TW424003B - System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing - Google Patents

Abstract

A system and method for mixing and/or diluting ultrapure fluids, such as liquid acids for semiconductor processing. The system includes first and second chemical dispensers, the first and second chemical dispensers adapted to contain first and second fluids to be mixed respectively; a process connection between the first and second chemical dispensers which allows the first and second fluids to flow therethrough and intermingle to form a mixed fluid the process connection further allowing the mixed fluid to flow to a location needed by the operator; and an ultrasonic wave emitting device, the device provided in a location sufficient to transmit an ultrasonic wave through the mixed fluid, the device including means to measure the velocity of the wave through the mixed fluid, and thus indirectly measure a ratio defined by a quantity of the first chemical to a quantity of the second chemical in the mixed fluid. Preferably mixing of a three-component formulation is performed by sequential two-component mixing steps.

Description

4 24 00 3 A7 B7 V. Description of the invention (/) Printed by the Industrial and Commercial Cooperatives of the Central Slope Bureau of the Ministry of Light Industry «. Description of the invention Background and description The present invention is broadly conceived for semiconductor processing * and is particularly concerned with large accuracy A blend of ultra-pure fatigue agents. Horiba Ultra Purification The inventor of this case has developed a high-purity liquid pharmaceutical preparation (including HF, HC1, NH4 OH, WfU F, and UN (water soluble) in an on-site (omite) system located at a semi-carcass wafer processing site.掖) Method. In the case of ammonia water * This method is implemented by sucking ammonia from the liquid ammonia reservoir-~ ^-·-steam, and using 髙 PH pure water (the better has been with ammonia The ultra-pure gas stream is balanced, _______-one ------- ionized water) to wash the filtered harp. This finding has led to the conversion of industrial ammonia to a sufficient level without the need for traditional tower steaming. High-purity ammonia for high-precision manufacturing. Ammonia vapor g_.IL is drawn from the supply reservoir as a one-stage split distillation, which can eliminate non-volatile content and high-boiling impurities, such as alkali gold tincture and alkaline earth gold S oxide. Carbonates and hydrides · transition metal halides and hydrides, and high-boiling hydrocarbons and hafnium halides. Reactive volatile impurities such as a Some transition Au halides * Group I Au hydrides and halides * Some Group IV hydrogens Substances, halides, and halogens have been found to be removed by washing to a degree of ultra-purity sufficient for high-precision operations. This is a very surprising hair bun * because scrubbing technology has traditionally been used Come to remove the big players instead of the unscrupulous players. The details of this system are listed in the joint application of the United States (m0 0) (completion application_please) together with 4 * This paper standard applies to the Chinese national rate (CNS > A4 specifications (210X297 mm) Please note first · Note, 'This page is f 424 003 «Staff of the Central Ministry of Economic Affairs of the Ministry of Economic Affairs« Fee Cooperative Cooperative Seal *. • 4 • A A7 B7 V. Description of the invention (I) This article is for reference-and provisional applications 08 / 499,425, 08 / 499,414, and 08 / 499,413 in joint applications, all of which were filed on July 7, 1995 and all are incorporated herein K is for reference. The inventor of this case has also developed a hydrogen peroxide in-situ passivation system, and the details of their systems are contained in the US provisional application 08 / 439,427 (filed on July 7, 1995) * It is incorporated herein by reference. Background: Wet and Dry Semiconductor Processes One of the long-lasting technological changes is the change (and expected change) between dry and wet processing. In dry processing * only gaseous or plasma-phase reactants will contact the wafer. In wet processing There are many fatigue agents for various purposes, such as etching silicon dioxide or removing the inherent chloride layer, removing organic substances or trace organic impurities, removing metals or removing organic impurities, etching silicon nitride and etching silicon. Cream etch has many attractive capabilities * but is still insufficient for cleaning. There is simply no chemistry available to remove some of the worst impurities, such as gold. Wet cleaning methods are therefore necessary for modern semiconductor processes * and may remain necessary for the foreseeable future. Plasma etching is performed under the position of photoresist, and cannot be directly performed at high temperature. Conversely, the photoresist layer needs to be peeled off, so a cleaning step is required. Materials that must be removed during the cleaning step may include: photoresist residues (organic polymers): nano; earth metal (such as osmium or magnesium); and heavy metals 厪 (Please read the note on the back f & gt first) ;. ^ · Write this page)-Binding · The bound paper is in accordance with China National Standard (CNS) A4 specification (210X297 mm) 424003

Mf A7 B7 5. Description of the invention (3 as gold). Many of them do not make good J compounds throughout the building, making them impossible to take away. Therefore, a wet chemical cleaning step is required. The result of this situation is that the purity of the process chemicals at the plasma etching site is no longer critical, because the κ cleaning step is applied after these steps and before the high temperature step is performed, and in the high temperature step in hazardous impurities Before driving, they may remove such dangerous impurities from the surface. However, the inertness of the fatigue chemicals becomes much more turbid. Because the impact rate on the semiconductor surface is typically millions of times higher than that in gel etching * and because it is directly after the liquid cleaning step. The reason why the high-temperature step is not true is that the Mekong type treatment has a major disadvantage, that is, the pollution of radon. --·-, Phosphorus • and sometimes antimony) to form the required P-type and n-type doped regions. However * many other species are electroactive supplements and are highly undesirable impurities. Many of these impurities can have detrimental effects at concentrations well below 10 1 3 cm — 3, such as increased junction leakage. Furthermore, some of the poorer impurities will segregate into the silicon, that is, the equilibrium concentration of impurities in the silicon will be higher than its concentration in solution when the silicon is in contact with water. In addition, some of the poorer impurities have very high dispersion coefficients, which makes their supplements spread to all places after being introduced into any part of the silicon wafer, including these impurities. Drain® Joint J8. So * all liquid solutions that will be used on semi-isomeric wafers should have extremely low levels of all gold ions. The better one is all gold 羼 group * 6 * This paper size is free to use the Chinese national standard (0 it > eight 4 gauges / division (210 > < 297 mm >) Please read the note 3 of the Ministry of Economic Affairs t Printed by the Central Government Bureau of Shellfish Consumer Cooperatives Printed by the Central Standards Bureau of Shellfish Consumer Cooperatives ¾ Λ 2 4 〇 0 3 Α7 Β7 V. Description of the Invention (f) The combined must be less than 3 "appt (number of copies) Per mega portion) *, and for any _ ^ a metal should be lower than lOppt * and as low as possible. Moreover * must also be controlled by a __ · --- pollution of both sleepy and cations. (Some Anions may have adverse effects. For example, mismatched metal ions may be converted into mobile metal atoms or ions in the silicon lattice. Front-end facilities usually include in-situ purification systems 铳 K to produce high-purity water (called " DI ”water, also known as deionized water). However, • It is more difficult to obtain the program chemicals with the required passivity. Background: Ultra-passivity is mixed in the semiconductor process chemistry. • Accurate mixing of chemicals is a high priority. Variations may introduce inaccuracies in etch rates (and sometimes optional) > It is a source of procedural variation. Procedural variation is not good. • Because many variations from Shanghai tend to accumulate. There are many ultra-pure chemicals that require more than one dilution. (For example, general Several types of HF are used at different concentrations). However, the cost per unit volume of transporting ultra-blunt chemicals is higher, so if all the chemicals of the desired degree must be shipped to the manufacturing site, the cost may be high It is inexplicable * especially * This is very inefficient for the very dilute acid solution that is sometimes used. Some semiconductor manufacturing companies are using g-field bonding to prepare several dilution chemicals * For example, hydrofluoric acid * is used for its procedures. For the following reasons, on-site bonding is beneficial for reducing costs: This paper size is applicable to the CNS A4 specification (210X297 mm) Please read the notes on the back first to write this page)-Assembling and ordering the economic standard rate s Labor cost cooperatives India 4 2 4 Ο Ο 3 .i at _Β7_ V. Description of the invention (Γ) One only need to transport concentrated acid • Dilute solution No more than 1 water is required to incur shipping costs * One requires inventory and disposal of one, or a substantially reduced number of concentrates, and does not need to deal with several large volumes of several rare chemicals; and-real-time (real ti * e) The adjustment of the degree, because the transportation and disposal time are no longer required when the concentration adjustment is implemented. Nowhere, the need for the ultra-liquid solution «« is a very simple operation in general precision chemical systems. Significant restrictions may be added. Background: One form of ultra-blunt hybrid yd using load cells for in-situ bonding devices is known. "Load cells are used to control the quality of chemicals to be blended. However, the operation of a load battery instrument is limited by:-the unpredictable force exerted by the tubing connected to the weighing mixing container;-laboratory instruments are required to determine incoming chemical verification values and program adjustments to compensate for the variability of the verification ί A scale inaccuracies for large dilution ratios; and expensive electronic equipment typically required will be exposed to a corrosive chemical environment * and electronic components are easily susceptible to uranium decay * or if available and feasible * The user must use expensive non-corrosive equipment. Another known alternative is to use the volume method. For example, in the United States Patent No. 5. 148,945,5,330,072 to California, U.S.A. ρ ρ 1 ied C henica 1 S ο 1 uti ο ns. : 5,370,269; and 5,417.34 as disclosed in No. 6. However, although some systems can provide increased resolution for high dilution ratios, paper sizes use China 8 | Home Standard (CNS > A4 size (210X297 mm) (Please read the precautions on the back first -r ^ i (Write this page) 'Binding-order A7 B7 42 ^ 003 5. Description of the invention (resolution, they are not flexible with respect to proportional changes. As mentioned above, the semiconductor industry and other industries using chemical mixtures are highly Effective and inexpensive equipment is needed to mix chemicals on-site. 0 Innovative system and method for mixing ultra-purity liquids with K. This application describes a novel method for mixing ultra-purity liquids on-site at a semi-fat S manufacturing facility. In order to provide accurate control and maintain a very tight attitude at the same time---·-. · '·-Close control of pollution * Use continuous addition to complete the mixing of multiple ingredients Automatic control system • where an electrical signal representing the sensed speed or calculated density is directed to the flow rate controller and fed back to the flow rate control valve in a program connection upstream of the first and second fluid mutual points ( Feed control system). In addition or in conjunction with it, a front lock control program can be used; that is, the system can detect the composition of the source chemical with a tool (such as an ultrasonic wave tool); it may be capable of over time And the mutants will provide their sensing data to control the downstream flow rate, read the note on the first page, write the page on the page of the Ministry of Economic Affairs, the Bureau of Loss and Consumption Cooperation, Du Yin *. Yuhei I's product mix three nfig The first-ranked fluidized product and the duotuo body pushed the blunt multiple-flowed fluid into a super combination. The species or the second mixed species and the first species, the number of the three and the one or the first rolled fin species line The confluence of the two will be the combination of the mixed species of the latter into the middle and the second mixed into the first, the main component system, the warmth becomes the part of the manifold nl is also good to combine the other. ， Mixed seed products, clearing up the diplomatic system, e-learning system, another order, roll-up control, integrated K-shaped flow, 1 paper size, applicable to China S family standard (CNS) A4 (210X297 mm) 424003 λ Α7 _Β7__ 5. Description of the invention (1) Method • It includes the following steps: (a) Preparation At least a first fluid and a second fluid to be mixed; (b) passing the fluids through a tool that allows the fluids to mix with each other thereby forming a mixed ultrapure fluid; (c) directing an ultrasonic wave through the The mixed fluid; and (d) measuring the wave velocity transmitted through the mixed fluid, thereby displaying the density of the mixed ultrapure flow hip and indirectly measuring the most to the second fluid of the first fluid contained in the mixed fluid Proportion of the amount of fluid. A preferred embodiment of the system and method includes a computer with a tool that compares the received signal to a standard ratio * by receiving a multiple from a super-wave concentration monitor * and sends a A signal is sent to the wave level monitor to monitor and control the mixing of chemicals in real time. The obtained silly points include: the verification of each chemical can be measured in the radon and can be programmed into the hybrid controller to automatically compensate for variability; eliminating the problem of the load battery, thereby improving the accuracy; and the ultra-wave system The high resolution provided can provide 1/200 or better of the mixed quasi-economic ministry's central government rate for only consumer cooperatives. Other parts and silly points of the present invention will appear after reading the following detailed description of the present invention. The schematic description of the drawings shows the present invention with reference to the attached drawing to K description * which shows the important embodiments of the present invention and it is also included in the description of the present invention for reference. The silver scale of this paper applies to Chinese national standards. (CNS) A4 specification (210X297 mm) 4 2 4 00 3 Printed by the Ministry of Economic Affairs, Central Bureau of quasi- Bureau of the Moon Industry Consumer Cooperative A7 B7 V. Description of invention (public) where: Figure 1 A is based on the system of the present invention, K0 A small scale flowchart is shown in a small scale; and FIGS. 2A-2D are diagrams showing a specific fluid velocity versus mixed concentration according to the embodiment 1 of the present invention. The garden 1 is an engineering process of an embodiment of a unit for manufacturing ultra-blunt ammonia. The plaque 2 is a block 圔 of a semiconductor manufacturing line for the ammonia purification army shown by sister B1. Circle 3A shows an overview of the program roll in a generation army, where ultra-pure ammonia is introduced into argon fluoride acid to make HF of Jingyuan Street. Circle 3B1-3B3 shows the program of Figure 3A. A detailed P & ID diagram of an embodiment. Circle 4 shows an on-site H F blunt device in accordance with a specific embodiment of the disclosed creation. Figure 5 shows the effect on the g-wave velocity of the resulting mixture of HF, HH03, and HAc when BNO3 and HAc were added to HF with the known degree and velocity in one body. Among them, first add HN03 to a specified volume ratio, and then add HAc to the final volume ratio. The final volume ratios of the tested dissolution were 6: 1: 5 and 3: 1: 2 (HF: H (J03: HAc). It was observed that the wave velocity of the mixture was increased with the addition of Hfi03. It is high and decreases with the addition of HAc. Figure 6 shows the effect of the addition of several HF degrees in three separate experiments on the wave velocity of a concentration Ht). When the ratio of ΗΝ03 to HF is the maximum, the acoustic wave velocity is the maximum. V Β 7 shows the HF institute with a known concentration when nitric acid and acetic acid are added in sequence. 11- This paper size applies to Chinese standards (CNS > A4 size (210X297 mm). Please read the note on the back. Item ^ 1 written version Yin)-equipment-Ϊ --1 Printed by the Bayou Consumer Cooperative of the Central Bureau of Vehicles of the Ministry of Economic Affairs 424003 4 A7 B7 V. Explanation of the invention (?) The speed of the wave is quite impressive. The measured wave velocity pseudo increased with the addition of nitric acid, but decreased with the addition of acetic acid. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Many innovative disclosures of the present invention must be described with particular reference to the preferred embodiment of the present invention (as an example rather than a limiter), where: Sleep 1 A is a preferred system embodiment of the present invention The outline of the procedure flow. The main components of the system include a joining tank 2 · a finished product storage tank 4 * and a chemical dispenser 6. The first, second, and third chemicals, C1, C2, and C3, enter the system through conduits 8, 10, and 12 respectively. Deionized water can enter through the conduit 14. The conduits 8, 10, 12 and 14 all terminate at the engagement groove 2, preferably as shown, although other types of tube arrangements may be advantageous. The two pumps 16 and 18 are preferably arranged near the joint groove 2. The pumps 16 and 18 are preferably driven by the clean air supplied from the duct 20. The pump 18 is used as a drain pump * and the pump 16 is used to transport the chemical mixture into the finished product storage tank 4 as a chemical mixture transfer pump. The chemical mixture delivery pump 16 is drawn from a conduit * and has a discharge conduit 26 leading from the discharge port of the pump 16 to the tank 4. The known method and device in the joint groove 2 are maintained at a level * such as sensing with the level of the tired surface, and the display control unit 22 * has a programmed set point level and makes it relative to the actual measured level. Compare. If the level is too low, the control unit 22 will send a signal to the flow control valve 23K to guide more chemicals C1 into the engagement tank 2. Those skilled in the art can detect other variations to complete level control. -1 2- This paper size applies to China Gujiamu (CNS) Α4 specification (210 fathers and 297 males; ^ L ----------- long-- (please read M. Note on the back first) Copybook X)

, 1T A7 424 003 B7 V. Description of the invention (, ...) (Chu Xian read the note on the back of the $ item factory 'to write this page) An important part of the present invention is to install an e-wave combination mode sister (S ο nic C ο b ρ 〇srti ο ne 〇du 1 e) 2 8, which is also referred to herein as " SC Μ 」〇S CM 2 8 is a measurement of the wave or wave transmitted through the chemical mixture flowing through the discharge duct 26 The speed of the pulse. The speed (sound velocity) of the chirped pulse that is transmitted through the chemical compound is directly linked to the concentration of C1 in C2. Or more appropriately * Cong is better than C1 and C 2 chemistry The volume ratio of C1 to C2 in the product mixture. According to the setpoint or target ratio, if the speed is too low or too high * SCM 2 8 will send an appropriate electronic signal to one of several flow control valves, such as adjusting the chemistry separately S C2 and C3 flow control valves 29 and 31 (this signal is sent to only one control at a time so that the addition of chemicals to the mixture is sequential). This feedback control operation can be used to feed forward the main control loop to M modification, the buried road includes, for example, sensing upstream of control valves 23, 23, 31, etc. A component of purity or degree of chemical Cl * C2, etc. The actual inertia or degree can be compared with the degree or concentration of the set point, and an appropriate signal is forwarded to the control valve 23 · 23 and 31, M compensate for the change in purity. Of course, care must be taken to use sensing elements that do not themselves contribute to unacceptable impurities in the chemicals to be mixed. The Shell Standard Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs printed a commercially available S CM, which is more suitable for the system and method of the present invention * is available from MESA LABORATORIES, IHC, N us ο nies D ivisi ο η, W heat R ige, C ο 1 〇rad 〇 trade names " MODEL 88 " and "88 SCiT. As described in the operation manual of this unit (this manual is incorporated herein by reference > The degree rotation rate is based on the process of considering the speed of sound in the convection crosshead with the concentration and temperature as well as the situation «Procedure-13- This paper standard applies to the 0 national ladder standard (CNS) A4 specification (210X297 (Mm) 4 2 4 Ο Ο 3 Α7 Β7 V. Description of the invention (Calculated value derived from the model I 丨. Concentration can be expressed in various units, including weight percentage, density / specific gravity * and special niches such as Brix Γ Brix ) Or Baume (° Bauae). More suitable S CMs include two main assemblies, a transmitter and a converter. The transmitter is typically installed within about 25 to about 100 feet of the converter The converter is a wet component of SCM. Its pseudo installation is in the control of the program. Inside • For example, it is installed in the tube 2 6 shown in Figure 1. They can also be installed in the sampling path. More suitable converters have a speed converter and a temperature converter. Within the main body of the converter * the main system is welded * thus avoiding the use of elastomer seals to prevent it from being destroyed under extreme pressure * extreme temperatures or in corrosive environments. Another suitable converter is A "spool M design * in which a spool is installed, which has an almost the same diameter as the conduit used for the chemical mixture to flow through. The spool includes individual feed and receive converters installed facing each other and flush with the wall of the tube. • In addition, a temperature converter can be installed. Both types of converters are in the SCM that can be obtained from the above quoted MESA LABORATORIES K product name * M0DEL 88 ". As described above *, you can put pressure on the SCM used Converter • However, due to the effect of pressure on the speed of sound, it is only 0.0 1 m / s / psi (as mentioned in the MESA LABS operating manual) * so few power converters are needed. The transmitter and converter are based on the above quote MESA Operation Manual The manual is operated by K | This manual is hereby and incorporated herein by reference. Another important part of the present invention is the storage of the finished product. 4 Packing -14- This paper size applies to Chinese national standards (CNS > A4 Specifications (210 × 297 public shame) Please read first-The note of the back is set by the Ministry of Economic Affairs, China ’s Ladder Standard Bureau—Industrial and Consumer Cooperatives, India ’s Central Government Bureau, the Ministry of Economic Affairs, the Central Bureau of Standards, and the Bayer Consumer Cooperative ’s Seal * 4 2 4 Ο Ο 3 ^ at Β7 5 The invention description (A) is provided with level controllers 32, 34, 36, and 38. These are used to ensure that the level is maintained without any risk of overflow or exhaustion when batch mixing and input feeds are required. To use the method and method of the present invention In a preferred embodiment of the present invention, it is necessary to first select the chemical fatigue to be blended. The first chemical is then prepared in the blending tank at a known dilution. The volume of the first chemical is not particularly important • Of course, it is necessary to avoid overfilling the mixing tank. A second chemical to be blended with the first chemical is then selected and presented to the blending tank. The blending tank includes mixing tools * such as a searcher, baffle, vortex breaker, etc. • After the chemicals are closely mixed, the exhaust stream starts to flow from the blending tank through a conduit to the finished product. Product storage tank. An S-wave concentration monitor (eS CM) is installed in the catheter, which sends the 轚 sound 倌 number through the fluid mixture: measures the speed of the 轚 sound signal, compares with the set point or target mixture, and generates a signal M indicator One or more control valves to trim one of the chemicals or the flow rate of deionized water * to produce the desired ratio of chemicals 1 and 2. Then K is added in the same sequential manner as the third and fourth, and up to the nth chemical is added to the blended krypton to produce a second. Third and n-1 mixtures. The present invention should be better understood with reference to the following actual pickled examples, where all ratios and percentages are by weight of K unless otherwise specified. Practical Example 1 In this example, a field bonding unit is used to deposit various fluorinated acid (HF) • nitric acid (NONO3), and acetic acid (Cfl3 C00H or HAc) K to various -15 # paper Zhang Zhijiun uses the Chinese National Standard (CNS Μ4 specification (2 丨 OX297 mm) Please read the precautions on the back r > i write this page) 'Packing. -Order 4 24 00 3 " ΐ »at Β7 V. DESCRIPTION OF THE INVENTION (β) to be mixed. The mixing was performed in the following order: 1) 4 9HSHF was added to the empty blending tank. 2) Add HN03 according to the specified volume ratio. 3) Finally add HAc to the final volume ratio. The best way to measure and control your success is to use the Mesa Labs Model 8 8S Tone Concentration Monitor (SCH). Therefore, a preliminary check M should be performed to determine that the available S-sound velocity variation is added with each successive addition of the above components. (Of course * the additional measurements and hybrid steps used to determine sensitivity are not part of normal production use). Preliminary verification procedures This implementation was implemented in accordance with 4.3 of the Model 88 SCM Operating Manual. For this verification procedure, a magnetic stirrer is used to reduce the temperature leanness (in general, it is not used in ultra-blunt production facilities). The experimental steps are as follows: 1) Add 43XHF (known speed) 2) Add HN03 to (target volume ratio-5X) and hold the speed 3) Add HN〇3 to the body-to-vegetation ratio of the puppet and measure the speed 4) Add HN03 To (target volume ratio + 5¾) and measure speed 5} Add HAc to (target volume ratio-5¾) and measure speed 6) Add HAc to target volume ratio and measure speed 7) Add HAC to (target volume ratio + 5X) And measure the speed of Dong using a standard 50.0 liter burette to measure the composition of the plant. For this test, two representative 〇: 1111〇3: 〇 (; solution: 6: 1: 5 product and 3: 1: 2 product -16- This paper size applies to China National Standard (CNS) Α4 specifications ( 210 × 297 mm > Please read M. Note on the back side. 0. ¾ Write this page to order 'I. M. Printed by Zhengong Consumer Cooperative, Central Gradient Bureau of the Ministry of Economic Affairs *. 424 003 ^ A7 _ _B7_ V. Description of the invention (β ). This test uses M to determine a useful speed / concentration slope at a representative endpoint. The first test is for an HF / HNO3 / HAc volume ratio close to 6: 1: 5 and the second test is for close to 3: 1: 2 volume ratio. The three acids used (weight X) are: HF 43X; nitric acid 70%; and acetic acid is 99.53. In each case, it is observed that the speed of sound will increase with the addition of nitric acid. Increase and decrease with the addition of acetic acid. Preliminary verification results with 6: 1: 5 mixture The results obtained with 6: 1: 5 mixture are as follows: Please read the precautions on the back first and write this page) Central Standards Bureau, Shellfish Consumer Cooperative, printed Cum. Δ Vacou temperature Ό 110Όliter HF 1327.76 22.20 + 10 奄 hno3 10 nit 1338.49 2 2.45 + 7.3 liters 1 ^ 〇3 17.3 nit 1345.60 22.58 + 1 ml of HN〇3 18.3 nit 1346.21 22.61 + 0.9 ml of HNO3 19.2 nit 1346.81 22.65 -17- The size of the paper is distant from the Chinese National Standard (CNS) Α4. Grid (210X297 mm) 2.4 00 3 ， # A7 B7 V. Description of the invention (π This result shows the first stage of a precisely controlled mixed semiconducting hafnium-grade chemical. The plot 2A is a plot derived from this data, showing The relationship between the speed of sound and the degree of sound. As shown by the data, the speed of sound provides a good one-dimensional measure of the degree of sound for mixtures in this range. The product thus produced is then used in the second mixing stage in which the first Three ingredients: Please read the first note of h. Printed by the Central Kneading Department of the Ministry of Ammonium and Rubber Industry Cooperatives *. Initially add Cum. △ Vacou temperature t 100 ml HF: HN〇3 1346.81 + 30 ml HAc 49.2 1316.53 21.30 + 10 ml HAc 59.2 1309.OS 21.28 + 28 ml HAc 87.1 1293.95 21.00 + 3.6 HAC 90.7 1292.0Z 21.15 + 3.5 liters HAc -18- 94.2 129G.22 21.2 This paper is based on China National Standards (CNS) ) A4 specification (2 丨 0 > < 297 mm) t Page order 424 003 A7 B7 V. Description of the invention (ι &) Figure 2B is a plot derived from this data, showing the difference between the speed of sound and the degree of sound. relationship. As the data shows, the speed of sound provides good one-dimensional concentration measurements for mixtures in this range. In this way, the combination of the two flail mixing steps facilitates the accurate measurement of the three-component temperature compound concentration using a one-dimensional sensor (sound velocity sensing). Please read the back of the note on the back of the 3: 1: 2 mixture to obtain the preliminary verification results. The results obtained with the 3: 1: 2 mixture are listed below. Cum. Δ Vacou Temperature t: 120 ml of HF 1329.69 22.5 + 30 ml of NONO3 30 nit 1355.39 27.9 + 8 ml of MONO 38 38 1361.08 22.95 + 2 ml of NONO 3 40 1362.46 22.93 + 2 ml of NONO3 42 1363.84 22.93 Paper size: China National Standard (CNS) A4 specification (210 × 297 mm) 424003 A7 B7 V. Description of the invention (| Γ1)] _ 1 I__ | _I__i This result shows the first of the precision controlled mixed semiconductor-grade chemicals stage. Figure 2C is a plot derived from this data, showing the relationship between speed of sound and concentration. As shown in this data, the speed of sound provides a good one-dimensional measurement of the mixture for mixtures in this range. The product thus produced is used in the second mixing stage, in which the third component is mixed: the central consumer sample bureau of the Ministry of Economic Affairs, the consumer co-operative printing, initially added Cun. Δ Vacou temperature υ 100 ml 3: 1 HF + HN03 + 30 ml HAc 72 1320.09 21.1 + 18 ml HAc 89.6 1315.18 20.88 + 2.5 ml BAc 92 1313.31 20.95 + 2.5 ml HAc 94.6 1311.6 21 -20- (please read the note on the back of the page to fill in this page) 1 y pack 'f Seven items Γ: Manually write the Taipa paper standard (CNS) A4 size (210X297 mm) 424 0034¾ at B7 V. Description of the invention ("?" Draw 2D is a standard drawing derived from this data.顬 shows the relationship between the speed of sound and the density. As the data shows, the speed of sound provides a good one-dimensional concentration test for mixtures in this range. The combination of these two sequential mixing steps can facilitate the accurate measurement of the three-component mixture using a one-dimensional sensor (Sonic Speed Sensing). Test sensitivity The slope of each key map at the concentration range considered is listed in the table below. Each slope is significantly larger than required by Hodel 88's 0.1 m / s repeatability specification. Slope nitric acid for 6: 1: 5 product ... ml = 1. 165 (meters / second per -1 serving) acetic acid for 6: 1: 5 product ... 0) 2 =-3. 6 5 5 (M / s per-parts) nitric acid for 3: 1: 2 products ... m3 = 2 76 (m / s per-parts for acrylic acid) for 3: 1: 2 products ... b4 = -3 58 (meters / second per -1- servings) (please read the note on the back of the page to write this page). Binding and printing by the Central Standard Industrial and Consumer Cooperatives of the Ministry of Economic Affairs. Although there is no direct measurement of reaction heat data, However, the observed maximum temperature rise was about 0.4 ° F. The reaction heat is not expected to be an important factor. (Note: The typical acidic temperature coefficient proposed by Hass Labs for Model 8 8 is 2 to 4 meters / second / * 0). Although the heat of reaction is small, the temperature adjustment capability is still required in the installed unit. Cargo Example 2 21- This paper size applies to the Chinese national standard {CNS} Α4 size (2 丨 0X297mm) 2 4 Wuli Jinji Central Bureau of Zhuanzhou Bureau Shellfish Consumer Cooperatives print π 丨 3 α Α7 Β7 Description of the invention ( β) The second tri-component system used in the treatment of semi-corpus callosum is Jingyuan hydrofluoric acid of various dilutions. In this system, the ingredients used are aqueous HF * NIU F, and ultra-pure (DI) water. In this case, both HF water soluble ammonium hydroxide and ammonium fluoride aqueous solution are preferred. They are produced at the semiconductor manufacturing facility. 1 Use the temporary profit application number filed on July 7, 1995. 08/4 Systems and methods described in 39,562 • This patent application is hereby incorporated by reference in this example. Ultrapure gaseous HF is first prepared, and then ultra-blunt HF water-soluble radon is produced (as measured by sound velocity sensing. Degrees or, for several types of dilute solvents, to degrees measured by the conductivity measurement. In addition, ultra-pure gas ammonia * is generated, and then the gas ammonia is blown into the ultra-pure aqueous solution, which is performed under the control of the output of the one-dimensional sensor * to produce yuan HF with a desired strength. In this way, the sequential step-by-step soft coupling of two consecutive mines again provides precise control of the three-component mixture. Individual steps in this process will be explained in more detail here. Specifically, in this embodiment, all of these steps are performed on-site at the semiconductor manufacturing facility. Purification of NH3 According to the present invention, ammonia vapor is pseudo-extracted from the vapor space of the liquid ammonia supply reservoir. K This method of extracting steam can be used as a first stage distillation | leaving some solid and high boiling impurities in the tired phase. The supply reservoir may be any conventional supply eaves or other reservoir suitable for containing ammonia *, and the ammonia may be in an anhydrous form or in the form of an aqueous solution. The aging device can be maintained at atmospheric pressure or if necessary. -22- This paper can be used by the Chinese National Standard (CNS > A4 Washing (210X297 mm)) Printed by the Male Workers Consumer Cooperatives of the Central Bureau of the Ministry of Economic Affairs ¾ 4: 24 003 ^ a7 B7 Γ,, V. Description of the invention (>) It is maintained at a pressure higher than atmospheric pressure to enhance the ammonia flow through the system. The reservoir is preferably controlled by a thermal controller * so that its temperature is at About 1G ° to about 50 °, preferably about 15 ° to about 3510 * and most preferably about 20 ° to about 25C. As a result of ammonia extraction from the vapor phase, the impurities that can be removed include the cycle Tables Group 1 and Group I gold ions and the amination forms of some metal ions caused by contact with ammonia. In addition, oxides and carbonates of these metal ions, M and hydrides such as Samarium hydride and magnesium hydride; Group B elements and their oxides, and ammonium adducts of hydrides and halides of these elements; transition metal rhenium hydrides; and heavy hydrocarbons and halogenated carbon compounds such as pump oil ) 〇 Ammonia extracted from the reservoir is passed through a filter element M to remove any solids entrained by the vapor .Microfiltration and ultrafiltration units and membranes are available on the market and can be used by users. The quality and type of the filter are selected according to needs. This preferred embodiment uses a coarse filter, followed by the ion A 0.1 micron filter was used before the purifier and it was not purged after the ion purifier. Then the purged steam was passed to a scrubber * where high-purity pure water (preferably de-ionized water) was used. To wash the steam. The high pH water is preferably ammonia water, and the degree of saturation is increased to saturation through the scrubber through the scrubber. The scrubber can be conveniently countercurrently used like a conventional scrubber tower Operation. Although the operating temperature is not a keying factor, but the tower is preferably operated at a temperature of about 10 ° to about 50 * 0, and more preferably about 15 ° to about 35TC. Similarly, the operation of 23- Standards are applicable to Chinese families (CNS > A4 specifications (2 丨 0X297mm) Please read the notes on the back-r > 4- > write this page) Printed by consumer cooperatives Α7 Β7 V. Description of invention (> 丨) Pressure is not relevant * The best practice is to operate at a pressure of about atmospheric pressure to about 30 p si above atmospheric pressure. The tower is typically loaded with conventional tower packing to provide a high level of fatigue-gas contact * and preferably also includes A dehumidification section. In a preferred embodiment of the present invention, the tower has a filling height of about 3 feet (0.9 泶) and an inner diameter of about 7 inches (18 cm), and reaches 0.84 cubic feet (24 liters). Fill volume, and it operates at a pressure drop of about 0.30 water column (0.075KPa) and an overflow rate of 10 X * its nominal circulating flow rate is about 2.5 gallons per minute (0 · 16 liters / second) Or 5 gallons per minute (0.32 liters / second) at a 2 ×× overflow rate. * Its gas inlet is lower than the packed bed, and its tired population is higher than the packed bed but lower than the dehumidification section. A more suitable packing for a tower with such a description is one having a nominal size smaller than one eighth of the diameter of the tower. The tower's dehumidification section has a similar or denser packing * other aspects are customary builders. All descriptions and dimensions in this paragraph must be understood only as examples. Every system parameter can be different. In a typical operation, the start-up step is to first use ammonia to saturate deionized water to form a medium for the initial scrubbing medium. During the scrubber operation, a small amount of liquid in the tower sink should be periodically discharged to remove accumulated impurities. Examples of impurities that can be removed by scrubbers include reactive volatiles such as silane (SiH4) and arsenic (AsH3) phosphorus, halides and hydrides of arsenic and antimony; general transition gold halides; and Kth Halides and hydrides of Group VII and Group VI gold dysprosium. The military army described above can be used in batches * in a buried or semi-continuous manner. -24- Standard for paper-based methods. Standards for use in the midst of difficulties (CNS > Α4 specifications (2 丨 0 > < 297 mm) (Please read the note f4 on the back page of the back page first) _ .¾. ^ 'Ϊ́ν Π Socket lamp A7 424 003 __B7_ V. Description of the invention (θ). M ores or semi-continuous operations are more suitable. Ammonia The volume processing rate of the purification system is not critical and can vary widely. However, in most operations that can be expected to be used in the present invention, the ammonia flow rate through the system is about 200 cubic centimeters per hour to In the range of thousands of liters / hour. As needed, ammonia leaving the scrubber can be further purified before use, depending on the type of special manufacturing method used to purify the ammonia. When the ammonia is intended to be used, for example, in chemical vapor deposition * It is advantageous to add a dehydration unit and a distillation unit to the system. The distillation column can also be operated in batch, continuous ore, or semi-buried mode. "In batch operation • Typical operating pressure is 300 psi / absolute Value (2,0680 & >, batch size is 100 lbs (45.4 kg). The tower in this example has a diameter of 8 hours (20 cm), a height of 72 inches (183 cm) * K 3G2 overflow rate operation, and a steam velocity of 0.02 1 foot / second (0.00 0 0 6 7 m / S) · The theoretical equivalent plate height is 1.5 inches, and it has 4 8 equivalent plates. The boiler size in this example is approximately 18 hours (45. 7 cm) in diameter and 27 hours (68. 6 cm) in length. The ratio is 0.5, and its circulating cooling water enters at 60T (15.61C) and flows out at 90T (32.2υ). Again, this is only an example; a distillation column with a wide range of structural and operating parameters can be used. Central Ministry of Economic Affairs Rubin Bureau ’s consumer cooperation with Du Yin It depends on its path. Purified ammonia can be used in the form of a purified gas or an aqueous solution with or without a distillation step. In the case of an aqueous solution, the purified Ammonia is dissolved in purified water (preferably deionized water). The mixing ratio and the mixing tool are customary. Circle 1 shows a rolling stroke B depicting an embodiment of the ammonia passivation unit according to the present invention. Liquid ammonia It is stored in the reservoir 11. The vapor space in the container -25- S furniture standard (CNS) A4 specification (210X2 ~ 7mm) 4 24 00 3 A7 B7 Printed by the Shell Cooperative Consumer Cooperative of the Central Rubbing Bureau of the Ministry of Economic Affairs 5. Description of the invention) After the ammonia vapor is extracted, t is closed by a sight. The valve 13 is then passed through a 'm' device. The ammonia vapour passed through it is controlled by a pressure regulator 16 which then waits for a scrubbing tower Π which contains a filling section 18 and a dehumidifying pad 1 £ When the ammonia vapor flows upwards, the saturated ammonia water 2 is flowing downwards. • The liquid system rri is circulated by the circulation pump 21 and its fatigue level is controlled by the level sensor 22. The waste liquid 23 is from the bottom of the scrubber. The liquid held in the pump is periodically extracted. Deionized water 24 is supplied to the aerator 17 under the pressure maintained by the pump 25. The scrubbed ammonia 26 is guided to one of three alternative ways. These two paths are: ⑴ distillation column 27 in which ammonia is further washed m 0 The resulting distilled ammonia 28 is directed to the point of use 0 ⑵ dissolution unit 29 * where ammonia is combined with deionized water 30 to form an aqueous solution 31 which is directed to the point of use 〇 For I plant operations with multiple points of use, the aqueous solution can be used Collected into the holding tank * Then, the ammonia oil is taken into individual pipelines for use by many end users in the same factory. ⑶ Conveying line 32 1 The ammonia in the form of gas is delivered to the point of use. Neither the second nor the third of these alternatives requires a distillation column 27 9 and is therefore suitable for the preparation of ammonia containing less than 100 parts per trillion of any metallic impurities. It is more suitable. Examples are ammonia furnace use or chemical vapor sinking (C VD) use. C If ammonia is used * For example, in the case of t CVD, distillation towers can remove non-condensable substances such as oxygen that can dry-cast CVD. And nitrogen 0 In addition * As the ammonia system leaving the aerator 17 is saturated with water, it depends on the characteristics and efficiency of the distillation column as needed 1 Available at 26-Please read the note on the back of this page Home Standard (〇 呢) 8 4 specifications (210 father 297 mm) Printed by the Consumers' Cooperatives of the Central Government Bureau of the Ministry of Economic Affairs «. 4 24 00 3 1 A7 _B7__ 5. Description of the invention (#) A dehydration unit is installed between the vessel 17 and the distillation column 27. When using any of these alternative routes, the resulting stream 1 can be divided into two or more tributaries regardless of whether it is gaseous ammonia or an aqueous solution. * Each channel is directed to a different use station * so that the purification unit can Purified ammonia is simultaneously supplied to many use stations. HF passivation B 4 shows an on-site H F purifier according to one embodiment of the creation shown in this specification. The starting material is preferably high purity 49XHF which is substantially free of arsenic. Lower arsenic species are available from Allied Chenical. The HF program flow includes an evaporation (and arsenic removal) stage, a fractionation column M removes most of the other impurities, an ion purifier column K withholds impurities that are not removed by the splitter column *, and the final HF supply. (HFS). Optionally, a batch program for arsenic removal can be combined with an evaporator. In this application, arsenic is converted to the +5 state and is kept in evaporation by adding oxidant UMn〇4 or (NH4) z S2 〇8) and a cation source such as KHFz Μ in the distillation process. Device. This is a batch procedure because the reaction is slow and sufficient time must be allowed to elapse before the distillation is complete. This procedure requires about one hour of contact time at the box at the nominal temperature. In order to achieve a complete response in a continuous process, high temperatures and pressures (which are not good for safety) or very large vessels and lines are required. In this procedure * pseudo-lead HF into a batch-type evaporator container * stir for a suitable reaction time while treating the chamber with an oxidant. -27- The standard of this paper is Chinese national standard (CNS > A4 size (210X297 mm) (please read the precautions on the back first) to write this page) Du Yin, the Bureau ’s work-consumer cooperation, Du Yin «. Α7 Β7 V. Description of the invention (A) Then HF is led to a fractionation column and refluxed to remove most of the gold impurities. In this step, it is shown that the amount of gold is reduced. Elements include: Group 1 (1) Na Group 2 (11) Ca, Sr, Ba Group 3-12 (IIIA-IIA) CΓ, W. Ho. Μ η, Fe, Cu, Zn η 13 {III ) Group Ca Group 14 (IV) Sn. Pb. And Group 15 (VII) Sb. This fractionation column has a series of single passivation distillation functions; it uses a column filled with high surface area materials to convect the exhaustion. The method is carried out so that there is a complete balance between the falling fatigue and the rising vapor. Only a fake part of the condenser K is installed in this tower to provide the drawing flow and the passivated gaseous HF is subsequently led to HF IP water purifier (HF IP). At this stage, the HFM is generally pure, but may contain arsenic treatment chemicals or quenching agents (qu ench). HF IP is used as an additional purity guarantor before the HF gas is deflated into the supply system. Some elements may be present in the processing solution or in the IP to absorb the sulfates entrained by the HF gas stream. IP tests have shown that the following elements have a significant reduction in HF gas stream impurities: Groups 2 (I) Sr and Ba, Groups 6-12 (VIA-IIA) Groups Cr, W, and Cu,

Group 13 (1) B Group 14UV) Groups Pb, Sn, and -28- This paper wave standard is applicable to the China National Standard for Household Standards (CNS) A4 (2 丨 0 乂 297 mm) ------- ^ ----.------- ύ -------- ΙΤ ------ "-----: ---:-(锖 先 Μ. Read the back of the note Matters r " '', i nest page) 424003 Α7 Β7 Shellfish Consumption Cooperation of the Central Ministry of Economic Affairs of the People ’s Republic of China Du Yinxian 5. Description of the Invention (d) Group 15 (v) Sb. Many of these elements can be used to Suppression of arsenic pollution. Any entrainment in the steaming tower due to its excess in As treatment can be corrected in this step. The production of slow street HF, 3A, shows that ultrapure ammonia is conducted to An overview of the program flow in the generation unit used to make HF in argonfluoric acid * and Figures 3B1-3B3 show detailed P & ID diagrams of an embodiment of the program flow shown in Figure 3A. One of these is important This is because some gold impurities (such as Fe and Ni) dissolve out of the vapor stream more slowly than HF. Therefore, a two-stage procedure is used, in which some impurities are dissolved in the first scrubber * and the second The saturation operation of the gas system is about 105¾, so that these "light" impurities escape from the top of the tower In this way, the second scrubber produces high-purity hydrofluoric acid. In the preferred embodiment of the present invention, the liquid volume of the ammonia passivator is 10 liters, and the maximum gas flow rate is about 10 standard liters / minute. Fatigue system K foot K The flow rate is changed at least once in 24 hours. The product concentration (continuously or in batches) (measured in two production steps) is measured using a sound velocity measuring device (obtained from Mesa Labs). Measurements can be performed by replacing conductivity, density, emissivity *, or IR spectroscopy. To begin the procedure, you must determine the degree of thallium HF and HH 3 to be dissolved in water. For example, 1 kg 40 weight The ammonium fluoride solution of X contains 4Q0 grams of this paper size, using the Chinese National Standard (CNS) A4 grid (210X297 mm) I ---- ^ --- ^ ---- i-- (please first Read the note on the back $ ^^ 4 ~ Write this page) --- Order 1 / A7 B7 V. Description of the invention (correction) Please read the note on the back of NH4 F and 600 g of ultrapure water. In terms of F, the molar ratio of HF to NH3 is 1: 1, so 400 grams of NH4 F includes 216 grams of anhydrous HF and 184 grams of anhydrous NH3. (MW NH4 F = 37, MW HF = 20 MW 〇3 = 17) 〇 At the end of the HF formation cycle, 21 16 grams of HF are dissolved in 600 grams of water or 26.5 weight. The online instrument will promote the addition of HF to its concentration. In addition, you can also 49UF was diluted to this level. After the 26.5XHF solution had been formed, 189 grams of HH3 was added to form 40XΝΗ4F. Other degrees and mole ratios required for different applications can also be set by adjusting the concentration instrument control. Wafer cleaning. The central government's stamp printed by the Ministry of Economic Affairs and Consumer Cooperatives «. II 2 shows some cleaning stations in traditional semi-lead manufacturing media. The first unit in the cleaning medium is a photoresist stripping station (31 ^ 〇11 on 41) 41, in which hydrogen peroxide 42 and sparse acid 4 3 are combined and marinated on the surface of the semiconductor to peel In addition to the light sister layer. Thereafter, the rinsing station 44 is connected there to rinse off the stripping solution with deionized water. Immediately downstream of the flushing station 44 is Jijie Station 45. An ammonia solution and a hydrogen peroxide solution are applied there to dissolve the dissolution. This dissolution is supplied in one of two ways. In the first method, the ammonia solution 31 is dissolved with hydrogen peroxide solution 46, and the resulting mixture 4 7 is led to a cleaning station 45. In the second method, * a blunt gas is passed through the ammonia 32 into the peroxide, the water is dissolved in the water 48, and a similar mixture 4S is produced. It is similarly swollen to the cleaning station 45 30. This paper size applies the Chinese S standard > 8 this grid (210 × 297 mm) 424003 A7 B7 V. Description of the invention (J) Please read the note of the back first | ί Section 1. After cleaning with ammonia / hydrogen peroxide composition The second washing station 50 is used to remove the cleaning solution at the place where the young child water M is applied. The next station is another cleaning station 54 where the water-soluble hydrochloric acid 55 and the hydrogen peroxide 56 are applied to the semiconductor surface for further cleaning. This is followed by a final rinse station 57 * where deionized water K is applied to remove HC1 and ΗZ 0 2. At deglaze station 59, thin Yuanchong HF is applied to the crystal garden (to remove inherent or other oxides) Membrane). The dilute hydrofluoric acid is directly supplied from the generator 70 through a sealed tube. As described above • The reservoir 72 is equipped with anhydrous HF, and the gas is scarred from there. Ion purifier 7 1 to the generator 70. The better one also passes the gas poison f to the generator Prepare the Chengyuan Chong solution * and add ultrapure deionized water M to the desired dilution. Then rinse in ultra-blunt deionized water (at station 60) and dry at station 58. Wafer or crystal The round batch 61 is held on a wafer support frame 52 and is transported from a workstation M robot 63 or some other conventionally used tool to achieve sequential processing to the next station. The transport tool can be fully automatic. Partially automated or not at all. Printed by the Central Standards Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperative, the system shown in Figure 2 is just one example of a cleaning line for semiconductor manufacturing. Generally speaking, high-precision manufacturing cleaning media There may be a wide variation from the one shown in Figure 2, it may be possible to eliminate one or more of the units shown or to add or remove units that are not shown. However, the concept of on-site preparation of a high-purity ammonia solution according to the present invention may be applied In all of their systems. As shown in Figure 2, the workstations of the cleaning station 4 5 using ammonia and hydrogen peroxide as semiconducting cleaning media are well-known in the industry. Although the proportion will vary, -3 1 paper X China National Standards CNS > Α4 size (210 X 297 mm) Printed by the Central Standards Bureau of the Ministry of Economic Affairs, Printed by the Consumers Cooperative, V. Description of the invention (y) However, a nominal system contains deionized water, 23J; ammonium hydroxide (weight barrier benchmark) ) And 30 3: Hydrogen peroxide (weight basis), which is a 6: 1: 1 volume ratio. This cleaner is used to remove organic residues * and * with a super S wave at a frequency of about 1MHz. Search and remove particles in the sub-micron size range. In one example, purification (or purification and production) is located in the production line close to the point of use of ultra-pure chemicals. Only a short travel distance is left between the unit and the production line. In addition, for factories that have many uses, ultra-blunt chemicals from passivation (or passivation and production) units can pass through an intermediate storage and then reach the point of use. Each use point is fed from an individual output line of the intermediate storage tank K. In either case, you ca n’t learn the Department of Ultrapurity or the external fluorinated water in the hybrid. If you use it in the middle, you can send it in pure numbers, and so on. The application should be opened as usual. The storage of Fen Yi's storehouse is often used to control the internal connection of this unit, and the product is generally used to use the high-end element line to prepare for dismissal. Due to the dense army type, the distance is large. The high, small, and blunt systems are the exceptions that can be made to the super-intermediate service example. The factory has imported materials that are close and the mid-point distance from its line depends on the quality of the transmission. That. The transportation base of the management will be used to send the medium or the medium or the external real-time large-scale transmission network production equipment to the guide to make it more clean and rusty. If you set up this line system or not, you need to add to the production. Standing feet are not controlled by yuan. Biochemical uses a single source of K-adapter to make 20% of the land purely, which can directly guide it as a system of work. Pure and semi-sully. Pluripotent materials can be made into materials that are more suitable because of the presence of points. They can be stored in a moment or separated by aggregating necessities, which can be used to change the quality of the paper. Use the Chinese national sample rate (CNS) > Μ specifications (2 丨 0 > < 297 mm) 003 Α7 A standard printed by the Ministry of Economic Affairs, Central Laboratories and Consumer Cooperatives *. __Β7_ V. Description of the invention. These standards are commonly used in the semiconductor industry and are well known to those skilled in the art and skilled in industrial operations and standards. Methods for purifying water according to some criteria include ion exchange and reverse osmosis. Ion exchange methods typically include most or all of the following: chemical treatments such as chlorination to kill organisms; sand filtration to remove particles; activated carbon to remove gas and trace organic matter; silica frontier filtration ; Sleepy son exchange to remove strong free acid: mixed bed polishing), which contains both cation and anion exchange resin K to remove other ions; sterilization * including chlorine treatment or ultraviolet light; and 0.45 Filters of micron or smaller size are too thin. 1 Permeation methods include replacing one or more of the units in the ion exchange * process by passing water under pressure through a selective membrane that does not allow many dissolved or suspended substances to pass through. The typical purity standard for water obtained from the tritium method is at least about 15 million ohms per centimeter Uegohi-c ·) at 251C. The pseudo number of resistance (typically 18 million ohm-cm at 25 * 0) * is less than about 25 ppb. Electrolyte, particle content of less than about 150 / cubic centimeter and particle size of less than 0.2 micron * tritium biological content of less than about 10 / cubic centimeter, and tritium organic carbon of less than 100 PPb. In the method and system of the present invention, the high degree of control over the degree of product and therefore the flow rate is achieved through the use of known equipment and instruments for accurate monitoring and child counting. A convenient means to this end is tone detection. Other methods are in the hands of those skilled in the art. If necessary, various modifications can be made to the concentration control path (using the coefficient of energy, etc. instead of the speed of sound). -33- This paper uses China Standards (CNS) Α4 size (210 × 297 cm) (Please read the precautions on the back to write this page. _ Order ο The Central Government of the Ministry of Economic Affairs Bureau of the Bayer Consumer Cooperatives printed policy ^ 2 Λ Ο 0 3 Α7 Β7 V. Description of the Invention (μ) Modifications and Variations As recognized by those skilled in the art * The innovative ideas described in this application can be modified and mutated for large applications, so * The scope of the patent complaint of the present invention is not limited to any special examples given herein. For example, as apparent to those skilled in the art * The concepts disclosed can be adapted for the semi-continuous use of ultra-pure chemicals In another example, the innovative technology shown is not strictly limited to the manufacture of jackpot circuits, but can also be used to manufacture individual f-conductor parts * such as photovoltaic devices And power device. As another example, the disclosed innovative technology can also be applied to other technologies using integrated circuit manufacturing methods, such as thin-film magnetic heads and active matrix liquid crystal displays; however, its basic application is in integrated circuits. Made in Kushiro, The technology shown is secondary to applications in other fields. In addition, it must also be mentioned in particular that the tubing used to guide ultra-pure chemicals in the semiconductor front end can include an internal reservoir or a pressurized reservoir. Therefore The "direct" fittings referred to in the scope of the patent application do not exclude the use of their reservoirs * but do exclude exposure to uncontrolled atmosphere. In addition, it must be specifically mentioned that the present invention is not strictly limited to only one The use of sensors. For example * the speed of sound sensor used in the preferred embodiment of the present invention has disadvantages, that is, * for very dilute HF solutions (near 1¾) • there is no pair between the sensor output and the degree In the preferred embodiment of the present invention, the conductivity measurement is used to control the BF dilution from the final to the highest dilution. &Quot; 3 4 _ This paper size uses China National Standards (CNS) A4 specifications (210X297mm) (Please read • Read the notes on the back and write this page) Order.

Claims (1)

424 003 A8 B8 C8 D8 Patent Application Scope 1. A method for generating accurate ultra-pure liquid chemical formulations at the site of semiconductor processing facilities, which includes the following steps: (Please read the precautions on the back before filling out this page > (a) The first, second, and third sources K are supplied in a controlled manner from the first, second, and third ultrapure pharmaceutical ingredients; (b) the first and second pure pharmaceutical ingredients are mixed, and The control related to the output of the one-dimensional sensor is turned over to produce a first ultrapure mixture with the first precisely selected formula; (c) combining the third ultrapure pharmaceutical ingredient with the The first ultra-pure mixture is a second ultra-pure mixture with a second precisely selected formula from the mixture under the control of the output of a sensor that can provide one-dimensional measurement; And (d) providing the second ultrapure admixture to a pipe connection and directing the aqueous solution to a point of use in the semiconductor device manufacturing facility. 2. The method according to item 1 of the scope of patent application, wherein the first A second pharmaceutical ingredient It is acid. 3 · As in the method of applying for the first item of patent scope, where the two mixed operations are automatically controlled by K closed loop relationship ° Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 4 · If the application of the first item of patent scope Method, where the two mixing operations are both M, including the feedforward dependency, and the relationship is automatically controlled by ° 5 * As in the method of the scope of patent application No. 1 'where the sensor is a sound velocity sensor. 6 species A method for producing an accurate ultrapure liquid chemical compound in a semiconductor processing facility, including the following steps: -1- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 42 4 0 03 A8 B8 C8 D8 夂 、 Scope of patent application (please read the notes on the back before filling out this page) (a) Supply the first, second and third sources in a controlled manner from the first, second and third sources A third ultra-pure pharmaceutical component; (b) mixing the first and second two ultra-pure pharmaceutical components, which are mixed under a control relationship dependent on the output of a first sensor to produce a first precision Selected recipes An ultra-pure mixture; (c) warming the third ultra-pure elixir component with the first ultra-pure mixture is dependent on the second sense which is different from the first sensor but also provides one-dimensional measurement Mixing under the control relationship of the output of the measuring device to produce a second ultrapure mixture having a second precise selection formula therefrom; and (d) providing the second ultrapure mixture to a pipeline connection to guide the aqueous solution To the point of use in the semiconductor device manufacturing facility. 7 · If the method of the scope of patent application item 6, the first and second pharmaceutical ingredients are both acids. 8 · If the method of the scope of patent application item 6, The two mixed operations are automatically controlled by the M closed circuit. 9 «The method according to item 6 of the patent application, wherein the two mixed operations are automatically controlled including the relationship of feedforward dependency. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 10 · If the method of the scope of patent application is No. 6, the sensor is a speed sensor. 1 1 · The method according to item 6 of the scope of patent application, wherein one of the sensors is a sound speed sensor and the other is a conductivity measurement. 1 2 ♦ —A method of mixing two or more fluids * which includes the following steps: -2- This paper size applies _ National Standard (CNS > A4 size (210 X 297 mm) 424 003 'B8 C8 ___ D8 VI. Scope of patent application (a) Prepare at least one first fluid and one second fluid to be mixed; (b) Roll the fluids through a tool that can mix the fluids to form a combined fluid (C) guiding an ultrasonic wave through the mixed fluid; and (d) measuring the wave velocity transmitted through the mixed fluid, thereby displaying the density of the mixed fluid and indirectly measuring the first contained in the coupled fluid. The ratio of the amount of a fluid to the amount of a second fluid. 1 3 * As in the method of item 12 of the patent application, wherein the first fluid is an acid. 1 4 · As in the method of item 12 of the patent application, The second fluid is an acid. 15. The method according to item 12 of the patent application, wherein the first and second fluids are an acid. 0 * * An on-site mixing system used in a semiconductor device manufacturing facility To provide ultra-high purity pharmaceuticals to semiconductor manufacturing operations. For users, the system includes: first, second, and third sources, which are connected to supply the first, second, and third ultrapure tincture components for semiconductor processing; a halide device, which is Connected to the sources K to receive the ultra-pure pharmaceutical ingredients and generate their mixtures; a sensor * which is connected to monitor the composition of the ingredient mixture produced by the mixing device, and control series * It is connected and configured to adjust these pharmaceutical ingredients with Κ-3-This paper size applies to Chinese national standards (CNS > A4 size (210 X 297 mm) (Please read the precautions on the back before filling out this page). Clothing- ------ Order --------- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 1x2 ά U 〇Α8 Β8 C8 D8 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs The flow rate in the mixing device is adjusted by the following relationship depending on the output of the sensor: it makes the mixing device first mix the first and second components into a precisely selected formulation, and then mix The second and third two Serving as the second, precisely selected formulation. 1 7. Such as the system of patent application No. 16 'wherein the first and second pharmaceutical ingredients are both acid. 1 8 · as patent application No. 1 The system of 6 items, wherein the control compliance includes feed-forward dependence. 1 9 * If the system of item 16 of the patent application 'in which the sensor is a speed sensor, 2 0. — a field hybrid system It is used in semiconductor device manufacturing facilities to provide ultra-high inertness reagents to users of semiconductor manufacturing operations. The system includes: first * second and third sources, which are connected to supply M, 1 and 2 And a third kind of ultra-blunt pharmaceutical ingredients for semiconducting treatment; a mixing device that receives the ultra-pure pharmaceutical ingredients via the source K and generates their mixture; a sensor that is The connection W monitors the composition of the component mixture produced by the mixing device; and a control series, which is connected and configured to adjust the flow rate of the pharmaceutical ingredients into the mixing device with K, which depends on the sensor Output The sticking device first relies on the output of a first-dimensional sensor to mix the first and second components into a precisely selected compound. -4-This paper size applies to China National Standard (CNS) A4 Specifications (210 X 297 mm) — —It— ^ -------- ^ 7_ |! --- ^ (Please read the notes on the back before filling out this page) Consumption for off-site work, Intellectual Property Bureau, Ministry of Economic Affairs Cooperative printed 424 003 Shao ^ C8 D8 6. The scope of the patent application relies on the output of a second elementary sensor to mix the second and third components into a second precisely selected formulation. 21 · As in the system under item 20 of the patent application, wherein the first and second pharmaceutical ingredients are both acids. 22 * If the system is in the scope of patent application No. 20, wherein the control operation includes feedforward dependency. 23 * If the system of item 20 of the scope of patent application is applied, the sensor is a speed sensor. 24 ♦ —System for mixing ultrapure fluids • It includes: (a) First and second chemical dispensers ”The first and second chemical dispensers are adapted to hold the first and second chemical dispensers, respectively. First and second fluid t (b)-a program connection, which is installed between the first and second two chemical dispensers, which can be heated and flowed through and mixed with each other to form a mixture.髑 • The program connection allows the mixed stream to flow to the position of the operator; and (c > an ultrasonic wave transmitting device, which is installed at a position where the ultrasonic wave is transmitted through the mixed fluid. Here, the device includes a tool for measuring the velocity of the wave transmitted through the mixed fluid, and thus indirectly measures the ratio defined by the amount of the first chemical contained in the mixed fluid to 1 of the second chemical. 25. If you apply for the system of item 24 of the patent scope, where the first and second pharmaceutical ingredients are both acid. This paper size applies the Chinese National Standard (CNS) A4 (210 X 297 mm) H n H · Γ · * n tt nnn I «n I (Please read the notes on the back first (Fill in this page) Δ2Λ 0〇3 Α8 BS C8 DS VI. Items of Patent Application Scope System 4 2 Range Fanli-Specificity, please ask Lai Shen for your feedback. The first 6 include 2 packages and control the system. Item 4 2 Fan Li special request. Application device is tested. Sense 7 speed 2 tone is the device tide sense (please read the precautions on the back before filling this page). Intellectual Property Bureau of the Ministry of Economic Affairs, consumer cooperation Du Paper's paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm)