TW450982B - Polyimide film and electric/electronic equipment base materials with the use thereof - Google Patents

Polyimide film and electric/electronic equipment base materials with the use thereof Download PDF

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TW450982B
TW450982B TW88119324A TW88119324A TW450982B TW 450982 B TW450982 B TW 450982B TW 88119324 A TW88119324 A TW 88119324A TW 88119324 A TW88119324 A TW 88119324A TW 450982 B TW450982 B TW 450982B
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film
adhesive
polyimide film
polyimide
patent application
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TW88119324A
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Chinese (zh)
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Kazuhiro Ono
Renichi Akahori
Hideto Nishimura
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Kanegafuchi Chemical Ind
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Abstract

A polyimide film having sufficiently excellent characteristics such as a sufficiently high elastic modulus, a low water absorption, a small coefficient of moisture-absorption expansion, a small coefficient of linear expansion and a nigh dimensional stability; and various electric/electronic equipment bases with the use of the polyimide film. A polyimide film having a tensile elastic modulus of 700 kg/mm<SP>2</SP> or less and a coefficient of moisture-absorption expansion of 20 ppm or less and containing a specific repeating unit as an essential repeating unit is synthesized. Then various electric/electronic equipment bases such as a laminate for flexible print connection boards are produced by using the polyimide film.

Description

五、發明說明Q) 具i ϊ:係關於—種新穎聚酿亞胺薄膜。特別係關於一種 水性、’,佳特性之新穎聚醯亞胺薄膜(夠高彈性模量,低吸 7 ;,’、小吸水膨脹係數,小線性膨脹係數及高形穩性-、車姓δ用作多種電鐵* /電子機器之基底膜例如軟性印刷 懸;ϊ:ίΐΐ: ·用於封裝半導體、磁性記錄膜、硬碟 哲r夕^ 4有機聚合物中通常以聚醯亞胺薄膜具有多種絕佳性 取疏.,、、性,低溫性質,耐化學品性,電氣特性等)。因此 1芬Ξ胺薄膜廣用於電氣/電子機器作為材料以及用於航 ,子通訊領域。特別近年來要求此等聚醯亞胺薄膜不 /、耐熱性同時也具有多種功能俾便滿足要求。 # t如希望聚醯亞胺薄膜用作軟性印刷連結板的基底膜, 二t有高彈性模量 '小吸水膨脹係數及小線性膨脹係 A 1-採用具有大吸水膨脹係數及大線性膨脹係數之聚酿 ,胺薄膜時’所得軟性印刷連結板捲曲或翹曲。特別具有 尚形穩性的板基底膜須用於軟性印刷連結板用於電漿顯示 器(PDP) ’原因為該基底臈預定用於比較其它用途更大面 積的用途。 至於用於前述電氣/電子機器的聚醯亞胺,曾經實際使 =經由苯均四酸二酐與4, 4,—二胺基二苯基醚之縮聚所得 聚酿亞胺’原因在於其耐熱性及電氣絕緣性質絕佳,因此 可用於待用於高溫設備。經由利用高形穩性,使用此種聚V. Description of the invention Q) With i ϊ: about a novel polyimide film. In particular, it is a novel polyimide film with good water properties (high enough elastic modulus, low absorption 7 ;, ', small coefficient of water expansion, small coefficient of linear expansion, and high dimensional stability-, car name δ Used as a base film for a variety of electric iron * / electronic devices such as flexible printing suspensions; ΐΐ: ΐΐ: · For packaging semiconductors, magnetic recording films, hard disks, etc. 4 Polyimide films are commonly used in organic polymers. A variety of excellent properties, such as low temperature properties, chemical resistance, electrical properties, etc.). Therefore, fenfluramine film is widely used in electrical / electronic equipment as materials and in aviation and sub-communications fields. Especially in recent years, these polyimide films have been required to be incompatible with heat resistance and have multiple functions. # If you want polyimide film to be used as a base film for flexible printed connection boards, it has a high elastic modulus, a small water expansion coefficient and a small linear expansion system A 1- Use a large water expansion coefficient and a large linear expansion coefficient In the polymerization, the amine film 'cured or warped when the resulting flexible printed web was curled. The substrate substrate film, which is particularly stable in shape, must be used for a flexible printed board for a plasma display (PDP) 'because the substrate is intended for a larger area than other applications. As for the polyfluorene imine used in the aforementioned electrical / electronic equipment, the polyimide obtained by polycondensation of pyromellitic dianhydride and 4, 4, diaminodiphenyl ether was actually used because of its heat resistance Excellent electrical and electrical insulation properties, so it can be used in high temperature equipment. By using high dimensional stability, this polymer is used

88119324.ptd 第5頁 450982 五、ϋ說明(2) ' ' -- 酿亞胺製成的薄膜也可用於軟性印刷連結板等。但近年來 需,用於IC、LSI等的基底膜具有進一步改良的加一工性及 較高準確性。因此作為基底膜材料的聚醯亞胺須具有較高 彈性模量、較低線性膨脹係數、較低吸水性等。^此多^_ 面嘗試滿足此等需求。例如據報告經由使用對伸苯基二胺 作為二胺成分升高彈性模量,藉此獲得由苯岣四酸二酐, 4’4’-二胺基二苯基醚及對伸苯基二胺組成的三成分弋聚 醯亞胺,揭示於JP-A-60〜21〇629,JP-A-64-16M2,/P-f 64-16833 ,JF-A-64-16834 ’JA-A-1-131241 及jp—A一卜 131242(「JP-A」一詞用於此處表示「日本專利公開 案」)。此外也嘗試添加3,3’,4,4,_聯苯四羧酸二酐至前 f三種成分,因而獲得具有進一步升高的彈性模量之四成 分式聚醯亞胺。例如JP-A-59-1 643 28及JP-A-6 1 - 1 1 1 359揭 不此種四成分式聚醯亞胺。進一步嘗試藉由於聚合步騾中 以控制的順序添加單體來改良四成分式聚醯亞胺之物理性 f ’報告由例如JP-A-5-25273。又報告使用具有類似對伸 苯基戴(苯偏三酸一酯酐)結構式之酸,報告於Jp_A_63_ 189490(日本專利公開案第7__88495號),Jp_n6〇182(日 本專利第 2,712,597 號),JP-A - 9-7787 1 ’JP-A-1 0-36506 及JP-A’54862 。 如前述對用於電氣/電子機器的聚醯亞胺薄膜加諸愈來 愈多的要求’因此多方面研究意圖滿足此等要求。但未曾 提不具有充分絕佳特性的聚醯亞胺薄膜(夠高彈性模量, 低吸水性,小吸水膨脹係數,小線性膨脹係數及高形穩88119324.ptd Page 5 450982 V. Description (2) ''-Films made from imine can also be used for flexible printed plywood, etc. However, in recent years, it has been required that the base film used for IC, LSI, etc. has further improved workability and higher accuracy. Therefore, polyimide as a base film material must have a high elastic modulus, a low linear expansion coefficient, and a low water absorption. ^ 这 多 ^ _ Try to meet these needs. For example, it has been reported that by using p-phenylenediamine as a diamine component, the modulus of elasticity is increased, thereby obtaining phenyltetracarboxylic acid dianhydride, 4'4'-diaminodiphenyl ether, and p-phenylene Three-component fluorene polyimide composed of amines, disclosed in JP-A-60 ~ 21〇629, JP-A-64-16M2, / Pf 64-16833, JF-A-64-16834 'JA-A-1 -131241 and jp-A 131242 (the term "JP-A" is used herein to mean "Japanese Patent Publication"). In addition, 3,3 ', 4,4, -biphenyltetracarboxylic dianhydride was also added to the first three components, thereby obtaining a four-component polyimide having a further increased elastic modulus. For example, JP-A-59-1 643 28 and JP-A-6 1-1 1 1 359 are not such four-component polyfluorene imines. Further attempts have been made to improve the physical properties of the four-component polyimide by adding monomers in a controlled order during the polymerization step. F 'Reported by, for example, JP-A-5-25273. It is also reported that an acid having a similar formula to p-phenylene (trimellitic acid monoester anhydride) is reported in Jp_A_63_189490 (Japanese Patent Publication No. 7__88495), Jp_n6〇182 (Japanese Patent No. 2,712,597), JP -A-9-7787 1 'JP-A-1 0-36506 and JP-A'54862. Increasing demands are being placed on polyimide films for electrical / electronic equipment as previously described ', and therefore various studies are intended to meet these requirements. However, polyimide films that do not have sufficiently excellent characteristics (high enough elastic modulus, low water absorption, small water expansion coefficient, small linear expansion coefficient, and high dimensional stability) have not been mentioned.

88119324.ptd 450982 五、發明說明(3) 性)。 發明概沭 此等情況下,本發明之目的係提供一種具有充分絕佳特 性之聚醯益胺薄膜(夠高彈性模量’低吸水性,小吸水膨 脹係數,小線性膨脹係數及高形穩性)。本發明之另一目 的係提供使用該聚醯亞胺薄膜之多種電氣/電子機器基 板0 為了達成前述目的’本發明提供一種聚醯亞胺薄膜,一 種軟性印刷連結板之層合物,一種黏合臈,磁性記錄基底 膜及硬碟懸吊連結基板,個別容後詳述。 (1) 一種聚醯亞胺薄膜具有抗拉彈性模量7〇〇千克/平方 亳米或以下及吸水膨脹係數2 〇ppm或以下。 (2) 如上(1)所述聚醯亞胺薄膜具有於10〇至2〇(rc之線性 膨脹係數為5至I5ppm。 (3) 如前(1)或(2)所述聚醯亞胺薄膜具有吸水性3_〇 %或 以下。 (4) 如上(3)所述聚醯亞胺薄膜具有吸水性2.0%或以下》 (5) 如上(1)至(4)中任一項所述聚醯亞胺薄膜,其含有 如下通式(1)表示之重覆單位於其分子:88119324.ptd 450982 V. Description of the invention (3)). Summary of the invention Under these circumstances, the object of the present invention is to provide a poly (trimethylamino) amine film with sufficiently excellent characteristics (high enough elastic modulus', low water absorption, small water expansion coefficient, small linear expansion coefficient, and high dimensional stability Sex). Another object of the present invention is to provide various electrical / electronic device substrates using the polyimide film. In order to achieve the foregoing object, the present invention provides a polyimide film, a laminate of a flexible printed connecting plate, and an adhesive Alas, the magnetic recording base film and the hard disk suspension connection substrate are described in detail later. (1) A polyimide film has a tensile elastic modulus of 700 kg / m 2 or less and a water absorption coefficient of 20 ppm or less. (2) The polyimide film described in (1) above has a linear expansion coefficient of 10 to 20 (rc is 5 to 15 ppm.) (3) The polyimide film according to (1) or (2) above The film has a water absorption of 3% or less. (4) The polyimide film described in (3) above has a water absorption of 2.0% or less. (5) As described in any one of (1) to (4) above. A polyimide film containing the repeating unit represented by the following general formula (1) in its molecule:

其中R1表示一個二價有機基選自:Where R1 represents a divalent organic group selected from:

88119324.ptd 第7頁 45098288119324.ptd Page 7 450982

88119324,ptd 第8頁 450982 五、發明說明(5) (其中Y及Z可相同或相異且各自表示一價取代基選自包括 氫原子,_原子,羧基,含6個或以下碳原子之低碳烷 基,及含6個或以下碳原子之低碳烷氧基;及A表示二價鍵 聯基選 0-,-S-,-C〇-,-S0-,及-CH9_) 〇 〇 人Λ N R3 N—R- Υ Υ 〇 〇 (6)如上(5)所述之聚醯亞胺薄膜其除了通式(1)表示之 重覆單位外,進一步含有如下通式(2)表示之重覆單位於 其分子: (2) 其中R定義如通式(1);及R3表示四價有機基選88119324, ptd page 8 450982 V. Description of the invention (5) (where Y and Z may be the same or different and each represents a monovalent substituent selected from the group consisting of hydrogen atom, _ atom, carboxyl group, and having 6 or less carbon atoms A lower alkyl group, and a lower alkoxy group having 6 or less carbon atoms; and A represents a divalent bonding group selected from 0-, -S-, -C0-, -S0-, and -CH9_). 〇human Λ N R3 N-R- Υ 〇 〇〇 (6) The polyimide film as described in (5) above, in addition to the repeating unit represented by the general formula (1), further contains the following general formula (2) The repeating unit represented in its molecule: (2) where R is defined as the general formula (1); and R3 represents a tetravalent organic radical

〇 II c-o〇 II c-o

»1〇C〇L»1〇C〇L

〒Η3 ο I u 0&quot;C〒Η3 ο I u 0 &quot; C

CH, -aCH, -a

:O~S02OC: O ~ S02OC

88119324.ptd 第9頁 45098288119324.ptd Page 9 450982

88119324.ptd 第10頁 五、發明說明(7) (其中R2疋義如通式(4);及R3定義如通式(2))。 所含 (9 )如上j 5 )或(6 )所述聚醯亞胺薄膜,其中其分子 主要重覆單位為如下通式(6)至(9)表示者:88119324.ptd Page 10 V. Description of the invention (7) (where R2 has the same meaning as the general formula (4); and R3 has the same definition as the general formula (2)). It contains (9) the polyimide film as described in j 5) or (6) above, wherein the main repeating unit of the molecule is represented by the following general formulae (6) to (9):

〇 η〇 η

(10)如上(9)所述聚醯亞胺薄膜其可滿足下述要求 (a + b)/s ’(a + c)/s,(b + d)/s 及(c + d)/s 各自落入0. 2 0. 75之範圍之要求,其中a,b,c及d分別表示如上至 (6)^(9)表示的重覆單位數目及s表示a + b + c + (i。 450982__ 五、發明說明(8) (11) 一種軟性印刷連結板用之層合物,其係經由於如上 (1)至(10)中任一項所述之聚醯亞胺薄膜的—面上开彡志一 層金屬層獲得。 心成 (1 2)如上(11)所述之軟性印刷連結板用之層合物,其中 該金屬層係透過熱固性黏合劑層合。 (1 3)如上(11)所述之軟性印刷連結板用之層合物,其中 該金屬層係透過熱塑性聚醯亞胺黏合劑層合。 (14) 如上(11)至(1 3)中任一項所述之軟性印刷連結板用 之層合物,其中聚醯亞胺薄膜之至少一面接受至少一種選 自加熱處理、電暈處理、電漿處理及偶合劑處理中之至少 f 一種處理。 (15) —種黏合薄膜係經由於如前述(1)至(10)中任一項 所述之聚醯亞胺薄膜的至少一面上形成一層黏合層獲得。 (1 6)如上(1 5 )所述黏合薄膜其中該黏合層包含一種熱固 性黏合劑。 (17) 如上(15)所述黏合薄膜其中該黏合層包含一種熱塑 性聚醯亞胺黏合劑。 (18) 如上(1)至(10)中任一項所述聚醯亞胺薄膜用作磁 性記錄的基底膜。 圖式之簡單說,明 ' 圖1為有關比較例1及實例22至28之三層層合物捲曲性質 評估試驗之略圖。 本圖中各數字代號顯示如下: 1 :銅箔(10) The polyfluorene imide film described in (9) above can satisfy the following requirements (a + b) / s' (a + c) / s, (b + d) / s and (c + d) / The requirements of s each falling within the range of 0.2 2 0.75, where a, b, c, and d respectively represent the number of repeating units as indicated by (6) ^ (9) above and s represents a + b + c + ( i. 450982__ V. Description of the invention (8) (11) A laminate for a flexible printed connection board, which is obtained by using the polyimide film described in any one of (1) to (10) above— The surface is obtained by opening a metal layer on the surface. Xincheng (1 2) The laminate for a flexible printed connecting board as described in (11) above, wherein the metal layer is laminated through a thermosetting adhesive. (1 3) as above (11) The laminate for a flexible printed connecting board, wherein the metal layer is laminated through a thermoplastic polyimide adhesive. (14) As described in any one of (11) to (13) above A laminate for a flexible printed connection board, wherein at least one side of the polyimide film is subjected to at least one treatment selected from the group consisting of heat treatment, corona treatment, plasma treatment, and coupling agent treatment. (15) — Adhesive film It is obtained by forming an adhesive layer on at least one side of the polyimide film according to any one of (1) to (10) above. (16) The adhesive film according to (1 5) above, wherein the adhesive layer comprises A thermosetting adhesive. (17) The adhesive film according to the above (15), wherein the adhesive layer comprises a thermoplastic polyimide adhesive. (18) The polyurethane according to any one of (1) to (10) above An amine film is used as a base film for magnetic recording. In brief, the figure is clear. Figure 1 is a schematic diagram of a curling property evaluation test for the three-layer laminate of Comparative Example 1 and Examples 22 to 28. Each number in the figure shows As follows: 1: Copper foil

88119324.ptd 第12頁 450982 五、發明說明(9) 2 :黏合劑 3 :薄膜。 圖2為有關測定比較例1及2及實例1至3 3之吸水膨脹係數 之試驗之略圖。 圖3為用以測定比較例1及2及實例1至3 3之吸水膨脹係數 之裝置。 本圖中各符號顯示如下: a :偵測 b :記錄器 c :(增益) d :水蒸氣出口 e :熱水出口 f :通入氮氣 g :樣本 h:水 i :水蒸氣 j :熱水入口(熱水槽) k :濕度感測器 1 :濕度轉換器 m :水蒸氣產生器 η :恆溫器(5 0 °C ) 〇:濕度控制單元 發明之詳細說明 根據本發明之聚醯亞胺薄膜具有抗拉彈性模量700千克/88119324.ptd Page 12 450982 V. Description of the invention (9) 2: Adhesive 3: Film. Fig. 2 is a schematic diagram of a test for measuring the coefficient of water expansion of Comparative Examples 1 and 2 and Examples 1 to 33. Fig. 3 is a device for measuring the coefficient of water expansion of Comparative Examples 1 and 2 and Examples 1 to 33. The symbols in this figure are shown as follows: a: detection b: recorder c: (gain) d: water vapor outlet e: hot water outlet f: nitrogen flow g: sample h: water i: water vapor j: hot water Inlet (hot water tank) k: Humidity sensor 1: Humidity converter m: Water vapor generator η: Thermostat (50 ° C) 〇: Detailed description of the invention of the humidity control unit Polyimide film according to the present invention With tensile elastic modulus of 700 kg /

88119324.ptd 第13頁88119324.ptd Page 13

4 5 Q 9 R P4 5 Q 9 R P

五、發明說明(10) 平方毫米或以下且通常為5 〇〇至7〇〇千克/平方毫米及吸 水膨脹係數20ppm或以下較佳i5ppm或以下。通常具有^ 1 0 0至2 0 0。(:之線性膨脹係數為5至1 5ppm及吸水3 . 0 %或以下 及較佳2.0%或以下。 前述本發明之聚醯亞胺薄膜係由一種聚醯亞胺製成,該 種聚醯亞胺通常於其分子含有如下通式(1)表示之重覆單 位。C :5. Description of the invention (10) Square millimeters or less and usually 5,000 to 700 kilograms / square millimeter and a water absorption coefficient of 20 ppm or less, preferably i5 ppm or less. Usually has ^ 1 0 0 to 2 0 0. (: The linear expansion coefficient is 5 to 15 ppm and the water absorption is 3.0% or less and preferably 2.0% or less. The aforementioned polyimide film of the present invention is made of a polyimide, which is a polyimide The imine usually contains a repeating unit represented by the following general formula (1) in its molecule. C:

(1) 其中R1表示一個二價有機基選自包括(1) wherein R1 represents a divalent organic group selected from the group consisting of

-ΟτΌτ-ΟτΌτ

,Br-,, Br-,

(其中R4表示CH3-,C1- F-或CH30_);及R表示如下(Where R4 represents CH3-, C1-F- or CH30_); and R represents as follows

88119324.ptd 第14頁 45 09 8 2 五、發明說明(11) 通式表示之二價有機基:88119324.ptd Page 14 45 09 8 2 V. Description of the invention (11) Divalent organic group represented by the general formula:

(其中η為1至3之整數;及X表示— 齒原子,幾基,含6個或以下碳^取代基選自氫原子’ 以下碳原子之低碳烷氧基),或之低碳烷基及含6個或 〜XU )x 5£ Js Js -r_ _(Where η is an integer from 1 to 3; and X represents-a tooth atom, several groups, a substituent having 6 or less carbon ^ substituents selected from a lower carbon alkoxy group having a hydrogen atom 'and lower carbon atoms), or a lower alkyl group Base and containing 6 or ~ XU) x 5 £ Js Js -r_ _

及Z可相同或相異且各自表示一價取代基選自氫原 •,齒原子,羧基,含6個或以下碳原子之低碳烷基,及 含6個或以下碳原子之低碳烷氧基;及a表示二價鍵聯基選 自、0-,—S-,-C0-,-S0-,-S02-及-CH2-)。 分子内含有通式(1)表示之重覆單位之聚醯亞胺薄膜除 了通式(1)重覆單位作為主要成分外,進一步含有另一種 士口下通式(2)表示之重覆單位: ϋ 人Λ W—R- ο ο 其中R定義如通式(l);及R3表示四價有機基選自包括:And Z may be the same or different and each represents a monovalent substituent selected from the group consisting of hydrogen, tooth atom, carboxyl group, lower alkyl group having 6 or less carbon atoms, and lower alkyl group having 6 or less carbon atoms Oxy; and a represents a divalent linking group selected from 0-, -S-, -C0-, -S0-, -S02-, and -CH2-). The polyimide film containing the repeating unit represented by the general formula (1) in the molecule contains a repeating unit represented by the following general formula (2) in addition to the repeating unit of the general formula (1) as a main component. : Ϋ human Λ W—R- ο ο where R is defined as the general formula (l); and R3 represents a tetravalent organic group selected from the group consisting of:

88119324,ptd 第15頁 450982 五、發明說明(12)88119324, ptd page 15 450982 V. Description of the invention (12)

)DOC.m ch3DOC.m ch3

ch3ch3

-t〇C-t〇C

^as〇2OC^ as〇2OC

^〇n〇:^ 〇n〇:

〇 II C—O — (CHsb〇 II C—O — (CHsb

-OC 根據本發明之聚醯亞胺薄膜&lt;經由脫水及環化聚醯胺酸 (亦即聚醯亞胺前驅物)溶液製造因而獲得醯亞胺及隨後加 工成為薄臈,或同時進行醯亞胺化及薄膜形成。特定言 之,聚醯胺酸溶液混合脫水劑、觸媒等及然後所得混合物 澆鑄或施用於擔體上例如循環帶上而形成薄膜。其次經由 於適當溫度烘烤轉成醯亞胺,如此所得薄膜由擔 而獲得聚醯亞胺薄膜。 用於聚醯亞胺薄膜製造作為前驅物的 由於大致等莫耳比於有機 :::液可經 成分獲得。此種方法中若有所需二:成分及二胺 為酸二酐成分及二或多種二胺作為二胺成1種酸二酐作 之聚驢胺酸溶液通常之獲得方係二。用於本發明 表示之芳㉟二酿。酐其係用# m 合如下通式(1。) 其係用作主要二酐成分,與如下通式-OC The polyimide film according to the present invention &lt; is manufactured by dehydration and cyclization of a polyimide acid (i.e., a polyimide precursor) solution, thereby obtaining the imine and subsequently processing it into a thin sheet, or simultaneously Imination and thin film formation. Specifically, the polyamic acid solution is mixed with a dehydrating agent, a catalyst, and the like, and then the resulting mixture is cast or applied to a support such as a circulating belt to form a thin film. Secondly, it is converted into fluorene imine by baking at an appropriate temperature, and the thus obtained film is obtained as a polyfluorene imine film. It is used in the manufacture of polyimide film as a precursor, because it is roughly equal in mole ratio to organic ::: liquid can be obtained through ingredients. In this method, if there are two required components, the poly-donkey amine solution made of the acid dianhydride component and two or more diamines as the diamine to form an acid dianhydride is usually obtained as the second component. The fragrant vinegar used in the present invention. Anhydride with #m is combined with the following general formula (1.) It is used as the main dianhydride component and has the following general formula

45 09 R 五,發明說明(13) (11)表示之二胺聚合獲得: 〇 11 (10) c II o45 09 R V. Description of invention (13) The polymerization of diamine represented by (11) is obtained: 〇 11 (10) c II o

、C ϊΙ Ο 其中R1定義如通式(1): h2n- R - nh2, C ϊΙ Ο where R1 is defined as the general formula (1): h2n- R-nh2

其中R定義如通式(1) D 一前ί聚合反應中,除了用作主要成分之如上通式(10)表 二二ί族一知一野外,也可添加二酐類(例如如下通式 U 表不之四羧酸二酐);Where R is defined as the general formula (1) D. In addition to the polymerization reaction, in addition to the general formula (10) as shown in Table 22 of the above formula (10), the dianhydride can also be added, such as the following formula U means tetracarboxylic dianhydride);

〇 II〇 II

〇 II X 0 C II 0 C II 0 (12} 其中R3定義如通式(2)。 示IS:: ’通式(1〇)表示之芳族二酯二酐及通式(12)表 酐可隨使用目的適當決定的比例使用。通常 箪^ 不之芳族二酯二酐占全體二酐成分用量為25% 忐比或以上,較佳35%莫耳比或以上及又更佳4〇%莫耳比 上,但較佳使用適量通式(12)表示之四羧酸二酐。當 〜.10)表示之方族一自旨二酐含量低於Μ%莫耳比時,所 得聚酿亞胺薄膜具有較高吸水性及較高吸水膨脹係數。 刚述I合可以任一種眾所周知的方法進行,例如〗p _ A _〇II X 0 C II 0 C II 0 (12) where R3 is defined as the general formula (2). Show IS: 'Aromatic diester dianhydride represented by the general formula (1〇) and epihydride of the general formula (12) It can be used in a proportion appropriately determined according to the purpose of use. Generally, the amount of aromatic diester dianhydride which accounts for the total amount of dianhydride is 25% or more, preferably 35% or more and more preferably 4%. % Molar ratio, but it is preferable to use an appropriate amount of tetracarboxylic dianhydride represented by the general formula (12). When the content of the square group one intentional dianhydride represented by ~ .10) is lower than the M% Molar ratio, the resulting polymer The imine film has higher water absorption and higher water absorption coefficient. The above-mentioned I-combination can be performed by any well-known method, for example, p_A_

450982 五、發明說明¢14) 5 9- 1 64328或JP-A-63-Η6287使用有機極性溶劑進行。聚 合步驟中’起始二酐成分及二胺成分可以任意順序&quot;3添加 反應系統。 4、 本發明中,反應巧藉多種方法進行如後。 分一種方法其中二胺及二酐初步混合,及然後混合物 成數份於擾拌下添加至溶劑溶液。 (b)—種方法其中溶劑與前述相反係於攪拌下添加至二 及一軒混合物。 醉(c) ~種方法其中二胺係排它地溶解於溶劑,及然後二 以許可控制反應速率的比例添加至其中。 後(^)厂種方法其中四羧酸二酐排它地溶解於溶劑,及然 〜胺以許可控制反應速率的比例添加至其中。 反 種方法其中一 Bk及.~~軒分.開溶解於溶劑及然後於 應器内緩慢混合溶液。 之〇)~種方法其中含過量二胺之聚醯胺酸及含過量二酐 $ 一種聚醯胺酸初步形成然後於反應器内彼此反應。 g) 一種方法其中部分二胺及二酐首先反應及然後反應 职!叙-… &amp; —恥’反之亦然。 4通式(1〇)表示之芳族二酯二酐及通式(12)表示之四羧 軒用作二酐成分時,特佳聚合反應之進行方式係首先450982 V. Description of the invention ¢ 14) 5 9- 1 64328 or JP-A-63-Η6287 is performed using an organic polar solvent. In the polymerization step, the 'initial dianhydride component and the diamine component can be added to the reaction system in any order &quot; 3. 4. In the present invention, the reaction is performed by various methods as follows. In a separate method, the diamine and the dianhydride are initially mixed, and then the mixture is added to the solvent solution with stirring. (b) A method in which the solvent is added to the di- and yixuan mixture under stirring as opposed to the foregoing. (C) ~ a method in which a diamine system is exclusively dissolved in a solvent, and then two are added thereto in a proportion allowing a controlled reaction rate. The latter method is one in which the tetracarboxylic dianhydride is exclusively dissolved in the solvent, and the amine is added thereto in a proportion allowing the reaction rate to be controlled. The other method is to use Bk and ~~ xuanfen. Dissolve in the solvent and then slowly mix the solution in the reactor. 〇) ~ A method in which polyamines containing excess diamine and polydianhydride containing excess dianhydride are initially formed and then react with each other in the reactor. g) A method in which part of the diamine and dianhydride are reacted first and then reacted!--&amp;-shame 'and vice versa. 4 When the aromatic diester dianhydride represented by the general formula (10) and the tetracarboxylic acid represented by the general formula (12) are used as the dianhydride component, a particularly preferred polymerization method is performed first.

應其中一種二酐與二胺成分獲得第一聚醯胺酸,及然後 反靡S ^另一種二酐與二胺成分獲得第二聚醯胺酸。 (〜前述聚合反應有用的有機極性溶劑範例包括亞礙溶劑 〜甲亞碼,二乙亞楓等),曱醯胺溶劑(N,N -二甲基曱酼 45 09 8 2 五、發明說明(15) N,N-二乙基甲醯胺等),乙醯胺溶劑(N,二甲基乙醯 胺 ,〆 —^ ^ iv, ^ U ㈡ 胺,N,N-二乙基乙醯胺等),β比咯啶酮溶劑(N—甲基-2-吡 咯啶酮,Ν-乙烯基-2-吡咯啶酮等),酚溶劑(酚、鄰_、間 -或對-甲酚,二甲酚,鹵化酚,兒茶酚等),六甲基磷醯 胺及r丁内酯。需要使用其t一種溶劑或其混合物。也可 使用此等溶劑與芳族烴類如二f苯及甲苯之組合。由處理 觀點看來,希望如此形成的聚醯胺酸係以5至重量比, 較佳10至30%重置比及又較娃12至?7¾舌θ 有機極性溶劑。 至27%重夏比之滚度溶解於 藉前述方法始於聚醯胺酸製造的聚醯亞胺 特性及平衡良好的物理性質。要求前述方臈,、有絕佳 具有平均分子量為10, 〇〇〇至丨,〇〇〇, 〇〇〇。卷得聚醯胺酸 均分子量低於1 0, 00 0時所得薄膜變脆性。&quot;醯胺酸之平 分子量超過1,〇〇〇,〇〇〇時,由於黏度過高,方面,當平均 漆之處理性質變差D 聚酿胺酸清 藉前述方法由聚醯胺酸製造之分子内含 - 之重覆單位之聚醯亞胺中,以分子含有如通式(1)表示 之重覆單位之聚醯亞胺薄膜為特佳: 通式(3)表示A first polyamic acid is obtained from one of the dianhydride and a diamine component, and then a second polyamine is obtained from the other dianhydride and a diamine component. (~ Examples of organic polar solvents useful in the foregoing polymerization reactions include arsenic solvents ~ methylidene, diethylene fluorene, etc.), amine solvents (N, N-dimethyl fluorene 45 09 8 2 5. Description of the invention ( 15) N, N-diethylformamide, etc.), acetamide solvent (N, dimethylacetamide, 〆— ^ ^ iv, ^ U ㈡amine, N, N-diethylacetamide) Etc.), β-pyrrolidone solvents (N-methyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, etc.), phenol solvents (phenol, o-, m- or p-cresol, Xylenol, halogenated phenol, catechol, etc.), hexamethylphosphoramidine and r-butyrolactone. It is necessary to use a solvent or a mixture thereof. Combinations of these solvents with aromatic hydrocarbons such as di-benzene and toluene can also be used. From a processing point of view, is it desirable that the polyamines thus formed are in a weight ratio of 5 to, preferably 10 to 30% reset ratio, and 12 to 1 in weight? 7¾ Tongue θ Organic polar solvent. The rolling degree to 27% by weight Charpy is dissolved in polyimide starting from polyamic acid by the aforementioned method. Characteristics and well-balanced physical properties. The foregoing formula is required to have excellent molecular weight with an average molecular weight of 10,000 to 10,000, 100,000. When the polyamic acid having a rolled average molecular weight of less than 10,000 is obtained, the resulting film becomes brittle. &quot; When the flat molecular weight of glutamic acid exceeds 1,000,000,000, because the viscosity is too high, on the one hand, when the processing properties of the average lacquer are deteriorated, D polyamino acid is manufactured from polyamino acid by the aforementioned method Among the polyfluorene imide in which the molecule contains-repeating units, it is particularly preferable that the polymer contains a polyimide film having the repeating unit represented by the general formula (1): The general formula (3) represents

(3) 藉前述方法由聚醯胺酸製造之分子内Λ W通式(U表示(3) Intramolecular Λ W formula (U represents

450982 五、發明說明(16) 之重覆單位之聚醯亞胺薄膜中,以分子内含有如下通式 (4)表示之重覆單位及如下通式(5)表示之另一重覆單位之 聚醯亞胺薄膜為特佳:450982 V. Polyimide film of the repeating unit of the description of the invention (16), the polymer containing the repeating unit represented by the following general formula (4) and another repeating unit represented by the following general formula (5) in the molecule醯 Imine film is particularly good:

(4) 其中R2表示二價有機基選自: 普 ο 〇 (5) λ3λ 2(4) wherein R2 represents a divalent organic group selected from the group consisting of: ο 〇 (5) λ3λ 2

W—R ο ο (其中R2定義如通式(4);及R3定義如通式(2))。 分子内含有如上通式(1)表示之重覆單位之聚醯亞胺薄 膜中,以含有如下通式(6)至(9)表示之重覆單位作為主要 重覆單位之聚醯亞胺薄膜為又更佳:W—R ο ο (where R2 is defined as the general formula (4); and R3 is defined as the general formula (2)). In the polyimide film containing the repeating unit represented by the above general formula (1) in the molecule, the polyimide film containing the repeating unit represented by the following general formulae (6) to (9) as the main repeating unit For even better:

88119324.ptd 第20頁 4 5 0 9 8 2 五'發明說明(17) Ο 〇88119324.ptd Page 20 4 5 0 9 8 2 Five 'invention description (17) 〇 〇

(6) (7)(6) (7)

:νη〇*·〇Ό^ (9) 前述聚醯亞胺薄膜可滿足要求,(a + b)/s,(b + d)/s及 (c + d)/s各自落入0.25至0.75之範圍,其中a,b,c及d分 別表示如上通式(6)至(9)表示的重覆單位數目及s表示 a+b+c+d 〇 根據本發明之聚醯亞胺薄膜之製造中也可添加抗氧化 劑、光安定劑、阻燃劑、抗靜電劑、熱安定劑、紫外光吸 收劑、無機填充劑或多種加強劑至用作前驅物的聚醯胺酸 溶液。 為了由聚醯胺酸溶液獲得本發明之聚醯亞胺薄膜,可使 用利用熱脫水之加熱方法或使用脫水劑的化學方法。但車交 佳使用化學方法,原因在於如此所得聚醯亞胺薄膜顯示有: νη〇 * · 〇Ό ^ (9) The foregoing polyfluorene imide film can meet the requirements, (a + b) / s, (b + d) / s and (c + d) / s each fall between 0.25 and 0.75 Ranges, where a, b, c, and d respectively represent the number of repeating units represented by the general formulae (6) to (9) above and s represents a + b + c + d. Antioxidants, light stabilizers, flame retardants, antistatic agents, heat stabilizers, ultraviolet light absorbers, inorganic fillers, or various reinforcing agents can also be added to the production of the polyamic acid solution used as a precursor. In order to obtain the polyimide film of the present invention from a polyamic acid solution, a heating method using thermal dehydration or a chemical method using a dehydrating agent can be used. However, Che Jiao used chemical methods because the polyimide film thus obtained showed

88119324.ptd 第21頁 450982 五、發明說明(18) ' — 利的機械性質例如伸長度及抗拉強度,它方面埶方 點為醯亞胺化反應可於短時間完成。也可合併埶亞=優 方法與化學醯亞胺化方法。 &quot;、ώ私化 現在詳細說明根據本發明之聚醯亞胺薄膜製法。 前述聚醯胺酸或其溶液中’添加化學計算量或以上' 水劑及觸媒。如此所得溶液隨後澆鑄或施用於轉鼓庙脫 帶上而形成膜。其次此膜於丨5 〇 t或以下溫度乾燥約\ f 分鐘,因而獲得自撐式聚醯胺酸膜。隨後此膜由擔體分 及然後固。定兩端。接著藉緩慢或逐步加熱至約丨〇〇至55^ (較佳450 °C或以上,更佳47〇。〇或以上,最佳5〇〇七或以 上)轉成醯亞胺。由薄膜劣化觀點看來,較佳最高加熱溫 度不超過600 °C。冷卻後取下膜獲得根據本發明之聚醯= 胺薄膜。作為前述脫水劑,可使用例如脂族酐(乙酐等)及 芳族酐。至於前述觸媒’可使用例如脂族第三胺類(三乙 基胺等),芳族第三胺類(二甲基苯胺等)及雜環第三胺類 等(咄啶,甲基吡啶,異喳啉等)。如此所得聚醯亞胺薄膜 厚度可隨使用目的等適當決定。通常厚度係由5至9〇微米 範圍。 較佳如此所得聚醯亞胺薄膜具有彈性模量為5〇{)千克/平 方毫来或以上但不超過7〇〇千克/平方毫米(含)故可適當用 作基底膜例如軟性印刷連結板的層合物。較佳聚醯亞胺薄 膜具有吸水膨脹係數為2〇ΡΡπι或以下,更佳18ppm或以下及 特佳16ppm或以下。也較佳聚醯亞胺薄膜具有於1〇〇至2〇〇 °C之線性膨脹係數為2〇ppn]或以下,更佳I5ppm或以下及最88119324.ptd Page 21 450982 V. Description of the invention (18) '— favorable mechanical properties, such as elongation and tensile strength, the aspect is that the imidization reaction can be completed in a short time. It is also possible to combine the fluorene method with the chemical fluoridation method. &quot;, Privatization Now, the method for producing a polyimide film according to the present invention will be described in detail. To the aforementioned polyamic acid or its solution, 'a stoichiometric amount or more' of a water agent and a catalyst is added. The solution thus obtained is subsequently cast or applied to a drum drum strip to form a film. Secondly, the film is dried at a temperature of 500 t or less for about \ f minutes, thus obtaining a self-supporting poly (amino acid) film. This membrane is then separated by the carrier and then solidified.定 both ends. It is then slowly or gradually heated to about 1500 to 55 ^ (preferably 450 ° C or more, more preferably 47.0 or more, and most preferably 507 or more) into amidine. From the viewpoint of film deterioration, the preferred maximum heating temperature does not exceed 600 ° C. After cooling, the film was removed to obtain a polyfluorene = amine film according to the present invention. Examples of the dehydrating agent include aliphatic anhydrides (such as acetic anhydride) and aromatic anhydrides. As for the aforementioned catalysts, for example, aliphatic third amines (triethylamine, etc.), aromatic third amines (dimethylaniline, etc.), and heterocyclic third amines (piperidine, methylpyridine, etc.) can be used. , Isooxoline, etc.). The thickness of the polyfluoreneimide film thus obtained can be appropriately determined depending on the purpose of use and the like. Usually the thickness ranges from 5 to 90 microns. It is preferred that the polyimide film thus obtained has an elastic modulus of 50 (kg) / m 2 or more but not more than 700 kg / m 2 (inclusive), so it can be suitably used as a base film such as a flexible printed connection board Of laminates. The preferred polyimide film has a water absorption coefficient of 20 ppm or less, more preferably 18 ppm or less, and particularly preferably 16 ppm or less. It is also preferred that the polyimide film has a linear expansion coefficient of 200 ppn at 100 to 200 ° C] or less, more preferably 15 ppm or less and most

88119324.ptd 第22頁 450982 五、發明說明(19) -------— 佳12卿或〇。it常線性膨服係 圍。較佳聚,胺薄臈具有吸水性為3肩或以下,更圭2 ?或以:,又^佳!.㈣或以下及特幻. = 電容率為3.50或以下,又更佳^ :萬赫頻f範園之相對 下。也較佳聚醯亞胺薄臈具有於,。〇至2()(^溫度^赫乂 之頻率|&amp;園或於常溫1千赫至i百萬赫之頻率範圍之相對電 容率為3. 30或以下。乾條件與吸水條件間之相對電容率差 異較佳低底0. 3或以下。此外較佳聚醯亞胺薄膜顯示主要 方向(MD)之吸水膨脹係數對横向(TD)之比為1/5至5, 1/3至3及特佳1/2至2。聚醯亞胺薄膜密度較佳為約l 44〇 至1.。480克/立方厘米。聚醯亞胺薄膜之玻璃化溫度較佳 200 t或以上’更佳24〇 °c或以上及特佳260 X:或以上。 f述,根據本發明之聚醯亞胺薄膜具有絕佳特性例如 夠尚彈性模量,低吸水性,小吸水膨脹係數,小線性膨脹 係數及高形穩性。因此可廣泛用於多種目的。其中可充分 用作軟性印刷連結板的黏合膜,或用於封裝半導體,磁性 記錄膜(軟碟’磁性記錄帶等),硬碟懸吊連結基板等。 現在將就根據本發明之聚醯亞胺薄膜用作敕性印刷連結 板層$物之基底膜之案例作說明。 通常’軟性印刷連結板(FPC)係藉下述方法製造,涉及 I歹j步驟.①使用黏合劑及乾燥;②層合鋼箔;③硬化黏 合劑;及④形成布局圖案(施用抗蝕劑’鋼蝕刻,分開抗 蝕劑)。圖樣形成步驟中,蝕刻處理期間常出現尺寸改 88119324.ptd88119324.ptd Page 22 450982 V. Description of the invention (19) ----------- Jia 12 Qing or 0. It is usually linearly expanded. Better poly, amine thin has a water absorption of 3 shoulders or less, more Gui 2? Or with :, and good! .㈣ or below and special fantasy. = Permittivity of 3.50 or below, and better ^: Relative frequency of 10Hz f range. It is also preferable to have polyimide thin sheet. 〇 to 2 () (^ temperature ^ hertz frequency | &amp; the relative permittivity of the frequency range of 1 kHz to i million Hz at room temperature is 3. 30 or less. The relative between dry conditions and water absorption conditions The permittivity difference is preferably low or 0.3 or lower. In addition, it is preferred that the polyimide film exhibit a ratio of water absorption expansion coefficient (MD) to transverse direction (TD) in the main direction (MD) of 1/5 to 5, 1/3 to 3 And particularly good 1/2 to 2. The density of the polyimide film is preferably about 440 to 1.480 g / cm3. The glass transition temperature of the polyimide film is preferably 200 t or more. 24 ° C or above and particularly good 260 X: or above. F. The polyimide film according to the present invention has excellent characteristics such as sufficient elastic modulus, low water absorption, small water expansion coefficient, and small linear expansion. Coefficient and high dimensional stability. Therefore it can be widely used for a variety of purposes. Among them, it can be fully used as an adhesive film for flexible printed connection boards, or used for packaging semiconductors, magnetic recording films (floppy disks, magnetic recording tapes, etc.), hard disk suspension Hanging the connection substrate, etc. The polyimide film according to the present invention will now be used as the base of the flexible printing connection plate layer. A case is explained. Generally, a 'flexible printed connection board (FPC) is manufactured by the following method and involves the steps of I 歹 j. ① using an adhesive and drying; ② laminating steel foil; ③ hardening the adhesive; and ④ forming a layout pattern (Application of resist 'steel etching, separate the resist.) In the pattern formation step, the size change often occurs during the etching process 88119324.ptd

第23頁 45 〇9 8 2Page 23 45 〇 9 8 2

變。因此電路圖案設計時須事先將隨後步驟的變化列入考 量。為了達成FPC本身的高形穩性,需要採用具有適當高 彈性模量’低吸水性、小線性膨脹係數及小吸水膨脹係數 的FPC基底材料。FPC之此等變化起因為:(a)由於吸水/脫 離吸附造成作為FPC絕緣材料的基底膜維度改變;(b)於銅 箱層合步驟出現鋼箔與基底膜之熱膨脹差異引起應變;及 (c)各步驟張力引起應變等。因素(b)引起的維度變化程度 若基底膜具有恆定線性膨脹係數則容易於設計步驟預期。 因素(c)引起的維度變化可藉控制各步驟發生的張力調 整。因此此種變化亦容易於設計步驟預期。但因素(a)引 發的維度變化幾乎無法控制,原因在於吸水性及乾燥係於 FPC製造過程重覆進行。 晚近報告一種製造多層連結板之方法。此種方法中,聚 醯亞胺薄膜首先使闬熱塑性聚醯亞胺黏合至銅箔,獲得具 有層疊結構的銅箔/聚醯亞胺薄膜,其中熱塑性聚醯亞胺 黏合層亦於底面上形成。其次於其上蝕刻銅連結圖樣,載 體由底部使用準分子雷射束鑽孔。其次載體之導電糊(藉 由加金屬粉末至熱塑性聚醯亞胺樹脂獲得)填注於孔内。 藉相同方法彼此堆疊製備預定數目之板。其次此等板使用 熱壓機藉熱熔方法一次層合獲得多層連結板。此種多層連’ 結板之製法中,難以適當控制作為絕緣層之聚醯亞胺薄膜 之形穩性。它方面,電漿顯示器(PDP)之FPC本身須具有較 高形穩性’原因在於其比較其它用途係使用更大面積。如 此迫切要求本發明之FPC基板可滿足此等嚴格要求。change. Therefore, the design of circuit patterns must take into account changes in subsequent steps in advance. In order to achieve the high dimensional stability of the FPC itself, it is necessary to use an FPC base material having a suitably high elastic modulus', low water absorption, small linear expansion coefficient, and small water expansion coefficient. These changes in FPC are caused by: (a) changes in the dimensions of the base film as the FPC insulating material due to water absorption / desorption; (b) strain caused by the difference in thermal expansion between the steel foil and the base film during the copper box lamination step; and ( c) The strain caused by the tension in each step. The degree of dimensional change caused by factor (b) If the base film has a constant linear expansion coefficient, it is easy to expect in the design step. The dimensional change caused by factor (c) can be adjusted by controlling the tension occurring in each step. Therefore, such changes are also easy to anticipate in the design steps. However, the dimensional change induced by factor (a) is almost uncontrollable because the water absorption and drying are repeated in the FPC manufacturing process. Recently, a method for manufacturing multilayer connection boards has been reported. In this method, a polyimide film is first bonded to a copper foil with a thermoplastic polyimide to obtain a copper foil / polyimide film having a laminated structure, in which a thermoplastic polyimide adhesive layer is also formed on the bottom surface. . Next, a copper connection pattern is etched, and the carrier is drilled from the bottom using an excimer laser beam. Secondly, the conductive paste of the carrier (obtained by adding metal powder to the thermoplastic polyimide resin) is filled in the holes. A predetermined number of plates were prepared by stacking each other by the same method. Secondly, these plates were laminated in one pass by a hot-melt method using a hot press to obtain a multi-layer connection plate. In such a method for manufacturing a multi-layered connection board, it is difficult to appropriately control the shape stability of the polyimide film as an insulating layer. On the other hand, the FPC of the plasma display (PDP) itself must have higher dimensional stability 'because it uses a larger area than other applications. It is thus urgently required that the FPC substrate of the present invention can meet these strict requirements.

88119324.ptd 第24頁88119324.ptd Page 24

五、發明說明(21) __ 1於具有前述絕佳特⑯,故本發明之聚醢 決前述FPC領域遭逢的問題,且可充分用作習 ^^ 晚近報告之多層連結板之基底膜。 層吓C或 當本發明之聚醯亞胺薄膜用作三層Fpc或多層蛛 基底膜時’特佳使用聚醯亞胺薄膜,I用除胺基外。之 代基之伸苯基二胺以及除胺基外不含取代基之二胺3取 基醚。使用前述伸苯基二胺可進一步提高彈性模量, 前述二胺基二苯基醚可進一步改良聚醯亞㉟於薄膜二 成步驟之模製性。此等伸苯基二胺中以對伸苯基二、= =。此等二胺基二苯基醚中以4, 4, _二胺基二苯基醚為特 佳三此外較佳使用聚醯亞胺薄膜其中伸苯基二胺及二胺美 二苯基醚之混合比為10至90%莫耳比及1〇至9〇%莫耳比,ς 佳20至8 0%莫耳比及20至8〇%莫耳比及更佳3〇至7〇%莫耳比 及30至70莫耳比。 、 ^以用作軟性印刷連結板之基底膜之聚醯亞胺薄膜為例, 該軟性印刷連結板將用於嚴格條件(高溫、高濕等)下,如 此薄膜之前述性質須更佳,本發明之聚醯亞胺薄膜中,特 佳=用共聚合聚醯亞胺薄膜,其中含有前述芳族二酯二酐 之,酿亞胺成分及兩種特定二胺成分(伸苯基二胺:二胺基 一苯基5至40%莫耳比:60至95%莫耳比)分子鍵結至另 二種含前述四羧酸二酐之聚醯亞胺成分及兩種特定二胺成 分(伸苯基二胺:二胺基二苯基醚;55至90%莫耳比;1〇至 45%莫耳比)。 由本發明之聚醯亞胺薄膜作為基底膜及其上形成的金屬V. Description of the invention (21) __ 1 has the aforementioned excellent features, so the invention of the present invention solves the problems encountered in the aforementioned FPC field, and can be fully used as the base film of the multilayer connection board reported recently. When the polyimide film of the present invention is used as a three-layer Fpc or a multi-layer spider base film, a polyimide film is particularly preferably used, except for the amine group. The substituted phenylene diamine and the diamine 3 which does not have a substituent other than the amine group are 3 ethers. The use of the aforementioned phenylenediamine can further improve the elastic modulus, and the aforementioned diamine diphenyl ether can further improve the moldability of polyfluorene in the film forming step. Among these phenylenediamines, p-phenylenediamine, ==. Among these diamine diphenyl ethers, 4, 4, _diamino diphenyl ether is particularly preferred. In addition, polyfluorene imine films are preferred. Among them, phenylenediamine and diamine mediphenyl ether. The mixing ratio is 10 to 90% Molar ratio and 10 to 90% Molar ratio, preferably 20 to 80% Molar ratio and 20 to 80% Molar ratio and more preferably 30 to 70%. Mole ratio and 30 to 70 Mole ratio. ^ Take polyimide film as the base film of flexible printed connecting plate as an example. The flexible printed connecting plate will be used under strict conditions (high temperature, high humidity, etc.), so the aforementioned properties of the film must be better. In the polyimide film of the invention, it is particularly good to use a copolymerized polyimide film, which contains the aforementioned aromatic diester dianhydride, an imine component, and two specific diamine components (phenylene diamine: Diamino monophenyl 5 to 40% mole ratio: 60 to 95% mole ratio) molecularly bonded to another two polyimide components containing the aforementioned tetracarboxylic dianhydride and two specific diamine components ( Phenyldiamine: diaminodiphenyl ether; 55 to 90% mole ratio; 10 to 45% mole ratio). The polyimide film of the present invention is used as a base film and a metal formed thereon

4 5 0982_ 五、發明說明&quot;(22) ' ------ 層組成的軟性印刷連結板層合物可經由選用眾所周知4 5 0982_ V. Description of the invention &quot; (22) '------ Flexible printed plywood laminate with layer composition can be selected through well-known

造軟性印刷連結板層合物之方法中之適當方法生 I 舉例說明一例。 。如此 通常此種層合物之製法係施用溶液型黏合劑於本 聚醯亞胺薄膜,或層合片狀黏合劑然後附著金屬箔 等)於其上,然後黏合金屬箔(銅箔等)於其上,及於= 溫度固化用以硬化黏合劑。本例中適當黏合劑可選'自 眾所周知的黏合劑,例如環氧樹脂黏合劑’聚醯胺樹f 合劑,酚系樹脂黏合劑,丙烯酸系樹脂黏合劑,聚醯亞胺 樹月旨黏合劑及橡膠樹脂黏合劑。可使用任一種黏合劑或其 中二種或多種之混合物。也可使用含有多種添加劑例如ς 化劑、抗氧化劑及紫外光吸收劑之黏合劑。使用溶液型黏 合劑時’聚醯亞胺薄膜被開縫獲得固定寬度,然後黏合劑 溶液使用桿塗機,「逗點」塗機等施用其上獲得丨至5〇&quot;微 米厚度’接著於5 0至20 0 °C氣氛乾燥1〇至600秒因而去除黏 合劑溶液中之有機溶劑。其次其上已經施用黏合劑之聚醢 亞胺薄膜於加熱至5 0至2 0 0。〇之條件下黏合至銅箔。如此 所得由黏合劑、聚醯亞胺薄膜及銅箔組成的三層層合物於 適當溫度加熱固化適當時間因而硬化用於黏合劑的樹脂。 使用片狀黏合劑時’薄片保護層被移開,黏合劑黏合至, 加熱至50至20 0 °C之聚醯亞胺薄膜。其次聚醯亞胺薄膜及 黏合劑薄片组成的二層層合物黏合至加熱至5〇至2〇〇 〇c之 鋼羯。如此所得由黏合劑、聚醯亞胺薄膜及銅箔組成的三 層層合物於夠高溫度加熱充分時間而硬化黏合劑採用的樹An example of a suitable method in the method of making a flexible printed plywood laminate is given below. . So usually the method of making such a laminate is to apply a solution-type adhesive to the polyimide film, or laminate a sheet-shaped adhesive and then attach a metal foil, etc., and then adhere a metal foil (copper foil, etc.) to On it, and cured at = temperature to harden the adhesive. The appropriate adhesive in this example can be selected from 'well-known adhesives, such as epoxy resin adhesive' polyamidine f-mixture, phenolic resin adhesive, acrylic resin adhesive, polyimide tree adhesive And rubber resin adhesive. Any one of the adhesives or a mixture of two or more of them may be used. Adhesives containing various additives such as hydrating agents, antioxidants, and ultraviolet light absorbers can also be used. When using a solution type adhesive, the 'polyimide film is slit to obtain a fixed width, and then the adhesive solution is applied thereon using a rod coating machine, a "comma" coating machine, etc. to obtain a thickness of 5 to "50 microns" followed by Dry at 50 to 200 ° C for 10 to 600 seconds to remove the organic solvent from the adhesive solution. Secondly, the polyimide film on which the adhesive has been applied is heated to 50 to 200. 〇 Adhesion to copper foil. The thus obtained three-layer laminate consisting of an adhesive, a polyimide film, and a copper foil is heated and cured at an appropriate temperature for an appropriate time, thereby hardening the resin used for the adhesive. When a sheet-shaped adhesive is used, the thin sheet protective layer is removed, the adhesive is adhered to, and the polyimide film is heated to 50 to 200 ° C. Secondly, a two-layer laminate composed of a polyimide film and an adhesive sheet was bonded to a steel reed heated to 50 to 2000c. The three-layer laminate composed of the adhesive, the polyimide film, and the copper foil thus obtained was heated at a high temperature for a sufficient time to harden the tree used for the adhesive.

4 5 0982 五、發明說明(23) 脂。經由使用此等方法’可得軟性印刷連結板用之三層層 合物。 前述層合物之黏合強度可採用升高黏合強度之多種眾所 周知的技術改良’舉例言之於施用黏合劑至聚醯亞胺薄膜 或層合黏合薄月於其上之步驟前’使聚醯亞胺薄膜接受前 處理(加熱處理’電暈處理’大氣壓下電漿處理,減壓下 電漿處理’偶合劑處理,喷砂,鹼處理,酸處理等)。為 了改良黏合強度’也可如美國專利4, 742, 099之揭示添加 多種金屬化合物(錫化合物、鈦化合物等)至聚醮胺酸,或 施用多種金屬化合物溶液至凝膠薄膜上。 則述用作聚醯亞胺薄膜前處理之加熱處理可使用例如介 於薄膜進給器與配送器間設置有一加熱供箱(電熱器等)之 加熱處理系統連續進行。若有所需較佳使用設置有多個加 熱烘箱之加熱處理系統等。也較佳最高加熱溫度控制為可 獲得加熱烘箱之最高大氣壓溫度為1〇〇至7〇〇。〇,又更佳 200至600。(:。經由調節最高加熱溫度於前述範圍,可獲得 一種機械強度、黏合性、形穩性等絕佳的聚醯亞胺薄膜^ 有關加熱處理時間,較佳聚醯亞胺薄膜暴露於最高加熱溫 二〜1’!。:秒’更佳2至800秒及特佳5至400秒。加熱處理 :定口二L逐步改變。❹加熱烘箱之加熱溫度可分別 600,4°0及20(rc,而聚醯亞胺薄膜暴 度歷200秒。另外,加熱焕箱之加熱溫度可 a 疋為5 0 0 C但改變各烘箱的加熱時間。 如述用作聚醯亞胺薄膜前處理的電暈處理可使用業界人4 5 0982 V. Description of the Invention (23) Fat. By using these methods', a three-layer laminate for a flexible printed connection board can be obtained. The adhesive strength of the aforementioned laminates can be improved using a variety of well-known techniques to increase the adhesive strength, 'for example, by applying an adhesive to a polyimide film or laminating an adhesive thin film before the step thereon'. The amine film is subjected to pretreatment (heat treatment 'corona treatment', plasma treatment at atmospheric pressure, plasma treatment under reduced pressure 'coupling agent treatment, sandblasting, alkali treatment, acid treatment, etc.). In order to improve the adhesion strength ', it is also possible to add various metal compounds (tin compounds, titanium compounds, etc.) to polyamic acid, or to apply various metal compound solutions to the gel film as disclosed in U.S. Patent No. 4,742,099. Then, the heat treatment used for the pretreatment of the polyimide film can be continuously performed using, for example, a heat treatment system provided with a heating supply box (electric heater, etc.) between the film feeder and the dispenser. If necessary, a heat treatment system provided with a plurality of heating ovens is preferably used. It is also preferable that the maximum heating temperature is controlled so that the highest atmospheric pressure temperature at which the heating oven can be obtained is from 100 to 700. 〇, and more preferably 200 to 600. (:. By adjusting the maximum heating temperature within the aforementioned range, a polyimide film with excellent mechanical strength, adhesion, and shape stability can be obtained. ^ Regarding the heat treatment time, it is preferred that the polyimide film be exposed to the highest heating. Temperature 2 ~ 1 '!.: Seconds' is more preferably 2 to 800 seconds and particularly good 5 to 400 seconds. Heat treatment: The fixed mouth 2 L is gradually changed. 加热 The heating temperature of the heating oven can be 600, 4 ° 0 and 20 ( rc, and the polyimide film lasts 200 seconds. In addition, the heating temperature of the heating box can be a 疋 5 0 C but the heating time of each oven is changed. As described in the pretreatment of polyimide film Corona treatment can be used by industry people

450982 五、發明說明(24) 士常用的電暈處理系統進行。根據下式求出之電暈處理密 度較佳為50至80 0瓦•分鐘/平方米。 電暈處理密度(瓦•分鐘/平方米) -電暈輸出(瓦)/{直線速度(米/分鐘)&gt;&lt;處理寬度(米)}。 別述用作聚酸亞胺薄膜之前處理的電漿處理可使用業界 人士常用的電漿處理系統進行。有兩種方法包括一種係於 減壓下電漿放電而另一種係於大氣壓下電漿放電。由作業 成本觀點看來以後者為佳。雖然於大氣壓下電漿放電並未 限於氣體類型或壓力或處理密度,但氣體壓力通常係控制 於至1,〇〇〇托耳之範圍◦用於形成電漿氣體之氣體範例 惰性氣體(氦,氬,氪,氤,氖,氡,氮等),氧氣, =氣一氧化碳,二氧化碳’四氣化碳,氯仿,氫氣,氨 四氟化礙,三氯氟乙烧及三氟甲烧。也可使用眾所周 知的含氟氣體或前述氣體混合物。較佳氣體組合包括氬/ —氬/氨,鼠/氦/氧,氬/二氧化碳,氬/氛/二氧化碳, /氦/氮,氬/氦/氮/二氧化碳,氬/氦,氬/氦/丙酮,氦 / ,氦/空氣,氬/氦/矽烷等。根據下式算出之電漿處 理密度較佳為1()〇至20,000瓦.分鐘/平方米及特佳3〇〇至 1()’ 〇〇〇瓦.分鐘/平方米。 電锻處理密度(瓦.分鐘/平方米) =電^浆輪出(瓦)Μ直線速度(米/分鐘)X處理寬度(米)丨。 方六、it作為聚醢亞胺薄膜前處理之使用偶合劑處理之進行 愚f例如可施用偶合劑溶液於薄膜表面,使用偶合劑溶液 立口薄膜表面,喷霧偶合劑溶液於薄膜表面上,浸潰薄膜450982 V. Description of the invention (24) Corona treatment system commonly used by scholars. The corona treatment density obtained from the following formula is preferably from 50 to 800 watts / minute / square meter. Corona treatment density (W • min / m2)-Corona output (W) / {linear speed (m / min) &gt; &lt; processing width (m)}. In addition, the plasma treatment used as a pre-treatment for the polyimide film can be performed using a plasma treatment system commonly used by those in the industry. There are two methods including one based on plasma discharge under reduced pressure and the other based on plasma discharge under atmospheric pressure. From the viewpoint of activity cost, the latter is better. Although plasma discharge at atmospheric pressure is not limited to gas type or pressure or processing density, the gas pressure is usually controlled to the range of 1,000 torr. The gas example used to form the plasma gas is an inert gas (helium, Argon, Krypton, Krypton, Neon, Krypton, Nitrogen, etc.), Oxygen, = Carbon monoxide, Carbon dioxide 'Tetragasified Carbon, Chloroform, Hydrogen, Ammonia tetrafluoride, Trichlorofluoroethane and Trifluoromethane. It is also possible to use a well-known fluorine-containing gas or a mixture of the foregoing gases. Preferred gas combinations include argon-argon / ammonia, rat / helium / oxygen, argon / carbon dioxide, argon / atmosphere / carbon dioxide, / helium / nitrogen, argon / helium / nitrogen / carbon dioxide, argon / helium, argon / helium / acetone , Helium /, helium / air, argon / helium / silane, etc. The plasma processing density calculated according to the following formula is preferably from 1 () 0 to 20,000 watt.min / m2 and particularly preferably from 300 to 1 () '000 watt.min / m2. Density of electro-forging treatment (W.min / m2) = Out of the electric wheel (W) M linear velocity (m / min) X processing width (m) 丨. Fifth, it is used as a pretreatment of the polyimide film to use a coupling agent. For example, a coupling agent solution can be applied to the film surface, the coupling agent solution can be used to stand up the film surface, and the coupling agent solution can be sprayed on the film surface. Impregnated film

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450982 五、發明說明(27) 藉下述辦法解決’於使用前述本發明之聚醯亞胺薄膜作為 基底膜製造FPC時’使用熱塑性聚醯亞胺作為黏合劑’及 進行前述前處理例如電暈處理,電漿處理,偶合劑處理 等。如此可製造具有進一步改良特性涉及黏合強度增強且 可用於苛刻條件(高溫等)之FPC。 用於前述具有進一步改良特性之FPC的熱塑性聚醯亞胺 黏合劑並無特殊限制。通常可使用如下通式(1 3 )及(1 4 )表 示之熱塑性聚醯亞胺。450982 V. Description of the invention (27) Solve the problem of 'using thermoplastic polyimide as an adhesive when manufacturing FPC using the aforementioned polyimide film of the present invention as a base film' and perform the aforementioned pretreatment such as corona Treatment, plasma treatment, coupling agent treatment, etc. This makes it possible to manufacture FPCs with further improved properties that involve increased adhesive strength and can be used in harsh conditions (high temperature, etc.). The thermoplastic polyimide adhesive used in the aforementioned FPC having further improved characteristics is not particularly limited. Generally, the thermoplastic polyfluorene imide represented by the following general formulae (1 3) and (1 4) can be used.

其中R5表示二價有機基選自包括: ch3 ch3 ch3 如士、—Srh2—、、 ch3 普普 &gt; cf3Where R5 represents a divalent organic group selected from the group consisting of: ch3 ch3 ch3 Ru Shi, —Srh2— ,, ch3 Pop &gt; cf3

88119324.ptd 第31頁 450982 五、發明說明(28) 及R6表示二價有機基選自包括:88119324.ptd Page 31 450982 V. Description of the invention (28) and R6 indicate that the divalent organic group is selected from the group consisting of:

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88119324,ptd 第34頁 4 δ 098 2 五、發明說明(31)88119324, ptd page 34 4 δ 098 2 V. Description of the invention (31)

此等熱塑性聚醯亞胺樹脂顯示於1 0 0至3 5 0 °c範圍之確切 玻璃化溫度,取決於組成而定。 藉由使用熱塑性聚醯亞胺黏合劑,作為基底膜的聚醯亞 胺薄媒通常可以-p . IT Λ 塑性聚醯亞胺之ί述方式黏合至金屬箱。當含有待轉成熱 聚醯胺酸之清漆用釀胺酸或含有部分醯亞胺化聚醯亞胺之 一形成薄層。然後作為黏合劑時,清漆施用至被黏合物之 ^ I如此黏合的被黏合物於大氣下加熱至約These thermoplastic polyimide resins show an exact glass transition temperature in the range of 100 to 350 ° C, depending on the composition. By using a thermoplastic polyimide adhesive, a polyimide thin film as a base film can usually be bonded to a metal box in the manner described in -p. IT Λ plastic polyimide. When the varnish containing the polyamidic acid to be converted into a thermal polyamic acid is used, a thin layer is formed with one of the amino acids or a partially polyimide-containing polyimide. When used as an adhesive, the varnish is applied to the adherend.

88119324.ptd 第35頁 4 5 0 9 8 2 五、發明說明(32) 10 0至3 0 0 °c經歷一段固定的時間因而去除過量溶劑且將聚 醯胺酸轉成具有較高安定性之聚醯亞胺。其次另一種被黏 合物置於其上且於100至400 °C於1至1,000千克/平方厘米 加壓黏合接著於100至400 °C固化。如此被黏合物彼此黏 合。當薄膜或粉末形式的熱塑性聚醯亞胺用作黏合劑時, 薄膜或粉末插入被黏合物内部,於1〇〇至400 °C於1至1,〇〇〇 千克/平方厘米下加壓黏合然後於1 〇〇至4 0 0 °c固化因而將 被黏合物彼此黏合。當熱塑性聚醯亞胺於有機溶劑之溶液 用作黏合劑時’此種黏合劑施用於被黏合物之一。然後被 黏合物加熱至約1 〇 〇至3 〇 〇 °c經歷一段固定時間而去除溶 劑。其次另一種被黏合构置於前述其上已經施用黏合劑的 被黏合物表面上且於100至400 °C於1至1,〇〇〇千克/平方厘 米下加壓黏合接著於100至400。(:固化。如此被黏合物彼此 黏合。於前述黏合方法中’聚醯亞胺層合物及金屬箔可經 由使用適當選自眾所周知的方法加壓黏合,例如使用熱親 之加熱層合法或熱壓法。加熱條件取決於使用的熱塑性聚 酿亞胺之玻璃化溫度。換言之較佳採用不低於玻璃化溫度 之加熱溫度,較佳比玻璃化溫度高達2〇〇c。處理壓力通常 為20至150千克/平方厘米。較佳使用具有玻璃化溫度為 100至350 °C又更佳150至300。(:之熱塑性聚醯亞胺。 其次詳細說明使用根據本發明之聚醯亞胺薄膜作為黏合 膜之基底膜。 晚近傾向於發展具有高性能、高功能及尺寸小的電子機 器,要求採用小且質輕的電子部件。如此也要求採用的半88119324.ptd Page 35 4 5 0 9 8 2 V. Description of the invention (32) 10 0 to 3 0 ° C After a fixed period of time, the excess solvent is removed and the polyamic acid is converted into a compound with higher stability. Polyimide. Next, another adherend was placed thereon and pressure-bonded at 100 to 400 ° C at 1 to 1,000 kg / cm2 and then cured at 100 to 400 ° C. In this way, the adhesives adhere to each other. When a thermoplastic polyimide in the form of a film or powder is used as an adhesive, the film or powder is inserted into the inside of the adherend and is pressure-bonded at 100 to 400 ° C at 1 to 1,000 kg / cm2. It then cures at 1000 to 400 ° C and will adhere to each other. When a solution of thermoplastic polyimide in an organic solvent is used as an adhesive ', this adhesive is applied to one of the adherends. It is then heated by the adhesive to about 1000 to 300 ° C for a fixed period of time to remove the solvent. Next, another adhered structure is placed on the surface of the adherend on which the adhesive has been applied and pressure-bonded at 100 to 400 ° C at 1 to 1,000 kg / cm2, followed by 100 to 400. (: Cured. In this way, the adhesives are bonded to each other. In the aforementioned bonding method, the 'polyimide laminate and the metal foil can be pressure-bonded by using a method appropriately selected from well-known methods, such as using a heat-friendly heating layer or heat Pressing method. The heating conditions depend on the glass transition temperature of the thermoplastic polyimide used. In other words, a heating temperature not lower than the glass transition temperature is preferred, and it is preferably as high as 200 c above the glass transition temperature. The processing pressure is usually 20 To 150 kg / cm2. It is preferable to use a thermoplastic polyimide having a glass transition temperature of 100 to 350 ° C and more preferably 150 to 300. (: a thermoplastic polyimide having a glass transition temperature. Next, the use of a polyimide film according to the present invention will be described in detail. Base film of adhesive film. Recently, it has tended to develop high-performance, high-function and small-sized electronic devices, which require the use of small and lightweight electronic components. This also requires the use of semi-

MS 88119324-ptd 第36頁 4 5 〇9 8 2 五、發明說明(33) 一 能及3 f Ϊ及布線材料及布線部件具有較高密度、高功 ^ 良’也。特別要求開發焊料耐熱性、形稗性及黏人 封裝材料(半導7二」 料,如此可適當用於高密度 模組)等^印刷車封^體,C〇L ’ L〇C封裝體,MCM(多晶片 ^ .τ&lt; I Ρ刷連、纟。板材料(多層FPC等)及航空材料。 二f夕方面嘗試改良焊料耐熱性。jp_A_6_ 聚ΓΓ:板用,,黏合薄膜係由具有-個聚梦氧單位之 經由以=,月曰及裱氧樹脂組成。JP~A-7_0 975 55提議—種 脂改良::ΐ混醇溶性聚醯胺樹脂與特定萘型環氧樹 二,,水溶液作表面處理的聚醯亞胺薄膜改良焊料二 性印刷遠έΓ/9496提議·&quot;種製造具有良好焊料耐熱性之軟 :=結板之方法,該方法係藉交流触刻捲起的鋼箱2 備。‘二黏合劑於其上,及然後層合塑膠絕緣膜於其上製 别述曾經提議多種獲得具有絕佳焊料耐熱性之 表式改性被黏合物表面(聚醯: 表面處理,銅泊之表面處理等)或藉將一個聚 :::引進聚醯亞胺主鏈來改良黏著性。,至目 夕MS 88119324-ptd Page 36 4 5 〇 9 8 2 V. Description of the invention (33)-Energy and 3 f Ϊ and wiring materials and wiring components have high density and high power. Special requirements for the development of solder heat resistance, formability, and sticky packaging materials (Semiconductor 7 2 ″ material, so that it can be appropriately used in high-density modules), etc. ^ Printing car seal body, COL 'L〇C package , MCM (multi-chip ^ .τ &lt; IP brush connection, 纟. Board material (multi-layer FPC, etc.) and aviation materials. Second, try to improve solder heat resistance. Jp_A_6_ poly ΓΓ: for the board, the adhesive film is made of -The composition of a polyoxymethylene unit is composed of =, month, and mounting oxygen resin. JP ~ A-7_0 975 55 proposal-Improved lipids: mixed with alcohol-soluble polyamine resin and specific naphthalene epoxy resin II, , Aqueous solution as surface treatment of polyimide film to improve solder amphoteric printing far Γ / 9496 proposal "A method to make soft solder with good solder heat resistance: = junction plate method, this method is rolled by AC contact engraving The steel box 2 is prepared. 'Two adhesives are laminated thereon, and then a plastic insulating film is laminated thereon. In addition, a variety of table-type modified adhered surfaces with excellent solder heat resistance have been proposed (polyurethane: surface treatment). , Copper surface treatment, etc.) Or borrow a poly ::: introduce polyimide master Chain to improve adhesion., To the end

ς =件顯示令人滿意的焊料耐熱性、形穩性 ;J 黏合膜、絕緣材料等β 邪考特性之 為了組成前述封裝半導體之黏合膜,顯示谍 ^醯:穩性及黏合特性之黏ί膜可經由使用根據本:: 定用根據本發明之聚醢亞胺薄膜作為基底膜之黏合臈可^ 一ς = satisfactory solder heat resistance and dimensional stability; J adhesive films, insulating materials, etc. β evil test characteristics In order to form the aforementioned adhesive film for packaged semiconductors, it shows spy ^ 醯: Stability and adhesion characteristics of adhesion ί The film can be used according to this :: Adhesion of the polyimide film according to the present invention as the base film can be used.

450982 五 '發明說明(34) ' ~ 當用於電子機器固定或絕緣電子部件、電子電路板等。特 別可適當用於軟性印刷連結板或半導體裝置之壓模墊黏 合’或用於需要高耐熱性之C〇L(引線上晶片)或匕〇以晶片 上引線)之封裝材料。 使用根據本發明之聚醯亞胺薄膜作為基底膜之本發明之 黏合膜可經由於作為基底臈之聚醯亞胺薄膜之一或二面上 ,成黏合層製造。具有覆蓋臈等(例如pET薄膜)之黏合膜 等也屬於本發明之黏合膜之範疇。由形穩性觀點看來,較 佳作為基底膜之聚醯亞胺膜具有高彈性模量,故可缓和由 於輥至輥模製步驟拉張造成彈性變 胺膜之彈性模量較佳為50。千克/平方毫米或以上心亞 5 5 0千克/平方毫米或以上及特佳6〇〇千克/平方毫米或以 士二也較佳聚醯亞胺薄膜具有低吸水性其可對焊料耐熱性 敍从有^ ί Ϊ,因而改良原先狀態及吸收水氣後之焊料耐 ;ρ杜S之,聚醯亞胺薄膜之吸水性較佳為3_ 0%或以 ,2為2·〇%或以下,又更佳為18%或以下及特佳為 醯亞L ^ Ί。此外由改良圖案密度及可靠度觀點看來,聚 故圭具有低吸水膨脹係數及低線性膨脹係數, 操牛酿、/成之加熱步驟及鋼包被層合物蚀刻、洗縣及乾 m之維度改變。較佳聚醜亞胺薄膜之吸水膨脹:Γ; 12ppm或以下,更祛〗nnnm +、 ΊΤ ^ ^ 取疏;m β ppm或u下及特佳8ppm或以下。較佳 聚醯亞胺薄膜之線性膨脹係^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 或以下及特佳12pprn或以下。為15聊戈以下,更佳14卿 為了形成根據本發明之黏合膜之黏合層,可使用適當選450982 Five 'Invention Note (34)' ~ When used to fix or insulate electronic parts, electronic circuit boards, etc. in electronic equipment. In particular, it can be suitably used for the bonding of die pads for flexible printed circuit boards or semiconductor devices, or for packaging materials that require high heat resistance such as COL (chip on lead) or dna (chip on lead). The adhesive film of the present invention using the polyimide film according to the present invention as a base film can be manufactured by forming an adhesive layer on one or both sides of the polyimide film as the base film. Adhesive films and the like having a covering film (such as a pET film) also belong to the category of adhesive films of the present invention. From the viewpoint of shape stability, the polyimide film which is preferably used as the base film has a high elastic modulus, so the elastic modulus of the elastic amine film which can be alleviated due to the roll-to-roll molding step stretching is preferably 50. . Kg / mm2 or more, 550 kg / mm2 or more, and particularly preferably 600 kg / mm2 or esteem. Polyimide film also has a low water absorption and can be used for solder heat resistance. Since ^ ί ί, the solder resistance after the original state is improved and the moisture is absorbed; ρDuS, the water absorption of the polyimide film is preferably 3-0% or more, 2 is 2.0% or less, Even more preferably, it is 18% or less and particularly preferred is 醯 Asian L ^ Ί. In addition, from the point of view of improved pattern density and reliability, Ju Guerui has a low coefficient of water expansion and a low coefficient of linear expansion, a heating step for cattle brewing, heating, and etching, laundering, and drying of ladle laminates. Dimensions change. Water swell of the preferred polyimide film: Γ; 12ppm or less, more specifically nnnm +, ΊΤ ^ ^ sparse; m β ppm or u and particularly preferably 8ppm or less. The linear expansion system of the preferred polyimide film is ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ or less and particularly preferably 12 pprn or less. 15 or less, more preferably 14 In order to form the adhesive layer of the adhesive film according to the present invention, an appropriate selection may be used.

4 5 09 8 2 五、發明說明(35) 自包括藉由使用本發明之聚醯亞胺薄膜製造軟性印刷連結 板之類似前述案例眾所廟知的黏合劑。有用的黏合劑範例 包括熱塑性聚酿亞胺黏合劑,及熱固性黏合劑例如環氧樹 脂及酚系樹脂。若有所需’聚醯亞胺薄膜可應用眾所周知 的改良黏合強度技術前處理(加熱處理,電暈處理,於大 氣壓下電漿處理,減壓下電漿處理,偶合劑處理等)。 此等加熱處理、電暈處理、於大氣壓下電漿處理、於減 壓下電漿處理及使用偶合劑處理可各自如前述經由使用本 發明之聚醯亞胺薄臈製造軟性印刷連結板層合物所述案例 般進行。也可合併二或多種前處理《較佳進行此等前處 理,原因為介於聚醯亞胺薄膜與黏合層間之交界面黏合強 度可藉此改良。 待用於形成黏合層之熱塑性聚醯亞胺黏合劑並無特殊限 制。通常使用如上通式(13)及(14)表示之熱塑性聚醢亞 胺。此種熱塑性聚醯亞胺製成的黏合層可以前述藉由使用 本發明之聚醯亞胺薄膜製造軟性印刷連結板層合物案例之 相同方式’形成於用作基底膜的聚醢亞胺薄膜上,彳曰本發 明非僅園限於此。換言之’熱塑性聚醯亞胺溶液或聚醯胺 酸(亦即其前驅物)溶液可洗铸於聚醯亞胺薄膜上或使用輕 塗機、桿塗機等施用於其上接著藉加熱乾燥,藉此形成黏 合層。另外呈薄膜或粉末形式之熱塑性聚醯亞胺使用 所謂之配備有加熱/加壓件及循環帶的所謂雙帶壓機加壓 黏合於聚醯亞胺膜上如此形成黏合層。 可用於形成黏合層之熱固性黏合劑之例 包括環氧樹脂4 5 09 8 2 V. Description of the invention (35) Self-contained adhesives similar to those previously described in the case of producing flexible printed connection boards by using the polyimide film of the present invention. Examples of useful adhesives include thermoplastic polyimide adhesives, and thermosetting adhesives such as epoxy resins and phenolic resins. If necessary, a polyimide film can be pre-treated by applying the well-known improved adhesive strength technology (heating treatment, corona treatment, plasma treatment at atmospheric pressure, plasma treatment under reduced pressure, coupling agent treatment, etc.). These heat treatment, corona treatment, plasma treatment at atmospheric pressure, plasma treatment under reduced pressure, and treatment with a coupling agent can each be laminated as described above through the use of the polyimide sheet of the present invention to produce a flexible printed plywood laminate. The case is described as the case. It is also possible to combine two or more pre-treatments (these pre-treatments are preferably performed because the adhesion strength at the interface between the polyimide film and the adhesive layer can be improved. There is no particular limitation on the thermoplastic polyamidine adhesive to be used for forming the adhesive layer. The thermoplastic polyfluorene imide represented by the general formulae (13) and (14) is usually used. Such an adhesive layer made of thermoplastic polyimide can be formed on a polyimide film used as a base film in the same manner as in the case of manufacturing a flexible printed plywood laminate by using the polyimide film of the present invention. In the foregoing, the invention is not limited to this. In other words, a thermoplastic polyimide solution or a polyamic acid (ie, its precursor) solution can be washed and cast on the polyimide film or applied on it using a light coater, a bar coater, etc., and then dried by heating. This forms an adhesive layer. In addition, the thermoplastic polyimide in the form of a film or a powder is press-bonded with a so-called double-belt press equipped with a heating / pressing member and an endless belt to form an adhesive layer on the polyimide film. Examples of thermosetting adhesives that can be used to form the adhesive layer include epoxy resins

五、發9月說明(36)_ 一 ----- :,脂、三聚氰胺樹脂、二甲苯樹脂及氰酸酯樹脂。其 人ί軋樹脂及酚系樹脂由於具有絕佳絕緣性故為較佳。黏 i Ϊ熱固性樹脂含量相對於每百/分重量比所謂之橡膠成 ’、即熱固性樹脂以外的樹脂成分係於5至4〇〇份重量比 j佳50至200份重量比之範圍。較佳使用含量為5份重量 ,以上之熱固性樹脂,原因為可防止高溫彈性模量下 峨可防止於半導體封裝儀器操作時半導體積體電路連結 形,如此可改良製程之處理性質。也較佳使用熱固性 二脂用量為400份重量比或以下,原因為如此可獲得具有 田彈性模里及充分線性膨脹係數的黏合層。本發明絕非 限於添加硬化劑、加速劑等至形成黏合層之熱固樹脂。 現在舉例說明使用前述熱固性黏合劑製造黏合薄膜之方 法。 、 (a) 黏合劑組合物於溶劑之溶液施用至離型聚酯膜等及 乾燥。乾燥較佳於1〇〇至200。(:進行!至5分鐘。溶劑之較佳 ,包括芳族溶劑(甲苯,二甲笨,氣苯等),酮類(異丁酮 及質子惰性極性溶劑(二f基甲醯胺,二甲基乙醯胺 等),但本發明非僅囿限於此。 (b) 如上(a)所述薄膜層合於用作為基底膜之聚醯亞胺薄 膘上*脫除離型聚酯膜後於1〇〇至2〇〇 進行固化歷1〇至2〇 小時獲得黏合膜。 ' 如則述’黏合膜係由作為基底膜之聚醯亞胺薄膜及黏合 層組成。其次說明各層之較佳厚度。較佳基底膜厚度係於 1 5至90微米之範圍。當基底膜厚度小於丨5微米時,聚醯亞V. September instructions (36) _ One -----:, grease, melamine resin, xylene resin and cyanate resin. Other resins and phenol resins are preferred because of their excellent insulation properties. The content of the thermosetting resin relative to the so-called rubber composition per 100 / minute weight ratio, that is, the resin components other than the thermosetting resin is in a range of 5 to 400 parts by weight and preferably 50 to 200 parts by weight. It is preferred to use a thermosetting resin with a content of 5 parts by weight or more, because the high temperature elastic modulus can be prevented. The semiconductor integrated circuit can be prevented from being connected during the operation of the semiconductor packaging instrument, which can improve the processing properties of the process. It is also preferable to use a thermosetting diester in an amount of 400 parts by weight or less because the adhesive layer having a field elastic mold and a sufficiently linear expansion coefficient can be obtained in this way. The present invention is by no means limited to thermosetting resins that add a hardener, an accelerator, and the like to form an adhesive layer. A method for producing an adhesive film using the aforementioned thermosetting adhesive will now be described by way of example. (A) A solution of the adhesive composition in a solvent is applied to a release polyester film or the like and dried. Drying is preferably from 100 to 200. (: Proceed! To 5 minutes. Preferable solvents include aromatic solvents (toluene, dimethylbenzyl, benzene, etc.), ketones (isobutyl ketone and aprotic polar solvents (dimethylformamide, dimethylformamide) (E.g., ethylacetamide, etc.), but the present invention is not limited to this. (B) The film as described in (a) above is laminated on a polyimide film used as a base film. * After the release polyester film is removed The adhesive film is cured from 100 to 2000 for 10 to 20 hours to obtain an adhesive film. 'As stated then' The adhesive film is composed of a polyimide film and an adhesive layer as a base film. Secondly, it is explained that each layer is better. Thickness. The preferred thickness of the base film is in the range of 15 to 90 microns. When the thickness of the base film is less than 5 microns, Polyurethane

88tl9324.ptd 第40頁 450982 五、發明說明(37) 胺黏合膜其為具有機械性質彼此大為差異的多層之層合 物,經常有衝壓步驟期間閃火形成的缺點。常^衝壓&amp; 敗,母壓模與公壓模間之開口被衝壓廢料填滿因而無法 縯進仃衝壓。此種情況下出現另一種黏合對正錯誤問題。 它方面當基底膜厚度超過9〇微米時,衝壓步驟需要高壓, 結果導致薄膜變形或裂開。較佳黏合層厚度其通常由熱固 黏合劑或熱塑性聚醯亞胺黏合劑製成係於2至微米之 圍:當黏合層厚度低於2微米時,無法建立充分黏合力如 此損害可靠度。它方面當黏合層厚度超過3〇微米時經 衝壓步驟形成閃火。雖然形成閃火的機制至目前為止未明 但預期如後:t基底膜於黏合層之前完全被切割時,黏合 層於切割下變成細&amp; ’如此黏合層的伸長部轉成閃火。: 了防止閃火形&amp; ’較佳基底層加厚而不使衝壓之切削性&amp; 劣化’同時黏合層變薄而不使黏合可靠度劣化。特定言、 之,二佳基底膜厚度係占總厚度之3〇至9〇%。如此詳細。 明:據本發明之黏合膜。經由黏合鋼箱於本發明之黏合 二或:面形成的•包被層合物具有烊料时熱性為3。膜 率m上。,如此對封裝半導體產生有利結果(品質及欵 其ΐ 2:使用本發明之聚醯亞胺薄膜作為磁性記錄膜之 基底膜如後。 ^贤之 具有薄金屬膜形成於基底膜表面上之薄片已經用於夕 技術領域。例如於磁性記錄領域,己 磁二種 於聚合物膜表面製成的磁性層來獲尸::施2用鐵磁材料 丨!木獲侍磁性記錄膜(軟碟、88tl9324.ptd Page 40 450982 V. Description of the invention (37) The amine adhesive film is a multilayered layer having greatly different mechanical properties from each other, and often has the disadvantage of flash formation during the stamping step. Often stamping &amp; failure, the opening between the mother stamper and the male stamper is filled with stamping waste material and cannot be evolved. In this case, another kind of misalignment error occurs. On the other hand, when the thickness of the base film exceeds 90 micrometers, the pressing step requires high pressure, which results in deformation or cracking of the film. The preferred adhesive layer thickness is usually made of thermosetting adhesive or thermoplastic polyimide adhesive in the range of 2 to micrometers: when the thickness of the adhesive layer is less than 2 micrometers, a sufficient adhesive force cannot be established, which can damage reliability. On the other hand, when the thickness of the adhesive layer exceeds 30 micrometers, a flash fire is formed after the stamping step. Although the mechanism of flash formation is unknown until now, it is expected to be as follows: When the base film is completely cut before the adhesive layer, the adhesive layer becomes fine under cutting and the extended portion of the adhesive layer turns into a flash flame. : To prevent the flash shape &amp; ‘The preferred base layer is thickened without degrading the machinability &amp; of the stamping’ and the adhesive layer is thinned without deteriorating the adhesion reliability. In particular, the thickness of Erjia's base film accounts for 30 to 90% of the total thickness. So detailed. Ming: The adhesive film according to the present invention. The coating layer formed on the bonding surface or surface of the present invention via a bonded steel box has a thermal property of 3 when the coating layer is formed. Film rate m. This will produce favorable results for packaged semiconductors (quality and quality) 2: The base film using the polyimide film of the present invention as a magnetic recording film is as follows. ^ Xianzhi has a thin metal film formed on the surface of the base film It has been used in the technical field. For example, in the field of magnetic recording, two kinds of magnetic layers made of polymer films have been used to obtain corpses :: 2 ferromagnetic materials for application 2!!

450982 五、發明說明(38) 磁性記錄帶等)。此項磁性記錄領域令曾對金屬應用類型 或蒸氣沈積類型之磁性記錄媒體作研究,與習知氧化物應 用類型有別,晚近傾向於高密度記錄。此外曾經開發垂^ 磁性記錄系統之磁性5己錄媒體,其係超過習知於平面磁性 記錄系統限制。又磁性記錄媒體的製法大為改變。例如習 知方法其中磁性金屬粉混合黏合劑並施用所得混合物已經 被新穎的薄膜堆疊法取代,例如蒸氣沈積、濺散或離子鍍 敷如用於形成合金如鈷-鎳或钻—鉻。此等薄膜堆叠方法 中,系統由於蒸發來源的輻射熱以及形成磁性層膜於基底 膜之步驟時沈積粒子放出的動能故遭遇顯著高溫。為了如 同鈷-鉻薄膜之例賦與夠大矯頑磁力,某些情況下偶爾需 要升高基底膜溫度至1 0 0它或以上或丨6 〇 或以上。如此金 屬箔之基底膜於薄膜堆疊法較佳具有顯著高耐熱性。 錄:ίϋ Ϊ如聚伸乙基對酞酸酯薄膜常用作習知磁性記 =S、#认=&amp;膜。由於聚酯膜具有低耐熱性,故須降低罐 =於报二i ΐ,且充分黏合基底膜至罐俾便輔助於沈積方 乙美針触於層步驟之熱排放。即使進行此等方法,聚伸 (寡聚對:等 部分熱傷害或形㈣ 酯難以用於形成i霡t產生小凸起。&amp;外聚伸乙基對酞酸 瞵間加熱亦如2於超過16〇。〇加熱史的磁性層’即使 它方面’聚醯亞脸^ ^ 胺膜於聚合物材料φ 、及聚醯胺膜已知為耐熱膜。聚醯亞 250。(:。習知聚酿、具有極高对熱性’因此可連續用於 A 亞胺薄膜涉及下列成分製成的薄膜:笨均450982 V. Description of the invention (38) Magnetic recording tape, etc.). This field of magnetic recording has led to the study of magnetic recording media of metal application type or vapor deposition type, which is different from the conventional oxide application type and has recently tended to high density recording. In addition, magnetic 5H recording media that have developed magnetic recording systems have exceeded the limits of conventional magnetic recording systems. The manufacturing method of magnetic recording media has changed greatly. For example, conventional methods in which magnetic metal powder is mixed with a binder and the resulting mixture has been replaced by novel thin film stacking methods such as vapor deposition, sputtering or ion plating such as used to form alloys such as cobalt-nickel or diamond-chromium. In these thin film stacking methods, the system encounters a significant high temperature due to the radiant heat from the evaporation source and the kinetic energy emitted by the deposited particles during the step of forming the magnetic layer film on the base film. In order to impart a sufficiently large coercive force as in the case of the cobalt-chromium thin film, it is occasionally necessary to raise the temperature of the base film to 100 or more or 6 or more. The base film of such a metal foil preferably has significantly high heat resistance in a thin film stacking method. Record: ϋ Ϊ such as polyethylene terephthalate film is often used as a conventional magnetic film = S, #cognite = &amp; film. Because the polyester film has low heat resistance, it is necessary to reduce the temperature of the tank. It is necessary to fully adhere the base film to the tank to assist the deposition process. Even if these methods are performed, the poly (isomeric pair: equal part of the thermal damage or the shape of the ester is difficult to use to form i 霡 t to produce small bumps. &Amp; exo-polyethylene terephthalate is also heated as in 2 A magnetic layer with a history of more than 16.0 ° 'even though it's a polyamine ^ ^ amine film on the polymer material φ, and polyamine film is known as a heat-resistant film. Polyamide 250. (:. Known polymer brewing 、 It has extremely high heat resistance, so it can be used continuously in A imine film. Films made of the following components:

450982 五、發明說明(39) 四酸二酐(後文簡寫為PMDA)與二胺基二苯基醚(後文簡寫 為0DA)之聚合物,聯苯四羧酸二酐(後文簡寫為BPDA)與 0M之聚合物,及BPDA與對伸苯基二胺(後文簡寫為p-PDA) 之聚合物。但三類型聚醯亞胺薄膜之耐熱性或機械性質不 足,亦即顯示過高線性膨脹係數(於20至300 °C為30ppm或 以上)或過低線性膨脹係數(於20至300 〇C為4ppm或以上)。 由此等習知聚醯亞胺薄臈或聚醯胺薄膜組成的磁性記錄媒 體具有藉沈積或減散方法形成於表面上之合金膜經常有嚴 重捲曲問題。 前述磁性記錄媒體的捲曲原因似乎為:(a)磁性層應力; (b)基底膜層與磁性層之線性膨脹係數差異以及由於基底 膜層之熱收縮造成熱應力;以及(c)於磁性層形成期間外 加至基底膜之機械應力。於磁性記錄媒體之例,兑 性層形成期間,基底膜溫度須顯著升高,原、因在ς磁性 性2同鈷-鉻膜之例,特別基底膜層與磁性、 構成捲曲的一大因素。但未曾發現任何線可= 除捲曲的手段。習知聚醯亞胺薄效免 3 0 0千吞/巫士含, ^ 巧仇顶坪性模量約 “ 方毫米,其係與磁性記錄媒體的剛硬有 方鉍聚醯胺薄膜之模量為約!,〇〇〇至約】2〇〇 ^有關,而 =。,言之此等薄膜比較聚伸乙基 J平方毫 L如此無法顯示充分抗拉彈性模量。因::過軟或過 :體之行進性質…常有捲繞不規c 擾。 只條觸故障等困 使用根據本發明之聚醯亞胺薄膜作為磁性記錄犋之基底450982 V. Description of the invention (39) Polymer of tetraacid dianhydride (hereinafter abbreviated as PMDA) and diamine diphenyl ether (hereinafter abbreviated as 0DA), biphenyltetracarboxylic dianhydride (hereinafter abbreviated as Polymers of BPDA) and 0M, and polymers of BPDA and p-phenylenediamine (hereinafter abbreviated as p-PDA). But the three types of polyimide films have insufficient heat resistance or mechanical properties, that is, they show an excessively high linear expansion coefficient (30 ppm or above at 20 to 300 ° C) or an excessively low linear expansion coefficient (at 20 to 300 ° C). 4ppm or more). Such conventional magnetic recording media composed of polyimide thin film or polyimide thin film often have severe curling problems in alloy films formed on the surface by a deposition or dispersion method. The curling cause of the aforementioned magnetic recording medium seems to be: (a) the stress of the magnetic layer; (b) the difference in the linear expansion coefficient of the base film layer and the magnetic layer, and the thermal stress caused by the thermal contraction of the base film layer; and (c) the magnetic layer Mechanical stress applied to the base film during formation. In the case of magnetic recording media, the temperature of the base film must be significantly increased during the formation of the flexible layer. The reason is that in the case of magnetic properties 2 the same as the cobalt-chromium film, especially the base film layer and magnetic, a major factor that constitutes curl . But no thread was found to be a means other than curl. The conventional polyimide thin effect is free from 300 kw / witch, ^ Qiao Qiu The top modulus is about "square millimeter, which is about the same as that of the rigid square bismuth polyfluorene film of the magnetic recording medium! , 〇〇〇 至 约】 200 %, and =., In other words, these films compared with polyethylene J square milliliter, so can not show a sufficient tensile elastic modulus. Because :: too soft or too: body Traveling properties ... Irregular winding disturbances often occur. Only the contact failure can be used. The polyimide film according to the present invention is used as a substrate for magnetic recording.

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五、發明說明(40) 臈可解決前述習知磁上甘k 2 題。通當要电ϋ 性記錄膜遭遇的問 通要求作為磁性記錄膜之性質如下:U)正當诶&amp; β 未於捲縝躇庳忐宿由士 丨·土*捲繞而 右雜- &gt; 4 X次厚度方面於表面形成任何不規則;(b)且 有夠回抗拉彈性模量(5〇〇至8〇〇 )八 性絕佳;及(rn认、田* * 凡丁乃宅木)’ Cc)耐熱 換t之且濕度改變情況下具有高形穩性, 熱收縮比,小的線性膨脹係數,小的吸水 且不含膜内各向異性。經由使用根據本發明之聚 -胺薄膜作為基底膜,可獲得滿足前述要求性f 14 i 記錄膜且不具有捲曲問題。 川生質之磁性 棍:= 生Λ錄膜之基底膜之聚醯亞胺薄膜較佳具有彈性 模里為500千克/平方毫米或以上(較佳55〇千克/平方亳 或以上),於20至300。(:之線性膨脹係數平均為】至 ’、 2*0ppm(較佳1至l6ppm),主要方向(MD)對橫向(td)之線性 膨脹係數比為1/5至5(較佳1/3至3及又更佳1/2至2),於 30%相對濕度至80%相對濕度範圍之吸水膨脹係數平均值為 2至20ppm較佳1至15ppm及更佳1至10叩111),藉常溫至3〇〇它 加熱隨後維持於同溫2小時測得之常溫薄膜熱收縮比為_工. 0%至不超過1.0%,厚度為5〇微米或以下,即使於厚度縮小 至2至1 5微米後仍可維持此等性質。 現在參照下列實例說明本發明之較佳具體例。但須瞭解 本發明非僅限於此等實例。業界人士可未悖離本發明之範 圍作出多種變化、變更及修改。 下列縮寫用於實例及比較例。 PDMD :笨均四酸二酐。V. Description of the invention (40) 臈 can solve the above-mentioned conventional magnetic problem k 2. The properties of the magnetic recording film that Tong Dang encounters with electrical recording films are as follows: U) The proper properties of the magnetic recording film are as follows: U) legitimate 诶 &amp; β is not wound in the coil 缜 躇 庳 忐 土 土 * soil and right mixed-&gt; 4 X-thickness formation of any irregularities on the surface; (b) with sufficient tensile elastic modulus (500 to 800); excellent properties; and (rn recognized, Tian * * Fan Ding Nai Zhai Wood) 'Cc) It has high dimensional stability under the condition of heat resistance change and humidity change, heat shrinkage ratio, small linear expansion coefficient, small water absorption and does not contain anisotropy in the film. By using the poly-amine film according to the present invention as a base film, a f 14 i recording film that satisfies the aforementioned requirements can be obtained without the curl problem. Sichuan Biomass magnetic stick: = Polyimide film of the base film of raw Λ film, preferably with an elastic mold of 500 kg / mm2 or more (preferably 550 kg / mm2 or more), at 20 To 300. (: The average linear expansion coefficient is] to ', 2 * 0ppm (preferably 1 to 16ppm), and the linear expansion coefficient ratio in the main direction (MD) to the transverse direction (td) is 1/5 to 5 (preferably 1/3) To 3 and even better 1/2 to 2), the average value of the water absorption coefficient in the range of 30% relative humidity to 80% relative humidity is 2 to 20ppm, preferably 1 to 15ppm and more preferably 1 to 10 叩 111). From room temperature to 300, it is heated and then maintained at the same temperature for 2 hours. The measured heat shrinkage ratio of the film at room temperature is _ work. 0% to not more than 1.0%, the thickness is 50 microns or less, even when the thickness is reduced to 2 to 1 These properties are maintained after 5 microns. Preferred specific examples of the present invention will now be described with reference to the following examples. However, it should be understood that the present invention is not limited to these examples. Those skilled in the art can make various changes, changes and modifications without departing from the scope of the present invention. The following abbreviations are used in the examples and comparative examples. PDMD: stupid melamine.

88119324.ptd 第44頁 45098288119324.ptd Page 44 450982

五、發明說明(41) TMHQ 對伸苯基浓(笨偏三酸一酯軒) QDA 4, 4’ -二胺基二笨基醚。 p-PDA 對伸苯基二胺。 DMF 一甲基曱酿胺。 DMAc 二甲基乙醯胺。 AA 乙酐。 IQ 比較例1 異嗜琳。 DMF引進分開燒瓶内及加入1當量〇DA。所得混合物於室 溫徹底攪拌至0DA完全熔解為止。其次〇,85當量粉狀ρΜΜ 緩幔加入其中接著攪拌40分鐘。然後〇. 1 5當量PMDA溶解於 DMF溶液缓慢加入其中及所得混合物於冷卻下揽拌1小時獲 得聚醯胺酸於DMF之溶液。DMF用量為可獲得二胺及芳族四 羧酸二酐單體之進給濃度為1 8%重量比。 其次聚醯胺酸溶液混合AA及IQ並倒至玻璃板上。於約 1 0 0 °C乾燥約5分鐘後’由玻璃板上撕離聚醯胺酸薄膜。然 後薄膜固定至支架上及經由於約1 〇 〇 °c加熱約5分鐘,約 3 0 〇。(:加熱約3 0秒’於約4 0 0 °C加熱約3 0秒及於約5 1 0 °C加 熱約30秒脫水及環化,如此獲得厚約1 〇微米的聚醯亞胺薄V. Explanation of the invention (41) TMHQ p-phenylene concentrated (benzyltrimonate) QDA 4, 4'-diamine dibenzyl ether. p-PDA p-phenylenediamine. DMF Monomethylamine. DMAc dimethylacetamide. AA acetic anhydride. IQ Comparative Example 1 Heterophilin. DMF was introduced into a separate flask and 1 equivalent of ODA was added. The resulting mixture was stirred thoroughly at room temperature until the 0DA was completely melted. Next, 0,85 equivalents of powdered pMM slow mantle was added thereto and stirred for 40 minutes. Then, 1.5 equivalents of PMDA was dissolved in DMF solution and slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMF. The amount of DMF used is 18% by weight to obtain the feed concentration of the diamine and aromatic tetracarboxylic dianhydride monomer. Next, the polyamic acid solution was mixed with AA and IQ and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyamine film was peeled off from the glass plate. The film was then fixed to the stand and heated for about 5 minutes at about 1000 ° C, about 300 ° C. (: Heating for about 30 seconds' heating at about 400 ° C for about 30 seconds and heating at about 5 10 ° C for about 30 seconds for dehydration and cyclization, thus obtaining a polyimide film having a thickness of about 10 microns

實例1 成分A : DMAc引進分離瓶内及於其中加入2當量ODA及3當量p-PDA 。所得混合物於室溫徹底攪拌至OPA及p-PDA完全溶解為Example 1 Ingredient A: DMAc was introduced into a separation bottle and 2 equivalents of ODA and 3 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until OPA and p-PDA were completely dissolved into

88119324.ptd 第45頁 五、發明說明(42) 止°其次緩慢加入4· 25當量粉狀TMHQ接著攪拌40分鐘。然 後缓慢加入〇. 75當量TMHQ溶解於MAc之溶液及所得混合物 於冷卻下攪拌1小時獲得聚醯胺酸於DM Ac之溶液。DM Ac之 用量可獲得二胺及芳族四羧酸二酐單體之進給濃度為18% 重量比。 成分B : DMF引進分離瓶内及於其中加入3當量ODA及1當量 p_PDA °所得混合物於室溫徹底攪拌至ODA及p-PDA完全溶 解為止。其次緩慢加入3. 4當量粉狀pMDA接著攪拌4〇分 鐘。然後0. 6當量PMDA溶解於DMF之溶液緩慢加入其中及所 得混合物於冷卻下攪拌1小時獲得聚醯胺酸於DMF之溶液。’ DMF之用量可獲得二胺及芳族四羧酸二酐單體進給濃度為 18%重量比。 其次’成分A及β以1 : 1之重量比混合及攪拌。聚醮胺酸 溶液混合ΑΑ及1Q及倒至玻璃板上。於約1 0 0 °C乾燥約5分鐘 後’由玻ί离板上撕離聚醯胺酸薄膜。然後薄膜固定於支架 及經由循序於約1 〇 0。〇加熱約5分鐘,於約3 〇 〇 〇c加熱約3 〇 秒,於約4〇〇°c加熱約30秒及約510 °c加熱約30秒脫水及環 化,因而獲得厚約i 〇微米之聚醯亞胺薄膜。 、 實例2 DMAc引進分離瓶内及於其中加入4當量ODA及2當量 p-PDA。所得混合物於室溫徹底攪拌至〇DA及p_pDA完全溶 解為止。其次緩慢加入6當量TMHQ於其中接著攪拌4〇分 鐘。加入1當量0DA及3當量p_PDA,混合物攪拌4〇分鐘。其88119324.ptd Page 45 V. Description of the invention (42) Stop ° Secondly, slowly add 4.25 equivalents of powdered TMHQ and stir for 40 minutes. Then, a solution of 0.75 equivalent of TMHQ dissolved in MAc and the resulting mixture were slowly added under stirring for 1 hour to obtain a solution of polyamic acid in DM Ac. The amount of DM Ac can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. Ingredient B: DMF was introduced into the separation bottle and 3 equivalents of ODA and 1 equivalent of p_PDA ° were added to the mixture. The mixture was thoroughly stirred at room temperature until ODA and p-PDA were completely dissolved. Next, 3.4 equivalents of powdery pMDA was slowly added and stirred for 40 minutes. Then, a solution of 0.6 equivalent of PMDA in DMF was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMF. The amount of DMF can be used to obtain a diamine and an aromatic tetracarboxylic dianhydride monomer feed concentration of 18% by weight. Next, the components A and β are mixed and stirred at a weight ratio of 1: 1. The polyamic acid solution was mixed with AA and 1Q and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyamic acid film was peeled off from the glass plate. The film was then fixed to the stent and passed sequentially at about 1000. 〇Heating for about 5 minutes, heating at about 3000c for about 30 seconds, heating at about 400 ° c for about 30 seconds, and about 510 ° c for about 30 seconds for dehydration and cyclization, thereby obtaining a thickness of about i. Micron polyimide film. Example 2 DMAc was introduced into a separation bottle and 4 equivalents of ODA and 2 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until the oDA and p_pDA were completely dissolved. Next, 6 equivalents of TMHQ were slowly added thereto, followed by stirring for 40 minutes. 1 equivalent of 0DA and 3 equivalents of p_PDA were added, and the mixture was stirred for 40 minutes. its

88119324.ptd 第46頁 450982 五、發明說明(43) 次加入3. 5當量PMDA及混合物攪拌40分鐘。然後0. 5當量 PMDA溶解於DMAc之溶液緩慢加入其中,所得混合物冷;搜 拌1小時獲得聚醯胺酸於DM Ac之溶液。 DMAc之用量可獲得二胺及芳族四羧酸二酐單體之進给濃 度為18%重量比。 其次,聚醯胺酸溶液混合AA及I Q並倒至玻璃板上。於約 1 0 0 °C乾燥約5分鐘後,由玻璃板上撕離聚醯胺酸薄膜。然 後此膜固定至支架及經由循序於約1 〇 〇 °C加熱約5分鐘,於 約3 G 0 °C加熱約3 0秒,於約4 0 0 °C加熱約3 0秒及於約51 〇 X: 加熱約3 0秒脱水及環化因而獲得厚約1 〇微米之聚醯亞胺薄 膜。 實例3 DM Ac引進分離瓶内及於其中加入4. 5當量0D A及5. 5當量 p-PDA。所得混合物於室溫徹底攪拌至0DA及p-PDA完全溶 解為止。其次加入5當量PMDA於其中接著攪拌40分鐘。然 後加入4. 5當量TMHQ及混合物攪拌40分鐘。然後〇. 5當量 TMHQ溶解於DMAc之溶液緩慢加入其中,所得混合物冷卻攪 拌1小時獲得聚醢胺酸於DMAc之溶液。DMAc之用量可獲得 二胺及芳族四羧酸二酐單體之進給濃度為18%重量比。 其次,聚醯胺酸溶液混合AA及IQ並倒至玻璃板上。於約 100 °C乾燥約5分鐘後,由玻璃板上撕離聚醯胺酸薄膜。然 後此膜固定至支架及經由循序於約1 〇 〇 °C加熱約5分鐘,於 約3 0 0 °C加熱約3 0秒’於约4 0 0 °C加熱約3 0秒及於約5 1 0 °C 加熱約3 0秒脫水及環化因而獲得厚約1 0微米之聚醯亞胺薄88119324.ptd Page 46 450982 V. Description of the invention (43) Add 3.5 equivalents of PMDA and stir the mixture for 40 minutes. Then 0.5 equivalent of a solution in which PMDA was dissolved in DMAc was slowly added, and the resulting mixture was cooled; it was stirred for 1 hour to obtain a solution of polyamic acid in DM Ac. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. Next, the polyamic acid solution was mixed with AA and I Q and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyamic acid film was peeled off from the glass plate. The film is then fixed to the stent and heated sequentially at about 100 ° C for about 5 minutes, at about 3 G 0 ° C for about 30 seconds, at about 400 ° C for about 30 seconds, and at about 51 seconds. OX: Dehydration and cyclization by heating for about 30 seconds to obtain a polyimide film having a thickness of about 10 microns. Example 3 DM Ac was introduced into a separation flask and 4.5 equivalents of 0D A and 5.5 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until 0DA and p-PDA were completely dissolved. Next, 5 equivalents of PMDA was added thereto, followed by stirring for 40 minutes. Then 4.5 equivalents of TMHQ was added and the mixture was stirred for 40 minutes. Then, a 0.5 equivalent solution of TMHQ dissolved in DMAc was slowly added thereto, and the resulting mixture was cooled and stirred for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomer of 18% by weight. Next, the polyamic acid solution was mixed with AA and IQ and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyamic acid film was peeled from the glass plate. The film was then fixed to the stent and heated sequentially at about 1000 ° C for about 5 minutes, at about 300 ° C for about 30 seconds', at about 400 ° C for about 30 seconds, and at about 5 ° C. Heat at 10 ° C for about 30 seconds to dehydrate and cyclize to obtain a thin polyimide with a thickness of about 10 microns.

88119324,ptd 第47頁 450982 五、發明說明(44) 膜。 實例4 DMAc引進分離瓶内及於其中加入5當量0DA及5當量 ρ-PDA。所得混合物於室溫徹底攪拌至〇da及p-PDA完全溶 解為止。其次加入5當量TMHQ於其中接著撥拌40分鐘。然 後加入4. 5當量PMDA及混合物攪拌40分鐘。然後0. 5當量 PMDA溶解於))MAc之溶解緩慢加入其中,所得混合物冷卻攪 拌1小時獲得聚醯胺酸於DMAc之溶液。 DMAc之用量可獲得二胺及芳族四羧酸二酐單體之進給濃 度為18%重量比。88119324, ptd page 47 450982 V. Description of the invention (44) Membrane. Example 4 DMAc was introduced into a separation bottle and 5 equivalents of 0DA and 5 equivalents of p-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until oda and p-PDA were completely dissolved. Next add 5 equivalents of TMHQ and stir for 40 minutes. Then 4.5 equivalents of PMDA was added and the mixture was stirred for 40 minutes. Then 0.5 equivalent of PMDA was dissolved in)) MAc was slowly added thereto, and the resulting mixture was cooled and stirred for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight.

其次’聚醯胺酸溶液混合AA及I Q及倒至玻璃板上。於約 100 °C乾燥約5分鐘後,由玻璃板上撕離聚醢胺酸薄臈。然 後此膜固定至支架及經由循序於約1 〇 〇艺加熱約5分鐘,於 約300 °C加熱約30秒,於約400 °C加熱約30秒及於約51〇°C 加熱約3 0秒脫水及環化因而獲得厚約1 〇微米之聚醯亞胺薄 膜。 量測比較例1及實例1至4所得薄膜之線性膨脹係數、吸 水膨脹係數、彈性模量、吸水性及相對電容率。表1摘述 其結果。 A1Next, the polyamine solution was mixed with AA and IQ and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyacetic acid thin sheet was peeled off from the glass plate. The film was then fixed to the support and heated sequentially at about 100 ° C for about 5 minutes, at about 300 ° C for about 30 seconds, at about 400 ° C for about 30 seconds, and at about 51 ° C for about 30 seconds. Dehydration and cyclization in seconds resulted in a polyimide film having a thickness of about 10 microns. The linear expansion coefficient, water expansion coefficient, elastic modulus, water absorption and relative permittivity of the films obtained in Comparative Example 1 and Examples 1 to 4 were measured. Table 1 summarizes the results. A1

彈性模量 (千克/平方毫米) 比較例1 300 實例1 550 實例2 680 實例3 630 實例4 600 線性膨脹係數 32 9 8 9 9 88119324.ptd 第48頁 450982 (ppm) 吸水膨脹係數 (ppm) 21 8 4 5 5 吸水性(%) 3 1. 5 0. 9 1. 4 1.2 相對電容率 溫度/頻率 -5 0 °C /1 千赫 3. 50 3.08 3.10 3.09 3.10 -0 °C / 1千赫 3.46 3.18 3.20 3.19 3.18 22 °C/i千赫 3. 48 3. 24 3. 22 3.23 3.23 1 0 0 °C /1 千赫 3. 01 3.11 3.10 3.12 3.11 2 0 (TC / 1 千赫 3. 00 3. 16 3. 17 3. 19 3.15 2 2 〇C /1 0 0 赫 3.51 3. 28 3.25 3.30 3/2 5 22 °C/10 千赫 3. 46 3. 20 3.17 3.20 3.21 22 °C/100千千赫 3. 43 3. 15 3. 14 3. 14 3. 15 2 2 °C /1百萬赫 3.40 3.10 3.10 3.11 3. 10 線性膨脹係數表示使用理學電氣公司製造的TMA-8 140於 2 0至3 0 0 °C於氮氣氣流下量測得之線性膨脹係數。 吸水膨脹係數係經由使用如下量測裝置(2 )藉如下計算 方法(1)測定。 (1 )水分伸長率之計算方法: 當如圖2所示改變水分時,同時量測樣本長度增益及水 分變化,如此算出水分伸長率(量測溫度:5 0 °C )。 水分伸長率=Modulus of Elasticity (kg / mm2) Comparative Example 1 300 Example 1 550 Example 2 680 Example 3 630 Example 4 600 Linear expansion coefficient 32 9 8 9 9 88119324.ptd Page 48 450982 (ppm) Water expansion coefficient (ppm) 21 8 4 5 5 Water absorption (%) 3 1. 5 0. 9 1. 4 1.2 Relative permittivity temperature / frequency-5 0 ° C / 1 kHz 3.50 3.08 3.10 3.09 3.10 -0 ° C / 1 kHz 3.46 3.18 3.20 3.19 3.18 22 ° C / i KHz 3. 48 3. 24 3. 22 3.23 3.23 1 0 0 ° C / 1 KHz 3. 01 3.11 3.10 3.12 3.11 2 0 (TC / 1 KHz 3. 00 3. 16 3. 17 3. 19 3.15 2 2 0C / 1 0 0 Hz 3.51 3. 28 3.25 3.30 3/2 5 22 ° C / 10 kHz 3. 46 3. 20 3.17 3.20 3.21 22 ° C / 100 KHz 3. 43 3. 15 3. 14 3. 14 3. 15 2 2 ° C / 1 megahertz 3.40 3.10 3.10 3.11 3. 10 The linear expansion coefficient is represented by TMA-8 140 manufactured by Rigaku Corporation. The linear expansion coefficient measured under a nitrogen gas flow at 0 to 3 0 0 ° C. The water absorption expansion coefficient is measured by using the following measuring device (2) by the following calculation method (1). (1) Calculation method of water elongation : When as shown in Figure 2 When changing the water, while the length of the sample measured gain and moisture changes, thus calculated moisture elongation (measured temperature: 5 0 ° C) water elongation =

88119324.ptd 第49頁 450982 五、發明說明(46) {吸水長度增益(d)/{樣本長度+ c)} /水分變化(b)。 b: 35%相對濕度(低濕度端), 75%相對濕度(高濕度端)。 c :固定樣本後隨著溫度由室溫升高至量測溫度之熱膨脹 (2)量測裝置: ① 量測溫度係藉熱水槽控溫器控制。 ② 為了升高恒溫器濕度,將氮氣通入水蒸氣產生槽’藉 由使用加熱包升高溫度程式規劃濕度條件。位在恆溫器間 之入口部溫度經控制以防露水形成。 ③ 濕度感測器之溫度係調節為恆溫器溫度的相同準位β 溫控單元係設置於恆溫器外側之感測器本體。 ④ 長度(增益)係使用丸善公司製造的1^八(1^(:_14〇)測 量。 抗拉彈性模量係根據ASTM-D882測量。 吸水性係根據下式測定,其中W1表示於150 °C乾燥30分 鐘後測得薄膜樣本重量,及W2表示浸沒於蒸餾水24小時然 後拭除其表面水滴測得之樣本重量。 吸水性(%):=(W2_W1)/W1 χ1〇〇。 相對電容率係於如下條件下測量。 樣本壤厚度係藉容積比重方法計算。 電極類型:根據JIS-K6911。 測试環境:22 ±2 〇C,60 ±5%相對濕度。 頻率:1〇〇赫,1千赫,1〇千赫,1〇0千赫,1百萬赫。88119324.ptd Page 49 450982 V. Description of the invention (46) {water absorption length gain (d) / {sample length + c)} / moisture change (b). b: 35% relative humidity (low humidity end), 75% relative humidity (high humidity end). c: Thermal expansion after the sample is fixed as the temperature rises from room temperature to the measurement temperature. (2) Measurement device: ① The measurement temperature is controlled by the thermostat of the hot water tank. ② In order to increase the humidity of the thermostat, the nitrogen gas is passed into the water vapor generating tank ’, and the humidity conditions are planned by using a heating bag to raise the temperature program. The temperature of the inlet between the thermostats is controlled to prevent dew formation. ③ The temperature of the humidity sensor is adjusted to the same level as the temperature of the thermostat. The β temperature control unit is a sensor body provided outside the thermostat. ④ The length (gain) is measured using 1 ^ 8 (1 ^ (: _ 14〇) manufactured by Maruzen. The tensile elastic modulus is measured according to ASTM-D882. The water absorption is measured according to the following formula, where W1 is expressed at 150 ° The film sample weight was measured after 30 minutes of drying, and W2 is the weight of the sample measured by immersing in distilled water for 24 hours and then wiping off the water droplets on the surface. Water absorption (%): = (W2_W1) / W1 χ100. Relative permittivity The measurement is performed under the following conditions. The thickness of the sample soil is calculated by the volume specific gravity method. Electrode type: According to JIS-K6911. Test environment: 22 ± 2 ° C, 60 ± 5% relative humidity. Frequency: 100 Hz, 1 KHz, 10 KHz, 100 KHz, 1 MHz.

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Material wearing F M D Α Λ Tibetan containing &gt; Batch + Zhici Jin Da S # Card 1 ,? — Ο 浼 Qi Qin 300》 ττϊ30 test * All the private Gods are 3 ° next to each other, the lod contains λ and the piano is shot p 拍 W Jing. Peak base series &amp; Lv Feng: * Γ I 飒 气 Θ You Zagong 'Broken M Tai Shou Zhong Chou Han MD ^ s ^ r $ ί ^ φύ β ΛΑ ^ Η ϋ Μ ^ &gt; As ο tcrο, ΐ 片 身 私 + ^: Jue Gang Tan resigned from Bu Yi ^ β ^ r β ^ ^ $ ^ τ φ —Γ. Respect 1 Ο Ο d Wuza 5 Jin Mi Qi &quot; Including 1th. 彦 诛 S Toe silk Bu Zhufan. Λ $ I 也 also 部 部 m 森森 麻 麦 ^^ 策 S 3 ΦΡ DMF5I 麻 今 s 砵 砵 gt gt gt &gt; N narrative life deduction ODA ^ ^ Ί p $ p tr 1 Steaming-Kernel O this age. β β β t yr M, 4 ^ ^ ^ ^ λ ^ 0β ^ β o s ^ β o d s s O D A. ^ -Gong resigned to give the ginseng w approval and o. 卬 卬 spider _ f cable ΡΜΙ &gt; Α δ 麦 Ο. 一 卬 妹 : *: IP Μ r &gt; Α 释 $ 琴 7 f ^ sf ^ β t, M, J -0Ψ β ^ p ^ β ^ l !! ^ r $ β 450982 V. Description of the invention (52) Steel circulation belt. After drying at 100 ° C for 5 minutes, the self-supporting front film thus formed was peeled off from the tape. The front film was continuously fed into the inside of the oven by clamping the two ends, and heated in the oven at 300 for 30 seconds, at 400 ° C for 30 seconds, and at 510 ° C for 30 seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber, it is torn off from the needle. Then measure various characteristics of the film, and call the film flow direction the MD direction and the transverse direction the TD direction. Example 13 DMAc was introduced into a separation bottle and 1 equivalent of ODA and 3 equivalents of p-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until ODA and p-PDA were completely dissolved. Next, 3.95 equivalents of powdered PMDA was slowly added followed by stirring for 40 minutes. 4 equivalents of ODA and 2 equivalents of p-PDA were added, and the mixture was stirred for 40 minutes. Next, 6 equivalents of powdered TMHQ were slowly added thereto and the mixture was stirred for 1 hour. Then, a 0.05 equivalent solution of TMHQ in DMAc was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DM Ac can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. Next, the polyamic acid thus obtained was mixed with A A and IQ and then cast on a stainless steel endless belt. After drying at 100 ° C for 5 minutes, the self-supporting front film thus formed was peeled off from the tape. The front film is continuously fed into the inside of the oven by clamping the two ends, and heated in the oven at 300 for 30 seconds, 400 ° c for 30 seconds, and 510 ° C for 30 seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber ', it is torn off from the needle. Then, various characteristics of the film were measured, and the flow direction of the film was referred to as the MD direction and the lateral direction was referred to as the td direction. Example 14

88119324.ptd 第56胃 450982 五、發明說明(53) DMAc引進分離瓶内及於其中加入4當量0DA及1當量 Ρ-PDA。所得混合物於室溫徹底攪拌至〇DA及p-PDA完全溶 解為止。其次缓慢加入4. 95當量粉狀TMHQ接著攪拌40分 鐘。加入0. 5當量0DA及4. 5當量p-PDA後,混合物攪拌40分 鐘。其次5當量PMDA粉末緩慢加入其中及混合物攪拌1小 時。然後0. 5當量PMDA溶解於DMAc之溶液缓慢加入其中, 所得混合物於冷卻下攪拌1小時獲得聚醯胺酸於DM Ac之溶 液。DMAc之用量可獲得二胺及芳族四羧酸二酐單體之進給 濃度為18%重量比。 其次’如此所得聚醯胺酸混合AA及I Q及然後澆鑄於不銹 鋼循環帶上。於1 00 °C乾燥5分鐘後,如此形成的自撐式前 膜由帶上撕離。夾持兩端將前膜連續進給入烘箱内部,於 供箱内於300加熱30秒’於4〇〇 °c加熱30秒及510 X:加熱30 秒。其次於退火腔室緩慢冷卻至室溫。當薄膜由退火腔室 取出時’由針上撕離。然後量測薄臈之多種特性,將薄膜 流動方向稱作MD方向及將橫向稱作TD方向。 量測比較例2及實例1 2至1 4所得薄膜之線性膨脹係數、 吸水膨脹係數及彈性模量。表3摘述其結果。 線陡膨服係數表示使用理學電氣公司製造的^丸一。“於 2〇至3〇〇7係於氮氣流下量測得之線性膨脹係數。 吸水知脹係數係以比較例工及實例】至斗之相同方式測 定。 抗拉彈性模量係根據ASTM-D882測定。 吸水佳係根據下式測^ ’其中们表示於l5Q t乾燥分88119324.ptd 56th stomach 450982 V. Description of the invention (53) DMAc was introduced into the separation bottle and 4 equivalents of 0DA and 1 equivalent of PDA were added. The resulting mixture was stirred thoroughly at room temperature until the oDA and p-PDA were completely dissolved. Secondly, 4.95 equivalents of powdered TMHQ were slowly added, followed by stirring for 40 minutes. After adding 0.5 equivalent of 0DA and 4.5 equivalent of p-PDA, the mixture was stirred for 40 minutes. Next, 5 equivalents of PMDA powder was slowly added thereto and the mixture was stirred for 1 hour. Then, a solution of 0.5 equivalent of PMDA in DMAc was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DM Ac. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. Next, 'the polyamic acid thus obtained was mixed with AA and I Q and then cast on a stainless steel endless belt. After drying at 100 ° C for 5 minutes, the self-supporting front film thus formed was peeled off from the tape. The front film was continuously fed into the inside of the oven by clamping both ends, and heated in a supply oven at 300 for 30 seconds', heated at 400 ° C for 30 seconds, and 510 X: heated for 30 seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber ', it is torn off from the needle. Then, various characteristics of the thin film were measured, and the film flow direction was referred to as the MD direction and the lateral direction was referred to as the TD direction. The linear expansion coefficient, water absorption expansion coefficient, and elastic modulus of the films obtained in Comparative Example 2 and Examples 1 2 to 14 were measured. Table 3 summarizes the results. The linear swelling coefficient indicates that Maruichi manufactured by Rigaku Corporation is used. "The coefficient of linear expansion measured under nitrogen flow from 20 to 3007 is determined in the same manner as in Comparative Examples and Examples] to the bucket. The modulus of tensile elasticity is according to ASTM-D882 The water absorption is measured according to the following formula ^ 'wherein they are expressed in l5Q t dry content

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W β β ^ W νΝ t。濟齊濉皇颯辑 ^u v^r ^φ ^s Λν^ Η MW 蛛雒翁卧捧 Ψ ^w, u$ ^s ο I f« 450982 五 '發明說明(56) 攪拌1小時獲得聚醯胺酸於MAc之溶液。DMAc之用量可獲 得二胺及芳族四羧酸二酐單體之進給濃度為18%重量比。 成分B : DMF引進分離瓶内及於其中加入3當量0DA及1當量 P-PDA。所得混合物於室溫徹底攪拌至〇DA及p-PDA完全溶 解為止。其次缓慢加入3. 4當量粉狀PMDA接著攪拌40分 鐘。然後0. 6當量PMDA溶解於DMF之溶液緩慢加入其中及所 得混合物於冷卻下攪拌1小時獲得聚醯胺酸於DMF之溶液。 DMF之用量可獲得二胺及芳族四羧酸二酐單體進給濃度為 1 8 %重量比。 其次成分A及B以1 : 1重量比混合及攪拌。 隨後如此所得聚醯胺酸混合AA及IQ及然後澆鑄於不銹鋼 循環帶上。於100 °C乾燥5分鐘後,如此形成的自撐式前膜 由帶上撕離。夾持兩端將前膜連續進給入烘箱内部,於烘 箱内於30 0加熱30秒’於4〇〇 °c加熱30秒及於51 0 °C加熱30 秒。其次於退火腔室緩慢冷卻至室溫。當薄膜由退火腔室 取出時’由針上撕離。然後量測薄膜之多種特性,將薄膜 流動方向稱作MD方向及將橫向稱作td方向。 JT 例 1 8 成分A: DMAc引進分離瓶内及於其中加入2當量〇Μ及3當量p-pda 所得藏合物於室溫徹底攪拌至〇J)A及p_pda完全溶解為止。 其次加入4. 25當量粉狀TMHQ接著攪拌40分鐘。然後緩慢加 入0. 75當置TMHQ溶解於之溶液及所得混合物於冷卻下W β β ^ W νΝ t. A Collection of Emperor Jiqi ^ uv ^ r ^ φ ^ s Λν ^ Η MW, 雒 雒 雒 Ψ Ψw, u $ ^ s ο I f «450982 Description of the Five 'Invention (56) Stir for 1 hour to obtain polyamide A solution of acid in MAc. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. Ingredient B: DMF is introduced into the separation bottle and 3 equivalents of 0DA and 1 equivalent of P-PDA are added to it. The resulting mixture was stirred thoroughly at room temperature until the oDA and p-PDA were completely dissolved. Next, 3.4 equivalents of powdered PMDA was slowly added, followed by stirring for 40 minutes. Then, a solution of 0.6 equivalent of PMDA in DMF was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMF. The amount of DMF can be used to obtain a diamine and aromatic tetracarboxylic dianhydride monomer feed concentration of 18% by weight. Next, components A and B are mixed and stirred at a 1: 1 weight ratio. The polyamic acid thus obtained was then mixed with AA and IQ and then cast on a stainless steel endless belt. After drying at 100 ° C for 5 minutes, the self-supporting front film thus formed was peeled off from the tape. The front film was continuously fed into the inside of the oven by clamping both ends, and heated in the oven at 300 ° C for 30 seconds', heated at 400 ° C for 30 seconds, and heated at 5100 ° C for 30 seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber ', it is torn off from the needle. Then, various characteristics of the film were measured, and the flow direction of the film was referred to as the MD direction and the lateral direction was referred to as the td direction. JT Example 18 Ingredient A: DMAc was introduced into the separation flask and 2 equivalents of OM and 3 equivalents of p-pda were added to the Tibetan compound, and the mixture was thoroughly stirred at room temperature until 0) A and p_pda were completely dissolved. Next, 4.25 equivalents of powdered TMHQ was added and stirred for 40 minutes. Then slowly add 0.775 of the solution in which TMHQ was dissolved and the resulting mixture was allowed to cool.

88119324.ptd88119324.ptd

450982 五、發明說明(57) 攪拌1小時獲得聚醯胺酸於DMAc之溶液。DMAc之用量可獲 得二胺及芳族四羧酸二酐單體之進給濃度為18%重量比。 成分B : DMF引進分離瓶内及於其中加入3當量0DA及1當量p-PDA 。所得混合物於室溫徹底攪拌至0DA及p-PDA完全溶解為 止。其次緩慢加入3. 4當量粉狀PMDA接著攪拌40分鐘。然 後0_ 6當量PMM溶解於DMF之溶液緩慢加入其中及所得混合 物於冷卻下攪拌1小時獲得聚醯胺酸於DMF之溶液。DMF之 用量可獲得二胺及芳族四羧酸二酐單體進給濃度為18%重 量比。 其次成分A及B以2 : 1重量比混合及攪拌。 隨後如此所得聚醯胺酸混合AA及IQ及然後澆鑄於不銹鋼 循環帶上。於1 00 °C乾燥5分鐘後,如此形成的自撐式前膜 由帶上撕離。夾持兩端將前膜連續進給入烘箱内部,於煤 箱内於300加熱30秒,於400 °C加熱30秒及於510 °C加熱30 秒。其次於退火腔室缓慢冷卻至室溫。當薄膜由退火腔室 取出時,由針上撕離。然後量測薄膜之多種特性,將薄膜 流動方向稱作M D方向及將橫向稱作T D方向。 實例1 9 DMAc引進分離瓶内及於其中加入4. 5當量ODA及5. 5當量 p-PDA。所得混合物於室溫徹底攪拌至ODA及p-PDA完全溶 為止。其次加入5當量PMDA於其中及混合物擾拌40分鐘。 加入4. 5當量TMHQ後混合物又攪拌40分鐘。然後0. 5當量 TMHQ溶解於DMAc之溶液緩慢加入其中,所得混合物於冷卻450982 V. Description of the invention (57) Stir for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. Ingredient B: DMF is introduced into the separation bottle and 3 equivalents of 0DA and 1 equivalent of p-PDA are added thereto. The resulting mixture was thoroughly stirred at room temperature until 0DA and p-PDA were completely dissolved. Next, 3.4 equivalents of powdered PMDA was slowly added and stirred for 40 minutes. Then, a solution of 0-6 equivalents of PMM in DMF was slowly added thereto and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMF. The amount of DMF can obtain the diamine and aromatic tetracarboxylic dianhydride monomer feed concentration of 18% by weight. Next, components A and B are mixed and stirred at a 2: 1 weight ratio. The polyamic acid thus obtained was then mixed with AA and IQ and then cast on a stainless steel endless belt. After drying at 100 ° C for 5 minutes, the self-supporting front film thus formed was peeled off from the tape. The front film was continuously fed into the inside of the oven by clamping the two ends, and heated in a coal oven at 300 for 30 seconds, at 400 ° C for 30 seconds, and at 510 ° C for 30 seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber, it is torn off from the needle. Then, various characteristics of the film were measured, and the direction of film flow was referred to as the MD direction and the transverse direction was referred to as the T D direction. Example 19 DMAc was introduced into a separation flask and 4.5 equivalents of ODA and 5.5 equivalents of p-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until ODA and p-PDA were completely dissolved. Next, 5 equivalents of PMDA was added thereto and the mixture was stirred for 40 minutes. After adding 4.5 equivalents of TMHQ, the mixture was stirred for another 40 minutes. Then 0.5 equivalent of a solution of TMHQ dissolved in DMAc was slowly added thereto, and the resulting mixture was cooled down

88119324.ptd 第61頁 450982 五、發明說明(58) 下攪拌1小時獲得聚醯胺酸於DM Ac之溶液》DM Ac之用量可 獲得二胺及芳族四羧酸二酐單體之進給濃度為18%重量 比。 其次,如此所得聚醯胺酸混合AA及IQ及然後澆鑄於不銹 鋼循環帶上。於1 00 °C乾燥5分鐘後,如此形成的自撐式前 膜由帶上撕離。夾持兩端將前膜連續進給入烘箱内部,於 烘箱内於300加熱30秒,於400 °C加熱30秒及510 t:加熱30 秒。其次於退火腔室緩慢冷卻至室溫。當薄膜由退火腔室 取出時,由針上撕離。然後量測薄膜之多種特性,將薄膜 流動方向稱作MD方向及將橫向稱作TD方向。 f例2 g DMAc引進分離瓶内及於其中加入4當量ODA及2當量 P-PDA。所得混合物於室溫徹底攪拌至〇DA及p-PDA完全溶 解為止。然後加入6當量TMHQ於其中及混合物攪拌40分 鐘。其次’ 1當量ODA及3當量p-PDA加入其中及混合物攪拌 40分鐘。加入3. 5當量PMDA後混合物又攪拌40分鐘。然後 〇. 5當量PMDA溶解於DMAc之溶液緩慢加入其中,所得混合 物於冷卻下攪拌1小時獲得聚醯胺酸於DMAc之溶液。DMAc 之用量可獲得二胺及芳族四羧酸二酐單體之進給濃度為 1 8 %重量比。 其次’如此所得聚醯胺酸混合AA及I Q及然後澆鑄於不銹 鋼循環帶上。於1 〇〇 t:乾燥5分鐘後,如此形成的自撐式前 膜由帶上撕離。夾持兩端將前膜連續進給入烘箱内部,於 烘箱内於300加熱30秒,於400 eC加熱30秒及510 °C加熱3088119324.ptd Page 61 450982 V. Description of the invention (58) Stir for 1 hour to obtain a solution of polyamic acid in DM Ac ". The amount of DM Ac can obtain the feed of diamine and aromatic tetracarboxylic dianhydride monomers. The concentration is 18% by weight. Next, the polyamic acid thus obtained was mixed with AA and IQ and then cast on a stainless steel endless belt. After drying at 100 ° C for 5 minutes, the self-supporting front film thus formed was peeled off from the tape. The front film is continuously fed into the inside of the oven by holding both ends, and heated in the oven at 300 for 30 seconds, 400 ° C for 30 seconds and 510 t: heating for 30 seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber, it is torn off from the needle. Then measure various characteristics of the film, and call the film flow direction the MD direction and the transverse direction the TD direction. Example 2 g DMAc was introduced into a separation bottle and 4 equivalents of ODA and 2 equivalents of P-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until the oDA and p-PDA were completely dissolved. Then 6 equivalents of TMHQ was added thereto and the mixture was stirred for 40 minutes. Next, 1 equivalent of ODA and 3 equivalents of p-PDA were added thereto and the mixture was stirred for 40 minutes. After adding 3.5 equivalents of PMDA, the mixture was stirred for another 40 minutes. Then, a solution of 0.5 equivalent of PMDA in DMAc was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of 18% by weight of diamine and aromatic tetracarboxylic dianhydride monomer. Next, 'the polyamic acid thus obtained was mixed with AA and I Q and then cast on a stainless steel endless belt. At 100 t: 5 minutes after drying, the self-supporting front film thus formed was peeled off from the tape. The front film is continuously fed into the inside of the oven by clamping the two ends, and heated in the oven at 300 for 30 seconds, at 400 eC for 30 seconds, and at 510 ° C for 30 seconds.

88119324,ptd 第62頁 4 5 0982 五、發明說明(59) 秒。其次於退火腔室緩慢冷卻至室溫。當薄膜由退火腔室 取出時,由針上撕離。然後量測薄膜之多種特性,將薄膜 流動方向稱作MD方向及將橫向稱作TD方向。 實例21 DMAc引進分離瓶内及於其中加入5當量0DA及5當量 p-PDA。所得混合物於室溫徹底攪拌至〇da及p-PDA完全溶 解為止。其次加入5當量TMHQ於其中及混合物攪拌40分 鐘。加入4. 5當量PMDA後混合物又攪拌4〇分鐘。然後〇, 5當 量TMHQ溶解於DMAc之溶液緩慢加入其中,所得混合物於冷 卻下搜拌1小時獲得聚醯胺酸於DMAc之溶液。DMAc之用量 可獲得二胺及芳族四羧酸二酐單體之進給濃度為18%重量 比。 其次’如此所得聚醯胺酸混合AA及IQ及然後澆鑄於不銹 鋼循環帶上。於1 00 °C乾燥5分鐘後,如此形成的自撐式前 膜由帶上撕離。夾持兩端將前膜連續進給入烘箱内部,於 烘箱内於3 0 0加熱3 0秒’於4 0 0 °C加熱3 0秒及於5 1 0 °C加熱 3 0秒。其次於退火腔室緩慢冷卻至室溫。當薄膜由退火腔 室取出時’由針上撕離。然後量測薄膜之多種特性,將薄 膜流動方向稱作MD方向及將橫向稱作了!)方向。 量測比較例2及實例15至21所得薄膜之線性膨脹係數、 吸水膨脹係數及彈性模量。表4摘述其結果。 ^_488119324, ptd Page 62 4 5 0982 V. Description of the invention (59) seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber, it is torn off from the needle. Then measure various characteristics of the film, and call the film flow direction the MD direction and the transverse direction the TD direction. Example 21 DMAc was introduced into a separation bottle and 5 equivalents of 0DA and 5 equivalents of p-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until oda and p-PDA were completely dissolved. Next, 5 equivalents of TMHQ was added thereto and the mixture was stirred for 40 minutes. After adding 4.5 equivalents of PMDA, the mixture was stirred for another 40 minutes. Then, a solution of 0,5 equivalents of TMHQ in DMAc was slowly added thereto, and the resulting mixture was searched under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. Next, 'the polyamic acid thus obtained was mixed with AA and IQ and then cast on a stainless steel endless belt. After drying at 100 ° C for 5 minutes, the self-supporting front film thus formed was peeled off from the tape. The front film is continuously fed into the inside of the oven by clamping both ends, and heated in the oven at 300 for 30 seconds', heated at 400 ° C for 30 seconds, and heated at 5 10 ° C for 30 seconds. Next, slowly cool to room temperature in the annealing chamber. When the film is removed from the annealing chamber ', it is torn off from the needle. Then measure the various characteristics of the film, the film flow direction is called MD direction and the transverse direction is called!) Direction. The linear expansion coefficient, water expansion coefficient and elastic modulus of the films obtained in Comparative Example 2 and Examples 15 to 21 were measured. Table 4 summarizes the results. ^ _4

線性膨脹係 數(ppm) 吸水膨脹係 數(ppm) 彈性模量 (千克/平 捲曲程 度 I S ί 1 Ϊ 1 i ! I 1 ! ϊ 1 i 1 1 ί 11 11 II 88119324.ptd 第63頁 1450982 五、發明說明(60) 方毫来) MD TD MD TD 比較例2 30 34 18 22 300 X 實例1 5 12 13 6 8 550 〇 實例1 6 11 9 4 3 700 〇 實例1 7 9 9 8 8 550 〇 實例1 8 7 6 6 6 640 〇 實例1 9 9 10 5 6 63 0 〇 實例2 0 8 8 4 4 660 〇 實例21 9 8 4 4 600 〇, 線性膨脹係數表示經由使用理學電氣公司製造的TMA-8140於2 0至3 0 0 °C於氮氣流下量測之線性膨脹係數。 吸水膨脹係數係以比較例1及實例1至4之相同方式測 定。 抗拉彈性模量係根據ASTM-D882測定。 捲曲程度係經由使用電子束加熱型連續沈積裝置藉共同 斜向蒸氣沈積方法於比較例2及實例1 5至2 1之各薄膜樣本 上形成一層磁性層測定。各例中磁性層厚度為0. 1 2微米, 罐溫度為2 5 0 °C。磁性層沈積速度為約0. 1微米/秒。 實例22 厚约1 0微米之聚醯亞胺薄膜係以實例5之相同方式獲 得。 實例23 厚約1 0微米之聚醯亞胺薄膜係以實例6之相同方式獲Coefficient of Linear Expansion (ppm) Coefficient of Water Expansion (ppm) Modulus of Elasticity (kg / flat curl IS IS ί 1 Ϊ 1 i! I 1! Ϊ 1 i 1 1 ί 11 11 II 88119324.ptd Page 63 1450982 V. Invention Explanation (60) Fang Lailai MD TD MD TD Comparative Example 2 30 34 18 22 300 X Example 1 5 12 13 6 8 550 〇 Example 1 6 11 9 4 3 700 〇 Example 1 7 9 9 8 8 550 〇 Example 1 8 7 6 6 6 640 〇Example 1 9 9 10 5 6 63 0 〇Example 2 0 8 8 4 4 660 〇Example 21 9 8 4 4 600 〇, the linear expansion coefficient is expressed by using TMA-8140 manufactured by Rigaku Corporation. Coefficient of linear expansion measured at 20 to 300 ° C under nitrogen flow. The coefficient of water expansion was measured in the same manner as in Comparative Example 1 and Examples 1 to 4. The tensile elastic modulus is measured according to ASTM-D882. The degree of curl was measured by forming a magnetic layer on each of the thin film samples of Comparative Example 2 and Examples 15 to 21 by a common oblique vapor deposition method using an electron beam heating type continuous deposition apparatus. The thickness of the magnetic layer in each case was 0.1 2 microns, and the tank temperature was 250 ° C. The magnetic layer deposition rate is about 0.1 micron / second. Example 22 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 5. Example 23 A polyimide film having a thickness of about 10 microns was obtained in the same manner as in Example 6.

88119324.ptd 第64頁 ^ 4 5 09 8 2 五、發明說明(61) 得。 實例2 4 厚約1 0微米之聚醯亞胺薄膜係以實例1之相同方式獲 得。 實例25 厚約1 0微米之聚醯亞胺薄膜係以實例8之相同方式獲 得。 實例2 6 厚約1 0微米之聚醯亞胺薄膜係以實例3之相同方式獲 得。 實例27 厚約1 0微米之聚醯亞胺薄膜係以實例2之相同方式獲 得。 實例28 厚約1 0微米之聚醯亞胺薄膜係以實例4之相同方式獲 得。 量測比較例1及實例22至28所得薄膜之線性膨脹係數、 吸水膨脹係數及彈性模量。表5摘述其結果。 表__5 線性膨 脹係數 (ppm) 吸水膨 脹係數 (ppm) 彈性模量 (千克/平 方毫米) 密度 (克/立 方厘米) 吸水性 (%) 黏著強 度(千 克/厘 米) 比較例1 32 20 300 1. 420 3. 0 0.888119324.ptd Page 64 ^ 4 5 09 8 2 V. Description of Invention (61). Example 24 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 1. Example 25 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 8. Example 26 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 3. Example 27 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 2. Example 28 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 4. The linear expansion coefficient, water expansion coefficient, and elastic modulus of the films obtained in Comparative Example 1 and Examples 22 to 28 were measured. Table 5 summarizes the results. Table__5 Linear expansion coefficient (ppm) Water absorption expansion coefficient (ppm) Elastic modulus (kg / mm2) Density (g / cm3) Water absorption (%) Adhesive strength (kg / cm) Comparative example 1 32 20 300 1 . 420 3. 0 0.8

88119324.ptd 第65頁 450982 五、發明說明(62) 實例2 2 12 — — 7 550 1.456 1. 0 1.1 實例23 10 4 700 1. 457 0,8 1.1 實例24 9 8 550 1. 445 1.5 1.2 實例2 5 8 7 640 1.445 1.4 1.1 實例26 9 5 630 1.445 1.4 1.3 實例27 8 4 680 1. 460 0.9 1. 2 實例28 9 5 600 1. 459 ί7Γ~1 1.3 線性膨脹係數表示經由使用理學電氣公司製造的TMA-8140於2 0至30 0 t係於氮氣流下量測得之線性膨脹係數。 吸水膨脹係數係以比較例1及實例1至4之相同方式測 定。 抗拉彈性模量係根據ASTM-D882測定。 吸水性係根據下式測定,其中W1表示於150 °C乾燥30分 鐘後測得薄膜樣本重量,及W2表示浸沒於蒸餾水24小時然 後拭除其表面水滴後測得之樣本重量β 吸水性U)KW2-W1)/W1 Χ100。 密度係根據JIS.K7112 6.4D方法(密度梯度離心方法) 測定。 黏合強度係如下強度測定。 如此所得各聚醯亞胺薄膜經由使用尼龍環氧樹脂黏合劑 層合於鋼箔(三井礦冶公司製造的電解銅箔3EC_VLp)上獲 得三層層合物(聚醯亞胺薄膜/黏合劑/銅箔)。然後層合物 根據JIS~6472-1 995-(8)接受測定。 三層鋼包被層合物之捲曲程度係藉下述方法評估。88119324.ptd Page 65 450982 V. Description of the invention (62) Example 2 2 12 — — 7 550 1.456 1. 0 1.1 Example 23 10 4 700 1. 457 0,8 1.1 Example 24 9 8 550 1. 445 1.5 1.2 Example 2 5 8 7 640 1.445 1.4 1.1 Example 26 9 5 630 1.445 1.4 1.3 Example 27 8 4 680 1. 460 0.9 1. 2 Example 28 9 5 600 1. 459 7Γ ~ 1 1.3 The linear expansion coefficient is expressed by using Rigaku Corporation The linear expansion coefficient of TMA-8140 measured at 20 to 300 t under nitrogen flow. The coefficient of water expansion was measured in the same manner as in Comparative Example 1 and Examples 1 to 4. The tensile elastic modulus is measured according to ASTM-D882. Water absorption is measured according to the following formula, where W1 is the weight of the film sample measured after drying at 150 ° C for 30 minutes, and W2 is the weight of the sample measured after immersed in distilled water for 24 hours and then wiped off the water droplets on the surface β water absorption U) KW2-W1) / W1 X100. The density is measured according to JIS.K7112 6.4D method (density gradient centrifugation method). The adhesive strength was measured as follows. Each of the polyimide films thus obtained was laminated on a steel foil (electrolytic copper foil 3EC_VLp manufactured by Mitsui Mining and Metallurgy Co., Ltd.) using a nylon epoxy adhesive to obtain a three-layer laminate (polyimide film / adhesive / Copper foil). The laminate was then subjected to measurement according to JIS ~ 6472-1 995- (8). The degree of curling of the three-layer ladle laminate was evaluated by the following method.

88119324.ptd 第66頁 450982 五、發明說明(63) (1) 如比較例1及實例2 2至2 8獲得5 〇微米薄膜。 (2) 如此所得各薄膜經由使用尼龍環氧樹脂黏合劑層合 於鋼落(三井礦冶公司製造的電解銅f|3EC-VLP)上獲得三 層層合物(聚醯亞胺薄膜/黏合劑/銅箔)。 (3) 如此所得三層層合物切成35毫米(TD方向)X40毫米 CMD方向)大小且任其於23 °C及55%相對濕度之氣氛下放 f。隨後樣本如圖1所示放置成凹面向下,及使用撥盤表 量?刻最高舉升高度。表6摘述其結果。 捲曲 方向 高度(宅米) 比較例1 TD 2.4 實例2 2 TD 1. 3 厂例23 TD 1.3 2 4 TD 1.1 ^例25 TD 1.4 實例2 6 TD 0.9 實例27 TD 0. 8 刊 28 TD 0. 8 gJ^J2 9 厚約1 〇微米之聚醯亞胺薄膜係以實例5之相同方式獲得 ^#&gt;J3088119324.ptd Page 66 450982 V. Description of the Invention (63) (1) As Comparative Example 1 and Examples 2 to 2 8 a 50 micron film was obtained. (2) Each of the films thus obtained was laminated on a steel sheet (electrolytic copper f | 3EC-VLP manufactured by Mitsui Mining and Metallurgy Co., Ltd.) using a nylon epoxy resin adhesive to obtain a three-layer laminate (polyimide film / adhesion Agent / copper foil). (3) The three-layer laminate thus obtained was cut into a size of 35 mm (TD direction) X40 mm CMD direction) and allowed to stand in an atmosphere of 23 ° C and 55% relative humidity. The sample was then placed with the concave side downward as shown in Figure 1, and the dial was used to measure the highest lifting height. Table 6 summarizes the results. Height in the curling direction (meter) Comparative Example 1 TD 2.4 Example 2 2 TD 1. 3 Factory Example 23 TD 1.3 2 4 TD 1.1 ^ Example 25 TD 1.4 Example 2 6 TD 0.9 Example 27 TD 0. 8 Issue 28 TD 0. 8 gJ ^ J2 9 Polyimide film with a thickness of about 10 microns was obtained in the same manner as in Example 5 ^ # & J30

88119324.Ptd 第 67 頁 v 4 5 0 9 8 2 五、發明說明(64) 厚約1 0微米之聚醯亞胺薄膜係以實例6之相同方式獲 得。 實例31 厚約1 0微米之聚醯亞胺薄膜係以實例3之相同方式獲 得。 實例32 厚約1 0微米之聚醯亞胺薄膜係以實例2之相同方式獲 得。 實例33 DMAc引進分離瓶内及於其中加入5當量〇])A及5當量 p-PDA »所得混合物於室溫徹底攪拌至〇da及p-PDA完全溶 解為止。其次加入5當量TMHQ於其中接著攪拌40分鐘。進 一步加入4_ 5當量PMDA於其中接著攪拌40分鐘·•然後0. 5當 量PMDA溶解於DMAc之溶液緩慢加入其中,所得混合物於冷 卻下攪拌1小時獲得聚醯胺酸於DMAc之溶液。DMAc之用量 可獲得二胺及芳族四羧酸二酐單體之進給濃度為18%重量 比。 聚醯胺酸溶液混合A A及I Q並倒至玻璃板上。於約1 〇 〇 °C 乾燥約1分鐘後,由玻璃板上撕離聚醯亞胺薄膜。然後此膜 固定於支架及經由循序於約1 〇 〇 °c加熱约1分鐘,於約3 0 0 °C加熱約30秒’於約400 °C加熱約30秒及於約510 X:加熱約 30秒脫水及環化因而獲得厚約1 〇微米之聚醯亞胺薄膜。 量測比較例1及實例2 9至3 3所得薄膜之線性膨脹係數、 吸水膨脹係數及彈性模量。表7摘述其結果。88119324.Ptd page 67 v 4 5 0 9 8 2 V. Description of the invention (64) A polyimide film having a thickness of about 10 microns was obtained in the same manner as in Example 6. Example 31 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 3. Example 32 A polyimide film having a thickness of about 10 m was obtained in the same manner as in Example 2. Example 33 DMAc was introduced into a separation flask and 5 equivalents of 0]) A and 5 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until 0da and p-PDA were completely dissolved. Next, 5 equivalents of TMHQ was added thereto, followed by stirring for 40 minutes. Further, 4-5 equivalents of PMDA was added thereto, followed by stirring for 40 minutes. Then, a solution of 0.5 equivalents of PMDA dissolved in DMAc was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomers of 18% by weight. The polyamic acid solution was mixed with A A and I Q and poured onto a glass plate. After drying at about 1000 ° C for about 1 minute, the polyimide film was peeled off from the glass plate. The film was then fixed to the stent and heated sequentially at about 1000 ° C for about 1 minute, then at about 300 ° C for about 30 seconds', at about 400 ° C for about 30 seconds, and at about 510 X: heating for about Dehydration and cyclization in 30 seconds resulted in a polyimide film having a thickness of about 10 microns. The linear expansion coefficient, water absorption expansion coefficient, and elastic modulus of the films obtained in Comparative Examples 1 and 2 to 9 to 3 3 were measured. Table 7 summarizes the results.

88119324.ptd 第68頁 45 09 8 2 五、發明說明(65) 線性膨脹係 數(ppm) 吸水膨脹係 數(ppm) 一_^ 彈性模量 (千克/平 方亳米) 吸水性 (%) 比較例1 32 20 ---~~~-L- - 300 3. 0 實例29 12 Ί 550 1.0 實例30 10 4 Π~Ύ〇〇 〇78~ 實例31 9 5 630 1.4 實例32 8 4 680 0· 9 實例33 9 5 600 1.2 線性膨脹係數表示經由使用理學電氣公司製造的TMA-8140於2 0至3 0 0 °C於氮氣流下量測之線性膨脹係數。 吸水膨脹係數係以比較例1及實例1至4之相同方式測 定。 抗拉彈性模量係根據ASTM-D882測定。 吸水性係根據下式測定,其中W1表示於1 5 0 °C乾燥3 0分 鐘後測得薄膜樣本重量,及W 2表示浸沒於蒸餾水2 4小時然 後拭除其表面水滴後測得之樣本重量。 吸水性(%) = (W2-W1)/W1 X100。 比較例3 比較例1所得薄膜(1 0微求)之一面上施用聚醯胺酸溶 液,聚醯胺酸為具有Tg 190 °C之熱塑性聚醯亞胺前驅物, 含有3, 3’,4, 4,-二笨曱酮四羧酸二酐,3, 3,’ -4, 4,-乙二 醇二笨甲酸酯四羧酸二酐及2, 2’-貳(4-(4-胺基笨氧)笨88119324.ptd Page 68 45 09 8 2 V. Explanation of the invention (65) Coefficient of linear expansion (ppm) Coefficient of water expansion (ppm) _ ^ Modulus of elasticity (kg / square meter) Water absorption (%) Comparative example 1 32 20 --- ~~~ -L--300 3. 0 Example 29 12 Ί 550 1.0 Example 30 10 4 Π ~ Ύ〇〇〇78 ~ Example 31 9 5 630 1.4 Example 32 8 4 680 0 · 9 Example 33 9 5 600 1.2 The coefficient of linear expansion refers to the coefficient of linear expansion measured using a TMA-8140 manufactured by Rigaku Corporation at 20 to 300 ° C under a nitrogen stream. The coefficient of water expansion was measured in the same manner as in Comparative Example 1 and Examples 1 to 4. The tensile elastic modulus is measured according to ASTM-D882. The water absorption is determined according to the following formula, where W1 is the weight of the film sample measured after drying at 150 ° C for 30 minutes, and W2 is the weight of the sample measured after immersing in distilled water for 24 hours and then wiping off the water droplets on the surface. . Water absorption (%) = (W2-W1) / W1 X100. Comparative Example 3 A polyamic acid solution was applied to one side of the film (10 μg) obtained in Comparative Example 1. Polyamic acid was a thermoplastic polyimide precursor having a Tg of 190 ° C, containing 3, 3 ', 4 , 4, -Dibenzylidene tetracarboxylic dianhydride, 3, 3, '-4, 4, -ethylene glycol dibenzylate tetracarboxylic dianhydride and 2, 2'-fluorene (4- (4 -Amino stupid oxygen) stupid

88119324,ptd 第69頁 450982 五、發明說明(66) ' '—~*-----—-- 基)丙燒作為主要成分於 1 取刀%有機溶劑之溶液,接著乾燥獲得 厚1 7微米之聚醯亞胺層合物。然後如此所得聚醯亞胺層合 .物置於鋼箔(三井礦冶公司製造的電解銅箔3EC-VLP)上及 使用熱壓機加熱壓縮黏合(30千克力/平方厘米/240 °C/20 分鐘)獲得三層層合物,亦即#熱塑性聚醯亞胺/熱塑性聚 醯亞胺/銅箔。量測所得層合物之交界面(非熱塑性聚醯亞 胺/熱塑性聚醯亞胺)黏合強度。表8顯示其結果。 表8 _揮一 鲇合強度 (千克/厘米) 加熱 電暈 電漿 偶合劑 比較例3 比較例1 • _ 0.1 比較例4 比較例1 0 - - 0.2 比較例5 比較例1 0 0 0,2 比較例6 比較例1 0 0 0 - 0,2 比較例7 比較例1 0 0 - 0異佛耳酮 二胺 0,3 比較例8 比較例1 0 _ 0 同上 0.3 比較例9 實例29 - - 0.3 |比較例10 實例3 3 _ - 0,3 實例34 實例29 0 - - 0異佛耳酮 二胺 1.0 實例35 實例2 9 0 0 - - 0.9 實例36 實例29 0 0 1.2 丨實例37 實例29 0 0 0 1.2 i實例3 8 實例29 0 0 0異佛耳齣 二胺 1.0 丨實例39 實例2 9 0 0 0 同上 Ϊ .2 丨實例40 實例3 0 0 0 0 1.0 丨實例41 實例3 1 0 0 0 1,1 實例42 實例3 2 0 0 0 1,0 11 II 1 1 —- — --- 88119324.ptd 第70頁 450982 五、發明說明(67) 實例4 3 實例33 〇 - - 0異佛耳_ 二胺 \Λ 實例44 實例3 3 0 - - 0二伸乙基 三胺 1.0 實例45 實例33 0 - - 〇N-胺基乙 基六氫吡畊 1.0 實例4 6 實例33 0 0 _ 0.9 實例47 實例33 0 0 1.2 實例48 實例33 0 0 0 垂 1.2 實例49 實例33 - - 0 • 1.2 比較例4 比較例1所得薄膜(1 0微米)於5 0 0 °C接受加熱處理1分 鐘。然後如比較例3量測所得聚醯亞胺薄膜之黏合強度。 比較例5 比較例1所得薄膜(10微米)循序接受於5 〇〇加熱處理1 分鐘及於電暈密度3 0 0瓦·分鐘/平方米電暈處理。然後如 比較例3量測所得聚醯亞胺薄膜之黏合強度。 ί匕&amp; Ϊ列6 比較例1所得薄膜(1 〇微米)循序接受於5 〇 〇它加熱處理1 分知及於電暈密度300瓦.分鐘/平方米電暈處理。進一步 接爻於電漿密度2000瓦.分鐘/平方米之電漿處理。然後 如比較例3量測所得聚醯亞胺薄膜之黏合強度。 … 比較例7 米)循序接受於5 00 °c加熱處理1 分鐘/平方米電暈處理。進一步 比較例1所得薄膜(1 〇微 分鐘及於電暈密度3〇〇瓦88119324, ptd Page 69 450982 V. Description of the invention (66) '' ~~ * -------- based) Propylene sintering is used as the main ingredient in a solution of 1% organic solvent and then dried to obtain a thickness of 1 7 Micron polyfluorene imide laminate. Then the polyimide thus obtained was laminated. The material was placed on a steel foil (electrolytic copper foil 3EC-VLP manufactured by Mitsui Mining and Metallurgy Co., Ltd.) and heated and compressed and bonded (30 kgf / cm2 / 240 ° C / 20) Minutes) to obtain a three-layer laminate, namely #thermoplastic polyimide / thermoplastic polyimide / copper foil. The adhesive strength of the interface (non-thermoplastic polyimide / thermoplastic polyimide) of the obtained laminate was measured. Table 8 shows the results. Table 8 _Coupling strength (kg / cm) Heating corona plasma coupling agent Comparative example 3 Comparative example 1 • _ 0.1 Comparative example 4 Comparative example 1 0--0.2 Comparative example 5 Comparative example 1 0 0 0,2 Comparative Example 6 Comparative Example 1 0 0 0-0, 2 Comparative Example 7 Comparative Example 1 0 0-0 Isophorone Diamine 0, 3 Comparative Example 8 Comparative Example 1 0 _ 0 Ibid. 0.3 Comparative Example 9 Example 29-- 0.3 | Comparative Example 10 Example 3 3 _-0,3 Example 34 Example 29 0--0 Isophoronediamine 1.0 Example 35 Example 2 9 0 0--0.9 Example 36 Example 29 0 0 1.2 丨 Example 37 Example 29 0 0 0 1.2 i Example 3 8 Example 29 0 0 0 Isophoric diamine 1.0 丨 Example 39 Example 2 9 0 0 0 Ibid. 2 丨 Example 40 Example 3 0 0 0 0 1.0 丨 Example 41 Example 3 1 0 0 0 1,1 Example 42 Example 3 2 0 0 0 1,0 11 II 1 1 —- — --- 88119324.ptd Page 70 450982 V. Description of the invention (67) Example 4 3 Example 33 〇--0 Buddha_diamine \ Λ Example 44 Example 3 3 0--0 Diethylenetriamine 1.0 Example 45 Example 33 0--〇N-Aminoethylhexahydropyracine 1.0 Example 4 6 Example 33 0 0 _ 0.9 Example 47 Example 3 3 0 0 1.2 Example 48 Example 33 0 0 0 Drop 1.2 Example 49 Example 33--0 • 1.2 Comparative Example 4 The film (10 micrometers) obtained in Comparative Example 1 was subjected to heat treatment at 50 ° C for 1 minute. Then, the adhesion strength of the obtained polyimide film was measured as in Comparative Example 3. Comparative Example 5 The film (10 micrometers) obtained in Comparative Example 1 was sequentially subjected to a heat treatment at 5000 for 1 minute and a corona treatment at a corona density of 300 watt · minutes / square meter. Then, the adhesive strength of the obtained polyfluoreneimide film was measured as in Comparative Example 3. The thin film (10 micrometers) obtained in Comparative Example 1 was sequentially subjected to 500 heat treatment for 1 minute, and was subjected to a corona density of 300 W.min / m2. Further connected to a plasma treatment with a plasma density of 2000 W.min / m². Then, the adhesive strength of the obtained polyimide film was measured as in Comparative Example 3. … Comparative Example 7 m) Sequentially subjected to a heat treatment at 500 ° C for 1 minute / square meter of corona treatment. Further, the film obtained in Comparative Example 1 (10 microminutes and a corona density of 300 watts

4 5 09 8 2 五、發明說明(68) 使用桿塗機將異佛耳網二胺於甲醇溶液(5 上及於70 C乾燥!分鐘。然後如比較量比)施加其 薄膜之黏合強度。 1利所得聚醯亞胺 比較例8 比較例1所得薄膜(10微求)循序 分鐘及於電裝密度瓦.分鐘/平方加熱處理1 步使用桿塗機將異佛耳酮二胺於甲醇溶液 進: ^ a ^70 It ^ ^ # 0 ^ ^ ^ ,,J3 (t ; 胺薄膜之黏合強度。 $利所仵聚醯亞 比較例9 測實例33所得薄膜(j 〇微米)之黏合強度係如比較例3量 比較例1 0 實例33所得薄膜, f例34 、 未)之黏合強度係如比較例3量測。 缺::29 :得薄膜(1°微米)接受於5〇〇。。加熱處理1分鐘。 」4用杯塗機將異佛耳酮二胺於甲醇溶液(5%重量比·)施 =t 5 3 5乾燥1分鐘。然後如比較例3量測所得聚醯 亞^胺岸膜之黏合強度。 實例35 實例29所得薄膜(1〇微米)循序接受於5〇〇它加 鐘及於電暈密細G瓦.分鐘/平μ之電暈處理。 比較例3置測所得聚醯亞胺薄膜之黏合強度。 實例364 5 09 8 2 V. Description of the invention (68) Use a rod coater to apply isophoric diamine in a methanol solution (dry at 5 and 70 C! Minutes. Then, as a comparison ratio), apply the adhesive strength of the film. Polyimide Comparative Example 8 Obtained in Comparative Example 8 The film obtained in Comparative Example 1 (10 micrograms) was sequentially mined and densified in tiles. Min / square heat treatment 1 step Use a rod coater to apply isophorone diamine in a methanol solution Progress: ^ a ^ 70 It ^ ^ # 0 ^ ^ ^ ,, J3 (t; Adhesive strength of amine thin film. $ 利 所 利 聚醯 亚 Comparative Example 9 Measurement of the adhesive strength of the film (j 0 micron) obtained in Example 33 As in Comparative Example 3, the adhesive strength of the film obtained in Comparative Example 10, Example 33, and f Example 34 (not shown) was measured as in Comparative Example 3. Defect: 29: The obtained film (1 ° micron) was accepted at 500. . Heat treatment for 1 minute. 4 Use a cup coater to dry isophorone diamine in a methanol solution (5% weight ratio ·) for t 5 3 5 for 1 minute. Then, the adhesive strength of the obtained polyimide shore film was measured as in Comparative Example 3. Example 35 The film (10 micrometers) obtained in Example 29 was sequentially subjected to a corona treatment at 500 ° C and a corona density of fine G watts per minute / square µ. In Comparative Example 3, the adhesive strength of the obtained polyimide film was measured. Example 36

450982 五、發明說明(69) *----- 如比較例3量測所得聚醯亞胺薄臈之黏合強度。 實例37 實例29 =薄膜(10·米)循序接受於5〇(rc力口 鐘及於電暈密度300瓦.分鐘/平方米 理、;; 電漿密度2000瓦•分鐘/平方半垃典恭妝#/ &amp; $ ^ 卞乃水接受電漿處理。然後如比 較例3直測所得聚醯亞胺薄膜之黏合強度。 實例38 口 又 實例29所得薄膜α〇微求)循序接受於5〇〇。〇加執 分 鐘及於電暈密度_瓦·分鐘/平方米之電暈處理、。進—步 使用桿塗機將異佛耳酮二胺於甲醇溶液(5%重量比)施加其 t及於70上乾燥1分鐘。然後如比較例3量測所得聚醯亞胺 ?專膜之黏合強度。 實例39 實例29所得薄膜(1〇微米)循序接受於5〇〇它加熱處理1分 鐘及於電暈密度300瓦.分鐘/平方米之電暈處理。進一步 於電漿密度20 0瓦·分鐘/平方米接受電漿處理。然後使用 桿塗機將異佛耳酮二胺於甲醇溶液(5%重量比)施加其上及 於7 0°C乾燥1分鐘。然後如比較例3量測所得聚醯亞胺 之黏合強度。 / 、 實例4 0 實例30所得薄膜(10微米)循序接受於5〇(rc加熱處理!分 知及於電暈密度300瓦.分鐘/平方米之電暈處理。然後於450982 V. Description of the invention (69) * ----- As measured in Comparative Example 3, the adhesive strength of the obtained polyimide thin fluorene was measured. Example 37 Example 29 = Film (10 · m) is sequentially accepted at 50 ° (rc force clock and corona density of 300 watts per minute per square meter ;; Plasma density of 2000 watts per minute per square half standard Makeup # / amp 卞 is water-treated with plasma. Then directly measure the adhesion strength of the polyimide film obtained as in Comparative Example 3. Example 38 film and Example 29 film αα micro demand) was sequentially accepted at 500. 〇 plus minutes and corona treatment at corona density_W · min / m2. Further—Use a bar coater to apply isophorone diamine to a methanol solution (5% by weight) and dry it on 70 for 1 minute. Then, the adhesive strength of the obtained polyimide-specific film was measured as in Comparative Example 3. Example 39 The film (10 micrometers) obtained in Example 29 was sequentially subjected to 500 hours of heat treatment for 1 minute and corona treatment at a corona density of 300 W.min / m2. Further, plasma treatment was performed at a plasma density of 200 W · min / m 2. Isophorone diamine was then applied to a methanol solution (5% by weight) using a bar coater and dried at 70 ° C for 1 minute. Then, the adhesion strength of the obtained polyimide was measured as in Comparative Example 3. /, Example 4 0 The film (10 microns) obtained in Example 30 was sequentially subjected to 50 ° C heat treatment! It was known to be corona treated at a corona density of 300 watts per minute per square meter.

450982_ 五、發明說明(70) 電漿密度200瓦·分鐘/平方米接受電漿處理。然後如比較 例3量測所得聚醯亞胺薄膜之黏合強度。 實例41 實例31所得薄膜(1 〇微米)循序接受於5〇〇加熱處理1分 鐘及於電暈密度300瓦·分鐘/平方米之電暈處理。然後於 電藥密度200瓦.分鐘/平方米接受電漿處理。然後如比較 例3量測所得聚醯亞胺薄膜之黏合強度。 實例4 2 實例3 2所得薄膜(1 〇微米)循序接受於5 〇 〇它加熱處理1分 鐘及於電暈密度3〇〇瓦.分鐘/平方米之電暈處理。然後於, 電漿密度200瓦.分鐘/平方米接受電漿處理。然後如比較 例3量測所得聚醯亞胺薄膜之黏合強度。 實例43 貫例33所得薄膜(1〇微米)接受於5〇〇它加熱處理2分鐘。 然後使用桿塗機將異佛耳酮二胺於甲醇溶液(5 %重量比)施 加其上及於70 °C乾燥1分鐘。然後如比較例3量測所得聚醯 亞胺薄膜之黏合強度。 實例44 、實例3 3所得薄膜(1 〇微米)接受於5 〇 〇加熱處理2分鐘。 然後使用桿塗機將二伸乙基三胺於甲醇溶液(5 %重量比)施 加其上及於7 〇。(:乾燥1分鐘。然後如比較例3量測所得聚醯 亞胺薄臈之黏合強度。 實例45 實例33所得溥膜(10微米)接受於500 °C加熱處理1分鐘。450982_ V. Description of the invention (70) Plasma density: 200 W · min / m2 Plasma treatment. Then, the adhesion strength of the obtained polyimide film was measured as in Comparative Example 3. Example 41 The film (10 micrometers) obtained in Example 31 was sequentially subjected to a heat treatment at 5000 for 1 minute and a corona treatment at a corona density of 300 W · min / m 2. Then it was treated with plasma at a density of 200 W.min / m². Then, the adhesion strength of the obtained polyimide film was measured as in Comparative Example 3. Example 4 2 The film (10 microns) obtained in Example 3 2 was sequentially subjected to a heat treatment of 500 minutes and a corona treatment of a corona density of 300 watts per minute per square meter. Then, the plasma density was 200 watts per minute per square meter. Then, the adhesion strength of the obtained polyimide film was measured as in Comparative Example 3. Example 43 The film (10 micrometers) obtained in Example 33 was subjected to 500 heat treatment for 2 minutes. Isophorone diamine was then applied to a methanol solution (5% by weight) using a rod coater and dried at 70 ° C for 1 minute. Then, the adhesion strength of the obtained polyfluoreneimide film was measured as in Comparative Example 3. The films (10 microns) obtained in Examples 44 and 33 were subjected to a heat treatment at 5000 for 2 minutes. Diethylene glycol triamine was then applied to a methanol solution (5% by weight) using a bar coater and then heated to 70%. (: Dry for 1 minute. Then measure the adhesive strength of the obtained polyfluorene imine thin film according to Comparative Example 3. Example 45 The film (10 microns) obtained from Example 33 was subjected to heat treatment at 500 ° C for 1 minute.

88119324.ptd 第74頁 450982 五、發明說明(71) 然後使用才干塗機將N -胺基乙基六氫”比喷於曱醇溶液($ %重 量比)施加其上及於70 °C乾燥1分鐘。然後如比較例3量測 所得聚醯亞胺薄膜之黏合強度。 實例46 實例33所得薄膜(1〇微米)循序接受於5〇〇它加熱處理1分 鐘及於電暈密度300瓦·分鐘/平方米之電暈處理。然後如 比較例3量測所得聚醯亞胺薄膜之黏合強度。 … 實例47 實例33所得薄膜(1〇微米)循序接受於5〇〇艽加熱處理1分 鐘及於電漿密度2000瓦·分鐘/平方米之電漿處理。然後 如比較例3量測所得聚醯亞胺薄膜之黏合強度。 實例48 實例3 3所得薄膜(1 〇微米)循序接受於5 〇 〇它加熱處理^分 鐘及於電暈密度3〇〇瓦.分鐘/平方米之電暈處理。一 於電漿密度2000瓦·分鐘/平方米接受電漿處理。然後如 比較例3量測所得聚醯亞胺薄膜之黏合強度。 、 實例49 實例33所得薄膜(1〇微来)於電漿密度2〇〇〇瓦 方米接受電漿處理。然後如比較例3量 ’ 膜之黏合強度。 亞胺 聚醯亞胺薄膜之製造: 下述程序形成。此 6型聚醯亞胺薄膜(PI薄膜1至6)係藉 等薄膜性質各自以下述方法測定。 (線性膨脹係數)88119324.ptd Page 74 450982 V. Description of the invention (71) Then use a dry coater to spray N-aminoethylhexahydro "onto a methanol solution ($% by weight) and apply it at 70 ° C. 1 minute. Then the adhesive strength of the obtained polyimide film was measured as in Comparative Example 3. Example 46 The film (10 micron) obtained in Example 33 was sequentially subjected to 500. It was heat-treated for 1 minute and at a corona density of 300 watts. Corona treatment per minute / square meter. Then the adhesive strength of the polyfluoreneimide film obtained was measured as in Comparative Example 3.… Example 47 The film (10 microns) obtained in Example 33 was sequentially subjected to a heat treatment at 500 ° C for 1 minute and Plasma treatment at a plasma density of 2000 W · min / m 2 .The adhesive strength of the obtained polyimide film was then measured as in Comparative Example 3. Example 48 The film (10 μm) obtained in Example 3 3 was sequentially accepted at 50%. 〇 It was heat-treated for ^ minutes and corona treatment at a corona density of 300 watts per minute / square meter.-Plasma treatment at a plasma density of 2000 watts per minute / square meter. Then measured as in Comparative Example 3. Adhesive strength of polyimide film. Example 49 The film (10 microliters) obtained in Example 33 was subjected to plasma treatment at a plasma density of 2,000 watt-meters. Then, the adhesive strength of the film was measured as in Comparative Example 3. The imine polyimide film was manufactured as follows: The procedure is to form. This type 6 polyfluorene imide film (PI films 1 to 6) is measured by the following methods based on the properties of each film. (Linear expansion coefficient)

88119324,ptd 第75頁 450982 五、發明說明(72) 於氮氣氣流下,樣本以每分鐘1 0 °c之速率重覆由室溫至 4 0 0 °C加熱且冷卻》然後使用理學電氣公司製造的 TMA-8140測量於20至300 °C之第二加熱步驟之平均線性膨 脹係數。 (吸水膨脹係數) 吸水膨脹係數係以比較例1及實例1至4之相同方式測 定。 (抗拉彈性模量) 抗拉彈性模量係根據ASTM-D882測定。 (吸水性) 吸水性係根據下式測定,其中W1表示於150 °C乾燥30分 鐘後測得薄膜樣本重量,及W2表示浸沒於蒸餾水24小時然 後拔除其表面水滴後測得之樣本重量。 吸水性(%) = (W2-W1)/W1 Χ100。 (PI薄膜-1) DMF引進分離瓶内及10當量〇Da加至其中。所得混合物於 室溫徹底攪拌至0DA完全溶解為止。其次8. 5當量粉狀PMDA 緩慢加入其中接著攪拌40分鐘。然後丨,5當量PMDA溶解於 DMF之溶液緩慢加入其中及所得混合物於冷卻下攪拌1小時 獲得聚醯胺酸於DMF之溶液。DMF之用量可獲得二胺及芳族 四叛酸二酐單基於聚醯胺酸溶液重量之進給濃度為18%重 量比。其次,聚醯胺酸溶液混合AA及丨Q並倒至玻璃板上。 於約100 C乾燥約5分鐘後,由玻璃板上撕離聚醯胺酸薄 膜°然後此膜固定至支架上及經由循序於約3 〇 〇加熱約188119324, ptd Page 75 450982 V. Description of the invention (72) Under nitrogen gas flow, the sample is repeatedly heated and cooled from room temperature to 400 ° C at a rate of 10 ° c per minute "and then manufactured by Rigaku Corporation TMA-8140 measures the average linear expansion coefficient of the second heating step at 20 to 300 ° C. (Coefficient of Water Expansion) The coefficient of water expansion was measured in the same manner as in Comparative Example 1 and Examples 1 to 4. (Tensile elastic modulus) The tensile elastic modulus is measured according to ASTM-D882. (Water absorption) The water absorption was measured according to the following formula, where W1 is the weight of the film sample measured after drying at 150 ° C for 30 minutes, and W2 is the weight of the sample measured after immersion in distilled water for 24 hours and then removing the water droplets on the surface. Water absorption (%) = (W2-W1) / W1 × 100. (PI film-1) DMF was introduced into the separation flask and 10 equivalents of 0 Da were added thereto. The resulting mixture was stirred thoroughly at room temperature until 0DA was completely dissolved. Next, 8.5 equivalents of powdered PMDA was slowly added thereto followed by stirring for 40 minutes. Then, a solution of 5 equivalents of PMDA in DMF was slowly added thereto and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMF. The amount of DMF can be used to obtain a feed concentration of 18% by weight based on the weight of the polyamidic acid solution of diamine and aromatic tetra-acid dianhydride. Second, the polyamic acid solution was mixed with AA and Q and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyamic acid film was peeled off from the glass plate, and then the film was fixed to a stand and heated at about 300 ° C in order.

4 5 09 8 2 五、發明說明(73) 分鐘,於約4 0 0 °C加熱約1分鐘及於約51 0 °C加熱約1分鐘脫 水及環化,如此獲得厚約1 〇微米之聚醯亞胺薄膜。如此所 得聚醯亞胺薄膜顯示線性膨脹係數32ppm,吸水膨脹係數 2 0ppm,彈性模量300千克/平方毫米及吸水性3. 0%。 (PI薄膜-2) DMAc引進分離瓶内及8當量0DA及5當量p-PDA加至其中。 所得混合物於室溫徹底攪拌至ODA及p-PDA完全溶解為止。 其次5當量TMHQ及6. 05當量粉狀PMDA緩慢加入其中接著擾 拌4 0分鐘。然後1. 9 5當量P M D A溶解於DM A c之溶液緩慢加入 其中,所得混合物於冷卻下攪拌1小時獲得聚醯胺酸於 DMAc之溶液。DMAc用量可獲得二胺及芳族四叛酸二酐單體 基於聚醯胺酸溶液重量之進給濃度為1 8%重量比。其次, 聚醯胺酸溶液混合A A及I Q並倒至玻璃板上。於約1 〇 〇它乾 燥約5分鐘後,由玻璃板上撕離聚醯胺酸薄膜。然後此膜 固定至支架上及經由循序於約300 °C加熱約1分鐘,於約 4 0 0 °C加熱約1分鐘及於約51 0 °C加熱約分鐘脫水及環化, 如此獲得厚約1 0微米的聚醯亞胺薄膜。如此所得聚醯亞胺 薄膜顯示線性膨脹係數1 2ppm,吸水膨脹係數7ppm,彈性 模量550千克/平方毫米及吸水性1.0%。 (PI薄膜-3) DMAc引進分離瓶内及12當量ODA及11當量p-PDA加至其 中。所得混合物於室溫徹底攪拌至ODA及p-PDA完全溶解為 止。其次15當量TMHQ及4. 55當量粉狀PMDA緩慢加入其中接 著攪拌40分鐘。然後3. 45當量PMDA溶解於DMF之溶液緩慢4 5 09 8 2 V. Description of the invention (73) minutes, heating at about 400 ° C for about 1 minute and heating at about 5100 ° C for about 1 minute for dehydration and cyclization, thus obtaining a polymer with a thickness of about 10 microns醯 imine film. 0%。 The polyimide film thus obtained showed a linear expansion coefficient of 32 ppm, a water absorption expansion coefficient of 20 ppm, an elastic modulus of 300 kg / mm2 and a water absorption of 3.0%. (PI film-2) DMAc was introduced into the separation bottle and 8 equivalents of 0DA and 5 equivalents of p-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until ODA and p-PDA were completely dissolved. Next, 5 equivalents of TMHQ and 6.05 equivalents of powdered PMDA were slowly added thereto, followed by stirring for 40 minutes. Then, a solution of 1.95 equivalents of P M D A in DMA c was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain the diamine and aromatic tetra-acid dianhydride monomer. The feed concentration based on the weight of the polyamine solution is 18% by weight. Next, the polyamic acid solution was mixed with A A and I Q and poured onto a glass plate. After it was dried for about 5 minutes, the polyamic acid film was peeled off from the glass plate. The film is then fixed to the support and heated sequentially at about 300 ° C for about 1 minute, heated at about 400 ° C for about 1 minute, and heated at about 5100 ° C for about one minute for dehydration and cyclization. 10 micron polyimide film. The polyimide film thus obtained exhibited a linear expansion coefficient of 12 ppm, a water absorption expansion coefficient of 7 ppm, an elastic modulus of 550 kg / mm2, and a water absorption of 1.0%. (PI film-3) DMAc was introduced into a separation bottle and 12 equivalents of ODA and 11 equivalents of p-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until the ODA and p-PDA were completely dissolved. Next, 15 equivalents of TMHQ and 4.55 equivalents of powdered PMDA were slowly added thereto, followed by stirring for 40 minutes. Then 3.45 equivalents of PMDA dissolved in DMF solution slowly

' 45 0982 五、發明說明(74) ' &quot; -- 加入其中’所得混合物於冷卻下攪拌1小時獲得聚醯胺酸 於DMAc之溶液。DMAc用量可獲得二胺及芳族四羧酸二軒翠 體基於聚醯胺酸溶液重量之進給濃度為丨8%重量比。其 次,聚醯胺酸溶液混合AA及19並倒至玻璃板上。於約1〇〇 °C乾燥約5分鐘後’由玻璃板上撕離聚醯胺酸薄膜。然後 此膜固定至支架上及經由循序於約3 〇 〇 °C加熱約1分鐘,於 約4 0 0 °C加熱約1分鐘及於約5 1 〇 t:加熱約1分鐘脫水及環 化’如此獲得厚約10微米的聚醯亞胺薄膜《如此所得聚醯 亞胺薄膜顯示線性膨脹係數丨〇ρριη,吸水膨脹係數4ppm, 彈性模量700千克/平方毫米及吸水性〇 , 8%。 (PI薄膜-4) DMAc引進分離瓶内及4. 5當量ODA及5. 5當量p-PDA加至其 中。所得混合物於室溫徹底攪拌至0DA及p-PDA完全溶解為 止。其次5當量PMDA加入其中接著攪拌40分鐘,然後4· 5當 量TMHQ加入其中接著攪拌4〇分鐘。然後〇· 5當量TMHQ溶解 於DMAc之溶液緩慢加入其中,所得混合物於冷卻下攪拌j 小時獲得聚醯胺酸於DMAc之溶液。DMAc用量可獲得二胺及 芳族四羧酸二酐單體基於聚醯胺酸溶液重量之進給濃度為 18%重量比。其次,聚醯胺酸溶液混合AA及丨〇並倒至玻璃 板上。於約1 0 0 °C乾燥約5分鐘後,由玻璃板上撕離聚醯胺 酸薄膜。然後此膜固定至支架上及經由循序於约3 0 0 °C加 熱約1分鐘,於約4 0 0 °C加熱約1分鐘及於約5 1 0。&lt;:加熱約1 分鐘脫水及環化,如此獲得厚約1 〇微米的聚醢亞胺薄膜。 如此所得聚醯亞胺薄膜顯示線性膨脹係數9ppm,吸水膨脹'45 0982 V. Description of the invention (74)' &quot;-Added to it 'and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain the feed concentration of diamine and aromatic tetracarboxylic acid dixenite based on the weight of the polyamic acid solution is 8% by weight. Next, the polyamic acid solution was mixed with AA and 19 and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyamic acid film was peeled off from the glass plate. The membrane was then fixed to the stent and heated sequentially at about 300 ° C for about 1 minute, at about 400 ° C for about 1 minute, and at about 5 10 t: heating for about 1 minute for dehydration and cyclization ' In this way, a polyimide film having a thickness of about 10 micrometers was obtained. The polyimide film thus obtained showed a linear expansion coefficient of 0ρρη, a water absorption expansion coefficient of 4 ppm, an elastic modulus of 700 kg / mm2, and a water absorption of 0.8%. (PI film-4) DMAc was introduced into the separation bottle and 4.5 equivalents of ODA and 5.5 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until 0DA and p-PDA were completely dissolved. Next, 5 equivalents of PMDA was added, followed by stirring for 40 minutes, and 4.5 equivalents of TMHQ was added, followed by stirring for 40 minutes. Then, 0.5 equivalent of a solution of TMHQ dissolved in DMAc was slowly added thereto, and the resulting mixture was stirred for j hours under cooling to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of diamine and aromatic tetracarboxylic dianhydride monomer based on the weight of the polyamic acid solution of 18% by weight. Next, the polyamic acid solution was mixed with AA and O and poured onto a glass plate. After drying at about 100 ° C for about 5 minutes, the polyurethane film was peeled off from the glass plate. The film was then fixed to the stent and heated sequentially at about 300 ° C for about 1 minute, then at about 400 ° C for about 1 minute and at about 5 1 0. &lt; Dehydration and cyclization by heating for about 1 minute, thus obtaining a polyimide film having a thickness of about 10 microns. The polyimide film thus obtained exhibited a linear expansion coefficient of 9 ppm and swelling upon absorption of water.

88119324.ptd 第78頁 1 ^ ^15 09 8 ? 五、發明說明(75) 係數5ppm,彈性模量630千克/平方毫米及吸水性14%。 (PI薄膜-5) DMAc引進分離瓶内及4當量〇da及2當量p-PDA加至其中。 所得混合物於室溫徹底攪拌至ODA及p_pda完全溶解為止。 其次6當量TMHQ加入其中接箸攪拌4〇分鐘。於加入}當量 - 0DA及3當量p-PDA後,混合物又攪拌4〇分鐘。其次加入3. 5 當量PMDA接著攪拌40分鐘。然後〇. 5當量pMDA溶解於DMAc &quot; 之溶液缓慢加入其中’所得混合物於冷卻下攪拌1小時獲 得聚酿胺酸於DMAc之溶液。DMAc用量可獲得二胺及芳族四 幾酸二野單體基於聚醯胺酸溶液重量之進給濃度為18%重 ) 1比。其次’聚醯胺酸溶液混合AA及I Q並倒至玻璃板上。 於約100 C乾燥約5分鐘後,由玻璃板上撕離聚醯亞胺薄 膜。然後此膜固定支架上及經由循序於約3 〇 〇它加熱約1分 鐘’於約400 °C加熱約1分鐘及於約51〇七加熱約1分鐘脫水 及環化’如此獲得厚約1 〇微米的聚醯亞胺薄膜。如此所得 聚醯亞胺薄膜顯示線性膨脹係數8ppra,吸水膨脹係數姉⑽ ’彈性模量680千克/平方毫米及吸水性〇. 99^ (ΡΙ薄膜-6) DMAc引進分離瓶内及5當量〇DA及5當量p_PDA加至其中。 所得混合物於室溫徹底授拌至〇j)A及p-PDA完全溶解為止。 ) 其次5當量TMHQ加入其中接著攪拌4〇分鐘。於加入4. 5當量 PMDA後所得混合物攪拌4〇分鐘。然後〇, 5當量pMDA溶解於 DMAc之溶液緩慢加入其中,所得混合物於冷卻下攪拌i小 時獲得聚醯胺酸於DMAc之溶液。DMAc用量可獲得二胺及芳88119324.ptd Page 78 1 ^ ^ 15 09 8? 5. Description of the invention (75) The coefficient is 5 ppm, the elastic modulus is 630 kg / mm2 and the water absorption is 14%. (PI film-5) DMAc was introduced into a separation bottle and 4 equivalents of 0 da and 2 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until ODA and p_pda were completely dissolved. Next, 6 equivalents of TMHQ were added and stirred for 40 minutes. After the addition of} equivalent-0DA and 3 equivalents of p-PDA, the mixture was stirred for another 40 minutes. Next, 3.5 equivalents of PMDA was added followed by stirring for 40 minutes. Then 0.5 equivalent of pMDA was dissolved in DMAc &quot; solution was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc can be used to obtain a feed concentration of 18% by weight based on the weight of the polyamidic acid solution of the diamine and the aromatic tetrakisine di-field monomer. Next, the polyamine solution was mixed with AA and I Q and poured onto a glass plate. After drying at about 100 C for about 5 minutes, the polyimide film was peeled off from the glass plate. This film was then fixed on the support and sequentially heated at about 300 ° C for about 1 minute 'heated at about 400 ° C for about 1 minute and heated at about 5107 for about 1 minute for dehydration and cyclization' so as to obtain a thickness of about 1%. Micron polyimide film. The polyimide film thus obtained showed a coefficient of linear expansion of 8 ppra, a coefficient of absorption of water and a coefficient of expansion of 680 kg / mm2 and a water absorption of 0.999 ^ (PI film-6). DMAc was introduced into the separation bottle and 5 equivalents of DA. And 5 equivalents of p_PDA were added to it. The resulting mixture was thoroughly stirred at room temperature until 0j) A and p-PDA were completely dissolved. ) Next add 5 equivalents of TMHQ and stir for 40 minutes. The resulting mixture was stirred for 40 minutes after the addition of 4.5 equivalents of PMDA. Then, a solution of 0.5 equivalent of pMDA in DMAc was slowly added thereto, and the resulting mixture was stirred under cooling for 1 hour to obtain a solution of polyamic acid in DMAc. DMAc dosage can get diamine and aromatic

88119324.ptd 第79頁 4 5 09 8 2 五、發明說明(76) 族四羧酸二酐單體基於聚酿胺酸溶液重量之進給濃度為 1 8 %重量比。其次,聚醯胺酸溶液混合A A及IQ並倒至玻璃 板上。於约lOOt:乾燥約5分鐘後’由玻璃板上撕離聚醯胺 酸薄膜。然後此膜固定至支架上及經由循序於約3 0 0。(:加 熱約1分鐘,於约4 0 0 °C加熱約1分鐘及於約5 1 〇 加熱約1 分鐘脫水及環化,如此獲得厚約1 0微米的聚醯亞胺薄膜。 如此所得聚醯亞胺薄膜顯示線性膨脹係數9ppm,吸水膨脹 係=5ppffl -彈性模量60。千克/平方毫來及吸水性丨.2%。 P I溥膜之處理:88119324.ptd Page 79 4 5 09 8 2 V. Description of the invention (76) The feed concentration of the tetracarboxylic dianhydride monomer based on the weight of the polyamino acid solution is 18% by weight. Next, the polyamic acid solution was mixed with A A and IQ and poured onto a glass plate. At about 100 t: after drying for about 5 minutes', the polyamide film was peeled off from the glass plate. This membrane is then fixed to the stent and is sequentially applied at about 300. (: Heating for about 1 minute, heating at about 400 ° C for about 1 minute, and heating at about 5 100 for about 1 minute for dehydration and cyclization, so that a polyimide film having a thickness of about 10 microns is obtained.醯 imine film shows a linear expansion coefficient of 9ppm, water absorption expansion = 5ppffl-elastic modulus of 60. kg / m2 and water absorption 丨. 2%. Treatment of PI 溥 film:

如此所得P I薄膜接受下列處理。 (處理A) 於500 °C 1分鐘進行加熱處理。 (處理B) 然後於電暈密度300 於50(TC ’ 1分鐘進行加熱處理 瓦.分鐘/平方米接受電暈處理。 (處理C) 分鐘/平方米進行電漿處理。 於電漿密度2〇〇〇瓦 (處理D)The PI film thus obtained was subjected to the following treatments. (Process A) Heat treatment at 500 ° C for 1 minute. (Treatment B) Corona treatment was then performed at a corona density of 300 at 50 (TC '1 minute. Watt-minutes per square meter for corona treatment. (Treatment C) minutes / square meter for plasma treatment. Plasma density was 2 °. 〇〇watt (treatment D)

於50 0 °C ’ 1分鐘進行加熱處 (5%重量比)使用桿塗機施用於 鐘。 理後,異佛耳酮二胺於曱醇 薄膜上及於70 °C乾燥1分 黏合膜之製造: 比較例11 未經處理的p 灌館_ 1 + 4膜-1之一面上施用聚醯胺酸溶液,其為It was heated at 50 ° C ′ for 1 minute (5% by weight) and applied to a bell using a bar coater. After the treatment, the production of isophorone diamine on the methanol film and drying at 70 ° C for 1 minute, the adhesive film was produced: Comparative Example 11 Untreated p Irrigation_ 1 + 4 film-1 Amino acid solution, which is

第80頁 4’ 450982 五、發明說明(77) 熱塑性聚醯亞胺前驅物,具有Tg 19〇t:且 4, 黏 :二苯甲酮四羧酸二酐,3, 3, -4, 4,-乙二醇二苯甲酸酯四 羧酸二酐及2, 2’ -貳(4-(4_胺基苯氧)笨基)丙烷作為主癸 成分於有機溶劑之溶液,接著乾燥獲得厚6〇 單- 合膜。所得薄膜之黏合強度及焊料耐熱性藉^ 法測 量,容後詳述◊結果顯示黏合強度〇1千克力藉=及於 280至300 C之焊料耐熱性「不良」。 比較例1 2 】較ϋ11之程序,但使用已經接受處理A之Π薄膜 人胺ϋ!處理PI薄膜―1之替代品獲得厚60微米之單邊黏 二^ §猎後述方法量測時,勒合膜顯示黏合強度為〇, 3 千克力/厘米。 比較例 1 3 ί較Γ11之程序’但使用已經接受處理β之?1薄膜 =ί;ίΐΡΙ薄膜:1之替代品獲得厚6〇微米之單邊黏 :# Λ /备Γ·」V方法量測時,黏合膜顯示黏合強度為3 干兑力/厘米。Page 80 4 '450982 V. Description of the invention (77) Thermoplastic polyimide precursor with Tg 19〇t: and 4, viscous: benzophenone tetracarboxylic dianhydride, 3, 3, -4, 4 A solution of 2, -ethylene glycol dibenzoate tetracarboxylic dianhydride and 2, 2'-fluorene (4- (4-aminophenoxy) benzyl) propane as the main december component in an organic solvent, followed by drying to obtain Thickness 60 single-composite film. The adhesive strength and solder heat resistance of the obtained film were measured by the method ^, and the details will be described later. The results show that the adhesive strength is 0.01 kgf = the solder heat resistance at 280 to 300 C is "bad". Comparative Example 1 2] The procedure compared to ϋ11, but using the Π film human amine which has been treated with A! Process PI film -1 as an alternative to obtain a 60 μm thick single-sided adhesive ^ § When measuring in the method described later, Le The composite film showed an adhesive strength of 0.3 kgf / cm. Comparative Example 1 3 ΓComparing to Γ11's procedure 'but using β which has already been processed? 1 film = ίΐΡΙ film: a substitute of 1 to obtain a single-sided adhesive with a thickness of 60 μm: # Λ / 备 Γ · ″ When measured by the V method, the adhesive film showed an adhesive strength of 3 dry strength / cm.

比較例U 1 3 11之程序’但使用已經接受處理C之ΡΙ薄膜 1作為未經處理PI薄膜” J替 〇 合膜。告Μ尨、+. tβ 心朁代时獲付厚60微未之早邊黏The procedure of Comparative Example U 1 3 11 'but using PI film 1 which has been treated with C as an untreated PI film' J instead of 0 film. It was reported that the thickness of 60 μm was paid when the heart was replaced. Early Sticky

S力/// 料,黏合膜顯示雜合強度為U 比較例1 5 遵照比較例11之裡序,但使用已經接受處理D之Π薄膜 4 5 09 8 2 五 '發明說明(78) 1 -1作為未經處理PI薄膜-1之替代品獲得厚6〇微来之單邊黏 合膜。當籍後述方法量測時’黏合膜顯示黏合強度為〇 / 千克力/厘米。 ~ 比較例1 6 未經處理的PI -薄膜-1之一面上施用聚醯胺酸溶液,其 為熱塑性聚醯亞胺前驅物,具有Tg 190。(:且含有 、 3, 3’,4, 4’ -二苯甲酮四羧酸二酐’ 3, 3’ -4, 4,-乙二醇二笨 甲酸酯四羧酸二酐及2, 2’ -貳(4-(4-胺基笨氧)苯基)丙烧 作為主要成分於有機溶劑之溶液,接著乾燥獲得厚6〇微&quot;&quot;米 之单邊黏合膜。其次對薄膜之另一面重覆前述程序獲得厚 7 0微米之雙邊黏合膜。所得薄臈之焊料耐熱性係藉後述方 法量測。結果顯示於2 8 0至3 0 0 °C之焊料耐熱性「不良 比較例1 7 」 P E T (聚伸乙基對酞酸酯)薄膜之一面上施用尼龍環氧樹 脂黏合劑及乾燥獲得具有一階段B黏合層之黏合pET薄片 如此所得黏合PET薄片具有厚度1 〇微米。其次未經處理之° PI薄膜-1置於此黏合PET薄片上形成PI薄膜/黏合層/pET 膜順序及於12(TC於5千克力/平方厘米壓力下加熱5秒,如 此獲得單邊黏合薄膜,其中黏合面塗布以PET薄膜。ρΕτ薄 膜係作為黏合面之覆蓋膜且於使用前撕離。所得薄膜之黏 合強度及焊料耐熱性係藉後述方法量測。結果顯示黏人強 度0. 1千克力/厘米及於280至300 °C之焊料耐熱性「不Q 良」。 比較例1 8S force // material, the adhesive film shows a hybrid strength of U. Comparative Example 1 5 Follows the sequence of Comparative Example 11, but uses the Π film that has been treated D 4 5 09 8 2 Five 'Description of the Invention (78) 1- 1 As an alternative to the untreated PI film-1, a unilateral adhesive film with a thickness of 60 micrometers was obtained. When measured by the method described later, the 'adhesive film showed an adhesive strength of 0 / kg force / cm. ~ Comparative Example 16 A polyamic acid solution was applied to one side of the untreated PI-film-1, which was a thermoplastic polyimide precursor and had Tg 190. (: And contains 3, 3 ', 4, 4'-benzophenone tetracarboxylic dianhydride' 3, 3 '-4, 4, -ethylene glycol dibenzate tetracarboxylic dianhydride and 2 , 2'-fluorene (4- (4-aminobenzyloxy) phenyl) propane as a main component in an organic solvent solution, followed by drying to obtain a 60-micrometer &quot; &quot; rice unilateral adhesive film. The other side of the film was repeated to obtain a bilateral adhesive film with a thickness of 70 micrometers. The solder heat resistance of the thin foil obtained was measured by the method described below. The results showed that the solder heat resistance at 280 to 300 ° C was "poor" Comparative Example 17 "Nylon epoxy resin adhesive was applied to one side of PET (polyethylene terephthalate) film and dried to obtain a bonded pET sheet with a one-stage B adhesive layer. The resulting bonded PET sheet had a thickness of 10 microns .Second untreated PI film-1 was placed on this adhesive PET sheet to form a PI film / adhesive layer / pET film sequence and heated at 12 ° C for 5 seconds under a pressure of 5 kgf / cm2 to obtain a single edge. Adhesive film, in which the adhesive surface is coated with PET film. The ρΕτ film is a cover film for the adhesive surface and is torn off before use. The adhesive strength and solder heat resistance of the obtained film were measured by the method described later. The results showed that the adhesive strength was 0.1 kgf / cm and the solder heat resistance at 280 to 300 ° C was "not Q good". Comparative Example 1 8

4 5 09 8 2 五、發明說明(79) ---- 遵照比較例17之程序,但使用已經接受處理A之?1薄臈 一1作為未經處理PI薄臈-1之替代品獲得單邊黏合臈。當藉 後述方法量測時,黏合膜顯示黏合強度為0 3千克力/厘 米0 达較例1 94 5 09 8 2 V. Explanation of the invention (79) ---- Follow the procedure of Comparative Example 17, but use the treatment A that has already been accepted? 1 臈 臈 1 1 is obtained as a substitute for untreated PI 臈 臈 -1. When measured by the method described below, the adhesive film showed an adhesive strength of 0.3 kgf / cm2.

遵照比較例1 7之程序,但使用已經接受處理6 2P丨薄膜_ J 作為未經處理PI薄膜-1之替代品獲得單邊黏合膜。當藉後 述方法量測時,黏合膜顯示黏合強度為〇 . 3千克力/厘米。 达l-M例2 0 、 遵照比較例1 7之程序,但使用已經接受處理c之?丨薄膜 -1作為未經處理PI薄膜-1之替代品獲得單邊黏合膜。當藉 後述方法量測時,黏合膜顯示黏合強度為〇.4千克力/厘 遵照比較例1 7之程序’但使用已經接受處理D之p I薄膜 1作為未經處理PI薄膜-1之替代品獲得單邊黏合膜。當藉 述方法量測時,黏合膜顯示黏合強度為〇. 4千克力/厘 米。The procedure of Comparative Example 17 was followed, but using the 6 2P 丨 film_J that had been treated as an alternative to the untreated PI film-1 to obtain a single-sided adhesive film. When measured by the method described later, the adhesive film showed an adhesive strength of 0.3 kgf / cm. Up to l-M example 20, follow the procedure of comparative example 17, but use the already accepted treatment c?丨 Film -1 As a substitute for untreated PI film-1, a unilateral adhesive film was obtained. When measured by the method described below, the adhesive film showed an adhesive strength of 0.4 kgf / cm, following the procedure of Comparative Example 17 ', but using p I film 1 which has been treated with D as an alternative to untreated PI film-1. Product to obtain a single-sided adhesive film. When measured by the method described above, the adhesive film showed an adhesive strength of 0.4 kgf / cm.

介於比較例1 7使用之兩片黏合pet薄片間插入未經處理 薄膜-1,如此呈PET薄膜/黏合層/π薄膜/黏合層/pET :膜之順序。於120。(:於5千克力/平方厘米壓力下加熱5秒 ,’獲得雙邊黏合膜,其中兩面皆塗布以PET薄膜。所得 屢膜之焊料耐熱性係藉後述方法量測。結果顯示於2 8 0至The untreated film-1 was inserted between the two adhesive pet sheets used in Comparative Example 17 in the order of PET film / adhesive layer / π film / adhesive layer / pET: film. At 120. (: Heating at 5 kgf / cm2 for 5 seconds, to obtain a double-sided adhesive film, in which both sides are coated with PET film. The solder heat resistance of the obtained repeated film was measured by the method described later. The results are shown in 280 to

第83頁 450982Page 83 450982

300 C之焊料耐熱性r不戸 實例50 又 遵照比較例11之種序但使 經處理之ΡΙ薄膜-1之替代品 膜。當藉後述方法量測時, 「良好」焊料耐熱性。 實例51 用未經處理之Ρ I薄膜-2作為 因而獲得厚60微米之單邊黏 黏合膜顯示於280 °C至300。〇 未 合 之 遵照比較例1 1之程序但使用 經處理之PI薄膜-1之替代品因 膜。當藉後述方法量測時,黏 「良好」悍料耐熱性。 實例52 未經處理之Ρ I薄膜-3作為未 而獲得厚60微米之單邊黏合 合膜顯示於280 °C至300 °C之 遵照比較例11之程序但使用未經處理之ρ〖薄膜_4作為未 經處理之ΡΙ薄膜-1之替代品因而獲得厚6〇微米之單邊黏合 膜。當藉後述方法量測時,黏合膜顯示於28〇艺至3〇〇 C之 「良好」焊料耐熱性。 實例53 遵照比較例11之程序但使用未經處理之ρ I薄膜_ 5作為未 經處理之ΡΙ薄臈-1之替代品因而獲得厚60微米之單邊黏合 膜。當藉後述方法量測時,黏合膜顯示於280 °C至300 °C之 「良妤」焊料耐熱性。 實例54 遵照比較例1 1之程序但使用未經處理之p I薄膜-6作為未 經處理之PI薄膜-1之替代品因而獲得厚60微米之單邊黏合The solder heat resistance r of 300 C was not high. Example 50 The same procedure as in Comparative Example 11 was followed, but a treated PI film-1 was used instead. When measured by the method described below, "good" solder heat resistance. Example 51 The untreated PI film-2 was used as a single-sided adhesive film thus obtaining a thickness of 60 µm, which was shown at 280 ° C to 300 ° C. 〇 Not applicable Follow the procedure of Comparative Example 11 but use the treated PI film-1 as a replacement film. When measured by the method described below, the sticky "good" material has heat resistance. Example 52 Untreated PI film-3 was obtained as a single-sided adhesive film with a thickness of 60 micrometers. Shown at 280 ° C to 300 ° C. Followed the procedure of Comparative Example 11 but used untreated ρ 〖film_ As an alternative to the untreated PI film-1, a single-sided adhesive film with a thickness of 60 microns was thus obtained. When measured by the method described below, the adhesive film showed "good" solder heat resistance from 28 ° C to 300 ° C. Example 53 The procedure of Comparative Example 11 was followed but using untreated ρ I film _ 5 as a substitute for untreated PI thin film -1 and thus a single-sided adhesive film having a thickness of 60 µm was obtained. When measured by the method described below, the adhesive film shows the "good" solder heat resistance of 280 ° C to 300 ° C. Example 54 The procedure of Comparative Example 11 was followed but using untreated p I film-6 as a substitute for untreated PI film-1 thus obtaining a 60 μm thick single-sided adhesive

88119324.ptd 第 84 頁 4 5 09 8 2 五、發明說明(81) 膜。當藉後述方法 力/厘米及於280 °C 實例5 5 遵照比較例11之 作為未經處理之PI 邊黏合膜。當藉後 9千克力/厘米。 實例5 6 遵照比較例11之 作為未經處理之PI 邊黏合膜。當藉後 1千克力/厘米。 實例57 遵照比較例11之 作為未經處理之PI 邊黏合膜。當藉後 1. 2千克力/厘米β f例58 遵照比較例1 1之 作為未經處理之PI 邊黏合膜。當藉後 3千克力/厘米。 复例5 9 量測時,黏 至3 0 0°C之 程序但使用 薄膜-1之替 述方法量測 程序但使用 薄膜-1之替 述方法量測 # # 使用 薄膜-1之智; 述方法量琪1】 合膜顯示黏合強度0· 2千克 「良好」焊料耐熱性。 已經接受處理A之PI薄膜 代品因而獲得厚6 〇微米之單 時’黏合膜顯示黏合強度〇. 程序但使用已經接受處理薄膜_6 薄膜-1之替代品因而獲得厚6〇微米之單 述方法量測時’黏合膜顯示黏合強度}. 已經接受處理C之PI薄膜-6 代品因而獲得厚60微米之單 時,黏合膜顯示黏合強度 已經接受處理D之P I薄膜—6 代品因而獲得厚60微米之單 時,黏合臈顯示黏合強度1, 遵照比較例1 6之程序但使用 未經處理之PI薄膜-2作為未88119324.ptd Page 84 4 5 09 8 2 V. Description of the invention (81) Membrane. Using the method described later Force / cm and at 280 ° C Example 5 5 Follow Comparative Example 11 as an untreated PI edge adhesive film. When borrowed 9 kgf / cm. Example 5 6 Followed Comparative Example 11 as an untreated PI edge adhesive film. When borrowed 1 kgf / cm. Example 57 Followed Comparative Example 11 as an untreated PI edge adhesive film. When borrowed 1.2 kgf / cm β f Example 58 Followed Comparative Example 11 as an untreated PI edge adhesive film. When borrowed 3 kgf / cm. Repeat Example 5 9 When measuring, the procedure of sticking to 300 ° C but using the alternative method of film-1 is used to measure the program but using the alternative method of film-1 is used to measure # # Use the wisdom of film-1; Method No. 1] The composite film showed an adhesive strength of 0.2 kg and "good" solder heat resistance. The PI film substitute that has already been treated with A thus obtains a single thickness of 60 microns. The adhesive film shows the adhesive strength. The procedure but uses the alternative that has been treated with thin film_6 thin film-1 and thus obtains a single description of 60 microns thick. Method for measuring the 'adhesive strength of the adhesive film}. When the PI film -6 of the C film that has been treated has received a 60 micron thick sheet, the adhesive film shows that the PI film of the D film -6 has been treated and thus obtained When the thickness is 60 μm, the adhesive layer shows an adhesive strength of 1, following the procedure of Comparative Example 16 but using an untreated PI film-2 as

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Mr WN kr My H 為♦ J m 6 0寒诛 琴 2000 。&lt; /^— Q ^ΓΓ栖槔·如命 rfo ·to-f-冲 β ο f Ά. 3 0 0 on 4 5 0982 五、發明說明(84) .實例6 9 遵照比較例17之裎序但使用 作為未經處理之p I薄臈—1之替 邊黏合膜。當藉後述方法量測 1 · 1千克力/厘米。 實例7 0 遵照比較例1 7之種序但使用 作為未經處理之P I薄膜_丨之替 邊黏合膜。當藉後述方法量測 1. 2千克力/厘米。 f例71 遵照比較例1 7之程序但使用 作為未經處理之P I薄膜—i之替 邊黏合膜。當藉後述方法量測 1. 4千克力/厘米。 、 實例72 遵照比較例2 2之程序但使用 作為未經處理之PI薄臈〜丨之替 邊黏合膜。當藉後述方法量琪4 1. 3千克力/厘米。 彳 實例73 遵照比較例2 2之程序但使用 經處理之PI薄膜-1之替代品因 膜。當藉後述方法量測時,黏 已經接受處理A之PI薄膜一6 代品因而獲得厚6 0微米之單 時’勘合膜顯示黏合強度 已經接受處理B之PI薄膜_6 代品因而獲得厚6 0微米之單 時’黏合膜顯示黏合強度 已經接受處理c之PI薄膜 代品因而獲得厚60微米之單 時’黏合膜顯示黏合強度 已經接受處理D之PI薄膜-6 代品因而獲得厚70微米之單 時’黏合膜顯示黏合強度 未經處理之PI薄膜-2作為未 而獲得厚70微米之單邊黏合 合膜顯示於280。(:至30(TC之Mr WN kr My H is ♦ J m 60 0 Han Qin 2000. &lt; / ^ — Q ^ Γ 槔 槔 如 命 rfo · to-f-rush β ο f Ά. 3 0 0 on 4 5 0982 V. Description of the invention (84). Example 6 9 Follow the sequence of Comparative Example 17 However, it is used as an untreated p I thin 臈 -1 substitute edge adhesive film. Measure 1 · 1 kgf / cm by the method described below. Example 70 Followed the procedure of Comparative Example 17 but used as an untreated PI film. When measuring by the method described below 1.2 kgf / cm. f. Example 71 The procedure of Comparative Example 17 was followed but used as an untreated PI film—i instead of an edge-adhesive film. When measuring by the method described below 1.4 kgf / cm. Example 72 The procedure of Comparative Example 22 was followed but used as an untreated PI thin film. We shall measure Qi 4 1.3 kgf / cm by the method described later. 73 Example 73 The procedure of Comparative Example 2 2 was followed but a substitute film of treated PI film-1 was used. When measured by the method described below, the PI film that has been treated with A has been replaced with a 6-generation product and thus has a thickness of 60 micrometers. The 'combined film shows that the adhesive strength has been treated with the PI film with B._6 The product has obtained a thickness of 6 A single time of 0 micron 'adhesive film shows the adhesive strength has been treated with the PI film substitute of c and thus obtains a single thickness of 60 micrometers. A single time' adhesive film has an adhesive strength of the PI film which has received the treatment of D film-6 and thus has a thickness of 70 microns The single-time 'adhesive film showed adhesive strength. The untreated PI film-2 was shown at 280 as a single-sided adhesive film with a thickness of 70 microns. (: To 30 (TC of

88119324.ptd 第88頁 45 09 8 2 五、發明說明 「良好」焊料耐熱性。 實例74 遵照比較例22之程序但使用未經處理之ρι薄膜_3作為未 經處理之PI薄膜-;[之替代品因而獲得厚7 〇微米之單邊黏合 膜。當藉後述方法量測時,黏合膜顯示於2 8 〇。匸至3 〇 〇 t 「良好」焊料耐熱性。 實例75 遵照比較例22之程序但使用未經處理之ρι薄膜_4作為未 經處理之P/I薄膜-丨之替代品因而獲得厚7〇微米之單邊黏合 膜。當藉後述方法量測時,黏合膜顯示於28〇 t至3〇〇 t之 「良好」焊料耐熱性。 實例76 遵照比較例2 2之程序但使用未經處理之ρ I薄膜„ 5作為未 經處,之ΡΙ薄膜―1之替代品因而獲得厚70微米之單邊黏合 膜。▲藉後述方法量測時,黏合膜顯示於2 8 〇 t至3 〇 〇它之 良好」知料耐熱性。 實例77 遵照比較例22之程序但使用未經處理之pi薄膜_6作為未 經處理之PI薄膜—丨之替代品因而獲得厚γ〇微米之單邊黏合 膜。當藉後述方法量測時,黏合膜顯示於2 8 〇 °c至3 〇 〇 t:之 良好」4料耐熱性。 黏合膜之黏合強度及焊料耐熱性之量測方法: 首先銅箱(電解銅箱3EC_VLp,35微米,三井礦冶公司製 造)黏合至比較例11至22及實例50至77所得之各黏合膜,88119324.ptd Page 88 45 09 8 2 V. Description of the invention "Good" solder heat resistance. Example 74 The procedure of Comparative Example 22 was followed but an untreated PI film_3 was used as the untreated PI film-; an alternative to this resulted in a single-sided adhesive film with a thickness of 70 microns. When measured by the method described later, the adhesive film was shown at 20.8.匸 to 300 t "Good" solder heat resistance. Example 75 The procedure of Comparative Example 22 was followed but using an untreated p_4 film as an alternative to an untreated P / I film-thus obtaining a single-sided adhesive film having a thickness of 70 µm. When measured by the method described later, the adhesive film showed a "good" solder heat resistance of 280 to 300 t. Example 76 The procedure of Comparative Example 2 2 was followed but an untreated ρ I film „5 was used as an alternative to the PI film -1 without a process, so a single-sided adhesive film with a thickness of 70 μm was obtained. ▲ Measured by the method described later At this time, the adhesive film showed good performance from 280 to 3,000. Example 77 The procedure of Comparative Example 22 was followed but an untreated PI film_6 was used as an alternative to the untreated PI film-thereby obtaining a single-sided adhesive film having a thickness of γ0 µm. When measured by the method described below, the adhesive film showed a temperature of 2800 ° C to 300 t: good. 4) Heat resistance. Measurement method of adhesive strength and solder heat resistance of the adhesive film: First, a copper box (electrolytic copper box 3EC_VLp, 35 microns, manufactured by Mitsui Mining and Metallurgy Co., Ltd.) was bonded to each of the adhesive films obtained in Comparative Examples 11 to 22 and Examples 50 to 77.

45 09 8 2 五、發明說明(86) 選擇方式係依據採用的黏合層類型及薄膜類型(亦即單面 或雙面)而由下列各種方法中選用適當黏合方法。 (一面含有熱塑性聚醯亞胺層之黏合膜:比較例丨〗至〗5及實 例5 0至5 8 ) 單邊黏合膜置於銅箱(電解銅猪3EC〜VLp,35微米,三井 礦冶公司製造)上並使用熱壓機(3〇千克力/平方厘米,24〇 °C ’ 20分鐘)熱壓黏合獲得PI薄膜/熱塑性聚醯亞胺/銅箔 組成的三層層合物。 (兩面含有熱塑性聚醯亞胺層之黏合膜:比較例16及 至63) 鋼箔(電解銅箔3EC-VLP,35微米,三井礦冶公司製造) 置於黏合臈兩面上,使用熱壓機(3〇千克力/平方厘米, 240 °C 20分鐘)熱壓黏合獲得鋼箔/熱塑性聚醯亞胺邡工薄 膜/熱塑性聚醯亞胺/銅箔組成的五層層合物。 (一面含有熱固性黏合層之黏合膜:比較例17至以及實例Μ 於撕離作為覆蓋膜之PET薄膜後’單邊黏合膜置 (電解鋼箱3EC-VLP,35微米,三井礦冶公司製造)上=白 用熱壓,(10*千克力/平方厘米,12(rc,丨分鐘)初步熱壓 2 :獲得PI薄膜/尼龍環氧樹脂黏合劑/銅箔組成的三層層 口 。其次如此所得三層層合物以三步驟加埶(丨2 0。曰 4小時,12(rc 4小時)完成尼龍環 劑的硬化。 衣乳钳知黏合 兩面含有熱固性黏合層之黏合膜:比較例22及實例巧至45 09 8 2 V. Description of the invention (86) The selection method is based on the type of adhesive layer and film type used (that is, single-sided or double-sided), and the appropriate bonding method is selected from the following methods. (Adhesive film containing thermoplastic polyimide layer on one side: Comparative Examples 丨〗 〖5〗 and Examples 50 to 5 8) Single-sided adhesive film was placed in a copper box (electrolytic copper pig 3EC ~ VLp, 35 microns, Mitsui Mining and Metallurgy (Manufactured by the company) and thermocompression bonded using a hot press (30 kgf / cm2, 24 ° C '20 minutes) to obtain a three-layer laminate consisting of a PI film / thermoplastic polyimide / copper foil. (Adhesive film containing thermoplastic polyimide layer on both sides: Comparative Examples 16 and 63) Steel foil (electrolytic copper foil 3EC-VLP, 35 micron, manufactured by Mitsui Mining and Metallurgy Co., Ltd.) was placed on both sides of the adhesive concrete, using a hot press ( 30 kgf / cm2, 240 ° C for 20 minutes) hot-pressed to obtain a five-layer laminate consisting of steel foil / thermoplastic polyimide masonry film / thermoplastic polyimide / copper foil. (Adhesive film with a thermosetting adhesive layer on one side: Comparative Examples 17 to and Example M. After tearing off the PET film as a cover film, a single-sided adhesive film was placed (electrolytic steel box 3EC-VLP, 35 microns, manufactured by Mitsui Mining & Metallurgy) Top = hot pressing with white, (10 * kgf / cm2, 12 (rc, 丨 minutes) preliminary hot pressing 2: obtaining three layers of PI film / nylon epoxy adhesive / copper foil. Secondly, so The obtained three-layer laminate was cured in three steps (20 hours, 4 hours, 12 (rc 4 hours)) to complete the hardening of the nylon ring agent. A pair of adhesive films with a thermosetting adhesive layer on both sides of the adhesive was known: Comparative Example 22 And examples

45 09 B 2 五、發明說明(87) 77) 於撕離作為覆蓋膜之PET薄膜後,銅箔(電解銅箔3EC-VLP,35微米,三井礦冶公司製造)置於雙邊黏合膜兩面上 並使用熱壓機(10千克力/平方厘米,120 °C,1分鐘)初步 熱壓黏合獲得銅箔/尼龍環氧樹脂黏合劑/PI薄膜/尼龍環 氧樹脂黏合劑/銅箔組成的五層層合物。其次如此所得五 層層合物以二步驟加熱(12〇°c 4小時,160°C 4.小時,12〇 eC 4小時)因而完成尼龍環氧樹脂黏合劑的硬化。 如此所付之各鋼包被層合物係藉下列方法評估黏合強度 及焊料耐熱性。 (黏合強度) 黏合強度係根據JIS 6472-1 995-(8)規定之方法測量。 (焊料耐熱性)45 09 B 2 V. Description of the invention (87) 77) After tearing off the PET film as the cover film, copper foil (electrolytic copper foil 3EC-VLP, 35 micron, manufactured by Mitsui Mining and Metallurgy Co., Ltd.) was placed on both sides of the bilateral adhesive film Five pieces of copper foil / nylon epoxy resin adhesive / PI film / nylon epoxy resin adhesive / copper foil were obtained by preliminary hot pressing using a hot press (10 kgf / cm2, 120 ° C, 1 minute). Layer laminate. Secondly, the five-layer laminate thus obtained was heated in two steps (4 hours at 120 ° C, 4 hours at 160 ° C, 4 hours at 120 eC) to complete the hardening of the nylon epoxy resin adhesive. The thus-obtained steel-clad laminates were evaluated for adhesion strength and solder heat resistance by the following methods. (Adhesive strength) The adhesive strength is measured according to the method specified in JIS 6472-1 995- (8). (Solder heat resistance)

知料耐熱性係於原先狀態評估。鋼包被層合物切成塊狀 (20毫米X50毫米)並飄浮於280或300 °C溶化焊料上1分 鐘。其次蝕刻去除銅箱並觀察發泡。不含任何異常(發刀 泡、起縐、裂開、撕離、變形等)的樣本評估為、「良X =有異ί(發泡、起罐、裂開、撕離、變形等)的樣本 汁估為|不良」。It is known that the heat resistance is based on the original state evaluation. The ladle laminate was cut into blocks (20 mm x 50 mm) and floated on 280 or 300 ° C melted solder for 1 minute. The copper box was then removed by etching and the foam was observed. Samples that do not contain any abnormalities (hair blistering, creping, cracking, tearing, deformation, etc.) are evaluated as "good X = different (foaming, canning, cracking, tearing, deformation, etc.) Sample juice was evaluated as | bad. "

表9摘述比較例1丨至22及實例5〇至77之樣本之 資料及焊料耐熱性評估結果。 '強XTable 9 summarizes the data of the samples of Comparative Examples 1 to 22 and Examples 50 to 77 and the results of solder heat resistance evaluation. 'Strong X

88119324.ptd 第91頁 450982 五、發明說明(88) 表88119324.ptd Page 91 450982 V. Description of Invention (88) Table

PI薄膜 處理 面 黏合劑 黏合強度 ί千克力/ 焊料耐熱性 厘米) 28 0 °C 30 0 PC 比較例 1 1 無 單面 ΤΡΙ 0.1 不良 不良 比較例 12 A 單面 ΤΡΙ 0.3 比較例 13 E 單面 ΤΡΙ 0.3 比較例 14 C 單面 ΤΡΙ 0.3 比較例 15 1 D 單面 ΤΡΙ 0.3 不 良 不良 比較例 16 無 雙面- TPJ 不 良 不良 比較例 1 7 無 單面 ΝΗ 0.1 比較例 18 A 單面 ΝΕ 0.3 比較例 1 9 B 單面 ΝΕ 0,3 比較例 20 C 單面 ΝΕ 0.4 比較例 2 1 1 D 單面 ΝΕ 0.4 比較例 22 1 無 雙面 ΝΕ 不 良 不良 實例 50 2 無 單面 ΤΡΙ 良好 良好 實例 51 3 無 單面 ΤΡΙ 良 好 良好 實例 52 4 無 單面 ΤΡΙ 良 好 良好 實例 53 5 無 單面 ΤΡΙ 良 好 良好 實例 54 6 無 單面 ΤΡΙ 0.2 良 好 良好 實例 55 6 A 單面 ΤΡΙ 0.9 實例 56 6 B 單面 ΤΡΙ 1 .1 實例 57 6 C 單面 ΤΡ1 1.2 實例 58 6 D 單面 ΤΡΙ 1.3 實例 59 2 無 雙面 ΤΡΙ 良 好 良好 實例 60 3 無 雙面 ΤΡΙ 良 好 良好 實例 61 4 Μ 雙面 ΤΡΙ 良 好 良好 實例 62 5 無 雙面 ΤΡΙ 良 好 良好 實例 63 6 無 雙面 ΤΡΙ 良好 良好 實例 64 2 無 單面 ΝΕ 良 好 良好 實例 65 3 無 單面 ΝΕ 良 好 良好 實例 66 4 無 單面 ΝΕ 良好 良好 實例 67 5 無 單面 ΝΕ 良 好 良好 實例 68 6 無 單面 ΝΕ 0.2 良 好 良好 88119324.ptd 第92頁 45 09 8 2PI film surface adhesive strength (kg force / solder heat resistance cm) 28 0 ° C 30 0 PC Comparative Example 1 1 No single-sided TPI 0.1 Poor Poor Comparative Example 12 A Single-sided TPI 0.3 Comparative Example 13 E Single-sided TPI 0.3 Comparative Example 14 C Single-sided TPI 0.3 Comparative Example 15 1 D Single-sided TPI 0.3 Defective Poor Comparative Example 16 No double-sided-TPJ Poor Defective Comparative Example 1 7 No single-sided ΝΗ 0.1 Comparative Example 18 A Single-sided Ε 0.3 Comparative Example 1 9 B Single-sided NE 0, 3 Comparative Example 20 C Single-sided NE 0.4 Comparative Example 2 1 1 D Single-sided NE 0.4 Comparative Example 22 1 No Double-sided NE E Bad Example 50 2 No Single-sided TPI Good Good Example 51 3 No Single-sided TPI Good Good Examples 52 4 Single-sided TPI Good Good Example 53 5 Single-sided TPI Good Good Example 54 6 Single-sided TPI 0.2 Good Good Example 55 6 A Single-sided TPI 0.9 Example 56 6 B Single-sided TPI 1. 1.1 Example 57 6 C single-sided TP1 1.2 Example 58 6 D single-sided TPI 1.3 Example 59 2 None Good examples of double-sided TPI 60 3 Good examples of double-sided TPI Good examples 61 4 Μ Double-sided TPI Good examples 62 5 No double-sided TPI Good examples 63 6 No double-sided TPI Good examples 64 2 No single-sided ΕΕ Good example 65 3 No single-sided ΝΕ Good good example 66 4 No single-sided ΝΕ Good good example 67 5 No single-sided ΝΕ Good good example 68 6 No single-sided Ν0.2 Good Good 88119324.ptd Page 92 45 09 8 2

五、發明說明(89) 實例69 '---— 5 A 單面 NE 1,1 ®例7 0 6 B 單面 NE 1.2 實例71 6 C 單面 NE 1.4 實例72 6 D 單面 NE 1.3 «例73 2 無 雙面 NE 良好 良好 實例74 3 無 雙面 NE 良好 良好 實例75 4 無 雙面 NE 良好 良好 實例76 5 一 雙面 NE 良好 良好 實例77 6 無 雙面 NE 良好 良好 TPI:熱塑性聚醯亞胺。 N E :尼龍環氧樹腊勘合劑。 比較例2 3 DMAc引進分離瓶内及於其中加入1當量〇DA及3當量 p-PDA °所得混合物於室溫徹底攪拌至〇1^及贮⑼八完全溶 解為止。其次3. 5當量粉狀PMDA緩慢加入其中接著攪拌40 分鐘。然後0. 5當量pmda溶解於DMAc之溶液緩慢加入其 中’所得湛•合物擾拌1小時獲得聚醯胺酸於MAc之溶液。 DMAc用里可獲知二胺及芳族四羧酸二酐 18%重量比。 馬 遵照實例1之程序獲得厚25,5〇及75微米薄膜 疋至框架後’於下述條件下進行加熱: 厚2 5微米薄膜: 100°C 5 分鐘及300。(: 厚50微米薄膜: 4〇〇 °C 及510 °C 各30 秒; _l^jog B 2___ 五、發明(go) _----- 10〇C 5 分鐘及 300 °c,4〇〇°c 及 510°C 各 6〇 秒· 厚75微米薄膜: ’ 100 °C 5 分鐘及30 0 °c,40 0 t:及510。(:各90 秒. AJ178 遵,實例4程序獲得厚25,50及75微米薄膜。 固定至框架後’於下述條件下進行加熱: 厚2 5微米薄膜: °C 5 分鐘及30 0 °C,40 0 °C 及510 °C 各30 秒; 厚5 0微米薄膜: 100°C 5 分鐘及 300 °c,40(TC 及 510。(:各 60 秒; 厚7 5微米薄膜: 100 °C 5 分鐘及300 °c,40 0 °C 及510 t 各90 秒; 經由使用比較例23及實例78所得薄膜,根據曰本工業標 準(J I S)對水蒸氣透過性及透氣性作量測。量測水蒸氣透 過性之溫度相關性時使用厚2 5微米薄膜。表1 〇至1 2顯示其 結果。 表10 水蒸氣透過性:J IS 0 2 0 8 (杯方法)4 0 °C,9 0 %相對濕度 (克/平方3 民· 24小時) 實例78 比較例23 2 5微米 8.5 60 50微米 5.0 —--— - 38 75微米 | 3. 4V. Description of the invention (89) Example 69 '--- 5 A single-sided NE 1,1 ® example 7 0 6 B single-sided NE 1.2 example 71 6 C single-sided NE 1.4 example 72 6 D single-sided NE 1.3 «example 73 2 Good examples without double-sided NE 74 3 Good examples without double-sided NE 75 4 Good examples without double-sided NE 76 5 Good examples without double-sided NE 77 6 Good examples without double-sided NE Good TPI: thermoplastic polyimide. N E: Nylon epoxy resin wax mixture. Comparative Example 2 3 DMAc was introduced into a separation bottle and 1 equivalent of 0DA and 3 equivalents of p-PDA ° were added to the mixture. The resulting mixture was thoroughly stirred at room temperature until 0 ^^ and storage was completely dissolved. Next, 3.5 equivalents of powdered PMDA was slowly added thereto followed by stirring for 40 minutes. Then, 0.5 equivalent of a solution of pmda dissolved in DMAc was slowly added thereto and the obtained Zhan compound was stirred for 1 hour to obtain a solution of polyamic acid in MAc. In DMAc, 18% by weight of diamine and aromatic tetracarboxylic dianhydride are known. Ma Followed the procedure of Example 1 to obtain 25, 50 and 75 micron thick films. After reaching the frame ', the film was heated under the following conditions: 25 micron thick film: 100 ° C for 5 minutes and 300. (: 50 micron thick film: 400 ° C and 510 ° C for 30 seconds each; _l ^ jog B 2___ V. Invention (go) _----- 100 ° C for 5 minutes and 300 ° C, 400 ° 60 seconds each at ° c and 510 ° C · 75 micron thick film: '100 ° C for 5 minutes and 30 0 ° c, 40 0 t: and 510. (: 90 seconds each. AJ178 compliance, Example 4 procedure to obtain a thickness of 25 , 50 and 75 micron film. After fixing to the frame, 'heated under the following conditions: 25 micron thick film: ° C 5 minutes and 30 0 ° C, 40 0 ° C and 510 ° C 30 seconds each; thickness 5 0 micron film: 100 ° C for 5 minutes and 300 ° c, 40 (TC and 510. (: 60 seconds each; thickness of 75 micron film: 100 ° C for 5 minutes and 300 ° c, 40 0 ° C and 510 t each 90 seconds; By using the films obtained in Comparative Example 23 and Example 78, the water vapor permeability and air permeability were measured according to the Japanese Industrial Standard (JIS). When measuring the temperature dependence of water vapor permeability, use a thickness of 2 5 microns Film. Tables 1 to 12 show the results. Table 10 Water vapor permeability: J IS 0 2 0 8 (cup method) 40 ° C, 90% relative humidity (g / sq. 3 min. 24 hours) Example 78 Comparative Example 23 2 5 μm 8.5 60 50 microns 5.0 ------38 75 microns | 3. 4

45 09 8 245 09 8 2

水蒸氣透過性(溫度/水分相關性):JIS z〇2〇8(杯方法) __ (克/平方米.24小時) 實例78 比較例2 3 25 t , 90% 3. 4 30 4 0 °C,9 0% 7· 6 60 60 °C - 90% 18 130 85 〇C,85% 57 300 衣Water vapor permeability (temperature / moisture correlation): JIS z〇2〇8 (cup method) __ (g / m2. 24 hours) Example 78 Comparative Example 2 3 25 t, 90% 3. 4 30 4 0 ° C, 9 0% 7. 6 60 60 ° C-90% 18 130 85 〇C, 85% 57 300 clothing

I C 透氧性:JIS K7126A方法) (立方厘米/平 方米.24小時.; 實例78 ~— 比較例2 3 2 5微米 18 ~~” 150 5 0微米 11 7 5 .7 5微米 8,3 - 5 5 大氣壓) (1)水蒸氣透過性: 當基底膜具有高吸水性及高水蒸氣透過性時,其介 數改變而FPC之電氣特性也改變。通常電路設計係考;電常 氣特性之變化範圍。但考慮此等變化之較為寬廣範圍將^員 更為威格縮小F P C的大小及厚度。以雙層jT p c為丨列 特另丨亩 接接觸鋼的基底膜容易受到吸水性影響。因此用於雙層 FPC之基底膜具有低吸水性及低水蒸氣透過性高度重要。IC oxygen permeability: JIS K7126A method) (cubic centimeter / square meter. 24 hours .; Example 78 ~ — Comparative Example 2 3 2 5 microns 18 ~~ ”150 5 0 microns 11 7 5 .7 5 microns 8,3- 5 5 Atmospheric Pressure) (1) Water vapor permeability: When the base film has high water absorption and high water vapor permeability, its dielectric constant changes and the electrical characteristics of the FPC also change. Usually the circuit design is considered; The range of change. However, considering the wider range of these changes, we will reduce the size and thickness of FPC. We will use double-layered jT pc as the base film and contact the steel with susceptibility to water absorption. Therefore, it is highly important that the base film used for the double-layer FPC has low water absorption and low water vapor transmission.

88119324.ptd 第95頁 45 09 8 2 五、發明說明(92) ' — (2 )透氧性: 當氧由基底膜邊穿透三層FPC時’偶爾出現由於黏合劑 劣化而黏合失敗問題。它方面,以雙層FPC為例,由於銅 劣化故電氣特性受損。因此希望使用具有低透氧性之聚醯 亞胺薄膜。 比較例24 DMAc引進分離瓶内及於其中加入1當量及2當量 P-PDA。所得混合物於室溫徹底攪拌至〇DA &amp;p_pDA完全溶 解為止。其次2. 5當量粉狀TMHQ緩慢加入其中接著攪拌4〇 刀鐘。然後0. 5當量TMHQ溶解於DMAc之溶液緩慢加入其中, 及所得混合物攪拌1小時獲得聚醯胺酸於DMAc之溶液。 DMAc之用量為獲得二胺及芳族四羧酸二酐單體之進給濃度 為18%重量比。 其次遵照實例1程序獲得厚約】〇微米之聚醯亞胺薄膜。 feA 例 2 5 DMAc引進分離瓶内及於其中加入2當量〇DA及3當量p_pD a 。所得ί昆合物於室溫徹底攪拌至〇DA及ρ_ΡΜ完全溶解為 止。其次4. 5當量粉狀TMHQ緩慢加入其中接著攪拌40分 錢。然後0· 5當量TMHQ溶解於DMAc之溶液缓慢加入其中及 所知混合物擾拌1小時獲得聚醢胺酸MDMAc之溶液。DMc 之用量為獲得二胺及芳族四羧酸二酐單體之進給濃度為 18%重量比。 其次遵照實例1程序獲得厚約1 〇微米之聚醢亞胺薄 犋〇88119324.ptd Page 95 45 09 8 2 V. Description of the invention (92) '— (2) Oxygen permeability: When oxygen penetrates the three layers of FPC from the edge of the basement membrane, the problem of adhesion failure due to the deterioration of the adhesive occasionally occurs. On the other hand, taking double-layer FPC as an example, the electrical characteristics are impaired due to the deterioration of copper. It is therefore desirable to use a polyfluorene imide film having low oxygen permeability. Comparative Example 24 DMAc was introduced into a separation bottle and 1 equivalent and 2 equivalents of P-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until the oDA &amp; p_pDA was completely dissolved. Next, 2.5 equivalents of powdery TMHQ was slowly added thereto followed by stirring for 40 knives. Then, a solution of 0.5 equivalent of TMHQ in DMAc was slowly added thereto, and the resulting mixture was stirred for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc used was 18% by weight to obtain the feed concentration of the diamine and aromatic tetracarboxylic dianhydride monomer. Next, a polyimide film having a thickness of about 0 μm was obtained according to the procedure of Example 1. feA Example 25 5 DMAc was introduced into a separation bottle and 2 equivalents of oDA and 3 equivalents of p_pD a were added thereto. The obtained quinqueline mixture was thoroughly stirred at room temperature until OA and ρ_PM were completely dissolved. Next, 4.5 equivalents of powdered TMHQ was added slowly and then stirred for 40 cents. Then a solution of 0.5 equivalents of TMHQ dissolved in DMAc was slowly added to it and the known mixture was stirred for 1 hour to obtain a solution of polymethane MDMAc. The amount of DMc used is 18% by weight to obtain the feed concentration of the diamine and aromatic tetracarboxylic dianhydride monomer. Secondly, follow the procedure of Example 1 to obtain a polyimide film with a thickness of about 10 microns.

450982_ 五、發明說明(93) 比較例2 6 DMAc引進分離瓶内及於其中加入1當量0DA及1當量p-pDA 。所得混合物於室溫撤底攪拌至0DA及p-PDA完全溶解為 止。其次1. 8當量粉狀TMHQ緩慢加入其中接著攪拌40分 鐘。然後0. 2當量TMHQ溶解於DMAc之溶液缓慢加入其中及 所得混合物攪拌1小時獲得聚醯胺酸於DM Ac之溶液。DMAc 之用量為獲得二胺及芳族四羧酸二酐單體之進給濃度為 18%重量比。 其次遵照實例1程序獲得厚約1 〇微米之聚醯亞胺薄 膜。 比較例2 7 DMAc引進分離瓶内及於其中加入3當量〇DA及1當量p〜pDA 。所得混合物於室溫徹底攪拌至〇DA及p-PDA完全溶解為 止。其次3· 6當量粉狀TMHQ緩慢加入其中接著攪拌4〇分 鐘。然後0 4當量TMHQ溶解於MAc之溶液緩慢加入其中及 所得混合物攪拌1小時獲得聚醯胺酸於DMAc之溶液^ DMAc 之用量為獲得二胺及芳族四幾酸二酐單體之進給濃度為 1 8 %重量比。 ~ 其次遵照實例1程序獲得厚約〗〇微米之聚醯亞胺薄 膜0 比較例28 遵照比較例24之程序,但固定至框架後加熱係於丨〇〇七 進行5分鐘然後於2〇〇、300及“(^^各自進行2分鐘’,如此 獲传厚12·5微米之聚酿亞胺薄膜。450982_ V. Description of the Invention (93) Comparative Example 2 6 DMAc was introduced into a separation bottle and 1 equivalent of 0DA and 1 equivalent of p-pDA were added thereto. The resulting mixture was stirred at room temperature until the 0DA and p-PDA were completely dissolved. Next, 1.8 equivalents of powdered TMHQ was slowly added thereto followed by stirring for 40 minutes. Then a solution of 0.2 equivalents of TMHQ in DMAc was slowly added thereto and the resulting mixture was stirred for 1 hour to obtain a solution of polyamic acid in DM Ac. The amount of DMAc used was 18% by weight to obtain the feed concentration of diamine and aromatic tetracarboxylic dianhydride monomer. Next, a polyimide film having a thickness of about 10 micrometers was obtained by following the procedure of Example 1. Comparative Example 2 7 DMAc was introduced into a separation bottle and 3 equivalents of 0DA and 1 equivalent of p ~ pDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until the oDA and p-PDA were completely dissolved. Next, 3.6 equivalents of powdered TMHQ was slowly added thereto followed by stirring for 40 minutes. Then a solution of 0.4 equivalent of TMHQ dissolved in MAc was slowly added thereto and the resulting mixture was stirred for 1 hour to obtain a solution of polyamic acid in DMAc ^ The amount of DMAc was the feed concentration of the diamine and aromatic tetrakis dianhydride monomers It is 18% by weight. ~ Second, follow the procedure of Example 1 to obtain a polyimide film with a thickness of about 0 μm. 0 Comparative Example 28 Follow the procedure of Comparative Example 24, but after fixing to the frame, heat it for 5 minutes at 2007 and then at 2000, 300 and "(^^ for 2 minutes each", thus obtaining a polyimide film with a thickness of 12.5 microns.

450982450982

實例79 遵照實例4之程序藉此獲得厚約丨〇微米之聚醯亞胺薄 膜。 實例80 DMAc引進分離瓶内及於其中加入5當量〇Ι)α及5當量 P-PDA。所得混合物於室溫徹底攪拌至⑽人&amp;ρ_ρ])Α完全溶 解為止。其次6當量粉狀TMHQ緩慢加入其中接著攪拌4〇分 鐘。進一步添加3· 5當量PMDA至其中接著攪拌40分鐘。然 後0 · 5當量PMDA溶解於DMAc之溶液緩慢加入其中及所得混 合物攪拌1小時獲得聚醯胺酸於DjjAc之溶液。DMAc之用量 為獲得二胺及芳族四羧酸二酐單體之進給濃度為18%重量 比。 其次遵照實例1程序獲得厚約1 〇微米之聚醯亞胺薄膜。 ZM11 DMAc 5丨進分離瓶内及於其中加入5當量〇DA及5當量 p-pDA。所得混合物於室溫撤底攪拌至ODA及p-PDA完全溶 解為止。其次7當量粉狀TMHQ緩慢加入其中接著攪拌40分 鐘°進一步添加2. 5當量PMDA至其中接著攪拌40分鐘。然 後〇 . 5當量PMDA溶解於DM Ac之溶液緩慢加入其甲及所得混 合物攪拌1小時獲得聚醯胺酸於DMAc之溶液。DMAc之用量 為獲得二胺及芳族四羧酸二酐單體之進給濃度為18%重量 比。 其次遵照實例1程序獲得厚约1 0微米之聚醯亞胺薄膜。 XM82Example 79 By following the procedure of Example 4, a polyimide film having a thickness of about 0 µm was obtained. Example 80 DMAc was introduced into a separation flask and 5 equivalents of α) α and 5 equivalents of P-PDA were added thereto. The resulting mixture was stirred thoroughly at room temperature until the &amp; ρ_ρ]) A completely dissolved. Next, 6 equivalents of powdered TMHQ were slowly added thereto followed by stirring for 40 minutes. Further, 3.5 equivalents of PMDA was added thereto, followed by stirring for 40 minutes. Then, a solution of 0.5 equivalent of PMDA dissolved in DMAc was slowly added thereto and the resulting mixture was stirred for 1 hour to obtain a solution of polyamic acid in DjjAc. The amount of DMAc used was 18% by weight to obtain the feed concentration of diamine and aromatic tetracarboxylic dianhydride monomer. Next, the procedure of Example 1 was used to obtain a polyimide film having a thickness of about 10 microns. ZM11 DMAc 5 was placed in a separation flask and 5 equivalents of oDA and 5 equivalents of p-pDA were added thereto. The resulting mixture was stirred at room temperature until the ODA and p-PDA were completely dissolved. Next, 7 equivalents of powdered TMHQ was slowly added thereto, followed by stirring for 40 minutes. Further, 2.5 equivalents of PMDA was added thereto, followed by stirring for 40 minutes. Then, a solution of 0.5 equivalent of PMDA in DM Ac was slowly added to the solution and the resulting mixture was stirred for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc used was 18% by weight to obtain the feed concentration of diamine and aromatic tetracarboxylic dianhydride monomer. Next, the procedure of Example 1 was used to obtain a polyimide film having a thickness of about 10 microns. XM82

4 5 0 9 8 2 五、發明說明(95) DMAc引進分離瓶内及於其中加入5當量0DA及5當量 P-PDA 〇所得混合物於室溫徹底攪拌至0DA及p-PM完全溶 解為止。其次4當量粉狀TMHQ緩慢加入其中接著攪拌40分 鐘。進一步添加5. 5當量PMDA至其中接著攪拌40分鐘。然 後0. 5當量PMDA溶解於DM Ac之溶液緩慢加入其中及所得混 合物攪拌1小時獲得聚醯胺酸於DMAc之溶液。DMAc之用量 為獲得二胺及芳族四羧酸二酐單體之進給濃度為18%重量 比。 其次遵照實例1程序獲得厚約1 0微米之聚醯亞胺薄膜。 實例83 DMAc引進分離瓶内及於其中加入5當量ODA及5當量 p-PDA 〇所得混合物於室溫徹底攪拌至0DA及p-PDA完全溶 解為止。其次3當量粉狀TMHQ缓慢加入其中接著攪拌40分 鐘。進一步添加6.5當量PMDA至其中接著授拌40分鐘。然 後0. 5當量PMDA溶解於DMAc之溶液缓慢加入其中及所得混 合物攪拌1小時獲得聚醯胺酸於DMAc之溶液^ DM Ac之用量 為獲得二胺及芳族四羧酸二酐單體之進給濃度為18 %重量 比。 其次遵照實例1程序獲得厚約1 0微米之聚醯亞胺薄膜。 實例84 DMAc引進分離瓶内及於其中加入7當量ODA及3當量 p-PDA。所得混合物於室溫徹底攪拌至ODA及p-PDA完全溶 解為止。其次5當量粉狀TMHQ缓慢加入其中接著攪拌40分 鐘。進一步添加4. 5當量PMDA至其中接著攪拌40分鐘。然4 5 0 9 8 2 V. Description of the invention (95) DMAc was introduced into the separation bottle and 5 equivalents of 0DA and 5 equivalents of P-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until 0DA and p-PM were completely dissolved. Next, 4 equivalents of powdered TMHQ was slowly added thereto followed by stirring for 40 minutes. Further, 5.5 equivalents of PMDA was added thereto, followed by stirring for 40 minutes. Then, a solution of 0.5 equivalent of PMDA in DM Ac was slowly added thereto, and the resulting mixture was stirred for 1 hour to obtain a solution of polyamic acid in DMAc. The amount of DMAc used was 18% by weight to obtain the feed concentration of diamine and aromatic tetracarboxylic dianhydride monomer. Next, the procedure of Example 1 was used to obtain a polyimide film having a thickness of about 10 microns. Example 83 DMAc was introduced into a separation flask and 5 equivalents of ODA and 5 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until 0DA and p-PDA were completely dissolved. Next, 3 equivalents of powdered TMHQ was slowly added thereto followed by stirring for 40 minutes. A further 6.5 equivalents of PMDA was added thereto, followed by stirring for 40 minutes. Then 0.5 equivalent of a solution of PMDA dissolved in DMAc was slowly added thereto and the resulting mixture was stirred for 1 hour to obtain a solution of polyamic acid in DMAc. DM Ac was used in an amount to obtain the diamine and aromatic tetracarboxylic dianhydride monomers. The given concentration is 18% by weight. Next, the procedure of Example 1 was used to obtain a polyimide film having a thickness of about 10 microns. Example 84 DMAc was introduced into a separation flask and 7 equivalents of ODA and 3 equivalents of p-PDA were added thereto. The resulting mixture was thoroughly stirred at room temperature until ODA and p-PDA were completely dissolved. Next, 5 equivalents of powdered TMHQ was slowly added thereto followed by stirring for 40 minutes. A further 4.5 equivalents of PMDA was added thereto, followed by stirring for 40 minutes. Of course

88119324.ptd 第99頁 tosl 1^32^. ptd 孩 一〇一 减88119324.ptd Page 99 tosl 1 ^ 32 ^. Ptd child one hundred one minus

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O 讀&amp;β m 4 5 09 B2 五、發明說明(98) 實例89 遵照實例7 9之程序,但於固定至枢架 非於510 °C反而係於480 °C進行,因而獲 酿亞胺薄膜。ijMio 遵照實例79之程序,但於固定至概架 非於510 °C反而係於450 °C進行,因而獲 酿亞胺薄膜。tMll 遵照實例79之程序,但於固定至樞架 非於510 °C反而係於400 t:進行,因而獲 酸亞胺薄膜。 前述實例所得薄膜之動態黏彈性係於 量測裝置: 精工電子公司製造 樣本形式: 9毫米X 4 0毫米。 側錄(Profile): 20 °C-400 °〇 3。 頻率: 10赫 Lamp: 20。 基底:0。 增益:3 〇 表13顯示觀察最小ΔΕ’/Δ T(亦即 料出現最大下降的溫度)之Ε,(儲存彈性 後之最終加 得厚1 2. 5微 後之最終加 得厚1 2. 5微 熱步驟 米之聚 熱步驟 米之聚 後之最終加 得厚1 2. 5微 下列條件下 的DMS200 ° 分鐘6 熱步驟 米之聚 測量。 察隨著溫度 模量)及Tg( 的升高 〇C)資O read &amp; β m 4 5 09 B2 V. Description of the invention (98) Example 89 The procedure of Example 7 9 was followed, but the fixing to the pivot was performed at 480 ° C instead of 510 ° C, so the imine was obtained. film. ijMio followed the procedure of Example 79, but it was fixed to the frame instead of 510 ° C but at 450 ° C, so the imine film was obtained. tMll followed the procedure of Example 79, but was fixed to the pivot instead of 510 ° C but at 400 t: proceeded, and thus the acid imine film was obtained. The dynamic viscoelasticity of the film obtained in the foregoing example was measured by a measuring device: manufactured by Seiko Instruments Inc. Sample form: 9 mm x 40 mm. Profile: 20 ° C-400 ° 〇 3. Frequency: 10 Hz Lamp: 20. Base: 0. Gain: 3 〇 Table 13 shows the smallest observed ΔE ′ / ΔT (that is, the temperature at which the maximum drop is expected), E, (the final thickness after storage elasticity is increased by 12 2.5, and the final thickness is increased by 12. 5 micro-heating step of rice gathering The final thickness of the thermal step-metering gathering is 1 2.5 DMS 200 ° min under the following conditions. 6 Hot-step rice-converging measurement. Check with the increase in temperature modulus) and Tg ( 〇C) information

TMHQ PMDATMHQ PMDA

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表 0DA 13Table 0DA 13

卜PDA Tg( °〇 E’ (Pa)於 3 50 °CBu PDA Tg (° 〇 E ’(Pa) at 3 50 ° C

8811932488119324

^50982 五、發明說明(99) 比較例2 4 3 -1 1 丄—2_—_ — 228 Μ. 1E9 比較例2 5 5 - 2 3 215 9.8E8 比較例2 6 2 一」—1 — 1 227 6.6E8 比較例2 7 4 一 3 1 211 2.7E8 比較例28 3 — 1 2 228 1.1E9 實例79 | 5 | 5 5 5 290 12.1E9 1 實例80 1 6 I 4 5 5 | 280 |1. 9E9 實例81 1 7 1 3 5 5 275 11.7E9 實例 82 1 4 1 6- 5 | 5 | 290 2, 1E9 |實例83 3 | 7 5 5 I 295 2. 2E9 實例84 5 5 7 3 280 2. 0E9 實例 85 1 5 | 5 3 7 I 295 I 2. 5E9 ( 實例 86 I 7 1 3 1 7 3 270 1.9E9 實例87 t^JB8 ] 3 1 7 I 7 3 390 2.5E9 3 1 7 3 7 | 3 0 0 丨 2. 7E9 實例 8 9 1 5 | 5 | 5 5 I 290 2. 1E9 實例 9 0 1 5 1 5 1 5 5 290 2. 1E9 實例91 | 5 | 5 5 5 1 290 2. 1E9 其次於下列條件下(膜厚度:12. 5微米)經由使用比較例24 至2 8及實例7 9至91之薄膜進行水解抗性試驗。 ① 作為水解抗性的指示,使用根據ASTM D-1 938量測之 抗撕傳播性指示。 ② 抗撕傳播性係量測作為初值。 ③ 為了評估水解抗性,薄膜樣本使用PC30 5S(Hirayama^ 50982 V. Description of the invention (99) Comparative example 2 4 3 -1 1 丄 —2 _—_ — 228 Μ. 1E9 Comparative example 2 5 5-2 3 215 9.8E8 Comparative example 2 6 2 1 "-1 — 1 227 6.6E8 Comparative Example 2 7 4-3 1 211 2.7E8 Comparative Example 28 3 — 1 2 228 1.1E9 Example 79 | 5 | 5 5 5 290 12.1E9 1 Example 80 1 6 I 4 5 5 | 280 | 1. 9E9 Example 81 1 7 1 3 5 5 275 11.7E9 Example 82 1 4 1 6- 5 | 5 | 290 2, 1E9 | Example 83 3 | 7 5 5 I 295 2. 2E9 Example 84 5 5 7 3 280 2. 0E9 Example 85 1 5 | 5 3 7 I 295 I 2. 5E9 (Example 86 I 7 1 3 1 7 3 270 1.9E9 Example 87 t ^ JB8] 3 1 7 I 7 3 390 2.5E9 3 1 7 3 7 | 3 0 0 丨2. 7E9 Example 8 9 1 5 | 5 | 5 5 I 290 2. 1E9 Example 9 0 1 5 1 5 1 5 5 290 2. 1E9 Example 91 | 5 | 5 5 5 1 290 2. 1E9 Next under the following conditions (Film thickness: 12.5 micrometers) The hydrolysis resistance test was performed by using the films of Comparative Examples 24 to 28 and Examples 7 9 to 91. ① As an indicator of hydrolysis resistance, the resistance measured according to ASTM D-1 938 was used Indication of tear propagation. ② The tear propagation resistance is measured as the initial value. ③ In order to evaluate the hydrolysis resistance, the film-like Use PC30 5S (Hirayama

88119324.ptd 第103頁 0 9 0 2 五、發明說明(100) 製作所製造)暴露於150 °C/100%相對濕度/4大氣壓24小時 然後測量抗撕傳播性。 ④於暴露後,比較例2 4至2 8之樣本碎成粉狀因而無法測 量。 表14摘述其結果。 表 14 最1¾溫度 (°〇 初值 (克/毫米) 1暴露後 (克/毫米) 保留% 比較例2 4 510 120 未測量 .0 比較例2 5 510 121 同上 0 比較例2 6 510 125 同上 0 比較例27 510 119 同上 0 比較例28 400 120 同上 0 實你Π9 510 150 120 80 實例80 510 150 121 81 丨實例81 510 149 120 81 實例8 2 510 152 125 82 實例8 3 510 150 122 81 實例84 510 150 116 77 實例85 510 148 120 81 實例86 510 150 120 81 實例87 510 153 121 79 實例88 510 150 119 I 79 實例8 9 480 155 120 1 7788119324.ptd Page 103 0 9 0 2 V. Description of the Invention (100) (manufactured by Seisakusho) Exposure to 150 ° C / 100% relative humidity / 4 atmospheres for 24 hours. Then measure the tear propagation resistance. ④ After the exposure, the samples of Comparative Examples 2 to 28 were broken into powders and could not be measured. Table 14 summarizes the results. Table 14 Maximum temperature (° 0 Initial value (g / mm) 1 After exposure (g / mm) Percent retention Comparative Example 2 4 510 120 Not measured. 0 Comparative Example 2 5 510 121 Ibid. 0 Comparative Example 2 6 510 125 Ibid. 0 Comparative Example 27 510 119 Ibid. 0 Comparative Example 28 400 120 Ibid. 0 Real Π9 510 150 120 80 Example 80 510 150 121 81 丨 Example 81 510 149 120 81 Example 8 2 510 152 125 82 Example 8 3 510 150 122 81 Example 84 510 150 116 77 Example 85 510 148 120 81 Example 86 510 150 120 81 Example 87 510 153 121 79 Example 88 510 150 119 I 79 Example 8 9 480 155 120 1 77

88119324.ptd 第104頁 4509^^ 五、發明說明(101) 實例90 450 154 實例9 1 400 149 (1)動態黏彈性:88119324.ptd Page 104 4509 ^^ V. Description of the invention (101) Example 90 450 154 Example 9 1 400 149 (1) Dynamic viscoelasticity:

性 比較例28對應於JP-A-1 0-36506之實例〗但厚度 5 先說明於3 50 t: E’之量測。聚醯亞胺薄膜於當不同°首 , i j. ^ 、見度方向施加 張力下連續成形同時兩端係夾持於張幅供箱 、 、州夏於问溫(400Comparative Example 28 corresponds to the example of JP-A-1 0-36506. However, the thickness 5 will be described in advance before the measurement at 3 50 t: E '. Polyimide film is continuously formed under tension at different angles, i j. ^, And in the direction of visibility, while the two ends are clamped in a box for the box, Zhou Xia Yuwen (400

°c或以上)下成形。當南溫彈性模量顯著下降時,寬产方 向幾乎無法施加張力,如此薄膜於張幅烘箱内鬆垂,X而無 法穩定製造。發明人研究結果發現此種現象較高機率^ ^ 於E’下降至1. 0E9或以下時。因此可能於發明人之已經x公 告的專利案之實例薄膜無法於穩態連續製造。 ” A 前述情況下,E’隨著時間的升高顯示最大下降的溫度稱 作Tg。於Tg為25 0 °C或以下可能出現下列困擾。 1. 當熱塑性聚醯亞胺用作黏合劑時,該程序係於升高溫 度(約250至3 0 0 °C)進行,熱接觸黏合係使用壓機進行:: 此基底膜變形而於冷卻後捲曲或翹曲。 2. 當用於高溫時如此構成的FPC可能變形。 因此考慮Tg至少須為250 r及E’於3 5 0 °C至少須為 1.0E9 。 (2 )水解抗性: 使用聚醯亞胺薄膜作為基底膜之FPC將於更為分歧的條 件下使用。其中最苛刻案例之一似乎為FPC用於高溫及高 濕。當FPC於此等條件下使用時,估計基底膜水解劣化造° c or above). When the South Modulus elastic modulus decreases significantly, tension can hardly be applied in the wide production direction, so the film sags in the tenter oven, and X cannot be manufactured stably. The inventor's research results found that this phenomenon has a higher probability ^ ^ when E 'drops to 1.0E9 or below. It is therefore possible that in the inventor's published patent case, the film cannot be continuously manufactured in steady state. "A In the foregoing case, the temperature at which E 'shows the greatest decrease with time is called Tg. At Tg of 25 0 ° C or below, the following problems may occur. 1. When thermoplastic polyimide is used as an adhesive This procedure is performed at an elevated temperature (about 250 to 300 ° C), and the thermal contact bonding system is performed using a press: This base film deforms and curls or warps after cooling. 2. When used at high temperature The FPC thus constructed may be deformed. Therefore, it is considered that the Tg must be at least 250 r and the E ′ must be at least 1.0E9 at 3 50 ° C. (2) Hydrolysis resistance: FPC using polyimide film as the base film will be Use under more divergent conditions. One of the most demanding cases seems to be FPC for high temperature and high humidity. When FPC is used under these conditions, it is estimated that the base film is degraded by hydrolysis

88119324.ptd 第105頁 450982 五、發明說明(102) 成下列困擾s 換言之水解造成薄膜劣化誘發:①PI薄膜與黏合 FPC)間之交界面黏合強度下降;②介於ρι薄膜與° 二^ (二層FPC)間之交界面黏合強度下降;③由於機械5曰-降故無法忍受儲存於彎折態或用於移動 =1度= PI薄膜之電氣特性低劣等。 考折4件;④ 如前述本發明可提供一種具有絕隹 量,低吸水性,小吸水膨脹係數,小性模 穩性等)之新賴聚醯亞胺薄膜及板具有線:膨脹 用聚醯亞胺薄膜之多種電氣/電子機於使 連結板、封裝半導體之黏合薄膜、^印刷 連結基板。 艰〖生圯錄膜及硬碟懸吊 雖然已經就其細節及參照特例說明本發明,但 顯然易知可未悖離其精髓及範圍作出多種變化及二88119324.ptd Page 105 450982 V. Description of the invention (102) The following problems s In other words, the degradation of the film is induced by hydrolysis: ① the adhesive strength at the interface between the PI film and the adhesive FPC decreases; ② between the ρι film and ° 2 ^ (二The bonding strength of the interface between layers (FPC) is reduced; ③ Due to the mechanical 5-drop, it cannot be stored in a bent state or used for movement = 1 degree = poor electrical characteristics of the PI film. Examination of 4 pieces; ④ As mentioned above, the present invention can provide a new polyimide film and board with absolute weight, low water absorption, small water expansion coefficient, small mold stability, etc.): Various kinds of electric / electronic devices of 醯 imine film are used for connecting boards, adhesive films for packaging semiconductors, and printing connection boards. Difficulties Although the film and the hard disk suspension have been described in detail with reference to specific examples, it is obvious that many changes can be made without departing from its essence and scope.

Claims (1)

公告本 450982 ~六、申請專利範圍 1 . 一種聚醯亞胺薄膜,具有抗拉彈性模量為70 0千克/平 方毫米或以下及吸水膨脹係數為20 ppm或以下。 2 ·如申請專利範圍第1項之聚醯亞胺薄膜,其具有於1 0 〇 至2 G Q °C之線性膨脹係數為5至1 5 p p m。 3.如申請專利範圍第1項之聚醮亞胺薄膜,其具有吸水 性為3, 0 %或以下。 4 ·如申請專利範圍第3項之聚醯亞胺薄膜,其具有吸水 性為2, 0 %或以下。 5.如申請專利範圍第1項之聚酿亞胺薄膜,其含有如下 通式(1)表示之重覆單位於其分子:Bulletin 450982 ~ 6. Patent application scope 1. A polyimide film with a tensile elastic modulus of 70 kg / mm2 or less and a water absorption coefficient of 20 ppm or less. 2. The polyimide film according to item 1 of the scope of patent application, which has a linear expansion coefficient from 100 to 2 G Q ° C of 5 to 15 p p m. 3. The polyimide film according to item 1 of the patent application scope has a water absorption of 3.0% or less. 4. The polyimide film according to item 3 of the patent application, which has a water absorption of 2.0% or less. 5. The polyimide film according to item 1 of the patent application scope, which contains the repeating unit represented by the following general formula (1) in its molecule: 88119324,ptd 第108頁 45098288119324, ptd p. 108 450982 R4R4 R4 R4R4 R4 六、_請專利範園 . R4 . R4 「、 &lt;?〇&gt; (其中R4表示CH3-,C1- ’Br-,F-或CH30-);及R表示如下 通式表示之二價有機基:Six, please patent garden. R4. R4 ", &lt;? 〇 &gt; (where R4 represents CH3-, C1-'Br-, F- or CH30-); and R represents a bivalent organic represented by the following general formula base: (其中η為1至3之整數;及X表示一價取代基選自包括氫原 子,齒原子,羧基,含6個或以下碳原子之低碳烷基及含6 個或以下碳原子之低碳烷氧基),或如下通式表示: Ζ(Where η is an integer from 1 to 3; and X represents a monovalent substituent selected from the group consisting of a hydrogen atom, a tooth atom, a carboxyl group, a lower alkyl group containing 6 or less carbon atoms, and a lower group containing 6 or less carbon atoms Carboalkoxy), or the formula: C其中Υ及Ζ可相同或相異且各自表示一價〃&amp;卜代基選自包括 氫原子,齒原子,羧基,含6個或以下碳原子之低碳烷 基’及含6個或以下碳原子之低破烧氧基;及八表示二價鍵 聯基選自-0-,-S-,-C〇~,_so—,_s〇2-及-CH2-)。 6.如申請專利範圍第5項之聚醯益胺薄膜,其除了通式 (1)表示之重覆單位外,進一步含有如T通式(2)表示之重 覆單位於其分子: 乂C in which Υ and Z may be the same or different and each represents a monovalent 〃 &amp; Budyl is selected from the group consisting of a hydrogen atom, a tooth atom, a carboxyl group, a lower alkyl group containing 6 or less carbon atoms, and 6 or less carbons Atomic low-scorching oxygen; and eight represents a divalent linking group selected from -0-, -S-, -C0 ~, _so-, _s〇2-, and -CH2-). 6. The polyamidamine film according to item 5 of the patent application, which, in addition to the repeating unit represented by the general formula (1), further contains the repeating unit represented by the general formula (2) in the molecule: 乂 88119324.ptd 第109頁 4 5 09 8 2 六、申請專利範圍88119324.ptd Page 109 4 5 09 8 2 ο c 一 〇— (ch2)2—Ο— C )α .toe 7.如申請專利範圍第5或6項之聚醯亞胺薄膜,其進一步 含有如下通式(3)表示之重覆單位於其分子:ο c 〇— (ch2) 2—〇— C) α .toe 7. If the polyimide film of the patent application scope item 5 or 6, it further contains the repeating unit represented by the following general formula (3) in Its molecule: 〇 其中R定義如通式(1)。 8.如申請專利範圍第5或6項之聚醯亞胺薄膜,其含有如〇 Wherein R is defined as the general formula (1). 8. The polyimide film as claimed in claim 5 or 6, which contains 88119324.ptd 第110頁 45098288119324.ptd Page 110 450982 8S119324.ptd 第111頁 450982 六、申請專利範圍8S119324.ptd Page 111 450982 6. Scope of Patent Application 1 0.如申請專利範圍第9項之聚醯亞胺薄膜,其可滿足 (a + b)/s,(a + c)/s,(b + d)/s 及(c + d)/s 各自落入 0.25 至 0.75之範圍之要求’其中a ’b,c及d分別表示如上通式 (6)至(9)表示的重覆單位數目及s表示a + b + c + d。 11. 一種軟性印刷連結板用之層合物,其係經由形成一 層金屬層至少於如申請專利範圍第8項之聚醯亞胺薄膜之 一面上獲得。 1 2.如申請專利範圍第11項之軟性印刷連結板用之層合 物’其中該金屬層係透過熱固性黏合劑層合。 1 3·如申請專利範圍第丨丨項之軟性印刷連結板用之層合 物’其中該金屬層係透過熱塑性聚醯亞胺黏合劑層合。 1 4.如申請專利範圍第11項之軟性印刷連結板用層合 物’其中該聚醯亞胺薄膜之至少一面上接受至少一種選€10. If the polyimide film according to item 9 of the patent application scope, it can satisfy (a + b) / s, (a + c) / s, (b + d) / s and (c + d) / The requirements of s each falling within the range of 0.25 to 0.75 'where a'b, c and d represent the number of repeating units as represented by the general formulae (6) to (9) above and s represents a + b + c + d. 11. A laminate for a flexible printed connection board, which is obtained by forming a metal layer on at least one side of a polyimide film as described in item 8 of the patent application scope. 1 2. The laminate for a flexible printed connection board according to item 11 of the scope of the patent application, wherein the metal layer is laminated through a thermosetting adhesive. 1 3. The laminate for a flexible printed link board according to item 丨 丨 of the patent application range, wherein the metal layer is laminated through a thermoplastic polyimide adhesive. 1 4. The laminate for flexible printed connection boards according to item 11 of the scope of patent application, wherein at least one side of the polyimide film receives at least one option. 88119324.ptd 第112頁 450982 六、申請專利範圍 包括加熱處理、電暈處理、電漿處理及偶合劑處理中之至 少一種處理。 1 5 · —種黏合薄膜,其係經由於如申請專利範圍第8項之 聚醯亞胺薄膜之至少一面上形成一層黏合層獲得。 1 6.如申請專利範圍第1 5項之黏合薄膜,其中該黏合層 包含一種熱固性黏合劑。 1 7.如申請專利範圍第1 5項之黏合薄膜,其中該黏合層 包含一種熱塑性聚醯亞胺黏合劑。 1 8.如申請專利範圍第8項之聚醯亞胺薄膜,其係用作磁 性記錄之基底膜。88119324.ptd Page 112 450982 6. The scope of patent application includes at least one of heat treatment, corona treatment, plasma treatment and coupling agent treatment. 1 ··· An adhesive film obtained by forming an adhesive layer on at least one side of a polyimide film such as the item No. 8 of the patent application. 16. The adhesive film according to item 15 of the patent application scope, wherein the adhesive layer comprises a thermosetting adhesive. 1 7. The adhesive film according to item 15 of the patent application scope, wherein the adhesive layer comprises a thermoplastic polyimide adhesive. 1 8. The polyimide film according to item 8 of the scope of patent application, which is used as a base film for magnetic recording. 18119324.ptd 第113頁18119324.ptd Page 113
TW88119324A 1998-11-05 1999-11-05 Polyimide film and electric/electronic equipment base materials with the use thereof TW450982B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408200B (en) * 2004-09-24 2013-09-11 Kaneka Corp Novel polyimide film, adhesive film obtained using the same, and flexible metal laminated laminate
US8808837B2 (en) 2007-12-21 2014-08-19 Lg Electronics Inc. Flexible film and display device comprising the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI408200B (en) * 2004-09-24 2013-09-11 Kaneka Corp Novel polyimide film, adhesive film obtained using the same, and flexible metal laminated laminate
US8808837B2 (en) 2007-12-21 2014-08-19 Lg Electronics Inc. Flexible film and display device comprising the same

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