TW475034B - Evacuation device - Google Patents
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475034475034
—--案號 8811MI— 修正I 五、發明說明(1) .二._____________________一—J •本發明係有關於一種抽真空裝置,尤指一種能防止因 潔淨内部裝置時所導致之抽真空失敗的抽真空裝置。——— Case No. 8811MI— Amendment I. V. Description of the invention (1). 2. _____________________ One—J • The present invention relates to a vacuum pumping device, especially a method that can prevent the vacuum pumping caused by cleaning the internal devices. Failed evacuation device.
在半導體的設備當中,抽真空裝置已經是一個非常廣 泛使周的裝置,經常兩來裝設在蝕刻機台(etch machine) 或化#氣相沉積機台(CVD machine)上,以提供製程所需 =的咼真空度。為了加速抽真空的速度,抽真空裝置多半 刀成=個主要裝置,以抽真空的能力區別,一個則稱為第 一真空泵〇高真空泵),另一個稱為第二真空泵(低真空 泵)处备一個真空艙要從一大氣壓開始抽真空時,先以第 真二果插乳,使真空搶之氣壓快速下降到一個既定範 Q a ^後關掉第二具空泵,啟動第一真空泵,再將真空艙 =氣S降到更低的範圍,以便進行製程。第一真空泵可能 Z 種低,泵(cry〇 pump),以液態氮(心)或氦(He)將真 =内的氣體冷凝後排出,能夠使真空艙之氣壓到 直* 毛、耳(ΐ0ΓΓ)。而第二真空泵可能是機械泵之類的 二,工果’以#輪或滾軸方式將氣體排出,大約只能達到 10-1〜10_5牦耳的氣壓值。 ^ 2而低溫果隨著使用的時間增加,在低溫泵中的冷凝 漸漸地堆積一些由氣體冷凝所形成的固體,好比冰 ig Shr ’ 9 像’因而慢慢的減低低溫泵冷凝的效能。所以, 低溫栗每仿田 <n_ . , ^ h缺災用—段時間後,便需要再生(regenerate),就 ··;水相的 愛 &表 動作,來恢復低温泵效能。 古心=參閱第1圖,第1圖為習知抽真空裝置之示意圖。抽 一、且匕3有一低溫泵12,與一真空艙15相連通。而一Among the semiconductor equipment, the evacuation device has been a very extensive device, often installed on an etch machine or a CVD machine (CVD machine) to provide a process station. Requires a vacuum degree of 咼. In order to speed up the evacuation speed, the evacuation device is mostly divided into two main devices, which are distinguished by the ability of evacuation. One is called the first vacuum pump (high vacuum pump) and the other is called the second vacuum pump (low vacuum pump) When a vacuum chamber is to be evacuated from atmospheric pressure, first insert the milk with the second true fruit to quickly reduce the pressure of the vacuum grab to a predetermined range Q a ^, then turn off the second empty pump, start the first vacuum pump, and then Reduce the vacuum chamber = gas S to a lower range for the process. The first vacuum pump may be low in type Z. The pump (cryopump) condenses the gas inside the liquid with liquid nitrogen (heart) or helium (He) and discharges it. It can make the pressure in the vacuum chamber straight to the hair and ears (ΐ0ΓΓ). ). The second vacuum pump may be a mechanical pump or the like. The working fruit ’uses a # wheel or a roller to discharge the gas, and it can only reach a pressure of about 10-1 to 10_5 torr. ^ 2 And with the increase of the use time, the condensation in the cryopump gradually accumulates some solids formed by gas condensation, which is like ice ig Shr '9 image' and thus slowly reduces the condensation performance of the cryopump. Therefore, the low temperature chestnuts will be regenerated for a period of time after a shortage of disasters-after a period of time, the water phase love & table action will be used to restore the low temperature pump performance. Ancient heart = Refer to Figure 1, which is a schematic diagram of a conventional vacuum pumping device. The pump 1 and the knife 3 have a cryopump 12 in communication with a vacuum chamber 15. While one
475034 五、發明說明(2) 潔淨用氣體源1 4連結至低溫泵1 2,用來提供高於外部壓力 之氮氣。低溫泵1 2上設有一排氣管1 9,排氣管上設有一個 單向排氣閥(relief valve)20。抽真空裝置另包含有一機 械泵16。機械泵16、低溫泵12與真空艙15之間以連接管18 相連接’各連接管1 8上設有控制閥2 2,用來控制各部分間 的氣體流通。低溫泵1 2的再生流程 '中,首先將低溫栗丨2溫 度提高(warm-up)到^10 V K·,然後以送氣管路14喷氮氣沖 洗低溫泵-1 2,接著將氣壓降至5 〇 //技耳(t 〇 r r),跟著檢杳 氣壓上昇的速度(rate of rise)要低於每分鐘ίο#耗耳, 也就是不可有漏氣,如果都沒問題,最後將低溫泵1 2降到 工作溫度,準備進行工作。當沖洗低溫泵丨2時,高壓氣氣 免疏1排氣管19並推開單向排氣閥20排出於大氣中Γ所有 低溫泵1 2中的氣體,也會昇華回氣體伴隨著氮氣破 Ί到大氣中。… 士因為在低溫泵1 2之再生流程裡,高壓氮氣沖洗低溫粟 1 2 =,低溫泵1 2中的一些微粒可能會從單向排氣閥2 〇排出 低溫泵1 2外。而且,微粒有很大的機會附著在單向排氣閥 =亡的油封環(〇 —ring sea〇上,導致了單尚排氣閥 2 0 色真 時完全^隔1^^;17^^^ J^。使得再生流程中沒有辦法將氣壓降至5〇 # 者 氣壓上昇的速度高於每分鐘10//托耳,兩者均表示抽真空 失敗會使機台發出故障警報(a 1 a r m ),而工程師龠要檢 查維修,再生必須重做。 ^ 有鑑於此,本發明的主要目的,在於提供一種抽真空475034 V. Description of the invention (2) The clean gas source 14 is connected to the cryopump 12 to provide nitrogen gas at a pressure higher than the external pressure. The cryopump 12 is provided with an exhaust pipe 19 and the exhaust pipe is provided with a relief valve 20. The evacuation device further comprises a mechanical pump 16. The mechanical pump 16, the cryopump 12 and the vacuum chamber 15 are connected by a connecting pipe 18 '. Each connecting pipe 18 is provided with a control valve 22 for controlling the gas flow between the parts. In the regeneration process of the cryopump 12, the temperature of the cryopump 2 is raised to ^ 10 VK ·, and then the cryopump-1 is flushed with nitrogen gas through the air supply pipe 14 and then the air pressure is reduced to 5 〇 // technical ear (t 〇rr), the rate of rise following the detection pressure (rate of rise) is lower than every minute ίο # consumption ear, that is, no air leakage, if there is no problem, finally the cryopump 1 2 Reduce to working temperature and prepare to work. When the cryopump is flushed, the high-pressure gas is freed from the exhaust pipe 19 and the one-way exhaust valve 20 is pushed out to discharge into the atmosphere. All the gas in the cryopump 12 will also sublimate the return gas accompanied by nitrogen breakdown. Ί into the atmosphere. … In the regeneration process of the cryopump 12, high-pressure nitrogen flushes the cryopump 12 =, and some particles in the cryopump 12 may be discharged from the cryopump 12 from the one-way exhaust valve 20. In addition, the particles have a great chance to attach to the one-way exhaust valve = the oil seal ring (0-ring sea0), which caused the single-shang exhaust valve to be completely ^ separated 1 ^^; 17 ^^ ^ J ^. There is no way to reduce the air pressure to 5〇 # in the regeneration process, or the air pressure rises at a rate higher than 10 // torr per minute, both of which indicate that failure to evacuate will cause the machine to issue a fault alarm (a 1 arm ), And the engineer does not want to check and repair, the regeneration must be redone. ^ In view of this, the main purpose of the present invention is to provide a vacuum
第5頁 475034 五、發明說明(3) 裝置,能夠防止微粒在再生 油封環上,能減少機台的維 根據上述之目的,本發 空裝置包含有, 流程中附著在 修時間(d 〇 w n t 第一真空泵 單向排氣閥上的 i me) 〇 明提出一種抽真空裝置。抽真 閥以及一濾清 器。第一真空 知丨" I » 力,且第一真 於一真 結於一 以去除第一真 泵連結 空泵連 壓力大之氣體 向排氣閥設於第一真空泵上 大於一外部壓力時,開啟而 向排氣閥而排出第一真空泵 一真空泵之間,用以濾除該 本發明之優點在於在潔 高壓氣體流動,而在往單向 清器攔截下來,不會到達單 無法緊密的關閉,導致抽真 濾清器,機台便不會受微粒 作,提高量產的效率。 、一單 空艙, 潔淨用 空泵運作時所 向排氣 用以減低真空艙中之壓 氣體源,提供一較外部 用以於第 使第一 〇濾清 等微粒 一—.r 一 W一一. '1 淨第一 排氣閥 向排氣 空失敗 的問題 真空泵 器設於 產生的微粒。單 真空泵内的壓力 内之氣體流經單 单向與一^ 真空泵時,微粒會隨著 排出的途中,會先被濾 閥處,造成單向排氣閥 。所以只要定期的保養 影響,可以正常的工 圖式之簡單說明: 1 為使本發明之上述目的、特徵和優點能更明顯易懂, 下文特舉一較佳實施例,並配合所附圖式,作詳細說明如 下: ’ 第1圖為習知抽真空裝置之示意圖。 第2圖為本發明的抽真空裝置之示意圖。Page 5 475034 V. Description of the invention (3) The device can prevent particles from being on the regenerative oil seal ring, which can reduce the dimension of the machine. According to the above purpose, the air-saving device includes, the process is attached to the repair time (d ownt The first vacuum pump one-way exhaust valve (i me) o Ming proposed a vacuum pumping device. Vacuum valve and a filter. The first vacuum knows the quot; I »force, and the first is true to the first to remove the first true pump connected to the air pump and the high pressure gas to the exhaust valve on the first vacuum pump when the pressure is greater than an external pressure The first vacuum pump is opened to discharge to the exhaust valve between the first vacuum pump and the vacuum pump. The advantage of the present invention is to filter the high-pressure gas flow, and intercept it to the one-way cleaner. Closed, leading to the true filter, the machine will not be affected by particles, improving the efficiency of mass production. A single empty cabin. The exhaust gas used by the clean air pump is used to reduce the pressure of the gas source in the vacuum chamber. It provides an external source for filtering the particles such as the first one. —R—W— I. '1 Net first exhaust valve failed to exhaust air The vacuum pump is set on the generated particles. When the pressure in the vacuum pump flows through the unidirectional and unidirectional vacuum pumps, the particles will be removed by the filter valve during the discharge, causing a one-way exhaust valve. Therefore, as long as the regular maintenance affects, the normal working drawings can be simply explained: 1 In order to make the above-mentioned objects, features and advantages of the present invention more comprehensible, a preferred embodiment is given below with the accompanying drawings The detailed description is as follows: 'Figure 1 is a schematic diagram of a conventional vacuum pumping device. Fig. 2 is a schematic diagram of a vacuum pumping device of the present invention.
475034 五、發明說明(4) | 第3圖為第2圖中的濾清器附近的裝置之示意圖。 符號說明: 32第一真空泵 34潔淨用氣體源 35真空艙 36第二真空泵 38連接管 40單-向排氣閥 42濾清器 44油封環 、 46排氣管 5 0控制閥 實施例: 請參閱第2圖,第2圖為本發明的抽真空裝置之示意 圖。本發明為一種能防止因潔淨内部裝置時所導致之抽真 空失敗的抽真空裝置。本發明之抽真空裝置包含有一第一 j 真空泵32、一單向排氣閥40以及一滹清器42。第一真空泵 | 32連結於一真空艙35,闬以減低真空艙35中之壓A,且第 ! 一真空泵32連結於一潔淨用氣體源34,提供一較外部壓力 大之氣體以去除第一真空泵32運作時所產生的微粒。低溫 泵32上設有一排氣管46。單向排氣閥40設於排氣管46上,475034 V. Description of the invention (4) | Figure 3 is a schematic diagram of the device near the filter in Figure 2. Explanation of symbols: 32 first vacuum pump 34 clean gas source 35 vacuum chamber 36 second vacuum pump 38 connection pipe 40 one-way exhaust valve 42 filter 44 oil seal ring 46 exhaust pipe 50 0 control valve embodiment: see FIG. 2 is a schematic diagram of a vacuum device according to the present invention. The present invention is an evacuation device capable of preventing vacuum failure caused by cleaning internal devices. The vacuum device of the present invention includes a first j vacuum pump 32, a one-way exhaust valve 40, and a cleaner 42. The first vacuum pump | 32 is connected to a vacuum chamber 35, so as to reduce the pressure A in the vacuum chamber 35, and the first! A vacuum pump 32 is connected to a clean gas source 34 to provide a gas having a pressure higher than the external pressure to remove particles generated during the operation of the first vacuum pump 32. The cryopump 32 is provided with an exhaust pipe 46. A one-way exhaust valve 40 is provided on the exhaust pipe 46,
用以於第一真空泵3 2内的壓力大於一外部壓力時,開啟而 使第一真空泵32内之氣體流經單向排氣閥40而排出第一真 IWhen the pressure in the first vacuum pump 32 is greater than an external pressure, it is turned on so that the gas in the first vacuum pump 32 flows through the one-way exhaust valve 40 to discharge the first true I
^E_88H8644 五、發明說明(5) 月 =泵32。濾清器42設於單向排氣閥4〇與第—直 間,用以濾除該㈣粒。 真空泵32之 本發明之抽真空裝置另包含一 真空泵32、赏—吉处石OP t ^ 弟一真空栗36。第一 . •一真工泵3 6與真空艙3 5之間以遠& # π。 接,各連接瞢連接官38相連 r ^ ^ 38上5又有控制閥50,用來控制各邻八Μ μ # --通。於抽真空時,先以第二直 士:卜刀間的乳 空至一預定&洛μ ^ ^ /、 汞扑將具空艙35抽真 疋的乳壓,然後關閉掉第二直*爷μ 真空觀續抽真空至更低的氣卓】,二,改由第- 空度。 ^ 也就疋製程所需的真 第一真空泵32以及第二直H 置,譬如說,第一真空”、:泵36 了以疋許多種類的裝 1 0_5〜1 〇-7按互(t (、的水疋〃、一可使真空艙之氣壓達到 異工的方法是以液態氦將真空 &飢汞的油 二真空泵36是為一可使直* :尸孔體冷歧後排出。而第 (torr) bh m ^ 一工艙之氣壓達到10-1〜1〇-5拢耳 (torr)的機械泵,而機械泵 對稱:滚軸將真空搶之氣體擠出去:的方法疋以齒輪或不 之干音:閱?3圖’第3圖為第2圖中的濾清器附近的裝置 之不思圖。早向排氣閥4〇設於 „ 控制開口之開啟與關閉。單为,46之一開口上,用來 設有一油封環(oil r」g)4I Ϊ氣間40與排氣管46之間另 來使單向排氣閥4〇緊密 *早向排氣閥40關閉·時,用 空.‘泵32。 策在的封住,防止外界氣體進入第一真 如第3圖所示,滹清哭 42是以-金屬網狀物VJ。,排氣管46内,濾清器 成 金屬網狀物捲成之一圓錐狀^ E_88H8644 V. Description of the invention (5) Month = pump 32. The filter 42 is provided between the one-way exhaust valve 40 and the first straight line for filtering out the particles. Vacuum pump 32 The vacuum pumping device of the present invention further includes a vacuum pump 32 and a sapphire stone OP t ^ one vacuum pump 36. First. • A real pump 36 and vacuum chamber 3 5 and far &# π. Then, each connection 瞢 connection officer 38 is connected to r ^ ^ 38 and there is a control valve 50 on the 5 to control each adjacent eight μ μ-pass. When vacuuming, first use the second straight: the milk space between the swords to a predetermined & Luo μ ^ ^ /, the mercury puff will pump the true breast pressure of the empty chamber 35, and then turn off the second straight * Ye μ vacuum view continues to evacuate to a lower Qi Zhuo], two, changed from the first-degree of air. ^ That is, the true first vacuum pump 32 and the second straight H required for the process, for example, the first vacuum ",: the pump 36 is equipped with many types of devices 1 0_5 ~ 1 〇-7 (t ( The method of making the air pressure of the vacuum chamber reach a different working method is to use liquid helium to vacuum the & mercury-hungry oil. The second vacuum pump 36 is to make straight *: the corpse hole is cold and discharged. (Torr) bh m ^ A mechanical pump with a pressure of 10-1 to 10-5 torr, and the mechanical pump is symmetrical: the roller squeezes out the gas grabbed by the vacuum: Gear or dry sound: Read the 3rd picture, the 3rd picture is the unconscious picture of the device near the filter in the second picture. The early exhaust valve 40 is set at the control opening and closing of the opening. One of the openings of 46 is used to provide an oil seal ring (oil) 4I, between the gas chamber 40 and the exhaust pipe 46 to make the one-way exhaust valve 40 tight * early exhaust valve 40 When closing, use the empty pump 32. Seal it to prevent outside air from entering the first. As shown in Figure 3, 滹 清 哭 42 is-metal mesh VJ., Inside the exhaust pipe 46, Filter into metal The mesh is rolled into a cone
$ 8頁 五、發明說明(6) -*- 物放置在排氣管46内。如此的做法有—個 需要去更改排氣管46的結構。濾清器“可 管46的側壁,固定在排氣管46之中。不論 常方便。當然也可以在排氣管46上加一: 形式^清器,但是製作的成本會大幅: 當弟-真空泵32, (Regenerate)時,潔淨用氣體源34會提供 氣體來沖洗並潔淨抽真空裝二 廠裡最容易獲得的氮氣。此;程 2所產生的微粒便會被氮氣帶走,】 ::1達=排氣闕4°之前,會被濾 單有機會到達油封“的 早向排虱閥40的關閉造成影響 w =習知的抽真空裝L本發明之 向排乳閥與連接管多加了::月: 油封的表面,所以不合 ,思π為,用 要定期的保養渡清器:機::排氣閥的關 常出現習知的抽直空裳=不會受微粒 以機台可以正常的工作抽真空 本t明雖以_較佳的效率 定本發明,任何孰習.馆ii'如, 和έ圍内,當可^此^、复1^ 好處〜不 頂著排氣 拿取都非 固定不同 最大的 以直接 放置或 裝置以 提南.。 行再生 大於一大氣壓的 使用的氣體是工 第一真空泵32損 單向排氣閥4 0流 清器4 2阻擋下 表面,便不會對 抽真空裝置於單 來阻止微粒到達 閉造成影響。只 的問題影響而經 不良的情形,所 〇 Μ,甚並非周以限 •、,分—〜_______ 應發明之精神 ^ ( ( ....... _—衫 、此本發明之ϋ護$ 8Page 5. Invention Description (6)-*-Objects are placed in the exhaust pipe 46. There is a need to change the structure of the exhaust pipe 46 in this way. The filter "can be fixed to the side wall of the pipe 46 in the exhaust pipe 46. It is always convenient. Of course, you can also add one to the exhaust pipe 46: form ^ cleaner, but the cost of production will be substantial: 当 弟- When the vacuum pump 32, (Regenerate), the clean gas source 34 will provide gas to flush and clean the most easily available nitrogen in the second vacuum plant. This; the particles generated in process 2 will be carried away by nitrogen,]: 1 reaches = exhaust 阙 4 °, it will be affected by the closing of the filter head to reach the oil seal "early lice valve 40" w = the conventional vacuum pump L :: Month: The surface of the oil seal is not consistent. Think about it. Use regular maintenance for the cleaner: Machine :: The exhaust valve is often used to close the air. It can work under normal vacuum, although it is clear that the present invention can be set with _ better efficiency, any study. Museum ii ', such as, and έ Wai, when you can ^ this ^, complex 1 ^ benefits ~ do not take against the exhaust Take the non-fixed and different largest to directly place or install to the south. The regeneration uses more than one atmosphere of gas. The first vacuum pump 32 is damaged. The one-way exhaust valve 40 and the flow filter 42 are blocked by the lower surface. This will not affect the vacuum device to prevent particles from reaching the gate. Only the problem affects the bad situation, so 〇 Μ, is not limited to the week • ,, points-~ _______ the spirit of invention ^ ((....... _-shirt, the protection of this invention
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TW88118644A TW475034B (en) | 1999-10-28 | 1999-10-28 | Evacuation device |
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TW88118644A TW475034B (en) | 1999-10-28 | 1999-10-28 | Evacuation device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI385307B (en) * | 2009-02-24 | 2013-02-11 | Shimadzu Corp | Turbine Molecular Pumps and Turbine Molecular Pumps |
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1999
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI385307B (en) * | 2009-02-24 | 2013-02-11 | Shimadzu Corp | Turbine Molecular Pumps and Turbine Molecular Pumps |
US8894355B2 (en) | 2009-02-24 | 2014-11-25 | Shimadzu Corporation | Turbomolecular pump, and particle trap for turbomolecular pump |
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