TW514267U - Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate - Google Patents

Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate

Info

Publication number
TW514267U
TW514267U TW86209359U TW86209359U TW514267U TW 514267 U TW514267 U TW 514267U TW 86209359 U TW86209359 U TW 86209359U TW 86209359 U TW86209359 U TW 86209359U TW 514267 U TW514267 U TW 514267U
Authority
TW
Taiwan
Prior art keywords
substrate
optical system
mask pattern
illumination unit
repetitively imaging
Prior art date
Application number
TW86209359U
Other languages
Chinese (zh)
Inventor
Hans Van Der Laan
Johannes Catharina Hub Mulkens
Judocus Marie Domi Stoeldrayer
Original Assignee
Asml Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Corp filed Critical Asml Corp
Priority to TW86209359U priority Critical patent/TW514267U/en
Publication of TW514267U publication Critical patent/TW514267U/en

Links

TW86209359U 1996-02-24 1996-02-24 Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate TW514267U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW86209359U TW514267U (en) 1996-02-24 1996-02-24 Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW86209359U TW514267U (en) 1996-02-24 1996-02-24 Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate

Publications (1)

Publication Number Publication Date
TW514267U true TW514267U (en) 2002-12-11

Family

ID=27786712

Family Applications (1)

Application Number Title Priority Date Filing Date
TW86209359U TW514267U (en) 1996-02-24 1996-02-24 Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate

Country Status (1)

Country Link
TW (1) TW514267U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI728520B (en) * 2018-10-31 2021-05-21 台灣積體電路製造股份有限公司 Euv reflective structure, euv collector and euv reticle

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI728520B (en) * 2018-10-31 2021-05-21 台灣積體電路製造股份有限公司 Euv reflective structure, euv collector and euv reticle
US11454877B2 (en) 2018-10-31 2022-09-27 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet light reflective structure including nano-lattice and manufacturing method thereof
US11762280B2 (en) 2018-10-31 2023-09-19 Taiwan Semiconductor Manufacturing Company, Ltd. Extreme ultraviolet light reflective structure including nano-lattice and manufacturing method thereof

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MK4K Expiration of patent term of a granted utility model