TW429403B - Method for improving the optical quality of a 45 DEG micro-mirror device - Google Patents

Method for improving the optical quality of a 45 DEG micro-mirror device

Info

Publication number
TW429403B
TW429403B TW88117286A TW88117286A TW429403B TW 429403 B TW429403 B TW 429403B TW 88117286 A TW88117286 A TW 88117286A TW 88117286 A TW88117286 A TW 88117286A TW 429403 B TW429403 B TW 429403B
Authority
TW
Taiwan
Prior art keywords
micro
mirror device
optical quality
improving
mirror
Prior art date
Application number
TW88117286A
Other languages
Chinese (zh)
Inventor
Hung-Lu Chang
Jau-Jiu Ju
Der-Ray Huang
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW88117286A priority Critical patent/TW429403B/en
Priority to JP2000121296A priority patent/JP2001116913A/en
Application granted granted Critical
Publication of TW429403B publication Critical patent/TW429403B/en

Links

Landscapes

  • Weting (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Head (AREA)

Abstract

This invention discloses a method for improving the optical quality of a 45 DEG micro-mirror device. The method is: prepare an alkaline aqueous solution as the etchant, control the temperature in the range of 55 DEG C to 95 DEG C and proceed the etching with the stir and vibration means, then form a micro-mirror on the 111 plane with an angle of 45 DEG relative to the silicon substrate. This method can improve the optical quality of a 45 DEG micro-mirror device. By incorporating a laser diode and other optical sensors onto a silicon substrate, the micro-mirror can be applied to a thin optical pick-up head.
TW88117286A 1999-10-07 1999-10-07 Method for improving the optical quality of a 45 DEG micro-mirror device TW429403B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW88117286A TW429403B (en) 1999-10-07 1999-10-07 Method for improving the optical quality of a 45 DEG micro-mirror device
JP2000121296A JP2001116913A (en) 1999-10-07 2000-04-21 Method for improving optical quality of 45° micro-mirror device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW88117286A TW429403B (en) 1999-10-07 1999-10-07 Method for improving the optical quality of a 45 DEG micro-mirror device

Publications (1)

Publication Number Publication Date
TW429403B true TW429403B (en) 2001-04-11

Family

ID=21642529

Family Applications (1)

Application Number Title Priority Date Filing Date
TW88117286A TW429403B (en) 1999-10-07 1999-10-07 Method for improving the optical quality of a 45 DEG micro-mirror device

Country Status (2)

Country Link
JP (1) JP2001116913A (en)
TW (1) TW429403B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100580657B1 (en) * 2004-11-11 2006-05-16 삼성전기주식회사 Micro mirror array and manufacturing method for the same
KR100601991B1 (en) 2005-02-15 2006-07-18 삼성전기주식회사 Manufacturing method of micro mirror array and optical device comprising micro mirror
JP2017069241A (en) * 2015-09-28 2017-04-06 京セラ株式会社 Semiconductor laser element package and semiconductor laser device

Also Published As

Publication number Publication date
JP2001116913A (en) 2001-04-27

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees