TW514267U - Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate - Google Patents
Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrateInfo
- Publication number
- TW514267U TW514267U TW86209359U TW86209359U TW514267U TW 514267 U TW514267 U TW 514267U TW 86209359 U TW86209359 U TW 86209359U TW 86209359 U TW86209359 U TW 86209359U TW 514267 U TW514267 U TW 514267U
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- optical system
- mask pattern
- illumination unit
- repetitively imaging
- Prior art date
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW86209359U TW514267U (en) | 1996-02-24 | 1996-02-24 | Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW86209359U TW514267U (en) | 1996-02-24 | 1996-02-24 | Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
TW514267U true TW514267U (en) | 2002-12-11 |
Family
ID=27786712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW86209359U TW514267U (en) | 1996-02-24 | 1996-02-24 | Illumination unit for an optical system and apparatus for repetitively imaging a mask pattern on a substrate |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW514267U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI728520B (en) * | 2018-10-31 | 2021-05-21 | 台灣積體電路製造股份有限公司 | Euv reflective structure, euv collector and euv reticle |
-
1996
- 1996-02-24 TW TW86209359U patent/TW514267U/en not_active IP Right Cessation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI728520B (en) * | 2018-10-31 | 2021-05-21 | 台灣積體電路製造股份有限公司 | Euv reflective structure, euv collector and euv reticle |
US11454877B2 (en) | 2018-10-31 | 2022-09-27 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extreme ultraviolet light reflective structure including nano-lattice and manufacturing method thereof |
US11762280B2 (en) | 2018-10-31 | 2023-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Extreme ultraviolet light reflective structure including nano-lattice and manufacturing method thereof |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4K | Issue of patent certificate for granted utility model filed before june 30, 2004 | ||
MK4K | Expiration of patent term of a granted utility model |