TW353774B - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- TW353774B TW353774B TW086114091A TW86114091A TW353774B TW 353774 B TW353774 B TW 353774B TW 086114091 A TW086114091 A TW 086114091A TW 86114091 A TW86114091 A TW 86114091A TW 353774 B TW353774 B TW 353774B
- Authority
- TW
- Taiwan
- Prior art keywords
- polarity
- signal line
- integrated circuit
- semiconductor integrated
- circuit device
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5225—Shielding layers formed together with wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8259480A JPH10107208A (ja) | 1996-09-30 | 1996-09-30 | 半導体集積回路装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW353774B true TW353774B (en) | 1999-03-01 |
Family
ID=17334669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086114091A TW353774B (en) | 1996-09-30 | 1997-09-26 | Semiconductor integrated circuit device |
Country Status (4)
Country | Link |
---|---|
US (1) | US6005265A (zh) |
JP (1) | JPH10107208A (zh) |
KR (1) | KR19980025140A (zh) |
TW (1) | TW353774B (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5864181A (en) | 1993-09-15 | 1999-01-26 | Micron Technology, Inc. | Bi-level digit line architecture for high density DRAMs |
US6043562A (en) * | 1996-01-26 | 2000-03-28 | Micron Technology, Inc. | Digit line architecture for dynamic memory |
US6072699A (en) * | 1998-07-21 | 2000-06-06 | Intel Corporation | Method and apparatus for matching trace lengths of signal lines making 90°/180° turns |
US6606587B1 (en) * | 1999-04-14 | 2003-08-12 | Hewlett-Packard Development Company, L.P. | Method and apparatus for estimating elmore delays within circuit designs |
EP1347389B1 (en) * | 2002-03-19 | 2013-05-15 | Broadcom Corporation | Bus twisting scheme for equalizing coupling and low power |
US6894231B2 (en) * | 2002-03-19 | 2005-05-17 | Broadcom Corporation | Bus twisting scheme for distributed coupling and low power |
JP4354681B2 (ja) | 2002-09-13 | 2009-10-28 | 株式会社日立製作所 | 通信用半導体集積回路 |
US7139993B2 (en) * | 2004-03-26 | 2006-11-21 | Sun Microsystems, Inc. | Method and apparatus for routing differential signals across a semiconductor chip |
JP4492734B2 (ja) * | 2008-05-29 | 2010-06-30 | ソニー株式会社 | 信号処理装置、信号処理システム、および信号処理方法 |
JP2009302132A (ja) * | 2008-06-10 | 2009-12-24 | Toshiba Corp | レイアウト設計方法及び記録媒体 |
US8621405B2 (en) * | 2012-05-31 | 2013-12-31 | Synopsys, Inc. | Incremental elmore delay calculation |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3440335B2 (ja) * | 1993-08-18 | 2003-08-25 | 日本テキサス・インスツルメンツ株式会社 | 半導体メモリ装置 |
JP3158017B2 (ja) * | 1994-08-15 | 2001-04-23 | インターナショナル・ビジネス・マシーンズ・コーポレ−ション | 相互結線配列および相互結線配列用の導線を形成する方法 |
-
1996
- 1996-09-30 JP JP8259480A patent/JPH10107208A/ja active Pending
-
1997
- 1997-09-26 TW TW086114091A patent/TW353774B/zh not_active IP Right Cessation
- 1997-09-29 US US08/939,869 patent/US6005265A/en not_active Expired - Fee Related
- 1997-09-30 KR KR1019970049879A patent/KR19980025140A/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US6005265A (en) | 1999-12-21 |
KR19980025140A (ko) | 1998-07-06 |
JPH10107208A (ja) | 1998-04-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |