TW336770U - Semi-conductor manufacturing waste gas treatment system - Google Patents
Semi-conductor manufacturing waste gas treatment systemInfo
- Publication number
- TW336770U TW336770U TW086214571U TW86214571U TW336770U TW 336770 U TW336770 U TW 336770U TW 086214571 U TW086214571 U TW 086214571U TW 86214571 U TW86214571 U TW 86214571U TW 336770 U TW336770 U TW 336770U
- Authority
- TW
- Taiwan
- Prior art keywords
- semi
- waste gas
- treatment system
- gas treatment
- conductor manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000002912 waste gas Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D51/00—Auxiliary pretreatment of gases or vapours to be cleaned
- B01D51/10—Conditioning the gas to be cleaned
Landscapes
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950034994A KR0160391B1 (ko) | 1995-10-11 | 1995-10-11 | 반도체 제조설비의 폐가스 처리장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW336770U true TW336770U (en) | 1998-07-11 |
Family
ID=19429899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086214571U TW336770U (en) | 1995-10-11 | 1996-02-13 | Semi-conductor manufacturing waste gas treatment system |
Country Status (4)
Country | Link |
---|---|
US (1) | US5743939A (zh) |
JP (1) | JP2695764B2 (zh) |
KR (1) | KR0160391B1 (zh) |
TW (1) | TW336770U (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100242956B1 (ko) * | 1997-06-03 | 2000-02-01 | 윤종용 | 가스 배기 시스템의 잔류물 제거 및 차단장치 |
US5972078A (en) * | 1997-07-31 | 1999-10-26 | Fsi International, Inc. | Exhaust rinse manifold for use with a coating apparatus |
KR100708369B1 (ko) * | 2006-03-07 | 2007-04-19 | 안재혁 | 폐가스 배기 제어시스템 |
DE102006052586B4 (de) * | 2006-11-08 | 2008-07-03 | Schott Solar Gmbh | Verfahren und Vorrichtung zur Reinigung der Abgase einer Siliziumdünnschicht-Produktionsanlage |
CN105148639B (zh) * | 2015-07-31 | 2016-12-07 | 温州市洞头新凯实业有限公司 | 一种废气处理装置 |
CN105080226B (zh) * | 2015-07-31 | 2016-08-24 | 厦门市优家品日用品有限公司 | 一种高效的废气处理装置 |
CN105080240B (zh) * | 2015-07-31 | 2016-08-24 | 金华市四维空间汽车用品有限公司 | 一种工业废气处理装置 |
CN104998477B (zh) * | 2015-07-31 | 2017-01-18 | 浙江划云环境技术有限公司 | 加工设备的废气处理装置 |
CN105080239B (zh) * | 2015-07-31 | 2016-09-07 | 诸暨市洋诚日用品有限公司 | 一种降噪的废气处理装置 |
CN105080237B (zh) * | 2015-07-31 | 2016-08-31 | 温岭市锦鹏日用品有限公司 | 一种速度可调的废气处理装置 |
CN105521663A (zh) * | 2015-12-09 | 2016-04-27 | 永兴县灿阳贵金属有限责任公司 | 一种铅冶炼废气处理系统 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2999560A (en) * | 1956-12-20 | 1961-09-12 | Phillips Petroleum Co | Separation for flare systems |
US3755990A (en) * | 1972-05-08 | 1973-09-04 | Universal Oil Prod Co | Method of collecting sub-micron particles from a hot gas effluent stream |
US3823531A (en) * | 1972-08-15 | 1974-07-16 | J Crawley | Gas cleaner |
US3844740A (en) * | 1973-10-11 | 1974-10-29 | Rothemuehle Brandt Kritzler | Exhaust gas treatment |
US3883329A (en) * | 1974-01-23 | 1975-05-13 | Dupps Co | High efficiency vapor control system |
US4022593A (en) * | 1975-05-05 | 1977-05-10 | Lerner Bernard J | Mist elimination |
-
1995
- 1995-10-11 KR KR1019950034994A patent/KR0160391B1/ko not_active IP Right Cessation
-
1996
- 1996-02-05 JP JP8019070A patent/JP2695764B2/ja not_active Expired - Fee Related
- 1996-02-13 TW TW086214571U patent/TW336770U/zh unknown
- 1996-09-24 US US08/718,670 patent/US5743939A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR970023777A (ko) | 1997-05-30 |
KR0160391B1 (ko) | 1999-02-01 |
US5743939A (en) | 1998-04-28 |
JPH09103639A (ja) | 1997-04-22 |
JP2695764B2 (ja) | 1998-01-14 |
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