510148 A7 B7 經濟部智慧財產局員工消費合作社印製 頁 五、發明説明（ 【發明領域】 本發明是有關於一種有機電激發光顯示器之金屬膜的 衣k方法’特別是指一種製造有機電激發光顯示器之陽極 輔助電極與基板線路的方法。· 【習知技藝說明】 一般有機電激發光顯示器的基本結構，大致如第一、 二圖所示，是在一由玻璃或透明塑膠所製成之基板1的一 發光區11上，設置多數矩陣型態排列之有機發光二極體 2(Organic Light-Emitting Diode，縮略為 〇LED)，對整體 顯示器而3 ，母一發光二極體2都是一可被控制明滅之畫 素（pixel)，至於未設置該等有機發光二極體2的區域通常 是用來供配置多數線路121，僅顯示於第二圖中，以下稱 基板1上用來配置該等線路12 1之區域為佈線.區12，通 常該等線路121截面是呈下寬上窄之造型。亦即，該顯示 器之整體基板2的面積分佈，可依據是否設置有機發光二 極體2來區分成一可發出光源之發光區Η與一可供配置 被覆線路121之配線區12，該等線路12ι是以蒸鍍方式 成型被覆於基板1表面的金屬膜。該發光區11通常是偏 靠在基板1之一角隅處，相對地該配線區12大致是呈L 型區域。 每一有機發光二極體2之基本構造，可見於第二圖中 ，包括有在該基板1上以濺鍍或蒸鍍方式依序成型出層狀 構造之一 1%極21、一發光層組合體22及一陰極23。該陽 極21是為透明導電玻璃（如ΙΤ0)其面積大於該發光層組 第 本紙張尺度逋用中國國家標準（CNS ) Α4規格（210X297公釐） — I I I 訂 I 線 (請先閲讀背面之注意事項再填寫本頁) 510148 A7 __ B7_ 五、發明説明（2 ) (請先閲讀背面之注意事項再填寫本頁) 合體22。該陰極23則為金屬膜。而此發光層組合體22 是由多層有機薄膜所構成，具有依序成型疊接之一電洞注 入層 221 ( Hole injection layer，HIL)、一電洞傳遞層 222 (Hole Transport Layer，HTL·)有機發光層 223 ( Emitting layer)及電子傳遞層 224(Electron Transport Layer;ETL) ’當然貫際量產時’在考慮不同需求的情況下，有時還會 具有其他不同薄膜。 此類顯示器之發光原理，是當陽極2 1與陰極2 3加上 偏壓後，於電場存在的情況下，電洞、電子分別從陽極2 j 與陰極2 3出發’越過各別的能障後，於發光層組合體2 2 相遇再結合而成激子（Excition )，然後激子以輻射方式 由激發狀態衰退回基態將能量釋出，便能放出光來。至於 發光的顏色疋取決於發光的有機材料，因此藉由改變發光 材料，能使發光顏色有所不同。 經濟部智慧財產局員工消費合作社印製 整體有機電激發光顯示器電壓\電流之提供，必須配 合刖述基板1之配線區12上所被覆的該等線路丨2丨，及 每一有機發光二極體2之陽極21與陰極23導通電流，其 中该陽極2 1為透明電極，一般為氧化銦錫蒸鍍而成，係 為一氧化物，其阻抗較一般金屬高，因此設計上會因需要 在陽極2 1上更蒸鍍成型有一金屬材料之辅助電極2丨工， 以降低整體阻抗並增加電流效率，通常該辅助電極2ΐι截 面也是設計為下寬上窄之造型。 前述藉由蒸鍍金屬材料方式所製成之線路12丨、陰極 23及陽極21之辅助電極211等屬於導電金屬膜之部份， 1本紙張適用中國國家標準（CNS )八视^· ( 210x297公釐Γ —-- 經濟部智慧財產局員工消費合作社印製 510148 五、發明説明（3 ) ’、中僅陰極23之見度較大，而線路i2i與陽極21之辅助 電極21 1的寬度較小，#」σ t '、尺寸有機電激發光顯示器產品 之電礼特性而吕，寬度較窄之線路i 2工與辅助電極⑴尚 :付口要纟 <-在大尺寸產品時，由於有機電激發光顯示 器屬於「電流驅動却顧；盟 _不」，不同於液晶顯示器（TFT- .LCD)之電壓驅動類型，由於有機電激發光顯示器屬於「 電流驅動型顯示器」，不同於液晶顯示器（lcd)之電壓驅 動類型，因此電流流經各線路、電極及發光材之阻抗必須 相當低，才可節省能源及獲得較佳之電流效率，前述於陽 極21上瘵鍍成型有一金屬材料之輔助電極m之方式， 對於小尺寸之顯示器或許可達降低局部阻抗之效果，伸备 顯示器晝面尺寸增加時，陽極21長度隨之增長其阻抗亦 相對增加，且一般而t^ 。輔助電極211之寬度與陽極21相 較，其約佔1/5〜1/20之寬度，因此在輔助電極211厚度 不增加之狀況下’該辅助電極211欲降低阻抗之功效有限 導致見度軚乍之線路121與輔助電極211的導電性無法 符合需求。 正因上述原因，在設計大尺寸之有機電激發光顯示器 時，對陽極2i之輔助電極211與基板i上之線路ΐ2ι的 導電性要求必須提向’也就是辅助電極2】i與線路m的 電阻值必須降低’為達此一效果’以往可見採用導電性較 佳之蒸鍍材料來作改善，但改善效果並不明顯。♦缺 藉由增加蒸鍍厚度來作改善，但蒸鍍較大 ^甚' 、增加成本，且通常辅助電極211與線路121的=費： 5 本纸張肅用 ( CNS ) A4^7^X297^ ) 111 n 11111 n 11111、?T11 一............11 _「：......： I (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 MUI48 五、發明説明（4 ) 先蒸鍍出整面之餹脸祕 v 坡膝後’再進行蝕刻作業，將不需要之部 伤^去’僅餘留下輔助電極211與線路121等部份，因此 * "、、鍍之鍍膜越厚，其後續之蝕刻作業將越不容易、成本 越增加。而且，一加一 I瘵鍍，較理想之鍍膜厚度是介於 500〜3000人（gp 〇 〜0·3 /z m)，因此欲藉由增加蒸鍍厚度 作改善之效果也極為有限。 【發明概要】 。因此，本發明之目的，即在提供一種有機電激發光顯 不器之陽極辅助電極與基板線路的製造方法，使其不僅可 具著降低電阻值’且不致有金屬蒸鍍方式製造成型之缺失 〇 於疋’本發明之製造方法，是用來成型有機電激發光 顯不益之陽極辅助電極與基板線路，所述有機電激發光顯 不益包含有一具有一發光區與佈線區之基板、多數設置在 該基板之發光區上的有機發光二極體，及多數被覆在該基 板之佈線區上的線路，每一有機發光二極體包括有一蒸鍍 成型在該基板上之陽極、一蒸鍍成型在該陽極上之發光層 組合體，及-被覆在該發光層組合體之陰極，該陽極具有 一被覆在其表面上的輔助電極。該等陽極辅助電極與基板 線路之製造方法分別為·· ^ 一、該等有機發光二極體之辅助電極的製造方法包含 :(A1)在該等陽極之遠離該基板的表面上塗佈一層光阻層 。（A2)進行曝光與顯影使該光阻層上形成多數^空部。S (A3)進行電鍍而將金屬材料電鍍被覆在該等鏤空部所對應 第6頁 ^紙張尺度適用中國國家標隼（CNS ) A4規格(210^297公釐） (請先閱讀背面之注意事項再填寫本頁)510148 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention ([Field of the Invention] The present invention relates to a method for fabricating a metal film of an organic electroluminescent display. Method of anode auxiliary electrode and substrate circuit of light display. [Known technical description] The basic structure of general organic electro-optical light display, as shown in the first and second figures, is made of glass or transparent plastic. On a light-emitting area 11 of the substrate 1, an organic light-emitting diode 2 (abbreviated as OLED) arranged in a majority matrix is arranged. For the overall display, 3 and the mother-light-emitting diode 2 are both It is a pixel that can be controlled to be extinguished. As for the area where the organic light-emitting diodes 2 are not provided, it is usually used to configure most of the circuits 121. It is only shown in the second figure, which is hereinafter referred to as the substrate 1. The area where these lines 121 are arranged is the wiring. Area 12, usually the cross-section of these lines 121 has a shape of lower width and narrower. That is, the area distribution of the overall substrate 2 of the display, According to whether an organic light-emitting diode 2 is provided, it is divided into a light-emitting area 可 that can emit light sources and a wiring area 12 that can be provided with a covered circuit 121. These circuits 12m are formed by a metal film coated on the surface of the substrate 1 by evaporation. The light-emitting area 11 is usually leaned at a corner of the substrate 1, and the wiring area 12 is generally an L-shaped area. The basic structure of each organic light-emitting diode 2 can be seen in the second figure, including A 1% electrode 21, a light-emitting layer assembly 22, and a cathode 23 are sequentially formed on the substrate 1 by sputtering or vapor deposition. The anode 21 is a transparent conductive glass (such as ITO) Its area is larger than the first paper size of the light-emitting layer group. It uses the Chinese National Standard (CNS) A4 specification (210X297 mm) — III order I line (please read the precautions on the back before filling this page) 510148 A7 __ B7_ V. Description of the Invention (2) (Please read the precautions on the back before filling out this page) Composite 22. The cathode 23 is a metal film. The light-emitting layer combination 22 is composed of multiple organic thin films and has sequential molding and overlap Hole injection 221 (Hole injection layer, HIL), a hole transport layer (HTL ·) organic light emitting layer 223 (Emitting layer) and electron transport layer 224 (Electron Transport Layer; ETL) 'Of course during mass production 'In consideration of different needs, sometimes there are other different films. The light-emitting principle of this type of display is that when the anode 21 and the cathode 23 are biased, in the presence of an electric field, holes, The electrons start from the anode 2 j and the cathode 2 3 respectively. After crossing the respective energy barriers, the electrons meet at the light-emitting layer assembly 2 2 and combine to form an exciton, and then the exciton decays from the excited state back to the ground state by radiation. By releasing energy, light can be emitted. As for the color of luminescence, it depends on the organic material that emits light, so by changing the light-emitting material, the color of luminescence can be made different. The supply of the voltage and current of the organic organic excitation light display printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs must be matched with the lines covered on the wiring area 12 of the substrate 1 described above, and each organic light emitting diode The anode 21 and the cathode 23 of the body 2 conduct current. The anode 21 is a transparent electrode, which is generally formed by evaporation of indium tin oxide. It is a monoxide, and its impedance is higher than that of general metals. The auxiliary electrode 2 with a metallic material is further evaporated and formed on the anode 21 to reduce the overall impedance and increase the current efficiency. Generally, the auxiliary electrode 2 is also designed to have a lower width and a narrower shape. The aforementioned line 12 丨, cathode 23, and auxiliary electrode 211 of anode 21, which are made by vapor-depositing metallic materials, are part of the conductive metal film. 1 paper applies the Chinese National Standard (CNS) Eight Views ^ (210x297 Mm Γ --- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 510148 V. Description of the invention (3) ', only the visibility of the cathode 23 is larger, and the width of the line i2i and the auxiliary electrode 21 1 of the anode 21 is wider Small, # ″ σ t ', the size and size of the organic electroluminescence display products, and the narrower width of the line and the auxiliary electrode: 付 口 要 纟 <-In the case of large-size products, The organic electroluminescent display belongs to the "current-driven but care; alliance_no", which is different from the voltage driving type of the liquid crystal display (TFT-.LCD). Because the organic electroluminescent display belongs to the "current-driven display", it is different from the liquid crystal display. (Lcd) voltage drive type, so the impedance of the current flowing through each line, electrode and light-emitting material must be quite low in order to save energy and obtain better current efficiency. The method of the auxiliary electrode m, which is a material, may have the effect of reducing the local impedance for a small-sized display. When the size of the extended display increases during the day, the anode 21 will increase in length and its impedance will increase, and generally t ^. Compared with the anode 21, the width of the auxiliary electrode 211 occupies a width of about 1/5 to 1/20. Therefore, under the condition that the thickness of the auxiliary electrode 211 does not increase, 'the auxiliary electrode 211 has a limited effect of reducing impedance, resulting in visibility. The conductivity of the circuit 121 and the auxiliary electrode 211 cannot meet the requirements. Because of the above reasons, when designing a large-sized organic electroluminescent display, the conductivity requirements for the auxiliary electrode 211 of the anode 2i and the circuit 2i on the substrate i are required. It must be raised to 'that is, the auxiliary electrode 2] The resistance values of i and the line m must be reduced.' To achieve this effect 'In the past, it can be seen that a better conductivity of the evaporation material is used for improvement, but the improvement effect is not obvious. It is improved by increasing the thickness of the vapor deposition, but the vapor deposition is large, and the cost is increased. Usually, the auxiliary electrode 211 and the wiring 121 = cost: 5 papers (CNS) A4 ^ 7 ^ X297 ^) 111 n 11111 n 11111,? T11 A ............ 11 _ ": ......: I (Please read the notes on the back before filling this page) Intellectual Property of the Ministry of Economic Affairs Printed by the Consumer Cooperative of the Bureau MUI48 V. Description of the invention (4) First, the entire face is vulcanized v. Slope knees, and then the etching operation will be performed, and unnecessary parts will be injured ^ to go 'only the auxiliary electrode 211 is left And circuit 121 and other parts, so the thicker the plating film, the easier the subsequent etching operation and the higher the cost. In addition, one plus one I 瘵 plating, the more ideal coating thickness is between 500 ~ 3000 people (gp 0 ~ 0.3 / zm), so the effect of improving by increasing the thickness of the vapor deposition is also very limited. [Summary of the invention]. Therefore, an object of the present invention is to provide a method for manufacturing an anode auxiliary electrode and a substrate circuit of an organic electro-active light display device, so that the method can not only reduce the resistance value, but also avoid the lack of metal vapor deposition manufacturing. 〇Yu 'The manufacturing method of the present invention is used to shape the anode auxiliary electrode and the substrate circuit which are not beneficial to organic electro-excitation light. The organic electro-excitation light comprises a substrate having a light emitting area and a wiring area. Most of the organic light-emitting diodes provided on the light-emitting area of the substrate, and most of the wirings covered on the wiring area of the substrate. Each organic light-emitting diode includes an anode formed by vapor deposition on the substrate, A light-emitting layer assembly plated on the anode, and a cathode coated on the light-emitting layer assembly, the anode having an auxiliary electrode covered on a surface thereof. The manufacturing methods of the anode auxiliary electrode and the substrate circuit are respectively. 1. The manufacturing method of the auxiliary electrode of the organic light emitting diode includes: (A1) coating a layer of the anode on the surface of the anode away from the substrate Photoresist layer. (A2) Exposure and development are performed to form a plurality of hollow portions on the photoresist layer. S (A3) Electroplating and plating metal materials on these hollowed out pages 6 ^ Paper size applies to China National Standard (CNS) A4 specification (210 ^ 297 mm) (Please read the precautions on the back first (Fill in this page again)
510148 A7 B7 五、發明説明（5 ) 陽 而 含 行 而 面 路 極之表面，而成型出該 露出該等輔助電極。 二、該等被覆在基板 :(B1)在該基板的佈線 曝光與顯影使光阻層上 將金屬材料電艘被覆在 ，而成型出該等線路。 等輔助電極。及(A4)去除光阻層 的佈線區上之線路的製造方法包 區表面塗佈-層光阻層。（B2)進 形成多數鏤空冑。（B3)進行電鍍 該等鏤空部所對應之佈線區的表 及（B4)去除光阻層而露出該等線 【圖式之簡單說明】 本發明之其他特徵及 佳實施例的詳細說明中， 第一圖是一種習知有 優點，在以下配合參考圖式之較 將可清楚的明白，在圖式中： 機電激發光顯示器之俯視示意圖 正 大 放 4 局 - 之 器 示 顯 光 發 激 電 機 有 知 習 該 是 圖 ·， 二圖 第意 示 視 示 視 正 大 放·， β, IMJ. 立口 命 局施 1 實 之佳 器較 示 一 顯的 光法 發方 激造 電製 機之 有明 一 發 是本 圖明 三說 第， 圖 意 I--------^------1T------^ (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 的 法 方 造 製 極 助 辅 之 極 陽 的 例 施 實 佳 較 該 ·， 是圖 圖程 四流 第造 製 ^1 1^— ·， ΙΦΙ 圖 圖圖圖 四 四意四 第 ·， 第示第 是圖是態是 圖意圖狀圖 五示六的七 第態第驛第 狀 步 的 造 驟 步 造 製 之 層 阻 光 佈 塗 上 極 陽 在 製 之 β, J5t0 空 鏤 數 多 成 形 上 層 阻 光 在 極 助 輔 出 型 成 鍍 電 面 表 極 陽 在 -紙 本510148 A7 B7 V. Description of the invention (5) The surface of the anode including the anode and the anode is formed to expose the auxiliary electrodes. 2. These coatings on the substrate: (B1) The wiring on the substrate is exposed and developed to cover the photoresist layer with metal materials, and these circuits are formed. Wait for the auxiliary electrode. And (A4) a manufacturing method for removing a wiring on a wiring area of a photoresist layer by coating a surface of the photoresist layer with a photoresist layer. (B2) Enter to form most of the hollow cymbals. (B3) Plating the wiring area corresponding to the hollow portions and (B4) removing the photoresist layer to expose the lines. [Simplified description of the drawings] In the detailed description of other features and preferred embodiments of the present invention, The first picture is a kind of knowledge that has advantages. It will be clearly understood by comparing the following with reference to the diagrams. In the diagrams: The top view of the electromechanical excitation light display is shown in the 4th round-the device shows that the light excitation motor has The picture of the acquaintance should be shown in the second picture. The β, IMJ. Β, IMJ. The best tool of the Likou command bureau is better than the one shown in the light method. The picture is the third of the picture, the picture is I -------- ^ ------ 1T ------ ^ (Please read the notes on the back before filling this page) Ministry of Economy The French-made example printed by the Intellectual Property Bureau ’s Consumer Cooperatives is extremely helpful and extremely useful. It ’s better than that. Four meanings, four numbers, the first number, the first, the seventh, the seventh, the sixth, and the seventh Layer light blocking cloth made step-step manufacturing system of shaped step coating on shaped upper layer of the light-blocking polar co-secondary-out into the plating electrical surface table very positive in the very positive in β made of, J5t0 number of null Lou multi into - paper
Ns 6 /V 準 標 家 國 國 中 用 適 1* ίχ2 510148 A7 _____B7 五、發明説明（6 ) 之製造步驟的狀態示意圖； (請先閲讀背面之注意事項再填寫本頁) 第八圖是第四圖中一將電阻層去除而露出辅助電極之 製造步驟的狀態示意圖；及 第九圖是該較佳實施例之線路製造方法的一製造流程 圖。 【較佳實施例之詳細說明】 本發明之製造方法是用來成型有機電激發光顯示器之 陽極辅助電極及基板線路等金屬膜，所述有機電激發光顯 示器如第三圖所示，包含有一具有一發光區31與佈線區 32之基板3、多數設置在該基板3之發光區31上的有機 發光二極體4，及多數被覆在該基板3之佈線區32上的 線路5’該等線路5截面形狀為下寬上窄。每一有機發光 二極體4包括有一蒸鍍成型在該基板3上之陽極41、一 蒸錢成型在該陽極41上之發光層組合體42，及一被覆在 该發光層組合體42之陰極43，且該陽極41面積大於該 發光層組合體42 ’該陽極4 1並具有一被覆在其一遠離該 基板3之表面上的輔助電極411，該輔助電極411截面是 呈下寬上窄之造型。 經濟部智慧財產局員工消費合作社印製 由本發明之製造方法所製成的顯示器成品中，該等被 覆在基板3之佈線區32上的線路5及該等有機發光二極 體4之陽極41的輔助電極411等金屬膜的厚度，可達到 〇 · 5〜5 // m ’亦即該厚度範圍約為前述習知製造方法可達最 大厚度的十倍左右，因此可有效降低電阻值、提升導電性 _____ 第 8 頁 本紙張从適用中國國家榡準（CNS) Α4· (21()><297公 510148 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明説明（7 而針對上述辅助電極411$_ 电後411及線路5等金屬膜的製造方 法，分別說明如下： 一、 該等陽極41之辅助雪托in & 補助電極411的製造方法，配合第四 〜八圖所示，包含有以下·步驟： (Α1)在該等陽極41上塗佈一層光阻層61:如第五圖 所示1佈吩，疋將光阻層61塗佈在陽極41之 遠離該基板3的表面。 (Α2)進行曝光與顯影使光阻層61上形成多數鏤空部 “1:如第六圖所示，此一步驟是配合預設有預定 圖案之光罩（圖未示）對該光阻層61曝光後，再經 顯影而在光阻層61上形成多數鏤空部611，設計 上形成該等鏤空部61 1，便是後續製程中用來成 型該等辅助電極41 1之位置，因此，設計上該等 鏤空部6 1 1的截面形狀必須呈下寬上窄。 (A3)在陽極41上電鍍被覆辅助電極極41丨：如第七圖 ^ 所示，可使用銅、鎳、鉻或金等金屬為電鍍材料 進行電鍍，而將金屬材料電鍍被覆在該等鏤空部 611所對應陽極41之表面，藉此成型出該等截面 形呈下寬上窄之輔助電極411，該等辅助電極411 的電錢厚度可達5/zm。 (A4)去除光阻層61使該等辅助電極411露出：以洗 劑將光阻層6 1去除，便可如第八圖所示，使該等 辅助電極4 11露出。 二、 該等線路5的製造方法，如第九圖所示包含有以下步 I 訂 線 (請先閱讀背面之注意事項再填寫本頁) - 竿 I ✓ ί * 公 丄 0148 A7 B7 五、 發明説明（8) 驟 經濟部智慧財產局員工消費合作社印製 (B1)在該基板3的佈線區32表面塗佈一層光阻層。 (B2)進行曝光與顯影使光阻層上形成多數截面形狀呈 下寬上窄之鏤空部。， (B 3)在佈線區3 2上電鑛被覆該等線路5 :進行電鍵而 將金屬材料電錢被覆在該等鎮空部所對應之基板 3的佈線區3 2表面而成型為該等線路5，同樣地 所製成之該等線路5的截面形狀是呈下寬上窄造 型，且其電鍍厚度可達5vm。 (B 4)去除光阻層而露出該等線路5。 綜上所述’本發明之製造方法藉由以上製造步驟，所 得之陽極41的輔助電極411及線路5等金屬膜之厚度可 達5//m，此一厚度咼達以往金屬蒸鍍成型之厚度的十幾 倍，不僅可顯著降低輔助電極411及線路$的電阻值使導 電性獲得良好提升’且不致存在習知金屬蒸鍍方式製造成 型會造成後續姓刻作業不易、且對導電性改善效果不顯著 等缺失，因此本發明製造方法所製之輔助電極4ΐι、線路· $， 所具備良好的導電性，確實可符合大尺汁 ’ 不器在導電性上的特性需求。 此外，整體有機電激發光顯示在制丄 ^ ^ 在製成該等陽極41 之輔助電極411及線路5後，可在聲夢主 趟相 产表面進行塗佈矽酸 鹽類、矽氧烷類…等介電材料之平坦化加工 ^ 表面上因各部元件間高、低落差所形成處S ’以填補 土 战的縫隙，使表面承 為平坦’此一平坦化處理即一般所稱 更 的局部平坦化技術 (請先閱讀背面之注意事項再填寫本頁) 訂 • -.........- HJ · 第10 1 本紙張尺度適用中國國家標準（CNS ) Μ規格（210 X297公慶f 510148 五、發明説明（9 ) (spin 〇n giass，縮略為 s 〇 G)。 歸納上述’本發明的製造方法， 激發光顯*器的陽極輔助1極以有機電 興基板線路可顯著降低電阻Ns 6 / V quasi-standard home country and middle school application 1 * ίχ2 510148 A7 _____B7 V. State diagram of the manufacturing steps of invention description (6); (Please read the notes on the back before filling this page) The eighth figure is the fourth In the figure, a state schematic diagram of the manufacturing steps of removing the resistive layer to expose the auxiliary electrode; and FIG. 9 is a manufacturing flowchart of the circuit manufacturing method of the preferred embodiment. [Detailed description of the preferred embodiment] The manufacturing method of the present invention is used to form metal films such as anode auxiliary electrodes and substrate circuits of organic electroluminescent display. The organic electroluminescent display includes a A substrate 3 having a light-emitting area 31 and a wiring area 32, an organic light-emitting diode 4 mostly disposed on the light-emitting area 31 of the substrate 3, and most of the lines 5 'covered on the wiring area 32 of the substrate 3. The cross-sectional shape of the line 5 is a narrow width and a narrow width. Each organic light emitting diode 4 includes an anode 41 formed by vapor deposition on the substrate 3, a light emitting layer assembly 42 formed by evaporation on the anode 41, and a cathode covered by the light emitting layer assembly 42 43, and the area of the anode 41 is larger than that of the light-emitting layer assembly 42 ', the anode 41 has an auxiliary electrode 411 covered on a surface away from the substrate 3, and the cross-section of the auxiliary electrode 411 is wide and narrow. modeling. In the printed display finished by the manufacturing method of the present invention, printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the wirings 5 covered on the wiring area 32 of the substrate 3 and the anodes 41 of the organic light emitting diodes 4 The thickness of the metal film such as the auxiliary electrode 411 can reach 0.5 to 5 // m ', that is, the thickness range is about ten times the maximum thickness of the conventional manufacturing method, which can effectively reduce the resistance value and improve the conductivity. _____ Page 8 This paper is printed from the applicable Chinese National Standards (CNS) Α4 · (21 () > < 297 公 510510 A7 B7 Printed by the Intellectual Property Bureau Staff Consumer Cooperatives of the Ministry of Economic Affairs The manufacturing methods of the above-mentioned auxiliary electrode 411 $ _ metal film such as post-411 and line 5 are respectively described as follows: 1. The manufacturing method of the auxiliary snow support in & The illustration includes the following steps: (A1) Apply a photoresist layer 61 on the anodes 41: as shown in the fifth figure, 1 cloth phen, apply the photoresist layer 61 on the anode 41 away from the substrate 3 surface (Α2) exposure and display A plurality of hollow portions are formed on the photoresist layer 61 “1: As shown in FIG. 6, this step is performed with a photomask (not shown) preset with a predetermined pattern after exposure to the photoresist layer 61, and then developed The majority of the hollow portions 611 are formed on the photoresist layer 61, and the hollow portions 61 1 are formed in the design, which is the position for forming the auxiliary electrodes 41 1 in the subsequent process. Therefore, the hollow portions 6 1 are designed. The cross-sectional shape of 1 must be the lower width and the upper narrow. (A3) Electroplating on the anode 41 to cover the auxiliary electrode 41 丨: As shown in the seventh figure ^, metal such as copper, nickel, chromium or gold can be used as the plating material for plating The metal material is electroplated and coated on the surface of the anode 41 corresponding to the hollow portions 611, thereby forming the auxiliary electrodes 411 whose cross sections are narrow and wide, and the thickness of the auxiliary electrodes 411 can reach 5 (A4) Remove the photoresist layer 61 to expose the auxiliary electrodes 411: remove the photoresist layer 61 with a lotion, and then expose the auxiliary electrodes 4 11 as shown in the eighth figure. The manufacturing method of these lines 5 includes the following step I as shown in the ninth figure (please read first Note on the back, please fill out this page again)-Rod I ✓ ί * Public 0148 A7 B7 V. Description of the invention (8) Printed on the surface of the wiring area 32 of the substrate 3 by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (B1) Apply a layer of photoresist layer. (B2) Perform exposure and development to form hollow sections on the photoresist layer with most of the cross-sectional shapes of lower width and narrower width. (B 3) On the wiring area 3 2 the power mine covers these lines 5 : Electric keys are used to coat metal wires on the surface of the wiring area 3 2 of the substrate 3 corresponding to these towns to form these lines 5. The cross-sectional shape of these lines 5 is similarly made. The bottom is wide and the top is narrow, and its plating thickness can reach 5vm. (B 4) The photoresist layer is removed to expose the lines 5. In summary, 'the manufacturing method of the present invention through the above manufacturing steps, the thickness of the obtained metal film such as the auxiliary electrode 411 of the anode 41 and the wiring 5 can reach 5 // m. This thickness is as thick as that of conventional metal evaporation molding. More than ten times the thickness, not only can significantly reduce the resistance value of the auxiliary electrode 411 and the circuit $ and improve the conductivity ', but also does not exist in the conventional metal evaporation method. Manufacturing and forming will make subsequent engraving operations difficult and improve the conductivity. The effect is not significant and so on. Therefore, the auxiliary electrode 4mm and the wiring made by the manufacturing method of the present invention have good electrical conductivity, and can indeed meet the characteristics of large scale juicer's electrical conductivity. In addition, the whole organic electro-excitation light shows that after the auxiliary electrode 411 and the circuit 5 of the anode 41 are made, silicates and siloxanes can be coated on the surface of the main production phase of the sound dream. … And other dielectric materials for flattening processing ^ The surface S 'formed by the high and low drop between the various components on the surface fills the gap in the soil warfare and makes the surface flat. This flattening treatment is generally called more local Flattening technology (please read the precautions on the back before filling this page) Order • -.........- HJ · Article 10 1 This paper size applies to Chinese National Standard (CNS) Μ specifications (210 X297) Qing f 510148 V. Description of the invention (9) (spin 〇n giass, abbreviated as s 〇G). In summary of the above-mentioned 'producing method of the present invention, the anode auxiliary 1 pole of the excitation light display device can be marked with an organic electromotive substrate circuit. Reduce resistance
Lrr屬蒸鑛方式製造成型會造成後續姓刻作 明之目的。 不…缺失’故確實能達到發 惟以上所述者，僅為本發明之較佳實施例而已，當不 :以此限定本發明實施之範，’即大凡依本發明申請：利 範圍及發明說明書内容所作之簡單的等效變化與修飾，皆 應仍屬本發明專利涵蓋之範圍内。 (請先閱讀背面之注意事項再填寫本頁) .裝.Lrr is produced by steam ore method, which will cause the purpose of subsequent name engraving. "No ... missing", so the above-mentioned ones can really be achieved, which are only the preferred embodiments of the present invention. When not: to limit the scope of the implementation of the present invention, 'that is, where the application according to the present invention: the scope of the invention and the invention The simple equivalent changes and modifications made in the description should still fall within the scope of the patent of the present invention. (Please read the notes on the back before filling this page).
、1T 線 經濟部智慧財產局員工消費合作社印製 頁 ilx f-IH 第 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 510148 A7 B7 五、發明説明（10 ) 元件標號對照】 3 基板 42 發光層組合體 3 1 發光區 43 陰極 32 佈線區 :5 線路 4 有機發光二極體 61 光阻層 41 陽極 611 鏤空部 411 辅助電極 丨 ----------- (請先閱讀背面之注意事項再填寫本頁) 、1Τ 經濟部智慧財產局員工消費合作社印製 第12頁 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐）1, 1T line Ministry of Economics Intellectual Property Bureau employee consumer cooperative printed page ilx f-IH The first paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 510148 A7 B7 V. Description of the invention (10) Component label comparison] 3 Substrate 42 Light-emitting layer assembly 3 1 Light-emitting area 43 Cathode 32 Wiring area: 5 Circuit 4 Organic light-emitting diode 61 Photoresistive layer 41 Anode 611 Hollow-out portion 411 Auxiliary electrode 丨 ------------ ( Please read the precautions on the back before filling out this page), 1T Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Page 12 This paper size applies to China National Standard (CNS) Α4 specification (210 × 297 mm)