TW538222B - Humidification method for increasing relative humidity of clean room - Google Patents

Humidification method for increasing relative humidity of clean room Download PDF

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Publication number
TW538222B
TW538222B TW91122711A TW91122711A TW538222B TW 538222 B TW538222 B TW 538222B TW 91122711 A TW91122711 A TW 91122711A TW 91122711 A TW91122711 A TW 91122711A TW 538222 B TW538222 B TW 538222B
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Taiwan
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air
clean room
clean
room
relative humidity
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TW91122711A
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Chinese (zh)
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B C Lee
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Au Optronics Corp
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Abstract

Disclosed is a humidification method for increasing relative humidity of clean room. The internal air of a clean room is circulated form an air cleaning chamber into the clean room and then through an air return zone to flow into the air cleaning chamber. The external air is sent into the clean room through an external air discharge port of the air cleaning chamber by a make-air unit (MAU). For effectively humidifying and precisely controlling the relative humidity of the clean room, a steaming humidifier is provided and the steaming humidifier is arranged at the external air discharge port of the air cleaning chamber to allow the steaming humidifier directly humidifying the external air.

Description

538222 五、發明說明(1) 本發明 ,且特別有 效控制相對 半導體 生產或實驗 品或實驗結 室内部環境 必須維持一 請參見 般潔淨室1 〇 (make-air 控制其溫度 氣室區20, 備的潔淨室 設備所放出 區3 0進行降 内部空氣可 淨室1 0的環 外氣空 使得送至各 的溫度與相 環境條件並 能需要在較 部空氣的相 種k问冷淨室相對濕度的加渴 關於一種可對:智、、么— “、、乃法 ’糸淨至之局部氣密區域提高並右 濕度的加濕方法。 艾有 廠、電子廠等J1董十人hi , 寺工菜或貫驗室中,一般係將產0 設備言f置於潔淨室(Clean ro〇m)内,以使= 果不文空氣中雜質或灰塵的影響。因此, :須進行嚴格的控制,例如溫度與濕度等條件 定。 第1圖,顯示常見的工業用潔淨室之一例。一 中的空氣來源,係經由一外氣空調箱 unit \MAU,未圖示)對空氣預先進行調節, 與濕度$條件之後,再送人每—潔淨室的潔淨 並將空氣經由進一步過濾後再進入放置機台設 1 0。此肖’潔淨室i 〇内的空氣可能因吸收機台 的顯熱,而使溫度提高,故可將空氣經由回風 溫,再回到潔淨氣室區2〇,如此,潔淨室1〇的 經由上述的循環過濾與降溫等動作,而使得潔 境溫度與濕度等條件維持不變。 調箱係在空氣送人潔淨室前即預先進行調節, 潔淨室1 0的空氣(以下稱外部空氣)具有相同 對濕度。然而,半導體或電子的擊程,立所需 不一定完全相同,舉例而言,某些特定i程可 高的相對濕度下進行較為適合。此時,由於外 對濕度已固定,為避免影響其他製程,不寬在538222 V. Description of the invention (1) The present invention, which is particularly effective for controlling the environment inside semiconductor production or experimental products or experimental junctions, must be maintained. Please refer to the general clean room 1 〇 (make-air controls the temperature of the air chamber area 20, preparation The clean area of the clean room equipment is 30, and the internal air can be reduced. The external air of the clean room 10 can be sent to the temperature and phase environmental conditions, and the relative humidity of the clean room can be required in the phase of the upper air. The thirst for thirst is about a method of humidification that can improve the humidity of the local air-tight area and increase the humidity to the right of the airtight area: Zhi ,,,,,,, and the law. Ai Youchang, Electronics Factory, etc. J1 Dong Shiren hi, Temple In the cooking or inspection room, the production equipment is generally placed in a clean room (Clean rom), so that the impact of impurities or dust in the air must be avoided. Therefore, strict control is required. Conditions such as temperature and humidity are determined. Figure 1 shows an example of a common industrial clean room. The air source in the first is the air conditioning unit (MAU, not shown) to adjust the air in advance. With humidity $ condition after Give each person the cleanliness of the clean room and filter the air into the placement machine after further filtering. The air in the clean room i 〇 may increase the temperature by absorbing the sensible heat from the machine, so The air is returned to the clean air chamber area 20 through the return air temperature. In this way, the clean room 10 is subjected to the above-mentioned circulation filtering and cooling operations, so that the conditions such as clean room temperature and humidity are maintained. Before the air is sent to the clean room, the air conditioning in the clean room 10 (hereinafter referred to as the outside air) has the same humidity. However, the strokes of semiconductors or electronics are not necessarily exactly the same. For example, Some specific processes can be performed at high relative humidity. At this time, because the external humidity is fixed, in order to avoid affecting other processes, it is not wide

538222538222

夕。卜部空調箱直接調整’因此必須將相對濕度需求較高的製 矛°所在的你淨室單獨進行局部加濕’以提高此一^ 相對濕度。 、 提向 ,在 潔淨室的相對濕度,一般常使用如第2a圖所示 放置機台1 2等設備的潔淨室1 0中放置加濕器5 〇 為 的方法 ’直接對潔淨室1 〇中的内部空氣進行加濕,使其到達所需 的相對濕度。然而,外部空氣(即外氣空調箱送入潔淨室 的空氣)相對濕度低於已加濕的内部空氣;即使外部空氣 經由外氣送風口 22送入潔淨氣室區20時,會與由回風區3〇 經乾式盤管3 2降溫而送回的内部空氣混合,但由於混合之Xi. The air-conditioning box of Bu Bu directly adjusts ‘so you have to separately humidify your clean room where the relative humidity is needed’ to increase the relative humidity. For the relative humidity of the clean room, the humidifier 50 is usually placed in the clean room 10, where the machine 12 and other equipment are placed as shown in Figure 2a. Humidify the interior air to the required relative humidity. However, the relative humidity of the outside air (that is, the air sent into the clean room from the outside air-conditioning box) is lower than the humidified inside air; The internal air sent back from the cooling zone 30 after being cooled by the dry coil 32 is mixed.

不均勻將使得潔淨室1 〇内部的含水率不均勻,無法有效地 控制濕度。 另一種提高潔淨室相對濕度的方法,係如第2b圖所示 ’將加濕器50放置在回風區3〇中,將回風區3〇的内部空氣 加濕至略高於潔淨室1 〇所需的相對濕度,然後經乾式盤管 3 2 2 而送回潔淨氣室區2 0,與相對濕度較低的外部空氣 混合’使得混合後的空氣達到潔淨室丨〇所需的相對濕度, 再送入潔淨室10中。然而,如此設置的方式,由於回風區 30 ^ =空氣回到潔淨氣室區20時,可能在未與外部空氣 ^分混合之前’即因短循環現象而再度經過濾而送入潔淨 室1 〇中’因此同樣可能會造成内部空氣相對濕度不均勻的 現象,無法有效地控制濕度。 上述兩種方法’在潔淨室1 0内部空氣對流混合均勻時 ’其相對濕度不均勻的現象尚不明顯;但若是潔淨氣室區The non-uniformity will make the water content inside the clean room 10 uneven, and the humidity cannot be controlled effectively. Another method to increase the relative humidity of the clean room is to place the humidifier 50 in the return air zone 30 as shown in Figure 2b, and humidify the internal air in the return air zone 30 to be slightly higher than the clean room 1 〇 the required relative humidity, and then returned to the clean air chamber area 20 through the dry coil 3 2 2 and mixed with the external air with a lower relative humidity 'so that the mixed air reaches the required relative humidity 丨 〇 , And then into the clean room 10. However, in this way, when the return air zone 30 ^ = air returns to the clean air chamber zone 20, it may be sent to the clean room 1 after being filtered again due to short-cycle phenomenon before being mixed with the outside air ^. 〇 中 'Therefore, the relative humidity of the internal air may also be uneven, and the humidity cannot be effectively controlled. The above two methods, 'When the air convection in the clean room 10 is uniformly mixed,' the phenomenon of uneven relative humidity is not obvious; but if it is in the clean air room area,

538222 之目的 外氣空 的潔淨 的相對 高潔淨 以及一 及回風 一外氣 入潔淨 蒸氣加 濕器直 室相對 器或紅 箱提供 另外, 低内部 /二動形成層流環境,會使得相對濕 影響製程或機台設備的表現。 五、發明說明(3) 20與潔淨室10内的空氣 度分佈差異更大,進而 發明概述: 有鐘於此,本發明 對濕度的加濕方法f在 下’針對所需濕度較高 確地控制此一潔淨室内 本發明揭示一種提 淨室具有一潔淨氣室區 淨氣室區通過潔淨室以 循環,且外部空氣係由 室區的一外氣送風口送 供一蒸氣加濕器',並將 氣达風口處,使蒸氣加 本發明之提高潔淨 濕器可採用電熱式加濕 的相對濕度較外氣空調 部環境保持氣密狀態。 (dry c〇U ),用以降 貫施例詳細說明: 睛參見第3圖,以-高潔淨室相對濕度的加 本發明揭示一種提 實施例中,潔淨室1 〇内 在於提出一種提高潔淨室相 調箱的控制條件不變的狀況 室進行加濕,且能有效而準 濕度。 室相對濕度的加濕方法。潔 回風區,内部空氣係經由潔 區再回到潔淨氣室區而進行 空調箱(MAU )經由潔淨氣 氣室區。本發明之方法係提 濕器設置於潔淨氣室區之外 接對外部空氣進行加濕。 濕度的加濕方法中,蒸氣加 外線加濕器,且因潔淨室内 之外部空氣高,故最好與外 回風區可設有一乾式盤管 空氣之溫度。 -潔淨室之貫施例說明本發明之提 濕方法。 鬲潔淨室相對濕度的加濕方法。本 設有機台1 2等設備,其設置如第3The purpose of 538222 is the relatively high cleanliness of the outer air and the return air and the clean air humidifier with a straight chamber or a red box. In addition, the low internal / secondary movement forms a laminar flow environment, which will make the relatively humid Affect the performance of process or machine equipment. V. Description of the invention (3) The difference between the air distribution in the clean room 20 and the clean room 10 is greater, and the invention is summarized as follows: There is a clock here, and the method for humidifying the humidity f of the present invention is accurately controlled according to the required humidity. The present invention discloses a clean room. The clean room has a clean air chamber area. The clean air chamber area is circulated through the clean room, and the external air is supplied to a steam humidifier from an external air supply port in the room area. The air is brought to the air outlet, so that the steam can be added to the improved humidifier of the present invention, and the relative humidity can be maintained in an airtight state relative to the environment of the outdoor air-conditioning unit by using electric heating humidification. (dry c〇U), which is used to explain the details of the embodiment: See Figure 3 for details.-Adding the relative humidity of the high-clean room. The present invention discloses an embodiment in which the clean room 10 is a solution for improving the clean room. Humidification is performed in the condition room where the control conditions of the phase modulation box are unchanged, and the humidity can be effective and quasi-humidity. Humidification method of room relative humidity. In the clean air return area, the internal air passes through the clean area and back to the clean air room area. The air conditioning box (MAU) passes through the clean air room area. The method of the present invention is that the humidifier is arranged outside the clean air chamber area to humidify the external air. In the method of humidifying humidity, steam is added to the external humidifier, and because the external air in the clean room is high, it is best to set a dry coil air temperature in the outdoor return air zone. -Conventional examples of clean rooms illustrate the humidifying method of the present invention.方法 Humidification method of relative humidity in clean room. This machine is equipped with equipment such as machine 1 and 2.

〇632-8642TOF(n);AU91092;Calvin.ptd 第6頁 538222 五、發明說明(4) 圖所示,同樣具有一潔淨氣室區2〇以及一回風區3〇。本實 施例,設外部空氣係由外氣空調箱(未圖示)調節成含水 率為每公斤乾空氣中含有〇 〇〇8kg的水分(即〇 〇〇8^ (vapor^/kgUry air)),而潔淨室1〇所要求之條件為含 水率為每公斤乾空氣中含有〇· 〇〇8kg的水分(即〇· 〇12 ^ (vapor)/kg(dry air))。 外部空氣由外氣空調箱調節後,如第3圖中的箭頭方 ,所不,經由潔淨氣室區2 〇的外氣送風口 2 2送入潔淨氣室 區而内部空氣係經由潔淨氣室區2 0通過潔淨室1 〇,吸收 機台12等設備的顯再經由回風區3G之乾式盤管32以降 低内部空氣之溫度,最後再回到潔淨氣室區2〇而進行循環 。=,,,於此一潔淨室10内的含水率較外氣空調箱提供 之卜4空耽商,故最好與外部環境保持氣密狀態。 以下說明本發明所採用之方法。 器5。,例如常見的電熱式加濕器,並m 濕 設置於潔淨氣室區20之外氣送户 $乱口濕态50 友丄从尸 礼^风口 ^處,如此,當外邱处 虱由外氣送風口22送入潔淨氣室區卜。卜 直接對外部空氣進行加濕。 …孔加濕為50可 本發明之提高潔淨室相 氣加濕器50可使水分穩定地 室1 0内必須保持潔淨環境, 生銹蝕的電熱式加濕器較佳 成本較高的蒸氣加濕器5 〇, 外’由於潔淨室1 〇内的含水 對濕度的加濕方法中,使用装 加濕至外部空氣’ 1由於潔; 因此蒸氣加濕器50採用不易 =可採用紅外線加濕器等 乂確保加濕動作穩定進行。 率較外氣空調箱提供之外部空〇632-8642TOF (n); AU91092; Calvin.ptd Page 6 538222 V. Description of the invention (4) As shown in the figure, it also has a clean air chamber area 20 and a return air area 30. In this embodiment, it is assumed that the external air is adjusted by an external air conditioner (not shown) to have a moisture content of 0.008 kg of moisture per kg of dry air (that is, 0.008 ^ (vapor ^ / kgUry air)). , And the condition required for the clean room 10 is that the moisture content contains 0.008 kg of water per kilogram of dry air (that is, 0.0012 ^ (vapor) / kg (dry air)). After the outside air is adjusted by the outside air conditioning box, as shown by the arrow in FIG. 3, the outside air is sent into the clean air chamber area through the outside air supply port 22 of the clean air chamber area 20 and the internal air is passed through the clean air room. Zone 20 passes through the clean room 10, and the display of the absorption machine 12 and other equipment passes through the dry coil 32 of the return air zone 3G to reduce the temperature of the internal air, and finally returns to the clean air zone 20 for circulation. = ,, The moisture content in this clean room 10 is higher than that provided by the outdoor air-conditioning box. Therefore, it is better to keep the airtight state with the external environment. The method used in the present invention will be described below.器 5。 5. For example, a common electric humidifier, and m is set outside the clean air chamber area 20 to send households $ mess mouth wet state 50 You 丄 from the corpse ceremony ^ wind mouth ^, so when the outer Qiu place lice from the outside The air supply air outlet 22 is sent into the clean air chamber area. Bu directly humidify the outside air. … The hole humidification is 50, which can improve the clean room phase gas humidifier 50 of the present invention, which can stabilize the moisture in the room 10. A clean environment must be maintained, and the rusted electric heating humidifier is preferably a higher cost steam humidifier. The humidifier 5 〇, the outer 'humidity method due to the water in the clean room 10, the use of humidification to the outside air' 1 because of cleanliness; therefore, the use of steam humidifier 50 is not easy = infrared humidifier can be used, etc.乂 Make sure that the humidification operation is stable. The ratio of external space provided by the outdoor air conditioning box

538222 五、發明說明(5) """ ' —^__ 氣间’且與其他潔淨室内的相對濕度不同,故最 Π1氣密狀態,以免使得其相對濕度受外界影ΐ1二 、交。另外,回風區可設有一乾式盤管(dry c〇il 9 降低内部空氣之溫度。 ,用以 °月再參見第4圖,針對上述實施例中的加濕動 一 說明。第4圖係顯示空氣在大氣壓(1〇1· 325kpa )進行 :的空氣線圖,其中,A點係顯示外部空氣進入外5 ^况 粕,並經外氣空調箱的冰水盤管降溫除濕後之送庙氣二凋 水率為每公斤乾空氣中含有〇〇〇8kg (假設室點’此 的水分,但因溫度低 :二 ::的加熱過程,此時由於外部空氣的含水 ,卜:: 專3水率線向右移動而到達B點,即可得到送風點 /σ 接著,Β點的'外部空氣經由外氣送風口 22送入如,三 室區20。如前所述,本發明之蒸氣加濕器⑼設置:二氣, 風口 22處’直接對外部空氣進行加濕,因此“卜” 與蒸氣加濕器50提供的蒸氣混合,由β點向左上工礼百先 點,此時外部空氣的含水率變為每公斤乾空氣中斤^動至c 需之含水率狀況。 ^乳即為潔淨室所 另外,在潔淨室1 〇内的内部空氣,备 備的顯#,而可能由D點沿等含水率'線向曰、,台二等, 度上昇,因此在進入回風區30之後,可驻山 便付皿 内部空氣的溫度降回23 °C,如此即可使^乾式盤管32將 溫度2 3 °C,相對濕度65%的狀況,再回于部空氣保持在 巧冷淨氣室區2 〇。538222 V. Description of the invention (5) " " " '— ^ __ 气 间' and its relative humidity is different from other clean rooms, so it is airtight, so as not to make its relative humidity affected by external influences. . In addition, a dry coil (dry coil 9) can be provided in the return air area to reduce the temperature of the internal air. Refer to FIG. 4 for ° month and a description of the humidification in the above embodiment. Air line diagram showing the air at atmospheric pressure (101 · 325kpa), where point A shows that outside air enters the outside, and is sent to the temple air after cooling and dehumidification through the ice water coil of the air conditioning box. The second withering rate is 0.008 kg per kilogram of dry air (assuming that the chamber point 'this moisture, but because of the low temperature: two :: heating process, at this time due to the moisture in the external air, bu :: 3 water The rate line moves to the right to reach point B, and the air supply point / σ can be obtained. Next, the 'outside air' at point B is sent into the three-chamber area 20 through the outdoor air supply port 22. As described above, the steam humidification of the present invention Device setting: two air, 22 air outlets' directly humidifies the external air, so "bu" is mixed with the steam provided by the steam humidifier 50, from the point β to the left, the first hundred points. The moisture content becomes the moisture content condition required to move to kg in kg of dry air. ^ Milk is the clean room. In addition, the internal air in the clean room 10, the prepared display #, and may be from point D along the iso-moisture content line to, said, the second stage, the degree rises, so it is entering After returning to the wind zone 30, the temperature of the air inside the pan can be reduced back to 23 ° C, so that the dry coil 32 can return the temperature of 23 ° C and 65% relative humidity to the air Keep it in the cold and clean air chamber area 20.

0632-8642TW(n);AU91092;Calvin.ptd 第8頁 538222 發明說明(6) 、,此’由於加濕後的外部空氣以及經由回風區3〇的乾 式〇盤官32降溫後的内部空氣都處於溫度23 °C,相對濕度 65%的狀況,因此即使兩者在潔淨氣室區2〇内混合不均X勻 分:ί it循環的現象,也不會使得潔淨室10的相對濕度 室1 〇内的相對濕度。 x 有效而準確地控制潔淨 雖然本發明已以具體之較 非用以限定本發明,任何熟例揭露如i,然其並 明之精神和範圍内,仍可作4b J、技藝者,在不脫離本發 明之保護範圍當視後附之申二=的更動與潤飾,因此本發 τ %專利範圍所界定者為準。0632-8642TW (n); AU91092; Calvin.ptd Page 8 538222 Description of the invention (6), this' because of the humidified external air and the dry air through the return air zone 30 Panwan 32 cooled internal air Both are at a temperature of 23 ° C and a relative humidity of 65%, so even if the two are mixed unevenly and evenly in the clean air chamber area 20, it will not make the relative humidity room of the clean room 10 Relative humidity within 10%. x Effective and accurate control of cleanliness Although the present invention has been used to define the present invention in a more specific way, any familiar example is disclosed as i, but within the spirit and scope of the same, it can still be a 4b J, an artist, without departing The protection scope of the present invention shall be subject to the modification and retouching of the attached application No. 2 =, so the definition in the patent scope of τ% shall prevail.

538222 圖式簡單說明 為使本發明之上述及其他目的、特徵和優點能更明顯 易懂,下文特舉一具體之較佳實施例,並配合所附圖式做 詳細說明。 圖式說明: 第1圖係潔淨室的示意圖。 第2a圖係習知潔淨室加濕方法中在潔淨室内放置加濕 的不意圖。 第2b圖係習知潔淨室加濕方法中在潔淨室的回風區内 放置加濕器的示意圖。 第3圖係本發明一實施例之潔淨室的示意圖。 第4圖係上述實施例之外部空氣加濕的空氣線圖。 符號說明: 10〜潔淨室、 1 2〜機台; 2 0〜潔淨氣室區; 2 2〜外氣送風口; 3 0〜回風區; 32〜乾式盤管; 5 0〜蒸氣加濕器。538222 Brief description of the drawings In order to make the above and other objects, features, and advantages of the present invention more comprehensible, a specific preferred embodiment is given below and described in detail with the accompanying drawings. Description of the drawings: Figure 1 is a schematic diagram of a clean room. Fig. 2a shows the intention of placing humidification in a clean room in the conventional clean room humidification method. Fig. 2b is a schematic view of placing a humidifier in the return air zone of a clean room in the conventional clean room humidification method. FIG. 3 is a schematic diagram of a clean room according to an embodiment of the present invention. Fig. 4 is an air line diagram for humidifying outside air in the above embodiment. Explanation of symbols: 10 ~ clean room, 12 ~ machine; 20 ~ clean air zone; 2 ~ external air supply port; 30 ~ return air zone; 32 ~ dry coil; 50 ~ steam humidifier .

0632-8642TWF(n);AU91092;Calvin.ptd 第10頁0632-8642TWF (n); AU91092; Calvin.ptd Page 10

Claims (1)

538222 六、申請專利範圍 1. 一種提高潔淨室相對濕度的加濕方法,其中該潔淨 室具有一潔淨氣室區以及一回風區,使得内部空氣係經由 該潔淨氣室區通過該潔淨室以及該回風區再回到該潔淨氣 室區而進行循環,且外部空氣係由一外氣空調箱(MAU ) 經由該潔淨氣室區的一外氣送風口送入該潔淨氣室區;該 方法包含下列步驟: 提供一蒸氣加濕器;以及 將該蒸氣加濕器設置於該潔淨氣室區之該外氣送風口 處,使該蒸氣加濕器直接對該外部空氣進行加濕。 2. 如申請專利範圍第1項所述之提高潔淨室相對濕度 的加濕方法,其中該蒸氣加濕器係電熱式加濕器。 3. 如申請專利範圍第1項所述之提高潔淨室相對濕度 的加濕方法,其中該蒸氣加濕器係紅外線加濕器。 4. 如申請專利範圍第1項所述之提高潔淨室相對濕度 的加濕方法,其中該潔淨室係與外部環境保持氣密狀態。 5. 如申請專利範圍第1項所述之提高潔淨室相對濕度 的加濕方法,其中該回風區設有一乾式盤管(d r y c 〇 i 1 ),用以降低該内部空氣之溫度。538222 VI. Scope of patent application 1. A humidification method for increasing the relative humidity of a clean room, wherein the clean room has a clean air room area and a return air area, so that the internal air passes through the clean air room area through the clean room and The return air area returns to the clean air room area for circulation, and the external air is sent into the clean air room area by an external air conditioning box (MAU) through an external air supply port of the clean air room area; the The method includes the following steps: providing a steam humidifier; and setting the steam humidifier at the outside air supply port in the clean air chamber area, so that the steam humidifier directly humidifies the external air. 2. The humidifying method for increasing the relative humidity of a clean room as described in item 1 of the scope of the patent application, wherein the steam humidifier is an electric heating humidifier. 3. The humidifying method for increasing the relative humidity of a clean room as described in item 1 of the scope of the patent application, wherein the steam humidifier is an infrared humidifier. 4. The humidifying method for increasing the relative humidity of a clean room as described in item 1 of the scope of patent application, wherein the clean room is kept airtight from the external environment. 5. The humidifying method for increasing the relative humidity of the clean room according to item 1 of the scope of the patent application, wherein the return air area is provided with a dry coil (d r y c oi 1) to reduce the temperature of the internal air. 0632-8642TWF(n);AU91092;Calvin.ptd 第11頁0632-8642TWF (n); AU91092; Calvin.ptd Page 11
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111412561A (en) * 2020-02-28 2020-07-14 上海碳索能源服务股份有限公司 Constant temperature and humidity control system and method for semiconductor clean room based on MAU and DCC

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111412561A (en) * 2020-02-28 2020-07-14 上海碳索能源服务股份有限公司 Constant temperature and humidity control system and method for semiconductor clean room based on MAU and DCC

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