GB9700548D0 - Image exposing apparatus - Google Patents

Image exposing apparatus

Info

Publication number
GB9700548D0
GB9700548D0 GBGB9700548.2A GB9700548A GB9700548D0 GB 9700548 D0 GB9700548 D0 GB 9700548D0 GB 9700548 A GB9700548 A GB 9700548A GB 9700548 D0 GB9700548 D0 GB 9700548D0
Authority
GB
United Kingdom
Prior art keywords
image exposing
exposing apparatus
image
exposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9700548.2A
Other versions
GB2309088A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SYNECTIX Ltd
Original Assignee
SYNECTIX Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB9600605.1A external-priority patent/GB9600605D0/en
Application filed by SYNECTIX Ltd filed Critical SYNECTIX Ltd
Priority to GB9700548A priority Critical patent/GB2309088A/en
Publication of GB9700548D0 publication Critical patent/GB9700548D0/en
Publication of GB2309088A publication Critical patent/GB2309088A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB9700548A 1996-01-12 1997-01-13 Image exposing apparatus Withdrawn GB2309088A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9700548A GB2309088A (en) 1996-01-12 1997-01-13 Image exposing apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB9600605.1A GB9600605D0 (en) 1996-01-12 1996-01-12 Image exposing apparatus
GB9700548A GB2309088A (en) 1996-01-12 1997-01-13 Image exposing apparatus

Publications (2)

Publication Number Publication Date
GB9700548D0 true GB9700548D0 (en) 1997-03-05
GB2309088A GB2309088A (en) 1997-07-16

Family

ID=26308455

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9700548A Withdrawn GB2309088A (en) 1996-01-12 1997-01-13 Image exposing apparatus

Country Status (1)

Country Link
GB (1) GB2309088A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW445545B (en) * 1999-03-10 2001-07-11 Mitsubishi Electric Corp Laser heat treatment method, laser heat treatment apparatus and semiconductor device
US20150030985A1 (en) * 2012-02-28 2015-01-29 Robert J. DeVoe Multiphoton Curing Methods Using Negative Contrast Compositions

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2119871B2 (en) * 1971-04-23 1976-03-25 Meteor-Siegen Apparatebau Paul Schmeck Gmbh, 5900 Siegen LIGHTING MACHINE WITH A MEASURING STATION FOR MEASURING THE TRANSPARENCY OF AN ORIGINAL
JPS4940140A (en) * 1972-08-18 1974-04-15
GB1581551A (en) * 1976-08-24 1980-12-17 Atomic Energy Authority Uk Image reproduction systems
GB2096335B (en) * 1978-07-07 1983-06-02 Pitney Bowes Inc Light-scanning
JPS57198631A (en) * 1981-05-29 1982-12-06 Ibm Exposing method and device
JPS6240986A (en) * 1985-08-20 1987-02-21 Fuji Electric Corp Res & Dev Ltd Laser beam machining method
US5109465A (en) * 1990-01-16 1992-04-28 Summit Technology, Inc. Beam homogenizer
US5367381A (en) * 1991-07-29 1994-11-22 Xerox Corporation Method and apparatus for enhanced resolution and contrast via super intensity controlled overscanned illumination in a two dimensional high addressability printer
WO1995018984A1 (en) * 1994-01-07 1995-07-13 Coherent, Inc. Apparatus for creating a square or rectangular laser beam with a uniform intensity profile

Also Published As

Publication number Publication date
GB2309088A (en) 1997-07-16

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)