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Priority claimed from JP19299498Aexternal-prioritypatent/JP2000029230A/en
Priority claimed from JP32379898Aexternal-prioritypatent/JP3959189B2/en
Application filed by Nitto Denko CorpfiledCriticalNitto Denko Corp
Application grantedgrantedCritical
Publication of TW429399BpublicationCriticalpatent/TW429399B/en
The present invention provides a process for the peeling of a resist material with a pressure-sensitive adhesive sheet which involves the improvement in the removal of resist material or the enhancement of peelability of resist material to certainly remove the resist material from the object regardless of the properties or treated state of the resist material. The process comprises (1) after the application of the pressure-sensitive adhesive sheet, effecting a stress-imparting treatment which causes shrinkage or expansion of the pressure-sensitive adhesive sheet so that a stress develops at the interface between the resist material and the object or (2) prior to the application of the resist material to the object, effecting surface treatment to the object such that the surface of the object has a surface free energy of to not greater than 60 dyne/cm.
TW88111571A1998-01-161999-07-08Process for the removal of resist material
TW429399B
(en)
Apparatus for allowing web-like material to be subjected to vacuum glow-discharging treatment and method of conducting vacuum glow-discharging treatment.