TW512510B - Electrostatic discharge protection device - Google Patents

Electrostatic discharge protection device Download PDF

Info

Publication number
TW512510B
TW512510B TW90132249A TW90132249A TW512510B TW 512510 B TW512510 B TW 512510B TW 90132249 A TW90132249 A TW 90132249A TW 90132249 A TW90132249 A TW 90132249A TW 512510 B TW512510 B TW 512510B
Authority
TW
Taiwan
Prior art keywords
type
doped region
electrostatic discharge
type doped
protection device
Prior art date
Application number
TW90132249A
Other languages
Chinese (zh)
Inventor
Jian-Shing Li
Suei-Hung Chen
Jiau-Ren Shr
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Priority to TW90132249A priority Critical patent/TW512510B/en
Application granted granted Critical
Publication of TW512510B publication Critical patent/TW512510B/en

Links

Abstract

An electrostatic discharge protection device is disclosed, which is disposed between the bonding pad coupled to the external signal and a specific level, and which comprises a substrate of first type; a first doped region of the second type formed on the substrate of the first type and coupled to the bonding pad; a second doped region of the second type formed on the substrate of the first type; a third doped region of the second type formed on the substrate of the first type and coupled to the specific level; a gate disposed between the second doped region of the second type and the third doped region of the second type and coupled to the specific level; and a resistor disposed between the second doped region of the second type and the bonding pad.

Description

於一 靜電 本發明係有關於一種 種能夠減少接合墊於 放電保護裝置。 2電放電保護裝置,特別是有關 靜電放電過程中無謂功率損耗之 )^放電(Electrostatlc Dlscharge,以下以ESD 簡稱 /、曰k存在於積體電路之量測、組裝、安裝及使用過程 ,其可能造成積體電路的損壞,並間接影響電子系統的 =能。然而,形成ESD應力的原因,最常見的是下列三種 =型.(1)人體放電模式(human body model):美軍軍事 才二準883 號方法3015.6(MIL-STD-883, Method 3015· 6)所界 疋之模型,其代表人體所帶靜電碰觸積體電路的接腳時所 造成之ESD應力。(2)機器模式(machine m〇del):機器所 帶靜電碰觸積體電路接腳時所造成之ESD應力,以現有工 業標準El A J-1C-121 method 20所界定之量測方法。(3)電 荷元件模式(charge device model):原已帶有電荷的積 體電路在隨後的過程中,接觸接地導電物質,因此對穑 電路形成一 ESD脈衝路徑。 、 ^ 隨著製程技術的進步,ESD之耐受力已經是積體電路 (integrated circuit,1C)可靠度的主要考量之一。尤其 疋半導體製程技術進入深次微米時代(d e e p s u b m i c r ο η regime)後,縮小尺寸(SCaled-down)的電晶體、較淺的摻 雜接面深度、較薄的閘氧化層、輕摻雜之沒極結構 (lightly-doped drain,LDD)、淺溝隔離(shallow trench isolation,STI)製程以及金屬矽化物(salicide) 製程等,對於ESD應力而言都是比較脆弱的。因此,在j cThe present invention relates to various types of electrical discharge protection devices capable of reducing bonding pads. 2Electrical discharge protection devices, especially those related to unnecessary power loss in the process of electrostatic discharge) ^ Electrostatlc Dlscharge (hereinafter referred to as ESD //, said k exists in the measurement, assembly, installation and use of integrated circuits, it may be Causes damage to the integrated circuit and indirectly affects the performance of the electronic system. However, the most common reasons for the formation of ESD stress are the following three types. (1) Human body model: US military only Model No. 3015.6 (MIL-STD-883, Method 3015 · 6) is a model defined by the ESD stress caused by the static electricity of the human body when it contacts the pins of the integrated circuit. (2) machine mode m〇del): The ESD stress caused by the static electricity carried by the machine touching the pins of the integrated circuit is measured according to the existing industry standard El A J-1C-121 method 20. (3) Charge element mode ( charge device model): In the subsequent process, the integrated circuit that has been charged contacts the grounded conductive material, so it forms an ESD pulse path for the plutonium circuit. ^ With the advancement of process technology, the ESD tolerance has been One of the main considerations for the reliability of integrated circuits (1C). Especially after the semiconductor process technology has entered the deep submicron era (deepsubmicr ο η regime), SCaled-down transistors, shallower doped The depth of the hybrid interface, the thinner gate oxide layer, the lightly-doped drain (LDD), the shallow trench isolation (STI) process, and the metal silicide process, etc. ESD stress is relatively fragile. Therefore, in jc

D1ZD1U 五、發明說明(2) =輸::埠便必須特別設計ESD防護電路 的兀件免於遭受ESJ)損害。 乂保。隻K笮 參閱第1圖,第1圖係顯示傳統靜電放 ”。如第!圖所示,傳統靜電放電保護裝^ 型基底10包括一N型摻雜㈣以 =^ 型摻雜區1 1係耦接於接受外;‘雜㈣N 信號包括於-般操作時輸入二m妾上述外部 電源;而n型摻雜區12係輕接至 及 Η為閘極。因此,藉由N型 電位另外豐層結構D1ZD1U V. Description of the invention (2) = Loss: Ports must be specially designed with ESD protection circuit components to avoid ESJ damage. Guarantee. Only K 笮 refers to FIG. 1, which shows a conventional electrostatic discharge. ”As shown in FIG. 10, the conventional electrostatic discharge protective device ^ -type substrate 10 includes an N-type doped ㈣ and a ^ -type doped region 1 1 It is coupled to the receiver; the “Miscellaneous N” signal includes the above two external power sources during normal operation; and the n-type doped region 12 is lightly connected to and is the gate. Therefore, the N-type potential additionally Layer structure

型摻雜區1 2即可構成寄生雔垃、⑽ 垔基底1 0、以及N ⑽電流之裝置構二可生當體心The doped region 12 can form a parasitic chirp, a chirped substrate 10, and a device of N chirp current.

型摻雜區11與P型基底10即會 主現於接合塾13時,N 免内部電路π受到ESD損^先们月〉貝以排放ESD電流,避 ,因1:球ί:般操作時’為了消除來自電源之高頻雜訊 因此傳統技術於接合墊丨3與 a ^ ^ 1 6,在此以5 Ω為例。電阻丨6愈σ ” 之間设置一電阻 祀占狀、s、南★ 6與電源電路内部既有之電容 參閱第2圖,第2圖係電源之高頻雜訊。 路圖。如第2圖所示,接合=3傳^:電放電保護裝置之電 與内部電路17之間呈右雷 阻16以及寄生雙接面電晶體15 路7 /、有電The doped region 11 and the P-type substrate 10 will mainly appear at the junction 塾 13, and N will prevent the internal circuit π from being damaged by ESD. ^ Before and after, the ESD current will be discharged. 'In order to eliminate high-frequency noise from the power supply, the conventional technology is used in the bonding pads 3 and a ^ ^ 16. Here, 5 Ω is taken as an example. Resistor 丨 6 σ ”is placed between a resistor, s, south ★ 6 and the existing capacitor in the power supply circuit. See Figure 2. Figure 2 is the high-frequency noise of the power supply. Roadmap. See Figure 2. As shown in the figure, the connection = 3 pass ^: there is a right lightning resistance 16 between the electrical discharge protection device and the internal circuit 17 and 15 parasitic double-junction transistor 7 /, with power

u時,則可透過寄生雙接面電5曰二D事件出現於接合墊 ...^ ^ ^ φ 電日日體15之電壓崩潰而將ESD 一般操作時,由電源所輸入之高頻雜訊能 ΐ ί Γ 源電路内部既有之電容所形成之低通濾、波 0503-6720TWf ; TSMC2001-0624 ; ROBERT.ptd $ 5頁When u, it can be seen on the bonding pad through the parasitic double-sided electrical 5 nd 2D event ... ^ ^ ^ φ The voltage of the electric sun and the sun body 15 collapses, and the high frequency Xun Neng ί Γ Low pass filter, wave 0503-6720TWf formed by the existing capacitors in the source circuit; TSMC2001-0624; ROBERT.ptd $ 5 pages

51251U 五、發明說明(3) ,顯示傳統技術必須^,將會增加接合塾13之功率消耗 福供一種」^说為了,決上述問題,本發明主要目的在於 置;^接人ί盘/^ if ί護裝置,於一般操作時,能夠藉由設 置;口 〃内^電路之間的電阻將來自電;^之$頻雜1 消除。另外,本發明更描征兄一 pcn ^ 3 4,原之冋頻雜桌 流流經上述電阻而徒然二 ^…、、加接合墊之功率損耗。 "述的,本發明提出一種靜電放電罗 置,設置於輕接於外部信號之接合墊及一衣 包括第一型基底、形成於第一拉準之間, 一第一型摻雜區、形成於第一型 口蛩义弟 、形成於第一型基底,计$ 一 弟一弟一型摻雜區 雜區、形成於第一型基底^於特=位準之第三第二型摻 區與第三第二型摻雜區之j耦:设置於第二第二型摻雜 及設置於第二第二型摻:= = ==的閘極、以 圖式之簡單說明: 塾之間的電阻。 為使本發明之上述目的、 下文特舉一較佳實施例, 人"和^點能更明顯易懂, 下: 1配合所附圖式,作詳細說明如 圖示說明: 第1圖係顯示傳統靜電放 第2圖係顯示傳統靜電放置之剖面圖。 第3圖係顯示根據本發每’、°衣置之電路圖。 “例所述之靜電放電保護 第6頁 0503-6720TWf ; TSMC2001-0624 ; ROBERT.ptd ^51051251U V. Description of the invention (3) shows that the traditional technology must be used, and it will increase the power consumption of the 塾 13 for the benefit of one type. ^ In order to solve the above problems, the main purpose of the present invention is to set up; ^ 接 人 ί 盘 / ^ If the protection device can be set in normal operation; the resistance between the circuit inside the mouth will come from electricity; the $ frequency miscellaneous 1 of ^ will be eliminated. In addition, the present invention further describes a brother pcn ^ 3 4, the original high frequency miscellaneous table flow through the above-mentioned resistor and vainly ^ ..., plus the power loss of the bonding pad. " As mentioned, the present invention proposes an electrostatic discharge arrangement, which is disposed on a bonding pad and a garment which are lightly connected to an external signal, and includes a first-type substrate formed between the first pull-in, a first-type doped region, It is formed on the first type substrate, and is formed on the first type substrate. The first and second type doped regions are formed on the first type substrate, and the third and second type doped regions are formed on the first type substrate. The j-coupling of the region and the third and second type doped regions: a gate electrode provided in the second and second type dopants and a second and second type doped regions: = = == Between the resistance. In order to make the above object of the present invention, a preferred embodiment is exemplified below, people and points can be more clearly understood, as follows: 1 In accordance with the drawings, a detailed description is given as an illustration: Show traditional electrostatic discharge Figure 2 is a cross-sectional view showing the traditional electrostatic discharge. Fig. 3 is a circuit diagram showing the positions of the clothes according to the present invention. "Static discharge protection described in the example Page 6 0503-6720TWf; TSMC2001-0624; ROBERT.ptd ^ 510

施例所述之靜電放電保護 裝 符 第4圖係顯示根據本發明實 置之電路圖。 號說明: 1 0、20〜p型基底; 11、12、21、22、23 〜N 型摻雜區; 1 3、2 4〜接合墊; 1 4、2 7〜疊層結構; 15、28A、28B〜寄生雙接面電晶體; 1 6、2 5〜電阻;The electrostatic discharge protection device according to the embodiment. Fig. 4 is a circuit diagram showing an implementation according to the present invention. Number description: 1 0, 20 ~ p-type substrate; 11, 12, 21, 22, 23 ~ N-type doped regions; 1 3, 2 4 ~ bonding pads; 1 4, 2 7 ~ laminated structure; 15, 28A 28B ~ parasitic double-junction transistor; 1 6, 2 5 ~ resistance;

17、26〜内部電路; ^ Pathl、Path2〜電流路徑。 貫施例: ^弟,第3圖係顯示根據本發明實施例戶斤述 施裝置之剖面圖。如第3圖所示,根據本發明^ ==電放電保護裳i包括-Ρ型基底20型“ :接區二N ;摻雜區22以及N型摻雜區上Ν ΐ 型摻雜區22係經由電阻25而電性二塾2 ;而Ν L唬包括於一般操作時輸入至内 上述外部 電源;而ν型摻雜區23係轉接至接地電位以及 2 7為閘極,其受到其他信號所控 —且曰結構 區、P型基底20、以及㈣摻雜區2"口:構型摻雜 電晶體28A ;藉由N型摻雜區22 I j構成可生雙接面 型基底20、以及N型摻雜17, 26 ~ internal circuit; ^ Pathl, Path2 ~ current path. Implementation Example: Brother, FIG. 3 is a cross-sectional view showing a household application device according to an embodiment of the present invention. As shown in FIG. 3, according to the present invention, ^ == the electric discharge protection device i includes a -P-type substrate 20 type ": a junction region N; a doped region 22; and an Nΐ-type doped region 22 on the N-type doped region. It is electrically connected to 塾 2 via a resistor 25; and NL includes input to the above-mentioned external power source during normal operation; and the ν-type doped region 23 is connected to the ground potential and 2 7 is the gate, which is subject to other Controlled by the signal—the structure region, the P-type substrate 20, and the erbium doped region 2 " port: the configuration doped transistor 28A; the N-type doped region 22 I j constitutes a double-junction type substrate 20 N-type doping

512510512510

區23即可構成寄生雙接面電晶體28B,以作為排放ESD電流 之衣置。當E S D事件出現於接合墊2 4時,由於電流路徑 Path2較電流路徑Pathl多了電阻25,因此其阻抗較高,故 此時ESD電流將選擇從電流路徑pathi通過,因此導致n型 換雜區21與P型基底20先行崩潰以排放esd電流,避免内部 電路26受到ESD損壞。如上所述,因為電阻25之緣故,寄 生雙接面電晶體28B導通之機會不大,當ESd事件出現於接 合塾24時’通常僅有作為主要ESD結構之雙接面電晶體28a 導通。The region 23 can constitute a parasitic double junction transistor 28B, which can be used as a garment for discharging ESD current. When the ESD event occurs in the bonding pad 24, the current path Path2 has a higher resistance than the current path Pathl by 25, so its impedance is higher. At this time, the ESD current will choose to pass through the current path pathi, thus causing the n-type doping region 21 It collapses with the P-type substrate 20 in advance to discharge esd current, and prevents the internal circuit 26 from being damaged by ESD. As mentioned above, because of the resistance 25, there is little chance that the double junction transistor 28B will be turned on. When an ESD event occurs at junction 塾 24 ', usually only the double junction transistor 28a, which is the main ESD structure, is turned on.

另外,在一般操作時,為了消除來自電源之高頻雜訊 ’因此於接合墊24與内部電路26之間設置一電阻25,在此 以5 Ω為例。電阻2 5與電源電路内部既有之電容形成一低 通濾波器,故有效消除來自電源之高頻雜訊。In addition, in normal operation, in order to eliminate high-frequency noise from the power source, a resistor 25 is provided between the bonding pad 24 and the internal circuit 26. Here, 5 Ω is used as an example. The resistor 25 and the existing capacitor in the power supply circuit form a low-pass filter, so it effectively eliminates high-frequency noise from the power supply.

… 參閱第4圖’第4圖係顯示根據本發明實施例所述之靜 電放電保護裝置之電路圖。如第4圖所示,接合墊24與内 部電路26之間具有電阻25以及寄生雙接面電晶體28B,而 於f合墊24與接地電位之間,具有寄生雙接面電晶體28a 。當ESD事件出現於接合墊24時,則可透過寄生雙接面電 晶體28A之電壓崩潰而將ESD排除,其電流路徑如pathi所 不:而於電路一般操作時,由於寄生雙接面電晶體28A未 達&通條件’因此由電源端所輸入信號將直接經由電阻2 5 輸入至内部電路26,其電流路徑如Path2所示,而信號中 $關高頻雜訊之部分將被電阻25與電源電路内部既有之電 容所形成之低通濾波器濾除。… Refer to FIG. 4 ′ FIG. 4 is a circuit diagram showing an electrostatic discharge protection device according to an embodiment of the present invention. As shown in Fig. 4, a resistance 25 and a parasitic double junction transistor 28B are provided between the bonding pad 24 and the internal circuit 26, and a parasitic double junction transistor 28a is provided between the f-bond pad 24 and the ground potential. When the ESD event occurs on the bonding pad 24, the ESD can be eliminated by the voltage collapse of the parasitic double junction transistor 28A, and the current path is not the same as pathi: when the circuit is generally operated, due to the parasitic double junction transistor 28A is not up to the "Condition" so the signal input from the power supply terminal will be directly input to the internal circuit 26 through the resistor 2 5. The current path is as shown in Path2, and the part of the signal that turns off high-frequency noise will be resistor 25. Low-pass filter formed by existing capacitors in the power circuit.

〇503-6720TWf ; TSMC2001-0624 ; ROBERT.ptd〇503-6720TWf; TSMC2001-0624; ROBERT.ptd

512510 五、發明說明(6) 綜上所述,根據本發明實施例所述之靜電放電保護裝 置,於一般操作時,能夠藉由設置於接合墊與内部電路之 間的電阻將來自電源之高頻雜訊消除。而在ESD時,根據 本發明實施例所述之靜電放電保護裝置將自動切換ESD之 放電路徑,避免ESD電流經過上述電阻,因此能夠有效減 少ESD事件時之功率損耗。 本發明雖以較佳實施例揭露如上,然其並非用以限定 本發明的範圍,任何熟習此項技藝者,在不脫離本發明之 精神和範圍内,當可做些許的更動與潤飾,因此本發明之 保護範圍當視後附之申請專利範圍所界定者為準。 馨512510 V. Description of the invention (6) In summary, according to the electrostatic discharge protection device according to the embodiment of the present invention, in normal operation, the resistance between the pad and the internal circuit will be high from the power supply. Noise reduction. In the case of ESD, the electrostatic discharge protection device according to the embodiment of the present invention will automatically switch the discharge path of the ESD to prevent the ESD current from passing through the above-mentioned resistor, so the power loss during the ESD event can be effectively reduced. Although the present invention is disclosed as above with a preferred embodiment, it is not intended to limit the scope of the present invention. Any person skilled in the art can make some modifications and decorations without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application. Xin

0503-6720TWf ; TSMC2001-0624 ; ROBERT.ptd 第9頁0503-6720TWf; TSMC2001-0624; ROBERT.ptd page 9

Claims (1)

512510 六、申請專利範圍 1 · 一種靜電放電保護裝置,設置於耦接於外部信號之 接合墊及一特定位準之間,包括: 〜 一第一型基底; 形成於上述第一型基底,並輕 形成於上述第一型基底; 形成於上述第一型基底,並耦 一第一第二型摻雜區 接於上述接合墊; 一第二第二型摻雜區 一第三第二型摻雜區 接於上述特定位準; ★ 一一閘極,形成於上述第一型基底表面,並設置於上述 第二第二型摻雜區與第三第二型摻雜區之間,且耦接於上 述特定位準;及 一電阻,設置於上述第二第二型摻雜區及上 之間。 4 π 口! 2 ·如申請專利範圍第1項所述之靜電放電保護裝置, 其中上述第一型基底為Ρ型基底。 3 ·如申請專利範圍第2項所述之靜電放電保護裝置, 其中上述第一第二型摻雜區、第二第二型摻雜區、及 第二型摻雜區為Ν型摻雜區。 4 ·如申請專利範圍第3項所述之靜電放電保護裝置, ,、中上述電阻與供應上述外部信號之裝置之輸出電容 一濾波電路,用以對上述外部信號濾波。 5 ·如申凊專利範圍第4項所述之靜電放電保護裝置, 其中上述特定位準為接地電位。512510 6. Scope of patent application1. An electrostatic discharge protection device is provided between a bonding pad coupled to an external signal and a specific level, including: ~ a first type substrate; formed on the first type substrate, and Lightly formed on the first type substrate; formed on the first type substrate and coupled to a first and second type doped region and connected to the bonding pad; a second and second type doped region and a third and second type doped region The impurity regions are connected to the above-mentioned specific level; ★ One gate is formed on the surface of the first-type substrate, and is disposed between the second-type doped region and the third-type doped region, and is coupled. Connected to the specific level; and a resistor disposed between the second and second type doped regions and above. 4 π mouth! 2. The electrostatic discharge protection device according to item 1 of the scope of patent application, wherein the first type substrate is a P-type substrate. 3. The electrostatic discharge protection device according to item 2 of the scope of the patent application, wherein the first and second type doped regions, the second and second type doped regions, and the second type doped region are N-type doped regions. . 4 · According to the electrostatic discharge protection device described in item 3 of the scope of the patent application, a filter circuit is used to filter the external signal. 5 · The electrostatic discharge protection device as described in item 4 of the patent application, wherein the specific level is a ground potential.
TW90132249A 2001-12-25 2001-12-25 Electrostatic discharge protection device TW512510B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW90132249A TW512510B (en) 2001-12-25 2001-12-25 Electrostatic discharge protection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW90132249A TW512510B (en) 2001-12-25 2001-12-25 Electrostatic discharge protection device

Publications (1)

Publication Number Publication Date
TW512510B true TW512510B (en) 2002-12-01

Family

ID=27731328

Family Applications (1)

Application Number Title Priority Date Filing Date
TW90132249A TW512510B (en) 2001-12-25 2001-12-25 Electrostatic discharge protection device

Country Status (1)

Country Link
TW (1) TW512510B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7919816B2 (en) 2005-08-19 2011-04-05 Infineon Technologies Ag Electrostatic discharge protection element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7919816B2 (en) 2005-08-19 2011-04-05 Infineon Technologies Ag Electrostatic discharge protection element
US8476711B2 (en) 2005-08-19 2013-07-02 Infineon Technologies Ag System for protection against electrostatic discharges in an electrical circuit

Similar Documents

Publication Publication Date Title
TW411606B (en) Dual-node capacitor coupled MOSFET
TW533591B (en) Low-substrate noise ESD protection circuits by using bi-directional polysilicon diodes
TW299495B (en) Electrostatic discharge protection circuit
TW473977B (en) Low-voltage triggering electrostatic discharge protection device and the associated circuit
TW475250B (en) ESD protection circuit to be used in high-frequency input/output port with low capacitance load
TWI260085B (en) Electrostatic discharge protection circuit
US7705404B2 (en) Electrostatic discharge protection device and layout thereof
TWI336946B (en) Esd protection circuit
US9728512B2 (en) Electro static discharge clamping device
CN104753055A (en) Electrostatic discharge protection circuit
TW546811B (en) Integrated circuit with silicided ESD protection transistors
TW312047B (en) Low voltage triggered electrostatic discharge protection circuit
US20130148243A1 (en) Esd protecting circuit and semiconductor device including the same
TWI220312B (en) Electrostatic discharge protection circuit
JP2001186003A (en) Input output protection device for semiconductor integrated circuit and its protection method
TWI244194B (en) Charge-device model electrostatic discharge protection using active devices for CMOS circuits
US11804708B2 (en) Fast triggering electrostatic discharge protection
TW200411898A (en) ESD protection circuit with self-triggered technique
TW200531258A (en) Input/output cell with robust electrostatic discharge protection
TW445627B (en) Electrostatic discharge buffer apparatus
TW512510B (en) Electrostatic discharge protection device
TWI291224B (en) Semiconductor layout structure for ESD production circuits
TW577166B (en) BiCMOS electrostatic discharge power clamp
TW457692B (en) Semiconductor device for ESD protection
TWI828638B (en) Electrostatic discharge protection structure

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MK4A Expiration of patent term of an invention patent