TW463043B - Analyzing method of molten metal and apparatus therefor - Google Patents

Analyzing method of molten metal and apparatus therefor Download PDF

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TW463043B
TW463043B TW89121658A TW89121658A TW463043B TW 463043 B TW463043 B TW 463043B TW 89121658 A TW89121658 A TW 89121658A TW 89121658 A TW89121658 A TW 89121658A TW 463043 B TW463043 B TW 463043B
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light
wavelength
intensity
measurement
molten metal
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TW89121658A
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Chinese (zh)
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Kazukiyo Yoshida
Tomoharu Ishida
Takanori Akiyoshi
Atsushi Chino
Ikuhiro Sumi
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Nippon Kokan Kk
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Abstract

Concentration of analyzing element is determined from the intensity variation of laser beam which passed through the vapor layer of molten metal. The wavelength of the laser beam is adjusted to the position which is deviated from the center position of absorption wavelength of the analyzing element by 0.001-0.03 nano-meter. It is possible to expand the measuring concentration range.

Description

4 63 04 五、發明說明(】) ~ — ---—_ 【技術領域】 本發明是關於熔化金屈 裝置。 匕孟屬成/刀几素的快速分析的方法及其 【技術背景】 為了控制金屬的;Λ掉陆.a < _ . ^ 口精煉過程’對溶化金屬之在生连蝻上 —分浙的要求报強烈。徊a 闻〜隹生產線上 搔柃卢私宜i 仁疋’由於炼化金屬之測定蛊会浙的 環i兄處於尚溫和粉塵等亞 彳疋只刀析的 下的工程上的課題壓:為了解決這樣惡劣環境 能實現。 b在生產線上分析的實用化幾乎未 通常,作為進行金屬組成分析的可靠性較高Μ A & + 法,是對於用酸等分艇厶麗p ^、々霏性权阿的分析方 收光度法進行4: i!!;;液的試樣1用原子吸 本/上南精度的分析方法即原二二* * 今古·^八 > 久认7^度法用於炼化+屬 直接刀析,例如日本專利特開平09_049 795 ' 的溶化金屬之直接分析方法及其裝置、以及二報二載 :〇"〇〇725號公報記載的嫁化金屬之直接化學分專寺開 屬之表面上的金屬蒸氣層照射特定“匕m金 元素的含量。 广出烙化金屬中成分 之ϊ:進亡ί,獻記載的採用原子吸收光度法對炼化金屬 之瘵軋進仃4析的方法,由於金屬蒸氣量不能控屬 表現出測定含量範圍較窄的原子吸故^必 該問題說明如下。 收光度法的缺點。現將4 63 04 V. Description of the invention (]) ~ — ---—_ [Technical Field] The present invention relates to a molten gold buckling device. Method for rapid analysis of genus genus / knifediol and its [technical background] In order to control the metal; Λ drop off the land. A < _. ^ Oral refining process' on the life of the molten metal-points Zhejiang The request is strong. Aa smell ~ 隹 Production line 搔 柃 Lu Yiyi i Ren 疋 'Due to the determination of the refining metal, the ring of Zhejiang will be under the engineering problem of sub-kinetic analysis such as mild dust: in order to Solving such a harsh environment can be achieved. b The practical application of analysis on the production line is almost uncommon. As a highly reliable method for performing metal composition analysis, the M A & + method is an analysis method for the analysis of acidic aliquots, p. Photometric method 4: i !! ;; liquid sample 1 using atomic absorption / Shangan precision analysis method is the original 22 * * ancient times ^ eight > long recognized 7 ^ degree method for refining + It is a direct knife analysis, for example, a method and a device for the direct analysis of molten metals in Japanese Patent Laid-Open No. 09_049 795 ', and a second chemical journal of the second chapter and second issue: 〇 " 〇〇725 open the direct chemical branch The metal vapor layer on the surface of the genus is irradiated with a specific content of gold element. It is widely known that the constituents in the metallized metal are: dying, and the documented method of atomic absorption spectrophotometry is used to roll the metal into the metal. 4 The analysis method, because the amount of metal vapor cannot be controlled, shows a narrow range of atomic absorption, so the problem must be explained as follows. The disadvantages of the photometric method. Now

4 63 04 3 五、發明說明(2) 關於原子吸收光度法的測定原理,是根據下列公式(1 ) 的原子吸收現象,求出試樣中分析元素的含量或者濃度。 A= // CL .............................. (1 ) (式中,A :吸收光的強度變化(=—log(I/Io))、 (1/1 〇);光強度比I :吸光後光強度;Ιο :吸光前光強 度;:吸光係數(固有波長);C :分析元素的含量或 濃度;L :蒸氣層長度)。 從上述公式(1 )可以看出,光強度比(I / I 〇 )伴隨分 析元素含量或濃度C的增加而急劇下降。當光強度比 (I / I 〇 )過小時,則出現由於受吸收光以外的光的影響並 顯示出測定裝置的測定值的不穩定性,其結果,使濃度的 測定變得困難。故該分析元素的量或濃度C存在分析的上 限。 為了擴大分析測定的量或濃度,根據公式(1)’降低β 、C、L各項參數中一個或幾個參數。例如,在熔化原子吸 收光度法中稀釋試樣溶液降低元素量或濃度C,或者將原 子化部C燒嘴)的光轴角度加以改變,縮短蒸氣層的長度 L,可以使測定濃度的範圍擴大。4 63 04 3 V. Description of the invention (2) The measurement principle of the atomic absorption spectrophotometry is to determine the content or concentration of the analytical element in the sample based on the atomic absorption phenomenon of the following formula (1). A = // CL .................... (1) (where A: change in intensity of absorbed light ( = —Log (I / Io)), (1/1 〇); light intensity ratio I: light intensity after light absorption; Ι: light intensity before light absorption ;: light absorption coefficient (natural wavelength); C: content or concentration of analysis element ; L: vapor layer length). As can be seen from the above formula (1), the light intensity ratio (I / I 0) decreases sharply with an increase in the content of the analysis element or the concentration C. When the light intensity ratio (I / I 0) is too small, the measurement value of the measuring device becomes unstable due to the influence of light other than the absorbed light, and as a result, it becomes difficult to measure the concentration. Therefore, there is an upper limit for the amount or concentration C of the analysis element. In order to increase the amount or concentration of the analytical measurement, one or several parameters of β, C, and L are decreased according to the formula (1) '. For example, by diluting the sample solution in the melt atomic absorption spectrophotometry to reduce the element amount or concentration C, or by changing the optical axis angle of the atomization section C burner, and shortening the length L of the vapor layer, the range of concentration can be expanded. .

'但是’對於熔煉中熔化金屬之測定,生成的蒸氣層的濃 度C ’由冶煉條件和熔化金屬中的含量確定,因此不能控 制。所以’為了擴大測定濃度範圍,必須將蒸氣層長度L 或吸光係數众變小才行。但是,為了將蒸氣層的厚度穩定 地變成適宜的薄層在工程上是一項很大的課題,因此把蒸 氣層的長度L變小確實很難。另外,為了減小吸光係數 463043 五、發明說明(3) ~ '---- 一 # ’對具有測定濃唐e阁 所以很難》例如對Mn 的的#的吸收光並不是有限的, 數"大的279nm波長的的原子吸收光,只存在吸光係 線。Μη的遭度測定線和吸光係數〆小的403nffl波長光 收光,在熔鋼溫度為係數#小的4〇3關的吸 雖然蒸氣層L為报短 ,Μ層中Mn的濃度C很高’ $ #。& μ· ^ ( 1 mm左右)’蒸氣層的吸光強度仍然 - χ 於?辰度為0· 1%Μη,上述的光強度比為1%以 下:而不能測定o.u以上的Mn含量。 敕:專??開平9,°725記載的熔化金屬表面調 ^ , 貝|不机動的熔化金屬面上的實用化是困 爆化金屬表面如果是靜止®’顯示出鏡面的行為, 投射光的反射可以達到設計上的反射位置,可以獲得充分 的反射強纟。但;I:,在表面產生搖動波的狀態下,其反射 方向返回到設計的反射位置是間歇式的。而且,反射強度 ,靜止面時相比非常小。這是由於反射面並不是平行面而 疋曲面、反射角沿著曲率擴大使測定位置的照度(光強度 的密度)變小的緣故。如果能製作靜止面,則這類問題不 會產生,但在冶煉過程中製作靜止面非常困難。即使使用 光照射的感測器,由於感測器内使用惰性氣體,Ar或乂氣 處於流動狀態’導致您化金屬表面波動’故製作不出靜止 面。 在熔化金屬表面’由於出現熔化金屬之流動、蒸氣層的 熱對流、發生粉塵等的影響,要想始終將蒸氣層厚度保持 一定是非常困難的,在測定過程中蒸氣層的厚度會發生波'But' For the measurement of the molten metal during smelting, the concentration C of the vapor layer formed is determined by the smelting conditions and the content in the molten metal, and therefore cannot be controlled. Therefore, in order to expand the measurement concentration range, it is necessary to reduce the vapor layer length L or the absorption coefficient. However, in order to stably change the thickness of the vapor layer into a suitable thin layer, it is a great problem in engineering. Therefore, it is really difficult to reduce the length L of the vapor layer. In addition, in order to reduce the absorption coefficient 463043 V. Description of the invention (3) ~ '---- ##' It is difficult to measure the concentration of tange. For example, the absorption light of # of Mn is not limited. " Atoms with large wavelengths of 279 nm absorb light, and only light-absorbing lines exist. The measurement line of Mη and the absorption coefficient of light with a wavelength of 403nffl are smaller, and the absorption at the molten steel temperature is a coefficient of # 403. Although the vapor layer L is short, the Mn concentration C in the M layer is high. '$ #. & μ · ^ (about 1 mm) ’The light absorption intensity of the vapor layer is still-χ? The degree of channality is 0.1% Mn, and the above-mentioned light intensity ratio is 1% or less: the Mn content above o.u cannot be measured. Bian: Special? ? Kaiping 9, ° 725 Melted Metal Surface Adjustment ^, Shell | The practical use of non-motorized molten metal surface is to explode the metal surface. If it is stationary, it will show the behavior of mirror surface, and the reflection of the projected light can reach the design. Position, you can get sufficient reflection intensity. But; I: In the state where the surface generates a shaking wave, its reflection direction returns to the designed reflection position intermittently. In addition, the reflection intensity is very small compared with the stationary surface. This is because the reflecting surface is not a parallel surface, but the curved surface and the reflection angle are enlarged along the curvature to reduce the illuminance (density of light intensity) at the measurement position. If a stationary surface can be made, such problems would not occur, but it is very difficult to make a stationary surface during the smelting process. Even when using a light-irradiated sensor, because an inert gas is used in the sensor, Ar or krypton is in a flowing state, 'resulting in metallized metal surface fluctuations', so a stationary surface cannot be produced. On the surface of molten metal, due to the effects of the flow of molten metal, the thermal convection of the vapor layer, and the occurrence of dust, it is very difficult to maintain the thickness of the vapor layer at all times. During the measurement, the thickness of the vapor layer will have a wave.

89l2l658.ptd 第 7 頁 4 63 0 五、發明說明(4) 動’因此需要對此進行修正。 通常的熔,金屬處於高溫狀態(例如燦鋼溫度約 i m冰始戶以溶化金屬本身也會發出輕射光。該韓射 光是從紫外線到紅外線的連續光,當然包括原子吸收光測 定的波長的光在内,所以熔化金屬表面的光時時刻刻都在 變化。因此,採用日本專利特開平卜5〇〇725記載的方法, 實際上所測定的光量等於原子吸光後的光量與同一波長幸畐 射光的光量之和,而不能測定出真正的原子吸光後的光 量。此時’輻射光在熔煉過程中一旦發生波動,從表面 看,就會錯誤地認為原子吸光後的光量在發生變化。 另一方面,在熔化金屬之上部產生的各元素蒸氣量,與 該元素在熔化金屬中的濃度(活性量)和蒸氣壓力成正比一 例。由於飽和蒸氣壓是溫度的函數,熔化金屬之溫度如果 是一定的,則根據原子吸收光度法求得的資訊卜蒸=量) 可以求出熔化金屬中該元素的濃度。曰本專利特開平 9-5 00 725記載的方法,是將熔化金屬溫度保持在恒定狀態 下進行測定。但是,在需要測定濃度的冶煉作業,通常熔 化金屬之溫度是變化的,在煉鋼過程中溫度波動範圍高達 1 〇〇 °c以上。伴隨熔化金屬溫度的波動,蒸氣量也發生^ 化。°例如’從1 6 00 °c的熔鋼產生的Μη蒸氣量,溫度每變化 5、C ’則變化4%左右。因此’為了高精度進行分析,應該 以5 以下的精度測定嫁化金屬之溫度,對蒸氣量的測^ 值進行修正。為了高精度地測定高溫溫度.,最好使用’銷〜 錢熱電偶’但是溫度測定位置需要在雷射照射面的不部' 89l2l658.r89l2l658.ptd Page 7 4 63 0 V. Description of the Invention (4) Movement ’Therefore, this needs to be corrected. Usually molten, the metal is in a high temperature state (for example, the temperature of Cansteel is about 150 ° C to melt the metal itself, and it also emits light. The Korean light is continuous light from ultraviolet to infrared, and of course, it includes light with a wavelength determined by atomic absorption Because of this, the light on the surface of the molten metal changes all the time. Therefore, using the method described in Japanese Patent Laid-Open No. 500725, the measured light amount is actually equal to the amount of light after atomic absorption and the same wavelength. Sum of the amount of light, you cannot determine the actual amount of light absorbed by the atom. At this time, once the radiated light fluctuates during the melting process, from the surface, it will be wrongly believed that the amount of light absorbed by the atom is changing. Another On the other hand, the amount of vapor of each element above the molten metal is directly proportional to the concentration (active amount) of the element in the molten metal and the vapor pressure. As the saturated vapor pressure is a function of temperature, if the temperature of the molten metal is constant , Then according to the information obtained by atomic absorption spectrometry, the concentration of the element in the molten metal can be calculated. . The method described in Japanese Patent Application Laid-Open No. 9-5 00 725 measures the temperature of the molten metal while keeping it constant. However, in smelting operations that require concentration measurement, the temperature of the molten metal usually changes, and the temperature fluctuation range during the steelmaking process is as high as 100 ° C or more. As the temperature of the molten metal fluctuates, the amount of vapor also changes. ° For example, 'the amount of Mn vapor generated from a molten steel at 1 600 ° C will change by about 4% when the temperature changes by 5, C'. Therefore, in order to perform the analysis with high accuracy, the temperature of the grafted metal should be measured with an accuracy of 5 or less, and the measured value of the vapor amount should be corrected. In order to measure the high temperature temperature with high accuracy, it ’s best to use a ‘pin ~ money thermocouple’, but the temperature measurement position needs to be on the part of the laser irradiation surface. 89l2l658.r

a 63 c A 3 五、發明說明(5) —----- 使用熱電偶困難。尤其是為了控制教汽笙 +社a ,,,L 刊亂乱等’在使用感測器 的狀態下,將測定位置固定在雷射照射的下部更加困難益 日本專利特開平9-5 0 0725記載的方法,是用單色光詳 或多色光譜儀受光後進行分光,測定光的強度。但是,^ 法在分光時,由於使用狹縫等產生光量的衰減,故出現= 定精度不夠的問題。 、 【發明之揭示】· 本發明的目的在於提供可以擴大測定濃度範圍的熔化金 屬之分析方法。 本發明是使雷射通過熔化金屬之蒸氣時,根據穿過該蒸广 氣層的雷射強度的變化測定熔化金屬中含有的分析元素的 、 ΐ辰度的溶化金屬之分析方法,可以提供該雷射從分析元素 吸收波長的中心位置偏離〇· 〇〇inm乃至〇. 〇3nm的位置調整 波長為特徵的方法。 根據本發明可以提供以下的熔化金屬之分析方法,即: 對含有一種或多種分析元素的熔化金屬表面附近的蒸氣 層’根據被分析元素的測定濃度範圍,於該分析元素吸收 波長的中心位置的偏離位置,使具有波長中心位置的測定 光與不產生原子吸光的波長的標準光在同一光路重疊通 ^ 過,測定通過光的測定光成分的強度和標準光成分的強 度’從測定光成分和標準光成分的強度比、蒸氣層厚度、 以及炫化金屬溫度之間已知的關係測定熔化金屬中分析元 素的濃度為特徵的熔化金屬分析方法。 在本發明中,上述測定光的中心波長的偏離量,以測定a 63 c A 3 V. Description of the invention (5) —----- It is difficult to use a thermocouple. In particular, in order to control the teaching chaos + agency a ,,, L, etc. 'Under the state of using a sensor, it is more difficult to fix the measurement position to the lower part of the laser irradiation. Japanese Patent Laid-Open No. 9-5 0 0725 The method described is to measure the intensity of light by receiving light with a monochromatic light or a polychromatic spectrometer and then splitting the light. However, in the ^ method, the light quantity is attenuated due to the use of a slit or the like during the beam splitting, so the problem of insufficient accuracy is caused. [Disclosure of the invention] The object of the present invention is to provide a method for analyzing molten metal which can expand the measurement concentration range. The present invention is an analysis method for measuring the degree of melting metal of an analysis element contained in molten metal based on a change in laser intensity passing through the vaporized gas layer when a laser is passed through the vapor of the molten metal. A method in which a laser is deviated from the center position of the absorption wavelength of the analysis element by a position of 0.00 Inm or even 0.03 nm, which is characteristic of the wavelength. According to the present invention, the following analysis method of molten metal can be provided, that is, the vapor layer near the surface of the molten metal containing one or more analytical elements is Deviate from the position so that the measurement light with the center of the wavelength and the standard light of the wavelength that does not generate atomic absorption overlap on the same optical path ^, and measure the intensity of the measured light component and the intensity of the standard light component through the light. A molten metal analysis method characterized by determining the known relationship between the intensity ratio of the standard light component, the thickness of the vapor layer, and the temperature of the sintered metal to determine the concentration of the analytical element in the molten metal. In the present invention, the amount of deviation of the center wavelength of the measurement light described above is measured.

8912365S.ptd 第9頁 463043 ?辰度範圍最大值的吸光麼 k D古ΛΑ卜私士、、 尤^ ( 1 〇g (吸光後光強度/沒吸 光時的光強度))為2 5以ίγ At 、 士 -^ . ^ , e , ΰ以下的值,設定在分析元素的原 子吸士的波長半幅值2倍的以下的值比較適宜。 在.么明中’假定分析元素的原子吸光的波長半幅值為 X、上述測定光的中心波長偏離量為Υ,I述測定光的波長 半幅值Ζ,最好能滿足ζ< (2χ—γ)的關係。 在本發明中,最好是根據吸光的靈敏度,使波長的中心 位置從熔化金屬之主成分元素的原子吸光的中心位置偏離8912365S.ptd Page 9 463043 Light absorption at the maximum value of the degree range k D Λ Λ Α 私 私, 尤 ^ (1 0g (light intensity after light absorption / light intensity without light absorption)) is 2 5 to ίγ The values of At and Shi- ^. ^, E, ΰ are preferably set to a value less than twice the half-wavelength of the atomic absorption of the element to be analyzed. In "Ming Ming", assuming that the half-amplitude of the wavelength of the atomic absorption of the analysis element is X, and the deviation of the central wavelength of the above-mentioned measuring light is Υ, the half-amplitude of the wavelength Z of the measuring light is preferably ζ < (2χ —Γ). In the present invention, it is preferable that the center position of the wavelength is deviated from the center position of the light absorption of the atom of the main component element of the molten metal according to the sensitivity of light absorption.

的測定光、偏離上述分析元素用的波長中心位置的測定 光、不產生上述原子吸收光的波長的標準光,在同一光路 重疊,使其通過熔化金屬表面的蒸氣層,測定通過光的兩 測定光成分的強度和標準光成分的強度,根據對應通過光 的主成分元素的測定光成分與標準光成分的強度比 '對應 分析元素的測定光成分與標準光成分的強度比的已知的關 係,修正蒸氣層的厚度。 關於本發明中,在分析中監視測定光的波長,測定原子 吸光的中心位置與測定光波長的中心位置之間的偏離量, 最好是根據測定的偏離量修正蒸氣通過光的測定光成分的 吸光靈敏度。The measurement light, the measurement light deviating from the center position of the wavelength used for the analysis element, and the standard light of a wavelength that does not generate the above-mentioned atomic absorption light are overlapped on the same optical path and passed through the vapor layer on the surface of the metal. The intensity of the light component and the intensity of the standard light component are based on the known ratio of the intensity ratio of the measured light component to the standard light component corresponding to the principal component element of the passing light. Correct the thickness of the vapor layer. In the present invention, the wavelength of the measurement light is monitored during the analysis, and the amount of deviation between the center position of the atomic absorption light and the center position of the measurement light wavelength is measured. It is preferable to correct the measured light component of the vapor passing light based on the measured deviation amount. Absorptivity.

在本發明中,最好是使用遮光器對測定光和標準光進行 通過/截止,在截止時的光強度作為熔化金屬之輻射光強 度,修正背底。 在本發明中,將測定光和標準光照射到爆化金屬表面’ 使其反射,通過蒸氣層後測定反射光的強度為佳。In the present invention, it is preferable to use a shutter to pass / cut the measurement light and the standard light, and the light intensity at the time of cutoff is used as the radiation light intensity of the molten metal to correct the background. In the present invention, it is preferable that the measurement light and the standard light are irradiated to the surface of the exploded metal and reflected, and the intensity of the reflected light is measured after passing through the vapor layer.

89121658.ptd 第10頁 46304^ 五、發明說明(7) - — 在本發明中’將測定光和標準光照射到熔化金屬表面的 屮5mm以上的區域為佳。 f本勒明中’將標準光的反射強度為門檻值以上的場入 的資料用於濃度測定為佳。 σ 在本發明中,最好是用光導纖維接受反射光,對接受的 反射光,通過波長包括分析元素在内的原子吸光波長,使 其通過可通過波幅為5nm以下的帶通濾波器,選擇波長, 測定通過帶通濾波器後的全光量。89121658.ptd Page 10 46304 ^ V. Description of the invention (7)--In the present invention, it is preferable to irradiate the measurement light and the standard light to the area of 屮 5mm or more on the surface of the molten metal. In "F. Leming", it is preferable to use the data of the field in which the reflection intensity of the standard light is above the threshold value for the concentration measurement. σ In the present invention, it is preferable to use an optical fiber to receive the reflected light, and to pass the received reflected light through the absorption wavelength of the atom including the analysis element, and pass it through a bandpass filter with an amplitude of 5 nm or less, and select Wavelength, the total amount of light after passing through the band-pass filter is measured.

一在本發明中,照射的測定光和標準光是雷射,調整照射 :的強度,最好是使反射光通過帶通濾波器後的測定光和 心準光的強度,是通過該帶通遽波器波長..區的溶化金屬之 輻射光強度的1 〇倍以上。 一在本發明中,最好是熔化金屬之主成分元素是鐵,分析 t照本發明’可以提供裝設有以下手段為特徵的熔化i 屬为析裝置,即裝設有使用發射出的雷射波長和半幅值; 其強度可變的許多個雷射光源、檢測該雷射的波長及強^ 的手段、從該許多個雷射光源發射出的波長不同的許多4 雷射被重疊於同一光路的光學系統、使重疊於該同一光sFirst, in the present invention, the measurement light and the standard light to be irradiated are lasers, and the intensity of the irradiation is adjusted. It is preferable that the intensity of the measurement light and the collimated light after passing the reflected light through a band-pass filter passes through the band pass. The intensity of the radiated light of the dissolved metal in the wavelength range of the wave filter is more than 10 times. First, in the present invention, it is preferable that the main component element of the molten metal is iron. According to the present invention, the analysis can be provided with a melting device characterized by the following means, that is, a lightning device is used Wavelength and half-amplitude; many laser sources with variable intensity, means for detecting the wavelength and intensity of the laser, and many 4 lasers with different wavelengths emitted from the many laser sources are superimposed on Optical systems on the same optical path, overlapping the same light s

U 的雷射以一定的週期通過和截止的遮光器、端部4置於尤 近使重疊於同一光路的雷射導入您化附近自 光導、纖維、從光導纖維放出的光能照射炫化金屬 上範圍的光學系統、受光部設置於熔化金 接受熔化金屬表面的反射光導入光檢測部 、' 丨的一個或許多4The laser of U passes and closes the shutter and the end 4 at a certain period. The end 4 is placed so close that the laser that overlaps the same optical path is introduced into your vicinity. The light energy emitted from the optical fiber, fibers, and light from the optical fiber irradiates the dazzling metal. The upper range of the optical system, the light receiving section is provided on the molten gold to receive the reflected light from the molten metal surface, and the light is introduced into the light detecting section.

89121658,ptd 第11頁 4 63 043 五、發明說明(8) 受光用光導纖維、由受光用光導纖維導出的反射光被分離 成包括各自雷射波長的波長區的高通濾波器和/或低通滤 波器、通過高通濾波器和/或低通濾波器以後的反射光被 分離成包括各自的雷射波長的狹窄波長區的帶通渡波器、 通過帶通遽波器後的全光量測定用的光檢測器、測定炼化 金屬溫度的手段、以及運算測定結果的運算裝置為特徵的 熔化金屬分析裝置。 【發明之最佳實施形態】 本發明的分析方法’包括使雷射通過熔化金屬蒸氣層的 作業、求出通過該蒸氣層產生的雷射強度變化的作業、以 及根據強度變化測定熔化金屬中包括的分析元素的濃度的 作業 對於使用的雷射’調整雷射的波長’使其從分析元素的 吸收波長的中心區偏離0. 001乃至〇, 03nm的位置。將該雷 射導入熔化金屬表面附近,使其通過熔化金屬蒸氣層,測 定通過的雷射的強度變化。首先求出強度變化量與金屬中 的成分元素的濃度(例如單位為wt% )的關係式,用該關 係式根據測定強度的變化量求出分析元素的濃度。關於強 度變化的測定,通過比較通過雷射前後的強度也可以,製 作校準線後只測定通過後的雷射強度也可以。強度變化 量,通過測定強度求出也可以,通過對蒸氣層非常薄的可 以忽略的狀態與蒸氣層存在的狀態進行比較也可以,與進 入同一光學系統的沒產生吸收光的狀態進行比較也可以。 比較值可以是直接比較數值,也可以是以對數表示。89121658, ptd Page 11 4 63 043 V. Description of the invention (8) The light-receiving optical fiber and the reflected light derived from the light-receiving optical fiber are separated into a high-pass filter and / or a low-pass wavelength region including the respective laser wavelengths. Filters, reflected light after passing through a high-pass filter and / or a low-pass filter are separated into band-passing wave filters with narrow wavelengths including their respective laser wavelengths, The molten metal analysis device is characterized by a photodetector, a means for measuring the temperature of the refined metal, and a computing device that calculates the measurement result. [Preferred Embodiment of the Invention] The analysis method of the present invention includes an operation of passing a laser beam through a molten metal vapor layer, an operation of determining a change in laser intensity generated by the vapor layer, and measuring the inclusion of molten metal based on the intensity change. The operation of analyzing the concentration of the element for the laser used to 'adjust the wavelength of the laser' so that it deviates from the center region of the absorption wavelength of the analysis element by a position of 0.001 to 0.03 nm. This laser was introduced near the surface of the molten metal, and passed through the molten metal vapor layer to measure the change in intensity of the passing laser. First, a relational expression between the amount of change in intensity and the concentration (for example, wt%) of the component elements in the metal is obtained, and the concentration of the analysis element is obtained from the amount of change in the measured intensity using this relational expression. The intensity change can be measured by comparing the intensity before and after passing the laser, and it is also possible to measure only the intensity of the laser after passing the calibration line. The amount of change in intensity can also be determined by measuring the intensity. It can also be compared by comparing the negligible state of the vapor layer with the state in which the vapor layer is present, or by comparing it with the state where no light is absorbed when entering the same optical system. . The comparison value can be a direct comparison value or a logarithmic expression.

89121658.ptd 第12頁 4 63 043 五、發明說明(9) 分析元素的吸光譜線,受吸收物資的溫度的 光的波長有一定的波幅。即,吸光強度的變化才/胃,對於 波長最大,隨著偏離吸光中心波長位置的,吸光中心 光強度變化減小十測定用雷射波長位置偏1=吸 波長時’可以減小因分析元素吸光引起的強度變f中~ 將測定用雷射波長位置發生偏離時透過光(檢 射光的變化實例示於圖1。從該圖可以看出,卷使、兩^對入 波長位置與原子吸光波長的中心位置一致時,$幾乎 透射光,故不能進行光的檢測,只有當波長偏 ^ 過透射光進行檢測。 于才他通 波長的偏離量根據分析元素(檢測物件元素)的濃度、 原子吸光的種類進行調整。於測定濃度範圍的最大值^吸 光度(=一 log(吸光後強度/沒有吸光時的光強度高達 2. 5時高濃度側的靈敏度下降,很難進行準確的分析。因 此需要設定偏離量,使測定濃度範圍的最大值的吸光度在 2. 5以下’比較好的測定濃度範圍的最大值的吸光度應該 在2. 0以下。這樣,吸光度隨濃度的變化,在測定濃度範 圍内可以成直線關係。當偏離量過大時,不容易產生吸 光’因此偏離量的上限設定在原子吸光波長的的半幅值的 2/舎以下。最好是設定偏離量的上限,使測定濃度範圍的 最大值的吸光度在0· 5以上。這是由於如果吸光度不足〇. 5 則測定濃度全範圍的靈敏度不夠的緣故。 f用上述手法,用原子吸光光度法可以使測定的元素濃 度犯圍擴大。正確地控制雷射的波長使其偏離分析元素的89121658.ptd Page 12 4 63 043 V. Description of the invention (9) The absorption spectral line of the analysis element has a certain amplitude of the wavelength of the light which is absorbed by the temperature of the material. That is, the change in light absorption intensity is only the maximum wavelength. As the wavelength deviates from the light absorption center wavelength position, the light intensity change in the light absorption center decreases. Ten measurement laser wavelength positions are offset by 1 = when the absorption wavelength is reduced. Intensity change due to light absorption f ~ Transmitted light when the measurement laser wavelength position deviates (an example of the change in the detection light is shown in Figure 1. From this figure, it can be seen that the coil, the two pairs of wavelength positions, and the atomic absorption When the center positions of the wavelengths are the same, $ almost transmits light, so light detection cannot be performed. Only when the wavelength deviates from transmitted light is detected. Therefore, the amount of deviation of the wavelength depends on the concentration of the analysis element (element of the detection object) and the atom. The type of light absorption is adjusted. The maximum value in the concentration range measured ^ absorbance (= a log (intensity after light absorption / light intensity without light absorption is as high as 2.5 when the sensitivity on the high concentration side decreases, it is difficult to perform accurate analysis. Therefore 0 The amount of deviation needs to be set so that the absorbance of the maximum value of the measured concentration range is 2.5 or less. 'The better absorbance of the maximum value of the measured concentration range should be 2.0. Below. In this way, the change in absorbance with concentration can be in a linear relationship within the concentration range. When the deviation is too large, light absorption is not easy to occur. Therefore, the upper limit of the deviation is set to 2 / 舎 of the half amplitude of the atomic absorption wavelength. Below, it is best to set the upper limit of the amount of deviation so that the absorbance at the maximum value of the measurement concentration range is 0.5 or more. This is because if the absorbance is less than 0.5, the sensitivity of the entire measurement concentration range is insufficient. F Using the above method Using atomic absorption spectrophotometry can make the measured elemental concentration increase. Correctly control the wavelength of the laser to deviate from the analysis element.

89121658.ptd 第13頁 4 63 043 五、發明說明(ίο) 中心波長,可以根據分析元素的濃度設定適宜的吸光所引 起的強度變化。 作為可以做該種柯定的光源,用光譜儀對連續光進行分 光,取出目的波長的光,也可以將取出的光作為光源。但 是,從光的強度考慮,使用雷射較為適宜。尤其是振盪波 長的位置可任意調整的所謂波長可調雷射更為合適。 但是,並非所有的波長可調雷射都適用,要求輸出光的 波幅要小。如果波幅大,偏離吸光幅的比例增加。即,沒 被吸收的光(光測定背底的光)增多,因此,隨著元素濃 度變化其光強度的變化減小,導致測定精度下降。 通過對測定光的輸出光(光源光)的波幅進行下述規 定,可以限制沒被吸收光的比例,保持良好的測定精度。 即,以構成高溫炼化金屬之分析元素的原子吸光波長的半 幅值為X、以測定光的中心波長偏離該原子吸光中心位置 的偏離量為Y,則測定光的中心波長半幅值Z,最好是滿足 Z < (2X — Y )的關係式。 參照圖2進行說明。當把分析元素的吸光譜線的波長分 佈當作是高斯分佈時,其擴展的指標的標準偏差σ與半幅 值X的關係為Χ = 2. 35 σ。通常,高斯分佈的中心強度為1 , 偏離中心區2倍的半幅值(2Χ = 4. 7 σ )的位置的強度為 1 0_5。即,該波長位置之吸光度,相對於中心波長之吸光 度呈1 0_5,當試樣濃度高、在中心波長的吸光度為1 〇 〇以上 時,該波長位置可以看作是幾乎沒有吸光的波長區。 另一方面,偏離分析元素的原子吸光的中心位置為Υ的部89121658.ptd Page 13 4 63 043 5. Description of the invention (ίο) The central wavelength can be set according to the concentration of the element to analyze the intensity change caused by appropriate light absorption. As a light source that can be used for this kind of Kodine, continuous light is separated by a spectrometer, and light of a target wavelength is taken out, and the taken-out light can also be used as a light source. However, considering the intensity of light, the use of lasers is more appropriate. In particular, the so-called wavelength-tunable laser whose position of the oscillation wavelength can be adjusted arbitrarily is more suitable. However, not all wavelength-tunable lasers are suitable, and the amplitude of the output light must be small. If the amplitude is large, the proportion of deviation from the absorption amplitude increases. That is, the amount of unabsorbed light (light for measuring the background of the light) increases. Therefore, as the element concentration changes, the change in light intensity decreases, resulting in a decrease in measurement accuracy. By regulating the amplitude of the output light (light source light) of the measurement light as described below, it is possible to limit the proportion of light that is not absorbed and maintain good measurement accuracy. That is, if the half-amplitude of the atomic absorption wavelength of the analytical element constituting the high-temperature refining metal is X, and the deviation of the center wavelength of the measurement light from the center of the atomic absorption is Y, then the half-wavelength of the center wavelength of the measurement light is Z , It is best to satisfy the relation of Z < (2X — Y). Description will be made with reference to FIG. 2. When the wavelength distribution of the absorption line of the analysis element is taken as a Gaussian distribution, the relationship between the standard deviation σ of the extended index and the half-amplitude X is X = 2.35 σ. In general, the intensity of the center of the Gaussian distribution is 1, and the intensity at a position deviating from the half-amplitude (2 × = 4. 7 σ) that is twice the center region is 1 0_5. That is, the absorbance at this wavelength position is 10-5 relative to the absorbance at the center wavelength. When the concentration of the sample is high and the absorbance at the center wavelength is 100 or more, this wavelength position can be regarded as a wavelength region with little light absorption. On the other hand, the part where the center position of the atomic absorption of the analysis element deviates from Υ

89]21653.ptd 第14頁 4 63 n d 五、發明說明(π) 位,可以看作具有中心波長的半幅值ζ、標準偏 的尚斯分佈。從偏離中心波長Υ進一步偏離半 、刀二 σ)以上的波長位置(χ + γ)測定光量,減少 * j -2.35 光沒被分析元素所吸收而殘留下來,I生的“程度的 因此’作為測定光的半輻(波長幅)值,從:二 心波長Y起偏離半幅值(ζ = 2·35σ )的波長' 離開吸光譜線的中心2倍於半幅值的波長位置(2; +:)在 侧為好,可以認為,這一偏離量 # ,的内 響較小。即Υ + Ζ<2Χβ因此導出被二收’殘留光的影 這測定光與不產生原子吸光的波長的襟準光 長的特性採用反射或者透射的光學遽波器使2 := 光路,通過高溫的熔化金屬表面的蒸氣層。、 '门 在熔化金屬之表面,不僅是蒸吸 塵等也能使光的強度衰㉟,因此,; $連發生的粉 必要使用不產生原子吸光的匕為:這-影響,有 不被蒸氣層吸收的光,而是接近測定波長的光。最好疋 通過蒸氣層的光的測定光的成分與標準光成分 度,根據波長的特性採用反射或者透射 分光檢測。根據獲得的各種波長的光強:2 比(β :測定光強度/標準先強/出私準光強度 或熬氣層很薄因此可以忽略的狀態下的強度比的iί (R/KD )。此時,強度比變化量的倒數^ I量 (R/RO))被定義為吸光度(Α)。該吸十數(=— 屬中的分析元素(測定成分) :可由熔化金 取没 k化金屬之溫度以89] 21653.ptd Page 14 4 63 n d 5. Description of the invention (π) bit can be regarded as a half-amplitude ζ with standard wavelength and a standard deviation of the Suns distribution. Measure the amount of light from a wavelength position (χ + γ) that is further away from the center wavelength by more than half, and the knife σ), and reduce * j -2.35 The light is not absorbed by the analysis element and remains. Measure the half-radiation (wavelength amplitude) of the light, from: the wavelength of the two-center wavelength Y, which deviates from the half-amplitude (ζ = 2.35σ) by a wavelength position that is 2 times the half-amplitude from the center of the absorption line (2; + :) is better on the side, it can be considered that the internal response of this deviation # # is small. That is, Υ + ZO < 2 × β, so the shadow of the residual light that is doubled is derived. This determines the wavelength of light and does not generate atomic absorption. The characteristic of long optical length is the use of reflective or transmissive optical chirpers to make 2: = optical path, through the vapor layer on the surface of the molten metal through high temperature., 'The door is on the surface of the molten metal, not only steam and dust can also make light The intensity decays, so, the powder that needs to be generated without using atomic absorption is: this-affects, there is light that is not absorbed by the vapor layer, but light close to the measurement wavelength. It is best to pass through the vapor layer. Measurement of light composition and standard light composition, Reflective or transmission spectroscopic detection is used according to the characteristics of the wavelength. According to the obtained light intensity of various wavelengths: 2 ratio (β: measured light intensity / standard first intensity / extra quasi light intensity or thin gas layer so it can be ignored The intensity ratio of iί (R / KD). At this time, the reciprocal of the intensity ratio change amount ^ I amount (R / RO)) is defined as the absorbance (Α). The absorption ten (=-the analytical element in the genus ( Determining composition): The temperature of the K-metal can be removed from the molten gold to

89121658.ptd 第15頁 4 63 c 4 j 五、發明說明(12) ' 及蒸氣f的厚度的函數表示。因此,通過對熔化金屬之溫 度以及蒸氣層的厚度的修正,可以求出熔化金屬中分析元 素的濃度。 首先說明蒸氣層厚度的修正方法。為了測定熔化金屬中 主成分=素的測定光,與分析元素用的測定光、標準光作 為同一光路通過高溫的溶化金屬表面的蒸氣層。通過幕氣 層的光用光學遽波器分光’檢測出主成分元素測定光、分 析兀素測定光及標準光等各種光的強度。根據所獲得的各 種光強度求出主成分元素的標準光強度比(L )及分析 凡素的標準光強度比(R ),在沒有蒸氣層或蒸氣層非常 薄且可以忽略的狀態下分別求出各個強度比(Ris〇 ' R〇 ) 的變化量。然後,對主成分元素也求出與分析元素同樣的 強度比的變化量的倒數的對數(=—1〇g )),作 為主成分元素的吸光度(A]s )。 關於蒸氣層的厚度修正,可以將分析元素的吸光度(A ^與主成分的吸光度(A]s)的比(A/Ais)作為分析元素的 蒸氣層厚度修正後的吸光度。關於主成分元素及分析元 素’其吸光現象的上述公式〇 )成立。因此,通過得到 S亥2元素的吸光度之比,蒸氣層厚度(長度)L變數項不再 存在’可以用分析元素濃度的函數表示。 對嫁化金屬之主成分元素的測定光的波長的中心位置, 根據該主成分元素的原子吸光的吸光靈敏度,可望從該主 成分元素的原子吸光的中心位置偏移。其理由在於:測定 光的波長中心位置與原子吸光的中心位置如果相同,當吸89121658.ptd Page 15 4 63 c 4 j 5. Description of the invention (12) 'and the function of the thickness of the vapor f. Therefore, by correcting the temperature of the molten metal and the thickness of the vapor layer, the concentration of the analytical element in the molten metal can be obtained. First, a method for correcting the thickness of the vapor layer will be described. In order to measure the measurement light of the main component = element in the molten metal, the measurement light and standard light used for the analysis of the element pass through the vapor layer on the surface of the molten metal at a high temperature in the same optical path. The intensity of various kinds of light, such as principal component element measurement light, analysis element measurement light, and standard light, was detected by the optical chirper spectroscope 'through the light in the curtain layer. Obtain the standard light intensity ratio (L) of the main component elements and the standard light intensity ratio (R) of the analytical element based on the various light intensities obtained, and determine them in the state where there is no vapor layer or the vapor layer is very thin and can be ignored. The change amount of each intensity ratio (Ris0'R0) is shown. Then, the logarithm of the reciprocal of the change in the intensity ratio (= —10 g)) of the same intensity ratio as that of the analysis element was calculated for the main component element, and the absorbance (A) s of the main component element was determined. Regarding the thickness correction of the vapor layer, the ratio (A / Ais) of the absorbance of the analysis element (A ^ to the absorbance (A) s) of the main component) can be used as the absorbance after the vapor layer thickness correction of the analysis element. The above formula (0) for analyzing the element 'its light absorption phenomenon holds. Therefore, by obtaining the ratio of the absorbance of the element S2, the variable term of the vapor layer thickness (length) L no longer exists' can be expressed as a function of the concentration of the analysis element. The center position of the wavelength of the measurement light of the main component element of the bridging metal is expected to be shifted from the center position of the atomic absorption of the main component element based on the absorption sensitivity of the atomic absorption of the main component element. The reason is that if the center position of the wavelength of the measurement light and the center position of the atomic absorption are the same,

89121658.ptd 第16頁 在63 0厶3 五、發明說明(13) 光靈敏度尚時,信號變小’因此信噪比(S/N )變差。後 文將要介紹,在測定中監視測定光的波長,一邊修正該波 長邊化引起的吸光度的變化,一邊進行測定,使測定精度 更加提高。 其次,說明熔化金屬之溫度修正方法。熔化金屬表面產 生的各種元素的蒸氣量與其該元素在熔化金屬中的濃度 (活性量)和瘵氣壓(飽和蒸氣壓)成正比例。飽和蒸氣 壓可用熔化金屬之溫度函數表示。因此,以熔化金屬標準 溫度TO它下的分析元素的飽和蒸氣壓(p〇 )及主成分元素 的飽和蒸氣壓(PIS 〇 )為標準’求出測定時的溫度T 〇c的各 個飽和蒸氣愿(P (T) 、Pis (T))之比(p0/p (T)、89121658.ptd Page 16 at 63 0 厶 3 V. Description of the invention (13) The light sensitivity is still too low, and the signal becomes smaller, so the signal-to-noise ratio (S / N) becomes worse. As will be described later, the wavelength of the measurement light is monitored during the measurement, and the measurement is performed while correcting the change in absorbance caused by the wavelength edge, thereby improving the measurement accuracy. Next, a method for correcting the temperature of molten metal will be described. The amount of vapors of various elements generated on the surface of molten metal is proportional to its concentration (active amount) and krypton pressure (saturated vapor pressure) of the element in the molten metal. The saturated vapor pressure can be expressed as a function of the temperature of the molten metal. Therefore, using the saturated vapor pressure (p0) of the analysis element and the saturated vapor pressure (PIS 〇) of the main component elements at the standard temperature TO of the molten metal as standards, determine each saturated vapor temperature at the time of measurement T 〇c. (P (T), Pis (T)) ratio (p0 / p (T),

Pis (T )),用於校正上述吸光度(A及‘)。各溫 度的飽和蒸氣壓的變化參考文獻值也可以。 此時丄作為波長可變雷射,輸出光的波幅非常小,巧* JE 確地設定波長的中心位置,並要求波長位置不隨時間變 化。吸光靈敏度與光源光的波長位置呈函數關係,所以上 述的波長位置不隨時間變化當然是最好的,但是,雷射的 设置%扰(尤其是溫度變化)如果想嚴格地管理,使構成 雷射的各部件不發生波動等的控制是很難的,現實情況也 很難達到。作為對策,事先改變波長位置,求出吸光靈敏 度與波長的關係,在氣體的在線檢測時一邊監視發出的雷 射波長,一邊測定吸光量,在線修正因波長位置的變化而 引起的吸光靈敏度的變化,求出氣體中的成分 由此玎 以實現現實情況下的氣體中成分的在生產線上分析。 89121658.pid 11 1 第17頁Pis (T)) to correct the absorbances (A and ‘). Changes in saturated vapor pressure at various temperatures may be obtained from reference values. At this time, as a wavelength-variable laser, the amplitude of the output light is very small. QE * sets the center position of the wavelength accurately and requires that the wavelength position does not change with time. The absorption sensitivity is a function of the wavelength position of the light source, so it is certainly best that the above-mentioned wavelength position does not change with time. However, if you want to strictly manage the setting of the laser's% disturbance (especially the temperature change), make up the laser It is difficult to control the various parts of the shooting without fluctuations, and it is difficult to achieve the actual situation. As a countermeasure, change the wavelength position in advance to find the relationship between the light absorption sensitivity and the wavelength. During the online detection of the gas, monitor the emitted laser wavelength, measure the light absorption, and correct the change in the light absorption sensitivity caused by the change in wavelength position. , To find the components in the gas, so as to achieve the actual analysis of the components in the gas on the production line. 89121658.pid 11 1 p. 17

4 63 0 4 五、發明說明(14) 圖3表不為實施本發明實施形態的裝置結構的<_例。 在圖3中’從雷射源1發出的雷射通過光學系統2照射到 炼化金屬3的表面上的金屬蒸氣層4。通過金屬蒸氣層4的 雷射再通過光學系統5導入檢測器6測定光的強度。 作為光學系統2和5,最好是使用光導纖維,這樣,雷射 源1及光檢測器6等可以與熔化金屬表面隔離開進行配置。 雷射源1是將波長可以任意設定的波長可調雷射,分析 元素的吸收波長的中心位置在文獻中都有記載,因此在偏 離中心位置〇· 〇〇lnm〜〇. 〇3nm處設定發光波長。 波長的最佳偏離量可用下述方法求得。首先考察吸光強 度變化隨波長的依存關係,即,製作測定系統後,改變雷 射波長’對熔化金屬3的目標濃度測定數點,然後,找到 金屬蒸氣4吸光後的雷射強度為最佳狀態的雷射波長的位 置。並且’用通常的原子吸光分析裝置以熔化試樣進行原 子吸光分析時’作為光源使用該分析系統的雷射,事先考 察了及光強度的變化與波長的依存性^其次,對於分析元 素濃度較小的熔化金屬3,進行了分析元素的吸收波長的 中心位置的測定,求出該中心位置的測定極限。然後,根 據事先進行的吸光強度的變化與波長的依存性的考察結 果’求出測定濃度範圍適宜的波長。 ,光的強度變化伴隨發光波長的半幅值而變化,因此不 僅疋改變波長的偏離量,改變波幅也可以 調整到 適宜程度》 m 雷射只是測定元素的吸光測定波長的光也可以,包含有4 63 0 4 V. Description of the invention (14) FIG. 3 shows a < _ example of a device structure for implementing the embodiment of the present invention. In FIG. 3 ', the laser emitted from the laser source 1 is irradiated to the metal vapor layer 4 on the surface of the refined metal 3 through the optical system 2. The laser passing through the metal vapor layer 4 is introduced into the detector 6 through the optical system 5 to measure the intensity of light. As the optical systems 2 and 5, it is preferable to use an optical fiber, so that the laser source 1 and the photodetector 6 can be arranged separately from the surface of the molten metal. Laser source 1 is a wavelength-tunable laser whose wavelength can be arbitrarily set. The center position of the absorption wavelength of the analysis element is described in the literature. Therefore, the light emission is set at a position away from the center. 〇〇〇〇lnm〜〇. 〇3nm wavelength. The optimum amount of wavelength deviation can be obtained by the following method. First, the dependence of the light absorption intensity on the wavelength is examined, that is, after the measurement system is made, the laser wavelength is changed to measure the target concentration of the molten metal 3, and then the laser intensity after the absorption of the metal vapor 4 is found to be the best state. The position of the laser wavelength. In addition, "when performing atomic absorption analysis with a molten sample using a conventional atomic absorption analysis device" as a light source, the laser using the analysis system was examined in advance and the dependence of the light intensity change on the wavelength ^ Second, the concentration of the analysis element was relatively low. The small molten metal 3 was measured at the center position of the absorption wavelength of the analysis element, and the measurement limit of the center position was determined. Then, based on the results of examining the dependence of the change in the absorbance intensity and the wavelength in advance ', a wavelength with a suitable concentration range is determined. The change in the intensity of light changes with the half-amplitude of the light emission wavelength. Therefore, not only the wavelength deviation can be changed, but the amplitude can also be adjusted to a suitable level. M Laser is only measuring the absorption of light by measuring elements

89121658.ptd 第18頁 4 83 04 3__________ 五、發明說明(15) 其他分析元素的吸收波長及分析元素不能吸收的標準光等 也可以。通過這些光的同時照射,可以逐一測定各分析元 素的光強度。 為了使蒸氣層4穩定,在感測器内配設光學系統2及5、 在感測器内充入惰性氣體也可以。 在光檢測器6的前面,設置光譜儀或帶通遽波盗也可 以,這樣,只測定目的波長的光強度’可以減低熔化金屬 3的熱輻射光和照明引起的不利影響。 為了使熔化金屬3的表面起著雷射反射鏡的作用,配置 光學系統2及5也可以。即,從光學系統發出的雷射通過表 厂彳 面附近層在溶化金屬3的表面反射後進入光學系統5也可 以。圖4表示熔化金屬3的表面作為雷射的反射鏡使用時光 學系統配置的一例。在圖4中,雷射光源1 a、(分析元素 測定用)、1 b (主成分元素測定用)以及1 c (標準光用) 發出的雷射,用聚光光學系統7内的光學濾波器(高通濾 波器)8a〜8c使其成為同一光路的光。從光導纖維ua的 端部發出的光2 0,通過照射光學系統2 2後,穿過蒸氣層4 照射到熔化金屬表面3上。熔化金屬表面3反射出的光2丨再 次穿過蒸氣層4後,通過受光用光導纖維傳送出去。受光 用光導纖維Π b發出的光通過透鏡1 2後變成平行光,通過 。 光學濾波器1 3 a和1 3 b (高通濃波器)分成各種不同波長的 雷射後通過帶通濾波器1 4 a和1 4 b導入光檢測器6 a和6 b,測 定其強度。被測定各種波長的強度,連同溶化金屬之溫度 感測器1 6發出的溫度資訊、對雷射源的雷射測定的波長測 —89121658.ptd Page 18 4 83 04 3__________ 5. Description of the invention (15) The absorption wavelength of other analytical elements and standard light that the analytical elements cannot absorb can also be used. By simultaneously irradiating these lights, the light intensity of each analysis element can be measured one by one. In order to stabilize the vapor layer 4, optical systems 2 and 5 may be provided in the sensor, and an inert gas may be filled in the sensor. It is also possible to provide a spectrometer or a bandpass chirp in front of the photodetector 6. In this way, measuring only the light intensity of the target wavelength 'can reduce the adverse effects caused by the heat radiation light and illumination of the molten metal 3. In order that the surface of the molten metal 3 functions as a laser reflector, the optical systems 2 and 5 may be disposed. That is, the laser emitted from the optical system may enter the optical system 5 after being reflected by the surface of the molten metal 3 through the layer near the surface of the watch factory. Fig. 4 shows an example of the arrangement of the optical system when the surface of the molten metal 3 is used as a laser reflector. In FIG. 4, the laser light emitted from the laser light sources 1 a, (for the measurement of analytical elements), 1 b (for the measurement of principal component elements), and 1 c (for standard light) is filtered by the optical filter in the condenser optical system 7 The filters (high-pass filters) 8a to 8c make them light in the same optical path. The light 20 emitted from the end of the optical fiber ua passes through the irradiation optical system 22 and passes through the vapor layer 4 to be irradiated onto the molten metal surface 3. The light 2 丨 reflected from the molten metal surface 3 passes through the vapor layer 4 again, and is transmitted through the optical fiber for receiving light. Receiving light The light emitted from the light guide fiber Π b passes through the lens 12 and becomes parallel light. The optical filters 1 3 a and 1 3 b (high-pass thickeners) are divided into lasers of various wavelengths and passed through the band-pass filters 1 4 a and 1 4 b to the photodetectors 6 a and 6 b to measure their intensity. The intensity of the various wavelengths to be measured, together with the temperature information from the temperature of the molten metal sensor 16 and the wavelength measurement of the laser measurement of the laser source —

89121658.ptd 第19頁 4 63 04: 五、發明說明(16) 定器1 9發出的雷射波長資訊、以及光束取樣器1 7與光檢測 器1 8測定的雷射光源的雷射輸出功率資訊一起輸送到運算 裝置(電腦)15。 根據上述資訊,用運算裝置對雷射功率的波動、雷射輪 出波長的波動、蒸氣層厚度的波動以及溫度等參數進行校 正,可以求出炼化金屬中分析元素的濃度。 當嫁化金屬表面振動形成波紋時,其波紋是隨機性的, 波動方向也是隨機性的,而且波面的曲率也時時刻刻在變 化β當照射到這樣的嫁化金屬表面上某一點時,熔化金屬 表面的特定點發出的反射光有時達不到受光部,但是稍微 離開該特定點的部位產生的波面的變化也同樣是隨機性 的,因此,這一部位發.出的反射光達不到受光部的機率則 很小。因此,增加反射點數可使反射光到達受光部的期望 值增加。即,對熔化金屬表面的雷射照射,不是採用日 專利特開平9-50 0 725號公報記載的在熔化面上聚焦的方 式,相反使被照射部分的面積擗士 部的機會. m Μ大W加反射光到達受光 由於熔化金屬面的搖動佶矣工+ , 多m下力Γ 9 f : 產生的波紋的曲率半徑, 夕歡慣/兄下在1〜2mm左右。趁氣/由,4 Π ^ ^ * 動傳播使表面產生複雜的凹 凸狀態。當注意到凸部時發頦,1 n J ^ 几邱ΐ λα c ^ , 货現先照射到凸部時如果接受 凸部某一點的反射光,則接受 7不伐又 的反射光。為了獲得更多的受:近該點以外部位發出 在其他的凹凸部位照射雷射姑:為必須條件需要 的反射光。作為這類的凹凸接受從凹凸部位發出 4仇’至少在關注的凸部前後 第20頁 \\312\2d^code\90-01\89]21658,ptd 4 S3 043 五、發明說明(ϊ7) 取與凸部相同的寬度,在該寬度範圍照射光可以增加受光 次數8 凸部代表性的見度尺寸為1〜2 m m ’因此在其前後取同樣 寬度以上的區域進行照射,在實際操作中雷射的照射區為 少5min以上。通過規定照射面積,對測定極其有利。 由於反射效率不是一定的,因此測定光的受光量變化 (減少)很難判斷究竟是因為吸光的原因或是因振盪引起 反射率的變化的原因。這裏,通過同時照射和測定比較用 光和測定光’對反射率的變化部分進行補償,在測定中是 必要的。所s胃比較用光,是指反射效率的變化與測定光在 任何微小的時間都相等、光路和照射面積都相同的比較用 的光而言。 關於受光強度的測定方法,分割成微小的時間測定光的 強度’通過濃度測定上只使用反射光強度在門檻值以上時 的信號’提高測定精度。反射光的強度,對於低信號幾乎 都是轄射光’不能正確地測定吸光量。因此,通過濃度測 定上只使用反射光(特別是標準光的反射光)強度在門檻 值以上時的信號,可以改善S/N,提高分析精度。 上述嫁化金屬本身發出的輻射光,可按如下手續從測定 光中分離。即’在—定的週期内,遮斷雷射照射’測定遮 斷時的輻射光強度(),將雷射照射時的測定光強度 (Ir )與遮斷時輻射光強度(If )之差(Ir — If )作為雷射 反射光的強度。根據這樣測定的反射光的強度可以正確地 測定原子吸光強度。89121658.ptd Page 19 4 63 04: V. Description of the invention (16) Laser wavelength information from the stator 19 and the laser output power of the laser light source measured by the beam sampler 17 and the light detector 18 The information is transmitted to the computing device (computer) 15 together. Based on the above information, using a computing device to correct parameters such as laser power fluctuations, laser wheel output wavelength fluctuations, vapor layer thickness fluctuations, and temperature parameters, the concentration of analytical elements in the refined metal can be determined. When the surface of the grafted metal vibrates to form ripples, the ripples are random, and the direction of the wave is also random, and the curvature of the wave surface is constantly changing. Β When irradiated to a point on the surface of such a grafted metal, it melts. The reflected light emitted from a specific point on the metal surface sometimes does not reach the light-receiving part, but the wavefront change of the part slightly away from that specific point is also random, so the reflected light emitted from this part cannot reach The probability of reaching the light receiving section is small. Therefore, increasing the number of reflection points can increase the expected value of the reflected light reaching the light receiving section. That is, the laser irradiation on the surface of the molten metal is not the method of focusing on the melting surface described in Japanese Patent Laid-Open No. 9-50 0 725, but rather the opportunity to make the area of the illuminated part a firearm. M Μ 大W plus reflected light reaches the light receiving surface due to the rocking work of the molten metal surface, and the force Γ 9 f for many m: the radius of curvature of the generated ripple, which is about 1 to 2 mm. While the air is in motion, the 4 Π ^ ^ * dynamic propagation causes the surface to have a complex concave-convex state. When the convex part is noticed, 1 n J ^ several Qiu ΐ λα c ^, when the goods are first irradiated to the convex part, if the reflected light at a certain point of the convex part is received, 7 non-cutting and reflected light is accepted. In order to gain more acceptance: the part near this point emits laser light on other concave and convex parts: the reflected light required as necessary. Accepting this as a kind of unevenness is to send out four enemies from the unevenness at least before and after the convexity of interest. Page 20 \\ 312 \ 2d ^ code \ 90-01 \ 89] 21658, ptd 4 S3 043 V. Description of the invention (ϊ7) Take the same width as the convex part, and irradiate light in this width range can increase the number of light receiving times. 8 The typical visibility size of the convex part is 1 ~ 2 mm. Therefore, the area with the same width or more is irradiated before and after it. The laser irradiation area is less than 5min. The predetermined irradiation area is extremely advantageous for measurement. Since the reflection efficiency is not constant, it is difficult to determine whether the change in the amount of light received by the measurement light is due to light absorption or the change in reflectance due to oscillation. Here, it is necessary to compensate for the change in the reflectance by irradiating and measuring the comparison light and the measurement light 'simultaneously. The light for stomach comparison refers to the light for comparison in which the change in reflection efficiency is equal to the measurement light at any minute time, and the light path and irradiation area are the same. Regarding the method of measuring the received light intensity, the intensity of the light is divided into minute times to measure the intensity of the light. 'On the basis of the concentration measurement, only the signal when the reflected light intensity is above the threshold value' is used to improve the measurement accuracy. The intensity of the reflected light is almost always for the low signal, and the light absorption cannot be measured accurately. Therefore, by using only the signal when the intensity of the reflected light (especially the reflected light of the standard light) is above the threshold, the S / N can be improved and the analysis accuracy can be improved. The radiant light emitted by the aforementioned grafted metal itself can be separated from the measurement light by the following procedure. That is, "the laser irradiation is interrupted within a predetermined period" to measure the radiation light intensity () at the time of interruption, and the difference between the measured light intensity (Ir) at the time of laser irradiation and the radiation light intensity (If) at the time of interruption (Ir — If) is the intensity of the laser reflected light. From the intensity of the reflected light thus measured, the atomic absorption intensity can be accurately measured.

4 63 CM3 發明說明(18) 當輻射光隨時間變化時,以一定的週期遮斷雷射的照 射按以下方式測定遮斷時的輻射光,考慮輻射光隨時間 的變化。即,根據雷射照射時的輻射光強度(L )以及在 此前後雷射遮斷時的輻射光強度(In、h )計&的雷射遮 斷時的輕射光強度(=(In + If2)/2),求出光強度之差 (Ir ( ifl + 1以)/ 2 )。將該光強度之差作為雷射反射光 的強度’測定原子吸光強度。這樣,即可正確地修正輻射 光。 /4 63 CM3 Description of the Invention (18) When the radiated light changes with time, the radiation of the laser is interrupted at a certain period. The radiated light at the time of blocking is measured in the following manner, taking into account the change of the radiated light with time. That is, according to the radiation light intensity (L) at the time of laser irradiation and the radiation light intensity (In, h) before and after the laser is interrupted, the light intensity at the time of laser interruption (= (In + If2) / 2), find the difference in light intensity (Ir (ifl + 1 to) / 2). The difference in light intensity was used as the intensity of the laser reflected light 'to measure the atomic light absorption intensity. In this way, the radiated light can be corrected correctly. /

遽斷雷射照射的週期,應該在1乃至丨〇 〇 〇 Hz的範圍内。 為了測疋炼化金屬發出的輕射光並以一定的週期遮斷雷 射’在雷射照射熔化金屬表面之前使其通過旋轉式遮斷機 (以下稱遮光器)。雷射的照射和遮斷交互進行,在照射 時測定雷射反射光與輻射光之和,在遮斷時只測定輻射光 k樣 可以較為容易地測疋真正的雷射反射光。此時, 雷射的遮斷時間應該比光的測定時間長一些。例如,如果 光的測定週期時間為0· 0 0 2 s時,雷射遮斷時間為0. 〇2s,The period of the interrupted laser irradiation should be in the range of 1 or even 1000 Hz. In order to measure the light emitted by the refining metal and cut off the laser at a certain period, the laser is passed through a rotary interrupter (hereinafter referred to as a shutter) before the laser irradiates the molten metal surface. The laser irradiation and blocking are performed interactively. The sum of the laser reflected light and the radiant light is measured during the irradiation, and only the radiated light k is measured during the blocking. It is relatively easy to measure the real laser reflected light. At this time, the interruption time of the laser should be longer than the measurement time of the light. 〇2s , If the measurement cycle time of light is 0 · 0 0 2 s, the laser blocking time is 0. 〇2s ,

雷射照射時間為0. 0 8s (週期〇, 1 s )較為適宜。不一定要 求遮斷時間與照射時間一致,在遮斷中可以充分地進行包 括輻射光波動在内的測定時’為了提高雷射反射光的測定 精度’希望照射時間長一些。這樣,在對熔化金屬之光進 行分光的分光測光部,只要設置簡單的帶通濾波器和光電 倍增管就可以準確地測定輻射光。 炼化金屬之輻射光是連續光,作為簡便的測定方法,把 反射光和輻射光合計的光用光譜儀分光,通過測定入射的The laser irradiation time is preferably 0.08s (period 0, 1 s). It is not necessary for the blocking time to be the same as the irradiation time. When the measurement including the fluctuation of the radiated light can be performed sufficiently during the blocking, it is desirable that the irradiation time be longer in order to improve the measurement accuracy of the reflected laser light. In this way, in the spectrophotometric section that splits the light from the molten metal, as long as a simple band-pass filter and a photomultiplier tube are provided, the radiant light can be accurately measured. The radiant light of the refining metal is continuous light. As a simple measurement method, the combined light of the reflected light and the radiant light is separated by a spectrometer and the incident light is measured.

89121658.ptd 第22頁89121658.ptd Page 22

五、發明說明(19) 雷射波長及其附近的.处立^ λ 的輻射光也可以。,波長的輻射光,推測與雷射相同波長 例如,首先求少AL # 定光的輻射光的關传]:的特定波長的輻射光與反射測 測盥f η # i系,通過測定該特定波長的輜射光,推 J興田射相同波長的輻射光。 作為反射光的檢、丨 譜儀對受光進行分f方如使用單色光譜儀或多色光 方法進行分光時,ΐ、 光強度的方法。但是,使用該 度不夠。使接受的^於狹缝等使光量衰減,導致測定靈敏 5㈣以下的帶通二 過波長包括反射光波長、波幅為V. Explanation of the invention (19) The laser wavelength and its surrounding radiation of ^ λ can also be used. , The wavelength of the radiant light is estimated to be the same wavelength as the laser. For example, first find the pass of the radiant light of AL # fixed light]: The radiant light and reflection of a specific wavelength are measured by measuring the f η # i system. The Xingtian radiates light of the same wavelength. As the detection of reflected light, the spectrometer divides the received light, such as using a monochromatic spectrometer or a multicolor light method to perform spectroscopic analysis. However, using this degree is not enough. Decreasing the amount of light received by the slit or the like will cause the measurement to be sensitive. Bandpass 2 below 5㈣ The wavelength includes the wavelength of the reflected light and the amplitude is

號。例如配置Λ器,選擇波長後,檢測出全光量信 A. Μ . ^ ^ , 夏徑少lmm文光用光導纖維,接受從熔化 過4 ί出的反射光,從光導纖維的另一端出來的光通 器1 = ί ί ί行光,通過測定波長為中心波長的帶通滤波 n 古王I里導入光電倍增管’測定光的強度。這樣,可 2问測疋靈敏度。此時包括帶通濾波器的半幅值内測定 .、波長’並且希望其半幅值儘量小一些。 經過熔化金屬元素的原子吸光後的光、主成分元素的原 子吸收後的光、標準光等多種反射測定光在同一光路時,number. For example, if the Λ device is configured, the full-light quantity signal A. Μ. ^ ^ Is detected after the wavelength is selected, and the optical fiber for summer light is 1mm, and the reflected light from the melted 4 Å is received from the other end of the optical fiber. Luminometer 1 = ί ί Row light, which is measured by a band-pass filter with a wavelength of the center wavelength. The photomultiplier tube is introduced into the ancient king I to measure the intensity of the light. In this way, you can measure the sensitivity of radon. In this case, the measurement of the half-amplitude, including the band-pass filter, and the wavelength 'is desired, and the half-amplitude thereof is desired to be as small as possible. When multiple reflection measurement lights, such as light absorbed by atoms of molten metal, light absorbed by atoms of main component elements, and standard light, are in the same optical path,

對、角入射的光’特定波長範圍的光發生反射、其他的 波長範圍的光用透光的光學濾波器對雷射分光,穿過 測疋波長為中心波長的帶通濾波器後,導入光妒 測定強度也可以。 θ 熔化金屬處於高溫時,輻射光增大’很難檢測熔化金屬 面發出的輻射光。這裏,調整照射光的強度,使檢測.的Diagonal and angular incident light 'light is reflected in a specific wavelength range, and light in other wavelength ranges is separated by a light-transmitting optical filter and passed through a band-pass filter whose measurement wavelength is the center wavelength, and then the light is introduced. Envy measurement intensity is also possible. θ When the molten metal is at a high temperature, the radiated light increases' It is difficult to detect the radiated light emitted from the molten metal surface. Here, adjust the intensity of the irradiated light so that

89121658.ptd 第23頁 4 63 04^: 五、發明說明(20) ~ --- 達到轄射光的1〇倍以上。特別是蒸氣層吸收 波先,由於吸光使反射光的強度減小,因此沒被 拉光強度’希望通過調整入射光強度使其達到 輻射光的1 0 0倍以上0 當輻射光較強時’反射光與輻射光之比變小,反射光的 Ϊ定:ίΐΐ:因此為了不檢測出熔化金屬發出的輻射 光’希望k蔽部分炼化金屬之表面。 關於熔化金屬之溫度變化,其修正的必要性及修正方法 與上述相同。熔化金屬之溫度測t,預先求出特定 :昌射光強度與熔化金屬之溫度之間的關係式,由 2 輕射光的強度的測定值計算也可以。此外,不用特 =光強度’而是使用特定的2各波長的轄射長 ΐ:二”光強度設置另外的測定裝置進行測定也可 太1i:測定光時使用測定的光量求出也可以。 箅如主成分為鐵、分析元素為…) ί:ίμ m 方法。傳統的原子吸收光度法,對 ,鋼中Μη = $達到〇· 2wt%以上時因吸光飽和而不能測 疋’但使用本發明的方法時,即使您.由μ入直古、去〇 也能測定。 ^便込鋼中Μη含量尚達2wt% 現在說明關於本發明的溶化金屬分 置的-例:,中,雷射光源la、(分析元素測定用裝 I: lb (主成分元素測定用)以及lc (標準光用)發出的 雷射’通=光光學系統7内的光學遽波器(高通渡波: )8a〜8C使”成為同—光路的光。雷射光源使周發出雷射89121658.ptd Page 23 4 63 04 ^: 5. Description of the invention (20) ~ --- Reached more than 10 times the light emission. Especially when the vapor layer absorbs the wave, the intensity of the reflected light is reduced due to the absorption of light, so the intensity of the light is not pulled. 'It is hoped that the intensity of the incident light can be adjusted to reach more than 100 times the radiated light. 0 When the radiated light is strong' The ratio of the reflected light to the radiant light becomes smaller. The definition of the reflected light is: ΐΐ: Therefore, in order not to detect the radiant light emitted by the molten metal, it is desirable to shield the surface of the part of the refined metal. Regarding the temperature change of the molten metal, the necessity and method of correction are the same as those described above. The temperature t of the molten metal is measured, and the relationship between the specific light intensity and the temperature of the molten metal is obtained in advance. It can also be calculated from the measured value of the light intensity of the light. In addition, it is not necessary to use special = light intensity ', but to use a specific radiation length of 2 wavelengths: two "light intensity can be measured by setting up another measuring device too. 1i: It can also be determined by measuring the amount of light when measuring light.箅 If the main component is iron and the analysis elements are…) ί: ί μm method. Traditional atomic absorption spectrometry, yes, the steel can not be measured due to saturated light absorption when Mη = $ reaches 2 · 2wt% or more. But using this When the method is invented, it can be measured even if you enter μ from Zhigu and remove 0. ^ The Mη content in the bento steel is still up to 2% by weight. Now, the dissolution of the molten metal of the present invention will be described. Light source la, (analytical element measurement device I: lb (for measurement of main component elements), and lc (for standard light) emitted laser light pass = optical chirper (high pass wave:) 8a ~ in optical optical system 7) 8C makes "the light of the same light path. The laser light source makes Zhou emit a laser

4 . 4 63 、發明說明(2]) 波長和半幅值及強度可調的雷射光源。同一光路的光通過 透鏡9導入光導纖維11&,傳送到熔化金屬3表面附近。為 了測定炼化金屬之輻射光,將雷射導入光導纖維丨丨a之前 通過遮光器1 0 ^從光導纖維1丨a的端部發出光通過照射光 子系統2 2 ’再穿過蒸氣層4照射到熔化金屬3的表面上。照 射光學系統2 2具有調節機構,借助於安裝在透鏡上的透鏡 位置調節器’調節光導纖維Π a的端面與透鏡之間的距 離’使雷射變成平行光或者發散光,照射到熔化金屬之表 面上。溶化金屬3的表面上反射的光再次通過蒸氣層4 ,穿4. 4 63, Invention Description (2)) Laser light source with adjustable wavelength and half amplitude and intensity. Light of the same optical path is introduced into the optical fiber 11 & through the lens 9 and transmitted to the vicinity of the surface of the molten metal 3. In order to measure the radiant light of the refined metal, the laser is introduced into the optical fiber 丨 丨 a before passing through the shutter 1 0 ^ light emitted from the end of the optical fiber 1 丨 a through the photonic subsystem 2 2 'and then irradiated through the vapor layer 4 Onto the surface of molten metal 3. The irradiation optical system 22 has an adjustment mechanism. The lens position adjuster 'adjusts the distance between the end surface of the optical fiber Π a and the lens' by means of a lens position adjuster mounted on the lens, so that the laser becomes parallel light or divergent light, and irradiates the molten metal. On the surface. The light reflected on the surface of the molten metal 3 passes through the vapor layer 4 again, passes through

過受光用光導纖維Π b被傳送出去》該光導纖維有一根即 可,多根也可以。從受光用光導纖維丨]b發出的光通過透 鏡12 ’變成平行光’通過分離波長區的光學瀘 13b分成各自的雷射波長後,通過帶通濾波器〜14(;, 導入測定全光量的光檢測器6a〜6c,測定強度。被測定各 種不同波長的強度’連同熔化金屬之溫度感測器丨6發出的 溫度資,、對雷射源的雷射測定的波長測定器〗9發出的雷 射波長資訊、以及光束取樣器1 7與光檢測器丨8測定的雷射 光源的雷射輸出功率資訊一起輸送到運算裝置(電腦) 15。 <The light-guiding optical fiber Π b is transmitted. The optical fiber may have one or more optical fibers. The light emitted from the light-receiving optical fiber 丨] b passes through the lens 12 'becomes parallel light' and is divided into respective laser wavelengths by the optical 泸 13b in the separation wavelength region, and then is passed through a band-pass filter ~ 14 (;) to measure the total light amount The photodetectors 6a to 6c measure the intensity. The intensities of various wavelengths are measured, together with the temperature information from the temperature sensor of the molten metal, and the wavelength measurement device for the laser measurement of the laser source. Laser wavelength information, and beam sampler 17 and laser output power information of the laser light source measured by the photodetector 丨 8 are sent to a computing device (computer) 15. <

根據上述資訊,用運算裝置對雷射功率的波動、雷射輸 出波長的波動、療氣層厚度的波動以及溫度等參數進行校 正’可以求出嫁化金屬中分析元素的濃度。 用圖4所示的裝置,首先對雷射輸出功率、雷射輸出波 長、蒸氣層厚度和溫度進行修正,通過求出分析元素的吸According to the above information, using a computing device to correct parameters such as fluctuations in laser power, fluctuations in laser output wavelength, fluctuations in the thickness of the gas treatment layer, and temperature can be used to calculate the concentration of the analytical elements in the grafted metal. Using the device shown in Fig. 4, first of all, the laser output power, laser output wavelength, vapor layer thickness and temperature were corrected, and the absorption of the analytical elements was calculated.

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IIII

4 63 ^//_____ 五、發明說明(22) 光度與熔化金屬中的分析元素濃度 (校正線),可以進行良好精度的分析。U)的關係式 (實施例1 ) 使用圖3所示的測定裝置,測定熔化金屬3中的m 。 嫁化金屬3是採用高頻炫煉爐在炭甜禍内炼煉的㈣熔 鋼^然在炫鋼中添加Mn。使嫁鋼中Mn含量控制在〇〜 1 w t /。Μη的測定是在熔鋼溫度丨6 〇 〇艺下進行的。 測定用的波長可調的雷射是按照下述條件輸线。 根據YAG雷射的第2高次諧波的振盪光(〇,53⑽)激發出^ ί Ϊ ί身:结得到波長連續的雷射。調整波長,*該波長連 ,戈雷射的弟2高次諧波振盪,作為波長可調的雷射而輪 出。振盥波長的調整,是以Μη的原子吸光波長4〇3. 3〇7nm 為中心,以O.OOlnm單位進行偏離。輸出雷射的能量為 10mW,波長半幅值為〇 〇〇2nm。 ,為光學系統,使用了 2根光導纖維(雷射入光用2和雷 ,又光用5)。雷射用光導纖雉2的—端置於能夠會聚雷射 光源1發出雷射的部位。入光用光導纖維2的另一端進入感 測器:每個感測器都放在靠近熔化金屬之表面附近。為^ 防^混入空氣引起的氧化’在感測器内充滿了 N2氣。在感 測,内,入光两光導纖維2發出的光通過蒸氣層4後,被送 到受光用光導纖維5的一端。受光用光導纖維5的另一端安 放f 5 0 cm艾伯特光譜儀的入射狹縫處。到達入射狹縫的光 被光譜儀分光’由發光二極體6測定強度。 使用上述系統,偏離雷射的波長,對於各個偏離量測定4 63 ^ // _____ 5. Description of the invention (22) Photometric and concentration of analytical elements in the molten metal (calibration line), can be analyzed with good accuracy. U) Relational expression (Example 1) The measurement device m shown in FIG. 3 was used to measure m in the molten metal 3. Married metal 3 is a molten steel smelted in a charcoal disaster using a high-frequency smelting furnace. Mn is added to the smelting steel. The Mn content in the grafted steel is controlled to 0 to 1 w t /. The measurement of Mn was performed at a melting temperature of 600 ° C. The wavelength-adjustable laser for measurement is fed under the following conditions. The oscillating light (0,53⑽) of the 2nd harmonic of the YAG laser excites ^ Ϊ Ϊ :: The knot obtains a laser with a continuous wavelength. Adjust the wavelength. * This wavelength is connected to the second harmonic wave of the laser, which is turned out as a laser with adjustable wavelength. The adjustment of the vibration wavelength is centered on the atomic absorption wavelength of 4.03nm of Mη, and the deviation is made in units of 0.0001nm. The output laser has an energy of 10 mW and a half-wavelength of 0.02 nm. For the optical system, two optical fibers are used (2 for laser incident light and 5 for lightning, and 5 for light). The end of the laser light guide fiber bundle 2 is placed at a position where the laser light source 1 can converge the laser. The other end of the optical fiber 2 for incident light enters the sensors: each sensor is placed near the surface near the molten metal. In order to prevent oxidation caused by mixed air, the sensor is filled with N2 gas. In the sensing, the light emitted from the two light-guiding optical fibers 2 passes through the vapor layer 4 and is sent to one end of the light-guiding optical fiber 5. The other end of the light receiving fiber 5 was placed at the entrance slit of an f 50 cm Albert spectrometer. The light reaching the entrance slit is split by a spectrometer 'and the intensity is measured by the light emitting diode 6. Using the above system, the wavelength of the laser is deviated, and the amount of each deviation is measured.

89121658.ptd 第26頁89121658.ptd Page 26

Μ: 3量與吸光引起的強度變化的關係。將測定結果的實例 不:圖5。從圖5可以看出,把雷射波長對在吸光波長的中 心吟,沒能夠測定ΑΜη含量為〇. 2wt%以上的吸光強度的變 化。但是’將雷射波長從心的吸光波長的中心偏離0 0 5nm 以上丄即她的含量提高到lwt% s也能充分測定吸光引起 - ϊ ΐ丄根?本發明,通過控制雷射波長位置可以控制測 0結果,可以克服原子吸收光度法的測定範圍 二=、、點拓寬原子吸收光度法在熔化金屬分析中的通 用把圍。 (實施例2 ) 使用圖4所示的測定裝置’測定熔化金屬中临含量。 熔化金3疋採用高頻熔煉爐在炭坩堝内熔煉的5kg熔 然後,在熔鋼中添加^。使熔鋼中^含量控制在〇〜 1· 5wt%。Μη的測定是在熔鋼溫度155〇。〇〜165〇。匸範圍内進 行的。Μ: The relationship between the amount of 3 and the intensity change due to light absorption. Examples of measurement results No: FIG. 5. It can be seen from Fig. 5 that when the laser wavelength is set to the center of the absorption wavelength, it is not possible to measure the change in the light absorption intensity when the AMη content is 0.2 wt% or more. But ’the laser wavelength deviates from the center of the light absorption wavelength of the heart by more than 0 5 nm, that is, if her content is increased to 1 wt% s, the light absorption caused by--ΐ 丄 root? In the present invention, the measurement results can be controlled by controlling the position of the laser wavelength, which can overcome the measurement range of the atomic absorption spectrophotometry. Second, the point broadens the general range of the atomic absorption spectrophotometry in the analysis of molten metals. (Example 2) The content of molten metal in the molten metal was measured using a measuring device 'shown in Fig. 4. 3 kg of molten gold was smelted in a carbon crucible by a high-frequency melting furnace, and then 5 kg was added to the molten steel. The content of ^ in the molten steel is controlled to 0 to 1.5 wt%. The measurement of Mn is at a melting steel temperature of 1550. 〇 ~ 165〇.匸 within the range.

按照圊4的裝置的分析元素測定用雷射光源1 a,根據YAG 雷射的第2高次譜波的振盪光(〇.53nm)激發出Ti發射雷 射 >,得到波長連續的雷射,對該波長連續的雷射的第2高 次谐波調整波長,冑用振盪的波長可調的雷射。振盪波長 是從Μη的原子吸光波長中心(4〇3. 3〇7nm ),調成偏離 0.0 0 611111的 40 3.3 1311111。雷射的波長半幅值為〇,〇〇21111],輸 出功率為1 OmW。 圖6表示用該雷射根據波長位置測定Mn的吸光靈敏度變A laser light source 1 a for measuring elemental analysis according to the device of 圊 4 was used to excite the Ti emission laser based on the oscillating light (0.53 nm) of the second higher-order wave of the YAG laser to obtain a laser with a continuous wavelength. Adjust the wavelength of the second higher harmonic wave of the laser with continuous wavelength, and use the laser with adjustable wavelength to oscillate. The oscillating wavelength is adjusted from the center of the atomic absorption wavelength of Mη (40.307nm) to 40 3.3 1311111 which deviates from 0.0 0 611111. The wavelength of the laser has a half-amplitude of 0,0021111], and the output power is 1 OmW. FIG. 6 shows the change in the light absorption sensitivity of Mn measured by this laser from the wavelength position.

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4 63 G4 五、發明說明(24) 化的結果例。從圖6可以看出’在Μ η的原子吸收波長 4 〇 3 · 3 Ο 7ηηι處得到吸光靈敏度的峰值。 圖4裝置的主成分元素測定用雷射光源1 b,使用上述波 長可變雷射,將振盪波長調整到熔化金屬主成分的F e的原 子吸收波長中心(386nm)附近。雷射的輸出為l〇mW。 圖4的標準光用雷射光源lc,使用振盪波長430nm附近的 蘭色半導體雷射。4 63 G4 V. Example of the results of the invention (24). It can be seen from FIG. 6 ′ that the peak of the light absorption sensitivity is obtained at the atomic absorption wavelength of 4 η 3. The laser light source 1b for measuring principal component elements in the apparatus of Fig. 4 uses the above-mentioned variable-wavelength laser to adjust the oscillation wavelength to near the center of the atomic absorption wavelength (386 nm) of Fe of the molten metal principal component. The laser output is 10 mW. The standard laser light source lc shown in FIG. 4 uses a blue semiconductor laser with an oscillation wavelength of about 430 nm.

上述3種雷射呈9 0 °角的位置關係佈置,在雷射的交叉 點配置後文將要敘述的光學濾波器_8a〜8c,將其用於雷射 照射用光學系統,3種雷射集於同一光路。即,從雷射光 源1 a產生的雷射由光學濾波器8a使^其發生反射後,與雷射 光源1 b發出的雷射呈9 0 a角交又。該交叉點上,裝設對 45 °角入射的光能透過4〇3nm (光源la )的光、對386nm (光源1 b )的光能反射的光學濾波器8b。這樣,可以使光 源1 a、1 b發出的雷射會聚於同一光路。其次,從同一光路 的光源1 a、1 b發出的雷射,與雷射光源1 c發出的雷射交又 成90 °角。在該交叉點上,設置能透過4〇3nm (光源la ) 的光和386nm (光源lb )的光以及使43 0nm (光源lc )的光 能反射的光學濾波器8c。這樣,403nm (光源la ) 、386nm (光源1 b )的雷射和4 3 0 n m (光源1 c )的雷射可以作成同 一光路狀態。將同一光路的3種雷射用會聚透鏡9聚光’導 入〇_3mm孔徑的光導纖維113。導入光導纖維na之前使雷 射通入旋轉式遮光器1 〇。光導纖維丨丨a的反向侧端面由端 子固疋’彳曰助於微調透鏡2 2的位置的微調機構調整透鏡2 2The above three types of lasers are arranged at a positional relationship of 90 °. Optical filters _8a to 8c, which will be described later, are arranged at the intersections of the lasers, and they are used in optical systems for laser irradiation. Three types of lasers Set on the same light path. That is, the laser generated from the laser light source 1 a is reflected by the optical filter 8 a and then intersects with the laser emitted from the laser light source 1 b at an angle of 90 °. At this crossing point, an optical filter 8b is provided which transmits light having a wavelength of 40 ° (light source la) to light incident at an angle of 45 ° and reflects light energy of 386 nm (light source 1b). In this way, the lasers emitted from the light sources 1 a and 1 b can be focused on the same optical path. Secondly, the laser emitted from the light sources 1 a and 1 b in the same optical path and the laser emitted from the laser light source 1 c make another 90 ° angle. At this intersection, an optical filter 8c is provided which can transmit light of 403 nm (light source 1a), light of 386 nm (light source 1b), and reflect light energy of 4300 nm (light source 1c). In this way, a laser of 403 nm (light source la), 386 nm (light source 1 b) and a laser of 4 3 0 nm (light source 1 c) can be made into the same optical path state. Three types of laser condensing lenses 9 for condensing the same optical path are condensed 'into an optical fiber 113 having an aperture of 0.3 mm. Before introducing the optical fiber na, a laser was passed through the rotary shutter 10. The optical fiber 丨 丨 a on the opposite side is fixed by the terminal. The fine-tuning mechanism that helps fine-tune the position of the lens 2 2 adjusts the lens 2 2

89121658.ptd 第28頁 d63 043 五、發明說明(25) 與光導纖維1 1 a端面的距離,把雷射變成平行光2〇後照射 到熔鋼表面。照射到熔鋼表面上的照射直徑為炉。 作為受光光學系統,只使用了光導纖維u b,並使用了 光學濾波器1 3a及13b的分光系統。即,在熔鋼表面附近安 裝了直徑P 1 mm的受光用光導纖維丨〗b,接受熔鋼表面的反 射光21。從光導纖維lib的另一端發出的光由透鏡12變成 平行光以後導入光學濾波器丨3 a進行分光。光學濾波器 13a,是對45。角入射光能透過43〇nm (光源c ^光、°並 能對4 0 3nm (光源1 a )的光和3 8 6 πιε (光源1 b )的光能夠反 射的滅波器。反射的雷射由光學濾波器丨3b再次分光。光 學濾波器13b,是對45。角入射光能透過403nm (光源la) 的光' 並能對386nm (光源lb )的光反射的濾波器。將這 類分光的各種測定波長雷射,分別通過各波長為中心波的 半幅值2nm的帶通濾波器14a、14c,導入光電倍增管6a〜 3c ’以2ms的單位測定了光強度。以2s的間隔進行測定, 收錄了 1 0 0 0個資料。89121658.ptd Page 28 d63 043 V. Description of the invention (25) The distance from the end face of the optical fiber 1 1 a, the laser is converted into parallel light 20, and then the molten steel surface is irradiated. The diameter of the irradiation on the surface of the molten steel is a furnace. As the light-receiving optical system, only the optical fiber u b is used, and a spectroscopic system using the optical filters 13a and 13b is used. That is, a light-receiving optical fiber with a diameter of P 1 mm is installed near the surface of the molten steel, and the reflected light 21 on the surface of the molten steel is received. The light emitted from the other end of the light guide fiber lib is changed into parallel light by the lens 12 and then introduced into the optical filter 3a to be split. The optical filter 13a is 45. Angular incident light can pass through 43nm (light source c ^ light, ° and can reflect light of 403 nm (light source 1 a) and 3 8 6 πε (light source 1 b). The reflected thunder The light is split again by the optical filter 3b. The optical filter 13b is a pair of 45. The angular incident light can transmit light of 403nm (light source 1a) and can reflect the light of 386nm (light source 1b). This type of filter Lasers at various measuring wavelengths of the spectroscope are passed through the bandpass filters 14a and 14c with a half-amplitude of 2 nm at each wavelength as the center wave, and are introduced into the photomultiplier tubes 6a to 3c. Measurements were performed and 1 000 data were collected.

採用Pt-Rh熱電偶測定溫度。首先,用pt-Rh熱電偶對鋼 液表面正下方與測溫位置的關係進行了測定,並求出關係 式。遮光器10的週期為100s,遮斷時間為25ms,照射時間 為75ms,反復進行。如上所述,被遮光氣1〇遮斷時的光強( 度為輻射光強度。按照時間序列求出遮斷時輻射光強度的 平均值,如上所述,測定反射光時的輻射光強度,可將反 射光測定前後遮斷時的輻射光強度取其平均值而求得。從 測定反射光時的測定值減去輻射光強度,可以求出真正的The temperature was measured using a Pt-Rh thermocouple. First, the relationship between the temperature directly below the molten steel surface and the temperature measurement position was measured with a pt-Rh thermocouple, and the relational expression was obtained. The period of the shutter 10 is 100 s, the blocking time is 25 ms, and the irradiation time is 75 ms, which are repeated. As described above, the light intensity when the light is interrupted by the light-shielding gas (degree is the intensity of the radiant light. The average value of the intensity of the radiant light at the time of interruption is obtained according to the time series. As described above, the intensity of the radiant light when the light is reflected is measured. The intensity of the radiated light when the reflected light is interrupted before and after the measurement can be obtained by taking the average value. Subtracting the value of the radiated light intensity from the measured value when measuring the reflected light, you can find the true

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463043_ 五、發明說明(26) 反射光的強度。分別求出標準光、測定用光的反射光強 度0 圖7表示標準光、Μη測定用光由遮光器丨〇遮斷光求出的 反射光的一例。 關於吸光度的資料,按照強度順序排列標準光強度時達 到50%以上的時間的資料定為有效資料。求出該時間内如 測定光與標準光的平均值之間的強度比(R )與未通過鋼 液面接受雷射時Μη測定光與標準光的平均值之間的強度比 CR0)之比(R/R0) ’其倒數的對數(=—(r/r〇)) 定為Μη的吸光度’對主成分元素Fe的吸光度,可用同樣方 法求出。 熔化金屬3的溫度修正,使用蒸氣壓隨溫度變化的參考 文獻值°以1600 C的蒸氣壓的Mn、Fe的吸光度的值為標 準,進行修正。 义 " 關於蒸氣層4的厚度修正,計算μ n和f e的吸光度比’將 該吸光度比作為蒸氣層厚度4修正後的Mn吸光度。 將^I疋Μη吸光度(實際上是與Fe的吸光度之比)與熔鋼 中Μη,度的關係實例示於圖8。從圖8可以看出,根據本發 明的實施形態’ Μη吸光度與鋼液中Μη濃度之間具有良好的 相關性’可以高精度地分析Μη的濃度。 本實施例的測定時間較短,因此雷射的輸出波長穩定, 沒有發生變化。但是,在實際的長時間測定中,雷射的輸 出波長是變化的。當雷射的輸出波長變化時,使用圖6所463043_ 5. Description of the invention (26) The intensity of reflected light. The reflected light intensities 0 of the standard light and the measurement light are obtained, respectively. Fig. 7 shows an example of the reflected light obtained by blocking the light with the standard light and the measurement light for the measurement. Regarding the data of absorbance, the data that reached 50% or more of the time when the standard light intensity was arranged in order of intensity was determined as valid data. Calculate the ratio of the intensity ratio (R) between the average value of the measured light and the standard light during this time to the intensity ratio (CR0) between the average value of the Mη measurement light and the standard light when the laser is not received through the molten steel surface. (R / R0) 'The logarithm of its reciprocal (= — (r / r0)) is determined as the absorbance of Mn' for the absorbance of the main component element Fe, which can be determined in the same manner. The temperature of the molten metal 3 is corrected by using the reference value of the vapor pressure as a function of temperature. The correction is performed based on the values of the absorbance of Mn and Fe at a vapor pressure of 1600 C. In terms of the thickness correction of the vapor layer 4, the absorbance ratio between µn and fe is calculated ', and this absorbance ratio is used as the Mn absorbance after the vapor layer thickness 4 correction. An example of the relationship between the ^ I 疋 Μη absorbance (actually the ratio to the absorbance of Fe) and the Mn, degree in the molten steel is shown in FIG. 8. It can be seen from Fig. 8 that according to the embodiment of the present invention, there is a good correlation between the Mn absorbance and the Mn concentration in the molten steel, and the Mn concentration can be analyzed with high accuracy. Since the measurement time in this example is short, the output wavelength of the laser is stable and unchanged. However, in actual long-term measurement, the output wavelength of the laser varies. When the laser output wavelength changes, use Figure 6

89121658.ptd 第30頁 卜 463 043 五、發明說明(27) 行高精度的分析。 【元件編號之說明】 1 :雷射光源 1 a :雷射光源(測定分析元素用) 1 b :雷射光源(測定主成分元素用) 1 c :雷射光源(標準光用) 2、5 :光學系統 3 :熔化金屬 4 :金屬蒸氣層 6a、6b、6c :光檢測器 7 :聚光光學系統 8a、8b、8c :光學遽波器(高通爐、波器) 9 :會聚透鏡 10 :遮光器 1 1 a :照射用光導纖維 1 1 b :受光用光導纖維89121658.ptd Page 30 463 043 V. Description of the invention (27) High-precision analysis. [Description of component numbers] 1: Laser light source 1 a: Laser light source (for measuring and analyzing elements) 1 b: Laser light source (for measuring main component elements) 1 c: Laser light source (for standard light) 2, 5 : Optical system 3: Molten metal 4: Metal vapor layer 6a, 6b, 6c: Photodetector 7: Condensing optical system 8a, 8b, 8c: Optical chirping device (high pass furnace, wave device) 9: Condensing lens 10: Shutter 1 1 a: Light guide fiber 1 1 b: Light guide fiber

12 =透鏡 13a ' 13b : 光 學遽波器(高通濾、波器) 14a 、14b 14 c :帶通濾波器 15 運算 裝 置 16 溫度 感 測 器 17 光束 取 樣 器 18 光檢 測 器 19 波長 測 定 器 89121658.ptd 第31頁 46304312 = lens 13a '13b: optical chirp (high-pass filter, wave filter) 14a, 14b 14c: band-pass filter 15 computing device 16 temperature sensor 17 beam sampler 18 light detector 19 wavelength measuring device 89121658. ptd page 31 463043

89121658.ptd 第32頁 d63 04 3 圊式簡單說明 圖1是本發明原理的說明圖。 圖2是本發明原理的說明圖。 圖3是表示關於本發明熔化金屬分析裝置實例的圖。 圖4是表示關於本發明熔化金屬分析裝置另一實例的 圖。 圖5是表示本發明實施例的熔化金屬分析結果實例圖。 圖6是本發明原理的說明圖。 圖7是表示本發明實施例的熔化金屬分析時間系列檢測 結果的實例圖。 圖8是表示本發明實施例的熔化金屬分析結果的實例 圖。89121658.ptd Page 32 d63 04 3 Simple explanation of the formula Figure 1 is an explanatory diagram of the principle of the present invention. Fig. 2 is an explanatory diagram of the principle of the present invention. Fig. 3 is a diagram showing an example of a molten metal analysis apparatus according to the present invention. Fig. 4 is a view showing another example of the molten metal analyzing apparatus according to the present invention. Fig. 5 is a diagram showing an example of the analysis result of molten metal in the embodiment of the present invention. Fig. 6 is an explanatory diagram of the principle of the present invention. Fig. 7 is a diagram showing an example of the results of detection of a molten metal analysis time series according to the embodiment of the present invention. Fig. 8 is a diagram showing an example of the analysis result of molten metal in the embodiment of the present invention.

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Claims (1)

4 63 043 六、申請專利範圍 1 · 一種熔化金屬之分析方法,由下述作業構成. 使:射通過熔化金屬蒸氣層的作業、把雷射的波長從分 析元素的吸收波長中心位置調整到偏離〇. 〇〇1乃至〇 位置的作業、根據通過該蒸氣層的雷射強度變化測定=7匕 金屬中含有的分析70素的濃度的測定作業。 2 _ —種炫化金屬之分析方法,由以下作業構成: 根據分析元素的測定濃度範圍,從該分析元素的吸收波 長的中心位置偏離的位置具有的波長中心位置的測定光與 不產生原子吸光的波長的標準光在同一光路重疊並使其^ 過至少含有一個分.析元素的炫化金屬之表面附近的蒸氣層 的作業、對通過光的測定光成分的強度與標準光成分的強 度進行測定的測定作業、從測定光成分與標準光成分的強 •度比和蒸氣層厚度同熔化金屬溫度之間的已知關係測定熔 化金屬中分析元素濃度的測定作業。 3.如申請專利範圍第2項之熔化金屬之分析方法,其 中,在測定濃度範圍的最大值的吸光度(=—1 (吸光後 光強度/沒有吸光時的光強度))為2. 5以下的數值時,上 述測定光偏離中心波長的偏離量設定在分析元素的原子吸 光的波長半幅值的2倍以下數值。 4_如申請專利範圍第2項之熔化金屬之分析方法,其 亡述測定光波長半幅值2滿足分析元素的原子吸光波 巾^直為x、上述測定光的中心波長的偏離量為Y時的 Z <(2X — Y)的關係。 5, 一種熔化金屬之分析方法,由以下作業組成:4 63 043 VI. Application for Patent Scope 1. An analysis method for molten metal, which consists of the following operations: The operation of transmitting through the molten metal vapor layer and adjusting the wavelength of the laser from the center of the absorption wavelength of the analysis element to the deviation 〇. 〇〇1 and 〇 position work, based on the laser intensity change through the vapor layer measurement = 7 dagger metal contained in the analysis of 70 element concentration measurement work. 2 _ — An analysis method for a dazzling metal, which is composed of the following operations: According to the measurement concentration range of the analysis element, the measurement light at the center position of the wavelength having a position deviating from the center position of the absorption wavelength of the analysis element and the atomic absorption is not generated The standard light of the wavelength overlaps on the same optical path and passes through at least one component containing the element, and the vapor layer near the surface of the dazzling metal is operated to measure the intensity of the light component and the intensity of the standard light component by light. The measurement operation of the measurement is a measurement operation of measuring the concentration of the analytical element in the molten metal from the known relationship between the intensity-degree ratio of the measured light component and the standard light component and the thickness of the vapor layer and the temperature of the molten metal. 3. The method for analyzing molten metal according to item 2 of the patent application range, wherein the absorbance (= -1 (light intensity after light absorption / light intensity without light absorption)) in the maximum concentration range is 2.5 or less The value of the deviation of the measurement light from the center wavelength is set to a value which is twice or less the half-amplitude of the wavelength of the atomic absorption of the analysis element. 4_ If the method for analyzing molten metal in item 2 of the scope of the patent application, the half-amplitude of the measured light wavelength 2 is satisfied. The atomic absorption wave towel that satisfies the analysis element is x, and the deviation of the center wavelength of the measurement light is Y. The relationship of Z < (2X — Y) at the time. 5, An analysis method of molten metal, consisting of the following operations: 第34頁 在63 043 六、申請專利範圍 根據吸光靈敏度使波長中心位置從熔化金屬之主成分元 素的原子吸光的中心位置偏離的測定光、使上述分析元素 用的波長位置偏離的測定光、不產生上述原子吸光的波長 的標準光等上述光重疊於同一光路使其通過炼化金屬表面 的蒸氣層的作業;測定上述兩測定光成分的強度與標準光 成分的強度的測定作業、根據測定光成分與標準光成分的 強度比和蒸氣層厚度同熔化金屬溫度之間的已知關係測定 炼化金屬中分析元素的濃度的測定作業;根據通過光 的主成分元素的測定光成分與標準光成分的強度比,與% 應分析元素的測定光成分與標準光成分的強度比之間存對 的巳知關係,修正蒸氣層厚度的作業。 在 6·如申諳專利範圍第2項之熔化金屬之分析方法,其 中’在分析中監視測定光的波長,測定原子吸光的中,、、 置與測定光波長的中心位置的偏離量,根據測定的讀 t 量對蒸氣通過光的測定光成分的吸光靈敏度進行修正。隹 7. 如申請專利範圍第2項之溶化金屬之分析方法,其 中,用遮光器使測定光和標準光通過/截止,把截止時 光強度作為熔化金屬發出的輻射光強度進行修正背底、 業。 &的作 8. 如申請專利範圍第2項之熔化金屬之分析方法,其 中,對測定光成分的強度和標準光成分的強度進行夠定 作業是將測定光和標準光照射到熔化金屬表面使其反射的 過蒸氣層後測定反射光強度。 & 9. 如申請專利範圍第8項之炼化金屬之分析方法,其Page 34 on 63 043 6.Applicable patents Measurement light whose wavelength center position deviates from the center position of atomic absorption of the main component element of molten metal according to the light absorption sensitivity, measurement light which deviates the wavelength position for the above analysis element, The operation of superimposing the above-mentioned light such as standard light having a wavelength of the above-mentioned atomic absorption on the same optical path and passing it through the vapor layer on the surface of the refining metal; measuring the intensity of the two measurement light components and the intensity of the standard light component; Intensity ratio of the component to the standard light component and the known relationship between the thickness of the vapor layer and the temperature of the molten metal. Measurement of the concentration of the analytical element in the refined metal; the light component and the standard light component are determined based on the measurement of the main component element of light There is a known relationship between the intensity ratio of the measured light component of the element to be analyzed and the intensity ratio of the standard light component to correct the thickness of the vapor layer. In 6. · The method of analyzing molten metal in item 2 of the scope of the patent application, wherein 'the wavelength of the measurement light is monitored during the analysis, and the amount of deviation of the center, position, and center of the measurement light from the atomic absorption is measured according to The measured reading t corrects the light absorption sensitivity of the measured light component of the vapor passing light.隹 7. For the analysis method of molten metal according to item 2 of the scope of patent application, in which the measurement light and the standard light are passed / cut with a shutter, and the light intensity at the time of cutoff is used as the intensity of the radiant light emitted by the molten metal to modify the background and industry. . & 8. The analysis method for molten metal as described in the second item of the patent application, wherein the sufficient operation for measuring the intensity of the light component and the intensity of the standard light component is to irradiate the measurement light and the standard light to the surface of the molten metal The reflected light was passed through the vapor layer, and the reflected light intensity was measured. & 9. If the analysis method of refining metal in the scope of patent application item 8, 63 六、申請專利範圍 面的反射光並將其導入光檢測器的一個或許多個受光用光 導纖維、由受光用光導纖維導出的反射光被分離成含有各 個雷射波長的波長區的南通ί慮波益和/或低通遽波益、從 通過高通濾波器和/或低通遽波器的反射光分離成含有各 個雷射波長的狹窄波長區的帶通濾波器、對通過帶通濾波 器後的全光量進行測定的光檢測器、測定熔化金屬之溫度 的手段以及對測定結果進行運算的運算裝置。63 VI. Reflected light on the surface of the patent application and introduced it into one or more light-receiving optical fibers of the photodetector. The reflected light derived from the light-receiving optical fibers is separated into Nantong, which contains the wavelength region of each laser wavelength. Taking into account the benefits and / or low-pass chirps, separating the reflected light passing through the high-pass filter and / or the low-pass chirp into a band-pass filter with a narrow wavelength region containing each laser wavelength, and filtering the pass-band A photodetector for measuring the total amount of light behind the device, a means for measuring the temperature of the molten metal, and an arithmetic device for calculating the measurement result. 89121658.ptd 第37頁89121658.ptd Page 37
TW89121658A 1999-03-24 2000-10-17 Analyzing method of molten metal and apparatus therefor TW463043B (en)

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WO2001071320A1 (en) * 2000-03-24 2001-09-27 Nkk Corporation Method and apparatus for analyzing vaporized metal
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JP4485170B2 (en) * 2003-11-14 2010-06-16 東亜ディーケーケー株式会社 Analysis equipment
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CN110832303B (en) * 2017-07-10 2022-09-13 株式会社岛津制作所 Flame atomic absorption spectrophotometer

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