TW527695B - High reliability fuse structure - Google Patents

Abstract

A high reliability fuse structure is provided. It comprises a substrate with a reserved fuse area. A first conductor layer is formed on a part of the substrate. A first insulation layer is formed on the substrate and the first conductor layer. A second conductor layer is formed on a part of the first insulated layer that includes the reserved fuse area and the bottom side of a part of the second conductor layer overlaps the corresponding first conductor layer. At least a conductive plug crosses the first insulation layer to electrically connect the first conductor layer and the second conductor layer. A second insulation layer is formed on the first insulation layer and extends to upon the second conductor layer to protect the conductive plug against being corroded by the external gas. A third conductor layer is formed on the second insulation layer. This fuse structure can protect the conductive plug against the external gas corrosion and prevent damaging the neighboring fuses when conducting the laser blow process of the fuse area, so the reliability of the fuse structure is raised.

Description

527695 V. Description of the invention (1) [Field of the invention] The present invention relates to a fuse structure with high reliability; in particular, it can ensure that the conductor plug is protected from external air erosion, and is used for laser burning. Fuse structure to avoid damage to adjacent fuse structure during Laser Blow process. [Known technical description] Integrated circuits usually form fusible links, that is, "fuse", as programming elements to facilitate customers in integrated circuits. After the circuit is manufactured, it is programmed. Of course, the fusible links are not limited to stylized uses. These links can also be used to repair defective circuits. For example, integrated circuit memory is usually formed with redundant circuits

In the ClrCU1 〇 area, when a defective circuit is found during component testing, a laser fuse (Laser Biow) fusible connection line can be used, and the efficacy of the defective circuit. In order for the laser to blow the fuse, the operator must usually form a fuse E (fuse ^ ndw = exposed fuse) in the integrated circuit process. However, the conventional staggered fuse (staggered after the laser blown process, It is often found that the laser beam i: 3 i: ΐ thermal scattering and other original ® 'caused the adjacent fuse structure X "shock next to the fuse—sh0Clo's damage, such as the occurrence of cracks 2 3 F' · 1, Make the sub product fail the high temperature and high humidity accelerated stress test & 1 and reduce the reliability and yield of the product. In addition, in the conventional staggered fuse structure, the conductor plug between the upper and lower metal layers is the fifth Page 527695

(contact or plug) is also prone to moisture intrusion due to its close proximity to outside air, which makes the product fail to perform high temperature and high humidity accelerated stress tests (HAST Fai 1), and reduces the reliability and yield of the product. . In the following, a cross-sectional view of the conventional fuse structure shown in FIG. 1 and a top view of the conventional fuse structure shown in FIG. 2 are used to explain the conventional fuse structure. Among them, the first figure is viewed from the C-C 'tangent of the second figure.

First, referring to FIG. 1, reference numeral 100 indicates an insulating layer substrate having a predetermined fuse region 110. A part of the substrate 100 is formed with a metal layer 'M0. An oxide layer 12 is formed on the M0 layer. Then, another metal layer M1 is formed on part of the oxide layer 120. There is an oxide layer 120 between the M0 layer and the M1 layer, and at least one conductor plug 130 passes through the oxide layer 120 for electrically connecting the M0 layer and the M1 layer. In addition, a fuse window 140 is formed above the part of the metal layer 0 and the part of the oxide layer including the predetermined fuse region 110, and the symbol 15 represents a passivation layer. In the conventional wire-finishing structure, the conductors of the upper and lower metal layers 金属 and M1 are electrically connected. The edge of the plug 130 is relatively close to the outside air 131 and is easily eroded by water vapor, which makes the product high temperature and high humidity. HAST Fail and accelerated product reliability and yield reduction.

Also, please refer to Fig. 2. Fig. 2 is a top view of Fig. 1. Among fuses 1¾ 1 4 0, there are usually a plurality of fuse structures 2 i 〇, 2 2 〇, 2 3 〇, each The fuse structure includes the Mo layer, the conductor plug 30, and the M1 layer. Among them, the solid line indicates the layer M1 'and the dotted line indicates the layer μ, and each fused silk structure has its own fuse region 11 °. For example, when the laser beam 29 is irradiated on the fuse 527695 V. Description of the invention (3) The layer 220 of the structure 220 located in the predetermined fusing area 110, due to the misalignment of the laser beam 290 or the scattering of laser heat As a result, the M 0 layer adjacent to the dissolved filament structure 2 1 0, 2 3 0 is damaged by thermal shock, for example, a crack is generated, and the product is subjected to high temperature and high humidity accelerated stress testing. Failure (HAST Fail), and reduction in product reliability and yield. [Summary of the Invention] In view of this, the object of the present invention is to provide a highly reliable fuse structure, in particular, to ensure that the conductor plug is protected from external air erosion, and during the laser blow process. , To avoid damage to the adjacent fuse structure. According to the above object, the present invention provides a highly reliable fuse structure including: (a) a substrate having a predetermined fuse region on the substrate; (b) a first conductor layer formed on part of the substrate; A first insulating layer is formed on the substrate and the first conductor layer; (d) a second conductor layer is formed on a portion of the first insulating layer including the predetermined fuse region and a portion of the second conductor The side below the layer is a corresponding overlapping part of the first conductor layer; (e) at least one conductor plug passes through the first insulation layer to electrically connect the first conductor layer and the second conductor layer a second An insulating layer 'formed on part of the first insulating layer and extends to part of the second conductor f' is used to ensure that the conductor plug is protected from outside air erosion; and (g) a third conductor layer is formed on the On the second insulation layer. In addition, the present invention also proposes a fuse window. The fuse window has a plurality of wire-refining structures, and each of the fuse structures includes: (a)-a base, the _

W695 Description of the invention (4) _ The substrate has — " box a on the substrate; and _ break area; (b) a first conductor layer formed on a conductor layer; (d) C_ first insulating layer A part of the first conductor layer formed on the base and the first fuse region is formed on the corresponding side including the predetermined lower side; 2: upper: and part of the second conductor wide plug passes through the first One. Stabbing the first conductor layer; (e) at least one conductor and the second conductor layer; an edge layer for electrically connecting the first conductor layer and the edge layer, and extending the first insulation layer to the second insulation layer, Formed on part of the first insulation plug to prevent outside air erosion: the second conductor is on one layer to ensure that the conductor is on the two insulation layers. ## In the hair, a second conductor layer is formed in the predetermined fuse region of the first conductor layer. 2 ^ The fuse structures in the window have their own contact with each other, and each of the fuses :: the fuse structures are not electrically connected to each other and the fuses are adjacent to each other. &Quot;Cap; the second conductor layer of the towel The two sides are opposite to the body layer. The second insulation layer and the third structure in the structure of the present invention are characterized by: (a) Because the second insulation layer of the present invention is partly more brilliant than the conventional structure One layer of the first body sound, so the first edge layer, and extends to part of the second lead. Ensure that the conductor plug avoids external air erosion and enhances the product. The laser light is irradiated on the second conductor layer. Its purpose is: when it is enough, the first fuse layer of the fuse structure is located in the predetermined dissolution area, and the third conductor layer of the adjacent fuse structure can block or absorb it. Excessive laser energy so that adjacent material structures will not be hit

527695 Fifth, the invention description (5) harm, which can improve the reliability of the product. Brief Description of the Drawings Fig. 1 is a cross-sectional view of a conventional melting wire structure. Figure 2 is a top view of Figure 1. Fig. 3 is a sectional view of the fuse structure according to the first embodiment of the present invention. Fig. 4 is a top view of Fig. 3. Fig. 5 is a cross-sectional view taken along the line E-E in Fig. 4. Explanation of symbols 100, 300 ~ insulating layer substrate M 0, M1 ~ conductor layer; 130, 350 ~ conductor plug; 140, 380 ~ fuse window; 320 ~ first conductor layer; 340 ~ second conductor layer; 370 ~ third conductor layer; 210, 220 '230, 410 290, 490 ~ laser beam. 110, 310 ~ predetermined fuse area 1 2 0 ~ oxide layer; 1 31 ~ outside air; 150, 390 ~ passivation layer; 330 ~ first insulation layer; 3 6 0 ~ second insulation layer; 420, 430 ~ fuse structure EXAMPLES Hereinafter, examples of the present invention will be described using FIG. 3 and FIG. 4. Fig. 3 is a sectional view of a fuse structure according to an embodiment of the present invention. Figure 4 is a top view of Figure 3. Among them, the third figure is viewed from d-D, tangent of the fourth figure.

0548-7018TWF; 90039 »Jacky.ptd Page 9 527695 V. Description of the Invention (6) First, referring to Figure 3, this figure shows an insulating layer substrate 300 composed of, for example, p £ — τ £ 〇s silicon oxide, The substrate has a predetermined fuse region 3 1 0, and a first conductor layer 320 made of, for example, a tungsten metal material is formed on the surface of the substrate 3 0 0. A first insulating layer 330 is formed on the substrate 300 and the first conductor layer 32. The first insulating layer 330 is, for example, a silicon dioxide layer having a thickness of about 0.4 // Π1. Still referring to FIG. 3, a second conductor layer 34o is formed on the first insulating layer 330, which is located in a portion including the predetermined fuse region 31o, and the first conductor layer 340 is, for example, You Shao, The copper copper alloy or polycrystalline spar material is composed of 'and a part of the lower side of the second conductor layer 3 4 0 overlaps a part of the first conductor layer 32 0. Then, referring still to FIG. 3, at least one conductive plug 350, such as a tungsten plug, is formed and passed through the insulating layer 330 to electrically connect the first conductive layer 320 and the second conductive layer 340. Still referring to FIG. 3, a second insulating layer 36 is formed on a portion of the first insulating layer 330 and extends to a portion of the second conductive layer 34o to ensure that the conductor plug 350 avoids outside air. Eroded, and the second insulating layer 36 is, for example, a thickness of about 0.8 / zm of dioxide; an ε layer. Still referring to FIG. 3, a third conductive layer 37o is formed on the second insulating layer 360, and the third conductive layer 37o is made of, for example, aluminum, an aluminum-copper alloy, or a polycrystalline silicon material. In addition, a metal barrier layer (not shown), such as a TiN layer, may be further included at the bottom of the third conductor layer 370. Furthermore, in the foregoing fuse structure, the second conductor layer 340 and the third conductor layer 370 may further include a passivation having a fuse window opening 38o.

527695

Layer 390, and the fuse wind opening 38 is used to expose the second conductor layer 3 40 and the & Three conductor layers 370. The passivation layer 390 is made of PE-TEOS silicon oxide or silicon nitride, for example. Then refer to Figure 4. Figure 4 is a top view of a plurality of Figures 3. There are usually a plurality of fuse structures 410, 420, 430 in the fuse window 380, and each fuse structure has its own fuse region 310. Some of the second conductor layers 34o correspond to the fused region 31o. The first conductor layer 320 is protected by the third conductor layer 370. E.g

When the laser beam 490 irradiates the second conductor layer 34o of the fuse structure 420 located in the predetermined fuse region 310, the excess energy of the laser beam 490 will be absorbed by the adjacent fuse structures 41. The absorption of the third conductor layer 370 of 430, the first conductor layers 302, 320 of the adjacent fuse structures 410, 430 are protected from being damaged, and the product can be improved. Reliability and yield. It is particularly emphasized here that the second conductor layer 370 of each fuse structure 41 o, 42 o, and 43 o can be formed as a whole and connected to each other at the same time as shown in FIG. 4. It should be noted here that The third conductor layer 370 and the first and second conductor layers 320 and 340 are insulated from each other by the second insulating layer 360, so there will be no short circuit between the fuse structures 41, 42, and 43. The situation happened.

FIG. 5 is a cross-sectional view taken along the line E_E in FIG. 4. It can also be seen from FIG. 5 that, the fuse structures 410, 420, and 430 do not make electrical contact with each other, and two of the second conductor layer 340 in each of the fuse structures 41, 42, 40, 43. Side, corresponding to the adjacent fuse structures 410, 420,

0548-7018TWF; 90039; Jacky.ptd Page 11 527695 V. The second insulating layer 360 and the third conductor layer 370 in the description of the invention (8) 430. When the laser beam 490 irradiates the second conductor layer 340 of the fuse structure 420 located in the predetermined fuse region 31o, the excess energy of the laser beam 490 will be absorbed by the adjacent fuse structures 41o, 43 〇The third conductor layer 37 absorbs, so that the adjacent first fuse layers 410, 430 and the first conductor layers 320, 320 are protected from being damaged, which can improve product reliability and yield. . It should also be emphasized here that the second insulating layer 36 is a silicon dioxide layer with a thickness of about 0.8 / zm. Therefore, if the third conductive layer 37 is melted, the first conductive layer 37 will not be damaged. The insulating layer 33 〇, and the first conductor layer 320 can be timed. "

[Advantages and characteristics of the present invention] The advantages and characteristics of the high-reliability fuse structure of the present invention are: (a) Because the fuse structure of the present invention has a second insulating layer 360 in part than the conventional structure, An insulation layer 33 is formed and extends to part 3 ′, so that the conductor plug 35 () can be prevented from being corroded and the reliability of the product can be improved. On the Λ Λ, the Bu conductor layer 32G and the conductor plug 35 (2; on the edge layer 36 °, a third layer of the third conductor layer 370 is formed: when the laser light 490 is irradiated at a certain position

The second conductive layer 34 of the predetermined fuse region 310. Time: The third conductor layer 370 of 7 structure can block or absorb the excess thunder and thorium, so that the first conductor layer 3 2 〇 and the ^^^ of the adjacent fuse structure will be injured, so it can be damaged. Improve product reliability. Plug 35

527〇y ^

Claims (1)

527695 VI. Application for patent scope 1. A highly reliable fuse structure, comprising: a substrate having a predetermined dissolution region on the substrate; a first conductor layer formed on part of the substrate; a first insulating layer Is formed on the base and the first conductor layer; a second conductor layer is formed on a portion of the first insulation layer including the predetermined fusing area, and a portion of the second conductor layer below the side corresponds to overlap Part of the first conductor layer; at least one conductor plug passing through the first insulation layer to electrically connect the first conductor layer and the second conductor layer; a second insulation layer formed on part of the first conductor layer An insulating layer and extending to a portion of the second conductor layer to ensure that the conductor plug is protected from outside air erosion; and a third conductor layer is formed on the second insulating layer. 2. The highly reliable fuse structure as described in item 1 of the scope of the patent application, wherein the first conductor layer is a metallic material. 3. The highly reliable fuse structure according to item 1 of the patent application scope, wherein the second conductor layer is made of aluminum, aluminum-copper alloy, or polycrystalline silicon material. 4. The highly reliable fuse structure according to item 1 of the patent application scope, wherein the third conductor layer is made of aluminum, aluminum-copper alloy, or polycrystalline silicon material. 5. The highly reliable fuse structure according to item 4 of the scope of patent application, wherein a barrier layer is further formed at the bottom of the third conductor layer. 6. The highly reliable fuse structure as described in item 5 of the patent application scope, wherein the barrier layer is a T i N layer. 7. High-reliability fuse junction as described in the first patent application 0548-7018TWF; 90039; Jacky.ptd Page 14 527695 6. Patent application structure, wherein the first insulating layer is a silicon dioxide layer. 8. The highly reliable fuse structure according to item 1 of the patent application scope, wherein the second insulating layer is a silicon dioxide layer. 8 // m。 9. The high reliability fuse structure as described in the first patent application scope, wherein the thickness of the second insulating layer is approximately 0.8 // m. 10. The highly reliable fuse structure as described in item 1 of the scope of the patent application, wherein the conductor plug is a crane plug. 11. The highly reliable fuse structure according to item 1 of the scope of patent application, wherein the second conductor layer and the third conductor layer further include a passivation layer having an opening, and the opening is used for The exposure includes the second conductor layer and at least a portion of the third conductor layer located in the predetermined fusing area. 1 2. The high-reliability fuse structure according to item 11 of the scope of patent application, wherein the passivation layer is a PE-TEOS silicon oxide or silicon nitride layer. 1 3. A fuse window, the fuse window having a plurality of fuse structures therein, each of the fuse structures including: a substrate having a predetermined fuse region on the substrate; a first conductor layer formed on a portion On the substrate; a first insulation layer formed on the substrate and the first conductor layer; a second conductor layer formed on a portion of the first insulation layer including the predetermined fuse region, and a portion of the first insulation layer The lower sides of the two conductor layers are correspondingly overlapping portions of the first conductor layer; at least one conductor plug passes through the first insulation layer to electrically connect the first conductor layer and the second conductor layer; a second An insulating layer formed on part of the first insulating layer and extending 0548-7018TWF; 90039; Jacky.ptd Page 15 527695 VI. The scope of application for patents covers part of the second conductor layer to ensure that the conductor plug avoids invasion by outside air; and a third conductor layer is formed on On the second insulating layer; wherein the fuse structures in the fuse window have their respective predetermined fuse regions, the fuse edge structures do not make electrical contact with each other, and each of the fuse structures The two sides of the second conductor layer correspond to the second insulation layer and the third conductor layer in the adjacent fuse structures. 14. The fuse window as described in item 13 of the scope of patent application, wherein the first conductor layer is a tungsten metal material. 1 5. The fuse window as described in item 13 of the scope of patent application, wherein the second conductor layer is made of aluminum, aluminum-copper alloy or polycrystalline silicon material. 16. The fuse window according to item 13 of the scope of patent application, wherein the third conductor layer is made of aluminum, aluminum-copper alloy, or polycrystalline silicon material. 1 7. The fuse window according to item 16 of the scope of patent application, wherein a barrier layer is further formed on the bottom of the third conductor layer. 1 8. The fuse window as described in item 17 of the scope of patent application, wherein the barrier layer is a T i N layer. 19. The fuse window according to item 13 of the scope of patent application, wherein the first insulating layer is a dioxide layer. 20. The fuse window according to item 13 of the scope of patent application, wherein the second insulating layer is a silicon dioxide layer. 2 1. The fuse window as described in item 13 of the scope of patent application, wherein the thickness of the second insulating layer is approximately 0.8 // m. 2 2. The fuse window as described in item 13 of the scope of patent application, wherein the guide 0548-7018TWF; 90039; Jacky.ptd p. 16 527695 0548-7018TWF; 90039; Jacky.ptd Page 17