475084 A7 B7 五、發明説明（ 經濟部中央標準局吳工消t合作社印製 發明頫域： 本發明係有關於一種製造液晶顯示器之方法，且更特 別的是，一種形成薄膜電晶體-液晶顯示器之彩色濾光片的 方法。發明眢景z 薄膜電晶體-液晶顯示器（TFT-LCD)已知需要高像素密 度和高品質。一般，TFT-LCD包括一薄膜電晶體和像素電 極所形成之底板及具有彩色濾光片之頂板。液晶乃充填在 頂板和底板之間。每個單位像素中，提供了 一電容器和另 一電容器，藉由TFT作為單位像素之開關元件。於操作中， 閘極信號電壓加到每個單位像素之開關元件的TFT上。 TFT接收了閘極信號電壓後會開啟，因而攜帶影像資訊之 資料電壓可經由TFT而加到相對應之像素電極和液晶上。 當資料電壓加到TFT上，液晶分子之配置會有所改變，因 而也改變了其光學特性並顯示出影像。 一彩色濾光片用於LCD中以顯示螢幕之彩色部分。一 般說來，彩色濾光片之設計影響視角和色彩之表現。多重 隙縫結構廣泛地應用在生產L C D之彩色濾光片，且已經應 用在TN(TFT)和光學補償彎曲（optical compensation bend ; OCB )模式。第一圖顯示了傳統之多重隙縫LCD。 在此結構中，紅、藍和綠色像素分別在玻璃2上面形成。 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標4M CNS ) Λ4規格（210X297公釐） 475084 A7 B7 五、發明説明（） 夢一光阻4在綠色和藍色像素上形成。再者，第二個光阻 6只在藍色像素之頂端上形成。在玻璃2和另一玻璃8之 間為液曰曰曰10。因此，隙縫距離dR，dG和dB是不同的。 換言之，彩色濾波β具有多重隙縫紱| ^一 ，―· ____________.......·-·*-· ·· ........- - --— ................ —............... ； . ·- 一般來說，Δηοΐ /人乃設計成穿透性極小化或極大化， 其中之η為整數，d為玻璃8和彩色像素之間的隙縫距離， λ則代表光波波長。因此，紅色像素具有最大的And，且藍 色像素在二個，色41章中有最小的Δη〇ι。多重隙縫結構之目 的為保持固定值。然而，形成上述結構之程序至 少需要兩個光阻$層和兩寧1微影蝕刻製程步驟。 v . .’ 發明目的及概述： (請先閲讀背面之注意事項再填寫本頁) •^1. 經濟部中央標準局員工消费合作社印^ 所 法包括 塗上一 準紅色 開口對 露出正 置。接 之強度 第一次 照明強 揭不的為形成TFT-LCD之彩色濾光片之方法。此方 在底材上形成紅色，綠色和藍色像素（R，G，B)。 透明正光阻在彩色像素上。第—次曝光利用開口對 像素（R)之光罩加以照射而完成。接著，光罩位移到 準綠色像素（G)的位置。接著，執行第二次曝光以曝 2阻。類似地，光罩也移到開口對齊藍色像素之位 者，正光阻利用光罩加以曝光。正光阻由控制照光 、曝光時間或兩者結合方式而加以曝光。詳細的說， 曝光具有最高之照明強度，第三次曝光具有最低之 度’第二次曝光強度則為中間值。另一個方式為控 、11 本紙張尺度適用中ϊί家標準（ 475084475084 A7 B7 V. Description of Invention (Invention printed by Wu Gongxiao Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs: The present invention relates to a method for manufacturing a liquid crystal display, and more particularly, a method for forming a thin film transistor-liquid crystal display The method of color filter. Invention of the thin film transistor-liquid crystal display (TFT-LCD) is known to require high pixel density and high quality. Generally, TFT-LCD includes a substrate formed by a thin film transistor and pixel electrodes And a top plate with a color filter. The liquid crystal is filled between the top plate and the bottom plate. In each unit pixel, a capacitor and another capacitor are provided, and the TFT is used as the switching element of the unit pixel. In operation, the gate The signal voltage is applied to the TFT of the switching element of each unit pixel. The TFT is turned on after receiving the gate signal voltage, so the data voltage carrying image information can be applied to the corresponding pixel electrode and liquid crystal via the TFT. When data When the voltage is applied to the TFT, the arrangement of the liquid crystal molecules will be changed, which will also change its optical characteristics and display the image. A color filter is used In the LCD, the color part of the display screen is used. Generally speaking, the design of the color filter affects the viewing angle and color performance. The multi-gap structure is widely used in the production of LCD color filters, and has been used in TN (TFT) And optical compensation bend (OCB) mode. The first picture shows a traditional multi-slit LCD. In this structure, red, blue and green pixels are formed on glass 2. (Please read the precautions on the back first Please fill in this page again) This paper size is applicable to Chinese national standard 4M CNS) Λ4 specification (210X297 mm) 475084 A7 B7 V. Description of the invention () Dream one photoresistor 4 is formed on green and blue pixels. Furthermore, a second photoresist 6 is formed only on the top of the blue pixel. Between the glass 2 and the other glass 8 is a liquid 10. Therefore, the gap distances dR, dG and dB are different. In other words, the color filter β has multiple gaps 绂 | ^ 1, ____________............----- *-·· ..............----- ...... .......... —...............;.-In general, Δηοΐ / person is designed to minimize or maximize penetration, where Η is an integer, d is the gap distance between the glass 8 and the color pixel, and λ represents the wavelength of the light wave. Therefore, the red pixel has the largest And, and the blue pixel has two, the smallest Δηι in the color chapter. The purpose of the multi-slot structure is to maintain a fixed value. However, the process of forming the above structure requires at least two photoresist layers and two lithography etching process steps. v.. ’The purpose and summary of the invention: (Please read the notes on the back before filling out this page) • ^ 1. Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs ^ All methods include painting a quasi-red opening to expose it upright. The intensity of the first time, the intensity of the first illumination cannot be exposed is the method of forming a color filter for the TFT-LCD. This side forms red, green, and blue pixels (R, G, B) on the substrate. Transparent positive light is blocked on the color pixels. The first exposure is completed by irradiating the mask of the pixel (R) with an opening. Then, the mask is shifted to the position of the quasi-green pixel (G). Next, a second exposure is performed to expose 2 resistances. Similarly, the mask is also moved to the position where the blue pixels are aligned with the opening, and the positive photoresist is exposed using the mask. Positive photoresist is exposed by controlling illumination, exposure time, or a combination of both. In detail, the exposure has the highest illumination intensity, and the third exposure has the lowest intensity. The second exposure intensity is an intermediate value. Another way is to control the 11 paper standards to apply the Chinese standard (475084
經满部中央標準局吳工消费合作社印製 五、發明説明（） 制曝光時間。第一次曝光之曝光時間是最長的，而第三次 曝光則時間最短，第二次曝光時間則為中間值。 接著，正光阻以傳統之方式顯影。在三次曝光步驟之 後本發明之結果為形成具有多重隙縫結構之彩色濾光片。 之後，用濺鍍法形成一氧化銦錫（ITO)透明薄膜於彩色濾光 片上。最後，液晶、對準薄膜、另一層ITO和另一層玻璃 分別由傳統技術形成。 B A ffi蕈說明= 本發明的前述觀點及許多伴隨的優點如參考下面之詳 細敘述，並結合附圖之後將更加容易瞭解，其中： 第一圖為液晶顯示器之截面圖，例舉了依照習知技術 之彩色濾波平板之結構。 第二圖為彩色濾光片之戴面圖，例舉了依照本發明來 形成彩色像素之步驟。 第三圖為彩色濾光片之戴面圖，例舉了依照本發明來 進行第一次曝光。 第四圖為彩色濾光片之截面圖，例舉了依照本發明來 進行第二次曝光。 第五圖為彩色濾光片之截面圖，例舉了依照本發明來 進行第三次曝光。 第六圖為彩色濾光片之截面圖，例舉了依照本發明來 進行顯影之步驟。 第七圖為彩色濾光片之截面圖，例舉了依照本發明的 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標隼（CNS ) Λ4規格（210X 297公釐） 經濟部中央標準局員工消费合作社印1i 475084 A7 ----------B7 五、發明説明（^---* 最後結構。 詳細說明： 本發明揭露一形成TFT-LCD彩色濾光片之方法’只需 要-次光阻和一次光罩。接下來可以看到本技術應用在一 TFT疋件之形成’ |閱第二圖’以一較佳實施例而言：一 玻璃形j之底# 1()(3，以石英或類似材質為_透明絕緣底 材，接者使用傳統方法形成紅色，綠色和藍色像素之圖案 於基板上，通常這些像素的材質為樹脂。 仍明參閱第二圖，塗上一透g正光^1〇4在彩色像素 上。/眾所皆知正光阻與負光阻的反，接下來於光阻 上^成多層結構，以控制照光強度和曝光時間的多重步 驟來形成此多層結構Ά前述紅、綠、藍像素上的光阻受 上強度二』於光阻受不同的照光強度故顯影後可 形成位於像素上的多層結構，或者是以控制光阻曝光時間 的夕重步驟來形成此多層結構，此實施例如下·· 凊參閱第三圖，第一次曝光利用開口 1 0 8對準紅色像 素（R)之光罩1〇6加以照明而完成。接著如第四圖所示，光 罩106移動到開口對準綠色像素（G)的位置，執行第二次曝 光以曝露出正光阻。 Χ 參閱第五圖，類似地，移動光罩106使開口 1 〇8的位 (請先閱讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用巾11§3家縣（（：]^)/、4規格（2丨()>< 297公策） 475084 A7 B7 經濟部中央標革局吳工消费合作社印製 五、發明説明（） 置對準藍色像素（B)，然後用光罩1〇6將正光阻1〇4曝光。 本發明之關鍵為分別使用不同的照光強度來完成三次的曝 光，為邊成此目的，正光阻104由控制照光之強度、曝光 厂時間或兩者結合方式加以曝光。詳細的說，第一次曝光具 /、有^胃之照明〜，第三次曝光具有最低之照明強度，第 ^二次曝色強！— 則為中間值。另一個方式為控制曝光時間。 第一次曝光之曝光時間是最長的，而第三次曝光則時間最 與，第二次曝光時間則為中間值。 ' XV--------------- ' ' S----------------------------------------- 然後以傳統方法將正光阻1 〇 4顯影。本發明之結果顯 示在第六圖，如第六圖所示，本發明的彩色濾光片具有一 多重隙縫結構。最後如圖七所示，濺鍍一氧化銦錫膜（IT0) 102在彩色濾光片上。而配向薄膜112、液晶iio、及另 一層玻璃1 16上之ΙΤΟ 1 14及另一配向薄膜丄18分別由 傳統技術形成。然而這些並不是本發明的重點，因此本發 明的彩色濾光片確實具有不同的隙縫距離dR、dG和dB。 以上所述僅為本發明之較佳實施例而已，並非用以限 定本發明之申請專利範圍；凡其它未脫離本發明所揭示之 精神下所完成之等效改變或修飾，均應包含在下述之申請 專利範圍内。 (請先閱讀背面之注意事項再填寫本頁) 訂 % 本紙張尺度適用中國國家標率（CNS ) Λ4規格（210X 297公釐） 475084 A7 B7 五、發明説明（） L 一 元件符號說明： 100 玻璃底材 102 氧化銦錫膜（ITO) 104 正光阻 106 光罩 108 開口 110 液晶 112 配向薄膜 114 ITO 116 玻璃 118 配向薄膜 (請先閲讀背面之注意事項再填寫本頁) 裝 訂 線 經濟部中央橾隼局貝工消費合作社印¾ 本紙張·尺度通用中國國家標率（CNS ) A4说格（210X 297公釐〉Printed by the Wu Gong Consumer Cooperative of the Central Bureau of Standards of the People's Republic of China. 5. Description of Invention () System exposure time. The first exposure time is the longest, the third exposure time is the shortest, and the second exposure time is the middle value. The positive photoresist is then developed in a conventional manner. The result of the present invention after the three exposure steps is to form a color filter having a multi-slit structure. Thereafter, a transparent film of indium tin oxide (ITO) is formed on the color filter by a sputtering method. Finally, the liquid crystal, alignment film, another layer of ITO, and another layer of glass are formed by conventional techniques. BA ffi mushroom description = The foregoing viewpoints of the present invention and many accompanying advantages will be more easily understood by referring to the following detailed description, combined with the accompanying drawings, in which: The first figure is a cross-sectional view of a liquid crystal display, exemplified by conventional knowledge The structure of the color filter panel of the technology. The second figure is a wearing view of a color filter, exemplifying a step of forming a color pixel according to the present invention. The third figure is a wearing view of a color filter, exemplifying the first exposure according to the present invention. The fourth figure is a cross-sectional view of a color filter, exemplifying a second exposure in accordance with the present invention. The fifth figure is a cross-sectional view of a color filter, exemplifying a third exposure in accordance with the present invention. The sixth figure is a cross-sectional view of a color filter, exemplifying the steps of developing according to the present invention. The seventh figure is a cross-sectional view of a color filter, exemplified by the present invention (please read the precautions on the back before filling this page) This paper size is applicable to the Chinese National Standard (CNS) Λ4 specification (210X 297 mm) ) Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 1i 475084 A7 ---------- B7 V. Description of the invention (^ --- * Final structure. Detailed description: The present invention discloses the formation of a TFT-LCD color filter The method of the light sheet 'only requires a secondary photoresist and a primary photomask. Next, you can see that this technology is applied to the formation of a TFT element.' | See the second figure 'for a preferred embodiment: a glass shape j 之 底 # 1 () (3, using quartz or similar materials as transparent insulating substrates, and then use traditional methods to form patterns of red, green and blue pixels on the substrate, usually these pixels are made of resin. Still Refer to the second picture, and apply a transparent light ^ 104 to the color pixels. / It is well known that the positive and negative photoresistances are reversed, and then a multilayer structure is formed on the photoresist to control the light intensity. And exposure time multiple steps to form this multilayer structure: the aforementioned red, green, and blue The photoresist on the substrate is of the second intensity. After the photoresist receives a different light intensity, it can form a multilayer structure on the pixel after development, or the multilayer structure can be formed by controlling the exposure time of the photoresist. This implementation For example, see the third picture below. The first exposure is completed by using the opening 108 to align the mask of the red pixel (R) 106 with illumination. Then as shown in the fourth picture, the mask 106 moves to The opening is aligned with the position of the green pixel (G), and a second exposure is performed to expose the positive photoresist. Χ Refer to the fifth figure, and similarly, move the mask 106 to position the opening 1 08 (please read the precautions on the back first) (Fill in this page again.) The size of the paper is applicable to 11§3 counties ((:) ^) /, 4 specifications (2 丨 () > < 297 policy) 475084 A7 B7 Wu Gong, Central Bureau of Standards and Leather Industry, Ministry of Economic Affairs Printed by the Consumer Cooperative. 5. Description of the invention () Align the blue pixel (B), and then expose the positive photoresist 104 with a photomask 10. The key of the present invention is to use three different light intensities to complete three times. For this purpose, the positive photoresistor 104 controls the intensity of the light, Light factory time or a combination of the two methods to expose. In detail, the first exposure tool has illumination of the stomach ~, the third exposure has the lowest illumination intensity, and the second exposure has strong color intensity! — Is Intermediate value. Another way is to control the exposure time. The first exposure time is the longest, while the third exposure time is the best, and the second exposure time is the intermediate value. 'XV ------ --------- '' S -------------------------------------- --- Then develop the positive photoresist 104 by the conventional method. The results of the present invention are shown in Fig. 6. As shown in Fig. 6, the color filter of the present invention has a multi-slit structure. Finally, as shown in FIG. 7, an indium tin oxide film (IT0) 102 is sputtered on the color filter. The alignment film 112, the liquid crystal iio, the ITO 1 14 on the other layer of glass 116, and the other alignment film 丄 18 are formed by conventional techniques, respectively. However, these are not the focus of the present invention, so the color filter of the present invention does have different gap distances dR, dG, and dB. The above are merely preferred embodiments of the present invention, and are not intended to limit the scope of patent application for the present invention; all other equivalent changes or modifications made without departing from the spirit disclosed by the present invention shall be included in the following Within the scope of patent application. (Please read the precautions on the back before filling this page) Order% This paper size applies to China National Standards (CNS) Λ4 specification (210X 297 mm) 475084 A7 B7 V. Description of the invention () L Symbol description of a component: 100 Glass substrate 102 Indium tin oxide film (ITO) 104 Positive photoresist 106 Photomask 108 Opening 110 Liquid crystal 112 Alignment film 114 ITO 116 Glass 118 Alignment film (Please read the precautions on the back first and then fill out this page) Gutter Center Ministry of Economic Affairs 橾Printed by the Bureau of Shellfish Consumer Cooperatives ¾ This paper · size is in accordance with China National Standards (CNS) A4 scale (210X 297mm>