537955 五、發明說明（1) 許多槽成型為非網印式導光板被應用於 如數位相機、液晶顯示器背光板上 或反射式L C D用之前本#，士、甘m _ 川心則九扳，尤其用於LCE)背光板上可節 本，因傳統背光板，都須在導光板上加 層聚。光顧公司專利產品），其中聚光片就佔；： 組3 0%以上成本，為了降低成本因而本發明人曾研發出一、 上製作許多微小透鏡直接-體射出成型V取代 傳統的水光片（如發明專利第1 1 490 3號液晶顯示器 源）。 兩錄由-於Λ前導光板（前光板與背光板）模具的製作技術有 二一械加：工方*『參閱第—圖』，使用金屬基材 且右σ工製成光點圖案成模具或以濕蝕刻方式蝕刻出 ς 曰之圖案結構，最後配合射出成型機射出成導光 史土、、利用光阻塗於平面基板上『參閱第二圖』，細 ;::ί Ϊ阻、加熱使光阻凸點成半球形光點，再鍍金二屬 後電禱成型，利用電禱模具配合射出成型機： 作，戶超精密機械加工方法’目為使用機械加工製 益法提"：之導光板其精密度和光點圖案大小受限制， 衣作出小體積且形狀一致之微小透鏡模具，通常 /、此加工V型槽（俗稱V cut)。 光阻^ i Ϊ用光阻方法，由於是用加熱方式使基板上粒狀 材枓表面因表面張力及縮收成半球面狀，此半球 間較容易製作，因光阻塗佈容易，曝光也容 Μ/955 五、發明說明（2) 易，但在50 〜80 #m)間則是 光板所用的微透鏡粒徑約2〇 曝光設備要曝光那麼越果難直做’因此須用厚膜光阻，以目前 昂責（高能量短波+如门、半的是一件非常難的工程且設備極 有鑑於上述困難;同步：射光)。 終於開發出一種制1 = 、、、工本發明人多次的思考與實驗， 簡單、精冑、萝：二：板模具的新方法，以此方法製程 丄々…作^具成本低。 本赉明導光板模具作 導光板的製作方生，甘▲作方法要目的在於提供一種 上塗佈一層光阻%二^中係用1 00結晶方位之矽晶片基板 餘刻出具有傾斜角後… 成導電鱗方式製作成模具並配合射出成型機:出 別利二二:杯槽在導光板之製作其光學效果較佳，V形槽特 ㈣於U板之使用’但_般方法使用在基板上塗佈光 阻絰曝光顯衫後，只能製作出垂直的凹槽壁（傾斜角9 0 )無法製成V形凹槽（因光阻無法曝光成傾斜面），唯有 100結晶方位（Orientation)矽晶片方可蝕刻出具有傾斜角 54·74傾斜壁之凹形槽或V形槽（其夾角7〇· 52。）供導光 板的製作使用，而目前除了100結晶方位（〇rientati〇n)之 石夕晶片’尚沒有任何其它結晶方位矽晶片可製成此V形凹 槽。 本發明導光板模具的製作方法優點為可很快速且便宜537955 V. Description of the invention (1) Many grooves are formed into non-screen-printed light guide plates and are used in digital cameras, liquid crystal display backlight boards or reflective LCDs. Especially for LCE) backlight boards can save costs, because traditional backlight boards must be layered on the light guide plate. Patronizing the company's patented products), of which the light-condensing sheet accounts for: 30% of the cost. In order to reduce the cost, the inventor has developed a direct-body injection molding method for making many tiny lenses instead of the traditional water-lighting sheet. (Such as the invention patent No. 1 490 3 LCD source). Two recordings: Yu Yu's front light guide plate (front light plate and backlight plate) mold manufacturing technology has two tools: Gong Fang * "refer to the figure", using a metal substrate and the right σ process to make a light spot pattern into the mold Or use wet etching to etch out the pattern structure, and finally cooperate with the injection molding machine to produce light guide history, and use a photoresist to coat the flat substrate. "See the second picture", fine; Photoresist bumps are formed into hemispherical light dots, and then gold-plated. After the two are electroplated, the electric mold is used in conjunction with the injection molding machine. The ultra-precision machining method is used for the purpose of using mechanical processing methods. The light guide plate is limited in its precision and spot pattern size. The clothes are made of small lens molds with a small volume and a uniform shape. Generally, this process is a V-shaped groove (commonly known as V cut). Photoresist ^ i Ϊ The photoresist method uses the heating method to make the surface of the granular material on the substrate into a hemispherical shape due to surface tension and shrinkage. This hemisphere is relatively easy to make. Because the photoresist is easy to apply, exposure is also limited. Ｍ / 955 V. Description of the invention (2) Easy, but in the range of 50 ~ 80 #m), the micro lens used by the light plate has a particle size of about 20. Exposure equipment is more difficult to do if it is exposed. Therefore, thick film light is required. The current high responsibility (high energy short wave + such as gate, half is a very difficult project and the equipment is extremely in view of the above difficulties; synchronization: light emission). Finally, we have developed a system of 1 = ,,, and the inventor's thoughts and experiments for many times. It is simple, precise, and sophisticated: two: a new method of plate mold, and the process of this method is low. This Mingming light guide plate mold is used for the production of light guide plates. The main purpose of the method is to provide a silicon wafer substrate coated with a layer of photoresistance. … Made into a conductive scale to form a mold and cooperate with an injection molding machine: Chubley 22: Cup grooves have better optical effects in the production of light guide plates, V-shaped grooves are especially used for U-boards, but the general method is used in After coating the photoresist on the substrate, only vertical groove walls (inclination angle 90 °) can be made. V-shaped grooves cannot be made (because of the photoresist, it cannot be exposed as an inclined surface). Only 100 crystal orientations are available. (Orientation) A silicon wafer can be etched with a concave groove or a V-shaped groove with an inclined wall of 54.74 (its angle is 70.52.) For the production of light guide plates. Currently, except for 100 crystal orientation (〇rientati 〇n) Shi Xi wafer 'No other crystal silicon wafer can be made into this V-shaped groove. The manufacturing method of the light guide plate mold of the invention has the advantages of being very fast and cheap.
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537955 圖式簡單說明 茲為了使本發明說明具有可實施與特徵功效，特為本 發明「導光板模具的製作方法」配合圖示說明如下，敬請 參閱。 圖示部份537955 Brief description of the drawings In order to make the description of the present invention implementable and characteristic, the “Making Method of the Light Guide Plate Mould” of the present invention is illustrated as follows, please refer to it. Graphic part
第 一 圖 係 傳 統 機 械 加 工 方 式 製 作 導 光 板 模 具 方 法 流 程 圖 第 二 圖 係 傳 統 光 阻 方 式 製 作 導 光 板 模 具 方 法 流 程 圖 第 三 圖 係 本 發 明 厂 導 光 板 模 具 的 製 作 方 法 J 流 程 圖 第 四 圖 係 本 發 明 厂 導 光 板 模 具 的 製 作 方 法 J 之 矽 基 板 剖 面 圖 第 五 圖 係 本 發 明 厂 導 光 板 模 具 的 製 作 方 法 J 之 矽 基 板 塗 佈 光 阻 層 示 意 圖 第 六 圖 係 本 發 明 厂 導 光 板 模 具 的 製 作 方 法 j 之 矽 基 板 上 之 部 份 光 阻 曝 光 顯 影 之 示 意 圖 第 七 圖 係 本發 明 厂 導 光 板 模 具 的 製 作 方 法 J 之 矽 基 板 上 做 刻 凹 槽 成 型 結 構 圖 第 八 圖 係 本發 明 厂 導 光 板 模 具 的 製 作 方 法 J 之 矽 基 板 上 除 去 光 阻 後 之 形 成 具 有 凹 槽 結 構 之 矽 基 板 結 構 圖 第 九 圖 係 本 發 明 厂 導 光 板 模 具 的 製 作 方 法 j 之 做 金 屬 層 結 構 圖 第 十 圖 係 本 發 明 厂 導 光 板 模 具 的 製 作 方 法 J 之V形凹》 第7頁 537955 圖式簡單說明 第十一圖 第十二圖 第十三圖 導光板成品立體圖 係本發明「導光板模具的製作方法」之v形凹溝 導光板成品立體圖 係本發明「導光板模具的製作方法」之v形凹槽 導光板成品立體圖 係本發明「導光板模具的製作方法」製成導光 板的應用不意圖 圖號部份 « 10 11 12 13 14 矽基板 上光阻層 下光阻層 顯影區 名虫刻凹槽 傾斜壁 金屬導電層 V形凹槽導光板 V形凹槽 鎳（N i)膜層 V形凹溝導光板 V形凹溝 基板 菱鏡片 1 5 .發光二極體 1 6.反射層 1 7.擴散片 <·The first diagram is a flowchart of a method of manufacturing a light guide plate mold by a traditional mechanical processing method. The second diagram is a flowchart of a method of manufacturing a light guide plate mold by a traditional photoresist method. The third diagram is a method of manufacturing a light guide plate mold of the factory of the present invention. Sectional view of the silicon substrate of the method for manufacturing the light guide plate mold of the factory of the present invention. The fifth figure is a schematic diagram of the method of making the light guide plate of the factory of the invention. Schematic diagram of partial photoresist exposure and development on the silicon substrate of method j. The seventh diagram is a method for making a light guide plate mold of the factory of the present invention. The eighth diagram is a light guide plate mold of the factory of the present invention. The method of making J is to remove the photoresist from the silicon substrate. The ninth diagram of the silicon substrate structure diagram of the groove structure is the manufacturing method of the light guide plate mold of the factory of the present invention. The tenth diagram is the manufacturing method of the light guide plate mold of the factory of the present invention. The drawings briefly explain the eleventh, twelfth, and thirteenth perspective views of the finished light guide plate. The perspective view of the finished v-groove light guide plate of the present invention "method of manufacturing a light guide plate mold" is the present invention "method of making a light guide plate mold" The finished three-dimensional view of the V-shaped groove light guide plate is the "production method of the light guide plate mold" of the present invention. The application of the light guide plate is not intended to be part of the drawing. «10 11 12 13 14 Development of the photoresist layer under the photoresist layer on the silicon substrate Area name Insect carved groove Inclined wall Metal conductive layer V-shaped groove Light guide plate V-shaped groove Nickel (N i) film layer V-shaped groove light guide plate V-shaped groove substrate Diamond lens 1 5. Light-emitting diode 1 6 Reflective layer 1 7. Diffuse sheet < ·
537955 圖式簡單說明 敬請參閱第三圖說明： 2. 3. 4. 5. 6 · =先4用矽基板1其為丨〇〇結晶方位⑽）之矽 日日片『參閱第四圖』。 於矽基板1正、反面各上一層光阻成上光阻層2和下光 阻層3『參閱第五圖』 =用曝光顯影方式將曝光顯影區4之光阻去除『參閱第 六圖』 。 利用非等向性濕蝕刻（Anis〇tr〇pic wet etching)， 2刻形成蝕刻凹槽5及傾斜壁6，若達到一定深度即形 成夾角70· 52。『參閱第七、八圖』。 經蒸鍍亡金屬導電層7『參閱第九圖』。 再以電鑄方式形成鎳（N丨）膜層丨〇並將矽基板i去除即形 成電鑄模『參閱第十圖』。 以電鑄模配合射出成型機射出具溝 導光板11『參閱第十一圖』。 心凹，算 敬請簽閱第十二圖導亦.. a . ππ M n 口等九板亦可設計成具有點狀之V形 凹槽9的V形凹槽導光板8。 參閱第十三圖係本發明道 ^ ^ ^ ^ + s明導光板的應用不意圖。 綜上所述，本發明「暮忠 «537955 For a brief description of the diagram, please refer to the description of the third diagram: 2. 3. 4. 5. 6 · = First 4 silicon substrates 1 which is 丨 〇〇 crystal orientation ⑽) silicon sun and sun tablets "refer to the fourth diagram" . On the front and back sides of the silicon substrate 1, a photoresist is formed on each of the front and back sides to form an upper photoresist layer 2 and a lower photoresist layer 3. "Refer to the fifth figure" = Use the exposure and development method to remove the photoresist of the exposed development area 4 "see the sixth figure" . Using anisotropic wet etching, an etching groove 5 and an inclined wall 6 are formed in 2 etches, and an angle of 70 · 52 is formed when it reaches a certain depth. "See Figures 7 and 8". The vapor-deposited conductive layer 7 of metal (refer to the ninth figure). Then, a nickel (N 丨) film layer is formed by electroforming, and the silicon substrate i is removed to form an electroforming mold "see Fig. 10". The grooved light guide plate 11 is formed by using an electroforming mold and an injection molding machine [refer to FIG. 11]. Concave, count. Please sign the twelfth guide. A. Nine plates such as ππ M n can also be designed as a V-shaped groove light guide plate 8 with a point-shaped V-shaped groove 9. Refer to the thirteenth figure is the application of the invention ^ ^ ^ ^ + s The application of the light guide plate is not intended. In summary, the present invention "Mu Zhong«
為r少# 士爲制扣#抑 ν先板模具的製作方法」其優點 馬郎令成本及製私間卓、拜令 ,〇 /¾ ^ ^ 積达、，可很快速且便宜製作出V为 r 少 # 士 为 制 扣 # 抑 ν The method of making the first plate mold "has the advantages of Ma Langling cost and the production of private zhuo, bailing, 〇 / ¾ ^ ^ Accumulate, can make V very quickly and cheaply
537955 圖式簡單說明 形槽其夾角為7 0 . 5 2 ° ，主要是應用於液晶顯示器背光膜 組上導光板之設計，如用於前光板與背光板，但其缺點為 僅能製作此7 0. 5 2 °夾角V形槽而無其它角度，不過此角度 已可運用於導光板之V形槽光點且效果良好。537955 The diagram simply illustrates that the angle of the groove is 70. 5 2 °, which is mainly used for the design of the light guide plate on the backlight film group of the liquid crystal display, such as the front light plate and the backlight plate, but the disadvantage is that only this 7 can be made. 0. 5 2 ° V-groove with no other angle, but this angle can already be applied to the V-groove light spot of the light guide plate with good effect.
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