TW473801B - Lid plate device for protecting machine platen - Google Patents

Lid plate device for protecting machine platen Download PDF

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Publication number
TW473801B
TW473801B TW90100377A TW90100377A TW473801B TW 473801 B TW473801 B TW 473801B TW 90100377 A TW90100377 A TW 90100377A TW 90100377 A TW90100377 A TW 90100377A TW 473801 B TW473801 B TW 473801B
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Taiwan
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cover
cover plate
patent application
scope
plates
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TW90100377A
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Chinese (zh)
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Kok-Weng Tan
Hung-I Shu
Yu-Chun Chiu
Heng-Chang Hsieh
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United Microelectronics Corp
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Abstract

The present invention provides a lid plate device fixed above the machine platen in a clean room for protecting the machine platen. The device includes at least two supporting shafts and a plurality of rectangular sheet lid plates for connecting to the supporting shafts in an inclined and mutually parallel manner. Each lid plate has a part of area overlapped with the projecting plane of the adjacent lid plate in a vertical direction, wherein each lid plate is formed by an anti-acid zinc-plated steel plate, and the bottom of each lid plate is connected with a flow-guiding slot for carrying and guiding the carelessly leaked process liquid.

Description

473801 五、發明說明α) 發明之領域 本發明係提供一種保護機台之蓋板裝置,尤指一種固 定於潔淨室内之機台上方,用以保護機台之蓋板裝置。 背景說明 一般的晶圓廠中,所有的製程均是在潔淨室中完成 的,而為了節省空間,潔淨室大多係採用複數層類似樓中 樓的設計;亦即利用一交錯網狀的鍍鋅鋼架與欄杆,搭設 g 於地面某一個高度,然後於其上架設主機台與管線。 _ 然而此一設計通常會產生兩個問題,第一是由於該鍍 鋅鋼架為交錯網狀,且該欄杆也不足以完全封閉住該鍍鋅 鋼架,所以某些不慎墜落之工具或者是零件,常會穿過網 狀鋼架與欄杆的空隙,而損害到樓下的機台或工作人員。 第二個問題在於,架設在網狀鍍鋅鋼架上的主機台與各縱 橫交錯的管線之中,常常充滿了許多酸性或驗性的製程溶 液,例如濕#刻(w e t e t c h i n g)製程中,為了去除二氧化 石夕層(silicon dioxide )之亞石肖酸(n i t r i c a c i d )與氫氟酸 (hydrofluoric acid)的製程混合溶液。這些溶液極有可 j 能從主機台與管線的接縫處流出,進而滴落於網狀與欄杆 的空隙間,而損害到樓下的機台或工作人員。473801 V. Description of the invention α) Field of the invention The present invention provides a cover device for protecting a machine, particularly a cover device fixed above a machine in a clean room to protect the machine. Background: In a general wafer factory, all processes are completed in a clean room. In order to save space, most of the clean rooms adopt a design similar to the middle floor of multiple floors; that is, a staggered mesh galvanized The steel frame and railing are set up at a certain height on the ground, and then the main platform and pipeline are set up on it. _ However, this design usually produces two problems. The first is that the galvanized steel frame is staggered and the railing is not enough to completely close the galvanized steel frame. Therefore, some accidental falling tools or It is a part that often passes through the gap between the mesh steel frame and the railing, and damages the machine or staff below. The second problem is that the mainframe and the criss-crossed pipelines that are installed on the mesh galvanized steel frame are often filled with many acidic or experimental process solutions, such as the wet #etching process. A mixed solution of a process for removing nitricacid and hydrofluoric acid from silicon dioxide. These solutions are very likely to flow out from the joint between the mainframe and the pipeline, and then drip into the gap between the mesh and the railing, thereby damaging the machine or the staff below.

473801 五、發明說明(2) 由於這些製程溶液都是高揮發性、高腐蝕性或有毒的 溶液,所以當製程溶液外漏時,這些溶液或揮發的氣體必 將造成工作人員肉體上的傷害,甚至會導致無法彌補的後 果,而且該外漏之製程溶液亦有可能會滴落侵蝕到樓下的 機台、腐蝕電路而造成整座機台的故障,進而導致整條生 產線的停擺以及資源的浪費。此外,在一塵不染、高潔淨 度的無塵室中,該製程溶液揮發所產生的微粒 (particles),也必定會對晶片表面造成傷害。 習知在預防這些問題的解決方法係在網狀鐵架下面, 鋪設一塊比下方之主機台稍大的蓋板裝置1 0 0,用以承接 不慎掉落的製程溶液或工具、零件。請參閱圖一,圖一是 習知技術的示意圖。習知技術係將一蓋板裝置1 0 0設於一 潔淨室2 0 0之内,潔淨室2 0 0包含有蓋板裝置1 0 0、一空氣 過濾器(air filter)202、一 進氣口 204、一 出氣口 206、 一網狀鋼架2 0 8、一機台2 1 0 a設於網狀鋼架2 0 8之上,以及 一機台2 1 0 b設於網狀鋼架2 0 8之下,而蓋板裝置1 0 0的結構 包含有一片鍍鋅鋼板1 0 2固定在該潔淨室内之機台2 1 0 b的 上方,以及四根設於鐘鋅鋼板1 0 2四角之垂直方向的支撐 軸1 0 4 (於圖一只顯示兩根),且鍍鋅鋼板1 0 2所覆蓋的面 積,略大於機台210b,用來保護下方的機台或工作人員, 以防止製程溶液的侵蝕及工具、零件的掉落,傷及下方的 機台或工作人員。473801 V. Description of the invention (2) Since these process solutions are all highly volatile, highly corrosive or toxic solutions, when the process solution leaks out, these solutions or volatile gases will definitely cause physical injury to workers. It may even lead to irreparable consequences, and the leaked process solution may drip and erode the machine downstairs, corrode the circuit and cause the failure of the entire machine, which will cause the entire production line to stop and resources. waste. In addition, in a clean, clean room, the particles generated by the volatilization of the process solution will certainly cause damage to the wafer surface. It is known that the solution to prevent these problems is to lay a cover device 100, which is slightly larger than the mainframe underneath, under the mesh iron frame to receive the accidentally dropped process solution, tools, and parts. Please refer to Fig. 1, which is a schematic diagram of a conventional technique. The conventional technology is to install a cover device 100 in a clean room 200, which includes a cover device 100, an air filter 202, and an air intake. Port 204, an air outlet 206, a meshed steel frame 2 0 8, a machine 2 1 0 a is provided on the meshed steel frame 2 0 8 and a machine 2 1 0 b is provided on the meshed steel frame Below 2008, the structure of the cover device 100 includes a piece of galvanized steel plate 102 fixed above the machine 2 1 0 b in the clean room, and four zinc plate steel plates 102 The four vertical support shafts 104 (two are shown in the figure), and the area covered by the galvanized steel sheet 102 is slightly larger than the machine 210b, which is used to protect the machine or workers below. Prevent the erosion of the process solution and the fall of tools and parts, and hurt the machine or staff below.

第5頁 473801 五、發明說明(3) 潔淨室2 0 0係利用空氣過濾器2 0 2、進氣口 2 0 4、出氣 口 2 0 6以達到保持潔淨度(c 1 e a η 1 i n e s s )的要求。其中,空 氣過濾器2 0 2係捕捉空氣中的微粒,而使空氣中的微粒保 持在某一程度之下。進氣口 2 0 4,則供給新鮮空氣給潔淨 室2 0 0,同時稀釋空氣中微粒的濃度。而出氣口 2 0 6,則負 責將空氣排出潔淨室2 0 0之外,以產生充分的對流。 由於潔淨室2 0 0的設計是希望藉由進氣口 2 0 4與出氣口 2 0 6間之空氣的進出與對流(如箭頭所示),然後再利用空 氣過濾器2 0 2來減少空氣中的微粒,進而達到保持潔淨度 的要求。但是習知技術的蓋板裝置1 0 0卻會造成設有蓋板 裝置1 0 0處之空氣的不流通(如箭頭所示),而致使潔淨室 2 0 0無法達到潔淨度的要求。 如上所述,習知技術雖然能夠避免機台或工作人員遭 受製程溶液與工具的侵蝕及損害,但卻也同時造成潔淨室 裡面空氣無法流通,嚴重影響潔淨室裡面潔淨度的要求。 發明概述 因此,本發明之目的即在提供一種新的蓋板裝置,以 達到潔淨度要求並同時兼顧工業安全,解決上述問題。 本發明係提供一固定於潔淨室内之機台上方,用以保Page 5 473801 V. Description of the invention (3) Clean room 2 0 0 uses air filter 2 2, air inlet 2 0 4 and air outlet 2 0 6 to maintain cleanliness (c 1 ea η 1 iness) Requirements. Among them, the air filter 202 traps particles in the air and keeps the particles in the air below a certain level. The air inlet 2 0 4 supplies fresh air to the clean room 2 0 and at the same time dilutes the particle concentration in the air. The air outlet 2 06 is responsible for exhausting air out of the clean room 2 0 to generate sufficient convection. Because the design of clean room 2 0 0 is to reduce the air through the inflow and convection of air between the air inlet 2 0 4 and the air outlet 2 0 (as shown by the arrow), and then use the air filter 2 0 2 Particulates, which in turn meets the requirements for maintaining cleanliness. However, the cover device 100 of the conventional technology will cause the air circulation at the cover device 100 (as shown by the arrow), and the clean room 2000 cannot meet the requirements of cleanliness. As mentioned above, although the conventional technology can prevent the machine or workers from being eroded and damaged by the process solution and tools, it can also cause the air in the clean room to circulate, which seriously affects the cleanliness requirements in the clean room. SUMMARY OF THE INVENTION Therefore, the object of the present invention is to provide a new cover device to meet the requirements of cleanliness while taking into account industrial safety, and to solve the above problems. The invention provides a machine fixed in a clean room for protection.

第6頁 4?33〇i 五、發明説明⑷ 數二片狀蓋板,且各該蓋板二二t串接於各該支樓轴上之 矩形片一 米至2〇公分的部份區 數ί片狀蓋板,且各該蓋板均二甲接於谷孩叉得軸上a 矩Ϊ二於相鄰蓋板之垂直方2=i厘米至20公分的部份區 威j a由-防酸之鍍辞鋼板i以:f平面上。*中各該盖 :此之頂部與底部所構成,I各該、ί f物連接各相鄰蓋板 <導流槽,用來承接並導引一不=#板之底部下方另設有 本發明之優點在於,該蓋板裝 ^ ^ T e 兩从λα u 攸衣置既可有效防止製程溶 、备的侵妙及工具、零件的掉落,士 η η主长A ^ 干/合也冋時兼顧了潔淨室裡面 .紗詻度的要水。 /導",l 丨不慎外漏的制紹杰μ 潔淨度的 發明之詳細說明 請參閱,二,圖二為本發明最佳實施例之外觀圖。如 圖二所示’蓋板裝置10包含有四根互相平行的水平方向的 支撐軸1 2、四根互相平行的垂直方向的支撐軸丨3、複數片 矩形蓋板1 4,以及一導流管1 8。其中,各支撐軸1 2、1 3與 蓋板1 4皆係由防酸之鍍鋅鋼板或材料所製成,且各支撐軸 1 2係用來串接各蓋板1 4相對應之角,以固定住複數個蓋板 i 4,同時使複數個蓋板1 4能夠維持傾斜及互相平行的$列 狀態,且各支撐軸1 3則係連接網狀鋼架(未顯示於圖中), 以固定蓋板裝置1 0設於潔淨室下層之機台(未顯示於圖中) 的上方。而導流管1 8係設於複數片矩形蓋板1 4之同一側角Page 6 4 ~ 33〇i V. Description of the invention 数 Number of two sheet-shaped cover plates, and each of the cover plates 22 t is connected in series to a part of the rectangular piece on the shaft of the branch from one meter to 20 cm. Count several sheet-shaped cover plates, and each of the cover plates is connected to the Gu Hai fork axis a moment Ϊ 2 is perpendicular to the adjacent cover plate 2 = i cm to 20 cm. The acid-proof plated steel sheet i is on the f plane. Each cover in *: This top and bottom are made up, each should be connected to each adjacent cover < diversion slot, used to receive and guide the bottom of the plate is not provided The advantage of the present invention is that the cover assembly ^ ^ T e and λα u can effectively prevent the melting of the process, the invasion of preparation, and the fall of tools and parts, and the main length A ^ dry / close I also took into account the clean room. I want water. / 引 ", l 丨 Carefully leaked details of the invention of the Shaojie μ cleanliness invention Please refer to FIG. 2. FIG. 2 is an external view of a preferred embodiment of the present invention. As shown in FIG. 2 ', the cover plate device 10 includes four horizontal support shafts 1 parallel to each other, 2, four vertical support shafts parallel to each other, 3, a plurality of rectangular cover plates 14, and a flow guide. Tube 1 8. Among them, each support shaft 1 2, 1 3 and the cover plate 14 are made of acid-proof galvanized steel plate or material, and each support shaft 12 is used to connect the corresponding angles of the cover plates 14 in series. In order to fix a plurality of cover plates i 4 while maintaining a plurality of cover plates 1 4 to maintain a tilted and parallel $ row state, and each support shaft 1 3 is connected to a mesh steel frame (not shown in the figure) The fixed cover device 10 is arranged above the machine (not shown in the figure) below the clean room. And the diversion tube 18 is set at the same side corner of a plurality of rectangular cover plates 1 4

473801 五、發明說明(5) 下方,且蓋板裝置1 0所覆蓋的面積,略大於潔淨室下層之 機台,故能防止製程溶液的侵蝕及工具、零件的掉落,而 保護下方的機台或工作人員。 請參閱圖三,圖三為圖二所示之相鄰蓋板的相對位置 示意圖。如圖三所示,各蓋板1 4係以傾斜且彼此平行之方 式分別串接於各支撐軸1 2上,且各蓋板1 4之頂部在垂直方 向的投影平面上係位於另一相鄰蓋板1 4底部之上方。也就 是說,任兩相鄰之蓋板1 4均有部份區域,重疊於相鄰蓋板 1 4的垂直方向之投影平面上,且該部份區域於該投影平面 β 上的最小邊長為1公髮至2 0公分,以防止未承接到部分滴 落的製程溶液。 請參閱圖四及圖五,圖四及圖五分別為由Α方向及Β方 向直視圖二之任一蓋板1 4的示意圖。如圖四所示,蓋板14 為一矩形片狀板,並與水平面成11 3 0的傾斜夾角,以承 接並引導可能從主機台與管線之接縫處流出而滴落於網狀 與欄杆之空隙間的製程溶液。如圖五所示,蓋板1 4的底部 包含有一導流槽1 6,以將該滴落的製程溶液引導至導流管 1 8。導流管1 8係設於各蓋板1 4之同一側角下方,用來將導 流槽1 6所承接的製程溶液引導至一出口(未顯示)。其中,__ 各蓋板1 4均係由兩片狀物1 4a,1 4b所構成(或為一經過鍛 造之L型片狀板),且兩片狀物1 4a,1 4b於蓋板1 4底部形成 一夾角形之凹槽當作導流槽1 6,而各導流槽1 6下方即設置473801 V. Description of the invention (5) The area under the cover device 10 is slightly larger than that of the lower machine in the clean room, so it can prevent the erosion of the process solution and the fall of tools and parts, and protect the lower machine. Desk or staff. Please refer to Figure 3, which is a schematic diagram of the relative positions of adjacent cover plates shown in Figure 2. As shown in FIG. 3, each cover plate 14 is serially connected to each support shaft 12 in an inclined and parallel manner, and the top of each cover plate 4 is located in another phase on a vertical projection plane. Adjacent to the bottom of the cover 14. That is, any two adjacent cover plates 14 have a partial area that overlaps the vertical plane of the adjacent cover plate 14 and the minimum side length of the partial area on the projection plane β. It is from 1 cm to 20 cm to prevent the process solution from not dripping. Please refer to FIG. 4 and FIG. 5, which are schematic diagrams of any one of the cover plates 14 from the direction A and the direction B from the second view, respectively. As shown in Figure 4, the cover plate 14 is a rectangular sheet-shaped plate, and it is inclined at an angle of 1130 with the horizontal plane to receive and guide the water that may flow out from the joint between the main platform and the pipeline and drip on the net and railing The process solution between the gaps. As shown in FIG. 5, the bottom of the cover plate 14 includes a diversion groove 16 to guide the dropped process solution to the diversion tube 18. A diversion tube 18 is disposed below the same side corner of each cover plate 14 and is used to guide the process solution received by the diversion tank 16 to an outlet (not shown). Among them, __ each cover 14 is composed of two sheets 1 4a, 1 4b (or a forged L-shaped sheet), and the two sheets 14a, 1 4b are on the cover 1 4 An angled groove is formed at the bottom as the diversion groove 16, and each diversion groove 16 is arranged below the diversion groove 16

第8頁 473801 五、發明說明(6) 有前述之導流管1 8。 請參閱圖六,圖六為本發明之第二實施例。各蓋板 1 4c底部的導流槽1 6,係為一經過鍛造之圓弧形設計,而 非由兩片狀物1 4a,1 4b於蓋板1 4c底部所構成的銳角結 構。請參閱圖七,圖七為本發明之第三實施例。各蓋板 1 4d之頂部另設有一倒鉤式之頂蓋1 5,俾使滴落到頂蓋1 5 的製程溶液,可以順著頂蓋1 5的弧度,往下分流到相鄰蓋 板14d或自身蓋板14d的導流槽16,以避免該製程溶液滴落 到本發明最佳實施例的蓋板1 4頂部時,會飛濺到機台或工 β 作人員上。 請參閱圖八及圖九’圖八及圖九分別為本發明之弟 四、五實施例。如圖八所示,各蓋板1 4 e之頂部與另一相 鄰之蓋板1 4 e底部之間,另可以設一網狀物2 0相連接,俾 更能保證製程溶液或零件、工具,不會藉由各蓋板1 4之頂 部與另一相鄰之蓋板1 4底部所構成的空隙,而損害到機台 或工作人員。此外,如圖九所示,網狀物2 2亦可以直接覆 蓋於各蓋板14f的頂部間。 本發明係利用複數個傾斜且彼此平行的蓋板所構成, 並以部份重疊於相鄰蓋板之垂直方向之投影平面上的方 式,來使得製程溶液或零件、工具無法藉由相鄰蓋板之間 的空隙,而損害到樓下的機台和工作人員。此外,由於本Page 8 473801 V. Description of the invention (6) The aforementioned diversion tube 18 is provided. Please refer to FIG. 6, which is a second embodiment of the present invention. The guide groove 16 at the bottom of each cover plate 4c is a forged arc-shaped design, instead of an acute angle structure formed by two pieces of objects 14a and 14b at the bottom of the cover plate 4c. Please refer to FIG. 7, which is a third embodiment of the present invention. On the top of each cover 14d, a barb top cover 15 is provided, so that the process solution dripped onto the cover 15 can flow down the arc of the cover 15 to the adjacent cover 14d. Or the guide groove 16 of the cover plate 14d itself, to prevent the process solution from dripping onto the machine or workers when the process solution drips on top of the cover plate 14 of the preferred embodiment of the present invention. Please refer to Fig. 8 and Fig. 9 'Fig. 8 and Fig. 9 are the fourth and fifth embodiments of the invention, respectively. As shown in Figure 8, a mesh 20 can be connected between the top of each cover 1 4e and the bottom of another adjacent cover 1 4e, which can better ensure the process solution or parts, The tool will not damage the machine or the staff through the gap formed by the top of each cover 14 and the bottom of another adjacent cover 14. In addition, as shown in Fig. 9, the meshes 22 can also be directly covered between the tops of the respective cover plates 14f. The invention uses a plurality of cover plates inclined and parallel to each other, and partially overlaps the projection plane of the vertical direction of the adjacent cover plates, so that the process solution or parts and tools cannot pass through the adjacent covers. The gap between the boards hurts the machine and staff downstairs. In addition, since this

第9頁 473801 五、發明說明(7) 發明的相鄰蓋板之間均留有空隙,故而能保證潔淨室中空 氣的對流效果,進而兼顧到潔淨室中的潔淨度要求。 相較於習知技術,本發明在維護工業安全的同時,也 兼顧了潔淨室裡面,對潔淨度的嚴格要求,而達到兩全其 美的目標。 以上所述僅為本發明之較佳實施例,凡依本發明申請 專利範圍所做之均等變化與修飾,皆應屬本發明專利之涵 蓋範圍。Page 9 473801 V. Description of the invention (7) There are gaps between adjacent cover plates of the invention, so the convection effect of air in the clean room can be guaranteed, and the cleanliness requirements in the clean room can be taken into account. Compared with the conventional technology, the present invention, while maintaining industrial safety, also takes into account the strict requirements for cleanliness in the clean room, and achieves the best of both worlds. The above description is only a preferred embodiment of the present invention, and all equivalent changes and modifications made in accordance with the scope of the patent application for the present invention shall fall within the scope of the invention patent.

第10頁 473801 圖式簡單說明 圖示之簡單說明 圖一為習知技術的蓋板裝置示意圖。 圖二為本發明最佳實施例之外觀圖。 圖三為圖二所示之相鄰蓋板的相對位置示意圖。 圖四為由A方向直視圖二之任一蓋板1 4的示意圖。 圖五為由B方向直視圖二之任一蓋板1 4的示意圖。 圖六至圖九為本發明之第二、三、四,五實施例示意 圖。 圖示之符號說明Page 10 473801 Brief description of the drawings Brief description of the drawings Figure 1 is a schematic diagram of a cover device of the conventional technology. FIG. 2 is an external view of a preferred embodiment of the present invention. FIG. 3 is a schematic diagram of relative positions of adjacent cover plates shown in FIG. 2. FIG. 4 is a schematic view of any one of the cover plates 14 as viewed from the direction A. FIG. FIG. 5 is a schematic view of any one of the cover plates 14 as viewed from the B direction. 6 to 9 are schematic diagrams of the second, third, fourth, and fifth embodiments of the present invention. Symbol description

100' 10 蓋 板 裝置 102 鍍 鋅 鋼 板 104、 12 支 撐 轴 20 0 潔 淨 室 202 空 氣 過濾器 204 進 氣 α 206 出 氣 口 208 網 狀 鋼 架 210a 、b 機 台 14、 14c、 14d、 .14e' 14f 蓋 板 14a、 14b 片 狀 物 15 頂 蓋 16 導 流 槽 18 導 流 管 2 0' 22 網 狀 物 第11頁100 '10 Cover device 102 Galvanized steel plate 104, 12 Support shaft 20 0 Clean room 202 Air filter 204 Air inlet α 206 Air outlet 208 Mesh steel frame 210a, b Machine table 14, 14c, 14d, .14e' 14f Covers 14a, 14b Sheets 15 Top cover 16 Baffles 18 Baffles 2 0 '22 Mesh p. 11

Claims (1)

473801 六、申請專利範圍 1. 一種設置於一潔淨室(c 1 e a η r ο 〇 m )内之一蓋板裝置, 該潔淨室内設有一機台,該蓋板裝置包含有: 至少二支撐轴,固定於該潔淨室内之該機台上方;以 及 複數片蓋板,分別牟接於各該支撐軸上,且各該蓋板 之頂部位於另一相鄰蓋板底部之上方。 2. 如申請專利範圍第1項之蓋板裝置,其中各該蓋板皆 為一矩形片狀板,且各該支撐軸係用來串接各該蓋板相對 應之角。 3. 如申請專利範圍第1項之蓋板裝置,其中备該蓋板係 以傾斜且彼此平行之方式分別串接於各該支撐軸上。 4. 如申請專利範圍第1項之蓋板裝置,其中各該蓋板係 為防酸之鍍鋅鋼板。 5. 如申請專利範圍第1項之蓋板裝置,其中任兩相鄰之 蓋板均有部份區域重疊於垂直方向之投影平面上,且該部 份區域於該投影平面上的最小邊長為1釐米至2 0公分。 6. 如申請專利範圍第1項之蓋板裝置,其中各該蓋板之 頂部與另一相鄰之蓋板底部係以一網狀物連接。473801 6. Scope of patent application 1. A cover device provided in a clean room (c 1 ea η r ο 〇m), the clean room is provided with a machine, the cover device includes: at least two support shafts Is fixed above the machine in the clean room; and a plurality of cover plates are respectively connected to the support shafts, and the top of each cover plate is above the bottom of another adjacent cover plate. 2. As for the cover device of the first patent application, each of the cover plates is a rectangular sheet plate, and each of the support shafts is used to connect the corresponding corners of the cover plates in series. 3. As for the cover device of the scope of patent application, the cover plates are connected in series to each of the support shafts in an inclined and parallel manner. 4. As for the cover plate device in the scope of patent application, each of the cover plates is an acid-proof galvanized steel plate. 5. For the cover device of the scope of patent application, any two adjacent cover plates have a partial area overlapping on the vertical projection plane, and the minimum side length of the partial area on the projection plane It is 1 cm to 20 cm. 6. As for the cover plate device in the scope of patent application, the top of each cover plate and the bottom of another adjacent cover plate are connected by a mesh. 第12頁 473801 六、申請專利範圍 7. 如申請專利範圍第1項之蓋板裝置,其中各該蓋板係 由兩片狀物所構成,且兩片狀物於蓋板底部形成一夾角形 之凹槽。 8. 如申請專利範圍第1項之蓋板裝置,其中各該蓋板底 部係一圓弧形設計,用來承接並導引一液體。 9. 如申請專利範圍第1項之蓋板裝置,其中各該蓋板之 頂部另設有一倒鉤式之頂蓋。 1 0. —種設置於一潔淨室内用來保護一機台之蓋板裝置, 該蓋板裝置包含有: 至少二支撐軸,固定於該潔淨室内之機台上方; 複數片蓋板,各該蓋板分別爭接於各該支撐軸上,各 該蓋板底部包含有一導流槽,且各該蓋板之頂部位於另一 相鄰蓋板之導流槽上方;以及 一導流管,設於各該蓋板底部之同一側角下方,用來 將各該導流槽收集之液體引導至一出口。 11.如申請專利範圍第1 〇項之蓋板裝置,其中各該蓋板皆 為一矩形片狀板,各該支撐軸係用來串接各該蓋板相對應 4 之角。 1 2.如申請專利範圍第1 0項之蓋板裝置,其中各該蓋板係Page 12 473801 VI. Application for patent scope 7. For the cover device of the first scope of patent application, each of the cover plates is composed of two pieces, and the two pieces form an angle shape at the bottom of the cover plate. Of the groove. 8. As for the cover plate device of the scope of patent application, the bottom of each cover plate is an arc-shaped design for receiving and guiding a liquid. 9. As for the cover plate device of the scope of patent application, the top of each cover plate is additionally provided with a barb top cover. 1 0. A cover device provided in a clean room to protect a machine, the cover device includes: at least two support shafts fixed above the machine in the clean room; a plurality of cover plates, each of which Cover plates compete with each of the support shafts, and the bottom of each cover plate includes a flow guide groove, and the top of each cover plate is located above the flow guide groove of another adjacent cover plate; Below the same side corner of the bottom of each cover plate, it is used to guide the liquid collected by each diversion tank to an outlet. 11. The cover device according to item 10 of the patent application scope, wherein each of the cover plates is a rectangular sheet-shaped plate, and each of the support shafts is used to serially connect the corresponding 4 corners of each of the cover plates. 1 2. The cover plate device according to item 10 of the patent application scope, wherein each of the cover plates is 第13頁 473801 六、申請專利範圍 以傾斜且彼此平行之方式分別串接於各該支撐軸上。 1 3 .如申請專利範圍第1 0項之蓋板裝置,其中該蓋板底部 鄰近該導流管之一側低於各該蓋板底部之另一側,,以使 滴落之液體得以順利流入導流管内。 1 4 .如申請專利範圍第1 3項之蓋板裝置,其中該蓋板裝置 傾斜之角度約為1 °至3 0 °。 1 5 ·如申請專利範圍第1 0項之蓋板裝置,其中各該蓋板係 為防酸之鍍鋅鋼板。 1 6.如申請專利範圍第1 0項之蓋板裝置,其中任兩相鄰之 蓋板均有部份區域重疊於垂直方向之投影平面上,且該部 份區域於該投影平面上的最小邊長為1釐米至2 0公分。 1 7.如申請專利範圍第1 0項之蓋板裝置,其中各該蓋板之 頂部與另一相鄰之蓋板底部係以一網狀物連接。 1 8 .如申請專利範圍第1 0項之蓋板裝置,其中該導流槽係 係由兩片狀物之夾角形成。 1 9.如申請專利範圍第1 0項之蓋板裝置,其中該導流槽係 一圓弧形設計,用來承接並導引一液體。Page 13 473801 VI. Scope of patent application Serially connected to each of the support shafts in an inclined and parallel manner. 1 3. According to the cover plate device of the scope of application for patent No. 10, wherein the side of the bottom of the cover plate adjacent to the guide tube is lower than the other side of the bottom of each cover plate, so that the dripping liquid can be smoothly Into the diversion tube. 14. The cover device according to item 13 of the patent application scope, wherein the cover device is tilted at an angle of about 1 ° to 30 °. 1 5 · The cover plate device according to item 10 of the patent application scope, wherein each of the cover plates is an anti-acid galvanized steel plate. 16. As for the cover device of item 10 of the patent application scope, any two adjacent cover plates have a partial area overlapping on a vertical projection plane, and the smallest area of the partial area on the projection plane The side length is 1 cm to 20 cm. 1 7. The cover plate device according to item 10 of the patent application scope, wherein the top of each cover plate and the bottom of another adjacent cover plate are connected by a mesh. 18. The cover plate device according to item 10 of the patent application scope, wherein the diversion groove is formed by an angle between two pieces. 19. The cover plate device according to item 10 of the patent application scope, wherein the guide groove is an arc-shaped design for receiving and guiding a liquid. 第14頁 473801Page 473 801 第15頁Page 15
TW90100377A 2001-01-08 2001-01-08 Lid plate device for protecting machine platen TW473801B (en)

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