DE69708560D1 - Belichtungsapparat mit abtastschlitz - Google Patents
Belichtungsapparat mit abtastschlitzInfo
- Publication number
- DE69708560D1 DE69708560D1 DE69708560T DE69708560T DE69708560D1 DE 69708560 D1 DE69708560 D1 DE 69708560D1 DE 69708560 T DE69708560 T DE 69708560T DE 69708560 T DE69708560 T DE 69708560T DE 69708560 D1 DE69708560 D1 DE 69708560D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure machine
- scanning slot
- scanning
- slot
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70125—Use of illumination settings tailored to particular mask patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP96200882 | 1996-04-01 | ||
PCT/IB1997/000296 WO1997037282A1 (en) | 1996-04-01 | 1997-03-25 | Scanning-slit exposure device |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69708560D1 true DE69708560D1 (de) | 2002-01-10 |
DE69708560T2 DE69708560T2 (de) | 2002-07-18 |
Family
ID=8223837
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69708560T Expired - Fee Related DE69708560T2 (de) | 1996-04-01 | 1997-03-25 | Belichtungsapparat mit abtastschlitz |
Country Status (7)
Country | Link |
---|---|
US (1) | US5889580A (de) |
EP (1) | EP0829035B1 (de) |
JP (1) | JP3813634B2 (de) |
KR (1) | KR100500771B1 (de) |
DE (1) | DE69708560T2 (de) |
TW (1) | TW449052U (de) |
WO (1) | WO1997037282A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19724903A1 (de) * | 1997-06-12 | 1998-12-17 | Zeiss Carl Fa | Lichtintensitätsmeßanordnung |
KR100673152B1 (ko) * | 2000-04-10 | 2007-01-22 | 주식회사 하이닉스반도체 | 반도체 소자의 패턴 형성 방법 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4822975A (en) * | 1984-01-30 | 1989-04-18 | Canon Kabushiki Kaisha | Method and apparatus for scanning exposure |
JP3200894B2 (ja) * | 1991-03-05 | 2001-08-20 | 株式会社日立製作所 | 露光方法及びその装置 |
JP3141471B2 (ja) * | 1991-12-25 | 2001-03-05 | 株式会社ニコン | ディスク媒体の製造方法、及び製造装置、並びに露光方法及び露光装置 |
US5703675A (en) * | 1992-01-17 | 1997-12-30 | Nikon Corporation | Projection-exposing apparatus with deflecting grating member |
JPH06333803A (ja) * | 1992-09-18 | 1994-12-02 | Sharp Corp | 投影型露光装置用フィルター |
US5291240A (en) * | 1992-10-27 | 1994-03-01 | Anvik Corporation | Nonlinearity-compensated large-area patterning system |
EP0720056B1 (de) * | 1994-12-28 | 1999-10-06 | Canon Kabushiki Kaisha | Beleuchtungssystem und Abtastbelichtungsapparat |
US5724122A (en) * | 1995-05-24 | 1998-03-03 | Svg Lithography Systems, Inc. | Illumination system having spatially separate vertical and horizontal image planes for use in photolithography |
JP3617558B2 (ja) * | 1995-11-17 | 2005-02-09 | 株式会社ニコン | 露光量制御方法、露光装置、及び素子製造方法 |
-
1997
- 1997-03-25 JP JP53508197A patent/JP3813634B2/ja not_active Expired - Fee Related
- 1997-03-25 KR KR1019970708591A patent/KR100500771B1/ko not_active IP Right Cessation
- 1997-03-25 DE DE69708560T patent/DE69708560T2/de not_active Expired - Fee Related
- 1997-03-25 WO PCT/IB1997/000296 patent/WO1997037282A1/en active IP Right Grant
- 1997-03-25 EP EP97906326A patent/EP0829035B1/de not_active Expired - Lifetime
- 1997-03-27 US US08/824,624 patent/US5889580A/en not_active Expired - Fee Related
- 1997-04-12 TW TW089215003U patent/TW449052U/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5889580A (en) | 1999-03-30 |
JPH11507145A (ja) | 1999-06-22 |
KR19990022112A (ko) | 1999-03-25 |
JP3813634B2 (ja) | 2006-08-23 |
TW449052U (en) | 2001-08-01 |
EP0829035B1 (de) | 2001-11-28 |
KR100500771B1 (ko) | 2005-12-30 |
DE69708560T2 (de) | 2002-07-18 |
EP0829035A1 (de) | 1998-03-18 |
WO1997037282A1 (en) | 1997-10-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |