TW348285B - Method of fabricating semiconductor device - Google Patents
Method of fabricating semiconductor deviceInfo
- Publication number
- TW348285B TW348285B TW085114846A TW85114846A TW348285B TW 348285 B TW348285 B TW 348285B TW 085114846 A TW085114846 A TW 085114846A TW 85114846 A TW85114846 A TW 85114846A TW 348285 B TW348285 B TW 348285B
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor device
- fabricating semiconductor
- tungsten silicide
- fabricating
- carrying
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- WQJQOUPTWCFRMM-UHFFFAOYSA-N tungsten disilicide Chemical compound [Si]#[W]#[Si] WQJQOUPTWCFRMM-UHFFFAOYSA-N 0.000 abstract 2
- 229910021342 tungsten silicide Inorganic materials 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019960024616A KR100219416B1 (ko) | 1996-06-27 | 1996-06-27 | 반도체장치 제조방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW348285B true TW348285B (en) | 1998-12-21 |
Family
ID=19463951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW085114846A TW348285B (en) | 1996-06-27 | 1996-12-02 | Method of fabricating semiconductor device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3121777B2 (ja) |
| KR (1) | KR100219416B1 (ja) |
| TW (1) | TW348285B (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100482751B1 (ko) | 2002-12-27 | 2005-04-14 | 주식회사 하이닉스반도체 | 반도체 소자의 제조 방법 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63227060A (ja) * | 1987-03-17 | 1988-09-21 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPS6442175A (en) * | 1987-08-07 | 1989-02-14 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPH047826A (ja) * | 1990-04-25 | 1992-01-13 | Fuji Xerox Co Ltd | 半導体装置の製造方法 |
-
1996
- 1996-06-27 KR KR1019960024616A patent/KR100219416B1/ko not_active IP Right Cessation
- 1996-11-29 JP JP08320072A patent/JP3121777B2/ja not_active Expired - Fee Related
- 1996-12-02 TW TW085114846A patent/TW348285B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JPH1050704A (ja) | 1998-02-20 |
| KR100219416B1 (ko) | 1999-09-01 |
| KR980005556A (ko) | 1998-03-30 |
| JP3121777B2 (ja) | 2001-01-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |