TW429426B - Method for monitoring wafer orientation - Google Patents
Method for monitoring wafer orientationInfo
- Publication number
- TW429426B TW429426B TW88100333A TW88100333A TW429426B TW 429426 B TW429426 B TW 429426B TW 88100333 A TW88100333 A TW 88100333A TW 88100333 A TW88100333 A TW 88100333A TW 429426 B TW429426 B TW 429426B
- Authority
- TW
- Taiwan
- Prior art keywords
- asterisk
- thin film
- metal thin
- mark
- shape mark
- Prior art date
Links
Abstract
The present invention provides a method for monitoring wafer orientation suitable for a physical vapor deposition apparatus having mark shields. The method comprises the steps of: (a) providing a test wafer having an asterisk-shape mark formed on a position to be shielded, the asterisk-shape mark being formed by a plurality of small holes spaced with each other by a predetermined distance; using the robot of the physical vapor deposition apparatus to move the test wafer into a deposition room for performing a metal thin film deposition to form a metal thin film layer while the mark shields cover the asterisk-shape mark; (c) using the robot to move out the test wafer deposited with the metal thin film; and (d) determining the accuracy of the wafer orientation by observing the degree of the asterisk-shape mark covered by the metal thin film. In accordance with monitoring method of the present invention, the stability of the system device can be ensured.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW88100333A TW429426B (en) | 1999-01-11 | 1999-01-11 | Method for monitoring wafer orientation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW88100333A TW429426B (en) | 1999-01-11 | 1999-01-11 | Method for monitoring wafer orientation |
Publications (1)
Publication Number | Publication Date |
---|---|
TW429426B true TW429426B (en) | 2001-04-11 |
Family
ID=21639362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW88100333A TW429426B (en) | 1999-01-11 | 1999-01-11 | Method for monitoring wafer orientation |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW429426B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110581083A (en) * | 2019-09-26 | 2019-12-17 | 上海华力集成电路制造有限公司 | Method and system for monitoring position of shielding ring |
-
1999
- 1999-01-11 TW TW88100333A patent/TW429426B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110581083A (en) * | 2019-09-26 | 2019-12-17 | 上海华力集成电路制造有限公司 | Method and system for monitoring position of shielding ring |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MK4A | Expiration of patent term of an invention patent |