TW449052U - Scanning-slit exposure device - Google Patents

Scanning-slit exposure device

Info

Publication number
TW449052U
TW449052U TW089215003U TW89215003U TW449052U TW 449052 U TW449052 U TW 449052U TW 089215003 U TW089215003 U TW 089215003U TW 89215003 U TW89215003 U TW 89215003U TW 449052 U TW449052 U TW 449052U
Authority
TW
Taiwan
Prior art keywords
scanning
exposure device
slit exposure
slit
exposure
Prior art date
Application number
TW089215003U
Other languages
English (en)
Inventor
Johannes Christiaan Mar Jasper
Alexander Straaijer
Original Assignee
Asm Lithography Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm Lithography Bv filed Critical Asm Lithography Bv
Publication of TW449052U publication Critical patent/TW449052U/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70125—Use of illumination settings tailored to particular mask patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW089215003U 1996-04-01 1997-04-12 Scanning-slit exposure device TW449052U (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96200882 1996-04-01

Publications (1)

Publication Number Publication Date
TW449052U true TW449052U (en) 2001-08-01

Family

ID=8223837

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089215003U TW449052U (en) 1996-04-01 1997-04-12 Scanning-slit exposure device

Country Status (7)

Country Link
US (1) US5889580A (zh)
EP (1) EP0829035B1 (zh)
JP (1) JP3813634B2 (zh)
KR (1) KR100500771B1 (zh)
DE (1) DE69708560T2 (zh)
TW (1) TW449052U (zh)
WO (1) WO1997037282A1 (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19724903A1 (de) * 1997-06-12 1998-12-17 Zeiss Carl Fa Lichtintensitätsmeßanordnung
KR100673152B1 (ko) * 2000-04-10 2007-01-22 주식회사 하이닉스반도체 반도체 소자의 패턴 형성 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4822975A (en) * 1984-01-30 1989-04-18 Canon Kabushiki Kaisha Method and apparatus for scanning exposure
JP3200894B2 (ja) * 1991-03-05 2001-08-20 株式会社日立製作所 露光方法及びその装置
JP3141471B2 (ja) * 1991-12-25 2001-03-05 株式会社ニコン ディスク媒体の製造方法、及び製造装置、並びに露光方法及び露光装置
US6249335B1 (en) * 1992-01-17 2001-06-19 Nikon Corporation Photo-mask and method of exposing and projection-exposing apparatus
JPH06333803A (ja) * 1992-09-18 1994-12-02 Sharp Corp 投影型露光装置用フィルター
US5291240A (en) * 1992-10-27 1994-03-01 Anvik Corporation Nonlinearity-compensated large-area patterning system
EP0720056B1 (en) * 1994-12-28 1999-10-06 Canon Kabushiki Kaisha Illumination system and scan type exposure apparatus
US5724122A (en) * 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
JP3617558B2 (ja) * 1995-11-17 2005-02-09 株式会社ニコン 露光量制御方法、露光装置、及び素子製造方法

Also Published As

Publication number Publication date
DE69708560T2 (de) 2002-07-18
JPH11507145A (ja) 1999-06-22
WO1997037282A1 (en) 1997-10-09
US5889580A (en) 1999-03-30
EP0829035B1 (en) 2001-11-28
EP0829035A1 (en) 1998-03-18
DE69708560D1 (de) 2002-01-10
KR100500771B1 (ko) 2005-12-30
JP3813634B2 (ja) 2006-08-23
KR19990022112A (ko) 1999-03-25

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MK4K Expiration of patent term of a granted utility model