved from the inspection machine in the atmosphere to the reticle stage in the EUV exposure machine in a vacuum. The period 'is a state of being mounted on the reticle 2. Therefore, the reticle protection box 21 must continuously protect the reticle 2 in the atmosphere and in a vacuum. Therefore, the reticle protection box 21 should have a strength capable of withstanding a pressure difference of 1 atmosphere. In order to have this strength ', it is necessary to make the reticle protective box have a sufficient wall thickness. However, if the wall thickness is increased, problems may occur when inspecting the reticle with the reticle protection box installed in the inspection machine due to the decrease in visible light transmittance, or the reticle may be transported due to the increase in overall weight. Problems occur. The present invention has been made in view of the above problems, and an object thereof is to provide a reticle protection box that can withstand a pressure difference of 1 atmosphere even if the wall thickness of the protection box is thin, and an exposure device using the protection box. [Means to solve the problem] In order to solve the above-mentioned problem, the reticle protection box of the present invention protects the pattern surface of the reticle from pollution, and has a mounting and dismounting mechanism for attaching and detaching to and from the reticle. The interior has a hollow portion, which is characterized by including a cover portion covering a pattern surface of the reticle, a holding portion 'for holding the cover portion' formed on at least one of the wall portion of the cover portion and the holding portion, and connected to the hollow portion. The air vent is a filter installed on the air vent to block the dust above the predetermined size. According to the above-mentioned reticle protection box, by providing a vent hole connected to the hollow portion, even if the wall thickness of the covering portion and the holding portion is thin, it can withstand a pressure difference of 1 atmosphere. In other words, because the standard is used in the atmosphere, the paper size of the paper is subject to the Chinese National Standard (CNS) A4 (210 X 297 Public Love 1 " ~ " '(Please read the precautions on the back before filling this page)- ------- Order ------- 548716 A7 ___B7 _____ — V. Description of the invention (+) Inspection and storage of the film, exposure is performed in an exposure device in a vacuum, although the reticle is back and forth to the atmosphere Medium and vacuum, but by providing vent holes in the reticle protection box, even if the wall thickness of the reticle protection box is thin, it can withstand the use condition of 1 pressure difference, preventing the reticle from being protected by the air pressure difference. The box was damaged. When the environment where the reticule protection box is installed is changed from atmospheric to vacuum, the air in the hollow part is discharged from the vent hole, and the inside of the box is protected by a reticule. When the environment of the reticle is changed from a vacuum to the atmosphere, air flows into the hollow from the vent holes, and the inside of the reticle protective box becomes atmospheric pressure. At this time, a filter is installed in the vent hole to prevent dust Enter the marking line with the incoming air Inside the film protection box. Also, in the reticle protection box of the present invention, it is preferable that the filter can block the resolution limit of the EUV exposure device using the reticle by multiplying by more than 10% of the reduction ratio 値. In addition, the above-mentioned vent hole in the reticle protective box of the present invention may be disposed on at least one side of the covering portion and the holding portion. The reticle is attached to the reticle side when the reticle is installed. Opposite faces. Also, the aforesaid vent hole may be disposed below the holding portion, and a surface facing the opposite side of the pattern surface of the reticle when the reticle is installed. The vent hole may also be It is arranged on the upper surface of the covering part, and the side facing the pattern of the reticle when mounting the reticle is located away from the pattern surface. The exposure device of the present invention has an illumination system for directing X-rays to the reticle. , And a projection optical system that directs X-rays from the reticle to the photosensitive substrate to transfer the reticle pattern to the photosensitive substrate. It is characterized in that it has a 6-wood paper scale and applies Chinese National Standard (CNS) A4 specifications. (210 X 297 male ) (Please read the precautions on the back before filling this page) Order -------- 548716 A7 ^ ______ B7 ___ V. Description of the invention (f) Remove the reticle from the reticle before exposure Box, after the exposure, the reticle protection box is installed on the reticle mounting mechanism. The above-mentioned reticle protection box is to protect the pattern surface of the reticle from pollution, and has a loading and unloading mechanism for attaching and detaching to the reticle. When the reticle has a hollow portion inside, it includes a covering portion covering the pattern surface of the reticle, a holding portion for holding the covering portion, formed on at least one of the covering portion and the holding portion, and connected to the wall surface. The air vent in the hollow part is installed in this air vent to filter through which the dust above the predetermined size passes. According to the above exposure device, a reticle equipped with a reticle protective box is transported in the device, and even if the pressure environment of the reticle protective box is changed from the atmospheric pressure state to the vacuum state, the reticle protective box can be made through the vent hole. The hollow part inside is also in a vacuum state. Therefore, even if the wall thickness of the reticle protection box is made thin, it can withstand a pressure difference of 1 atmosphere. In addition, since a filter is provided in the vent hole, when the pressure environment of the reticle protection box is changed from vacuum pressure to atmospheric pressure, a filter can prevent dust and the like from entering the hollow portion of the reticle protection box. Therefore, it is possible to suppress the adhesion of dirt and the like to the pattern surface of the reticle, and to make the wall of the reticle protection box thin. [Brief description of the drawings] Fig. 1 is a perspective view showing a schematic structure of a removable protective film (reticle protective box) according to an embodiment of the present invention. FIG. 2 ′ is a schematic diagram of an EUV exposure device that cannot use the reticle protection box shown in FIG. 1. Figure 3 is a perspective view showing the outline of a conventional glyph protection box. 7 t. The paper size applies the Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page)
548716 A7 _B7 五、發明說明（^ ) [符號說明] IL 照明系統 1 反射鏡 2 標線片 3 標線片載台 4,5 標線片焦點感測器 6 第1透鏡 7 第2透鏡 8 第3透鏡 9 第4透鏡 10 晶圓 11 晶圓載台 12,13 晶圓焦點感測器 14 鏡筒 15 離軸顯微鏡 16 真空室 17 閘閥 18 預備排氣室 19 機械臂 21，22 標線片保護盒 22a 覆蓋部 22b 保持部 23 鉸鏈 8 --------------------訂 —------- (請先閱讀背面之注意事項再填寫本頁) 衣紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 548716 __B7___ 五、發明說明（^)) 31〜35 通氣孔 41〜4 5 過漉益 (請先閱讀背面之注意事項再填寫本頁) [發明之實施形態] 以下，參照圖式說明本發明之實施形態。 圖1，係顯示本發明實施形態之能裝拆之保護膜(標線 片保護盒)之槪略構造的立體圖。 此標線片保護盒22，係保護標線片2之電路圖案面（ 未圖示)不受塵垢等之污染，具備裝卸於標線片2之機構的 保護膜。此圖中，顯示了標線片保護盒22安裝於標線片2 之狀態。此標線片2，其俯視形狀大致呈正方形，其上面 形成有曝光圖案(未圖示）。 此曝光圖案被標.線片保護盒22完全覆蓋，未形成曝光 圖案之標線片2的兩端邰則自標線片保護盒2 2露出。覆蓋-曝光圖案之標線片保護盒22,係以透明之玻璃或樹脂形成 ，可穿透可視光及紫外光。 標線片保護盒22，具有覆蓋標線片2之電路圖案面的 覆蓋部22a，與用以保持此覆蓋部22a的保持部22b。覆蓋 部22a與保持部22b係以鉸鏈23連結而構成爲開關自如。 覆蓋部22a與保持部22b其全體爲一箱形，在將標線片保 護盒22安裝於標線片2時，該標線片保護盒22之內部形 成中空部，該中空部除後述通氣孔31〜35之部分外，爲與 外部呈密閉之狀態。亦即，中空部係僅透過通氣孔31〜35 成與外部連接之狀態。 9 衣纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 548716 A7 _________B7___ 五、發明說明（(f ) 覆蓋部22a的上面(亦即安裝於標線片2時，與該標線 片之電路圖案面對向之面），設有通氣孔33, 34，此通氣孔 33, 34係配置在遠離標線片2之電路圖案面的位置。所謂 遠離電路圖案面的位置，係指在標線片檢查步驟中於電路 圖案面照射檢查光時，不致遮蔽該檢查光程度之遠離電路 圖案面的位置。又，保持部22b的側面(亦即安裝於標線片 2時，與該標線片之側部對向之面），設有通氣孔31，32, 35 。此等通氣孔31〜35連接於上述中空部。 各通氣孔31〜35中安裝有過濾器41〜45。過濾器41 〜45之能力，係以EUV曝光裝置將標線片2之電路圖案 轉印至晶圚（感光性基板）上時，不使會造成問題之大小以 上之塵垢通過的程度。 此處，所謂會造成問題之大小以上之塵垢，係指對 EUV曝光裝置之解析度限度乘以縮小倍率値的至少20%之 大小的物質，尤指該値之10%以上大小之物質。例如，過 濾器最好是具有不使直徑5〇nm〜20nm以上大小之塵垢通 過的能力。又’例如，考慮在晶圓上爲70nm〜30nm之大 小時，若係4 : 1縮小之曝光裝置的話，則標線片側之尺寸 爲280nm〜12〇nm，若係5 : 1縮小之曝光裝置的話，則標 線片側之尺寸爲350nm〜 。 圖2，係顯示能利用圖1所示之標線片保護盒之EUV 曝光裝置的槪略構成圖。 如圖2所示，EUV曝光裝置具備真空室16，此真空室 16內配置有後述之照明系統IL等。真空室16透過閘閥Π 10 木纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） __________tiii^---------I (請先S3讀背面之注意事項再填寫本頁) 548716 A7 am 明說 明發 Λ五 連接於預備排氣室(l〇aH〇ck chamber)18。真空室16內配 置有機械臂19。此機械臂19，係用來在預備排氣室18與 標線片載台3之間搬送標線片2，在標線片載台3上將標 線片保護盒22裝、卸於標線片2。 從包含光源之照明系統IL射出之EUV光(一般係使用 波長5〜20nm，具體而言，係使用13nm或llnm之波長） ，藉反射鏡1照射於標線片2。標線片2保持於標線片載 台3。標線片載台3，於掃描方向(Y軸)具有100mm以上 之行程，於標線片面內與掃描方向正交之方向（X軸）具有 微小行程，於光軸方向(Z軸)亦具有微小行程。XY方向之 位置’係以未圖不之雷射干涉器尚精度的加以監測，Z方 向，則以由標線片焦點送光系統4與標線片焦點受光系統 5所構成之標線片焦點感測器加以監測。 被標線片2反射之EUV光，包含標線片上所描繪之電 路圖案。標線片2上形成有反射EUV光之多層膜(例如Mo /Si或Mo/Be)，視此多層膜上有無吸收層（例如Ni或 A1)而圖案化。EUV光，射入鏡筒14內，被第丨鏡6反射 ’再依序被第2鏡7、第3鏡8、第4鏡9反射，最後垂直 射入晶圓10。投影系統之倍率例如爲丨/4或1/5。此圖 中’鏡片數雖爲4 ’但爲了使N.A.更大，使用6片或8片 鏡將更具效果。鏡筒14附近配置有離軸顯微鏡。 晶圓10係裝載於晶圓載台11上。晶圓載台n能自由 移動於與工軸正交之面內（XY平面），其行程例如爲3〇〇〜 400mm。光軸方向（Z軸)亦能進行微小行程之上下動作，z 11 --------------------^--------- (請先閱讀背面之注意事項再填寫本頁) 木紙張尺度ϋ中國國家標準（CNS)A4規格（21〇 χ 297公釐) 〜--------—、 A7 548716 五、發明說明 方向ίΐΔ置’係以由晶圓焦點送光系統12與晶圓焦點受光系 統13所構成之晶圓焦點感測器加以監測。χγ方向之位置 ，則以未圖示之雷射干涉器高精度的加以監測。曝光動作 中’標線片載台3與晶圓載台11，以和投影系統之縮小倍 率相同之速度比，亦即以4 : 1或5 : 1同步進行掃描。 其次，就使用圖1所示之標線片保護盒22，以圖2所 不之EUV曝光裝置進f了曝光之順序進行說明。 於標線片2安裝標線片保護盒22之狀態下，將該標線 片2設置在標線片檢查機以穿越標線片保護盒之方式進行 檢查。由於此標線片保護盒22之電路圖案面上的部分，係 使對可視光及紫外光而言充分透明之材質，故能在安裝標 線片保護盒22之狀態下檢查標線片2之電路圖案面的塵垢 等。因此，標線片保護盒，即使是在標線片檢查機中於大 氣環境下檢查標線片2，亦能防止塵垢等附著於標線片；T 之電路圖案面。 接著，將檢查步驟中合格之標線片2搬送至EUV曝光 裝置之預備排氣室18內。此搬送亦係在標線片2安裝標線 片保護盒22之狀態下進行。據此，在搬送中亦能防止塵垢 等附著於標線片2之電路圖案面。 之後，對預備排氣室18進行真空抽氣直到成爲既定壓 力。此時，雖然標線片保護盒22之壓力環境係從大氣壓狀 態變化成真空狀態，但由於標線片保護盒22設有通氣孔 31〜35及過爐器41〜45，因此標線片保護盒內之中空部亦 被抽成真空。是以，標線片保護盒22不須要能承受1氣壓 12 衣纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)548716 A7 _B7 V. Description of the invention (^) [Symbol] IL lighting system 1 reflector 2 reticle 3 reticle stage 4, 5 reticle focus sensor 6 1st lens 7 2nd lens 8 3 lens 9 4th lens 10 wafer 11 wafer stage 12, 13 wafer focus sensor 14 lens barrel 15 off-axis microscope 16 vacuum chamber 17 gate valve 18 pre-exhaust chamber 19 robot arm 21, 22 reticle protection box 22a Cover section 22b Holding section 23 Hinge 8 -------------------- Order ----------- (Please read the precautions on the back before filling this page ) Applicable to Chinese national standard (CNS) A4 size (210 X 297 mm) A7 548716 __B7___ V. Description of the invention (^)) 31 ~ 35 Ventilation holes 41 ~ 4 5 Passing benefits (Please read the note on the back first) (Please fill in this page again) [Embodiments of the invention] Hereinafter, embodiments of the invention will be described with reference to the drawings. Fig. 1 is a perspective view showing a schematic structure of a removable protective film (reticle protective box) according to an embodiment of the present invention. The reticle protection box 22 is a protective film for protecting the circuit pattern surface (not shown) of the reticle 2 from dust and the like, and is provided with a mechanism for attaching and detaching the reticle 2. In this figure, the state where the reticle protection box 22 is mounted on the reticle 2 is shown. The reticle 2 has a substantially square shape in plan view, and an exposure pattern (not shown) is formed on the reticle 2. This exposure pattern is completely covered by the reticle protection box 22, and both ends of the reticle 2 on which the exposure pattern is not formed are exposed from the reticle protection box 22. The reticle protection box 22 of the cover-exposure pattern is formed of transparent glass or resin, and can penetrate visible light and ultraviolet light. The reticle protection box 22 includes a cover portion 22a covering the circuit pattern surface of the reticle 2 and a holding portion 22b for holding the cover portion 22a. The cover portion 22a and the holding portion 22b are connected to each other by a hinge 23 and are configured to be freely switchable. The covering portion 22a and the holding portion 22b are all box-shaped. When the reticle protective box 22 is mounted on the reticle 2, a hollow portion is formed inside the reticle protective box 22, and the hollow portion is except for a vent hole described later. Parts 31 to 35 are sealed from the outside. That is, the hollow portion is connected to the outside only through the vent holes 31 to 35. 9 The size of the paper is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) 548716 A7 _________B7___ 5. Description of the invention ((f) The top of the covering portion 22a (that is, when installed on the reticle 2) The circuit pattern of the reticle is facing the surface), and there are vent holes 33, 34, which are arranged at a position far from the circuit pattern surface of the reticle 2. The so-called position away from the circuit pattern surface, It refers to the position where the inspection light is irradiated on the circuit pattern surface during the reticle inspection step, and the inspection light is not shielded from the circuit pattern surface. The side of the holding portion 22b (that is, when mounted on the reticle 2, The surface facing the side of the reticle) is provided with ventilation holes 31, 32, 35. These ventilation holes 31 to 35 are connected to the above-mentioned hollow portion. Each of the ventilation holes 31 to 35 is provided with a filter 41 to 35 45. The ability of filters 41 to 45 is the extent to which the circuit pattern of the reticle 2 is transferred to the crystal substrate (photosensitive substrate) by an EUV exposure device without passing through the size of the problem causing the problem. Here, the dust that is larger than the size causing the problem refers to Multiplying the resolution limit of the EUV exposure device by at least 20% of the reduction ratio 値, especially the size of 10% or more of this 。. For example, the filter preferably has a diameter not exceeding 50 nm to 20 nm. The ability of large and small scales to pass through. Also, for example, when a size of 70nm to 30nm on a wafer is considered, if a 4: 1 reduction exposure device is used, the size of the reticle side is 280nm to 120nm. For a 5: 1 reduction exposure device, the size of the reticle side is 350nm ~. Figure 2 shows a schematic configuration diagram of an EUV exposure device that can use the reticle protection box shown in Figure 1. As shown in Figure 2 As shown, the EUV exposure device is provided with a vacuum chamber 16 which is equipped with an illumination system IL and the like described later. The vacuum chamber 16 passes through a gate valve Π 10 The paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) ) __________ tiii ^ --------- I (Please read the precautions on the back of S3 before filling out this page) 548716 A7 am clearly states that Λ5 is connected to the pre-exhaust chamber (l〇aHOCK chamber) 18 A robot arm 19 is arranged in the vacuum chamber 16. This robot arm 19 is used for The reticle 2 is transported between the spare exhaust chamber 18 and the reticle stage 3, and the reticle protection box 22 is mounted on the reticle stage 3 and detached from the reticle 2. From the lighting system including the light source The EUV light emitted by the IL (generally uses a wavelength of 5 to 20 nm, specifically, a wavelength of 13 nm or 11 nm) is irradiated to the reticle 2 by the reflector 1. The reticle 2 is held on the reticle stage 3 The reticle stage 3 has a stroke of 100 mm or more in the scanning direction (Y axis), a slight stroke in the direction orthogonal to the scanning direction (X axis) in the reticle plane, and also has a small stroke in the optical axis direction (Z axis). Has a small stroke. The position in the XY direction is accurately monitored with a laser interferometer not shown in the figure. In the Z direction, the reticle focus is formed by the reticle focus light transmitting system 4 and the reticle focus light receiving system 5. Sensor to monitor. The EUV light reflected by the reticle 2 includes the circuit pattern depicted on the reticle. The reticle 2 is formed with a multilayer film (for example, Mo / Si or Mo / Be) that reflects EUV light, and is patterned depending on the presence or absence of an absorbing layer (for example, Ni or A1) on the multilayer film. The EUV light enters the lens barrel 14 and is reflected by the first mirror 6 ′, and then is sequentially reflected by the second mirror 7, the third mirror 8, and the fourth mirror 9, and finally enters the wafer 10 vertically. The magnification of the projection system is, for example, / 4 or 1/5. Although the number of lenses is 4 in this figure, in order to make N.A. larger, it is more effective to use 6 or 8 lenses. An off-axis microscope is arranged near the lens barrel 14. The wafer 10 is loaded on a wafer stage 11. The wafer stage n can move freely in a plane (XY plane) orthogonal to the work axis, and its stroke is, for example, 300 to 400 mm. Optical axis direction (Z axis) can also move up and down with a small stroke, z 11 -------------------- ^ --------- (Please Please read the notes on the back before filling in this page) Wood paper size ϋ Chinese National Standard (CNS) A4 specification (21〇χ 297 mm) ~ ----------, A7 548716 5. Direction of invention description ΐΐΔ The setting is monitored by a wafer focus sensor composed of the wafer focus light transmitting system 12 and the wafer focus light receiving system 13. The position in the χγ direction is monitored with a laser interferometer (not shown) with high accuracy. During the exposure operation, the reticle stage 3 and the wafer stage 11 are scanned synchronously at the same speed ratio as the reduction ratio of the projection system, that is, 4: 1 or 5: 1. Next, the reticle protection box 22 shown in Fig. 1 will be used to explain the order of exposure performed by the EUV exposure apparatus shown in Fig. 2. In the state where the reticle protection box 22 is installed in the reticle 2, the reticle 2 is set in a reticle inspection machine to inspect the reticle 2 through the reticle protection box. Since the part of the circuit pattern surface of the reticle protection box 22 is a material that is sufficiently transparent to visible light and ultraviolet light, the reticle 2 can be inspected with the reticle protection box 22 installed. Dirt on the circuit pattern surface. Therefore, the reticle protection box can prevent dirt and the like from adhering to the reticle even if the reticle 2 is inspected in an atmosphere in a reticle inspection machine; the circuit pattern surface of T. Next, the reticle 2 that passed the inspection step is transferred to the preliminary exhaust chamber 18 of the EUV exposure apparatus. This transfer is also performed while the reticle 2 is mounted with the reticle protection box 22. Accordingly, it is possible to prevent dirt and the like from adhering to the circuit pattern surface of the reticle 2 during transportation. Thereafter, the pre-exhaust chamber 18 is evacuated to a predetermined pressure. At this time, although the pressure environment of the reticle protection box 22 is changed from the atmospheric pressure state to the vacuum state, the reticle protection box 22 is provided with vent holes 31 to 35 and a furnace furnace 41 to 45, so the reticle protection The hollow part inside the box was also evacuated. Therefore, the reticle protection box 22 does not need to be able to withstand 1 air pressure. 12 The size of the paper is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm).
548716 A7 ________B7____ 五、發明說明（l \) 之氣壓差的強度。亦即，由於可使用標線片保護盒之強度 較弱者，因此可使標線片保護盒之壁厚較薄。 接著，打開閘閥17，使用機械臂19將標線片2自預 備排氣室18裝載至真空室16內之標線片載台3。此時： 真空室16已進行真空抽氣至既定壓力。之後，在標線片載 台3上，於曝光之前一刻使用機械臂19將標線片保護盒 22從標線片2取下。如此，即不致妨礙EUV光對標線片 圖案面之照射。 接著，對晶圚10上之光阻膜進行EUV光之曝光，據 以將標線片2之電路圖案轉印至晶圓10上。在對複數之晶 圓進行此曝光後，使用機械臂19將標線片保護盒22安裝 於標線片2，打開閘閥17將標線片2搬送至預備排氣室18 。其次，關閉閘閥17，使預備排氣室18回到大氣壓，將 標線片2搬送至預備排氣室18外。 根據上述實施形態，藉在標線片保護盒22設置通氣孔 31〜35,即使標線片保護盒之壁厚較薄亦能承受1氣壓之 氣壓差的使用條件。也就是說，將安裝了標線片保護盒22 之標線片2搬送至預備排氣室18，對該預備排氣室18進 行真空抽氣而使標線片保護盒22之壓力環境自大氣壓狀態 變化成真空狀態，亦能通過通氣孔31〜35使標線片保護盒 22內部之中空部成爲真空狀態。因此，即使標線片保護盒 22之壁厚較薄亦能承受1氣壓之氣壓差的使用條件。 又，上述實施形態，由於在通氣孔31〜35中設置了過 濾器41〜45，因此在使標線片保護盒22之壓力環境自真 13 衣纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)548716 A7 ________B7____ 5. The strength of the pressure difference of the invention (l \). That is, since the strength of the reticle protective box can be used, the wall thickness of the reticle protective box can be made thin. Next, the gate valve 17 is opened, and the reticle 2 is loaded from the pre-exhaust chamber 18 to the reticle stage 3 in the vacuum chamber 16 using the robot arm 19. At this time: The vacuum chamber 16 has been evacuated to a predetermined pressure. After that, on the reticle stage 3, the reticle protection box 22 is removed from the reticle 2 using the robot arm 19 immediately before exposure. In this way, it does not prevent the EUV light from irradiating the pattern surface of the reticle. Next, the photoresist film on the crystallite 10 is exposed to EUV light, so that the circuit pattern of the reticle 2 is transferred to the wafer 10. After performing this exposure on a plurality of crystal circles, a reticle protection box 22 is mounted on the reticle 2 using a robot arm 19, and the gate valve 17 is opened to transport the reticle 2 to the pre-exhaust chamber 18. Next, the gate valve 17 is closed to return the pre-exhaust chamber 18 to atmospheric pressure, and the reticle 2 is conveyed outside the pre-exhaust chamber 18. According to the above embodiment, by providing the vent holes 31 to 35 in the reticle protection box 22, even if the reticle protection box has a thin wall thickness, it can withstand the use condition of a pressure difference of 1 atmosphere. In other words, the reticle 2 with the reticle protection box 22 installed is transported to the pre-exhaust chamber 18, and the pre-exhaust chamber 18 is evacuated to make the pressure environment of the reticle protection box 22 from atmospheric pressure. The state changes to a vacuum state, and the hollow portion inside the reticle protection box 22 can also be brought into a vacuum state through the vent holes 31 to 35. Therefore, even if the thickness of the reticle protection box 22 is thin, it can withstand the use condition of a pressure difference of 1 atmosphere. In the above-mentioned embodiment, since the filters 41 to 45 are provided in the vent holes 31 to 35, the pressure environment of the reticle protection box 22 is made to be true. 13 The paper size applies the Chinese National Standard (CNS) A4 standard. (210 X 297 mm) (Please read the notes on the back before filling this page)
548716 B7 五、發明說明（卜） 空壓變化成大氣壓時，能以過濾器41〜45防止塵垢等進入 標線片保護盒內之中空部。因此能抑制塵垢等附著於標線 片2之電路圖案面，將標線片保護盒22之壁厚作得較薄。 又，本發明並不限定於上述實施形態，在不脫離本發 明主旨範圍內可進行種種變化據以實施。 例如，上述實施形態，雖係以能穿透可視光及紫外光 之透明玻璃或樹脂來形成標線片保護盒22，但標線片保護 盒全體不一定須以透明材質來形成，只要在安裝標線片保 護盒22之狀態下檢查標線片2時，將能自外部目視標線片 2電路圖案之覆蓋部22a的一部分以透明材質來形成的話 ’即能以各種材質來形成標線片保護盒之其他部分。 又，上述實施形態，雖係在覆蓋部22a上面及保持部 22b側面設置通氣孔.31〜35及過濾器41〜45，但亦可在標 線片保護盒之其他位置設置通氣孔及過濾器，例如，亦可 在覆蓋部22a側面及保持部下面(亦即，將標線片保護盒22 安裝於標線片2時，與該標線片之電路圖案面的相反面對 向之面)設置通氣孔及過濾器。 又，通氣孔之數量、位置、大小，可使用各種不同者 ，該等之自由度非常大。不過，若過份增加通氣孔之數量 、或各通氣孔過大的話，由於會降低標線片保護盒之強度 ’因此最好是能在保持必要強度的狀態下調整通氣孔之數 量及大小。通氣孔之位置，只要是分別在覆蓋部22a及保 持部22b之側面、保持部22b下面的話，無論設於任何位 置皆可，但在覆蓋部22a上面開設通氣孔時，則最好是配 14 表紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) ΦΚ---- 訂---------. 548716 A7 _B7___ 五、發明說明（\、） 置在周邊部，以避免在使用標線片檢查機進行檢查時造成 妨礙。 [發明效果] 根據以上說明之本發明，其具有連接於保護盒內中空 部之通氣孔，以及安裝於該通氣孔之過濾器。因此，能提 供即使使保護盒之壁厚較薄，亦能承受1氣壓之氣壓差的 標線片保護盒及使用該保護盒之曝光裝置。 (請先閱讀背面之注意事項再填寫本頁) ----- 15548716 B7 V. Description of the invention (b) When the air pressure changes to atmospheric pressure, filters 41 to 45 can be used to prevent dirt and the like from entering the hollow portion of the reticle protection box. Therefore, it is possible to suppress dirt and the like from adhering to the circuit pattern surface of the reticle 2, and to make the thickness of the reticle protection box 22 thin. The present invention is not limited to the above-mentioned embodiments, and various changes can be made without departing from the scope of the present invention. For example, in the above embodiment, although the reticle protective box 22 is formed of transparent glass or resin that can penetrate visible light and ultraviolet light, the entire reticle protective box need not be formed of a transparent material as long as it is installed When inspecting the reticle 2 in the state of the reticle protection box 22, if a part of the covering portion 22a of the circuit pattern of the reticle 2 can be visually viewed from the outside, the transparent portion is used to form the reticle. Other parts of the protective box. In the above-mentioned embodiment, although the vent holes are provided on the upper surface of the covering portion 22a and the side of the holding portion 22b. 31 to 35 and filters 41 to 45, vent holes and filters may be provided in other positions of the reticle protection box. For example, it can also be on the side of the cover portion 22a and below the holding portion (that is, when the reticle protection box 22 is mounted on the reticle 2, the side facing the circuit pattern surface of the reticle opposite to the facing surface) Set up vents and filters. In addition, the number, position, and size of the vent holes can be various, and the degree of freedom of these is very large. However, if the number of vent holes is excessively increased, or if each vent hole is too large, the strength of the reticle protection box will be reduced, so it is best to adjust the number and size of vent holes while maintaining the necessary strength. The position of the vent hole may be located at any position as long as it is on the side of the covering portion 22a and the holding portion 22b and under the holding portion 22b. However, it is preferable to arrange the vent hole on the covering portion 22a. The paper size of the table applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling this page) ΦΚ ---- Order ---------. 548716 A7 _B7___ 5. The description of the invention (\,) is placed at the periphery to avoid obstruction when using a reticule inspection machine for inspection. [Effects of the Invention] According to the present invention described above, it has a vent hole connected to the hollow portion in the protective box, and a filter attached to the vent hole. Therefore, it is possible to provide a reticle protection box capable of withstanding a pressure difference of 1 atmosphere even if the wall thickness of the protection box is thin, and an exposure device using the protection box. (Please read the notes on the back before filling this page) ----- 15
· I — — — I 衣紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）· I — — — The size of the paper is applicable to China National Standard (CNS) A4 (210 X 297 mm)