TW441845U - Self-alignment mechanism for mark shielding clamp ring application in PVD process chamber and process chamber using the same - Google Patents

Self-alignment mechanism for mark shielding clamp ring application in PVD process chamber and process chamber using the same

Info

Publication number
TW441845U
TW441845U TW87218157U TW87218157U TW441845U TW 441845 U TW441845 U TW 441845U TW 87218157 U TW87218157 U TW 87218157U TW 87218157 U TW87218157 U TW 87218157U TW 441845 U TW441845 U TW 441845U
Authority
TW
Taiwan
Prior art keywords
process chamber
self
same
clamp ring
alignment mechanism
Prior art date
Application number
TW87218157U
Other languages
Chinese (zh)
Inventor
Cheng-Fang Jung
Shi-Sheng Juang
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Priority to TW87218157U priority Critical patent/TW441845U/en
Publication of TW441845U publication Critical patent/TW441845U/en

Links

TW87218157U 1998-11-02 1998-11-02 Self-alignment mechanism for mark shielding clamp ring application in PVD process chamber and process chamber using the same TW441845U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW87218157U TW441845U (en) 1998-11-02 1998-11-02 Self-alignment mechanism for mark shielding clamp ring application in PVD process chamber and process chamber using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW87218157U TW441845U (en) 1998-11-02 1998-11-02 Self-alignment mechanism for mark shielding clamp ring application in PVD process chamber and process chamber using the same

Publications (1)

Publication Number Publication Date
TW441845U true TW441845U (en) 2001-06-16

Family

ID=21637315

Family Applications (1)

Application Number Title Priority Date Filing Date
TW87218157U TW441845U (en) 1998-11-02 1998-11-02 Self-alignment mechanism for mark shielding clamp ring application in PVD process chamber and process chamber using the same

Country Status (1)

Country Link
TW (1) TW441845U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101787513A (en) * 2010-03-12 2010-07-28 上海宏力半导体制造有限公司 Metal deposition chamber
TWI783658B (en) * 2021-08-31 2022-11-11 天虹科技股份有限公司 Wafer carrying and fixing mechanism and thin film deposition equipment using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101787513A (en) * 2010-03-12 2010-07-28 上海宏力半导体制造有限公司 Metal deposition chamber
TWI783658B (en) * 2021-08-31 2022-11-11 天虹科技股份有限公司 Wafer carrying and fixing mechanism and thin film deposition equipment using the same

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MK4K Expiration of patent term of a granted utility model