TW345690B - Dummy wafer recoverable from ion implantation machine and recovery use method thereof - Google Patents

Dummy wafer recoverable from ion implantation machine and recovery use method thereof

Info

Publication number
TW345690B
TW345690B TW086113765A TW86113765A TW345690B TW 345690 B TW345690 B TW 345690B TW 086113765 A TW086113765 A TW 086113765A TW 86113765 A TW86113765 A TW 86113765A TW 345690 B TW345690 B TW 345690B
Authority
TW
Taiwan
Prior art keywords
ion implantation
dummy wafer
recoverable
use method
wafer
Prior art date
Application number
TW086113765A
Other languages
Chinese (zh)
Inventor
Ren-Tsorng Lin
Geeng-Yuan Wu
Kuen-Juh Chern
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW086113765A priority Critical patent/TW345690B/en
Application granted granted Critical
Publication of TW345690B publication Critical patent/TW345690B/en

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  • Drying Of Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

A method for recovering a dummy wafer from an ion implantation machine, which at comprises: forming a silicon dioxide layer on a bare dummy wafer as a monitor wafer; carrying out at least one ion implantation process using the monitor wafer as a dummy wafer of the ion implantation process; and carrying out an etching process to etch a portion of the silicon dioxide layer on the dummy wafer when the ion concentration of the dummy wafer reaches a preset saturation dosage in the ion implantation process.
TW086113765A 1997-09-22 1997-09-22 Dummy wafer recoverable from ion implantation machine and recovery use method thereof TW345690B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086113765A TW345690B (en) 1997-09-22 1997-09-22 Dummy wafer recoverable from ion implantation machine and recovery use method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086113765A TW345690B (en) 1997-09-22 1997-09-22 Dummy wafer recoverable from ion implantation machine and recovery use method thereof

Publications (1)

Publication Number Publication Date
TW345690B true TW345690B (en) 1998-11-21

Family

ID=58263841

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086113765A TW345690B (en) 1997-09-22 1997-09-22 Dummy wafer recoverable from ion implantation machine and recovery use method thereof

Country Status (1)

Country Link
TW (1) TW345690B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111243993A (en) * 2020-01-17 2020-06-05 上海华力集成电路制造有限公司 Method for monitoring angle of implanter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111243993A (en) * 2020-01-17 2020-06-05 上海华力集成电路制造有限公司 Method for monitoring angle of implanter

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