TW523435B - Quasi-CW diode-pumped, solid-state UV laser system and method employing same - Google Patents

Abstract

A quasi-CW diode- or lamp-pumped, A-O Q-switched solid-state UV laser system (10) synchronizes timing of the quasi-CW pumping with movement of the positioning system (36) to reduce pumping while the positioning system (36) is moving from one target area (31) to the next target area (31) to form multiple vias in a substrate at a high throughput. Thus, the available UV power for via formation is higher even though the average pumping power to the laser medium (16), and thermal loading of the laser pumping diodes (14), remains the same as that currently available through conventional CW pumping with conventionally available laser pumping diodes (14). The quasi-CW pumping current profile can be further modified to realize a preferred UV pulse amplitude profile.

Description

523435 A7 ___B7__ V. Description of Invention (/) Related Applications This patent application claims priority based on US Provisional Patent Application No. 60 / 275,246 filed on March 12, 2001. Copyright notice © 2001 Electro Scientific Industries, Inc., a part of this patent document reveals that the material is protected by copyright. The copyright owner has no objection to the facsimile reproduction by anyone of the patent document or the patent disclosure, provided that it is published in the patent. And the patent file or record of the Trademark Office, otherwise all copyright rights will be reserved. 37 CFR § 1.71 (d). BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state laser of a diode pump, and more particularly, to a quasi-continuous-wave pulse-type ultraviolet laser system for forming a through hole in a circuit board and a processing method using the same. BACKGROUND OF THE INVENTION Different forms of laser systems have been used to drill through holes in point-to-point target areas on electronic devices such as printed circuit boards (PCBs). The following explanation is presented herein by way of example only of a diode pump solid state ultraviolet (UV) laser system and an electronic target, and should not be considered as limiting the scope of the invention. When using an acousto-optic (AQ) Q-switched continuous wave (CW) diode pump (DP) solid-state (DP) pump such as Electro Scientific Industries Inc. (ESI) Model 5200, which includes a lightwave electronic device (LWE), model 210 SS) When the laser system is used to create the through hole, the pump diode or diode will maintain the active state. Whenever the positioning system is pointing at a new target area on an electronic device, the laser switch is prevented by turning off the Q switch. Alignment of this positioning system with 3 paper standards is applicable to China National Standard (CNS) A4 specifications (210x 297 public love)-(Please read the precautions on the back before filling this page), install • n ί ϋ nnnn order --- ------ · 523435 A7 ____ B7 _ 5. Explanation of the invention (>) After the new target area, the laser system will emit one or more shots by turning on the Q switch at a predetermined repetition rate. Laser output of laser pulse. The LWE Model 210 uses two 20-watt (W) continuous wave (CW) diodes for pumping and generates a 3-watt ultraviolet (UV) output power at a repetition rate of 10 KHz. The continuous wave pump current to the diode is limited by the thermal load of the diode. If an application guarantees a large UV output power, a diode with a higher current / power rating 30. watt diode laser bars or four more 20 watt diode laser bars. With these designs, an ultraviolet output of approximately 8 watts can be expected. However, if a higher pump power is used, the thermal load on the solid-state laser medium will be increased, and thermal overload of the laser medium will permanently damage it, or cause the laser beam quality and power to be greatly deteriorated. This limitation Make laser system design and manufacturing face important engineering challenges. However, 'other pump designs such as pulse wave pumps and quasi-continuous wave pumps can be used for laser design, such as Lambda Physics, Model's early form of "Gator" ultraviolet electro-optic (E_0) Q-switched pulsed DPSS UV laser uses -0 Q switch because the laser system is suitable for high gain and low complex rate. For each pump pulse, only one ultraviolet laser pulse is generated, and the pump cycle time is limited to hundreds of microseconds (// s), so the laser output pulse repetition rate is typically limited to less than 2 KHz. This pump design is not optimal for drilling through holes, as it will adversely affect the throughput of the drilling. The conventional quasi-continuous wave pump is similar to a pulse wave pump, but has a longer pump cycle time with a lower peak power. Depending on the repetition rate and duty cycle of the diode used, the pump design can also have a size of about 4 to 2 KHz. The paper size is suitable-use Chinese national standard 21〇 (Please read the precautions on the back before filling this page )

nn 1 '^ in n · n. nn I 523435 A7 ___B7_____ 5. Description of the invention (-) Pump repetition rate and pump cycle time can be from hundreds of microseconds to milliseconds (ms). This pump design allows when the pump is turned on without Higher pump level when continuous wave is performed because the diode is "rested" (and the thermal load is stopped) whenever the pump is turned off. Therefore, during the pump time period, the laser output power is also higher than that of a comparable continuous wave pulsed laser. The laser output is controlled by controlling the current to the diode. However, the pump repetition rate of this pump design remains a significant disadvantage. Typical applications for quasi-continuous wave pumps include those that use long laser pulse widths and moderate peak-to-peak power, such as laser bonding and welding. Therefore, what is desired is a laser system that includes a pump design that promotes higher power and faster repetition rates to increase drilling output. SUMMARY OF THE INVENTION The conventional ultraviolet laser system uses a standard frequency conversion design to convert the fundamental wavelength of the laser in the infrared (IR) region to ultraviolet (UV). These ultraviolet through-hole forming systems preferably make use of high ultraviolet power and high repetition rate to achieve a high throughput of through-hole formation. Therefore, the A-0 Q-switched DPSS laser system has so far been better used for drilling through holes. However, the desired systems on the market will love higher UV power for reducing through-hole drilling time, or to complete acceptable through-holes on certain "difficult to drill" materials such as copper and FR4. Therefore, a high ultraviolet output power (5 to 15 watts) at a high repetition rate (a few KHz to several tens of KHz) will be better. Moreover, for commercial use, for example, the formation of via holes on a PCB will require the laser system to be able to complete 300 to 400 vias per second. Therefore, the laser 5 wood paper scale applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) (Please read the notes on the back before filling out this page) ^ Install 523435 A7 ____B7 V. Description of the invention (4) The positioning system must be moved to 300 to 400 new positions every second. Laser systems typically take less than 1 millisecond (ms) to drill a through hole, but in some cases it often takes longer than 1 millisecond to move to a new location for the next through hole. Therefore, in fact, the time for turning on the laser will be less than the time for turning it off, making the use of the laser rather inefficient. The invention provides a quasi-continuous wave diode / lamp pump A-0 Q switch solid-state ultraviolet laser, which can make the timing of the quasi-continuous wave pump when the positioning system is moving from one target area to the next target area. Synchronize while avoiding pumps. Therefore, the effective ultraviolet power used for through-hole formation is relatively high, and the average pump power for the thermal load of the laser medium and the pump diode remains the same as that of the conventional laser diode with a conventionally effective laser diode. The average pump power of a continuous wave pump is known. The quasi-continuous wave current waveform can be further modified to achieve a better ultraviolet pulse wave amplitude waveform. This quasi-continuous wave diode or lamp pump A-0 Q switch solid-state ultraviolet laser is novel; the synchronization of quasi-continuous wave pumps with beam scanning is novel; and this laser system is also used for through-hole formation. Is novel. Additional objects and advantages of the present invention will be apparent from the following detailed description of a preferred embodiment with reference to the accompanying drawings. Fig. 1 is a simplified schematic diagram of an embodiment of a quasi-continuous-wave diode pump A-〇Q switch laser with intra-cavity three-frequency conversion; Fig. 2A is a simplification of an example waveform of a quasi-continuous-wave diode current Graphic description; and 6 paper sizes are applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) (Please read the precautions on the back before filling out this page) ---- 523435 A7 B7 V. Description of the Invention (C) Figure 2B is a simplified graphic illustration of the A-0 Q-switch laser pulse superimposed on the quasi-pump diode current shown in Figure 2A. Description of component symbols 10 Laser system 12 Laser resonator 14 Laser pump diode 16 Laser medium 18 IR mirror 20 Ultraviolet transmittance output coupler 22 Optical axis 24 Acousto-optic Q switch 26 Frequency multiplier 28 Frequency three times 50, 50a, 50b, 50c current pulse or time interval 60, 60a, 60b, 60c laser pulse 30 workpiece 31 target area 32 central processing unit (CPU) 34 power supply 36 positioning system 38 Q switch controller 40 Laser system output pulse wave (please read the precautions on the back before filling this page) Detailed description of the preferred embodiment Figure 1 is a quasi-continuous wave pulse wave diode pump A-0 Q switch solid purple wood paper scale Applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 523435 A7 ------------ B7__ V. Description of the invention (b) Simplified schematic diagram of a preferred embodiment of the external line laser system 10, which System 10 has synchronized targets, pumps, and launches to form through-holes with high throughput. Referring to FIG. 1, the laser resonator 12 of the laser system 10 is shown with a diode 14 pump laser medium 16 on its side. However, those skilled in the art will understand that the resonator 丨 2 It is foldable and the pump design can be an "end pump" or the laser system 10 can utilize other feasible well-known configurations. The example diode 14 includes, but is not limited to, SDL-lnf. Model SDL-3200 sequence sold by San Jose, California [j 100 watt quasi-continuous wave array and 960 watt high working factor stacked array. An exemplary solid-state laser medium 16 includes a lasing material having YAG, YLF, and YVO4 components. Between the IR reflector 18 and the ultraviolet (third harmonic) transmissive output coupler 20, the resonator 12 also includes an acousto-optic (A-0) Q switch 24 and a frequency multiplier along its optical axis 22 26. A frequency tripler 28 for frequency conversion in the cavity. Those skilled in the art will understand that the frequency conversion can be done outside the resonator 12. Figures 2A and 2B (combined Figure 2) are simplified simplified illustrations of the quasi-pump diode current pulses or time intervals 50a, 50b, and 50c (collectively referred to as the current time interval 50) of the example waveforms and overlapping Example A-0 Q-switched laser pulses 60a, 60b, and 60c (collectively referred to as laser pulses 60) on the quasi-pump diode current waveforms shown in Figure 2A. Referring to FIGS. 1 and 2, the operation of the laser system is synchronized, so that when the laser system 10 finishes forming a through hole on one of the first target areas 31 on the workpiece 30, the central processing unit (CPU;) 32 will borrow The power supply 34 is controlled to stop the diode pump (convert the diode current to zero) or reduce the diode pump to a predetermined low current level. Sample power supply 34 packs 8 This paper size applies to Chinese National Standard (CNS) A4 specifications (210 X 297 meals ^-(Please read the precautions on the back of S3 before filling out this page) • · nnn I ί · ϋ n One-port T · n It in n an-523435 A7 _ B7 ___ V. Description of the invention (7) Included, but not limited to: Model SDL-820 'for use with a typical 10 microsecond (Vs) current 10 to 15 Ampere Continuous Wave Laser Diode Drivers for Transition Time; Model SDL-830 for approximately 50 Ampere Continuous Wave Laser Drivers; or Model SDL-928 for approximately 150 Amperes Peak / Quasi Continuous Wave Lasers The laser diode array drivers are all sold from SDL, Inc. of San Jose, California. Then, the positioning system 36 moves the beam output position to a new target area 31. Preferably, the beam positioning system 36 includes a The translation stage locator 2'S Hai translation stage positioner uses at least two lateral stages to allow rapid movement between target areas 31 on the same or different workpieces 30. In a preferred embodiment, the translation stage is positioned The device is a split-axis system, where Y table moves the workpiece 30 and X table moves a quick positioner and The associated focusing lens is also adjustable in the Z space size between the X and Y stages. The positioning mirror will align the optical path 22 through any turning between the laser resonator 12 and the fast positioner, such as the fast Positioners can use high-resolution linear mirrors and / or a pair of galvanometer mirrors to perform single or repeated processing operations based on the test or design information provided. The tables and positioners can be controlled and independently or Coordinated movement in response to instrumented or non-instrumented data. Beam positioning system 36 can use conventional vision or light beams to operate alignment systems that can be operated through an objective lens or separated The camera operates off-axis, and the alignment systems are well known to those skilled in the art. In one embodiment, HRVX using free library software is used in the positioning system 36 sold by Electro Scientific Industries, Inc. The vision box is used to perform alignment between the target area on the laser resonator 12 and the workpiece 30. Other suitable alignment systems are also available on the market. _ 9 This paper ruler China National Standard (^ CNS) A4 specification (21〇 X 297 mm) (Please read the precautions on the back before filling this page)

nn sip, · ϋ ϋ nn ί ί I%-523435 A7 ___B7__ 5. Description of the invention (/) In addition, the beam positioning system 36 is also best to use a contactless, small displacement sensor to determine Abbe errors caused by pitch, yaw, or roll are not indicated by on-axis position indicators such as linear scale encoders or laser interferometers. The Abbe error correction system can be calibrated against a precise reference standard, so corrections are based only on small changes in sensor readings and not on absolute accuracy of the sensor readings. This Abbe error correction system is described in detail in International Publication No. WO 01/52004 A1 published on July 19, 2001 and US Publication No. 2001-0029674 A1 published on October 18, 2001. Relevant portions disclosed in the corresponding U.S. Patent Application No. 09/755950 by Cutler will be incorporated herein by reference. Many variations of the positioning system 36 are well known to those skilled in the art, and some embodiments of the positioning system 36 are described in detail in U.S. Patent No. 5,751,585 by Cutler et al., Commercially available from Electro Scientific Industries, Inc. of Portland, Oregon's ESI model 5320 micro-via drilling system is a preferred implementation of the positioning system 36 and has been used for resin-coated copper-encapsulated laser drilling in the electronics industry.

Industries, Inc. in Portland, Oregon, other preferred positioning systems of the model series 27χχ, 43χχ, 44χχ, or 53χχ. Those skilled in the art will also understand that a system with a single χ-γ stage can optionally be used to position the beam with a fixed beam and / or a fixed galvanometer for workpiece positioning. Those skilled in the art will Recognize that this system can be programmed to use a tool path file to dynamically position the focused UV laser system to output pulses 40 to produce periodic or non-periodic wide changes. 10 This paper size applies Chinese national standards ( CNS) A4 specification (210 X 297 mm) '---- ----------------- (Please read the precautions on the back before filling this page) i] · ·

523435 A7 _____ ———- " " " " V. Useful patterns of invention description (1). When the positioning system 36 reaches or almost reaches the new target area 31 or the diode pump inhibits a predetermined time interval, the CPU 32 returns the diode to ON. The CPU 32 instructs the Q-switch controller 38 to turn on the Q-switch 24 and emits a laser pulse 60 'at a predetermined repetition rate until the second through hole is completed. The waveform of the pump current interval 50 can be adjusted to control the shape of the peak pulse power waveform of the laser pulse 60 during the quasi-continuous wave pump, such as during the period ... "flat" from low to high (Figure 2A (Shown), or high to low. In addition, these current waveforms are adjustable and have different amplitudes, so that, for example, peak chirp power can be used for drilling metal layers and lower peak chirp power can be used for drilling dielectric layers as needed. Similarly, the time period of the current pump interval 50 can be adjusted to suit the size, depth, and material of the processed vias, such as a longer current interval 50 for larger diameter vias. Figures 2A and 2B show that the laser system 10 allows, but is not required when the duty cycle can be kept the same, the variable period of the current pump interval 50 and the variable period between the current pump period 50. However, if the laser output is desired to be waveformized, the duty cycle can be similarly changed. The repetition rate of a quasi-continuous wave pump can easily reach as high as 2 kHz. The interval between the quasi-continuous wave pumps does not need to be constant. As long as the average thermal load of the laser pump diode 14 and / or the laser medium 16 is maintained Relatively constant or below the thermal damage level. < In an embodiment, the continuous wave pump 5 watt UV laser system] _〇's diode 14 and power supply 34 are changed to be connected to a variable current pump. 11 This paper size applies Chinese national standards ( CNS) A4 specification (210 X 297 mm) (Please read the notes on the back before filling this page) -I * Hi n 1 a— · n an n Order -------- -¾. 523435 A7 ________B7__ 5. Description of the invention (I u) • ---------------- (Please read the precautions on the back before filling in this page) Laser system generated 丨 〇 can be 500 KHz runs in a 2 to 1 duty cycle. They will pump the laser medium 16 for 1 millisecond before the diodes 14 stop for another 1 millisecond '. So, during the pumping cycle, about twice as much current will enter the diode 14 (and not Adversely affects the average thermal load on the diode 14 or the laser medium 16). Therefore, the laser power during this 1 millisecond pump cycle is more than twice as large as the laser power from a comparable continuous wave pump laser (especially after non-linear frequency conversion). The A-0 Q switch 24 used in the laser resonator 12 will ensure that the laser pulse 60 is emitted at a predetermined repetition rate of, for example, 10 KHz or up to 50 KHz.

The workpiece 30 may be, for example, an IC (Integrated Circuit) chip package, an MCM (Multiple Chip Module), a capacitor, a circuit board, a resistor, or a hybrid or semiconductor microcircuit. For convenience, the workpiece 30 having only four layers will be described below. For example, the top and bottom conductive layers may contain standard metals such as aluminum, copper, gold, molybdenum, nickel, palladium, platinum, silver, titanium, tungsten, metal nitrides, or combinations thereof. The thickness of the conventional metal layer varies, typically between 9 and 36 microns (where 7.8 × 10 · 3 kg of metal is equal to a thickness of about 9 microns) 'but may be thinner or a thickness of 72 microns. Typically, the conductive layer is made of the same material. The dielectric matrix or layer is sandwiched between the conductive layers and may contain, for example, standard organic dielectric materials such as phenylcyclobutane (BCB), cis-dibuteneacetamidotriazine (BT), card boards , Cyanate ester, epoxy, phenolic, polyvinylamine 'polytetrafluoroethylene (PTFE), various polymer alloys or female composition. Conventional organic dielectric layers vary considerably in thickness, but are typically thicker than metal layers. Organic dielectric layers typically have a thickness in the range of about 30 to 400 microns. _ 12 This paper size applies Chinese National Standard (CNS) A4 specification (21 × 297 mm) 523435 A7 _______B7_ 5. Description of the invention (") The dielectric layer may also contain woven or dispersed throughout the organic dielectric Examples include fibrous materials such as ramie fiber, ceramics or glass, or reinforcing components that disperse particles. Conventional reinforcing components are typically woven bundles of individual filaments or particles' having a size of about 1 to 10 microns and / or 10 to hundreds of microns. Those skilled in the art will understand that the strengthening component can be introduced into the organic dielectric as a powder and can be non-adjacent and non-uniform. Such a composite or reinforced dielectric layer typically requires a higher laser density than the energy density required to ablate the unreinforced dielectric layer. Those familiar with this technology will also understand that these different layers can also be internally non-adjacent, non-uniform and non-hierarchical. A stack with several layers of metal, dielectric, and reinforcement can be thicker than 2 mm. Preferably, the diameter of the vias ranges from 25 to 300 microns, but the laser system 10 can produce vias having a diameter as small as about 5 to 25 microns or greater than 1 mm. Because the preferred ablation point size of the laser pulse 60 is about 25 to 75 microns in diameter, through-holes larger than 25 microns can be processed by the ring saw method, concentric circle processing method, or spiral processing method. Those skilled in the art will understand that the through-holes may be non-circular shapes such as square, rectangular, oval, grooved, or other surface geometries. The through-hole through-hole neatly and uniformly penetrates all layers and materials of the workpiece 30 and preferably shows a negligible cone, from the top to its bottom. Blind vias do not penetrate all layers and / or materials and usually reside at the bottom conductive layer. Proper selection of laser parameters allows the bottom conductive layer to remain unaffected, even if it contains the same material as the top metal layer. Select laser output 40 parameters to help in all kinds of metals, paper sizes 13 wood paper standards applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) (Please read the precautions on the back before filling (This page) 523435 A7 ______B7_____ V. Description of the Invention (II) A variety of metals and dielectric materials have been used to achieve substantially neat and continuous drilling (that is, through-hole formation) in electrical and other material targets. And other material targets can have different optical absorption, ablative threshold, or other characteristics in response to ultraviolet or visible light. The preferred laser system output 40 parameters include: the average energy of each pulse wave measured at the working surface is greater than about 120 microjoules U), preferably greater than 200 microjoules; points smaller than about 50 microns Or spatial major axis, preferably from about 1 to 50 microns; and a repetition rate greater than about 1 kHz, preferably greater than 5 kHz, and even better than 20 kHz; the wavelength is preferably about 190 to 532 nanometers Meters, and more preferably between about 250 and 400 nanometers. Specific preferred wavelengths include, but are not limited to, 1064 nm, 532 nm, 355 nm, 349 nm, or 266 nm. The preferred parameter for laser output 40 is to suppress some thermal damage effect by using temporary pulses shorter than about 150 nanoseconds (ns) and preferably from about 40 to 90 nanoseconds or less width. Those skilled in the art will also understand that the light spot area of the laser pulse 60 is approximately circular, but may be slightly elliptical. Preferred ultraviolet laser drilling parameters are disclosed in U.S. Patent Nos. 5,593,606 and 5,841,099. Blind holes, and especially blind holes with large diameters, are preferably produced by two penetration processes, in which the conductive layer of all target areas is removed in the first penetration process and then during the second penetration process Remove the dielectric layer of the target area with the laser output energy density less than the ablation threshold of the conductive layer. After removing the top conductive layer of all target areas, the energy density used for laser output during the second penetration process can be defocused by the defocused laser light point and / 14 wood paper standards applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) (Please read the notes on the back before filling out this page) n I n) s, v > nnnnnnn _ 523435 A7 _______B7 _—_ 5. Description of the invention () or increase the repetition rate and reduce it to The current of the laser pump diode 14 is reduced. Those skilled in the art will understand that blind holes can also be generated in a single pass through process, in which the conductive and dielectric layers of each target are removed before the positioning system 36 moves to the next target area 31 A single pass-through treatment is preferably used to create a smaller diameter through hole. In a single pass through process, when the laser pulse 60 starts to remove the dielectric layer, it will be more efficient to maintain a suitably high energy density, but when the laser pulse 60 removes the dielectric layer and is exposed When the bottom conductive layer starts to absorb heat from the laser output 40, the bottom conductive layer is preferably protected by using a lower energy density. Therefore, instead of using a single energy density to remove the dielectric, during the dielectric removal, gradually defocusing the laser light spot or reducing the pump current is faster, more efficient, and the bottom metal layer is better protected. These and other laser output waveform techniques for through-hole drilling methods are described in detail in U.S. Patent Application No. 09/823922 and U.S. Patent Publication No. US2001-0045419 published on November 29, 2001, The detailed description and drawings of US Patent Application No. 09/823922 are incorporated herein by reference. Those skilled in the art will appreciate that many changes can be made to the details of the embodiments of the invention described above without departing from the basic principles of the invention. Therefore, the scope of the present invention is defined only by the scope of patent application. 15 This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back before filling out this page) · ί ϋ ϋ nn Ha n One OJ * n ϋ n an nnn 1% ,

Claims (1)

c ^ 8895 ABCD 523435 VI. Patent application scope P! (Please read the notes on the back before writing this page) The first and third time intervals of the line, in which the current is provided to the laser at the lower current level The pump two-pole system occurs at a second time interval, wherein the beam positioner changes the output position from the first target area to the second target area during the second time interval, wherein the first and second The laser output has an output power level that varies as a function of a current level supplied to the laser pump diode, and wherein the laser pump diode has a voltage level that can be maintained throughout the first to third time intervals. A current-inductive cumulative pump capacity that limits the amount of pump power that can be transferred from the laser diode to the solid-state laser, so that the lower current level supplied during the second time interval allows the At least one of the first and second higher current levels supplied during the three time intervals exceeds a maximum continuous wave current level, which is equal to the total continuous wave time interval during the first to third time intervals. The Ray The laser diode and the first and second laser outputs at a given pulse wave repetition rate when pumped by the laser pump diode at the maximum continuous wave current level At least one of the output power levels exceeds the laser output of the maximum continuous wave pump of the solid-state laser at the given pulse wave repetition rate. 3. The method according to item 2 of the patent application range, wherein the laser system has a through-hole drilling output that varies as a function of the output power levels of the laser outputs, and the through-hole drilling output The amount will exceed the laser through-hole drilling output of one of the largest continuous wave pumps of the laser system when the laser system is operating at the laser output of the largest continuous wave pump. 4. The method according to item 2 of the patent application, wherein the first or second higher current level is lower than the maximum continuous wave current level. 5. If the method of applying for the second item of the patent scope, where the first and third --2 ______ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 523435 ab C8 D8 Time intervals represent equal amounts of time. (Please read the notes on the back before filling out this page) 6. For the method in the scope of patent application No. 5, the same amount of current is supplied during the first and third time intervals. 7. The method according to item 5 of the patent application, wherein different amounts of current are supplied during the first and third time intervals. 8. The method of claim 2 in which the first and third time intervals represent different amounts of time. 9. The method of claim 8 in which the same amount of current is supplied during the first and third time intervals. 10. The method according to item 8 of the patent application, wherein different amounts of current are supplied during the first and third time intervals. 11. The method of claim 1 in which the current is applied to the laser pump two-pole system at the first and second higher current levels occurs at respective first and third time intervals, where The lower current level provides current to the laser pump diode system at a second time interval, wherein the beam positioner changes the output position from the first target area to the second time interval during the second time interval. Two target areas, and wherein the first and third time intervals represent equal amounts of time. 12. The method of claim 11 in which the same amount of current is supplied during the first and third time intervals. 13. The method according to item 11 of the application, wherein different amounts of current are supplied during the first and third time intervals. 14. As the method of applying for item 1 of the patent scope, wherein the current is provided to the laser pump two-pole system at the first and second higher current levels, which occurs in each paper size applicable to China National Standard (CNS) A4 Specifications (210 X 297 mm) 523435 A8 Driving D8 6. The first and third time intervals of the patent application range, in which the current is provided to the laser pump diode system at the lower current level in a second time Interval, wherein the beam positioner changes the output position from the first target area to the second target area during the second time interval, and wherein the first and third time intervals represent an unrelated amount of time. 15. The method of claim 14 in which the same amount of current is supplied during the first and third time intervals. 16. The method according to item 14 of the patent application, wherein different amounts of current are supplied during the first and third time intervals. 17. The method of claim 1, wherein the lower current level does not substantially include current. 18. The method according to item 1 of the patent application, wherein the lower current level contains sufficient current to generate an optical output from the laser pump diode. 19. The method according to item 2 of the patent application, wherein The lower current level contains sufficient current to generate an optical output from the laser pump diode. 20 · As in the method of patent application item 1, the method is provided at the first and second higher current levels Current to the laser pump two-pole system occurs at respective first and third time intervals, wherein supplying current to the laser pump two-pole system at the lower current level occurs at a second time interval, where the The light beam> positioner changes the output position from the first target area to the second target area during the second time interval, and wherein the first and second higher current levels are each at each The first and third time intervals include at least the first paper size applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ------------------ --------- (Please read the notes on the back before writing this page) -Mu 线 52 3435 cBs8 D8 6. Scope of patent application and second different current level. 21. The method of claim 20, wherein the first and second current levels are applied to a single layer of material in the target area. 22. The method of claim 20, wherein the first current level is higher than the second current level, and the first current level is a metal applied to the target areas. The processing period of the layer and the second current level are those of a dielectric layer applied to the target regions. 23. The method of claim 2 in which the first and second higher current levels each include at least first and second different current levels during each of the first and third time intervals. . 24. The method of claim 23, wherein the first and second current levels are applied during the processing of a single layer of material in the target areas. 25. The method of claim 23, wherein the first current level 値 is higher than the second current level ，, the first current level 第一 is applied to a metal in the target areas The processing period of the layer and the second current level are those of a dielectric layer applied to the target regions. 26. The method of claim 1 in which the Q switch generates a laser pulse with a repetition rate greater than 50 kHz. 27. The method according to item 2 of the patent application, wherein the Q switch generates a laser pulse with a repetition rate greater than 3 to 50 kHz. 28. The method of claim 1, wherein the first and second laser outputs include a wavelength shorter than about 400 nanometers (nm). ________________ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) — (Please read the precautions on the back before filling this page), 1T: Line 523435, scold D8 6. Scope of patent application 29. If you apply The method of claim 2 wherein the first and second laser outputs include a wavelength shorter than about 400 nanometers (nm). 30. The method of claim 1 in the patent application range, wherein the first and second laser outputs include a harmonic of a wavelength emitted by a YAG, YLF or YV04 laser, and the harmonics include 532 nm · · 355nm 〃 349nm or 266nm. 31. If the method according to item 2 of the patent application scope, wherein the first and second laser outputs include a harmonic wave of a wavelength emitted by a YAG, YLF or YVCu laser, the harmonics include 355 nm, 349 nm or 266 nm. 32. The method of claim 1 in which the current is applied to the laser pump two-pole system at the first and second higher current levels occurs at respective first and third time intervals, where The lower current level provides current to the laser pump diode system at a second time interval, wherein the beam positioner changes the output position from the first target area to the second time interval during the second time interval. Two target areas, wherein the beam positioner changes the output position from the second target area to one after the third time interval and during a fourth time interval representing a time amount different from the second time interval A third separated target area and wherein the laser pump diode system supplies a second lower current level during the fourth time interval. 33. The method of claim 2 in the scope of patent application, wherein supplying current to the laser pump two-pole system at the first and third higher current levels occurs at the first and third time intervals, respectively, The current supplied to the laser pump diode system at the lower current level occurred at a second time interval, in which the beam --- _6 ____- a paper size applicable to China National Standard (CNS) A4 (210 X 297) (Mm) (Please read the precautions on the back before filling this page)-\ tx line C8 D8 VI. The patent application range locator changes the output position from the first standard zone to the first time zone during the second time interval A second target area, wherein the beam positioner changes the output position from the second target area to a third separate target area during a fourth time interval representing a time amount different from the second time interval And wherein the laser pump diode system supplies a second lower current level during the fourth time interval. 34. The method of claim 32, wherein the lower current level is different from the second lower current level. 35. The method of claim 32, wherein the lower current level is different from the second lower current level. 36. The method of claim 1 in which the through-holes penetrating more than a target layer are formed by a double penetration operation. 37. The method of claim 1 in which the through-holes penetrating more than a target layer are formed by a single penetrating operation. 38. A laser system for processing at least one layer of target material in multiple target areas on a workpiece, comprising: a solid-state laser for generating at least first and second laser outputs, along an optical The path is towards an output position; a laser pump diode is used to pump the solid-state laser during at least first and third non-overlapping time intervals; ° a variable-controllable power supply is used in the first Supply a higher current level to the laser pump diode during the first and third time intervals, and for ___ 7 ____ copies between the first and third time intervals at a repetition rate of at least 2 kHz Paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before writing this page), first-line iD8 523435 6. Patent application scope-second time interval supply-lower Current level; an intra-cavity acousto-optic Q switch for providing at least two laser pulses within each of the first and first laser output during the respective first and third time intervals ; A beam positioner for The output position addressed to the first laser output during a time interval is directed toward a 'first' target area, and the output position addressed to the second laser output during the second interval is directed toward a second target area, And for changing the output position from the first target area to the second target area during the second time interval; and an interface control for directly or indirectly coordinating the beam positioning system and the power supply And the operation of the Q switch, such that during the first and third time intervals when the first and second laser outputs are generated, the power supply will supply a higher level of current to the laser The pump diode and a low level of current are supplied during the second time interval when the output position is changed. 39. The laser system of claim 38, wherein the first and second laser outputs have a power level that varies as a function of a current level supplied to the laser pump diode, and wherein the The laser pump diode has a current-inductive cumulative pump capacity that limits the amount of pump power that can be transferred from the laser diode to the solid laser during the first to third time intervals, so that The lower current level 3 supplied during the second time interval allows the higher current level supplied during the first and third time intervals to exceed a maximum continuous wave current level for equal to the first to The laser diode during the entire continuous wave time interval of the third time interval 'and makes __ _g —-—— ---- ^ paper rule China National Standard (CNS) A4 specification (210 x 297 public love ) (Please read the precautions on the back before writing this page), IT: Line 523435 Λ8 B8 C8 D8, Shen Qing patent dry enclosure should be borrowed by the laser pump diode at the maximum continuous wave current level Spring Time 'knows that first and Two of the laser output power level exceeding the given repetition rate of the laser output is not the most Dalian chestnut one Bighead this laser medium. 40. The laser system of claim 39, wherein the laser system has a through-hole drilling output that varies as a function of the power level of the laser output, and the through-hole drilling output The output will exceed the laser through-hole drilling output of one of the largest continuous wave pumps of the laser system when the laser system is operating at the laser output of the largest continuous wave pump. 41. The laser system of item 38 of the patent application, wherein the first and second time intervals represent equal amounts of time. 42. The laser system of claim 38, wherein the first and third time intervals represent different amounts of time. 43. The laser system of claim 38, wherein the higher current level supplied during the first and third time intervals represents an equal amount of current. 44. The laser system of claim 38, wherein the higher current level supplied during the first time interval is different from the higher current level supplied during the third time interval. 45. The laser system according to item 38 of the patent application, wherein the lower current level does not substantially include current. 46. The laser system of claim 38, wherein the higher current level has at least first and second different current levels 値 during each of the first and third time intervals. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (please read the precautions on the back before writing this page), 1T * " line 523435 6. Application scope 47. If you apply for a patent The laser system of scope item 46, wherein the first and first current levels are not applied during the processing of a single layer of material in the target IE zone. 48. The laser system of claim 46 in which the first current level is higher than the second current level, and the first current level is applied to the target area. The processing period of a metal layer and the second current level are the processing periods of a dielectric layer applied to the target regions. 49. The laser system of claim 39, wherein the laser system has a through-hole drilling output that varies as a function of the power level of the laser output, and the through-hole drilling output The output will exceed the laser through-hole drilling output of one of the largest continuous wave pumps of the laser system when the laser system is operating at the laser output of the largest continuous wave pump. 50. The laser system of claim 38, wherein the first and second laser outputs include a wavelength shorter than about 400 nm. 51. For the laser system of claim 38, wherein the first and second laser outputs include a harmonic wave at a wavelength emitted by a YAG 'YLF or YV〇4 laser, this harmonic wave contains 532 Nano, 355, 349, or 266. 52. The laser system of claim 38, wherein during a fourth time interval representing a different amount of time than the second time interval, " the beam positioner changes the output position from the second target Rake zone to a third separate target zone. 53. If you apply for the laser system in the 38th scope of the patent application, which runs through the super (please read the precautions on the back before filling this page), 1T * " The size of the paper is applicable to the Chinese National Standard (CNS) A4 (210 X 297 public love) 523435 and C8 D8 VI. The through-holes in the scope of patent application are formed by a single through operation. 54. For the laser system of the 38th scope of the patent application, the through hole penetrating through a target layer is formed by a double penetrating operation. 55. As in the laser system of claim 38, during a fourth time interval representing a different amount of time than the second time interval, the beam positioner changes the output position from the second target area. To a third separation target area, wherein the first and third time intervals include different time periods, and the higher current level supplied during the first time interval is different from that at the third time The higher current level supplied during the time interval. 56. For example, the laser system of item 39 of the patent application scope, wherein the laser output includes a wavelength, which is a Harmonics; the lower level current has a non-zero chirp; and the Q-switch generates a laser pulse at a repetition rate greater than 50 kHz. (Please read the notes on the back before copying this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm)