TW477895B

TW477895B - Gas insensitive interferometric apparatus and methods

Info

Publication number: TW477895B
Application number: TW089104204A
Authority: TW
Inventors: Henry Allen Hill
Original assignee: Zygo Corp
Priority date: 1999-04-28
Filing date: 2000-03-08
Publication date: 2002-03-01
Also published as: WO2000065303A1; EP1194732A1; JP2002543373A; US6330065B1; EP1194732A4

Abstract

Displacement measuring interferometers (DMI) are disclosed for use in conjunction with apparatus for measuring and monitoring the intrinsic optical properties of the gas in the measurement leg of a DMI to compensate for variations in the refractive index of the gas that would otherwise render subsequent displacement calculations less accurate. The DMIs may be used for either linear or angular displacements. Cyclic error compensation, wavelength monitoring and correction, and phase redundancy features are included to further enhance the accuracy with which displacement determinations may be made and are particularly suitable for use in photolithographic applications.

Description

477895 A7 B7_ 五、發明說明（1 ) 有關申請書之對照參考 (請先閱讀背面之注意事項再填寫本頁) 本申請書爲於1 9 9 9年元月1 9日所提出之同擁有之美專利申請書〇 9 / 2 3 2，5 1 5號，題爲”用以量度氣體之本質光性質之裝置及方法”之後續部份，此轉而爲於1 9 9 8年1 0月2 1日所提出之美專利申請書 0 9/176 ，442號，題爲”用以量度氣體之本質光性質之干涉方法及裝置”之後續部份，此轉而爲於 1997年10月2日以Henry Allen Hill具名提出之美專利申請書08/942，848號，題爲”用以量度氣體之本質光性質之裝置及方法”之後續部份，並由1 9 9 8 年2月2 3日所提出之美臨時專利請書 6 0/ 075，595號，題爲”用以量度氣體之本質光性質之裝置及方法”申請優先。發明背景經濟部智慧財產局員工消費合作社印製本發明一般係有關光量度術，且特別係有關干涉計位移量度，不受量度徑路中之氣體折射率之光徑路長度影響，包括折射率波動之影響。在精密干涉計中經常遭遇之問題爲需要具有有關量度徑路中之氣體之折射率，及/或量度徑路之光徑路長度中由於氣體而改變之精確知識。此在氣會波動，例如氣體擾亂，及/或量度徑路之物理長度會改變之情形尤爲如此。由有關折射率及其對光徑路改變之影響之精確資訊，可改正在決定長度及角度之物理位移中由此等影響所引起之誤 4 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 A7 _____B7 經濟部智慧財產局員工消費合作社印製五、發明說明（2 ) 差。有若干技術用以在高度控制之環境下量度該折射率，諸如當空氣柱包含於一樣品胞中並監視溫度，壓力，及物理大小時。然而，在無控制之情況下量度折射率爲技術上之挑戰，尤是是在需要高度精確之情形。或且，有關空氣之折射率之最困難之量度爲量度在未知或可變長度，具有無控制之溫度及壓力之量度徑路上之折射率。此情形常在高度精確距離量度干涉計，諸如用於積體電路之微製版製造中發生。例如，閱N.Bobroff所作之一文，”由空氣擾亂及非線性在雷射干涉計中所引起之殘留誤差”，應用光學，26(13)，2676 — 2687(1987)，及亦N.Bobroff所作之一文”位移量度干涉計之最近進步”量度科學及技術，4 (9) ，907 — 926 (1993) 〇如所知，在空氣中之干涉計位移量度接受環境之不確定性，尤其是空氣壓力及溫度之改變；空氣組成份之不確定性，諸如由濕度改變所引起；及空氣擾亂之殆響。此等因素改變用以量度位移之光之波長。在正常情況下，空氣之折射率約爲1 . 〇〇 0 3，具有變動在1 X 1 0 — 5至1 X 1 0 — 4階層。然而，在許多應用上，需知道空氣之折射率至低於0.lppm(百萬分之幾）至0·003ppm之相對精確度，此二相對精確度相當於一米干涉計位移量度値之1 〇〇 nm及3 nm之位移量度精確度。 (請先閱讀背面之注意事項再填寫本頁) 一裝 ----訂--- s'. 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 A7 _ B7 五、發明說明（3 ) 偵測折射率波動之一方法爲量度一量度徑路上之壓力及溫度之改變，並計算對量度徑路之光徑路長度之影響。用以執行此計算之數學等式發表於F.EJones所作之一文，題爲”空氣之折射率” ，J.Res.NBSB86(l)，27-32( 1 98 1 )。該技術之實施發表於W.T.Estler所作之一文，題爲”空氣中之高度精確位移干涉計”，應用光學24(6) ，808- 8 1 5 ( 1 9 8 5 )。不幸，此技術僅提供接近値，麻煩 ’且僅對空氣之密度之緩慢，全球性波動改正。偵測量度徑路上之波動之折射率之影響之另一較直接方法爲使用多波長距離量度法。其基本原理可由以下獲得明瞭。干涉計及雷射雷達量度一基準及一物件間之光徑路長度，最常在開放之空氣中。此光徑路長度爲折射率及量度光束所橫過之物理徑路之積分乘積。由於折射率隨波長變化，但物理徑路不受波長影響，故通常可由光徑路長度決定物理徑路長度。尤其是折射率中波動之貢獻，假設該工具使用至少二波長，及氣體之本質光性質爲可知者。由於折射率隨波長改變在本藝中稱爲色散，故該技術常稱爲色散技術。折射率量度用之色散技術在較短距離之光干涉相位偵測中具有長久之歷史。在1 9 7 2年給R.B. Ζιριη及J.T. Zaiusky之美專利3，6 4 7，3 0 2號，題爲”獲得精確幅度量度之裝置及方法”中，發表一種干涉計位移量度系統，使用多波長來補償環境情況，諸如溫度，壓力，及濕度之改變。該工具特別設計用於可移動物件，即具有可變 _ - R - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) I裝--------訂---- 經濟部智慧財產局員工消費合作社印製經濟部智慧財產局員工消費合作社印制衣 477895 A7 B7___ 五、發明說明（4 ) 物理徑路長度之物件上。然而，Z i p i η及Z a I u s k y之相位偵測裝置在高度精確量度上似乎不夠精確。最近在微製版術之高度精確干涉計上之嘗試由發給A. / I s h 1 d a ( 1 9 9 0)之美專利4，9 4 8，2 5 4號代表。一相似裝置由Ishida說明於一文中，題爲”使用第二諧波光來消除空氣擾亂所引起之誤差之二波長位移量度干涉計”，曰本應用物理雜誌，28 (3) ，L473 — 475 ( 1989)。在該文中，發表一種位移量度干涉計，此由二波長色散偵測法消除去由折射率之波動所引起之誤差。在發給3.八丄18( 1 995)之美專利5，404，222號，題爲”具有空氣擾亂補償之干涉計量度系統”中，發表一種二波長干涉計，使用散技術來偵測及補償折射率波動。一相似裝置由L i s說明於一文中，題爲I C製造用之空氣亂補償之干涉計”，S P I E 2 4 4 0 ( 1 9 9 5 ) 。然而，二Isluda及Lis依賴外部供應之有關佔住量度徑路之氣體之倒數·色散率之値之資料。自以上顯然，先行技藝並未提供實際，高速，高度精確之方法及對應裝置，用以量度空氣之折射率，並補償量度徑路中空氣之光徑路長度之影響，尤其是由於空氣之折射率波動所引起之影響。先行技藝中之限制主要由以下未解決之術困難所引起：（1)先行技藝之外差及超外差干涉計在精確度上受空氣之折射率之波動限制；（2 )先行技藝用以量度折射率波動之色散技術在干涉相位量度上需要極高之精確度，普通超過高精確度之距離量度干涉計之 ____^_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I-----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7_ 五、發明說明（5 ) 普通精確度一幅度階；（3 )先行技藝干涉計在提高相位量度精確度上所作之明顯修改會增加量度時間至不能與近代微製版裝備之迅速平台移動相容之程度；（4 )先行技藝之色散技術需要至少二極端穩定之雷射源，或單個光源發射多個相位鎖定之波長；（5 )微製版應用上之先技藝色散技術對量度期間中之平台移動敏感，產生系統誤差；及（6 )使用雙晶體作爲偵測系統之一部份之先行技藝色 /散技術（例如，發給Lis之美專利5，4 0 4，2 2 2號）成本高昂且複雜。先行技藝之此等缺點導致欠缺任何實用之干涉計系統，在量度徑路中有氣體存在之微製版術執行位移量度，在此，普通有折射率波動，且量度徑路由變化之物理長度構成。 V故此，本發明之一目的在提供一種位移量度干涉計系統，由此迅速及精確量度及監視量度徑路中之氣體之折射率及/或氣體之光徑路長度之影響，其中，折射折射率可波動及/或量度徑路之物理長度可改變。本發明之另一目的在提供一種位移量度干涉計系統及方法，由此迅速及精確量度及監視量度徑路中之氣體之折射率及/或氣體之光徑路長度之影響，其中，量度之精確度及氣體之折射率及/或氣體之光徑路長度影響之監視大致不受量度徑路之物理長度之迅速改變之損害。本發明之另一目的在提供一種位移干涉計系統及方法，由此迅速及精確量度及監視量度徑路中之氣體之折射率 ___________zAjz__ 本紙張尺度適用中關家標準（CNS)A4規格（210 X 297公爱1 ' I---.-------•裝--------訂---------^9— (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 ___ B7_ 五、發明說明（6 ) 及/或氣體之光徑路長度之影響，其中，該系統及方法無需量度及監視環境情況，諸如溫度及壓力。本發明之另一目的在提供一種位移量度干涉計系統及方法，由此迅速及精確量度及監視量度徑路中之氣體之折射率及/或氣體之光徑路長度之影響，其中，該系統及方法可，但並不需要使用相鎖之不同波長之二或更多光束。本發明之另一目的在提供一種位移量度千涉計系統及方法，由此迅速及精確量度，監視，及使用量度徑路中之氣體之折射率及/或氣體之光徑路長度之影響，俾由補償量度徑路中折射率之影響，精確決定物理位移。本發明之另一目的在提# 一種位移量度干涉計系統及方法，由此精確量度，監視，及使用量度徑路中之氣體之折射率及/或氣體之光徑路長度之影響，俾由補償量度徑路中折射率之影響，精確決定物理位移。本發明之其他目的部份顯然可見，且部份顯示於後。本發明故此包含方法及裝置，具有構造，步驟，元件組合，及機件安排，詳細示範說明於下，並參考附圖。發明槪要本發明一般係有關干涉計裝備及方法，用以精確量度至少一'量度徑路中之位移（線性及/或角度）’同時量度及監視量度徑路中之氣體之折射率及/或量度徑路之光徑路長度中由於氣體所引起之改變，以獲得有關此折射影響對位移決定之精確度之衝擊之資訊，並補償此等影響。量 ______ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） J. 一-------— I----^--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7___ 五、發明說明（7 ) 度徑路中之氣體之折射率可波動，例如氣體擾亂，及/或量度徑路之物理長度可改變。本發明並係有關裝備及方法，用於光電量度及其他應用中。更明確言之，本發明用以提供折射率之色散之量度，該色散大致與氣體密度成比例，及/或光徑路長度之色散之量度，與折射率之色散及量度徑路之物理長度有關。其後由量得之折射率之色散及/ 或量得之光徑路長度之色散，計算氣體之折射率及/或氣體之光徑路長度影響。由本發明裝備所產生之資訊特別適用於干涉計距離量度工具（D Μ I )上，以補償有關至少一量度徑路中之氣體之折射率由環境影響及迅速平台轉動所引起之擾亂所導致之誤差。已作成本發明之若干實施例，具有不同之干涉計結構，用以產生含有有關量度徑路之光徑路長度之資訊之本質位移信號，及含有有關氣體之本質性質之資訊之信號，此用以補償位移計算之誤差，否則，在無有關氣體之本質光性質之資料，會出現此誤差。本發明實施例之其他特色係有關各種裝置，由此可產生及監視不同波長之光束，此等波長値之關係；用以補償相位重複，循環誤差，由於平台移動所引起之Doppler頻移影響，及/剪力影響之方法及裝置。而且，說明信號處理之不同方法，包括使用直接相位量度及零差·，外差，及超外差技術。附圖簡述 ______- m -_ 一本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） J—--------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（8) 由閱讀詳細說明並參考附圖，可最佳明瞭本發明之結構及操作’連同其他目的及優點，在附圖中，本發明之元件標有參考數字，此在其所出現之所有圖中用以識別，且其中：圖1爲槪要，高階圖，顯示本發明之裝置之主要元件 ’其功能，及相互關係，及其所產生及處理之各種資訊，以執行精確之位移量度，俾用於各種下游應用上；圖1 a以槪要之形態顯示本發明之第一詳細實施例，用以量度及監視量度徑路及基準徑路之至少之一中之氣體之折射率差，及/或量度及基準徑路之光徑路長度由於氣體所引起之相對改變；圖1 b更詳細顯示圖1 a之電子處理器； : 圖2 a以槪要之形態顯示本發明之第二較宜實施例，用以量度及改正角度或線性位移干涉計之量度徑路及基準徑路之至少之一中之氣體之影響，並改正量得之相位（用以決定量度及基準徑路之相對光徑路長度中之改變）及所屬光色散有關信號二者中之循環誤差之影響，以改正量度及基準徑路之至少之一中之氣體之影響之相對光徑路長度之改變；圖2 b更詳細顯示圖2 a之電子處理器；圖3 a - 3 e以槪要之形態顯示本發明之第三較宜實施例，用以量度量度徑路及基準徑路之相對物理徑路長度，使用多次光通過系統構造’以降低色散有關信號中之 Doppler頻移影響； _____-11- _ 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公爱） -----------裝--------訂---------^^^1 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7__ 五、發明說明（11 ) 隨量度徑路之物理長度改變而同時改變之期間中，達成所採取之量度之精確位移決定。所補償之折射率改變可能由於氣體組成部份之改變，及/或氣體由於量度腳之迅速改變所導致之波動所引起，諸如在製造半導體電路之製版處理中所發生者。現參考圖1 ，此槪要顯示本發明之一般裝置4 1 0之主要元件。裝置4 1 0之主要元件顯示包含一光源4 1 2 ，用以產生不同波長之射線束；一色散干涉計4 1 4，此可採取多種構造；一波長監視器4 1 6，用以量度由光源 4 1 2所產生之各種光束之波長之精確度；一儀器4 1 8 ，此用以量度及監視色散干涉計4 1 2之量度腳中之氣體之本質光性質；一電子處理器4 2 0用以接收並操作於裝置4 1 0中各處所產生之各種電信號；一電腦4 2 2或等效微處理器，此有軟體程式提供，用以執行控制，內務處理，及計算功能，如以後所明瞭；及一區塊4 2 4，代表各種下游用具，此利用由裝置4 1 0之其他元件所產生之上游結果。例如，區塊4 2 4可爲需要精確位移資訊之任何敏感應用，且宜爲其後欲說明之裝備之一部份，用於製造半導體裝置之製版處理。在此應用上，製版裝備可依熟悉之方式連接至干涉計4 1 4及電腦4 2 2。光源4 1 2產生不同波長之至少二光束4 2 6，以提供干涉計4 1 4用之基準及量度光束。視產生裝置之詳細而定，光束4 2 6可爲極化且同等範圍，極化且在空間上分開，空間上分開，諧波關係，由第二諧波產生所引起， ----------- 14. -___ 本紙張尺度適用中國國家標準(CNS)A4規格（210 X 297公釐） " ------------•裝--------訂--------- 華 (請先閱讀背面之注咅？事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 —___B7__ 五、發明說明（12 ) 頻移，由一或更多雷射或其他適當裝置所產生，用以產生宜爲同調之光源。在自光源4 1 2發出後，光束4 2 6由光束分裂器 4 2 8欄截，此發送其一部份至干涉計4 1 4，如光束 430，並反射一部分，如束432，以移行至光束分裂器 4 3 4。干涉計4 1 4可爲任何熟悉型式之幅度分裂色散干涉計，諸如Mchelson，修改之MIchelson，平面鏡，微分平面鏡干涉計，Mach-Zehnder，角度補償，或精於本藝之人士所熟悉之其他型式。干涉計4 1 4設有圖1未顯示之裝置，用以分割光束 4 3 0爲基準及量度光束，俾沿干涉計4 1 4之基準及量度腳中移行（亦未顯示）。量度腳爲可變者，且至少部份由氣體佔住。此可連接於例如構成製版處理之一部份之一平台，其位移需精確決定者。雖普通爲固定長度，但基準腳無需爲固定，而是可變化，且亦可部份由氣體佔住。在沿干涉計4 1 4之基準腳及量度腳移行後，干涉計 4 1 4產生在二波長上之輸出基準光束4 3 6及輸出量度光束438。光束436及438由光束分裂器440攔截，此根據波長分離，成爲在一波長上之光束4 8及 4 5 0移行至一偵測器4 5 6，及在另一波長上之光束 4 4 2及4 4 4移行至偵測器4 5 8。偵測器4 5 6用以變換輸入光束4 8及4 5 0爲電信號4 6 0，此發送至電子處理器4 2 0，及偵測器4 5 8同樣用以變換光信號 -1S- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I --------•裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 ____B7 ___ 五、發明說明（13) 4 5 2及4 5 4爲電信號4 6 2，此傳送至電子處理器 4 2 0。電信號4 6 0及4 6 2具有在二波長上之基準及量度光束在其移行通過干涉計414時所遭遇不同之光徑路方面之非本質相位資訊。此非本質相位資訊，諸如視氣體之柱密度而定之折射率及折射率差不足以使用色散干涉計來精確計算線性及/或角度位移。然而，經由本質性質監視器4 1 8及/或波長監視器4 1 6，本發明能補償由干涉計4 1 4所提供之非本質資訊中之缺點。更明確言之，且其後在以下各詳細實施例之說明中所指出，本質性質監視器4 1 8提供有關氣體之相對折射率差及/或倒數相對色散Γ，且此資訊在其後位移計算中用以補償未能其他由普通色散干涉計補償之誤差。爲進一步提高此位移計算之精確度，波長監視器 416接收光束432之一部份’成爲光束464 ’此由光束分裂器4 3 4之反射提供。光束分裂器4 3 4亦透射光束432之一部份，成爲光束466，此由鏡468反射，作爲光束4 7 0，以移行至本質性質監視器4 1 8。波長監視器4 1 6估計光束4 6 4之波長之精確度，並提供有關精確度之資訊，作爲信號4 7 1 ’俾由本質性質監視器4 1 8及電子處理器4 2 0使用。而且，光源4 1 2提供有關所產生之波長之資訊，從而成爲信號4 7 2及4 7 4之形態’此等發送至電子處理器4 2 0，俾用於改正計算，或提供反饋控制信號，以提 -- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I------------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7 經濟部智慧財產局員工消費合作社印製五、發明說明（14 ) 高由光源4 1 2所除相位重複性。本質性質監視 /氣體之本質光性質器4 2 0之其他資之改正之位移，或各種本質光性質監，可參考同擁有之，題爲”用以量度於1 9 9 9年元月別整個列作參考。如將明瞭，電償可由色散干涉計本相位項中之循環在實際上，本 4 1 4之量度腳設版處理中之普通情游或上風處。亦可監視監視器之輸化或在時間上之變化率之近或經歷資料，以反映超已一般說明本發明，及1 b 度及監產生之光束之波長之精確度，及/或消器4 1 之資訊訊，用發送至視器4 美專利氣體之 1 9曰子處理 4 14 誤差。質性質置，且形，則現參考圖1 a 槪要形態，用以量 8產生一信號4 7 6，含有有關，且此資訊連同提供給電子處理以計算干涉計4 1 4之量度腳中電腦4 2 2，供相似使用。有關 1 8及波長監視器4 1 6之詳細申請書09/232，515號本質光性質之裝置及方法”，此以HenryAIIenHiII具名提出，且特器4 2 0亦可設有裝置，用以補提供之色散項及/或色散項及基監視器4 1 8宜盡量接近干涉計如引導一氣流於量度腳中，如製監視器4 1 8宜置於量度腳之上出信號4 7 6，以發展有關其變統計資訊，且如適當，可更新最過預定控限度之改變。現說明詳細之實施例。，此顯示本發明之第一實施例之視量度徑路及基準徑路之至少之本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L . •裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) -17- 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（15) 一中之氣體折射率差，及/或量度及基準徑路之光徑路長度由於氣體所引起之相對改變。氣體之折射率及量度及基準徑路之相對物理長度之任一或二者可改變。在一些終端應用上，在量度及基準徑路之至少之一中氣體影響之改正，由有關信號之色散所產生之改正中之循環誤差之影響經補償至一特定精確度。該特定精確度部份由相對量度及基準徑路長度在色散有關信號之各別波長上之量度値中之循環誤差影響之幅度決定。雖該裝置可應用於廣大範圍之射源上，但以下以光量度系統方面之例來說明。如顯示於圖1 a，第一實施例包含一光源5 0 0，一干涉計5 6 9，偵測器5 8 9及5 9 0，干涉計5 6 9之量度及基準徑路之至少之一中之氣體之倒數色散率Γ之監視器5 5 0，光源5 0 0之輸出光束之不同波長組成部-份之波長之監視器5 5 2，電子處理器5 2 7，及電腦 5 2 9° 參考圖1 a所示之光源5 0 0，自光源5 0 1所發射之一光束507通過一調變器503，成爲光束509。調變器5 0 3由驅動器5 0 5激勵。光源5 0 1宜爲雷射或同調射線之類似光源，宜極化，並具有波長λ i。調變器 5 0 3例如可爲一聲光裝置，或聲光裝置與額外光學裝置之桷合，用以選擇調變光束5 0 7之極化部份。調變器 5 0 3宜使光束5 0 7之一線性極化部份之掁盪頻率對正交線性極化之組部份移動一量ί ^光束5 0 7之部份之極化方向分別平行及正交於圖1 a之平面，在此標示如X及y 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐） • J---..-------11^ 裝--------訂------ (請先閱讀背面之注意事項再填寫本頁) 477895 A7 _____B7 _ 五、發明說明（16 ) ’掁盪頻率f i由驅動器5 0 5決定。 (請先閱讀背面之注意事項再填寫本頁) 在次一步驟，由光源5 0 2所發射之光束5 0 8通過調變器504，成爲光束510。調變器504由電子驅動器5 0 6激勵，與電子驅動器5 0 5激勵調變器5 0 3 相似。與光源5 0 1同樣，光源5 0 2宜爲雷射或極化調輻射之相似光源，但宜在不同之頻率上。調變器5 0 4宜使光束5 0 8之一線性極化之掁盪頻率對一正交線性極化部份移動一量f 2，二部份之極化方向分別爲X及y。掁盪頻率f 2由電子驅動器5 0 6決定。頻率f :及丨2之移動幅度大體遠小於光束5 0 7及5 0 8之光頻率之差之幅度〇光源5〇1及502以及調變器503及504可爲多種調頻裝置及/或雷射之任一種。例如，雷射可爲氣體雷射，例如H e N e雷射，以精於本藝之人士所知之多種普通技術之任一種穩定，例如，閱T . B a e r等之” 經濟部智慧財產局員工消費合作社印製〇· 633/zmHe— Ne縱向Zeeman雷射之頻率穩定” ，應用光學，19，3173 — 3177 (1980); /3111^\^1(1等之美專利3，889，207號，1 9 7 5年 6月1 0日頒發；及Ssndstrom等之美專利 3，662，279號，1972年5月9曰頒發。或且，雷射可爲精於本藝之人士所知之多種普通技術之任一種頻率穩定之二極體雷射，例如閱T.OkoshI及K.kikuchi之” 外差式光學通訊系統用之半導體雷射之頻率穩定”，電子通訊，16， 179-181(1980)，及本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 A7 _ B7__ 五、發明說明（17 ) (請先閱讀背面之注音？事項再填寫本頁) S.Yamaqguchi及M.Suzuki之”使用Krypton之光電效應同時穩定A IGaAs半導體雷射之頻率及功率” ，IEEE 量子電子雜誌，QE — 19，15 14—1519 ( 1 9 8 3 )° 由以下技術之一，可產生二光頻率：（1 )使用 Z e e m a η分裂雷射，例如閱B a g I e y等之美專利 3，458，259號，1969年7月2 9日頒發； G. Bouwhuis 之”干涉計氣體雷射” ，Ned.T.Naturk，3 4 ，225 — 232 (1968年8月）；6&21^等之美專利3，656，853號，1972年4月18曰頒發；及H.Matsumoto之”使用穩定之雷射之最近干涉計量度”，精密工程，6(2) ，87 — 94; (2)使用一對聲光477895 A7 B7_ V. Description of the invention (1) Cross-reference of related application (please read the notes on the back before filling out this page) This application is the beauty of the same ownership filed on January 19, 1999 The follow-up part of the patent application No. 09/2 3 2, 5 1 5 entitled "Apparatus and method for measuring the intrinsic optical properties of gases", this was changed to October 2, 1998 The follow-up part of US Patent Application No. 0 9 / 176,442 filed on the 1st, entitled "Interference method and device for measuring the essential optical properties of gases", which was changed to October 2, 1997. The follow-up part of Henry Allen Hill's named US Patent Application No. 08 / 942,848, entitled "Apparatus and Method for Measuring the Essential Optical Properties of Gases", published on February 23, 1998 The application of the US Provisional Patent Application No. 60 / 075,595, entitled "Apparatus and Method for Measuring the Essential Optical Properties of Gases", has priority. BACKGROUND OF THE INVENTION This invention is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economics. This invention is generally related to photometry, and particularly to interferometer displacement measurement, and is not affected by the optical path length of the refractive index of the gas in the measurement path, including the refractive index. Impact of fluctuations. A problem often encountered in precision interferometers is the need to have accurate knowledge about the refractive index of the gas in the measurement path and / or the optical path length of the measurement path due to the change in gas. This is especially the case when gas fluctuates, such as gas disturbances, and / or the physical length of the measuring path changes. The precise information about the refractive index and its influence on the change of the optical path can be used to correct errors caused by these effects in determining the physical displacement of length and angle. 4 This paper size applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) 477895 A7 _____B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. The invention description (2) Poor. There are several techniques for measuring this refractive index in a highly controlled environment, such as when an air column is contained in a sample cell and the temperature, pressure, and physical size are monitored. However, measuring the refractive index without control is a technical challenge, especially if a high degree of accuracy is required. Or, the most difficult measurement of the refractive index of air is to measure the refractive index on an unknown or variable length path with uncontrolled temperature and pressure. This situation often occurs in highly accurate distance-measuring interferometers, such as in microplate manufacturing for integrated circuits. For example, read an article by N. Bobroff, "Residual errors caused by air disturbances and nonlinearities in laser interferometers", Applied Optics, 26 (13), 2676-2687 (1987), and also N. Bobroff One of the papers "Recent advances in displacement measurement interferometers" measures science and technology, 4 (9), 907-926 (1993). As is known, interferometer displacement measurements in air accept environmental uncertainty, especially Changes in air pressure and temperature; uncertainties in air composition, such as caused by changes in humidity; and the noise of air disturbances. These factors change the wavelength of the light used to measure the displacement. Under normal circumstances, the refractive index of air is about 1.03, with a range of 1 X 1 0-5 to 1 X 10-4 levels. However, in many applications, it is necessary to know the relative accuracy of the refractive index of air to less than 0.1 ppm (parts per million) to 0.003 ppm, which is equivalent to one meter of interferometer displacement measurement. Displacement measurement accuracy of 100 nm and 3 nm. (Please read the precautions on the back before filling out this page) One Pack ---- Order --- s'. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 477895 A7 _ B7 5 3. Description of the invention (3) One method for detecting the fluctuation of the refractive index is to measure the change in pressure and temperature on a measuring path, and calculate the effect on the optical path length of the measuring path. The mathematical equation used to perform this calculation was published in an article by F. EJones entitled "Refractive Index of Air", J. Res. NBSB86 (l), 27-32 (1981). The implementation of this technique was published in an article by W.T.Esler entitled "Highly accurate displacement interferometer in air", Applied Optics 24 (6), 808-8 1 5 (19 8 5). Unfortunately, this technology only provides close to 値, troublesome ′ and only corrects for the slowness of air density and global fluctuations. Another more direct method of detecting the effect of refractive index on fluctuations in the path is to use a multi-wavelength distance measurement method. The basic principle can be obtained from the following. Interferometers and laser radars measure a datum and the length of an optical path between objects, most often in open air. This optical path length is the integral product of the refractive index and the physical path traversed by the measuring beam. Since the refractive index varies with the wavelength, but the physical path is not affected by the wavelength, the physical path length is usually determined by the optical path length. In particular, the contribution of fluctuations in the refractive index, assuming that the tool uses at least two wavelengths, and that the essential optical properties of the gas are known. Since the refractive index changes with wavelength in this art is called dispersion, this technique is often called dispersion technique. The dispersion technique used for refractive index measurement has a long history in short-distance optical interference phase detection. In 1972, US Patent No. 3,6 4 7,3,02 to RB Zιριη and JT Zaiusky, entitled "Apparatus and method for obtaining accurate amplitude measurement", published an interferometer displacement measurement system using multiple wavelengths To compensate for environmental conditions such as changes in temperature, pressure, and humidity. This tool is specially designed for movable objects, that is, it has variable _-R-This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) I equipment -------- Order ---- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7___ V. Description of the invention (4) Length of the physical path On the object. However, the phase detection devices of Z i p i η and Za I u sk y do not appear to be sufficiently accurate in terms of highly accurate measurements. A recent attempt on microplate-making highly accurate interferometers is represented by US Patent No. 4,9 4 8, 2 5 4 issued to A. / I sh h 1 d a (19 9 0). A similar device was described by Ishida in a paper entitled "Two Wavelength Displacement Interferometers Using Second Harmonic Light to Eliminate Errors Caused by Air Disturbances", Japanese Journal of Applied Physics, 28 (3), L473 — 475 (1989). In this article, a displacement measurement interferometer is published, which eliminates errors caused by fluctuations in refractive index by a two-wavelength dispersion detection method. In US Pat. No. 5,404,222, issued to 3. 丄 18 (1 995), entitled "Interferometry System with Compensation for Air Disturbance", a two-wavelength interferometer is used to detect and detect Compensate for refractive index fluctuations. A similar device is described in a paper by L is entitled "Interferometer for compensation of air disturbances for IC manufacturing", SPIE 2 4 4 0 (1 9 9 5). However, two Isluda and Lis rely on the external supply related occupation From the above, it is clear that the reciprocal of gas and the dispersion rate of the track. From the above, it is clear that the advanced technology does not provide a practical, high-speed, highly accurate method and corresponding device to measure the refractive index of the air and compensate the track. The influence of the air path length of air, especially due to the fluctuation of the refractive index of air. The limitations in the prior art are mainly caused by the following unsolved technical difficulties: (1) the external difference and superheterodyne of the advanced technology The accuracy of interferometers is limited by fluctuations in the refractive index of the air; (2) Dispersion techniques used to measure refractive index fluctuations in prior art require extremely high accuracy in the measurement of interference phases, and generally measure interferences at distances exceeding high accuracy Counting ____ ^ _ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) I ----------- installation -------- order --- ------ (Please read the notes on the back first (Written on this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7_ V. Description of the invention (5) Ordinary accuracy of the first order of magnitude; (3) Obvious modifications of the advanced art interferometer to improve the accuracy of phase measurement Increase the measurement time to the extent that it is not compatible with the rapid platform movement of modern micro-platemaking equipment; (4) the advanced technology of dispersion technology requires at least two extremely stable laser sources, or a single light source emitting multiple phase-locked wavelengths; (5) ) Advanced technology dispersion technology in microplate application is sensitive to platform movement during the measurement period, resulting in systematic errors; and (6) Advanced technology dispersion / dispersion technology using dual crystals as part of the detection system (for example, issued to The beauty of Lis patent No. 5,040,2 2 2) The cost is high and complicated. These shortcomings of the prior art have led to the lack of any practical interferometer system to perform displacement measurement in the microplatemaking method that measures the presence of gas in the path, Here, the refractive index fluctuates generally, and the physical length of the measuring path changes. V Therefore, an object of the present invention is to provide a displacement amount. Interferometer system, so as to quickly and accurately measure and monitor the influence of the refractive index of the gas in the path and / or the length of the optical path of the gas, wherein the refractive index can fluctuate and / or measure the physical length of the path It can be changed. Another object of the present invention is to provide a displacement measurement interferometer system and method, thereby quickly and accurately measuring and monitoring the influence of the refractive index of the gas in the path and / or the effect of the optical path length of the gas, wherein The monitoring of the accuracy of the measurement and the refractive index of the gas and / or the length of the optical path of the gas is substantially unaffected by the rapid change in the physical length of the measurement path. Another object of the present invention is to provide a displacement interferometer system And methods, so as to quickly and accurately measure and monitor the refractive index of gases in the path ___________zAjz__ This paper size applies the Zhongguanjia Standard (CNS) A4 specification (210 X 297 public love 1 'I ---.-- ----- • Equipment -------- Order --------- ^ 9— (Please read the notes on the back before filling this page) System 477895 A7 ___ B7_ V. Description of the invention ( 6) and / or the length of the light path of the gas, in which the system and method do not need to measure and monitor environmental conditions such as temperature and pressure. Another object of the present invention is to provide a displacement measurement interferometer system and method, thereby quickly and accurately measuring and monitoring the influence of the refractive index of a gas in a measurement path and / or the influence of the optical path length of the gas, wherein the system The method can be used, but it is not necessary to use two or more beams of different wavelengths which are phase-locked. Another object of the present invention is to provide a displacement measurement system and method, thereby quickly and accurately measuring, monitoring, and using the influence of the refractive index of a gas in a path and / or the length of a light path of the gas,补偿 Accurately determine the physical displacement by compensating the influence of the refractive index in the path. Another object of the present invention is to provide a displacement measurement interferometer system and method, thereby accurately measuring, monitoring, and using the influence of the refractive index of the gas in the path and / or the length of the optical path of the gas. Compensate for the influence of the refractive index in the path and accurately determine the physical displacement. Other objects of the present invention are partially visible, and some are shown later. The present invention therefore includes a method and a device, which have a structure, steps, component combinations, and mechanical arrangements. Detailed examples are described below with reference to the drawings. SUMMARY OF THE INVENTION The present invention generally relates to interferometer equipment and methods for accurately measuring at least one 'measurement of displacement (linear and / or angle) in a path' while simultaneously measuring and monitoring the refractive index of a gas in the path and / Or measure the change in light path length due to gas in order to obtain information about the impact of this refraction on the accuracy of the displacement determination and compensate for these effects. Amount ______ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) J. A ----------- I ---- ^ --------- (Please (Please read the notes on the back before filling this page) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7___ V. Description of the invention (7) The refractive index of the gas in the degree path can fluctuate, such as gas disturbance, and / or The physical length of the measuring path can be changed. The invention also relates to related equipment and methods, which are used in photoelectric measurement and other applications. More specifically, the present invention is used to provide a measure of the refractive index dispersion, which is approximately proportional to the gas density, and / or a measure of the dispersion of the optical path length, and a dispersion of the refractive index and the physical length of the measurement path related. The influence of the refractive index of the gas and / or the length of the optical path of the gas is then calculated from the measured dispersion of the refractive index and / or the measured optical path length of the dispersion. The information generated by the equipment of the present invention is particularly suitable for use on the interferometer distance measurement tool (DMI) to compensate for the refractive index of the gas in at least one measurement path caused by disturbances caused by environmental influences and rapid platform rotation error. Several embodiments of the invention have been made with different interferometer structures for generating essential displacement signals containing information about the optical path length of the measuring path and signals containing information about the essential properties of the gas. The error is calculated by compensating the displacement, otherwise, this error will occur if there is no information about the essential optical properties of the gas. Other features of the embodiments of the present invention are related to various devices, which can generate and monitor beams of different wavelengths, and the relationship between these wavelengths; to compensate for phase repetition, cyclic errors, and Doppler frequency shift effects caused by platform movement, And / or methods and devices for shear forces. Furthermore, different methods of signal processing are explained, including the use of direct phase measurement and homodyne, heterodyne, and superheterodyne techniques. Brief description of the drawings ______- m -_ A paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) J —-------- installation -------- order --------- (Please read the notes on the back before filling in this page) 477895 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (8) Read the detailed description and refer to the attached drawings The structure and operation of the present invention can be best understood together with other objects and advantages. In the drawings, the elements of the present invention are marked with reference numerals, which is used to identify all the figures in which it appears, and among them: Figure 1 For the sake of simplicity, a high-level diagram showing the main components of the device of the present invention, their functions, and their relationships, as well as various information generated and processed to perform accurate displacement measurements, are used in various downstream applications; Figure 1 a shows the first detailed embodiment of the present invention in a desired form, for measuring and monitoring the refractive index difference of the gas in at least one of the measuring path and the reference path, and / or measuring and the light of the reference path Relative changes in path length due to gas; Figure 1b shows Figure 1a in more detail Electronic processor; Figure 2a shows a second preferred embodiment of the present invention in an essential form for measuring and correcting at least one of the measurement path and the reference path of an angle or linear displacement interferometer The influence of gas, and correct the measured phase (used to determine the change in the relative optical path length of the measurement and the reference path) and the influence of the cyclic error in the signal of the relevant optical dispersion, in order to correct the measurement and the reference path The effect of the gas in at least one of the paths relative to the change of the optical path length; Figure 2b shows the electronic processor of Figure 2a in more detail; Figures 3a-3e show the third aspect of the present invention in a summary form The preferred embodiment is to measure the relative physical path length of the path and the reference path, and use multiple light to pass through the system to construct 'to reduce the effect of Doppler frequency shift in the dispersion-related signal; _____- 11- _ This paper Standards apply to China National Standard (CNS) A4 specifications (210 x 297 public love) ----------- installation -------- order --------- ^^^ 1 (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 4 77895 A7 B7__ V. Description of the invention (11) During the period when the physical length of the measuring path is changed at the same time, the precise displacement determination of the adopted measurement is achieved. The compensated changes in refractive index may be caused by changes in the gas composition and / or fluctuations in the gas due to rapid changes in the measuring feet, such as those that occur during the process of making semiconductor circuits. Referring now to FIG. 1, the main elements of the general device 410 of the present invention are shown. The main component display of the device 4 10 includes a light source 4 1 2 to generate ray beams of different wavelengths; a dispersive interferometer 4 1 4 which can take a variety of configurations; a wavelength monitor 4 1 6 to measure the The accuracy of the wavelengths of the various light beams generated by the light source 4 1 2; an instrument 4 1 8 for measuring and monitoring the essential optical properties of the gas in the foot of the dispersive interferometer 4 1 2; an electronic processor 4 2 0 is used to receive and operate various electrical signals generated in various places in the device 4 1 0; a computer 4 2 2 or equivalent microprocessor, which is provided by software programs for performing control, housekeeping, and calculation functions, As will be clarified later; and a block 4 2 4 represents various downstream appliances, which makes use of the upstream results produced by other elements of the device 4 10. For example, block 4 2 4 can be any sensitive application that requires precise displacement information, and should be part of the equipment to be described later, for plate-making processing of manufacturing semiconductor devices. In this application, platemaking equipment can be connected to the interferometer 4 1 4 and the computer 4 2 2 in a familiar manner. The light source 4 1 2 generates at least two light beams 4 2 6 of different wavelengths to provide a reference and measurement beam for the interferometer 4 1 4. Depending on the details of the generating device, the beams 4 2 6 can be polarized and of the same range, polarized and spatially separated, spatially separated, the harmonic relationship caused by the second harmonic generation, ----- ------ 14. -___ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) " ------------ • Package ----- --- Order --------- Hua (Please read the note on the back? Matters before filling out this page) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 —___ B7__ V. Description of the Invention (12) Frequency shift, generated by one or more lasers or other suitable devices, to produce a light source that is preferably homogeneous. After emitting from the light source 4 1 2, the light beam 4 2 6 is intercepted by the beam splitter 4 2 8 column. This sends a part of it to the interferometer 4 1 4 such as the light beam 430 and reflects a part such as the beam 432 to move. To beam splitter 4 3 4. Interferometer 4 1 4 can be any familiar type of amplitude split dispersion interferometer, such as Michelson, modified MIchelson, plane mirror, differential plane mirror interferometer, Mach-Zehnder, angle compensation, or other types familiar to those skilled in the art . The interferometer 4 1 4 is provided with a device not shown in FIG. 1 to divide the beam 4 3 0 as a reference and measure the beam, and move along the reference and measurement feet of the interferometer 4 1 4 (also not shown). The measuring foot is variable and is at least partially occupied by gas. This can be connected, for example, to a platform that forms part of the platemaking process, whose displacement needs to be determined precisely. Although it is usually a fixed length, the reference foot does not need to be fixed, but can be changed, and it can also be partially occupied by gas. After moving along the reference and measuring feet of the interferometer 4 1 4, the interferometer 4 1 4 generates an output reference beam 4 3 6 and an output measurement beam 438 at two wavelengths. The beams 436 and 438 are intercepted by the beam splitter 440, which is separated according to the wavelength, and becomes the beams 4 8 and 4 50 at one wavelength to a detector 4 5 6 and the beam 4 4 2 at another wavelength. And 4 4 4 move to the detector 4 5 8. Detector 4 5 6 is used to convert the input light beam 4 8 and 4 50 into electrical signal 4 6 0, which is sent to the electronic processor 4 2 0, and detector 4 5 8 is also used to convert the optical signal -1S- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) I -------- • Installation -------- Order --------- (Please (Please read the notes on the back before filling this page) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ____B7 ___ V. Invention Description (13) 4 5 2 and 4 5 4 are electrical signals 4 6 2 and this is transmitted to the electronics Processor 4 2 0. The electrical signals 4 6 0 and 4 6 2 have reference and measurement at two wavelengths, and the non-essential phase information of the different optical paths encountered by the light beam as it travels through the interferometer 414. This non-essential phase information, such as the refractive index and the refractive index difference depending on the column density of the gas, is not sufficient to accurately calculate the linear and / or angular displacement using a dispersion interferometer. However, the present invention can compensate for the shortcomings in the non-essential information provided by the interferometer 4 1 4 via the intrinsic property monitor 4 1 8 and / or the wavelength monitor 4 1 6. More specifically, and as indicated later in the description of the detailed examples below, the essential property monitor 4 1 8 provides the relative refractive index difference and / or the reciprocal relative dispersion Γ of the gas, and this information is shifted thereafter It is used in the calculation to compensate for other errors that cannot be compensated by ordinary dispersion interferometers. To further improve the accuracy of this displacement calculation, the wavelength monitor 416 receives a portion of the light beam 432 ' to become the light beam 464 ' This is provided by the reflection of the beam splitter 4 3 4. The beam splitter 4 3 4 also transmits a part of the beam 432 and becomes the beam 466, which is reflected by the mirror 468 as the beam 4 7 0 to move to the essential property monitor 4 1 8. The wavelength monitor 4 1 6 estimates the accuracy of the wavelength of the light beam 4 6 4 and provides information on the accuracy as a signal 4 7 1 ′ 俾 used by the essential property monitor 4 1 8 and the electronic processor 4 2 0. Moreover, the light source 4 1 2 provides information about the generated wavelength, thus becoming the form of the signals 4 7 2 and 4 7 4 'This is sent to the electronic processor 4 2 0, which is used to correct calculations or provide feedback control signals In order to mention-this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) I ------------ installation -------- order --- ------ (Please read the notes on the back before filling this page) 477895 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (14) High phase repeatability divided by the light source 4 1 2 . Intrinsic nature monitoring / the displacement of other essential light properties of the gas optical device 4 2 0, or various essential optical properties monitoring, refer to the same ownership, entitled "Used to measure the entire column in January 1999 For reference, if it is clear, the electric compensation can be cycled in the phase term of the dispersion interferometer. In fact, the measurement of this 4 1 4 foot is usually used for ordinary love or upper hand in the plate processing. It can also monitor the output of the monitor. Near or experienced data of change rate in time to reflect the general description of the present invention, and the accuracy of 1 b degree and the wavelength of the light beam generated by the monitor, and / or the information of the canceller 41 Sent to the viewer 4 The 19th patent gas of the United States handles the 14 14 error. If the quality is set and shaped, refer to Figure 1a. The essential shape is used to generate a signal 4 7 6 with the quantity 8 and contains the relevant, and This information, together with the computer 4 2 2 provided to the electronic processing to calculate the interferometer 4 1 4 for similar use. Detailed application No. 09/232, 515 regarding 1 8 and wavelength monitor 4 1 6 Essential optical properties Device and method ", this is HenryAIIenHi II is named, and the special device 4 2 0 can also be provided with a device to supplement the provided dispersion term and / or dispersion term and the base monitor 4 1 8 should be as close as possible to the interferometer such as directing an air current in the measuring foot, such as The control monitor 4 1 8 should be placed on the measuring foot and the signal 4 7 6 should be developed to develop statistical information about the change, and if appropriate, the change that exceeds the predetermined control limit can be updated. A detailed embodiment will now be described. This shows that at least the paper size of the visual measurement path and the reference path of the first embodiment of the present invention is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) L. • installed ----- --- Order --------- (Please read the notes on the back before filling out this page) -17- 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of Invention (15) The relative refractive index difference of the gas, and / or the relative change of the optical path length of the measurement and the reference path due to the gas. Either or both the refractive index and measurement of the gas and the relative physical length of the reference path can be changed. In some end-use applications, the correction of gas effects in at least one of the measurement and the reference path is compensated to a specific accuracy by the effects of cyclic errors in the correction caused by the dispersion of the relevant signal. The specific accuracy is determined in part by the magnitude of the effect of the circular error in the measurement of the relative measurement and the length of the reference path at the respective wavelengths of the dispersion-related signal. Although this device can be applied to a wide range of sources, it will be described below with an example of a light measurement system. As shown in Fig. 1a, the first embodiment includes at least one of a light source 5 0 0, an interferometer 5 6 9, detectors 5 8 9 and 5 9 0, and an interferometer 5 6 9 The monitor of the reciprocal dispersion of gas in Γ is 5 5 0, the output of light source 5 0 0 is a different wavelength component-the monitor of the wavelength 5 5 2, the electronic processor 5 2 7, and the computer 5 2 9 ° Referring to the light source 5 0 0 shown in FIG. 1 a, a light beam 507 emitted from the light source 5 0 1 passes through a modulator 503 and becomes a light beam 509. The modulator 5 0 3 is excited by the driver 5 0 5. The light source 501 should be a laser or similar light source of homogeneous rays, should be polarized, and have a wavelength λ i. The modulator 5 0 3 can be, for example, an acousto-optic device, or a combination of an acousto-optic device and an additional optical device, for selecting a polarization portion of the modulated light beam 5 7. The modulator 5 0 3 should move the oscillating frequency of one linearly polarized part of the beam 5 0 7 to the orthogonal linearly polarized part of the group by an amount. ^ The polarization directions of the part of the beam 5 0 7 are respectively Parallel and orthogonal to the plane of Figure 1a, where X and y are marked here. The paper dimensions are applicable to the Chinese National Standard (CNS) A4 (210 χ 297 mm). • J ---..------ -11 ^ Install -------- Order ------ (Please read the precautions on the back before filling this page) 477895 A7 _____B7 _ V. Description of the invention (16) 'The oscillating frequency fi is driven by the driver 5 0 5 decision. (Please read the precautions on the back before filling this page) In the next step, the light beam 508 emitted by the light source 502 passes through the modulator 504 and becomes the light beam 510. The modulator 504 is excited by the electronic driver 5 0 6, similar to the electronic driver 5 0 5 activating the modulator 5 0 3. Similar to the light source 501, the light source 502 should be a similar light source for laser or polarized radiation, but should be at a different frequency. The modulator 5 0 4 should move the oscillating frequency of one linear polarization of the light beam 5 8 to an orthogonal linear polarization part by an amount f 2, and the polarization directions of the two parts are X and y, respectively. The oscillating frequency f 2 is determined by the electronic driver 5 0 6. The frequency f: and 丨 2 have a movement amplitude that is substantially smaller than the difference between the optical frequencies of the light beams 507 and 508. The light sources 501 and 502 and the modulators 503 and 504 can be a variety of frequency modulation devices and / or mines. Shoot either. For example, a laser can be a gas laser, such as a He N e laser, which is stable with any of a number of common technologies known to those skilled in the art, for example, see the intellectual property of the Ministry of Economic Affairs Printed by the Bureau ’s Consumer Cooperatives. 633 / zmHe—Ne Frequency Stability of Longitudinal Zeeman Laser ”, Applied Optics, 19, 3173—3177 (1980); / 3111 ^ \ ^ 1 (First Class US Patent 3,889,207 No., issued on June 10, 1975; and US Patent No. 3,662,279, issued by Ssndstrom et al., Issued on May 9, 1972. Or, lasers may be known to those skilled in the art Any of a variety of common technologies for frequency-stable diode lasers, such as T.OkoshI and K.kikuchi's "Frequency Stability of Semiconductor Lasers for Heterodyne Optical Communication Systems", Electronic Communications, 16, 179-181 (1980), and this paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 477895 A7 _ B7__ V. Description of the invention (17) (Please read the note on the back? Matters before filling out this page) .Yamaqguchi and M.Suzuki "use Krypton's photoelectric effect to stabilize the frequency of A IGaAs semiconductor lasers And power ", IEEE Quantum Electronics Magazine, QE — 19, 15 14 — 1519 (1 9 8 3) ° Two light frequencies can be generated by one of the following technologies: (1) Zee η split laser, for example, see B US Patent No. 3,458,259, issued by Ag I ey et al., issued on July 29, 1969; "Interferometer Gas Laser" by G. Bouwhuis, Ned.T. Naturk, 34, 225 — 232 (Aug. 1968 6), US Patent No. 3,656,853, etc., issued on April 18, 1972; and H.Matsumoto, "Recent Interferometry Using Stable Lasers", Precision Engineering, 6 (2) 87—94; (2) Using a pair of sound and light

Bragg電池，例如閱Y.Ohtsuka及K.Itch之”低頻範圍中小位移量度用之二頻率雷射干涉計”，應用光學，1 8 ( 2 )，219 — 224(1979) ; N.Massie 等之”由 6 4波道外差干涉計量度雷射流場”應用光學，2 2 ( 14) ，2141 — 2151 (1982) ; Y,〇htsuka 及經濟部智慧財產局員工消費合作社印製 M. Tsubokawa之”小位移量度用之動態二頻率干涉計”，光及雷射技術，1 6，2 5 - 2 9 ( 1 9 8 4 ); H. Matsumoto，同上；P.Dirksen 等之美專利 5，485，272，1996年元月16日頒發； N. A.Riza及M.M.K.HowIader之”用以產生及控制可調諧之低頻信號之聲光系統”光學工程，3 5 ( 4 )，9 2 0 — 925 (1996) ; (3)使用單聲光Bragg電池，例如 _____ - 90 .___ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）經濟部智慧財產局員工消費合作社印製 477895 A7 ___ B7_ 五、發明說明（18 ) 閱G.E.Sommargren同擁有之美專利4，684，828號，1 9 8 7年7月4日頒發；G.E.Sommargren同擁有之美專利4，687，958號，1987年7月18曰； P.Dirksen等同上；（4)使用隨機極化之HeNe雷射之二縱向模式，例如閱J.B.Ferguson及R.H.Morris之”在 6328AHeNe電射中之單模崩潰”，應用光學， 17(18)，2924-2929 (19 78) ; (5 )使用雙折射元件於雷射內部，例如閱V.Evtuhuhov及 A.E.Siegman之”在雷射空腔中獲得軸向均勻能量密度之扭轉模式技術”，應用光學，4 ( 1 ) ，1 4 2 — 1 4 3 ( 1 9 6 5 );或使用同擁有之美專利申請書序號 09/061，928中所述之系統，4/17/98提出，題爲”用以變換二非平行傳播光束部份爲二正交極化光束部份之裝置”，由H.A.Hill提出，其內容列作參考。由單雷射產生光束說明於美專利5，732，095 號，題爲”雙諧波波長分裂頻率雷射”，並於1 9 9 8年 5月發給P.Zorabedian，此具有二廣大分開之波長，且每一光束具有一對正交極化之部份，每對之一部份對該對之第二部份轉移頻率。光束5 0 9及5 1 0之光源所用之特定裝置決定光束 5 0 9及5 1 0之直徑及發散。在一些光源，例如二極體雷射，可能需使用並普通光束整形光學裝置，例如普通顯微物鏡，使光束5 0 9及5 1 0具有適當之直徑及發散，供其後元件使用。當光源爲H e N e雷射時，例如，可能 ____-?1 - _ 未紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） " " I-----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) A7Bragg batteries, for example, "Two-frequency laser interferometers for small and medium displacement measurements in the low-frequency range" by Y. Ohtsuka and K. Itch, Applied Optics, 18 (2), 219-224 (1979); N. Massie et al. "Laser flow field by 64-channel heterodyne interferometric metrology" Applied Optics, 2 2 (14), 2141-2151 (1982); printed by M. Tsubokawa by Y, Ohtsuka and the Employees' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs " "Dynamic Two-Frequency Interferometer for Small Displacement Measurements", Light and Laser Technology, 16, 2 5-2 9 (1 9 8 4); H. Matsumoto, ibid; P. Dirksen et al., US Patent 5,485,272 , Issued on January 16, 1996; "Sound and Light System for Generating and Controlling Tunable Low-Frequency Signals" Optical Engineering by NARiza and MMK HowIader, 3 5 (4), 9 2 0 — 925 (1996); ( 3) Use a single acousto-optic Bragg battery, such as _____-90 .___ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 ___ B7_ 5 、 Explanation of the invention (18) Read the US Patent No. 4,684,828, owned by GESommargren, 1 9 8 7 Issued on July 4; US Patent No. 4,687,958, owned by GESommargren, July 18, 1987; P. Dirksen equivalent; (4) Use of a vertically polarized HeNe laser two longitudinal mode, for example, read JBFerguson and RHMorris, “Single-mode collapse in 6328AHeNe radiography”, Applied Optics, 17 (18), 2924-2929 (19 78); (5) Using birefringent elements inside the laser, for example, see V. Evtuhuhov and AE Siegman, "Twisting Mode Technology for Achieving Axial Uniform Energy Density in a Laser Cavity", Applied Optics, 4 (1), 1 4 2 — 1 4 3 (1 9 6 5); or use the same The system described in the US Patent Application Serial No. 09 / 061,928, proposed on 4/17/98, entitled "A device for transforming two non-parallel propagation beam parts into two orthogonally polarized beam parts", by HAHill proposed that its content is listed as a reference. The beam generated by a single laser is described in US Patent No. 5,732,095, entitled "Dual Harmonic Wavelength Split Frequency Laser", and was issued to P. Zorabedian in May 1998. This has two broad divisions Wavelength, and each beam has a pair of orthogonally polarized portions, one portion of each pair shifts frequency to the second portion of the pair. The specific devices used for the light sources of beams 5 0 9 and 5 1 0 determine the diameter and divergence of the beams 5 9 and 5 1 0. Some light sources, such as diode lasers, may require the use of ordinary beam-shaping optical devices, such as ordinary microscope objectives, so that the beams 509 and 5 10 have appropriate diameters and divergence for subsequent components. When the light source is H e N e laser, for example, it may be ____-? 1-_ The Chinese paper standard (CNS) A4 specification (210 X 297 mm) is applicable for the paper size " " I ----- ------ Install -------- Order --------- (Please read the notes on the back before filling this page) A7

477895 五、發明說明（19 ) 無需光束整形光學裝置。波長之比率（λ i / A 2 )具有已知之接近比率値I i / I 2，即 (λ1/λ2) Ξ (/i//2) , (1) 其中，I 1及I 2包含低階非零整數値，或具有低幅度階之至少一非整數非零値。光束5 0 9及5 1 0之X極化部份具有掁盪頻率分別對光束5 〇 9及5 1 〇之y極化部份轉移一量f 1及f 2。而且，光束5 0 9及5 1 0之X部份之頻率轉移方向相同。精於本藝之人士另明瞭光束5 0 9及/或光束5 1 0 之X及y極化部份二者頻率可轉移，而不脫離本發明之精神及範圍，f 1保持光束5 0 9之X及y極化部份之頻率之差’及f 2保持光束5 1 0之X及y極化部份之頻率之差。干涉計及雷射光源之隔離通常可由一光束之二X及y極化部份之頻率轉移加強，加強之隔離程度部份取決於產生頻率轉移所用之裝置。在次一步驟，光束5 0 9由鏡5 5 3 A反射，且·其一部份由二色非極化光束分裂器5 5 3 B反射，成爲光束 5 1 2之一 λχ部份。光束5 1 0之一部份由二色非極化光束分裂器5 5 3 Β透射，成爲光束5 1 2之一第二部份，一 λ 2部份’其中，λ 2部份宜與λ 1部份平行且在同等範圍。其次，光束5 1 2之第一部份由非極化光束分裂器本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I ---J---裝·--I rtt先閱讀背面之注意事項再填寫本頁} 訂i 經濟部智慧財產局員工消費合作社印製 -22- 477895 經濟部智慧財產局員工消費合作社印製 A7 _____B7___ 五、發明說明（20 ) 553C透射’成爲光束5 1 3。光束5 1 3傳播至一干涉計5 6 9，此由一光學裝置構成，用以引進一相位轉移 P i於光束5 1 3之λ i部份之X及y極化部份之間，及一相位轉移P 2於光束5 1 3之λ 2部份之X及y極化部份之間。在另一步驟中，光束5 1 2之一第二部份由非極化光束分裂器553C反射，且其後由鏡553D，553E ，5 5 3 F，及5 5 3 G反射，其一第一部份由非極化光束分裂器5 5 3H反射，成爲輸入至監視器5 5 0之光束，及其第二部份由非極化光束分裂器5 5 3 Η透射，成爲輸入至監視器5 5 2之光束。監視器5 5 0及5 5 2分別爲波長及Γ監視器。Γ監視器5 5 2顯示於圖1 a，如實體上移離干涉計5 6 9。在實際上，此宜接近由氣體所佔住之量度及基準徑路之至少之一設置。如在干涉計5 6 9之環境中有具有已知之空氣流形態之一空氣流，則另宜置Γ監視器5 5 2於上游，如由氣體所佔住之量度及基準徑路之至少之一之已知之空氣流形態所定。而且，Γ監視器5 5 2之位置宜在會改變 Γ之局部値之污染源之上游。例如，當本發明之裝置爲製版系統之一部份時，可能之局部污染源爲在曝光過程中自晶片上之光阻劑所流出之氣體。相位轉移之幅度φ 1及P 2與量度徑路5 9 8之來回物理長度有以下公式之關係 % = LpkA ， i = 1 R 2 , (2) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I-----------·裝--------訂--------- (請先閲讀背面之注意事項再填寫本頁) -23- 477895 經濟部智慧財產局員工消費合作社印製 A7 B7_ 五、發明說明（21 ) 其中’ P爲通過多通過干涉計之各別基準及量度腳之次數，及n i爲氣體在量度徑路5 9 8中之折射率，相當於波長數= ( 2 7Γ ) / Ai。等式（2 )包含氣體僅在量度徑路中之影響，俾以最簡單之方式表示本發明之功能，而不脫離本發明之範圍及精神。演繹等式（2 )來涵蓋氣體在基準腳中之影響對精於本藝之人士爲一直截之程序。如顯示於圖1 a，干涉計5 6 9包含基準回反射器 59 1，一物件回反射器592具有由移位器567所控制之位置，四分之一波長相位延滯板5 7 7及5 7 8，及一極化光束分裂器5 7 1。此構造在本藝中稱爲極化 Michelson干涉計，並以ρ=1簡單顯示。等式（2 )在具有一波長之光束之氣體徑路及具有第二波長之光束徑路大致在同等範圍中之情形有效，此爲第一實施例中選擇用以最簡單之方式顯示本發明之功能之情形。對精於本藝之人士，演繹至具有二不同波長之各別光束徑路並非大致在同等範圍中之情形爲一直截之程序。在通過干涉計5 6 9後，光束5 1 3之通過量度徑路之部份成爲移相光束5 3 3，及光束5 1 3之通過含有回反射器 5 9 1之基準徑路之部份成爲移相光束5 3 4。量度光束 5 3 3及基準光束5 3 4各越過四分之一波相位延滯板 6 7 8及6 7 7二次，轉動量度及基準光束之極化9 0° 。移相光束5 3 3及5 3 4分別與該平面正交極化，且在圖1 a之平面中。普通二色光束分裂器5 6 1分離與波長 λ i及λ 2相對應之光束5 3 3之此等部份分別爲光束本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I-----------裳--------訂--------- (請先閱讀背面之注咅？事項再填寫本頁) -?4· 477895 A7477895 V. Description of the invention (19) No beam shaping optical device is needed. The ratio of the wavelengths (λ i / A 2) has a known approach ratio 値 I i / I 2, that is (λ1 / λ2) Ξ (/ i // 2), (1) where I 1 and I 2 include low-order Non-zero integer 値, or at least one non-integer non-zero 値 with low amplitude order. The X-polarized portions of the light beams 509 and 5 10 have an oscillation frequency that shifts an amount f 1 and f 2 to the y-polarized portions of the light beams 509 and 5 1 0, respectively. In addition, the frequency shift direction of the X part of the light beams 509 and 5 10 is the same. Those skilled in the art also understand that the frequency of both X and y polarized portions of beam 5 0 9 and / or beam 5 1 0 can be transferred without departing from the spirit and scope of the present invention, and f 1 maintains beam 5 0 9 The difference between the frequencies of the X and y polarized portions' and f 2 maintains the difference between the frequencies of the X and y polarized portions of the beam 5 1 0. The isolation of the interferometer and laser light source can usually be enhanced by the frequency shift of the two X and y polarized parts of a beam. The degree of enhanced isolation depends in part on the device used to generate the frequency shift. In the next step, the light beam 5 0 9 is reflected by the mirror 5 5 3 A, and a part of it is reflected by the two-color non-polarized beam splitter 5 5 3 B to become a λχ part of the light beam 5 1 2. A part of the light beam 5 1 0 is transmitted by the two-color non-polarized beam splitter 5 5 3 Β, and becomes a second part of the light beam 5 1 2, a λ 2 part, wherein the λ 2 part is preferably the same as λ 1 part is parallel and within the same range. Secondly, the first part of the beam 5 1 2 is made by the non-polarized beam splitter. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). rtt first read the precautions on the back before filling out this page} Order i Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-22- 477895 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _____B7___ V. Invention Description (20) 553C Transmission ' Become a light beam 5 1 3. The light beam 5 1 3 propagates to an interferometer 5 69, which is composed of an optical device for introducing a phase shift P i between the X and y polarization parts of the λ i part of the light beam 5 1 3, and A phase shift P 2 is between the X and y polarized portions of the λ 2 portion of the beam 5 1 3. In another step, a second part of the light beam 5 1 2 is reflected by the non-polarized beam splitter 553C, and thereafter is reflected by the mirrors 553D, 553E, 5 5 3 F, and 5 5 3 G. One part is reflected by the non-polarized beam splitter 5 5 3H and becomes the beam input to the monitor 5 50, and the second part is transmitted by the non-polarized beam splitter 5 5 3 Η and becomes the input to the monitor 5 5 2 of the beam. Monitors 5 5 0 and 5 5 2 are wavelength and Γ monitors, respectively. The Γ monitor 5 5 2 is shown in Figure 1a, such as the physical removal of the interferometer 5 6 9. In practice, this should be set close to at least one of the measurement occupied by the gas and the reference path. If there is an air flow with a known air flow pattern in the environment of the interferometer 5 6 9, it is also appropriate to place a Γ monitor 5 5 2 upstream, such as at least one of the measurement occupied by the gas and the reference path It is determined by the known air flow pattern. Moreover, the position of the Γ monitor 5 5 2 should be upstream of the source of pollution that will change the local 値 of Γ. For example, when the device of the present invention is part of a plate making system, a possible source of local contamination is the gas flowing out of the photoresist on the wafer during the exposure process. The phase shift amplitudes φ 1 and P 2 and the physical length of the measuring path 5 9 8 are related by the following formula% = LpkA ， i = 1 R 2, (2) This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) I ----------- · Installation -------- Order --------- (Please read the precautions on the back before filling in this Page) -23- 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7_ V. Description of the invention (21) where 'P is the number of different benchmarks and measuring feet passed through the interferometer, and ni is the gas being measured The refractive index in path 5 9 8 corresponds to the number of wavelengths = (2 7Γ) / Ai. Equation (2) contains the influence of gas only in measuring the path, and 俾 expresses the function of the present invention in the simplest way without departing from the scope and spirit of the present invention. Deductive equation (2) to cover the influence of the gas in the benchmark feet is a routine process for those skilled in the art. As shown in Figure 1a, the interferometer 5 6 9 includes a reference retroreflector 591, an object retroreflector 592 having a position controlled by a shifter 567, a quarter-wave phase retardation plate 5 7 7 and 5 7 8 and a polarized beam splitter 5 7 1. This structure is called a polarized Michelson interferometer in the art, and is simply displayed with ρ = 1. Equation (2) is valid in the case where the gas path of a beam with one wavelength and the path of a beam with a second wavelength are approximately in the same range, which is the simplest way to choose to display the invention Situation of its function. For those skilled in the art, the process of interpreting to the case where the respective beam paths with two different wavelengths are not approximately in the same range is a straightforward procedure. After passing through the interferometer 5 6 9, the portion of the beam 5 1 3 passing through the measurement path becomes the phase-shifted beam 5 3 3 and the portion of the beam 5 1 3 passing through the reference path including the back reflector 5 9 1 Become a phase-shifted beam 5 3 4. The measuring beam 5 3 3 and the reference beam 5 3 4 each cross the quarter-wave phase retardation plate 6 7 8 and 6 7 7 twice, and rotate the measurement and the polarization of the reference beam 90 °. The phase-shifted beams 5 3 3 and 5 3 4 are respectively orthogonally polarized to the plane and are in the plane of FIG. 1a. Ordinary two-color beam splitter 5 6 1 separates the light beams 5 3 3 corresponding to the wavelengths λ i and λ 2 These parts are the light beams The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm ) I ----------- Shang -------- Order --------- (Please read the note on the back? Matters before filling out this page)-? 4 477895 A7

五、發明說明（22 ) 經濟部智慧財產局員工消費合作社印製及537，及與波長久1及久2相當光束534之此爲5 3 6及5 3 8。光束5 3 5及5 3 6進入偵測系統 5 8 9 ’及光束5 3 7及5 3 8進入偵測系統5 9〇中。在圖1 a所示之偵測系統5 8 9中，光束5 3 5先由鏡5 6 3A反射，及然後由極化光速分裂器5 6 3 B反射 ’以形成光速5 4 1之一部份。光束5 3 6由極化光束分裂器5 6 3 B透射，以成爲光束5 4 1之一第二部份。在偵測系統5 9 0中，光束5 3 7先由鏡5 6 4 A反射，及然後由極化光束分裂器5 6 4 B反射，以形成光束5 4 2 之一部份。光束5 3 8由極化光束分裂器5 6 4 B透射，以形成光束5 4 2之一第二部份。光束5 4 1及5 4 2分別通過極化器5 7 9及5 8 0，分別撞擊於光偵測器 5 8 5及5 8 6上，並宜由光電偵測產生二電干涉信號。二電干涉信號分別包含二外差信號s 1及s 2。極化器 5 7 9及5 8 0之取向宜在混合光束5 4 1及5 4 2之X 及y極化部份。外差信號s i及s 2分別相當於波長λ i及 λ 2，且發送至電子處理器5 2 7，供分別分析數位或類比格式，且宜爲數位格式之電子信號5 2 3及5 2 4 ° 信號s ^具有以下形態，i = 1及2， ~ =為⑺ cos[a，(/)] , /’ = 1 及 2 · ⑶ 時間依賴自變數a i ( t )由以下提供 ai(t)-2nfit + (pi +ζ,. +Λ,· , i 二1 及 2, ⑷ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L-----------•裝 -------訂--------- 華 (請先閱讀背面之注意事項再填寫本頁) -25- 477895 Α7 _ Β7 五、發明說明（23) (請先閱讀背面之注意事項再填寫本頁) 其中，相位偏置f ,包含自變數a i之所有貢獻，此等與量度徑路5 9 8或基準徑路無關或關連，且與非線性誤 \/差無關或關連，及A :包含非線性誤差，含有循環誤差項。 5虎S i爲~'複數S i之貫數部份S i，R ’其中s i包含一因由，穩定，即可絕對總計之實數序列。如此，S i之 Fourier變換S i r ( j ω )完全界定S i ( j ω )〔”閱離散時間信號處理”中之章1 0 ”離散HUlbert變換”，（學徒屋，1 9 8 9 ) A.V.Oppenheim 及 R.W.Schafer 所著〕，其中 si(>) = (>) + iSifI(>) , i = l 及 2 , (5) S ,（ j ω )爲S : ( j ω )之虛數部份，ω爲一角頻率，及j爲虛數/- 1。s i之虛數部份s i，：由以下自 s ^，I ( j ω )之反Fourier變換獲得 b =4(〇sin[a,.⑺],/· = 1 及 2 · (6) 經濟部智慧財產局員工消費合作社印製相位a i ( t )可依據以下公式自ί i，r及ΐ ^；獲得 fs, \ a,·⑺=arctan , / = 1 及 2 · (7)V. Description of the invention (22) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs and 537, and the beams 534 corresponding to the wavelengths 1 and 2 are 5 3 6 and 5 3 8. Beams 5 3 5 and 5 3 6 enter detection system 5 8 9 ′ and beams 5 3 7 and 5 3 8 enter detection system 5 9O. In the detection system 5 8 9 shown in FIG. 1 a, the light beam 5 3 5 is first reflected by the mirror 5 6 3A and then reflected by the polarized light speed splitter 5 6 3 B to form a part of the light speed 5 4 1 Serving. The beam 5 3 6 is transmitted by the polarized beam splitter 5 6 3 B to become a second part of the beam 5 4 1. In the detection system 590, the light beam 5 3 7 is first reflected by the mirror 5 6 4 A and then reflected by the polarized beam splitter 5 6 4 B to form a part of the light beam 5 4 2. The light beam 5 3 8 is transmitted by the polarization beam splitter 5 6 4 B to form a second part of the light beam 5 4 2. The light beams 5 4 1 and 5 4 2 pass through the polarizers 5 7 9 and 5 8 0, respectively, and impinge on the light detectors 5 8 5 and 5 8 6 respectively. Two electric interference signals should be generated by photoelectric detection. The two electrical interference signals include two heterodyne signals s 1 and s 2 respectively. The orientations of the polarizers 5 7 9 and 5 8 0 are preferably in the X and y polarized portions of the mixed beams 5 4 1 and 5 4 2. The heterodyne signals si and s 2 are equivalent to the wavelengths λ i and λ 2 respectively, and are sent to the electronic processor 5 2 7 for analysis in digital or analog format, respectively, and should preferably be digital signals in electronic format 5 2 3 and 5 2 4 ° The signal s ^ has the following form, i = 1 and 2, ~ = is ⑺ cos [a, (/)], / '= 1 and 2 · ⑶ The time-dependent independent variable ai (t) is provided by ai (t) -2nfit + (pi + ζ ,. + Λ, ·, i 2 1 and 2, ⑷ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) L --------- -• Equipment ------- Order --------- Hua (Please read the notes on the back before filling this page) -25- 477895 Α7 _ Β7 V. Description of the invention (23) ( Please read the notes on the back before filling in this page) Among them, the phase offset f includes all contributions of the independent variable ai, which are not related to or related to the measurement path 5 9 8 or the reference path, and are non-linear errors \ / Difference is not related or related, and A: contains nonlinear errors, including cyclic error terms. 5 Tiger S i is the continuous part of the complex number S i, S i, R 'where si contains a cause, stable, and absolute The sequence of total real numbers. Thus, Fourier of Si The transformation S ir (j ω) completely defines S i (j ω) ["See Chapter 1 in Discrete-Time Signal Processing" 1 0 "Discrete HUlbert Transform", (Apprentice House, 1 89 9) AVOppenheim and RWSchafer ], Where si (>) = (>) + iSifI (>), i = l and 2, (5) S, (j ω) is the imaginary part of S: (j ω), ω is a corner Frequency, and j is an imaginary number / -1. The imaginary part of si, si, is obtained by the following inverse Fourier transform from s ^, I (j ω): b = 4 (〇sin [a, .⑺], / · = 1 and 2 · (6) The phase ai (t) printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs can be obtained from ί i, r and ΐ ^ according to the following formula: fs, \ a, ·, = arctan, / = 1 and 2 · (7)

\S^J 現參考圖1 b，電子處理器5 2 7包含電子處理器 5274A及5274B，用以自量得之相位分別決定量得之相位φ 1及P 2， 6 =Φ|·+ζ,. + 八 1. / ，· = 1 及 2，（8) -26- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 A7 B7 五、發明說明（24) 由數位或類比信號處理，宜數位處理，使用時基相位偵測，諸如數位Hilbert變換相位偵測器（R.E.Best，同上 )或類似者，及電子驅動器5 0 5及5 0 6之相位。電子驅動器5 0 5及5 0 6之相位分別由電信號，數位類比格式，宜爲數位格式之基準信號5 2 1及5 2 2發送至電子處理器5 2 7。基準信號5 2 1及5 2 2之替代之基準信號亦可由一光撿起裝置及偵測器（未顯示於圖中 )產生，由光束分裂器，宜爲非極化光束分裂器分裂出光束5 0 9及5 1 0之部份，混合分裂出之光束5 0 9及 5 1 0之各別部份，並偵測混合之部份，以產生替代之外差基準信號。可能需由光源5 0 0發送光束之不同極化部份至干涉器5 6 9，作爲空間上分離之部份（未顯示於圖 1 a中），以達成例如減少Λ i及Λ 2之一些循環誤差部份。在自光源5 0 0至干涉計5 6 9之分離光束輸送之情形，光撿起裝置宜置於干涉計5 6 9之輸入端附近。再參考圖1 b，相位ί i及相位ί 2其次分別在電子處理器5275Α及5275Β中分別由Ii/p及Ι2/ρ 倍乘，宜由數位處理，以分別產生相位（I χ / Ρ )〜φ 1及 (I 2 / Ρ ) $2。相位（Il/p) $1 及（I2/P) φ 2 其次在電子處理器5 2 7 6中相加一起，並在電子處理器 5 2 7 7中相減，宜由數位處理，以分別產生相位θ及Φ。形式爲，本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注咅？事項再填寫本頁) |裝--------訂----- 經濟部智慧財產局員工消費合作社印製 -27 - 477895 A7 B7 五、發明說明（25 ) Φ (9) (10) 使用由等式（8 )所提供之定義，相位3及Φ亦可寫成 θ = +/71) +尺(”2 — ”1)] + |^|似2 +/ΐζΐ) (11) \Ρ)\ S ^ J Now referring to FIG. 1b, the electronic processor 5 2 7 includes electronic processors 5274A and 5274B, which are used to determine the measured phases φ 1 and P 2 from the measured phases, respectively. 6 = Φ | · + ζ ,. + Eight 1. /, · = 1 and 2, (8) -26- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 477895 A7 B7 V. Description of the invention (24) Digital or analog signal processing, preferably digital processing, using time base phase detection, such as digital Hilbert transform phase detector (REBest, ibid.) Or similar, and electronic driver phase 505 and 506. The phases of the electronic driver 5 0 5 and 5 0 6 are respectively sent to the electronic processor 5 2 7 by electric signals, digital analog format, and preferably reference signals 5 2 1 and 5 2 2 in digital format. The reference signals 5 2 1 and 5 2 2 can be replaced by a light pick-up device and a detector (not shown in the figure). The light beam is split by a beam splitter, preferably a non-polarized beam splitter. The parts of 509 and 5 10 are mixed with the respective parts of the split beams 509 and 5 10, and the mixed parts are detected to generate a substitute heterodyne reference signal. It may be necessary to send differently polarized parts of the beam from the light source 500 to the interferometer 5 69 as spatially separated parts (not shown in Figure 1a) to achieve some reductions such as Λ i and Λ 2 Cyclic error part. In the case of the transmission of the separated light beam from the light source 500 to the interferometer 5 69, the light pick-up device should be placed near the input end of the interferometer 5 69. Referring again to Fig. 1b, phase ί i and phase ί 2 are then multiplied by Ii / p and Ι2 / ρ in the electronic processors 5275A and 5275B, respectively, and should be digitally processed to generate the phases (I χ / P) ~ Φ 1 and (I 2 / Ρ) $ 2. Phase (Il / p) $ 1 and (I2 / P) φ 2 are then added together in the electronic processor 5 2 7 6 and subtracted in the electronic processor 5 2 7 7, which should be processed digitally to generate separately Phases θ and Φ. In the form, this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the note on the back? Matters before filling out this page) | Installation -------- Order-- --- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economics -27-477895 A7 B7 V. Description of the invention (25) Φ (9) (10) Use the definition provided by equation (8), phase 3 and Φ also Can be written as θ = + / 71) + ruler (”2 —” 1)] + | ^ | like 2 + / ΐζΐ) (11) \ Ρ)

[’2八2(Φ2) + ’1 八ΐ(Φΐ)] I (12) (請先閱讀背面之注意事項再填寫本頁)[’2 八 2 (Φ2) +’ 1 八 ΐ (Φΐ)] I (12) (Please read the precautions on the back before filling this page)

\PJ\ PJ

[’2八2(Φ2) -’1 八 1(Φΐ)]| 經濟部智慧財產局員工消費合作社印製其中 χ-(/^2+/^)/2 , (13) KHlMI2 · (14) 相位ί i，θ，及φ以數位或類比格式，宜爲數位格式之信號5 2 5發送至電腦5 2 9。非循環非線性7? ^未在第一實施例中進一步討論，且故此在第一實施例之其後說明中略去。在由真空所構成之量度徑路中，相位Φ應大致爲一常數，不受回反射器5 9 2之運動所引起之Doppler頻移之影響。此在實際之情形可能並非如此，因爲外差信號s :及 s 2所遭遇之群延遲並不相同。群延遲（通常稱爲包封延遲 -28- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 A7 B7___ 五、發明說明（26 ) (請先閱讀背面之注意事項再填寫本頁) )說明一包頻率之延遲，且在一特定頻率上之群延遲訂定爲在特定頻率上之相位曲線之負坡度〔閱H.J.Blinchikoff及 A.I.Zverev之”在時域及頻域中之濾波” ，2 . 6章， 1 9 7 6 ( W i 1 e y，紐約）〕。如在真空構成之量度徑路中相位Φ並非常數，則可使用精於本藝之人士所知之技術，以補償相位Φ與常數之偏差（參考上述Blinchikoff及 Zverlv)。應注意Φ中之群延遲影響不獨可偵測，且亦可由量度Φ隨用作含有真空之量度徑路之移位器5 6 7所產生之回反射器5 9 2之不同位移速度而變化來決定。且應注意Φ中之群延遲影響可如下而大幅減小，盡量接近偵測器5 8 5及5 8 6中之光電偵測器執行信號s i及s 2之類比至數位變換，隨後執行數位信號處理，而非發送類比信號之信號S i及S 2，供其後在下游處執行類比信號處理及 /或類比至數位變換。特定群延遲之補償通常可在產生該特定群延遲之處理元件之前或後’或部份前及部份後引進〇經濟部智慧財產局員工消費合作社印製氣體之色散（Π2 — ηι)可使用以下等式由θ及φ決定 ("2 -’71)= - 忑 2*|{[φ-θ(尺/5〇] + 2ψ ^Q] / (15) χ〒-(尺/χ) 其中本紙張尺度適用中國國家標準（CNS)A4規格（21〇 X 297公釐） 477895 A7 B7 五、發明說明（27 )Ωψ = ζψ(^/χ)~ (16) (17) —Ψ2- —Ψι p p ㈣(々χ)-Z , (18) (19) ξ = + ~S2 + <P (20) Ζ = Μ . (21) \P Ρ ) 在有關. 距離量度干涉計之此等應用中，外差相位Ρ 相位θ及Φ可用以決定距離L，成爲不受距離量度干涉計之量度徑路中之氣體之折射率之影響之量，使用公式 -(Φΐ~ζΐ-Ψΐ) I-----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁)['2 八 2 (Φ2) -'1 Eight 1 (Φΐ)] | Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, where χ-(/ ^ 2 + / ^) / 2, (13) KHlMI2 · (14) The phases ί i, θ, and φ are sent to the computer 5 2 5 in digital or analog format, preferably in digital format. Acyclic non-linearity is not further discussed in the first embodiment, and is therefore omitted from the description of the first embodiment. In the measurement path formed by the vacuum, the phase Φ should be approximately a constant and not affected by the Doppler frequency shift caused by the motion of the retroreflector 5 92. This may not be the case in practice because the group delays experienced by the heterodyne signals s: and s 2 are not the same. Group delay (commonly referred to as encapsulation delay-28- This paper size applies to Chinese National Standard (CNS) A4 specifications (210 X 297 mm) 477895 A7 B7___ V. Description of the invention (26) (Please read the precautions on the back before Fill in this page)) Explain the delay of a packet frequency, and the group delay at a specific frequency is set as the negative slope of the phase curve at a specific frequency [see HJBlinchikoff and AIZverev 'in the time and frequency domains Filtering ", Chapter 2.6, 1976 (W i 1 ey, New York)]. If the phase Φ is not constant in the measurement path formed by the vacuum, a technique known to those skilled in the art can be used to compensate for the deviation between the phase Φ and the constant (refer to the above-mentioned Blinchikoff and Zverlv). It should be noted that the effect of group delay in Φ is not uniquely detectable, but can also be measured by Φ with different displacement speeds of the reflector 5 9 2 produced by the shifter 5 6 7 used as a measuring path containing a vacuum. Decide. And it should be noted that the group delay effect in Φ can be greatly reduced as follows, as close as possible to the photodetectors in the detectors 5 8 5 and 5 8 6 to perform analog to digital conversion of the signals si and s 2 and then perform the digital signal Processing instead of sending the signals S i and S 2 of the analog signal for subsequent execution of analog signal processing and / or analog-to-digital conversion downstream. Compensation for the delay of a specific group can usually be introduced before or after the processing element generating the specific group's delay, or part of the front and back. The dispersion of the printed gas (Π 2 — ηι) from the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economy can be used. The following equation is determined by θ and φ (" 2 -'71) =-忑 2 * | {[φ-θ (feet / 5〇) + 2ψ ^ Q] / (15) χ〒- (feet / χ) Among them, the paper size is in accordance with Chinese National Standard (CNS) A4 (21〇X 297 mm) 477895 A7 B7 V. Description of the invention (27) Ωψ = ζψ (^ / χ) ~ (16) (17) —Ψ2- — Ψι pp ㈣ (々χ) -Z, (18) (19) ξ = + ~ S2 + < P (20) Zn = Μ. (21) \ P Ρ) are relevant. These applications of distance measurement interferometer , The heterodyne phase P phase θ and Φ can be used to determine the distance L, which is not affected by the refractive index of the gas in the measuring path of the distance measurement interferometer, using the formula-(Φΐ ~ ζΐ-Ψΐ) I- ---------- Install -------- Order --------- (Please read the notes on the back before filling this page)

L (X-尺) Γ 經濟部智慧財產局員工消費合作社印製 [Φ - (Χ/χ)θ+2ψ+2] (22) [1 + (削]丨其中，氣體之倒數色散率Γ訂定爲 Κ-1) (23) Γ (η2 -ηχ)自等式（14)所提之Κ之定義顯示，（Κ/Χ) 〇相當於波長λ i及λ 2在諧波上有嚴格已知比率I 1 / 私紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1 477895 五、發明說明（28) 之關係。在I K / X | 或（2 2 )中，需知道滿足最終使用需求之應 550量度。在使用等知道X値至另一特定程 550量度。量得之（ 5 5 1發送至電子處理視器5 5 2，用以決定倒數色散率Γ由監 5 5 2之較宜實施例爲視器實施例。量得之Γ 527,宜爲數位格式色散（η 2 — η 1 ) 差之影響，影響之幅度 A7 B7 >〇，且在使用等式（15)及/ (Κ/Χ)之値至特定精確度，以用上，（Κ/Χ)由波長監視器式（15)及/或（22)中，需確度之應用上，X由波長監視器 Κ / X )及X之値如所需以信號器5 2 7，以及如所需發送至Γ監 Γ，宜爲數位格式。視器5 5 2量度及監視。Γ監視器來自此處其後所述之第二群之Γ監値以信號5 5 3發送至電子處理器〇可決定之相對精確度部份受循環誤所限制，依據等式（1 5 )，約爲 (請先閱讀背面之注意事項再填寫本頁) ψ/Ι 1及2 (24) 經濟部智慧財產局員工消費合作社印製 (25) 例如，考慮 λι=0 · 633Am，λι=2 入 2，p =1 ，L = 0 · 5m，及氣體由25°C及一大氣壓力之空氣所構成之一應用，由等式（2 4)所表示之貢獻至相對精確度之幅度爲 0·017|Ψι| Ψ 1以弧度表示，及I Ψ 1 I指示ψ 1之絕對値。繼續該例，在I Ψ 1 I = 0 · 1弧度之特定循環誤差，在該例中 -31 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）經濟部智慧財產局員工消費合作社印製 477895 A7 B7 ___ 五、發明說明（29 ) 該循環誤差在相位上相當於5 n m之距離量度之循環誤差，該特定之循環誤差限制色散（η 2 - n i )可量度之相對精確度至0· 2%。如几1光束之光源爲具有Ai=106 /zm之NbYAG雷射，則色散（ni—ns)可量度之相對精確度上之對應限度爲《0. 5%。循環誤差對色散（η 2 - η 1 )可決定之相對精確度之影響限度直接傳播至循環誤差對使用色散干涉計之距離量度干涉計之量度徑路中之氣體折射率差影響之改正之影響限度。由檢查等式（2 2 )，顯然相對於通過i i進入之循環誤差貢獻I Ψχ I之幅度，通過Qv進入之循環誤差之幅度爲ξΓ | | 。在具有λ1=2λ2之λ1 = 0 · 6 3 3 ’以及亦具有λι=2入2之λι = 1 0 6 2 // m之二情形中，Γ之値分別爲2 1 · 4及 6 4 . 6。如此，如由改正項所引起之循環誤差貢獻之影響爲等於或低於由Ρ χ直接引起之循環誤差貢獻之影響之階層，則循環誤差貢獻於量度徑路中氣體之折射率差之等式 (2 2 )中之改正項之影響需降低約一又二分之一以上之幅階。以P ^及P 2表示之循環非線性Ψ i之頻譜可根據不同族之正交多項式及函數。二例爲包含Fourier正弦及餘弦函數之一級數，及包含Chebyshev多項式函數之一級數。不脫離本發明之精神及範圍，Ψ i之Fourier正弦及餘弦級數頻譜表示使用於以後實施例中，及在第一實施例中表示如： 32- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I. * 裝--------訂--------- SI (請先閱讀背面之注咅？事項再填寫本頁) 477895 A7 B7 (26) 五、發明說明（30 ) Ψ/(φ/) = Hair C0Sr(P* +Σ*/> sinr(P/ \r=l r=l Ψ i以餘弦及正弦級數項寫於等式（2 6 )中，具有級數項之自變數爲P i之諧波。在干涉計之一*些構造中，尤其是多通過干涉計中，一系統可包含一光源，干涉計，及偵測器，用以產生¢) t之副諧頻之循環非線性。如一系統中有副諧頻循環誤差，則擴大等式（2 6 )，以包含餘弦及正弦級數項，具有副諧波P i之自變數。以後以等式（2 6 ) 所提之級數表示來說明用以決定餘弦及正弦級數中之係數之程序，而不脫離本發明之精神及範圍。含有一光源，干涉計，偵測器，及數位信號處理之系統可能產生並非P ^之副諧波或諧波之循環非線性。非副諧波，非諧波循環誤差例如由數位信號處理中之疏取產生，並具有頻率爲P i之諧波及副諧波之疏取頻率。如非副諧波，非諧波循環誤差出現於系統中，則擴大等式（2 6 )，以包含餘弦及正弦級數項，具有自變數爲P i之諧波及/或副諧波之疏取者。其後以等式（2 6 )所提之級數表示來說明用以決定餘弦及正弦級數之係數之程序，而不脫離本發明之精神及範圍。等式（2 6 )所提之頻譜表示對外差信號之相位大致以恆定之變化率改變之干涉計大體有效。等式（2 6 )所提之頻譜表示之係數大體取決於相位改變率，例如，由外差信號所遭遇之群延遲之性質所引起（閱有關Φ之頻率依賴性之群延遲討論）。 -33- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I-----------裝--------訂--------- S! (請先閱讀背面之注音？事項再填寫本頁} 經濟部智慧財產局員工消費合作社印製 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（31 ) 在次一步驟，量度隨¢)1及φ2之特定値範圍上之P 1 及而定之Φ。Φ之量度値可依據等式（1 2)寫成 Φ = Ζχ(；72 -+ +"1) + Ζψ +Ζ · (27) 由等式（1 8 )所提之循環誤差項Z V V可表示如 ^[/2Ψ2(φ2)-/ιΨι(φι)] · (28) 在1 0又1至1 〇〇又2之階層之L中改變中，自等式 (2 7)顯然可見，在1<；/又=〔（112—111)/(112 + η ^ )〕之情形，Z w項爲有關Φ中產生改變之主要項，普通爲數幅階，其他項K，X，Z爲常數，及在2 5 °C及一大氣壓力上之空氣中，〔（n2 — ni)/(n2+ni〕S 1 / ( 2 X 1 0 5 )，入1=0.6//111，及入1三2入2。結果，所量得之Φ値可直接用於決定Z v之有效程序中。第一實施例中之波長λ i / Λ 2之比率可依等式（1 )表示如比率I i/I 2，具有特定之相對精確度。比率故此可表示如具有相同特定之相對精確度。Zv之二參數表示（依據等式（18)及（26)，該二參數爲可由使用等式（2 9 )來消除Z'r之二參數表示中之，以減少至一參數表示。其後以消除P 2來說明第一實施例，唯亦可選擇消除P i，因爲消除參數對ζ ψ之決定產生大致 __ -34- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -----------裝--------訂--------- (請先閱讀背面之注音？事項再填寫本頁) 477895 A7 B7 經濟部智慧財產局員工消費合作社印製五、發明說明（32) 相同之最後結果。所造成之Z W之一參數表示，即縮小之表示 Ζ ψ爲L (X-foot) Γ Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs [Φ-(χ / χ) θ + 2ψ + 2] (22) [1 + (cut) 丨 Among them, the inverse dispersion rate of gas Γ is set It is defined as κ-1) (23) Γ (η2-ηχ) The definition of κ mentioned in equation (14) shows that (κ / χ) 〇 corresponds to the wavelengths λ i and λ 2 which have strict harmonics. Known ratio I 1 / private paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1 477895 5. The relationship between invention description (28). In I K / X | or (2 2), it is necessary to know the 550 measurement to meet the end-use requirements. Before using, know X to another specific course 550 measurement. (5 5 1 is sent to the electronic processing viewer 5 5 2 to determine the reciprocal dispersion ratio Γ. The preferred embodiment of the monitor 5 5 2 is the viewer embodiment. The measured Γ 527 should be in digital format. The effect of dispersion (η 2 — η 1) difference, the magnitude of the effect A7 B7 > 0, and using the 値 of equations (15) and / (κ / χ) to a certain accuracy, in order to use, (κ / (X) From the wavelength monitor type (15) and / or (22), in applications where accuracy is required, X is from the wavelength monitor K / X) and X, if necessary, with the annunciator 5 2 7 and as required It needs to be sent to Γsupervisor Γ, which should be in digital format. Sight 5 5 2 Measure and monitor. The Γ monitor from the second group of Γ monitors described here is sent to the electronic processor with a signal 5 5 3. The relative accuracy that can be determined is partly limited by cyclic errors, according to equation (1 5) (Please read the notes on the back before filling this page) ψ / Ι 1 and 2 (24) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (25) For example, consider λι = 0 · 633Am, λι = 2 Input 2, p = 1, L = 0 · 5m, and an application in which the gas consists of air at 25 ° C and an atmospheric pressure, the contribution to the relative accuracy represented by equation (2 4) is 0 · 017 | Ψι | Ψ 1 is expressed in radians, and I Ψ 1 I indicates the absolute 値 of ψ 1. Continuing the example, the specific cyclic error at I Ψ 1 I = 0 · 1 radian, in this example -31-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Employee Consumption Cooperative 477895 A7 B7 ___ V. Description of the invention (29) The cyclic error is equivalent to a cyclic error of a distance measurement of 5 nm in phase, and this specific cyclic error limits the relative measurable dispersion (η 2-ni) Accuracy to 0.2%. If the light source of a few beams is a NbYAG laser with Ai = 106 / zm, the corresponding limit of the relative accuracy of the measurable dispersion (ni-ns) is <0.5%. The limit of the influence of cyclic error on the relative accuracy of dispersion (η 2-η 1) can be directly propagated to the effect of cyclic error on the correction of the influence of the refractive index difference of the gas in the measurement path of the interferometer using the dispersion interferometer. limit. From the inspection equation (2 2), it is clear that the magnitude of the loop error contribution through Qv is ξΓ | | relative to the loop error contribution I Ψχ I entered through i i. In the case of λ1 = 0 · 6 3 3 ′ with λ1 = 2λ2 and λι = 1 0 6 2 // m which also has λι = 2 to 2, the 値 of Γ are 2 1 · 4 and 6 4 respectively. 6. Thus, if the effect of the cyclic error contribution caused by the correction term is equal to or lower than the effect of the cyclic error contribution directly caused by P χ, the cyclic error contributes to the equation for measuring the refractive index difference of the gas in the path The impact of the correction term in (2 2) needs to be reduced by about one and a half times. The spectrum of the cyclic nonlinearity Ψ i represented by P ^ and P2 can be based on orthogonal polynomials and functions of different families. Two examples are a series containing Fourier sine and cosine functions, and a series containing Chebyshev polynomial functions. Without departing from the spirit and scope of the present invention, the Fourier sine and cosine series spectrum representations of Ψi are used in the following embodiments, and in the first embodiment, such as: 32- This paper size is applicable to the Chinese National Standard (CNS) A4 Specifications (210 X 297 mm) I. * Packing -------- Order --------- SI (Please read the note on the back? Matters before filling this page) 477895 A7 B7 ( 26) V. Description of the invention (30) Ψ / (φ /) = Hair C0Sr (P * + Σ * / > sinr (P / \ r = lr = l Ψ i is written in the equation with cosine and sine series terms In (2 6), the independent variable with a series term is the harmonic of Pi. In one or more of the interferometer structures, especially in the multi-pass interferometer, a system may include a light source, an interferometer, and a detector. The tester is used to generate the cyclic nonlinearity of the subharmonic frequency of ¢) t. If there is a subharmonic cyclic error in a system, expand equation (2 6) to include the cosine and sine series terms with subharmonic The independent variable of P i. The procedure used to determine the coefficients in the cosine and sine series will be described by the series expression mentioned in equation (2 6) without departing from the spirit and scope of the present invention. Sources, interferometers, detectors, and digital signal processing systems may produce sub-harmonics or cyclic nonlinearities of harmonics that are not P ^. Non-sub-harmonic, non-harmonic cyclic errors such as those caused by digital signal processing Take the generated and have the sparse frequency of the harmonics of the P i and the sub-harmonics. If the non-sub-harmonics and non-harmonic cyclic errors appear in the system, expand the equation (2 6) to include the cosine and The sine series term has the extractor of the harmonics and / or subharmonics whose independent variables are P i. The series expressions mentioned in equation (2 6) are used to determine the cosine and sine series. The procedure of the coefficients does not depart from the spirit and scope of the present invention. The frequency spectrum mentioned in equation (2 6) indicates that the interferometer whose phase of the heterodyne signal is changed at a substantially constant rate of change is generally effective. Equation (2 6) The coefficients of the mentioned spectrum representation are largely dependent on the phase change rate, for example, caused by the nature of the group delay encountered by the heterodyne signal (see the discussion of frequency-dependent group delay for Φ). -33- This paper standard applies China National Standard (CNS) A4 Specification (210 X 297 Mm) I ----------- install -------- order --------- S! (Please read the phonetic on the back? Matters before filling out this page} Printed by the Employees 'Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (31) In the next step, measure P 1 over a specific range of ¢) 1 and φ2 And Φ. The measure Φ of Φ can be written as Φ = χ × (; 72-+ + " 1) + ψ + + · (27) according to the equation (1 2). The error term ZVV can be expressed as ^ [/ 2Ψ2 (φ2)-/ ιΨι (φι)] · (28) In the change of L in the hierarchy of 10 and 1 to 100 and 2 since Equation (2 7) Obviously, in the case of 1 < / again = [(112—111) / (112 + η ^)], the Z w term is the main term that changes in Φ, usually several orders, and the other terms K, X and Z are constants, and in the air at 2 5 ° C and an atmospheric pressure, [(n2 — ni) / (n2 + ni] S 1 / (2 X 1 0 5), enter 1 = 0.6 // 111, and enter 1 three 2 into 2. As a result, the measured Φ 値 can be directly used in the effective procedure for determining Z v. The ratio of the wavelengths λ i / Λ 2 in the first embodiment can be expressed according to equation (1), such as the ratio I i / I 2, with a specific relative accuracy. Ratios can therefore be expressed as if they have the same specific relative accuracy. Zv's two-parameter representation (according to equations (18) and (26), this two-parameter is that one of Z'r's two-parameter representation can be eliminated by using equation (2 9) to reduce to one parameter representation. Thereafter The first embodiment is explained by eliminating P 2, but it is also possible to choose to eliminate P i, because the decision of the elimination parameter on ζ ψ is approximately __ -34- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 Mm) ----------- Installation -------- Order --------- (Please read the phonetic on the back? Matters before filling out this page) 477895 A7 B7 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs V. Invention Description (32) The same final result. One of the parameter expressions of ZW caused, that is, the reduced expression Z ψ is

V Σα2^ cosr h. Φι+ΣνδίηΓ h Φι ~·ΪΣαι,Γ c〇sr9x + Σ V sinr(Pi (30) Ζ ν之縮小表示i W之精確度部份由λ i / λ 2以比率 I i / I 2表示之特定精確度決定。用以估計縮小表示云V之Fourier係數之程序使用p i作爲Ζψ之Fourier分析中之積分之變數。F 〇 u r i e r分析中之積分之間隔爲^ 1，△ p 1之間隔，俾△ p i爲2 ττ之倍數，而且，ΙιΔφι / 12爲2 π之倍數至一特定精確度。循環誤差項Ζ ν可由第一實施例決定之相對精確度具有以弧度Ρ 1表示之1 / 2循環誤差之幅階之幅度’或如較大，波長（λι/λ2)之比率以I ι/Ι 2表示之特定相對精確度，及/或I ιΔ ii / I 2爲2 7Γ之倍數之特定精確度之效果。如此，循環誤差對循環誤差影響之Φ後改正之殘餘貢獻進入爲第二階影響，在Φ之循環誤差中之第一階，及第一階影響之某組合，諸如i ^中之循誤差，波長（入1 /λ2)之比率以I i / I 2比率表示之特定精確度’及 I (Pi/Ι 2爲2 7Γ之倍數之特定精確度。故此’循環誤差對量度徑路5 9 8中之氣體之補償之殘餘貢獻進入爲第二階影響之Γ倍。電腦5 2 9使用等式（1 5 )及（2 2 )以及各別量 -35- ---*-------裝--------訂--------- 華 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）經濟部智慧財產局員工消費合作社印製 477895 A7 B7_ 五、發明說明（33 ) 得之量，分別計算色散（η 1 - η 2 )及物理位移L，如最終應用所需。使用等式（1 5 )及（2 3 )及量得之Γ値，計算折射率差（n : - 1 )。說明本發明之第一實施例之第一改變，其中，除循環誤差之處理外，第一實施例之第一改變之說明與第一實施例之說明相同。在第一實施例之第一改變中，由等式（ 2 7 )所提之相位Φ由Φ對I ^ i i / I 2間隔或其倍數上之積分變換，或Φ對I 2Δ ^2 / I 1之間隔或其倍數之p 2積分變換加以濾波。積分變換演算之設計係根據縮小之表示g Ψ之性質。循環誤差對積分變換之Φ後濾波之殘餘貢獻以第二階影響， Φ中之循環誤差之第一階，及9 1或Ρ 2中之循環誤差之第一階影響之其他組合進入，此視使用ί i及Ρ 2之何者來執行積分變換，波長（λ i i / λ i 2 )之比率以I i i / I i 2 比率表示之特定相對精確度，及I pi / I 2爲2 7Γ之倍數之特定精確度’或I 2Δ Φ2 / I 1爲2 π之倍數之特定精確度，何者用於積分變換中而定。在最佳之積分變換中，殘餘之第二階影響具有由弧度Ρ 1或Ρ 2 (何者用於積分變換中）表示之循環誤差之一些其他組合之幅度之 1 / 2倍乘Ζ Ψ之幅階，波長（λ i i / λ i 2 )之比率以 1 ii/I 表示之特定相對精確度之效果’及I ιΔ ^ /1 2爲2 7Γ之倍數之特定精確度，或I 2Δ 92/1 1爲 2 π之倍數之特定精確度，視何者用於積分變換中而定。 Φ之積分變換Φ 1由以下等式提供 -- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） i . •裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7__ 五、發明說明（34 ) φΐ=1ί^ί： , 7· = 1 及 2 , (31)V Σα2 ^ cosr h. Φι + ΣνδίηΓ h Φι ~ · ΪΣαι, Γ c〇sr9x + Σ V sinr (Pi (30) ZO / I 2 represents a certain degree of accuracy. The procedure used to estimate the Fourier coefficients that represent the cloud V uses pi as the variable of the integral in the Fourier analysis of Zψ. The interval between the integrals in the Fourier analysis is ^ 1, △ p At intervals of 1, 俾 △ pi is a multiple of 2 ττ, and ΙΔΔι / 12 is a multiple of 2 π to a specific accuracy. The relative accuracy of the cyclic error term Z ν, which can be determined by the first embodiment, is expressed in radians P 1 The magnitude of the magnitude of the 1/2 cycle error 'or as large, the specific relative accuracy expressed by the ratio of wavelength (λι / λ2) as I ι / Ι 2 and / or I ΔΔ ii / I 2 is 2 7Γ The effect of the specific accuracy of multiples. In this way, the residual contribution of the correction of the circular error to the circular error after Φ enters the second-order effect, the first order in the circular error of Φ, and some combination of the first-order effects , Such as the cyclic error in i ^, the ratio of the wavelength (in 1 / λ2) is given by I i / The specific accuracy of the I 2 ratio 'and the specific accuracy of I (Pi / Ι 2 is a multiple of 2 7Γ. Therefore, the residual contribution of the cyclic error to the compensation of the gas in the measurement path 5 9 8 enters the second order Γ times the effect. Computer 5 2 9 uses equations (1 5) and (2 2) and the respective quantities -35- --- * ------- install -------- order- -------- Hua (Please read the notes on the back before filling this page) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7_ 5. The quantity of the invention (33), calculate the dispersion (η 1-η 2) and the physical displacement L respectively, as required for the final application. Use equations (1 5) and (2 3) and the quantity Obtain Γ 値, calculate the refractive index difference (n:-1). Explain the first change of the first embodiment of the present invention, in addition to the processing of the cyclic error, the description of the first change of the first embodiment and the first change The description of one embodiment is the same. In the first modification of the first embodiment, the phase Φ mentioned by equation (2 7) is transformed by the integral of Φ on I ^ ii / I 2 interval or a multiple thereof , Or Φ filters the interval of I 2Δ ^ 2 / I 1 or its multiple of p 2 integral transformation. The design of the integral transformation calculation is based on the nature of the reduced representation g 。. Residual of the filtering after the integral error of cyclic error Contributions are entered with other combinations of the second-order effects, the first-order effects of the cyclic errors in Φ, and the first-order effects of the cyclic errors in 9 1 or P 2, depending on which of ί i and P 2 is used to perform the integration Transform, the specific relative accuracy of the ratio of wavelength (λ ii / λ i 2) expressed by the ratio of I ii / I i 2, and the specific accuracy where I pi / I 2 is a multiple of 2 7Γ 'or I 2Δ Φ 2 / I 1 is a specific precision that is a multiple of 2 π, whichever is used in the integral transformation. In the best integral transform, the residual second-order effect has a magnitude of 1/2 of the other combination of cyclic errors represented by radians P 1 or P 2 (whichever is used in the integral transform) times the magnitude of Z Ψ Order, the effect of the specific relative accuracy of the ratio of wavelength (λ ii / λ i 2) expressed in 1 ii / I 'and I ΔΔ ^ / 1 2 is a specific accuracy in multiples of 2 7Γ, or I 2Δ 92/1 1 is a specific precision that is a multiple of 2 π, depending on which is used in the integral transformation. Integral transformation of Φ Φ 1 is provided by the following equation-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) i. • installed -------- order ----- ---- (Please read the notes on the back before filling this page) 477895 A7 B7__ V. Description of the invention (34) φΐ = 1ί ^ ί:, 7 · = 1 and 2, (31)

Jd9/ (請先閱讀背面之注意事項再填寫本頁) 在此在Pi上之積分範圍爲，在i二1時IiZX pi/ I2爲之倍數，及時Ι2Δ 之倍數。等式（3 1 )中之積分濾波在實際上大體以數位濾波器實施，使用一數位信號處理器〔閱例如rokakis及 D.G.ManoIakis之”數位信號處理：原理，演算，及應用” ，第二版，（Macmillan，紐約）1 9 9 2〕。第一實施例之第一改變並不施加任何限制於鏡5 9 2 之移動上，俾達成原先相當於△ ^:或^ ^2之一些移動以外者，此取決濾波之積分變換程序中使用何相位變數，或其各別倍數，且循環誤差在鏡5 9 2移動於一距離相當於 △ i i或△ ^ 2之相位空間或其倍數（用於濾波之積分變換程序中）時之週期之間並無重大改變。由第一實施例之第一改變中之濾波來減小循環誤差，有效消除先行技藝中根據固定期間中積分之濾波方法所遭遇之問題。經濟部智慧財產局員工消費合作社印製需注意在第一實施例之第一改變中，除第三及更高階影響外，氣體中之擾亂之影響並不影響減小循環誤差影響中之濾波程序之效果。濾波程序之效果之不敏感性爲氣體中之量度光束之不同波長部份大致在同等範圍之徑路中之結果。第一實施例之第一改變之其餘說明與第一實施例所提 ____=^Lz__ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）經濟部智慧財產局員工消費合作社印製 477895 A7 _ B7__ 五、發明說明（35 ) 之說明之對應部份相同。圖2 a及2 b以槪要之形態顯示本發明之第二較宜實施例。第二實施包含裝置及方法，用以量度及改正在角或線位移干涉計之量度徑路及基準徑路之至少之一中之氣體之影響，及改正用以決定量度及基準徑路之相對光徑路長度之改變之決定之量得之相位，及用以改正量度及基準徑路之至少之一中之氣體影響之相對光徑路之改變之所屬色散有關信號二者中之循環誤差之影響。量度及基準徑路之氣體折射率及相對物理長度之任一或二者可改變。如顯示於圖2 a，第二實施例之干涉計系統包含一光源系統7 0 0，一干涉計系統7 6 9，偵測器7 8 9及 790 ，波長監視器75〇及784，一 Γ監視器752 ，一電子處理器7 2 7，及一電腦及控制器7 2 9。此構造在本藝中稱爲極化Mchelson干涉計，並以p = 1簡單顯示。圖2 a及2 b中所示之第二實施例之許多元件執行與圖1 a及1 b之第一實施例之元件相同之功能，且除非另有指示，執行與第一實施例之元件相等功能之圖2 a及 2 b之第二實施例之元件編號等於圖1 a或圖1 b中之第一實施例之元件編號加2 0 0及2 0 0 0。光源7 0 1及 7 0 2 A之說明與第一實施例之光源5 0 1及5 0 2所提之說明相同。光源7 0 2 B之說明分別與第一實施例之光源5 0 2所提供之說明之對應部相同’唯光源7 0 2 B之波長並非固定。光源70 1，702A，及702B分別 -38- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） f/—---------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7___ 五、發明說明（36 ) 產生光束707，708A，及708B，分別具有波長入3，λ4Α，及λ4Β。光束7〇7 ，7〇8A，及 7〇8B在圖2 a之平面中極化。來自光源7 0 2 B之光束之波長λ4Β由來自電腦及控制器7 2 9之誤差信號7 4 4控制。在第二實施例中（ λ 4 A — λ 4 B ) >〇及 I λ4Α— λ4Β|<<λ4Α，俾以簡單之方式圖解本發明。第二實施例可構造操作於（Λ 4 Α — 入4B)之負値上及/或| Λ4Α — λ4Β | <<λ4Α，而不脫離本發明之車Ε圍及精神。在不適用條件| λ 4Α — λ 4Β | << λ 4 Α之第二實施例之裝置之構造中，可能需改變第二實施例中對二色光束分裂器所述之一些非極化光束分裂器，以提高光源系統及干涉計系統之整個效率。如顯示於圖2 a ，光束7 0 8 A之一第一部份由非極化光束分裂器7 5 1 A反射，及其一部份由非極化光束分裂器7 5 1 B反射，以形成光束7 40之一第一部份。在次一步驟，光束7 0 8 B之一第一部份由非極化光束分裂器7 5 1 C反射，由鏡7 5 1 D反射，及其一部份由非極化光束分裂器7 5 1 B透射，以形成光束7 4 0之一第二部份。光束7 4 0撞擊於波長監視器7 8 4上，此構造用以監視比率（λ 4 A / A 4 B )。所量得之比率（λ 4 A / λ 4 B )之値發送至電腦及控制器7 2 9，成爲電子信號 7 2 0。波長監視器7 8 4可包含例如干涉計，具有或無真空在量度腳及/或非線性元件，諸如Θ - B a B〇3，俾由第二諧波產生S H G加倍光束之頻率。本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -39- :—----------------訂---------^9 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7 五、發明說明（37) 電腦及控制器7 2 9產生有關波長比率（λ 4 Α / λ 4 , )之量度値，由信號7 2 0所發送之比率，及由電腦及控制器7 2 9所指定之比率間之差之誤差信號7 4 4。光源 7 0 2 Β之波長由誤差信號7 4 4控制。誤差信號7 4 4 可由壓電轉換器控制雷射空腔之長度而控制雷射之波長，或由控制二極體雷射之注入電流而控制二極體雷射之波長〇繼續圖2 a ，光束7 0 8 Α之一第二部份由非極化光束分裂器7 5 1 A透射，進入調變器7 0 4 A中，並離開調變器7 Ο 4A，成爲由二同等範圍之頻率部份所構成之光束7 1 OA。光束7 1 OA由鏡7 5 3A反射，其一部份由非極化光束分裂器7 5 3 B反射，及其一部份由二色光束分裂器7 5 3D透射，以形成光束7 1 2之部份及頻移之λ 4Α部份。光束7 0 8 Β之一第二部份由非極化光束分裂器7 5 1 C透射，進入調變器7 0 4 Β中，並離開調變器7 0 4 Β，成爲由二同等範圍之頻率部份所構成之光束7 1 ΟΒ。光束7 1 0Β之一部份由非極化光束分裂器7 5 3 Β透射，及其一部份由二色光束分裂器 7 5 3 D透射，以形成光束7 1 2之λ4Β部份及頻移之 λ4Β部份。光束707進入及離開調變器703，成爲由二同等範圍之頻率部份所構成之光束7 0 9。光束7 〇 9 由鏡7 5 3 C反射，及其一部份由二色光束分裂器 7 5 3D反射，以形成光束7 1 2之λ3部份及頻移之部份。 __-___-40 -_— -- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L.---r-------•裝--------訂--------- ΜΨ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 _B7 _ 五、發明說明（38 ) 波長之比率（λ 3 / λ 4 A )具有已知之接近比率値I 3 / I 4 A，即 (入3/入认）Ξ (’3"4A)， (32) 其中，I 3及I 4 A包含低階非零整數値，或具有低幅階之至少一非整數非零値。調變器7 0 3，7 0 4 A，及7 0 4 B及有關驅動器 7 0 5，7 0 6 A，及7 0 6 B之說明與第一實施例之驅動器5 0 3及5 0 4以及有關之驅動器5 0 5及5 0 6所提之說明之對應部份相同。由調變器7 0 3，7 0 4 A，及7 0 4 B所引進之相位轉移分別爲f i，f 2 A，及f 2 B 。光束7 1 2之非頻移部份在圖2 A之平面中極化，及光束7 1 2之頻移部份在正交於圖2 a之平面中極化。頻移動f 2 A及f 2 B並不相同。其次，光束7 1 2之一第一部份由非極化光束分裂器 7 5 3E透射，成爲光束7 1 3。光束7 1 3傳播至光學裝置所構成之干涉計系統7 6 9，用以引進一相位轉移Φ 3 於光束7 1 3之λ 3部份之X及y極化部份之間，一相位轉移P 4 a於光束7 1 3之λ 4 a部份之X及y極化部份之間，及一相位轉移P 4 b於光束7 1 3之λ 4 b部份之X及y極化部份之間。在另一步驟中。光束7 1 2之一第二部份由非極化光束分裂器7 5 3 E反射，且在由鏡7 5 3 F及 7 5 3 G反射後，其一第一部份由非極化光束分裂器 7 5 3 Η反射，成爲輸入至波長監視器7 5 0之光束，及 ____-41 - _ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L-----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7Jd9 / (Please read the notes on the back before filling this page) The range of points on Pi here is the multiple of IiZX pi / I2 when i 21, and the multiple of I 2 Δ in time. The integral filtering in equation (3 1) is practically implemented as a digital filter, using a digital signal processor [for example, "Digital Signal Processing: Principles, Calculations, and Applications" by rokakis and DGManoIakis ", Second Edition (Macmillan, New York) 1 9 9 2]. The first change of the first embodiment does not impose any restrictions on the movement of the mirror 5 9 2. It does not achieve any of the original equivalents of △ ^: or ^ ^ 2. This depends on what is used in the filtering integral transformation program. Phase variable, or its respective multiples, and the cycle error between the period when the mirror 5 9 2 moves in a phase space or a multiple thereof (for integration filtering process of filtering) with a distance equivalent to △ ii or △ ^ 2 No major changes. The filtering in the first modification of the first embodiment reduces cyclic errors and effectively eliminates problems encountered in filtering techniques based on integration in fixed periods in prior art. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. In the first modification of the first embodiment, in addition to the third and higher order effects, the influence of disturbance in the gas does not affect the filtering process in reducing the influence of cyclic errors The effect. The insensitivity of the filtering procedure results from the fact that the different wavelength portions of the measuring beam in the gas are approximately in the same range of paths. The rest of the description of the first change of the first embodiment and the one mentioned in the first embodiment ____ = ^ Lz__ This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Employees ’Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Printed 477895 A7 _ B7__ 5. The corresponding parts of the description of invention description (35) are the same. Figures 2a and 2b show the second preferred embodiment of the invention in summary form. The second implementation includes a device and method for measuring and correcting the influence of gas in at least one of the measurement path and the reference path of the angular or linear displacement interferometer, and correcting the relative of the measurement and the reference path The cyclic error in the dispersion-related signal of both the measured phase determined by the change in the optical path length and the relative optical path change used to correct the influence of the gas in at least one of the measurement and the reference path influences. Either or both the refractive index of the gas and the relative physical length of the measurement and reference path can be changed. As shown in Fig. 2a, the interferometer system of the second embodiment includes a light source system 700, an interferometer system 7 69, detectors 7 89 and 790, wavelength monitors 75 and 784, and a Γ. A monitor 752, an electronic processor 7 2 7 and a computer and controller 7 2 9. This construction is called a polarized Michelson interferometer in the art and is simply shown with p = 1. Many of the elements of the second embodiment shown in Figs. 2a and 2b perform the same functions as those of the first embodiment of Figs. 1a and 1b, and execute the elements of the first embodiment unless otherwise indicated The component numbers of the second embodiment of FIGS. 2 a and 2 b with equivalent functions are equal to the component numbers of the first embodiment in FIG. 1 a or FIG. 1 b plus 2 0 0 and 2 0 0 0. The descriptions of the light sources 70 1 and 70 2 A are the same as those of the light sources 50 1 and 50 2 of the first embodiment. The description of the light source 7 0 2 B is the same as the corresponding part of the description provided by the light source 5 2 of the first embodiment, except that the wavelength of the light source 7 0 2 B is not fixed. Light source 70 1, 702A, and 702B, respectively -38- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) f / ----------- installation ------ --Order --------- (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7___ V. Description of the invention (36) Generated beams 707,708A , And 708B have wavelengths of 3, λ4A, and λ4B, respectively. The light beams 707, 708A, and 708B are polarized in the plane of Fig. 2a. The wavelength λ4B of the light beam from the light source 7 0 2 B is controlled by the error signal 7 4 4 from the computer and the controller 7 2 9. In the second embodiment (λ 4 A-λ 4 B) > 〇 and I λ4 A-λ4B | < λ4A, 图解 illustrates the present invention in a simple manner. The second embodiment can be constructed and operated on the negative （of (Λ 4 Α— 入 4B) and / or | Λ4Α-λ4B | < < λ4Α without departing from the scope and spirit of the present invention. In the non-applicable conditions | λ 4Α — λ 4B | < < λ 4 Α The structure of the second embodiment of the device may need to change some of the non-polarization described in the second embodiment for the two-color beam splitter Beam splitter to improve the overall efficiency of the light source system and the interferometer system. As shown in Figure 2a, one of the first part of the beam 7 0 8 A is reflected by the non-polarized beam splitter 7 5 1 A, and a part of it is reflected by the non-polarized beam splitter 7 5 1 B. A first portion of one of the beams 7 40 is formed. In the next step, one of the first part of the beam 7 0 8 B is reflected by the non-polarized beam splitter 7 5 1 C, and is reflected by the mirror 7 5 1 D, and part of it is reflected by the non-polarized beam splitter 7 5 1 B is transmitted to form a second part of the beam 7 4 0. The light beam 7 4 0 impinges on the wavelength monitor 7 8 4. This structure is used to monitor the ratio (λ 4 A / A 4 B).値 of the measured ratio (λ 4 A / λ 4 B) is sent to the computer and controller 7 2 9 and becomes an electronic signal 7 2 0. The wavelength monitor 7 8 4 may include, for example, an interferometer, with or without a vacuum measuring foot and / or a non-linear element, such as Θ-B a B0, 俾 that generates a frequency of the SHG doubled beam by the second harmonic. This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -39-: -------------------- Order --------- ^ 9 (Please read the precautions on the back before filling out this page) Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7 V. Description of the invention (37) Computer and controller 7 2 9 produces the relevant wavelength ratio (λ 4 Α / λ 4,) is the error signal 7 4 4 of the difference between the ratio sent by signal 7 2 0 and the ratio specified by the computer and controller 7 2 9. The wavelength of the light source 7 0 2 B is controlled by the error signal 7 4 4. The error signal 7 4 4 can be controlled by the piezoelectric converter to control the length of the laser cavity and the wavelength of the laser, or by controlling the injection current of the diode laser to control the wavelength of the diode laser. Continue to Figure 2a, The second part of beam 7 0 8 A is transmitted by the non-polarized beam splitter 7 5 1 A, enters the modulator 7 0 4 A, and leaves the modulator 7 0 4A, becoming a frequency of two equal ranges. Part of the beam 7 1 OA. The beam 7 1 OA is reflected by the mirror 7 5 3A, part of it is reflected by the non-polarized beam splitter 7 5 3 B, and part of it is transmitted by the two-color beam splitter 7 5 3D to form the beam 7 1 2 Part and λ 4A part of frequency shift. One part of the beam 7 0 8 B is transmitted by the non-polarized beam splitter 7 5 1 C, enters the modulator 7 0 4 B, and leaves the modulator 7 0 4 B. The light beam 7 1 〇B constituted by the frequency part. Part of the beam 7 1 0B is transmitted by the non-polarized beam splitter 7 5 3 Β, and part of it is transmitted by the two-color beam splitter 7 5 3 D to form a λ4B part and frequency of the beam 7 1 2 Move the λ4B part. The light beam 707 enters and leaves the modulator 703, and becomes a light beam 709 composed of two frequency parts of the same range. The light beam 7 〇 9 is reflected by the mirror 7 5 3 C, and a part thereof is reflected by the two-color beam splitter 7 5 3D to form a λ3 part and a frequency shifted part of the light beam 7 1 2. __-___- 40 -_—-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) L .--- r ------- • Package ------ --Order --------- ΜΨ (Please read the notes on the back before filling out this page) Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs 477895 A7 _B7 _ V. Description of invention (38) Wavelength ratio (Λ 3 / λ 4 A) has a known approach ratio 値 I 3 / I 4 A, that is (in 3 / recognized) Ξ ('3 " 4A), (32) where I 3 and I 4 A include low Order non-zero integer 値, or at least one non-integer non-zero 値 with low amplitude order. Modulators 7 0 3, 7 0 4 A, and 7 0 4 B and descriptions of the related drives 7 0 5, 7 0 6 A, and 7 0 6 B and the drivers of the first embodiment 5 0 3 and 5 0 4 And the corresponding parts of the descriptions of the related drives 5 05 and 5 06 are the same. The phase shifts introduced by the modulators 7 0 3, 7 0 4 A, and 7 0 4 B are f i, f 2 A, and f 2 B respectively. The non-frequency-shifted portion of the beam 7 1 2 is polarized in the plane of FIG. 2A, and the frequency-shifted portion of the beam 7 1 2 is polarized in the plane orthogonal to FIG. 2a. The frequency shifts f 2 A and f 2 B are different. Secondly, a first part of one of the light beams 7 1 2 is transmitted by the non-polarized beam splitter 7 5 3E to become the light beam 7 1 3. The beam 7 1 3 propagates to the interferometer system 7 6 9 formed by the optical device, and is used to introduce a phase shift Φ 3 between the X and y polarization parts of the λ 3 part of the beam 7 1 3, a phase shift P 4 a is between the X and y polarized portions of the λ 4 a portion of the beam 7 1 3 and a phase shift P 4 b is between the X and y polarized portions of the λ 4 b portion of the beam 7 1 3 Between servings. In another step. One of the second part of the beam 7 1 2 is reflected by the non-polarized beam splitter 7 5 3 E, and after being reflected by the mirrors 7 5 3 F and 7 5 3 G, one of the first part is reflected by the non-polarized beam The splitter 7 5 3 Η reflects and becomes the light beam input to the wavelength monitor 7 50, and ____- 41-_ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) L --- -------- Install -------- Order --------- (Please read the precautions on the back before filling this page) 477895 A7

經濟部智慧財產局員工消費合作社印製五、發明說明（39 ) 其一桌一部份由非極化光束分裂器7 5 3 Η透射，成爲輸入至Γ監視器7 5 2之光束。 Γ監視器7 5 2在圖2 a中顯示移離干涉計系統 7 6 9位移。在實際上，Γ監視器與干涉計系統7 6 9相對位置之選擇在第二實施例之性能上爲一重要考慮。Γ監視器7 5 2 —般宜接近由氣體所佔住之量度及基準徑路之至少之一設置。如干涉計系統7 6 9之環境包含具有已知空氣流形態之空氣流，則Γ監視器7 5 2宜另置於由氣體所佔住之量度及基準徑路之至少之一之上游，如由已知之空氣流形態訂定。光束7 1 3之傳播通過干涉計系統7 6 9及電干涉信號’包括成爲號7 2 3發送之外差信號s 3，及成爲信號 7 2 4發送之外差信號S 4Α及S 4Β之產生之說明與第一實施例中有關光束5 1 3之傳播通過干涉計5 6 9，及成爲信號5 2 3及5 2 4發送之電干涉信號s 2及3 2之產生所提之說明之對應部份相同。外差信號S 3及S 4 Α及各別相位ί 3及i 4 Α之性質之說明與第一實施例之外差信號S 1及S 2及各別相位i i及i 2 之性質之說明之對應部份相同。而且。與第一實施例之等式（1 )至（2 3 )相當之第二實施例之等式自等式（1 )至（2 3 )獲得，以下標3取代所有下標1，及以下標 4 A取代所有下標2而成。對應之等式用以決定氣體所佔住之量度及基準徑路之至少之一中之氣體之色散，並用以決定氣體對量度及基準徑路之相對徑路長度之貢獻。本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） . ^--------^--------- (請先閱讀背面之注意事項再填寫本頁) -42- 477895 經濟部智慧財產局員工消費合作社印製 A7 ____B7_ 五、發明說明（40 ) 餘留之外差信號S 4 A及S 4 B及各別相位φ 4 a及¢) 4 B 用以決定^ 4 Α及¢) 4 Β中之循環誤差。經補償循環誤差後之相位Φ 4 A及φ 4 B之一用以決定ρ 3中之循環誤差。信號7 4 2包含外差信號s 4 A，S 4 Β，及另二外差信號。外差信號S 4A及S 4B具有外差頻率分別等於頻率 f 4 A及f 4 B。另二外差信號之外差頻率分別爲| △ f | 土 f4A 及 |Z\f | 土 f4B，其中Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (39) A part of the table is transmitted by the non-polarized beam splitter 7 5 3 Η and becomes a beam input to the Γ monitor 7 5 2. The Γ monitor 7 5 2 shows the displacement of the interferometer system 7 6 9 in Figure 2a. In practice, the choice of the relative positions of the? Monitor and the interferometer system 7 6 9 is an important consideration in the performance of the second embodiment. The Γ monitor 7 5 2 is generally set close to at least one of the measurement occupied by the gas and the reference path. If the environment of the interferometer system 7 6 9 contains an air flow with a known air flow pattern, the Γ monitor 7 5 2 should be placed upstream of at least one of the measurement and reference path occupied by the gas, such Defined by known airflow patterns. The propagation of the beam 7 1 3 through the interferometer system 7 6 9 and the electric interference signal 'includes the generation of the heterodyne signal s 3 as the number 7 2 3 and the generation of the heterodyne signals S 4A and S 4B as the signal 7 2 4 The description corresponds to the explanation given in the first embodiment regarding the propagation of the light beam 5 1 3 through the interferometer 5 6 9 and the generation of the electrical interference signals s 2 and 3 2 which are sent by the signals 5 2 3 and 5 2 4 Partially the same. The description of the properties of the heterodyne signals S 3 and S 4 A and the respective phases ί 3 and i 4 A is similar to the description of the properties of the heterodyne signals S 1 and S 2 and the respective phases ii and i 2 of the first embodiment. The corresponding part is the same. and. The equations of the second embodiment which are equivalent to the equations (1) to (2 3) of the first embodiment are obtained from equations (1) to (2 3). Subscript 3 replaces all subscripts 1 and subscripts. 4 A replaces all subscripts 2. The corresponding equation is used to determine the gas occupancy and the dispersion of the gas in at least one of the reference paths, and to determine the contribution of the gas to the measurement and the relative path length of the reference path. This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). ^ -------- ^ --------- (Please read the precautions on the back before filling in this Page) -42- 477895 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ____B7_ V. Description of the invention (40) Residual heterodyne signals S 4 A and S 4 B and respective phases φ 4 a and ¢) 4 B Used to determine the cyclic errors in ^ 4 Α and ¢) 4 Β. One of the phases Φ 4 A and φ 4 B after the compensation of the cyclic error is used to determine the cyclic error in ρ 3. Signal 7 4 2 includes heterodyne signals s 4 A, S 4 B, and two other heterodyne signals. The heterodyne signals S 4A and S 4B have heterodyne frequencies equal to the frequencies f 4 A and f 4 B, respectively. The heterodyne frequencies of the other two heterodyne signals are | △ f | soil f4A and | Z \ f | soil f4B, where

及C爲真空中之光速。第二實施例之裝置及方法之作用爲丨4/1》ΙΛαΙ，丨/犯丨· (34) 在等式（3 4 )之條件作用中，另二外差信號雖可加以處理，以獲得額外資訊，但容易與外差信號S 4 Α及S 4 Β 分離，並在偵測器7 8 6及/或電子處理器7 2 7中由電子濾波消除。在偵測器7 8 6中所產生之外差信號S 4 A及s 4 B具有形態 == ^/(〇cos[a,·(/)] , ζ· = 4Α 及 4B · (35) 時間依賴之自變數a : ( t )由以下提供 a〆/1) = 27^〆+φ,.+ζ,. + Λ,. , / = 4Α 及 4Β ' (3 6) 其中，相位偏置Γ ι包含^ ι之所有貢獻，此等與量度徑路 ____-43-__ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1^-----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) (38) (39) 經濟部智慧財產局員工消費合作社印製 477895 A7 ___ B7___ 五、發明說明（41 ) 7 9 8或基準徑路之光徑路無關或關連，且與非線誤差無關或關連，及Λ ^包含非線性誤差，含有循環誤差影響。等式（3 5 )所示之S4A及s 4B之說明與等式（3 )所示之第一實施例之S 及s 2之對應說明相同。外差信號s 4 A及 s 4 b作爲電子信號7 2 4以數位或類比，宜爲數位格式發送至電子處理器7 2 7，以供處理。現參考圖2 b，電子處理器7 2 7包含電子處理器 7 2 7 4 C及7 2 7 4 D ’用以分別決定所量得之相位〜〜 P 4 A 及 φ 4 B ’ Φ,· =(Ρί+ζ,+ 八如：1) ， ί=4Α 及 4B ' (37) 使用由信號7 2 2Α及7 2 2 Β分別發送之驅動器 706Α及706Β之相位。電子處理器7277Β由 4 Β減¢) 4 A，以產生Φ Ψ，即 Φψ =(φ4Β -Φ4α) · 相位Φ ν ν可由其他量表示，如 Οψ —Ρ 左 4Α(”4βΖ4Β — ”4aZ4A)+/^"4B 丄 4Β(2πΑ/*Α〇 + (ζ4Β ~C4a) + [Ψ4β(Φ4β) " Ψ4α(Φ4α)] t 其中，非線性項7? 4 Α及7? 4 Β已略去，如有關第一實施例所提之說明。擾亂對量度徑路中之氣體折射率之影響在Φ Ψ Φ消除’ 由平移器7 6 7平移鏡7 9 2所產生之Doppler頻移之影響 -44- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝訂---- 477895 A7 B7 五、發明說明（42) 亦然。擾亂對量度徑路中之氣體折射率之影響在φ ψ中消除 ’因爲波長條件| — Λ4Β | <<λ4Α，且因爲光束 7 3 7之量度光束部份（用以產生外差信號s 4 Α及s 4 Β之部份）係獲自在量度徑路7 9 8中大致同等範圍中之量度光束之不同頻率部份之故。而且，可使L4A及L4B等於高精確度。循環非線性φ 4 A及φ 4 B可在高精確度上寫成 Ψ4Α = Σα4Α^· C0Sr(P4A sinr(P4A ， —f Si (4〇) Ψ4Β = 犯，C0Sr(P4B +Σ64Β>γ Sinr(P4B · r=l r=l 循環非線性Ψ 4 A及Ψ 4 B可由諧波¢) 4 A及¢) 4 B之餘弦及正弦級數項寫於等式（4 0 )中。在一些干涉計之構造中，尤其是多通過之干涉計，一系統可包含一光源，干涉計’及偵測器，以產生¢) 4 A及/或P 4 B之副諧波之循環非線性。如該系統中有副諧波循環誤差，則等式（4 〇 )經擴大’以包含餘弦及正弦級數項，具有自變數爲（P 4 A及/ 或P 4 B之副諧波。用以決定餘弦及正弦級數之係數之程序其後以等式（4 0 )所示之級數來說明，而不脫離本發明之精神及範圍。一系統可包含一光源，干涉計，偵測器，及數位信號處理，用以產生非（/) 4 A或P 4 B之諧波或副諧波之循環非線性。非副諧波，非諧波之循環誤差例如由數位信號處理中疏取產生，並具有¢) 4 A及¢) 4 B之諧波及副諧波之疏取者。如系統中有非副諧波，非諧波循環誤差存在，則等式（本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） c請先閲讀背面之注意事項再填寫本頁) 裝--------訂--------- 經濟部智慧財產局員工消費合作社印製 -45- 477895 A7 -----B7______ 五、發明說明（43 ) 4 0 )經擴大，以包含餘弦及正弦級數項，具有自變數爲 Φ 4 A及¢) 4 b之諧波及/或副諧波之適當疏取者。用以決定餘弦及正弦級數中之係數之程序以後以等式（4 0 )所提之級數表示說明’而不脫離本發明之精神及範圍。等式（4 CT)之循環非線性ψ 4 b之等式可改寫爲以下形態 Ψ4Β = Σα4Β/ cosr^^ +ρ^4Β(2πΔ//ο)Ι4Β] r=l ( 41) + Σ*4Β/ sinr^^ + ρη^{2πΑ//c)L^] 注意此極接近 (42) (請先閱讀背面之注意事項再填寫本頁)And C are the speed of light in a vacuum. The function of the device and method of the second embodiment is 丨 4/1》 ΙΛαΙ, 丨 / guidance. (34) In the conditional function of equation (3 4), the other two heterodyne signals can be processed to obtain Additional information, but easily separated from the heterodyne signals S 4 Α and S 4 Β and eliminated by electronic filtering in the detector 7 8 6 and / or the electronic processor 7 2 7. The heterodyne signals S 4 A and s 4 B generated in the detector 7 8 6 have a form == ^ / (〇cos [a, · (/)], ζ · = 4A and 4B · (35) time The dependent variable a: (t) is provided by a〆 / 1) = 27 ^ 〆 + φ,. + Ζ ,. + Λ ,., / = 4Α and 4Β '(3 6) where the phase offset Γ ι includes all contributions of ^ ι, which are related to measuring the path ____- 43 -__ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1 ^ --------- --Installation -------- Order --------- (Please read the notes on the back before filling out this page) (38) (39) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 ___ B7___ V. Description of the invention (41) 7 9 8 or the optical path of the reference path is unrelated or related, and it is not related or related to the non-linear error, and Λ ^ includes non-linear errors and cyclic error effects. The description of S4A and s 4B shown in Equation (3 5) is the same as the corresponding description of S and s 2 of the first embodiment shown in Equation (3). The heterodyne signals s 4 A and s 4 b are sent as electronic signals 7 2 4 to the electronic processor 7 2 7 in digital or analogue, preferably in digital format, for processing. Referring now to FIG. 2b, the electronic processor 7 2 7 includes electronic processors 7 2 7 4 C and 7 2 7 4 D 'to determine the measured phases, respectively ~ ~ P 4 A and φ 4 B' Φ, · = (Ρί + ζ, + Eight such as: 1), ί = 4Α and 4B '(37) Use the phases of the drivers 706A and 706B sent by the signals 7 2 2Α and 7 2 2 Β, respectively. The electronic processor 7277B subtracts 4 ¢ 4 A from 4 Β to generate Φ Ψ, that is Φψ = (φ4B-Φ4α) · The phase Φ ν ν can be expressed by other quantities, such as 〇ψ —Ρ Left 4Α (”4βZ4Β —” 4aZ4A) + / ^ " 4B 丄 4Β (2πΑ / * Α〇 + (ζ4Β ~ C4a) + [Ψ4β (Φ4β) " Ψ4α (Φ4α)] t where the non-linear terms 7? 4 Α and 7? 4 Β have been omitted As mentioned in the first embodiment. The effect of disturbance on the refractive index of the gas in the measurement path is eliminated in Φ Ψ Φ. The effect of the Doppler frequency shift generated by the translator 7 6 7 translation mirror 7 9 2- 44- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) Binding ---- 477895 A7 B7 V. Description of Invention (42) However, the effect of the disturbance on the refractive index of the gas in the measurement path is eliminated in φ ψ 'because of the wavelength condition | — Λ4B | < < λ4Α, and because the beam portion of the measuring beam 7 3 7 (to generate heterodyne) The parts of the signals s 4 A and s 4 B) are obtained from the different frequency parts of the measuring beams in the measuring path 7 98 in approximately the same range. Moreover, L4A and L4B can be made to have high accuracy. Cyclic nonlinearity φ 4 A and φ 4 B can be written with high accuracy as Ψ4Α = Σα4Α ^ · C0Sr (P4A sinr (P4A, —f Si (4〇) Ψ4B = Offense, C0Sr (P4B + Σ64B > γ Sinr (P4B · r = lr = l cyclic nonlinearity Ψ 4 A and Ψ 4 B can be harmonics ¢) 4 A and ¢) 4 The cosine and sine series terms of B are written in equals In formula (40), in the construction of some interferometers, especially the multipass interferometers, a system may include a light source, an interferometer 'and a detector to generate ¢) 4 A and / or P 4 B The cyclic nonlinearity of the subharmonic. If there is a subharmonic cyclic error in the system, the equation (40) is expanded to include the cosine and sine series terms, with independent variables of (P 4 A and / or The subharmonic of P 4 B. The procedure for determining the coefficients of the cosine and sine series is described below with the series shown in equation (40) without departing from the spirit and scope of the present invention. A system may Contains a light source, interferometer, detector, and digital signal processing to generate non-(/) 4 A or P 4 B harmonic or sub-harmonic cyclic nonlinearity. Non-sub-harmonic, non- The cyclic error of the wave is generated, for example, by extraction in digital signal processing, and has the ¢) 4 A and ¢) 4 B harmonic and subharmonic extraction. If there is non-subharmonic, non-harmonic circulation in the system If there is an error, then the equation (this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) c, please read the precautions on the back before filling this page)) -------- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-45- 477895 A7 ----- B7______ V. Invention Description (43) 4 0) Enlarged to include cosine and sine series terms Appropriate extractors of harmonics and / or subharmonics with independent variables of Φ 4 A and ¢) 4 b. The procedure for determining the coefficients in the cosine and sine series is described later using the series mentioned in equation (40) without departing from the spirit and scope of the present invention. The equation of the cyclic nonlinearity ψ 4 b of equation (4 CT) can be rewritten as the following form: Β4Β = Σα4Β / cosr ^^ + ρ ^ 4Β (2πΔ // ο) Ι4Β] r = l (41) + Σ * 4Β / sinr ^^ + ρη ^ {2πΑ // c) L ^] Note that this is very close to (42) (Please read the precautions on the back before filling this page)

Φ4Β = Φ4Α +^4b(27iA//C)^4E 等式（42)中已略去項（pk：4A (L4Bn4B — L 4 a η 4 a )，例如，在 Δί^δΟΟΜΙιζ ， L4b = 1 m，及氣體由在室溫及大氣壓力上之空氣構成之情形此項爲1 0 — 4弧度階層。等式（4 1 )中之各項可使用角恆等式展開，並依以下公式重行排列經濟部智慧財產局員工消費合作社印製Φ4B = Φ4Α + ^ 4b (27iA // C) ^ 4E The term has been omitted from equation (42) (pk: 4A (L4Bn4B — L 4 a η 4 a), for example, at Δί ^ δΟΟΜΙιζ, L4b = 1 m In the case where the gas is composed of air at room temperature and atmospheric pressure, this item is a 10 to 4 radian hierarchy. Each item in equation (4 1) can be developed using angular identity, and the Ministry of Economic Affairs can be rearranged according to the following formula Printed by the Intellectual Property Bureau Staff Consumer Cooperative

Ψ4Β =ZC〇Sr(P4A ΣδίηΓφ^ 74Β/· cosr[/?A74B(2KA//c)I4B] +64ΒϊΓ ΒΐηΓ[ρη^(2πΑ//c)L^b] sinr[p/74B(2KA/'/c)L4B] +δ4Β>Γ cosr[/?A74B(27iA//c)L4b] (43) 在次一步驟中，量度Φ Ψ，此隨P 4 A而定，且在一組 △f之値中（訂定於等式（33)中），Δί之不同値之所需數取決於Ψ 4 Β之複數及Ψ 4 Α之量度値所需之精確度< 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -46- 477895 A7 B7 五、發明說明（44 ) 自〔φψ— pn4BL4B(27TZ\;f / c)〕之量度値，產生該量之量得値 Ψ4β(Φ4Β>Δ/)~Ψ4β(Φ4Β>Δ/〇) (44) 經濟部智慧財產局員工消費合作社印製其中，△ f。爲△ f之初始値。等式（44)之循環誤差Ψ4Β (p4B . z\f ) 一 Ψ4Β ( φ 4B · △ f Q)使用等式（4 3 )以其他量重寫成 Ψ4β(Φ4Β，Δ/)-Ψ4β(Φ4Β»4/〇) [cosr[rj4B(2nAf /c)L^ ] - cosr[n^B (2πΔ/〇 /c)Z4B ]}' &4B/.{sinr[/;4B(2KA//c)L4B]-sinr[?7^(2nAf0/c)L^]} ^ '一 a4B，{sinr卜(2πΔ/Α)Ζ4Β] - 如，卜4“2^/0/咖犯]}、 ^Btr{c〇sr[r7^(2nAf /c)L^ cosr[n^(2nA/0/c)L^]} ^ (45) * 可由包含一列重複程序之一程序，決定Fourier係數 a4A，r ’ b4A，r ’ a4B，r ’ 及 t) 4 B，r。該程序之第 ~. 步爲自 Ψ4Β (<^4B，Z\f ) — Ψ4Β (φ4Β，/Xf。）之分析獲得 a4B，i: ’ b4B，r ’ 34Β，ι· ’ r 之第一^ 解。該分析包括 Ψ4Β (P4B，Δί ) — Ψ4Β (p4B，^fo )之Fourier分析，其中使用P 4 a作爲積分之變數，以產生等式（45)中隨△ f而定之c 〇 s r (/)“及 s i n r φ4Α之係數値。等式（45)中之c 〇 s r φ4Α 及 s i n r $4Α 之係數値產生 a4B，r，t>4B，r，r$l 之一組同時等式，並解出a4B，r，b4B，r，r$l之第一解之該組同時等式。a4B，r，b4B，r，r^l之第一解可決定之絕對精確度具有以弧度表示之循環誤差項 +^sinr94A r=l 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注音？事項再填寫本頁) ··裝 -47- 經濟部智慧財產局員工消費合作社印製 477895 A7 _ B7 五、發明說明（45) I Ψ4α | /2及以弧度表不之循環Ik差項| Ψ4Β |之乘積之幅階之幅度。循環誤差項| Ψ 4 A I及| ψ 4 B I之聯合影響進入作爲Ψ 4 B可決定之絕對精確度中之第二階影響。程序之弟—·步驟在產生a4A，i* ’ b4A，r，Γ^Ι之第一重複解。第二步驟包含根據a 4 Β，r，b 4 Β μ，r $ 1 之第一解，〔Φψ— pn4BL4B(27rz\f/c)〕減 Ψ4Β之重複Fourier分析，其中，根據a 4b, r， b 4 b，/，r S 1之第一解，經對Ψ 4 b改正之p 4 B用作重複Fourier分析中之積分之變數。 a 4 A，r及b 4 A , r之重複解之第一解可決定之絕對精確度具有以弧度表示之循環誤差項| ψ4Α I及以弧度表示之循環誤差項Ψ 4 Β由a 4 Β，r，b 4 Β，r，r ^之第一解決定之絕對精確度之乘積之幅階之一幅度。循環誤差項 | Ψ 4 A I及I Ψ 4 B |之聯合影響進入作爲I Ψ 4 A I可決定之絕對精確度中之第三階影響，以弧度表示之I ψ 4 A I 之幅度中之第二階，及以弧度表示之I Ψ4Β I之幅度中之第一階。程序之第三步驟爲自Ψ4Β (P4B，Δί ) - Ψ4Β ( Ρ4Β，△ f Q )之分析獲得 34Β，ιγ 及 b4B，r ’ IT — 1 之第二解。第三步驟與第一步驟相同，唯第一步驟之Fourier 分析中所用之積分之變數在第三步驟中由經根據Ψ 4 a之第一重複解對Ψ 4 A改正之P 4 A取代。a 4 B，r及b 4 B7，r s 1之第二解可決定之絕對精確度具有以弧度表示之循環誤差項I ψ 4 B I及以弧度表示之循環誤差項I Ψ 4 A I由 _____-48-___ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L I--·-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7 五、發明說明（46) a 4 A q及b 4 A，r，r S 1之第一重複解決定之絕對精確度之乘積之幅階之一幅度。循環誤差項I ψ 4 A I及I ψ 4 B |之聯合影響進入作爲Ψ 4 A可決定之絕對精確度中之第四階影響，以弧度表示之| Ψ 4 A |之幅度中之第二階，及以弧度表示之I Ψ 4 B |之幅度中之第二階。Ψ4Β = ZC〇Sr (P4A ΣδίηΓφ ^ 74Β / · cosr [/? A74B (2KA // c) I4B] + 64ΒϊΓ ΒΐηΓ [ρη ^ (2πΑ // c) L ^ b] sinr [p / 74B (2KA / ' / c) L4B] + δ4B > Γ cosr [/? A74B (27iA // c) L4b] (43) In the next step, measure Φ Ψ, which depends on P 4 A, and is in a group of △ f値 In (determined in equation (33)), the required number of different Δ depends on the complex number of Ψ 4 Β and the measure of Ψ 4 Α 値 The accuracy required for this paper standard applies to Chinese national standards (CNS) A4 specification (210 X 297 mm) -46- 477895 A7 B7 V. Description of the invention (44) Measured from [φψ— pn4BL4B (27TZ \; f / c)], the quantity that produces this quantity is obtained. Β4β (Φ4B > Δ /) ~ Ψ4β (Φ4B > Δ / 〇) (44) It is printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, where △ f. Is the initial value of △ f. The circular error of equation (44) (p4B. z \ f) Ψ4B (φ 4B · △ f Q) is rewritten as Ψ4β (Φ4B, Δ /)-Ψ4β (Φ4B »4 / 〇) using equation (4 3) in other quantities [cosr [rj4B ( 2nAf / c) L ^]-cosr [n ^ B (2πΔ / 〇 / c) Z4B]} '& 4B /. {Sinr [/; 4B (2KA // c) L4B] -sinr [? 7 ^ ( 2nAf0 / c) L ^]} ^ '一 a4B , {Sinr 卜 (2πΔ / Α) Z4Β]-For example, Bu 4 "2 ^ / 0 / coffee criminal"}, ^ Btr {c〇sr [r7 ^ (2nAf / c) L ^ cosr [n ^ (2nA / 0 / c) L ^]} ^ (45) * The Fourier coefficients a4A, r 'b4A, r' a4B, r ', and t) 4 B, r can be determined by one of a series of repeated procedures. ~~ The step is the analysis of Ψ4B (< ^ 4B, Z \ f)-Ψ4B (φ4B, / Xf.) To obtain the first solution of a4B, i: 'b4B, r' 34B, ι '' r. This analysis Include a Fourier analysis of Ψ4Β (P4B, Δί)-Ψ4Β (p4B, ^ fo), where P4a is used as a variable of integration to produce c 〇sr (/) in equation (45) as a function of △ f "and The coefficient 値 of sinr φ4Α. The coefficients of c 0sr φ4Α and sinr $ 4Α in equation (45) produce a group of a4B, r, t > 4B, r, r $ l simultaneously, and solve a4B, r, b4B, r, The first solution of r $ l is the set of simultaneous equations. The absolute accuracy that can be determined by the first solution of a4B, r, b4B, r, r ^ l has a cyclic error term expressed in radians + ^ sinr94A r = l This paper standard applies to China National Standard (CNS) A4 specification (210 X 297 mm) (Please read the phonetic on the back? Matters before filling out this page) ·· 装 -47- Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 _ B7 V. Description of the invention (45) I Ψ4α | / 2 And the magnitude of the product of the cyclic Ik difference term | Ψ4B | expressed in radians. The combined effect of the cyclic error terms | Ψ 4 A I and | ψ 4 B I enters the second-order effect in the absolute accuracy that Ψ 4 B can determine. Brother of the program-The step is to generate the first repeated solution of a4A, i * 'b4A, r, Γ ^ I. The second step includes the repeated Fourier analysis of [Φψ — pn4BL4B (27rz \ f / c)] minus Β4Β according to the first solution of a 4 Β, r, b 4 Β μ, r $ 1, where, according to a 4b, r The first solution of, b 4 b, /, r S 1, p 4 B corrected for Ψ 4 b is used as the variable of the integral in the repeated Fourier analysis. The absolute accuracy that can be determined by the first solution of the repeated solutions of a 4 A, r and b 4 A, r has a cyclic error term expressed in radians | ψ4Α I and a cyclic error term expressed in radians Ψ 4 Β by a 4 Β , R, b 4 Β, r, r ^ is one of the magnitudes of the product of the absolute accuracy of the first solution. The combined effect of the cyclic error term | Ψ 4 AI and I 联合 4 B | enters the third order of the absolute accuracy that I Ψ 4 AI can determine, and the second order of the magnitude of I ψ 4 AI expressed in radians , And the first order of the magnitude of I Ψ 4B I in radians. The third step of the procedure is to obtain the second solution of 34B, ιγ and b4B, r ′ IT — 1 from the analysis of Ψ4Β (P4B, Δί)-Ψ4Β (P4B, Δf Q). The third step is the same as the first step, except that the integral variable used in the Fourier analysis of the first step is replaced in the third step by P 4 A corrected for Ψ 4 A according to the first repeated solution of Ψ 4 a. The absolute accuracy that can be determined by the second solution of a 4 B, r and b 4 B7, rs 1 has a cyclic error term I ψ 4 BI expressed in radians and a cyclic error term I Ψ 4 AI expressed in radians by _____- 48 -___ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) L I --------------------------------- --- (Please read the notes on the back before filling out this page) 477895 A7 B7 V. Description of the invention (46) The first repeated solution of a 4 A q and b 4 A, r, r S 1 One of the magnitudes of the product. The combined effect of the cyclic error terms I ψ 4 AI and I ψ 4 B | enters the fourth order of the absolute precision that can be determined by Ψ 4 A, and the second order of the magnitude of | Ψ 4 A | expressed in radians , And the second order in the magnitude of I Ψ 4 B | expressed in radians.

程序之第四步驟爲獲得a4A，r及b4A,r，r^l之第二重複解。第四步驟包含根據a 4 B , r及b 4 B , r，r S 1 之第二解’ 〔φψ - pn4BL4B(2/TZ\f/c)〕減 Ψ 4 B之重複Fourier分析，其中，根據a 4 B，r及 b 4 b，r，r S 1之第二解，經對ψ 4 B改正之:4 B用作重複Founei:分析中之積分之變數。第四步驟與第二步驟相同，唯各別Fourier分析中所用之積分之變數不同。a 4A,r 及b 4 a，r，r - 1之第二重複解可決定之絕對精確度可具有以弧度表不之循環誤差項| Ψ 4 A |及以弧度表示之環誤差項| Ψ4Β |由a4A，r及b4A，r，r^l之第二解決定之絕對精確度之乘積之幅階之一幅度。循環誤差項I Ψ 4 A 丨及| Ψ 4 B |之聯合影響進入作爲ψ 4 A可決定之絕對精確度中之第五階影響，以弧度表示I Ψ 4 A I之幅度中之第三階，及以弧度表示之I Ψ 4 B |之幅度中之第二階。繼續所述之重複程序之順序中之重複處理，直至決定 Fourier 係婁夂 a 4Α，ι· ’ b 4 a . r，a 4 b - r ，及 b4B，r，r 2 1至最終應用所需之精確度爲止。重複處理之重複程序應涵蓋若干循環，直至I Ψ4Α I =1/3及I Ψ4Β I乏 1 / 3之所需精確度爲止。 _ -49- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝--------訂----- 拳· 經濟部智慧財產局員工消費合作社印製 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（47) 第二實施例之其餘說明與第一實施例及其改變所提之說明之對應部份相同。第二實施例之優點與第七實施例所列者相同，具有以下另外優點。在第二實施例，距離量度功能及用以補償量度徑路中之氣體’包括氣體中擾亂影響之色散基礎之系統可由一固疋波長λ 3及λ 4A執行，與根據可變波長λ 4B及固定波長之一 λ 3或λ 4 Α之循環誤差補償程序同時且相互獨立。第一及第二實施例及其改變使用三不同之程序，用於量度’監視’減少，及/或補償部份或全部所量得之外差信號相位中所存在之循環誤差之影響。對循環誤差影響之其他形式之部份或全部量度，監視，減少及/或補償可依最終應用所需要，加進本發明之裝置中，如在積體電路製版中工作階段時普通所遭遇者，而不脫離本發明之精神及範圍。其他方式包括G.Wilkening及W.HOU之美專利 5，3 3 1，4 0 0號中所述，題爲”外差干涉計安排” ，1994 年 6 月 19 日發出；S.R.Paterson，V.G.Bagdami，及C.A.Zan〇ni之同待核定，同擁有之美專利申請書序號 ◦ 9/168，200，題爲”具有減少循環誤差之干涉計系統”，於1 9 9 8年1 0月6日提出；及Η.Α.ΗΠΙ之同待核定，同擁有之美專利申請書序號（Fish及Richardson 律師案號09712/005001)，題爲”距離量度及色散干涉計中之特性循環誤差之系統及方法” ’於 1 9 9 9年3月1 6日提出。二同待核定之申請書之內容 _____- ___ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L-----------裝--------訂----- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7__ 五、發明說明（48 ) 整個列作參考。注意第一及第二實施例及其改變之說明在圖1 a及 2 a所示之干涉計構造在本藝中稱爲極化Micheison干涉計。其他形態之Miches son干涉計及其他干涉計形態，諸如高穩定性平面鏡干涉計，或微分平面鏡干涉計，或角度補償干涉計，或類似裝置，諸如題爲”距離及角度量度用之微分干涉計安排：原理，優點，及應用”一文中所述者， 0.冗&11〇11丨所作，¥0 1報告書7 49號（1 9 8 9 )，當工作於積體電路之製版中通常遇到之工作階段時，可加此於本發明之裝置中，而不脫離本發明之精神及範圍。圖3 a - 3 f以槪要之形態顯示本發明之第三較宜實施例。第三實施例包含裝置及方法，用以量度量度徑路及基準徑路之相對物理徑路長度。干涉計之多光通過系統構造用以減少色散有關信號之中Doppler頻移影響。量度並補償線性位移干涉計之量度徑路及基準徑路之至少之一中之氣體之影響。而且，量度及補償用以決定量度及基準徑路之相對物理徑路長度之所量得之相位，及用以改正量度及基準徑路之至少之一中相對光徑路長度之氣體影響之所屬色散有關之信號二者。量度及基準徑路之氣體折射率及相對物理長度任一或二者可改變。如顯示於圖3 a，第三實施例之干涉計系統包含一光源系統1 0 0，干涉計6 9及干涉計群7 0，偵測器8 5 ，86，及286，波長監視器50及84，一 Γ監視器 52，一電子處理器1〇9，及一電腦及控制器1 1〇。本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -51 - .^--------^--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 --- B7 五、發明說明（49) 干涉計6 9及包含干涉計群7 0之干涉計之構造在本藝中稱爲微分平面鏡干涉計。第三實施例之光源系統產生光束9及1 〇。圖3 a所不之先源系統1 0 0之g午多兀件執行與圖]_ a所示之第一* 實施例之光源系統5 0 0之相同元件所執行相同之功能。除非另有指示，否則，執行與第一實施例之光源系統 5 0 0之元件相同功能之光源系統1 〇〇之元件之號數等於圖1 a所示之第一實施例之元件之號數相同，另加 5 0 0。光源1及2之說明分別與第一實施例之光源 5 0 1及5 0 2所提之說明之對應部份相同。光源1 A之說明與第一實施例之光源1之說明之對應部份相同，唯光源1 A之波長並非固定。光源1，1 A，及2分別產生具有波長λ5，λ5Α，及λ6之光束7，7A，及8。光束7 ，7 A，及8在圖3 a之平面中極化。波長之比率（λ 5 / λ 6 )具有已知之接近比率値I 5 / I 6，即 = {hlh) t (46) 其中，I 5及I 6包含低階非零整數値，或具有低幅階之至少一非整數非零値。來自光源1 A之光束之波長λ 5A由來自電腦及控制器 1 1 0之誤差信號控制。在第三施例中’ （λ 5 一 λ 5 Α )The fourth step of the procedure is to obtain the second repeated solution of a4A, r and b4A, r, r ^ l. The fourth step includes a repeated Fourier analysis of subtracting 4 B from the second solution of a 4 B, r and b 4 B, r, r S 1 '[φψ-pn4BL4B (2 / TZ \ f / c)], where: According to the second solution of a 4 B, r and b 4 b, r, r S 1, which is corrected for ψ 4 B: 4 B is used to repeat the variable in the Founei: integral in the analysis. The fourth step is the same as the second step, except that the variables of the integrals used in the Fourier analysis are different. The absolute accuracy that can be determined by the second repeated solution of a 4A, r and b 4 a, r, r-1 can have a cyclic error term expressed in radians | Ψ 4 A | and a loop error term expressed in radians | Ψ4Β | One of the magnitudes of the product of the absolute accuracy determined by the second solution of a4A, r and b4A, r, r ^ l. The combined effect of the cyclic error terms I Ψ 4 A 丨 and | Ψ 4 B | enters the fifth order of the absolute accuracy that can be determined by ψ 4 A, and the third order of the magnitude of I Ψ 4 AI is expressed in radians, And the second order of the magnitude of I Ψ 4 B | expressed in radians. Continue the repetitive process in the sequence of the iterative procedures described above, until it is determined that Fourier is Lou 4a, ι · 'b 4a. R, a 4 b-r, and b4B, r, r 2 1 to the final application. Up to the accuracy. Iterative procedures for iterative processing should cover several cycles until I Ψ4Α I = 1/3 and I Ψ4Β I lack the required accuracy of 1/3. _ -49- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) -Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed A7 B7 V. Description of the invention (47) The rest of the description of the second embodiment and the first embodiment and its changes The corresponding parts of the description are the same. The advantages of the second embodiment are the same as those listed in the seventh embodiment, and have the following additional advantages. In the second embodiment, the distance measurement function and the system for compensating for the measurement of the gas in the path, including the dispersion basis of the disturbance in the gas, can be performed by a fixed wavelength λ 3 and λ 4A, and according to the variable wavelength λ 4B and The cyclic error compensation procedures of one of the fixed wavelengths λ 3 or λ 4 Α are simultaneously and independent of each other. The first and second embodiments and their modifications use three different procedures for measuring the 'monitoring' reduction, and / or compensating for the effects of cyclic errors in some or all of the measured heterodyne signal phases. Some or all of the other forms of measurement of the impact on cyclic errors, monitoring, reduction and / or compensation can be added to the device of the present invention as required for the final application, such as those normally encountered during the working phase of integrated circuit making Without departing from the spirit and scope of the invention. Other methods include G. Wilkening and W. HOU US Patent No. 5,333,400, entitled "heterodyne interferometer arrangement", issued on June 19, 1994; SRPaterson, VGBagdami, And CAZanOni are subject to approval and have the same US patent application serial number 9 / 168,200, entitled "Interferometer System with Reducing Cyclic Error", filed on October 6, 1998; And Η.Α.ΗΠΙ are pending approval, and have the same US patent application serial number (lawyer Fish and Richardson case number 09712/005001), entitled "System and method of distance measurement and characteristic cyclic error in dispersion interferometer" Proposed on March 16, 1999. The contents of the same application to be approved _____- ___ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) L ----------- pack ----- --- Order ----- (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7__ V. Description of Invention (48) The entire list is for reference. Note that the explanation of the first and second embodiments and their changes. The interferometer structure shown in Figs. 1a and 2a is referred to as a polarized Michelison interferometer in the art. Other forms of Miches son interferometers and other interferometer forms, such as high-stability plane mirror interferometers, or differential plane mirror interferometers, or angle-compensated interferometers, or similar devices, such as differential interferometers entitled "Distance and angle measurement Arrangement: Principles, advantages, and applications ", 0. Redundant & 11〇11 丨, ¥ 0 1 Report No. 7 49 (1 9 8 9), when working in the plate making of integrated circuits When the working phase is usually encountered, it can be added to the device of the present invention without departing from the spirit and scope of the present invention. Figures 3a-3f show the third preferred embodiment of the present invention in summary form. The third embodiment includes a device and a method for measuring the relative physical path lengths of a path and a reference path. Much of the interferometer light is passed through the system to reduce the effect of Doppler frequency shift in the dispersion-related signals. The influence of gas in at least one of the measurement path and the reference path of the linear displacement interferometer is measured and compensated. Moreover, the measurement and compensation are used to determine the phase of the measurement and the relative physical path length of the reference path, and the affiliation of the gas effect to correct the optical path length of at least one of the measurement and the reference path. Both dispersion related signals. Either or both the refractive index of the gas and the relative physical length of the measurement and reference path can be changed. As shown in FIG. 3a, the interferometer system of the third embodiment includes a light source system 100, an interferometer 69, and an interferometer group 70, a detector 85, 86, and 286, a wavelength monitor 50, and 84, a Γ monitor 52, an electronic processor 109, and a computer and controller 110. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -51-. ^ -------- ^ --------- (Please read the precautions on the back first (Fill in this page again) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 --- B7 V. Description of the invention (49) Interferometer 6 9 and the structure of the interferometer including the interferometer group 70 are called in this art Differential plane mirror interferometer. The light source system of the third embodiment generates light beams 9 and 10. Fig. 3a shows the implementation of the first source system 100, and the same components perform the same functions as the light source system 500 of the first * embodiment shown in Fig._a. Unless otherwise indicated, the number of components of the light source system 1000 that performs the same function as the components of the light source system 500 of the first embodiment is equal to the number of components of the first embodiment shown in FIG. 1 a Same, plus 5 0 0. The descriptions of the light sources 1 and 2 are the same as the corresponding parts of the descriptions of the light sources 501 and 502 of the first embodiment, respectively. The description of the light source 1 A is the same as the corresponding part of the description of the light source 1 of the first embodiment, except that the wavelength of the light source 1 A is not fixed. The light sources 1, 1 A, and 2 generate light beams 7, 7A, and 8 having wavelengths? 5,? 5A, and? 6, respectively. The light beams 7, 7 A, and 8 are polarized in the plane of Fig. 3a. The ratio of the wavelengths (λ 5 / λ 6) has a known approach ratio 値 I 5 / I 6, which is = {hlh) t (46) where I 5 and I 6 contain low-order non-zero integers 値, or have low amplitudes. At least one non-integer non-zero unit of order. The wavelength λ 5A of the light beam from the light source 1 A is controlled by the error signal from the computer and the controller 110. In the third embodiment '(λ 5-λ 5 Α)

> 0及I λ 5 - λ 5 A I << λ 5，俾以簡單之方式例解本發明。第三實施構造可工作於（λ 5 - λ 5 A )之負値及/或I -52 -一___ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L ·-------·裝--------訂--------- 華 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 ___B7__ 五、發明說明（50 ) λ 5 — λ 5 A | << λ 5上，而不脫離本發明之精神及範圍。在不適用| Α5 — λ5Α丨<<λ5之第三實施例之裝置構造中，可能需對第三實施例所述之非極化光束分裂器作一些改變爲二色光束分裂器，以提高光源系統及干涉計系統之整個效率。如顯示於圖3 a ，光束7之一第一部份由非極化光束分裂器5 1 A反射，及其一部份由非極化光束分裂器 5 1 B反射，以形成光束4 0之一第一部份。在次一步驟，光束7A之一第一部份由非極化光束分裂器51C反射，由鏡5 1 D反射，及其一部份由非極化光束分裂器 5 1 B透射，以形成光束4 0之一第二部份。光束4 0撞擊於構造用以監視比率（λ 5 / λ 5 A )之波長監視器8 4 上。比率（λ 5 / λ 5 A )之量度値發送至電腦及控制器 1 1 0，作爲電子信號2 0。波長監視器8 4可包含例如光偵測器，用以由混合光束4 0產生電干涉信號，具有或無量度腳中之真空及/或非線性元件，諸如/3 — B a B〇3 之干涉計，俾由第二諧波之產生S H G加倍該光束之頻率〇電腦及控制器1 1 0產生有關所量得之波長比率（λ 5 / λ 5 A )之値，由信號2 0所發送之比率，及由電腦及控制器1 1 0所指定之比率間之差之誤差信號4 4。光源 1 A之波長由誤差信號4 4控制。誤差信號4 4可由壓電轉換器控制雷射空腔之長度，控制例如雷射之波長，或由控制注入二極體雷射中之電流，控制二極體雷射之波長。 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ------------裝--------訂--------- ^•1 (請先閱讀背面之注咅？事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7 五、發明說明（51) 繼續圖3 a ，離開調變器3之光束之一第一部份由非極化光束分裂器5 3 A透射，及其一部份經透射成爲光束 9之λ 5部份。離開調變器3之光束之一第二部份由非極化光束分裂器5 3 Α反射，由鏡5 3 Β及5 3 C反射，及其一部份由非極化光束分裂器5 3 D反射，成爲光束9 G。入射於非極化光束分裂器5 3 D上之光束一第二部份由鏡 5 3 E透射及然後反射，成爲光束9W。光束9 G及9W 具有波長λ 5。離開調變器3 A之光束由鏡5 3 F，5 3 G ，及5 3H反射，及其一部份由非極化光束分裂器5 3 I 反射，成爲光束9之λ 5A部份。如顯示於圖3 a，離開調變器4之光束之第一部份由非極化光束分裂器5 4 C透射，成爲光束1 0。離開調變器4之光束之一第二部份由非極化光束分裂器5 4 C反射，且其一部份由非極化光束分裂器5 4 D反射，成爲光束 1 0 G。入射於非極化光束分裂器5 4 D上之光束之一第二部份由非極化光束分裂器5 4 D透射，及然後由鏡 5 4E反射，成爲光束1 0W。光束1 0G及1 〇W具有波長λ 6。在次一步驟，光束1 0之一第一部份由非極化光束分裂器5 4Α反射，成爲光束2 1 2。光束1 0之一第二部份由非極化光束分裂器5 4 Α透射，且其一部份由非極化光束分裂器54B反射，成爲光束12。光束9入射於微分平面鏡干涉計6 9上，及光束1 2及2 1 2入射於微分平面鏡干涉計群7 0上，此包含二微分平面鏡干涉計。具 ________-54___ 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐） I-----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7_______ 五、發明說明（52) 有光束分裂器6 5及由外部鏡系統9 0所提供之外部鏡之微分平面鏡干涉計6 9及微分平面鏡干涉計群7 0含有裝置，用以引進相位轉移P 5於具有波長λ 5之光束9之X及 y部份之間，一相位轉移¢) 5 Α於具有波長λ 5 Α之光束9之 X及y部份之間，一相位轉移P 6於光束1 2之X及y部份之間，及一相位轉移P 7於具有波長λ 6之光束2 1 2之X 及y部份之間。一微分平面鏡干涉計量度二外部平面鏡間之光徑路改變。而且，此對干涉計光束分裂室及所屬光部份中可能發生之熱及機械擾亂不敏感。如顯示於圖3 b，微分平面鏡干涉計69具有8離開/轉回光束17，25，33， 41，117，125，133，及 141。光束 17， 2 5，3 3，及4 1由光束9之一極化部份，第一極化部份產生，包含基準腳用之光束。由光束9之第二極化部份產生之光束117，125，133，及141包含量度腳用之光束。光束9之第一極化部份爲唯一祖先之各光束在圖3 b中由短劃線表示，及光束9之第二極化部份爲唯一祖先之各光束在圖3 b中由點線表不。微分平面鏡干涉計群7 0之一微分平面鏡干涉計具有四離開/轉回光束18，26，118，及126。由光束1 2之一極化部份，第一極化部份所產生之光束1 8及 2 6包含基準腳用之光束，由光束1 2之第二極化部份產生之光束1 1 8及12 6包含量度腳用之光束。光束1 2 之第一極化部份爲唯一祖先之光束在圖3 c中由短劃線表 -55- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -----*-------裝 *-------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7 _ 五、發明說明（53) 不’及光束1 2之第二極化部份爲唯一祖先之光束在圖 3 c中由點線表示。微分平面鏡干涉計群了〇之一第二微分平面鏡干涉計具有四離開/轉回光束2 1 8，2 2 6， 3 1 8，及3 2 6。由光束2 1 2之一極化部份，第一極化部份產生之光束2 1 8及2 2 6包含基準腳用之光束，由光束2 1 2之第二極化部份產生之光束3 1 8及3 2 6 包含量度腳用之光束。光束2 1 2之第一極化部份爲唯一祖先之光束在圖3 c中由交替之點及短劃線所構成之線表示，及光束2 1 2之第二極化部份爲唯一祖先之光束在圖 3 c中由交替之成對點及短劃線所構成之線表示。光束 17，25，33，41，117，125， 133，及141入射於極化光束分裂器65上，並由二色光束分裂介面6 6透射，分別成爲光束E 1 7，E 2 5 ，E33，E41，E117，E125，E133，及 E141。光束 E17，E25，E33，E41， E117，E125，E133，及 E141 入射於圖 3 d所示之外部鏡系統9 Ο，此產生光束4 3及1 4 3。光束1 4 3包含有關通過外部鏡系統9 0之量度徑路中之氣體之光徑路長度之在波長λ 5及λ 5Α上之資訊，及光束 4 3包含有關通過基準徑路之光徑路長度之在長λ 5及 λ5Α上之資訊。同樣，光束18，26，118，126 ，218，226，318，及326入射於極化光束分裂器6 5上，並由二色光束分裂介面6 6透射，分別成爲光束Ε18，Ε26，Ε118，Ε126，Ε218, 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） - L-------------------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（54) E226，E318，及 E326。光束 E18，E26 ，E118，E126，E218，E226，E318 ，及E 3 2 6入射於圖3 e所示之外部鏡系統9 0上，此分別產生光束28，128，228，及328。光束 1 2 8及3 2 8包含有關通過外部鏡系統9 0之各別量度徑路中之氣體之光徑路長度之在波長λ 6上之資訊，及光束 2 8及1 2 8包含有關通過基準徑路之光徑路長度之在長 λ 6上之資訊。 · 光束4 3由鏡6 3 Β反射，及其一部份由非極化光束分裂器6 3Α反射，成爲光束4 5之一部份。光束1 4 3 之一部份由極化光束分裂器6 3 Α透射，成爲光束4 5之一第二部份。光束4 5爲混合光束，光束4 5之第一及第二部份具有相同之線性極化。光束4 5離開微分平面鏡千涉計6 9。光束2 8由鏡5 8 B反射，及其一部份由非極化光束分裂器5 8 A反射，成爲光束3 0之第一部份。光束 1 2 8之一部份由光束分裂器5 8A透射，成爲光束3 0 之一第二部份。光束3 0爲混合光束，光束3 0之第一及第二部份具有相同之線性極化。光束2 2 8由鏡5 8 D反射，及其一部份由非極化光束分裂器5 8 C反射，成爲光束2 3 0之第一部份。光束 3 2 8之一部份由極化光束分裂器5 8 C透射，成爲光束 2 3 0之一第二部份。光束2 3 0爲混合光束，光束 2 3 0之第一及第二部份具有相同之線性極化。光束3〇 -57 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1·-----------裝--------訂---------. (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7 五、發明說明（55) 及2 3 0離開微分平面鏡干涉計群7〇。 (請先閱讀背面之注音？事項再填寫本頁) 相位轉移P 5 ’ p 5 A ’ φ 6，及P 7之幅度與量度徑路 9 8及基準徑路之徑路i之來回物理長度間之差l i有關，圖3 a — 3 e顯示在p i = 2 p 2之情形，依據公式 %(，)= Σφ5Α)= Σα.⑹, /=1 Φ5λ(0= ZVsa,(〇= ΣΑ(0^5Λ, /=1 /=1 ,、3 i^P2 (47) Φ6(’) = Σ%〆’,·) = Σ Α⑹众6%·, ，.=1 . /=1 Φ7(0= ΣΦ7火·)= ΣΑ⑷々7 /=/>2+1 /=/¾+1 經濟部智慧財產局員工消費合作社印製其中，nm，，爲量度徑路9 8之徑路i中之氣體之折射率，相當於波號數= (2ττ) / Ai。Li之正常値等於外部鏡系統9 0中之鏡表面9 5及9 6之空間距離之二倍（閱圖3 d及3 e )。對精於本藝之入士，演繹至p i #2 P2之情形爲直截之程序。在圖3 b — 3 e中，微分平面鏡干涉計6 9及微分平面鏡干涉計群7 0之微分平面鏡干涉計構造分別使P i = 4及p 2 = 2，俾以最簡單之方式例解有關使用多通過構造來減少有關色散信號中之Doppler 相移影響之本發明之第一較宜實施例之裝置之功能。等式（4 7 )在波長λ 5之聯合徑路及波長λ 6之聯合徑路大致在同等範圍之情形有效。對精於本藝之人士’演繹至二不同波長之各別聯合徑路並非大致在同等範圍之情形爲直截之程序。光束自外部鏡系統9 0之鏡9 2之第一反射移行至各 ___ . - _ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 _ 五、發明說明（56) 別重度及基準光束混合處之平均時間延遲對較短波長λ 6之光束及較長波長；15或λ5Α之光束一般並不相同。該時間延遲差由具有較短波長之光束多次通過之次數與具有較長波長之光束之多次通過之次數不同所引起。較短及較長波長之光束之平均時間延遲之不同之影響在等式（4 7 )中略去，俾第三實施例之說明不致過度複雜。在不同之各別相位上較短及較長波長之光束在平均時間延遲上之不同之影響爲較高階之影響，該影響與外部鏡系統9 0之鏡9 2之速度，接近L ,之瞬時平均値，及各別外差頻率成比例。在鏡9 2之移動速度爲2m/s ，Li之瞬時平均値爲2 m，及外差頻率爲2 Ο Μ Η z之情形，各別相位差約爲1弧度，及該差之變化率約爲1弧度/秒。此相位差之改變發生於低頻率上，普通低於或在1 Ο Η ζ 之階層。精於本藝之人士明瞭，此相位差，較短及較長波長之光束之平均時間延遲之差之影響可在其後之信號處理中，由鏡9 2之速度及L i之接近瞬時平均値之知識加以模造及補償至由最終應用施加於輸出資料上之所需精確度。在次一步驟中，如顯示於圖3 a，光束4 5撞擊於偵測器8 5上，導致產生帔差信號s 5及S 5 A及二其他外差信號，及光束3 0及2 3 0撞擊於光偵測器8 6及2 8 6 上，導致產生二干涉信號，外差信號s 6及s 7，宜由光電偵測產生。丨§號$ 5及S 5A分別相呈於波長λδ及λδΑ，及信號S 6及S 7相當於波長λ 6 .。外差信號S 5及S 5 Α具有外差頻率分別等於頻率f 5及 ______ 5Q -____ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I----*-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 Β7 五、發明說明（57) f 5 A。另二外差信號之外差頻率爲| △ I Δ f | ± f 5 A，其中土及> 0 and I λ 5-λ 5 A I < < λ 5, which illustrates the present invention in a simple manner. The third implementation structure can work at (λ 5-λ 5 A) minus 値 and / or I -52-一 ___ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) L ·- ------ · Equipment -------- Order --------- Hua (Please read the precautions on the back before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 ___B7__ 5. Description of the invention (50) λ 5 — λ 5 A | < < λ 5 without departing from the spirit and scope of the present invention. In the not applicable | Α5 — λ5Α 丨 < < λ5 third embodiment of the device structure, some changes may be required to the non-polarized beam splitter described in the third embodiment to a two-color beam splitter to Improve the overall efficiency of the light source system and the interferometer system. As shown in Figure 3a, a first part of the light beam 7 is reflected by the non-polarized beam splitter 5 1 A, and a part of it is reflected by the non-polarized beam splitter 5 1 B to form the beam 40 A first part. In the next step, a first part of the beam 7A is reflected by the non-polarized beam splitter 51C, and is reflected by the mirror 5 1 D, and a part thereof is transmitted by the non-polarized beam splitter 5 1 B to form a beam. One of the second part of 40. The light beam 40 hits a wavelength monitor 8 4 configured to monitor the ratio (λ 5 / λ 5 A). The measurement of the ratio (λ 5 / λ 5 A) is sent to the computer and controller 1 1 0 as an electronic signal 2 0. The wavelength monitor 84 may include, for example, a light detector to generate an electrical interference signal from the mixed beam 40, with or without measuring the vacuum and / or non-linear elements in the foot, such as / 3 — B a B0 3 Interferometer, the frequency of the beam is doubled by the SHG generated by the second harmonic. The computer and the controller 1 1 0 generate the 有关 of the measured wavelength ratio (λ 5 / λ 5 A), which is sent by the signal 20 The error signal 4 4 of the ratio and the difference between the ratio specified by the computer and the controller 110. The wavelength of the light source 1 A is controlled by the error signal 4 4. The error signal 44 can be controlled by a piezoelectric converter to control the length of the laser cavity, such as the wavelength of the laser, or the current injected into the diode laser to control the wavelength of the diode laser. -This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ------------ installed -------- order -------- -^ • 1 (Please read the note on the back? Matters before filling out this page) Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs 477895 A7 B7 V. Description of the invention (51) Continue to Figure 3a and leave the modulator 3 A first part of the light beam is transmitted by the non-polarized beam splitter 5 3 A, and a part thereof is transmitted to become a λ 5 part of the light beam 9. One of the second part of the light beam leaving the modulator 3 is reflected by the non-polarized beam splitter 5 3 Α, reflected by the mirrors 5 3 Β and 5 3 C, and a part of it is unpolarized beam splitter 5 3 D reflects and becomes 9 G beams. A second part of the light beam incident on the non-polarized beam splitter 5 3 D is transmitted and then reflected by the mirror 5 3 E to become a light beam 9W. The light beams 9 G and 9W have a wavelength λ 5. The light beam leaving the modulator 3 A is reflected by the mirrors 5 3 F, 5 3 G, and 5 3H, and a part of it is reflected by the non-polarized beam splitter 5 3 I to become the λ 5A part of the light beam 9. As shown in Fig. 3a, the first part of the light beam leaving the modulator 4 is transmitted by the non-polarized beam splitter 5 4 C and becomes the light beam 10. A second part of the light beam leaving the modulator 4 is reflected by the non-polarized beam splitter 5 4 C, and a part of it is reflected by the non-polarized beam splitter 5 4 D to become a beam 10 G. A second portion of one of the light beams incident on the non-polarized beam splitter 5 4 D is transmitted by the non-polarized beam splitter 5 4 D and then reflected by the mirror 5 4E to become a light beam 10W. The light beams 10G and 10W have a wavelength? 6. In the next step, one of the first part of the beam 10 is reflected by the non-polarized beam splitter 54A, and becomes the beam 2 1 2. One second part of the light beam 10 is transmitted by the non-polarized beam splitter 5 4 A, and a part of it is reflected by the non-polarized beam splitter 54B to become the light beam 12. The light beam 9 is incident on the differential plane mirror interferometer 69, and the light beams 12 and 2 1 2 are incident on the differential plane mirror interferometer group 70, which includes two differential plane mirror interferometers. ________- 54___ This paper size applies to China National Standard (CNS) A4 (210 χ 297 mm) I ----------- installation -------- order ---- ----- (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7_______ V. Description of the invention (52) Beam splitter 6 5 and external mirror system 9 0 Differential plane mirror interferometer 6 9 and differential plane mirror interferometer group 7 provided by the external mirror 0 include a device for introducing a phase shift P 5 between the X and y portions of the light beam 9 having a wavelength λ 5, a phase Transfer ¢) 5 Α between the X and y portions of the light beam 9 having a wavelength λ 5 Α, a phase shift P 6 between the X and y portions of the light beam 12, and a phase shift P 7 between the wavelengths Between the X and y portions of the light beam 2 1 2 at λ 6. A differential plane mirror interferes with the optical path between the two external plane mirrors. Moreover, it is not sensitive to thermal and mechanical disturbances that may occur in the beam splitting chamber of the interferometer and its associated light portion. As shown in Fig. 3b, the differential plane mirror interferometer 69 has 8 exit / return beams 17, 25, 33, 41, 117, 125, 133, and 141. Beams 17, 2, 5, 3, and 41 are generated by one of the polarized portions of the light beam 9 and the first polarized portion, and include the light beam for the reference pin. The light beams 117, 125, 133, and 141 generated by the second polarized portion of the light beam 9 include light beams for measuring feet. The first polarized part of the light beam 9 is the single ancestor. The light beams are indicated by dashed lines in Fig. 3b, and the second polarized part of the light beam 9 is the single ancestor. The light beams are indicated by dotted lines in Fig. 3b. No. One of the differential plane mirror interferometer groups 70, the differential plane mirror interferometer has four exit / return beams 18, 26, 118, and 126. One of the polarized parts of the light beam 12, the light beams 18 and 26 generated by the first polarization part include the light beam for the reference pin, and the light beam 1 1 8 of the second polarization part of the light beam 12 And 12 6 contains the beam used to measure the feet. The first polarization part of the light beam 12 is the only ancestor's light beam. In Figure 3c, the dashed line table -55- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --- -* ------- Equipment * ------- Order --------- (Please read the precautions on the back before filling out this page) Employee Consumer Cooperatives, Bureau of Intellectual Property, Ministry of Economic Affairs Printed 477895 A7 B7 _ V. Description of the invention (53) No 'and the second polarized part of the light beam 12 is the only ancestor. The light beam is indicated by a dotted line in Figure 3c. The differential plane mirror interferometer group is one of the second differential plane mirror interferometers with four exit / return beams 2 1 8, 2 2 6, 3 1 8, and 3 2 6. One of the polarized parts of the light beam 2 1 2, the light beams 2 1 8 and 2 2 6 generated by the first polarization part include the light beam for the reference pin, and the light beam generated by the second polarization part of the light beam 2 1 2 3 1 8 and 3 2 6 include the beam for measuring feet. The first polarized part of the beam 2 1 2 is the only ancestor. The light beam is represented by the alternate dots and dashed lines in Figure 3c, and the second polarized part of the beam 2 1 2 is the only ancestor. The light beam is represented in Figure 3c by alternate pairs of dots and a dashed line. Beams 17, 25, 33, 41, 117, 125, 133, and 141 are incident on the polarized beam splitter 65 and transmitted by the two-color beam splitting interface 6 6 to become beams E 1 7, E 2 5, and E33, respectively. , E41, E117, E125, E133, and E141. The light beams E17, E25, E33, E41, E117, E125, E133, and E141 are incident on the external mirror system 9 0 shown in Fig. 3d, which generates light beams 4 3 and 1 4 3. Beam 1 4 3 contains information about the length of the light path of the gas in the measuring path through the external mirror system 90 at wavelengths λ 5 and λ 5A, and beam 4 3 contains the light path through the reference path Information on lengths λ 5 and λ 5A. Similarly, the light beams 18, 26, 118, 126, 218, 226, 318, and 326 are incident on the polarized beam splitter 65 and transmitted by the two-color beam splitting interface 66, and become the beams E18, E26, and E118, respectively. Ε126, Ε218, This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)-L ------------------- Order ----- ---- (Please read the notes on the back before filling this page) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (54) E226, E318, and E326. The light beams E18, E26, E118, E126, E218, E226, E318, and E 3 2 6 are incident on the external mirror system 90 shown in Fig. 3e, which respectively generate light beams 28, 128, 228, and 328. Beams 1 2 8 and 3 2 8 contain information on the wavelength λ 6 of the optical path length of the gas in the respective measurement paths of the external mirror system 90, and beams 2 8 and 1 2 8 contain Information on the length of the light path of the reference path on the long λ 6. The beam 43 is reflected by the mirror 63B, and a part thereof is reflected by the non-polarized beam splitter 63A, and becomes a part of the beam 45. A part of the light beam 1 4 3 is transmitted by the polarized beam splitter 6 3 A and becomes a second part of the light beam 4 5. The beam 45 is a mixed beam, and the first and second parts of the beam 45 have the same linear polarization. The light beam 4 5 leaves the differential plane mirror 6 9. The light beam 2 8 is reflected by the mirror 5 8 B, and a part thereof is reflected by the non-polarized beam splitter 5 8 A to become the first part of the light beam 30. A part of the light beam 1 2 8 is transmitted by the beam splitter 5 8A and becomes a second part of the light beam 30. The light beam 30 is a mixed light beam, and the first and second parts of the light beam 30 have the same linear polarization. The light beam 2 2 8 is reflected by the mirror 5 8 D, and a part thereof is reflected by the non-polarized light beam splitter 5 8 C to become the first part of the light beam 2 3 0. A part of the light beam 3 2 8 is transmitted by the polarization beam splitter 5 8 C and becomes a second part of the light beam 2 3 0. The light beam 230 is a mixed light beam, and the first and second parts of the light beam 230 have the same linear polarization. Beam 30-57-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 1 · ----------------------- -------. (Please read the notes on the back before filling out this page) 477895 A7 B7 V. Description of the invention (55) and 2 30 Leave the differential plane mirror interferometer group 70. (Please read the note on the back? Matters before filling out this page) Phase shift between P 5 'p 5 A' φ 6 and the amplitude of P 7 and the physical length of the path i 8 and the path i of the reference path The difference li is related. Figures 3 a-3 e are shown in the case of pi = 2 p 2, according to the formula% (,) = Σφ5Α) = Σα.⑹, / = 1 Φ5λ (0 = ZVsa, (〇 = ΣΑ (0 ^ 5Λ, / = 1 / = 1 ,, 3 i ^ P2 (47) Φ6 (') = Σ% 〆', ·) = Σ Α⑹ 众 6% ·,,. = 1. / = 1 Φ7 (0 = ΣΦ7 火 ·) = ΣΑ⑷々7 / = / > 2 + 1 / = / ¾ + 1 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, where nm is the measurement of gas in path i of path 9 8 The refractive index is equivalent to the number of wave numbers = (2ττ) / Ai. The normal value of Li is twice the spatial distance between the mirror surfaces 95 and 96 in the external mirror system 90 (see Figures 3d and 3e). . For those who are skilled in the art, the interpretation of the situation to pi # 2 P2 is a straightforward procedure. In Figure 3 b-3 e, differential plane mirror interferometer 6 9 and differential plane mirror interferometer group 70 0 differential plane mirror interference Calculate the structure so that P i = 4 and p 2 = 2, respectively. 俾 In the simplest way, explain the use of multi-pass construction. The function of the device of the first preferred embodiment of the present invention that reduces the effect of the Doppler phase shift in the dispersion signal. Equation (4 7) The joint path at wavelength λ 5 and the joint path at wavelength λ 6 are approximately equal The situation in the range is valid. It is a straightforward procedure for those who are skilled in the art 'to interpret two joint paths with different wavelengths that are not approximately in the same range. The beam from the external mirror system 90 0 of the mirror 9 2 is the first Reflection migrates to each ___.-_ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 477895 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 _ V. Description of the invention (56) The average time delay where the heavy and reference beams are mixed is different for the shorter wavelength λ 6 beam and longer wavelength; 15 or λ 5 A beams are generally not the same. The time delay difference is determined by the number of times the beam with the shorter wavelength passes multiple times. Caused by the different number of passes of a light beam with a longer wavelength. The effect of the difference in the average time delay of a light beam with a shorter and longer wavelength is omitted in equation (4 7). The light will not be overly complicated. The difference in the average time delay of the shorter and longer wavelength beams at different respective phases is a higher order effect, which is related to the speed of the mirror 9 2 of the external mirror system 90, Near L, the instantaneous average chirp is proportional to the respective heterodyne frequency. In the case of the moving speed of mirror 9 2 is 2m / s, the instantaneous mean chi of Li is 2m, and the heterodyne frequency is 2 0 Μ Η z , The respective phase difference is about 1 radian, and the change rate of the difference is about 1 radian / second. This change in phase difference occurs at a low frequency, which is usually lower than or at the level of 10 Η ζ. Those skilled in the art understand that the effect of this phase difference, the difference between the average time delay of the shorter and longer wavelength beams, can be determined by the speed of the mirror 9 2 and the near instantaneous average of Li in the subsequent signal processing. Your knowledge is modeled and compensated to the required accuracy imposed on the output data by the final application. In the next step, as shown in Fig. 3a, the beam 45 hits the detector 85, resulting in the difference signals s5 and S5A and two other heterodyne signals, and the beams 3 0 and 2 3 0 hits the photodetectors 8 6 and 2 8 6, resulting in two interference signals. The heterodyne signals s 6 and s 7 should be generated by photoelectric detection.丨 § Numbers 5 and S 5A are present at wavelengths λδ and λδA, respectively, and signals S 6 and S 7 correspond to wavelengths λ 6. The heterodyne signals S 5 and S 5 Α have heterodyne frequencies equal to the frequencies f 5 and ______ 5Q -____ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) I ---- *- ------ Installation -------- Order --------- (Please read the precautions on the back before filling this page) 477895 A7 Β7 V. Description of the invention (57) f 5 A. The heterodyne frequency of the other two heterodyne signals is | △ I Δ f | ± f 5 A, where soil and

8 4 經濟部智慧財產局員工消費合作社印製及C爲真空中之光速度。第三實施例之裝Μ》ΙΛΙ , |/5A| · 在等式（4 9 )之條件有效時，另二以處理’以獲得額外資訊，但此等容易自 s 5A中分離，並/或在其後電子處理器1 理中由電子濾波消除。信號s i具有形態 Si = Ai cosfa^/)] , 7· = 5, 5A, 6,及 7 , 其中，時間依賴之自變數a , ( t )由如― α5(〇 = 2π/5/+φ5 ， α5λ(0 = 2π/*5Α^ + Φ5Α α6(/) = 2π/6/ + φ6 , α7(’) = 27ξ/^ + φ7 , 且在用作法方及置 49 處可5;號雖S信號號之信信中差J 9 外外 ϋ 加及 ο 5 (請先閱讀背面之注意事項再填寫本頁) 裝訂----- 供提 5 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 60 - 經濟部智慧財產局員工消費合作社印製 477895 A7 B7_ 五、發明說明（58) φ5 =φ5+Λ5+ζ5 , Φ5Λ = Φ5Λ + 八 5Α +ζ5Λ (5之） Φ6 =96+^6+66 / Φ7 = Φ7 + 八7 +;7 / 相位偏置Γ i包含對與量度徑路9 8及基準徑路無關之相位轉移ί ^之所有貢獻，及Λ ,包含循環誤差項。由等式 (50)所表示之S5，S5A，S6，及S7之說明與由等式（5 0 )所表示之第一實施例之對應s 2所提之說明相同。外差信號S 5及S 5 A以電子信號1 0 3，及外差信號S 6及S 7分別以電子信號1 0 4及3 0 4以數位或類比格式，宜以數位格式發送至電子處理器1 0 9，以供分析。外差信號S 5及S 5 A由電子處理器1 0 9及電腦及控制器1 1 0處理，以量度及監視所量得之相位（P 5及5 A 中之循環誤差貢獻。用以決定第三實施例之^ 5及^ 5 A中之循環誤差之處理及程序之說明與第二實施例之ί 4 A及 B中之循環誤差之決定所提之說明之對應部份相同。決定循環誤差之次一步驟爲決定所量得之相位φ 6及 9 7中之循環誤差。所量得之相位（ρ 6及Ρ 7中之循環誤差由 Ρ 6及Ρ 7之Founer*分析獲得，使用由前程序對循環誤差改正之P 5，或由前程序對循環誤差改正之ί 5 A作爲積分變數。決定循環誤差之其後步驟之說明與第二實施例所提之說明之對應部份相同。外差信號S 5，S 6，及S 7由電子處理器1 0 9及電 _______-61 -_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） l·---.-------裝--------訂---------*5^^" (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 B7__ 五、發明說明（59) 腦及控制器1 1 0處理，以量度及監視量度及基準徑路之至少之一中對氣體之影響不敏感之物理長度之改變。用以電子處理外差信號S 5，S 6，及S 7之較宜方法在此以I 5及/或I 6爲非低階整數之情形提出。在I 5及 I 6二者爲低階整數，且波長比率符合比率（I 5 / I 6 ) 至足以滿足由最終應用施加於輸出資料上之所需精確度之情形，用以電子處理外差信號S 5，S 6，及S 7之較宜程序與其後本發明之第三實施例之第二改變所訂定者相同。現參考圖3 f，電子處理器1 0 9包含電子處理器 10 94A， 1〇94B， 1094C，及 1094D，用以由數位或類比處理，宜由類比處理決定相位P 5，P 6 ，P 7，及φ 5 A，使用時間基礎之相位偵測法，諸如數位 Hilbert變換相位偵測器（閱以上R.E.Best )或類似者及驅動器5，5A，及6之相位。驅動器5，5 A，及6之相位由數位或類比格式，宜爲數位格式之電信號，分別爲基準信號1 0 1，1 0 1 A ，及102發送至電子處理器109。基準信號101， 1 0 1 A，及1 〇 2以外之基準信號亦可由光拾取裝置及偵測器（未顯示於圖中）產生，由光束分器，宜爲非極化光束分裂器分裂光束9及1 0之部份，混合分裂之光束9 之部份及光束1 0之部份，並偵測混合之部份，以產生外差基準信號。再參考圖3 f ，電子處理器1 0 9包含電子處理器 1〇9 6 A，相加^及i 7 —起。其次，相位Φ 5及所產生 _____-fi?-__ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ,,---V-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7 五、發明說明（6Q) 之相位和（$6 + ¢)7)在電子處理器1 0 9 5A及 1〇9 5B中宜以數位處理，分別由I 5/ρι及（16/ P 2 ) ( 1 / 2 )倍乘，產生相位相位（I 5 / p :)"及 (I 6 / P 2 ) (i6+“）/2。相位（15/ρι) φ 5 及（l6/p2) (φ6 + φ7) / 2其次在電子處理器 1 0 9 6 Β中相加一，並在電子處理器1 0 9 7 Α中相減，宜由數位處理，以分別產生相位θ及Φ。形式爲 k - . k (φ6+φ7)' —Φ5 十---- Ρι Ρι 2 (53) (請先閱讀背面之注意事項再填寫本頁) 裝 Φ (Φ6+Φ7) (54) 一 Ρι Ρι 2 _ 注意自等式（5 3 )及（5 4 ) ，θ及Φ對外部鏡系統 9 0之鏡9 1及9 2之傾斜及/或偏向不敏感’唯除外部鏡系統9 0之鏡9 1及9 2由不同波長之光束之平均時間延遲（閱等式4 6 )之不同影響所引起之瞬時改變傾斜及 /或偏向外，且對干涉計光束分裂室及所屬之光組成件中由於使用微分平面鏡干涉計所引起之熱及機械擾亂不敏感 ----訂---- 經濟部智慧財產局員工消費合作社印製經由不同波長之光束之平均時間延遲之不同影響所引起之鏡9 1或9 2之傾斜及/或偏向之瞬時改變所導致之3 及Φ之相位影響爲高階影響，該影響與傾斜或偏向，傾斜轉動之瞬間角速度，入射於傾斜及/或偏向變動之鏡上之光束之分離，及外差頻率成比例，且在低頻率，普通低於或等於1 OH z上發生。經由具有外差頻率2 ΟΜΗ z之 _ -63 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（61) 不同波長之光束之平均時間延遲之不同影響，鏡9 1或 9 2之在角速度2 ττ/1 0弧度/秒上之傾斜及/或偏向之瞬時改變所引起之θ及Φ之相位影響約爲〇·6弧度/秒。精於本藝之人士明瞭，由鏡9 1及9 2之傾斜及/或偏向之瞬時改變所引起之3及Φ之相位影響可在其後之信號處理中，由鏡9 1或9 2之瞬時傾斜及/或偏向角速度之知識及L i之接瞬時平均値加以模造及補償至最終應用所施加於輸出資料上之所需之精確度。可能需要慮及群延遲影響。在由真空構成之量度徑路上，相位Φ應大致恆定不變，不受外部鏡系統9 0中之鏡之一或二者移動所引起之Doppler頻移之影響，該移動改變鏡之分開距離。由於電信號S 5，S 6，及S 7所遭遇之群延遲並不相同，故實際情形並非，如此。如相位Φ在真空所構成之量度徑路中並非恆定不變，則精於本藝之人士所知之技術可用以補償相位Φ與常數之偏差（參考上述 Blinchikoff 及 Zveriv ) 〇應注意不獨可偵測，且可決定包含直空之量度徑路之群延遲影響，由量度隨平移器6 7所產生之鏡9 2之不同平移速度而定之Φ達成。且應注意可在盡量接近偵測器 8 5，8 6，及2 8 6中之光電偵測器處執行信號s 5， s 5 a，s 6，及s 7之數位至類比變換，隨後執行數位信號處理，而非發送類比信號之信號S 5，S 5 A，S 6，及S 7 ，供下游其後類比信號處理及/或類比至數位變換之用’ 而大幅減小Φ中之群延遲影響。特定之群延遲之補償大體 ___ - R4 -_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ί---*-------•裝--------訂--------- Sr (請先閱讀背面之注意事項再填寫本頁) 477895 A7 __B7_____五、發明說明（62) 可在產生特定群延遲之處理元件之前或後，或部份前及部份後引進。電子處理器1 〇 9另包含處理器1 0 9 4A，用以使用時間基礎之相位偵測或類似者’由類比或數位處理，宜由數位處理，決定相位轉移i 5 a ’基準信號1 0 1用作相位敏感偵測中之基準信號。相位P 5，θ，及Φ發送至電腦 1 1 0成作爲數位或類比格式，宜爲類比格式之信號 10 5° 氣體之折射率差（η5 - 1 )可使用以下公式計算 r (55) 其中，L爲物理長度Li之平均値 X = (^^5+^6)/2 , 尺=(,5灸5 -々〜)/2 / (56) (57) L---.-------•裝--------訂---- (請先閱讀背面之注意事項再填寫本頁) ΜΨ. Γ (58) 經濟部智慧財產局員工消費合作社印製及略去第二階改正項。第二階改正項由量度徑路i中之折射率自量度徑路i之平均折射率產生第一階改變，及物理長度L ^與！^之差所引起。量Γ爲氣體之倒數色散率，此大致不受環境情況及氣體騷動之影響。偏置項Q之定義爲 ρ = ξ(^/χ)-ζ , (59) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 4778958 4 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs and C is the speed of light in a vacuum. The third embodiment of the device M >> IΛI, | / 5A | · When the condition of equation (4 9) is valid, the other is processed to obtain additional information, but these are easily separated from s 5A and / or It is eliminated by electronic filtering in the following electronic processor. The signal si has the form Si = Ai cosfa ^ /)], 7 · = 5, 5A, 6, and 7, where the time-dependent independent variable a, (t) is given by ― α5 (〇 = 2π / 5 / + φ5 , Α5λ (0 = 2π / * 5Α ^ + Φ5Α α6 (/) = 2π / 6 / + φ6, α7 (') = 27ξ / ^ + φ7, and it can be used as a method and placed at 49 places. 5; No. Although S The letter of the signal number is the difference J 9 outside the outer plus plus ο 5 (Please read the precautions on the back before filling in this page) Binding ----- Provide 5 paper sizes applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) 60-Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7_ V. Description of the invention (58) φ5 = φ5 + Λ5 + ζ5, Φ5Λ = Φ5Λ + eight 5Α + ζ5Λ (5 of) Φ6 = 96 + ^ 6 + 66 / Φ7 = Φ7 + eight 7 +; 7 / phase offset Γ i includes all contributions to the phase transfer 无关 ^ which is independent of the measurement path 9 8 and the reference path, and Λ, including the loop Error term. The description of S5, S5A, S6, and S7 represented by equation (50) is the same as that of the corresponding s 2 of the first embodiment represented by equation (50). Heterodyne signal S 5 and S 5 A with electronic signal 103, and heterodyne The signals S 6 and S 7 are respectively transmitted in digital or analog format by electronic signals 104 and 3 0 4 and should preferably be transmitted to the electronic processor 10 9 in digital format for analysis. The heterodyne signals S 5 and S 5 A are provided by Electronic processor 10 and computer and controller 1 10 process to measure and monitor the measured phase (cycle error contribution in P 5 and 5 A. Used to determine ^ 5 and ^ 5 of the third embodiment The description of the processing and procedure of the cyclic error in A is the same as the corresponding part of the description mentioned in the second embodiment of the determination of the cyclic error in ί 4 A and B. The next step in determining the cyclic error is to determine the measured value. The cyclic errors in the phases φ 6 and 9 7. The measured phases (the cyclic errors in ρ 6 and P 7 are obtained by Founer * analysis of P 6 and P 7, using P 5 corrected by the previous procedure for the cyclic errors Or, the 5 A corrected for the cyclic error by the previous program is used as an integral variable. The description of the subsequent steps to determine the cyclic error is the same as the corresponding part of the description in the second embodiment. Heterodyne signals S 5, S 6, And S 7 by electronic processor 1 0 9 and electricity _______- 61 -_ This paper size applies to Chinese national standards (CNS) A4 specifications (210 X 297 public love) l · ---.------- install -------- order --------- * 5 ^^ " (Please read the precautions on the back before filling out this page) Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 B7__ V. Description of the invention (59) Brain and controller 1 1 0 processing, to measure and monitor measurement and benchmark A change in the physical length of at least one of the paths that is insensitive to the effects of the gas. The preferred method for electronically processing the heterodyne signals S5, S6, and S7 is proposed here in the case where I5 and / or I6 are non-low-order integers. In cases where both I 5 and I 6 are low-order integers and the wavelength ratio conformance ratio (I 5 / I 6) is sufficient to meet the required accuracy imposed on the output data by the final application, it is used to electronically process heterodyne The preferred procedures of the signals S5, S6, and S7 are the same as those prescribed by the second modification of the third embodiment of the present invention. Referring now to FIG. 3f, the electronic processor 10 9 includes electronic processors 10 94A, 1094B, 1094C, and 1094D for digital or analog processing, and the phases P 5, P 6, and P 7 should be determined by analog processing. , And φ 5 A, using a time-based phase detection method, such as a digital Hilbert transform phase detector (see REBest above) or similar and the phase of the driver 5, 5A, and 6. The phases of the drivers 5, 5 A, and 6 are sent to the electronic processor 109 in digital or analog format, preferably digital signals in electrical format, which are the reference signals 101, 101, and 102, respectively. Reference signals other than 101, 1 0 1 A, and 10 2 can also be generated by optical pickup devices and detectors (not shown in the figure). They are split by a beam splitter, preferably a non-polarized beam splitter. The parts 9 and 10, the part of the split beam 9 and the part of the beam 10 are mixed, and the mixed part is detected to generate a heterodyne reference signal. Referring again to FIG. 3 f, the electronic processor 10 9 includes the electronic processor 1096 A, and the addition ^ and i 7 together. Secondly, the phase Φ 5 and the generated _____- fi? -__ This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm), --- V ------- install- ------ Order --------- (Please read the notes on the back before filling out this page) 477895 A7 B7 V. Phase sum of invention description (6Q) ($ 6 + ¢) 7) in Electronic processors 1 0 9 5A and 10 9 5B should be digitally processed and multiplied by I 5 / ρι and (16 / P 2) (1/2) to generate the phase (I 5 / p:) " And (I 6 / P 2) (i6 + “) / 2. Phases (15 / ρι) φ 5 and (l6 / p2) (φ6 + φ7) / 2 are then added in the electronic processor 1 0 9 6 Β First, and subtract in the electronic processor 1 0 9 7 Α, it should be digitally processed to generate phases θ and Φ, respectively. The form is k-. K (φ6 + φ7) '— Φ5 ten ---- Ρι Ρι 2 (53) (Please read the precautions on the back before filling in this page) Install Φ (Φ6 + Φ7) (54) One Pai 2 _ Note that the self-equations (5 3) and (5 4), θ and Φ pairs The inclination and / or deflection of the mirrors 9 1 and 9 2 of the external mirror system 9 0 is not sensitive, except for the average time of the mirrors 9 1 and 9 2 of the external mirror system 9 0 by beams of different wavelengths. Instantaneous changes in tilt and / or outward caused by different effects of delay (see Equation 4 6), and thermal and mechanical disturbances caused by the use of differential plane mirror interferometers in the beam splitting chamber and the optical components of the interferometer Not sensitive ---- Order ---- The instant of tilt and / or deflection of the mirror 9 1 or 9 2 caused by the different effects of the average time delay of beams of different wavelengths printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs The phase effects of 3 and Φ caused by the change are high-order effects, which are proportional to the angular velocity of the tilt or deflection, the instantaneous angular velocity of the tilt rotation, the separation of the light beam incident on the mirror with the tilt and / or deflection, and the heterodyne frequency, And it occurs at low frequency, usually lower than or equal to 1 OH z. Via a heterodyne frequency of 2 ΟΜΗ z of _ -63-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 477895 Economy Printed by the Intellectual Property Bureau Staff Consumer Cooperative A7 B7 V. Description of the Invention (61) Different effects of the average time delay of beams with different wavelengths, mirror 9 1 or 9 2 at angular velocity 2 ττ / 1 0 radians / second The phase effect of θ and Φ caused by the instantaneous change of tilt and / or deflection is about 0.6 radians / second. Those skilled in the art understand that the instantaneous change of the tilt and / or deflection of mirrors 9 1 and 92 The resulting phase effects of 3 and Φ can be modeled and compensated to the final application in the subsequent signal processing by the knowledge of the instantaneous tilt and / or deflection angular velocity of the mirror 9 1 or 9 2 and the instantaneous average of L i The required accuracy applied to the output data. The group delay effect may need to be taken into account. On a measuring path made of vacuum, the phase Φ should be approximately constant and not affected by the Doppler frequency shift caused by the movement of one or both of the mirrors in the external mirror system 90, which changes the separation distance of the mirrors. Since the group delays encountered by the electrical signals S5, S6, and S7 are not the same, this is not the case. If the phase Φ is not constant in the measurement path formed by the vacuum, the technology known to those skilled in the art can be used to compensate the deviation of the phase Φ from the constant (refer to the above-mentioned Blinchikoff and Zveriv). It can determine the effect of group delay including the measurement path of straight space, which is achieved by measuring Φ with different translation speeds of mirror 9 2 produced by translator 67. And it should be noted that the digital-to-analog conversion of signals s 5, s 5 a, s 6, and s 7 can be performed as close as possible to the photodetectors in detectors 8 5, 8 6 and 2 8 6. Digital signal processing instead of sending signals S 5, S 5 A, S 6, and S 7 for analog signals for downstream analog signal processing and / or analog-to-digital conversion ', greatly reducing the group in Φ Delay effect. Compensation for specific group delay is generally ___-R4 -_ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) ί --- * ------- • installation ---- ---- Order --------- Sr (Please read the notes on the back before filling out this page) 477895 A7 __B7_____ V. Description of the invention (62) It can be used before the processing element that generates a specific group delay or Later, or partly before and partly after. The electronic processor 1 009 also includes a processor 1 0 9 4A, which is used for time-based phase detection or the like. 'Analog or digital processing, preferably digital processing, determines phase shift i 5 a' reference signal 1 0 1 is used as the reference signal in phase-sensitive detection. Phases P 5, θ, and Φ are sent to the computer 1 1 0 as a digital or analog format, preferably in analog format. 10 5 ° The refractive index difference (η5-1) of a gas can be calculated using the following formula r (55) where , L is the average of the physical length Li 値 X = (^^ 5 + ^ 6) / 2, ruler = (, 5 moxibustion 5 -々 ~) / 2 / (56) (57) L ---.--- ---- • Equipment -------- Order ---- (Please read the precautions on the back before filling in this page) ΜΨ. Γ (58) Printed and omitted by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Go to the second-order correction term. The second-order correction term results in a first-order change from the refractive index in the measurement path i from the average refractive index of the measurement path i, and the physical length L ^ and! ^ Caused by the difference. The amount Γ is the reciprocal dispersion rate of the gas, which is largely unaffected by environmental conditions and gas disturbances. The definition of the offset term Q is ρ = ξ (^ / χ) -ζ, (59) This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 477895

五、發明說明（63) 經濟部智慧財產局員工消費合作社印製其中卜Η Pi 2 J ， (60) Κ \Ρι _ h Ce P2 2 j · (61) (57 )所提供之K之定義顯示， (K / X )=〇相當於波長λ 5及Λ 6爲依已知之比率I 5 / I 6之嚴格諧波關係。在| Κ / X I > 〇之應用上，且（Κ / X )之値在使用等式（5 5)及/或（6 2)中需知道至特定精確度 ’以滿足最終使用需求之應用上，（Κ / X )由波長監視器550量度。在使用等式（55) ，(62) ，（67 )，及/或（15)中，需知道X之値至另一特定精確度之情形，X亦由波長監視器5 5 0量度。所量得之（Κ / X)及/或X之値由信號5 5 0 S發送至電子處理器 527及Γ監視器552，用以決定Γ，宜爲數位格式。倒數色散率Γ由監視器5 5 2量度及監視。Γ監視器 5 5 2之較宜實施例來自此處其後所述之第二群之Γ監視器實施例。量得之Γ値作爲信號5 5 2 S發送至電子處理器527,宜爲數位格式。而且，等式（5 5 )在一波長上之光束之聯合徑路大致與一第二波長上之光束之聯合徑路在同等範圍之情形有效，一較宜實施例亦用以最簡單之方式，例解第三實施例中之本發明在降低色散有關信號中之Doppler頻移影響上之功能。對精於本藝之人士，演繹至在一波長上之光束之聯 -66- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） .W ^-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 ____B7__五、發明說明（64) 合徑路與在第二波長上之光束之聯合徑路大致不在同等範圍中之情形爲一直截之程序。在有關距離量度干涉計之應用上，可使用外差相位i 5 及相位θ及Φ來決定距離L，而不受距離量度干涉計之量度徑路中之氣體之折射率之影響，使用公式V. Description of the Invention (63) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, Pi 2 J, (60) Κ \ Ρι _ h Ce P2 2 j · (61) (57) The definition of K provided is shown , (K / X) = 0 corresponds to a strict harmonic relationship between the wavelengths λ 5 and Λ 6 according to the known ratio I 5 / I 6. In the application of | Κ / XI > 〇, and the application of (K / X) in the use of equations (5 5) and / or (6 2) need to know to a specific accuracy 'to meet the end-use application Above, (K / X) is measured by a wavelength monitor 550. In using equations (55), (62), (67), and / or (15), it is necessary to know the range from X to another specific accuracy, and X is also measured by a wavelength monitor 5 50. The measured (K / X) and / or X is sent to the electronic processor 527 and the Γ monitor 552 by a signal 5 50 S to determine Γ, which should be a digital format. The inverse dispersion ratio Γ is measured and monitored by a monitor 5 5 2. A preferred embodiment of the Γ monitor 5 5 2 is from the second group of Γ monitor embodiments described later. The measured Γ 値 is sent to the electronic processor 527 as a signal 5 5 2 S, preferably in a digital format. Moreover, equation (5 5) is effective when the combined path of a beam at one wavelength is approximately the same as the combined path of a beam at a second wavelength. A more convenient embodiment is also used in the simplest way. Explain the function of the present invention in the third embodiment in reducing the influence of the Doppler frequency shift in the dispersion-related signal. For those skilled in the art, the interpretation of the beam of light at a wavelength -66- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm). W ^ ------- -------- Order --------- (Please read the precautions on the back before filling this page) 477895 A7 ____B7__ V. Description of the invention (64) In the case where the combined paths of the beams at the wavelengths are not substantially in the same range, the procedure is always cut. In the application of the distance measurement interferometer, the heterodyne phase i 5 and the phases θ and Φ can be used to determine the distance L without being affected by the measurement of the distance measurement interferometer. The refractive index of the gas in the path uses the formula

L 〇C +尺) ^(φι~ζι)·[Γ§^[™θ-φ-β] (62) 波長之比率可由等式（5 6)及（57)中之（Κ X )項表示，具有結果 1 + (¾) 當在以下情況下操作時 \m K-^s) 相位Φ及3之比率具有接近値 (63) (64) I,---'-------裝---------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 (Φ/θ)= 一〃5) (65) 故此，在第三實施例之情形，當波長比率（λ 5 / λ 6 )與比率値I 5 / I 6相同至一幅階之相對精確度，或小於氣體之折射率之色散（η 6 — η 5 )乘量度腳之光徑路長度 _ -67- _ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 4?7895 Α7 Β7 五、發明說明（65) 中由於氣體而改變量度値所需之相對精確度ε時，形式上由不等式表示L 〇C + rule) ^ (φι ~ ζι) · [Γ§ ^ [™ θ-φ-β] (62) The ratio of the wavelengths can be expressed by the (KK X) terms in equations (5 6) and (57) With the result 1 + (¾) when operating in the following cases \ m K- ^ s) The ratio of phase Φ and 3 has close to 値 (63) (64) I, ---'------- --------- Order --------- (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (Φ / θ) = 1 〃5) (65) Therefore, in the case of the third embodiment, when the wavelength ratio (λ 5 / λ 6) and the ratio 値 I 5 / I 6 are the same relative accuracy to the first order, or less than the refractive index of the gas The dispersion (η 6 — η 5) times the optical path length of the measuring foot _ -67- _ This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 4? 7895 Α7 Β7 V. Description of the invention When the relative accuracy ε required to change the measurement 値 due to gas in (65) is formally expressed by an inequality

λ5 /5 4 λ6 k V 〔”5 - ”6)ε , 等式（5 5 )及（6 2 )化簡爲更簡單之形態 ns ^1 = -^(φ + δ) · (66) (67)λ5 / 5 4 λ6 k V 〔”5-” 6) ε, Equations (5 5) and (6 2) are simplified to a simpler form ns ^ 1 =-^ (φ + δ) · (66) ( 67)

L XIPi (Φ5 -ζ5) + Γ(Φ + 2) (68) (請先閱讀背面之注音？事項再填寫本頁} (69) 經濟部智慧財產局員工消費合作社印製且精於本藝之人士亦明瞭，對η 6執行L之相似之計算 (”6 - 1) = (Λ75 - 1)(1 + 1/Γ) 以取代或補充η 5。在次一步驟，電子處理裝置1 〇 9發送^ 5及Φ至電腦 ’成爲數位或類比格式，宜爲數位格式之電子信號1 〇 5 ’用以計算（η5 - 1)及/或L。在使用等式（6 7)或 (6 8 )計算（η 5 — 1 )或L中由於氣體所引起之改變中 ’需要解出（1/15) Φ之相位重複。而且，在使用等式 (6 2 )或（6 8 )計算L中，如X爲時間上之變數，需要解出Ρ 5中之相位重複。包含（1 / I 5 ) Φ之等效波長遠大於波長λ 5及λ 6 ’且故此，在執行（1 / I 5 ) Φ之相位重複之解出程序中產生大爲簡化作用。（1 / I 5 ) Φ之等效波長λ ( 1 / 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -68- 經濟部智慧財產局員工消費合作社印製 477895 A7 _ B7 _ 五、發明說明（66) I 5 ) Φ 爲 λ(ΐ//5)Φ = (7。）在 λ5=0·633//ηι，(ns— 1) = 3x1 0~4 ，及（n6— n5) =1乂1〇-5之例中，由等式（7〇）所提之等效波長爲 λ(ι//5)Φ Ε 63 皿11 (71) 可容易使用若干程序之任一*，以解出（1/ I 5) φ中之相位重複，假設等效波長由等式（7 )表示。在量度徑路之改變可由干涉計量度之應用上，例如根據用以量度量度徑路中之改變之距離量度干涉計之應用之一特色，外部鏡系統9 0之可移動鏡9 2可由平移器6 7以控制之方式掃描於特定之長度上，並記錄（1/ I 5) Φ中隨帶之改變。自所記錄之（1 / I 5 ) Φ中之改變及所掃描之長度，如由i 5中之改變所記錄，可計算等效波長Λ ( 1 / I 5 ) Φ 。由等效波長λ ( 1 / I 5 ) Φ所計算之値，可容易解出（ 1 / I 5 ) Φ中之相位重複，因爲等效波長λ ( 1 / I 5 ) Φ之値相當大。在執行決定折射率及/或光徑路長度由於量度腳中之氣體而改變，及外部鏡系統之鏡9 2並無前段中所討論之掃描能力之應用上，可有其他程序用以解出（1 / I 5 ) Φ 中之相位重複。可用以解出（1 / I 5 ) Φ中之相位重複之 _____-69-__ 表紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ------------•裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7___ 五、發明說明（67 ) 一程序係根據使用一列外部鏡系統，在此，外部鏡系統之量度腳之來回物理長度形成一幾何級數。該列中之最小或第一來回物理長度接近由相對精確度除λ 5 /〔 4 ( η 6 -ns)] ，（ 1 / I 5 ) Φ之初始値爲已知。該列中之第二外部鏡系統9 0之來回物理長度接近由相對精確度除之第一外部鏡系統9 0之來回物理長度，其Φ使用第一外部鏡系統9 0量度。此爲幾何級數程序，產生之來回物理長度形成幾何級數，如該列中之外部鏡系統之數以一增量，則此級數繼續，直至超過用以量度光徑路中之折射率由於氣體折射率而改變之外部鏡系統之來回物理長度爲止。第三程序以使用一列已知波長及此等波長之量度Φ之一來源（未顯示於圖1 a - 1 e中）爲基礎。相位重複求解所需之已知波長之數大體由一小組構成，因爲等式（ 7〇）所提之λ ( 1 / I 5 ) Φ之値相當大。用以求解（1 / I 5 ) Φ中之相位重複之另一程序爲當量度徑路9 8自氣變爲真空時（圖1 a — 1 e中未顯示真空泵及必需之氣處理系統），觀察（1 / I 5 ) Φ中之改變，以解出（1 / I 5 ) Φ中之相位重複。量度折射率及光徑路長度中由於氣體之射率所引起之改變（部份根據氣體壓力自非零値變爲真空）中通常常所遭遇之問題並不存在於第一較宜實施例中，因爲（1 / I 5 ) Φ之等效波長相當大〇如需要，& 5中之相位重複之求解有與前本發明之第二及第三實施例及其改變中之θ之相位重複之所需求解方面所 -70 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1·---ί------^^裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（68) 述者相似之問題。故此，如需要，有關第二及第三實施例之θ中之相位重複之求解所述之程序可適用於求解¢) 5中之相位重複。包含等式（55) ，（62) ，（67)，及（68 )中所存在及等式（5 2)及（6 6)中所訂定之或/ 及Q之偏置項爲需要視X是否隨時間變化，是否欲決定折射率差或/及波長L，或是否欲決定折射率差或/及波長 L之改變而定之決定及/或監視之一些組合之項。用以決定Γ5及Q之一程序係以一鏡R91 (未顯示於圖Id及 1 e中）取代外部鏡系統9 0之鏡9 1爲基礎，此具有一表面R 9 3相當於鏡9 1之表面9 3，經塗敷而成爲波長 λ 5及λ 6二者之反射表面，並量度¢)5及φ之結果値。假設^及Φ之結果値爲^5!^及〇11。自等式（5 2)及（ 6 8 )顯然量及Q與及（Dr有關，由公式 (72) (73) r 5及q之非電子貢獻應在時間上大致恆定不變，因爲微分平面鏡干涉計6 9，微分平面鏡干涉計群7 0，光束分裂器6 5，及外部鏡系統9 0中發生重大程度之補償。 Γ5及Q之非電子貢獻可由純電子裝置（未顯示）監視。精於本藝之一些人士知道，由於第一較宜實施例中裝有光束分裂器6 5，在λ5及λ6上之光束之量度徑在外部鏡系統9 0之同等範圍中，故氣體之色散可用作量度徑路 ______ - 71 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7 五、發明說明（69) (請先閱讀背面之注意事項再填寫本頁) 中之氣柱密度之高度精密之代表，然而，光束分裂器7 1 之極化塗層7 3及四分之一波延滯板7 7僅需滿足在λ 5上之性能規格’同時光束分裂器7 2之極化塗層及四分之一波延滯板7 8僅需滿足在λ 6上之性能規格。當需要使用具有在氣體之同等範圍量度徑路之不同波長之三或更多光束 ’尤其是在諸如積體電路之微製版情形之高度精密之應用中’依第一實施例中所發表之波長指定重要操作可爲本發明之一重要特色。然而，依波長指定操作無需如第一實施例中所發表執行，例如，光束分裂器7 1及7 2之功能由具有適當修改之極化表面之單個光束分裂器達成，而不脫離本發明之精神及範圍。經濟部智慧財產局員工消費合作社印製圖3 b以槪要之形態顯示圖1 a所示之微分平面鏡干涉計6 9之一實施例。此依以下方式作用：光束9入射於光束分裂器5 5 A上，此宜爲一極化光束分裂器，光束9 之一部份透射，成爲光束1 3。由光束分裂器5 5A反射之光束9之一第二部份由鏡5 5 B反射，及然後由半波相位延滯板7 9透射，成爲光束1 1 3，半波相位延滯板 7 9轉動光束9之反射部份之極化平面9 0° 。光束13 及1 1 3具有相同之極化，但仍具有不同之頻率。光束分裂器5 5 A及鏡5 5 B之功能在使用普通極化技術，在空間上分離光束9之二頻率部份。光束1 3及1 1 3進入極化光束分裂器7 1 (此具有一極化塗層7 3 )中，並經饋射而分別成爲光束1 5及 1 1 5。光束1 5及1 1 5通過四分之一波相位延滯板 7?- 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐）經濟部智慧財產局員工消費合作社印製 477895 A7 ____B7 _ 五、發明說明（70) 7 7，並分別變換爲圓極化光束1 7及1 1 7。光束1 7 及1 1 7由具有二色塗層6 6之光束分裂器6 5透射，由外部鏡系統9 0內之鏡反射回於本身上，如顯示於圖3 d ，回轉通過光束分裂器6 5，且其後回轉通過四分之一波相位延滯板7 7，並變換回爲線性極化光束，此等與原入射光束1 5及1 1 5正交極化。此等光束由極化塗層7 3 反射，以分別成爲光束1 9及1 1 9。光束19及1 1 9 由回反射器75反射，分別成爲光束21及121。光束 2 1及1 2 1由極化塗層7 3反射，分別成爲光束2 3及 1 2 3。光束2 3及1 2 3通過四分之一波相位延滯板 77，並分別變換爲圓極化光束2 5及1 2 5。光束2 5 及1 2 5由光束分裂器6 5透射，由外部鏡系統9 0內之鏡反射回於本身上，如顯示於圖3 d，回轉通過光束分裂器6 5，且其後回轉通過四分之一波相位延滯板7 7，並變換回爲線性極化光束，該線性極化與原入射光束1 5及 1 1 5之線性極化相同。此等光束由極化塗層7 3透射，分別成爲光束27及127。光束27由鏡57A及 57B反射，光束127由鏡59C及59D反射，分別成爲光束29及129。光束2 9及1 2 9進入極化光束分裂器7 1，並由具有極化塗層7 3之極化光束分裂器7 1透射，分別成爲光束3 1及1 3 1。光束3 1及1 3 1通過四分之一波相位延遲滯板7 7，並分別變換爲圓極化光束3 3及1 3 3。光束3 3及1 3 3由光束分裂器6 5透射，由圖3 d所示 ____-73-__ 表紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） " l· .-------·裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 ___ _B7__ 五、發明說明（71 ) 之外部鏡系統9 0內之鏡反射回於本身上，轉回通過光束分裂器6 5，且其後轉回通過四分之一波相位延遲滯板 7 7 ’並變換回爲線性極化光束，此等與原入射光束3 1 及131正交極化。此等光束由極化塗層73反射，分別成爲光束3 5及1 3 5。光束3 5及1 3 5由回反射器 75反射，分別成爲光束37及137。光束37及 1 37由極化塗層73反射，分別成爲光束39及1 39 。光束3 9及1 3 9通過四分之一波相位延遲滯板7 7，並分別變換爲圓極化光束4 1及1 4 1。光束4 1及 1 4 1由光束分裂器6 5透射，由圖3 d所示之外部鏡系統9 0內之鏡反射回於其本身上，回轉通過光束分裂器 6 5，且其後回轉通過四分之一波相位延遲滯板7 7，並變換回爲線性極化光束，該線性極化與原入射光束1 5及 1 1 5之線性極化相同。此等光束由極化塗層7 3透射，分別成爲光束43及143。光束43及143包含有關通過量度徑路9 8之氣體之光徑路長度之在波長λ5上之資訊（其中，欲決定氣體之折射率差之影響），及有關通過基準腳之光徑路長度之資訊。光束4 3由鏡6 3 Β反射，及然後一部份由宜爲非極化式之光束分裂器6 3 Α反射，成爲光束4 5之一第一部份。光束1 4 3入射於光束分裂器6 3A上，光束1 4 3之一部份經透射，成爲光束4 5 之一第二部份，光束4 5之第一及第二部份具有相同之線性極化，但仍具有不同之頻率。圖3 c以槪要之形態顯示圖3 a所示之微分平面鏡干 -74 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） --------- ! 裝------！訂-----I-- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（72) 涉計群7 0之一實施例。此依以下方式作用：光束1 2入射於光束分裂器5 6 A上，此宜爲一極化光束分裂器，光束1 2之一部份透射，成爲光束1 4。由光束分裂器 5 6 A反射之光束1 2之一第二部份由鏡5 6 B反射，及然後由半波相位延滯板8 0透射，成爲光束1 1 4，半波相位延滯板8 0轉動光束束1 2之入射部份之極化平面 9 0 ° 。光束14及114具有相同之極化，但不同之頻率。光束分裂器5 6 A及鏡5 6 B之部份功能在使用普通極化技術，在空間上分離光束1 2之二頻率部份。光束 1 4及1 1 4進入極化光束分裂器7 2 (此具有一極化塗層74)中，並經透射，分別成爲光束1 6及1 1 6。光束1 6及1 1 6通過四分之一波相位延滯板7 8，並分別變換爲圓極化光束1 8及1 1 8。光束1 8及1 1 8由具有二色塗層6 6之光束分裂’器6 5反射，由外部鏡系統 9 0內之鏡反射回於本身上，如顯示於圖3 e，由光束分裂器6 5之表面6 6第二次反射，且其後回轉通過四分之一波相位延滯板7 8，並變換回爲線性極化光束，此等與原入射光束1 6及1 1 6正交極化。此等光束由極化塗層 74反射，分別成爲光束20及120。光束20及 1 2 0由回反射器7 6反射，分別成爲光束2 2及1 2 2 〇光束2 2及1 2 2由極化塗層7 4反射，分別成爲光束2 4及1 2 4。光束2 4及1 2 4通過四分之一波相位延滯板7 8，並分別變換爲圓極化光束2 6及1 2 6。光本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -7.R - ------------•裝--------訂--------- 華 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 ___B7__ 五、發明說明（73) 束2 6及1 2 6由光束分裂器6 5之表面6 6反射，由外部鏡系統9 0內之鏡反射回於本身上，如顯示於圖3 e，由光束分裂器6 5之表面6 6第二次反射，且其後回轉通過四分之一波相位延滯板7 8，並變換回爲線性極化光束，與原入射光束1 6及1 1 6之線性極化相同。此等光束由極化塗層7 4透射，分別成爲光束2 8及1 2 8。光束 2 8及1 2 8包含有關通過量度徑路9 8之氣體之光徑路長度之在波長λ上之資訊（其中，欲決定氣體之折射率差之影響），及有關通過基準腳之光徑路長度之資訊。光束2 8由鏡5 8 Β反射，及然後一部份由宜爲非極化式之光束分裂器5 8 Α反射，成爲光束3 0之一第一部份。光束1 2 8入射於光束分裂器5 8A上，光束1 2 8 之一部份經透射，成爲光束3 0之一第二部份，光束3 0 之第一及第二部份具有相同之線性極化，但仍具有不同之頻率。光束2 1 2入射於光束分裂器5 6A上，光束 2 1 2之一部份經透射而成爲光束2 1 4。光束2 1 2之一第二部份由光束分裂器5 6 A反射，其後由鏡5 6 B反射，及然後由半波相位延遲滯板8 0透射，成爲光束 3 1 4，半波相位延遲滯板8 0轉動光束2 1 2之入射部份90° 。光束214及314具有相同之極化，但仍具有不同之頻率。光束分裂器5 6 A及鏡5 6 B之部份功能在使用普通極化技術，在空間上分離光束2 1 2之二頻率部份。光束2 1 4及3 1 4進入極化光束分裂器7 2 (此具 ___- 7R -_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） i-----------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費令作社印製 477895 A7 —- _ B7_ 五、發明說明（74) 有極化塗層7 4 )，並經透射，分別成爲光束2 1 6及 3 1 6。光束2 1 6及3 1 6通過四分之一波相位延遲滯板7 8，並分別變換爲圓極化光束2 1 8及3 1 8。光束 2 1 8及3 1 8由光束分裂器6 5之表面6 6反射，由圖 3 e所示之外部鏡系統9 0內之鏡反射回於本身上，由光束分裂器6 5之表面6 6第二次反射，且其後轉回通過四分之一波相位延遲滯板7 8，並變換回至線性極化光束，此等與原入射光束2 1 6及3 1 6正交極化。此等光束由極化塗層7 4反射，分別成爲光束2 2 0及3 2 0。光束 2 2 0及2 3 0由回反射器7 5反射，分別成爲光束 222及322。光束222及322由極化塗層74反射，分別成爲光束224及324。光束224及324 通過四分之一波相位延遲滯板7 8，並分別變換爲圓極化光束226及326。光束226及326由光束分裂器 6 5之表面6 6反射，由圖3 e所示之外部鏡系統9 0內之鏡反射回於其本身上，由光束分裂器6 5之表面6 6第二次反射，且其後回轉通過四分之一波相位延遲滯板7 8 ，並變換回爲線性極化光束，該線性極化與原入射光束 2 1 6及3 1 6之線性極化相同。此等光束由極化塗層 7 4透射，分別成爲光束2 2 8及3 2 8。光束2 2 8及 3 2 8包含有關通過量度徑路9 8之氣體之光徑路長度之在波長λ 6上之資訊（其中，欲決定氣體之折射率差之影響 )，及有關通過基準腳之光徑路長度之資訊。光束2 2 8由鏡5 8 D反射，及然後一部份由宜爲非 -77 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L---.-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 A7 ____B7__ 五、發明說明（75) 極化式之光束分裂器5 8 C反射，成爲光束2 3 0之一第一部份。光束2 3 8入射於光束分裂器5 8 C上，光束 3 2 8之一部份經透射，成爲光束2 3 0之一第二部份，光束2 3 0之第一及第二部份具有相同之線性極化，但仍具有不同之頻率。發表第三較宜實施例之一第一改變，其中，第一實施例之第一改變之裝置之說明與第三實施例之裝置所提者相同，唯有關圖3 a所示之驅動器5及6之頻率f 5及f 6不同。在第三實施例之第一改變中，二驅動器5及6之頻率相同，即f 5 = f 6。第一實施例之第一改變之此特色消除第一實施例之群延遲中由f 6所引起之差之影響。第三實施例之第一改變之其餘說明與第一實施例所提之說明之對應部份相同。現參考圖3 a - 3 e及3 g，此等一起以槪要之形態顯示本發明之第三較宜實施例之一第二改變，用以量度一量度徑路及基準徑路之相對物理徑路長度。第三實施例之第二改變相當於第三實施例之一特殊情形，其中，波長λ 5 及Λ 6約爲諧波關係，且比率（I 5 / I 6 )可表示如低階非零整數之比率（p 5 / Ρ 6 )，即是 (請先閱讀背面之注意事項再填寫本頁) ------丨丨訂--------- k = Ps / k: Ps / (k 卜 Μ / 1,2,··· / Ps^Pe · (74) ；第三實施例之第二改變之光束9及1 0 之光源以及光及 1 〇之說明與第三實施例所提之光束 9 及1 0之光 -7ft. 477895 A7 Β7 五、發明說明（76) 源以及光束9及1 0之說明相同，另需要波長應爲諧波關係至充分滿足最終應用施加於輸出資料上之所需之相對精確度。圖3 a - 3 e所示之第三實施例之第二改變之裝置說明與在p 1 = 4及p 2 = 2之情形中之第三實施例所提之說明之對應部份相同。現參考圖3 g，電子處理器1 〇 9 A宜包含電子處理器1 0 9 5 c，用以類比或數位處理，宜爲數位處理由電子倍乘外差信號s 5及s 6 —起，以產生具有數學形態之一超外差信號S 5 X 6 *^5x6 = SSSS · (75) 超外差信號S 5 X 6由二旁波帶構成，且有抑制之載波且可寫成 ^5x6 = ^5x6 + ^5x6 (76) 其中 sLe =^AsAe cos(2kv/ + 05x6), (77) L---*-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 =会忐冯 C0S(2TcF’ + φ5χ6)， v = (/5+/e) / θ5χβ =(φ5 +Φβ)' 厂=(/5 - ,6)' Φ5χ6 =(Φ5 -Φβ) · -79 (78) (79) (80) (81) (82) 本紙張尺度適用中國國家標準（CNS)A4規格（21〇χ 297公爱） 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（77) 超外差信號S 5 X 6故此由相等幅度之二旁波帶S ^6及 S 構成，具有頻率V及相位a5x6之一旁波帶，及具有頻率f及相位φ5χ6之一第二旁波帶。在次一步驟，由電子處理器1 0 9 3 Α經由高通及低通濾波或任何類似技術分離旁波帶S ^6及s〗x6，以分離在頻率上分開之二信號。選擇超外差信號之較低頻率旁波帶之頻率F較之超外差信號之較高頻帶之頻率v遠較爲小，俾容易計算具有高分解度之相位Φ 5 X 6，大爲簡化處理器1 0 9 3A之分離工作。電子處理器1 Ο 9A另包含電子處理器1 0 9 4D及1 0 9 4E，用以使用時基相位偵測，諸如數位Hilbert變換相位偵測器（閱上述R.E.Best ) 或類似者，以及驅動器5及6之相位，決定相位θ 5 x 6及 Φ 5 X 6 ° 電子處理器1 Ο 9Α另包含電子處理器1 〇 9 5D，此以類比或數位處理，宜爲數位處理由電子倍乘外差信號 S 5及S 7 —起，以產生具有數學形態之超外差信號S 5 X 7L XIPi (Φ5 -ζ5) + Γ (Φ + 2) (68) (Please read the phonetic on the back? Matters before filling out this page} (69) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs's Consumer Cooperative and is skilled in this art People also understand that a similar calculation of L is performed on η 6 ("6-1) = (Λ75-1) (1 + 1 / Γ) to replace or supplement η 5. In the next step, the electronic processing device 1 〇9 Send ^ 5 and Φ to the computer 'to become a digital or analog format, preferably an electronic signal in digital format 1 0' to calculate (η5-1) and / or L. When using equations (6 7) or (6 8 ) Calculate (η 5-1) or L due to the change in gas due to the need to solve (1/15) Φ phase repetition. Also, in the calculation of L using equation (6 2) or (6 8) If X is a time-varying variable, it is necessary to solve the phase repetition in P 5. The equivalent wavelength containing (1 / I 5) Φ is much larger than the wavelengths λ 5 and λ 6 ′, and therefore, (1 / I 5 ) The phase repetition solution of Φ has a greatly simplified function. (1 / I 5) Φ equivalent wavelength λ (1 / This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -68- warp Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 _ B7 _ V. Description of the invention (66) I 5) Φ is λ (ΐ // 5) Φ = (7.) At λ5 = 0 · 633 // ηι, (ns— 1) = 3x1 0 ~ 4, and (n6—n5) = 1 乂 10 ～ 5, the equivalent wavelength given by equation (7〇) is λ (ι // 5) Φ Ε63 1111 (71) Any one of several programs * can be easily used to solve the phase repetition in (1 / I 5) φ, assuming that the equivalent wavelength is represented by equation (7). Changes in the measurement path It can be used in the application of interferometry, such as a feature of the interferometer used to measure the distance in the path. The movable mirror 9 2 of the external mirror system 90 can be controlled by the translator 67. The method scans on a specific length and records the changes in (1 / I 5) Φ. From the recorded changes in (1 / I 5) Φ and the scanned length, as changed by the changes in i 5 Record, the equivalent wavelength Λ (1 / I 5) Φ can be calculated. The 値 calculated from the equivalent wavelength λ (1 / I 5) Φ can easily solve the phase duplication in (1 / I 5) Φ, because Equivalent wavelength λ (1 / I 5) of Φ値 is quite large. There are other procedures for performing applications that determine the refractive index and / or the length of the optical path due to the gas in the measuring foot, and the mirror 9 2 of the external mirror system does not have the scanning capabilities discussed in the previous paragraph. It is used to solve the phase repetition in (1 / I 5) Φ. Can be used to solve (1 / I 5) _____- 69 -__ phase repetition in Φ The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --------- --- • Equipment -------- Order --------- (Please read the precautions on the back before filling out this page) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7___ Five Explanation of the invention (67) A program is based on the use of a row of external mirror systems, where the physical length of the measuring feet of the external mirror system forms a geometric progression. The minimum or first round-trip physical length in this column is close to the relative accuracy divided by λ 5 / [4 (η 6 -ns)], and the initial 値 of (1 / I 5) Φ is known. The physical length of the second external mirror system 90 in this column is close to the physical length of the first external mirror system 90 divided by relative accuracy, and Φ is measured using the first external mirror system 90. This is a geometric series procedure. The physical length generated from the back and forth forms a geometric series. If the number of external mirror systems in the column is an increment, this series continues until it exceeds the refractive index in the optical path Up and down the physical length of the external mirror system that changes due to the refractive index of the gas. The third procedure is based on the use of a list of known wavelengths and a source of measurements Φ of these wavelengths (not shown in Figures 1a-1e). The number of known wavelengths required for phase repetition is roughly composed of a small group, because the λ (1 / I 5) Φ given by equation (70) is quite large. Another procedure to solve the phase repetition in (1 / I 5) Φ is when the measuring path 9 8 changes from gas to vacuum (the vacuum pump and the necessary gas processing system are not shown in Figures 1 a-1 e), Observe the change in (1 / I 5) Φ to solve the phase repetition in (1 / I 5) Φ. The problems usually encountered in measuring the refractive index and the length of the optical path due to the emissivity of the gas (partially changing from a non-zero pressure to a vacuum according to the gas pressure) do not exist in the first preferred embodiment. Because the equivalent wavelength of (1 / I 5) Φ is quite large. If necessary, the solution of the phase repetition in & 5 is the same as the phase repetition of θ in the second and third embodiments of the present invention and its changes. -70-This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) 1 · --- ί ------ ^^ 装 ------- -Order --------- (Please read the notes on the back before filling out this page) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (68) Similar problems as described by the author. Therefore, if necessary, the procedure described in the solution of the phase repetition in θ in the second and third embodiments can be applied to solve the phase repetition in ¢) 5. An offset term containing the existence of equations (55), (62), (67), and (68) and the equations (5 2) and (6 6) or / and Q is required to be treated as X Whether to change over time, whether to determine the refractive index difference or / and the wavelength L, or whether to determine the refractive index difference or / and the change in the wavelength L, and / or some combination of monitoring and determination items. One program to determine Γ5 and Q is based on a mirror R91 (not shown in Figures Id and 1e) instead of the mirror 9 1 of the external mirror system 90. This surface has a surface R 9 3 which is equivalent to the mirror 9 1 The surface 9 3 is coated to become a reflective surface with both wavelengths λ 5 and λ 6 and the results ¢) 5 and φ are measured. Suppose the results of ^ and Φ are ^ 5! ^ And 〇11. From equations (5 2) and (6 8) it is clear that the quantity and Q are related to and (Dr, the non-electronic contributions of equations (72) (73) r 5 and q should be approximately constant in time, because the differential plane mirror Interferometer 69, differential plane mirror interferometer group 70, beam splitter 65, and external mirror system 90 are compensated to a significant degree. Non-electronic contributions of Γ5 and Q can be monitored by pure electronic devices (not shown). Some people in the art know that since the beam splitter 65 is installed in the first preferred embodiment, the measurement diameters of the beams on λ5 and λ6 are in the same range of the external mirror system 90, so the dispersion of the gas can be Used as a measuring path ______-71-This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) ----------- installation -------- order --------- (Please read the notes on the back before filling this page) 477895 A7 B7 V. Description of the invention (69) (Please read the notes on the back before filling this page) It represents the high precision, however, the polarization coating 7 3 of the beam splitter 7 1 and the quarter-wave retardation plate 7 7 only need to meet the performance specifications on λ 5 ' At the same time, the polarization coating of the beam splitter 7 2 and the quarter-wave retardation plate 7 8 only need to meet the performance specifications on λ 6. When it is necessary to use three different wavelengths with measuring paths in the same range of gas One or more light beams, 'especially in highly sophisticated applications such as the micro-engraving case of integrated circuits', specifying an important operation according to the wavelength published in the first embodiment may be an important feature of the present invention. However, specifying by a wavelength The operation need not be performed as published in the first embodiment, for example, the functions of the beam splitters 7 1 and 7 2 are achieved by a single beam splitter having a suitably modified polarization surface without departing from the spirit and scope of the present invention. The Ministry of Intellectual Property Bureau's Consumer Cooperative Prints Figure 3b shows an embodiment of the differential plane mirror interferometer 6 9 shown in Figure 1a in an obscure form. This works in the following way: the light beam 9 enters the beam splitter 5 5 On A, this is preferably a polarized beam splitter, a part of beam 9 is transmitted to become beam 13. A second part of beam 9 reflected by beam splitter 5 5A is reflected by mirror 5 5 B, and Then by The wave phase retardation plate 7 9 transmits and becomes the light beam 1 3, and the half wave phase retardation plate 7 9 rotates the polarization plane 90 of the reflection part of the light beam 9. The light beams 13 and 1 1 3 have the same polarization, However, they still have different frequencies. The functions of the beam splitter 5 5 A and mirror 5 5 B use ordinary polarization technology to spatially separate the frequency part of the beam 9. The beams 1 3 and 1 1 3 enter the polarized beam. The splitter 7 1 (which has a polarized coating 7 3) is fed into beams 15 and 1 1 5 respectively. Beams 15 and 1 1 5 pass through quarter-wave phase retardation plate 7?-This paper size is in accordance with China National Standard (CNS) A4 (210 x 297 mm) Printed by the Intellectual Property Bureau, Ministry of Economic Affairs, Consumer Consumption Cooperative 477895 A7 ____B7 _ V. Description of the invention (70) 7 7 and transformed into circularly polarized beams 17 and 1 1 7 respectively. The beams 1 7 and 1 1 7 are transmitted by a beam splitter 65 with a two-color coating 66, and reflected by the mirror inside the external mirror system 90, as shown in Fig. 3d, and passed through the beam splitter. 65, and then rotated back through the quarter-wave phase retardation plate 7 7 and transformed back into a linearly polarized beam, which are orthogonally polarized with the original incident beams 15 and 1 1 5. These beams are reflected by the polarizing coating 7 3 to become beams 19 and 1 1 9 respectively. The light beams 19 and 1 1 9 are reflected by the retroreflector 75 and become light beams 21 and 121, respectively. The light beams 2 1 and 1 2 1 are reflected by the polarization coating 7 3 and become light beams 2 3 and 1 2 3 respectively. The light beams 2 3 and 1 2 3 pass through the quarter-wave phase retardation plate 77 and are converted into circularly polarized light beams 25 and 1 2 5 respectively. The beams 2 5 and 1 2 5 are transmitted by the beam splitter 65 and reflected by the mirror inside the external mirror system 90. As shown in Figure 3d, they pass through the beam splitter 6 5 and then pass through The quarter-wave phase retardation plate 7 7 is transformed back into a linearly polarized beam, which is the same as the linear polarization of the original incident beams 15 and 1 15. These beams are transmitted by the polarizing coating 73, and become beams 27 and 127, respectively. The light beam 27 is reflected by the mirrors 57A and 57B, and the light beam 127 is reflected by the mirrors 59C and 59D to become light beams 29 and 129, respectively. The light beams 29 and 1 2 9 enter the polarization beam splitter 7 1 and are transmitted by the polarization beam splitter 7 1 having a polarization coating 7 3 to become light beams 3 1 and 1 3 1 respectively. The light beams 3 1 and 1 3 1 pass through a quarter-wave phase retardation retardation plate 7 7 and are respectively converted into circularly polarized light beams 3 3 and 1 3 3. The beams 3 3 and 1 3 3 are transmitted by the beam splitter 6 5 and shown in Figure 3 d. ____- 73 -__ The paper size applies to the Chinese National Standard (CNS) A4 (210 X 297 mm) " l · .------- · Equipment -------- Order --------- (Please read the notes on the back before filling out this page) 477895 Employee Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Print A7 ___ _B7__ V. Description of the invention (71) The mirror in the external mirror system 90 is reflected back to itself, and then passes back through the beam splitter 65, and then back through the quarter-wave phase delay lag The plate 7 7 ′ is transformed back into a linearly polarized light beam, which are polarized orthogonally to the original incident light beams 3 1 and 131. These beams are reflected by the polarization coating 73 and become beams 3 5 and 1 3 5 respectively. The light beams 35 and 135 are reflected by the retro-reflector 75 and become light beams 37 and 137, respectively. The light beams 37 and 1 37 are reflected by the polarization coating 73 and become light beams 39 and 1 39 respectively. The light beams 3 9 and 1 3 9 pass through a quarter-wave phase delay lag plate 7 7 and are respectively converted into circularly polarized light beams 4 1 and 1 4 1. Beams 4 1 and 1 4 1 are transmitted by the beam splitter 65, reflected by itself by the mirror in the external mirror system 90 shown in FIG. 3d, and pass through the beam splitter 65, and then pass through The quarter-wave phase retardation lag plate 7 7 is transformed back into a linearly polarized beam, which is the same as the linear polarization of the original incident beams 15 and 1 15. These beams are transmitted by the polarizing coating 73, and become beams 43 and 143, respectively. Beams 43 and 143 contain information on the wavelength λ5 of the light path length of the gas passing through the measuring path 98 (where the influence of the refractive index difference of the gas is to be determined), and the length of the light path passing through the reference foot Information. The light beam 43 is reflected by the mirror 6 3 B, and then partly reflected by the beam splitter 6 3 A, which is preferably a non-polarized beam, and becomes a first part of the light beam 45. The beam 1 4 3 is incident on the beam splitter 6 3A. A part of the beam 1 4 3 is transmitted to become a second part of the beam 4 5. The first and second parts of the beam 4 5 have the same linearity. Polarized, but still with different frequencies. Figure 3c shows the differential plane mirror stem shown in Figure 3a in a summary form -74-This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm) ---------! Install ------! Order ----- I-- (Please read the notes on the back before filling out this page) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (72) One of the 70 related groups to implement example. This works in the following way: the light beam 12 is incident on the beam splitter 5 6 A, which is preferably a polarized beam splitter, and a part of the light beam 12 is transmitted to become the beam 14. One second part of the light beam 12 reflected by the beam splitter 5 6 A is reflected by the mirror 5 6 B and then transmitted by the half-wave phase retardation plate 8 0 to become the light beam 1 1 4, half-wave phase retardation plate 80 ° turns the polarization plane of the incident part of the light beam 12 to 90 °. The beams 14 and 114 have the same polarization but different frequencies. Part of the function of the beam splitter 5 6 A and the mirror 5 6 B is to use ordinary polarization technology to spatially separate the 12 bis frequency part of the beam. The light beams 14 and 1 1 4 enter the polarized beam splitter 7 2 (which has a polarized coating layer 74) and are transmitted to become light beams 16 and 1 1 6 respectively. The light beams 16 and 1 1 6 pass through a quarter-wave phase retardation plate 7 8 and are converted into circularly polarized light beams 18 and 1 1 8 respectively. Beams 1 8 and 1 1 8 are reflected by a beam splitter 65 with a two-color coating 66, and reflected by the mirror inside the external mirror system 90, as shown in Figure 3e, by the beam splitter The surface of 6 5 is reflected for the second time, and then turns back through the quarter-wave phase retardation plate 7 8 and transforms back into a linearly polarized beam, which is positive with the original incident beams 16 and 1 1 6 Cross polarization. These beams are reflected by the polarization coating 74 and become beams 20 and 120, respectively. The light beams 20 and 1 2 0 are reflected by the retro-reflector 76 and become light beams 22 and 12 2 respectively. The light beams 2 2 and 1 2 2 are reflected by the polarizing coating 7 4 and become light beams 2 4 and 1 2 4 respectively. Beams 2 4 and 1 2 4 pass through a quarter-wave phase retardation plate 7 8 and are converted into circularly polarized beams 2 6 and 1 2 6 respectively. The paper size of the paper is applicable to China National Standard (CNS) A4 (210 X 297 mm) -7.R------------- • Installation -------- Order-- ------- Hua (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 ___B7__ 5. Description of the invention (73) Beam 2 6 and 1 2 6 by beam The surface 6 6 of the splitter 65 is reflected by the mirror inside the external mirror system 90. As shown in FIG. 3e, the surface 6 6 of the beam splitter 65 is reflected a second time, and thereafter The rotation passes through a quarter-wave phase retardation plate 7 8 and is converted back into a linearly polarized beam, which is the same as the linear polarization of the original incident beams 16 and 1 1 6. These beams are transmitted by the polarization coating 74, and become beams 2 8 and 1 2 8 respectively. Beams 2 8 and 1 2 8 contain information on the wavelength λ of the light path length of the gas passing through the measuring path 9 8 (where the influence of the difference in refractive index of the gas is to be determined) and the light passing through the reference foot Information on the length of the trail. The light beam 2 8 is reflected by a mirror 5 8 B, and then partly reflected by a beam splitter 5 8 A, which is preferably a non-polarized beam, and becomes a first part of the light beam 30. The beam 1 2 8 is incident on the beam splitter 5 8A. A part of the beam 1 2 8 is transmitted to become a second part of the beam 30. The first and second parts of the beam 30 have the same linearity. Polarized, but still with different frequencies. The light beam 2 1 2 is incident on the beam splitter 56A, and a part of the light beam 2 1 2 is transmitted to become the light beam 2 1 4. One of the second part of the beam 2 1 2 is reflected by the beam splitter 5 6 A, and then is reflected by the mirror 5 6 B, and then transmitted by the half-wave phase retardation lag plate 8 0 to become a beam 3 1 4 with a half-wave phase The retardation plate 80 rotates the incident portion of the light beam 2 1 2 by 90 °. Beams 214 and 314 have the same polarization but still have different frequencies. Part of the function of the beam splitter 5 6 A and mirror 5 6 B is to use the ordinary polarization technology to spatially separate the 2 2 2 frequency part of the beam. Beams 2 1 4 and 3 1 4 enter the polarized beam splitter 7 2 (this has ___- 7R -_ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) i ----- ------ Equipment -------- Order --------- (Please read the precautions on the back before filling this page) 477895 A7 —- _ B7_ V. Description of the invention (74) There is a polarized coating 7 4), and after transmission, it becomes light beams 2 1 6 and 3 1 6 respectively. Beams 2 1 6 and 3 1 6 pass through a quarter-wave phase delay retarder 7 8 and are converted into circularly polarized beams 2 1 8 and 3 1 8 respectively. The beams 2 1 8 and 3 1 8 are reflected by the surface 6 6 of the beam splitter 65, and reflected by the mirror inside the external mirror system 90 shown in FIG. 3e, and are reflected by the surface 6 of the beam splitter 6 5 6 is reflected a second time, and then turns back through a quarter-wave phase delay lag plate 7 8 and transforms back to a linearly polarized beam, which is orthogonally polarized to the original incident beams 2 1 6 and 3 1 6 . These beams are reflected by the polarization coating 74, and become beams 2 2 0 and 3 2 0, respectively. The light beams 2 2 0 and 2 3 0 are reflected by the retroreflector 75 and become light beams 222 and 322, respectively. Beams 222 and 322 are reflected by polarized coating 74 and become beams 224 and 324, respectively. The light beams 224 and 324 pass through a quarter-wave phase delay retardation plate 78 and are converted into circularly polarized light beams 226 and 326, respectively. The light beams 226 and 326 are reflected by the surface 66 of the beam splitter 65, and are reflected back by the mirror in the external mirror system 90 shown in FIG. 3e, and are reflected by the surface 6 6 of the beam splitter 65. The second reflection, and then it turns back through the quarter-wave phase retardation lag plate 7 8 and transforms it back into a linearly polarized beam, which is the same as the linear polarization of the original incident beams 2 1 6 and 3 1 6. These beams are transmitted by the polarization coating 74, and become the beams 2 2 8 and 3 2 8 respectively. The light beams 2 2 8 and 3 2 8 contain information on the wavelength λ 6 of the optical path length of the gas passing through the measuring path 9 8 (where the influence of the difference in refractive index of the gas is to be determined), and the pass through reference foot Information on the length of the light path. The light beam 2 2 8 is reflected by the mirror 5 8 D, and then part of it should be non-77-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) L ---.--- ---- Install -------- Order --------- (Please read the precautions on the back before filling this page) The paper printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs applies to this paper China National Standard (CNS) A4 specification (210 X 297 mm) 477895 A7 ____B7__ V. Description of the invention (75) The polarized beam splitter 5 8 C reflects and becomes one of the first part of the beam 2 3 0. The light beam 2 3 8 is incident on the beam splitter 5 8 C. A part of the light beam 3 2 8 is transmitted to become a second part of the light beam 2 3 0. The first and second parts of the light beam 2 3 0 have The same linear polarization, but still with different frequencies. The first modification of one of the third preferred embodiments is published, wherein the description of the first modified device of the first embodiment is the same as that of the third embodiment, except for the driver 5 and The frequencies f 6 and f 6 of 6 are different. In the first modification of the third embodiment, the frequencies of the two drivers 5 and 6 are the same, that is, f 5 = f 6. This feature of the first modification of the first embodiment eliminates the effect of the difference caused by f 6 in the group delay of the first embodiment. The rest of the description of the first modification of the third embodiment is the same as the corresponding part of the description of the first embodiment. Reference is now made to Figs. 3a-3e and 3g, which together show a second modification of one of the third preferred embodiments of the present invention in summary form to measure the relative physics of a measurement path and a reference path. Path length. The second modification of the third embodiment is equivalent to a special case of the third embodiment, where the wavelengths λ 5 and Λ 6 are about a harmonic relationship, and the ratio (I 5 / I 6) can be expressed as a low-order non-zero integer Ratio (p 5 / Ρ 6), that is (please read the notes on the back before filling this page) ------ 丨丨 Order --------- k = Ps / k: Ps / (k BM / 1, 2, ··· / Ps ^ Pe · (74); the second modified third embodiment of the light source 9 and 10 light source and the description of light and 10 and the third embodiment The light of the mentioned beams 9 and 10-7ft. 477895 A7 B7 V. Description of the invention (76) The source and the descriptions of beams 9 and 10 are the same, and the wavelength should be a harmonic relationship to fully meet the final application applied to the output The required relative accuracy in the data. The device description of the second modification of the third embodiment shown in Figs. 3a-3e and the third embodiment in the case of p 1 = 4 and p 2 = 2 Corresponding parts of the description are the same. Referring now to Fig. 3g, the electronic processor 1 009 A should include the electronic processor 1 0 9 5 c for analog or digital processing. It is advisable to digitally process the electron multiplication heterodyne signals s 5 and s 6 together to generate a superheterodyne signal S 5 X 6 * ^ 5x6 = SSSS · (75) Super heterodyne signal S 5 X 6 is composed of two sidebands, and has a suppressed carrier and can be written as ^ 5x6 = ^ 5x6 + ^ 5x6 (76) where sLe = ^ AsAe cos (2kv / + 05x6), (77) L --- *- ----- Equipment -------- Order --------- (Please read the precautions on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs = 会忐Feng C0S (2TcF '+ φ5χ6), v = (/ 5 + / e) / θ5χβ = (φ5 + Φβ)' factory = (/ 5-, 6) 'Φ5χ6 = (Φ5-Φβ) · -79 (78) (79) (80) (81) (82) This paper size applies the Chinese National Standard (CNS) A4 specification (21〇χ 297 public love) 477895 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 5. Description of the invention ( 77) The super heterodyne signal S 5 X 6 is therefore composed of two sidebands S ^ 6 and S of equal amplitude, with one sideband with frequency V and phase a5x6, and one second sidewave with frequency f and phase φ5χ6 In the next step, the electronic processor 1 0 9 3 Α through high-pass and low-pass filtering or any kind A similar technique separates the sidebands S ^ 6 and s〗 x6 to separate the two signals that are separated in frequency. The frequency F of the lower frequency sideband of the superheterodyne signal is selected to be much smaller than the frequency v of the higher frequency band of the superheterodyne signal. It is easy to calculate the phase with high resolution Φ 5 X 6, which is greatly simplified. Separate work of processor 10 9 3A. The electronic processor 1 0 9A also includes electronic processors 1 0 9 4D and 1 0 9 4E to use time-based phase detection, such as a digital Hilbert transform phase detector (see REBest above) or the like, and a driver Phases of 5 and 6 determine the phase θ 5 x 6 and Φ 5 X 6 ° Electronic processor 1 〇 9Α also includes electronic processor 1 〇 9 5D, this is analog or digital processing, it should be digital processing by electronic multiplication Difference signals S 5 and S 7 together to generate a superheterodyne signal S 5 X 7 with mathematical form

Ss乂Ί = SSS1 · (83) 超外差信號S 5 X 7亦由二旁波帶構成，且有抑制之載波，且可寫成 ^5x7 = *^5x7 (84) 其中 -80- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ------------裝--------訂----- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 ______B7 五、發明說明（78 ) ^5x7 = 2 C0S(2tCV/ + θ5χ7) / (85) *^5x7 = 一C〇S(2tc/^V Η ^Φ5χ7), (86) θ5χ7 =(φ5 +Φ?), • (87) Φ5χ7 -(φ5 ~Φ7) · (88) 超外差信號S 5 ^ :7故此包含相等幅度之二旁波帶s 及s〖x6’ 一旁波帶具有頻率V及相位θ5χ7，及第二旁波帶具有頻率F及相位Φ5Χ7。在次一步驟，由電子處理器1 0 9 3 Β經由高通及低通濾波或任何類似技術分離旁波帶S〖“及S ，以分離在頻率上分開之二信號。如電子處理器1 〇 9 3 Α之討論中所述，選擇超外差信號S 5x7之較低頻率旁波帶之頻率 F較之超外差信號S 5 X 7之較高頻帶之頻率V遠較爲小，大爲簡化處理器1 0 9 3 A之分離工作。電子處理器 1〇9A另包含電子處理器1 094F及1 094G，用以使用時基相位偵測，諸如Hilbert變換相位偵測器（閱上述R.E.Best )或類似者，以及驅動器5及6之相位決定相位 θ5χ7 及 Φ5χ7 0 其次，相位θ5χ6及θ5χ7在電子處理器1 0 9 6 C中以類比或數位處理，宜爲數位處理相加一起，並由2除’ 及相位Φ5χ6及Φ5χ7在電子處理器1 0 9 6 D中以類比或數位處理，宜爲數位處理相加一起，並由2除，以分別本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ----------— 裝--------訂--------- (請先閱讀背面之注音？事項再填寫本頁) -81 477895 A7 B7 五、發明說明（79 ) 產生θ及φ。形式爲公=(〇5χ6 +〇5χ7) Φ ^(Φ5χ6+Φ5χ7) 2 Φ5 ($6 +Φ7) (89) (90) 經濟部智慧財產局員工消費合作社印製注意自等式（8 9 )及（9 0 ) ，θ及Φ對外部鏡系統 9 0之鏡9 1及9 2之傾斜及/偏向不敏感，除經由不同波長之光束之平均時間延遲之差之較高階影響所引起之鏡 9 1及9 2之傾斜及/或偏向之瞬時改變外（閱等式（ 7 4))，且對干涉計光束分裂室及所屬之光組成件中由於使用微分平面鏡干涉計所可能發生之熱及機械擾亂不敏感。電子處理器1 0 9A，如圖3 g所示，包含電子處理器1 0 9 4 A，用以使用時基相位敏感偵測法，宜以數位處理由基準信號1 0 1或類似者決定外差信號s 5之相位 P 5。相位P 5，3，及Φ以數位或類比格式，宜爲數位格式發送至電腦1 1 0，成爲信號1 0 5，用以計算（η 5 -1 )及/或L。氣體之折射率（η 5 - 1 )或由於量度徑路中之氣體所引起之L之改變可由第三實施例之第二改變中以等式（ 54)，（56)，（58) ’（59)，（67)，及 (6 8 )所獲得之其他量表示，具有 (91) L---.-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) -82- 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐）經濟部智慧財產局員工消費合作社印製 477895 A7 ___B7__ 五、發明說明（80 ) 第三實施例之第二改變之其餘討論與第三實施例所提之說明之對應部份相同。第三實施例之第二改變之主要優點爲執行重要電子處理步驟，諸如決定在大致相同頻率，在f 5接近f 6上，及由外部鏡系統9 0之鏡9 2之平移所產生之Doppler頻移在 s 5，s 6，及S 7中大致相同上外差信號S 5，S 6，及 s 7之頻率上相位φ5χ6及Φ5Χ7之選擇，俾大爲降低由具有重大不同頻率之外差信號所遭遇之不同群延遲之產生可能。第三實施例之第二改變之群延遲之影響之討論與第三實施例所提之討論之對應部份相同。本發明之第三實施例之較宜第二改變已在前段中討論，由以下之討論，可更明瞭本發明之內在優點。由等式（ 5 5 )之折射率差之計算及等式4^ 6 2 )之光徑路中氣體之折射率差之影響之計算，顯然可知相位θ及Φ決定所需之精確度與波數Κ及X之値有關。由於頻率F可遠小於頻率 ν，且由於通常較易以有高分解度計算較低頻率之電子信號之相位，故通常最宜依賴超外差所獲得之旁波帶相位Φ 之高度精確之量度。當波數Κ及X有等式（6 4 )之關係時，此容易在本發明裝置中達成，在此，由等式（5 5 ) 計算折射率差或由等式（6 2 )計算光徑路上之氣體之折射率差之影響大致完全不涉及超外差所獲得之旁波帶相位θ 。而且，超外差所獲得之旁波帶相位Φ’之幅度低於超外差所獲得之旁波帶相位3之幅度，較不受等式（6 5 )所表示之接近（Π6 — Π5)/ (Π6 + ΙΊ5)因數之影響。此大爲 _^_ 83 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ----*-------裝--------訂--------- 華 (請先閱讀背面之注意事項再填寫本頁) 477895 A7 ______B7____五、發明說明（81) 提高移動物件之可能相位偵測精確度，諸如在微製版裝備中普通所遭遇者。對應之分析及槪述亦適用於第三實施例及第三實施例之第一改變，其中，移動物件之相位偵測精確度之提高大致與接近比率値I 5 / I 6可由低階非零整數之比率表示之相對精確度成比例，所有其他因素相同。等式（6 6 )亦構成一*項結論之基硬’即光源1及2 在第一較宜實施例之第一改變中無需相位鎖定。當在光源 1及2之相位鎖定需求上觀之，等式（6 6 )實爲一弱條件。考慮例如在量度氣體之折射率差（η 5 - 1 )或量度腳之光徑路長度由於氣體而改變上需要X 1 0— 6之精密度，相當於距離量度干涉計中約1 X 1 0 — 9之相對距離重度精密度 ’ （Π5 - 1) = 3x10 4及（Π6— ns) 二1 X 1 0 — 5。例如，由以光源頻率V 5及V 6分別取代波長λ 5及λ 6寫出之等式（6 6 )所表示之條件爲 3 X ΙΟ"11 v6 經濟部智慧財產局員工消費合作社印製在光譜之可見光部份中之光源波長及p 整數之情形，等式（9 2 )轉變爲條件《30 kHz (92) 之低階 (93) 等式（9 3 )中所表示之結果顯然爲在光源1及2之頻率上遠較相位鎖定條件爲小之限制條件。第三實施例及其第一及第二改變各構造具有微分平面鏡千涉計，使用光束偶數通過外部鏡系統9 0之量度徑路参紙張尺度適用中國國家標準（CNS)A4規格(210 X 297公釐）Ss 乂 Ί = SSS1 · (83) The superheterodyne signal S 5 X 7 is also composed of two sidebands, with suppressed carriers, and can be written as ^ 5x7 = * ^ 5x7 (84) where -80- this paper size Applicable to China National Standard (CNS) A4 specification (210 X 297 mm) ------------ Installation -------- Order ----- (Please read the note on the back first Please fill in this page again for matters) 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ______B7 V. Description of Invention (78) ^ 5x7 = 2 C0S (2tCV / + θ5χ7) / (85) * ^ 5x7 = One C〇S ( 2tc / ^ V Η ^ Φ5χ7), (86) θ5χ7 = (φ5 + Φ?), • (87) Φ5χ7-(φ5 ~ Φ7) · (88) Superheterodyne signal S 5 ^: 7 The two sidebands s and s [x6 ', one sideband has a frequency V and a phase θ5χ7, and the second sideband has a frequency F and a phase Φ5 × 7. In the next step, the electronic processor 1 0 9 3 B separates the sidebands S and S through high-pass and low-pass filtering or any similar technology to separate the two signals separated in frequency. For example, the electronic processor 1 〇 As described in the discussion of 9 3 Α, the frequency F of the lower frequency sideband of the superheterodyne signal S 5x7 is selected to be much smaller than the frequency V of the higher frequency band of the superheterodyne signal S 5 X 7. Simplify the separation of the processor 1093 A. The electronic processor 1009A also includes electronic processors 1 094F and 1 094G for the use of time-based phase detection, such as the Hilbert transform phase detector (see REBest above) ) Or the like, and the phases of the drivers 5 and 6 determine the phases θ5χ7 and Φ5χ7 0. Second, the phases θ5χ6 and θ5χ7 are processed analogously or digitally in the electronic processor 1 0 9 6 C, and should preferably be added together for digital processing and added by Divide by 2 'and phase Φ5χ6 and Φ5χ7 in the electronic processor 1 0 9 6 D by analog or digital processing, it is advisable to add the digital processing together and divide by 2 to apply Chinese National Standard (CNS) A4 respectively to this paper size Specifications (210 X 297 mm) ------------ equipment --- ----- Order --------- (Please read the note on the back? Matters before filling out this page) -81 477895 A7 B7 V. Description of the invention (79) Generates θ and φ. The form is common = (〇5χ6 + 〇5χ7) Φ ^ (Φ5χ6 + Φ5χ7) 2 Φ5 ($ 6 + Φ7) (89) (90) The Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs printed the attention self-equation (8 9) and (9 0) , Θ and Φ are not sensitive to the inclination and / or deflection of the mirrors 9 1 and 9 2 of the external mirror system 90, except for the higher order effects caused by the difference in the average time delay of the beams passing through different wavelengths. Outside the instantaneous change in tilt and / or deflection (see equation (7 4)), and is not sensitive to the thermal and mechanical disturbances that may occur in the interferometer beam splitting chamber and its associated light components due to the use of a differential plane mirror interferometer Electronic processor 10 9A, as shown in Figure 3g, contains electronic processor 10 9 4 A, which is used for the time-based phase-sensitive detection method. It should be determined digitally by the reference signal 101 or the like. The phase P 5 of the heterodyne signal s 5. The phases P 5, 3, and Φ are sent to the computer 1 1 0 in digital or analog format, preferably in digital format, and become the signal 1 0 5, Used to calculate (η 5 -1) and / or L. The refractive index of the gas (η 5-1) or the change in L due to the gas in the measuring path can be adjusted by the second change in the third embodiment, etc. (54), (56), (58), (59), (67), and (6 8) are obtained from other quantities, and have (91) L ---.------- equipment -------- Order --------- (Please read the precautions on the back before filling this page) -82- This paper size is applicable to China National Standard (CNS) A4 (210 x 297) (Mm) Printed by the Intellectual Property Bureau Employees Cooperative of the Ministry of Economic Affairs 477895 A7 ___B7__ V. Description of Invention (80) The rest of the discussion of the second modification of the third embodiment is the same as the corresponding part of the description mentioned in the third embodiment. The main advantages of the second modification of the third embodiment are the execution of important electronic processing steps, such as the decision to make at approximately the same frequency, at f 5 close to f 6, and the Doppler resulting from the translation of the mirror 9 2 of the external mirror system 90. The frequency shifts in s 5, s 6, and S 7 are approximately the same. The choice of the phases φ5χ6 and φ5χ7 on the frequencies of the upper heterodyne signals S 5, S 6, and s 7 is greatly reduced by having a significant difference in frequency difference. The possibility of different group delays encountered by the signal. The discussion of the effect of the group delay of the second modification of the third embodiment is the same as the corresponding part of the discussion of the third embodiment. The preferred second modification of the third embodiment of the present invention has been discussed in the previous paragraph, and the inherent advantages of the present invention will be made clearer by the following discussion. From the calculation of the refractive index difference of equation (5 5) and the calculation of the influence of the refractive index difference of the gas in the optical path of equation (4 ^ 6 2), it is clear that the phase θ and Φ determine the required accuracy and wave The numbers K and X are related. Because the frequency F can be much smaller than the frequency ν, and because it is usually easier to calculate the phase of lower frequency electronic signals with high resolution, it is usually best to rely on the highly accurate measurement of the sideband phase Φ obtained by superheterodyne . When the wave number K and X have an equation (6 4), this is easily achieved in the device of the present invention. Here, the refractive index difference is calculated by equation (5 5) or the light is calculated by equation (6 2). The influence of the refractive index difference of the gas on the path is almost completely independent of the sideband phase θ obtained by the superheterodyne. Moreover, the amplitude of the sideband phase Φ 'obtained by the superheterodyne is lower than the amplitude of the sideband phase 3 obtained by the superheterodyne, which is less affected by the approach represented by equation (6 5) (Π6 — Π5) / (Π6 + ΙΊ5) factor. This is _ ^ _ 83 This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) ---- * ------- installation -------- order-- ------- Hua (Please read the notes on the back before filling this page) 477895 A7 ______B7____ V. Description of the invention (81) Improve the accuracy of possible phase detection of moving objects, such as common in micro-plate equipment Encounter. Corresponding analysis and description are also applicable to the third embodiment and the first change of the third embodiment, in which the improvement of the phase detection accuracy of a moving object is approximately equal to the approach ratio 値 I 5 / I 6 may be a low-order non-zero The relative precision expressed by the ratio of the integers is proportional, all other factors being the same. Equation (6 6) also forms the basis of a * -term conclusion, that is, the light sources 1 and 2 do not require phase locking in the first modification of the first preferred embodiment. Looking at the phase lock requirements of light sources 1 and 2, equation (6 6) is really a weak condition. Considering, for example, the refractive index difference (η 5-1) of the measuring gas or the length of the optical path of the measuring foot due to the gas, a precision of X 1 0-6 is required, which is equivalent to about 1 X 1 0 in the distance measuring interferometer. — Relative distance severe precision of 9 '(Π5-1) = 3x10 4 and (Π6-ns) 2 1 X 1 0-5. For example, the condition represented by the equation (6 6) written with the light source frequencies V 5 and V 6 instead of the wavelengths λ 5 and λ 6 is 3 X ΙΟ " 11 v6. In the case of the light source wavelength and p integer in the visible part of the spectrum, equation (9 2) is transformed into the condition "30 kHz (92) lower order (93) equation (9 3). Light sources 1 and 2 are far less restrictive than the phase lock condition. The third embodiment and its first and second modifications each have a differential plane mirror perturbation meter, and use an even number of beams to pass through the external mirror system 90 to measure the path and paper parameters. The paper standards are applicable to China National Standard (CNS) A4 (210 X 297). Mm)

RA 1·---Ύ-------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（82) 9 8。由光束偶數通過微分平面鏡干涉計，離開量度腳之光束之傳播方向，及對應之離開基準腳之光束之傳播方向不受外部鏡系統9 0中任一鏡，尤其是鏡9 2之傾斜或偏向之影響，唯離開之光束之一對其他離開之光束有一些側方剪力。在距離量度干涉計中執行鏡9 2功能之元件產生等效平移，但並不產生等效傾斜或偏向之情形，第一實施例及其改變之微分平面鏡干涉計可構造具有偶或奇整數之 P 6，通常減少所需之通過數二次，同時保持第一實施例及其改變之特色。此減少所需通過數因數二可導致大爲簡化光學系統。例如，圖3 a - 3 e所示之微分平面鏡干涉計可由具有P5=2及p6 = 1之微分平面鏡干涉計取代，另保持第三實施例及其改變之特色，與更詳細顯示及說明於冋ί維有之待核定之美專利申請〇 9 / 2 3 2，5 1 5，題爲”量度氣體之本質光性質之裝置及方法”中有關第二實施例及其改變之微分平面鏡干涉計及隨帶之信號處理相似。如早前所述，以上申請書之內容例作參考。現參考圖4，此爲歸納之流程圖，經由方塊8 0 0 — 8 2 8顯示用以執行本發明方法之各種步驟，以量度及監視量度徑路中氣體之折射率差及/或量度徑路之光徑路長度由於氣體所引起之改變，其中，氣體之折射率差可改變及/或量度徑路之物理長度可改變。雖顯然，可執行圖4 所示之發明方法，而不使用上述本發明裝置，且精於本藝之人士明瞭，此亦可由所述以外之裝置執行。例如顯然，無需使用諸如較宜實施例中所用之干涉計，而是可使用其本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I,---’-------裝--------訂---------*5^^" (請先閱讀背面之注意事項再填寫本頁) -85- 477895 A7 B7 五、發明說明（83 ) (請先閱讀背面之注意事項再填寫本頁) 他普通干涉計裝置，只要有所需之基準及量度腳即可。而且顯然，可使用零差法或利用外差術之方法。且可進一步明瞭，圖4中之許多步驟可經由在通用電腦上運作之適當軟體執行，或適當程式之微處理器執行，任一可用以視需要控制系統之其他元件。如顯示於圖4，由方塊8 0 0開始，提供二或更多光束’具有不同之波長，此等宜具有約諧波關係，如前述。在方塊802，分離光束爲各部份，在方塊804中，此等宜由極化或空間碼，或頻率轉移或二者改變。在其他情形，光束可簡單不改變，並通過而至方塊8 0 6。如顯示於方塊8 2 2及8 2 4，可監視光束之波長及 /或波長之關係，且如其波長不在前所討論之限度內，貝[1 可採取改正措施，以補償波長之關係與波長或波長本身之所需關係之偏差。可使用該偏差提供反饋，以控制光速源之波長，或可建立改正，及用於其後受偏差影響之計算上，或可合倂執行二方法。經濟部智慧財產局員工消費合作社印製與方塊8 0 0中產生光束平行或同時，且如方塊 8 2 6所示，提供一位移量度干涉計，具有二腳，一基準腳及另一量度腳，其中，量度徑路之一部份在氣體中，其折射率差及/或對量度腳之光徑路長度之影響爲所欲量度者，以及一干涉計用於量度及監視選擇氣體之本質光特性〇如方塊8 0 6及8 0 8所示，前所產生之光束部份引進於各別干涉計腳中，俾每一部份依據其在移行通過其指本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（84) 定腳之物理長度中所遭遇之光徑路長度，轉移相位。在光束自方塊8 0 8出來後，此等在方塊8 1 0中合倂’以產生混合之光信號。此等混合之光信號然後發送至力塊8 1 2，在此，由光偵測產生對應之電信號，宜爲外 Μ ί言號，且此等電信號包含有關各光束部份間相位關係之資訊。電信號宜爲由前頻率轉移處理所產生之外差信號。在方塊8 1 4，可直接分析電信號，以取出相對相位資訊，然後可傳送此至方塊8 1 6 - 8 2 0，或產生超外差信號，且其後分折其相對相位資訊。在方塊8 1 6，宜由前有關較宜實施例之說明中所述之裝置及計算，解決零差，外差，及/或超外差中之任何相位模糊。在方塊8 1 8，補償循環誤差以及波長改正，如前所決定。在方塊8 2 0，計算氣體折射率差及/或氣體折射率差對量度徑路之光徑路長度之影響，並加改正，如前述，並產生輸出信號，供其後下游應用或資料格式需求。在此，本質光性質之改變或改變率如超出預定限度，可加以改變。最後，在方塊8 2 8，計算改正後之位移。精於本藝之人士可對本發明裝置及方法作其他改變，而不脫離本發明之範圍。故此，所示及所述之實施例意在例解，而無限制之意味。上述之干涉計可特別用於製版應用上（如槪要顯示於 6 7)，用以製造大型積體電路，諸如電腦晶片等。製片反 _ _- 87 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -1·---,-------籲裝--------訂----- (請先閱讀背面之注音？事項再填寫本頁) 477895 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（85) 爲半導體製造工業之主要技術驅動力。覆蓋改正爲向下至 1 〇〇 n m線寬度（設計尺度）及以下之最困難之五挑戰之一’例如閱，，半導體工業道路地圖”，第8 2頁， 1 9 7 7。覆蓋直接取決於性能，即用以定置晶片及網片 (或蔽罩）平台之距離量度干涉計之精確度及精密度。由於製版工具可產生產品之$ 5 0 - 1 Ο 0M/年，故自改良之性能距離量度干涉計可獲得巨大之經濟價値。製版工具每1 %之產出增加對積電路製造者產生約$ 1 M/年之經濟利益，並對製版工具之販賣者產生重大之競爭優勢。製版工具之功能在引導空間圖案射線於光阻劑塗層之晶片上。此處理包括決定晶片之何位置接受射線（對齊） ’並施加射線於光阻劑上該位置處（曝光）。爲適當定置晶片，晶片含有對劑標記在晶片上，此可由專用之感測器量度。所量得之對劑標記之位置界定晶片在工具內之位置。此資訊連同晶片表面上之所需圖案之規格引導晶片與空間圖案射線對齊。根據此資訊，支持光阻劑塗層之晶片之一可平移之平台移動晶片，俾射線使晶片之正確位置曝光。在曝光期間中，光線源照射圖案之網片，此分散射線，以產生空間圖案射線。網片亦稱爲蔽罩，且此二辭以下可交換使用。在縮小製版之情形，一縮小透鏡集合分散之射線，並形成網片圖案之一縮小之影像。或且，在接近印製之情形，分散之射線傳播一小距離（普通在微米階層），然後接觸晶片，以產生網片圖案之1 : 1影像。射線發 __ -88- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ------------裝--------訂----- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 477895 A7 ___B7_ 五、發明說明（86 ) 起光阻劑中之光化學處理，此變換射線圖案爲光阻劑內之隱性影像。上述干涉計系統爲定位機構之重要組成件，此控制晶片及網片之位置，並對準網片影像於晶片上。製版系統（亦稱爲曝光系統）普通包含一照射系統及一晶片定位系統。照射系統包含一射線源，用以提供射線，諸如紫外線，可見，X射線，電子，或離子射線，及一網片或蔽罩用以施加圖案於射線上，從而產生空間圖案之射線。而且，在縮小製版之情形，照射系統可包含一透鏡組件，用以使空間圖案之射線投影於晶片。投影之射線使晶片上所塗之光阻劑曝光。照射系統亦包含一蔽罩平台用以支持蔽罩，及一定位系統用以調整蔽罩平台與受引導通過蔽罩之射線之關係位置。晶片定位系統包含一晶片平台用以支持晶片，及一定位系統用以調整晶片平台與投影射線之關係位置。積體電路之製造可包含多個曝光步驟。有關製版之一般說明，參考例如J.R.Sheats及B.W.Smith之，，微製版術：科學及技術” （（M a r c e ID e k k e r公司，紐約， 1 9 9 9 )，其內容列作參考。上述之干涉計系統可用以精確量度每一晶片平台及蔽罩平台與曝光系統之其他組成件，諸如透鏡組件，射線源，或支持結構之關係位置。在此情形，干涉計系統可固定於一固定結構上，及量度物件固定於可移動元件上，諸如蔽罩及晶片平台之一。或且，情形可相反，以干涉計系統固定於可移動物件上，及量度物件固定於固定物件上。本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 89 产-------*^^裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7 五、發明說明（87) (請先閱讀背面之注意事項再填寫本頁) 更一般言之’干涉計系統可用以量度曝光系統之任一組成件與干涉計系統所固定處之曝光系統之任一其他組成件之關係位置，或由該等組成件之一支持，及量度物件由其他組成件固定或支持。圖5 a顯示製版掃描器6 〇〇之一例，使用干涉計系統6 2 6。干涉計系統用以精確量度曝光系統內晶片之位置。在此’平台6 2 2用以定置晶片與一曝光站之關係位置。掃描器6 0 0包含一框架6 0 2，此攜帶其他支持結構及此等結構上所攜帶之各種組成件。一曝光基座6 〇 4 具有一透鏡匣6 0 6裝於其頂上，其頂上裝一網片或蔽罩平台6 1 6，用以支持一網片或蔽罩。一定位系統由元件 6 1 7槪要表示，用以定置蔽罩與曝光站之關係位置。定位系統6 1 7可包含例如壓電轉換元件及對應之控制電子裝置。雖未包含於所述之實施例中，但亦可使用上述之一或更多干涉計系統，以精確量度蔽罩平台及其他可移動元件之位置，其位置在製造製版結構之過程中需精確監視（閱上述Sheats及Smith之”微製版技術：科學及技術”）。經濟部智慧財產局員工消費合作社印製曝光基座6 0 4下方懸吊一支持基座6 1 3，此攜帶晶片平台6 2 2。平台6 2 2包含一平面鏡，用以反射由干涉計6 2 6引導至平台之量度光束6 5 4。一定位系統由元件6 1 9槪要表示，用以定置平台6 2 2與干涉計系 •統6 2 6之關係位置。定位系統6 1 9可包含例如壓電變換元件及對應之控制電子電路。量度光束反射回至干涉計系統，此安裝於曝光基座6 0 4上。干涉計系統可包含前 -QO - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7RA 1 --- Ύ ------- install -------- order --------- (Please read the precautions on the back before filling out this page) 477895 Ministry of Economy Wisdom A7 B7 printed by the Property Cooperative Consumer Cooperative V. Invention Description (82) 9 8. Through the differential plane mirror interferometer from the even number of beams, the propagation direction of the beam leaving the measuring foot and the corresponding propagation direction of the beam leaving the reference foot are not affected by any of the mirrors in the external mirror system 90, especially the tilt or deflection of the mirror 92. The effect is that only one of the leaving beams has some side shearing force on the other leaving beams. In the distance measurement interferometer, the element performing the function of the mirror 9 2 has an equivalent translation, but does not produce an equivalent tilt or deflection. The differential planar mirror interferometer of the first embodiment and its modification can be constructed with an even or odd integer. P 6, usually reduces the number of passes required twice, while maintaining the characteristics of the first embodiment and its changes. This reduction in the required pass factor of two can result in a greatly simplified optical system. For example, the differential plane mirror interferometer shown in Figs. 3a-3e can be replaced by a differential plane mirror interferometer with P5 = 2 and p6 = 1, while maintaining the features of the third embodiment and its changes, and shown and explained in more detail in (2) The differential plane mirror interferometer related to the second embodiment and its modification in the "Apparatus and Method for Measuring the Essential Optical Properties of Gases" in the United States Patent Application 09/2 3 2,5 1 5 pending approval, and The accompanying signal processing is similar. As mentioned earlier, the contents of the above application are examples. Referring now to FIG. 4, this is a generalized flowchart showing the various steps for performing the method of the present invention through blocks 8 0—8 2 8 to measure and monitor the refractive index difference and / or the diameter of the gas in the path. The optical path length of the road is changed due to the gas, wherein the refractive index difference of the gas can be changed and / or the physical length of the measuring path can be changed. Although it is obvious that the method of the invention shown in FIG. 4 can be performed without using the above-mentioned device of the present invention, and those skilled in the art understand that this can also be performed by other devices than those described. For example, it is clear that it is not necessary to use an interferometer such as that used in the preferred embodiment, but that the paper size can be adapted to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) I, ---''---- --- Install -------- Order --------- * 5 ^^ " (Please read the notes on the back before filling this page) -85- 477895 A7 B7 V. Invention Instruction (83) (Please read the precautions on the back before filling this page) For ordinary interferometer devices, as long as the required reference and measuring feet are available. Obviously, homodyne or heterodyne can be used. It can be further understood that many of the steps in FIG. 4 can be performed by appropriate software running on a general-purpose computer, or by a microprocessor of an appropriate program, any of which can be used to control other components of the system as needed. As shown in Fig. 4, starting from block 800, two or more light beams' are provided with different wavelengths, and these should preferably have approximately harmonic relationships, as previously described. At block 802, the split beam is divided into parts. At block 804, these are preferably changed by polarization or spatial codes, or frequency shifting, or both. In other cases, the beam can simply be left unchanged and pass through to block 806. As shown in boxes 8 2 2 and 8 2 4, the wavelength and / or wavelength relationship of the beam can be monitored, and if the wavelength is not within the limits discussed previously, [1 can take corrective measures to compensate for the relationship between wavelength and wavelength Or the deviation of the desired relationship from the wavelength itself. This deviation can be used to provide feedback to control the wavelength of the light speed source, or corrections can be established and used in subsequent calculations affected by the deviation, or the two methods can be combined. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs in parallel with or simultaneously with the light beam generated in block 800, and as shown in block 8 26, a displacement measuring interferometer with two feet, a reference foot and another measuring foot is provided. Among them, a part of the measuring path is in the gas, the refractive index difference and / or the effect of the optical path length of the measuring foot is the desired measurement, and an interferometer is used to measure and monitor the nature of the selected gas Light characteristics: As shown in boxes 8 06 and 8 08, the previously generated light beams are introduced into the respective interferometer feet, and each part is based on its movement through its index. This paper applies Chinese national standards. (CNS) A4 specification (210 X 297 mm) 477895 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (84) The length of the optical path encountered in the physical length of the fixed leg, shifting the phase. After the light beam comes out of the block 8 0 8, these are combined in the block 8 1 0 to generate a mixed optical signal. These mixed optical signals are then sent to the force block 8 1 2, where the corresponding electrical signals are generated by light detection, which should be external signals, and these electrical signals include the phase relationship between the various beam parts. Information. The electrical signal should preferably be a heterodyne signal generated by a previous frequency transfer process. At block 8 1 4, the electrical signal can be directly analyzed to extract the relative phase information, and then this can be transmitted to block 8 1 6-8 2 0, or a superheterodyne signal can be generated, and then the relative phase information is divided. At block 8 1 6, any phase ambiguity in homodyne, heterodyne, and / or superheterodyne should preferably be resolved by the means and calculations described in the previous description of the preferred embodiment. At block 8 1 8, the cyclic errors and wavelength corrections are compensated as previously determined. At block 8 2 0, calculate the effect of the gas refractive index difference and / or the gas refractive index difference on the optical path length of the measurement path and add corrections, as described above, and generate an output signal for subsequent downstream applications or data formats demand. Here, if the change or change rate of the essential light property exceeds a predetermined limit, it can be changed. Finally, at block 8 2 8, calculate the corrected displacement. Those skilled in the art can make other changes to the device and method of the present invention without departing from the scope of the present invention. Therefore, the embodiments shown and described are intended to be illustrative and not limiting. The above-mentioned interferometers can be used in plate-making applications (such as those shown in Figure 6 and 7), used to manufacture large integrated circuits, such as computer chips. Production counter _ _- 87-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -1 · ---, ------- Appeal to install ------- -Order ----- (Please read the note on the back? Matters before filling out this page) 477895 Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention Description (85) is the main technical driving force for the semiconductor manufacturing industry . Coverage correction is one of the five most difficult five challenges down to 100nm line width (design scale) and below 'for example, reading, road map of the semiconductor industry,' page 82, 197 7. Coverage depends directly In terms of performance, that is, the accuracy and precision of the interferometer used to set the distance between the wafer and the mesh (or mask) platform. Since the plate-making tool can generate $ 5 0-1 0 0M / year, the self-improved The performance distance measurement interferometer can obtain a huge economic price. An increase of 1% of the output of a plate-making tool generates an economic benefit of about $ 1 M / year for the manufacturer of the circuit board and a significant competitive advantage for the seller of the plate-making tool. The function of the plate-making tool is to guide the spatial pattern rays on the photoresist-coated wafer. This process includes determining where the wafer is to receive the rays (alignment) and applying rays to that position on the photoresist (exposure). It is appropriate Set the wafer. The wafer contains a contrast agent mark on the wafer. This can be measured by a dedicated sensor. The position of the measured contrast agent mark defines the position of the wafer in the tool. This information together with the wafer table The specifications of the required pattern on the guide wafer are aligned with the spatial pattern rays. According to this information, one of the wafers supporting the photoresist coating can be moved by a translation platform, and the chirped rays expose the correct position of the wafer. During the exposure, The light source illuminates the patterned mesh, and the scattered rays are used to generate spatial pattern rays. The mesh is also called a mask, and the following two terms can be used interchangeably. In the case of reducing the plate making, a lens set is used to reduce scattered rays, Form a reduced image of one of the mesh patterns. Or, in the case of near printing, the scattered rays travel a small distance (usually at the micrometer level), and then contact the wafer to produce a 1: 1 image of the mesh pattern. Rays __ -88- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) ------------ Installation -------- Order --- -(Please read the precautions on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 ___B7_ V. Description of the invention (86) Photochemical treatment in photoresist. Recessive image in photoresist The above interferometer system is an important component of the positioning mechanism, which controls the position of the wafer and the mesh, and aligns the image of the mesh on the wafer. The plate-making system (also known as the exposure system) generally includes an irradiation system and a wafer positioning System. The illumination system includes a source of radiation to provide radiation, such as ultraviolet, visible, X-rays, electrons, or ion rays, and a mesh or mask to apply a pattern to the radiation to produce a spatially patterned ray. Moreover, in the case of reducing the plate making, the irradiation system may include a lens assembly for projecting the rays of the space pattern onto the wafer. The projected rays expose the photoresist applied on the wafer. The irradiation system also includes a mask platform To support the mask, and a positioning system to adjust the position of the relationship between the mask platform and the rays guided through the mask. The wafer positioning system includes a wafer platform to support the wafer, and a positioning system to adjust the position of the relationship between the wafer platform and the projection line. The fabrication of integrated circuits can include multiple exposure steps. For general instructions on plate making, refer to, for example, JRheats and BWSmith, Microplatemaking: Science and Technology "(M arce ID ekker, New York, 199 9), the contents of which are incorporated by reference. The above-mentioned interferometer The system can be used to accurately measure the position of each wafer platform and mask platform and other components of the exposure system, such as lens components, ray sources, or support structures. In this case, the interferometer system can be fixed to a fixed structure, And the measuring object is fixed on a movable element, such as one of the mask and the wafer platform. Or, the situation can be reversed, the interferometer system is fixed on the movable object, and the measuring object is fixed on the fixed object. This paper standard applies China National Standard (CNS) A4 Specification (210 X 297 mm) 89 Product ------- * ^^ Packing -------- Order --------- (Please read first Note on the back then fill in this page) 477895 A7 B7 V. Description of the invention (87) (Please read the notes on the back before filling out this page) More generally, the 'interferometer system can be used to measure any component of the exposure system With interferometer system The relational position of any other component of the exposure system here, or supported by one of these components, and the measurement object is fixed or supported by the other components. Figure 5a shows an example of a plate-making scanner 600, using interference Gauge system 6 2 6. The interferometer system is used to accurately measure the position of the wafer in the exposure system. Here the 'platform 6 2 2 is used to set the position of the relationship between the wafer and an exposure station. The scanner 6 0 0 includes a frame 6 0 2 This carries other supporting structures and various components carried on these structures. An exposure base 6 04 has a lens box 6 0 6 mounted on top, and a mesh or mask platform 6 6 is mounted on the top. To support a mesh or mask. A positioning system is indicated by the element 6 1 7 to set the position of the relationship between the mask and the exposure station. The positioning system 6 1 7 may include, for example, a piezoelectric conversion element and a corresponding Control electronics. Although not included in the described embodiment, one or more of the above interferometer systems can also be used to accurately measure the positions of the mask platform and other movable components, which are in the position where the plate-making structure is manufactured. process Need to be monitored accurately (see "Microplate Technology: Science and Technology" by Sheats and Smith above). The Consumers Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs has printed an exposure base 6 0 4 and a support base 6 1 3 is suspended below. This carry Wafer platform 6 2 2. The platform 6 2 2 includes a flat mirror to reflect the measuring beam 6 5 4 guided to the platform by the interferometer 6 2 6. A positioning system is indicated by the element 6 1 9 and is used to position the platform 6 The position of the relationship between 2 2 and the interferometer system 6 2 6. The positioning system 6 1 9 may include, for example, a piezoelectric conversion element and a corresponding control electronic circuit. The measuring beam is reflected back to the interferometer system, which is mounted on the exposure base 604. Interferometer system can include front -QO-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) A7

477895 五、發明說明（88) 述之任一實施例。在操作之期間中，一射線束6 1 〇，例如來自u V雷射（未顯示）之一紫外（U V )線束通過一線束整形光組件6 1 2 ’並由鏡6 1 4反射後，向下移行。其後，射線束通過由蔽罩平台6 16所攜帶之蔽罩（未顯示）。蔽罩 (未顯示）經由透鏡匣6 0 6中所攜帶之透鏡組件6 〇 8 ί又w於晶片平台6 2 2之晶片（未顯示）上。基座6〇4 及由其支持之各種組成件由彈簧6 2 〇所示之阻尼系統與環境掁動隔離。在製版掃描器之其他實施例中，可使用一或更多上述干涉計系統，以量度例如，但不限於晶片及網片（或蔽罩 )平台之所屬多個軸線上之距離及角度。而且，除U V電射線束外’及他射線束亦可用以曝光晶片，例如X射線束，·電子束’離子束，及可見光束。而且，製版掃描器可包含一柱基準，其中，干涉計系統6 2 6引導基準光束至透鏡匣6 〇 6或其他結構，此引導射線束，而非干涉計系統內之基準徑路。由干涉計系統 6 2 6所產生之干涉信號當與由平台6 2 2所反射之量度光束6 5 4及由透鏡匣6 0 6所反射之基準光束合倂時，指示平台與射線束關係位置之改變。而且，在其他實施例中，可設置干涉計系統6 2 6，用以量度網片（或蔽罩）平台6 1 6或掃描系統之其他可移動組成件之位置之改變。最後，除掃描器外’干涉計系統可同樣用於製版系統上，包括步進器。 ^91 - ------------裝--------訂--------- C請先閱讀背面之注音？事項再填寫本頁) 經濟部智慧財產局員工消費合作社印制衣本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 經濟部智慧財產局員工消費合作社印製 A7 B7_____ 五、發明說明（89) 如本藝中所熟悉’製版術爲用以製造半導體裝置之製造方法之一重要部份。例如，美專利5，4 8 3，3 4 3 號槪述此製造方法之步驟。以下參考圖5 b及5 c，說明此等步驟。圖5 b爲製造半導體裝置，諸如半導體晶片（例如I C或L S I )，液晶板，或C C D之順序之流程圖。步驟6 5 1爲設計處理，用以設計半導體裝置之電路。步驟6 5 2爲用以根據電路圖案設計，製造蔽罩之處理。步驟6 5 3爲用以製造晶片之處理，使用諸如砂材料。步驟6 5 4爲晶片處理，此稱爲預處理，其中，由使用如此製備之蔽罩及晶片，經由製版術構製電路於晶片上。步驟6 5 5爲組合步驟，此稱爲後處理，其中，由步驟 6 5 4處理之晶片構製成半導體晶片。此步驟包含組合（切粒及黏合）及包裝（晶片密封）。步驟6 5 6爲檢驗步驟’其中，對由步驟6 5 5所製成之半導體裝置執行可操作檢查，耐用性檢查等。由此等處理，完成半導體裝置，並裝運（步驟657)。圖5 c爲流程圖，顯示晶片處理之詳細。步驟6 6 1 爲氧化處理，用以氧化晶片之表面。步驟6 6 2爲C V D 處理，用以製造絕緣薄膜於晶片表面上。步驟6 6 3爲電極形成處理，用以由蒸氣沉積製造電極於晶片上。步驟 6 6 4爲離子植入處理，用以植入離子於晶片中。步驟 6 6 5爲光阻劑處理，用以施敷光阻劑（感光材料）於晶片上。步驟6 6 6爲曝光處理，用以經由上述之曝光裝置，由曝光印製蔽罩之電路圖案於晶片上。步驟6 6 7爲顯本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） —*-------^^^裝--------訂—— (請先閱讀背面之注意事項再填寫本頁) -92 - 經濟部智慧財產局員工消費合作社印製 477895 A7 _ B7 五、發明說明（9〇) 影處理，用於使曝光之晶片顯影。步驟6 6 8爲蝕刻處理 ’用以移去顯影之光阻劑影像以外之部份。步驟6 6 9爲光阻劑分離處理，用以分離接受鈾刻處理後之晶片上餘留之光阻劑材料。由重覆此等處理，構製並重疊電路圖案於晶片上。上述之干涉計系統亦可使用於其他應用上，其中需精確量度物件之關係位置。例如，在寫入光束，諸如雷射， X射線’離子，或電子束在基體或射線束移動時，標記一圖案於基體上之應用中，可使用干涉計系統來量度基體及寫入光束間之相對移動。例如’一槪要之光束寫入系統7 0 0顯。示於圖6。一光源7 1 0產生一寫入光束7 1 2，及一光束聚焦組件 7 1 4引導射線束至由可移動平台7 1 8所支持之基體 7 1 6上。爲決定平台之相對位置，一干涉計系統7 2 〇引導一基準光束7 2 2至光束聚焦組件7 1 4上所置之一鏡7 2 4，及一量度光束7 2 6至平台7 1 8上所裝之一鏡7 2 8。干涉計系統7 2 0可爲前述之任一干涉計系統。由干涉rf系統所量得之位置之改變相當於寫入光束 7 1 2在基體7 1 6上之相對位置之改變。干涉計系統 720發送一量度信號732至控制器730，此指示基體7 1 6上寫入光束7 1 2之相對位置。控制器7 3 〇發送一輸出信號7 3 4至一基座7 3 6，此支持及定置平台 7 1 8。而且，控制器7 3 0發送一信號7 3 8至光源 7 1 0，以改變寫入光束之強度或遮斷寫入光束7 ]_ 2，本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I.---,-------裝--------訂--------- ΜΨ (請先閱讀背面之注意事項再填寫本頁) 477895 A7 B7 五、發明說明（91) (請先閱讀背面之注意事項再填寫本頁) 俾寫入光束以充足之強度接觸基體，使基體之僅所選位置處引起光物理或光化學改變。而且，在一些實施例，控制器7 3 0可例如使用信號7 4 4，使光束聚焦組件7 1 4 掃描寫入光束於基體之一區域上。結果，控制器7 3 0引導系統之其他組成件，以製作圖案於基體上。該圖案製造普通係根據控制器中所儲存之電子設計圖案。在一些應用上，寫入光束製作基體上所塗敷之光阻劑圖案，及在其他應用中，寫入光束直接構製基體圖案，例如蝕刻基體。此一系統之一重要應用爲製造蔽罩及網片，使用於上述之製版方法中。例如，在製造製版蔽罩時，可使用電子束製造鉻塗層之玻璃基體之圖案。在寫入光束爲電子束之情形，光束寫入系統包圍在真空中之電子束徑路。而且，在寫入光束例如爲電子或離子束之情形，光束聚焦組件包含電場產生器，諸如四極透鏡，用以在真空下聚焦及引導電荷微粒於基體上。在寫入光束爲射線束，例如X射線， U V，或可見射線之情形，射線束聚焦組件包含對應之光學裝置，用以聚焦及引導射線至基體。經濟部智慧財產局員工消費合作社印製本發明可作另外其他改變。例如，在一些應用上，可能需要監視干涉計之二基準及量度腳上所含之氣體之折射率。其例包括干涉計之熟悉之柱基準式樣，其中，基準腳包含一目標光學裝置置於機械系統內之一位置處，及量度腳包含一目標光學裝置置於同一機械系統內之一不同位置處。另一應用實例係有關小角度之量度，爲此，量度及基準二光束撞擊於同一目標光學裝置上，但在小物理偏置上 ----- QA __ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 477895 A7 B7__ 五、發明說明（92) (請先閱讀背面之注意事項再填寫本頁) ’從而提供目標光學裝置之角度朝向之靈敏度量度。此等應用及構造爲精於本藝之人士所熟悉，且所需之修改應在本發明之範圍內。經濟部智慧財產局員工消費合作社印製在外差干涉計中達成對Doppler頻移大致不敏感之另外其他裝置在追蹤Doppler頻移，並由以下任一補償（1 )調整基準及量度光束間之頻率差，（2)調整電子A/D模組之一或二者之時脈頻率，或（3 )由主動調整驅動或偵測電子裝置，連續匹配二波長之視在外差拍頻之任何類似裝置。可用於本發明裝置中且使用第二諧波產生（S H G )技術之位移量度干涉計之其他實例包括發給Akiralshida 之美專利4，9 4 8，2 5 4號，發給StevenA.Lis之 5，404，222及5，537，209,發給 philipHenshaw 之 5，5 4 3，9 1 4，發給 JunKawakami 之 5，7 5 7，4 8 9，及發給 HitohsiKawai 等之 5，748，315 及 5，767，489 號，所有此等列作參考。可用於本發明裝置中且含有用以補償Doppler頻移基準之裝置之位移干涉計之另外實例可爲同待核定之同擁有之美專利申請書09/252，266及 09?252，440 號，二者於 1999 年 2 月 18 曰提出，並例作參考。應明瞭雖已說明本發明連同其詳細說明，但以上說明意在例解，而非限制本發明之範圍，此由後附之申請專利之範圍界定。 ----- QR -__ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）477895 V. Any one of the embodiments described in the description of the invention (88). During operation, a ray beam 6 1 0, such as an ultraviolet (UV) beam from a u V laser (not shown), passes through a beam shaping light assembly 6 1 2 ′ and is reflected by a mirror 6 1 4. Move down. Thereafter, the beam of rays passes through a mask (not shown) carried by a mask platform 6 16. A mask (not shown) passes through the lens assembly 6 0 8 carried in the lens box 6 06 on a wafer (not shown) of the wafer platform 6 2 2. The base 604 and the various components supported by it are automatically isolated from the environment by a damping system shown by a spring 620. In other embodiments of the plate making scanner, one or more of the above-mentioned interferometer systems may be used to measure, for example, but not limited to, distances and angles on multiple axes of the wafer and mesh (or mask) platform. Moreover, in addition to the UV beam, the 'and other beams can also be used to expose wafers, such as X-ray beams, electron beams, ion beams, and visible beams. Moreover, the plate-making scanner may include a column datum, in which the interferometer system 6 2 6 guides the reference beam to a lens box 6 06 or other structure, which guides the beam of rays instead of the reference path in the interferometer system. When the interference signal generated by the interferometer system 6 2 6 is combined with the measurement beam 6 5 4 reflected by the platform 6 2 2 and the reference beam reflected by the lens box 6 0 6, it indicates the position of the relationship between the platform and the beam. The change. Moreover, in other embodiments, an interferometer system 6 2 6 may be provided to measure changes in the position of the mesh (or mask) platform 6 1 6 or other movable components of the scanning system. Finally, interferometer systems other than scanners can be used on plate-making systems, including steppers. ^ 91------------- install -------- order --------- CPlease read the phonetic on the back first? Please fill in this page again.) The printed paper size of the employee's consumer cooperative in the Intellectual Property Bureau of the Ministry of Economic Affairs applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). Description of the Invention (89) As is familiar in the art, 'platemaking' is an important part of the manufacturing method used to manufacture semiconductor devices. For example, U.S. Patent No. 5,4 8 3,3 4 3 describes the steps of this manufacturing method. These steps are described below with reference to Figs. 5b and 5c. FIG. 5b is a flowchart of a sequence of manufacturing a semiconductor device, such as a semiconductor wafer (eg, IC or L S I), a liquid crystal panel, or C C D. Step 6 51 is a design process for designing a circuit of a semiconductor device. Step 6 5 2 is a process for manufacturing a mask according to the circuit pattern design. Step 6 5 3 is a process for manufacturing a wafer, using a material such as sand. Step 6 54 is wafer processing, and this is called pre-processing, in which a circuit is fabricated on the wafer by using the mask and the wafer thus prepared, through plate-making. Step 6 5 5 is a combination step, which is called post-processing, in which a semiconductor wafer is formed from the wafer processed in step 6 5 4. This step consists of combining (cutting and bonding) and packaging (wafer sealing). Step 6 5 6 is an inspection step ', in which an operation check, a durability check, and the like are performed on the semiconductor device manufactured in step 6 5 5. With these processes, the semiconductor device is completed and shipped (step 657). Figure 5c is a flowchart showing the details of wafer processing. Step 6 6 1 is an oxidation treatment to oxidize the surface of the wafer. Step 6 6 2 is a C V D process for manufacturing an insulating film on the surface of the wafer. Step 6 6 3 is an electrode formation process for manufacturing an electrode on a wafer by vapor deposition. Step 6 64 is an ion implantation process for implanting ions into the wafer. Step 6 6 5 is a photoresist treatment for applying a photoresist (photosensitive material) to the wafer. Step 6 6 is an exposure process for printing the circuit pattern of the mask on the wafer through the exposure device described above. Step 6 6 7 is the size of the paper. Applicable to China National Standard (CNS) A4 (210 X 297 mm) — * ------- ^^^ Installation -------- Order—— ( Please read the precautions on the back before filling this page) -92-Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A7 _ B7 V. Description of the invention (9〇) Photo processing for developing exposed wafers. Step 6 6 8 is an etching process ′ to remove a part other than the developed photoresist image. Step 6 6 9 is a photoresist separation process for separating the photoresist material remaining on the wafer after the uranium etching process. By repeating these processes, a circuit pattern is formed and superimposed on the wafer. The above-mentioned interferometer system can also be used in other applications, in which the relationship between objects needs to be accurately measured. For example, in applications where a writing beam, such as a laser, X-ray 'ion, or an electron beam moves on a substrate or a ray beam, marks a pattern on the substrate, an interferometer system can be used to measure the substrate and write between the beams. Relative movement. For example, a 'required beam writing system 700 display. Shown in Figure 6. A light source 7 1 0 generates a writing beam 7 1 2 and a beam focusing assembly 7 1 4 directs the beam of rays onto a substrate 7 1 6 supported by a movable platform 7 1 8. To determine the relative position of the platform, an interferometer system 7 2 0 guides a reference beam 7 2 2 to a mirror 7 2 4 placed on the beam focusing assembly 7 1 4 and a measuring beam 7 2 6 to the platform 7 1 8 One of the mounted mirrors 7 2 8. The interferometer system 7 2 0 may be any of the foregoing interferometer systems. The change in the position measured by the interference rf system is equivalent to the change in the relative position of the writing beam 7 1 2 on the substrate 7 1 6. The interferometer system 720 sends a measurement signal 732 to the controller 730, which indicates the relative position of the writing beam 7 1 2 on the substrate 7 1 6. The controller 7 3 0 sends an output signal 7 3 4 to a base 7 3 6 to support and set the platform 7 1 8. In addition, the controller 7 3 sends a signal 7 3 8 to the light source 7 1 0 to change the intensity of the writing beam or block the writing beam 7] _ 2. This paper size applies the Chinese National Standard (CNS) A4 specification ( 210 X 297 mm) I .---, ------- install -------- order --------- ΜΨ (Please read the precautions on the back before filling in this (Page) 477895 A7 B7 V. Description of the invention (91) (Please read the precautions on the back before filling this page) 俾 The writing beam contacts the substrate with sufficient intensity, so that only the selected location of the substrate causes photophysics or photochemistry change. Moreover, in some embodiments, the controller 7 30 can, for example, use the signal 7 4 4 to cause the beam focusing component 7 1 4 to scan the writing beam on an area of the substrate. As a result, the controller 730 guides the other components of the system to make a pattern on the substrate. The design of this pattern is usually based on the electronic design pattern stored in the controller. In some applications, the writing beam creates a photoresist pattern coated on the substrate, and in other applications, the writing beam directly forms the substrate pattern, such as etching the substrate. One of the important applications of this system is the manufacture of masks and nets, which are used in the above-mentioned plate making methods. For example, in the manufacture of plate-making masks, a pattern of a chrome-coated glass substrate can be made using an electron beam. In the case where the writing beam is an electron beam, the beam writing system surrounds an electron beam path in a vacuum. Moreover, in the case where the writing beam is, for example, an electron or ion beam, the beam focusing component includes an electric field generator, such as a quadrupole lens, to focus and guide the charged particles on the substrate under vacuum. In the case where the writing beam is a ray beam, such as X-ray, UV, or visible rays, the ray beam focusing component includes a corresponding optical device for focusing and guiding the ray to the substrate. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economics The present invention may be modified in other ways. For example, in some applications it may be necessary to monitor the interferometer reference and measure the refractive index of the gas contained in the foot. Examples include familiar pillar reference patterns for interferometers, where the reference foot includes a target optical device placed at a location in a mechanical system, and the measuring foot includes a target optical device placed at a different location in the same mechanical system. . Another application is related to the measurement of small angles. To this end, the measurement and the reference two beams collide on the same target optical device, but at a small physical offset ----- QA __ This paper standard applies to the Chinese National Standard ) A4 specification (210 X 297 mm) 477895 A7 B7__ V. Description of the invention (92) (Please read the precautions on the back before filling this page) 'This provides a measure of the sensitivity of the angle of the target optical device. Such applications and configurations are familiar to those skilled in the art, and the required modifications should be within the scope of the invention. The Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed in the heterodyne interferometer to achieve the Doppler frequency shift. Other devices are tracking the Doppler frequency shift, and any of the following compensations (1) are used to adjust the frequency of the reference and measurement beam Poor, (2) adjust the clock frequency of one or both of the electronic A / D modules, or (3) any similar device that actively drives or detects the electronic device to continuously match the apparent external differential beat frequency of two wavelengths . Other examples of displacement measurement interferometers that can be used in the device of the present invention and use the second harmonic generation (SHG) technique include US Patent No. 4,9 4 8, 2 5 4 issued to Akiralshida, and issued to Steven A. Lis No. 5, 404,222 and 5,537,209, to philipHenshaw 5,5 4 3,9 1 4, to JunKawakami, 5,7 5 7,4 8 9 and to HitohsiKawai, etc. 5,748,315 and No. 5,767,489, all of which are listed for reference. Another example of a displacement interferometer that can be used in the device of the present invention and contains a device to compensate for the Doppler frequency shift reference can be the US patent applications 09 / 252,266 and 09? 252,440, which are also owned and subject to approval The author put it forward on February 18, 1999, and used it as an example. It should be understood that although the present invention has been described with its detailed description, the above description is intended to be illustrative, and not to limit the scope of the invention, which is defined by the scope of the appended patents. ----- QR -__ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

Claims

Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A8 B8 C8 D8 6. Scope of patent application 1. A gas-insensitive interferometer device for measuring physical displacement. The interferometer device includes: a generating device for generating at least two light beams having different wavelengths; an interferometer having at least one measuring foot arranged to have The variable physical displacement of the measurement is simultaneously occupied by the air, and is suitable for receiving the beam and generating non-local quality information, which varies with the length of the optical path and the instantaneous column density of the gas in the measurement foot; the monitoring device, It is used to determine the essential optical properties of the gas in the foot, and generates a monitoring signal indicating the essential optical properties; and an electronic device for receiving non-intrinsic quality information and monitoring signals, and based on the non-essential information and the essential optical properties of the gas The actual physical displacement in the measuring foot is determined by roughly compensating for the presence of gas in the measuring foot. 2 . The interferometer equipment according to item 1 of the scope of patent application, wherein the interferometer includes an amplitude splitting interferometer. 3. The interferometer equipment according to item 2 of the scope of patent application, wherein the amplitude splitting interferometer further comprises: a reference pin; a dividing device for dividing the light beam and guiding at least a part of the two along the reference and measuring foot The two move to generate an exiting beam, which contains information about the lengths of the individual optical paths at these wavelengths through the reference and measuring feet; a combining device to combine those that have been moved along the reference and measuring feet The exiting beam to generate a mixed light signal contains information equivalent to the phase difference between the exiting beams, which is based on the change in the optical path experienced by each of the two wavelengths while traveling along the reference and measurement feet. This paper size applies to China National Standard (CNS) A4 (210 x 297 mm). gQ. I --------------------- Order · -------- (Please read the notes on the back before filling this page) 477895 Α8 Β8 C8 D8 t.Scope of patent application 4. The interferometer equipment described in item 3 of the scope of the patent application, further includes a device for detecting a mixed optical signal and generating an electrical interference signal, which includes the refractive index of the gas at different wavelengths of the beam and the gas occupied by the gas The impact of the physical path length of the reference and measuring feet is comparable. 5 · The interferometer equipment described in item 4 of the scope of the patent application, also contains electronic devices to analyze the electrical interference signals, extract the non-essential information from it, and combine it with the essential information to determine the displacement. 6 · The interferometer equipment according to item 2 of the scope of patent application, wherein the amplitude splitting interferometer is selected from a group of interferometer forms, including Michelson, Mach-Zehnder, plane mirror, differential plane mirror, and angle compensation. 7 · The interferometer equipment as described in item 1 of the scope of the patent application, further comprising a device for doubling the frequency of one of the beams of one wavelength to generate the second of the beams on the other wavelength. 8 · The interferometer equipment described in item 1 of the scope of the patent application, further including a device for doubling the frequency of leaving at least one of the beams, and then combining the leaving beams to generate a mixed optical signal. 9 · The interferometer equipment described in item 1 of the scope of patent application, wherein the electronic device structure determines the intrinsic light properties and the reciprocal dispersion rate of the gas Γ, such as: Γ = [^ ι (λι) " 1] and ["3 (λ3)-" 2 (into 2)] 'λΐ, λ2, and λ3 are wavelengths, and Πΐ, Γΐ2, and Γ13 are refractive indices, and the denominator can be expressed by [η3 (λ3) —ni (λ! )] Or [η 2 (λ 2)-η i (λ i)]. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) _ 97-(Please read the precautions on the back before filling this page) Order --------- Line j Ministry of Economy Wisdom Printed by the Consumers 'Cooperative of the Property Bureau Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A8 B8 C8 D8 The interferometer equipment described in item 1 of the scope of the patent application, wherein the electronic device is structured to determine the difference in refractive index of the gas corresponding to the wavelength of each beam. 1 1. The interferometer equipment as described in item 1 of the scope of the patent application, wherein the electronic device is structured and arranged to calculate the intrinsic light properties, the reciprocal dispersion rate Γ, $ 口: _ [”/ (人 /)-1] _t where [^ + ι (λ; + ι) ~ ~ i and j are integers equivalent to the wavelength. 1 2. The interferometer equipment described in item 1 of the scope of the patent application, wherein the electronic device structure determines the relative refractive index difference at different beam wavelengths of the essential optical property, wherein the form of the relative refractive index difference is: λ, · -1 Among them, 1 and j are integers equivalent to the wavelength, and are not the same. 1 3 · The interferometer equipment as described in item 1 of the patent application scope, wherein the electronic device further includes a device for compensating the measurement of Cyclic errors in non-essential information equivalent to gas dispersion (η-nai), where i and j are integers equivalent to wavelengths and are not the same. 1 4 · Interferometer as described in item 1 of the scope of patent applications Equipment, wherein the electronic device further includes a device 'for compensating a cyclic error in at least one of the electrical interference signals. 1 5. The interferometer equipment described in item 1 of the scope of patent application, wherein the electronic device further includes a device for compensating for the existence of non-essential information. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 public Θ ~ -98- " -------------- clothing -------- order --------- line (please read the precautions on the back before filling in this (Page) 477895 A8 B8 C8 D8 t. The cyclic error equivalent to the dispersion (η λ j — η λ i) of the gas in the foot of the patent application range, where i and j are integers equivalent to the wavelength and are not the same, and In at least one of the electrical interference signals. 16 · The interferometer equipment as described in item 15 of the scope of patent application, further comprising a device for measuring the wavelength accuracy and generating the wavelength accuracy signal indicated by it. 1 7 · The interferometer equipment as described in item 16 of the scope of patent application, wherein the electronic device further includes a device for receiving a wavelength accuracy signal and using its chirp to determine the actual physical displacement. 1 8 · As a patent application The interferometer equipment described in item 16 of the scope, which additionally includes a wavelength correction device for receiving Wavelength accuracy signal and generating a control signal to adjust the device for generating the light beam, whose wavelength is within a predetermined accuracy limit. 1 9 · The interferometer equipment according to item 1 of the scope of patent application, wherein, The interferometer further comprises: a reference foot, and a light beam steering element having a light beam steering element, and a positioning system for orienting the light beam steering element. The light beam steering element arranges a guide and a measuring foot to which it belongs, and is in contact with the light beam steering element. At least one of the reference and measuring beam, and a control circuit, during operation, this causes the positioning system to respond to changes in the angular orientation and position of the measuring object and redirects the beam manipulation element. 2. The interferometer equipment as described in item 1 of the scope of patent application, wherein the wavelengths of the light beams have a relationship close to the harmonics, and the approximate harmonics are related to the paper size of the Chinese National Standard (CNS) A4 (210 X 297 mm ) 99-(Please read the notes on the back before filling out this page) ------- Order --- I ------. Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A8 B8 C8 D8 VI. The scope of patent application is expressed as a series of ratios, each ratio is composed of one of low-order non-zero integers. 2 1 · The interferometer equipment as described in item 20 of the scope of the patent application, wherein the 'interferometer contains a device for passing the light beam at least along the measuring foot multiple times. Here, the number of times the light beam passes has a harmonic relationship. This is roughly the same as the approximate harmonic relationship between wavelengths. 2 2 · The interferometer equipment as described in item 21 of the scope of patent application, wherein the device for generating at least two light beams further comprises a device for generating an orthogonally polarized portion of each light beam. 2 3 · The interferometer equipment as described in item 22 of the scope of the patent application, further comprising a device for separating the beams into pairs of orthogonally polarized parts of the same wavelength. 2 4 · The interferometer equipment as described in item 23 of the scope of patent application, in addition, it contains a device for spatially separating each pair of orthogonally polarized parts for subsequent downstream use in the interferometer device. 25. The interferometer equipment as described in item 20 of the scope of patent application, wherein the relative accuracy of the wavelength relationship expressed by the ratio of the column is at or below the dispersion (η 2 — ni) of the refractive index of the gas Amplitude order, where η 1 and η 2 are the refractive index of the gas at different wavelengths multiplied by the relative accuracy ε, and need to be used to measure the refractive index difference (ni-1) of the gas or the difference in the optical path length of the foot Changes caused by gases. 2 6 · The interferometer equipment as described in Item 25 of the scope of patent application, and additionally contains a device to monitor the relative accuracy of the close harmonic relationship represented by the ratio of the column. This paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm)-100- (Please read the phonetic on the back? Matters before filling this page) W * 衣 -------- Order --------- Line 'Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed 477895 A8 B8 C8 D8 6. Application for Patent Scope 2 7 The interferometer equipment described in item 5 additionally contains a device that can reflect the relative accuracy of the device to monitor the near-harmonic relationship 'for providing a feedback signal to control the device used to generate the beam' 'near the harmonic relationship' The relative accuracy is at or below the dispersion of the refractive index of the gas multiplied by the relative accuracy ε. It is used to measure the refractive index difference (ni-1) of the gas or the difference in the optical path length of the measuring feet caused by the gas. 〇 2 8. The interferometer equipment described in item 4 of the scope of the patent application, further includes a device for introducing a frequency difference between at least the first and second parts of each beam to generate a set of frequency-shifted beams. No two beams in the group of frequency-shifted beams have the same frequency. 2 9. The interferometer equipment according to item 28 of the scope of patent application, wherein the electrical interference signal includes a heterodyne electrical signal. 3 0. The interferometer equipment as described in item 4 of the scope of patent application, wherein the electronic device further includes a device for receiving an electrical interference signal and directly extracting phase information corresponding to the optical nature of the selected nature of the gas therefrom. 3 1. The interferometer equipment described in item 1 of the scope of patent application, wherein different wavelengths have a close mutual harmonic relationship, and the close mutual harmonic relationship is represented by a list of ratios, each ratio being constituted by a low-order non-zero integer ratio. 3 2 · The interferometer equipment as described in item 31 of the scope of the patent application, wherein the electronic device further includes a phase analysis device 'for receiving an electrical interference signal and generating an initial electrical phase signal. The influence of the refractive index and the physical path length of the measuring foot occupied by the gas The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -101-丨 ^ -------- --- Cloths -------- Order --------- Line «(Please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Consumer Cooperatives 477895 A8 B8 C8 D8 6. Information on the scope of patent application and its change rate. 3 3 · The interferometer equipment as described in item 32 of the scope of patent application, wherein 'the electronic device further includes a multiplication device for multiplying the initial phase signal by a factor multiple proportional to the wavelength to generate a modified Phase signal. 3 4 · The interferometer equipment described in item 1 of the scope of patent application, wherein the interferometer has a reference foot, which is structured and arranged together with the measuring foot, and the light beam on one of the beam wavelengths follows a predetermined optical path The number of times of passing through at least one of the reference and second measuring feet is different from that of the light beam at other wavelengths to compensate for the relative change rate of the physical path length of the reference and second measuring feet. The interferometer device according to item 1, wherein the wavelengths of the light beams have a relationship close to each other, and the close harmonic relationship is represented by a column ratio ratio, and each ratio is composed of one ratio of a low-order non-zero integer. 3 6 · The interferometer equipment as described in item 35 of the scope of patent application, wherein the interferometer contains a device for making the light beam to pass through at least one measuring foot multiple times. Here, the number of times the light beam passes has a harmonic relationship. This is roughly the same as the approximate harmonic relationship between wavelengths. 3 7 · The interferometer equipment described in item 1 of the scope of patent application, further comprising a micro-plate making device, which is operatively related to the interferometer equipment and used to manufacture integrated circuits on a wafer. The micro-plate making device includes: at least A platform; an illumination system for projecting pattern rays on the wafer in space; and this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) _moving · 'I ------ ---------- Clothing -------- Order ---------- Line (Please read the precautions on the back before filling this page) 477895 A8 B8 C8 D8 VI The scope of patent application is at least one positioning system for adjusting the position of the at least one platform; wherein the interferometer equipment is suitable for measuring the position of the at least one platform. 3 8 · The interferometer equipment described in item 1 of the scope of patent application, further comprising a micro-plate making device, which is operatively related to the interferometer equipment and used to manufacture integrated circuits on a wafer. The micro-plate making device includes: at least A platform to support a wafer; an irradiation system including a ray source, a mask, a positioning system, a lens assembly, and a predetermined portion of an interferometer device, the microplate-making device is operable, and a chirped light source guides the rays Through the mask to generate space pattern rays, the positioning system adjusts the position of the relationship between the mask and the light source rays, the lens component projects the image of the space pattern rays on the wafer, and the interferometer equipment measures the position of the relationship between the mask and the light source rays. 3 9 · The interferometer equipment as described in item 1 of the scope of the patent application, further comprising a beam writing system 'operating with the interferometer equipment to manufacture a plate-making mask, the beam writing system includes: a light source 'For providing a writing beam to project a pattern on the substrate; at least one platform to support the substrate; a beam guiding component' for transmitting the writing beam to the substrate; and a positioning system for positioning the at least one The interrelated position of the platform and the beam guiding component, the interferometer equipment is adapted to measure the position of the relationship between the at least one platform and the beam guiding component. 4 0 · The interferometer equipment described in item 1 of the scope of the patent application, used to determine the proximity of the measuring device to the interferometer's measuring feet. (Please read the notes on the back before filling this page) -------- Order --------- line. Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) -103- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 477895 A8 B8 C8 ____D8 Scope of patent 4 1 · The interferometer equipment described in item 1 of the scope of patent application, the monitoring device used to determine the nature of the light is set close to the reference foot of the interferometer upstream 俾 Before the gas reaches the heavy foot, capture the upstream of the gas Changes in composition and environmental conditions. 4 2 · The interferometer equipment as described in item 41 of the scope of the patent application, in addition to the device, is used to periodically sample the nature of the light, to evaluate any changes, and to update the nature if the change exceeds the predetermined time Optical properties are used in subsequent calculations. 4 3 ·-An interferometer device for measuring the distance occupied by the gas. The optical properties of the gas can be changed in the measurement distance. The system includes: an interferometer device including first and second measuring feet. The first and second measuring feet have a light path, and the structure and arrangement are such that at least one of them has a variable physical length, and at least one of them is at least partially occupied by a gas, and one of them can be at least partially occupied by a predetermined medium. Occupy, the difference between the optical path lengths of the first and second measuring feet is based on the difference between the respective physical lengths of the optical paths and the properties of the gas and the predetermined medium; a generating device for generating at least different wavelengths Two beams; introduction device for introducing the first and second parts of each beam in the first and second measuring feet of the interferometer device, the first and second predetermined portions of the chirped beam are respectively along the predetermined light The path passes through the first and second measuring feet. Part of the pre-diameter of the beam and the part of the beam comes out of the interferometer device and becomes the exit beam, which contains information about passing the first and second measuring feet at these wavelengths. Individual optical path length Information; Combined device to combine the exiting beams to produce a mixed light signal. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). I N --------- ----------- Order --------- line (please read the notes on the back before filling out this page) Printed by the Consumers' Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A8 B8 C8 D8 6. The scope of the patent application 'contains information equivalent to the phase difference between the beams at these wavelengths corresponding to the predetermined optical path leaving the first and second measuring feet; a detection device for detecting mixed light Signal and generate an electrical interference signal 'contains information equivalent to the influence of the refractive index of the gas at different beam wavelengths and the physical path of the first and second measuring feet occupied by the gas; a measuring device for Measure the essential optical properties of the gas and generate correction information 'to compensate for the variable optical properties of the gas in the first and second measuring feet; and electronic devices to determine based on the information contained in the interference signal and the correction information' Difference in physical length between the first and second reference feet4 4 · The interferometer equipment according to item 43 of the scope of patent application, wherein the interferometer device is selected from the group consisting of Michelson, Mach-Zehnder, plane mirror, differential plane mirror, and angle compensation. 4 5 · The interferometer equipment as described in item 43 of the scope of the patent application, in which ‘the interferometer device, the beam wavelength, and the relative structure of the electronic device and the women ’s volleyball’ are used to compensate for the Doppler frequency shift introduced by the platform movement. 4 6 · The interferometer equipment as described in item 43 of the scope of the patent application, further including a device to compensate for at least one of the electrical signals and the cyclic error in the gas dispersion. 4 7 · The interferometer equipment as described in item 43 of the scope of the patent application, wherein the device for measuring the essential optical properties includes a variety of forms selected from Michelson, Mach-Zehnder 'plane mirrors, differential plane mirrors, and angle compensation meter. 4 8 · As for the interferometer equipment described in item 43 of the scope of patent application, this paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -105-ϋ Vi nnni ϋ ϋ a ^ i · ϋ -ϋ nn ϋ n ϋ I δ, I ϋ »ϋ i II (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A8 B8 C8 D8 The device used to measure the intrinsic optical properties uses the same part of the beam used by the interferometer device. 4 9. The interferometer equipment as described in item 43 of the scope of patent application, including photographic platemaking equipment. 5 0. -A gas-insensitive interferometer device for measuring the physical length, the interferometer device comprising: an interferometer having a measuring foot to be measured and one of the variable physical lengths occupied by the gas, the interferometer is suitable for Generating at least one signal indicating the length of the optical path of the measuring foot and at least another signal indicating the non-essential optical property of the gas in the measuring foot; a monitor for measuring the essential optical property of the gas and generating a correction signal indicating the essence Optical properties; and a receiving device for receiving the at least one signal and the at least another signal, and substantially compensating for the presence of gas in the measuring foot to determine the actual physical length of the measuring foot. 5 1. —A kind of gas-insensitive interferometer equipment for measuring the variable physical length in the gas. The interferometer includes: a first interferometer device including a reference foot and a measuring foot, the physical length of which can be changed, and Occupy; The second interferometer device is used to compensate for the existence of the gas in the first interferometer device. The second interferometer device includes a reference foot and a measuring foot, each having a predetermined physical length. The structure and arrangement of the reference foot are The medium is planned to be occupied, and the measuring foot structure and arrangement are occupied by gas; the generating device is used to generate at least two light beams with different wavelengths; this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ~ _ 彳〇6. I ----------------------- Order --------- line (Please read the precautions on the back before filling this page) Ministry of Economy Printed by the Intellectual Property Bureau employee consumer cooperative 477895 A8 B8 C8 D8 VI. Patent application scope introduction device 'used to introduce at least a part of each predetermined beam into the reference and measurement feet of the first and second interferometers to generate Optical signals, which contain information equivalent to: (a) the length of the optical path in the measurement path of the first interferometer device at the first wavelength, (b) the first interference at at least another wavelength The length of the optical path in the measuring foot of the measuring device, and (c) the essential optical properties of the gas in the measuring foot of the second interferometer device at the first and at least another wavelength; the conversion device is used to convert the optical signal Is an electrical signal; and an electronic device for processing the electrical signal to compensate for the presence of gas in the measuring foot of the first interferometer, and the first interferometer is determined by substantially correcting the presence of gas in the measuring foot of the first interferometer The device measures the physical path length of the foot. 52 · A kind of gas-insensitive interferometer equipment, including: an interferometer with a reference and a measuring foot, where the structure of the measuring foot is such that the physical path length L can be changed and occupied by the gas; Interferometer Γ monitor; generating means for generating at least two light beams with different wavelengths; introduction means for introducing at least a part of a predetermined light beam into the interferometer and the interferometer Γ monitor, and generating: ( a) One of the first signals of the physical path length L, where LiLi -Γ (L 2-L 1) is the optical path length of the measuring foot divided by Piki, where k 1 is the wave number, and P 1 In order to pass the measurement of the foot on λ 1, the paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm)-107-(Please read the precautions on the back before filling this page) --- ----- Order --------- Line 477895 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A8 B8 C8 D8 6. Number of patent applications, L 2 is the measurement foot divided by p 2 k 2 Length of the optical path, where k 2 is the wave number, and P 2 is the number of times the foot is measured at the wavelength λ 2, And Γ = (ηι — 1) / (η2— ηι) 'wherein' ηι and Π2 are the refractive indices of the gas in the foot at λ 1 and λ 2 respectively, and (b) — the second signal, which contains Calculate the information of Γ to correct the error of the gas in the measuring foot of λ in the first signal; and a signal processing device for receiving the first and second signals, calculate Γ, and then measure the actual physics of the foot Length L. 5 3-A gas-insensitive interference method for measuring physical displacement, the interference method includes the steps of: generating at least two light beams having different wavelengths; providing an interferometer having at least one measuring foot arranged to have one of the desired measurements Variable physical displacement, at the same time occupied by the gas, and suitable for receiving light beams and generating non-local quality information, this is based on the optical path length in the measuring foot and the instantaneous column density change of the gas; determining the nature of the gas in the measuring foot Light properties, and generate a monitoring signal indicating one of the essential light properties; and receive non-native quality information and monitoring signals, and the existence of the gas in the foot is roughly compensated based on the non-essential information and essential light properties of the gas to determine This measures the actual physical displacement in the foot. 54. The interference method as described in item 53 of the scope of patent application, wherein the interferometer includes an amplitude splitting interferometer. 5 5. The interference method as described in item 54 of the scope of the patent application, wherein 'the amplitude splitting interferometer additionally includes: This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -108- IJ4IIJIII — — — · 1111111 I-σ, 11111111 (Please read the precautions on the back before filling this page) 477895 A8 B8 C8 D8 VI. Patent application scope-a reference pin; Dividing device to split the beam and guide at least one of the two Copies travel along both the reference and measuring feet to produce an exiting beam containing information about the length of the individual optical paths that pass through the reference and measuring feet at those wavelengths; combining devices for combining the already-referenced and measuring The leaving beam after moving in the foot produces a mixed light signal that contains information equivalent to the phase difference between the leaving beams, which varies based on the two paths along the reference and measuring the light path encountered during the foot's movement. 5 6 · The interference method as described in item 55 of the scope of patent application, further comprising the steps of detecting the mixed optical signal and generating an electrical interference signal, including the influence and the refractive index of the gas at different beam wavelengths Information on the basis of the gas occupied and the physical path length of the measuring foot. 57. The interference method as described in item 56 of the scope of patent application, further comprising the step of analyzing the electrical interference signal to extract non-essential information from it and combining it with essential information to determine the displacement. 5 8. The interference method as described in claim 54 of the scope of patent application, wherein the amplitude splitting interferometer is selected from a group of interferometer morphologies, including Michelson, Mach-Zehnder, plane mirror 'differential plane mirror' and angle compensation. 5 9. The interference method as described in item 53 of the scope of patent application, further includes the step of doubling the frequency of one of the light beams of one of these wavelengths' to generate another second light beam of these wavelengths. 6 〇 · The interference method as described in Item 53 of the scope of the patent application, further comprising the step of: doubling the frequency of at least one of the leaving beams, and then combining the paper size with the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -109-(Please read the precautions on the back before filling out this page) -------- Order --------- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A8 B8 C8 D8 6. The scope of patent application leaves the light beam to generate a mixed light signal. 6 1 · The interference method described in Item 53 of the scope of patent application determines the intrinsic light properties and the reciprocal dispersion rate of gas Γ, such as: Γ: ["1 (人 1) -1] ['73 (入 3) -"2 (in 2)] and λΐ, λ2, and λ3 are wavelengths, and ΓΊ1, Π2, and Π3 are refractive index differences, and the denominator can be [η3 (λ3) — ni (Ai)] or [η 2 (λ 2) — ni (λ i)]. Medium Medium 6 2 · The interference method as described in Item 53 of the scope of patent application, which determines the difference in refractive index of the gas corresponding to each beam wavelength. 6 3 · The interference method as described in Item 53 of the scope of patent application, which includes the steps of calculating the intrinsic light properties and the reciprocal dispersion ratio Γ, such as: (Please read the precautions on the back before filling out this page) where the wisdom of the Ministry of Economic Affairs Printed by the Consumer Cooperative of the Property Bureau ["/ (入 /) -1] i and j are integers equivalent to the wavelength. 6 4 · The interference method described in item 53 of the scope of patent application determines the nature of the light. The relative refractive index difference at different beam wavelengths', where the form of the relative refractive index difference is:%-1 where i and j are integers equivalent to the wavelength and are different. 6 5. According to the method described in item 53 of the scope of the patent application, the method further includes the step of compensating the cyclic error in the non-essential information equivalent to the gas dispersion (η λ-nai) in the measurement foot, where i and j are Printed in accordance with Chinese National Standard (CNS) A4 specifications (21x 297 mm)-110- 477895 for Bourbon paper size. Printed by A8, B8, C8, D8, Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. And not the same. 6 6 · The interference method as described in item 53 of the scope of patent application, further comprising the step of compensating for a cyclic error in at least one of the electrical interference signals. 6 7 · The interference method as described in item 53 of the scope of patent application, further including the step of compensating a cyclic error in non-essential information equivalent to the dispersion (n ^ — nxi) of the gas in the measurement foot, where i And j is an integer equivalent to the wavelength and is not the same, and is in at least one of the electrical interference signals. 0 8 The interference method as described in item 67 of the patent application scope, further including the step of measuring the accuracy of the wavelength, And produce the wavelength accuracy signal indicated by it. ^ 6 9 · The interference method as described in item 68 of the patent application scope, further comprising the steps of receiving a wavelength accuracy signal and using its chirp to determine the actual physical displacement. 7 0. The interference method as described in item 68 of the scope of patent application, further comprising the steps of: receiving a wavelength accuracy signal and generating a control signal to adjust the device for generating the light beam so that its wavelength is within a predetermined accuracy limit. 7 1 · The interference method as described in item 53 of the scope of patent application, wherein the interferometer further comprises: a reference foot, and a beam steering component having a beam steering element, and a positioning system for directional beam steering element ， Beam manipulating element arranges the guide datum and the measuring foot belongs to, and the standard and the paper standard in contact with the beam manipulating element are applicable to China National Standard (CNS) A4 (210 X 297 mm) -111- I V ---- r --------------- Order --------- line (please read the precautions on the back before filling out this page) Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs 477895 A8 B8 C8 _ D8 t. At least one of the patent-pending measuring beams and a control circuit. During operation, this causes the positioning system to respond to changes in the angular orientation and position of the measuring object and redirects the beam. Control element. 7 2 · The interference method as described in item 53 of the scope of patent application, wherein the wavelengths of the light beams have a relationship close to each other, and the close harmonic relationship is expressed by a list of ratios, each ratio being a low-order non-zero integer. One ratio constitutes. 7 3 · The interference method as described in item 72 of the scope of the patent application, further comprising the step of passing the light beam at least along the measuring foot multiple times. Here, the number of times the light beam passes through is harmonically open, which is roughly between the wavelength The approximate harmonic relationship is the same. 74. The interference method as described in item 73 of the scope of patent application, including the step of generating at least two beams and the step of generating an orthogonally polarized portion of each beam. 7 5 · The interference method as described in item 74 of the scope of patent application, further comprising the step of separating the beams into pairs of orthogonally polarized portions of the same wavelength. 7 6 · The interference method as described in item 75 of the scope of patent application, further comprising the step of spatially separating each pair of orthogonal polarization portions for subsequent downstream use in the interferometer device. 7 7. The interference method as described in item 72 of the scope of patent application, wherein the relative accuracy of the wavelength relationship expressed by the ratio of the column is at or below the magnitude of the dispersion (η 2 — ni) of the refractive index of the gas, where , N 1 and η 2 are the refractive index of the gas at different wavelengths multiplied by the relative accuracy ε. The dimensions of this paper apply the Chinese National Standard (CNS) A4 specification (210 x 297 mm) -112- (Please read the back Please fill in this page again for attention) -------- Order --------- line- 477895 Printed by Employee Consumer Cooperative of Intellectual Property Bureau of Ministry of Economic Affairs Α8 Β8 C8 D8 The difference in refractive index (ni-1) of the measuring gas or the difference in the optical path length of the measuring foot is caused by the change of the gas. 7 8. The interference method as described in item 7 of the scope of the patent application, further includes monitoring the relative accuracy of the close-harmonic relationship represented by the ratio of the column. The interference method as described in item 78 of the scope of patent application, further comprising the steps of: responding to monitoring the relative accuracy of close to the harmonic relationship, providing a feedback signal to control the light beam, and the relative accuracy of the close to the harmonic relationship is at or low At the magnitude of the refractive index of the gas multiplied by the relative accuracy ε, it is necessary to measure the difference in refractive index (η 1) of the gas or the difference in the length of the optical path of the measuring foot due to the change caused by the gas. 8 0 · The interference method as described in item 56 of the scope of patent application, further comprising the step of: introducing a frequency difference between at least the first and second parts of each beam to generate a set of frequency shifted beams, 俾No two beams in this group of frequency-shifted beams have the same frequency. 8 1 · The interference method as described in item 80 of the scope of patent application, wherein the electrical interference signal includes a heterodyne electrical signal. 8 2 · The interference method as described in item 56 of the scope of patent application, which further includes receiving an electrical interference signal and directly extracting phase information corresponding to the selected essential optical property of the gas therefrom. 8 3 · The interference method as described in Item 53 of the scope of patent application, wherein different wavelengths have a close harmonic relationship with each other, and the close harmonic relationship is represented by a list of ratios, each ratio being a low-order non-zero integer. Ratio composition I -------------------- Order --------- line (Please read the precautions on the back before filling this page) This paper size Applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) -113- 477895 Printed by employees' cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A8 B8 C8 D8 々, patent application scope 8 4 · If the patent application scope item 8 3 The interference method further includes the steps of: receiving and analyzing the phase of the electrical interference signal, and generating an initial electrical phase signal, which contains the influence of the refractive index of the gas at different beam wavelengths and the physical properties of the measuring foot occupied by the gas Information about the length of the trail and its rate of change. 8 5 · The interference method as described in item 84 of the scope of patent application, further comprising the step of multiplying the initial phase signal by a factor multiple proportional to the wavelength to generate a modified phase signal. 8 6 · The interference method as described in item 53 of the scope of patent application, wherein the interferometer has a reference foot, which is structured and arranged together with the measuring foot, and the light beam on one of the beam wavelengths follows a predetermined optical path The number of times of passing through at least one of the reference and the second measuring foot is different from the light beam at other wavelengths to compensate for the change rate of the physical pair length of the physical path length of the reference and the second measuring foot. The interference method according to item 53, wherein the wavelengths of the light beams have a relationship close to each other, and the close harmonic relationship is represented by a list of ratios, each ratio being composed of a ratio of a low-order non-zero integer. 8 8 · The interference method as described in item 87 of the scope of patent application, including the step of passing the raw light beam through at least the measuring foot multiple times. Here, the amount of light beam passing through is a harmonic relationship, which is roughly between the wavelength The roughly harmonic relationship is the same. 8 9 · The interference method as described in Item 53 of the scope of patent application, including a micro-plate making method, which is related to the interference method in operation, and is used to manufacture this paper. The standard of China National Standard (CNS) A4 (210 X 297mm) -114- ------------- Φ clothing -------- order --------- lineΦ (Please read the precautions on the back first (Fill in this page again) 477895 A8 B8 C8 D8 printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs VI. Patent application for integrated circuits on a chip, the microplate method includes the steps of: supporting a chip on at least one platform; projection space The image rays of the pattern are on the wafer; and the position of the at least one platform is adjusted; wherein the interference method is suitable for measuring the position of the at least one platform. 90. The interference method as described in item 53 of the scope of patent application, further comprising a micro-plate making method, which is operatively related to the interferometer equipment for manufacturing integrated circuits on a wafer. The micro-plate making method includes: support A wafer on at least one platform; providing an irradiation system including a ray source, a mask, a positioning system, a lens assembly, and a predetermined portion of an interferometer device, guiding rays through the mask to generate a space pattern The ray, the positioning system adjusts the position of the relationship between the mask and the light source ray, the lens component projects a spatial pattern ray image on the wafer, and measures the position of the relationship between the mask and the light source ray. 9 1 · The interference method as described in Item 53 of the scope of the patent application, and further includes a micro-plate making method which is operationally related to the interference meter equipment and is used to manufacture integrated circuits, including the first and second components, the first and The second component can move relatively, the first and second components; the component is connected to the first and second measuring feet and moves in unison with it, and the interferometer is equipped to measure the position of the relationship between the first component and the second component. 9 2 · The interference method as described in Item 53 of the scope of the patent application, further including a beam writing method, which is related to the interference method in operation for manufacturing a plate making mask, and the beam writing method includes: the paper size Applicable to China National Standard (CNS) A4 (210 x 297 mm) _ 115------------------------ Order ------- -Line f, please read the phonetic on the back? Please fill in this page for further information) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 477895 A8 B8 C8 D8 6. The scope of the patent application provides a writing beam to make a pattern on the substrate; supports a substrate on at least one platform; guides the beam Onto the substrate; and setting the position of the relationship between the at least one platform and the light beam, the interference method is suitable for measuring the position of the relationship between the at least one platform and the light beam 0 9 3 · The interference method according to item 53 of the scope of patent application, wherein , Determine the essential optical properties of the measuring foot close to the interferometer. 9 4 · According to the interference method described in Item 53 of the scope of patent application, monitor the essential light properties near the reference foot of the dry meter and its upstream light, and capture the upstream components and environmental conditions of the gas before the gas reaches the measuring foot The change. 9 5 · The interference method as described in Item 93 of the scope of patent application, further including the steps: periodically sampling the essential light properties to estimate the change in position, and if the change exceeds the predetermined value, updating the essential light properties , 俾 is used in subsequent calculations. 9 6 · The interference method as described in Item 53 of the scope of patent application, further comprising the step of resolving the phase overlap in the electrical interference signal. 9 7 · The interferometer equipment as described in item 1 of the scope of patent application, which also includes micro-plate making equipment, which is operationally related to the interferometer equipment and is used to manufacture integrated circuits, including the first and second components, the first The first and second components can be moved to each other. The first and second components are connected to the first and second feet and move in unison with them. The interferometer is equipped to measure the relationship between the first and second components. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -116- —. ------------------ Order --------- line (Please read the precautions on the back before filling this page)