經濟部中央標準局負工消费合作社印製 A7 B7 五、發明説明（j ) 【發明之應用範疇】 本發明是關於一種全像擴散元件及其製法，特別是關 於一種以電腦計算設計，具高光穿透率且能均勻混合色 彩之全像擴散元件。 本發明之全像擴散元件在視覺上提供了多波源的色 彩混合效果，使不同波源經過此擴散元件可得較佳的混色 效果，提昇了擴散元件的穿透效率。本發明並提供一套疊 代演算法，利用電腦計算出全像元件之立體結構。 [發明之背景] 傳統式擴散元件在光學領域上扮演著相當重要的角 色。不但可改善光照射物體的均勻性，亦可改善光學影像 系統，使其具寬闊的影像可見度。擴散元件可應用於例如 平面顯示器上，作背景光照射，或作投影螢幕等等。 目前擴散元件的製作方式可分爲兩類： 1. 一般擴散板，例如毛玻璃這種擴散元件是利用擴散 板表面的粗糙度來完成光散射的效應。此傳統式的 擴散元件的光穿透能量過低，衰減效應太大。 2. 全像式拍攝的擴散板，是利用兩道光束干涉的方式 來達成光束整型及擴散的效果。這種擴散元件雖可 獲得可控制的擴散效果，其穿透效率亦有提昇，但 其光穿透能量不高，且無法達成滿意的色彩混合效 果，則爲其缺點。 由於習用技術對擴散元件之製作均存在相當缺點，本 發明人乃提出利用電腦計算方式設計的擴散元件。本發明 (請先閱讀背面之注意事項再填寫本頁) ---*------；— ^-----裝--- 訂----- 本紙悵尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 經濟部中央樣準局®C工消費合作杜印掣 Α7 Β7 五、發明説明（1) 之全像擴散元件利用電腦計算，以決定其立體空間結構。 因電腦計算精確，且利用半導體蝕刻技術可達到加工控制 準確之效果，故可達到極佳的穿透效率及可塑性的色彩混 合效果。本發明之全像擴散元件可稱爲電腦輔助 散元件。 【發明目的】 本發明的目的在提供一種新穎的電腦計算方法，以設 計出具有優異擴散效果的擴散元件。 本發明之目的也在提供一種以電腦輔助設計，製作擴 散元件之方法。 本發明之目的也在提供一種具高光穿透率及均勻混色 效果之全像擴散元件。 本發明之目的也在提供一種構造新穎的全像擴散元 件。 【發明之簡述】 本發明的全像擴散元件是一種利用電腦計算方法所設 計的擴散元件。基本的理論是利用Fraunhofer繞射原理和 叠代演算法，再輔以數個適用之判斷參數及條件，再參照 收斂條件，計算並據以製作具有優異擴散效果的元件立體 結構。在叠代演算中係利用改變振幅的判斷條件來達成元 件高穿透率的特性。本發明另一特點是可利用特殊的叠代 演算法，計算出可均勻混合多波源色彩’且具有高穿透效 率特性之擴散元件ο 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） —Λ-丨--------liir丨-;-II.— 丨L· (請先閲讀背面之注意事項再填寫本頁) 經濟部中央標準局貝工消費合作社印掣 A7 _B7__ 五、發明说明（3 ) 【圖式之說明】 第一圖表示本發明全像擴散元件截面圖。 ' 第二i表示適用於本發明之三個波源混色擴散元件的 鲞代演_:法示意圖。 第三圖表示由32 X 32二維單位元所組成的電腦輔助_ 設計全像擴散元件，每單位元的數字分別代表其蝕刻深 度，其階數爲2L'= 8量化階數。 第四圖表示第三圖之本發明全像擴散元件的穿透效率 甲意圖。 第五圖表示本發明全像擴散元件之製作流程圖。 【發明之詳細說明】 以下參照圖式說明本發明之全像擴散元件及其製法。 第一圖顯示一種本發明全像擴散元件之截面圖。圖中 顯示本發明之全像擴散元件是由許多單位元所組成。於此 所謂「單位元」是指組成全像擴散元件之微小區域’適當 之實例可爲每單位元1 X 1 V m。如圖所示’每一個單位 元的厚度均不相同。在本發明的實施例中’全像擴散元件 是利用蝕刻技術加以完成。圖中，D表示用以製作全像擴 散元件之基板之厚度，也表示某列單位元中，第i位置之 單位元之蝕刻深度。 依據本發明之全像擴散元件之製法，各單位元之蝕刻 深度Φ可以下列相位分佈函數算得： 5 - ·_ _ 1 '* " *" 本紙恨尺度適用中國囷家標準（〇^)戍4規格（210><297公兼> - Ί . —L·lll·ili_裝 — I (請先閲讀背面之注$項再填寫本頁) I訂 A7 _B7_____ 五、發明説明（4·) 其中，A表擴散元件對波源七之相位分佈函數；夂爲 在波源\下的波數；'爲基材的材料折射率。 本發明所提供之全像擴散元件之製法，可以針對不限 種類波長A，\，λ3…;ι„算得每一單位元之蝕刻深度。但 在實際應用上，通常是以三種波長（即三原色）之光源’ 造成混g梦果，最爲當見。因此本發®®®簞麗運裏方 式，以求得適合多段波源並具有混色效果之全像擴散元 ........ ........... -— -.....— 〜 佇。 雖不欲爲任何理論所拘束，但本發明爲適合多段波長 之光源之應用，提出一種「叠代演算法」，以決定其擴散 元件之立體結構。以下加以說明》 第二圖顯示適用於本發明之三段波源混色擴散元件之 叠代演算法示意圖。在此，本實施例是以波長變數4，毛，毛 的3種色彩混合方式，作爲說明之依據。但本發明可適用 於多於或少於三種波源，則不待言。 經濟部中央標隼局貝工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁) 首先以一組由亂數產生的起始値當作起始條件，這些 起始値是一組2維的陣列所組成，代表光在擴散元件後遠 場分布函數的相位値。此時乃假設空間振幅（Amplitude ) (a丨）均爲一常數。本發明所提出的演算法是由場的頻譜 定義開始進行叠代演算，由場的頻譜定義（Frequency Domain )分佈進行反傅氏轉換（Inverse Fourier Transformation )，得到空間定義（Spatial Domain )分 佈。此時所的分佈均在波長λ,下操作，令ai爲一常數，得 到木相位。 本紙张尺度適用中國國家標準（CNS ) A4说格（210X297公釐） 經濟部中央揉準局貝工消费合作社印1i A7 B7 五、發明説明（5 ) 接著進行波長毛的空間定義分布置換：由波源弋轉換 至波源毛係利用相位轉換的原理來完成。亦即，以每單位 元的蝕刻深度爲基本參數，將所得之波源弋相位么依（1 ) 式轉換至波源、下的相位么分佈。而相位函數貝岫蝕刻深 度與未蝕刻區域的相位差所形成。 接著進行傅氏轉換至波源七下的頻率定義分佈。此時 必須檢測振幅的優化結果，強制令4滿足收斂條件，對不 滿足的振幅變數皆重新設定，使滿足高穿透的特性，而不 致減損其光穿透率。 在波源、下重新設定後，將光場的分佈進行反傅氏轉 換，可得到一組在;ι2下新的空間定義分佈。即，以;12波長 爲標準，令电爲一常數，得到A相位。其次進行波源轉換， 由乂2轉換至;ι3 :利用如方程式（1 )，以蝕刻深度爲基本 參數作相位差變換，再將波源;ι3下的空間定義分佈作傅氏 轉換（Fourier Transformation )至頻譜定義分佈，並進行 振幅4條件判斷，及對不滿足收斂條件的振幅重新設定， 以滿足高效率穿透效果。 完成判斷及設定後，再進行反傅氏轉換，得到波源;13 下，重新設定的空間定義分佈。然後再依序由；^一夂一、 循序轉換並作條件判斷，回復到波長'的頻譜定義分佈。 如此稱爲一個叠代演算迴路。 胃¥檢測振幅劣是否滿足所設定的判斷値。如是，再 循序檢測々，<···是否滿足所設定的判斷値，直到所 有的振幅均符合條件，此時表示此全像擴散元件滿足所有 ( CNS ) A4^ ( 210X297/^ ) (請先閲讀背面之注意事項再填寫本頁) -裝.Printed by the Central Standards Bureau of the Ministry of Economic Affairs and Consumer Cooperatives A7 B7 V. Description of the invention (j) [Scope of application of the invention] The present invention relates to a holographic diffusion element and its manufacturing method, in particular to a computerized design with high gloss Holographic diffuser with transmissivity and uniform color mixing. The holographic diffusion element of the present invention visually provides a color mixing effect of multiple wave sources, so that different wave sources can obtain a better color mixing effect through the diffusion element, and improve the penetration efficiency of the diffusion element. The invention also provides a set of iterative algorithms to calculate the three-dimensional structure of the holographic element using a computer. [Background of the Invention] Traditional diffusion elements play a very important role in the optical field. Not only can improve the uniformity of light irradiation objects, but also improve the optical imaging system, so that it has a wide image visibility. The diffusing element can be applied to, for example, a flat panel display, used for backlighting, or used as a projection screen. At present, the manufacturing methods of diffusion elements can be divided into two categories: 1. General diffusion plates, such as frosted glass, use the roughness of the surface of the diffusion plate to complete the effect of light scattering. The light penetration energy of this conventional diffusion element is too low, and the attenuation effect is too large. 2. The diffusive plate for holographic imaging uses the interference of two beams to achieve the effect of beam shaping and diffusion. Although such a diffusing element can obtain a controllable diffusing effect and improve its penetration efficiency, its light penetration energy is not high and it cannot achieve a satisfactory color mixing effect, which is its disadvantage. Since conventional techniques have considerable disadvantages in the fabrication of diffusion elements, the inventors have proposed diffusion elements designed using computer calculation methods. The present invention (please read the precautions on the back before filling out this page) --- * ------;-^ ----- install --- order --- the standard of this paper is applicable to Chinese national standards (CNS) A4 specification (210X297 mm) Central Prototype Bureau of the Ministry of Economic Affairs® C Industrial Consumption Cooperation Du Yinhua A7 B7 V. Description of the invention (1) The holographic diffusion element is calculated by computer to determine its three-dimensional space structure. Because the computer calculation is accurate, and the semiconductor etching technology can be used to achieve accurate processing control, it can achieve excellent penetration efficiency and plastic color mixing effect. The holographic image diffusion element of the present invention may be referred to as a computer-assisted diffusion element. [Objective of the Invention] The object of the present invention is to provide a novel computer calculation method to design a diffusion element having an excellent diffusion effect. The object of the present invention is also to provide a method for manufacturing a diffusion element by computer-aided design. The object of the present invention is also to provide a holographic diffusion device with high light transmittance and uniform color mixing effect. The object of the present invention is also to provide a holographic diffusion element having a novel structure. [Brief description of the invention] The holographic diffuser element of the present invention is a diffuser element designed using a computer calculation method. The basic theory is to use the Fraunhofer diffraction principle and iterative algorithm, supplemented by several applicable judgment parameters and conditions, and then refer to the convergence conditions to calculate and make a three-dimensional structure of the element with excellent diffusion effect. In the iterative calculation, the judgment condition of changing the amplitude is used to achieve the characteristics of high transmittance of the element. Another feature of the present invention is that a special iterative algorithm can be used to calculate a diffusion element that can uniformly mix the colors of multiple wave sources' and has high penetration efficiency characteristics. Ο The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297). (Li) — Λ- 丨 -------- liir 丨-;-II.— 丨 L · (Please read the notes on the back before filling out this page) Printed by A7, Shellfish Consumer Cooperative, Central Bureau of Standards, Ministry of Economic Affairs _B7__ V. Description of the invention (3) [Explanation of the drawings] The first figure shows a cross-sectional view of a full-image diffusion element of the present invention. 'The second i represents a schematic representation of the 鲞: method applicable to the three wave source mixed color diffusing elements of the present invention. The third figure shows a computer-assisted _ design holographic diffuser composed of 32 X 32 two-dimensional unit cells. The number of each unit cell represents its etching depth, and its order is 2L '= 8 quantization order. The fourth figure shows the penetrating efficiency of the holographic diffuser of the present invention in the third figure. The fifth figure shows a manufacturing flow chart of the holographic diffusion device of the present invention. [Detailed description of the invention] Hereinafter, the holographic image diffusing element of the present invention and a manufacturing method thereof will be described with reference to the drawings. The first figure shows a cross-sectional view of a holographic diffusion element of the present invention. The figure shows that the holographic diffusion element of the present invention is composed of many unit cells. The "unit cell" as used herein refers to the micro area constituting the holographic diffusion element. An appropriate example may be 1 X 1 V m per unit cell. As shown ', the thickness of each unit is different. In the embodiment of the present invention, the 'holographic diffusion element is completed by using an etching technique. In the figure, D represents the thickness of the substrate used to make the full-image diffusion element, and it also represents the etching depth of the unit cell at the i-th position in a certain unit cell. According to the manufacturing method of the holographic diffusion device of the present invention, the etching depth Φ of each unit cell can be calculated by the following phase distribution function: 5-· _ _ 1 '* " * " The paper scale is applicable to Chinese standards (〇 ^)戍 4Specifications (210 > < 297) &;-Ί. —L·lll · ili_ 装 — I (Please read the note on the back before filling this page) I order A7 _B7_____ V. Description of the invention (4 ·) Among them, the phase distribution function of the diffusion device A to the wave source VII; 夂 is the wave number under the wave source \; 'is the refractive index of the material of the substrate. Limited types of wavelengths A, \, λ3 ...; ι „can be calculated as the etching depth per unit cell. However, in practical applications, light sources with three wavelengths (ie, three primary colors) are usually used to cause mixed dreams, which is most commonly seen. Therefore, Benfa®®® Liliyunli method, in order to obtain a holographic diffuser suitable for multi-band wave source and with color mixing effect ..........................----. ....— ~ 伫. Although not intended to be bound by any theory, the present invention is suitable for the application of light sources with multiple wavelengths. Algorithm "to determine the three-dimensional structure of the diffusion element. The following description" The second figure shows a schematic diagram of an iterative algorithm suitable for the three-band wave source mixed-color diffusion element of the present invention. Here, this embodiment uses a wavelength variable of 4 , 3 types of color mixing methods of wool, wool, as a basis for explanation. But the present invention can be applied to more or less than three wave sources, it goes without saying. Printed by the Shellfish Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs (please read first Note on the back, please fill in this page again) First of all, a set of starting chirps generated by random numbers is used as the starting conditions. These starting chirpes are composed of a two-dimensional array, which represents the far-field distribution of light behind the diffusing element. The phase of the function 此时. At this time, it is assumed that the spatial amplitude (Amplitude) (a 丨) is a constant. The algorithm proposed by the present invention starts from the definition of the frequency spectrum of the field and performs iterative calculations. The definition of the frequency of the field (Frequency Domain) ) Distribution to perform Inverse Fourier Transformation to obtain the Spatial Domain distribution. At this time, all distributions are operated at the wavelength λ, let ai be a constant The wood phase is obtained. This paper size applies the Chinese National Standard (CNS) A4 grid (210X297 mm), printed by the Central Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperative, 1i, A7, B7. 5. Description of the invention (5) Next, the spatial definition of the wavelength hair Distribution substitution: The conversion from wave source 弋 to wave source hair is accomplished using the principle of phase conversion. That is, using the etching depth per unit element as the basic parameter, the obtained wave source 弋 phase is converted to the wave source, (1) Phase distribution. The phase function is formed by the phase difference between the etching depth and the unetched area. Then Fourier transform is performed to the frequency definition distribution of the wave source. At this time, the optimization result of the amplitude must be detected, and the convergence condition 4 is forced to be set, and the unsatisfied amplitude variables are all reset to meet the characteristics of high penetration without detracting from its optical transmittance. After resetting the wave source and the bottom, the inverse Fourier transform of the distribution of the light field can be used to obtain a new set of spatially defined distributions under ι2. That is, taking the wavelength of 12 as a standard and making electricity a constant, the A phase is obtained. Secondly, the wave source conversion is performed, from 乂 2 to; ι3: using the equation (1), using the etching depth as the basic parameter to perform phase difference transformation, and then the spatial definition distribution under ι3 is Fourier Transformation (Fourier Transformation) to The frequency spectrum defines the distribution, and the amplitude 4 conditions are judged, and the amplitudes that do not meet the convergence conditions are reset to meet the high-efficiency penetration effect. After the judgment and setting are completed, the inverse Fourier transform is performed to obtain the wave source. Under 13, the spatial definition distribution is reset. Then, the sequence is followed by; ^ one by one, and sequentially convert and make conditional judgments, and return to the spectrum definition distribution of wavelength '. This is called an iterative calculation circuit. Stomach ¥ Detects whether the amplitude is inferior to the set judgment 满足. If yes, then sequentially check 々, < ... whether the set judgment 满足 is satisfied until all the amplitudes meet the conditions, at this time, it means that the holographic diffusion element meets all (CNS) A4 ^ (210X297 / ^) (please (Please read the notes on the back before filling out this page)-Install.
.IT 發明説明（G) 波源色彩混合特性；若未滿足，貝fj再循序進行轉換程序， 進行第二次、第三次…叠代演算，直到所有冷，均滿足所設 定的判斷値。最後進行模式量化，將元件中每單位元作階 數董化。例如此計算式全像元件若爲二階化，其量化結果 只容許〇與1狀態存在，而量化結果即表示元件的蝕刻深 度。 依此所設計出來的擴散元件，不但對三波源均具有良 * 好的光率，且能提供優異之混色效果。 上述說明雖以三段波源爲例，但本發明採用的叠代演 算法，可適用於多波長（例如;I,，a2，毛〇操作情況 下。而多波長叠代演算法與前述演算方式相同，可直接串 接至η個條件及列式。 在實例上，例如：依據波源;1,=0.565 # m及波源 A2=0.650 y m，經由本發明之叠代演算法可得到一收斂結 果。若此元件區分爲32 X 32的矩陣單位元，且元件蝕刻 深度設定爲八階之需求，經由量化所得的結果可如第三圖 所示。圖上所示的數字爲0至7 ,分別代表每位子單位元 所蝕刻深度的階數。光源通過此元件的穿透強度，顯示於 第四圖。當然，由於本發明是以一組亂數之矩陣開始運 算，實際應用時每次結果可能不同，但均合乎需求。因此， 第三圖所示之値並非本發明適用之唯一實例。也不待言。 以下說明本發明全像擴散元件之製法。本發明全像擴 散元件之製作方法是利用半導體製程來完成擴散元件的 製作。由上述叠代演算可得到一 2維分佈童化的數値，代 尺度通用中國國家棣準（CNS ) A4規格（210Χ297公釐） 經濟部中央橾準局貝工消费合作社印簟 A7 B7 五、發明説明（7) 表該單位元所需蝕刻深度成。由量化結果以二進位表示， 分別製作成m個光罩’而此m個光罩分別代表不同蝕刻 深度的製程參數。例如：m=3表示製作元件需3道光罩及 三次蝕刻製程，並代表元件可量化階數及製程階數可達 23 = 8個。每階的蝕刻深度，I爲波源Al，乂2， 2 An 又3的波長平均値，△”爲基材折射率與空氣折射率的差値， Δ« = w -1 ° 第五圖表示本發明全像擴散元件之製法之流程圖。首 先，於（401 )準備基材並淸洗乾淨。其次於（402 )進 行二氧化矽的鑛著，作爲蝕刻所用之介質，或直接以矽晶 片或石英玻璃雜作爲蝕刻基材。於（403 )將以上述方 式計算所得全像圖案依光罩順序蝕刻。於（404 )進行光 阻之蒸鍍及烘烤’作爲曝光層。再於（405 )利用光罩對 準機（依光罩程序）作圖案轉寫，於（406 )顯影，並於 (407 )反應離子蝕刻步驟。如此完成的樣品爲一道光罩 的製程。於（408 )判斷光罩是否已經全部完成轉寫，如 是，即完成製作，如否，則回到（403 )，進行下一道光 罩製程，直到完成樣品。 【發明之效果】 第四圖顯示第三圖所示全像擴散元件之穿透效率示意 圖。如圖所示，光線透過本發明全像擴散元件後之正規化 空間振幅（Normalized Amplitude )’在256灰階之表75 下，均在250左右，証明經由本發明所製成之全像擴散元 本紙張尺度適用中國國家橾率（CNS ) A4规格（210X297公釐） (請先閱讀背面之注$項再球寫本筲) 訂 ✓ A7 B7 五、發明説明（y) 件確具有相當優異之透光率。而經由主觀測試之結果’更 証明經由本發明之全像擴散元件後，LED呈現柔和均勻 的色彩《 在本發明中，因考慮到習用裝置中，光穿透率降低之 缺點，故以振輻條件作爲收斂條件。但在其他應用中可考 慮其他條件，或一倂考慮其他條件’均靥可行。 此外，本發明全像擴散元件使用在發光二極體之場 合，各發光二極體之空間（平面）分布條件（例如位置、 距離）等，也可加入運算之考慮，以求得類似效果，更不 待言。 以上是對本發明全像擴散元件之說明，習於斯藝之人 士不難由上述之說明，明瞭本發明之精神，進而作出不同 的衍伸與變化，唯只要不超出本發明之精神，均應包含於 其申請專利範圍之內。 I ^--·-----^-- (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部中央樣準局貝工消费合作社印掣 本紙张尺度適用中國國家榡準（CNS )八4規格（210 x297公釐}.IT Invention Description (G) The color mixing characteristics of the wave source; if it is not satisfied, the beijing fj will perform the conversion procedure in sequence, and perform the second, third ... iterative calculations until all the cold, meet the set judgment 値. Finally, the mode quantization is performed, and each unit element in the component is transformed into order. For example, if this calculation formula is a second-order element, the quantization result only allows 0 and 1 states to exist, and the quantization result indicates the etching depth of the element. The diffusive element designed in this way not only has good * good luminosity for all three wave sources, but also provides excellent color mixing effect. Although the above description takes three band wave sources as an example, the iterative algorithm used in the present invention can be applied to the multi-wavelength (eg, I ,, a2, and Mao 0 operation). The multi-wavelength iterative algorithm and the aforementioned calculation method Same, can be directly connected to η conditions and formulas. For example, according to the wave source; 1, = 0.565 # m and wave source A2 = 0.650 ym, a convergence result can be obtained through the iterative algorithm of the present invention. If this element is divided into 32 x 32 matrix unit elements, and the element's etching depth is set to the requirement of eighth order, the result obtained through quantization can be shown in the third figure. The numbers shown in the figure are 0 to 7, which represent The order of the etch depth of each sub-unit. The penetration intensity of the light source through this element is shown in the fourth figure. Of course, because the invention starts with a matrix of random numbers, the results may be different each time in actual application. However, they all meet the requirements. Therefore, the 第三 shown in the third figure is not the only example in which the present invention is applicable. It goes without saying. The method of manufacturing the holographic diffusion element of the present invention is described below. The manufacturing method of the holographic diffusion element of the present invention is to use The conductor process is used to complete the fabrication of the diffusion element. A 2-dimensional distribution of childlike numbers can be obtained from the above iterative calculations, and the general standard is the Chinese National Standard (CNS) A4 specification (210 × 297 mm). Industrial and Consumer Cooperative Seal A7 B7 V. Description of the invention (7) Table shows the required etching depth of the unit element. The quantified result is expressed in binary and made into m photomasks', and these m photomasks represent different etchings, respectively. Depth process parameters. For example: m = 3 means that three photomasks and three etching processes are required to make the component, and it represents the quantifiable order of the component and the number of process steps can reach 23 = 8. The etching depth of each step, I is the wave source Al The wavelength average 乂, 又 2, 2An and 3, △ "is the difference between the refractive index of the substrate and the refractive index of air, Δ« = w -1 ° The fifth figure shows a flowchart of the method for manufacturing a holographic image diffusion element according to the present invention. First, the substrate is prepared and cleaned at (401). Second, the mineralization of silicon dioxide is performed at (402) as a medium for etching, or a silicon wafer or quartz glass is directly used as an etching substrate. 403) will be in the above way The calculated full-image pattern is etched in the order of the mask. The photoresist is vapor-deposited and baked at (404) as the exposure layer. Then (405) the pattern is transferred using the mask alignment machine (according to the mask program) , Developed in (406) and reactive ion etching step in (407). The sample thus completed is a mask process. In (408), it is judged whether the mask has been completely rewritten, and if so, the production is completed, if not Then, return to (403) and proceed to the next mask process until the sample is completed. [Effects of the invention] The fourth figure shows a schematic diagram of the penetration efficiency of the holographic diffusion element shown in the third figure. As shown in the figure, light passes through The normalized Amplitude 'after the holographic diffusion element of the present invention is under the 256 gray level table 75, and is about 250, which proves that the paper size of the holographic diffusion element made by the present invention is suitable for the Chinese country. Rate (CNS) A4 specification (210X297 mm) (Please read the note on the back before writing the ball 筲) Order ✓ A7 B7 5. Description of the invention (y) The piece does have a very good light transmittance. The result of subjective test 'proves that after passing through the holographic diffuser element of the present invention, the LED presents a soft and uniform color. In the present invention, due to the shortcomings of light transmittance reduction in conventional devices, the vibration radiation is used. Condition as a convergence condition. However, other conditions may be considered in other applications, or it may not be feasible to consider other conditions at once. In addition, when the holographic diffusion element of the present invention is used in a light-emitting diode, the spatial (planar) distribution conditions (such as position and distance) of each light-emitting diode can also be considered by calculation to obtain similar effects. Needless to say. The above is the description of the holographic diffusion element of the present invention. It is not difficult for those who are familiar with Siyi to understand the spirit of the present invention, and then to make different extensions and changes. As long as it does not exceed the spirit of the present invention, they should It is included in the scope of its patent application. I ^-· ----- ^-(Please read the precautions on the back before filling this page) Order the paper printed by the Central Bureau of Standards, Ministry of Economic Affairs, Shellfish Consumer Cooperatives, and the paper size is applicable to China National Standards (CNS) Eight 4 size (210 x297 mm)