經濟部智慧財產局貝工消费合作社A 五、發明說明(1 ) 發明之技術翎迠 本發明係有關用於拋光部件的一種浞合物、方法及 裝置’該部件具有至少一個待拋光之空腔β 本發明較佳係施用於用以製造塑膠物品之鑄模形式 或鑄棋部份’而該待拋光的空腔係為用於該物品之成形 鑄棋。 背景技藝 目前係以滾筒清理法拋光金屬部件》在一滾動的困 筒或容器中裝滿拆卸的部件,及使用一設計以研磨該部 件的對應壁面之清潔混合物或物質,而拋光部件之表面 。藉由促使該密封容器持續地旋轉一特定時間,而獲致 該待拋光表面與該清潔浞合物之相對移動* 依據習知技藝進行之滾筒清理法,不僅因為需要使 用具有該等部件所用的一個大容器之特殊機器及使用大 量的拋光物質而非常昂贵,亦不容許特定地拋光該部件 之各種區域。此將構成例如其中具有基準面之鑄棋部份 之問題’該等基準面引導不同的鑄模部件及將其等置於 相互對應的位置,而該等基準面在重複的滾简清理操作 後之磨損,導致產生有缺陷的塑膠物品·該等鑄棋類型 係用於例如保特瓶之生產· 發明之揭露内容 因此,本發明之目的係克服上述之個別或整體的缺 $jc 。 如上所提及之目標,本發明之技術特性係述於本案 #適用中囲囲家標準(CNS)A4規格(2】0 X 297公釐) -4 - -S ί I n I *1 · K r— • · (請先閱讀背面之注意事項再填寫本頁) 訂 4 經濟部智慧財產局貝工消费合作社印製 A7 B7 五、發明說明(2 ) 之申請專利範圍,本發明之優點係參照所附圖式而更清 楚地說明於下列的詳細說明部份,所附圖式係說明一較 佳具體例而非限制本發明之應用範疇。 如用於拋光具有至少一個待拋光空腔之部件的本方 法,更詳細地該部件係為用於製造塑應物品之鋒模形式 或鑄模部份,其中該待拋光之空腔係用於該物品之成形 鑄棋,該方法預見一拋光混合物之製備,然後將該混合 物與待拋光之空腔表面接觸,及以相對於該待拋光表面 的方式’移動該拋光混合物一段預定時問》 該方法有利地預見將該拋光混合物置入該部件之空 腔中’其係經特殊設計以界定用於容納該拋光混合物之 一元件。 其避免使用過量的拋光物質。在該具有待拋光表面 之空腔中可置入的量係為足夠的。 如說明於後,該空腔具有一個上緣。如該方法之另 一有利特性,係該拋光混合物之置入位準高達該空腔之 上緣以上。 如本發明之另一特徵,當該拋光混合物置入該空腔 之時,該部件受到振動處理》 JI式之簡要說明 本發明為參照隨文所附實施例與獨特的田式而被更 佳地瞭解,其中 第1圖係有關於本發明裝置之一較佳具體例的圖解側 面圖。 本紙張尺度適用中國國家標準<CNS)A4規格(210 * 297公釐>Shellfish Consumer Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs A. V. INTRODUCTION TO THE INVENTION (1) Technology of the invention 翎 迠 The present invention relates to a compound, method and device for polishing a part. The part has at least one cavity to be polished β The present invention is preferably applied to a mold form or a chess piece used to make a plastic article, and the cavity to be polished is a shaped chess piece for the article. BACKGROUND ART At present, the metal parts are polished by a roller cleaning method. A rolling barrel or container is filled with disassembled parts, and a cleaning mixture or substance designed to grind the corresponding wall surface of the part is used to polish the surface of the part. The relative movement of the surface to be polished and the cleaning compound is obtained by causing the sealed container to continuously rotate for a specific time * The roller cleaning method according to the conventional art is not only because it requires the use of a Special machines for large containers and the use of a large amount of polishing material are very expensive and do not allow specific areas of the part to be polished. This would constitute, for example, the problem of casting parts with reference planes, 'these reference planes guide different mold parts and place them in mutually corresponding positions, and the reference planes are Wear and tear, resulting in defective plastic items. These types of casts are used, for example, in the production of pott bottles. The disclosure of the invention. Therefore, the purpose of the present invention is to overcome the individual or overall lack of $ jc described above. As mentioned above, the technical characteristics of the present invention are described in this case. #Applicable Chinese Standard (CNS) A4 specification (2) 0 X 297 mm. -4--S ί I n I * 1 · K r — • · (Please read the notes on the back before filling out this page) Order 4 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Printed by the Shellfish Consumer Cooperative A7 B7 5. The scope of patent application for invention description (2), the advantages of the present invention refer to The accompanying drawings are more clearly described in the following detailed description. The attached drawings illustrate a preferred specific example rather than limiting the application scope of the present invention. If this method is used for polishing a part having at least one cavity to be polished, the part is in more detail a die form or a mold part for manufacturing a plastic article, wherein the cavity to be polished is used for the The method for forming an article is to foresee the preparation of a polishing mixture, then contacting the mixture with the surface of the cavity to be polished, and 'moving the polishing mixture for a predetermined period of time relative to the surface to be polished.' It is advantageous to foresee that the polishing mixture is placed in the cavity of the component, which is specially designed to define an element for containing the polishing mixture. It avoids the use of excessive polishing substances. The amount that can be placed in the cavity having the surface to be polished is sufficient. As explained later, the cavity has an upper edge. As another advantageous feature of the method, the level of placement of the polishing mixture is above the upper edge of the cavity. According to another feature of the present invention, when the polishing mixture is placed in the cavity, the part is subjected to vibration treatment. Brief description of the JI formula. The present invention is better with reference to the accompanying examples and the unique Tian style. It is understood that FIG. 1 is a diagrammatic side view of a preferred embodiment of the device of the present invention. This paper size applies to Chinese National Standard < CNS) A4 Specification (210 * 297 mm)
I n I Ml t I ί請先閱讀背面之注意事項再填寫本頁) 訂. 線 經濟部智慧財產局員工消費合作社印製 421616 A7 __B7 五、發明說明(3 ) 依據本案方法’可藉由使用_乾式拋光混合物而斤 —有利的拋光效果,該拋光混合物包含自50至80重量。/〇金 屬丸、或研磨性陶瓷元件、或研磨性塑膠元件,及自2〇 至50重量°/。的一般為粉末形式之一磨料。 因該乾式混合物可在該空腔之非直線路境内合宜地 移動’該混合物之$用促成顯著地拋光該物品模鑄空腔 的所有點。 更進一步’觀察到當添加_定比例的水時,可增進 磨料於金屬丸上之融合作用,及促進其與待拋光表面接 觸之作用。該濕式拋光混合物較佳包含70至90重量%金屬 丸、或研磨性陶瓷元件、或研磨性塑膠元件,介於5至20 重量%之間的一磨料,及自3至10%的水* 亦可能在該拋光物質或混合物中添加3至10%之間的 拋光劑》例如一種液態清潔劑,其可增進物質的脫離及 在拋光後賦予該空腔一較具光澤的表面。 試驗顯示促成最佳拋光效果之拋光混合物的最佳组 成物,包含80重量%金屬丸、10%磨料、5%拋光劑及5% 水。 該金屬丸有利地包括具有各種形狀的銅丸,例如菱 形、三角形與圓柱形,較佳具有介於3至6毫米之間的一 個較大的尺寸。 該研磨性陶瓷元件或物質,或研磨性塑膠元件或物 質,具有類似的或較大的尺寸。 拋光處理之時間長庠較佳介於6至20小時之間。 本紙張尺度適用中國國家標準(CNS)A4規格<2]〇 * 297公* > r L Γ Lr ί It n n n * I n n I 一 » I n I Lv (請先《讀背面之沒意事項再填寫本頁)I n I Ml t I Please read the notes on the back before filling out this page). Order. Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Online Economics 421616 A7 __B7 V. Description of the invention (3) According to the method of this case 'can be used by _ Dry polishing mixture-favorable polishing effect, the polishing mixture contains from 50 to 80 weight. / 〇 Metal pellets, or abrasive ceramic elements, or abrasive plastic elements, and from 20 to 50 weight ° /. It is generally one of the abrasives in powder form. Because the dry mix can be expediently moved within the non-straight line of the cavity ', the use of the mix results in a significant polishing of all points of the article molding cavity. Furthermore, it was observed that when a certain proportion of water is added, the fusion effect of the abrasive on the metal pellets can be enhanced, and its contact with the surface to be polished can be enhanced. The wet polishing mixture preferably comprises 70 to 90% by weight of metal pellets, or abrasive ceramic elements, or abrasive plastic elements, an abrasive material between 5 and 20% by weight, and 3 to 10% water * It is also possible to add between 3 and 10% of a polishing agent to the polishing substance or mixture, such as a liquid cleaner, which can promote the release of the substance and give the cavity a shiny surface after polishing. Tests have shown that the optimal composition of the polishing mixture that contributes to the best polishing effect comprises 80% by weight of metal pellets, 10% abrasive, 5% polishing agent and 5% water. The metal pellets advantageously include copper pellets having various shapes, such as rhombic, triangular and cylindrical, preferably having a larger size between 3 and 6 mm. The abrasive ceramic element or substance, or the abrasive plastic element or substance, has a similar or larger size. The long polishing time is preferably between 6 and 20 hours. This paper size applies to China National Standard (CNS) A4 specifications < 2] 〇 * 297 male * > r L Γ Lr ί It nnn * I nn I I »I n I Lv (Fill in this page again)
C 經濟部智慧財產局具工消费合作社印製 Α7 Β7 五、發明說明(4 ) 參照所附圖式,如本發明所製之一較佳具體例1〇, 其包括用於多個待拋光部件12之一基座或支撐掻16 ·如 所示’該檯係架置於彈簧17或一固定基座15上。 有利地,本裝置之用途預見將拋光混合物置入該部 件12之空腔14中’其方式使得空腔14界定用於該拋光混 合物13之容器元件。 為了以相對於該待拋光表面的方式移動該拋光混合 物’預見能造成該部件12振動之構件。更詳細地,如該 唯一的圖式所示’振動構件包括施用於掻16之一振動器22 ,可將其開啟以使檯16振動。 振動係傳送到該部件,引發該拋光物質以循環方向 旋轉,造成該磨料物流的有效側舆該部件空腔的第一表 面之間之直接接觸(如圖中箭頭所示此係歸因於該檯上 之振動作用具有一平行於該捶之振動及一垂直於該檯之 頓挫振動* 為了均勻地拋光該空腔之周圍表面,以預定的間隔 中斷該檯之振動作用,而該部件以一預定角度轉動直至 將該表面完全拋光為止。選擇性地,可倒轉振動馬達的 多個旋轉作用,以倒轉該拋光物質於該空腔中循環之旋 轉方向。此促使拋光周圍所有的壁,特別是該等小部件 者。該操作上的解決方案’係得自本裝置中賦予該棰振 動作用之該設備,其包括一旋轉式振動轴,其重量係相 對於該軸之轴心而加以抵銷,而其係置於使該軸平行於 該棰之位置。 --- 111--1 · ---11----. 11 — I--1 <靖先閱讀背面之注意事項再填寫本頁)C Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Industrial Cooperatives A7 B7 V. Description of the Invention (4) Referring to the attached drawings, as shown in the figure, one of the preferred specific examples 10, which includes a plurality of parts to be polished One of the bases or supports 掻 16 · As shown, the stand is placed on a spring 17 or a fixed base 15. Advantageously, the use of the device foresees the placement of the polishing mixture into the cavity 14 of the component 12 'in such a way that the cavity 14 defines a container element for the polishing mixture 13. In order to move the polishing mixture 'in a manner relative to the surface to be polished, a member capable of causing the component 12 to vibrate is foreseen. In more detail, as shown in the sole drawing, the vibrating member includes one of the vibrators 22 applied to the cymbal 16, which can be turned on to vibrate the table 16. The vibration system is transmitted to the part, which causes the polishing substance to rotate in a circulating direction, causing the effective side of the abrasive material to directly contact the first surface of the cavity of the part (as shown by the arrow in the figure, this is due to the The vibration action on the table has a vibration parallel to the chirp and a shock vibration perpendicular to the table. * In order to uniformly polish the surrounding surface of the cavity, the vibration action of the table is interrupted at predetermined intervals, and the component starts with a Rotate by a predetermined angle until the surface is completely polished. Optionally, the multiple rotations of the vibration motor can be reversed to reverse the direction of rotation of the polishing substance circulating in the cavity. This promotes polishing of all surrounding walls, especially For these small parts, the operational solution is derived from the device that gives the chirping vibration effect in the device, which includes a rotary vibration shaft whose weight is offset relative to the axis of the shaft , And it is placed at a position where the axis is parallel to the-. --- 111--1 · --- 11 ----. 11 — I--1 < Jing first read the notes on the back before filling (This page)
421616 經濟部智慧財產局具工消费合作社印製 五、發明說明( 本裝置避免了使用習知技藝中之丄, «•势甲之昂贵與大型的滾動 筒。 就各部件12而言,具有用於密封空腔14之特殊構件 ,其包括-上蝝18,其構形其向上延伸而界定用以讓拋 光混合物13置入空腔14中之一個上方澎脹室2〇該構形 有利地促使該拋光混合物之置入位準高達該空腔的上緣 以上,而能完全拋光該空腔14之所有待拋光表面。 該上緣包括一個第一環形元件18,及一個上方盤形密 封元件18”。在置入上方盤形密封元件18”之前,將拋光物 質13置入該部件中。 密封該密封構件,該部件以用於各部件舆位於該部 件與上緣之上的一個單板21而固定於該檯上,及以延伸 支柱23而支樓於該檯16上,在支柱23的二端上緊防鬆螺 母25。 如圖式中所示’在用於密封空腔14之構件18的環形 部份18’’形成構件或部份22,其延伸以覆蓋與保護部件12 位於空腔14内之不可拋光的該等區域β 依此方法,防止在鑄棋的良好操作上所需的定位或 接觸區域,因拋光操作造成不利的磨損。 參照下列實例,將更容易瞭解本發明。 第1例 使用一濕式拋光混合物,其包含80重量%之長度為4 毫米的銅丸、〗0%粉末磨料諸如Rollwash Diaibril(商品名) ' 5%液態拋光劑諸如Ros〗erCL30(商品名)、及5%水。 本紙張尺度適用中國國家標準(CNSM4规格(210x 297公藿) {請先Μ讀背面之注意事項再填寫本頁) X袈 • If ---—訂·--11» n It 4 線421616 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and the Consumer Cooperatives. 5. Description of the invention (This device avoids the use of conventional techniques, «• The expensive and large rolling barrel of the armor. As far as each component 12 is concerned, it is useful A special component of the sealed cavity 14 includes an upper cymbal 18, which is configured to extend upwardly to define an inflation chamber 20 for placing the polishing mixture 13 into one of the cavities 14. The configuration advantageously facilitates the The polishing mixture is placed at a level above the upper edge of the cavity, and can completely polish all the surfaces to be polished of the cavity 14. The upper edge includes a first annular element 18, and an upper disc-shaped sealing element 18 ". Before placing the upper disc-shaped sealing element 18", the polishing substance 13 is placed in the part. The sealing member is sealed for each part 21 and a veneer 21 above the part and the upper edge. It is fixed on the platform, and is supported on the platform 16 by extending the pillars 23, and the lock nuts 25 are tightened on the two ends of the pillars 23. As shown in the figure, 'the member for sealing the cavity 14 18 '' 18 '' ring structure Or part 22, which extends to cover and protect the non-polishable areas 12 of the cavity 12 in the cavity 14. In this way, the positioning or contact areas required for good operation of the casting game are prevented due to the polishing operation. Unfavorable wear. The present invention will be easier to understand with reference to the following examples. The first example uses a wet polishing mixture containing 80% by weight of copper pellets with a length of 4 mm, and 0% powder abrasives such as Rollwash Diaibril (trade name ) '5% liquid polishing agent such as Ros erCL30 (trade name) and 5% water. This paper size applies to Chinese national standards (CNSM4 specifications (210x 297 cm)) {Please read the precautions on the back before filling this page ) X 袈 • If ---— Order · -11-11 n It 4 lines
CC
C 經濟部智慧財產局員工消费合作社印製 A7 B7 五、發明說明(6 ) 該部件受到振動處理.拋光處理時間為12小時。 第2例 使用一乾式拋光混合物,其包含50重量%之長度為6 毫米的銅丸’及50%粉末磨料諸如RoUwash Dialbril(商品 名)。 該部件受到振動處理。拋光處理時間為6小時。 第3例 使用一濕式拋光混合物,其包含90重量%之長度為3 毫米的銅丸' 5%粉末磨料諸如Rolhvash Dialbril(商品名) 、3%水、及2%拋光劑諸如清潔劑R0Sier CL30(商品名)。 該部件受到振動處理。拋光處理時間為20小時 在第一拋光階段之後,該空腔以_完全相同的第二 、最終拋光階段處理。後者階段使用第二拋光混合物, 其包括自70至95重量%金屬丸、或研磨性陶瓷元件、或研 磨性塑膠元件,較佳為90%,自3至20%水,較佳為5%, 及自3至20%拋光劑,較佳為5%。笫二拋光階段之時間長 度,係介於2至3小時之間。 此述之本發明可加以改良與變化,而不致偏離本發 明觀念之範疇。更進一步,本發明之所有細節,能以技 術上的相當元件加以取代。 本紙張尺度適用中固困家標準(CNS)A4規格(210x297公« ) til»— — — — —— — —! · I I I I I I I I I I I--I (請先M讀背面之注$項再填寫本K) A7 經濟部智慧財產局員工消費合作社印製 421616 _B7_ 五、發明說明(7 ) 元件標號對照 10 裝置 18” 上方盤形密封元件 12 部件 20 上方膨脹室 13 拋光混合物或物質 21 單板 14 空腔 22 振動器 15 基座 22 構件或部份 16 支撐檯 22’ 振動重量 17 彈簧 23 延伸支柱 18 上緣 25 防鬆螺母 18, 第一環形元件 <請先H讀背面之注意葶項再填寫本頁> 本紙張尺度遘用中®國家標準(CNS)A4規格(210 * 297公釐) 10C Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (6) The part is subjected to vibration treatment. The polishing treatment time is 12 hours. The second example uses a dry polishing mixture containing 50% by weight of copper pellets having a length of 6mm and 50% powdered abrasive such as RoUwash Dialbril (trade name). The part is subjected to vibration treatment. The polishing treatment time was 6 hours. The third example uses a wet polishing mixture that contains 90% by weight of copper pellets with a length of 3 mm '5% powdered abrasive such as Rolhvash Dialbril (trade name), 3% water, and 2% polishing agent such as detergent ROSier CL30 (Product name). The part is subjected to vibration treatment. The polishing treatment time is 20 hours. After the first polishing stage, the cavity is processed in the same second and final polishing stage. The latter stage uses a second polishing mixture, which includes from 70 to 95% by weight metal pellets, or abrasive ceramic elements, or abrasive plastic elements, preferably 90%, and from 3 to 20% water, preferably 5%, And from 3 to 20% polishing agent, preferably 5%. The duration of the second polishing stage is between 2 and 3 hours. The invention described herein can be modified and changed without departing from the scope of the concept of the invention. Furthermore, all the details of the present invention can be replaced by technically equivalent elements. This paper size is applicable to China Solid Standard Standard (CNS) A4 (210x297 male «) til» — — — — — — —! IIIIIIIIII I--I (please read the note $ on the back before filling in this K ) A7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 421616 _B7_ V. Description of the invention (7) Component number comparison 10 Device 18 ”Disk seal element 12 Upper 20 Expansion chamber 13 Polished mixture or substance 21 Veneer 14 Cavity 22 Vibrator 15 Base 22 Component or part 16 Support table 22 'Vibration weight 17 Spring 23 Extension post 18 Upper edge 25 Lock nut 18, First ring element < Please read the note on the back first before filling Page > This paper is in use ® National Standard (CNS) A4 Specification (210 * 297 mm) 10