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Application filed by Imec Inter Uni Micro ElectrfiledCriticalImec Inter Uni Micro Electr
Priority to TW086108868ApriorityCriticalpatent/TW346642B/zh
Application grantedgrantedCritical
Publication of TW346642BpublicationCriticalpatent/TW346642B/zh
Installation pourvue d'un dispositif d'admission de gaz, pour le traitement de substrats dans un récipient sous vide, et procédé pour ce traitement.