TW367536B - Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma - Google Patents

Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma

Info

Publication number
TW367536B
TW367536B TW085115628A TW85115628A TW367536B TW 367536 B TW367536 B TW 367536B TW 085115628 A TW085115628 A TW 085115628A TW 85115628 A TW85115628 A TW 85115628A TW 367536 B TW367536 B TW 367536B
Authority
TW
Taiwan
Prior art keywords
surface treatment
workpiece
plasma
damage
employ
Prior art date
Application number
TW085115628A
Other languages
Chinese (zh)
Inventor
Takuya Miyakawa
Takujji Tsutsui
Yoshiaki Mori
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Application granted granted Critical
Publication of TW367536B publication Critical patent/TW367536B/en

Links

Abstract

A kind of surface treatment method which can change the surface properties of the object without damage by plasma and with large degree of freedom of the surface treatment space. In order to increase the wetness of the soft solder of workpiece, the gas material of halogen composite containing carbon fluoride is guided into the plasma generator of the surface treatment unit. At that time, it can also employ the pressure by gas carrier except the helium. The plasma generator can activate the material gas to decomposite by applying low frequency as 0 to 50 KHz of alternating voltage or direct voltage under normal atmosphere pressure and generate the reactive fluorine which is used to contact the surface of the workpiece. Then, because the process did not employ the short life-span fluoride as the main object, the position of workpiece can be freely configured so as to eliminate odor generation. The hydrogen halide can be effectively decomposited in an aquiferous atmosphere under decomposition of halide.
TW085115628A 1995-11-07 1996-12-18 Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma TW367536B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32814595 1995-11-07
JP30254096A JP3796857B2 (en) 1995-11-07 1996-10-28 Surface treatment method and apparatus

Publications (1)

Publication Number Publication Date
TW367536B true TW367536B (en) 1999-08-21

Family

ID=26563154

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085115628A TW367536B (en) 1995-11-07 1996-12-18 Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma

Country Status (3)

Country Link
JP (1) JP3796857B2 (en)
SG (1) SG43457A1 (en)
TW (1) TW367536B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100473432B1 (en) * 1998-09-17 2005-03-08 가부시키가이샤 다무라 세이사쿠쇼 Bump forming method, soldering preprocessing method, soldering method, soldering preprocessing apparatus and soldering apparatus
JP2004006511A (en) * 2002-05-31 2004-01-08 Toppan Printing Co Ltd Plasma processing apparatus
KR101114803B1 (en) 2004-03-31 2012-03-13 칸토 덴카 코교 가부시키가이샤 Method for producing f2-containing gas, apparatus for producing f2-containing gas, method for modifying article surface, and apparatus for modifying article surface
JP5679139B2 (en) * 2008-03-06 2015-03-04 東洋炭素株式会社 Surface treatment equipment
JP6138441B2 (en) * 2011-09-21 2017-05-31 株式会社Nbcメッシュテック Airborne virus removal unit
JP2022163526A (en) * 2021-04-14 2022-10-26 東京エレクトロン株式会社 Substrate processing method

Also Published As

Publication number Publication date
JP3796857B2 (en) 2006-07-12
SG43457A1 (en) 1997-10-17
JPH09205272A (en) 1997-08-05

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