TW366529B - Method of elimination of passivation photoresist layer - Google Patents

Method of elimination of passivation photoresist layer

Info

Publication number
TW366529B
TW366529B TW087101613A TW87101613A TW366529B TW 366529 B TW366529 B TW 366529B TW 087101613 A TW087101613 A TW 087101613A TW 87101613 A TW87101613 A TW 87101613A TW 366529 B TW366529 B TW 366529B
Authority
TW
Taiwan
Prior art keywords
photoresist layer
elimination
passivation
photoresist
removal
Prior art date
Application number
TW087101613A
Other languages
Chinese (zh)
Inventor
zhi-kang Qiu
Sheng-Liang Pan
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Priority to TW087101613A priority Critical patent/TW366529B/en
Application granted granted Critical
Publication of TW366529B publication Critical patent/TW366529B/en

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Abstract

The present invention provides a pattern of elimination of passivation photoresist layer avoiding PR extrusion in the alloy process with residual of photoresist and stripper, including the following steps: first removal of part of the passivation photoresist with dry etching, followed by the removal of the rest of the photoresist layer with wet etching. Then, using proper solvent for one or more surface layer cleaning to remove the residue before quick dump rinse, QDR for liquid ion.
TW087101613A 1998-02-06 1998-02-06 Method of elimination of passivation photoresist layer TW366529B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW087101613A TW366529B (en) 1998-02-06 1998-02-06 Method of elimination of passivation photoresist layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW087101613A TW366529B (en) 1998-02-06 1998-02-06 Method of elimination of passivation photoresist layer

Publications (1)

Publication Number Publication Date
TW366529B true TW366529B (en) 1999-08-11

Family

ID=57941133

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087101613A TW366529B (en) 1998-02-06 1998-02-06 Method of elimination of passivation photoresist layer

Country Status (1)

Country Link
TW (1) TW366529B (en)

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