TW544828B - System level package apparatus and its manufacturing method - Google Patents

System level package apparatus and its manufacturing method Download PDF

Info

Publication number
TW544828B
TW544828B TW91116701A TW91116701A TW544828B TW 544828 B TW544828 B TW 544828B TW 91116701 A TW91116701 A TW 91116701A TW 91116701 A TW91116701 A TW 91116701A TW 544828 B TW544828 B TW 544828B
Authority
TW
Taiwan
Prior art keywords
substrate
scope
patent application
item
manufacturing
Prior art date
Application number
TW91116701A
Other languages
Chinese (zh)
Inventor
Pei-Ying Shie
Wen-Fu Shiu
Original Assignee
Asia Pacific Microsystems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asia Pacific Microsystems Inc filed Critical Asia Pacific Microsystems Inc
Priority to TW91116701A priority Critical patent/TW544828B/en
Application granted granted Critical
Publication of TW544828B publication Critical patent/TW544828B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Wire Bonding (AREA)

Abstract

A kind of system level package apparatus and its manufacturing method are provided in the present invention, in which the package is performed sequentially on an integrated passive device (IPD) substrate. At first, the flip chip or wire bonding process is used to mount at least one active device on the first surface of the substrate and form the electric connection. Then, the placing ball process is conducted to form plural solder balls on the first surface of the substrate for mounting to the other electronic apparatus. At last, an encapsulant is formed to cover and protect the active device. In the invention, much more functions are integrated in the same package so as to improve its operation speed and function. In addition, the invention has the advantages such as small package size, increased function, high manufacture-speed and mass production capability.

Description

544828544828

本發明係有關一種積體電路構裝技術,特別是關於一 種系統級構裝裝置(System-in-a-package device)及其 製造方法。 發明背景: 按,由於積體電路技術的進步,電子產品層次與功能 提升的趨向可以歸納為多功能化、高速化、大容量化、高 山度化、輕量化,為了達成這些需求,除了積體露路製程 技術進步的推動外,許多新穎的構裝技術與材料被開發出 而 多丑、小 系統產 需求, 更精巧 步達到 達到快 合於同 的空間 習 電訊傳 1C速度 要’此 為了因應高密 的電子系統產 品的包祇,較 但對構裝的大 的// BGA 或CSP 更南功能的組 速訊號傳遞及 一架構内,如 内,以增加新 知之電子構裝 遞之功能外, 越快’功率越 時I C可能需要 品,傳 新的單 小及厚 才足以 合,則處理, 此一來 的競爭 除了提 亦負有 V%時, 特別設 統單一晶片構裝的臃腫 晶B G A技術雖可纾解I / 〇 溥的需求仍稍嫌不足, 滿足此方面的需求。然 需將多顆晶片整合於模 甚至品要將被動元件也 ,更多功能才可能整合力。 供精緻1C之保護、空間 電訊傳遞品質及散熱之 電子構裝所扮演的角色 汁的電子構裝來保存期 薄、 已成為 腳數之 較BGA 欲進一 組内以 加以整 於有限 轉承及 mb 職。當 更重 以增進 五、發明說明(2) 的各種功能;也因為電“ 已開始整合電容,以達=傳輪速度的增快,有些電子構裝 能,甚至為了達到更高的2耦合(de-c〇upling )的功 更整合於同一構裝中,俅正體功能,數顆需緊密合作的j c 在習知整合多顆ic其逮度及功能更為精進。 5,784,26 1號之專利前索< 此類模組中,如美國專利第 直接安裝在一基板上後、,’、其係將至少一主動半導體元件 性連接。然而,該模組之=^組構裝方式和電路板形成電 並未將被動元件一併整合,係在基板上安裝主動元件, 而該模組構裝僅仰賴纟二未务揮系統級構裝之效益。 α、, 衣义後才進行填膠侔嘴 :呈,且不適合應用在構裝模組單獨出貨的產•不但製造 =結構亦沒有金屬遮蔽(shleldlng)業二工“ 熱、、、°構,無法完全保護其上之各元件功铲。〜構及散 因此,本發明即在針對上;之困擾此提 IC上所有線路之系統級構裂裂置及其製造方:種可整合 服習知之缺失。 ’以有效克 發明目的與概述: 本發明之主要目的,係在提供一種系統級構 其製造方法,其係將數個主動元件直接安裝在一二1、 元件(Integrated passive devices,IPcn I 广。被動 #反卜,而The present invention relates to an integrated circuit assembly technology, and more particularly, to a system-in-a-package device and a manufacturing method thereof. Background of the invention: According to the advancement of integrated circuit technology, the trend of the level and function improvement of electronic products can be summarized as multifunctional, high-speed, large-capacity, high-altitude, and lightweight. In order to meet these needs, in addition to integrated In addition to the advancement of the open-loop process technology, many new construction technologies and materials have been developed, which are more ugly and small system production needs, and more sophisticated steps to reach the space to quickly close to the same speed. The package of high-density electronic system products is only more than the structure of the large // BGA or CSP, but it also has a group signal transmission function and a structure, such as inside, to increase the functionality of the newly-known electronic structure delivery. The faster the power, the more time the IC may need the product, and the new single small and thick enough to be combined, then deal with it. In addition to the V%, the competition is specially designed for the bloated crystal BGA with a single chip structure. Although technology can relieve the demand of I / 〇 溥, it is still a little insufficient to meet this demand. However, multiple chips need to be integrated in the mold, and even passive components are required for more functions to integrate power. The electronic structure for the role of delicate 1C protection, space telecommunications transmission quality and heat dissipation of the electronic structure to save the thin period, has become the number of pins compared to the BGA want to be included in a group to be rounded up to a limited transfer and mb Job. When it is heavier to improve the various functions of V. Invention Description (2); also because electricity "has begun to integrate capacitors to achieve = faster transfer speed, some electronic construction energy, and even to achieve higher 2 coupling ( de-coupling) is more integrated in the same structure, and the function of the body is normal. Several jc that need to cooperate closely are more sophisticated in the integration and function of multiple ICs. The patent No. 5,784,26 No. 1 Front cable < This type of module, such as the US patent No., is directly mounted on a substrate, and it is connected to at least one active semiconductor element. However, the module's assembly method and circuit Board-forming electricity does not integrate passive components together, but installs active components on the substrate. The module structure relies only on the benefits of the second-level system-level structure. Α,, only after filling the glue Pouting: It is not suitable to be used in the production of structural modules that are shipped separately. • Not only manufacturing = structure, but also no metal shielding (shleldlng) industry second-hand "heat, temperature, temperature structure, can not fully protect the function of each component on it shovel. Therefore, the present invention is aimed at solving the problems mentioned above. The system-level structure of all circuits on the IC and its manufacturing method are lacking. The purpose and summary of the invention with effective grams: The main object of the present invention is to provide a system-level manufacturing method thereof, which directly mounts a number of active components on a 121, integrated passive devices (IPcn). Passive # 反 卜 , 而

無須再另外安裝電阻、電容或電感等被動元件,P 多功能直接整合於同一構裝中,使其速度及功^,將更 進。 力月匕更為精There is no need to install additional passive components such as resistors, capacitors or inductors. The P multi-function is directly integrated in the same structure, making its speed and power ^ will be improved. Li Yue Dagger is more refined

第5頁 、發明說明(3) 五 本發明之另二^的,係在提供—種系統級構裝芽置及 其製造方法’其係兼具有構裝尺寸小及功效增加:特性, 並同時具有製造速度快,並可大量生產之停點 柯 本發明之再=的,係在提供—種具;遮蔽 熱結構之系統級構裝裝置。 蚊、、,口稱 為達到上述之目的,本於明夕多^ 致人Μ4 A h笛 X月之系統級構裝裝置係在一 正。被動π件基板之弟一表面安裝至少一主 與該基板形成電性相接;一封裝膠體係位於基^面 上且覆蓋住該主動元件;以及複數 ;1 义 -表面,以利用該銲球作為對外之接點。,在1亥基省的第 本發明之另一實施態樣係在製 :法係先提供-整合被動元件基板: = =置,其 技術安裝有至少一主 先利用设晶或打線 球’以形成福赵# + 著,在該基板表面進行桔 式,於=數;=後”用真空網印或點膠之;植 件,且— =膠體,使其包覆該主動元 ^ 1由具體貫施例配合所附的囝斗、…,丄 谷易瞭解本發明夕 ,圖式砰加說明,當更 效。 之目的、技術内容、特點及其所達成之^ 圖號說明: ^整合被動元件(IPD )基板 丄z 被動元件 16成形凸塊 ^ ,一主動元件 20 引線 第二主動元件 22 封裝膠體 544828 五、發明說明(4) 2 4 鲜球 28 擋牆 32 中空承接基板 36 導孔 2 6 銲球 導孔 34 中空陶瓷基板 詳細說明: 作於將電"容或電感等被動元件直接整合製 畔至W、: ’再於此整合被動元彳(I PD )基板表面安 ’以藉此達到整合ic上所有線路又系統 、、及構装,亚可有效克服習知之缺失者。 f圖為本發明之系統級構裝裝置之第一實施例示意 回°圖所不’ Λ系統級構裝裝置包括一整合被動元件 土板1 0 ’其上係以形成有複數被動元件1 2,且該 IPD 土板Η具有第一表面及第二表面,並在ιρ])基板ι〇的第 ^面安I有二主動元件,例如:半導體晶片、微機電系 統I置或射頻裝置等,第一主動元件丨4係利用複數成形凸 塊(bump ) 16以覆晶方式安裝在IpD基板1〇第一表面上並 與其形成電性相接;第二主動元件丨8則利用複數引線2 〇以 打線方式與I PD基板1 〇形成電性相接。 另有封I膠體2 2係以真空網印或點膠之方式而形成 於IPD基板1〇之第一表面,以覆蓋住第一主動元件14及第 二主動元件18,封裴膠體22可以提供機械性的保護作用, 元件14、18受到外力(例如碰撞、灰塵、或水氣 寺J彳父。,以及複數銲球24設於IPD基板1〇的第一表面,Page 5, the description of the invention (3) The second of the fifth invention is to provide a system-level structure bud and its manufacturing method, which has both small structure size and increased efficiency: characteristics, and At the same time, it has a fast manufacturing speed and a stopping point for mass production. The present invention is a system-level assembly device that provides a kind of tools and a shielding thermal structure. The mosquitoes, mosquitoes, and vocalists said that in order to achieve the above-mentioned purpose, the system-level construction device for the M4 Ah Flute X Month was made in the evening. One of the passive π substrates has at least one main surface mounted to form an electrical connection with the substrate; an encapsulant system is located on the base surface and covers the active component; and a plurality; 1 meaning-surface to use the solder ball As an external contact. Another implementation of the present invention in the Haiji Province is in production: the law system first provides-integrates passive element substrates: = = set, its technology is installed with at least one master first using set crystals or wire shots' to Form the Fu Zhao # + work, carry out the orange type on the surface of the substrate, and then use the vacuum screen printing or dispensing; the implant, and — = colloid, so that it covers the active element ^ 1 by the specific Through the implementation of the examples and the attached buckets, ... Kuya is easy to understand the present invention, and the drawings are more illustrative, which is more effective. Purpose, technical content, characteristics and achieved ^ Drawing number description: ^ Integration passive Element (IPD) substrate 丄 z Passive element 16 forming bumps ^, an active element 20 lead second active element 22 package gel 544828 5. Description of the invention (4) 2 4 Fresh ball 28 Retaining wall 32 Hollow receiving substrate 36 Guide hole 2 6 Solder ball guide hole 34 Hollow ceramic substrate Detailed description: To integrate passive components such as capacitors or inductors directly to W: 'Integrate the surface of the passive element (I PD) substrate here' This achieves the integration of all the circuits and systems on the IC, and the construction. It can effectively overcome the lack of knowledge. Figure f is a schematic illustration of the first embodiment of the system-level configuration device of the present invention. The system-level configuration device includes an integrated passive component soil plate 1 0 above. A plurality of passive components 12 are formed, and the IPD soil plate Η has a first surface and a second surface, and has two active components on the first surface of the substrate ι0, such as a semiconductor wafer, a micro-electromechanical device, and the like. System I or radio frequency device, etc., the first active element 4 is a flip chip mounted on the first surface of the IpD substrate 10 by using a plurality of bumps 16; the second active element is electrically connected thereto;丨 8 uses a plurality of leads 2 0 to form an electrical connection with the I PD substrate 1 0 by wire bonding. Another sealant I colloid 2 2 is formed on the IPD substrate 1 10 by vacuum screen printing or dispensing. The surface to cover the first active element 14 and the second active element 18, the seal-peg colloid 22 can provide mechanical protection, and the elements 14, 18 are subjected to external forces (such as collision, dust, or water and gas temple J. Uncle., And a plurality of solder balls 24 are provided on the first of the IPD substrate 10 Surface,

第7頁 544828 五、發明說明(5) 且銲球24之高度係較封裝膠體22凸出而作為對外史接 以利用該等銲球24安裝至其他電子裝置上並形成電知 接。 &相 其中’上这整合被動元件基板丨〇之材質係選自石夕、 璃、·高電阻矽及陶瓷所組成之群組;亦可為微機電系统 (Micro Electromechanical System,簡稱MEMS )美柘式 是微光機電系統(M0EMS )基板。 土〆 另外,在該整合被動元件基板1〇之第一表面或第二表 2::有—遮蔽金屬㉟(圖中未示),以防止外來;磁 't干擾。且在該整合被動元件基板之第二表面更可利用 标形成一散熱結構’其係為一微散熱鰭 狀體,以增強裝置散熱效果。 本發明除了第一圖所示之系統級構裝裝置之外,亦旦 :::不同實施態、樣。%第二圖所示,其係為本發明之; 住其2ίϊ:第二實施:示意®,封裳膠體22係可覆蓋 r 兀件,僅露出銲球24頂端部份,將露出的 二加以研磨,使其與封裝膠體22相等,另有一组銲球 26係安裝在該組銲球24露出之 、^ 、…、、 為對外之接點。如第三圖、二形成電連接亚作 有-擋牆uam)28,當封膠體22之周圍係設 在利用該擔牆28提供密閉之二 於二再ίϊ有限範圍β ;其餘之結構與第-圖相同:故Page 7 544828 V. Description of the invention (5) And the height of the solder ball 24 is higher than the encapsulation gel 22 as an external history connection. These solder balls 24 are used to mount on other electronic devices and form electrical connections. & The material of the integrated passive component substrate above is selected from the group consisting of Shi Xi, glass, high-resistance silicon and ceramics; it can also be a Micro Electromechanical System (MEMS) The type is a micro-optical electromechanical system (MOEMS) substrate. Soil 〆 In addition, on the first surface or the second surface of the integrated passive element substrate 10 Table 2 :: Yes-shield the metal ㉟ (not shown) to prevent foreign; magnetic interference. And on the second surface of the integrated passive component substrate, a heat dissipation structure can be formed by using a standard, which is a micro-radiation fin to enhance the heat dissipation effect of the device. In addition to the system-level assembly device shown in the first figure, the present invention also has ::: different implementation modes and patterns. % The second picture shows that it is the present invention; the second embodiment: The second implementation: Schematic®, the Fengshang colloid 22 can cover the r element, only the top part of the solder ball 24 is exposed, and the exposed two are added. Grind to make it equal to the encapsulant 22, and another set of solder balls 26 are mounted on the exposed solder balls 24, ^, ..., are external contacts. As shown in the third figure, the two form an electrical connection (made as a retaining wall uam) 28. When the surrounding of the sealing gel 22 is provided by using the supporting wall 28 to provide a closed two to two and then a limited range β; the rest of the structure and the first -Same picture: So

544828544828

=回為本發明之系統級構裝裝置的第四實施例示意 :^ I所不,該組銲球24係可安裝在該IPD基板10之第 二二,與其形成電性相接,且安裝在IPD基板1〇第二 义 =、、且如球24係利用數導孔30與ipd基板1〇之第一表 面形成電性相接。 系、、、充、、及構I I置的第五實施例請參閱第五圖所示,此 系統級構裝裝置係在IPD基板1〇之第一表面周圍設有一相 同材負之中空承接基板32,其係利用晶圓接合或其他黏接 技術安裝於IPD基板1〇上,使第一主動元件14及第二主動 元件1 8位於I pd基板1 〇之第一表面並位於該中空承接基板 32之中空區域内,且封裝膠體22係覆蓋中空承接基板”之 中空區域,以完全包覆第一主動元件14及第二主動元件 18 ;複數銲球24則設置於該中空承接基板表面32且與IpD 基板1 0形成電性相接,以利用該組銲球24安裝至其他電子 衮置上並形成電性相接。另外,若該中空承接基板3 2除了 與IPD基板1,0相同材質之外,亦可使用陶瓷基板、印刷電 路板、軟性基板、BT基板及FR-4基板等;如第六圖所示, 其係直接在一整片之陶瓷基板上挖空,以形成具有中空區 域之中空陶瓷基板34,且陶瓷基板34中間係設有導孔36, 使銲球24利用該導孔36電連接至IPD基板1〇上,除了使用 陶瓷材質之中空陶瓷基板3 4外,其餘結構與第五圖之系統 級構裝裝置相同,所以不再重複敘述。 現就上述第一圖所示之結構來說明本發明之製造方 法,請參閱第七A圖至第七D圖,為本發明之較佳實施例在= The fourth embodiment of the system-level installation device of the present invention is schematically illustrated: ^ No, the group of solder balls 24 can be installed on the second and second of the IPD substrate 10, and is electrically connected to the same, and installed. The second meaning of the IPD substrate 10 and the ball 24 are electrically connected to the first surface of the ipd substrate 10 using a number of vias 30. The fifth embodiment of the system, system, charger, and structure is shown in the fifth figure. This system-level assembly device is provided with a negative hollow receiving substrate of the same material around the first surface of the IPD substrate 10 32, which is mounted on the IPD substrate 10 using wafer bonding or other bonding technology, so that the first active element 14 and the second active element 18 are located on the first surface of the I pd substrate 10 and on the hollow receiving substrate 32 in the hollow region, and the encapsulation gel 22 covers the hollow receiving substrate "to completely cover the first active element 14 and the second active element 18; a plurality of solder balls 24 are provided on the surface of the hollow receiving substrate 32 and Form an electrical connection with the IpD substrate 10 to use the set of solder balls 24 to be mounted on other electronic devices and form an electrical connection. In addition, if the hollow receiving substrate 32 is the same material as the IPD substrate 1.0 In addition, ceramic substrates, printed circuit boards, flexible substrates, BT substrates, and FR-4 substrates can also be used; as shown in Figure 6, it is hollowed out directly on a whole ceramic substrate to form a hollow substrate. Area hollow ceramic substrate 34, The ceramic substrate 34 is provided with a guide hole 36 in the middle, so that the solder ball 24 is electrically connected to the IPD substrate 10 using the guide hole 36. Except for the hollow ceramic substrate 34 made of ceramic material, the rest of the structure is the same as the system level of the fifth figure. The construction device is the same, so it will not be described again. Now, the manufacturing method of the present invention will be described with reference to the structure shown in the first figure above. Please refer to FIGS. 7A to 7D, which are the preferred embodiments of the present invention.

544828 五、發明說明(7) 氣作系、、充、、及構衣叙置結構之各步驟構造剖視圖;如圖所 不’本^明t要製造方法係包括有下列步驟: 第一 Π及第:A/所示之⑽基板10 ’其係具有 成有複數被動412::侧基板10第-表面已預先形 技術利用複數導電凸境=二如第示’先以覆晶 ^ ^ 凸塊μ將第一主動元件14安裝在IPD基 板10之弟一表面並开彡;、+ 面黏接第二主動元:m;再於1叩基板10第-表 該⑽基板1〇之第—n其係利用打線法將引線2〇耗合至 乐表面而形成電性相接。 , 然後如步驟七C κι仏- ^ ^ -^#^2;#^5 ^IPDf10 表面進行封裝作業,^利t ^ ’在1 PD基板1G之第一 使-封裝膠體22包覆二;真::印或點膠方式成型後’ 18,如第七D圖所:,=:上動:件14及第二主動元件 14、18受到外力侵宝.ΛΛ1Λ,避免主動元件 作為^卜接點’以提供電性連接至其他裝置上。 基板述ί:造方法本發明所提供之整合被動元件 每-構使得上述各構裝步驟皆是以 成主進行構裝的’在每-構裝單元依序完 -該構;ΐϊί I:求步驟及形成封裝膠體之後,再以每 統級構;Π為:,進行切割1同時製作出許多系 傅衣I置,故可有效提高其產量。 基板Ϊ =件直接安裝在-整合被動元件 …"員再另外女裝電阻、電容或電感等被動元件, 第10頁 544828 五、發明說明(8) 即可將更多功能直接整合於同一構裝中,使其速度及功能 更為精進。且因本發明將所有元件整合於同一構裝中,所 以具有構裝尺寸小及功效增加之特性,並同時具有製造速 度快,並可大量生產之優點。 以上所述之實施例僅係為說明本發明之技術思想及特 點,其目的在使熟習此項技藝之人士能夠暸解本發明之内 容並據以實施,當不能以之限定本發明之專利範圍,即大 凡依本發明所揭示之精神所作之均等變化或修飾,仍應涵 蓋在本發明之專利範圍内。 ,544828 V. Description of the invention (7) Sectional cross-sectional view of each step of the gas system, charge, and garment structure; as shown in the figure, the manufacturing method includes the following steps: First, and No .: A / shown in the base plate 10 'It has a plurality of passive 412 :: side substrate 10 No.-the surface has been pre-shaped technology using a plurality of conductive bumps = two as shown in the first' Crystal ^ ^ bump μ Install the first active element 14 on one surface of the IPD substrate 10 and open and close it; and + surface adhere to the second active element: m; It uses a wire bonding method to dissipate the lead wire 20 to the music surface to form an electrical connection. Then, as in step 7, C κι 仏-^ ^-^ # ^ 2; # ^ 5 ^ IPDf10 surface to perform the packaging operation, ^ t t ^ 'on the first PD substrate 1G-encapsulating gel 22 coating two; true :: After printing or dispensing method, '18, as shown in the seventh D drawing :, =: Move up: the 14 and the second active element 14, 18 are invaded by external forces. ΛΛ1Λ, avoid the active element as a contact 'To provide electrical connection to other devices. Substrate description: manufacturing method The integrated passive element per-configuration provided by the present invention enables the above-mentioned construction steps to be performed by the master. 'Each-the-assembly unit completes the order-the construction; ΐϊί I: seeking steps After the formation of the encapsulating colloid, each system is structured; Π is: cutting 1 is performed at the same time to produce many systems, so the yield can be effectively increased. Substrate Ϊ = pieces are directly installed on-integrated passive components ... " In addition to passive components such as women's resistance, capacitance or inductance, etc., page 10, 544828 5. Description of the invention (8), more functions can be directly integrated in the same structure Installed to make its speed and function more sophisticated. And because the present invention integrates all components in the same package, it has the characteristics of small package size and increased power, and also has the advantages of fast manufacturing speed and mass production. The above-mentioned embodiments are only for explaining the technical ideas and characteristics of the present invention. The purpose is to enable those skilled in the art to understand the contents of the present invention and implement them accordingly. When the scope of the patent of the present invention cannot be limited, That is, any equivalent changes or modifications made in accordance with the spirit disclosed in the present invention should still be covered by the patent scope of the present invention. ,

第11頁 544828 圖式簡單說明 圖式說明: 第一圖為本發明之系統級構裝裝置的第一實施例示意圖。 第二圖為本發明之系統級構裝裝置的第二實施例示意圖。 第三圖為本發明之系統級構裝裝置的第三實施例示意圖。 第四圖為本發明之系統級構裝裝置的第四實施例示意圖。 第五圖為本發明之系統級構裝裝置的第五實施例示意圖。 第六圖為本發明之系統級構裝裝置的第六實施例示意圖。 第七A圖至第七D圖為本發明於製作系統級構裝裝置之各步 驟構造剖視圖。 ,Page 11 544828 Brief description of the drawings Description of the drawings: The first diagram is a schematic diagram of the first embodiment of the system-level assembly device of the present invention. The second figure is a schematic diagram of a second embodiment of the system-level construction device of the present invention. The third figure is a schematic diagram of a third embodiment of the system-level assembly device of the present invention. The fourth figure is a schematic diagram of a fourth embodiment of the system-level assembly device of the present invention. The fifth figure is a schematic diagram of a fifth embodiment of the system-level assembly device of the present invention. The sixth figure is a schematic diagram of a sixth embodiment of the system-level assembly device of the present invention. Figures 7A to 7D are cross-sectional views of the steps of the present invention in the steps of manufacturing a system-level assembly device. ,

第12頁Page 12

Claims (1)

544828 表 該 至2 組 性 3 裝 第4 封 組5 整 瓷6 該 金 申請專利範圍 一種系統級構裝裝置,包括 :整合被動元件(IPD)基板 面; ^ J 一主動元件,其係安裝在 基板形成電性相接; +封t膠體’其係覆蓋住該主 禝數銲球,位在該基板的第一 其他電子裝置上並形成電性相 如申凊專利範圍第1項所述之 輝球更可安裝在該基板之第二 相接。 '如申請專利範圍第2項所述之 在基板第二表面之該組銲球係 一表面形成電性相接。 '如申請專利範圍第1項所述之 裝膠體更,可覆蓋住該組銲球, 辉球露出之表面上,以形成電 、如申請專利範圍第1項所述之 I被動元件基板之材質係選自 所組成之群組。 '如申請專利範圍第1項所述之 整合被動元件基板之第一表面 屬層。 、如申請專利範圍第1項所述之 係具有第一表面及第二 該基板之第—、, ^ 表面,並與 動元件;以 表面,以利 糸統級構裝 表面上而與 糸統級構:裝^ 利用複數導 系統級樺:| 並有另 組 連接。 系統級構& 矽、玻ί离、 系統級構:& 或第二表面 糸統級構| 及 用該銲球安裝 裂置,j其中該 该基板形成電 裝置,其中安 孔與該基板之 裝置,其中該 銲球安裝在該 裝置,其中該 高電阻矽及陶 裝置,其中在 更設有一遮蔽 裝置,其中在544828 Table 2 to 3 sets of 4 sets of seals 5 whole porcelain 6 This gold applies for a patent scope of a system-level structural device, including: integrated passive component (IPD) substrate surface; ^ J active component, which is installed in The substrate forms an electrical connection; + the t-colloid is used to cover the main solder ball and is located on the first other electronic device of the substrate and forms an electrical phase as described in item 1 of the scope of patent application The glow ball can be mounted on the second connection of the substrate. 'As described in item 2 of the scope of the patent application, an electrical connection is formed on one surface of the group of solder balls on the second surface of the substrate. 'As described in item 1 of the scope of the patent application, the gel can cover the group of solder balls and the exposed surface of the glow ball to form the electrical material of the passive component substrate as described in item 1 of the scope of the patent application. It is selected from the group. 'Integrate the first surface layer of the passive element substrate as described in the first patent application scope. As described in item 1 of the scope of the patent application, the first and second surfaces of the substrate are provided with the first and second surfaces, and the moving elements; the surface is used to construct the surface to facilitate the system. Hierarchical structure: equipment ^ use complex derivative system level birch: | and have another group connection. System-level structure & silicon, glass, system-level structure: & or second surface-level system structure; and using the solder ball to install the split, where the substrate forms an electrical device, where the vias and the substrate Device, wherein the solder ball is installed in the device, wherein the high-resistance silicon and ceramic device is further provided with a shielding device, wherein 第13頁 ----- 544828 六、申請專利範圍 該整合被動元件基板之第二表面更可形成— 8、 如申請專利範圍第7項所述之系統級jn 散熱結構係利用蝕刻或電鍍技術所形成者:羞置’其中该 其中該 其中 9、 如申請專利範圍第7項所述之系統級構 散熱結構係為一微散熱鰭狀體。 、衣置, 1 0、如中請專利範圍第i項所述之系統級構 在該封裝膠體周圍更設有一斤於。 、衣置 =:主動元件係以覆晶或打線方式安裝在〜置魏 其中 之第 該$ Φ — *私;从A4 I置 12、如申請專利範圍第】項所述之系統級構 J主動元件係選自半導體晶[微機電系統二:中裝 1 3、如申請專利範圍第i項所述之系統級構穿 體係:用产網印或點膠方式而形成W基板之 第 表面’以覆盍住該主動元件。 14、一種系統級構裝裝置之製造方法,包括下 面提供一整合被動元件基板,其係具有第—表面^第二表 在該基板之第-表面安裝至少一主動元件 板形成電性相接; T ^基 及 進行植球步驟,在該基板第一表面形成有複數銲球;以 在該基板之第一表面進行真空網印,使—封裂膠體包覆Page 13 ----- 544828 VI. Patent application scope The second surface of the integrated passive component substrate can be formed more. 8. The system-level jn heat dissipation structure described in item 7 of the patent application scope uses etching or electroplating technology. Formed by: Shame placement, wherein the system heat dissipation structure as described in item 7 of the scope of the patent application is a micro-radiation fin. 10, the system, as described in item i of the patent scope of the system level structure, there is a pound around the packaging colloid. , Clothing set =: the active component is installed in a flip chip or wire way ~ ~ Zhiwei among the first $ Φ — * private; from A4 I set 12, as described in the scope of the patent application of the system level structure J active The element is selected from the semiconductor crystal [Micro-Electro-Mechanical System 2: Middle-loading 1 3. The system-level structure system described in item i of the scope of patent application: the first surface of the W substrate is formed by screen printing or dispensing. Cover the active component. 14. A method for manufacturing a system-level mounting device, comprising providing an integrated passive component substrate having a first surface ^ a second table, and mounting at least one active component board on the first surface of the substrate to form an electrical connection; T ^ and performing a ball-planting step, a plurality of solder balls are formed on the first surface of the substrate; vacuum screen printing is performed on the first surface of the substrate, so as to cover the cracked colloid 544828544828 该主動元件,並使該銲球較該封裝膠體凸出,以作為對 接點。 1 5 ·如申請專利範圍第1 4項所述之製造方法,其中該主動 元件係利用複數導電凸塊與該基板形成電性相接。 1 一6 ·如申請專利範圍第1 4項所述之製造方法,其中該主動 兀件係利用打線法將引線耦合至該基板之第一表面而 電性相接。 1 7、如申請專利範圍第1 4項所述之製造方法,其中該整合 被動兀件基板之材質係選自矽、玻璃、高電阻矽及陶瓷所 組成之群組。 1 8、如申請專利範圍第1 4項所述之製造方法,其中在該整 合被動元件基板之第一表面或第二表面更設有一遮蔽金屬 層。 1 9、如申請專利範圍第1 4項所述之製造方法,其中在該真 空網印步驟後,更包括在該整合被動元件基板之第二表面 形成有一散熱結構。 20、如申請專利範圍第1 9項所述之製造方法,其中該散熱 結構係利用蝕刻或電鍍技術所形成者。 2 1、如申請專利範圍第1 9項所述之製造方法,其中該散熱 〜構係為一微散熱韓狀體。 2 2 如申请專利範圍第1 4項戶斤述之製造方法,其中該主動 元件係選自半導體晶片、微機電系統裝置或射頻裝置。 2 3、一種系統級構裝裝置之製造方法,包括下列步驟·· 提供一整合被動元件基板,其係具有第一表面及第二表The active component makes the solder ball protrude from the encapsulation gel as a contact point. 15 · The manufacturing method according to item 14 of the scope of patent application, wherein the active device is electrically connected to the substrate by using a plurality of conductive bumps. 1-6 · The manufacturing method as described in item 14 of the scope of patent application, wherein the active element is electrically connected by coupling leads to the first surface of the substrate by a wire bonding method. 17. The manufacturing method as described in item 14 of the scope of patent application, wherein the material of the integrated passive element substrate is selected from the group consisting of silicon, glass, high-resistance silicon, and ceramics. 18. The manufacturing method according to item 14 of the scope of patent application, wherein a shielding metal layer is further provided on the first surface or the second surface of the integrated passive element substrate. 19. The manufacturing method according to item 14 of the scope of patent application, wherein after the vacuum screen printing step, it further comprises forming a heat dissipation structure on the second surface of the integrated passive element substrate. 20. The manufacturing method according to item 19 of the scope of patent application, wherein the heat dissipation structure is formed by etching or electroplating technology. 2 1. The manufacturing method as described in item 19 of the scope of patent application, wherein the heat dissipation structure is a micro-heat-dissipating Korean body. 2 2 The manufacturing method described in item 14 of the scope of patent application, wherein the active element is selected from a semiconductor wafer, a micro-electro-mechanical system device or a radio frequency device. 2 3. A method for manufacturing a system-level assembly device, including the following steps: providing an integrated passive element substrate having a first surface and a second surface 544828 六:、 申請專利範圍544828 VI: Scope of patent application 面,該整合被動元件基板上係設有複數構裳單元· 在該基板上每一構裝單元之第一表面安裳至少— 件,其係與該基板形成電性相接; 動元 進行植球步驟,在該基板第一表面形成有複數鮮球. 在該基板之第一表面進行真空網印,使一封裝膠體勺舜 讀主動元件,並使該銲球較該封裝膠體凸出,以作為^覆 接點;以及 …、寸外 以每一該構裝單元為一單位,進行切割。 2 4 ·如申請專利範圍第2 3項所述之製造方法,其中該主動 元件係利用複數導電凸塊與該基板形成電性相接。 2 5 ·如申請專利範圍第2 3項所述之製造方法,其中該主動 元件係利用打線法將引線耦合至該基板之第一表面而形成 電性相接。 / 26、如申請專利範圍第23項所述之製造方法,其中該整合 被動元件基板之材質係選自矽、玻璃、高電阻矽及陶兗所 組成之群組’。 2 7、如申請專利範圍第2 3項所述之製造方法,其中在該整 合被動元件基板之第一表面或第二表面更設有一遮蔽金屬 層 。 2 8、如申請專利範圍第2 3項所述之製造方法,其中在該真 空網印步驟後,更包括在該整合被動元件基板之第二表面 形成有一散熱結構。 29、如申請專利範圍第28項所述之製造方法,其中該散熱 結構係利用蝕刻或電鍍技術所形成者。Surface, the integrated passive component substrate is provided with a plurality of structural units. On the substrate, at least one piece of the first surface of each structural unit is installed, which is in electrical contact with the substrate. In the ball step, a plurality of fresh balls are formed on the first surface of the substrate. Vacuum screen printing is performed on the first surface of the substrate, so that an encapsulating gel spoon reads the active element, and the solder ball is protruded from the encapsulating gel to As ^ overlay contacts; and ..., cutting is performed with each of the assembly units as a unit. 2 4 · The manufacturing method as described in item 23 of the scope of patent application, wherein the active device is electrically connected to the substrate by using a plurality of conductive bumps. 25. The manufacturing method as described in item 23 of the scope of patent application, wherein the active element is electrically connected by coupling wires to the first surface of the substrate by a wire bonding method. / 26. The manufacturing method according to item 23 of the scope of patent application, wherein the material of the integrated passive element substrate is selected from the group consisting of silicon, glass, high-resistance silicon and ceramics. 27. The manufacturing method as described in item 23 of the scope of patent application, wherein a shielding metal layer is further provided on the first surface or the second surface of the integrated passive element substrate. 28. The manufacturing method as described in item 23 of the scope of patent application, wherein after the vacuum screen printing step, a heat dissipation structure is further formed on the second surface of the integrated passive element substrate. 29. The manufacturing method as described in claim 28, wherein the heat dissipation structure is formed by etching or electroplating technology. 第16頁 544828 、申請專利範圍 么士 如申凊專利範圍第2 8項所述之製造方法,其中該散熱 結構係為一微散熱鰭狀體。 一 如申凊專利範圍第2 3項所述之製造方法,其中該主動 70件係選自半導體晶片、微機電系統裝置或射頻裝置。 32 一種系統級構裝裝置,包栝: —整合被動元件(IPD)基板,係具有第一表面及第二 表面; 一中空承接基板,位於該整合被動元件基板之第一表面 周圍; 至少一主動元件,其係安裝在該整合被動元件基板之第 一表面且位於該中空承接基板内,並與該整合被動元件基 板形成電性相接; 一封裝膠體,其係覆蓋住該主動元件;以及 數銲球,位於該中空承接基板表面且與該整合被動元件 基板形成電性相接,以利用該銲球安裝至其他電子裝置上 並形成電性’相接。 3 3、如申請專利範圍第3 2項所述之系統級構裝裝置,其中 3整合被動元件基板之材質係選自矽、玻璃、高電阻矽及 陶瓷所組成之群組。 34、 如申請專利範圍第32項所述之系統級構裝裝置,其中 該中空承接基板之材質係選自陶瓷基板、印刷電路板、軟 性基板、BT基板及FR-4基板所組成之群組。 35、 如申請專利範圍第32項所述之系統級構裝裝置,其中 在S整合被動元件基板之第一表面或第二表面更設有一遮Page 16 544828, patent application scope Moshi The manufacturing method as described in item 28 of the patent application scope, wherein the heat dissipation structure is a micro heat dissipation fin. As in the manufacturing method described in claim 23 of the patent scope, the active 70 pieces are selected from a semiconductor wafer, a micro-electro-mechanical system device or a radio frequency device. 32 A system-level assembly device, including:-an integrated passive component (IPD) substrate having a first surface and a second surface; a hollow receiving substrate located around the first surface of the integrated passive component substrate; at least one active A component that is mounted on the first surface of the integrated passive component substrate and is located in the hollow receiving substrate and is electrically connected to the integrated passive component substrate; a packaging gel that covers the active component; and The solder ball is located on the surface of the hollow receiving substrate and forms an electrical connection with the integrated passive component substrate, so as to use the solder ball to be mounted on other electronic devices and form an electrical connection. 3 3. The system-level assembly device described in item 32 of the scope of the patent application, in which 3 the material of the integrated passive component substrate is selected from the group consisting of silicon, glass, high resistance silicon and ceramics. 34. The system-level assembly device described in item 32 of the scope of the patent application, wherein the material of the hollow receiving substrate is selected from the group consisting of a ceramic substrate, a printed circuit board, a flexible substrate, a BT substrate, and a FR-4 substrate. . 35. The system-level assembly device according to item 32 of the scope of patent application, wherein a cover is further provided on the first surface or the second surface of the S-integrated passive component substrate. 第17頁 544828 六、申請專利範圍 蔽金屬層。 3 6、如申請專利範圍第3 2項所述之系統級構裝裝置,其中 在該整合被動元件基板之第二表面更可形成一散熱結構。 3 7、如申請專利範圍第3 6項所述之系統級構裝裝置,其中 該散熱結構係利用蝕刻或電鍍技術所形成者。 3 8、如申請專利範圍第3 6項所述之系統級構裝裝置,其中 該散熱結構係為一微散熱鰭狀體。 3 9、如申請專利範圍第3 2項所述之系統級構裝裝置,其中 該至少一主動元件係以覆晶或打線方式安裝在該整^合被動 元件基板之第一表面。 4 0、如申請專利範圍第3 2項所述之系統級構裝裝置,其中 該主動元件係選自半導體晶片、微機電系統裝置或射頻裝 置。 4 1、如申請專利範圍第3 2項所述之系統級構裝裝置,其中 該封裝膠體係利用真空網印或網印後置於真空中之方式而 形成於該整合被動元件基板之第一表面,以覆蓋住該主動 元件。Page 17 544828 6. Scope of patent application Metal shielding layer. 36. The system-level structural device according to item 32 of the scope of patent application, wherein a heat dissipation structure can be further formed on the second surface of the integrated passive element substrate. 37. The system-level structural device according to item 36 of the scope of patent application, wherein the heat dissipation structure is formed by etching or electroplating technology. 38. The system-level structural device according to item 36 of the scope of application for a patent, wherein the heat dissipation structure is a micro heat dissipation fin. 39. The system-level mounting device according to item 32 of the scope of the patent application, wherein the at least one active component is mounted on the first surface of the integrated passive component substrate in a flip-chip or wire bonding manner. 40. The system-level structure device described in item 32 of the scope of patent application, wherein the active element is selected from a semiconductor wafer, a micro-electro-mechanical system device, or a radio frequency device. 4 1. The system-level assembly device described in item 32 of the scope of the patent application, wherein the encapsulant system is formed on the integrated passive element substrate by vacuum screen printing or screen printing and placed in a vacuum. Surface to cover the active element. 第18頁Page 18
TW91116701A 2002-07-26 2002-07-26 System level package apparatus and its manufacturing method TW544828B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW91116701A TW544828B (en) 2002-07-26 2002-07-26 System level package apparatus and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW91116701A TW544828B (en) 2002-07-26 2002-07-26 System level package apparatus and its manufacturing method

Publications (1)

Publication Number Publication Date
TW544828B true TW544828B (en) 2003-08-01

Family

ID=29708523

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91116701A TW544828B (en) 2002-07-26 2002-07-26 System level package apparatus and its manufacturing method

Country Status (1)

Country Link
TW (1) TW544828B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI406386B (en) * 2008-08-20 2013-08-21 Unimicron Technology Corp Micro-electro-mechanical package structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI406386B (en) * 2008-08-20 2013-08-21 Unimicron Technology Corp Micro-electro-mechanical package structure

Similar Documents

Publication Publication Date Title
CN101996894B (en) Semiconductor device and method of forming dam material around periphery of die to reduce warpage
TWI502682B (en) Semiconductor package and method of mounting semiconductor die to opposite sides of tsv substrate
TWI550739B (en) Semiconductor device and method of embedding bumps formed on semiconductor die into penetrable adhesive layer to reduce die shifting during encapsulation
TW503496B (en) Chip packaging structure and manufacturing process of the same
TWI296151B (en) Methods and apparatuses for providing stacked-die devices
JP2019021921A (en) Ceramic module for power semiconductor COB and preparation method thereof
KR100660604B1 (en) Devices and packages using thin metal
CN101228625B (en) Semiconductor package with plated connection
TW200931628A (en) Stacking die package structure for semiconductor devices and method of the same
CN101996896A (en) Semiconductor device and method for manufacturing the same
CN101996893A (en) Semiconductor device and method of forming cavity in build-up interconnect structure for short signal path between die
US10325880B2 (en) Hybrid 3D/2.5D interposer
CN107622957B (en) The manufacturing method of the three-dimension packaging structure of two-sided SiP
TW200834768A (en) Low profile ball grid array (BGA) package with exposed die and method of making same
JP2004537841A5 (en)
CN111199957A (en) Three-dimensional packaging structure integrating chip and antenna and preparation method thereof
CN217387150U (en) Semiconductor packaging structure
KR20080114603A (en) Semiconductor device package having pseudo chips
CN109920773A (en) A kind of chip based on glass cloth wire encapsulation construction and preparation method thereof again
CN112928035A (en) Board-level flip chip packaging structure with electromagnetic shielding function and preparation method thereof
CN112768364A (en) Board-level three-dimensional chip packaging structure and preparation method thereof
TW544828B (en) System level package apparatus and its manufacturing method
TW201032300A (en) Chip scale package and method of fabricating the same
CN110867385A (en) Packaging structure and preparation method thereof
CN112802809B (en) Silicon-aluminum alloy packaging substrate and preparation method thereof

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MK4A Expiration of patent term of an invention patent